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JP2002223065A - Method for manufacturing printed wiring board - Google Patents

Method for manufacturing printed wiring board

Info

Publication number
JP2002223065A
JP2002223065A JP2001016241A JP2001016241A JP2002223065A JP 2002223065 A JP2002223065 A JP 2002223065A JP 2001016241 A JP2001016241 A JP 2001016241A JP 2001016241 A JP2001016241 A JP 2001016241A JP 2002223065 A JP2002223065 A JP 2002223065A
Authority
JP
Japan
Prior art keywords
wiring board
solder
solder paste
printed wiring
solder bumps
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001016241A
Other languages
Japanese (ja)
Inventor
Kazuhito Yamada
和仁 山田
Yoshinori Wakihara
義範 脇原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ibiden Co Ltd
Original Assignee
Ibiden Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibiden Co Ltd filed Critical Ibiden Co Ltd
Priority to JP2001016241A priority Critical patent/JP2002223065A/en
Publication of JP2002223065A publication Critical patent/JP2002223065A/en
Pending legal-status Critical Current

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  • Electric Connection Of Electric Components To Printed Circuits (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a method for manufacturing a printed wiring board which can efficiently manufacture the printed wiring board with superior connectivity with mounted electronic components. SOLUTION: Solder paste 30 is printed at desired positions on the wiring board 10 and made to reflow and thus solder bumps 2 are formed on the wiring board 10. While a flat surface 41 of a fluttering jig 4 are made to abut against the solder paste 30 from above, the solder paste 30 is made to reflow. Consequently, the peak parts 31 of the solder bumps 3 are flattened and formed almost on the same plane.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【技術分野】本発明は,複数の半田バンプを設けたプリ
ント配線板の製造方法に関する。
The present invention relates to a method for manufacturing a printed wiring board provided with a plurality of solder bumps.

【0002】[0002]

【従来技術】従来より,ICチップなどの電子部品を実
装するために,半田バンプを表層に形成したプリント配
線板がある。上記半田バンプは,上記電子部品との接続
性を向上すべく,その頂部を平坦化すると共に,上記複
数の半田バンプの頂部を略同一平面上に形成することが
行われている。例えば,特開2000−244101号
公報には,配線基板上に半田バンプを形成した後,加
熱,加圧,又は加熱加圧することにより,上記半田バン
プの頂部を平坦化する,プリント配線板の製造方法が開
示されている。
2. Description of the Related Art Conventionally, there is a printed wiring board in which solder bumps are formed on a surface layer for mounting electronic components such as an IC chip. In order to improve the connectivity with the electronic component, the solder bumps are flattened at the top, and the tops of the plurality of solder bumps are formed on substantially the same plane. For example, Japanese Patent Application Laid-Open No. 2000-244101 discloses a method of manufacturing a printed wiring board in which after forming a solder bump on a wiring board, the top of the solder bump is flattened by heating, pressing, or heating and pressing. A method is disclosed.

【0003】即ち,上記製造方法は,まず,配線基板上
に半田ペーストを印刷した後,該半田ペーストをリフロ
ーして,上記配線基板上に複数の半田バンプを形成す
る。次いで,シート状の上記配線基板を個片化する。次
いで,上記半田バンプの頂部を,加熱,加圧,又は加熱
加圧することにより平坦化する。
That is, in the above-mentioned manufacturing method, first, after a solder paste is printed on a wiring board, the solder paste is reflowed to form a plurality of solder bumps on the wiring board. Next, the sheet-like wiring board is singulated. Next, the top of the solder bump is flattened by heating, pressing, or heating and pressing.

【0004】[0004]

【解決しようとする課題】しかしながら,上記従来のプ
リント配線板の製造方法においては,上記半田ペースト
をリフローした後,上記半田バンプの頂部を平坦化する
工程を設ける必要があり,工数が増え,生産効率が低下
するおそれがある。また,シート状の配線基板に上記半
田バンプを形成しても,配線基板を載せる治具と,上記
半田バンプの頂部を押圧するフラッタニングヘッドとの
平行出しが困難であるため,上記シート状の配線基板を
個片化してから上記半田バンプの頂部の平坦化を行う必
要がある。それ故,個片ごとに個別に半田バンプの頂部
の平坦化を行わなければならず,生産効率を向上させる
ことが困難である。
However, in the above-mentioned conventional method for manufacturing a printed wiring board, it is necessary to provide a step of flattening the top of the solder bump after reflowing the solder paste. The efficiency may decrease. Further, even if the solder bumps are formed on a sheet-shaped wiring board, it is difficult to parallelly set a jig for mounting the wiring board and a flattening head that presses the top of the solder bumps. It is necessary to flatten the tops of the solder bumps after singulating the wiring board. Therefore, the tops of the solder bumps must be individually flattened for each piece, and it is difficult to improve the production efficiency.

【0005】本発明は,かかる従来の問題点に鑑みてな
されたもので,実装する電子部品との接続性に優れたプ
リント配線板を,効率よく製造することができる,プリ
ント配線板の製造方法を提供しようとするものである。
SUMMARY OF THE INVENTION The present invention has been made in view of such a conventional problem, and a method of manufacturing a printed wiring board capable of efficiently manufacturing a printed wiring board having excellent connectivity with electronic components to be mounted. It is intended to provide.

【0006】[0006]

【課題の解決手段】請求項1に記載の発明は,配線基板
上における所望の複数の位置に半田ペーストを印刷した
後,該半田ペーストをリフローして,上記配線基板上に
複数の半田バンプを形成するに当り,上記半田ペースト
の上から,平坦面を有するフラッタニング治具の上記平
坦面を当接させた状態で,上記半田ペーストをリフロー
することにより,上記半田バンプの頂部を平坦化すると
共に,上記複数の半田バンプの頂部を略同一平面上に形
成することを特徴とするプリント配線板の製造方法にあ
る。
According to a first aspect of the present invention, after a solder paste is printed at a plurality of desired positions on a wiring board, the solder paste is reflowed to form a plurality of solder bumps on the wiring board. In forming the solder bump, the top of the solder bump is flattened by reflowing the solder paste while the flat surface of the flattening jig having a flat surface is in contact with the solder paste. In addition, there is provided a method of manufacturing a printed wiring board, wherein the tops of the plurality of solder bumps are formed on substantially the same plane.

【0007】本発明において最も注目すべきことは,半
田ペーストの上から,上記フラッタニング治具の平坦面
を当接させた状態で,上記半田ペーストをリフローする
ことである。
What is most notable in the present invention is that the solder paste is reflowed with the flat surface of the flattening jig abutting from above the solder paste.

【0008】次に,本発明の作用効果につき説明する。
本製造方法によれば,上記半田バンプの頂部が平坦化さ
れるため,上記プリント配線板に実装する電子部品との
接続面積が大きくなり,確実に接続することができる。
また,上記複数の半田バンプの頂部を略同一平面上に形
成することができるため,実装する電子部品の接続パッ
ドとの未接続を防ぐことができる。
Next, the function and effect of the present invention will be described.
According to the present manufacturing method, since the tops of the solder bumps are flattened, the connection area with the electronic components mounted on the printed wiring board is increased, and the connection can be reliably performed.
Further, since the tops of the plurality of solder bumps can be formed on substantially the same plane, it is possible to prevent the electronic components to be mounted from being disconnected from the connection pads.

【0009】そして,上記プリント配線板の製造方法に
おいては,半田ペーストの上から,上記フラッタニング
治具の平坦面を当接させた状態で,上記半田ペーストを
リフローする。これにより,軟化した上記半田ペースト
の頂部が,上記平坦面に沿って平坦化して,頂部が平坦
な半田バンプが形成される。
In the method of manufacturing a printed wiring board, the solder paste is reflowed from above the solder paste while the flat surface of the flattening jig is in contact with the solder paste. As a result, the top of the softened solder paste is flattened along the flat surface, and a solder bump having a flat top is formed.

