JP2006335837A - Photoradical crosslinking polymer, photocurable resin composition and method for producing photoradical crosslinking polymer - Google Patents
Photoradical crosslinking polymer, photocurable resin composition and method for producing photoradical crosslinking polymer Download PDFInfo
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- 229920000642 polymer Polymers 0.000 title claims abstract description 49
- 238000004132 cross linking Methods 0.000 title claims abstract description 17
- 239000011342 resin composition Substances 0.000 title claims abstract description 11
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 5
- 239000000178 monomer Substances 0.000 claims abstract description 25
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical group CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 claims abstract description 19
- 125000000524 functional group Chemical group 0.000 claims abstract description 13
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 claims abstract description 12
- 238000006116 polymerization reaction Methods 0.000 claims description 4
- 230000000379 polymerizing effect Effects 0.000 abstract description 4
- 238000000465 moulding Methods 0.000 abstract description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 11
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 10
- 150000003254 radicals Chemical class 0.000 description 7
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 6
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- 238000006243 chemical reaction Methods 0.000 description 4
- 238000005336 cracking Methods 0.000 description 4
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- 230000009257 reactivity Effects 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- 238000003786 synthesis reaction Methods 0.000 description 4
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- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 3
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- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical compound OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 2
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- 229910052757 nitrogen Inorganic materials 0.000 description 2
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- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 2
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- ZKJNETINGMOHJG-GGWOSOGESA-N (e)-1-[(e)-prop-1-enoxy]prop-1-ene Chemical class C\C=C\O\C=C\C ZKJNETINGMOHJG-GGWOSOGESA-N 0.000 description 1
- MSAHTMIQULFMRG-UHFFFAOYSA-N 1,2-diphenyl-2-propan-2-yloxyethanone Chemical compound C=1C=CC=CC=1C(OC(C)C)C(=O)C1=CC=CC=C1 MSAHTMIQULFMRG-UHFFFAOYSA-N 0.000 description 1
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- XLPJNCYCZORXHG-UHFFFAOYSA-N 1-morpholin-4-ylprop-2-en-1-one Chemical compound C=CC(=O)N1CCOCC1 XLPJNCYCZORXHG-UHFFFAOYSA-N 0.000 description 1
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- AAUXVPAKDMCMMN-UHFFFAOYSA-N 2-[(4-ethenylphenoxy)methyl]oxirane Chemical compound C1=CC(C=C)=CC=C1OCC1OC1 AAUXVPAKDMCMMN-UHFFFAOYSA-N 0.000 description 1
- CRQSAKXMWFFXJG-UHFFFAOYSA-N 2-[(4-ethenylphenyl)methyl]oxirane Chemical compound C1=CC(C=C)=CC=C1CC1OC1 CRQSAKXMWFFXJG-UHFFFAOYSA-N 0.000 description 1
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 1
- GWZMWHWAWHPNHN-UHFFFAOYSA-N 2-hydroxypropyl prop-2-enoate Chemical compound CC(O)COC(=O)C=C GWZMWHWAWHPNHN-UHFFFAOYSA-N 0.000 description 1
- MXRGSJAOLKBZLU-UHFFFAOYSA-N 3-ethenylazepan-2-one Chemical compound C=CC1CCCCNC1=O MXRGSJAOLKBZLU-UHFFFAOYSA-N 0.000 description 1
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- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- LCFVJGUPQDGYKZ-UHFFFAOYSA-N Bisphenol A diglycidyl ether Chemical compound C=1C=C(OCC2OC2)C=CC=1C(C)(C)C(C=C1)=CC=C1OCC1CO1 LCFVJGUPQDGYKZ-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000005057 Hexamethylene diisocyanate Substances 0.000 description 1
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical class C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- MLVSWIXRZNPEKF-OWOJBTEDSA-N bis(oxiran-2-ylmethyl) (e)-but-2-enedioate Chemical compound C1OC1COC(=O)/C=C/C(=O)OCC1CO1 MLVSWIXRZNPEKF-OWOJBTEDSA-N 0.000 description 1
