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JP2004031562A - Semiconductor device and its manufacturing method - Google Patents

Semiconductor device and its manufacturing method Download PDF

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Publication number
JP2004031562A
JP2004031562A JP2002184317A JP2002184317A JP2004031562A JP 2004031562 A JP2004031562 A JP 2004031562A JP 2002184317 A JP2002184317 A JP 2002184317A JP 2002184317 A JP2002184317 A JP 2002184317A JP 2004031562 A JP2004031562 A JP 2004031562A
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Japan
Prior art keywords
wiring
main surface
semiconductor chip
auxiliary
interconnect lines
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Application number
JP2002184317A
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Japanese (ja)
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JP4030363B2 (en
JP2004031562A5 (en
Inventor
Noriyuki Takahashi
高橋 典之
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Renesas Technology Corp
Renesas Semiconductor Package and Test Solutions Co Ltd
Original Assignee
Renesas Technology Corp
Hitachi Yonezawa Electronics Co Ltd
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Priority to JP2002184317A priority Critical patent/JP4030363B2/en
Publication of JP2004031562A publication Critical patent/JP2004031562A/en
Publication of JP2004031562A5 publication Critical patent/JP2004031562A5/ja
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Publication of JP4030363B2 publication Critical patent/JP4030363B2/en
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32225Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/45001Core members of the connector
    • H01L2224/45099Material
    • H01L2224/451Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • H01L2224/45138Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
    • H01L2224/45144Gold (Au) as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • H01L2224/4905Shape
    • H01L2224/4909Loop shape arrangement
    • H01L2224/49095Loop shape arrangement parallel in plane
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/153Connection portion
    • H01L2924/1531Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
    • H01L2924/15311Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA

Landscapes

  • Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide a semiconductor device which is improved in reliability by mounting a chip size package on a wiring board where interconnect lines and auxiliary interconnect lines connected as bypasses to them are formed so as to keep the interconnect lines or auxiliary interconnect lines connected, even if either the interconnect lines or auxiliary interconnect lines are disconnected when thermal stress is applied. <P>SOLUTION: The semiconductor device is composed of the package board 2 which is provided with a main face 2a and a rear face and where the interconnect lines 2h and auxiliary interconnect lines 2i connected as bypasses to them are formed, a semiconductor chip mounted on the main face 2a, a plurality of wires 4 connecting the pads of the semiconductor chip to the corresponding connectors 2c of the package board 2, a plurality of solder bumps formed on the rear face, and a sealing part for sealing the semiconductor chip. The auxiliary interconnect lines 2i which are formed as bypasses for the interconnect lines 2h on the main face 2a are provided in a region corresponding to the rear end of the semiconductor chip, so that either the interconnect lines 2h or auxiliary interconnect lines are kept connected even if thermal stress is applied to disconnect either the interconnect lines 2h or auxiliary interconnect lines 2i, and the chip size package can be improved in reliability. <P>COPYRIGHT: (C)2004,JPO

Description

【0001】
【発明の属する技術分野】
本発明は、半導体製造技術に関し、特に、半導体装置の熱特性における信頼性向上に適用して有効な技術に関する。また、電気的特性の信頼性向上に適用して有効な技術に関する。
