[go: up one dir, main page]

JP2001127026A - Method and device for bonding wafer to mounting board - Google Patents

Method and device for bonding wafer to mounting board

Info

Publication number
JP2001127026A
JP2001127026A JP30569099A JP30569099A JP2001127026A JP 2001127026 A JP2001127026 A JP 2001127026A JP 30569099 A JP30569099 A JP 30569099A JP 30569099 A JP30569099 A JP 30569099A JP 2001127026 A JP2001127026 A JP 2001127026A
Authority
JP
Japan
Prior art keywords
wafer
mounting plate
elastic sheet
chamber
adhesive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP30569099A
Other languages
Japanese (ja)
Other versions
JP4339973B2 (en
Inventor
Yokou Kaku
誉綱 郭
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Enya Systems Ltd
Original Assignee
Enya Systems Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Enya Systems Ltd filed Critical Enya Systems Ltd
Priority to JP30569099A priority Critical patent/JP4339973B2/en
Publication of JP2001127026A publication Critical patent/JP2001127026A/en
Application granted granted Critical
Publication of JP4339973B2 publication Critical patent/JP4339973B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Mechanical Treatment Of Semiconductor (AREA)

Abstract

PROBLEM TO BE SOLVED: To stick plural sheets of wafers, where fused adhesives are applied on the surfaces, equally to a mounting board regardless of order of sticking. SOLUTION: A wafer 4, where an adhesive is applied, is placed on a mounting board. This mounting board 1 is put on a cooling block 2 having cooling action. Then, the mounting board 1 is surrounded and sealed by a chamber 3. There is an elastic sheet 14 on the topside of the chamber 3, and there is a temperature adjusting jacket 19 on the rear side of that elastic sheet 14. An adhesive is cooled and hardened while pressing the wafer 4 by vacuumizing the air within the chamber 3 with a vacuumizer through an exhaust port 25, thereby pulling the elastic sheet 14 to the wafer face.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、半導体ウエ−ハ等
のウエ−ハを研磨機で平滑に研磨する際、該研磨機にセ
ットするマウント板にウエ−ハを接着するためのマウン
ト板へのウエ−ハ接着方法及び装置に関するものであ
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a mounting plate for bonding a wafer to a mounting plate set in the polishing machine when a wafer such as a semiconductor wafer is polished smoothly by a polishing machine. And a wafer bonding method and apparatus.

【0002】[0002]

【従来の技術】半導体製造において、ウエ−ハを平滑に
研磨するため研磨機のマウント板にウエ−ハを接着剤で
貼り付けて研磨処理を行っているが、この際ウエ−ハの
全面をきわめて均一に貼り付けることが求められてい
る。そのため、ウエ−ハに溶融した接着剤を薄く塗布
し、この接着剤塗布面を下にしてマウント板に載置し、
上面からウエ−ハを押圧して複数枚のウエ−ハを接着す
る方法が一般に採用されている。
2. Description of the Related Art In the manufacture of semiconductors, a wafer is adhered to a mount plate of a polishing machine with an adhesive in order to polish the wafer smoothly, and a polishing process is performed. It is required to be applied very uniformly. Therefore, the melted adhesive is thinly applied to the wafer, and the adhesive is applied to the mount plate with its adhesive side down.
A method in which a plurality of wafers are bonded by pressing the wafer from the upper surface is generally employed.

【0003】ウエ−ハの貼り付け精度を向上させるに
は、接着剤をきれいに極めて薄く、例えば約0.5μm程
度に塗布し、この接着剤層にダストや気泡を含ませるこ
となく接着剤層を壊さないでウエ−ハを貼る必要があ
る。そのような現状に対応して種々の方法、装置が提案
されている。例えば、接着剤層中に気泡を封入しないよ
うウエ−ハを上面からスタンプで押圧して気泡を押し出
すようにしたり、真空中でウエ−ハをマウント板に貼り
付ける方法等が知られている。しかし、これらの方法は
ウエ−ハに塗布した接着剤が高温で未だ流動的な状態で
行われ、貼り付け後に接着剤が硬化するまでの間に時間
があるため、貼り付け後に周縁部が浮き上る傾向があ
り、最初にマウント板に貼り付けたウエ−ハと最後に貼
り付けたウエ−ハでは、特に周縁部の貼付状態に微細な
差異を生じることがあった。
In order to improve the accuracy of attaching a wafer, an adhesive is applied in a very thin and clean, for example, about 0.5 μm, and the adhesive layer is formed without containing dust or bubbles. It is necessary to stick the wafer without breaking. Various methods and apparatuses have been proposed in response to such a current situation. For example, a method is known in which a wafer is pressed with a stamp from the upper surface so as to extrude air bubbles so as not to enclose air bubbles in the adhesive layer, or a method of attaching the wafer to a mount plate in a vacuum. However, in these methods, since the adhesive applied to the wafer is still in a fluid state at a high temperature, and there is time until the adhesive is cured after the application, the peripheral portion is lifted after the application. There is a tendency that the wafer attached to the mounting plate first and the wafer attached last have a slight difference particularly in the attached state of the peripheral portion.

