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JP2006303310A - Batch processing method of chip, and device used for it - Google Patents

Batch processing method of chip, and device used for it Download PDF

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JP2006303310A
JP2006303310A JP2005125251A JP2005125251A JP2006303310A JP 2006303310 A JP2006303310 A JP 2006303310A JP 2005125251 A JP2005125251 A JP 2005125251A JP 2005125251 A JP2005125251 A JP 2005125251A JP 2006303310 A JP2006303310 A JP 2006303310A
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polishing
support member
batch processing
small pieces
belt
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Toshihiro Okabe
俊博 岡部
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Resonac Holdings Corp
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Showa Denko KK
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a solid electrolytic capacitor capable of effectively reproducing and reusing a clean and highly accurate temporary bar in a batch processing method of a chip for reusing a supporting member, especially in a manufacturing method of a conductor for a capacitor element in a batch processing method of the chip including the steps of fixing a plurality of chips to the supporting member, providing the predetermined process to a part of the surface of each chip, and then separating the each processed part from the supporting member, and to provide a device for these purposes. <P>SOLUTION: In the batch processing method comprising the steps of fixing the plurality of chips to the supporting member, and separating the processed part from the supporting member after providing the predetermined process to the part of the surface of each chip, the surface of the supporting member with the chip separated is plished and reused. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

本発明は、小片の一括処理方法及びその方法に用いる装置、特に固体電解コンデンサ製造用支持部材を効率的に再利用する固体電解コンデンサの製造方法及びそのために用いる固体電解コンデンサ製造用支持部材の再生装置に関する。   The present invention relates to a method for batch processing of small pieces and an apparatus used for the method, in particular, a method for manufacturing a solid electrolytic capacitor that efficiently reuses a support member for manufacturing a solid electrolytic capacitor, and regeneration of a support member for manufacturing a solid electrolytic capacitor used therefor Relates to the device.

近年、電気機器のディジタル化、パーソナルコンピュータの高速化に伴い、小型で大容量のコンデンサ、高周波領域において低インピーダンスのコンデンサが要求されている。最近では、電子伝導性を有する導電性重合体を固体電解質として用いた固体電解コンデンサが提案されている。   In recent years, with the digitization of electrical equipment and the speeding up of personal computers, small and large-capacitance capacitors and low-impedance capacitors in the high frequency region are required. Recently, a solid electrolytic capacitor using a conductive polymer having electronic conductivity as a solid electrolyte has been proposed.

固体電解コンデンサの基本素子は、一般に、エッチング処理された比表面積の大きな金属箔からなる陽極基体に誘電体の酸化皮膜を形成し、この外側に対向する電極として固体の半導体層(以下、固体電解質という。)を形成し、望ましくはさらに導電ペーストなどの導電体層を形成して作製される。通常は固体電解質(陰極部分)と陽極基体との絶縁を確実とするためにさらにマスキング層が設けられ、適宜、電極が付加される。   A basic element of a solid electrolytic capacitor is generally formed by forming a dielectric oxide film on an anode base made of a metal foil having a large specific surface area that has been etched, and a solid semiconductor layer (hereinafter referred to as a solid electrolyte) as an electrode facing the outside. And a conductor layer such as a conductive paste is preferably formed. Usually, a masking layer is further provided to ensure insulation between the solid electrolyte (cathode portion) and the anode substrate, and electrodes are appropriately added.

一般に、誘電体酸化皮膜上に導電性重合体を形成する手法として電解酸化重合法及び化学酸化重合法が知られている。化学酸化重合法は、反応の制御あるいは重合膜形態の制御が難しいが、固体電解質の形成が容易で、短時間に大量生産が可能であるため種々の方法が提案されている。例えば、陽極基体をモノマーを含む溶液に浸漬する工程と酸化剤を含む溶液に浸漬する工程を交互に繰り返すことにより層状構造を有する固体電解質を形成する方法、層状構造の固体電解質層を形成することなく、コンデンサ素子の細孔内及び外表面に固体電解質を形成する方法として、モノマー化合物を含む溶液に陽極基体を浸漬した後、酸化剤溶液中で重合し、酸化剤を洗浄した後に乾燥するサイクルを繰り返す方法が知られている。   In general, an electrolytic oxidation polymerization method and a chemical oxidation polymerization method are known as methods for forming a conductive polymer on a dielectric oxide film. The chemical oxidative polymerization method is difficult to control the reaction or the form of the polymer film, but various methods have been proposed because it is easy to form a solid electrolyte and enables mass production in a short time. For example, a method of forming a solid electrolyte having a layered structure by alternately immersing an anode substrate in a solution containing a monomer and a step of immersing in a solution containing an oxidizing agent, and forming a solid electrolyte layer having a layered structure As a method for forming a solid electrolyte in the pores and the outer surface of the capacitor element, a cycle in which the anode substrate is immersed in a solution containing a monomer compound, polymerized in an oxidant solution, washed with the oxidant, and then dried. The method of repeating is known.

このように、いずれの製造方法でも固体電解コンデンサ素子用導体(陽極基体)をモノマー含有溶液及び酸化剤含有溶液に浸漬し引き上げる操作を含むため、浸漬及び引き上げ操作を効率的に行なう必要がある。このため、通常、固体電解コンデンサ素子の製造においてはテンポラリーバーと称される支持部材を用いて複数の素子を同時に処理している。すなわち、図1に示すように、支持部材(テンポラリーバー)1に複数の固体電解コンデンサ素子用導体2をハンダ付け等により取り付け(図1(a))、テンポラリーバーの上下動により、処理液3への浸漬(図1(b))及び引き上げ操作を行ない、必要な厚みの固体電解質層を形成した後、コンデンサ素子用導体をテンポラリーバーから分離して(図1(c))コンデンサ用素子4を得ている。   Thus, since any manufacturing method includes the operation of immersing and pulling up the solid electrolytic capacitor element conductor (anode substrate) in the monomer-containing solution and the oxidant-containing solution, it is necessary to efficiently perform the dipping and lifting operations. For this reason, normally, in the manufacture of a solid electrolytic capacitor element, a plurality of elements are processed simultaneously using a support member called a temporary bar. That is, as shown in FIG. 1, a plurality of solid electrolytic capacitor element conductors 2 are attached to a support member (temporary bar) 1 by soldering or the like (FIG. 1A), and the treatment liquid 3 is moved by the vertical movement of the temporary bar. (Fig. 1 (b)) and a pulling up operation to form a solid electrolyte layer having a required thickness, and then separating the capacitor element conductor from the temporary bar (Fig. 1 (c)). Have gained.

