[go: up one dir, main page]

JP2002317295A - Reflow treated Sn alloy plating material, fitting type connection terminal using the same - Google Patents

Reflow treated Sn alloy plating material, fitting type connection terminal using the same

Info

Publication number
JP2002317295A
JP2002317295A JP2001121365A JP2001121365A JP2002317295A JP 2002317295 A JP2002317295 A JP 2002317295A JP 2001121365 A JP2001121365 A JP 2001121365A JP 2001121365 A JP2001121365 A JP 2001121365A JP 2002317295 A JP2002317295 A JP 2002317295A
Authority
JP
Japan
Prior art keywords
layer
alloy
reflow
processed
plating material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001121365A
Other languages
Japanese (ja)
Inventor
Hitoshi Tanaka
仁志 田中
Satoshi Suzuki
智 鈴木
Morimasa Tanimoto
守正 谷本
Akira Matsuda
晃 松田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Furukawa Electric Co Ltd
Original Assignee
Furukawa Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Furukawa Electric Co Ltd filed Critical Furukawa Electric Co Ltd
Priority to JP2001121365A priority Critical patent/JP2002317295A/en
Publication of JP2002317295A publication Critical patent/JP2002317295A/en
Pending legal-status Critical Current

Links

Landscapes

  • Electroplating Methods And Accessories (AREA)
  • Connections Effected By Soldering, Adhesion, Or Permanent Deformation (AREA)

Abstract

(57)【要約】 【課題】 摺動性、はんだ付け性、耐食性に優れた材料
と、それを用いた嵌合型接続端子を提供する。 【解決手段】 導電性基体1の表面に形成される表面層
2が、SnまたはSn合金の電気めっき層と更にその上
を被覆するAg,Bi,Cu,In,Znの群から選ば
れる少なくとも1種の金属の電気めっき層とに対してリ
フロー処理を施して形成されたリフロー処理層であるリ
フロー処理Sn合金めっき材料。
(57) [Problem] To provide a material excellent in slidability, solderability and corrosion resistance, and a fitting connection terminal using the same. A surface layer (2) formed on the surface of a conductive substrate (1) has at least one selected from the group consisting of an electroplating layer of Sn or a Sn alloy and Ag, Bi, Cu, In, and Zn further covering the electroplating layer. A reflow-processed Sn alloy plating material, which is a reflow-processed layer formed by performing a reflow process on an electroplating layer of a kind metal.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明はリフロー処理Sn合
金めっき材料とそれを用いた嵌合型接続端子に関し、更
に詳しくは、表面における摺動性、はんだ付け性、およ
び耐食性が優れているリフロー処理Sn合金めっき材料
と、それを用いた嵌合型接続端子に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a reflow-processed Sn alloy plating material and a fitting connection terminal using the same, and more particularly, to a reflow process having excellent surface slidability, solderability, and corrosion resistance. The present invention relates to a Sn alloy plating material and a fitting connection terminal using the same.

【0002】[0002]

【従来の技術】CuまたはCu合金から成る導電性基体
の表面にSn層を設けた材料は、CuまたはCu合金の
優れた導電性と機械的強度を有し、かつ、Snの良好な
電気接触特性とはんだ付け性、および耐食性を具備した
高性能導体であって、コンデンサや半導体チップのリー
ド線、各種の端子やコネクタ、電線などの分野で広く用
いられている。
2. Description of the Related Art A material in which an Sn layer is provided on the surface of a conductive substrate made of Cu or Cu alloy has excellent conductivity and mechanical strength of Cu or Cu alloy, and has good electrical contact with Sn. It is a high-performance conductor having characteristics, solderability, and corrosion resistance, and is widely used in fields such as leads of capacitors and semiconductor chips, various terminals, connectors, and electric wires.

【0003】ところで、上記した材料において、Sn層
は通常純Snを電気めっきして形成されているが、その
場合、めっき層の内部応力が大きいのでSnのウイスカ
ーが発生しやすく、そのウイスカーによる短絡事故を招
くことがある。また、Sn層の組織は微細であるため、
例えばはんだ付け時の熱で導電性基体の成分がSn層の
表面にまで拡散してきて、はんだ付け性の劣化や耐食性
の劣化などの問題を引き起こすことがある。更には、S
nは軟質であるため、耐摩耗性に劣り、また相手材の表
面が同じくSn層で構成されている場合は、相互間の摺
動時に凝着摩耗とアブレシブ摩耗が起きて動摩擦係数は
大きくなり、耐摩耗性の低下が起こる。
In the above-mentioned materials, the Sn layer is usually formed by electroplating pure Sn. In this case, since the internal stress of the plating layer is large, whiskers of Sn are easily generated, and short-circuiting by the whiskers is caused. Accidents may occur. Further, since the structure of the Sn layer is fine,
For example, the components of the conductive substrate may diffuse to the surface of the Sn layer due to heat at the time of soldering, which may cause problems such as deterioration of solderability and deterioration of corrosion resistance. Furthermore, S
Since n is soft, it is inferior in wear resistance, and when the surface of the mating material is also composed of the Sn layer, cohesive wear and abrasive wear occur when sliding between them, and the dynamic friction coefficient increases. , A decrease in wear resistance occurs.

