JP2001176653A - Organic el element - Google Patents
Organic el elementInfo
- Publication number
- JP2001176653A JP2001176653A JP35457599A JP35457599A JP2001176653A JP 2001176653 A JP2001176653 A JP 2001176653A JP 35457599 A JP35457599 A JP 35457599A JP 35457599 A JP35457599 A JP 35457599A JP 2001176653 A JP2001176653 A JP 2001176653A
- Authority
- JP
- Japan
- Prior art keywords
- organic
- layer
- film
- moisture
- protective layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims abstract description 42
- 229920005989 resin Polymers 0.000 claims abstract description 18
- 239000011347 resin Substances 0.000 claims abstract description 18
- 239000010410 layer Substances 0.000 claims description 101
- 239000010408 film Substances 0.000 claims description 70
- 239000011241 protective layer Substances 0.000 claims description 55
- 229910052751 metal Inorganic materials 0.000 claims description 38
- 239000002184 metal Substances 0.000 claims description 38
- 239000011247 coating layer Substances 0.000 claims description 29
- 239000010409 thin film Substances 0.000 claims description 20
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 14
- 238000000034 method Methods 0.000 claims description 14
- -1 polyethylene terephthalate Polymers 0.000 claims description 9
- 239000000377 silicon dioxide Substances 0.000 claims description 6
- 239000003230 hygroscopic agent Substances 0.000 claims description 5
- 229910044991 metal oxide Inorganic materials 0.000 claims description 5
- 150000004706 metal oxides Chemical class 0.000 claims description 5
- 239000011368 organic material Substances 0.000 claims description 5
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 4
- 239000004593 Epoxy Substances 0.000 claims description 4
- 239000004372 Polyvinyl alcohol Substances 0.000 claims description 4
- 239000002250 absorbent Substances 0.000 claims description 4
- 230000002745 absorbent Effects 0.000 claims description 4
- 229920000139 polyethylene terephthalate Polymers 0.000 claims description 4
- 239000005020 polyethylene terephthalate Substances 0.000 claims description 4
- 229920000642 polymer Polymers 0.000 claims description 4
- 229920002451 polyvinyl alcohol Polymers 0.000 claims description 4
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 claims description 3
- 229920006289 polycarbonate film Polymers 0.000 claims description 3
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 claims description 2
- 239000004677 Nylon Substances 0.000 claims description 2
- 239000004695 Polyether sulfone Substances 0.000 claims description 2
- 229920002472 Starch Polymers 0.000 claims description 2
- 229910052782 aluminium Inorganic materials 0.000 claims description 2
- 229910052804 chromium Inorganic materials 0.000 claims description 2
- 239000002131 composite material Substances 0.000 claims description 2
- 229920001778 nylon Polymers 0.000 claims description 2
- 229920003023 plastic Polymers 0.000 claims description 2
- 239000002985 plastic film Substances 0.000 claims description 2
- 229920001230 polyarylate Polymers 0.000 claims description 2
- 229920006393 polyether sulfone Polymers 0.000 claims description 2
- 239000008107 starch Substances 0.000 claims description 2
- 235000019698 starch Nutrition 0.000 claims description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims 1
- 239000001913 cellulose Substances 0.000 claims 1
- 229920002678 cellulose Polymers 0.000 claims 1
- 239000011651 chromium Substances 0.000 claims 1
- 229910010272 inorganic material Inorganic materials 0.000 claims 1
- 239000011147 inorganic material Substances 0.000 claims 1
- 229920000058 polyacrylate Polymers 0.000 claims 1
- 239000002861 polymer material Substances 0.000 claims 1
- 235000012239 silicon dioxide Nutrition 0.000 claims 1
- 239000004408 titanium dioxide Substances 0.000 claims 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract description 19
- 229910052760 oxygen Inorganic materials 0.000 abstract description 19
- 239000001301 oxygen Substances 0.000 abstract description 19
- 238000007789 sealing Methods 0.000 abstract description 3
- 230000015556 catabolic process Effects 0.000 abstract description 2
- 238000006731 degradation reaction Methods 0.000 abstract description 2
- 230000005855 radiation Effects 0.000 abstract 1
- 239000000463 material Substances 0.000 description 9
- 230000001681 protective effect Effects 0.000 description 8
- 229910004298 SiO 2 Inorganic materials 0.000 description 7
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 7
- 230000004888 barrier function Effects 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Chemical compound [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 description 5
- BRPQOXSCLDDYGP-UHFFFAOYSA-N calcium oxide Chemical compound [O-2].[Ca+2] BRPQOXSCLDDYGP-UHFFFAOYSA-N 0.000 description 5
- 239000000292 calcium oxide Substances 0.000 description 5
- 230000035515 penetration Effects 0.000 description 5
- 239000005871 repellent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 4
- 230000006866 deterioration Effects 0.000 description 4
- DCZNSJVFOQPSRV-UHFFFAOYSA-N n,n-diphenyl-4-[4-(n-phenylanilino)phenyl]aniline Chemical compound C1=CC=CC=C1N(C=1C=CC(=CC=1)C=1C=CC(=CC=1)N(C=1C=CC=CC=1)C=1C=CC=CC=1)C1=CC=CC=C1 DCZNSJVFOQPSRV-UHFFFAOYSA-N 0.000 description 4
- 229910019015 Mg-Ag Inorganic materials 0.000 description 3
- NRCMAYZCPIVABH-UHFFFAOYSA-N Quinacridone Chemical class N1C2=CC=CC=C2C(=O)C2=C1C=C1C(=O)C3=CC=CC=C3NC1=C2 NRCMAYZCPIVABH-UHFFFAOYSA-N 0.000 description 3
- 239000011575 calcium Substances 0.000 description 3
- 229920006332 epoxy adhesive Polymers 0.000 description 3
- 239000003822 epoxy resin Substances 0.000 description 3
- 230000005525 hole transport Effects 0.000 description 3
- 239000004973 liquid crystal related substance Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 229920000647 polyepoxide Polymers 0.000 description 3
- 238000007650 screen-printing Methods 0.000 description 3
- 238000001771 vacuum deposition Methods 0.000 description 3
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910052791 calcium Inorganic materials 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005401 electroluminescence Methods 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 2
- 150000002894 organic compounds Chemical class 0.000 description 2
- 239000012044 organic layer Substances 0.000 description 2
- 229920006254 polymer film Polymers 0.000 description 2
- 239000002952 polymeric resin Substances 0.000 description 2
- 239000000565 sealant Substances 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229920003002 synthetic resin Polymers 0.000 description 2
- TVIVIEFSHFOWTE-UHFFFAOYSA-K tri(quinolin-8-yloxy)alumane Chemical compound [Al+3].C1=CN=C2C([O-])=CC=CC2=C1.C1=CN=C2C([O-])=CC=CC2=C1.C1=CN=C2C([O-])=CC=CC2=C1 TVIVIEFSHFOWTE-UHFFFAOYSA-K 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000005909 Kieselgur Substances 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 229910003023 Mg-Al Inorganic materials 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 229910021536 Zeolite Inorganic materials 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000000440 bentonite Substances 0.000 description 1
- 229910000278 bentonite Inorganic materials 0.000 description 1
- SVPXDRXYRYOSEX-UHFFFAOYSA-N bentoquatam Chemical compound O.O=[Si]=O.O=[Al]O[Al]=O SVPXDRXYRYOSEX-UHFFFAOYSA-N 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- GUJOJGAPFQRJSV-UHFFFAOYSA-N dialuminum;dioxosilane;oxygen(2-);hydrate Chemical compound O.[O-2].[O-2].[O-2].[Al+3].[Al+3].O=[Si]=O.O=[Si]=O.O=[Si]=O.O=[Si]=O GUJOJGAPFQRJSV-UHFFFAOYSA-N 0.000 description 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 230000008595 infiltration Effects 0.000 description 1
- 238000001764 infiltration Methods 0.000 description 1
- 230000009545 invasion Effects 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 230000033001 locomotion Effects 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000002808 molecular sieve Substances 0.000 description 1
- 229910052901 montmorillonite Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 1
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 150000003967 siloles Chemical class 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000009751 slip forming Methods 0.000 description 1
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 230000008719 thickening Effects 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
Landscapes
- Electroluminescent Light Sources (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、電子手帳、携帯電
話等の携帯情報機器の表示部分に用いられる表示装置の
うち有機EL素子を用いた表示装置で、特にその有機E
L素子の耐湿性や耐酸素性に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a display device using an organic EL element among display devices used for a display portion of a portable information device such as an electronic organizer and a mobile phone.