【0010】このようにして,リフローの際に,上記半
田バンプの頂部を平坦化すると共に,上記複数の半田バ
ンプの頂部を略同一平面上に形成することができる。そ
のため,半田バンプの頂部を平坦化し,上記複数の半田
バンプの頂部を略同一平面上に形成するための工程を,
特別に設ける必要がない。それ故,生産効率に優れたプ
リント配線板の製造方法を得ることができる。
In this way, during the reflow, the tops of the solder bumps can be flattened and the tops of the plurality of solder bumps can be formed on substantially the same plane. Therefore, a step of flattening the tops of the solder bumps and forming the tops of the plurality of solder bumps on substantially the same plane is performed.
No special provision is required. Therefore, a method for manufacturing a printed wiring board having excellent production efficiency can be obtained.

【0011】また,上記製造方法によれば,シート状の
配線基板を個片化することなく,該シート状の配線基板
に形成された半田バンプの頂部の平坦化を一括してして
行うことができる。それ故,プリント配線板の生産効率
を大幅に向上させることができる。
Further, according to the above-described manufacturing method, the flattening of the tops of the solder bumps formed on the sheet-like wiring board is performed collectively without dividing the sheet-like wiring board into individual pieces. Can be. Therefore, the production efficiency of the printed wiring board can be greatly improved.

【0012】以上のごとく,本発明によれば,実装する
電子部品との接続性に優れたプリント配線板を,効率よ
く製造することができる,プリント配線板の製造方法を
提供することができる。
As described above, according to the present invention, it is possible to provide a method for manufacturing a printed wiring board which can efficiently manufacture a printed wiring board having excellent connectivity with electronic components to be mounted.

【0013】次に,請求項2に記載の発明のように,上
記フラッタニング治具は,リフロー時に,上記半田ペー
ストの上に載置しておくこともできる。この場合には,
上記フラッタニング治具の重量により,該フラッタニン
グ治具の平坦面を介して上記半田ペーストを押圧するこ
とができる。これにより,リフローにより軟化した上記
半田ペーストの頂部が,上記平坦面に沿って平坦化し,
複数の半田バンプの頂部が略同一平面上に形成される。
上記フラッタニング治具は,例えば,リフロー前に,上
記半田ペーストの上に,上記平坦面を当接させる状態で
載置し,その状態で,リフローさせることができる。そ
れ故,容易に,半田バンプの頂部の平坦化等を行うこと
ができる。
Next, as in the second aspect of the present invention, the flattening jig may be placed on the solder paste during reflow. In this case,
Due to the weight of the flattening jig, the solder paste can be pressed through the flat surface of the flattening jig. Thereby, the top of the solder paste softened by the reflow is flattened along the flat surface,
The tops of the plurality of solder bumps are formed on substantially the same plane.
For example, the flattening jig can be placed on the solder paste in a state where the flat surface is in contact with the solder paste before the reflow, and the reflow can be performed in that state. Therefore, the top of the solder bump can be easily flattened.

【0014】次に,請求項3に記載の発明のように,上
記フラッタニング治具は,リフロー時に,上記半田ペー
ストの方向へ向かって押圧されるものであってもよい。
例えば,機械的に,上記フラッタニング治具を半田ペー
ストの方向へ駆動させることにより,押圧することがで
きる。これにより,確実に,上記半田バンプの頂部の平
坦化等を行うことができる。
Next, the flattening jig may be pressed in the direction of the solder paste during reflow.
For example, the pressing can be performed by mechanically driving the flattening jig in the direction of the solder paste. As a result, the top of the solder bump can be reliably flattened.

【0015】[0015]

【発明の実施の形態】実施形態例1 本発明の実施形態例にかかるプリント配線板の製造方法
につき,図1〜図7を用いて説明する。本例のプリント
配線板1の製造方法においては,図1,図2に示すごと
く,配線基板10上における所望の複数の位置に半田ペ
ースト30を印刷した後,該半田ペースト30をリフロ
ーして,上記配線基板10上に複数の半田バンプ3を形
成する。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Embodiment 1 A method for manufacturing a printed wiring board according to an embodiment of the present invention will be described with reference to FIGS. In the method of manufacturing the printed wiring board 1 of the present embodiment, as shown in FIGS. 1 and 2, after solder paste 30 is printed at a plurality of desired positions on the wiring board 10, the solder paste 30 is reflowed. A plurality of solder bumps 3 are formed on the wiring board 10.

【0016】この半田バンプ3の形成に当り,図2
(C),(D)に示すごとく,上記半田ペースト30の
上から,平坦面41を有するフラッタニング治具4の上
記平坦面41を当接させた状態で,上記半田ペースト3
0をリフローする。これにより,図2(E)に示すごと
く,上記半田バンプ3の頂部31を平坦化すると共に,
上記複数の半田バンプ3の頂部31を略同一平面上に形
成する。
In forming the solder bump 3, FIG.
As shown in (C) and (D), the solder paste 3 is placed in a state where the flat surface 41 of the flattening jig 4 having the flat surface 41 is brought into contact with the solder paste 30 from above.
Reflow 0. Thereby, as shown in FIG. 2E, the top 31 of the solder bump 3 is flattened,
The tops 31 of the plurality of solder bumps 3 are formed on substantially the same plane.

【0017】即ち,まず,図1(A)に示すごとく,配
線基板10に,印刷用の開口部21を有するマスク2
を,位置合せして載置する。次いで,該マスク2の上面
22にクリーム状の半田ペースト30を供給し,該半田
ペースト30を,スキージによって押しつけながら上記
開口部21に充填する。次いで,図1(B)に示すごと
く,上記マスク2を配線基板10から離す。以上によ
り,上記配線基板10に半田ペースト30を印刷する。
First, as shown in FIG. 1A, a mask 2 having an opening 21 for printing is formed on a wiring board 10.
Is positioned and placed. Next, a creamy solder paste 30 is supplied to the upper surface 22 of the mask 2, and the solder paste 30 is filled in the opening 21 while being pressed by a squeegee. Next, as shown in FIG. 1B, the mask 2 is separated from the wiring board 10. As described above, the solder paste 30 is printed on the wiring board 10.

【0018】次いで,図2(C),(D)に示すごと
く,フラッタニング治具4を上記半田ペースト30の上
に載置して,リフローを行う。このとき,配線基板10
は,アルミニウム又はステンレス鋼等の金属板からなる
リフロー搬送治具51に載置されて搬送される。これに
より,リフロー中における配線基板10の反りの発生を
防止している。そして,リフロー後に,図2(E)に示
すごとく,上記フラッタニング治具4を取外す。これに
より,略同一平面上に平坦化された頂部31を有する複
数の半田バンプ3を得る。また,該フラッタニング治具
4は,周端部に,上記平坦面41から一定の長さだけ突
出した突出部42を有する。該突出部42は,上記平坦
面41が半田ペースト30を押圧した後,上記配線基板
10に当接する。
Next, as shown in FIGS. 2C and 2D, the fluttering jig 4 is placed on the solder paste 30 and reflow is performed. At this time, the wiring board 10
Is mounted and transported on a reflow transport jig 51 made of a metal plate such as aluminum or stainless steel. This prevents the occurrence of warpage of the wiring board 10 during reflow. Then, after the reflow, the fluttering jig 4 is removed as shown in FIG. As a result, a plurality of solder bumps 3 having the top portions 31 which are flattened on substantially the same plane are obtained. Further, the flattening jig 4 has a protruding portion 42 protruding from the flat surface 41 by a predetermined length at a peripheral end portion. The protrusion 42 contacts the wiring board 10 after the flat surface 41 presses the solder paste 30.