【0004】一方、上記したSn層を例えばSn−A
g,Sn−Bi,Sn−PbのようなSn合金の層で代
替すると、当該Sn合金層にはウイスカーは発生しづら
く、また耐摩耗性も向上するという利点が生まれる。し
かしながら、Sn合金層を電気めっき法で形成すること
は、めっき浴の条件や電流条件などがわずかに変動して
も形成されたSn合金層における合金組成がばらついて
くるので、目的組成のSn合金層を安定して形成するこ
とが困難である。また、電気めっき法に代えて溶融めっ
き法でSn合金層を形成することも可能であるが、その
場合には、薄いめっき厚に制御することが困難で、めっ
き厚は厚くなってしまうという問題が生ずる。このめっ
き厚が厚いということは、摺動抵抗が大きくなることで
あるため、例えば小さい摺動抵抗が要求されるコネクタ
の場合には不利となる。
On the other hand, the above-mentioned Sn layer is formed of, for example, Sn-A
Substitution with an Sn alloy layer such as g, Sn—Bi, or Sn—Pb has the advantage that whiskers are less likely to occur in the Sn alloy layer and that the wear resistance is improved. However, when the Sn alloy layer is formed by the electroplating method, the alloy composition in the formed Sn alloy layer varies even if the conditions of the plating bath and the current conditions are slightly changed. It is difficult to form a layer stably. Further, it is possible to form the Sn alloy layer by a hot-dip plating method instead of the electroplating method, but in that case, it is difficult to control the plating thickness to be small, and the plating thickness becomes large. Occurs. A thicker plating thickness means a higher sliding resistance, which is disadvantageous, for example, in the case of a connector requiring a low sliding resistance.

【0005】表面層がSn層やSn合金層から成る材料
における上記した問題を解決するために、特開2000
−150008号公報では、次のような材料が開示され
ている。すなわち、導電性基体の表面にSn層を形成
し、更にそのSn層の上に、置換析出法で極めて薄いB
i層または/およびAg層を形成したのち、全体にリフ
ロー処理を行って、上記Sn層の表面近傍をSn合金層
に転化させた材料である。
In order to solve the above-mentioned problem in a material whose surface layer is made of a Sn layer or a Sn alloy layer, JP-A-2000-2000
Japanese Patent Publication No. -150008 discloses the following materials. That is, an Sn layer is formed on the surface of a conductive substrate, and an extremely thin B layer is formed on the Sn layer by a substitution deposition method.
After the i-layer and / or the Ag layer is formed, the whole is subjected to a reflow treatment to convert the vicinity of the surface of the Sn layer into a Sn alloy layer.

【0006】[0006]

【発明が解決しようとする課題】しかしながら、上記し
た先行技術にも次のような問題のあることが最近の研究
で判明した。まず、置換析出法でBi層または/および
Ag層をSn層の上に形成する場合、Sn層の表面が一
旦BiやAgで被覆されると、置換反応の速度が急速に
減少してしまうため、ある程度の量を置換するに要する
時間は非常に長くなり、生産性が極めて低くなるという
ことである。
However, recent research has revealed that the above-mentioned prior art has the following problems. First, when the Bi layer and / or the Ag layer is formed on the Sn layer by the substitution deposition method, the speed of the substitution reaction is rapidly reduced once the surface of the Sn layer is coated with Bi or Ag. In other words, the time required to replace a certain amount is very long, and the productivity is extremely low.

【0007】また、この置換析出法の場合、析出電位が
Snよりも卑である金属は、原理的には、Sn層の上に
析出しないということがある。とくに、前者の問題は、
コネクタ端子に代表される嵌合型接続端子の材料にとっ
ては重要な問題としてある。すなわち、嵌合型接続端子
の場合、オス端子とメス端子を嵌合して電気的接続を実
現しているが、各端子を嵌合したときに、それぞれは互
いに相手材の表面層を削り取りながら摺動して嵌合す
る。したがって、各端子にあっては、その表面層がある
程度の厚みに亘って前記したSn合金層になっていて、
嵌合摺動時には、その表面層の下に位置するSn層やS
n合金層までは削り取られないことが必要になる。しか
しながら、前記した先行技術における表面近傍のSn合
金層は非常に薄いので、上記した要求に応えることが困
難であり、そのため、Sn層やSn合金層も削り取られ
ることになり、嵌合摺動時の抵抗は大きく、摺動性の低
下はまぬがれないという問題がある。
Further, in the case of the displacement deposition method, a metal whose deposition potential is lower than that of Sn may not be deposited on the Sn layer in principle. In particular, the former problem is
This is an important problem for the material of the fitting connection terminal represented by the connector terminal. That is, in the case of the fitting type connection terminal, the male terminal and the female terminal are fitted to each other to realize the electrical connection. Sliding fit. Therefore, in each terminal, the surface layer is the Sn alloy layer described above over a certain thickness,
At the time of mating sliding, Sn layer or S layer located under the surface layer
It is necessary that the n alloy layer is not removed. However, since the Sn alloy layer in the vicinity of the surface in the prior art described above is very thin, it is difficult to meet the above-mentioned requirements. However, there is a problem in that the resistance is large and the slidability cannot be reduced.

【0008】また、最近のコネクタは、その端子数が増
加している。そのため、嵌合摺動時の端子間の抵抗は従
来に増して大きくなっているが、その抵抗の大小は、コ
ネクタ組み付け時における作業性に大きな影響を与え
る。例えば、抵抗が大きい場合には、組み付け作業に多
大の時間が必要になってくる。この嵌合摺動時の抵抗を
小さくするためには、導電性基体上のSn層やSn合金
層の厚みを薄くすればよいが、あまり薄くすると、今度
は、コネクタ端子に必要とされる接触抵抗などの特性に
悪影響が及ぶ。
In recent connectors, the number of terminals has increased. For this reason, the resistance between the terminals at the time of mating sliding is larger than before, but the magnitude of the resistance greatly affects the workability at the time of assembling the connector. For example, when the resistance is large, a large amount of time is required for the assembling work. In order to reduce the resistance at the time of the sliding of the fitting, the thickness of the Sn layer or the Sn alloy layer on the conductive base may be reduced. The characteristics such as resistance are adversely affected.

【0009】このようなことから、コネクタ端子の場
合、表面に形成する表面層(Sn合金層)の厚みは可成
り精密に制御されていることが必要であり、また表面層
の合金組成に関しても同様に精密に制御されていること
が必要となる。この点は、例えば表面のはんだ濡れ性の
みを確保するために、表面をSn合金層にするリード線
などの場合と異なるコネクタ端子における独特の問題点
である。
Therefore, in the case of the connector terminal, the thickness of the surface layer (Sn alloy layer) formed on the surface needs to be controlled quite accurately, and the alloy composition of the surface layer is also required. Similarly, it must be precisely controlled. This is a unique problem in a connector terminal different from the case of a lead wire having a Sn alloy layer on the surface, for example, in order to ensure only the solder wettability of the surface.

