JP2003088088A - Linear motor and moving device and charged particle beam device - Google Patents
Linear motor and moving device and charged particle beam deviceInfo
- Publication number
- JP2003088088A JP2003088088A JP2001278047A JP2001278047A JP2003088088A JP 2003088088 A JP2003088088 A JP 2003088088A JP 2001278047 A JP2001278047 A JP 2001278047A JP 2001278047 A JP2001278047 A JP 2001278047A JP 2003088088 A JP2003088088 A JP 2003088088A
- Authority
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- Japan
- Prior art keywords
- linear motor
- shield
- yoke
- charged particle
- particle beam
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
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- Electron Beam Exposure (AREA)
- Iron Core Of Rotating Electric Machines (AREA)
- Linear Motors (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
(57)【要約】
【課題】 リニアモータからの磁束が外部へ漏洩するこ
とを防止する。
【解決手段】 内部が空間になっているヨーク１の上
下内面にそれぞれ複数の永久磁石群２（２ａ，２ｂ，２
ｃ，……………）、３（３ａ，３ｂ，３ｃ，…………
…）を極性が交互するように移動方向に沿って配置す
る。両磁石群の間に複数のコイル４（４ａ，４ｂ，４
ｃ）を移動方向に沿って配置する。磁石群２，３間及び
コイル４の周りに発生する磁束が外部に漏れない様に、
ヨーク１の上下面を除く全ての側面を僅かな隙間を空け
て取り囲むように、高透磁率材料から成るシールド体２
２を設ける。
(57) [Problem] To prevent a magnetic flux from a linear motor from leaking outside. SOLUTION: A plurality of permanent magnet groups 2 (2a, 2b, 2) are respectively provided on upper and lower inner surfaces of a yoke 1 having a space inside.
c,...), 3 (3a, 3b, 3c,...)
..) Are arranged along the moving direction so that the polarities are alternated. A plurality of coils 4 (4a, 4b, 4
c) is arranged along the moving direction. To prevent the magnetic flux generated between the magnet groups 2 and 3 and around the coil 4 from leaking outside,
A shield body 2 made of a material having high magnetic permeability so as to surround all the side surfaces except the upper and lower surfaces of the yoke 1 with a slight gap therebetween.
2 is provided.
Description
【０００１】[0001]
【発明の属する分野】本発明は、電子ビーム描画装置や
走査電子顕微鏡等のステージ等を駆動するために用いら
れるリニアモーター及びこれを用いた移動装置及び荷電
粒子ビーム装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a linear motor used for driving a stage or the like of an electron beam drawing apparatus or a scanning electron microscope, a moving apparatus using the same, and a charged particle beam apparatus.
【０００２】[0002]
【従来の技術】電子ビーム描画装置はＩＣ素子の製造の
一役を担っていることは良く知られている。この様な電
子ビーム描画装置では、ＩＣパターン描画データに基づ
いて被描画材料上の所定の箇所に電子ビームを照射する
ことによりＩＣパターンを描画している。2. Description of the Related Art It is well known that an electron beam drawing apparatus plays a role in manufacturing an IC element. In such an electron beam drawing apparatus, an IC pattern is drawn by irradiating a predetermined portion on the drawing material with an electron beam based on the IC pattern drawing data.
【０００３】一方、ＩＣ素子を検査するための走査型電
子顕微鏡では、ＩＣパターンが描かれた材料上の所定領
域を電子ビームで走査し、該走査により検出された二次
電子に基づいてＩＣパターンの情報を得、該情報に基づ
いてＩＣパターンの観察及び分析等を行っている。On the other hand, in a scanning electron microscope for inspecting an IC element, a predetermined area on a material on which an IC pattern is drawn is scanned with an electron beam, and the IC pattern is detected based on the secondary electrons detected by the scanning. Is obtained, and the IC pattern is observed and analyzed based on the information.