上記方法は、多数のコンデンサ用素子を一括して製造し得る点で有利であるが、コンデンサ素子用導体を分離した後のテンポラリーバー表面には、陽極基体の残片(図1(c)の5)及び陽極基体をテンポラリーバーに固定することによる溶接痕やハンダ等の接着材料が残る。この状態ではテンポラリーバー表面の不均一性が高いためそのまま再利用することはできず、従来はテンポラリーバー表面にスクレーパーを当てて残片等を個別に剥がしていた。しかし、こうした方法は効率が悪くコストもかかる上、残片がすべて掻き取れなかったり、さらに溶接痕を除去する必要がある。また、溶接痕除去後の表面状態が安定していなかったり、固体電解コンデンサの製造プロセス全体の効率や信頼性をさらに向上させる必要があった。   The above-described method is advantageous in that a large number of capacitor elements can be manufactured in a lump. However, the remaining pieces of the anode substrate (5 in FIG. 1C) are formed on the surface of the temporary bar after separating the capacitor element conductors. ) And an adhesive material such as welding marks and solder left by fixing the anode substrate to the temporary bar. In this state, the surface of the temporary bar is highly non-uniform and cannot be reused as it is. Conventionally, a scraper is applied to the surface of the temporary bar to remove the remaining pieces individually. However, these methods are inefficient and costly, and it is necessary to remove all the remaining pieces or to remove weld marks. In addition, the surface state after removal of the welding marks is not stable, and it is necessary to further improve the efficiency and reliability of the entire manufacturing process of the solid electrolytic capacitor.

従って、本発明の課題は、複数個の小片を支持部材に固定し、各小片の表面の一部に所定の処理を行なった後、各処理済み部分を支持部材から分離する工程を含む小片の一括処理方法において、前記支持部材を再利用する小片の一括処理方法、特に、コンデンサ素子用導体の製造方法において、清浄かつ高精度なテンポラリーバーを効率的に再生してこれを再利用する固体電解コンデンサの製造方法及びこれらの目的のための装置を提供することにある。   Accordingly, an object of the present invention is to fix a plurality of small pieces to a support member, perform a predetermined treatment on a part of the surface of each small piece, and then separate each processed portion from the support member. In a batch processing method, in a batch processing method for small pieces that reuses the support member, particularly in a method for manufacturing a conductor for a capacitor element, a solid electrolytic that efficiently regenerates and reuses a clean and highly accurate temporary bar. It is an object to provide a method of manufacturing a capacitor and an apparatus for these purposes.

本発明者らは、上記課題について鋭意検討した結果、小片(例えば、コンデンサ素子用導体)を分離した後の支持部材(例えば、テンポラリーバー)表面を物理的に研磨することにより上記問題が解決できること、特に無限ベルトを用いた湿式研磨が有用であることを見出し本発明を完成するに至った。   As a result of intensive studies on the above problems, the present inventors can solve the above problem by physically polishing the surface of a support member (for example, a temporary bar) after separating a small piece (for example, a conductor for a capacitor element). In particular, the present inventors have found that wet polishing using an infinite belt is useful and completed the present invention.

すなわち、本発明は以下に示す小片の一括処理方法及びその方法に用いる装置に関する。
1.複数個の小片を支持部材に固定し、各小片の表面の一部に表面処理を行なった後、前記処理済み部分を支持部材から分離する工程を含む小片の一括処理方法において、小片分離後の支持部材表面を研磨して再利用することを特徴とする小片の一括処理方法。
2.前記小片が金属箔である前記1に記載の小片の一括処理方法。
3.金属箔がアルミニウム化成箔である前記2に記載の小片の一括処理方法。
4.支持部材がステンレス鋼板である前記1〜3のいずれかに記載の小片の一括処理方法。
5.小片が支持部材にハンダ付けまたは溶接によって固定されたものである前記1〜4のいずれかに記載の小片の一括処理方法。
6.研磨が湿式研磨である前記1〜5のいずれかに記載の小片の一括処理方法。
7.研磨材を含む無限ベルトを前記支持部材表面に接触させることにより研磨を行なう前記6に記載の小片の一括処理方法。
8.無限ベルトを水洗しながら前記支持部材表面に接触させることにより研磨を行なう前記7に記載の小片の一括処理方法。
9.支持部材表面から剥離した導体の残片を水洗による水流によって無限ベルト表面から除去しつつ研磨を行なう前記8に記載の小片の一括処理方法。
10.研磨後の支持部材の表面粗さを15S以下とする前記1〜9のいずれかに記載の小片の一括処理方法。
11.研磨後の支持部材の変形矯正工程をさらに含む前記1〜10のいずれかに記載の小片の一括処理方法。
12.小片に固体電解コンデンサ素子部分を形成するための処理に前記1〜11のいずれかに記載の方法を適用することを特徴とする固体電解コンデンサの製造方法。
13.複数の導体支持部材を保持して順次投入する支持部材投入機と投入された支持部材を研磨部に搬送する搬送部を含み、前記研磨部が少なくとも1の研磨ベルトを含む支持部材再生装置。
14.研磨ベルトが研磨材を含む無限ベルトであり、駆動された前記無限ベルトを研磨部において支持部材表面に接触させる前記13に記載の支持部材再生装置。
15.研磨部が少なくとも2の研磨ベルトを含む前記14に記載の支持部材再生装置。
16.支持部材の搬送方向と対向する向きに無限ベルトを駆動させる前記15に記載の支持部材再生装置。
That is, the present invention relates to a small piece batch processing method and an apparatus used for the method shown below.
1. In the batch processing method of small pieces including a step of fixing a plurality of small pieces to a support member, performing a surface treatment on a part of the surface of each small piece, and separating the processed portion from the support member, A method for batch processing of small pieces, wherein the surface of the support member is polished and reused.
2. The method for batch processing of small pieces according to 1 above, wherein the small pieces are metal foil.
3. The batch processing method of the said small piece of said 2 whose metal foil is aluminum conversion foil.
4). The batch processing method of the small piece in any one of said 1-3 whose support member is a stainless steel plate.
5. The collective processing method for small pieces according to any one of the above 1 to 4, wherein the small pieces are fixed to the support member by soldering or welding.
6). The method for batch treatment of small pieces according to any one of 1 to 5, wherein the polishing is wet polishing.
7). 7. The batch processing method for small pieces according to 6 above, wherein polishing is performed by bringing an infinite belt containing an abrasive into contact with the surface of the support member.
8). The batch processing method for small pieces according to 7 above, wherein polishing is performed by bringing the endless belt into contact with the surface of the support member while washing with water.
9. 9. The batch processing method for small pieces as described in 8 above, wherein polishing is performed while removing the remaining conductors separated from the surface of the support member from the surface of the infinite belt by a water flow by water washing.
10. The batch processing method of the small pieces in any one of said 1-9 which makes the surface roughness of the support member after grinding | polishing 15S or less.
11. The batch processing method of the small pieces in any one of said 1-10 which further includes the deformation correction process of the support member after grinding | polishing.
12 A method for producing a solid electrolytic capacitor, wherein the method according to any one of 1 to 11 is applied to a treatment for forming a solid electrolytic capacitor element portion on a small piece.
13. A support member regenerator including a support member feeder that holds and sequentially feeds a plurality of conductor support members, and a transport unit that transports the loaded support members to a polishing unit, wherein the polishing unit includes at least one polishing belt.
14 14. The support member reproducing apparatus according to 13, wherein the polishing belt is an infinite belt containing an abrasive, and the driven infinite belt is brought into contact with the surface of the support member at the polishing portion.
15. 15. The support member recycling apparatus according to 14, wherein the polishing unit includes at least two polishing belts.
16. 16. The support member reproducing apparatus according to 15, wherein the endless belt is driven in a direction opposite to the conveyance direction of the support member.

