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JP2001527590A - ステレオリソグラフィのための耐熱性ポリマー - Google Patents

ステレオリソグラフィのための耐熱性ポリマー

Info

Publication number
JP2001527590A
JP2001527590A JP53588498A JP53588498A JP2001527590A JP 2001527590 A JP2001527590 A JP 2001527590A JP 53588498 A JP53588498 A JP 53588498A JP 53588498 A JP53588498 A JP 53588498A JP 2001527590 A JP2001527590 A JP 2001527590A
Authority
JP
Japan
Prior art keywords
polymer precursor
vinyl ether
compound
liquid polymer
photoinitiator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP53588498A
Other languages
English (en)
Japanese (ja)
Inventor
ヴィー． シズマン、ユージーン
エフ． アンダースン、ラッセル
ピー． コルジャック、マティアス
ジー． クルツ、ジュリエッタ
エム． シュリヴァスタヴァ、チャンドラ
Original Assignee
アライド シグナル インコーポレイテッド
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US09/013,159 external-priority patent/US6054250A/en
Application filed by アライド シグナル インコーポレイテッド filed Critical アライド シグナル インコーポレイテッド
Publication of JP2001527590A publication Critical patent/JP2001527590A/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
    • C08F283/10—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polymers containing more than one epoxy radical per molecule
    • C08F283/105—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polymers containing more than one epoxy radical per molecule on to unsaturated polymers containing more than one epoxy radical per molecule
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
    • C08F283/10—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polymers containing more than one epoxy radical per molecule
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Epoxy Resins (AREA)
  • Polymerisation Methods In General (AREA)
  • Graft Or Block Polymers (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
JP53588498A 1997-02-18 1998-02-13 ステレオリソグラフィのための耐熱性ポリマー Pending JP2001527590A (ja)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US3841897P 1997-02-18 1997-02-18
US1370098A 1998-01-26 1998-01-26
US09/013,700 1998-01-26
US60/038,418 1998-01-26
US09/013,159 1998-01-26
US09/013,159 US6054250A (en) 1997-02-18 1998-01-26 High temperature performance polymers for stereolithography
PCT/US1998/002679 WO1998036323A1 (fr) 1997-02-14 1998-02-13 Polymeres performants a hautes temperatures et destines a la stereolithographie

Publications (1)

Publication Number Publication Date
JP2001527590A true JP2001527590A (ja) 2001-12-25

Family

ID=27359792

Family Applications (1)

Application Number Title Priority Date Filing Date
JP53588498A Pending JP2001527590A (ja) 1997-02-18 1998-02-13 ステレオリソグラフィのための耐熱性ポリマー

Country Status (3)

Country Link
EP (1) EP0960354A1 (fr)
JP (1) JP2001527590A (fr)
WO (1) WO1998036323A1 (fr)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003073457A (ja) * 2001-08-31 2003-03-12 Asahi Denka Kogyo Kk 光学的立体造形用樹脂組成物およびこれを用いた光学的立体造形方法
JP4798846B2 (ja) * 1998-04-06 2011-10-19 ハンツマン アドバンスト マテリアルズ （スイッツァランド） ゲーエムベーハー 特に高熱撓み温度を有するステレオリソグラフ法による柔軟な硬化物品を製造するための液体放射線硬化性組成物
JP4796690B2 (ja) * 1998-07-10 2011-10-19 コニンクリーケ デーエスエム ナムローゼ フェンノートシャップ ポリエチレン様物品製造用のソリッドイメージング組成物
JP4798845B2 (ja) * 1998-03-30 2011-10-19 ハンツマン アドバンスト マテリアルズ （スイッツァランド） ゲーエムベーハー 特にステレオリソグラフ法による柔軟な硬化物品を製造するための液体放射線硬化性組成物
JP2011221476A (ja) * 2009-06-08 2011-11-04 Sanyo Chem Ind Ltd 感光性組成物
JP2018528107A (ja) * 2015-09-09 2018-09-27 カーボン，インコーポレイテッド 積層造形用エポキシ二重硬化樹脂