- MQDJYUACMFCOFT-UHFFFAOYSA-N bis[2-(1-hydroxycyclohexyl)phenyl]methanone Chemical compound C=1C=CC=C(C(=O)C=2C(=CC=CC=2)C2(O)CCCCC2)C=1C1(O)CCCCC1 MQDJYUACMFCOFT-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
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- 239000003795 chemical substances by application Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- UUZLJPRHSPEASP-UHFFFAOYSA-N cyclohexylmethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC1CCCCC1 UUZLJPRHSPEASP-UHFFFAOYSA-N 0.000 description 1
- CPZVJYPXOWWFSW-VAWYXSNFSA-N dibenzyl (e)-but-2-enedioate Chemical compound C=1C=CC=CC=1COC(=O)/C=C/C(=O)OCC1=CC=CC=C1 CPZVJYPXOWWFSW-VAWYXSNFSA-N 0.000 description 1
- JBSLOWBPDRZSMB-BQYQJAHWSA-N dibutyl (e)-but-2-enedioate Chemical compound CCCCOC(=O)\C=C\C(=O)OCCCC JBSLOWBPDRZSMB-BQYQJAHWSA-N 0.000 description 1
- BLKQQTCUGZJWLN-VAWYXSNFSA-N dicyclohexyl (e)-but-2-enedioate Chemical compound C1CCCCC1OC(=O)/C=C/C(=O)OC1CCCCC1 BLKQQTCUGZJWLN-VAWYXSNFSA-N 0.000 description 1
- 238000000113 differential scanning calorimetry Methods 0.000 description 1
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- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 235000011087 fumaric acid Nutrition 0.000 description 1
- 150000002238 fumaric acids Chemical class 0.000 description 1
- 230000005251 gamma ray Effects 0.000 description 1
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- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 description 1
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- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- FZYCEURIEDTWNS-UHFFFAOYSA-N prop-1-en-2-ylbenzene Chemical compound CC(=C)C1=CC=CC=C1.CC(=C)C1=CC=CC=C1 FZYCEURIEDTWNS-UHFFFAOYSA-N 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
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- JRMUNVKIHCOMHV-UHFFFAOYSA-M tetrabutylammonium bromide Chemical compound [Br-].CCCC[N+](CCCC)(CCCC)CCCC JRMUNVKIHCOMHV-UHFFFAOYSA-M 0.000 description 1
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- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
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Landscapes
- Macromonomer-Based Addition Polymer (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Abstract
Description
本発明は、紫外線その他の活性エネルギー線(活性種を生成可能な光線および放射線)照射の架橋による3次元硬化が可能な重合体、およびこれを含有する樹脂組成物に関する。特には、(メタ)アクリロイル基同士のラジカル重合反応によって3次元化が行われるものに関する。なお、本明細書においては、光以外の活性エネルギー線により架橋反応が誘起される場合も含めて、光ラジカル架橋、光硬化性等の語を用いることとする。 The present invention relates to a polymer capable of three-dimensional curing by irradiation with ultraviolet rays and other active energy rays (light rays and radiation capable of generating active species), and a resin composition containing the same. In particular, the present invention relates to one that is three-dimensionalized by radical polymerization reaction between (meth) acryloyl groups. In this specification, terms such as photoradical crosslinking and photocurability are used, including the case where a crosslinking reaction is induced by active energy rays other than light.
従来は塗膜の形成方法として、熱硬化型や溶剤型が一般的であったが、熱硬化型では耐熱性のない基材に対しては不適当であるという問題や、溶剤型では環境に対する負荷が大きいという問題があった。近年、これらに変わる方法として、エネルギー線の照射によって硬化可能な樹脂を使った塗装方法がさまざまな分野で開発されている(特開平5−179156号公報等)。
しかし、光ラジカル重合型では硬化時の収縮が大きく、硬化物にゆがみやわれが生じてしまうという問題点がある。硬化時の収縮による成形後のゆがみやわれは、光ファイバー等の成形体では特に問題になる。以上のことから、本発明は光硬化性樹脂において、硬化成形後の歪みや割れを防止できる光ラジカル架橋型ポリマー、光硬化樹脂組成物およびその製造方法を提供することを目的とする。 However, in the photo radical polymerization type, there is a problem that the shrinkage at the time of curing is large and the cured product is distorted and distorted. Distortion and cracking after molding due to shrinkage during curing is particularly a problem in molded articles such as optical fibers. In light of the above, an object of the present invention is to provide a photoradical crosslinking polymer, a photocurable resin composition, and a method for producing the same that can prevent distortion and cracking after curing molding in a photocurable resin.
本件発明者らは、これらの状況に鑑みて鋭意検討した結果、ポリマー分子構造中に(メタ)アクリロイル基をペンダント型に導入することにより、硬化収縮を小さくすることができることを見出した。 As a result of intensive studies in view of these circumstances, the inventors of the present invention have found that curing shrinkage can be reduced by introducing a (meth) acryloyl group into a polymer molecular structure into a pendant type.
