JP2004158597A - Exposure equipment - Google Patents

Abstract

An exposure apparatus is provided which has excellent vibration proofing and can position a stage with higher accuracy.
A fixed guide (4) extending in the Y direction has both ends fixed on a surface plate (2) via two guide fixing stands (3). A slider 5 is fitted to the center of the fixed guide 4 via a gas bearing. The fixed guide 4 and the slider 5 constitute an air cylinder, and the slider 5 is driven on the Y axis. At the left and right ends of the fixed guide 4 in the figure, thin sub guides 8 extending in the Y direction extend. A box-shaped counter mass 12 is fitted to the sub-guide 8 via a gas bearing. A spool valve 13 for driving the counter mass 12 on the Y axis is provided at the upper and lower portions of the counter mass 12.
[Selection diagram] Fig. 1

Description

[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to an exposure apparatus for transferring and exposing a pattern formed on a reticle (original) onto a sensitive substrate (eg, a wafer). In particular, the present invention relates to an exposure apparatus which has excellent vibration proofing and can form a pattern with high accuracy by positioning the stage with higher accuracy.
[0002]
[Prior art]
FIG. 8 is a diagram schematically showing an overall configuration of an exposure apparatus currently used in lithography of a semiconductor device pattern.
The exposure apparatus 200 shown in FIG. 8 is installed on a floor 202. A body 203 is fixed on a floor 202 via a vibration isolator (air mount, LPF, low-pass filter) 201. The body 203 is a gate-shaped structure, and includes pillar portions 203b on both sides and a beam portion 203a extending over both pillar portions 203b. A box-shaped wafer chamber 205 is suspended and fixed to the lower surface of the beam portion 203a of the body 203. A linear guide 206 is fixed on a bottom surface 205a of the wafer chamber 205. On the linear guide 206, a wafer stage 207 for moving and positioning the wafer is mounted.
[0003]
Above the central part of the beam 203a of the body 203, a projection optical barrel 208 is installed. A reticle stage fixing base 210 is installed on the upper surface of the beam 203 a of the body 203 outside the projection optical barrel 208. On the reticle stage fixing base 210, a linear guide 211 is fixed. A reticle stage 212 for moving and positioning the reticle is mounted on the linear guide 211.
[0004]
A large box-shaped reticle chamber 213 is fixed to an outer portion of the upper surface of the beam portion 203a of the body 203. The reticle chamber 213 covers the reticle 212 and the like, and an optical lens barrel (illumination optical system) 214 is fixed to the center of the upper structure.
[0005]
The sides of the linear guide 206 and the linear guide 211 described above are supported by an RFC (Reaction Force Canceller) 223 via horizontally extending buffer members (active vibration isolation tables) 221 and 222 made of springs and dampers. The RFC 223 is a structure like a thick pillar, and a base end thereof is fixed on the floor surface 202.
[0006]
As an example of the above-described wafer stage 207 and reticle stage 212, there is a single-axis stage device supported by a non-contact hydrostatic gas bearing constituted by a movable slider and a fixed guide.
In this stage device, the moving element of the driving means is attached to a movable slider (stages 207 and 212), and the stator (not shown) of the driving means is connected to a stage base (not shown) via linear guides 211 and 206. ) Vertically. The driving reaction force of the stator is horizontally supported by the RFC 223 via the linear guides 211 and 206 and the buffer members 222 and 221 including springs and dampers.
[0007]
In the above-described apparatus, a high-frequency vibration component of the stage reaction force is removed via a vibration isolating table (air mount) 201 acting as an LPF (low-pass filter), and the active vibration isolating table installed in the main body of the exposure apparatus performs RFC 223. Vibrationally insulates the low-frequency vibration components transmitted from the floor to the floor.
[0008]
Next, the anti-shake effect of the above-described exposure apparatus will be described.
FIG. 9 is a diagram showing a vibration-proof effect of the conventional exposure apparatus.
The horizontal axis of FIG. 9 indicates the vibration frequency, and the vertical axis indicates the gain.
In FIG. 9, the floor vibration 231 generated at the time of exposure in the case where the image stabilization processing is not performed is indicated by a solid line. The gain of the floor vibration 231 is about 70 [dB] in a low frequency range of about 10 ⁻¹ to 1 [rad / s], and is high in a high frequency range of about 10 to 10 ² [rad / s]. It is about 20 [dB].