【0002】
【従来の技術】
以下に説明する技術は、本発明を研究、完成するに際し、本発明者によって検討されたものであり、その概要は次のとおりである。
【0003】
樹脂封止形の半導体装置のうち、配線基板に半導体チップを搭載し、これを樹脂モールドによって樹脂封止して組み立てられる半導体パッケージでは、薄型/小型化が一般化してきており、CSP(Chip Size Package)と呼ばれる小型パッケージが開発されている。
【0004】
基板タイプのCSPでは、インタポーザとして有機基板(配線基板)が用いられる場合が多いが、半導体パッケージの小型化により、端子ピッチもファイン化しつつあるとともに、多ピン化によってピン数も増える傾向にある。
【0005】
なお、樹脂製の基板を有する半導体装置については、例えば、特開2000−124163号公報にその記載がある。
【0006】
【発明が解決しようとする課題】
前記技術において、配線基板の配線幅もファインピッチ化によって可能な限り狭く形成しなけれけばならない。ところが、配線である銅箔とその表面を覆う絶縁膜であるソルダレジストとの熱膨張係数が異なるため、熱サイクルテストなどでの熱ストレスが細い配線に集中し、断線を引き起こすことが問題となる。
【0007】
なお、断線は、主に、配線基板のチップ搭載側の面(この面を以降、主面という)で、かつ半導体チップの裏面の端部に対応する領域で発生することを本発明者は見出した。
【0008】
これは、半導体チップが存在する領域としない領域とでは、基板の強度(剛性)が異なるため、その境界部の外側と内側とで熱収縮量が異なり、その結果、断線を引き起こすものである。
【0009】
本発明の目的は、信頼性の向上を図る半導体装置およびその製造方法を提供することにある。
【0010】
本発明の前記ならびにその他の目的と新規な特徴は、本明細書の記述および添付図面から明らかになるであろう。
【0011】
【課題を解決するための手段】
本願において開示される発明のうち、代表的なものの概要を簡単に説明すれば、以下のとおりである。
【0012】
すなわち、本発明は、主面とその反対側の裏面とを有し、かつ配線とこれにバイパス状に電気的に接続された補助配線とが形成された配線基板と、前記配線基板の主面に搭載され、かつ前記主面の接続端子と電気的に接続された半導体チップと、前記配線基板に設けられ、かつ前記半導体チップの表面電極とそれぞれに電気的に接続される複数の外部端子とを有し、前記補助配線は、前記配線基板の主面または裏面の少なくとも何れか一方に形成されているものである。
【0013】
また、本発明は、配線とこれにバイパス状に電気的に接続された補助配線とを有し、かつ前記補助配線が主面に形成された配線基板を準備する工程と、前記配線基板の主面の前記補助配線上に半導体チップの裏面の端部が配置されるように前記配線基板上に前記半導体チップを搭載する工程と、前記半導体チップの表面電極とこれに対応する前記配線基板の接続端子とを接続する工程と、前記半導体チップを樹脂封止する工程とを有するものである。
【0014】
【発明の実施の形態】
以下の実施の形態では特に必要なとき以外は同一または同様な部分の説明を原則として繰り返さない。
【0015】
また、以下の実施の形態において、要素の数など(個数、数値、量、範囲などを含む)に言及する場合、特に明示した場合および原理的に明らかに特定の数に限定される場合などを除き、その特定の数に限定されるものではなく、特定の数以上でも以下でも良いものとする。
【0016】
以下、本発明の実施の形態を図面に基づいて詳細に説明する。なお、実施の形態を説明するための全図において、同一の機能を有する部材には同一の符号を付し、その繰り返しの説明は省略する。
【0017】
図1は本発明の実施の形態の半導体装置の一例であるCSPの構造を示す斜視図、図2は図1に示すCSPの構造の一例を示す断面図、図3は図1に示すCSPの配線基板における主面側の配線パターンの一例を示す平面図、図4は図3に示す配線基板の裏面側のランド形状の一例を示す底面図、図5は図3に示す配線基板の主面におけるチップ搭載可能エリアの一例を示す平面図、図6は図3に示す配線基板におけるランドと半田バンプの構造の一例を示す拡大部分断面図、図7は図1に示すCSPの組み立てに用いられる多数個取り基板の構造の一例を示す平面図、図8は図1に示すCSPの組み立てにおけるワイヤボンディング後の構造を示す断面図、図9は図1に示すCSPの組み立てにおける樹脂モールディング時の構造を示す断面図、図10は図1に示すCSPの組み立てにおける個片化時の構造を示す側面図である。
【0018】
図1、図2に示す本実施の形態の半導体装置は、CSP9と呼ばれる小型の半導体パッケージであり、その外部端子である複数の半田バンプ(バンプ電極)3が、配線基板であるパッケージ基板2の裏面2b上に複数行/複数列でアレイ状に配列されているものである。
【0019】
ただし、図2に示すCSP9では、チップ下の基板中央部付近には半田バンプ3は配置されていないが、この中央部付近にも半田バンプ3が配置されていてもよい。
【0020】
また、本実施の形態のCSP9は、図7に示すような複数のデバイス領域7a(半導体装置の領域)がマトリクス配列で形成された多数個取り基板7を用いて組み立てられたものであり、複数のデバイス領域7aを図9に示すようなモールド金型13の1つのキャビティ13cで一括して覆った状態で樹脂モールドし(以降、これを一括モールドという)、これによって形成された一括モールド部8と多数個取り基板7とをモールド後にダイシングして個片化したものである。
【0021】
CSP9の構造について説明すると、主面2aとその反対側の裏面2bとを有し、かつ配線2hとこれにバイパス状に電気的に接続された補助配線2iとが形成された配線基板であるパッケージ基板2と、パッケージ基板2の主面2aに搭載された半導体チップ1と、半導体チップ1の表面電極であるパッド1aとこれに対応するパッケージ基板2の接続端子2cとをそれぞれに電気的に接続する複数のワイヤ4と、パッケージ基板2の裏面2bに設けられた外部端子である複数の半田バンプ(バンプ電極)3と、半導体チップ1および複数のワイヤ4を封止する封止部6とからなり、パッケージ基板2の補助配線2iは、その主面2aにおいて半導体チップ1の裏面1cの端部に対応した領域に形成されており、さらに、本実施の形態のCSP9では、図4に示すようにパッケージ基板2の裏面2bにも補助配線2iが形成されている。
【0022】
この補助配線2iは、銅箔からなる配線2hと、その表面を覆う絶縁膜であるソルダレジスト2gとの熱膨張係数の差が引き起こす熱ストレスがパッケージ基板2にかかった際に、配線2hが断線するという問題を解決するものである。
【0023】
すなわち、補助配線2iは、主の配線2hに対して両端が電気的に接続されてバイパス状に形成したものであり、前記熱ストレスがかかった際に、主の配線2hと補助配線2iのうち何れか一方が断線しても他方が残るようにするものである。
【0024】
したがって、補助配線2iは、熱ストレスによる断線が起こり易い箇所に設けておくことが好ましい。そこで、熱ストレスによる断線が起こり易いのは、半導体チップ1の裏面1cの端部付近をその内側と外側とで跨ぐように形成された配線2hである。つまり、半導体チップ1が存在する領域としない領域とで、パッケージ基板2の剛性に大きな差が生じるため、その境界部を境にして熱膨張による収縮量も大きく異なり、これによって前記境界部(半導体チップ1の端部)を跨ぐ配線2hが断線し易い。
【0025】
ここで、本実施の形態のCSP9のパッケージ基板2の配線パターンを示したものが、図3と図4であり、図3が主面2aを示し、図4が裏面2bを示したものである。
【0026】
なお、図3〜図5は、主面2aと裏面2bのそれぞれ配線パターンを示しているが、両者とも一部(ワイヤ4や半田バンプ3が接続される箇所)を除いてその表面には絶縁膜であるソルダレジスト2gが形成されているが、図3〜図5では、ソルダレジスト2gを透過させてそれぞれの面の配線パターンのみを表している。
【0027】
図3に示すように、パッケージ基板2の主面2aには、チップ搭載領域の外側の周囲に複数のビア配線2jがアレイ状に設けられ、さらにそれぞれのビア配線2jから外方に向かって放射状に配線2hが延在し、かつ各配線2hには、その途中にワイヤ4が接続される接続端子2cが形成されている。これら主面2aの配線2hのうち、4つの配線2hに対してバイパス状の補助配線2iが形成されている。
【0028】
なお、図5は、パッケージ基板2の主面2aにおけるチップ搭載可能エリアを示したものであり、下限の最小チップ搭載エリア11と、上限の最大チップ搭載エリア12との間の領域がチップ搭載可能エリアとなる。
【0029】