【0004】[0004]

【発明が解決しようとする課題】本発明の解決課題は、
接着剤を薄く塗布したウエ−ハをマウント板に貼り付け
る際、接着剤層中に気泡を封じ込めることなく、かつ複
数枚のウエ−ハを次々と貼り付けても最終的にすべての
ウエ−ハを均一な状態で貼り付けできるようにしたマウ
ント板へのウエ−ハ接着方法及び装置を提供することで
ある。
The problem to be solved by the present invention is as follows.
When a wafer coated with a thin adhesive is attached to a mounting plate, air bubbles are not sealed in the adhesive layer, and even if a plurality of wafers are attached one after another, all wafers are finally attached. Is to provide a method and an apparatus for bonding a wafer to a mounting plate so that the wafer can be stuck in a uniform state.

【0005】[0005]

【課題を解決するための手段】本発明によれば、溶融し
た接着剤を塗布したウエ−ハをマウント板に載置し該ウ
エ−ハを押圧してマウント板に接着する方法において、
マウント板を冷却ブロック上に載置し、ウエ−ハを載置
した該マウント板の周囲を弾性シ−トを有するチャンバ
−で密閉し、該チャンバ−内で上記弾性シ−トをウエ−
ハ面に押し付けて上記接着剤を硬化させつつ上記ウエ−
ハを押圧することを特徴とするマウント板へのウエ−ハ
接着方法が提供され、また上記弾性シ−トの押圧はチャ
ンバ−内を真空にしたり、弾性シ−トの背面側から加圧
流体で加圧することによってもでき、さらに、この加圧
流体により調温することもできるようにした上記方法が
提供され、上記課題が解決される。
According to the present invention, there is provided a method for placing a wafer coated with a molten adhesive on a mounting plate, pressing the wafer, and bonding the wafer to the mounting plate.
The mounting plate is placed on a cooling block, the periphery of the mounting plate on which the wafer is placed is sealed with a chamber having an elastic sheet, and the elastic sheet is wafered in the chamber.
Pressing against the c surface to cure the adhesive,
A method of bonding a wafer to a mounting plate, characterized by pressing a wafer, is provided. The pressing of the elastic sheet may be performed by evacuating the chamber or by applying a pressurized fluid from the back side of the elastic sheet. The above-mentioned method is also provided in which the temperature can be controlled by the pressurized fluid, and the above-mentioned problem can be solved.

【0006】さらに、本発明によれば、溶融した接着剤
を塗布したウエ−ハをマウント板に載置し該ウエ−ハを
押圧してマウント板に接着する装置において、上記マウ
ント板を載置し該マウント板を介して接着剤を冷却する
冷却ブロックと、上記冷却ブロックに対向する弾性シ−
トを有し上記マウント板の周囲を密閉するチャンバ−
と、該チャンバ−でマウント板を密閉した後該チャンバ
−内の上記弾性シ−トをマウント板上のウエ−ハに押圧
させる押圧手段を有することを特徴とするウエ−ハ接着
装置が提供され、また押圧手段として真空装置、上記弾
性シ−トの背面に流通する加圧流体、この加圧流体を調
温流体とした調温ジャケット等を有する上記ウエ−ハ接
着装置が提供され、上記課題が解決される。
Further, according to the present invention, there is provided an apparatus for mounting a wafer coated with a molten adhesive on a mounting plate and pressing the wafer to bond the wafer to the mounting plate. A cooling block for cooling the adhesive through the mounting plate, and an elastic shell facing the cooling block.
A chamber that has a housing and seals around the mount plate.
And a pressing means for pressing the elastic sheet in the chamber against a wafer on the mounting plate after sealing the mounting plate in the chamber. Further, there is provided the above wafer bonding apparatus having a vacuum device as a pressing means, a pressurized fluid flowing on the back surface of the elastic sheet, a temperature control jacket using the pressurized fluid as a temperature control fluid, and the like. Is resolved.