すなわち本発明の光ラジカル架橋型ポリマーは、分子構造中に(メタ)アクリロイル基を含有するポリマーであって、分子量(Mn)が2,000〜100,000であり、エネルギー線の照射によって架橋可能であるものとする(請求項1)。 That is, the photoradical crosslinkable polymer of the present invention is a polymer containing a (meth) acryloyl group in the molecular structure, and has a molecular weight (Mn) of 2,000 to 100,000, and can be crosslinked by irradiation with energy rays. (Claim 1).
また、本発明の光ラジカル架橋型ポリマーの製造方法は、(メタ)アクリル酸により変性される官能基を有するモノマーを含むモノマー成分の重合によりポリマーを得て、このポリマーを(メタ)アクリル酸により変性することを特徴とするものとする(請求項2)。 In addition, the method for producing a photoradical crosslinking polymer of the present invention comprises obtaining a polymer by polymerizing a monomer component containing a monomer having a functional group modified by (meth) acrylic acid, and converting the polymer to (meth) acrylic acid. It is characterized by denaturing (claim 2).
さらに、本発明の光硬化樹脂組成物は、上記本発明の光ラジカル架橋型ポリマーを含有し、3次元架橋時の体積収縮率が3%未満であるものとする(請求項3)。 Furthermore, the photocurable resin composition of the present invention contains the photoradical crosslinkable polymer of the present invention, and has a volume shrinkage rate of less than 3% during three-dimensional crosslinking (Claim 3).
本発明の光ラジカル架橋型ポリマーを用いた樹脂組成物によれば、硬化収縮が小さいため、硬化物のゆがみやわれの問題がほとんどなくなる。その硬化物は透明性が良好であることから、光学分野への応用も可能である。 According to the resin composition using the photoradical crosslinking polymer of the present invention, since the curing shrinkage is small, there is almost no problem of distortion and cracking of the cured product. Since the cured product has good transparency, it can be applied to the optical field.
また、構成モノマーの組み合わせや組成比によって、樹脂組成物のガラス転移点を調整することができ、硬化前のガラス転移点を高くすることで硬化前にもタックフリーにすることができる。そのため、硬化前の状態でもほこりがつかないようにするドライフィルム化ができるという利点がある。 Moreover, the glass transition point of a resin composition can be adjusted with the combination and composition ratio of a structural monomer, and it can be made tack-free before hardening by making the glass transition point before hardening high. Therefore, there is an advantage that a dry film can be formed so as not to be dusty even in a state before curing.
本発明の光ラジカル架橋型ポリマーである(メタ)アクリロイル基を含有するポリマーは、(メタ)アクリロイル基を含有するラジカル重合可能なモノマーを含むモノマーを重合することにより得ることができる。 The polymer containing a (meth) acryloyl group which is the photoradical crosslinking polymer of the present invention can be obtained by polymerizing a monomer containing a monomer capable of radical polymerization containing a (meth) acryloyl group.
好ましくは、(1)(メタ)アクリル酸により変性を行うことができる官能基、例えばエポキシ基、あるいはヒドロキシ基等を含有し、ラジカル反応性を有するモノマーと、(2)(メタ)アクリル酸により変性を行うことができる官能基は含有せず、ラジカル反応性を持ったモノマーとを重合させたポリマーを(メタ)アクリル酸により変性することにより得る。 Preferably, (1) a functional group that can be modified with (meth) acrylic acid, such as an epoxy group or a hydroxyl group, and a monomer having radical reactivity, and (2) (meth) acrylic acid It does not contain a functional group that can be modified, and is obtained by modifying a polymer obtained by polymerizing a monomer having radical reactivity with (meth) acrylic acid.
ポリマーの重合成分である(メタ)アクリル酸により変性を行うことができる官能基およびラジカル反応性を含有したモノマー(1)は、1〜3個のエポキシ基あるいはヒドロキシル基と1個のラジカル反応基とを有するものである。 The monomer (1) containing a functional group and radical reactivity that can be modified by (meth) acrylic acid, which is a polymerization component of the polymer, has 1 to 3 epoxy groups or hydroxyl groups and one radical reactive group. It has.
このような(メタ)アクリル酸により変性を行うことができる官能基およびラジカル反応性を含有したモノマー(1)の例としては、エポキシ基を含有する(メタ)アクリル酸エステル類、エポキシ基を含有するスチレン誘導体、エポキシ基を含有するフマル酸エステル類、エポキシ基を含有するビニル化合物、ヒドロキシル基を含有する(メタ)アクリル酸エステル類、ヒドロキシル基を含有するスチレン誘導体、ヒドロキシル基を含有するフマル酸エステル類、ヒドロキシル基を含有するビニル化合物が挙げられる。 Examples of such a functional group that can be modified with (meth) acrylic acid and a monomer (1) containing radical reactivity include (meth) acrylic acid esters containing an epoxy group, epoxy group containing Styrene derivatives, fumaric acid esters containing epoxy groups, vinyl compounds containing epoxy groups, (meth) acrylic acid esters containing hydroxyl groups, styrene derivatives containing hydroxyl groups, fumaric acids containing hydroxyl groups Examples include esters and vinyl compounds containing a hydroxyl group.
