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JP2002303295A - Exhaust capacity monitoring method, vacuum processing method and apparatus - Google Patents

Exhaust capacity monitoring method, vacuum processing method and apparatus

Info

Publication number
JP2002303295A
JP2002303295A JP2001108155A JP2001108155A JP2002303295A JP 2002303295 A JP2002303295 A JP 2002303295A JP 2001108155 A JP2001108155 A JP 2001108155A JP 2001108155 A JP2001108155 A JP 2001108155A JP 2002303295 A JP2002303295 A JP 2002303295A
Authority
JP
Japan
Prior art keywords
pressure
regulating valve
vacuum processing
pressure regulating
processing chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001108155A
Other languages
Japanese (ja)
Inventor
Takayuki Ashida
高之 芦田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP2001108155A priority Critical patent/JP2002303295A/en
Publication of JP2002303295A publication Critical patent/JP2002303295A/en
Pending legal-status Critical Current

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  • Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
  • Non-Positive Displacement Air Blowers (AREA)

Abstract

PROBLEM TO BE SOLVED: To resolve a problem of a vacuum treatment device where treatment had to be stopped and pressure inside a vacuum treatment chamber had to be raised for monitoring evacuating ability. SOLUTION: Gas is introduced into the vacuum treatment chamber 1, a value of a pressure regulator opening is constantly acquired when a pressure setting value is provided to a pressure regulator 5, and an evacuating ability anomaly of the vacuum treatment device is detected by a change in the value.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、真空処理室内にガ
スを導入しながら圧力を制御して、その雰囲気中で処理
を行う真空処理装置の排気能力監視方法、真空処理方法
及び装置に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for monitoring the evacuation capacity of a vacuum processing apparatus for controlling a pressure while introducing a gas into a vacuum processing chamber and performing the processing in the atmosphere, and a vacuum processing method and apparatus. is there.

【0002】[0002]

【従来の技術】本発明で対象とする真空処理装置を図2
を用いて説明すると、1は真空処理室、2は真空処理室
内での処理に必要なガスを導入するためのガス供給系、
3は真空処理室1内を真空排気するための真空ポンプ、
4は真空処理室1内の圧力を常時測定する真空計、5は
真空計4で測定される真空処理室1内の圧力が外部より
与えられた設定圧力になるように自身の開口度を調節す
る調圧弁である。
2. Description of the Related Art FIG.
In the description, 1 is a vacuum processing chamber, 2 is a gas supply system for introducing gas required for processing in the vacuum processing chamber,
3 is a vacuum pump for evacuating the vacuum processing chamber 1,
Reference numeral 4 denotes a vacuum gauge that constantly measures the pressure in the vacuum processing chamber 1, and 5 denotes a vacuum gauge that adjusts its own opening degree so that the pressure in the vacuum processing chamber 1 measured by the vacuum gauge 4 becomes a set pressure given from outside. Pressure regulating valve.

【0003】この装置の動作は、任意のガスを真空処理
室1に設けられたガス供給系2を通じて、真空処理室1
内に任意のガスを供給しながら、真空ポンプ3によっ
て、真空処理室1内を排気することで、真空処理室1内
を低圧力状態にし、真空処理室1内で処理を行うもので
ある。調圧弁5は、真空ポンプ3と真空処理室1の間に
設けられ、真空処理室1内の圧力を測定する真空計4に
接続されており、外部より与えられた設定圧力と真空計
4から取得した取込圧力とを比較しながら、自身の開口
度を調整し、真空処理室1内の圧力を設定圧力に保つ。
The operation of this apparatus is as follows. An arbitrary gas is supplied through a gas supply system 2 provided in the vacuum processing chamber 1 to the vacuum processing chamber 1.
While the inside of the vacuum processing chamber 1 is evacuated by the vacuum pump 3 while supplying an arbitrary gas into the vacuum processing chamber 1, the inside of the vacuum processing chamber 1 is brought into a low pressure state, and the processing is performed in the vacuum processing chamber 1. The pressure regulating valve 5 is provided between the vacuum pump 3 and the vacuum processing chamber 1 and is connected to a vacuum gauge 4 for measuring the pressure in the vacuum processing chamber 1. While comparing the acquired intake pressure with the acquired intake pressure, its own opening degree is adjusted, and the pressure in the vacuum processing chamber 1 is maintained at the set pressure.