It relates to the moisture resistance and oxygen resistance of the L element.
【0002】[0002]
【従来の技術】近年、有機化合物を用いて電界発光によ
り表示させる自発光型の表示素子が活発に検討されてい
る。いわゆる有機エレクトロルミネセンス(以後有機E
Lと呼ぶ)であり、これは液晶を用いた液晶表示装置と
は異なり、いくつかの利点を有している。一つは自発光
であるためバックライト無しでデイスプレイを実現でき
ること。また、極めて構造が簡単なため薄く、小型・軽
量の表示装置が可能であること。さらに、表示に使用さ
れる消費電力が小さく、バッテリーを用いて表示をする
携帯電話などの小型情報機器の表示装置に適しているこ
となどがあげられる。2. Description of the Related Art In recent years, self-luminous display elements for displaying an image by electroluminescence using an organic compound have been actively studied. So-called organic electroluminescence (hereinafter referred to as organic E)
L), which has several advantages, unlike liquid crystal display devices using liquid crystals. One is that it can emit light without a backlight because it emits light. In addition, since the structure is extremely simple, a thin, compact and lightweight display device can be provided. Further, the power consumption used for display is small, and it is suitable for a display device of a small information device such as a mobile phone which performs display using a battery.
【0003】従来の有機EL素子の概略構成を表す断面
図を図8に示す。透明ガラス基板1aに設けられた透明
電極2の上には有機EL層3が設けられている。さら
に、有機EL層3の上には金属電極4が設けられてい
る。通常、透明電極2にはITOと呼ばれるインジウム
とスズの酸化物が用いられ、陽極として正孔の供給源と
なる。金属電極4にはマグネシウムと銀などの合金が用
いられ、陰極として電子の供給源となる。有機EL層3
の発光は、これらの正孔と電子とが有機EL層3に注入
され再結合したときに生じる。一般にこの反応が生じや
すいように、有機層3と透明電極2(陽極)の間には正
孔輸送層が、有機層3と金属電極4(陰極)の間には電
子輸送層がそれぞれ有機EL層3の一部として設けられ
ている。FIG. 8 is a sectional view showing a schematic structure of a conventional organic EL device. An organic EL layer 3 is provided on the transparent electrode 2 provided on the transparent glass substrate 1a. Further, a metal electrode 4 is provided on the organic EL layer 3. Normally, an oxide of indium and tin called ITO is used for the transparent electrode 2 and serves as a source of holes as an anode. An alloy such as magnesium and silver is used for the metal electrode 4 and serves as a source of electrons as a cathode. Organic EL layer 3
Is generated when these holes and electrons are injected into the organic EL layer 3 and recombined. In general, a hole transport layer is provided between the organic layer 3 and the transparent electrode 2 (anode) and an electron transport layer is provided between the organic layer 3 and the metal electrode 4 (cathode) so that this reaction easily occurs. It is provided as a part of the layer 3.
【0004】また、この有機EL層3は水分や酸素に極
めて敏感に反応し劣化するために、吸水性を有する吸湿
層5が対向基板である透明ガラス基板1bの内面に設け
られる。この吸湿層5には、酸化バリウムBaOやカル
シウム金属Ca、酸化カルシウムCaOなどアルカリ土
類金属とその酸化物等が用いられる。さらに、封止剤6
によって周囲が完全に封止される。有機EL層3は通
常、ガラス転移点が100℃以下のものが多く、熱に弱
いのでこの封止剤6は紫外線硬化型樹脂が用いられてい
る。Further, since the organic EL layer 3 reacts extremely sensitively to moisture and oxygen and deteriorates, a moisture absorbing layer 5 having a water absorbing property is provided on the inner surface of the transparent glass substrate 1b as an opposite substrate. For the moisture absorbing layer 5, an alkaline earth metal such as barium oxide BaO, calcium metal Ca, and calcium oxide CaO, and an oxide thereof are used. Furthermore, the sealing agent 6
Completely seals the surroundings. The organic EL layer 3 usually has a glass transition point of 100 ° C. or lower in many cases, and is weak to heat. Therefore, an ultraviolet curable resin is used as the sealant 6.
【0005】また、特開平5−101884号公報に
は、有機EL層の吸湿防止のために、有機EL層が形成
された基板を、透湿性の小さいフィルムと吸水性ポリマ
ーとの積層体である防湿性高分子フィルムで被覆する封
止構造も提案されている。この防湿性高分子フィルムの
構成要素である吸水性ポリマーは、もう一方の構成要素
である透湿性の小さいフィルムを通過して有機EL素子
内にわずかに浸入した水分をトラップして有機EL層3
にまでの水分の到達を防止する役割を有するという提案
である。[0005] Japanese Patent Application Laid-Open No. 5-101883 discloses that a substrate on which an organic EL layer is formed is a laminate of a small moisture-permeable film and a water-absorbing polymer in order to prevent the organic EL layer from absorbing moisture. A sealing structure for covering with a moisture-proof polymer film has also been proposed. The water-absorbing polymer, which is a component of the moisture-proof polymer film, passes through the other component, which is a small moisture-permeable film, and traps a small amount of water that has entered the organic EL element, thereby forming an organic EL layer 3.
It is a proposal to have a role of preventing the arrival of moisture up to.
【0006】[0006]
【発明が解決しようとする課題】このように有機EL素
子は、水分や酸素の浸入防止対策には特別な注意、検討
がされてきた。それは一般に、発光層として有機EL層
3に用いられている有機化合物であるキナクリドン誘導
体やトリフェニルジアミンなどの有機EL物質は極めて
水分や酸素と反応し易く、いわゆるダークスポットとい
う表示不良を発生・成長させるために、有機EL素子の
寿命を短縮させるという問題があった。As described above, in the organic EL element, special attention and study have been made on measures for preventing intrusion of moisture and oxygen. In general, organic EL materials such as quinacridone derivatives and triphenyldiamine, which are organic compounds used in the organic EL layer 3 as a light emitting layer, are extremely easy to react with moisture and oxygen, and display defects such as so-called dark spots occur and grow. Therefore, there is a problem that the life of the organic EL element is shortened.