[0009]
A broken line 232 indicates the floor vibration when only the vibration isolating table (air mount) 201 of FIG. 8 is used. In this case, in the low-frequency vibration frequency region, vibration having a magnitude almost equal to the floor vibration 231 generated at the time of exposure occurs, but in the high-frequency vibration frequency region, as the frequency increases, the gain decreases and the vibration is suppressed. Have been.
[0010]
An alternate long and short dash line 233 indicates the floor vibration when vibration is suppressed as much as possible using the vibration isolator (air mount) 201, the buffer members 221 and 222, and the RFC 223 in FIG. In this case, vibration is suppressed in the high-frequency vibration frequency region in substantially the same manner as the floor vibration 232 when only the vibration isolating table 201 is used. Further, even in the low-frequency vibration frequency region, the gain is about 10 ^-1 to 1 [dB], which is smaller than the floor vibration 231 generated at the time of exposure, and the vibration is suppressed.
[0011]
[Problems to be solved by the invention]
The active anti-vibration table installed in the exposure apparatus body uses an air mount for removing high-frequency vibration components of floor vibration and an electromagnetic actuator for removing low-frequency vibration components. However, depending on the specifications of the springs and dampers of these stage buffer members and the stage drive pattern, it may not be possible to sufficiently suppress the floor vibration and remove the stage reaction force. For example, when a fixed portion that receives a driving reaction force, such as an air cylinder, is combined with and integrated with a fixed guide, high-precision non-contact guidance of the stage becomes difficult due to the reaction force generated in the fixed guide.
[0012]
The present invention has been made in view of such a problem, and an object of the present invention is to provide an exposure apparatus which is excellent in anti-vibration properties and can form a high-precision pattern by positioning a stage with higher accuracy. And
[0013]
[Means for Solving the Problems]
In order to solve the above problems, a first exposure apparatus of the present invention includes a reticle stage on which a reticle on which a desired pattern is formed is mounted, an illumination optical system that irradiates the reticle with energy ray illumination, An exposure apparatus comprising: a sensitive substrate stage on which a sensitive substrate to be transferred is placed; and a projection optical system configured to project and form an energy beam passing through the reticle onto the sensitive substrate; the reticle stage or the sensitive substrate. A stage is guided and driven in a direction opposite to the slider along a fixed guide, a slider guided and driven along the fixed guide, and a sub-guide extending from the fixed guide or an end thereof. And a counter reaction mass, wherein a driving reaction force between the slider and the fixed guide can be offset by a driving reaction force between the sub guide and the counter mass. It is characterized in.
[0014]
In an exposure apparatus having a stage device composed of a movable slider and a fixed guide receiving a driving reaction force, a counter mass driven in a direction opposite to a driving direction of the movable slider is provided on a sub-guide extending to a fixed guide shaft portion. The stage reaction force can be closed inside the stage device.
[0015]
In the method described in the related art, in which the stage reaction force is released to the foundation (floor or the like) of the entire exposure apparatus, feedback from the vibration measuring means is required to remove floor vibration that generates random vibration. On the other hand, since the reaction force due to the stage movement where the driving force is given as instructed can be predicted, the driving force for canceling the stage reaction force with the gain and phase adjusted should be generated without feedback in the direction opposite to the stage driving direction. Thus, the stage reaction force can be canceled.
[0016]
Since the reaction force can be closed by the stage apparatus alone, there is no need to arrange a rigid support structure around the exposure apparatus, and the floor area of the apparatus can be reduced. Further, the vibration isolator of the apparatus body can be used only for floor vibration isolation.
[0017]
A second exposure apparatus according to the present invention includes a reticle stage on which a reticle on which a desired pattern is formed is mounted, an illumination optical system for irradiating the reticle with energy rays, and a sensitive substrate for transferring the pattern. An exposure apparatus comprising: a sensitive substrate stage; and a projection optical system configured to project and form an energy beam that has passed through the reticle onto the sensitive substrate. The reticle stage or the sensitive substrate stage includes: a fixed guide; A slider guided and driven along a fixed guide; and a counter mass guided and driven in the fixed guide in a direction opposite to the slider, wherein a driving reaction force between the slider and the fixed guide is provided. However, it can be canceled by a driving reaction force between the fixed guide and the counter mass.
[0018]
Since the counter mass is arranged to move in the fixed guide, there is no possibility that another thing protrudes from the fixed guide, and the apparatus can be made compact.