【0010】本発明は、上記した問題に鑑みてなされた
ものであって、摺動性、はんだ付け性、耐食性のいずれ
もが優れているリフロー処理Sn合金めっき材料とそれ
を用いた嵌合型接続端子の提供を目的とする。
SUMMARY OF THE INVENTION The present invention has been made in view of the above-mentioned problems, and is directed to a reflow-processed Sn alloy plating material having excellent slidability, solderability, and corrosion resistance, and a fitting type using the same. The purpose is to provide connection terminals.

【0011】[0011]

【課題を解決するための手段】上記した目的を達成する
ために、本発明においては、導電性基体の表面に形成さ
れる表面層が、SnまたはSn合金の電気めっき層と更
にその上を被覆するAg,Bi,Cu,In,Znの群
から選ばれる少なくとも1種の金属の電気めっき層とに
対してリフロー処理を施して形成されたリフロー処理層
であることを特徴とするリフロー処理Sn合金めっき材
料が提供される。
In order to achieve the above object, in the present invention, a surface layer formed on the surface of a conductive substrate is coated with an electroplating layer of Sn or a Sn alloy and further coated thereon. A reflow-processed Sn alloy formed by subjecting an electroplated layer of at least one metal selected from the group consisting of Ag, Bi, Cu, In, and Zn to a reflow process. A plating material is provided.

【0012】具体的には、前記金属の濃度が、前記リフ
ロー処理層の表面から前記導電性基体側に向かって傾斜
的に減少しているおり、前記SnまたはSn合金の電気
めっき層の厚みが0.3〜2μmであり、前記金属の被
覆量が、前記SnまたはSn合金の電気めっき層におけ
るSn量に対し、0.3〜15質量%になっており、前
記導電性基体と前記表面層との間に、CuまたはCu合
金から成る下地めっき層が介装されており、また、前記
下地めっき層と前記表面層の間にNiまたはNi合金か
ら成る中間層が介装されており、更にはまた、前記導電
性基体と前記表面層との間に、NiまたはNi合金から
成る下地めっきが介装されており、また前記下地めっき
層と前記表面層の間にCuまたはCu合金から成る中間
層が介装されており、前記導電性基体が、Zn含有のC
u合金から成るリフロー処理Sn合金めっき材料が提供
される。
Specifically, the concentration of the metal decreases in a gradient from the surface of the reflow treatment layer toward the conductive substrate, and the thickness of the Sn or Sn alloy electroplating layer is reduced. 0.3 to 2 μm, and the coating amount of the metal is 0.3 to 15% by mass with respect to the Sn amount in the Sn or Sn alloy electroplated layer, and the conductive substrate and the surface layer A base plating layer made of Cu or Cu alloy is interposed therebetween, and an intermediate layer made of Ni or Ni alloy is interposed between the base plating layer and the surface layer, In addition, a base plating made of Ni or a Ni alloy is interposed between the conductive substrate and the surface layer, and an intermediate plate made of Cu or a Cu alloy is provided between the base plating layer and the surface layer. Layers are interposed, The conductive substrate is made of Zn-containing C
A reflow-processed Sn alloy plating material comprising a u alloy is provided.

【0013】また、本発明においては、オス端子とメス
端子を嵌合して使用される嵌合型接続端子において、前
記オス端子または/および前記メス端子の少なくとも摺
動部は、上記したいずれかのリフロー処理Sn合金めっ
き材料で形成されていることを特徴とする嵌合型接続端
子が提供される。
Further, in the present invention, in a fitting type connection terminal used by fitting a male terminal and a female terminal, at least a sliding portion of the male terminal and / or the female terminal may be any one of the above-described ones. And a reflow-processed Sn alloy plating material.

【0014】[0014]

【発明の実施の形態】本発明の材料の1例Aを図1に示
す。この材料Aでは、導電性基体1の上に、直接、後述
する表面層2が形成されている。この表面層2は次のよ
うにして形成される。まず、図2で示したように、導電
性基体1の表面にSnまたはSn合金(例えば、Sn−
Ag,Sn−Bi,Sn−Cu,Sn−Pb,Sn−Z
nなど)の電気めっき層2Aを形成し、更にその層2A
の上に、Ag,Bi,Cu,In,Znの群から選ばれ
る少なくとも1種の金属から成る電気めっき層2Bを形
成する。
FIG. 1 shows an example A of the material of the present invention. In this material A, a surface layer 2 described later is formed directly on the conductive substrate 1. This surface layer 2 is formed as follows. First, as shown in FIG. 2, Sn or Sn alloy (for example, Sn-
Ag, Sn-Bi, Sn-Cu, Sn-Pb, Sn-Z
n) and an electroplating layer 2A is formed.
On the above, an electroplating layer 2B made of at least one metal selected from the group consisting of Ag, Bi, Cu, In, and Zn is formed.

【0015】ついで、全体にリフロー処理を施す。その
結果、上記した2つの層2A,2Bは電気めっき層2B
の金属と電気めっき層2A内のSn成分との合金から成
る1つの層2、すなわちSn合金層に転化する(図
1)。このように、表面層2はリフロー処理層であり、
上記したように、上記した金属成分とSn成分とのSn
合金で形成されている。その場合、このSn合金は、上
記した金属との合金であるため、リフロー処理前の電気
めっき層2Aに比べると高硬度になっている。
Next, a reflow process is performed on the whole. As a result, the two layers 2A and 2B are electrically plated layers 2B.
Is converted into one layer 2 made of an alloy of the above-mentioned metal and the Sn component in the electroplating layer 2A, that is, a Sn alloy layer (FIG. 1). Thus, the surface layer 2 is a reflow treatment layer,
As described above, Sn of the metal component and Sn component described above is used.
It is formed of an alloy. In this case, since the Sn alloy is an alloy with the above-described metal, the Sn alloy has higher hardness than the electroplated layer 2A before the reflow treatment.