【0007】これらの課題に対して、上述したようにさ
まざまな工夫や考案がなされてきたが、いずれの場合に
も構造が複雑であるか経済的な負担が大きいかなどの問
題が残されていた。一般に、有機EL素子の劣化原因
は、有機材料自体の問題と環境からの水分や酸素の有機
EL素子への浸入、または製造プロセスなどに関わる問
題などが考えられる。有機材料自体の問題は、透明電極
2と有機EL層3の界面や有機EL層3と金属電極層4
との界面など各界面での密着性やコンタクトの均一性
が、熱的刺激や電気的刺激等により薄膜有機材料自体が
劣化していくという問題がある。これらは近年、有機材
料や製造方法の改善により急速な進歩を遂げている。As described above, various ideas and devices have been devised to solve these problems. However, in each case, problems such as a complicated structure and a heavy economic burden remain. Was. Generally, the cause of deterioration of the organic EL element is considered to be a problem of the organic material itself, a problem of infiltration of moisture or oxygen from the environment into the organic EL element, a problem relating to a manufacturing process, and the like. The problem of the organic material itself is that the interface between the transparent electrode 2 and the organic EL layer 3 and the organic EL layer 3 and the metal electrode layer 4
There is a problem in that the thin film organic material itself deteriorates due to thermal stimulus, electrical stimulus, or the like, in terms of the adhesion and the uniformity of contact at each interface such as the interface with the interface. These have made rapid progress in recent years due to improvements in organic materials and manufacturing methods.
【0008】本発明では、有機EL素子の寿命に前者に
比べてより大きな影響を与える後者の環境から水分や酸
素の影響を極力排除し、有機EL素子劣化を防止するた
めの構造を提案する。The present invention proposes a structure for minimizing the influence of moisture and oxygen from the latter environment, which has a greater effect on the life of the organic EL device than the former, and preventing the deterioration of the organic EL device.
【0009】[0009]
【課題を解決するための手段】そこで、本発明は、透明
性のプラステイックフィルムをベースフィルムにし、そ
の表面に吸湿剤を含んだ親水性層を設け、さらにその表
面に防湿コート層を設けた複合フィルムを基板として、
その上に透明電極、有機EL発光層、金属電極および保
護層を順次設けた単純な構造により上記問題点の解決が
可能であることを見いだしたものである。SUMMARY OF THE INVENTION Accordingly, the present invention provides a composite film comprising a transparent plastic film as a base film, a hydrophilic layer containing a moisture absorbent on the surface thereof, and a moisture-proof coating layer on the surface. Using the film as a substrate,
It has been found that the above problem can be solved by a simple structure in which a transparent electrode, an organic EL light emitting layer, a metal electrode and a protective layer are sequentially provided thereon.
【0010】すなわち、一方の表面に透明電極が形成さ
れた透明基板と、透明電極の上に形成された有機EL層
と、有機EL層の上に形成された金属電極と、透明電極
の一部と有機EL層と金属電極を被覆する保護層と、透
明基板の他方の表面に設けられた吸湿剤を含んだ親水性
層と、防湿コート層とを備えることとした。また、紫外
線硬化型樹脂で保護層を形成した。That is, a transparent substrate having a transparent electrode formed on one surface, an organic EL layer formed on the transparent electrode, a metal electrode formed on the organic EL layer, and a part of the transparent electrode And a protective layer covering the organic EL layer and the metal electrode, a hydrophilic layer containing a moisture absorbent provided on the other surface of the transparent substrate, and a moisture-proof coating layer. Further, a protective layer was formed of an ultraviolet curable resin.
【0011】また、保護層を多層の絶縁膜で構成した。
また、保護層を、透明電極の一部と有機EL層と金属電
極を被覆する絶縁膜からなる第一の保護膜と、第一の保
護層の上に設けられた紫外線硬化型樹脂を含んだ第二の
保護層と、を備える構成とした。さらに、第一の保護層
と第二の保護層との間に金属薄膜を設ける構成とした。The protective layer is composed of a multilayer insulating film.
Further, the protective layer includes a first protective film formed of an insulating film covering a part of the transparent electrode, the organic EL layer, and the metal electrode, and an ultraviolet curable resin provided on the first protective layer. And a second protective layer. Further, a configuration is adopted in which a metal thin film is provided between the first protective layer and the second protective layer.
【0012】[0012]
【発明の実施の形態】以下、本発明の有機EL素子の実
施の形態を、図面に基づき詳細に説明する。図1は、本
発明の有機EL発光素子の実施形態を示す断面説明図で
ある。図1に示すように、透明フィルム基板1には透明
電極2と有機EL層3と金属電極4が形成されている。
そして、これらを覆うように保護層7が設けられてい
る。保護層はこちら側からの水分等の侵入を防いでい
る。さらに、透明フィルム基板1の他方の表面には親水
性層8と防湿コート層9が積層されている。この親水性
層8と防湿コート層9により、水分が透明フィルム基板
に侵入することを防いでいる。防湿コート層9を設ける
だけでもある程度は透明フィルム基板に水分が侵入する
ことを防ぐことができる。しかしながら、防湿コート層
だけでは接着界面から侵入する水分や防湿コート層に侵
入してしまった水分が透明フィルム基板に侵入すること
を防ぐことはできない。そこで、透明フィルム基板と防
湿コート層の間に親水性層を設ける構成とした。これに
より、親水性層が侵入した水分や酸素をトラップして、
透明フィルム基板に水分や酸素が侵入することを防ぐこ
とが可能になる。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, embodiments of the organic EL device of the present invention will be described in detail with reference to the drawings. FIG. 1 is an explanatory sectional view showing an embodiment of the organic EL light emitting device of the present invention. As shown in FIG. 1, on a transparent film substrate 1, a transparent electrode 2, an organic EL layer 3, and a metal electrode 4 are formed.
Then, a protective layer 7 is provided so as to cover these. The protective layer prevents moisture and the like from entering from this side. Further, on the other surface of the transparent film substrate 1, a hydrophilic layer 8 and a moisture-proof coating layer 9 are laminated. The hydrophilic layer 8 and the moisture-proof coat layer 9 prevent moisture from entering the transparent film substrate. Even providing the moisture-proof coating layer 9 can prevent moisture from entering the transparent film substrate to some extent. However, the moisture-proof coating layer alone cannot prevent the moisture that has entered the bonding interface or the moisture that has entered the moisture-proof coating layer from entering the transparent film substrate. Therefore, a configuration was adopted in which a hydrophilic layer was provided between the transparent film substrate and the moisture-proof coating layer. This traps moisture and oxygen that the hydrophilic layer has invaded,
It is possible to prevent moisture and oxygen from entering the transparent film substrate.
【0013】また、透明電極と透明フィルム基板の間に
も防湿コート層、あるいは、親水性層を設けることによ
り、透明フィルム基板側から有機EL層に水分等が侵入
する危険性を著しるしく減少できる。すなわち、透明フ
ィルム基板は一般的に吸水性が高く、そのため、基板の
厚み方向からも僅かながらも水分を吸収する。したがっ
て、裏側だけに防湿コート層や親水性層を設けても、基
板側面から侵入した水分等が有機EL層側へ到達するこ
とを防げない。そこで、前述のように、透明電極と透明
フィルム基板の間にも防湿コート層、あるいは、親水性
層を設ける構成とした。Further, by providing a moisture-proof coating layer or a hydrophilic layer also between the transparent electrode and the transparent film substrate, the danger of entry of moisture and the like into the organic EL layer from the transparent film substrate side is significantly reduced. it can. That is, the transparent film substrate generally has high water absorption, and therefore, absorbs a small amount of water even in the thickness direction of the substrate. Therefore, even if a moisture-proof coat layer or a hydrophilic layer is provided only on the back side, it is not possible to prevent moisture or the like that has entered from the side of the substrate from reaching the organic EL layer side. Therefore, as described above, a configuration is provided in which a moisture-proof coating layer or a hydrophilic layer is provided between the transparent electrode and the transparent film substrate.
