JP2006210712A - Substrate processing equipment - Google Patents

Abstract

Provided is a substrate processing apparatus capable of performing a process in a safe state by preventing an operation recipe from being created in such a procedure that a substrate is collected in a cassette in an incomplete cooling state. To do.
In a substrate processing apparatus for processing a substrate by having a plurality of process chambers and executing a plurality of different processes using the plurality of process chambers, the transfer order to the process chamber is set for each substrate. A transport order designating means for designating, a substrate transport means for transporting each substrate sequentially to the process chamber in accordance with the transport order, and a process designating means for designating a process to be executed in the process chamber for each substrate. And an execution means for executing the process designated by the process designation means in the process chamber, and a determination means for determining whether or not the cooling process is designated as the last process to be executed among the processes.
[Selection] Figure 3

Description

The present invention relates to a substrate processing apparatus that has a plurality of process chambers and performs a plurality of different processes by using the plurality of process chambers, and in particular, processes a substrate in a high temperature process chamber. It has a function to do.

In general, in a single wafer type substrate processing apparatus, different processes (for example, CVD (Chem
ical Vapor Deposition), dry etching, sputtering,
Multi-process system equipment that performs heat treatment etc. has been proposed

This multi-process substrate processing apparatus usually has a plurality of process chambers, and can be applied to a plurality of different processes by one unit by executing different processes in each process chamber.

Conventionally, a substrate processing apparatus described in Japanese Patent Application Laid-Open No. 11-195573 is known as this type (see Patent Document 1). According to this, an operation recipe including a plurality of processes or the like can be created on the display screen. For this purpose, an operation recipe creation screen is displayed on the display unit of the apparatus, and this operation recipe creation screen is configured in a tabular form, and has a transfer order field and a process designation field on this screen.
The operator uses the transfer order field and the process specification field to specify the transfer order of the substrates to the plurality of process chambers for each substrate, and specifies the process to be executed in the plurality of process chambers for each substrate.
In this way, the operation recipe creation screen is used to create the operation recipe by specifying the transport order and process in a format that fills the blank, so for example, it is created by describing a plurality of commands Compared to such a case, it becomes easier to create a driving recipe.
JP-A-11-195573

In the above-described conventional apparatus, it is determined whether or not the transfer of a plurality of substrates to the same process chamber occurs at the same time depending on the content of the process, the time setting thereof, and the transfer sequence of the substrates. However, when the process is executed in a high-temperature process chamber, the substrate is collected in the cassette before it is sufficiently cooled, which may damage the apparatus.
Therefore, the object of the present invention is to solve the above-mentioned problems of the conventional processing by preventing the operation recipe from being created in such a procedure that the substrate is collected in the cassette in a state where the cooling is incomplete. An object of the present invention is to provide a substrate processing apparatus capable of performing a process in a safe state.

In order to achieve the above object, the substrate processing apparatus according to claim 1 has a plurality of process chambers, and performs a plurality of different processes using the plurality of process chambers to perform substrate processing. In the apparatus, a transfer order designating unit for designating a transfer order for the plurality of process chambers for each substrate, a substrate transfer unit for sequentially transferring each substrate to the plurality of process chambers according to the transfer order, Process designation means for designating processes to be executed in the plurality of process chambers for each substrate; execution means for executing processes designated by the process designation means in the plurality of process chambers; and Among them, there is provided determination means for determining whether or not the cooling process is designated as the last process to be executed.

More specifically, in a substrate processing apparatus that processes substrates in a plurality of process chambers based on an operation recipe, an input for inputting the transfer order and processes of the substrates for a plurality of or a single process chamber for each substrate in the cassette. And storage means for storing process conditions to be executed in each of the plurality of process chambers input by the input unit, and sequentially specifying the plurality of process chambers on an input screen for inputting the process conditions. And storing the operation condition in the storage means as the substrate transfer order and associating the process conditions with the process chamber, and storing the operation recipe in the cassette. A substrate processing apparatus characterized by inspecting whether a cooling process is designated as a process to be executed last. That.