【０００４】さて、前者の装置では被描画材料が、後者
の装置ではＩＣパターンが描かれた材料がステージ上に
載せられ、該ステージをＸ，Ｙの二次元方向に適宜移動
させることにより、電子ビーム光軸に対する材料の位置
決めが行われている。In the former apparatus, the material to be drawn is placed on the stage, and in the latter apparatus, the material on which the IC pattern is drawn is placed on the stage. The material is positioned with respect to the beam optical axis.
【０００５】この様な位置決めのための駆動手段とし
て、位置決め精度と応答性が極めて良いリニアモーター
が使用されている。As a driving means for such positioning, a linear motor having extremely high positioning accuracy and responsiveness is used.
【０００６】このリニアモーターは磁石を備えた固定子
（又は可動子）とコイルを備えた可動子（又は固定子）
等から成り、前記磁石とコイルの磁気的な相互干渉（反
発くは吸引力）に基づいて、可動子を固定子に沿って移
動させるものである。This linear motor includes a stator (or mover) having a magnet and a mover (or stator) having a coil.
And the like, and moves the mover along the stator on the basis of magnetic mutual interference (repulsion or attraction) between the magnet and the coil.
【０００７】図１及び図１はリニアモーターの一概略例
を示している。尚、図２は図１のＡ−Ａ断面図である。1 and 1 show a schematic example of a linear motor. 2 is a cross-sectional view taken along the line AA of FIG.
【０００８】図中１は断面がコの字状のヨークで、その
内側の上下面に、永久磁石２（２ａ，２ｂ，２ｃ，２
ｄ，…………）、３（３ａ，３ｂ，３ｃ，３ｄ，………
…）が固定されている。これらの永久磁石は極性（Ｎ
極，Ｓ極）が交互になるようにヨーク内側の上下面の長
手方向に並べられており、リニアモーターの固定子を成
している。In the drawing, reference numeral 1 is a yoke having a U-shaped cross section, and the permanent magnets 2 (2a, 2b, 2c, 2) are provided on the upper and lower surfaces inside thereof.
d, .........) 3 (3a, 3b, 3c, 3d, ...)
…) Is fixed. These permanent magnets have polarities (N
The poles and the S poles are arranged alternately in the longitudinal direction on the upper and lower surfaces inside the yoke to form the stator of the linear motor.
【０００９】前記上下面に挟まれた空間部に、コイル４
（４ａ，４ｂ，４ｃ）が前記永久磁石群の配列に沿って
配置されている。尚、これらのコイルはコイル支持体５
に支持されており、リニアモーターの可動子を成してい
る。The coil 4 is placed in the space between the upper and lower surfaces.
(4a, 4b, 4c) are arranged along the arrangement of the permanent magnet group. These coils are used as the coil support 5
It is supported by and forms the mover of a linear motor.
【００１０】この様な構成のリニアモーターにおいて、
各コイルに電流を流すことにより各コイルの周囲に発生
する磁束と、上下面の永久磁石群間に発生する磁束との
相互干渉に基づくローレンツ力が固定子と移動子の間に
働き、各コイルに流れる電流の位相を適宜変化させるこ
とにより、可動子が前記永久磁石群の配列方向に沿って
移動する。In the linear motor having such a structure,
The Lorentz force based on the mutual interference between the magnetic flux generated around each coil by passing a current through each coil and the magnetic flux generated between the upper and lower permanent magnet groups acts between the stator and the mover, By appropriately changing the phase of the current flowing through the mover, the mover moves along the arrangement direction of the permanent magnet group.
【００１１】図３はこの様なリニアモーターをステージ
の移動を駆動する手段として用いた電子ビーム描画装置
の概略を示したものである。FIG. 3 shows an outline of an electron beam drawing apparatus using such a linear motor as means for driving the movement of the stage.