【0014】さらに、透明電極と透明フィルム基板の間
に、裏側のフィルム基板表面と同様に、親水性層と防湿
コート層を共に備える構成にしてもよい。図2に、この
構成の有機EL素子の断面の概要を示す。このような構
成により、基板の側面や界面から侵入した水分等が親水
性層でトラップされ、更に、防湿コート層が親水性層と
有機EL層側の間の水分等の移動を防いでいることとな
り、有機EL素子の寿命、信頼性が高まる。Further, between the transparent electrode and the transparent film substrate, a hydrophilic layer and a moisture-proof coating layer may be provided in the same manner as on the back surface of the film substrate. FIG. 2 shows an outline of a cross section of the organic EL element having this configuration. With such a configuration, moisture or the like that has entered from the side surface or interface of the substrate is trapped by the hydrophilic layer, and the moisture-proof coating layer prevents movement of moisture or the like between the hydrophilic layer and the organic EL layer. And the life and reliability of the organic EL element are increased.
【0015】また、保護層7を多層膜で形成してもよ
い。保護層にピンホールやクラックがあると、そこから
水分等が侵入する危険がある。そのため、ピンホールや
クラックが生じ難い保護層を用いることが必要である。
そこで、保護層を厚くしたり、保護層を互いに密着性の
高い多層の薄膜で構成するとよい。保護層が多層膜で構
成されていれば、単層にピンホールやクラックが発生し
ても、他の層の薄膜によりバリア性が確保させることと
なり、信頼性に重大な影響を与えることを防ぐ事ができ
る。したがって、材質の異なる薄膜で形成された多層膜
だけではなく、同じ材質の薄膜が複数回成膜された多層
膜でも効果がある。Further, the protective layer 7 may be formed of a multilayer film. If there is a pinhole or a crack in the protective layer, there is a risk that moisture or the like may enter therethrough. Therefore, it is necessary to use a protective layer in which pinholes and cracks are unlikely to occur.
Therefore, it is preferable to increase the thickness of the protective layer or to configure the protective layer by a multilayer thin film having high adhesion to each other. If the protective layer is composed of a multilayer film, even if pinholes or cracks occur in a single layer, the thin film of the other layer will secure the barrier property and prevent a serious influence on reliability. Can do things. Therefore, not only a multilayer film formed of thin films of different materials but also a multilayer film formed of a thin film of the same material a plurality of times is effective.
【0016】(実施例1)本実施例の有機EL発光素子
を図1を用いて説明する。100μmの厚さのポリカー
ボネイトフィルムを用いた透明フィルム基板1の外側
に、親水性層8と防湿コート層9とが積層され、透明フ
ィルム基板1の内側には透明電極2が設けられている。
透明フィルム基板のベースフィルとしては、ポリカーボ
ネイトフィルムの他に、ポリエチレンテレフタレートフ
ィルム、ポリエーテルサルフォンフィルム、ポリアリレ
ートフィルム等、透明性のあるフィルムが使用できる。(Example 1) An organic EL device of this example will be described with reference to FIG. A hydrophilic layer 8 and a moisture-proof coating layer 9 are laminated on the outside of a transparent film substrate 1 using a polycarbonate film having a thickness of 100 μm, and a transparent electrode 2 is provided inside the transparent film substrate 1.
As the base film of the transparent film substrate, a transparent film such as a polyethylene terephthalate film, a polyether sulfone film, a polyarylate film, etc. can be used in addition to the polycarbonate film.
【0017】親水性層8の構成を表す断面図を図3に示
す。親水性層は、予め吸湿剤10を親水性物質の溶液中
に分散させておき、浸せき法、スピンコート法、スクリ
ーン印刷法などによりフィルム上にコートすることによ
り形成できる。この親水性層8は、浸入した水分や酸素
をトラップする役割を有し、1μm程度から数mm程度の
厚さまでが使用可能である。FIG. 3 is a sectional view showing the structure of the hydrophilic layer 8. The hydrophilic layer can be formed by dispersing the hygroscopic agent 10 in a solution of a hydrophilic substance in advance and coating the film on the film by a dipping method, a spin coating method, a screen printing method, or the like. The hydrophilic layer 8 has a role of trapping infiltrated moisture and oxygen, and can be used in a thickness of about 1 μm to several mm.
【0018】吸湿剤には、シリカゲル、活性炭、モレキ
ュラシーブ、ゼオライト、活性アルミナ、酸化カルシウ
ム、酸化バリウム、カルシウム金属、リチウム金属、け
い藻土、モンモリロナイト、ベントナイト等が利用で
き、吸湿性があれば有機物、無機物は問わない。また、
親水性物質は、ポリビニルアルコール、セルロース系、
ナイロン、デンプン、アクリル酸系等の化合物から少な
くとも1種類を選択すればよく、これにより親水性層が
形成される。As the moisture absorbent, silica gel, activated carbon, molecular sieve, zeolite, activated alumina, calcium oxide, barium oxide, calcium metal, lithium metal, diatomaceous earth, montmorillonite, bentonite and the like can be used. Inorganic matter does not matter. Also,
Hydrophilic substance, polyvinyl alcohol, cellulosic,
At least one compound may be selected from compounds such as nylon, starch, and acrylic acid, thereby forming a hydrophilic layer.
【0019】さらに、親水性層8の表面に、予め紫外線
硬化型樹脂に撥水性シリカを分散させた溶液を、スピナ
ー法、浸せき法またはスクリーン印刷法等でコートする
ことにより、防湿コート層9が形成される。ここで、紫
外線硬化型樹脂には、エポキシ系、アクリル系、ウレタ
ン系などの高分子樹脂を用いることができる。これらの
内、特に、吸湿性の小さなエポキシ系樹脂が好ましい。Further, the surface of the hydrophilic layer 8 is coated with a solution in which water-repellent silica is dispersed in an ultraviolet curable resin in advance by a spinner method, a dipping method, a screen printing method, or the like, so that the moisture-proof coating layer 9 is formed. It is formed. Here, as the ultraviolet curable resin, a polymer resin such as an epoxy resin, an acrylic resin, or a urethane resin can be used. Of these, epoxy resins having low hygroscopicity are particularly preferred.
【0020】また、撥水性を強化するために撥水性シリ
カを紫外線硬化型樹脂に対して1重量%から20重量%
程度混入させている。この撥水性シリカは、平均粒径3
μmから8μm程度で多量の細孔を有しており、比表面
積は700m2 /gにも達するものを使用した(旭硝子
製サンスフェアH−53など)。また、エポキシ系の紫
外線硬化型樹脂は、低応力タイプであり、365nmの
紫外線を3500mj/cm2 程度で硬化可能である
(スリーボンド製3027Cなど)。この防湿コート層
9の厚みは、3μm程度から数mm程度まで使用可能で
あり、防湿性を高めるためには厚いほうが好ましいが、
作業性や紫外線硬化性などを考慮すると5μmから50
0μm程度が適している。Further, in order to enhance the water repellency, water-repellent silica is added in an amount of from 1% by weight to 20% by weight based on the ultraviolet curable resin.
To some extent. This water-repellent silica has an average particle size of 3
Those having a large number of pores of about 8 μm to about 8 μm and having a specific surface area of up to 700 m 2 / g (such as Sunsphere H-53 manufactured by Asahi Glass) were used. The epoxy-based UV-curable resin is a low-stress type and can cure UV light of 365 nm at about 3500 mj / cm 2 (for example, 3027C made by Three Bond). The thickness of the moisture-proof coating layer 9 can be used from about 3 μm to about several mm.
Considering workability and UV curability, 5 μm to 50
About 0 μm is suitable.