より具体的には、エポキシシクロメチルアクリレート、エポキシシクロヘキシルメチルメタクリレート、グリシジルアクリレート、グリシジルメタクリレート、[(4−エテニルフェニル)メチル]オキシラン、4−(グリシジルオキシ)スチレン、4−ビニルエポキシシクロへキサン、ジグリシジルフマレート、ジエポキシシクロヘキシルメチルフマレート、2−ヒドロキシエチル(メタ)アクリレート、2−ヒドロキシプロピル(メタ)アクリレート、4−ヒドロキシブチル(メタ)アクリレートが挙げられる。 More specifically, epoxy cyclomethyl acrylate, epoxy cyclohexyl methyl methacrylate, glycidyl acrylate, glycidyl methacrylate, [(4-ethenylphenyl) methyl] oxirane, 4- (glycidyloxy) styrene, 4-vinyl epoxycyclohexane, Examples include diglycidyl fumarate, diepoxycyclohexylmethyl fumarate, 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, and 4-hydroxybutyl (meth) acrylate.
その他のポリマーの重合成分として用いられる(メタ)アクリル酸により変性を行うことができる官能基を有しないモノマー(2)としては、公知の種々のモノマーが使用可能である。例えば、(メタ)アクリル酸メチル、(メタ)アクリル酸エチル、(メタ)アクリル酸ブチル、ベンジル(メタ)アクリレート、フェノキシエチル(メタ)アクリレート、テトラヒドロフルフリル(メタ)アクリレート、イソボルニル(メタ)アクリレート、(メタ)アクリロイルモルホリン、(メタ)アクリルアミド、ジシクロヘキシルフマレート、ジベンジルフマレート、ジブチルフマレート、ビニルカプロラクタム、ビニルピロリドン、酢酸ビニル、スチレン等が挙げられる。 As the monomer (2) having no functional group that can be modified with (meth) acrylic acid used as a polymerization component of other polymers, various known monomers can be used. For example, methyl (meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, benzyl (meth) acrylate, phenoxyethyl (meth) acrylate, tetrahydrofurfuryl (meth) acrylate, isobornyl (meth) acrylate, (Meth) acryloylmorpholine, (meth) acrylamide, dicyclohexyl fumarate, dibenzyl fumarate, dibutyl fumarate, vinyl caprolactam, vinyl pyrrolidone, vinyl acetate, styrene and the like.
このような(メタ)アクリル酸により変性を行うことができる官能基を有しないモノマーを用いる場合、ラジカル重合性モノマー((1)+(2))の総モル数中の(メタ)アクリル酸により変性を行うことができる官能基を有するモノマー(1)のモル分率、すなわち((メタ)アクリル酸により変性を行うことができる官能基を有するモノマーのモル数)/(ラジカル重合性モノマーの総モル数)は、0.2〜0.75であることが好ましい。 When such a monomer having no functional group that can be modified with (meth) acrylic acid is used, the (meth) acrylic acid in the total number of moles of the radical polymerizable monomer ((1) + (2)) The mole fraction of the monomer (1) having a functional group that can be modified, that is, (the number of moles of the monomer having a functional group that can be modified by (meth) acrylic acid) / (total of radical polymerizable monomers) The number of moles) is preferably 0.2 to 0.75.
また、上記により合成したポリマーの官能基を(メタ)アクリル酸により変性を行う際のモル分率、すなわち((メタ)アクリル酸モル数)/(ポリマーの官能基モル数)は0.1〜1.0であることが好ましい。このような共重合および(メタ)アクリル酸変性モル分率より、硬化物の物性を容易に、好ましいものに調整することができる。 Further, the molar fraction when the functional group of the polymer synthesized as described above is modified with (meth) acrylic acid, that is, ((meth) acrylic acid mole number) / (polymer functional group mole number) is 0.1 to 0.1. 1.0 is preferable. From such copolymerization and (meth) acrylic acid-modified molar fraction, the physical properties of the cured product can be easily adjusted to a preferable one.