【0016】そのため、この材料Aの表面層2と相手材
とが嵌合摺動した場合でも、相手材が表面層2に食い込
み、削り取るという問題は起こりずらくなり、両者間の
抵抗は低減し、摺動性は向上する。上記した作用効果を
発揮するリフロー処理層2を形成するためには、リフロ
ー処理前における電気めっき層2Bの被覆量が、電気め
っき層2A内のSn成分に対して0.3〜15質量%と
なるように設定することが好ましい。
Therefore, even when the surface layer 2 of the material A and the mating material are fitted and slid, the problem that the mating material bites into the surface layer 2 and scrapes hardly occurs, and the resistance between the two is reduced. The slidability is improved. In order to form the reflow treatment layer 2 exhibiting the above-described functions and effects, the coating amount of the electroplating layer 2B before the reflow treatment is 0.3 to 15% by mass with respect to the Sn component in the electroplating layer 2A. It is preferable to set so that

【0017】この被覆量が0.3質量%より少ない場合
は、形成されるリフロー処理層2の硬度は低く、相手材
との嵌合摺動時における摺動抵抗が大きくなり、また1
5質量%より多い場合、リフロー処理層の形成に長大な
時間がかかるとともに、Snとの合金化が不充分で、表
面がSn合金にならないなどのような問題が生じてくる
からである。
When the coating amount is less than 0.3% by mass, the hardness of the formed reflow treatment layer 2 is low, and the sliding resistance at the time of fitting sliding with the counterpart material is increased.
If the content is more than 5% by mass, it takes a long time to form the reflow treatment layer, and alloying with Sn is insufficient, causing problems such as that the surface does not become a Sn alloy.

【0018】なお、リフロー処理の条件選択によって
は、形成したリフロー処理層2の表面では前記金属の濃
度が高く、導電性基材1側へ行くほどその濃度が低くな
るように傾斜状に金属濃度を変化させることができる。
このような態様でリフロー処理層2を形成すると、表面
では摺動抵抗が小さく、内部は軟質なSnの柔軟性が確
保されることにより、接点特性の向上を実現することが
できるので好適である。
Depending on the reflow treatment conditions selected, the concentration of the metal is high on the surface of the formed reflow treatment layer 2, and decreases gradually toward the conductive substrate 1. Can be changed.
When the reflow treatment layer 2 is formed in this manner, the sliding resistance is small on the surface and the flexibility of soft Sn is secured on the inside, so that it is possible to improve the contact characteristics, which is preferable. .

【0019】また、リフロー処理前に形成する電気めっ
き層2Aの厚みは、その電気接触特性を喪失しない程度
に薄くすることが前記した摺動抵抗の低減という点から
好適である。また薄くすることにより、リフロー処理層
の形成が容易になるという点でも好適である。通常、電
気めっき層2Aは0.3〜2μmに設定される。より好
ましくは、0.5〜1.5μmに設定される。
It is preferable that the thickness of the electroplated layer 2A formed before the reflow treatment is reduced to such an extent that its electric contact characteristics are not lost, from the viewpoint of reducing the sliding resistance. In addition, it is also preferable that the thinner layer facilitates formation of the reflow treatment layer. Usually, the thickness of the electroplating layer 2A is set to 0.3 to 2 μm. More preferably, it is set to 0.5 to 1.5 μm.

【0020】導電性基体1としては、通常、高導電性と
優れた機械的強度を確保するためにCuまたはCu合金
(例えば、Cu−Zn,Cu−Sn,Cu−Ni−Si
など)が用いられる。なお、コネクタ端子の場合には、
導電性基体としてZnを含有するCu合金を用いる場合
が多い。そして、用途によっては、このZnが例えばは
んだ付け時の熱拡散で最表面に到達することがあるが、
そのような場合は接点特性の劣化が引き起こされる。
The conductive substrate 1 is usually made of Cu or a Cu alloy (for example, Cu-Zn, Cu-Sn, Cu-Ni-Si) in order to secure high conductivity and excellent mechanical strength.
Etc.) are used. In the case of connector terminals,
In many cases, a Cu alloy containing Zn is used as the conductive substrate. And depending on the application, this Zn may reach the outermost surface due to, for example, thermal diffusion during soldering,
In such a case, the contact characteristics deteriorate.

【0021】このような問題を防止するために、電気め
っき層2Aの形成に先立ち、導電性基体1の表面に、C
uもしくはCu合金(例えば、Cu−Sn,Cu−Zn
など)の層、またはNiもしくはNi合金(例えば、N
i−P,Ni−Coなど)の層を下地めっき層として、
更には、NiもしくはNi合金の層とその上にCuもし
くはCu合金の層を中間層として順次形成したり、また
CuもしくはCu合金の層とその上にNiもしくはNi
合金の層を中間層として順次形成し、それら全体をバリ
アとして機能させることが好ましい。
In order to prevent such a problem, before forming the electroplating layer 2A, the surface of the conductive substrate 1 is coated with C
u or Cu alloy (for example, Cu-Sn, Cu-Zn
) Or a Ni or Ni alloy (eg, N
i-P, Ni-Co, etc.) as a base plating layer.
Further, a Ni or Ni alloy layer and a Cu or Cu alloy layer thereon may be sequentially formed as an intermediate layer, or a Cu or Cu alloy layer and a Ni or Ni alloy may be formed thereon.
It is preferable that layers of the alloy are sequentially formed as an intermediate layer, and the whole of them functions as a barrier.

【0022】本発明の嵌合型接続端子は、オス端子とメ
ス端子を嵌合摺動したときに、オス端子とメス端子のい
ずれか一方または両方の少なくとも摺動部となる箇所
が、以上説明した材料で構成されているものである。
In the fitting type connection terminal of the present invention, when the male terminal and the female terminal are fitted and slid, at least one of the male terminal and the female terminal or both of the sliding portions is described above. It is composed of the following materials.