【0021】透明電極2は、スパッタリング法あるいは
電子線真空蒸着法により、表面抵抗20Ω/□のITO
(Indium−Tin−Oxide、スズをドープし
たインジウム酸化物)を形成した。一般に成膜方法によ
るITOの微小表面状態の差により薄膜の配向性に影響
を与えたり、還元されて薄膜中に金属Inが生成された
りすることがあり、有機EL層3との界面状態に影響を
与えるが、今回は両者の差はほとんどなく本発明ではス
パッタリング法により成膜した。The transparent electrode 2 is made of ITO having a surface resistance of 20 Ω / □ by sputtering or electron beam vacuum evaporation.
(Indium-Tin-Oxide, indium oxide doped with tin). In general, the difference in the state of the minute surface of ITO depending on the film forming method may affect the orientation of the thin film, or reduce the metal In in the thin film, thereby affecting the interface state with the organic EL layer 3. This time, there was almost no difference between the two, and in the present invention, the film was formed by the sputtering method.
【0022】図4に、透明フィルム基板1の一方の表面
に親水性層8、防湿コート層9を、他方の表面上に透明
電極2を設けた本実施例の透明フィルム基板の断面構成
を示す。本発明の有機EL素子においては、透明電極2
をフォトリソグラフィー法により所望のパターンに形成
した。この透明電極2に有機EL層3を形成する。有機
EL層3は、トリフェニルジアミンTPDやNPDなど
の正孔輸送材料と、アルミキノリノールAlq3 のホス
ト発光材料にキナクドリン(緑色)、ペリレン(青色)
などゲストの色素をドープした有機発光層と、アルミキ
ノリノールAlq3 やシロール誘導体PySPyなどの
電子輸送材料の3層が積層された構造であり、これらの
層を真空蒸着法により連続成膜することで形成される。FIG. 4 shows a cross-sectional structure of the transparent film substrate of this embodiment in which the hydrophilic layer 8 and the moisture-proof coating layer 9 are provided on one surface of the transparent film substrate 1 and the transparent electrode 2 is provided on the other surface. . In the organic EL device of the present invention, the transparent electrode 2
Was formed into a desired pattern by a photolithography method. An organic EL layer 3 is formed on the transparent electrode 2. The organic EL layer 3 is made of a hole transporting material such as triphenyldiamine TPD or NPD, and a host luminescent material such as aluminum quinolinol Alq 3 as quinacdrine (green) and perylene (blue).
It has a structure in which an organic light-emitting layer doped with a guest dye and an electron transporting material such as aluminum quinolinol Alq 3 and a silole derivative PySPy are laminated, and these layers are continuously formed by a vacuum evaporation method. It is formed.
【0023】さらに、Mg−AgやMg−Alなどの合
金層を、有機EL層3に続けて連続的に真空蒸着するこ
とにより、金属電極が形成される。この真空蒸着の際に
ステンレス製のパターンマスクを用いることにより金属
電極4を所望のパターンに形成できる。その後、真空槽
内にて保護層7を、外部取り出し用の領域を除いたIT
O電極2、有機EL層3、金属電極4を覆い尽くすよう
に被覆した。この保護層7は防湿コート層9と同様に紫
外線硬化型の樹脂であり、エポキシ系、アクリル系、ウ
レタン系などの高分子樹脂はすべて使えるが、吸湿性の
小さなエポキシ系樹脂が好ましい。この保護層7は、有
機EL層3を環境からの水分や酸素からの浸入を防止す
るために、膜厚をある程度厚くする必要がある。このた
めに、保護層7のコート方法は、スクリーン印刷法、バ
ーコーター法、デイスペンス法など厚塗りに適したコー
テイング方法が適している。Further, a metal electrode is formed by continuously vacuum-depositing an alloy layer of Mg-Ag, Mg-Al or the like on the organic EL layer 3. The metal electrode 4 can be formed in a desired pattern by using a stainless steel pattern mask during the vacuum deposition. After that, the protective layer 7 was removed in a vacuum chamber using an IT
The O electrode 2, the organic EL layer 3, and the metal electrode 4 were covered so as to cover them. The protective layer 7 is a UV-curable resin like the moisture-proof coat layer 9, and all high-molecular resins such as epoxy, acrylic and urethane can be used, but epoxy resins having small hygroscopicity are preferable. The protective layer 7 needs to have a certain thickness in order to prevent the organic EL layer 3 from entering from moisture or oxygen from the environment. For this reason, as the coating method of the protective layer 7, a coating method suitable for thick coating such as a screen printing method, a bar coater method, and a dispense method is suitable.
【0024】上記の知見から、保護層7、親水性層8、
防湿コート層9の厚みをそれぞれ最適に設定することに
より、水分や酸素の侵入が防げるために、寿命が延び、
信頼性が向上することとなる。以下の表1〜表3に、保
護層7、親水性層8、防湿コート層9の厚みの組み合わ
せによる輝度半減期の変化を示す。表1は、親水性層8
を100μm、保護層7を200μmに固定して防湿コ
ート層9の膜厚を変化させたときの、主に透明フィルム
基板1側からの水分や酸素の浸入を評価した第一の検討
結果であり、表2は、防湿コート層9を10μm、保護
層7を200μmに固定して親水性層8の膜厚を変化さ
せたときの、主に透明フィルム基板1側からの水分や酸
素の浸入を評価した第二の検討結果であり、表3は、親
水性層8を100μm、防湿コート層9を10μmに固
定して保護層7の膜厚を変化させたときの、主に保護層
7側からの水分や酸素の浸入を評価する第三の検討結果
である。From the above findings, the protective layer 7, the hydrophilic layer 8,
By optimally setting the thickness of the moisture-proof coating layer 9, the penetration of moisture and oxygen can be prevented, so that the life is extended,
Reliability will be improved. Tables 1 to 3 below show changes in the luminance half-life depending on the combination of the thicknesses of the protective layer 7, the hydrophilic layer 8, and the moisture-proof coating layer 9. Table 1 shows the hydrophilic layer 8
Is a first study result in which the penetration of moisture and oxygen from the transparent film substrate 1 side was mainly evaluated when the thickness of the moisture-proof coating layer 9 was changed while fixing the protective layer 7 to 100 μm and the protective layer 7 to 200 μm. Table 2 shows that when the moisture-proof coating layer 9 was fixed at 10 μm and the protective layer 7 was fixed at 200 μm and the thickness of the hydrophilic layer 8 was changed, the penetration of moisture and oxygen mainly from the transparent film substrate 1 side was prevented. Table 3 shows the results of the second evaluation, which were mainly performed on the protective layer 7 side when the hydrophilic layer 8 was fixed at 100 μm and the moisture-proof coating layer 9 was fixed at 10 μm to change the thickness of the protective layer 7. It is the third examination result which evaluates the invasion of moisture and oxygen from water.
【0025】[0025]
【表1】 [Table 1]
【0026】[0026]
【表2】 [Table 2]
【0027】[0027]
【表3】 [Table 3]
【0028】ここで、透明フィルム基板1の親水性層8
は、酸化カルシウム吸湿剤10をポリビニルアルコール
溶液に固形分重量比で10%分散混合したものを用い
た。防湿コート層9は、紫外線硬化型のエポキシ系接着
剤(スリーボンド製3027)に撥水性シリカ(旭硝子
製サンスフェアH−53)を重量比で3%分散混合させ
たものを用いた。有機EL層3は、正孔輸送層にトリフ
ェニルジアミンTPD、ホスト発光材料にアルミキノリ
ノールAlq3、ゲスト色素にキナクリドン(緑色)電
子輸送層にアルミキノリノールAlq3を用いた。金属
電極層4はMg−Agを用いた。Here, the hydrophilic layer 8 of the transparent film substrate 1
Used was a dispersion prepared by dispersing and mixing a calcium oxide hygroscopic agent 10% in a polyvinyl alcohol solution at a solid content weight ratio of 10%. The moisture-proof coating layer 9 was prepared by dispersing and mixing 3% by weight of water-repellent silica (Sunsphere H-53 manufactured by Asahi Glass) in an ultraviolet-curable epoxy adhesive (3027 manufactured by Three Bond). The organic EL layer 3 used triphenyldiamine TPD for the hole transport layer, aluminum quinolinol Alq3 for the host light emitting material, and quinacridone (green) for the guest dye. The metal electrode layer 4 used Mg-Ag.