これにより、最小チップ搭載エリア11と最大チップ搭載エリア12の間の領域に半導体チップ1の裏面1cの端部が配置されることになるため、前記領域で断線が起こり易く、したがって、前記領域に補助配線2iを設けることが好ましく、図5に示す例では、最小チップ搭載エリア11と最大チップ搭載エリア12の間の領域に4本の補助配線2iが設けられている。
【0030】
ただし、補助配線2iが設けられる領域としては、半導体チップ1の裏面1cの端部付近に対応した領域、すなわち最小チップ搭載エリア11と最大チップ搭載エリア12の間の領域に限定されるものではなく、それ以外の領域に設けられていてもよく、また、主面2aに限らず裏面2bに設けられていてもよい。
【0031】
そこで、図4は裏面2bの配線パターンの形状を示したものであるが、半田バンプ3が接続される複数のランド2eが、中央部付近を除いて複数行/複数列でアレイ状に配列されており、さらに4つの補助配線2iが形成されている。なお、それぞれの補助配線2iは、その内側の端部がランド2eに直接接続されており、図6に示すようなビア配線2jを介して主面2a側の配線2hと接続されている。
【0032】
また、裏面2bに形成された補助配線2iの外側寄りの端部付近はスルーホール配線などを介して主面2a側の配線2hと接続されており、これにより、裏面1c側の補助配線2iも主面2aの配線2hとバイパス状に接続されている。
【0033】
なお、図4の裏面2bの補助配線2iのように、主面2aの配線2hに比較して配線幅を全体的に細く形成しておくことにより、配線2hと補助配線2iとに熱ストレスがかかった際に、意図的に細い方に熱ストレスを集中させて細い方が切断するようにしてもよい。
【0034】
すなわち、主面2aまたは裏面2bあるいは両面に補助配線2iを形成する際に、主の配線2hと配線幅を変えておくことにより、熱ストレスがかかった際に細い方に熱ストレスを集中させて細い方を切断し、太い方が残るようにしてもよい。
【0035】
また、図6は、パッケージ基板2のランド構造を示したものであり、主面2aと裏面2bのランド2eがビア配線2jを介して接続されており、さらに、パッケージ基板2の表裏面には、各ランド2cの接続領域を除いて絶縁膜であるソルダレジスト2gが形成されている。
【0036】
すなわち、パッケージ基板2では、基材2dに形成された貫通孔2fに導電性ペーストなどが埋め込まれてビア配線2jが形成され、その両側にランド2cが形成され、さらに各ランド2cの中央付近を露出させて絶縁膜であるソルダレジスト2gが形成されている。
【0037】
また、図2に示すように、半導体チップ1は、例えば、シリコンなどによって形成され、かつその主面1bに半導体集積回路が形成されるとともに、主面1bの周縁部には表面電極である複数のパッド1aが形成されている。
【0038】
さらに、半導体チップ1は、絶縁性ペースト材や絶縁フィルム材などの接着材であるダイボンド材5によってパッケージ基板2の主面2aのほぼ中央付近に固着されている。
【0039】
また、ワイヤボンディングによって接続されるワイヤ4は、例えば、金線などであり、パッケージ基板2の主面2a側の接続端子2cに接続されており、これによって、半導体チップ1のパッド1aとこれに対応するパッケージ基板2の接続端子2cとを接続している。
【0040】
次に、本実施の形態における半導体装置(CSP9)の製造方法について説明する。
【0041】
なお、本実施の形態のCSP9の製造方法は、複数のデバイス領域7aがマトリクス配列で形成された多数個取り基板7を用いて、複数のデバイス領域7aを一括モールドした後、ダイシングによって個片化するものである。
【0042】
まず、配線2hとこれにバイパス状に電気的に接続された補助配線2iとを有し、かつ補助配線2iが主面2aに形成された図7に示す配線基板である多数個取り基板7を準備する。
【0043】
なお、多数個取り基板7は、図3、図4に示すパッケージ基板2の集合体であり、有機基板である。
【0044】
すなわち、多数個取り基板7には、ダイシングライン7bによって区画された複数のデバイス領域7aがマトリクス配列で形成されており、一括モールド後のダイシングによって個々のパッケージ基板2に分割される。
【0045】
なお、各デバイス領域7aには、各パッケージ基板2のインデックスとなるマーク2kがその表裏面の角部などに形成されている。
【0046】
さらに、多数個取り基板7には、組み立て時の搬送ガイドに用いられるガイド孔7cなどが設けられている。
【0047】
その後、多数個取り基板7の各デバイス領域7aに半導体チップ1を搭載する。本実施の形態では、各デバイス領域7aにおける補助配線2i上に半導体チップ1の裏面1cの端部が配置されるように半導体チップ1を搭載する。
【0048】
その際、各デバイス領域7aに対して、まず、ダイボンド材5を塗布し、このダイボンド材5を介して半導体チップ1を固定する。
【0049】
その後、図8に示すように、ワイヤボンディングを行う。
【0050】
ここでは、図2に示すように半導体チップ1のパッド1aとこれに対応する多数個取り基板7のデバイス領域7aの接続端子2cとをワイヤ4によって電気的に接続する。
【0051】
その後、一括モールドを行う。
【0052】
その際、図9に示すように、上金型13aと下金型13bとを有するモールド金型13のキャビティ13cによって多数個取り基板7の複数のデバイス領域7aを一括で覆い、その後、複数のデバイス領域7aを一括で覆った状態でキャビティ13c内に封止用樹脂を供給して樹脂封止を行う。
【0053】
これによって、図10に示す一括モールド部8を形成する。
【0054】
その後、多数個取り基板7の各デバイス領域7abに半田バンプ3を搭載する。この場合、バンプ形成にはんだ印刷方式による形成方式を用いることも可能である。
【0055】
その後、図10に示すように、切断刃であるブレード10を用いて一括モールド部8をデバイス領域単位に切断して個片化する。
【0056】
これにより、図1および図2に示す本実施の形態のCSP9の組み立て完了となる。
【0057】
なお、半田バンプ3の搭載は、個片化後に行ってもよい。
【0058】
本実施の形態のCSP9では、パッケージ基板2においてその配線2hに対してバイパス状に接続された補助配線2iが形成されたことにより、熱ストレスがかかった際に配線2hと補助配線2iのうちどちらか一方が断線したとしても他方が繋がっており、一方の断線をカバーすることが可能になる。
【0059】
これにより、配線2hは電気的に繋がっているため、CSP9の信頼性の向上を図ることができる。
【0060】
また、パッケージ基板2の裏面2bも利用して裏面2bにも補助配線2iを設けるなどして、表裏面の配線領域を多彩に活用することにより、さらに、信頼性を向上できるとともに、大電圧に対しても対応が可能となり、その結果、電気的特性の向上を図ることができる。設計上で電気特性上、インダクタンス・キャパシタンス・抵抗などを考慮すべき配線設計の際の適用も可となる。
【0061】
これにより、例えば、自動車用途向けなどの高耐久性が必要とされるものなどに対しても効果的にCSP9を搭載することができ、安全性を高め、かつ信頼性を確保することができる。
【0062】
また、補助配線2iを設けたことにより、熱ストレスを配線2hと補助配線2iとに分散させることができ、したがって、1つの配線2hまたは補助配線2iにかかる熱ストレスを低減することができる。
【0063】
その結果、断線を引き起こしにくくすることができる。
【0064】
また、補助配線2iを設けたことにより、配線パターンの配置バランスを良くすることができる。したがって、パッケージ基板2の剛性を高めることができ、パッケージ基板2の反りを低減することができる。
【0065】
以上、本発明者によってなされた発明を発明の実施の形態に基づき具体的に説明したが、本発明は前記発明の実施の形態に限定されるものではなく、その要旨を逸脱しない範囲で種々変更可能であることは言うまでもない。
【0066】
例えば、前記実施の形態では、半導体装置がCSP9の場合を説明したが、前記半導体装置は、補助配線2iが形成された配線基板を有するものであれば、LGA(Land Grid Array)などであってもよい。
【0067】
また、前記半導体装置の組み立てにおいても、必ずしも一括モールドでなくてもよく、モールド時に、多数個取り基板7においてそれぞれのデバイス領域をモールド金型13の別々のキャビティ13cで覆って樹脂モールドを行ってもよく、さらに、多数個取り基板7を予め個片化してパッケージ基板2とした状態から半導体装置を組み立ててもよい。
【0068】
また、前記実施の形態では、1つの配線2hに対して1つの補助配線2iが設けられている場合を説明したが、1つの配線2hに対する補助配線2iの設置数は、1つであっても、また2つ以上の複数であってもよい。
【0069】
【発明の効果】