【0023】[0023]

【実施例】実施例1〜10、比較例1〜3 直径0.8mmのCu線材の表面に電気めっきを行い、表
1で示した電気めっき層2Aと電気めっき層2Bを形成
した。ついで、各線材に対し、N2ガス炉において温度
350℃、時間5秒のリフロー処理を行い、上記した両
層を図1で示したリフロー処理層2に転化した。
EXAMPLES Examples 1 to 10 and Comparative Examples 1 to 3 Electroplating was performed on the surface of a Cu wire rod having a diameter of 0.8 mm to form an electroplating layer 2A and an electroplating layer 2B shown in Table 1. Then, each wire was subjected to a reflow treatment in a N 2 gas furnace at a temperature of 350 ° C. for a time of 5 seconds, and both layers described above were converted into a reflow treatment layer 2 shown in FIG.

【0024】得られた各材料につき、下記の仕様で摩擦
係数とはんだ濡れ性を測定した。 (1)摩擦係数:バウデン式摩擦測定器を用い、2本の
各線材をX字状に交差させ、押し付け荷重10g重、摺
動速度1mm/sec、摺動距離10mmの条件下で摩擦係数
を測定した。摺動1回後の結果と、摺動10回後の結果
を表1に示した。
The friction coefficient and solder wettability of each of the obtained materials were measured according to the following specifications. (1) Friction coefficient: Using a Bowden-type friction measuring instrument, two wires are crossed in an X-shape, and the friction coefficient is determined under the conditions of a pressing load of 10 g, a sliding speed of 1 mm / sec, and a sliding distance of 10 mm. It was measured. Table 1 shows the results after one slide and the results after 10 slides.

【0025】(2)はんだ濡れ性:メニスコグラフ法
(装置:レスカ社のソルダーチェッカーSAT−500
0、フラックス:25%ロジン、メタノール溶液)によ
り、まず、室温下ではんだ濡れ時間(秒)を測定、つい
で、温度170℃の大気中で24時間加熱したのちに測
定。 以上の結果を一括して表1に示した。
(2) Solder wettability: Meniscograph method (Equipment: Solder Checker SAT-500 manufactured by Resca Co.)
0, flux: 25% rosin, methanol solution), first, the solder wetting time (second) was measured at room temperature, and then measured after heating in air at 170 ° C. for 24 hours. Table 1 summarizes the above results.

【0026】[0026]

【表1】 [Table 1]

【0027】表1から明らかなように、リフロー処理に
よって合金層を形成しなかった材料(比較例1)は、摺
動を反復するにつれてその摺動性が大幅に低下し、同時
に、加熱後のはんだ濡れ性も大幅に劣化している。これ
に反し、実施例1〜10は、いずれも、摩擦係数の経時
劣化、はんだ濡れ性の経時劣化も少ない。
As is clear from Table 1, the material in which the alloy layer was not formed by the reflow treatment (Comparative Example 1) had a significantly reduced slidability as the sliding operation was repeated. Solder wettability is also significantly degraded. On the other hand, in Examples 1 to 10, the deterioration with time of the friction coefficient and the deterioration with time of the solder wettability are all small.

【0028】[0028]

【発明の効果】以上の説明で明らかなように、本発明の
材料は嵌合摺動時の抵抗が小さく、またはんだ付け性も
良好である。したがって、この材料で製造した嵌合型接
続端子は、端子数が多くなっても組み付け作業は容易で
あり、信頼性の高い接続状態を実現することができる。
As is apparent from the above description, the material of the present invention has a small resistance at the time of sliding sliding or has good solderability. Therefore, the fitting connection terminal manufactured from this material can be easily assembled even if the number of terminals is increased, and a highly reliable connection state can be realized.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の材料Aを示す断面図である。FIG. 1 is a sectional view showing a material A of the present invention.

【図2】リフロー処理前の材料Aを示す断面図である。FIG. 2 is a cross-sectional view showing a material A before a reflow process.

【符号の説明】[Explanation of symbols]

1 導電性基体 2 表面層(リフロー処理層) 2A 電気めっき層(SnまたはSn合金のめっき
層) 2B 電気めっき層(Ag,Bi,Cu,In,Z
nのめっき層)
Reference Signs List 1 conductive substrate 2 surface layer (reflow treatment layer) 2A electroplating layer (Sn or Sn alloy plating layer) 2B electroplating layer (Ag, Bi, Cu, In, Z)
n plating layer)

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) H01R 4/02 H01R 4/02 Z // B23K 101:38 B23K 101:38 (72)発明者 谷本 守正 東京都千代田区丸の内2丁目6番1号 古 河電気工業株式会社内 (72)発明者 松田 晃 東京都千代田区丸の内2丁目6番1号 古 河電気工業株式会社内 Fターム(参考) 4K024 AA01 AA03 AA05 AA07 AA09 AA10 AA14 AA21 AB02 AB03 AB04 AB19 BA09 BB10 BC01 DB02 GA03 GA04 GA14 5E085 DD02 EE33 FF08 HH04 HH22 JJ26 JJ27 ──────────────────────────────────────────────────の Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat ゛ (Reference) H01R 4/02 H01R 4/02 Z // B23K 101: 38 B23K 101: 38 (72) Inventor Morimasa Tanimoto Tokyo 2-6-1, Marunouchi, Chiyoda-ku, Tokyo Furukawa Electric Co., Ltd. (72) Inventor Akira Matsuda 2-6-1 Marunouchi, Chiyoda-ku, Tokyo F-term in Furukawa Electric Co., Ltd. 4K024 AA01 AA03 AA05 AA07 AA09 AA10 AA14 AA21 AB02 AB03 AB04 AB19 BA09 BB10 BC01 DB02 GA03 GA04 GA14 5E085 DD02 EE33 FF08 HH04 HH22 JJ26 JJ27