【0029】防湿性の試験条件は、有機EL素子を駆動
させて40℃、90%RHの恒温高湿環境下で行った。
透明電極2を陽極、金属電極4を陰極にして直流電圧5
V印可して約3mA/cm2 の電流で輝度評価した。輝
度測定は、透明フィルム基板側からの発光をミノルタ製
輝度計BM−7を用いて70cmの距離で行った。初期
の輝度100cd/cm2 あったが、50cd/cm2
まで輝度減少する半減時間により評価を行った。The test conditions of the moisture-proof property were performed in a constant temperature and high humidity environment of 40 ° C. and 90% RH by driving the organic EL element.
DC voltage 5 with transparent electrode 2 as anode and metal electrode 4 as cathode
V was applied and the luminance was evaluated at a current of about 3 mA / cm 2 . The luminance was measured at a distance of 70 cm from the transparent film substrate using a luminance meter BM-7 manufactured by Minolta. Although the initial luminance was 100 cd / cm 2, it was 50 cd / cm 2.
The evaluation was performed based on the half-life time until the luminance decreased.
【0030】この結果から、前提条件を40℃、90%
RH環境の寿命劣化の加速性を考慮して半減時間約50
0時間以上を実使用上の合格レベルとすると以上のこと
がわかった。 親水性層8を100μm、保護層7を200μmに
固定した防湿コート層9の膜厚は、5μm以上あること
が好ましい。From these results, it was assumed that the precondition was 40 ° C., 90%
Approximately 50 hours in half in consideration of the acceleration of life degradation of RH environment
The above was found when the pass level in practical use was set to 0 hours or more. The film thickness of the moisture-proof coating layer 9 in which the hydrophilic layer 8 is fixed at 100 μm and the protective layer 7 is fixed at 200 μm is preferably 5 μm or more.
【0031】 防湿コート層9を10μm、保護層7
を200μmに固定した親水性層8の膜厚は、3μm以
上あることが好ましい。 親水性層8を100μm、防湿コート層9を10μ
mに固定した場合、保護層7の膜厚は20μm以上が好
ましい。 以上をまとめると、防湿コート層9の膜厚は5μm以
上、親水性層8の膜厚は3μm以上、保護層7の膜厚は
20μm以上あることが好ましいという結果であるが、
親水性層8と防湿コート層9は相互に補完する性質のあ
るものであり、この数値には限定されるものではない。The moisture-proof coating layer 9 is 10 μm, and the protective layer 7
Is fixed to 200 μm, the thickness of the hydrophilic layer 8 is preferably 3 μm or more. 100 μm for the hydrophilic layer 8 and 10 μm for the moisture-proof coating layer 9
When fixed to m, the thickness of the protective layer 7 is preferably 20 μm or more. To summarize the above, it is preferable that the thickness of the moisture-proof coating layer 9 is 5 μm or more, the thickness of the hydrophilic layer 8 is 3 μm or more, and the thickness of the protective layer 7 is 20 μm or more.
The hydrophilic layer 8 and the moisture-proof coat layer 9 have properties complementary to each other, and are not limited to these values.
【0032】(実施例2)本実施例による有機EL素子
の構成を図5に示す。本実施例では、保護層が2種類の
保護層で構成されていることに上述の図1に基づく実施
例1と相違している。本実施例では、有機EL層を覆う
第一の保護層としてSiO2 を設け、その上に第二の保
護層として紫外線硬化型樹脂を設けている。実施例1で
も述べたように、保護層が厚いほど水分等の侵入が防止
できる。しかしながら、SiO2 等の金属酸化膜は紫外
線硬化型樹脂よりも水分や酸素に対してバリア性が高い
ものの厚膜化が困難であるため、SiO2 の単層だけで
は有機EL素子としての実現化が困難である。そこで、
まず、有機EL層3や金属電極4を覆うように薄膜のS
iO2 等の絶縁膜(第一の保護層)を形成し、次に、S
iO2 層の上に厚膜化の容易な樹脂(第二の保護層)を
設けることにより信頼性の高い有機EL素子を実現でき
る。Example 2 FIG. 5 shows the structure of an organic EL device according to this example. This embodiment is different from the first embodiment based on FIG. 1 described above in that the protective layer is composed of two types of protective layers. In this embodiment, SiO 2 is provided as a first protective layer covering the organic EL layer, and an ultraviolet curable resin is provided thereon as a second protective layer. As described in the first embodiment, the thicker the protective layer, the more the penetration of moisture and the like can be prevented. However, since the metal oxide film such as SiO 2 is difficult to thickening of having a high barrier property against moisture and oxygen than the UV-curable resin, only a single layer of SiO 2 realization of the organic EL device Is difficult. Therefore,
First, a thin film S is formed so as to cover the organic EL layer 3 and the metal electrode 4.
An insulating film (first protective layer) such as iO 2 is formed.
By providing a resin (second protective layer) that can be easily thickened on the iO 2 layer, a highly reliable organic EL element can be realized.
【0033】このように、第一の保護層として重要な特
性は、金属電極4上に形成できるように絶縁性を備える
こと、および、薄膜状態で十分なバリア性を有するこ
と、であり、第二の保護層として重要な特性は水分や酸
素に対してバリア性を有するとともに厚膜化が容易なこ
とである。したがって、第一の保護層にはSiO2 、T
iO2 等の金属酸化物が適しており、第二の保護層に
は、エポキシ系、アクリル系、ウレタン系等の高分子樹
脂が適している。さらに、生産性を考慮すると紫外線硬
化型の樹脂が最適である。As described above, important characteristics of the first protective layer are to have an insulating property so that it can be formed on the metal electrode 4 and to have a sufficient barrier property in a thin film state. The important properties of the second protective layer are that it has a barrier property against moisture and oxygen and that it is easy to form a thick film. Therefore, the first protective layer includes SiO 2 , T
A metal oxide such as iO 2 is suitable, and a polymer resin such as an epoxy-based, acrylic-based, or urethane-based resin is suitable for the second protective layer. Further, in consideration of productivity, an ultraviolet curable resin is optimal.