また、本発明の樹脂組成物を塗料化する場合には、酢酸エチル、トルエン等の有機溶剤およびモノマー類で希釈することができ、モノマーで希釈する場合は、ポリマーとモノマーの総和中のポリマーの含有率を30重量%以上にすることが望ましい。 When the resin composition of the present invention is made into a paint, it can be diluted with an organic solvent and monomers such as ethyl acetate and toluene, and when diluted with a monomer, the polymer in the sum of the polymer and the monomer can be diluted. The content is desirably 30% by weight or more.
希釈に用いるモノマー類としては、ビニルエーテル化合物、プロペニルエーテル化合物、スチレン誘導体、エポキシ化合物、ラクトン化合物、オキセタン化合物等、公知慣用のものが使用可能である。これらは単独で用いてもよく、複数種を併用してもよい。 As the monomers used for the dilution, known and commonly used monomers such as vinyl ether compounds, propenyl ether compounds, styrene derivatives, epoxy compounds, lactone compounds, oxetane compounds can be used. These may be used independently and may use multiple types together.
本発明のエネルギー線架橋型樹脂組成物には、必要に応じて光重合開始剤を添加する。 A photopolymerization initiator is added to the energy beam crosslinkable resin composition of the present invention as necessary.
光重合開始剤の種類は特に限定されず、公知のものが使用可能であるが、代表的な例としては、1−ヒドロキシシクロヘキシルフェニルケトン、2−ヒドロキシ−2−メチル−1−フェニルプロパン−1−オン、ベンジルジメチルケタール、ベンゾインイソプロピルエーテル、ベンゾフェノン等が挙げられる。これらを単独で用いても、複数種併用してもよい。 The type of the photopolymerization initiator is not particularly limited, and known ones can be used. Typical examples include 1-hydroxycyclohexyl phenyl ketone and 2-hydroxy-2-methyl-1-phenylpropane-1. -One, benzyl dimethyl ketal, benzoin isopropyl ether, benzophenone and the like. These may be used alone or in combination.
また、光重合開始剤を使用する場合のその添加量は、(メタ)アクリロイル基含有ポリマーと上記必要に応じて用いられるモノマーの総和に対し、0.1〜10重量%程度であり、約1〜5重量%が好ましい。 Moreover, the addition amount in the case of using a photoinitiator is about 0.1 to 10 weight% with respect to the sum total of the (meth) acryloyl group containing polymer and the said monomer used as needed, about 1 ~ 5 wt% is preferred.
さらに、本発明の光ラジカル架橋型ポリマーには、必要に応じて、光安定剤、紫外線吸収剤、触媒、レベリング剤、消泡剤、重合促進剤、酸化防止剤、難燃剤、赤外線吸収剤、等を添加することができる。 Furthermore, the photoradical crosslinkable polymer of the present invention includes a light stabilizer, an ultraviolet absorber, a catalyst, a leveling agent, an antifoaming agent, a polymerization accelerator, an antioxidant, a flame retardant, an infrared absorber, if necessary. Etc. can be added.
なお、本発明の光ラジカル架橋型ポリマーを硬化させるエネルギー線源は特に限定されないが、例としては、高圧水銀灯、電子線、γ線、カーボンアーク灯、キセノン灯、メタルハライド灯等が挙げられる。 The energy ray source for curing the photoradical crosslinking polymer of the present invention is not particularly limited, and examples thereof include a high pressure mercury lamp, an electron beam, a γ ray, a carbon arc lamp, a xenon lamp, and a metal halide lamp.
以下、本発明を実施例および比較例によりさらに具体的に説明するが、本発明はこれらの実施例に何ら限定されるものではない。なお、以下において、配合比率及び「%」は、特に断らないかぎり、全て重量基準であるものとする。 EXAMPLES Hereinafter, although an Example and a comparative example demonstrate this invention further more concretely, this invention is not limited to these Examples at all. In the following, the blending ratio and “%” are all based on weight unless otherwise specified.
[実施例1]
フラスコにメチルイソブチルケトン350gを仕込み、窒素を導入しながら加温し、還流温度とした。そこに、スチレン104g(1.0モル)、エポキシシクロヘキシルメチルメタクリレート205g(1.0モル)、α−メチルスチレンダイマー30.9g、ラウロイルパーオキサイド15gを溶解させたものを滴下しながら100〜105℃で反応させ、ポリマーA溶液を得た。
[Example 1]
The flask was charged with 350 g of methyl isobutyl ketone and heated while introducing nitrogen to obtain a reflux temperature. 100-105 ° C. while dropwise adding 104 g (1.0 mol) of styrene, 205 g (1.0 mol) of epoxycyclohexylmethyl methacrylate, 30.9 g of α-methylstyrene dimer, and 15 g of lauroyl peroxide. To obtain a polymer A solution.