【0019】以下に,より具体的な,本例のプリント配
線板1の製造方法につき,図3〜図7を用いて詳細に説
明する。 A.層間樹脂絶縁層用樹脂フィルムの作製 ビスフェノールA型エポキシ樹脂(エポキシ当量46
9,油化シェルエポキシ社製,エピコート1001)3
0重量部,クレゾールノボラック型エポキシ樹脂(エポ
キシ当量215,大日本インキ化学工業社製,エピクロ
ンN−673)40重量部,トリアジン構造含有フェノ
ールノボラック樹脂(フェノール性水酸基当量120,
大日本インキ化学工業社製,フェノライトKA−705
2)30重量部をエチルジグリコールアセテート20重
量部,ソルベントナフサ20重量部に撹拌しながら加熱
溶解させ,そこへ末端エポキシ化ポリブタジエンゴム
(ナガセ化成工業社製,デナレックスR−45EPT)
15重量部と2−フェニル−4,5−ビス(ヒドロキシ
メチル)イミダゾール粉砕品1.5重量部,微粉砕シリ
カ2重量部,シリコン系消泡剤0.5重量部を添加しエ
ポキシ樹脂組成物を調製した。得られたエポキシ樹脂組
成物を厚さ38μmのPETフィルム上に乾燥後の厚さ
が50μmとなるようにロールコーターを用いて塗布し
た後,80〜120℃で10分間乾燥させることによ
り,層間樹脂絶縁層用樹脂フィルムを作製した。
Hereinafter, a more specific method for manufacturing the printed wiring board 1 of the present embodiment will be described in detail with reference to FIGS. A. Preparation of Resin Film for Interlayer Resin Insulation Layer Bisphenol A type epoxy resin (Epoxy equivalent 46
9. Yuka Shell Epoxy Co., Epicoat 1001) 3
0 parts by weight, 40 parts by weight of a cresol novolak type epoxy resin (epoxy equivalent: 215, manufactured by Dainippon Ink and Chemicals, Inc., Epicron N-673), triazine structure-containing phenol novolak resin (phenolic hydroxyl group equivalent: 120,
FENOLITE KA-705 manufactured by Dainippon Ink and Chemicals, Inc.
2) 30 parts by weight were dissolved by heating in 20 parts by weight of ethyl diglycol acetate and 20 parts by weight of solvent naphtha while stirring, and epoxidized polybutadiene rubber (Denalex R-45EPT manufactured by Nagase Kasei Kogyo Co., Ltd.) was added thereto.
15 parts by weight, 1.5 parts by weight of a pulverized product of 2-phenyl-4,5-bis (hydroxymethyl) imidazole, 2 parts by weight of finely divided silica, and 0.5 part by weight of a silicone-based antifoaming agent were added to the epoxy resin composition. Was prepared. The obtained epoxy resin composition is applied on a 38 μm-thick PET film using a roll coater so that the thickness after drying becomes 50 μm, and then dried at 80 to 120 ° C. for 10 minutes to obtain an interlayer resin. A resin film for an insulating layer was produced.

【0020】B.貫通孔充填用樹脂組成物の調製 ビスフェノールF型エポキシモノマー(油化シェル社
製,分子量:310,YL983U)100重量部,表
面にシランカップリング剤がコーティングされた平均粒
径が1.6μmで,最大粒子の直径が15μm以下のS
iO2球状粒子(アトテック社製,CRS1101−C
E)72重量部およびレベリング剤(サンノプコ社製,
ペレノールS4)1.5重量部を容器にとり,撹拌混合
することにより,その粘度が25±1℃で30〜80P
a・sの樹脂充填材を調製した。なお,硬化剤として,
イミダゾール硬化剤(四国化成社製,2E4MZ−C
N)6.5重量部を用いた。
B. Preparation of Resin Composition for Filling Through Holes 100 parts by weight of a bisphenol F-type epoxy monomer (manufactured by Yuka Shell Co., molecular weight: 310, YL983U), an average particle diameter of which surface is coated with a silane coupling agent is 1.6 μm, S whose maximum particle diameter is 15 μm or less
iO 2 spherical particles (Atotech Co., Ltd., CRS1101-C
E) 72 parts by weight and a leveling agent (manufactured by San Nopco,
Perenol S4) Put 1.5 parts by weight in a container, and stir and mix the mixture so that its viscosity is 30-80P at 25 ± 1 ° C.
a · s resin filler was prepared. In addition, as a curing agent,
Imidazole curing agent (2E4MZ-C manufactured by Shikoku Kasei Co., Ltd.)
N) 6.5 parts by weight were used.

【0021】C.プリント配線板の製造方法 (1)厚さ0.8mmのガラスエポキシ樹脂またはBT
(ビスマレイミドトリアジン)樹脂からなるシート状の
樹脂基板11の両面に18μmの銅箔118がラミネー
トされている銅張積層板を出発材料とした(図3(a)
参照)。まず,この銅張積層板をドリル削孔し,無電解
めっき処理を施し,パターン状にエッチングすることに
より,樹脂基板11の両面に下層導体回路14とスルー
ホール19を形成した。なお,以下において「基板」と
いうときは,特に示さない限り,当該時点において得ら
れている状態の中間製造物をいうものとする。
C. Method for manufacturing printed wiring board (1) 0.8 mm thick glass epoxy resin or BT
A starting material is a copper-clad laminate in which 18 μm copper foils 118 are laminated on both surfaces of a sheet-shaped resin substrate 11 made of (bismaleimide triazine) resin (FIG. 3A).
reference). First, the copper-clad laminate was drilled, subjected to an electroless plating treatment, and etched in a pattern to form a lower conductor circuit 14 and a through hole 19 on both surfaces of the resin substrate 11. In the following, the term “substrate” refers to an intermediate product obtained at that time unless otherwise indicated.

【0022】(2)スルーホール19および下層導体回
路14を形成した基板を水洗いし,乾燥した後,NaO
H(10g/l),NaClO2(40g/l),Na8
PO4(6g/l)を含む水溶液を黒化浴(酸化浴)と
する黒化処理,および,NaOH(10g/l),Na
BH4(6g/l)を含む水溶液を還元浴とする還元処
理を行い,そのスルーホール19を含む下層導体回路1
4の全表面に粗化面14a,19aを形成した(図3
(b)参照)。
(2) The substrate on which the through hole 19 and the lower conductor circuit 14 are formed is washed with water and dried,
H (10 g / l), NaClO 2 (40 g / l), Na 8
A blackening treatment using an aqueous solution containing PO 4 (6 g / l) as a blackening bath (oxidizing bath), NaOH (10 g / l), Na
A reduction treatment is performed using an aqueous solution containing BH 4 (6 g / l) as a reduction bath, and the lower conductor circuit 1 including the through hole 19 is subjected to a reduction treatment.
Roughened surfaces 14a and 19a were formed on the entire surface of FIG.
(B)).

【0023】(3)次に,上記Bに記載した貫通孔充填
用樹脂組成物を調製した後,下記の方法により調整後2
4時間以内に,スルーホール19内,および基板11の
片面の導体回路非形成部と導体回路14の外縁部とに樹
脂充填材18の層を形成した。即ち,まず,スキージを
用いてスルーホール内に貫通孔充填用樹脂組成物を押し
込んだ後,100℃,20分の条件で乾燥させた。次
に,導体回路非形成部に相当する部分が開口したマスク
を基板上に載置し,スキージを用いて凹部となっている
導体回路非形成部に樹脂充填材18の層を形成し,10
0℃,20分の条件で乾燥させた(図3(c)参照)。
(3) Next, after preparing the resin composition for filling through holes described in B above, the resin composition was adjusted by the following method.
Within four hours, a layer of the resin filler 18 was formed in the through-hole 19 and on the non-conductive-circuit-formed portion on one side of the substrate 11 and the outer edge of the conductive circuit 14. That is, first, the resin composition for filling the through hole was pushed into the through hole using a squeegee, and then dried at 100 ° C. for 20 minutes. Next, a mask having an opening corresponding to the portion where the conductive circuit is not formed is placed on the substrate, and a layer of the resin filler 18 is formed in the portion where the conductive circuit is not formed using the squeegee.
It was dried at 0 ° C. for 20 minutes (see FIG. 3C).