Therefore, according to the present invention, when a substrate is processed, it is possible to prevent the specification and execution of a transfer procedure that damages the apparatus, so that the substrate processing can be continuously performed in a safe state. Can be done.
In addition, when the operation recipe created in this way is stored in the storage means or when the operation recipe is executed, the procedure is such that the substrate is processed in the process chamber and then collected in a cassette without cooling. If a procedure is inspected to find out that the procedure is to cause damage to the processing apparatus, a message is displayed so that the processing is not performed.

Hereinafter, embodiments of the present invention will be described.

FIG. 1 is a plan view of an internal configuration in which the substrate processing apparatus of the present invention is applied as an example of a multi-chamber type substrate processing apparatus. This apparatus is a single wafer type in which the number of substrates processed at one time in a process chamber is one.

The illustrated substrate processing apparatus has a hexagonal process chamber 1 for forming a transfer chamber TR. Inside the substrate transfer chamber process chamber 1, a substrate transfer robot 14 for transferring a substrate.
Is housed. In addition, six process chambers 2, 3, 4, 5, 6, and 7 are disposed for each side of the hexagon around the substrate transfer process chamber 1.

Here, the two adjacent process chambers 2 and 3 are process chambers for forming the cassette chambers CM1 and CM2. Further, the remaining four process chambers 4 to 7 have process chambers CS1, CS2, and CS2.
This is a process chamber for forming PM1 and PM2. These process chambers 2 to 7 are connected to the substrate transfer process chamber 1 through gate valves 8 to 13.

Here, the process chambers PM1 and PM2 are CVD, dry etching,
This is a processing chamber for performing sputtering, heat treatment, and the like. The process chambers CS1 and CS2 are cooling chambers that perform a cooling process.

Here is a list of process chamber names.

プロセス室プロセス室 名称名称
ＣＭ１ＣＭ１ 第一カセット室第一カセット室
ＣＭ２ＣＭ２ 第二カセット室第二カセット室
ＰＭ１ＰＭ１ 第一プロセス室第一プロセス室
ＰＭ２ＰＭ２ 第二プロセス室第二プロセス室
ＣＳ１ＣＳ１ 第一冷却室第一冷却室
ＣＳ２ＣＳ２ 第二冷却室第二冷却室
ＴＲＴＲ 搬送室搬送室
ＷＷ ウェーハ（基板）ウェーハ（基板）

Process room Process room Name
CM1CM1 1st cassette room 1st cassette room
CM2CM2 Second cassette room Second cassette room
PM1PM1 1st process room 1st process room
PM2PM2 Second process chamber Second process chamber
CS1CS1 1st cooling room 1st cooling room
CS2CS2 Second cooling chamber Second cooling chamber
TRTR transfer room transfer room
WW wafer (substrate) wafer (substrate)

FIG. 2 is a diagram showing the operation recipe creation screen. The operation recipe creation screen shown in the drawing is for each substrate, and designates the order in which the substrates are transported to the four process chambers PM1, PM2, CS1, and CS2 and the processes to be executed in the four process chambers PM1, PM2, CS1, and CS2. An order / process designating unit 31 is included. This transport order / process designating unit includes ten substrate unit designating units 31 (1), 31 (2) for designating the transport order and process of one substrate.
.. having 31 (10). Note that only 10 substrate unit designation portions 31 (1), 31 (2),..., 31 (10) are displayed due to the display space of the display screen 24, but more substrates than this. When a unit designation part is required, the board unit designation part for the maximum number of substrates that can be stored in one cassette can be displayed by switching the screen. Here, for convenience, only the second board designating units 31 (1) and 31 (2) from the top are designated.

Each board unit designating part 31 (n) (n = 1, 2,... 10) has a slot number designating part (S
lot no. ). This slot number designation section 310 (n) designates take-out slot numbers a1 (n) and a2 (titled as (U) and (L) for designating the number of the take-out slot in the cassette of the substrate to be processed. n). Both slot numbers are designated by selecting or describing the numbers. In this figure, “01” and “02” are designated in the first board unit designation part of the take-out slot number designation part, and “03” and “04” are designated in the second board unit designation part. Is shown.