【００１２】図中１１は電子銃で、該電子銃から発生し
た電子ビームは集束レンズ１２によりステージ１３上に
載置された材料１４上に集束される。又、該電子ビーム
は、制御装置（図示せず）からのパターン描画データに
基づいて作動するＸ，Ｙ偏向器１５Ｘ，１５Ｙにより前
記材料１４上の所定領域を走査するので、材料上の所定
箇所に所定のパターンが描画される。この様なパターン
描画において、偏向歪みが許容される範囲内で電子ビー
ムは偏向器１５Ｘ，１５Ｙにより走査されるが、その範
囲を越える場合にはステージ１３を移動させる様にして
いる。Reference numeral 11 in the figure denotes an electron gun, and an electron beam generated from the electron gun is focused by a focusing lens 12 on a material 14 placed on a stage 13. Further, since the electron beam scans a predetermined area on the material 14 by X, Y deflectors 15X, 15Y which operate based on pattern drawing data from a control device (not shown), a predetermined portion on the material is scanned. A predetermined pattern is drawn on. In such pattern writing, the electron beam is scanned by the deflectors 15X and 15Y within a range in which the deflection distortion is allowed. When the range exceeds the range, the stage 13 is moved.
【００１３】そこで、前記リニアモーターがベッド１６
上に取り付けられ、コイル４を支持したコイル支持体５
は、接続体１７を介してステージ１３の下面に固定され
た案内体１８Ａ，１８Ｂの一方１８Ａに接続されてい
る。これらの案内体はリニアモーターの永久磁石群２，
３の配列方向に平行な柱状を成しており、その底面に永
久磁石群の配列方向に平行な溝１９Ａ，１９Ｂが設けら
れている。Therefore, the linear motor is installed in the bed 16
Coil support 5 mounted above and supporting the coil 4
Is connected to one of the guide bodies 18A and 18B fixed to the lower surface of the stage 13 via a connection body 17A. These guides are linear motor permanent magnet groups 2,
3 has a columnar shape parallel to the arrangement direction, and grooves 19A and 19B parallel to the arrangement direction of the permanent magnet group are provided on the bottom surface thereof.
【００１４】前記ベッド１６は断面がコの字状を成して
おり、その底壁１６Ｂに垂直な両端の側壁１６Ｓ１，１
６Ｓ２は、リニアモータの永久磁石群の配列方向に平行
な柱状を成しており、それら側壁の上面が前記案内体１
８Ａ，１８Ｂの下面とごく僅かな隙間を空けて対向配置
されるように成っている。尚、この両側壁の上面にも、
前記溝１９Ａ，１９Ｂと対向するように溝２０Ａ，２０
Ｂが設けられており、該対向する溝の間には、例えば、
ボール２１Ａ，２１Ｂが挿入されている。The bed 16 has a U-shaped cross section, and side walls 16S 1 , 1 at both ends perpendicular to the bottom wall 16B thereof.
6S 2 has a columnar shape parallel to the arrangement direction of the permanent magnet group of the linear motor, and the upper surfaces of the side walls thereof are the guide members 1
It is arranged so as to face the lower surfaces of 8A and 18B with a very small gap therebetween. In addition, on the upper surfaces of both side walls,
Grooves 20A, 20 so as to face the grooves 19A, 19B
B is provided, and between the opposing grooves, for example,
Balls 21A and 21B are inserted.
【００１５】ここで、例えば、ステージ１３を紙面に対
して垂直な方向（仮に、この方向をＸ方向とする）に移
動させる場合、リニアモーターのコイル４（４ａ，４
ｂ，４ｃ）に移動量に対応した大きさの電流を流し、コ
イル支持体５及び接続体１７を介して案内体１８Ａ，１
８Ｂをベッドの側壁１６Ｓ１，１６Ｓ２上面上を移動さ
せる。Here, for example, when the stage 13 is moved in a direction perpendicular to the plane of the paper (this direction is assumed to be the X direction), the coil 4 (4a, 4a) of the linear motor is used.
b, 4c), a current having a magnitude corresponding to the amount of movement is made to flow, and the guide members 18A, 1 are passed through the coil support member 5 and the connection member 17.