[0019]
In the exposure apparatus, the counter mass is supported in a non-contact manner in the fixed guide or on the sub guide via an air guide, and an air cylinder is formed by the counter mass and the fixed guide or the sub guide. It is preferable to configure.
[0020]
BEST MODE FOR CARRYING OUT THE INVENTION
Hereinafter, description will be made with reference to the drawings.
First, an electron beam exposure apparatus will be described as an example of the exposure apparatus with reference to FIG.
FIG. 5 is a diagram schematically illustrating an example of the overall configuration of the electron beam exposure apparatus.
FIG. 5 schematically shows the electron beam exposure apparatus 100. An optical column (vacuum chamber) 101 is shown above the electron beam exposure apparatus 100. A vacuum pump 102 is connected to the optical barrel 101, and the inside of the optical barrel 101 is evacuated.
[0021]
An electron gun 103 is disposed above the optical barrel 101 and emits an electron beam downward. Below the electron gun 103, an illumination optical system 104 including a condenser lens 104a and an electron beam deflector 104b, and a reticle (mask) R are arranged.
[0022]
The electron beam emitted from the electron gun 103 is converged by the condenser lens 104a. Then, the light is sequentially scanned (scanned) in the horizontal direction in the figure by the deflector 104b, and illumination of each small area (subfield) of the reticle R within the visual field of the optical system 104 is performed. Although the condenser lens 104a has one stage in the drawing, the actual illumination optical system is provided with several stages of lenses, a beam shaping aperture, a blanking aperture, and the like.
[0023]
Reticle R is fixed to chuck 110 provided on reticle stage 111 by electrostatic attraction or the like. The reticle stage 111 is mounted on a surface plate 116.
[0024]
The reticle stage 111 is connected to a driving device 112 shown on the left side of the figure. In practice, the driving device 112 is incorporated in the stage 111 as shown in FIG. The driving device 112 is connected to a control device 115 via a driver 114. A laser interferometer 113 is provided on the side (right side in the figure) of the reticle stage 111. The laser interferometer 113 is connected to the control device 115. Accurate positional information of the reticle stage 111 measured by the laser interferometer 113 is input to the control device 115. A command is sent from the control device 115 to the driver 114 so that the position of the reticle stage 111 is set as the target position, and the driving device 112 is driven. As a result, the position of the reticle stage 111 can be accurately feedback-controlled in real time.
[0025]
Below the platen 116, a wafer chamber (vacuum chamber) 121 is shown. A vacuum pump 122 is connected to the side of the wafer chamber 121 (the right side in the drawing), and the inside of the wafer chamber 121 is evacuated.
A projection optical system 124 including a condenser lens (projection lens) 124a, a deflector 124b, and the like is arranged in the wafer chamber 121 (actually, in an optical barrel in the chamber). Further, a wafer (sensitive substrate) W is arranged in a lower part in the wafer chamber 121.
[0026]
The electron beam that has passed through the reticle R is converged by the condenser lens 124a. The electron beam that has passed through the condenser lens 124a is deflected by the deflector 124b, and an image of the reticle R is formed at a predetermined position on the wafer W. Although the condenser lens 124a has one stage in the drawing, in practice, a plurality of stages of lenses, aberration correcting lenses and coils are provided in the projection optical system.
[0027]
The wafer W is fixed to a chuck 130 provided above the wafer stage 131 by electrostatic attraction or the like. The wafer stage 131 is mounted on the surface plate 136.
[0028]
A driving device 132 shown on the left side of the drawing is connected to the wafer stage 131. In practice, the driving device 132 is incorporated in the stage 131 as shown in FIG. The driving device 132 is connected to the control device 115 via a driver 134. A laser interferometer 133 is provided on the side (right side in the figure) of the wafer stage 131. The laser interferometer 133 is connected to the control device 115. The accurate position information of the wafer stage 131 measured by the laser interferometer 133 is input to the control device 115. A command is sent from the control device 115 to the driver 134 so that the position of the wafer stage 131 is set as the target position, and the driving device 132 is driven. As a result, the position of the wafer stage 131 can be feedback-controlled accurately in real time.
[0029]
Next, a stage device used in the exposure apparatus according to the embodiment of the present invention will be described.
FIG. 1 is a side view showing the configuration of the stage device of the exposure apparatus according to the first embodiment of the present invention.
FIG. 1 shows a single-axis stage device 1. The stage device 1 corresponds to the reticle stage 111 in FIG. If a moving guide and a self-propelled table are placed on the slider 5, an I-type or H-type biaxial stage device can be obtained.