本発明によれば、小片の処理(例えば、固体電解コンデンサの製造)に用いる支持部材を繰り返し使用することが可能である。このため、一括連続処理を必要とする製造プロセスの効率化が実現できる。また、本発明によれば、再生された支持部材の表面性状が良好であるため、電気的特性等のバラツキが少ないコンデンサ素子を繰り返し一括製造することができる。   According to the present invention, it is possible to repeatedly use a supporting member used for processing a small piece (for example, manufacturing a solid electrolytic capacitor). For this reason, the efficiency of the manufacturing process which requires a batch continuous process is realizable. In addition, according to the present invention, since the surface properties of the regenerated support member are good, capacitor elements with little variation in electrical characteristics and the like can be repeatedly manufactured collectively.

以下、本発明の方法をより具体的に説明する。
本発明の方法は、上述の通り、複数個の小片を支持部材に固定し、各小片の表面の一部に表面処理を行なった後、前記処理済み部分を支持部材から分離する工程を含む小片の一括処理方法において、小片分離後の支持部材表面を研磨して再利用することを特徴とする小片の一括処理方法である。
本発明の方法は、種々の小片の一括処理方法に適用できる。このような一括処理方法の例としては、小片の表面処理を行なうために化学薬品を含む溶液に浸漬する浸漬処理、小片表面において電解重合その他の酸化還元処理を行なうための浸漬・通電処理、小片表面に種々の物質を積層するための塗布または浸漬処理、特定の雰囲気や温度条件下に保持する各種の処理、これらの処理に伴う洗浄処理や乾燥処理等の各種表面処理が挙げられる。もっとも、これらは例示であり、小片を一括処理するための方法であればいずれにも適用できる。
Hereinafter, the method of the present invention will be described more specifically.
As described above, the method of the present invention includes a step of fixing a plurality of small pieces to a support member, performing a surface treatment on a part of the surface of each small piece, and then separating the treated portion from the support member. In this collective processing method, the small piece collective processing method is characterized by polishing and reusing the surface of the support member after separating the small pieces.
The method of the present invention can be applied to various small piece batch processing methods. Examples of such a batch processing method include immersion treatment in which a chemical solution is included for surface treatment of small pieces, immersion / electric current treatment for electrolytic polymerization and other redox treatment on the surface of the small pieces, and small pieces. Various surface treatments such as coating or immersion treatment for laminating various substances on the surface, various treatments maintained under specific atmosphere and temperature conditions, and washing treatment and drying treatment associated with these treatments can be mentioned. However, these are only examples, and any method can be applied as long as it is a method for batch processing of small pieces.

特に、本発明の方法は、これらの処理を複数組み合わせた方法に好適に適用できる。例えば、固体電解コンデンサの製造方法では、複数の固体電解コンデンサ製造用導体を支持板にその下辺に沿って列状に取り付け、この導体の列をモノマー含有溶液と酸化剤含有溶液に順次浸漬し引き上げる(必要に応じて、引き上げ後に洗浄処理や乾燥処理を含む)ことにより各導体上に固体電解質層を形成し、さらに必要に応じて、これをカーボンペースト及び導体ペースト(例えば、銀ペースト)等に浸漬して導電体層を形成する表面処理を施しているが、本発明の方法は、このような固体電解コンデンサの製造方法において特に有用である。   In particular, the method of the present invention can be suitably applied to a method in which a plurality of these processes are combined. For example, in a method for producing a solid electrolytic capacitor, a plurality of conductors for producing a solid electrolytic capacitor are attached to a support plate in a row along its lower side, and the row of conductors is sequentially immersed in a monomer-containing solution and an oxidant-containing solution and pulled up. (If necessary, a solid electrolyte layer is formed on each conductor by including a washing process and a drying process after pulling up, and if necessary, this is converted into a carbon paste and a conductor paste (for example, a silver paste). Although the surface treatment for forming the conductor layer by dipping is performed, the method of the present invention is particularly useful in the method for producing such a solid electrolytic capacitor.

固体電解コンデンサの製造方法に適用する場合は、小片は一般的には、弁作用を有する金属である。本発明に使用できる弁作用を有する金属は、アルミニウム、タンタル、ニオブ、チタン、ジルコニウム、マグネシウム、珪素などの金属単体、またはこれらの合金である。小片は単体や合金の金属板(リボン、箔等を含む。)、多孔質焼結体、エッチング等で表面処理された板、線等が使用できるが、好ましくは平板状、箔状のものである。多孔質の形態の例としては、圧延箔のエッチング物、微粉焼結体などの多孔質成形体の形態が挙げられる。   When applied to a method of manufacturing a solid electrolytic capacitor, the small piece is generally a metal having a valve action. The metal having a valve action that can be used in the present invention is a simple metal such as aluminum, tantalum, niobium, titanium, zirconium, magnesium, silicon, or an alloy thereof. The small piece may be a single or alloy metal plate (including ribbon, foil, etc.), a porous sintered body, a plate surface-treated with etching or the like, a wire, etc. is there. Examples of the porous form include forms of a porous molded body such as an etched product of a rolled foil and a fine powder sintered body.

小片の厚さは、使用目的によって異なるが、厚みが約40〜300μmの箔(特に化成箔)が使用される。薄型の固体電解コンデンサとするためには、例えばアルミニウム箔(特に化成箔)では、80〜250μmのものを使用し、固体電解コンデンサを設けた素子の最大高さを250μm以下となるようにすることが好ましい。金属箔(特に化成箔)の大きさ及び形状も用途により異なるが、平板状素子単位として幅約1〜50mm、長さ約1〜50mmの矩形のものが好ましく、より好ましくは幅約2〜15mm、長さ約2〜25mmである。   Although the thickness of a small piece changes with purposes of use, foil (especially chemical conversion foil) whose thickness is about 40-300 micrometers is used. In order to obtain a thin solid electrolytic capacitor, for example, an aluminum foil (especially a chemical conversion foil) having a thickness of 80 to 250 μm is used, and the maximum height of the element provided with the solid electrolytic capacitor is 250 μm or less. Is preferred. The size and shape of the metal foil (especially the chemical conversion foil) vary depending on the application, but a rectangular element having a width of about 1 to 50 mm and a length of about 1 to 50 mm is preferable as a flat element unit, and more preferably about 2 to 15 mm in width. The length is about 2 to 25 mm.