本願において開示される発明のうち、代表的なものによって得られる効果を簡単に説明すれば、以下のとおりである。
【0070】
配線基板においてその配線に対してバイパス状に接続された補助配線が形成されていることにより、熱ストレスがかかった際に配線と補助配線のうちどちらか一方が断線したとしても他方が繋がっており、一方の断線をカバーすることができる。これにより、配線は電気的に繋がっているため、半導体装置の信頼性を向上できる。また、電気特性上、基板配線上でインダクタンス・キャパシタンス・抵抗などの設計要因でも本構造を採用することにより、汎用的設計が可能となる。
【図面の簡単な説明】
【図1】本発明の実施の形態の半導体装置の一例であるCSPの構造を示す斜視図である。
【図2】図1に示すCSPの構造の一例を示す断面図である。
【図3】図1に示すCSPの配線基板における主面側の配線パターンの一例を示す平面図である。
【図4】図3に示す配線基板の裏面側のランド形状の一例を示す底面図である。
【図5】図3に示す配線基板の主面におけるチップ搭載可能エリアの一例を示す平面図である。
【図6】図3に示す配線基板におけるランドと半田バンプの構造の一例を示す拡大部分断面図である。
【図7】図1に示すCSPの組み立てに用いられる多数個取り基板の構造の一例を示す平面図である。
【図8】図1に示すCSPの組み立てにおけるワイヤボンディング後の構造を示す断面図である。
【図9】図1に示すCSPの組み立てにおける樹脂モールディング時の構造を示す断面図である。
【図10】図1に示すCSPの組み立てにおける個片化時の構造を示す側面図である。
【符号の説明】
1  半導体チップ
1a パッド(表面電極)
1b 主面
1c 裏面
2  パッケージ基板(配線基板)
2a 主面
2b 裏面
2c 接続端子
2d 基材
2e ランド
2f 貫通孔
2g ソルダレジスト
2h 配線
2i 補助配線
2j ビア配線
2k マーク
3  半田バンプ(バンプ電極)
4  ワイヤ
5  ダイボンド材
6  封止部
7 多数個取り基板(配線基板)
7a デバイス領域
7b ダイシングライン
7c ガイド孔
8  一括モールド部
9  CSP(半導体装置)
10  ブレード
11 最小チップ搭載エリア
12 最大チップ搭載エリア
13 モールド金型
13a 上金型
13b 下金型
13c キャビティ
[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to a semiconductor manufacturing technique, and more particularly to a technique that is effective when applied to improvement in reliability of thermal characteristics of a semiconductor device. In addition, the present invention relates to a technique which is effective when applied to improve the reliability of electrical characteristics.
[0002]
[Prior art]
The technology described below has been studied by the inventor when researching and completing the present invention, and the outline thereof is as follows.
[0003]
Among semiconductor devices of resin-encapsulated type, a semiconductor package in which a semiconductor chip is mounted on a wiring board and assembled with resin by resin molding is becoming thinner and smaller, and a CSP (Chip Size) has been widely used. A small package called “Package” has been developed.
[0004]
In a substrate type CSP, an organic substrate (wiring substrate) is often used as an interposer. However, as the size of the semiconductor package is reduced, the terminal pitch is becoming finer, and the number of pins tends to increase due to the increase in the number of pins.
[0005]
The semiconductor device having a resin substrate is described in, for example, JP-A-2000-124163.
[0006]
[Problems to be solved by the invention]
In the above technique, the wiring width of the wiring board must be formed as narrow as possible by fine pitching. However, since the thermal expansion coefficient of the copper foil, which is the wiring, and the solder resist, which is the insulating film that covers the surface of the wiring, are different, thermal stress in a thermal cycle test or the like is concentrated on the thin wiring, causing a problem of disconnection. .
[0007]
The present inventor has found that the disconnection mainly occurs on the surface of the wiring board on the chip mounting side (hereinafter, this surface is referred to as a main surface) and in an area corresponding to the edge of the back surface of the semiconductor chip. Was.
[0008]
This is because the strength (rigidity) of the substrate is different between the region where the semiconductor chip is present and the region where the semiconductor chip is not present, so that the amount of heat shrinkage is different between the outside and the inside of the boundary, thereby causing disconnection.
[0009]
An object of the present invention is to provide a semiconductor device for improving reliability and a method for manufacturing the same.
[0010]
The above and other objects and novel features of the present invention will become apparent from the description of the present specification and the accompanying drawings.
[0011]
[Means for Solving the Problems]
The following is a brief description of an outline of typical inventions disclosed in the present application.