【0024】(4)上記(3)の処理を終えた基板の片
面を,#600のベルト研磨紙(三共理化学製)を用い
たベルトサンダー研磨により,下層導体回路14の表面
やスルーホール19のランド表面に樹脂充填材18が残
らないように研磨し,次いで,上記ベルトサンダー研磨
による傷を取り除くためのバフ研磨を行った。このよう
な一連の研磨を基板の他方の面についても同様に行っ
た。次いで,100℃で1時間,150℃で1時間の加
熱処理を行って樹脂充填材18を硬化させた。
(4) One surface of the substrate after the treatment of the above (3) is subjected to belt sander polishing using # 600 belt polishing paper (manufactured by Sankyo Rikagaku Co., Ltd.) to form the surface of the lower conductor circuit 14 and the through hole 19. Polishing was performed so that the resin filler 18 did not remain on the land surface, and then buffing was performed to remove scratches caused by the belt sander polishing. Such a series of polishing was similarly performed on the other surface of the substrate. Next, a heat treatment was performed at 100 ° C. for 1 hour and at 150 ° C. for 1 hour to cure the resin filler 18.

【0025】このようにして,スルーホール19や導体
回路非形成部に形成された樹脂充填材18の表層部およ
び下層導体回路14の表面を平坦化し,樹脂充填材18
と下層導体回路14の側面とが粗化面14aを介して強
固に密着し,またスルーホール19の内壁面と樹脂充填
材18とが粗化面19aを介して強固に密着した絶縁性
基板を得た(図3(d)参照)。即ち,この工程によ
り,樹脂充填材18の表面と下層導体回路14の表面が
同一平面となる。
In this manner, the surface layer of the resin filler 18 formed in the through-hole 19 and the portion where the conductor circuit is not formed and the surface of the lower-layer conductor circuit 14 are flattened.
And an insulating substrate in which the inner wall surface of the through hole 19 and the resin filler 18 are firmly adhered to each other through the roughened surface 19a. (See FIG. 3 (d)). That is, by this step, the surface of the resin filler 18 and the surface of the lower conductive circuit 14 become flush with each other.

【0026】(5)上記基板を水洗,酸性脱脂した後,
ソフトエッチングし,次いで,エッチング液を基板の両
面にスプレイで吹きつけて,下層導体回路14の表面と
スルーホール19のランド表面と内壁とをエッチングす
ることにより,下層導体回路14の全表面に粗化面14
a,19aを形成した(図4(a)参照)。なお,エッ
チング液としては,イミダゾール鋼(II)錯体10重
量部,グリコール酸7重量部,塩化カリウム5重量部か
らなるエッチング液(メック社製,メックエッチボン
ド)を使用した。
(5) After the above substrate is washed with water and acid degreased,
Soft etching is performed, and then an etching solution is sprayed onto both surfaces of the substrate to etch the surface of the lower conductor circuit 14 and the land surface and the inner wall of the through hole 19, so that the entire surface of the lower conductor circuit 14 is roughened. Surface 14
a, 19a were formed (see FIG. 4A). As an etching solution, an etching solution (Mec etch bond, manufactured by Mec Co.) consisting of 10 parts by weight of imidazole steel (II) complex, 7 parts by weight of glycolic acid, and 5 parts by weight of potassium chloride was used.

【0027】(6)上記Aで作製した,基板より少し大
きめの層間樹脂絶縁層用樹脂フィルムを,基板の両面に
配置し,圧力0.4MPa,温度80℃,圧着時間10
秒の条件で仮圧着して裁断した。そして,さらに,以下
の方法により真空ラミネーター装置を用いて,上記層間
樹脂絶縁層用フィルムを基板に張り付け,その後,熱硬
化させることにより層間樹脂絶縁層12を形成した(図
4(b)参照)。すなわち,層間樹脂絶縁層用樹脂フィ
ルムを基板上に,真空度67Pa,圧力0.4MPa,
温度80℃,圧着時間60秒の条件で本圧着して張り付
け,その後,170℃で30分間熱硬化させた。
(6) The resin film for the interlayer resin insulating layer slightly larger than the substrate prepared in the above A was placed on both sides of the substrate, and the pressure was 0.4 MPa, the temperature was 80 ° C., and the pressing time was 10 minutes.
The sheet was temporarily pressed and cut under the condition of seconds. Further, the interlayer resin insulating layer film was adhered to the substrate using a vacuum laminator apparatus by the following method, and then thermally cured to form an interlayer resin insulating layer 12 (see FIG. 4B). . That is, a resin film for an interlayer resin insulation layer is placed on a substrate, with a degree of vacuum of 67 Pa, a pressure of 0.4 MPa,
At the temperature of 80 ° C. and the pressing time of 60 seconds, the main bonding was performed, followed by bonding, followed by thermosetting at 170 ° C. for 30 minutes.

【0028】(7)次に,層間樹脂絶縁層12上に,厚
さ1.2mmの貫通孔が形成されたマスクを介して,波
長10.4μmのCO8ガスレーザにて,ビーム径4.
0mm,トップハットモード,パルス幅8.0μ秒,マ
スクの貫通孔の径1.0mm,1ショットの条件で層間
樹脂絶縁層12に,直径75μmのバイアホール用開口
16を形成した(図4(c)参照)。
(7) Next, through a mask having a through hole having a thickness of 1.2 mm formed on the interlayer resin insulating layer 12, a CO 8 gas laser having a wavelength of 10.4 μm is used.
Via hole 16 having a diameter of 75 μm was formed in interlayer resin insulation layer 12 under the conditions of 0 mm, top hat mode, pulse width of 8.0 μsec, diameter of through hole of mask of 1.0 mm, and one shot (FIG. 4 ( c)).

【0029】(8)さらに,バイアホール用開口16を
形成した基板を,60g/lの過マンガン酸を含む80
℃の溶液に10分間浸漬し,層間樹脂絶縁層12の表面
に存在するエポキシ樹脂粒子を溶解除去した。これによ
り,バイアホール用開口16の内壁を含む層間樹脂絶縁
層12の表面を粗面とした(図4(d)参照)。
(8) Further, the substrate in which the via hole opening 16 is formed is washed with 80 g of permanganic acid containing 60 g / l.
The substrate was immersed in a solution at 10 ° C. for 10 minutes to dissolve and remove the epoxy resin particles present on the surface of the interlayer resin insulating layer 12. Thereby, the surface of the interlayer resin insulating layer 12 including the inner wall of the via hole opening 16 was roughened (see FIG. 4D).

【0030】(9)次に,上記処理を終えた基板を,中
和溶液(シプレイ社製)に浸漬してから水洗いした。さ
らに,粗面化処理(粗化深さ3μm)した該基板の表面
に,パラジウム触媒(アトテック社製)を付与すること
により,層間樹脂絶縁層12の表面およびバイアホール
用開口16の内壁面に触媒核を付着させた。
(9) Next, the substrate after the above treatment was immersed in a neutralizing solution (manufactured by Shipley) and washed with water. Further, by applying a palladium catalyst (manufactured by Atotech) to the surface of the substrate subjected to the surface roughening treatment (roughening depth: 3 μm), the surface of the interlayer resin insulating layer 12 and the inner wall surface of the via hole opening 16 are formed. Catalyst nuclei were deposited.

【0031】(10)次に,以下の組成の無電解銅めっ
き水溶液中に基板を浸漬して,粗面全体に厚さ0.6〜
3.0μmの無電解銅めっき層112を形成した(図5
(a)参照)。 〔無電解めっき水溶液〕 NiS04 0.003 mol/l 酒石酸 0.200 mol/l 硫酸銅 0.030 mol/l HCHO 0.050 mol/l NaOH 0.100 mol/l α,α’−ビピリジル 40 mg/l ポリエチレングリコール(PEG) 0.10 g/l 〔無電解めっき条件〕 35℃の液温度で40分
(10) Next, the substrate is immersed in an aqueous solution of electroless copper plating having the following composition, and a thickness of 0.6 to
A 3.0 μm electroless copper plating layer 112 was formed (FIG. 5).
(A)). [Aqueous electroless plating solution] NiS04 0.003 mol / l tartaric acid 0.200 mol / l copper sulfate 0.030 mol / l HCHO 0.050 mol / l NaOH 0.100 mol / l α, α'-bipyridyl 40 mg / L Polyethylene glycol (PEG) 0.10 g / l [Electroless plating conditions] 40 minutes at a liquid temperature of 35 ° C

【0032】(11)市販の感光性ドライフィルムを無
電解銅めっき層112に貼り付け,マスクを載置して,
100mJ/cm2で露光し,0.8%炭酸ナトリウム
水溶液で現像処理することにより,厚さ20μmのめっ
きレジスト13を設けた(図5(b)参照)。
(11) A commercially available photosensitive dry film is attached to the electroless copper plating layer 112, and a mask is placed thereon.
Exposure was performed at 100 mJ / cm 2 , and development processing was performed with a 0.8% aqueous sodium carbonate solution to provide a plating resist 13 having a thickness of 20 μm (see FIG. 5B).