もっとも、本発明の方法は、固体電解コンデンサの製造方法以外にも一般に広く利用でき、適当可能な小片の材質及び形状は特に限定されず、例えば、鉄、チタン、金、銀、銅等やこれらの合金であってもよく、板、線、棒を含む。   However, the method of the present invention can be widely used in addition to the method for producing a solid electrolytic capacitor, and the material and shape of the suitable piece are not particularly limited. For example, iron, titanium, gold, silver, copper, etc. Alloy, including plates, wires, and bars.

支持部材の材質や大きさ等は小片を固定し得るものであれば特に限定されないが、小片を処理する便宜を考慮して導電性の支持体が好ましい。通常、テンポラリーバーとして慣用されている材料(例えば、SUS)が使用できる。通常、支持部材は板状であるが、実質的に物理研磨が可能な表面を有していればよく、棒状であってもよい。   The material and size of the support member are not particularly limited as long as the small piece can be fixed, but a conductive support is preferable in consideration of the convenience of processing the small piece. Usually, a material commonly used as a temporary bar (for example, SUS) can be used. Usually, the support member has a plate shape, but may have a surface that can substantially be physically polished, and may have a rod shape.

小片の一括処理方法では、上記のような小片を支持部材に複数個、例えば、10〜50個程度固定する。一般にはこれらの小片を支持部材の下辺に沿って列状に配置して固定する。固定方法は特に限定されないが、典型的には、ハンダ付け、溶接等である。しかる後、その一部、例えば、支持部材から突出した部分について所定の処理を行ない、次いで、製品として必要な部分のみを分離する。分離は、小片の剥離、支持部材の下辺に沿った切断等によって行なうが、この際に、支持部材には接着痕(例えば、溶接痕やハンダ)、小片の残部等が残る。   In the small piece batch processing method, a plurality of, for example, about 10 to 50 pieces of the above small pieces are fixed to the support member. Generally, these small pieces are arranged and fixed in a row along the lower side of the support member. The fixing method is not particularly limited, but typically is soldering, welding, or the like. Thereafter, a predetermined process is performed on a part thereof, for example, a part protruding from the support member, and then only a part necessary as a product is separated. Separation is performed by peeling off the small pieces, cutting along the lower side of the support member, and the like. At this time, adhesion marks (for example, welding marks and solder), the remainder of the small pieces, and the like remain on the support member.

本発明の小片の一括処理方法では、小片を支持部材から分離した後、支持部材表面を研磨してこのような接着痕(例えば、溶接痕やハンダ)、小片の残片(図1(c)の5)等を除去して、支持部材を再利用に供する。
研磨方法は、物理研磨であり、好ましくは、湿式研磨である。
In the batch processing method for small pieces according to the present invention, after separating the small pieces from the support member, the surface of the support member is polished so that such adhesion marks (for example, welding marks and solder) and the remaining pieces (see FIG. 5) etc. are removed and the support member is reused.
The polishing method is physical polishing, preferably wet polishing.

湿式研磨は種々の方法で行なうことができるが、通常は、研磨手段を支持部材上に接触させ両者を相対的に移動させて行なう。研磨手段としては、例えば、セラミックス砥粒を研磨剤として用いたブラシ等、種々のものを用い得るが、好ましくは研磨材を含む研磨ベルトが用いられる。すなわち、研磨すべき支持部材の表面に研磨ベルトを接触させ、支持部材及び/または研磨ベルトを移動させる。好ましくは、支持部材を移動させつつ、無限ベルト等の研磨ベルトを回転駆動させて、支持部材表面に押圧する。無限ベルトを用いることで研磨を均一に実施することができる。また、研磨面積を大きくすることができるため、研磨効率を高めることができる。   Wet polishing can be performed by various methods, but is usually performed by bringing the polishing means into contact with the support member and relatively moving both. As the polishing means, for example, various types such as a brush using ceramic abrasive grains as an abrasive may be used, but a polishing belt containing an abrasive is preferably used. That is, the polishing belt is brought into contact with the surface of the support member to be polished, and the support member and / or the polishing belt is moved. Preferably, while moving the support member, a polishing belt such as an infinite belt is rotationally driven and pressed against the surface of the support member. Polishing can be carried out uniformly by using an infinite belt. Moreover, since the polishing area can be increased, the polishing efficiency can be increased.

本発明の方法では、無限ベルトを水洗しながら研磨を行なうことが好ましい。このような態様を取ることにより、支持部材上から剥離した残片や溶接・ハンダ片を支持部材表面から除去しつつ研磨を行ない得る。水洗は研磨部位に限って行なってもよいが、好ましくはベルトの周回軌道上で、または研磨部位に加え周回軌道上でも水流を噴射して行なう。この場合、支持部材表面から剥離した残片がベルト上に残っていても周回軌道上で確実に洗い流される。必要であれば、研磨ベルトについて公知の洗浄方法を組み合わせてもよい(例えば、特開平11-077534号公報参照)。   In the method of the present invention, it is preferable to perform polishing while washing the infinite belt with water. By taking such an aspect, it is possible to perform polishing while removing the remaining pieces and weld / solder pieces peeled from the support member from the surface of the support member. The washing with water may be performed only on the polishing portion, but is preferably carried out by jetting a water stream on the belt orbiting or in addition to the polishing portion. In this case, even if the remaining pieces peeled off from the surface of the support member remain on the belt, they are surely washed off on the circular track. If necessary, known cleaning methods for the polishing belt may be combined (for example, see JP-A-11-077534).

また、研磨部位や無限ベルト表面から剥離した残片や溶接・ハンダ片は、水洗による水流によって研磨ゾーン(無限ベルトの周回軌道を含む研磨系)から除去される。このような処理残片等は前記水流を適当な濾過手段に通すことにより分離される。例えば、研磨ゾーンの下方に濾過手段を設けこの上に前記水流を洗い流す。濾過手段は、濾紙または濾布、金網等を含むが、ウェブ状のものとして連続的または間欠的に移動させて、濾過手段上の残滓を除去しつつ濾過を行なうことが好ましい。濾過後の洗浄水は水洗システムに還流してもよい。   Further, the remaining pieces and weld / solder pieces peeled off from the polishing portion and the surface of the infinite belt are removed from the polishing zone (polishing system including the infinite belt orbit) by water washing. Such processing residues and the like are separated by passing the water stream through suitable filtration means. For example, a filtering means is provided below the polishing zone, and the water flow is washed thereon. The filtering means includes filter paper, filter cloth, wire mesh, etc., but it is preferable to perform filtration while removing the residue on the filtering means by moving continuously or intermittently as a web. The washing water after filtration may be returned to the water washing system.