【0007】[0007]

【発明の実施の形態】図面は本発明の一実施例を示し、
ウエ−ハ接着装置の一部の断面図が示されている。図1
はウエ−ハを押圧している状態、図2はウエ−ハを押圧
する前の状態であって、本発明の装置は、マウント板
(1)を載置し該マウント板を冷却する冷却ブロック
(2)と、該冷却ブロック(2)に対向して設けられた
チャンバ−(3)を有している。
BRIEF DESCRIPTION OF THE DRAWINGS The drawings illustrate one embodiment of the present invention.
A sectional view of a part of the wafer bonding apparatus is shown. FIG.
FIG. 2 shows a state in which the wafer is pressed, and FIG. 2 shows a state before the wafer is pressed. In the apparatus of the present invention, a cooling block for mounting the mounting plate (1) and cooling the mounting plate is provided. (2) and a chamber (3) provided opposite to the cooling block (2).

【0008】上記マウント板(1)は、ウエ−ハ(4)
を載置する際に、例えば約80〜100℃程度に加熱さ
れており、溶融した接着剤をスピンコ−トによって薄く
塗布した上記ウエ−ハ(4)が接着剤層をマウント板側
にして載置されている。この接着剤としては、種々の接
着剤を用いることができるが、例えば溶融温度が約50
〜80℃程度、好ましくは約70℃程度の低温で貼付け
できる接着剤が好適に使用される。なお、各ウエ−ハは
マウント板に載置した際、1枚づつスタンプ(図示略)
で押圧され、以下同様にして複数枚のウエ−ハがマウン
ト板の所定位置に次々と貼られる。
The mounting plate (1) is a wafer (4)
The wafer (4), which has been heated to, for example, about 80 to 100 ° C. and is thinly coated with a molten adhesive by spin coating, is placed with the adhesive layer facing the mounting plate. Is placed. As this adhesive, various adhesives can be used.
An adhesive that can be applied at a low temperature of about 80 ° C., preferably about 70 ° C. is suitably used. Each wafer is stamped one by one (not shown) when placed on the mounting plate.
, And a plurality of wafers are successively stuck at predetermined positions on the mounting plate in the same manner.

【0009】上記冷却ブロック(2)には、内部に冷却
水等の調温媒体をブロック全体に循環させることができ
るよう流入口(5)及び流出口(6)に通じる循環流路
(7)が形成されており、図示を省いた流体圧シリンダ
−装置等の適宜の昇降手段により、上下動するよう構成
されている。なお、該冷却ブロック(2)を固定的に設
け、上記チャンバ−(3)を上下動するようにしてもよ
いし、いずれも移動式に設けてもよい。上記冷却ブロッ
ク(2)による冷却温度は、使用場所の雰囲気に応じて
調整されるが、表面に結露を生じない程度、例えば表面
温度が約12〜15℃程度となるようにするとよい。
The cooling block (2) has a circulation channel (7) communicating with an inlet (5) and an outlet (6) so that a temperature control medium such as cooling water can be circulated throughout the block. Is formed, and is configured to move up and down by appropriate lifting means such as a fluid pressure cylinder device not shown. The cooling block (2) may be fixedly provided, and the chamber (3) may be moved up and down, or both may be provided in a movable manner. The cooling temperature of the cooling block (2) is adjusted according to the atmosphere at the place of use, but it is preferable that the surface temperature is about 12 to 15 ° C., which does not cause condensation on the surface.

【0010】上記冷却ブロック(2)等の移動は、マウ
ント板(1)を上面に載置したことをセンサ−(8)で
確認した後に行われ、またマウント板の上面(9)は、
上記マウント板(1)を密着状態に載置できるよう平面
に形成され、周囲にはシリコンゴム材料等の耐熱,耐薬
品性を有するパッキング(10)が上記チャンバ−(3)の
下面に密着するように設けられている。
The movement of the cooling block (2) and the like is performed after it is confirmed by the sensor (8) that the mounting plate (1) is mounted on the upper surface, and the upper surface (9) of the mounting plate is
The mounting plate (1) is formed flat so that the mounting plate (1) can be placed in close contact with it, and a heat-resistant and chemical-resistant packing (10) such as a silicon rubber material is closely attached to the lower surface of the chamber (3). It is provided as follows.