Claims (10)

【特許請求の範囲】[Claims] 【請求項1】 導電性基体の表面に形成される表面層
が、SnまたはSn合金の電気めっき層と更にその上を
被覆するAg,Bi,Cu,In,Znの群から選ばれ
る少なくとも1種の金属の電気めっき層とに対してリフ
ロー処理を施して形成されたリフロー処理層であること
を特徴とするリフロー処理Sn合金めっき材料。
1. A surface layer formed on a surface of a conductive substrate, wherein the surface layer is at least one selected from the group consisting of an electroplating layer of Sn or a Sn alloy and Ag, Bi, Cu, In, and Zn further covering the electroplating layer. A reflow-processed Sn alloy plating material, which is a reflow-processed layer formed by subjecting a metal electroplating layer to a reflow process.
【請求項2】 前記金属の濃度が、前記リフロー処理層
の表面から前記導電性基体側に向かって傾斜的に減少し
ている請求項1のリフロー処理Sn合金めっき材料。
2. The reflow-processed Sn alloy plating material according to claim 1, wherein the concentration of the metal decreases in a gradient from the surface of the reflow-processed layer toward the conductive substrate.
【請求項3】 前記SnまたはSn合金の電気めっき層
の厚みが0.3〜2μmである請求項1または2のリフ
ロー処理Sn合金めっき材料。
3. The reflow-treated Sn alloy plating material according to claim 1, wherein the thickness of the Sn or Sn alloy electroplating layer is 0.3 to 2 μm.
【請求項4】 前記金属の被覆量が、前記SnまたはS
n合金の電気めっき層におけるSn量に対し、0.3〜
15質量%になっている請求項1〜3のいずれかのリフ
ロー処理Sn合金めっき材料。
4. The method according to claim 1, wherein the coating amount of the metal is Sn or S.
0.3 to the amount of Sn in the electroplating layer of the n alloy
The reflow-processed Sn alloy plating material according to any one of claims 1 to 3, which is 15% by mass.
【請求項5】 前記導電性基体と前記表面層との間に、
CuまたはCu合金から成る下地めっき層が介装されて
いる請求項1〜4のいずれかのリフロー処理Sn合金め
っき材料。
5. The method according to claim 1, wherein the conductive substrate and the surface layer are
The reflow-processed Sn alloy plating material according to any one of claims 1 to 4, wherein a base plating layer made of Cu or Cu alloy is interposed.
【請求項6】 前記表面層と前記下地めっき層の間に、
NiまたはNi合金から成る中間層が介装されている請
求項5のリフロー処理Sn合金めっき材料。
6. A method according to claim 1, wherein said surface layer and said base plating layer are
The reflow-processed Sn alloy plating material according to claim 5, wherein an intermediate layer made of Ni or a Ni alloy is interposed.
【請求項7】 前記導電性基体と前記表面層との間に、
NiまたはNi合金から成る下地めっき層が介装されて
いる請求項1〜4のいずれかのリフロー処理Sn合金め
っき材料。
7. Between the conductive substrate and the surface layer,
The reflow-processed Sn alloy plating material according to any one of claims 1 to 4, wherein a base plating layer made of Ni or a Ni alloy is interposed.
【請求項8】 前記表面層と前記下地めっき層の間に、
CuまたはCu合金から成る中間層が介装されている請
求項7のリフロー処理Sn合金めっき材料。
8. A method according to claim 1, wherein said surface layer and said base plating layer are
8. The reflow-processed Sn alloy plating material according to claim 7, wherein an intermediate layer made of Cu or Cu alloy is interposed.
【請求項9】 前記導電性基体が、Zn含有のCu合金
から成る請求項5〜8のいずれかのリフロー処理Sn合
金めっき材料。
9. The reflow-processed Sn alloy plating material according to claim 5, wherein the conductive substrate is made of a Zn-containing Cu alloy.
【請求項10】 オス端子とメス端子を嵌合して使用さ
れる嵌合型接続端子において、前記オス端子または/お
よび前記メス端子の少なくとも摺動部は、請求項1〜9
のいずれかのリフロー処理Sn合金めっき材料で形成さ
れていることを特徴とする嵌合型接続端子。
10. A fitting connection terminal used by fitting a male terminal and a female terminal, wherein at least a sliding portion of the male terminal and / or the female terminal is provided.
Characterized in that the fitting connection terminal is formed of a reflow-processed Sn alloy plating material.
JP2001121365A 2001-04-19 2001-04-19 Reflow treated Sn alloy plating material, fitting type connection terminal using the same Pending JP2002317295A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001121365A JP2002317295A (en) 2001-04-19 2001-04-19 Reflow treated Sn alloy plating material, fitting type connection terminal using the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001121365A JP2002317295A (en) 2001-04-19 2001-04-19 Reflow treated Sn alloy plating material, fitting type connection terminal using the same

Publications (1)

Publication Number Publication Date
JP2002317295A true JP2002317295A (en) 2002-10-31

Family

ID=18971257

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001121365A Pending JP2002317295A (en) 2001-04-19 2001-04-19 Reflow treated Sn alloy plating material, fitting type connection terminal using the same

Country Status (1)

Country Link
JP (1) JP2002317295A (en)