By providing the slot number designating portions a1 (n) and a2 (n), the substrate transfer order with respect to the four process chambers PM1, PM2, CS1, and CS2 and the four process chambers PM1, P.
Processes in M2, CS1, and CS2 can be specified for each substrate.

In addition, each substrate unit designating unit 31 (n) includes Process1, Process2, and Proc.
process room unit designation section 311 (n), which is displayed as ess3, Process4,
312 (n), 313 (n), and 314 (n). Each process chamber 31q (q) (q =
1, 2,..., 4) are transport order designation units b1 (n), c1 (n), d1 (n) for designating the transport order of the substrates for the corresponding process chambers PM1, PM2, CS1, CS2. ),
e1 (n) and process designating units b2 (n), c2 (n), d2 (n), and e2 (n) for designating processes to be executed in the process chambers PM1, PM2, CS1, and CS2. .

In this figure, the first cassette unit designating section takes out the cassette chamber designating section (Load Module).
le) The process chamber “PM1” is specified in the transfer order specifying unit b1 (1) that specifies the first transfer destination from the cassette chamber “CM1” specified in 42, and the process to be executed in the process chamber PM1 is specified. The process name “RECIPE01” is designated in the process designation part b2 (1) to be performed, and the process room “PM2” is designated in the transport order designation part c1 (1) for designating the next transport destination. In the process designation part c2 (1) to be executed, the process name “
“RECIPE02” is designated.

Furthermore, the process order “d1 (1) for designating the next transfer destination has a process chamber“
“CS1” is designated, and the cooling time “0400” (4 minutes) is described in the process designation part d2 (1) executed in the process chamber CS1.

Each substrate unit designating unit 31 (n) also designates a recovery cassette chamber designating unit (Unload Module) 315 (1), 315 for designating a cassette chamber in which the processed substrates are collected.
(2), ..., 315 (10). The collection cassette chamber is designated by selecting from the list. In the figure, a case where the cassette chamber CM1 is designated by the substrate unit designation part 31 (1) is shown. The second board designating part is the same as the first processing procedure,
The difference is that process chamber “CS1” or “CS2” having a cooling function is not specified in the transfer procedure.

The operation of the above configuration will be described. First, an operation for creating a driving recipe will be described with reference to FIG. This operation is started when an operator requests a control unit (not shown) to create a driving recipe. For example, the creation request is sent to the display unit (
This is performed using an operation screen displayed on the screen (not shown). Upon receipt of the operation recipe creation request, the control unit displays the operation recipe creation screen shown in FIG. 2 on the display unit. When the operation recipe creation screen is displayed on the display unit, the operator creates a desired operation recipe using the operation recipe creation screen. When this creation is completed, the operator registers (saves) the created driving recipe in the control unit.
Request. This registration request is made, for example, by pressing a button on the operation recipe creation screen. Upon receiving this registration request, the control unit checks whether the transfer order is such that the cooling process is performed immediately after being collected in the cassette chamber after being processed in the process chamber for each substrate. To do.

The sequence for inspecting the entire driving recipe when saving the driving recipe will be described in detail with reference to FIG. When a registration request is made on the operation recipe creation screen, an inspection is performed to determine whether a cooling chamber is specified at the end of the transfer procedure for each substrate in the operation recipe before registration (save). The inspection is performed for the number of board units set in the operation recipe. In FIG. 2, only two are set for the sake of simplicity, but of course more than that may be used. When the registration request is selected, the inspection is performed for each substrate in order from the top of the operation recipe. When the information of the transfer unit is acquired, the wafer transfer designation unit (transfer order designation unit) is inspected in order to detect the end of the transfer procedure. As a result, when the cooling chamber is not set, it is regarded as abnormal and the storage process is cancelled.
At this time, a message is displayed to the operator. If a cooling chamber is set at the end of the transfer procedure, it is considered normal. This process is repeated as many times as the number of substrate units that can be set in the operation recipe. It is possible to store only when there is normality in all substrate units. Except when the operator designates saving, such as temporarily saving when the operator leaves the device during the operation recipe creation. Note that all the transfer procedures for a certain substrate unit may be blank. In this case, it is considered normal even if the cooling chamber is not set at the end of conveyance. From the above, in the case of the setting as shown in FIG. 2, the first board unit is regarded as normal, but 2
In the second substrate unit, since the cooling chamber is not set at the end of transfer, it is regarded as abnormal, a message is displayed, and the storage process is cancelled.