【0011】上記チャンバ−(3)は、上記マウント板
(1)の外周全体を閉鎖的に囲む大きさの環状のチャン
バ−本体(11)を有している。なお上記パッキング(10)は
該チャンバ−本体(11)の下面に設けることもできる。
The chamber (3) has an annular chamber main body (11) having a size that surrounds the entire outer periphery of the mounting plate (1) in a closed manner. The packing (10) may be provided on the lower surface of the chamber body (11).

【0012】上記チャンバ−本体(11)の上面には支持段
部(12)が形成され、該支持段部(12)にはパッキング(1
3),(13) を介して弾性シ−ト(14)の周縁が保持されてお
り、該弾性シ−ト(14)の上部周縁のパッキング(13)は、
押え片(15)で固定され、防水機能を兼ねている。該弾性
シ−ト(14)は、テフロン(商品名)等の通気性のない耐
熱,耐薬品性を有するプラスチック材料やこれらの樹脂
材料をコ−ティングしたステンレス材その他の金属材料
で作られ、厚さ約2〜7mm、好ましくは約3〜5mm程度
に形成されている。なお、上記パッキング(13)は、後記
するように真空作用や加圧流体によって弾性シ−トが引
き寄せられたり、押し付けられた際、該シ−トが局部的
に変形しないで該パッキング部分が変形することにより
該シ−トが全体としてウエ−ハの全面に均一にほぼ平行
状態で当るようにしてある。
A supporting step (12) is formed on the upper surface of the chamber body (11), and the packing (1) is provided on the supporting step (12).
The peripheral edge of the elastic sheet (14) is held through (3) and (13), and the packing (13) of the upper peripheral edge of the elastic sheet (14) is
It is fixed with the presser piece (15) and also has a waterproof function. The elastic sheet (14) is made of a heat-resistant and chemical-resistant plastic material such as Teflon (trade name) having no air permeability, a stainless steel material coated with these resin materials, and other metal materials. The thickness is about 2 to 7 mm, preferably about 3 to 5 mm. The packing (13) does not deform locally when the elastic sheet is drawn or pressed by a vacuum action or a pressurized fluid as described later. By doing so, the sheet hits the entire surface of the wafer as a whole in a substantially parallel state.

【0013】上記チャンバ−本体(11)は、取付軸(16)を
介してフレ−ム(17)に支持され、該フレ−ム(17)とチャ
ンバ−本体(11)の間には、該チャンバ−本体(11)が押さ
れた際の緩衝作用を奏するようばね(18)が設けられてい
る。
The chamber body (11) is supported by a frame (17) via a mounting shaft (16), and the frame (17) and the chamber body (11) are provided between the frame (17) and the chamber body (11). A spring (18) is provided to provide a buffering action when the chamber body (11) is pressed.

【0014】上記チャンバ−(3)の上方には上記弾性
シ−ト(14)の背面側に調温流体を流通させて上記ウエ−
ハ(4)や接着剤を調温するよう調温ジャケット(19)が
設けられている。該調温ジャケットとして、図に示す実
施例では流入口(20)から温冷水等の調温流体を流入さ
せ、弾性シ−ト(19)に直接接触させて流出口(21)から流
出させ、接着剤の硬化温度に合わせて調温するようにし
ているが、その他適宜の調温手段を用いることができ
る。なお、上記弾性シ−ト(14)は、調温流体の重量によ
って垂れ下がらないよう中央にボス部(22)を形成してボ
ルト(23)で中央部を保持し上記調温ジャケット(19)との
隙間が約1〜3mm、好ましくは約1.5mm程度となるよう
保持している。ボルト(23)の外周には、水漏れ防止キャ
ップ(24)を設けて漏水しないようにしてある。また、上
記調温流体は、流出口を閉じて調温ジャケットに流入さ
せれば加圧流体となり、上記弾性シ−トを押圧する押圧
手段とすることができる。
Above the chamber (3), a temperature-controlling fluid is circulated to the back side of the elastic sheet (14) so that
A temperature control jacket (19) is provided to control the temperature of (c) and the adhesive. In the embodiment shown in the figure, as the temperature control jacket, a temperature control fluid such as hot or cold water flows in from the inflow port (20), comes into direct contact with the elastic sheet (19), and flows out from the outflow port (21). Although the temperature is adjusted according to the curing temperature of the adhesive, other appropriate temperature adjusting means can be used. The elastic sheet (14) is formed with a boss (22) at the center so that it does not hang down due to the weight of the temperature control fluid, and the central portion is held by bolts (23) to form the temperature control jacket (19). Is maintained to be about 1 to 3 mm, preferably about 1.5 mm. A water leakage prevention cap (24) is provided on the outer periphery of the bolt (23) to prevent water leakage. Further, the temperature-controlling fluid becomes a pressurized fluid if it flows into the temperature-controlling jacket with the outlet closed, and can be a pressing means for pressing the elastic sheet.