[0030]
FIG. 1 shows a bar-shaped fixed guide 4 extending in the Y direction. The fixed guide 4 has both ends fixed to the surface plate 2 via two guide fixing bases 3. A slider 5 is fitted to the center of the fixed guide 4 via a gas bearing (see FIG. 2 and details will be described later). The fixed guide 4 and the slider 5 constitute an air cylinder (see FIG. 2 and details will be described later), and the slider 5 is driven on the Y axis.
[0031]
At the left and right end portions of the fixed guide 4 in the drawing, a thin bar-shaped sub-guide 8 extending in the Y direction extends. The sub-guide 8 is fitted with a box-shaped counter mass 12 via a gas bearing (see FIG. 3). A spool valve 13 (see FIG. 3) for controlling the driving of the counter mass 12 on the Y axis is provided at the upper and lower portions of the counter mass 12.
[0032]
Next, the configuration of the air cylinder will be described with reference to FIG.
FIG. 2 is a side sectional view showing a configuration of an air cylinder including a fixed guide and a slider.
FIG. 2 shows an air cylinder including the slider 5 and the fixed guide 4 shown in FIG.
[0033]
The slider 5 has a block shape, and is provided with a gas chamber 33 in a central portion thereof so as to be cut out. A sliding inner hole with the guide 4 is formed on the side of each gas chamber 33, and an air pad 51 is provided on the inner hole surface. Outside the air pad 51, an air release guard ring 52, a low vacuum exhaust guard ring 53, and a high vacuum exhaust guard ring 55 are sequentially provided. By exhausting the air in the air pad and the gas chamber from these guard rings, it is possible to prevent air from leaking too much into the chamber maintained at a high vacuum.
[0034]
The fixed guide 4 is fitted to the slider 5. At the top and bottom of the center of the fixed guide 4, partition plates 31 are shown. The partition plate 31 has a plate shape extending in the XZ plane having a certain thickness, and is fitted in the gas chamber 33 at a certain interval. Each gas chamber 33 is divided into two gas chambers 33 a and 33 b by a partition plate 31.
[0035]
Inside the fixed guide 4, four gas passages 35 extending long in the Y direction are indicated by broken lines. One end of each passage 35 is disposed so as to supply gas to the gas chambers 33a and 33b of the slider 5 on the side of the partition plate 31, respectively. Gas is supplied to the other end of the passage 35 from an external device. By adjusting the pressure of the gas supplied to the gas chambers 33a and 33b, the slider 5 can be driven on the fixed guide 4 in the Y direction. Although not shown, a passage for supplying gas to the air pad 51 and collecting and exhausting gas from the guard rings 52, 53, 55 is also formed in the fixed guide 4.
[0036]
Next, the configuration of the counter mass 12 will be described with reference to FIG.
FIG. 3 is a side sectional view showing the configuration of the counter mass 12.
FIG. 3 shows the counter mass 12 fitted to the sub guide 8. A spool valve 13 is provided at the upper and lower portions of the counter mass 12.
The counter mass 12 is in the form of a block, and is provided with a gas chamber 43 in a central portion thereof so as to be cut out. Two gas passages 44 a and 44 b are provided in the counter mass 12 from the end of the gas chamber 43 to the spool valve 13. A supply pipe 45a for supplying gas and exhaust pipes 45b and 45c for exhausting gas are connected to the spool valve 13.
[0037]
On the side of the gas chamber 43 of the counter mass 12, a sliding inner hole with the auxiliary guide 8 is formed on the side, and an air pad 51 is provided on the inner hole surface. Outside the air pad 51, an air release guard ring 52, a low vacuum exhaust guard ring 53, and a high vacuum exhaust guard ring 55 are sequentially provided. By exhausting the air in the air pad and the gas chamber from these guard rings, it is possible to prevent air from leaking too much into the chamber maintained at a high vacuum.
[0038]
On the upper and lower end faces near the center of the sub guide 8 fitted to the counter mass 12, a dividing plate 46 is shown. The partition plate 46 has a plate shape extending in the XZ plane having a certain thickness, and is fitted in the gas chamber 43 at a certain interval. Each gas chamber 43 is partitioned into two gas chambers 43a and 43b by a partition plate 46. By controlling the spool valve 13 and adjusting the pressure of the gas supplied to the gas chambers 43a and 43b, the counter mass 12 can be driven in the Y direction.
[0039]
Next, the state of the stage device according to the first embodiment when the stage is driven will be described with reference to the drawings.