Cited By (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006505691A (en) * 2002-11-07 2006-02-16 オウトクンプ オサケイティオ ユルキネン Method for forming good contact surface on cathode support bar and support bar
JP2006108885A (en) * 2004-10-01 2006-04-20 Citizen Miyota Co Ltd Terminal for crystal vibrator and manufacturing method thereof, and crystal vibrator
JP2006161146A (en) * 2004-12-10 2006-06-22 Nikko Metal Manufacturing Co Ltd TINNED STRIP OF Cu-Zn BASED ALLOY IN WHICH GENERATION OF WHISKER IS SUPPRESSED AND METHOD FOR PRODUCING THE SAME
JP2007046150A (en) * 2005-04-06 2007-02-22 Misuzu:Kk Lead wire for electronic parts and flat cable comprising the lead wire
JP2007070731A (en) * 2005-09-07 2007-03-22 Rohm & Haas Electronic Materials Llc Metal duplex and method
WO2007040191A1 (en) 2005-10-03 2007-04-12 C. Uyemura & Co., Ltd. Method of surface treatment for the inhibition of wiskers
JP2007092144A (en) * 2005-09-29 2007-04-12 Dowa Metaltech Kk Composite-plated material and production method therefor
JP2007291458A (en) * 2006-04-26 2007-11-08 Nikko Kinzoku Kk Cu-Ni-Si alloy tin plating strip
WO2007126010A1 (en) * 2006-04-26 2007-11-08 Nippon Mining & Metals Co., Ltd. HEAT-RESISTANT Sn-PLATED Cu-Zn ALLOY STRIP SUPPRESSED IN WHISKERING
JP2008085011A (en) * 2006-09-27 2008-04-10 Sumitomo Bakelite Co Ltd Circuit board
JP2010138452A (en) * 2008-12-11 2010-06-24 Mitsubishi Materials Corp Sn PLATING MATERIAL AND METHOD FOR PRODUCING THE SAME
JP2010168666A (en) * 2010-04-23 2010-08-05 Nippon Mining & Metals Co Ltd HEAT-RESISTANT TINNED STRIP OF Cu-Zn ALLOY IN WHICH WHISKER IS SUPPRESSED
JP2010265540A (en) * 2009-05-18 2010-11-25 Kyowa Densen Kk Lead frame, manufacturing method thereof, electronic component and electronic device using the same, and plating material used therefor
JP2010280955A (en) * 2009-06-04 2010-12-16 Kyowa Densen Kk Plating film connection terminal member, connection terminal using the same, plating film material and multilayer plating material used therefor, and method for producing plating film connection terminal member
JP2011026677A (en) * 2009-07-28 2011-02-10 Mitsubishi Shindoh Co Ltd Conductive member and method for manufacturing the same
JP2012028139A (en) * 2010-07-22 2012-02-09 Shinko Leadmikk Kk Terminal for connection
US8168890B2 (en) * 2008-01-15 2012-05-01 Samsung Electro-Mechanics Co., Ltd. Printed circuit board and component package having the same
JP2012140678A (en) * 2010-12-28 2012-07-26 Kyowa Densen Kk Plated member for preventing occurrence of whisker in bending part, electric electronic component using the same, method for producing plated member, and method for preventing occurrence of whisker in plated member
JP2013222659A (en) * 2012-04-18 2013-10-28 Auto Network Gijutsu Kenkyusho:Kk Electrical contact material for connector, method of manufacturing the same, and electrical contact point for connector
JP2016009570A (en) * 2014-06-24 2016-01-18 矢崎総業株式会社 Method of manufacturing contact part
JP2016169439A (en) * 2015-03-13 2016-09-23 三菱マテリアル株式会社 Tin-plated copper terminal material, method for producing the same, and wire terminal structure
DE102017206910A1 (en) 2016-04-27 2017-11-02 Yazaki Corporation Clad material and termination using this clad material
JP2018059153A (en) * 2016-10-05 2018-04-12 Dowaメタルテック株式会社 Sn PLATED MATERIAL AND METHOD OF PRODUCING THE SAME
CN109509731A (en) * 2017-09-14 2019-03-22 屏东科技大学 Tin-silver joint structure of semiconductor and its manufacturing method
WO2020195058A1 (en) * 2019-03-26 2020-10-01 株式会社オートネットワーク技術研究所 Metal material and connection terminal