【0015】上記チャンバ−(3)には、側面に開口す
る排気ポ−ト(25)が設けられ、該ポ−ト(25)には弾性シ
−トを押圧する押圧手段としての真空装置(図示略)が
接続されている。該ポ−ト(25)は、図においては環状の
チャンバ−本体(11)の2ヶ所に設けてあるが、マウント
板(1)の大きさに応じて1ヶ所にしたり、3ヶ所以上
にしたり適宜数設けることができる。なお、上記真空装
置は、ポ−トと真空源の間に真空圧力コントロ−ラ−を
設けて真空度を調整するようにしてあり、真空リ−クの
スピ−ドも可変できるようにしてあり、また万一真空ラ
インに水が入った場合を考慮して配管の途中にトラップ
等を取付け、液面検出をする。
The chamber (3) is provided with an exhaust port (25) opened on the side surface, and the port (25) has a vacuum device (pressing means) for pressing an elastic sheet. (Not shown) is connected. The ports (25) are provided at two places in the annular chamber body (11) in the figure, but may be provided at one place or at three or more places depending on the size of the mount plate (1). An appropriate number can be provided. In the vacuum apparatus, a vacuum pressure controller is provided between the port and the vacuum source to adjust the degree of vacuum, and the speed of the vacuum leak can be varied. Also, in consideration of the case where water enters the vacuum line, a trap or the like is installed in the middle of the pipe to detect the liquid level.

【0016】而して、片面に溶融した接着剤を塗布した
ウエ−ハ(4)は、マウント板(1)に載置され、スタ
ンプ(図示略)で押圧される。このマウント板(1)
は、所要枚数のウエ−ハを載置した後、適宜のロボット
等の搬送手段で上記冷却ブロック(2)上に移送される
(図2)。該ロボットが退避したら上記冷却ブロック
(2)は上昇し、上記マウント板(1)を上記チャンバ
−(3)内に収納する。上記冷却ブロック(2)のパッ
キング(10)は、上記チャンバ−(3)の下面に密着する
ので、上記マウント板(1)の周囲は該チャンバ−
(3)によって密閉される。
The wafer (4) coated with the molten adhesive on one side is placed on the mounting plate (1) and pressed by a stamp (not shown). This mounting plate (1)
After the required number of wafers are placed, they are transferred onto the cooling block (2) by a suitable transport means such as a robot (FIG. 2). When the robot retreats, the cooling block (2) rises and stores the mounting plate (1) in the chamber (3). The packing (10) of the cooling block (2) is in close contact with the lower surface of the chamber (3).
Sealed by (3).