[0012]
That is, the present invention provides a wiring board having a main surface and a back surface opposite to the main surface, and on which a wiring and an auxiliary wiring electrically connected to the wiring in a bypass manner are formed, and a main surface of the wiring substrate. And a semiconductor chip electrically connected to the connection terminal on the main surface, and a plurality of external terminals provided on the wiring board and electrically connected to the surface electrodes of the semiconductor chip, respectively. And the auxiliary wiring is formed on at least one of the main surface and the back surface of the wiring substrate.
[0013]
Further, the present invention provides a step of preparing a wiring board having a wiring and an auxiliary wiring electrically connected in a bypass shape to the wiring board, and having the auxiliary wiring formed on a main surface thereof; Mounting the semiconductor chip on the wiring board such that the end of the back surface of the semiconductor chip is arranged on the auxiliary wiring on the surface, and connecting the front surface electrode of the semiconductor chip and the corresponding wiring board The method includes a step of connecting to a terminal and a step of sealing the semiconductor chip with a resin.
[0014]
BEST MODE FOR CARRYING OUT THE INVENTION
In the following embodiments, the description of the same or similar parts will not be repeated in principle unless necessary.
[0015]
Further, in the following embodiments, when referring to the number of elements (including the number, numerical value, amount, range, etc.), a case where it is particularly specified and a case where it is clearly limited to a specific number in principle, etc. Except, the number is not limited to the specific number, and may be more than or less than the specific number.
[0016]
Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. In all the drawings for describing the embodiments, members having the same functions are denoted by the same reference numerals, and repeated description thereof will be omitted.
[0017]
FIG. 1 is a perspective view showing a structure of a CSP as an example of a semiconductor device according to an embodiment of the present invention, FIG. 2 is a cross-sectional view showing an example of a structure of the CSP shown in FIG. 1, and FIG. FIG. 4 is a plan view showing an example of a wiring pattern on the main surface side of the wiring substrate, FIG. 4 is a bottom view showing an example of a land shape on the back surface side of the wiring substrate shown in FIG. 3, and FIG. 5 is a main surface of the wiring substrate shown in FIG. FIG. 6 is an enlarged partial cross-sectional view showing an example of the structure of lands and solder bumps on the wiring board shown in FIG. 3, and FIG. 7 is used for assembling the CSP shown in FIG. FIG. 8 is a plan view showing an example of the structure of a multi-piece substrate, FIG. 8 is a cross-sectional view showing a structure after wire bonding in assembling the CSP shown in FIG. 1, and FIG. 9 is a structure at the time of resin molding in assembling the CSP shown in FIG. Indicating a break FIG, 10 is a side view showing the structure of a time singulation in the assembly of CSP illustrated in Fig.
[0018]
The semiconductor device of the present embodiment shown in FIGS. 1 and 2 is a small semiconductor package called a CSP 9, and a plurality of solder bumps (bump electrodes) 3 as external terminals are provided on a package substrate 2 serving as a wiring substrate. They are arranged in an array on the back surface 2b in a plurality of rows / a plurality of columns.
[0019]
However, in the CSP 9 shown in FIG. 2, the solder bumps 3 are not arranged near the center of the substrate below the chip, but the solder bumps 3 may be arranged also near this center.
[0020]
The CSP 9 of the present embodiment is assembled using a multi-piece substrate 7 in which a plurality of device regions 7a (regions of a semiconductor device) as shown in FIG. The device region 7a is collectively covered with one cavity 13c of the molding die 13 as shown in FIG. 9 and resin-molded (hereinafter referred to as collective molding), and the collective molding portion 8 formed thereby And the multi-piece substrate 7 are diced into individual pieces after molding.
[0021]
The structure of the CSP 9 will be described. A package which is a wiring board having a main surface 2a and a back surface 2b opposite to the main surface, and on which a wiring 2h and an auxiliary wiring 2i electrically connected in a bypass manner are formed. The substrate 2, the semiconductor chip 1 mounted on the main surface 2 a of the package substrate 2, and the pads 1 a which are surface electrodes of the semiconductor chip 1 and the corresponding connection terminals 2 c of the package substrate 2 are electrically connected to each other. A plurality of wires 4, a plurality of solder bumps (bump electrodes) 3 as external terminals provided on the back surface 2 b of the package substrate 2, and a sealing portion 6 for sealing the semiconductor chip 1 and the plurality of wires 4. The auxiliary wiring 2i of the package substrate 2 is formed in a region corresponding to the end of the back surface 1c of the semiconductor chip 1 on the main surface 2a. In P9, auxiliary wiring 2i is formed on the back surface 2b of the package substrate 2 as shown in FIG.
[0022]
The auxiliary wiring 2i is disconnected when a thermal stress caused by a difference in thermal expansion coefficient between the wiring 2h made of copper foil and the solder resist 2g which is an insulating film covering the surface is applied to the package substrate 2. It solves the problem of doing.
[0023]
That is, the auxiliary wiring 2i is electrically connected at both ends to the main wiring 2h and formed in a bypass shape. When the thermal stress is applied, the auxiliary wiring 2i is formed of the main wiring 2h and the auxiliary wiring 2i. Even if one of them is disconnected, the other remains.
[0024]
Therefore, it is preferable to provide the auxiliary wiring 2i in a place where disconnection due to thermal stress is likely to occur. Therefore, the wiring 2h formed so as to straddle the vicinity of the end of the back surface 1c of the semiconductor chip 1 between the inside and the outside thereof is likely to be disconnected due to the thermal stress. In other words, a large difference occurs in the rigidity of the package substrate 2 between the region where the semiconductor chip 1 is present and the region where the semiconductor chip 1 is not present. The wiring 2h straddling the end of the chip 1) is easily broken.
[0025]
Here, FIGS. 3 and 4 show the wiring patterns of the package substrate 2 of the CSP 9 of the present embodiment, where FIG. 3 shows the main surface 2a and FIG. 4 shows the back surface 2b. .
[0026]
FIGS. 3 to 5 show the wiring patterns of the main surface 2a and the back surface 2b, respectively, but the surface of each of them is insulated except for a part (where the wires 4 and the solder bumps 3 are connected). Although a solder resist 2g, which is a film, is formed, FIGS. 3 to 5 show only the wiring pattern on each surface through the solder resist 2g.