本発明の方法で用いる研磨ベルトとしては、合成樹脂繊維材料からなる研磨布が好適に利用できる。研磨布は各種のものが市販されており、必要とされる耐久性に応じて任意のものが利用できるが、例えば、例えば、ナイロン6、ナイロン66、ナイロン12、共重合ナイロンなどのポリアミド類、ポリエチレンテレフタレート、ポリブチレンテレフタレート、ポリトリメチレンテレフタレート、共重合ポリエステルなどのポリエステル類、ポリエチレン、ポリプロピレン、ポリメチルペンテン、ポリスチレン、共重合ポリスチレンなどのポリオレフィン類、ポリ乳酸、乳酸共重合体、ポリグリコール酸などの脂肪族ポリエステル系重合体類、脂肪族ポリエステルアミド系共重合体類などが合成樹脂の例として挙げられる。また、これらの研磨ベルトはウレタン系、シリコーン系、アクリル系高分子などのクッション部材を含んでもよい。もっとも、これらは例示であり、市販の各種耐水性金属研磨布も利用できる。   As the polishing belt used in the method of the present invention, a polishing cloth made of a synthetic resin fiber material can be suitably used. Various types of polishing cloth are commercially available, and any one can be used depending on the required durability. For example, polyamides such as nylon 6, nylon 66, nylon 12, copolymer nylon, Polyesters such as polyethylene terephthalate, polybutylene terephthalate, polytrimethylene terephthalate, copolymerized polyester, polyolefins such as polyethylene, polypropylene, polymethylpentene, polystyrene, copolymerized polystyrene, polylactic acid, lactic acid copolymer, polyglycolic acid, etc. Examples of synthetic resins include aliphatic polyester polymers and aliphatic polyesteramide copolymers. Further, these abrasive belts may include cushion members such as urethane, silicone, and acrylic polymers. However, these are examples, and various commercially available water-resistant metal polishing cloths can also be used.

研磨は、研磨後の支持部材の表面粗さを15S以下とするものであればよい。再利用時の溶接性の安定度を考慮すると、10S以下が好ましく、より好ましくは6.3S以下であるが、一般的には15S以下でよい。なお、ここで、例えば、15Sは、表面粗さの最大値が15μmであることを表わす。   The polishing may be performed as long as the surface roughness of the support member after polishing is 15S or less. In consideration of the stability of the weldability at the time of reuse, it is preferably 10S or less, more preferably 6.3S or less, but generally 15S or less. Here, for example, 15S represents that the maximum value of the surface roughness is 15 μm.

研磨で使用するベルトに付着させた砥粒の粒度は、150メッシュ以上とする。150メッシュ未満では表面粗さが15S以上となり溶接性が悪化する。粒度に上限はなく、例えば、400メッシュ以上とすれば上記の表面粗さ6.3S以下が実現できる。砥粒の種類は特に限定されないが、例えば、アルミナ、炭化ケイ素等が挙げられる。なお、このような粒度の砥材を上述の布ベルトに樹脂で固着させた研磨ベルト(レジンベルト)は市販されており、本発明で利用できる。
また、支持部材に対して研磨ベルトを押し当てる手段としては、例えば、ゴム製コンタクトロールが挙げられる。
なお、研磨後の支持部材は、若干の変形を含み得るので、レベラー等で矯正してもよい。
The particle size of the abrasive grains adhered to the belt used for polishing is 150 mesh or more. If it is less than 150 mesh, the surface roughness becomes 15S or more, and the weldability deteriorates. There is no upper limit to the particle size. For example, if the particle size is 400 mesh or more, the surface roughness of 6.3S or less can be realized. Although the kind of abrasive grain is not specifically limited, For example, an alumina, silicon carbide, etc. are mentioned. An abrasive belt (resin belt) in which an abrasive having such a particle size is fixed to the above-described cloth belt with a resin is commercially available and can be used in the present invention.
Examples of means for pressing the polishing belt against the support member include a rubber contact roll.
In addition, since the support member after grinding | polishing may contain some deformation | transformation, you may correct with a leveler etc.

本発明は、また、上述のような支持部材を再生する装置を提供する。この再生装置は、複数の導体支持部材を保持して再生ラインに順次投入する支持部材投入機と投入された支持部材を研磨部に搬送する搬送部を含み、前記研磨部が少なくとも1の研磨ベルトを含む。研磨ベルトは、上記の通り、好ましくは研磨材を含む無限ベルトであり、駆動モーター等により駆動された無限ベルトを研磨部において支持部材表面に接触させる。
研磨部は、1の研磨ベルトを含むものでもよいが、好ましくは少なくとも2の研磨ベルトを含む。また、支持部材の搬送方向と対向する向きに無限ベルトを駆動させることが好ましい。さらに、研磨ベルトは、複数の支持部材を同時に処理し得る幅としてもよい。例えば、2〜10枚程度、好ましくは3〜8枚程度の支持部材を平行に並べて研磨ベルトと接触させることにより、これらの支持部材の研磨を同時に行なうことが可能である。
The present invention also provides an apparatus for regenerating the support member as described above. The reproducing apparatus includes a supporting member feeding machine that holds a plurality of conductor supporting members and sequentially throws them into a reproducing line, and a conveying unit that conveys the loaded supporting members to a polishing unit, and the polishing unit has at least one polishing belt including. As described above, the polishing belt is preferably an infinite belt containing an abrasive, and the infinite belt driven by a drive motor or the like is brought into contact with the surface of the support member in the polishing unit.
The polishing unit may include one polishing belt, but preferably includes at least two polishing belts. Moreover, it is preferable to drive the infinite belt in a direction opposite to the conveying direction of the support member. Furthermore, the polishing belt may have a width that allows a plurality of support members to be processed simultaneously. For example, about 2 to 10 sheets, preferably about 3 to 8 support members are arranged in parallel and brought into contact with the polishing belt, so that these support members can be polished simultaneously.

以下、図面を参照して本発明についての代表的な例を示し、さらに具体的に説明する。なお、これらは説明のための例示であって、本発明はこの例に何等制限されるものではない。   Hereinafter, a representative example of the present invention will be described with reference to the drawings, and will be described more specifically. Note that these are illustrative examples, and the present invention is not limited to these examples.