In this way, after performing the inspection, the control unit reports the determination result to the operator. This report is performed, for example, by displaying an error message on the operation recipe creation screen. Thereafter, the control unit monitors whether or not the registration request for the driving recipe has been received again. Upon receiving this report, the operator corrects the content of the driving recipe and then performs the registration operation again. Similarly,
After the substrate cooling process is performed, the above-described process is performed until the recipe collected in the cassette is obtained.

On the other hand, if there is no problem as a result of the inspection of the driving recipe, the control unit registers the created driving recipe in the storage unit. Thereby, the created driving recipe is registered.

Next, the operation for executing the created driving recipe will be described. This operation is, for example,
It is started when an investigation for starting execution of the driving recipe is executed by the operator. This operation is performed, for example, by pressing a button on the operation screen displayed on the display unit.

In this operation, the control unit reads the operation recipe from the storage unit, and based on the operation recipe, the operation of the substrate transfer unit (not shown) as the substrate transfer unit and the process execution unit (not shown) as the process execution unit. Control).

Among the plurality of substrates accommodated in the cassette of the cassette chamber CM1 or CM2 designated by the operation recipe, each of the substrates selected based on the operation recipe is designated by the operation recipe PM (1), PM. (2), conveyed to PM (3), PM (4). The substrate transferred to the process chamber PM (1), PM (2), PM (3), PM (4)
After being subjected to processing by the process specified by the operation recipe, each is collected in the cassette in the cassette chamber CM1 or CM2 specified by the operation recipe.

As described above, according to the present embodiment, when the operation recipe is stored, the entire operation recipe is inspected to check for any problems. In the case of the operation recipe as shown in FIG. 2, there is no problem with the first substrate unit designation part, but the second substrate unit designation part has a process cooling function after processing in a high temperature process chamber. An error occurs because there is no procedure for transporting to the room. When an error is detected, a message is displayed on the display means to alert the operator. Therefore, when the substrate is collected in the cassette, it is possible to avoid specifying a transfer procedure that causes damage due to heat, and it is possible to perform substrate processing continuously in a safer state.

It is a figure which shows the whole structure of the substrate processing apparatus which shows one embodiment of this invention. It is a figure which shows the driving | operation recipe creation screen which shows one embodiment of this invention. It is a flowchart figure which shows embodiment of this invention.

Explanation of symbols

1 Process room (transfer room TR)
2 Process room (cassette room CM1)
3 Process room (cassette room CM2)
4 Process room (cooling room CS2)
5 Process room (Process room PM2)
6 Process room (Process room PM1)
7 Process room (cooling room CS1)
8 Gate valve 9 Gate valve 10 Gate valve 11 Gate valve 12 Gate valve 13 Gate valve 14 Substrate transfer robot 31 Substrate unit designation unit 42 Removal cassette chamber designation unit 310 Slot number designation unit 311 Process chamber unit designation unit 312 Process chamber unit designation Section 313 Process room unit designation section 314 Process room unit designation section 315 Process room unit designation section

Claims (1)

In a substrate processing apparatus for processing a substrate by having a plurality of process chambers and performing a plurality of different processes using the plurality of process chambers,
A transport order designating means for designating a transport order for the process chamber for each substrate;
Substrate transport means for sequentially transporting the substrates to the process chamber in accordance with the transport order of the transport order designating means;
Process designation means for designating a process to be executed in the process chamber for each substrate;
Execution means for executing the process designated by the process designation means in the process chamber;
Determination means for determining whether or not a cooling process is designated as a process to be executed last among the processes;
A substrate processing apparatus comprising:

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