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6379866B2 (en) * 2000-03-31 2002-04-30 Dsm Desotech Inc Solid imaging compositions for preparing polypropylene-like articles
US6762002B2 (en) 1998-07-10 2004-07-13 Dsm Desotech, Inc. Solid imaging compositions for preparing polypropylene-like articles
ES2345031T3 (es) * 2000-02-08 2010-09-14 Huntsman Advanced Materials (Switzerland) Gmbh Composicion liquida curable por radiacion, especialmente para estereolitografia.
US6777027B2 (en) 2002-10-08 2004-08-17 Rohm And Haas Company Coating powders for smooth, low gloss finishes, and powder coatings formed therefrom
US6890997B2 (en) 2002-10-08 2005-05-10 Rohm And Haas Company Powder coating of free radical curable epoxy resin and another free radical curable resin
US7696260B2 (en) * 2006-03-30 2010-04-13 Dsm Ip Assets B.V. Cationic compositions and methods of making and using the same
CA2950213A1 (fr) 2014-06-23 2015-12-30 Carbon, Inc. Procedes de fabrication d'objets tridimensionnels en polyurethane a partir de materiaux ayant plusieurs mecanismes de durcissement
CN107428092B (zh) * 2015-03-19 2021-06-08 陶氏环球技术有限责任公司 使用光调节自由基聚合的增材制造方法
US10316213B1 (en) 2017-05-01 2019-06-11 Formlabs, Inc. Dual-cure resins and related methods

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS579398B2 (fr) * 1974-04-22 1982-02-20
JP2898761B2 (ja) * 1990-12-27 1999-06-02 旭電化工業株式会社 光学的造形用樹脂組成物
DE4291255T1 (de) * 1991-05-01 1994-05-05 Allied Signal Inc Stereolithographie unter Verwendung von Vinylether-Epoxid-Polymeren
TW269017B (fr) * 1992-12-21 1996-01-21 Ciba Geigy Ag
US5639413A (en) * 1995-03-30 1997-06-17 Crivello; James Vincent Methods and compositions related to stereolithography
JP3724893B2 (ja) * 1996-09-25 2005-12-07 ナブテスコ株式会社 光学的立体造形用樹脂組成物

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4798845B2 (ja) * 1998-03-30 2011-10-19 ハンツマン アドバンスト マテリアルズ （スイッツァランド） ゲーエムベーハー 特にステレオリソグラフ法による柔軟な硬化物品を製造するための液体放射線硬化性組成物
JP4798846B2 (ja) * 1998-04-06 2011-10-19 ハンツマン アドバンスト マテリアルズ （スイッツァランド） ゲーエムベーハー 特に高熱撓み温度を有するステレオリソグラフ法による柔軟な硬化物品を製造するための液体放射線硬化性組成物
JP4796690B2 (ja) * 1998-07-10 2011-10-19 コニンクリーケ デーエスエム ナムローゼ フェンノートシャップ ポリエチレン様物品製造用のソリッドイメージング組成物
JP2003073457A (ja) * 2001-08-31 2003-03-12 Asahi Denka Kogyo Kk 光学的立体造形用樹脂組成物およびこれを用いた光学的立体造形方法
JP2011221476A (ja) * 2009-06-08 2011-11-04 Sanyo Chem Ind Ltd 感光性組成物
JP2018528107A (ja) * 2015-09-09 2018-09-27 カーボン，インコーポレイテッド 積層造形用エポキシ二重硬化樹脂

Also Published As

Publication number Publication date
WO1998036323A1 (fr) 1998-08-20
EP0960354A1 (fr) 1999-12-01

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Legal Events

Date Code Title Description
A912 Re-examination (zenchi) completed and case transferred to appeal board

Free format text: JAPANESE INTERMEDIATE CODE: A912

Effective date: 20040415