(1)テンポラリーバー再生装置
図3に示すように、本発明の一態様による支持部材再生装置11は、それぞれ研磨ベルト12、13を備えた研磨ゾーンを含む。ここで、研磨ベルト12、13は日本コーテッドアブレーシブ(株)製レジンベルトNB(A#150X871KN)であり、150メッシュの砥粒(アルミナ)を含む。
研磨ベルト12、13は、駆動手段と連結した上部ロールによって335m/分の周速度で図中時計回りに回転し、研磨ロール14、15(ゴム製コンタクトロール)によってテンポラリーバーTに押し当てられる。
(1) Temporary Bar Reproducing Device As shown in FIG. 3, the support member reproducing device 11 according to one aspect of the present invention includes a polishing zone provided with polishing belts 12 and 13, respectively. Here, the polishing belts 12 and 13 are a resin belt NB (A # 150X871KN) manufactured by Nippon Coated Abrasive Co., Ltd., and include 150 mesh abrasive grains (alumina).
The polishing belts 12 and 13 are rotated clockwise in the drawing at a peripheral speed of 335 m / min by the upper roll connected to the driving means, and are pressed against the temporary bar T by the polishing rolls 14 and 15 (rubber contact rolls).

テンポラリーバーはエレベータ付マガジン(図示していない)によって、同時に5枚が、長手方向が搬送方向と一致するように、図面左から搬送ベルト16上に送り出される(T1)。搬送ベルト16はテンポラリーバーを、図中、左から右方向に搬送する(搬送速度:6.2m/分)が、この間、研磨ベルト12、13は図において時計回りに回転しているため、テンポラリーバーの表面は搬送ベルトと研磨ベルトに挟まれた部分で剥離力を受ける(T2、T3)。
また、研磨ゾーンでは、図中、矢印で示す方向に水流を噴射し、これによって、研磨ベルトは研磨部位と周回軌道上で水流を受け、テンポラリーバー表面から除去された溶接痕や残片は下方の漏斗状の残片回収部17に水流とともに洗い流される。残片回収部17出口の下には金網や濾紙、濾布を設けるかまたはこれらを組み合わせた濾過手段を設ける(図示していない)。例えば、金網とウェブ状の濾紙を組み合わせ、比較的大きな残片等は金網で捕捉し、溶接痕や小片は濾紙上に受ける。このようにして濾過された水は適当なポンプ手段によって上記の水流噴射部分に循環する。
At the same time, five temporary bars are fed from the left side of the drawing onto the conveyor belt 16 by a magazine with an elevator (not shown) so that the longitudinal direction coincides with the conveying direction (T 1 ). The conveying belt 16 conveys the temporary bar from the left to the right in the figure (conveying speed: 6.2 m / min), but during this time, the polishing belts 12 and 13 are rotating clockwise in the figure, so the temporary belt is temporary. The surface of the bar receives a peeling force at a portion sandwiched between the conveyance belt and the polishing belt (T 2 , T 3 ).
Also, in the polishing zone, water flow is jetted in the direction indicated by the arrow in the figure, whereby the polishing belt receives the water flow on the polishing site and the circular orbit, and the welding marks and residues removed from the surface of the temporary bar are below. The funnel-shaped residue collection part 17 is washed away with a water flow. A wire net, filter paper, filter cloth, or a filtering means in combination of these is provided below the outlet of the residue collection unit 17 (not shown). For example, a wire mesh and a web-like filter paper are combined, relatively large remaining pieces are captured by the wire mesh, and welding marks and small pieces are received on the filter paper. The water filtered in this way is circulated to the water jet part by means of a suitable pump.

この例では、支持部材再生装置はさらに付加的な洗浄ゾーンを含む。ここで、研磨後のテンポラリーバー(テンポラリーバーT4〜T6)はさらに搬送ローラー21上を移動し、図中、矢印で示される方向に噴射される洗浄水によって洗浄される。洗浄ミストはミストレーサー等のミスト回収手段18によって回収される。また、この例では、さらに乾燥ゾーンも含んでおり、洗浄後のテンポラリーバー(テンポラリーバーT7〜T8)はさらに搬送ローラー22上を移動し、ブロア19から、図中、矢印で示される方向に噴射されるエアによって乾燥される。
これらのゾーンの下方には漏斗状の洗浄水回収部20が設けられ、洗浄水は適当なタンク内で適温(例えば、40℃)に加温されて上記水流噴射部に循環される。
一方、洗浄乾燥されたテンポラリーバーはスロープ23から排出され(T9)、回収マガジン(図示していない)内にスタックされる。
In this example, the support member regeneration device further includes an additional cleaning zone. Here, the polished temporary bars (temporary bars T 4 to T 6 ) further move on the transport roller 21 and are cleaned by cleaning water sprayed in the direction indicated by the arrow in the drawing. The cleaning mist is collected by a mist collecting means 18 such as a mistracer. In addition, in this example, a drying zone is also included, and the cleaned temporary bars (temporary bars T 7 to T 8 ) further move on the transport roller 22 and from the blower 19 in the direction indicated by the arrow in the figure. It is dried by the air that is sprayed on.
Below these zones, a funnel-shaped washing water recovery unit 20 is provided, and the washing water is heated to an appropriate temperature (for example, 40 ° C.) in an appropriate tank and circulated to the water jet unit.
On the other hand, the cleaned and dried temporary bar is discharged from the slope 23 (T 9 ) and stacked in a collection magazine (not shown).

(2)固体電解コンデンサの製造
アルミニウム箔表面に慣用の方法により化成処理を施して形成したアルミニウム化成箔(厚み100μm)を1片が3mm×10mmの矩形状となるように切り出した。この化成箔32枚を短辺(3mm)側の端部から2mm迄がステンレス鋼製テンポラリーバー(224mm×15mm×1.0mm(SUS304製))に重なるように4mm間隔で1列にハンダ付けした。次いで、各化成箔について、長軸方向を4mmと5mmの部分に区切るように、両面に幅1mmのポリイミド溶液を周状に塗布、乾燥させマスキングを作成した。
(2) Production of Solid Electrolytic Capacitor An aluminum conversion foil (thickness: 100 μm) formed by subjecting the surface of the aluminum foil to chemical conversion treatment by a conventional method was cut out so that one piece had a rectangular shape of 3 mm × 10 mm. 32 sheets of this conversion foil were soldered in a row at intervals of 4 mm so that the end from the short side (3 mm) side to 2 mm overlapped with a stainless steel temporary bar (224 mm × 15 mm × 1.0 mm (made of SUS304)). . Next, with respect to each chemical conversion foil, a polyimide solution having a width of 1 mm was applied on both sides in a circumferential manner so as to divide the major axis direction into 4 mm and 5 mm portions, and then masked.

アルミニウム化成箔を列状に取り付けたこのテンポラリーバーを、アジピン酸アンモニウム水溶液上に移動させ、前記溶液に向けて垂直に降下させることにより、各化成箔の3mm×4mmの部分を溶液に浸漬させ、そのまま、切り口部分に化成し、誘電体酸化皮膜を形成した。   This temporary bar with aluminum conversion foil attached in a row is moved onto an aqueous solution of ammonium adipate and vertically lowered toward the solution, so that a 3 mm × 4 mm portion of each conversion foil is immersed in the solution, As it was, it was formed into a cut portion to form a dielectric oxide film.