このポリマーA溶液にアクリル酸36g(0.5モル)、トリフェニルホスフィン3g、ハイドロキノンモノメチルエーテル0.3gを加え、90〜110℃の条件にて酸価が4mgKOH/g以下になるまで反応させ、アクリロイル基を含有するポリマーを得た。得られたポリマーをメタノールにて精製し、分子量(Mn)5600(GPCスチレン換算)のアクリロイル基を含有するポリマーを得た。 To this polymer A solution, 36 g (0.5 mol) of acrylic acid, 3 g of triphenylphosphine, and 0.3 g of hydroquinone monomethyl ether were added and reacted at 90 to 110 ° C. until the acid value became 4 mgKOH / g or less. A polymer containing acryloyl groups was obtained. The obtained polymer was refine | purified with methanol, and the polymer containing the acryloyl group of molecular weight (Mn) 5600 (GPC styrene conversion) was obtained.
[実施例2]
フラスコにメチルイソブチルケトン150g、スチレン104g(1.0モル)、エポキシシクロヘキシルメチルメタクリレート205g(1.0モル)、ラウロイルパーオキサイド3gを仕込み、窒素を導入しながら75〜80℃の条件にて8時間反応させ、ポリマーB溶液を得た。
[Example 2]
A flask is charged with 150 g of methyl isobutyl ketone, 104 g (1.0 mol) of styrene, 205 g (1.0 mol) of epoxycyclohexylmethyl methacrylate and 3 g of lauroyl peroxide, and is introduced for 8 hours under conditions of 75 to 80 ° C. while introducing nitrogen. The polymer B solution was obtained by reacting.
このポリマーB溶液にメチルイソブチルケトン300g、アクリル酸36g(0.5モル)、トリフェニルホスフィン3g、ハイドロキノンモノメチルエーテル0.3gを加え、90〜110℃の条件にて酸価が4mgKOH/g以下になるまで反応させ、アクリロイル基を含有するポリマーを得た。得られたポリマーをメタノールにて精製し、分子量(Mn)56000(GPCスチレン換算)のアクリロイル基を含有するポリマーを得た。 To this polymer B solution, 300 g of methyl isobutyl ketone, 36 g (0.5 mol) of acrylic acid, 3 g of triphenylphosphine, and 0.3 g of hydroquinone monomethyl ether were added, and the acid value was reduced to 4 mgKOH / g or less at 90 to 110 ° C. The reaction was continued until a polymer containing an acryloyl group was obtained. The obtained polymer was refine | purified with methanol, and the polymer containing the acryloyl group of molecular weight (Mn) 56000 (GPC styrene conversion) was obtained.
[比較合成例1]
ヘキサメチレンジイソシアネートのイソシアヌレートタイプ3量体504g(1モル)、ハイドロキノンモノメチルエーテル0.47g、2−ヒドロキシプロピルアクリレート429g(3.3モル)を仕込み、70〜80℃の条件にて残存イソシアネート濃度が0.1%になるまで反応させ、ウレタンアクリレートを得た。
[Comparative Synthesis Example 1]
504 g (1 mol) of isocyanurate type trimer of hexamethylene diisocyanate, 0.47 g of hydroquinone monomethyl ether, 429 g (3.3 mol) of 2-hydroxypropyl acrylate, and the residual isocyanate concentration is 70 to 80 ° C. It was made to react until it became 0.1%, and urethane acrylate was obtained.
[比較合成例2]
ビスフェノールAジグリシジルエーテル(標準タイプ)380g(1モル)、アクリル酸144g(2モル)、ハイドロキノンモノメチルエーテル0.26g、テトラブチルアンモニウムブロマイド2.62gを仕込み、90〜100℃の条件にて酸価が5mgKOH/g以下になるまで反応させ、エポキシアクリレートを得た。
[Comparative Synthesis Example 2]
380 g (1 mol) of bisphenol A diglycidyl ether (standard type), 144 g (2 mol) of acrylic acid, 0.26 g of hydroquinone monomethyl ether and 2.62 g of tetrabutylammonium bromide are charged, and the acid value is 90 to 100 ° C. Was reacted until 5 mgKOH / g or less was obtained, to obtain an epoxy acrylate.
[実施例1,2、比較例1,2]
上記合成例で得られたポリマーおよび比較合成例で得られたウレタンアクリレート、エポキシアクリレートについて、以下の要領で硬化させ、物性等を測定・評価した。結果を表1に示す。
[Examples 1 and 2, Comparative Examples 1 and 2]
The polymer obtained in the above synthesis example and the urethane acrylate and epoxy acrylate obtained in the comparative synthesis example were cured in the following manner, and the physical properties and the like were measured and evaluated. The results are shown in Table 1.