【0033】(12)次いで,基板を50℃の水で洗浄
して脱脂し,25℃の水で水洗後,さらに硫酸で洗浄し
てから,以下の条件で電解飼めっきを施し,電解銅めっ
き層113を形成した(図5(c)参照)。 〔電解めっき水溶液〕 硫酸 2.24mol/l 硫酸銅 0.26mol/l 添加剤 19.5ml/l (アトテックジャパン社製,カパラシドHL) 〔電解めっき条件〕 電流密度 1A/dm2 時間 65分 温度 22±2℃
(12) Next, the substrate is washed with 50 ° C. water.
Degreased, washed with water at 25 ° C, and further washed with sulfuric acid.
And then apply electrolytic plating under the following conditions to
A layer 113 was formed (see FIG. 5C). [Aqueous electrolytic plating solution] Sulfuric acid 2.24 mol / l Copper sulfate 0.26 mol / l Additive 19.5 ml / l (Atotech Japan, Capparaside HL) [Electroplating conditions] Current density 1 A / dmTwo  Time 65 minutes Temperature 22 ± 2 ℃

【0034】(13)さらに,めっきレジスト13を5
%NaOH水溶液で剥離除去した後,そのめっきレジス
ト13下の無電解めっき層112を硫酸と過酸化水素の
混合液でエッチング処理して溶解除去し,無電解銅めっ
き層112と電解めっき層113からなる厚さ18μm
の独立の上層導体回路15(バイアホール17を含む)
とした(図5(d)参照)。
(13) Further, the plating resist 13 is
Then, the electroless plating layer 112 under the plating resist 13 is dissolved and removed by etching with a mixed solution of sulfuric acid and hydrogen peroxide, and the electroless plating layer 112 is removed from the electroless copper plating layer 112 and the electrolytic plating layer 113. 18μm thick
Independent upper layer conductor circuit 15 (including via hole 17)
(See FIG. 5D).

【0035】(14)上記(5)〜(13)の工程を繰
り返すことにより,さらに,上層の層間樹脂絶縁層12
と上層の導体回路15(バイアホール17を含む)を形
成した(図6(a)〜図7(a)参照)。その後,上記
上層の導体回路15の表面にエッチング液を用いて粗化
面を形成した。なお,エッチング液としては,メック社
製,メックエッチボンドを使用した(図7(b)参
照)。
(14) By repeating the above steps (5) to (13), the upper interlayer resin insulation layer 12
And the upper layer conductive circuit 15 (including the via hole 17) was formed (see FIGS. 6A to 7A). Thereafter, a roughened surface was formed on the surface of the upper conductive circuit 15 using an etchant. As an etchant, Mech etch bond manufactured by Mec Co. was used (see FIG. 7B).

【0036】(15)次に,ジエチレングリコールジメ
チルエーテル(DMDG)に60重量%の濃度になるよ
うに溶解させた,クレゾールノボラック型エポキシ樹脂
(日本化薬社製)のエポキシ基50%をアクリル化した
感光性付与のオリゴマー(分子量:4000)46.6
7重量部,メチルエチルケトンに溶解させた80重量%
のビスフェノールA型エポキシ樹脂(油化シェル社製,
商品名:エピコート1001)15.0重量部,イミダ
ゾール硬化剤(四国化成社製,商品名:2E4MZ−C
N)1.6重量部,感光性モノマーである多価アクリル
モノマー(日本化薬社製,商品名:R604)3.0重
量部,同じく多価アクリルモノマー(共栄化学社製,商
品名:DPE6A)1.5重量部,分散系消泡剤(サン
ノプコ社製,S−65)0.71重量部を容器にとり,
撹拌,混合して混合組成物を調製した。この混合組成物
に対して光重合開始剤としてベンゾフェノン(関東化学
社製)2.0重量部,光増感剤としてのミヒラーケトン
(関東化学社製)0.2重量部を加え,粘度を25℃で
2.0Pa・sに調整したソルダーレジスト組成物を得
た。なお,粘度測定は,B型粘度計(東京計器社製,D
VL−B型)で60min -1(rpm)の場合はロータ
ーNo.4,6min-1(rpm)の場合はローターN
o.3によった。
(15) Next, diethylene glycol dime
60% by weight in chill ether (DMDG)
Cresol novolak type epoxy resin
(Nippon Kayaku Co., Ltd.) acrylated 50% of epoxy groups
Oligomers for imparting photosensitivity (molecular weight: 4000) 46.6
7 parts by weight, 80% by weight dissolved in methyl ethyl ketone
Bisphenol A type epoxy resin (Yukaka Shell Co., Ltd.
Product name: Epicoat 1001) 15.0 parts by weight, Imida
Sol curing agent (Shikoku Chemicals, trade name: 2E4MZ-C
N) 1.6 parts by weight, polyvalent acrylic which is a photosensitive monomer
Monomer (Nippon Kayaku Co., Ltd., trade name: R604) 3.0
Amount, polyvalent acrylic monomer (manufactured by Kyoei Chemical Co., Ltd.
Product name: DPE6A) 1.5 parts by weight, dispersion defoamer (Sun
0.71 part by weight of Nopco, S-65)
The mixture was stirred and mixed to prepare a mixed composition. This mixed composition
Benzophenone (Kanto Chemical)
2.0 parts by weight, Michler's ketone as photosensitizer
Add 0.2 parts by weight (manufactured by Kanto Chemical Co.) and adjust the viscosity at 25 ° C.
Obtain solder resist composition adjusted to 2.0 Pa · s
Was. The viscosity was measured using a B-type viscometer (Tokyo Keiki Co., Ltd., D
VL-B type) 60 min -1(Rpm) for rotor
-No. 4,6min-1(Rpm) for rotor N
o. According to 3.

【0037】(16)次に,上記(14)までの工程に
より得られた多層基板100(図7(b))の両面に,
上記ソルダーレジスト組成物を20μmの厚さで塗布
し,70℃で20分間,70℃で30分間の条件で乾燥
処理を行った。その後,半田パッドのパターンが描画さ
れた厚さ5mmのフォトマスクをソルダーレジスト層に
密着させて1000mJ/cm2の紫外線で露光し,D
MTG溶液で現像処理し,直径90μmの開口を形成し
た。そして,さらに,80℃で1時間,100℃で1時
間,120℃で1時間,150℃で3時間の条件でそれ
ぞれ加熱処理を行ってソルダーレジスト層を硬化させ
た。これにより,半田バンプ形成用の開口部を有し,そ
の厚さが20μmのソルダーレジスト層114を形成し
た。なお,上記ソルダーレジスト組成物としては,市販
のソルダーレジスト組成物を使用することもできる。
(16) Next, on both surfaces of the multilayer substrate 100 (FIG. 7B) obtained by the steps up to (14),
The solder resist composition was applied in a thickness of 20 μm, and dried at 70 ° C. for 20 minutes and at 70 ° C. for 30 minutes. After that, a 5 mm-thick photomask on which the pattern of the solder pad is drawn is brought into close contact with the solder resist layer, and is exposed to ultraviolet light of 1000 mJ / cm 2.
The film was developed with an MTG solution to form an opening having a diameter of 90 μm. Further, the solder resist layer was cured by performing heat treatment at 80 ° C. for 1 hour, 100 ° C. for 1 hour, 120 ° C. for 1 hour, and 150 ° C. for 3 hours. Thus, a solder resist layer 114 having an opening for forming a solder bump and having a thickness of 20 μm was formed. In addition, a commercially available solder resist composition can be used as the solder resist composition.