【0017】そして、上記押圧手段を動作させて弾性シ
−トをウエ−ハ面に押し付ける。押圧手段として真空装
置を用いるときは上記冷却ブロック(2)の上面(9)
と弾性シ−ト(14)間の空気を吸引する。この際、上記チ
ャンバ−本体(11)に設けた上記センサ−(8)と同様の
センサ−(26)でマウント板(1)を有無を確認してから
行う。このセンサ−(26)部分はチャンバ−本体内を気密
にするように設けられている。この吸引によって、上記
弾性シ−ト(14)は周縁がパッキング(13)で保持されてい
るから、ほぼ平面状態で維持したまま上記ウエ−ハ
(4)の上面に引き寄せられ、複数のウエ−ハ(4)の
全面を均一に押圧する。この時、上記調温ジャケット(1
9)によって弾性シ−ト側からも接着剤層は冷却され、同
時に冷却ブロック(2)によっても冷却され、接着剤層
は流動しない程度に硬化する。なお、接着剤の種類によ
っては硬化温度が異なるため、接着剤の種類に応じて温
冷水によって最適温度に調温する。このとき、上記調温
ジャケットの流出口を閉じて調温流体を加圧流体として
機能させ、真空装置と共に弾性シ−トを押圧してもよ
い。また、上記真空装置を動作させず、加圧流体だけで
弾性シ−トを押圧するようにしてもよい。
The elastic sheet is pressed against the wafer surface by operating the pressing means. When using a vacuum device as the pressing means, the upper surface (9) of the cooling block (2)
The air between the and the elastic sheet (14) is sucked. At this time, the presence or absence of the mount plate (1) is confirmed by the sensor (26) similar to the sensor (8) provided in the chamber body (11). The sensor (26) is provided so as to make the inside of the chamber main body airtight. Due to the suction, the elastic sheet (14) is attracted to the upper surface of the wafer (4) while being maintained in a substantially flat state, since the peripheral edge is held by the packing (13), and a plurality of wafers are pulled. C) Press the entire surface of (4) uniformly. At this time, the temperature control jacket (1
According to 9), the adhesive layer is also cooled from the elastic sheet side, and at the same time, cooled by the cooling block (2), and the adhesive layer is hardened so as not to flow. Since the curing temperature differs depending on the type of the adhesive, the temperature is adjusted to an optimum temperature with hot and cold water according to the type of the adhesive. At this time, the outlet of the temperature control jacket may be closed so that the temperature control fluid functions as a pressurized fluid, and the elastic sheet may be pressed together with the vacuum device. Further, the elastic sheet may be pressed only by the pressurized fluid without operating the vacuum device.

【0018】[0018]

【実施例】上記装置を用いて溶融した接着剤を塗布した
ウエ−ハ(4)を載置したマウント板(1)の上方から
押圧手段として真空作用を用いて上記弾性シ−ト(14)を
ウエ−ハに向けて引き寄せ、同時に上記ウエ−ハを冷却
した。真空到達時間は約30秒、リ−ク時間約10秒、
ト−タル冷却時間(押圧時間)約100秒としたとこ
ろ、上記ウエ−ハは外周部が弾性シ−トで確実にかつ均
一な圧力でプレスするように押えられ、均一に貼り付け
ることができた。また、この際、上記冷却ブロック
(2)及び調温ジャケット(19)の作用で上記ウエ−ハ
(4)の表面温度は約60℃前後まで冷却することがで
き、接着剤を硬化させつつ貼り付けることができた。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The elastic sheet (14) is pressed from above a mounting plate (1) on which a wafer (4) coated with a molten adhesive is placed using a vacuum device as a pressing means. Was drawn toward the wafer, and at the same time, the wafer was cooled. Vacuum arrival time is about 30 seconds, leak time is about 10 seconds,
When the total cooling time (pressing time) is set to about 100 seconds, the wafer is pressed by an elastic sheet so that the outer peripheral portion is reliably and uniformly pressed, and the wafer can be stuck uniformly. Was. At this time, the surface temperature of the wafer (4) can be cooled down to about 60 ° C. by the action of the cooling block (2) and the temperature control jacket (19), and the adhesive is cured while the adhesive is cured. I could attach it.

【0019】[0019]

【発明の効果】本発明は上記のように構成され、ウエ−
ハを載置したマウント板を冷却ブロックの上に載せ、該
マウント板の周囲を弾性シ−トを有するチャンバ−で密
閉し、該チャンバ−内で上記弾性シ−トをウエ−ハ面に
押し付けて上記接着剤を硬化させつつウエ−ハを押圧す
るようにしたから、接着剤中に気泡等を封入することな
く、しかも貼付けると共に冷却することにより接着剤が
流動しない程度に硬化してマウント板の所定位置に薄い
接着剤層を破壊することなく複数のウエ−ハを均一に押
圧して均質に貼り付けることができ、弾性シ−トの背面
側から調温することにより接着剤に最適の状態で硬化さ
せることができ、効率よく貼り付け作業を行うことがで
き、研磨により高精度のウエ−ハを得ることができる。
The present invention is constructed as described above,
The mount plate on which the c is placed is placed on the cooling block, the periphery of the mount plate is sealed with a chamber having an elastic sheet, and the elastic sheet is pressed against the wafer surface in the chamber. Since the wafer is pressed while the adhesive is being hardened, the adhesive is hardened to such an extent that the adhesive does not flow by mounting and cooling without enclosing bubbles or the like in the adhesive, and mounting. Multiple wafers can be pressed evenly without breaking the thin adhesive layer at a predetermined position on the board, and can be stuck uniformly. Ideal for adhesives by adjusting the temperature from the back side of the elastic sheet In this state, the adhesive can be efficiently bonded, and a highly accurate wafer can be obtained by polishing.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の一実施例を示し、ウエ−ハを押圧して
いる状態の一部の断面図である。
FIG. 1 shows an embodiment of the present invention and is a partial sectional view of a state where a wafer is being pressed.