[0027]
As shown in FIG. 3, on the main surface 2a of the package substrate 2, a plurality of via wirings 2j are provided in an array around the outside of the chip mounting area, and further radially outward from each via wiring 2j. The connection terminal 2c to which the wire 4 is connected is formed in the middle of each wiring 2h. Of the wirings 2h on the main surface 2a, bypass auxiliary wirings 2i are formed for four wirings 2h.
[0028]
FIG. 5 shows the chip mountable area on the main surface 2a of the package substrate 2, and the area between the lower limit minimum chip mount area 11 and the upper limit maximum chip mount area 12 is the chip mountable area. Area.
[0029]
As a result, since the end of the back surface 1c of the semiconductor chip 1 is arranged in the area between the minimum chip mounting area 11 and the maximum chip mounting area 12, disconnection easily occurs in the area, and therefore, It is preferable to provide the auxiliary wiring 2i. In the example shown in FIG. 5, four auxiliary wirings 2i are provided in a region between the minimum chip mounting area 11 and the maximum chip mounting area 12.
[0030]
However, the area where the auxiliary wiring 2i is provided is not limited to the area corresponding to the vicinity of the end of the back surface 1c of the semiconductor chip 1, that is, the area between the minimum chip mounting area 11 and the maximum chip mounting area 12. May be provided in other regions, and may be provided not only on the main surface 2a but also on the back surface 2b.
[0031]
FIG. 4 shows the shape of the wiring pattern on the back surface 2b. A plurality of lands 2e to which the solder bumps 3 are connected are arranged in an array in a plurality of rows / columns except for the vicinity of the center. In addition, four auxiliary wirings 2i are formed. Each auxiliary wiring 2i has its inner end directly connected to the land 2e, and is connected to the wiring 2h on the main surface 2a side via a via wiring 2j as shown in FIG.
[0032]
In addition, the vicinity of the end near the outside of the auxiliary wiring 2i formed on the back surface 2b is connected to the wiring 2h on the main surface 2a side through a through-hole wiring or the like, whereby the auxiliary wiring 2i on the back surface 1c side is also connected. It is connected to the wiring 2h of the main surface 2a in a bypass shape.
[0033]
In addition, as in the case of the auxiliary wiring 2i on the back surface 2b in FIG. 4, by forming the wiring width as a whole smaller than the wiring 2h on the main surface 2a, thermal stress is applied to the wiring 2h and the auxiliary wiring 2i. When it is applied, the thinner side may be cut by intentionally concentrating heat stress on the thinner side.
[0034]
That is, when forming the auxiliary wiring 2i on the main surface 2a or the back surface 2b or both surfaces, by changing the wiring width from that of the main wiring 2h, when the thermal stress is applied, the thermal stress is concentrated on the thinner side. The thinner one may be cut off so that the thicker one remains.
[0035]
FIG. 6 shows a land structure of the package substrate 2. The land 2e of the main surface 2a and the back surface 2b are connected via a via wiring 2j. Except for the connection region of each land 2c, a solder resist 2g which is an insulating film is formed.
[0036]
That is, in the package substrate 2, a via paste 2j is formed by embedding a conductive paste or the like in the through-hole 2f formed in the base material 2d, lands 2c are formed on both sides thereof, and the vicinity of the center of each land 2c is formed. The exposed solder resist 2g as an insulating film is formed.
[0037]
As shown in FIG. 2, the semiconductor chip 1 is formed of, for example, silicon or the like, has a semiconductor integrated circuit formed on a main surface 1b thereof, and has a plurality of surface electrodes on a peripheral portion of the main surface 1b. Are formed.
[0038]
Further, the semiconductor chip 1 is fixed to the vicinity of substantially the center of the main surface 2a of the package substrate 2 by a die bonding material 5 which is an adhesive such as an insulating paste material or an insulating film material.
[0039]
Further, the wire 4 connected by wire bonding is, for example, a gold wire, and is connected to the connection terminal 2c on the main surface 2a side of the package substrate 2, whereby the pad 1a of the semiconductor chip 1 is connected to the connection terminal 2c. The corresponding connection terminal 2c of the package substrate 2 is connected.
[0040]
Next, a method for manufacturing the semiconductor device (CSP9) according to the present embodiment will be described.
[0041]
In the method of manufacturing the CSP 9 according to the present embodiment, a plurality of device regions 7a are collectively molded using a multi-piece substrate 7 in which a plurality of device regions 7a are formed in a matrix arrangement, and then, individualized by dicing. Is what you do.
[0042]
First, a multi-piece substrate 7 which is a wiring board shown in FIG. 7 having a wiring 2h and an auxiliary wiring 2i electrically connected thereto in a bypass shape, and having the auxiliary wiring 2i formed on the main surface 2a is provided. prepare.
[0043]
The multi-piece substrate 7 is an aggregate of the package substrates 2 shown in FIGS. 3 and 4, and is an organic substrate.
[0044]
That is, a plurality of device regions 7a partitioned by dicing lines 7b are formed in a matrix array on the multi-piece substrate 7, and are divided into individual package substrates 2 by dicing after batch molding.
[0045]
In each device region 7a, a mark 2k serving as an index of each package substrate 2 is formed at a corner portion on the front and back surfaces thereof.
[0046]
Further, the multi-cavity substrate 7 is provided with a guide hole 7c used for a conveyance guide at the time of assembly.
[0047]
After that, the semiconductor chip 1 is mounted on each device region 7a of the multi-piece substrate 7. In the present embodiment, the semiconductor chip 1 is mounted such that the end of the back surface 1c of the semiconductor chip 1 is arranged on the auxiliary wiring 2i in each device region 7a.
[0048]
At this time, first, a die bonding material 5 is applied to each device region 7a, and the semiconductor chip 1 is fixed via the die bonding material 5.
[0049]
Thereafter, as shown in FIG. 8, wire bonding is performed.
[0050]
Here, as shown in FIG. 2, the pads 1 a of the semiconductor chip 1 and the corresponding connection terminals 2 c of the device region 7 a of the multi-piece substrate 7 are electrically connected by wires 4.
[0051]
Thereafter, collective molding is performed.
[0052]
At this time, as shown in FIG. 9, a plurality of device regions 7a of the multi-piece substrate 7 are collectively covered by a cavity 13c of a mold 13 having an upper mold 13a and a lower mold 13b. A sealing resin is supplied into the cavity 13c while the device region 7a is collectively covered to perform resin sealing.