【0038】(17)次に,過硫酸ナトリウムを主成分
とするエッチング液を,そのエッチング能が毎分2μm
程度になるように調製し,このエッチング液中にソルダ
ーレジスト層114が形成された基板を1分間浸漬し,
導体回路表面に平均粗度(Ra)が1μm以下の粗化面
を形成した。さらに,この基板を,塩化ニッケル(2.
3×10-1mol/l),次亜リン酸ナトリウム(2.
8×10-1mol/l),クエン酸ナトリウム(1.6
×10-1mol/l)を含むpH=4.5の無電解ニッ
ケルめっき液に20分間浸漬して,上記開口部に厚さ5
μmのニッケルめっき層115を形成した。さらに,そ
の基板をシアン化金カリウム(7.6×10-3mol/
l),塩化アンモニウム(1.9×10-1mol/
l),クエン酸ナトリウム(1.2×10-1mol/
l),次亜リン酸ナトリウム(1.7×10-1mol/
l)を含む無電解金めっき液に80℃の条件で7.5分
間浸漬して,ニッケルめっき層115上に,厚さ0.0
3μmの金めっき層116を形成し,半田パッドとし
た。以上により,半田パッドを有するシート状の多層の
配線基板10を得た。
(17) Next, an etching solution containing sodium persulfate as a main component was used, and its etching ability was 2 μm / min.
The substrate on which the solder resist layer 114 has been formed is immersed in this etching solution for 1 minute.
A roughened surface having an average roughness (Ra) of 1 μm or less was formed on the surface of the conductor circuit. Further, this substrate was coated with nickel chloride (2.
3 × 10 -1 mol / l), sodium hypophosphite (2.
8 × 10 -1 mol / l), sodium citrate (1.6
× 10 -1 mol / l) and immersed in an electroless nickel plating solution having a pH of 4.5 and having a pH of 4.5 for 20 minutes.
A μm nickel plating layer 115 was formed. Further, the substrate was treated with potassium potassium cyanide (7.6 × 10 −3 mol / mol).
l), ammonium chloride (1.9 × 10 −1 mol /
l), sodium citrate (1.2 × 10 -1 mol /
l), sodium hypophosphite (1.7 × 10 −1 mol /
1) is immersed for 7.5 minutes at 80 ° C. in an electroless gold plating solution containing
A 3 μm gold plating layer 116 was formed to form a solder pad. Thus, a sheet-shaped multilayer wiring board 10 having solder pads was obtained.

【0039】(18)この後,ソルダーレジスト層11
4上に,全ての半田バンプ形成用開口に対向する部分に
直径100μmの開口を有するマスクを載置し,ピスト
ン式圧入型印刷機を用いて,凹形状の半田バンプ形成用
開口内に半田ペーストを完全に充填した。なお,ここで
充填した半田ぺーストは,Sn:Agを重量比96.
5:3.5で配合させた主として粒径5〜20μmの半
田を含むもので,その粘度を200Pa・sに調整した
ものである。
(18) Thereafter, the solder resist layer 11
4, a mask having an opening having a diameter of 100 μm is placed on a portion opposed to all the openings for forming solder bumps, and the solder paste is inserted into the concave openings for forming solder bumps by using a press-fit type press. Was completely filled. The solder paste filled here was Sn: Ag in a weight ratio of 96.
5: 3.5 mainly containing solder having a particle size of 5 to 20 μm, the viscosity of which was adjusted to 200 Pa · s.

【0040】(19)次に,上記(18)の工程で充填
した半田ぺーストのうち,ソルダーレジスト層114の
表面より盛り上がった部分の半田ぺーストをステンレス
製のスキージ又は硬度90°の平ゴムスキージを用いて
除去することにより,充填した半田ペーストの表面を平
坦化するとともに,半田ペーストの表面とソルダーレジ
スト層の表面とを同一平面にした。
(19) Next, of the solder paste filled in the step (18), a portion of the solder paste which is raised from the surface of the solder resist layer 114 is replaced with a stainless steel squeegee or a 90 ° hardness flat rubber squeegee. Then, the surface of the filled solder paste was flattened, and the surface of the solder paste and the surface of the solder resist layer were made flush with each other.

【0041】(20)次に,ソルダーレジスト層114
上に,上記(18)の工程で用いたマスクと同様のマス
クを載置し,半田ペーストを印刷した。なお,ここで充
填した半田ペーストは,Sn:Agを重量比96.5:
3.5で配合させた主として粒径5〜20μmの半田を
含むもので,その粘度を250Pa・sに調整したもの
である。
(20) Next, the solder resist layer 114
A mask similar to the mask used in the step (18) was placed on the top, and solder paste was printed. The solder paste filled here was Sn: Ag in a weight ratio of 96.5:
It mainly contains solder having a particle size of 5 to 20 μm and is adjusted to have a viscosity of 250 Pa · s.

【0042】(21)その後,上記半田ペーストの上か
ら,フラッタニング治具の平坦面を当接させた状態で,
上記(18)〜(20)の工程で印刷した半田ペースト
を約250℃でリフローし(図2(C),(D)参
照),さらに,フラックス洗浄を行った。これにより,
上記半田バンプ3の頂部31を平坦化すると共に,上記
複数の半田バンプ3の頂部31を略同一平面上に形成し
た。以上により,半田バンプ3を備えた多層のプリント
配線板1を得た(図7(c)参照)。そして,該プリン
ト配線板1を個片化することにより,多数のピース状の
プリント配線板を得た。
(21) Thereafter, the flat surface of the flattening jig is brought into contact with the solder paste from above,
The solder paste printed in the steps (18) to (20) was reflowed at about 250 ° C. (see FIGS. 2C and 2D), and further, flux cleaning was performed. This gives
The tops 31 of the solder bumps 3 were flattened, and the tops 31 of the plurality of solder bumps 3 were formed on substantially the same plane. Thus, a multilayer printed wiring board 1 provided with the solder bumps 3 was obtained (see FIG. 7C). Then, the printed wiring board 1 was divided into individual pieces to obtain a large number of piece-shaped printed wiring boards.

【0043】次に,本例の作用効果につき説明する。本
製造方法によれば,上記半田バンプ3の頂部31が平坦
化されるため,上記プリント配線板1に実装する電子部
品との接続面積が大きくなり,確実に接続することがで
きる。また,上記複数の半田バンプ3の頂部31を略同
一平面上に形成することができるため,実装する電子部
品の接続パッドとの未接続を防ぐことができる。
Next, the operation and effect of this embodiment will be described. According to this manufacturing method, since the top portions 31 of the solder bumps 3 are flattened, the connection area with the electronic component mounted on the printed wiring board 1 is increased, and the connection can be reliably performed. Further, since the top portions 31 of the plurality of solder bumps 3 can be formed on substantially the same plane, it is possible to prevent the electronic components to be mounted from being disconnected from connection pads.

【0044】そして,上記プリント配線板1の製造方法
においては,半田ペースト30の上から,上記フラッタ
ニング治具4の平坦面41を当接させた状態で,上記半
田ペースト30をリフローする(図2(C),
(D))。これにより,図2(D)に示すごとく,軟化
した上記半田ペースト30の頂部31が,上記平坦面4
1に沿って平坦化して,図2(E)に示すごとく,頂部
31が平坦な半田バンプ3が形成される。
In the method of manufacturing the printed wiring board 1, the solder paste 30 is reflowed from above the solder paste 30 while the flat surface 41 of the flattening jig 4 is in contact with the solder paste 30 (FIG. 2 (C),
(D)). As a result, as shown in FIG. 2D, the top 31 of the softened solder paste 30 is
2E, the solder bumps 3 having a flat top 31 are formed as shown in FIG.