Cited By (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006505691A (en) * 2002-11-07 2006-02-16 オウトクンプ オサケイティオ ユルキネン Method for forming good contact surface on cathode support bar and support bar
JP2006108885A (en) * 2004-10-01 2006-04-20 Citizen Miyota Co Ltd Terminal for crystal vibrator and manufacturing method thereof, and crystal vibrator
JP2006161146A (en) * 2004-12-10 2006-06-22 Nikko Metal Manufacturing Co Ltd TINNED STRIP OF Cu-Zn BASED ALLOY IN WHICH GENERATION OF WHISKER IS SUPPRESSED AND METHOD FOR PRODUCING THE SAME
JP2007046150A (en) * 2005-04-06 2007-02-22 Misuzu:Kk Lead wire for electronic parts and flat cable comprising the lead wire
JP2007070731A (en) * 2005-09-07 2007-03-22 Rohm & Haas Electronic Materials Llc Metal duplex and method
JP2007092144A (en) * 2005-09-29 2007-04-12 Dowa Metaltech Kk Composite-plated material and production method therefor
US8821708B2 (en) 2005-10-03 2014-09-02 C. Uyemura & Co., Ltd. Method of surface treatment for the inhibition of whiskers
WO2007040191A1 (en) 2005-10-03 2007-04-12 C. Uyemura & Co., Ltd. Method of surface treatment for the inhibition of wiskers
JP2007100148A (en) * 2005-10-03 2007-04-19 C Uyemura & Co Ltd Whisker suppression surface treatment method
JP2007291457A (en) * 2006-04-26 2007-11-08 Nikko Kinzoku Kk Cu-Zn alloy heat resistant Sn plating strip with reduced whisker
WO2007126011A1 (en) * 2006-04-26 2007-11-08 Nippon Mining & Metals Co., Ltd. TIN-PLATED Cu-Ni-Si ALLOY STRIP
WO2007126010A1 (en) * 2006-04-26 2007-11-08 Nippon Mining & Metals Co., Ltd. HEAT-RESISTANT Sn-PLATED Cu-Zn ALLOY STRIP SUPPRESSED IN WHISKERING
JP2007291458A (en) * 2006-04-26 2007-11-08 Nikko Kinzoku Kk Cu-Ni-Si alloy tin plating strip
US8524376B2 (en) 2006-04-26 2013-09-03 Jx Nippon Mining & Metals Corporation Heat-resistant Sn-plated Cu-Zn alloy strip with suppressed whiskering
KR101058763B1 (en) * 2006-04-26 2011-08-24 제이엑스 닛코 닛세키 킨조쿠 가부시키가이샤 Whisker-Resistant Cu-Kn Alloy Heat Resistant Sn-Plated Strip
KR101058764B1 (en) 2006-04-26 2011-08-24 제이엑스 닛코 닛세키 킨조쿠 가부시키가이샤 Cu-Ni-Si alloy tin plated strips
JP2008085011A (en) * 2006-09-27 2008-04-10 Sumitomo Bakelite Co Ltd Circuit board
US8168890B2 (en) * 2008-01-15 2012-05-01 Samsung Electro-Mechanics Co., Ltd. Printed circuit board and component package having the same
JP2010138452A (en) * 2008-12-11 2010-06-24 Mitsubishi Materials Corp Sn PLATING MATERIAL AND METHOD FOR PRODUCING THE SAME
JP2010265540A (en) * 2009-05-18 2010-11-25 Kyowa Densen Kk Lead frame, manufacturing method thereof, electronic component and electronic device using the same, and plating material used therefor
JP2010280955A (en) * 2009-06-04 2010-12-16 Kyowa Densen Kk Plating film connection terminal member, connection terminal using the same, plating film material and multilayer plating material used therefor, and method for producing plating film connection terminal member
JP2011026677A (en) * 2009-07-28 2011-02-10 Mitsubishi Shindoh Co Ltd Conductive member and method for manufacturing the same
JP2010168666A (en) * 2010-04-23 2010-08-05 Nippon Mining & Metals Co Ltd HEAT-RESISTANT TINNED STRIP OF Cu-Zn ALLOY IN WHICH WHISKER IS SUPPRESSED
JP2012028139A (en) * 2010-07-22 2012-02-09 Shinko Leadmikk Kk Terminal for connection
JP2012140678A (en) * 2010-12-28 2012-07-26 Kyowa Densen Kk Plated member for preventing occurrence of whisker in bending part, electric electronic component using the same, method for producing plated member, and method for preventing occurrence of whisker in plated member
JP2013222659A (en) * 2012-04-18 2013-10-28 Auto Network Gijutsu Kenkyusho:Kk Electrical contact material for connector, method of manufacturing the same, and electrical contact point for connector
JP2016009570A (en) * 2014-06-24 2016-01-18 矢崎総業株式会社 Method of manufacturing contact part
JP2016169439A (en) * 2015-03-13 2016-09-23 三菱マテリアル株式会社 Tin-plated copper terminal material, method for producing the same, and wire terminal structure
DE102017206910A1 (en) 2016-04-27 2017-11-02 Yazaki Corporation Clad material and termination using this clad material
US10557204B2 (en) 2016-04-27 2020-02-11 Yazaki Corporation Plated material and terminal using this plated material
JP2018059153A (en) * 2016-10-05 2018-04-12 Dowaメタルテック株式会社 Sn PLATED MATERIAL AND METHOD OF PRODUCING THE SAME
CN109509731A (en) * 2017-09-14 2019-03-22 屏东科技大学 Tin-silver joint structure of semiconductor and its manufacturing method
WO2020195058A1 (en) * 2019-03-26 2020-10-01 株式会社オートネットワーク技術研究所 Metal material and connection terminal
JP2020158822A (en) * 2019-03-26 2020-10-01 株式会社オートネットワーク技術研究所 Metal material and connection terminal
JP7135963B2 (en) 2019-03-26 2022-09-13 株式会社オートネットワーク技術研究所 Metal material and connection terminal pair

Similar Documents

Publication Publication Date Title
JP2002317295A (en) Reflow treated Sn alloy plating material, fitting type connection terminal using the same
JP3880877B2 (en) Plated copper or copper alloy and method for producing the same
TWI449809B (en) Electrical and electronic components for the use of composite materials and electrical and electronic components
JPH11350188A (en) Material for electric / electronic parts, method for producing the same, and electric / electronic parts using the material
CN102522646A (en) Wiring conductor, method for fabricating same, terminal connecting assembly, and Pb-free solder alloy
JP2726434B2 (en) Sn or Sn alloy coating material
WO2006006534A1 (en) Flexible printed wiring board terminal part or flexible flat cable terminal part
JP2801793B2 (en) Tin-plated copper alloy material and method for producing the same
JP3953169B2 (en) Manufacturing method of plating material for mating type connection terminal
JPH11222659A (en) Process for producing metal composite strip
US20050249968A1 (en) Whisker inhibition in tin surfaces of electronic components
CN101978562A (en) Metal material for connector and manufacturing method thereof
JP2004300524A (en) Copper or copper alloy member with Sn coating and method of manufacturing the same
JP3998731B2 (en) Manufacturing method of current-carrying member
CN102666938B (en) Reflow plating Sn component
JP4847898B2 (en) Wiring conductor and method for manufacturing the same
US7233072B2 (en) Electronic part and surface treatment method of the same
JP4260826B2 (en) Connector parts
JP2010090400A (en) Electroconductive material and method for manufacturing the same
JP2012140678A (en) Plated member for preventing occurrence of whisker in bending part, electric electronic component using the same, method for producing plated member, and method for preventing occurrence of whisker in plated member
JP2008210584A (en) Flexible flat cable terminal
JPH0681189A (en) Production of plated copper sheet or plated copper alloy sheet for producing electric connector
JP2000030558A (en) Material for electrical contact and method of manufacturing the same
JPH1046363A (en) Tin or tin alloy-plated copper alloy for multipolar terminal and this multipolar terminal
JP4427044B2 (en) Conductor for flexible substrate, method for producing the same, and flexible substrate

Legal Events

Date Code Title Description
RD05 Notification of revocation of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7425

Effective date: 20050922