8B is moved on the upper surfaces of the side walls 16S 1 and 16S 2 of the bed.
【００１６】尚、ステージを二次元的に移動させる場合
には、Ｘ，Ｙ方向駆動用機構が必要になるが、その様な
構成は極めて一般的なので、説明の便宜上、一方の方向
のみの移動を駆動する場合についてのみ説明した。実際
には、ステージ１３をＹ方向に移動させるためのリニア
モーターを具備したＹ方向駆動用機構も設けられおり、
この機構によりステージのＹ方向の移動が行われる様に
なっている。When the stage is moved two-dimensionally, a mechanism for driving in the X and Y directions is required, but since such a structure is extremely general, for the sake of convenience of explanation, movement in only one direction is required. Only the case of driving the above has been described. Actually, a Y-direction driving mechanism including a linear motor for moving the stage 13 in the Y direction is also provided,
This mechanism allows the stage to move in the Y direction.
【００１７】[0017]
【発明が解決しようとする課題】所で、リニアモーター
は位置決めのための駆動手段として、位置決め精度と応
答性が極めて優れているが、リニアモーターから外部に
漏れる磁束が問題となることがある。The linear motor has extremely excellent positioning accuracy and responsiveness as a driving means for positioning, but the magnetic flux leaking from the linear motor to the outside may be a problem.
【００１８】例えば、電子ビーム描画装置や走査型電子
顕微鏡等の荷電粒子ビーム装置のステージ移動の駆動機
構にリニアモーターを使用した場合、そこからの漏洩磁
束がステージ上の近傍に及ぶことがあり、その漏洩磁束
により、材料上に照射される荷電粒子ビームが偏向され
てしまう。この様な偏向が起こると、電子ビーム描画装
置においては、所定の位置にパターンが描けない、走査
型電子顕微鏡では所定の観察像が得られないという問題
が発生する。本発明は、この様な問題点を解決する為に
なされたもので、新規なリニアモーター、この様なリニ
アモーターを使用した移動装置及び荷電粒子ビーム装置
を提供することを目的とする。For example, when a linear motor is used as a driving mechanism for moving the stage of a charged particle beam apparatus such as an electron beam drawing apparatus or a scanning electron microscope, a leakage magnetic flux from the linear motor may reach the vicinity of the stage. The leaked magnetic flux deflects the charged particle beam irradiated onto the material. When such a deflection occurs, there arises a problem that a pattern cannot be drawn at a predetermined position in the electron beam drawing apparatus and a predetermined observation image cannot be obtained by the scanning electron microscope. The present invention has been made in order to solve such problems, and an object thereof is to provide a novel linear motor, a moving device and a charged particle beam device using such a linear motor.
【００１９】[0019]
【課題を解決するための手段】 本発明に基づくリニア
モーターは、磁石とコイルとが相対移動する様に成した
リニアモーターであって、内部が空間になっているヨー
クの相対する内壁面にそれぞれ複数の磁石を極性が交互
するように移動方向に沿って配置し、該両磁石群の間に
複数のコイルを移動方向に沿って配置したリニアモータ
ーにおいて、前記磁石及びコイルが発生する磁束が外部
に漏れない様に、前記ヨークの磁石群が配置される壁に
垂直な壁の外周を遮蔽体で囲うようにしたことを特徴と
する。本発明に基づく移動装置は、前記リニアモーター
を駆動手段として被移動体を移動するように成したこと
を特徴とする。A linear motor according to the present invention is a linear motor configured such that a magnet and a coil move relative to each other, and the linear motor is provided on each of inner wall surfaces of a yoke having a space inside. In a linear motor in which a plurality of magnets are arranged along the moving direction so that the polarities alternate, and a plurality of coils are arranged between the two magnet groups along the moving direction, the magnetic flux generated by the magnets and the coils is external. It is characterized in that the outer periphery of the wall perpendicular to the wall where the magnet group of the yoke is arranged is surrounded by a shield so as not to leak to the inside. A moving device according to the present invention is characterized in that the moving body is moved by using the linear motor as a driving means.