【0045】このようにして,リフローの際に,上記半
田バンプ3の頂部31を平坦化すると共に,上記複数の
半田バンプ3の頂部31を略同一平面上に形成すること
ができる。そのため,半田バンプ3の頂部31を平坦化
し,上記複数の半田バンプ3の頂部31を略同一平面上
に形成するための工程を,特別に設ける必要がない。そ
れ故,生産効率に優れたプリント配線板1の製造方法を
得ることができる。
In this way, during reflow, the tops 31 of the solder bumps 3 can be flattened and the tops 31 of the plurality of solder bumps 3 can be formed on substantially the same plane. Therefore, there is no need to provide a special step of flattening the tops 31 of the solder bumps 3 and forming the tops 31 of the plurality of solder bumps 3 on substantially the same plane. Therefore, a method for manufacturing the printed wiring board 1 having excellent production efficiency can be obtained.

【0046】また,上記製造方法によれば,シート状の
配線基板10を個片化することなく,該シート状の配線
基板10に形成された半田バンプ3の頂部31の平坦化
を一括してして行うことができる。それ故,プリント配
線板1の生産効率を大幅に向上させることができる。
Further, according to the above-described manufacturing method, the flattening of the top portions 31 of the solder bumps 3 formed on the sheet-like wiring board 10 is performed without dividing the sheet-like wiring board 10 into individual pieces. You can do it. Therefore, the production efficiency of the printed wiring board 1 can be greatly improved.

【0047】また,図2(C)に示すごとく,上記フラ
ッタニング治具4は,リフロー時に,上記半田ペースト
30の上に載置しておく。これにより,上記フラッタニ
ング治具4の重量により,該フラッタニング治具4の平
坦面41を介して上記半田ペースト30を押圧すること
ができる。そのため,リフローにより軟化した上記半田
ペースト30の頂部310が,上記平坦面41に沿って
平坦化し,複数の半田バンプ3の頂部31が略同一平面
上に形成される(図2(D),(E))。また,上記フ
ラッタニング治具4は,リフロー前に,上記半田ペース
ト30の上に載置すればよいため,容易に,半田バンプ
3の頂部31の平坦化等を行うことができる。
As shown in FIG. 2C, the fluttering jig 4 is placed on the solder paste 30 during reflow. Accordingly, the solder paste 30 can be pressed by the weight of the flattening jig 4 via the flat surface 41 of the flattening jig 4. Therefore, the top 310 of the solder paste 30 softened by reflow is flattened along the flat surface 41, and the tops 31 of the plurality of solder bumps 3 are formed on substantially the same plane (FIGS. 2D and 2D). E)). In addition, since the flattening jig 4 may be placed on the solder paste 30 before reflow, the top 31 of the solder bump 3 can be easily flattened.

【0048】また,図2(D)に示すごとく,上記フラ
ッタニング治具4に設けられた突出部42は,上記平坦
面41が半田ペースト30を押圧した後,上記配線基板
10に当接する。そして,上記突出部42の突出長さは
一定である。そのため,上記平坦面41と配線基板10
との間には一定の幅の空間が確保される。それ故,上記
半田バンプ3の頂部31は,確実に,上記配線基板10
と平行な平面上に,平坦化されて形成される。
As shown in FIG. 2D, the projection 42 provided on the flattening jig 4 comes into contact with the wiring board 10 after the flat surface 41 presses the solder paste 30. The length of the protrusion 42 is constant. Therefore, the flat surface 41 and the wiring board 10
A space with a certain width is secured between the two. Therefore, the top 31 of the solder bump 3 is securely connected to the wiring board 10.
And formed on a plane parallel to

【0049】以上のごとく,本例によれば,実装する電
子部品との接続性に優れたプリント配線板を,効率よく
製造することができる,プリント配線板の製造方法を提
供することができる。
As described above, according to this embodiment, it is possible to provide a method of manufacturing a printed wiring board, which can efficiently manufacture a printed wiring board having excellent connectivity with electronic components to be mounted.

【0050】実施形態例2 本例は,図8に示すごとく,フラッタニング治具4を,
リフロー時に,半田ペースト30の方向へ向かって押圧
する,プリント配線板の製造方法の例である。即ち,図
8(A),(B)に示すごとく,リフロー時に,機械的
に,上記フラッタニング治具40を半田ペースト30の
方向(図8(A)の矢印A)へ駆動させる。
Embodiment 2 In this embodiment, as shown in FIG.
This is an example of a method for manufacturing a printed wiring board in which the solder is pressed toward the solder paste 30 during reflow. That is, as shown in FIGS. 8A and 8B, at the time of reflow, the flattening jig 40 is mechanically driven in the direction of the solder paste 30 (arrow A in FIG. 8A).

【0051】なお,上記フラッタニング治具40は,表
面にクロムめっきが形成されたステンレス鋼板からな
る。また,上記フラッタニング治具40には,突出部は
設けられていない。また,配線基板10は,ステンレス
鋼よりなるサポート治具52に載置されている。その他
は,実施形態例1と同様である。これにより,確実に,
上記半田バンプ3の頂部31の平坦化等を行うことがで
きる。その他,実施形態例1と同様の作用効果を有す
る。
The flattening jig 40 is made of a stainless steel plate having a chromium plating formed on the surface. In addition, the flattening jig 40 has no protrusion. The wiring board 10 is placed on a support jig 52 made of stainless steel. Other configurations are the same as those of the first embodiment. This ensures that
The top 31 of the solder bump 3 can be flattened. In addition, the third embodiment has the same functions and effects as the first embodiment.

【0052】また,上記実施形態例1において,リフロ
ー時に,フラッタニング治具4を,実施形態例2と同様
に押圧してもよい。即ち,突出部42を有するフラッタ
ニング治具4(図2(C),(D)参照)を,上記突出
部42が配線基板10に当接するまで機械的に押圧して
もよい。これにより,一層確実に上記半田バンプ3の頂
部31を平坦化することができる。
In the first embodiment, the fluttering jig 4 may be pressed at the time of reflow in the same manner as in the second embodiment. That is, the fluttering jig 4 having the protrusion 42 (see FIGS. 2C and 2D) may be mechanically pressed until the protrusion 42 comes into contact with the wiring board 10. Thereby, the top portion 31 of the solder bump 3 can be more reliably flattened.

【0053】[0053]

【発明の効果】上述のごとく,本発明によれば,実装す
る電子部品との接続性に優れたプリント配線板を,効率
よく製造することができる,プリント配線板の製造方法
を提供することができる。
As described above, according to the present invention, it is possible to provide a method for manufacturing a printed wiring board which can efficiently manufacture a printed wiring board having excellent connectivity with electronic components to be mounted. it can.

【図面の簡単な説明】[Brief description of the drawings]

【図1】実施形態例1における,半田ペーストの印刷方
法の説明図。
FIG. 1 is a diagram illustrating a method for printing a solder paste according to a first embodiment.

【図2】実施形態例1における,半田バンプの平坦化の
説明図。
FIG. 2 is an explanatory diagram of flattening of solder bumps in the first embodiment.

【図3】実施形態例1における,プリント配線板の製造
方法の工程の一部を示す断面図。
FIG. 3 is a cross-sectional view showing a part of the steps of the method for manufacturing a printed wiring board in the first embodiment.

【図4】実施形態例1における,プリント配線板の製造
方法の工程の一部を示す断面図。
FIG. 4 is a cross-sectional view showing a part of the steps of the method for manufacturing a printed wiring board in the first embodiment.

【図5】実施形態例1における,プリント配線板の製造
方法の工程の一部を示す断面図。
FIG. 5 is a cross-sectional view showing a part of the steps of the method for manufacturing the printed wiring board in the first embodiment.

【図6】実施形態例1における,プリント配線板の製造
方法の工程の一部を示す断面図。
FIG. 6 is a cross-sectional view showing a part of the steps of the method for manufacturing a printed wiring board in the first embodiment.

【図7】実施形態例1における,プリント配線板の製造
方法の工程の一部を示す断面図。
FIG. 7 is a cross-sectional view showing a part of the steps of the method for manufacturing the printed wiring board in the first embodiment.

【図8】実施形態例2における,半田バンプの平坦化の
説明図。
FIG. 8 is a diagram illustrating flattening of solder bumps according to a second embodiment.