FIG. 4 is a side view showing a state where the stage device according to the first embodiment is driven. FIG. 4A shows a state in which the slider 5 is driven rightward in the figure, and FIG. 4B shows a state in which the slider 5 is driven leftward in the figure.
[0040]
As shown in FIG. 4A, when the slider 5 is driven rightward in the figure, the spool valve 13 is controlled to move the two counter masses 12 leftward in the figure. At this time, the counter mass 12 is driven in the direction opposite to the driving direction of the slider 5 with the same amplitude and cycle as the driving pattern of the slider 5. Here, for example, when it is desired to make the stroke of the counter mass 12 shorter than that of the slider 5, the mass of the counter mass 12 needs to be heavier than that of the slider 5 in accordance with the law of conservation of momentum.
[0041]
When the slider 5 is driven to the right, a leftward reaction force is applied to the fixed guide 4 and the sub guide 8. On the other hand, when the counter mass 12 is driven to the left, a rightward reaction force is applied to the fixed guide 4 and the sub guide 8. By controlling the two reaction forces to cancel each other, the stage reaction force can be closed inside the stage device.
[0042]
As shown in FIG. 4B, when the slider 5 is driven to the left in the figure, the spool valve 13 is controlled to move the two counter masses 12 to the right in the figure.
When the slider 5 is driven to the left, a rightward reaction force is applied to the fixed guide 4 and the sub guide 8. On the other hand, when the counter mass 12 is driven rightward, a leftward reaction force is applied to the fixed guide 4 and the sub guide 8. By controlling the two reaction forces to cancel each other, the stage reaction force can be closed inside the stage device.
[0043]
Next, a stage device used in an exposure apparatus according to another embodiment of the present invention will be described.
FIG. 6 is a side sectional view showing the configuration of the stage device of the exposure apparatus according to the second embodiment of the present invention.
FIG. 6 shows a bar-shaped fixed guide 4 'extending in the Y direction. The fixed guide 4 ′ has both ends fixed on the surface plate 2 via two guide fixing bases 3. A slider 5 is fitted to the center of the fixed guide 4 'via a gas bearing (see FIG. 2). The fixed guide 4 'and the slider 5 constitute an air cylinder (see FIG. 2), and the slider 5 is driven on the Y axis. It should be noted that piping for supplying air to the gas chamber of the slider 5 is not shown.
[0044]
Inside the fixed guide 4 ', a gas chamber 43' extending in the Y direction is provided so as to be cut out. A spool valve 13 'is provided on the left side of the fixed guide 4' in the drawing. The fixed guide 4 'is provided with two gas passages 44a' and 44b 'from both ends of the gas chamber 43' to the spool valve 13 '. A supply pipe 45a for supplying gas and exhaust pipes 45b and 45c for exhausting gas are connected to the spool valve 13 '.
[0045]
The counter mass 12 'is fitted in the gas chamber 43' so as to be slidable in the Y direction. The counter mass 12 'has the same cross-sectional shape as the gas chamber 43', and is fitted in the gas chamber 43 'at a certain interval. The gas chamber 43 'is partitioned into two gas chambers 43a' and 43b 'by the counter mass 12'. By controlling the spool valve 13 'and adjusting the pressure of the gas supplied to the gas chambers 43a' and 43b ', the counter mass 12' can be driven in the Y direction.
[0046]
Next, the state of the stage device according to the second embodiment when the stage is driven will be described with reference to the drawings.
FIG. 7 is a partial side sectional view showing a state when driving the stage device according to the second embodiment. FIG. 7A shows a state in which the slider 5 is driven rightward in the figure, and FIG. 7B shows a state in which the slider 5 is driven leftward in the figure.
[0047]
As shown in FIG. 7A, when the slider 5 is driven rightward in the figure, the spool valve 13 'is controlled to move the counter mass 12' leftward in the figure. At this time, the counter mass 12 'is driven in the direction opposite to the driving direction of the slider 5 with the same amplitude and cycle as the driving pattern of the slider 5.
[0048]
When the slider 5 is driven rightward, a leftward reaction force is applied to the fixed guide 4 '. On the other hand, when the counter mass 12 'is driven to the left, a rightward reaction force is applied to the fixed guide 4'. By controlling the two reaction forces to cancel each other, the stage reaction force can be closed inside the stage device.
[0049]
As shown in FIG. 7B, when the slider 5 is driven to the left in the figure, the spool valve 13 'is controlled to move the counter mass 12' to the right in the figure.