【００２０】本発明に基づく荷電粒子ビーム装置は、前
記移動装置に被照射物体をセットし、該被照射物体に荷
電粒子ビームを照射出来るように成したことを特徴とす
る。A charged particle beam apparatus according to the present invention is characterized in that an object to be irradiated is set on the moving device and the object to be irradiated can be irradiated with the charged particle beam.
【００２１】[0021]
【発明の実施の形態】以下、図面を参照して本発明の実
施の態様の形態を詳細に説明する。BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described in detail below with reference to the drawings.
【００２２】図４は本発明の一例として示したリニアモ
ーターの一概略図、図５は図４のＢ−Ｂ断面図である。FIG. 4 is a schematic view of a linear motor shown as an example of the present invention, and FIG. 5 is a sectional view taken along line BB of FIG.
【００２３】図中２２はヨーク１の上下面を除く全ての
側面を僅かな隙間を空けて取り囲むように、その一部が
コイル支持体５に取り付けられたシールド体である。該
シールド体は、例えば、パーマロイの如き透磁率の高い
材料から成る。Reference numeral 22 in the figure denotes a shield body, a part of which is attached to the coil support body 5 so as to surround all side surfaces except the upper and lower surfaces of the yoke 1 with a slight gap. The shield body is made of a material having a high magnetic permeability such as permalloy.
【００２４】前記ヨーク１の四隅部には回転軸２３Ａ、
２３Ｂ、２３Ｃ、２３Ｄが取り付けられており、各軸の
上下には間隔を開けてそれぞれローラ２４Ａ１，２４Ａ
２、２４Ｂ１，２４Ｂ２、ローラ２４Ｃ１，２４Ｃ２、
２４Ｄ１，２４Ｄ２が取り付けられている（２４Ｃ２、
２４Ｄ２尚は図示されていない）。尚、ローラが設けら
れているヨークの肉厚部には、ローラが挿入できるよう
な穴が設けられている。At the four corners of the yoke 1, a rotary shaft 23A,
23B, 23C, and 23D are attached, and rollers 24A 1 and 24A are provided above and below each shaft with a space provided.
2 , 24B 1 , 24B 2 , rollers 24C 1 , 24C 2 ,
24D 1 and 24D 2 are attached (24C 2 ,
24D 2 still not shown). The thick portion of the yoke provided with the roller is provided with a hole into which the roller can be inserted.
【００２５】尚、シールド壁２２の、コイル支持体５が
取り付けられる面には、コイル４に電流を流すためのリ
ードを通す為の細孔が開けられている。The surface of the shield wall 22 to which the coil support 5 is attached has an opening for passing a lead for passing an electric current through the coil 4.
【００２６】この様な構成のリニアモーターにおいて、
各コイル４（４ａ，４ｂ，４ｃ）に電流を流すことによ
り各コイルの周囲に発生する磁束と、上下面の間に発生
する磁束との相互干渉に基づくローレンツ力が固定子
（永久磁石群２，３）と可動子（各コイル４）の間に働
き、可動子が前記永久磁石群の配列方向に沿って移動す
る。この時、可動子と一体化したコイル支持体５に取り
付けられたシールド体２２も同期して、ヨーク１の側面
に沿って移動する。In the linear motor having such a structure,
The Lorentz force based on the mutual interference between the magnetic flux generated around each coil by passing a current through each coil 4 (4a, 4b, 4c) and the magnetic flux generated between the upper and lower surfaces causes the stator (permanent magnet group 2 , 3) and the mover (each coil 4), and the mover moves along the arrangement direction of the permanent magnet group. At this time, the shield 22 attached to the coil support 5 integrated with the mover also moves along the side surface of the yoke 1 in synchronization.