次に、このテンポラリーバーをモノマー溶液上に移動させ、溶液に向けて垂直に降下させることにより、各化成箔の3mm×4mmの部分を溶液に浸漬させた。この化成箔列を引き上げ、乾燥した。   Next, the temporary bar was moved onto the monomer solution and dropped vertically toward the solution, so that a 3 mm × 4 mm portion of each chemical conversion foil was immersed in the solution. The formed foil row was pulled up and dried.

一方、酸化剤溶液を調整し、前記のテンポラリーバーをこの溶液上に移動し、前記溶液に向けて垂直に降下させることにより、各化成箔の3mm×4mmの部分を前記溶液に浸漬させ酸化的重合を進行させた。   On the other hand, by adjusting the oxidizer solution, moving the temporary bar onto the solution and lowering it vertically toward the solution, a 3 mm × 4 mm portion of each conversion foil is immersed in the solution to oxidatively. Polymerization was allowed to proceed.

以上の各浸漬工程及び重合工程を全体で20回実施し、固体電解質層を形成した。
このようにして製造した固体電解コンデンサ素子部分をテンポラリーバーから切断し所定のコンデンサ素子製造工程に送る一方、アルミ箔残片の付着したテンポラリーバーを上記(1)のテンポラリーバー再生装置の送出用マガジン内に平行5列にスタックし、搬送ベルト上に25mm間隔5列で送出し、研磨、洗浄及び乾燥を行なった。
The above immersion steps and polymerization steps were performed 20 times in total to form a solid electrolyte layer.
The solid electrolytic capacitor element portion thus manufactured is cut from the temporary bar and sent to a predetermined capacitor element manufacturing process, while the temporary bar to which the aluminum foil residue has adhered is placed in the sending magazine of the temporary bar reproducing apparatus of (1) above. 5 rows in parallel with each other, and sent out on the conveyor belt at 25 mm intervals and 5 rows for polishing, washing and drying.

アルミ箔残片は概ね1番ロール(研磨ベルト2)で除去され、ハンダ付け痕は2番ロール(研磨ベルト3)で除去された。
上記装置により得られたテンポラリーバーの再生仕上がり面は平滑で、表面粗さ測定器(東京精密製)で測定した表面粗さ15S未満であり、レベレーで矯正した後の長手方向の反りは0.5mm/224mm(長手方向全長)であった。また、この装置により1時間当たり5000枚のテンポラリーバーを連続処理できた。
The aluminum foil residue was generally removed with the first roll (polishing belt 2), and the soldering trace was removed with the second roll (polishing belt 3).
The finished surface of the temporary bar obtained by the above apparatus is smooth and has a surface roughness of less than 15S measured with a surface roughness measuring instrument (manufactured by Tokyo Seimitsu). The warpage in the longitudinal direction after correction with a leveler is 0. It was 5 mm / 224 mm (full length in the longitudinal direction). In addition, this apparatus was able to continuously process 5000 temporary bars per hour.

このようにして再生されたテンポラリーバーを再利用して前記固体電解コンデンサ製造プロセスに投入したところ、新しいテンポラリーバーと全く変わらない製造が可能であった。
また、再生テンポラリーバーを使用して製造した固体電解コンデンサ素子にカーボンペーストと銀ペーストを付着させて4枚積層し、陰極リード端子を接続し、導電性重合体組成物層の形成されていない部分には陽極リード端子を溶接により接続し、この素子をエポキシ樹脂で封止した後、エージングを行ない、コンデンサを完成させたところ、新しいテンポラリーバーを使用した場合のコンデンサと比較して、電気特性(120Hzにおける容量と損失係数(tanδ×100(%))、等価直列抵抗(ESR)及び漏れ電流)に有意な劣化は認められなかった。
When the regenerated temporary bar was reused and put into the solid electrolytic capacitor manufacturing process, it was possible to manufacture completely the same as a new temporary bar.
In addition, a solid electrolytic capacitor element manufactured using a regenerative temporary bar is bonded to a carbon paste and a silver paste, and four sheets are stacked, a cathode lead terminal is connected, and a conductive polymer composition layer is not formed. The anode lead terminal was connected by welding, and after sealing this element with epoxy resin, aging was performed and the capacitor was completed. Compared with the capacitor using the new temporary bar, the electrical characteristics ( No significant deterioration was observed in the capacity and loss factor (tan δ × 100 (%)), equivalent series resistance (ESR) and leakage current) at 120 Hz.

さらに、上記装置による再生では、1再生当たりのテンポラリーバーの板厚減少量は0.001〜0.003mm(マイクロメーターによる。分解能0.001mm)であり、実用的な範囲(0.05mm以下)より十分に小さな値であった。   Further, in the reproduction by the above apparatus, the thickness reduction amount of the temporary bar per reproduction is 0.001 to 0.003 mm (by micrometer, resolution 0.001 mm), and practical range (0.05 mm or less). It was a sufficiently small value.

本発明の方法によれば、小片の一括処理を効率的に行なうことができる。特に固体電解コンデンサの製造において有用であり、固体電解コンデンサの製造プロセスの効率化、連続化に有効である。   According to the method of the present invention, batch processing of small pieces can be performed efficiently. In particular, it is useful in the production of solid electrolytic capacitors, and is effective for improving the efficiency and continuity of the production process of solid electrolytic capacitors.

固体電解コンデンサの製造プロセスを示す模式図。The schematic diagram which shows the manufacturing process of a solid electrolytic capacitor. 本発明の小片支持用部材の再生装置の一部を示す模式図。The schematic diagram which shows a part of reproducing | regenerating apparatus of the small piece support member of this invention.