When the slider 5 is driven to the left, a rightward reaction force is applied to the fixed guide 4 '. On the other hand, when the counter mass 12 'is driven rightward, a leftward reaction force is applied to the fixed guide 4'. By controlling the two reaction forces to cancel each other, the stage reaction force can be closed inside the stage device.
[0050]
【The invention's effect】
As is apparent from the above description, according to the present invention, in an exposure apparatus including a stage device including a movable slider and a fixed guide receiving a driving reaction force, a counter mass driven in a direction opposite to a driving direction of the movable slider is provided. Is provided on the sub-guide extending to the fixed guide shaft, so that the stage reaction force can be closed inside the stage device.
[0051]
In the method described in the related art in which the stage reaction force is released to the foundation (floor or the like) of the entire exposure apparatus, feedback from the vibration measuring means is required to remove floor vibration that generates random vibration. On the other hand, since the reaction force due to the stage movement where the driving force is given according to the command can be predicted, the stage reaction force canceling driving force with gain and phase adjustment should be generated without feedback in the direction opposite to the stage driving direction. Thus, the stage reaction force can be canceled.
[0052]
Since the reaction force can be closed by the stage apparatus alone, there is no need to arrange a rigid support structure around the exposure apparatus, and the floor area of the apparatus can be reduced. Further, the vibration isolator of the apparatus body can be used only for floor vibration isolation.
[Brief description of the drawings]
FIG. 1 is a side view showing a configuration of a stage device of an exposure apparatus according to a first embodiment of the present invention.
FIG. 2 is a side sectional view showing a configuration of an air cylinder.
FIG. 3 is a side sectional view showing the configuration of the counter mass 12.
FIG. 4 is a side view showing a state when the stage device according to the first embodiment is driven. FIG. 4A shows a state in which the slider 5 is driven rightward in the figure, and FIG. 4B shows a state in which the slider 5 is driven leftward in the figure.
FIG. 5 is a diagram schematically illustrating an example of the overall configuration of an electron beam exposure apparatus.
FIG. 6 is a side sectional view showing a configuration of a stage device of an exposure apparatus according to a second embodiment of the present invention.
FIG. 7 is a partial side sectional view showing a state when a stage device according to a second embodiment is driven. FIG. 7A shows a state in which the slider 5 is driven rightward in the figure, and FIG. 7B shows a state in which the slider 5 is driven leftward in the figure.
FIG. 8 is a diagram schematically showing an overall configuration of an exposure apparatus currently generally used in lithography of a semiconductor device pattern.
FIG. 9 is a diagram illustrating a vibration-proof effect of a conventional exposure apparatus.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 Stage device 2 Surface plate 3 Guide fixed base 4 Fixed guide 5 Slider 8 Secondary guide 12 Counter mass 13 Spool valve

Claims (3)

A reticle stage for mounting a reticle on which a desired pattern is formed,
An illumination optical system for applying energy ray illumination to the reticle;
A sensitive substrate stage on which a sensitive substrate for transferring the pattern is placed;
A projection optical system for projecting and forming an energy ray passing through the reticle on the sensitive substrate,
An exposure apparatus comprising:
The reticle stage or the sensitive substrate stage,
Fixed guides,
A slider guided and driven along the fixed guide;
A counter mass guided and driven in a direction opposite to the slider along the fixed guide or a sub guide extending from an end thereof;
With
An exposure apparatus, wherein a driving reaction force between the slider and the fixed guide can be offset by a driving reaction force between the sub-guide and the counter mass. A reticle stage for mounting a reticle on which a desired pattern is formed,
An illumination optical system for applying energy ray illumination to the reticle;
A sensitive substrate stage on which a sensitive substrate for transferring the pattern is placed;
A projection optical system for projecting and forming an energy ray passing through the reticle on the sensitive substrate,
An exposure apparatus comprising:
The reticle stage or the sensitive substrate stage,
Fixed guides,
A slider guided and driven along the fixed guide;
A counter mass guided and driven in a direction opposite to the slider in the fixed guide;
With
An exposure apparatus wherein a driving reaction force between the slider and the fixed guide can be offset by a driving reaction force between the fixed guide and the counter mass. The counter mass is supported in a non-contact manner in the fixed guide or on the auxiliary guide via an air guide,
4. The exposure apparatus according to claim 2, wherein the counter mass and the fixed guide or the sub guide form an air cylinder.

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