【0034】さらに、第一の保護層と第二の保護層の間
に金属薄膜を設けることにより、水分等の侵入が防げ、
有機EL素子の信頼性を向上させることができる。金属
薄膜も前述の金属酸化膜と同様に、水分や酸素に対して
バリア性が高い。しかしながら、導電性があるため、金
属電極4を直接覆うように設けることができない。その
ため、有機EL層と金属電極を直接覆うように絶縁薄膜
を設け、この絶縁薄膜上に金属薄膜を設ければよい。更
にこの金属薄膜上に第二の保護層を設ける構成により、
信頼性を保ったまま保護層の総厚を薄くする事ができ
る。この時、絶縁薄膜として前述のSiO2 、TiO2
等の金属酸化物を用いるとさらに効果がある。また、金
属薄膜には、Al、Cr等の金属の他にも安定的な金属
を用いることができる。金属薄膜を多層にしてさらにバ
リア性を向上させることもできる。Further, by providing a metal thin film between the first protective layer and the second protective layer, penetration of moisture and the like can be prevented,
The reliability of the organic EL element can be improved. The metal thin film has a high barrier property against moisture and oxygen, similarly to the above-described metal oxide film. However, since it is conductive, it cannot be provided so as to directly cover the metal electrode 4. Therefore, an insulating thin film may be provided so as to directly cover the organic EL layer and the metal electrode, and the metal thin film may be provided on the insulating thin film. Further, by providing a second protective layer on the metal thin film,
The total thickness of the protective layer can be reduced while maintaining reliability. At this time, the above-mentioned SiO 2 , TiO 2
Use of a metal oxide such as that described above has a further effect. In addition, a stable metal other than metals such as Al and Cr can be used for the metal thin film. The barrier properties can be further improved by using a multilayered metal thin film.
【0035】(実施例3)本実施例による有機EL素子
の構成を図6に示す。ここで用いた透明フィルム基板の
構成を図7に示す。75μmのポリエチレンテレフタレ
ート(PET)フィルムの両面に、実施例1と同様に親
水性層8と防湿コート層9が設けられ、一方の防湿コー
ト層上に透明電極2(ITO)が設けられた透明基板を
用いた。この透明基板の片側に設けられた透明電極2を
パターニングして本発明の有機EL素子の陽極とした。Example 3 FIG. 6 shows the structure of an organic EL device according to this example. FIG. 7 shows the configuration of the transparent film substrate used here. A transparent substrate in which a hydrophilic layer 8 and a moisture-proof coating layer 9 are provided on both sides of a 75 μm polyethylene terephthalate (PET) film as in Example 1, and a transparent electrode 2 (ITO) is provided on one of the moisture-proof coating layers Was used. The transparent electrode 2 provided on one side of this transparent substrate was patterned to form an anode of the organic EL device of the present invention.
【0036】実施例1と同様に、本実施例の親水性層8
には酸化カルシウム吸湿剤10をポリビニルアルコール
溶液に固形分重量比で10%分散混合したものを用い
た。また、防湿コート層9には紫外線硬化型のエポキシ
系接着剤(スリーボンド製3027)に撥水性シリカ
(旭硝子製サンスフェアH−53)を重量比で3%分散
混合させたものを用いた。有機EL層3には、正孔輸送
層にトリフェニルジアミンTPD、ホスト発光材料にア
ルミキノリノールAlq3、ゲスト色素にキナクリドン
(緑色)電子輸送層にAlq3を用いた。金属電極4に
はMg−Agを用いた。In the same manner as in Example 1, the hydrophilic layer 8
A mixture prepared by dispersing and mixing a calcium oxide hygroscopic agent 10% in a polyvinyl alcohol solution at a solid content weight ratio of 10% was used. The moisture-proof coating layer 9 was prepared by dispersing and mixing 3% by weight of water-repellent silica (Sunsphere H-53 manufactured by Asahi Glass) with an ultraviolet-curable epoxy adhesive (3027 manufactured by Three Bond). As the organic EL layer 3, triphenyldiamine TPD was used for the hole transport layer, aluminum quinolinol Alq3 was used for the host luminescent material, and quinacridone (green) was used for the electron transport layer for the guest dye. Mg-Ag was used for the metal electrode 4.
【0037】その後、外部電極となる部位の透明電極2
を除いて、第一の保護膜17として0.2μmの膜厚の
SiO2 と2.0μmのAlを真空蒸着により金属電極
4の形成後に連続的に成膜して設けた。この後、真空槽
内より取りだし、第二の保護膜27として実施例1と同
様に紫外線硬化型エポキシ接着剤を設けた。この第二の
保護膜の膜厚を変化させて、本発明の有機EL素子の劣
化を実施例1と同様に評価した結果を表4に示した。After that, the transparent electrode 2 at a portion to be an external electrode
Except for the above, a first protective film 17 was formed by continuously depositing SiO 2 having a thickness of 0.2 μm and Al having a thickness of 2.0 μm after forming the metal electrode 4 by vacuum deposition. Thereafter, it was taken out from the vacuum chamber, and an ultraviolet-curable epoxy adhesive was provided as the second protective film 27 in the same manner as in Example 1. Table 4 shows the results of evaluating the deterioration of the organic EL device of the present invention in the same manner as in Example 1 by changing the thickness of the second protective film.
【0038】[0038]
【表4】 [Table 4]
【0039】この結果、以上のことが確認できた。 第一の保護膜としてSiO2 とAlを設けることに
よって、本発明の有機EL素子の寿命が実使用上の合格
レベルになる第二の保護膜の膜厚は5μm以上であり、
実施例1に比べて薄膜化できることがわかった。 第一の保護膜を設けることで、真空槽内より外部に
出して第二の保護膜が形成できるので、作業性が改善で
きる。As a result, the above was confirmed. By providing SiO 2 and Al as the first protective film, the thickness of the second protective film, at which the life of the organic EL device of the present invention becomes an acceptable level for practical use, is 5 μm or more,
It was found that the film could be made thinner than in Example 1. By providing the first protective film, it is possible to form the second protective film out of the vacuum chamber to the outside, so that workability can be improved.
【0040】[0040]
【発明の効果】以上述べてきたように、本発明によれば
単純な構造でかつ一般的な材料の組み合わせにより、有
機EL素子の問題であった水分や酸素の素子への浸入に
よる有機EL発光層の劣化とこれによる有機EL素子の
寿命短縮が大幅に改善される。このことは、有機EL素
子がデイスプレイとして用いられる電子手帳や携帯電話
等の携帯情報機器用表示装置に要求される表示寿命を十
分満足し、工業的に貢献できる発明である。As described above, according to the present invention, with a simple structure and a combination of general materials, organic EL light emission due to intrusion of moisture and oxygen into the element, which has been a problem of the organic EL element, is achieved. Deterioration of the layer and shortening of the life of the organic EL element due to this are greatly improved. This is an invention in which the organic EL element sufficiently satisfies the display life required for a display device for a portable information device such as an electronic organizer or a mobile phone used as a display, and can contribute industrially.
【0041】また、本発明の有機EL素子は極めて簡単
な構造であり、高額な設備投資を避けられると同時に、
製造工程数の少ないプロセスを可能にし低コストの有機
EL素子を実現することができる。また、本発明の有機
EL素子の構造は、デイスプレイへの適用だけでなく、
液晶表示装置のバックライトとしての応用も可能であ
る。Further, the organic EL device of the present invention has an extremely simple structure, so that expensive capital investment can be avoided.
A low-cost organic EL device can be realized by enabling a process with a small number of manufacturing steps. Further, the structure of the organic EL device of the present invention can be applied not only to a display but also to a display.
Application as a backlight of a liquid crystal display device is also possible.
【図1】本発明の有機EL素子の構成を表す断面図であ
る。FIG. 1 is a cross-sectional view illustrating a configuration of an organic EL device of the present invention.
【図2】本発明の有機EL素子の他の実施例の構成を表
す断面図である。FIG. 2 is a cross-sectional view illustrating a configuration of another embodiment of the organic EL device of the present invention.
【図3】本発明の親水性層の概要を表す断面図である。FIG. 3 is a cross-sectional view illustrating an outline of a hydrophilic layer of the present invention.
【図4】本発明の一実施例に用いる透明フィルム基板の
構成を表す断面図である。FIG. 4 is a cross-sectional view illustrating a configuration of a transparent film substrate used in one embodiment of the present invention.