【符号の説明】[Explanation of symbols]

1...プリント配線板, 10...配線基板, 2...マスク, 3...半田バンプ, 31...頂部, 30...半田ペースト, 4...フラッタニング治具, 41...平坦面, 1. . . Printed wiring board, 10. . . Wiring board, 2. . . Mask, 3. . . Solder bumps, 31. . . Top, 30. . . 3. solder paste; . . Fluttering jig, 41. . . Flat surface,

───────────────────────────────────────────────────── フロントページの続き Fターム(参考) 5E319 AA03 AC01 BB04 BB05 CC33 CD13 CD29 GG15 5E346 AA15 AA32 BB16 CC40 FF45 GG25 HH31  ──────────────────────────────────────────────────続 き Continued on the front page F term (reference) 5E319 AA03 AC01 BB04 BB05 CC33 CD13 CD29 GG15 5E346 AA15 AA32 BB16 CC40 FF45 GG25 HH31

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 配線基板上における所望の複数の位置に
半田ペーストを印刷した後,該半田ペーストをリフロー
して,上記配線基板上に複数の半田バンプを形成するに
当り,上記半田ペーストの上から,平坦面を有するフラ
ッタニング治具の上記平坦面を当接させた状態で,上記
半田ペーストをリフローすることにより,上記半田バン
プの頂部を平坦化すると共に,上記複数の半田バンプの
頂部を略同一平面上に形成することを特徴とするプリン
ト配線板の製造方法。
After printing a solder paste on a plurality of desired positions on a wiring board, the solder paste is reflowed to form a plurality of solder bumps on the wiring board. By flattening the tops of the solder bumps by reflowing the solder paste in a state where the flat surfaces of the flattening jig having flat surfaces are in contact with each other, the tops of the plurality of solder bumps are flattened. A method for manufacturing a printed wiring board, wherein the printed wiring board is formed on substantially the same plane.
【請求項2】 請求項1において,上記フラッタニング
治具は,リフロー時に,上記半田ペーストの上に載置し
ておくことを特徴とするプリント配線板の製造方法。
2. The method according to claim 1, wherein the flattening jig is placed on the solder paste during reflow.
【請求項3】 請求項1又は2において,上記フラッタ
ニング治具は,リフロー時に,上記半田ペーストの方向
へ向かって押圧されることを特徴とするプリント配線板
の製造方法。
3. The method according to claim 1, wherein the flattening jig is pressed toward the solder paste during reflow.
JP2001016241A 2001-01-24 2001-01-24 Method for manufacturing printed wiring board Pending JP2002223065A (en)

Priority Applications (1)

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Family

ID=18882648

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Country Link
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US6719185B2 (en) * 2001-06-27 2004-04-13 Ngk Spark Plug Co., Ltd. Substrate with top-flattened solder bumps and method for manufacturing the same
WO2007108290A1 (en) * 2006-03-16 2007-09-27 Matsushita Electric Industrial Co., Ltd. Bump forming method and bump forming apparatus
WO2007122868A1 (en) * 2006-03-28 2007-11-01 Matsushita Electric Industrial Co., Ltd. Method for forming bump and device for forming bump
JP2010045089A (en) * 2008-08-11 2010-02-25 Nec Electronics Corp Method of manufacturing substrate, substrate, device provided with substrate, and determining method
JP2010062256A (en) * 2008-09-02 2010-03-18 Asahi Kasei E-Materials Corp Method of manufacturing semiconductor chip with bump
KR101033203B1 (en) 2009-11-20 2011-05-06 삼성전기주식회사 Printed circuit board and manufacturing method thereof
JP2011181924A (en) * 2010-02-23 2011-09-15 Schott Solar Ag Method and device for adhering solder to workpiece
JP2012018892A (en) * 2010-07-09 2012-01-26 Tyco Electronics Japan Kk Electrical component
JP2012104791A (en) * 2010-11-10 2012-05-31 Samsung Electro-Mechanics Co Ltd Coining device
CN103390561A (en) * 2012-05-09 2013-11-13 鸿骐新技股份有限公司 Reflow and leveling method and reflow leveling equipment of tin ball bumps on flip-chip substrate
US8962470B2 (en) * 2002-12-27 2015-02-24 Fujitsu Limited Method for forming bumps, semiconductor device and method for manufacturing same, substrate processing apparatus, and semiconductor manufacturing apparatus
US9368675B2 (en) 2014-02-28 2016-06-14 Nichia Corporation Method of manufacturing light-emitting device and wiring substrate for light-emitting element
JP2019046840A (en) * 2017-08-30 2019-03-22 日亜化学工業株式会社 Method for manufacturing semiconductor device
CN110007117A (en) * 2018-01-05 2019-07-12 旺矽科技股份有限公司 Probe card

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JPH08204319A (en) * 1995-01-23 1996-08-09 Sony Corp Solder supplying method and soldering device
JPH1013007A (en) * 1996-03-29 1998-01-16 Ngk Spark Plug Co Ltd Wiring board with solder bump, its manufacturing method, and flattening tool
JPH10335800A (en) * 1997-06-04 1998-12-18 Ibiden Co Ltd Formation of solder bump
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Cited By (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6719185B2 (en) * 2001-06-27 2004-04-13 Ngk Spark Plug Co., Ltd. Substrate with top-flattened solder bumps and method for manufacturing the same
US8962470B2 (en) * 2002-12-27 2015-02-24 Fujitsu Limited Method for forming bumps, semiconductor device and method for manufacturing same, substrate processing apparatus, and semiconductor manufacturing apparatus
WO2007108290A1 (en) * 2006-03-16 2007-09-27 Matsushita Electric Industrial Co., Ltd. Bump forming method and bump forming apparatus
KR101257977B1 (en) 2006-03-16 2013-04-24 파나소닉 주식회사 Bump forming method and bump forming apparatus
US7905011B2 (en) 2006-03-16 2011-03-15 Panasonic Corporation Bump forming method and bump forming apparatus
JP5002583B2 (en) * 2006-03-16 2012-08-15 パナソニック株式会社 Bump formation method
WO2007122868A1 (en) * 2006-03-28 2007-11-01 Matsushita Electric Industrial Co., Ltd. Method for forming bump and device for forming bump
CN101411251B (en) * 2006-03-28 2011-03-30 松下电器产业株式会社 Bump forming method and bump forming device
US8297488B2 (en) 2006-03-28 2012-10-30 Panasonic Corporation Bump forming method using self-assembling resin and a wall surface
JP5002587B2 (en) * 2006-03-28 2012-08-15 パナソニック株式会社 Bump forming method and bump forming apparatus
JP2010045089A (en) * 2008-08-11 2010-02-25 Nec Electronics Corp Method of manufacturing substrate, substrate, device provided with substrate, and determining method
JP2010062256A (en) * 2008-09-02 2010-03-18 Asahi Kasei E-Materials Corp Method of manufacturing semiconductor chip with bump
KR101033203B1 (en) 2009-11-20 2011-05-06 삼성전기주식회사 Printed circuit board and manufacturing method thereof
JP2011181924A (en) * 2010-02-23 2011-09-15 Schott Solar Ag Method and device for adhering solder to workpiece
JP2012018892A (en) * 2010-07-09 2012-01-26 Tyco Electronics Japan Kk Electrical component
JP2012104791A (en) * 2010-11-10 2012-05-31 Samsung Electro-Mechanics Co Ltd Coining device
CN103390561A (en) * 2012-05-09 2013-11-13 鸿骐新技股份有限公司 Reflow and leveling method and reflow leveling equipment of tin ball bumps on flip-chip substrate
US9368675B2 (en) 2014-02-28 2016-06-14 Nichia Corporation Method of manufacturing light-emitting device and wiring substrate for light-emitting element
JP2019046840A (en) * 2017-08-30 2019-03-22 日亜化学工業株式会社 Method for manufacturing semiconductor device
JP7014955B2 (en) 2017-08-30 2022-02-02 日亜化学工業株式会社 Manufacturing method of semiconductor device
CN110007117A (en) * 2018-01-05 2019-07-12 旺矽科技股份有限公司 Probe card

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