【0004】従来の真空処理装置の排気能力監視方法
は、基準となる圧力をP1、P2と定め(P1>P
2)、調圧弁5を全閉状態にして真空処理室1をいった
ん圧力の高い状態(圧力P1)にした後、調圧弁5を全
開にすることにより、真空ポンプ3によって真空処理室
1内を排気して、圧力P1から圧力P2に到達するまで
の時間を測定することによって、排気の速度を求め、そ
の速度の変化によって監視する方法である。
[0004] In a conventional method for monitoring the evacuation performance of a vacuum processing apparatus, reference pressures P1 and P2 are set (P1> P
2) After the pressure control valve 5 is fully closed and the vacuum processing chamber 1 is once in a high pressure state (pressure P1), the pressure control valve 5 is fully opened. This is a method in which the speed of the exhaust is determined by measuring the time from when the pressure is exhausted to when the pressure reaches the pressure P2, and the change is monitored.

【0005】[0005]

【発明が解決しようとする課題】しかしながら、上記従
来の排気能力監視方法では、真空処理装置の排気能力を
監視するためには、処理を停止させ、真空処理室内の圧
力をいったん上昇させる必要がある。真空処理装置で
は、いったん真空処理室内の圧力を上昇させると、その
復帰まで、数時間の真空排気状態で保持しなければ、正
常処理可能な状態にならないため、装置のメンテナンス
作業を行う数時間の処理停止中に排気能力確認作業を行
う必要がある。また、監視できるのが、処理停止時のみ
であるため、異常検出が遅れる可能性が大きい。真空処
理装置にとって、真空排気能力の低下は真空処理室内で
の処理に大きく影響を与えるため、より早く異常を検出
出来ることが望ましい。
However, in the above-described conventional exhaust capacity monitoring method, in order to monitor the exhaust capacity of the vacuum processing apparatus, it is necessary to stop the processing and temporarily increase the pressure in the vacuum processing chamber. . In vacuum processing equipment, once the pressure in the vacuum processing chamber is increased, it must be maintained in a vacuum exhausted state for several hours until the pressure returns to normal. It is necessary to check the exhaust capacity while the processing is stopped. Further, since monitoring can be performed only when processing is stopped, there is a high possibility that abnormality detection will be delayed. For a vacuum processing apparatus, it is desirable to be able to detect abnormalities more quickly because a reduction in the evacuation capacity greatly affects processing in a vacuum processing chamber.

【0006】本発明では上記従来の問題点に鑑み、真空
処理室内での処理中に、真空排気能力の監視を行うこと
ができ、早期に真空排気能力の異常を検知できる方法を
提供している。
In view of the above-mentioned conventional problems, the present invention provides a method capable of monitoring the evacuation capability during processing in a vacuum processing chamber and detecting an abnormality in the evacuation capability at an early stage. .

【0007】[0007]

【課題を解決するための手段】この課題を解決するため
に本発明は、真空処理室内に一定値のガス流量を導入
し、調圧弁に対して一定値の圧力設定値を与えた時の調
圧弁開口度の値を常に取得し、その値を初期状態での値
と比較することによって、真空処理装置の排気能力監視
を行うものである。
SUMMARY OF THE INVENTION In order to solve this problem, the present invention introduces a constant gas flow rate into a vacuum processing chamber and adjusts the pressure when a constant pressure set value is applied to a pressure regulating valve. The evacuation capacity of the vacuum processing apparatus is monitored by constantly acquiring the value of the pressure valve opening degree and comparing the value with the value in the initial state.

【0008】[0008]

【発明の実施の形態】図1は、本発明の実施の形態に係
る真空処理装置の排気能力監視方法を示すフローチャー
トである。
FIG. 1 is a flowchart showing a method for monitoring the exhaust capacity of a vacuum processing apparatus according to an embodiment of the present invention.

【0009】図1(a)は真空処理装置の初期状態にお
いて調圧弁開口度の基準値を取得する方法を示してい
る。真空処理室内に、一定流量のガスを導入し、一定の
設定圧力値を調圧弁に与えて調圧を行い、調圧弁の動作
が安定したときの調圧弁開口度の値を記憶する。この時
の開口度の値を基準開口度とする。
FIG. 1A shows a method of obtaining a reference value of the opening degree of the pressure regulating valve in the initial state of the vacuum processing apparatus. A constant flow rate gas is introduced into the vacuum processing chamber, a constant set pressure value is applied to the pressure regulating valve to regulate the pressure, and the value of the pressure regulating valve opening when the operation of the pressure regulating valve is stabilized is stored. The value of the opening degree at this time is defined as a reference opening degree.