【図5】本発明の有機EL素子の他の実施例の構成を表
す断面図である。FIG. 5 is a cross-sectional view illustrating a configuration of another embodiment of the organic EL device of the present invention.
【図6】本発明の実施例による有機EL素子の概要を表
す断面図である。FIG. 6 is a cross-sectional view illustrating an outline of an organic EL device according to an embodiment of the present invention.
【図7】本発明の一実施例に用いる透明フィルム基板の
構成を表す断面図である。FIG. 7 is a cross-sectional view illustrating a configuration of a transparent film substrate used in one embodiment of the present invention.
【図8】従来の有機EL素子の概要を表す断面図であ
る。FIG. 8 is a cross-sectional view illustrating an outline of a conventional organic EL element.
1 透明フィルム基板 2 透明電極層 3 有機EL層 4 金属電極層 5 吸湿層 6 封止剤 7 保護層 8 親水性層 9 防湿コート層 10 吸湿剤 DESCRIPTION OF SYMBOLS 1 Transparent film substrate 2 Transparent electrode layer 3 Organic EL layer 4 Metal electrode layer 5 Hygroscopic layer 6 Sealant 7 Protective layer 8 Hydrophilic layer 9 Moisture-proof coat layer 10 Hygroscopic agent
フロントページの続き (72)発明者 杉野谷 充 千葉県千葉市美浜区中瀬1丁目8番地 セ イコーインスツルメンツ株式会社内 Fターム(参考) 3K007 AB00 AB13 AB18 BB05 CA06 CB01 DA00 DB03 EB00 FA01Continued on the front page (72) Inventor Mitsuru Suginoya 1-8 Nakase, Mihama-ku, Chiba-shi, Chiba F-term (reference) in Seiko Instruments Co., Ltd.
Claims (10)
透明電極の上に形成された有機EL層と、前記有機EL
層の上に形成された金属電極と、を有する有機EL素子
において、 前記透明基板が、ベースフィルムと、吸湿剤を含んだ親
水性層と、防湿コート層とを備える複合フィルムであ
り、 前記透明電極の一部と、前記有機EL層と、前記金属電
極とを被覆する保護層を備えることを特徴とする有機E
L素子。A transparent substrate on which a transparent electrode is formed; an organic EL layer formed on the transparent electrode;
An organic EL device having a metal electrode formed on a layer, wherein the transparent substrate is a composite film including a base film, a hydrophilic layer containing a moisture absorbent, and a moisture-proof coat layer, An organic EL device comprising: a protective layer that covers a part of an electrode, the organic EL layer, and the metal electrode.
L element.
とを特徴とする請求項1に記載の有機EL素子。2. The organic EL device according to claim 1, wherein the protective layer is a UV-curable resin.
を特徴とする請求項1に記載の有機EL素子。3. The organic EL device according to claim 1, wherein the protective layer is formed of a multilayer insulating film.
記有機EL層、および、前記金属電極を被覆する絶縁膜
からなる第一の保護膜と、前記第一の保護層の上に設け
られた紫外線硬化型樹脂を含んだ第二の保護層と、を備
えることを特徴とする請求項1に記載の有機EL素子。4. The protection layer according to claim 1, wherein the protection layer includes a first protection film including an insulating film covering a part of the transparent electrode, the organic EL layer, and the metal electrode; 2. The organic EL device according to claim 1, further comprising: a second protective layer including an ultraviolet curable resin provided.
の間に金属薄膜が設けられたことを特徴とする請求項4
に記載の有機EL素子。5. A metal thin film is provided between said first protective layer and said second protective layer.
3. The organic EL device according to claim 1.
ケイ素と二酸化チタンのうち少なくとも一方を含み、前
記金属薄膜がアルミニウムとクロムのうち少なくとも一
方を含むことを特徴とする請求項5に記載の有機EL素
子。6. The method according to claim 5, wherein the metal oxide of the first protective layer contains at least one of silicon dioxide and titanium dioxide, and the metal thin film contains at least one of aluminum and chromium. The organic EL device according to the above.
トフィルム、ポリエチレンテレフタレートフィルム、ポ
リエーテルサルフォンフィルム、ポリアリレートフィル
ムの内のいずれかからなる透明性プラスチックフィルム
であることを特徴とする請求項1〜6のいずれか1項に
記載の有機EL素子。7. The method according to claim 1, wherein the base film is a transparent plastic film made of any one of a polycarbonate film, a polyethylene terephthalate film, a polyether sulfone film, and a polyarylate film. The organic EL device according to claim 1.
たは有機材料を含むことを特徴とする請求項1〜6のい
ずれか1項に記載の有機EL素子。8. The organic EL device according to claim 1, wherein the hygroscopic agent contains a hygroscopic inorganic material or organic material.
ル、セルロース系、ナイロン、デンプン、アクリル酸系
のうち少なくとも1つの高分子材料を含むことを特徴と
する請求項1〜6のいずれか1項に記載の有機EL素
子。9. The method according to claim 1, wherein the hydrophilic layer contains at least one polymer material selected from the group consisting of polyvinyl alcohol, cellulose, nylon, starch, and acrylic acid. The organic EL device according to the above.
子、アクリル系高分子、ウレタン系高分子の少なくとも
1種類以上を含む紫外線硬化型樹脂であることを特徴と
する請求項1〜6のいずれか1項に記載の有機EL素
子。10. The method according to claim 1, wherein the moisture-proof coating layer is an ultraviolet curable resin containing at least one of an epoxy polymer, an acrylic polymer, and a urethane polymer. 2. The organic EL device according to claim 1.
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|---|---|---|---|
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP35457599A JP2001176653A (en) | 1999-12-14 | 1999-12-14 | Organic el element |
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|---|---|
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| JP2003257666A (en) * | 2002-03-06 | 2003-09-12 | Dainippon Printing Co Ltd | Organic EL display |
| KR20040039608A (en) * | 2002-11-04 | 2004-05-12 | 주식회사 엘리아테크 | Apparatus and Method for manufacturing an Organic Electro Luminescence Display Device |
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| JP2015108836A (en) * | 2008-01-30 | 2015-06-11 | オスラム オーエルイーディー ゲゼルシャフト ミット ベシュレンクテル ハフツングOSRAM OLED GmbH | Device having encapsulation unit |
| US9647186B2 (en) | 2008-01-30 | 2017-05-09 | Osram Oled Gmbh | Method for producing an electronic component and electronic component |
| US10026625B2 (en) | 2008-01-30 | 2018-07-17 | Osram Oled Gmbh | Device comprising an encapsulation unit |
| US10297469B2 (en) | 2008-01-30 | 2019-05-21 | Osram Oled Gmbh | Method for producing an electronic component and electronic component |
| US8410691B2 (en) | 2009-09-29 | 2013-04-02 | Sharp Kabushiki Kaisha | Organic EL device |
| US8624230B2 (en) | 2009-12-02 | 2014-01-07 | Samsung Display Co., Ltd. | Organic light emitting diode display |
| JP2013214366A (en) * | 2012-03-30 | 2013-10-17 | Furukawa Electric Co Ltd:The | Sealing material and organic electroluminescent element using the same |
| US9099685B2 (en) | 2012-11-20 | 2015-08-04 | Samsung Display Co., Ltd. | Organic light emitting diode display and method of manufacturing the same |
| WO2014119385A1 (en) * | 2013-02-01 | 2014-08-07 | 日東電工株式会社 | Organic electroluminescent device |
| US9246132B2 (en) | 2014-01-02 | 2016-01-26 | Samsung Display Co., Ltd. | Flexible organic light-emitting display apparatus and method of manufacturing the same |
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