【００２７】この様にして、シールド体２２は常に、ヨ
ーク１の全側面を囲っているので、ヨーク１の内部に発
生している磁束が側部空間部から外部へと漏洩すること
が殆ど避けられる。In this way, since the shield body 22 always surrounds the entire side surface of the yoke 1, it is almost avoided that the magnetic flux generated inside the yoke 1 leaks from the side space portion to the outside. To be
【００２８】従って、この様な構成のリニアモーター
を、電子ビーム描画装置や走査型電子顕微鏡等の荷電粒
子ビーム装置のステージ移動の駆動機構に使用しても、
リニアモーターからの漏洩磁束がステージ上の近傍に及
ぶことがない。Therefore, even if the linear motor having such a structure is used as a driving mechanism for moving a stage of a charged particle beam apparatus such as an electron beam drawing apparatus or a scanning electron microscope,
The magnetic flux leaking from the linear motor does not reach the vicinity of the stage.
【００２９】尚、前記シールド体２２は、前記のように
ベルト状にしてローラによってガイドするように成して
も良いし、或いは、チェイン状に成して、スプロケット
でガイドするように成しても良い。The shield 22 may be formed into a belt shape as described above and guided by rollers, or may be formed into a chain shape and guided by a sprocket. Is also good.
【００３０】又、シールド体２２を前記のようにコイル
支持体５に取り付けず、該コイル支持体５に接触しない
ように、ヨーク１の全側面を囲う様にヨーク１に貼り付
けても良い。尚、この場合には、コイル４，コイル支持
体５と被移動体（図示せず）を繋ぐ接続体（図示せず）
が移動出来るように、シールド体の、接続体（図示せ
ず）が繋がれる側の面には移動方向に沿ったスリットが
開けられる。The shield 22 may not be attached to the coil support 5 as described above, and may be attached to the yoke 1 so as to surround the entire side surface of the yoke 1 so as not to contact the coil support 5. In this case, a connection body (not shown) that connects the coil 4, the coil support body 5, and the movable body (not shown).
A slit along the moving direction is formed in the surface of the shield body on the side where the connecting body (not shown) is connected so that the moving body can move.
【００３１】又、前記例では、リニアモーターを電子ビ
ーム描画装置や検査用走査電子顕微鏡のステージの移動
に使用する例を示したが、イオンビーム描画装置等他の
荷電粒子ビーム装置のステージ移動等にも使用可能であ
る。In the above example, the linear motor is used to move the stage of the electron beam drawing apparatus or the scanning electron microscope for inspection, but the stage of other charged particle beam apparatus such as the ion beam drawing apparatus is moved. It can also be used for.
【図１】 リニアモーターの一概略例を示したものであ
る。FIG. 1 shows a schematic example of a linear motor.
【図２】 図１のＡ−Ａ断面図である。FIG. 2 is a sectional view taken along line AA of FIG.
【図３】 リニアモーターを使用した電子ビーム描画装
置の一概略例を示したものである。FIG. 3 is a diagram showing a schematic example of an electron beam drawing apparatus using a linear motor.
【図４】 本発明のリニアモーターの一概略例を示した
ものである。FIG. 4 shows a schematic example of a linear motor of the present invention.
【図５】 図４のＢ−Ｂ断面図である。5 is a cross-sectional view taken along the line BB of FIG.