・硬化条件
表1に示した比率(重量部)で配合して均一に溶解させた樹脂組成物をガラス板上に200μmのアプリケーターバーで塗布し、減圧乾燥機で110℃×1時間乾燥後、80W/cmの高圧水銀灯を用いて積算照度340mJ/cm2の紫外線を照射した。
Curing conditions A resin composition blended and uniformly dissolved in the ratio (parts by weight) shown in Table 1 was applied onto a glass plate with a 200 μm applicator bar, dried at 110 ° C. for 1 hour in a vacuum dryer, An ultraviolet ray with an integrated illuminance of 340 mJ / cm 2 was irradiated using a 80 W / cm high-pressure mercury lamp.
・タック性
溶剤を揮発させた後に、指で表面を触り、タックがあるかどうかを以下の基準で評価した。
○:べたつきがない。
×:べたつきがある。
-Tackiness After volatilizing the solvent, the surface was touched with a finger, and the presence or absence of tack was evaluated according to the following criteria.
○: No stickiness.
X: There is stickiness.
・硬化性(ゲル化率)
硬化フィルムを塩化メチレンに18時間浸漬して未硬化部分を抽出し、105℃で3時間乾燥した。塩化メチレン浸漬前の重量と乾燥後の重量から、ゲル化率として次式により求めた。
ゲル化率(%)=(乾燥後の重量/浸漬前の重量)×100
・ Curing property (gelation rate)
The cured film was immersed in methylene chloride for 18 hours to extract an uncured part and dried at 105 ° C. for 3 hours. From the weight before methylene chloride immersion and the weight after drying, the gelation rate was determined by the following formula.
Gelation rate (%) = (weight after drying / weight before immersion) × 100
・硬化収縮(体積収縮率)
下記条件で硬化させた樹脂の硬化前後の20℃での比重をピクノメーターで測定し、次式により体積収縮率として求めた。
体積収縮率(%)=〔(硬化後の比重−硬化前の比重)/硬化後の比重〕×100
・ Curing shrinkage (volumetric shrinkage)
The specific gravity at 20 ° C. before and after curing of the resin cured under the following conditions was measured with a pycnometer, and the volume shrinkage was obtained by the following formula.
Volume shrinkage (%) = [(specific gravity after curing−specific gravity before curing) / specific gravity after curing] × 100
・ガラス転移点(硬化前)
示差走査熱量測定(DSC)のベースラインの変曲点から求めた。
・ Glass transition point (before curing)
It calculated | required from the inflection point of the baseline of differential scanning calorimetry (DSC).
・ガラス転移点(硬化後)
レオログラフのtanδの極大点から求めた。
・ Glass transition point (after curing)
It was determined from the maximum point of tan δ of the rheograph.
・透明性
硬化物の透明性を以下の基準で目視判定した。
○:透明である。
×:濁りがある。
-Transparency The transparency of the cured product was visually determined according to the following criteria.
○: Transparent.
X: There is turbidity.
本発明の光ラジカル架橋型ポリマーによれば、硬化収縮が小さいため、硬化物のゆがみやわれの問題がほとんどなくなる。硬化前のガラス転移点が高いため、硬化前にもタックフリーにすることができる。従って、各種成形体や塗膜の形成に用いることができる。 According to the photoradical crosslinkable polymer of the present invention, since the curing shrinkage is small, there is almost no problem of distortion and cracking of the cured product. Since the glass transition point before curing is high, it can be tack-free before curing. Therefore, it can be used for forming various molded bodies and coating films.
また、透明性が良好であることから、光学分野への応用も可能である。
Further, since it has good transparency, it can be applied to the optical field.
Claims (3)
A photocurable resin composition comprising the photoradical crosslinkable polymer according to claim 1 and having a volume shrinkage ratio of less than 3% during three-dimensional crosslinking.