【図2】ウエ−ハを押圧する前の状態を示す一部の断面
図である。
FIG. 2 is a partial cross-sectional view showing a state before a wafer is pressed.

【符号の説明】[Explanation of symbols]

1 マウント板 2 冷却ブロック 3 チャンバ− 4 ウエ−ハ 14 弾性シ−ト 19 調温ジャケット 25 排気ポ−ト 1 Mounting plate 2 Cooling block 3 Chamber 4 Wafer 14 Elastic sheet 19 Temperature control jacket 25 Exhaust port

Claims (9)

【特許請求の範囲】[Claims] 【請求項1】 溶融した接着剤を塗布したウエ−ハをマ
ウント板に載置し該ウエ−ハを押圧してマウント板に接
着する方法において、マウント板を冷却ブロック上に載
置し、ウエ−ハを載置した該マウント板の周囲を弾性シ
−トを有するチャンバ−で密閉し、該チャンバ−内で上
記弾性シ−トをウエ−ハ面に押し付けて上記接着剤を硬
化させつつ上記ウエ−ハを押圧することを特徴とするマ
ウント板へのウエ−ハ接着方法。
In a method of placing a wafer coated with a molten adhesive on a mounting plate and pressing the wafer to bond the wafer to the mounting plate, the mounting plate is placed on a cooling block, and -The periphery of the mount plate on which the c is mounted is sealed with a chamber having an elastic sheet, and the elastic sheet is pressed against the wafer surface in the chamber to cure the adhesive while the adhesive is being cured. A method for bonding a wafer to a mounting plate, which comprises pressing the wafer.
【請求項2】 上記弾性シ−トの押圧は、チャンバ−内
を真空にし該弾性シ−トを引き寄せることにより行う請
求項1に記載のマウント板へのウエ−ハ接着方法。
2. The method for bonding a wafer to a mounting plate according to claim 1, wherein the pressing of the elastic sheet is performed by evacuating the chamber and drawing the elastic sheet.
【請求項3】 上記弾性シ−トの押圧は、上記弾性シ−
トの背面に加圧流体を流通させることにより行う請求項
1または2に記載のマウント板へのウエ−ハ接着方法。
3. The elastic sheet is pressed against the elastic sheet.
3. The method for bonding a wafer to a mount plate according to claim 1 or 2, wherein the method is performed by flowing a pressurized fluid through the back surface of the wafer.
【請求項4】 上記加圧流体は調温流体である請求項3
に記載のマウント板へのウエ−ハ接着方法。
4. The pressurized fluid is a temperature-controlled fluid.
3. The method for bonding a wafer to a mounting plate according to 1.
【請求項5】 溶融した接着剤を塗布したウエ−ハをマ
ウント板に載置し該ウエ−ハを押圧してマウント板に接
着する装置において、上記マウント板を載置し該マウン
ト板を介して接着剤を冷却する冷却ブロックと、上記冷
却ブロックに対向する弾性シ−トを有し上記マウント板
の周囲を密閉するチャンバ−と、該チャンバ−でマウン
ト板を密閉した後該チャンバ−内の上記弾性シ−トをマ
ウント板上のウエ−ハに押圧させる押圧手段を有するこ
とを特徴とするマウント板へのウエ−ハ接着装置。
5. An apparatus for placing a wafer coated with a molten adhesive on a mounting plate and pressing the wafer to bond the wafer to the mounting plate, wherein the mounting plate is placed and placed through the mounting plate. A cooling block for cooling the adhesive by cooling, a chamber having an elastic sheet opposed to the cooling block, and sealing the periphery of the mounting plate; A device for bonding a wafer to a mounting plate, comprising a pressing means for pressing the elastic sheet against a wafer on the mounting plate.
【請求項6】 上記弾性シ−トは、ほぼ平面状態を維持
してウエ−ハ全面に押圧されるよう周縁がパッキングで
保持されている請求項5に記載のマウント板へのウエ−
ハの接着装置。
6. A wafer mounted on a mounting plate according to claim 5, wherein the peripheral edge of the elastic sheet is held by packing so as to be pressed substantially over the entire surface of the wafer while maintaining a substantially flat state.
C bonding equipment.
【請求項7】 上記押圧手段は、チャンバ−内の空気を
吸引する真空装置である請求項5に記載のマウント板へ
のウエ−ハの接着装置。
7. The apparatus for bonding a wafer to a mounting plate according to claim 5, wherein said pressing means is a vacuum apparatus for sucking air in the chamber.
【請求項8】 上記押圧手段は上記弾性シ−トの背面に
流通する加圧流体である請求項5または7に記載のマウ
ント板へのウエ−ハの接着装置。
8. An apparatus for bonding a wafer to a mounting plate according to claim 5, wherein said pressing means is a pressurized fluid flowing on a back surface of said elastic sheet.
【請求項9】 上記加圧流体は調温流体であり、該調温
流体を流通させる調温ジャケットを有する請求項8に記
載のマウント板へのウエ−ハの接着装置。
9. The apparatus for bonding a wafer to a mounting plate according to claim 8, wherein the pressurized fluid is a temperature-controlling fluid, and the device has a temperature-controlling jacket through which the temperature-controlling fluid flows.
JP30569099A 1999-10-27 1999-10-27 Wafer bonding method and apparatus for mounting plate Expired - Lifetime JP4339973B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP30569099A JP4339973B2 (en) 1999-10-27 1999-10-27 Wafer bonding method and apparatus for mounting plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP30569099A JP4339973B2 (en) 1999-10-27 1999-10-27 Wafer bonding method and apparatus for mounting plate