１…ヨーク ２（２ａ，２ｂ，２ｃ，……………）…永久磁石 ３（３ａ，３ｂ，３ｃ，……………）…永久磁石 ４（４ａ，４ｂ，４ｃ）…コイル ５…コイル支持体 １１…電子銃 １２…集束レンズ １３…ステージ １４…材料 １５Ｘ，１５Ｙ…偏向器 １６…ベッド １６Ｂ…底壁 １６Ｓ１，１６Ｓ２…側壁 １７…接続体 １８Ａ，１８Ｂ…案内体 １９Ａ，１９Ｂ，２０Ａ，２０Ｂ…溝 ２１Ａ，２１Ｂ…ボール ２２…シールド体 ２３Ａ，２３Ｂ，２３Ｃ，２３Ｄ…回転軸 ２４Ａ１，２４Ａ２，２４Ｂ１，２４Ｂ２…ローラ ２４Ｃ１，２４Ｃ２，２４Ｄ１，２４Ｄ２…ローラ1 ... Yoke 2 (2a, 2b, 2c, .........) ... Permanent magnet 3 (3a, 3b, 3c, .........) ... Permanent magnet 4 (4a, 4b, 4c) ... Coil 5 ... Coil Support 11 ... Electron gun 12 ... Focusing lens 13 ... Stage 14 ... Material 15X, 15Y ... Deflector 16 ... Bed 16B ... Bottom wall 16S 1 , 16S 2 ... Side wall 17 ... Connector 18A, 18B ... Guide 19A, 19B, 20A, 20B ... Grooves 21A, 21B ... Ball 22 ... Shield bodies 23A, 23B, 23C, 23D ... Rotating shafts 24A 1 , 24A 2 , 24B 1 , 24B 2 ... Rollers 24C 1 , 24C 2 , 24D 1 , 24D 2 ... Rollers
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 ＦＩ テーマコート゛(参考） Ｈ０１Ｊ 37/20 Ｈ０１Ｊ 37/20 Ｄ Ｈ０１Ｌ 21/027 Ｈ０２Ｋ 1/00 Ｂ Ｈ０２Ｋ 1/00 Ｈ０１Ｌ 21/30 ５４１Ｌ ─────────────────────────────────────────────────── ─── Continuation of front page (51) Int.Cl. 7 Identification code FI theme code (reference) H01J 37/20 H01J 37/20 D H01L 21/027 H02K 1/00 B H02K 1/00 H01L 21/30 541L
Claims (8)
たリニアモーターであって、内部が空間になっているヨ
ークの相対する内壁面にそれぞれ複数の磁石を極性が交
互するように移動方向に沿って配置し、該両磁石群の間
に複数のコイルを移動方向に沿って配置したリニアモー
ターにおいて、前記磁石及びコイルが発生する磁束が外
部に漏れない様に、前記ヨークの磁石群が配置される壁
に垂直な壁の外周を遮蔽体で囲うようにしたリニアモー
ター。1. A linear motor configured such that a magnet and a coil move relative to each other, and a moving direction such that a plurality of magnets are alternately arranged on opposite inner wall surfaces of a yoke having a space inside. In a linear motor in which a plurality of coils are arranged along the moving direction between the magnet groups, the magnet groups of the yoke are arranged so that the magnetic flux generated by the magnets and the coils does not leak to the outside. A linear motor that surrounds the wall perpendicular to the wall to be placed with a shield.
て移動可能な可動部材に前記遮蔽体が取り付けられ、前
記遮蔽部材が可動部材の移動と共に移動するように成し
た請求項１に記載のリニアモーター。2. The linear motor according to claim 1, wherein the shield is attached to a movable member that is movable with respect to a fixed member in the linear motor, and the shield moves along with the movement of the movable member.
項１に記載のリニアモーター。3. The linear motor according to claim 1, wherein the shield is formed in a strip shape.
る請求項１に記載のリニアモーター。4. The linear motor according to claim 1, wherein the shield is formed in a chain shape.
向に沿って前記遮蔽体にスリットが設けられている請求
項１に記載のリニアモーター。5. The linear motor according to claim 1, wherein the shield is provided with a slit along a moving direction of a movable member in the linear motor.
に記載のリニアモーター。6. The shield comprises a high magnetic permeability material.
Linear motor described in.
アモーターを駆動手段として被移動体を移動するように
成した移動装置。7. A moving device configured to move a moving body by using the linear motor according to claim 1 as a driving means.