[0053]
Thereby, the collective molding section 8 shown in FIG. 10 is formed.
[0054]
After that, the solder bumps 3 are mounted on each device region 7ab of the multi-piece substrate 7. In this case, it is also possible to use a solder printing method for bump formation.
[0055]
Thereafter, as shown in FIG. 10, the batch molding unit 8 is cut into individual device regions by using a blade 10 as a cutting blade.
[0056]
Thus, the assembly of the CSP 9 of the present embodiment shown in FIGS. 1 and 2 is completed.
[0057]
The mounting of the solder bumps 3 may be performed after individualization.
[0058]
In the CSP 9 of the present embodiment, since the auxiliary wiring 2i connected in a bypass shape to the wiring 2h is formed on the package substrate 2, which of the wiring 2h and the auxiliary wiring 2i is applied when thermal stress is applied. Even if one of them is disconnected, the other is connected, and it is possible to cover one of the disconnections.
[0059]
Thus, since the wiring 2h is electrically connected, the reliability of the CSP 9 can be improved.
[0060]
In addition, by utilizing the back surface 2b of the package substrate 2 and providing the auxiliary wiring 2i also on the back surface 2b to utilize the wiring area on the front surface and the back surface in various ways, the reliability can be further improved and the voltage can be increased. Accordingly, it is possible to cope with the problem, and as a result, it is possible to improve the electrical characteristics. The present invention can also be applied to wiring design in which inductance, capacitance, resistance, and the like should be considered in terms of electrical characteristics in design.
[0061]
Thus, for example, the CSP 9 can be effectively mounted on a device requiring high durability such as for an automobile, and the safety can be improved and the reliability can be ensured.
[0062]
Further, by providing the auxiliary wiring 2i, the thermal stress can be dispersed to the wiring 2h and the auxiliary wiring 2i, and therefore, the thermal stress applied to one wiring 2h or the auxiliary wiring 2i can be reduced.
[0063]
As a result, it is possible to prevent disconnection.
[0064]
Further, by providing the auxiliary wiring 2i, the arrangement balance of the wiring patterns can be improved. Therefore, the rigidity of the package substrate 2 can be increased, and the warpage of the package substrate 2 can be reduced.
[0065]
As described above, the invention made by the inventor has been specifically described based on the embodiment of the invention. However, the invention is not limited to the embodiment of the invention, and various modifications may be made without departing from the gist of the invention. It goes without saying that it is possible.
[0066]
For example, in the above-described embodiment, the case where the semiconductor device is the CSP 9 is described. However, if the semiconductor device has a wiring board on which the auxiliary wiring 2i is formed, an LGA (Land Grid Array) or the like is used. Is also good.
[0067]
Also, in assembling the semiconductor device, it is not always necessary to perform collective molding. At the time of molding, each device region of the multi-piece substrate 7 is covered with a separate cavity 13c of the mold 13 and resin molding is performed. Alternatively, the semiconductor device may be assembled from a state in which the multi-piece substrate 7 is singulated in advance to form the package substrate 2.
[0068]
Further, in the above-described embodiment, the case where one auxiliary wiring 2i is provided for one wiring 2h has been described, but the number of auxiliary wirings 2i provided for one wiring 2h may be one. Or two or more.
[0069]
【The invention's effect】
The effects obtained by typical aspects of the invention disclosed in the present application will be briefly described as follows.
[0070]
By forming an auxiliary wiring connected in a bypass shape to the wiring on the wiring board, even if one of the wiring and the auxiliary wiring is broken when thermal stress is applied, the other is connected. , One of the disconnections can be covered. Thus, the wiring is electrically connected, so that the reliability of the semiconductor device can be improved. In addition, by adopting this structure in terms of electrical characteristics, design factors such as inductance, capacitance, and resistance on the substrate wiring, general-purpose design becomes possible.
[Brief description of the drawings]
FIG. 1 is a perspective view showing a structure of a CSP which is an example of a semiconductor device according to an embodiment of the present invention.
FIG. 2 is a sectional view showing an example of the structure of the CSP shown in FIG.
FIG. 3 is a plan view showing an example of a wiring pattern on a main surface side of the wiring board of the CSP shown in FIG. 1;
FIG. 4 is a bottom view showing an example of a land shape on the back surface side of the wiring board shown in FIG. 3;
FIG. 5 is a plan view showing an example of a chip mountable area on a main surface of the wiring board shown in FIG. 3;
FIG. 6 is an enlarged partial cross-sectional view showing an example of a structure of lands and solder bumps on the wiring board shown in FIG.
FIG. 7 is a plan view showing an example of the structure of a multi-piece substrate used for assembling the CSP shown in FIG.
FIG. 8 is a sectional view showing a structure after wire bonding in assembling the CSP shown in FIG. 1;
FIG. 9 is a cross-sectional view showing a structure during resin molding in assembling the CSP shown in FIG. 1;
10 is a side view showing a structure of the CSP shown in FIG. 1 at the time of singulation.
[Explanation of symbols]
1 semiconductor chip 1a pad (surface electrode)
1b Main surface 1c Back surface 2 Package board (wiring board)
2a Main surface 2b Back surface 2c Connection terminal 2d Base 2e Land 2f Through hole 2g Solder resist 2h Wiring 2i Auxiliary wiring 2j Via wiring 2k Mark 3 Solder bump (bump electrode)
4 Wire 5 Die bond material 6 Sealing part 7 Multi-piece board (wiring board)
Reference numeral 7a Device area 7b Dicing line 7c Guide hole 8 Batch molding section 9 CSP (semiconductor device)
10 Blade 11 Minimum chip mounting area 12 Maximum chip mounting area 13 Mold die 13a Upper die 13b Lower die 13c Cavity

Claims (5)

主面とその反対側の裏面とを有し、配線とこれにバイパス状に電気的に接続された補助配線とが形成された配線基板と、
前記配線基板の主面に搭載され、前記主面の接続端子と電気的に接続された半導体チップと、
前記配線基板に設けられ、前記半導体チップの表面電極とそれぞれに電気的に接続される複数の外部端子とを有し、
前記補助配線は、前記配線基板の主面または裏面の少なくとも何れか一方に形成されていることを特徴とする半導体装置。
A wiring board having a main surface and a back surface opposite to the main surface, on which wiring and auxiliary wiring electrically connected in a bypass shape are formed,
A semiconductor chip mounted on a main surface of the wiring board and electrically connected to a connection terminal on the main surface;
A plurality of external terminals provided on the wiring substrate and electrically connected to the surface electrodes of the semiconductor chip, respectively;
The semiconductor device, wherein the auxiliary wiring is formed on at least one of a main surface and a back surface of the wiring substrate.