Publications (2)

Publication Number Publication Date
JP2001127026A true JP2001127026A (en) 2001-05-11
JP4339973B2 JP4339973B2 (en) 2009-10-07

Family

ID=17948197

Family Applications (1)

Application Number Title Priority Date Filing Date
JP30569099A Expired - Lifetime JP4339973B2 (en) 1999-10-27 1999-10-27 Wafer bonding method and apparatus for mounting plate

Country Status (1)

Country Link
JP (1) JP4339973B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7645685B2 (en) 2006-03-17 2010-01-12 Tdk Corporation Method for producing a thin IC chip using negative pressure

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7645685B2 (en) 2006-03-17 2010-01-12 Tdk Corporation Method for producing a thin IC chip using negative pressure

Also Published As

Publication number Publication date
JP4339973B2 (en) 2009-10-07

Similar Documents

Publication Publication Date Title
JP2527232B2 (en) Polishing equipment
US7704348B2 (en) Apparatus and method for fabricating bonded substrate
JP4022306B2 (en) Wafer bonding method and bonding apparatus
WO2012026275A1 (en) Sheet adhering device and adhering method
KR20020018641A (en) Semiconductor wafer polishing apparatus with a variable polishing force wafer carrier head
JPH11245163A5 (en)
CN110977750A (en) Pressure control device and chemical mechanical polishing device
TWI525678B (en) Sheet Adhesive Device and Paste Method
KR20170041267A (en) Apparatus for especially thermally joining micro-electromechanical parts
JP6559013B2 (en) Sheet sticking device and sticking method
JP2534196B2 (en) Wafer sticking method
JPH054482U (en) Wafer reversing sticker
TWI430387B (en) Supporting plate attaching method
JP4141725B2 (en) Film pasting method
JP2001127026A (en) Method and device for bonding wafer to mounting board
JP2009071145A (en) Method and device for sticking dicing tape on plate type member such as semiconductor wafer
TWI689035B (en) Support device and support method
JPH10296624A (en) Method and device for affixing wafer to porous surface plate
JP2004145096A (en) Liquid crystal device substrate bonding apparatus and liquid crystal device manufacturing method
CN111640840A (en) LED vacuum packaging process and vacuum pressing device
JP2003273049A (en) Vacuum sticking device for wafers
JPH01101386A (en) Bonding of wafer
TWI674659B (en) Wafer packaging device and wafer packaging method
CN223059335U (en) Film sticking jig and film sticking equipment
JP7537940B2 (en) Silicon wafer bonding apparatus and bonding method

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20051031

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20080805

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20090113

A711 Notification of change in applicant

Free format text: JAPANESE INTERMEDIATE CODE: A711

Effective date: 20081210

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20090302

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20090402

RD02 Notification of acceptance of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7422

Effective date: 20090402

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20090609

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20090703

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

Ref document number: 4339973

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120710

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120710

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130710

Year of fee payment: 4

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

EXPY Cancellation because of completion of term