セットし、該被照射物体に荷電粒子ビームを照射出来る
ように成した荷電粒子ビーム装置。8. A charged particle beam device configured to set an irradiation target object on the moving device according to claim 7, and to irradiate the irradiation target object with a charged particle beam.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001278047A JP4174201B2 (en) | 2001-09-13 | 2001-09-13 | Linear motor, moving device and charged particle beam device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001278047A JP4174201B2 (en) | 2001-09-13 | 2001-09-13 | Linear motor, moving device and charged particle beam device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2003088088A true JP2003088088A (en) | 2003-03-20 |
| JP4174201B2 JP4174201B2 (en) | 2008-10-29 |
Family
ID=19102478
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001278047A Expired - Fee Related JP4174201B2 (en) | 2001-09-13 | 2001-09-13 | Linear motor, moving device and charged particle beam device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4174201B2 (en) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1524556A1 (en) * | 2003-10-17 | 2005-04-20 | ASML Netherlands B.V. | Lithographic apparatus, device manufacturing method and positioning system |
| EP1580602A1 (en) * | 2004-03-10 | 2005-09-28 | ASML Netherlands B.V. | Lithographic apparatus, Lorentz actuator and device manufacturing method |
| WO2006127500A3 (en) * | 2005-05-23 | 2007-03-08 | Rockwell Scient Co | Multiple magnet moving coil reciprocating generator |
| JP2008041464A (en) * | 2006-08-08 | 2008-02-21 | Hitachi High-Technologies Corp | Charged particle beam equipment |
| CN101917110A (en) * | 2008-12-31 | 2010-12-15 | Asml控股股份有限公司 | Linear motor magnetic shield apparatus |
| JP2011030356A (en) * | 2009-07-24 | 2011-02-10 | Nissan Motor Co Ltd | Axial gap motor |
| WO2014010484A1 (en) * | 2012-07-09 | 2014-01-16 | 国立大学法人長崎大学 | Electric motor |
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2001
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7224429B2 (en) | 2003-10-17 | 2007-05-29 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method and positioning system |
| EP1524556A1 (en) * | 2003-10-17 | 2005-04-20 | ASML Netherlands B.V. | Lithographic apparatus, device manufacturing method and positioning system |
| EP1580602A1 (en) * | 2004-03-10 | 2005-09-28 | ASML Netherlands B.V. | Lithographic apparatus, Lorentz actuator and device manufacturing method |
| US7145269B2 (en) | 2004-03-10 | 2006-12-05 | Asml Netherlands B.V. | Lithographic apparatus, Lorentz actuator, and device manufacturing method |
| WO2006127500A3 (en) * | 2005-05-23 | 2007-03-08 | Rockwell Scient Co | Multiple magnet moving coil reciprocating generator |
| JP2008041464A (en) * | 2006-08-08 | 2008-02-21 | Hitachi High-Technologies Corp | Charged particle beam equipment |
| US9130443B2 (en) | 2008-12-31 | 2015-09-08 | Asml Holding N.V. | Linear motor magnetic shield apparatus |
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| US9136751B2 (en) | 2008-12-31 | 2015-09-15 | Asml Holding N.V. | Linear motor magnetic shield apparatus for lithographic systems |
| JP2011030356A (en) * | 2009-07-24 | 2011-02-10 | Nissan Motor Co Ltd | Axial gap motor |
| WO2014010484A1 (en) * | 2012-07-09 | 2014-01-16 | 国立大学法人長崎大学 | Electric motor |
| WO2015104099A1 (en) * | 2014-01-13 | 2015-07-16 | Asml Netherlands B.V. | Actuation mechanism, optical apparatus and lithography apparatus |
| CN105900017A (en) * | 2014-01-13 | 2016-08-24 | Asml荷兰有限公司 | Actuation mechanism, optical apparatus and lithography apparatus |
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| KR102317127B1 (en) * | 2014-01-13 | 2021-10-25 | 에이에스엠엘 네델란즈 비.브이. | Actuation mechanism, optical apparatus and lithography apparatus |
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