【0010】図1(b)は処理中において、真空処理装
置の排気能力を監視し、異常を検出するための方法を示
している。基準開口度を取得した時と同じ流量のガスを
導入し、同じ設定圧力を調圧弁に与えて調圧を行い、調
圧弁の動作が安定したときの調圧弁開口度の値を、基準
開口度と比較し、その差が、判断基準としてあらかじめ
定めておいた許容値を超えなければ、そのまま処理を続
行し、許容値を超えた場合は、真空処理装置の排気能力
に異常が発生したと判断する。
FIG. 1B shows a method for monitoring the evacuation capacity of a vacuum processing apparatus during processing and detecting an abnormality. The same flow rate of gas as when the reference opening was obtained was introduced, the same set pressure was applied to the pressure regulating valve to perform pressure regulation, and the value of the pressure regulating valve opening when the operation of the pressure regulating valve was stabilized was calculated as the reference opening. If the difference does not exceed a predetermined allowable value as a criterion, the process is continued as it is.If the difference exceeds the allowable value, it is determined that an abnormality has occurred in the exhaust capacity of the vacuum processing apparatus. I do.

【0011】なお、基準開口度は、ガス流量、設定圧力
に依るものであり、初期状態において、ガス流量、設定
圧力を変化させることにより、複数の基準開口度を取得
することができる。また、ガス流量、設定圧力の変化を
変化させていく中で、ガス流量、設定圧力と基準開口度
の関係が数式で表せるものであると判断できれば、その
数式を用いて、広い範囲のガス流量、設定圧力に対して
基準開口度を設定することができる。
The reference opening degree depends on the gas flow rate and the set pressure. In the initial state, a plurality of reference opening degrees can be obtained by changing the gas flow rate and the set pressure. Also, if it is determined that the relationship between the gas flow rate, the set pressure, and the reference opening degree can be expressed by a mathematical expression while changing the gas flow rate, the change in the set pressure, the gas flow rate in a wide range can be determined using the mathematical expression. The reference opening degree can be set with respect to the set pressure.

【0012】[0012]

【発明の効果】以上のように本発明によれば、初期状態
で真空処理室内に所定流量のガスを導入し、設定圧力値
を調圧弁に与えて調圧を行い、この調圧弁の動作が安定
したときの調圧弁開口度の値を基準開口度として記憶
し、前記所定の流量のガスを導入し、前記設定圧力値を
調圧弁に与えて調圧を行い、この調圧弁の動作が安定し
たときの調圧弁開口度の値を取得し、この取得した調圧
弁開口度と前記基準開口度と比較し、その差が予め設定
した許容範囲内か否かで排気能力の良否を判断すること
で、装置が処理中の状態であっても排気能力監視を行う
ことが可能になり、早期の装置異常検出が実現できる。
As described above, according to the present invention, a predetermined flow rate of gas is introduced into a vacuum processing chamber in an initial state, and a set pressure value is applied to a pressure regulating valve to regulate the pressure. The value of the opening degree of the pressure regulating valve at the time of stabilization is stored as a reference opening degree, the gas of the predetermined flow rate is introduced, and the pressure is given by giving the set pressure value to the pressure regulating valve, and the operation of the pressure regulating valve is stabilized. Obtain the value of the pressure regulating valve opening degree at the time of performing the above, compare the obtained pressure regulating valve opening degree with the reference opening degree, and judge the quality of the exhaust capacity based on whether or not the difference is within a preset allowable range. Thus, even when the apparatus is in the processing state, it is possible to monitor the exhaust capacity, and it is possible to realize early detection of the apparatus abnormality.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の実施の形態に係る排気能力監視方法の
フローを説明する図
FIG. 1 is a diagram illustrating a flow of an exhaust performance monitoring method according to an embodiment of the present invention.

【図2】本発明の実施の形態に係る真空処理装置の概略
FIG. 2 is a schematic diagram of a vacuum processing apparatus according to an embodiment of the present invention.