符号の説明Explanation of symbols

1 小片支持用部材(テンポラリーバー)
2 小片
3 処理液
4 固体電解コンデンサ素子
5 導体残片
11 小片支持用部材(テンポラリーバー)再生装置
12 研磨ベルト(1番ロール)
13 研磨ベルト(2番ロール)
14 コンタクトロール
15 コンタクトロール
16 搬送ベルト
17 残片回収部
18 ミストレーサ
19 ブロア
20 洗浄水回収部
21 搬送ローラ
22 搬送ローラ
23 スロープ
1 Small piece support member (temporary bar)
2 Small piece 3 Treatment liquid 4 Solid electrolytic capacitor element 5 Conductor residue 11 Small piece supporting member (temporary bar) Regenerating device 12 Polishing belt (No. 1 roll)
13 Abrasive belt (2nd roll)
14 Contact Roll 15 Contact Roll 16 Conveying Belt 17 Remaining Piece Collecting Unit 18 Mistracer 19 Blower 20 Washing Water Collecting Unit 21 Conveying Roller 22 Conveying Roller 23 Slope

Claims (16)

複数個の小片を支持部材に固定し、各小片の表面の一部に表面処理を行なった後、前記処理済み部分を支持部材から分離する工程を含む小片の一括処理方法において、小片分離後の支持部材表面を研磨して再利用することを特徴とする小片の一括処理方法。   In the batch processing method of small pieces including a step of fixing a plurality of small pieces to a support member, performing a surface treatment on a part of the surface of each small piece, and separating the processed portion from the support member, A method for batch processing of small pieces, wherein the surface of the support member is polished and reused. 前記小片が金属箔である請求項1に記載の小片の一括処理方法。   The batch processing method of the small piece of Claim 1 whose said small piece is metal foil. 金属箔がアルミニウム化成箔である請求項2に記載の小片の一括処理方法。   The method for batch processing of small pieces according to claim 2, wherein the metal foil is an aluminum conversion foil. 支持部材がステンレス鋼板である請求項1〜3のいずれかに記載の小片の一括処理方法。   The small piece batch processing method according to any one of claims 1 to 3, wherein the support member is a stainless steel plate. 小片が支持部材にハンダ付けまたは溶接によって固定されたものである請求項1〜4のいずれかに記載の小片の一括処理方法。   The method for batch processing of small pieces according to any one of claims 1 to 4, wherein the small pieces are fixed to the support member by soldering or welding. 研磨が湿式研磨である請求項1〜5のいずれかに記載の小片の一括処理方法。   The method for batch processing of small pieces according to any one of claims 1 to 5, wherein the polishing is wet polishing. 研磨材を含む無限ベルトを前記支持部材表面に接触させることにより研磨を行なう請求項6に記載の小片の一括処理方法。   The batch processing method of the small piece of Claim 6 which grind | polishes by making the infinite belt containing an abrasive material contact the said support member surface. 無限ベルトを水洗しながら前記支持部材表面に接触させることにより研磨を行なう請求項7に記載の小片の一括処理方法。   The batch processing method of the small pieces of Claim 7 which grind | polishes by making an infinite belt contact the said supporting member surface while washing with water. 支持部材表面から剥離した導体の残片を水洗による水流によって無限ベルト表面から除去しつつ研磨を行なう請求項8に記載の小片の一括処理方法。   9. The batch processing method for small pieces according to claim 8, wherein the polishing is performed while removing the remaining pieces of the conductor separated from the surface of the support member from the surface of the infinite belt by a water flow by washing with water. 研磨後の支持部材の表面粗さを15S以下とする請求項1〜9のいずれかに記載の小片の一括処理方法。   The method for batch treatment of small pieces according to any one of claims 1 to 9, wherein the surface roughness of the support member after polishing is 15S or less. 研磨後の支持部材の変形矯正工程をさらに含む請求項1〜10のいずれかに記載の小片の一括処理方法。   The batch processing method of the small pieces in any one of Claims 1-10 which further includes the deformation | transformation correction process of the support member after grinding | polishing. 小片に固体電解コンデンサ素子部分を形成するための処理に請求項1〜11のいずれかに記載の方法を適用することを特徴とする固体電解コンデンサの製造方法。   A method for producing a solid electrolytic capacitor, wherein the method according to claim 1 is applied to a treatment for forming a solid electrolytic capacitor element portion on a small piece. 複数の導体支持部材を保持して順次投入する支持部材投入機と投入された支持部材を研磨部に搬送する搬送部を含み、前記研磨部が少なくとも1の研磨ベルトを含む支持部材再生装置。   A support member regenerator that includes a support member feeding machine that holds and sequentially feeds a plurality of conductor support members, and a transport unit that transports the loaded support members to a polishing unit, wherein the polishing unit includes at least one polishing belt. 研磨ベルトが研磨材を含む無限ベルトであり、駆動された前記無限ベルトを研磨部において支持部材表面に接触させる請求項13に記載の支持部材再生装置。   The supporting member regeneration device according to claim 13, wherein the polishing belt is an infinite belt containing an abrasive, and the driven infinite belt is brought into contact with the surface of the supporting member in the polishing portion. 研磨部が少なくとも2の研磨ベルトを含む請求項14に記載の支持部材再生装置。   The supporting member regeneration apparatus according to claim 14, wherein the polishing section includes at least two polishing belts. 支持部材の搬送方向と対向する向きに無限ベルトを駆動させる請求項15に記載の支持部材再生装置。
The supporting member reproducing apparatus according to claim 15, wherein the endless belt is driven in a direction opposite to the conveying direction of the supporting member.
JP2005125251A 2005-04-22 2005-04-22 Batch processing method of chip, and device used for it Pending JP2006303310A (en)

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Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6438254U (en) * 1987-08-28 1989-03-07
JPH01149961A (en) * 1987-12-04 1989-06-13 Canon Inc Device for regenerating amorphous silicon photoreceptive member forming jig
JPH06190710A (en) * 1992-12-25 1994-07-12 Nisshin Steel Co Ltd Continuous polishing facility for steel band
JPH06283394A (en) * 1993-03-29 1994-10-07 Itec Tsuritani:Kk Chain lead structure body
JPH0757979A (en) * 1993-08-19 1995-03-03 Junichi Nakazawa Lead wire of electronic device and manufacturing method and apparatus therefor
JPH08277469A (en) * 1995-04-06 1996-10-22 Japan Energy Corp Wafer clamp device recycling method
WO2000067267A1 (en) * 1999-04-30 2000-11-09 Showa Denko K.K. Solid electrolytic capacitor and method for producing the same
JP2004084663A (en) * 2002-06-26 2004-03-18 Toshiba Corp Apparatus and method for correcting deformation of gas turbine blade

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6438254U (en) * 1987-08-28 1989-03-07
JPH01149961A (en) * 1987-12-04 1989-06-13 Canon Inc Device for regenerating amorphous silicon photoreceptive member forming jig
JPH06190710A (en) * 1992-12-25 1994-07-12 Nisshin Steel Co Ltd Continuous polishing facility for steel band
JPH06283394A (en) * 1993-03-29 1994-10-07 Itec Tsuritani:Kk Chain lead structure body
JPH0757979A (en) * 1993-08-19 1995-03-03 Junichi Nakazawa Lead wire of electronic device and manufacturing method and apparatus therefor
JPH08277469A (en) * 1995-04-06 1996-10-22 Japan Energy Corp Wafer clamp device recycling method
WO2000067267A1 (en) * 1999-04-30 2000-11-09 Showa Denko K.K. Solid electrolytic capacitor and method for producing the same
JP2004084663A (en) * 2002-06-26 2004-03-18 Toshiba Corp Apparatus and method for correcting deformation of gas turbine blade

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