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013075955A (en) * | 2011-09-29 | 2013-04-25 | Tomoegawa Paper Co Ltd | Hard coat film |
| JP2016064399A (en) * | 2014-06-26 | 2016-04-28 | 富士フイルム株式会社 | Method of manufacturing hard coat film, hard coat film, polarizing plate, and liquid crystal display device |
| US9829606B2 (en) | 2014-06-26 | 2017-11-28 | Fujifilm Corporation | Method of manufacturing hard coat film, hard coat film, polarizing plate, and liquid crystal display device |
| US10365411B2 (en) | 2015-02-06 | 2019-07-30 | Fujifilm Corporation | Hardcoat film, polarizing plate, liquid crystal display, and method for manufacturing hardcoat film |
Citations (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5237991A (en) * | 1975-09-18 | 1977-03-24 | Kansai Paint Co Ltd | Compositions which cure with ionizing radiation and have improved adhe sion to polyolefins |
| JPS63118304A (en) * | 1986-11-07 | 1988-05-23 | Showa Highpolymer Co Ltd | Photo-setting resin composition |
| JPH0391517A (en) * | 1989-09-05 | 1991-04-17 | Nippon Soda Co Ltd | High-refractive index transparent resin and its production |
| JPH08259623A (en) * | 1995-03-17 | 1996-10-08 | Toagosei Co Ltd | Production of reactive resin |
| JPH1020493A (en) * | 1996-06-28 | 1998-01-23 | Nippon Chibagaigii Kk | Photopolymerizable thermosetting resin composition |
| JPH10287787A (en) * | 1997-04-10 | 1998-10-27 | Sakata Corp | UV curable resin, UV curable resin composition using the same, and UV curable printing ink composition |
| JPH11246637A (en) * | 1998-03-02 | 1999-09-14 | Taiyo Ink Mfg Ltd | Photosensitive composition and baked material pattern obtained by using same |
| JP2000034319A (en) * | 1998-07-17 | 2000-02-02 | Dainippon Printing Co Ltd | Copolymer resin |
| JP2000128940A (en) * | 1998-10-23 | 2000-05-09 | Nippon Shokubai Co Ltd | Polymerizable polymer and its production |
| JP2000147767A (en) * | 1997-09-29 | 2000-05-26 | Kansai Paint Co Ltd | Photosensitive resin composition for photoresist |
| JP2001089533A (en) * | 1999-09-24 | 2001-04-03 | Showa Highpolymer Co Ltd | Photosensitive resin |
-
2005
- 2005-05-31 JP JP2005160698A patent/JP4880249B2/en not_active Expired - Fee Related
Patent Citations (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5237991A (en) * | 1975-09-18 | 1977-03-24 | Kansai Paint Co Ltd | Compositions which cure with ionizing radiation and have improved adhe sion to polyolefins |
| JPS63118304A (en) * | 1986-11-07 | 1988-05-23 | Showa Highpolymer Co Ltd | Photo-setting resin composition |
| JPH0391517A (en) * | 1989-09-05 | 1991-04-17 | Nippon Soda Co Ltd | High-refractive index transparent resin and its production |
| JPH08259623A (en) * | 1995-03-17 | 1996-10-08 | Toagosei Co Ltd | Production of reactive resin |
| JPH1020493A (en) * | 1996-06-28 | 1998-01-23 | Nippon Chibagaigii Kk | Photopolymerizable thermosetting resin composition |
| JPH10287787A (en) * | 1997-04-10 | 1998-10-27 | Sakata Corp | UV curable resin, UV curable resin composition using the same, and UV curable printing ink composition |
| JP2000147767A (en) * | 1997-09-29 | 2000-05-26 | Kansai Paint Co Ltd | Photosensitive resin composition for photoresist |
| JPH11246637A (en) * | 1998-03-02 | 1999-09-14 | Taiyo Ink Mfg Ltd | Photosensitive composition and baked material pattern obtained by using same |
| JP2000034319A (en) * | 1998-07-17 | 2000-02-02 | Dainippon Printing Co Ltd | Copolymer resin |
| JP2000128940A (en) * | 1998-10-23 | 2000-05-09 | Nippon Shokubai Co Ltd | Polymerizable polymer and its production |
| JP2001089533A (en) * | 1999-09-24 | 2001-04-03 | Showa Highpolymer Co Ltd | Photosensitive resin |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013075955A (en) * | 2011-09-29 | 2013-04-25 | Tomoegawa Paper Co Ltd | Hard coat film |
| JP2016064399A (en) * | 2014-06-26 | 2016-04-28 | 富士フイルム株式会社 | Method of manufacturing hard coat film, hard coat film, polarizing plate, and liquid crystal display device |
| US9829606B2 (en) | 2014-06-26 | 2017-11-28 | Fujifilm Corporation | Method of manufacturing hard coat film, hard coat film, polarizing plate, and liquid crystal display device |
| US10365411B2 (en) | 2015-02-06 | 2019-07-30 | Fujifilm Corporation | Hardcoat film, polarizing plate, liquid crystal display, and method for manufacturing hardcoat film |
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| JP4880249B2 (en) | 2012-02-22 |
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