【符号の説明】[Explanation of symbols]

1 真空処理室 5 調圧弁 1 vacuum processing chamber 5 pressure regulating valve

───────────────────────────────────────────────────── フロントページの続き Fターム(参考) 3H031 DA00 EA09 EA12 EA14 EA16 FA00 FA37 3H076 AA21 BB43 BB45 BB50 CC51 CC98 CC99  ──────────────────────────────────────────────────続 き Continued on the front page F term (reference) 3H031 DA00 EA09 EA12 EA14 EA16 FA00 FA37 3H076 AA21 BB43 BB45 BB50 CC51 CC98 CC99

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 初期状態で真空処理室内に所定流量のガ
スを導入し、設定圧力値を調圧弁に与えて調圧を行い、
この調圧弁の動作が安定したときの調圧弁開口度を基準
開口度として記憶する工程と、前記所定の流量のガスを
導入し、前記設定圧力値を調圧弁に与えて調圧を行い、
この調圧弁の動作が安定したときの調圧弁開口度を取得
する工程と、この取得した調圧弁開口度と前記基準開口
度と比較し、その差が予め設定した許容範囲内か否かで
排気能力の良否を判断する工程とを有することを特徴と
する排気能力監視方法。
1. A gas of a predetermined flow rate is introduced into a vacuum processing chamber in an initial state, and a set pressure value is given to a pressure control valve to perform pressure control.
A step of storing the opening degree of the pressure regulating valve when the operation of the pressure regulating valve is stabilized as a reference opening degree, introducing the gas at the predetermined flow rate, giving the set pressure value to the pressure regulating valve, and performing pressure regulation;
Obtaining a pressure regulating valve opening when the operation of the pressure regulating valve is stabilized; and comparing the obtained pressure regulating valve opening with the reference opening to determine whether the difference is within a preset allowable range. Determining the quality of the exhaust gas.
【請求項2】 請求項1記載の排気能力監視方法を有
し、対象物の真空処理を行うことを特徴とする真空処理
方法。
2. A vacuum processing method, comprising the method for monitoring exhaust capacity according to claim 1, wherein the vacuum processing is performed on an object.
【請求項3】 真空処理室と、この真空処理室の調圧を
行う調圧弁の開口度を取得する手段と、初期状態で真空
処理室内に所定流量のガスを導入し、設定圧力値を前記
調圧弁に与えて調圧を行い、この調圧弁の動作が安定し
たときの調圧弁開口度を基準開口度として記憶する手段
と、前記取得した調圧弁開口度と前記基準開口度と比較
し、その差が予め設定した許容範囲内か否かで排気能力
の良否を判断する手段とを有することを特徴とする真空
処理装置。
3. A vacuum processing chamber, means for acquiring the opening of a pressure regulating valve for controlling the pressure of the vacuum processing chamber, a gas at a predetermined flow rate introduced into the vacuum processing chamber in an initial state, and the set pressure value The pressure is given to the pressure regulating valve to perform pressure regulation, means for storing the pressure regulating valve opening when the operation of the pressure regulating valve is stable as a reference opening, and comparing the acquired pressure regulating valve opening with the reference opening, Means for judging the quality of the exhaust capacity based on whether the difference is within a preset allowable range.
JP2001108155A 2001-04-06 2001-04-06 Exhaust capacity monitoring method, vacuum processing method and apparatus Pending JP2002303295A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001108155A JP2002303295A (en) 2001-04-06 2001-04-06 Exhaust capacity monitoring method, vacuum processing method and apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001108155A JP2002303295A (en) 2001-04-06 2001-04-06 Exhaust capacity monitoring method, vacuum processing method and apparatus

Publications (1)

Publication Number Publication Date
JP2002303295A true JP2002303295A (en) 2002-10-18

Family

ID=18960347

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001108155A Pending JP2002303295A (en) 2001-04-06 2001-04-06 Exhaust capacity monitoring method, vacuum processing method and apparatus

Country Status (1)

Country Link
JP (1) JP2002303295A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102588247A (en) * 2011-01-17 2012-07-18 住友重机械工业株式会社 Cryopump and vacuum valve device
CN113494438A (en) * 2020-03-18 2021-10-12 住友重机械工业株式会社 Cryopump and method for controlling cryopump

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102588247A (en) * 2011-01-17 2012-07-18 住友重机械工业株式会社 Cryopump and vacuum valve device
CN113494438A (en) * 2020-03-18 2021-10-12 住友重机械工业株式会社 Cryopump and method for controlling cryopump

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