主面とその反対側の裏面とを有し、配線とこれに両端が電気的に接続された補助配線とが前記主面に形成された配線基板と、
前記配線基板の主面に搭載され、前記主面の接続端子と電気的に接続された半導体チップと、
前記配線基板に設けられ、前記半導体チップの表面電極とそれぞれに電気的に接続される複数の外部端子とを有し、
前記補助配線は、前記配線基板の主面における前記半導体チップの裏面の端部に対応した領域に形成されていることを特徴とする半導体装置。
A wiring board having a main surface and a back surface opposite to the main surface, and a wiring and auxiliary wirings both ends of which are electrically connected to the wiring surface formed on the main surface,
A semiconductor chip mounted on a main surface of the wiring board and electrically connected to a connection terminal on the main surface;
A plurality of external terminals provided on the wiring substrate and electrically connected to the surface electrodes of the semiconductor chip, respectively;
The semiconductor device, wherein the auxiliary wiring is formed in a region corresponding to an end of a back surface of the semiconductor chip on a main surface of the wiring substrate.
主面とその反対側の裏面とを有し、配線とこれに両端が電気的に接続された補助配線とが形成された配線基板と、
前記配線基板の主面に搭載され、前記主面の接続端子と電気的に接続された半導体チップと、
前記配線基板に設けられ、前記半導体チップの表面電極とそれぞれに電気的に接続される複数の外部端子とを有し、
前記配線と前記補助配線とで配線幅が異なっていることを特徴とする半導体装置。
A wiring board having a main surface and a back surface opposite to the main surface, and having a wiring and auxiliary wirings both ends of which are electrically connected thereto,
A semiconductor chip mounted on a main surface of the wiring board and electrically connected to a connection terminal on the main surface;
A plurality of external terminals provided on the wiring substrate and electrically connected to the surface electrodes of the semiconductor chip, respectively;
A semiconductor device, wherein a wiring width is different between the wiring and the auxiliary wiring.
主面とその反対側の裏面とを有し、配線とこれに両端が電気的に接続された補助配線とが形成された配線基板と、
前記配線基板の主面に搭載された半導体チップと、
前記半導体チップの表面電極とこれに対応する前記配線基板の接続端子とをそれぞれに電気的に接続する複数のワイヤと、
前記配線基板の裏面に設けられた外部端子である複数のバンプ電極と、
前記半導体チップおよび前記複数のワイヤを封止する封止部とを有し、
前記補助配線は、前記配線基板の主面における前記半導体チップの裏面の端部に対応した領域と前記配線基板の裏面とに形成されていることを特徴とする半導体装置。
A wiring board having a main surface and a back surface opposite to the main surface, and having a wiring and auxiliary wirings both ends of which are electrically connected thereto,
A semiconductor chip mounted on a main surface of the wiring board,
A plurality of wires for electrically connecting the surface electrodes of the semiconductor chip and the corresponding connection terminals of the wiring board, respectively,
A plurality of bump electrodes that are external terminals provided on the back surface of the wiring board,
Having a sealing portion for sealing the semiconductor chip and the plurality of wires,
The semiconductor device, wherein the auxiliary wiring is formed in a region corresponding to an end of a back surface of the semiconductor chip on a main surface of the wiring substrate and a back surface of the wiring substrate.
配線とこれにバイパス状に電気的に接続された補助配線とを有し、前記補助配線が主面に形成された配線基板を準備する工程と、
前記配線基板の主面の前記補助配線上に半導体チップの裏面の端部が配置されるように前記配線基板上に前記半導体チップを搭載する工程と、
前記半導体チップの表面電極とこれに対応する前記配線基板の接続端子とを接続する工程と、
前記半導体チップを樹脂封止する工程とを有することを特徴とする半導体装置の製造方法。
Having a wiring and an auxiliary wiring electrically connected in a bypass shape to the wiring, a step of preparing a wiring board having the auxiliary wiring formed on a main surface,
Mounting the semiconductor chip on the wiring board such that an end of the back surface of the semiconductor chip is arranged on the auxiliary wiring on the main surface of the wiring board;
Connecting a surface electrode of the semiconductor chip and a corresponding connection terminal of the wiring board,
Sealing the semiconductor chip with a resin.
JP2002184317A 2002-06-25 2002-06-25 Semiconductor device Expired - Fee Related JP4030363B2 (en)

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7230326B2 (en) 2004-09-03 2007-06-12 Yamaha Corporation Semiconductor device and wire bonding chip size package therefor
JP2010103348A (en) * 2008-10-24 2010-05-06 Elpida Memory Inc Semiconductor device and method of manufacturing same
JP2021044583A (en) * 2020-12-04 2021-03-18 ラピスセミコンダクタ株式会社 Semiconductor device

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JPH08316596A (en) * 1995-05-12 1996-11-29 Kyocera Corp Wiring board
JPH11163201A (en) * 1997-11-28 1999-06-18 Hitachi Ltd Semiconductor device
JP2000236040A (en) * 1999-02-15 2000-08-29 Hitachi Ltd Semiconductor device

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JPH08316596A (en) * 1995-05-12 1996-11-29 Kyocera Corp Wiring board
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JP2000236040A (en) * 1999-02-15 2000-08-29 Hitachi Ltd Semiconductor device

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7230326B2 (en) 2004-09-03 2007-06-12 Yamaha Corporation Semiconductor device and wire bonding chip size package therefor
JP2010103348A (en) * 2008-10-24 2010-05-06 Elpida Memory Inc Semiconductor device and method of manufacturing same
US8810047B2 (en) 2008-10-24 2014-08-19 Ps4 Luxco S.A.R.L. Semiconductor device and method of manufacturing the same
JP2021044583A (en) * 2020-12-04 2021-03-18 ラピスセミコンダクタ株式会社 Semiconductor device
JP7020629B2 (en) 2020-12-04 2022-02-16 ラピスセミコンダクタ株式会社 Semiconductor device

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