JP2007007862A - Drawing processing apparatus and method - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a drawing processing apparatus and a method wherein a desired two-dimensional image can be speedily drawn by efficiently transmitting and receiving drawing data. <P>SOLUTION: A CPU 74 constituting an image processing part 70 transmits the drawing data stored in a memory 84 to an exposure part 72 via a bus 88 and an I/F 86, and draws to record the two-dimensional image onto a substrate by driving a DMD 36. On the other hand, while loading of the substrate to an exposure recorder 10, processing of alignment and measurement to the substrate, and unloading of the substrate from the exposure recorder 10 are carried out on the basis of control of a system management server 11, an RIP 8 makes the next drawing data stored into an HD 82 of the image processing part 70 via an I/F 76 and the bus 88. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention relates to a drawing processing apparatus and method for drawing a two-dimensional image on a recording medium based on drawing data.

  Conventionally, various drawing processing apparatuses that form a desired two-dimensional image on a drawing surface based on drawing data are known.

  As such a drawing processing apparatus, for example, an apparatus that uses a spatial light modulation element such as a digital micromirror device (DMD) and modulates a light beam in accordance with drawing data to perform exposure has been proposed ( (See Patent Documents 1 and 2). Here, the DMD is configured by arranging a number of micromirrors two-dimensionally in a memory cell (SRAM array) on a semiconductor substrate such as silicon, and the electrostatic force due to the charge accumulated in the memory cell is reduced. By controlling according to the drawing data, the angle of the reflecting surface can be changed by tilting the micromirror, and an image can be formed by forming a drawing point at a desired position by changing the angle of the reflecting surface.

JP 2003-50469 A JP 2003-57834 A

  In such a drawing processing device, after drawing data is converted into raster data and transmitted to the image processing unit, the image processing unit performs desired image processing on the raster data, and then the raster data is received from a number of micromirrors. Drawing processing is performed by transmitting to a drawing unit including the spatial light modulation element.

  In this case, if the drawing area is large or the drawing density is high, the amount of drawing data also increases, so that it takes a long time to transmit raster data to the image processing unit. In addition, the image processing unit is dedicated to reception processing while receiving raster data, and the image processing raster data cannot be transmitted to the drawing unit. This is not possible and the drawing efficiency is also reduced.

  The present invention has been made to solve the above-described problems, and an object of the present invention is to provide a drawing processing apparatus and method capable of efficiently sending and receiving drawing data and quickly drawing a desired two-dimensional image. And

In order to solve the above problems, the present invention provides a drawing processing apparatus for drawing a two-dimensional image on a recording medium based on drawing data.
A drawing data supply unit for supplying the drawing data;
An image processing unit having a memory for storing the drawing data transmitted from the drawing data supply unit, and performing predetermined image processing on the drawing data;
A drawing unit that draws the two-dimensional image on the recording medium based on the image-processed drawing data transmitted from the image processing unit;
A transmission control unit that controls transmission processing of the drawing data transmitted from the drawing data supply unit to the drawing unit via the image processing unit;
The transmission control unit performs transmission processing of the drawing data from the drawing data supply unit to the memory of the image processing unit, and outputs the drawing data that has undergone image processing from the image processing unit to the drawing unit. It is characterized in that it is performed during a period other than the transmission period.

The present invention also provides a drawing processing method for drawing a two-dimensional image on a recording medium based on drawing data.
Transmitting the drawing data from the drawing data supply unit to the image processing unit;
Performing predetermined image processing on the drawing data transmitted to the image processing unit;
Transmitting the image-processed drawing data from the image processing unit to the drawing unit;
Drawing the two-dimensional image on the recording medium based on the drawing data transmitted to the drawing unit;
The drawing data transmission process from the drawing data supply unit to the image processing unit is performed during a period other than the period during which the drawing data is transmitted from the image processing unit to the drawing unit. .

  In the drawing processing apparatus and method of the present invention, the drawing data is efficiently transmitted by transmitting the drawing data from the drawing data supply unit to the image processing unit during a period when the drawing data is not transmitted from the image processing unit to the drawing unit. A desired two-dimensional image can be quickly drawn by transmitting and receiving.

  FIG. 1 shows an exposure recording system 4 which is an embodiment to which the drawing processing apparatus and method of the present invention are applied.

  The exposure recording system 4 creates drawing data and outputs it as vector data, and after converting the vector data transmitted from the CAD device 6 into bitmap data which is raster image data, the bitmap data is converted into the bitmap data. A raster image processor (RIP) 8 (drawing data supply unit) that performs run-length encoding processing and outputs it as compressed run-length data, and performs image processing including alignment processing on the run-length data transmitted from RIP 8. After that, the run-length data is expanded into bitmap data, and the exposure recording apparatus 10 that exposes and records a two-dimensional image on the recording medium based on the bitmap data, and the management control of the CAD apparatus 6, the RIP 8, and the exposure recording apparatus 10 From the system management server 11 (transmission control unit) Specifically configured.

  Here, the exposure recording apparatus 10 is an apparatus that performs exposure processing of a laminated printed wiring board or the like based on bitmap data, and is configured as shown in FIG.

  That is, the exposure recording apparatus 10 includes a surface plate 14 that is supported by a plurality of legs 12 and has a very small deformation. On the surface plate 14, an exposure stage 18 (a drawing stage) is provided via two guide rails 16. ) Is installed so as to be able to reciprocate in the arrow Y direction. A rectangular substrate F coated with a photosensitive material is sucked and held on the exposure stage 18.

  A gate-shaped column 20 is installed at the center of the surface plate 14 so as to straddle the guide rail 16. Fixed to one side of the column 20 are CCD cameras 22a and 22b that capture images including alignment marks 60a to 60d formed at predetermined positions on the substrate F, and on the other side of the column 20, A scanner 26 in which a plurality of exposure heads 24a to 24j for exposing and recording images on the substrate F is positioned and held is fixed. Strobes 64a and 64b are attached to the CCD cameras 22a and 22b via rod lenses 62a and 62b. The strobes 64a and 64b irradiate the imaging areas of the CCD cameras 22a and 22b with illumination light composed of infrared light that does not expose the substrate F.

  The alignment marks 60a to 60d are for detecting a displacement of the mounting position of the substrate F with respect to the exposure stage 18, deformation of the substrate F, and the like, and are through holes that can be clearly distinguished from the substrate F on which an image is drawn. Alternatively, it is composed of marks recorded by exposure on the substrate F, and is formed in the vicinity of the corner of the substrate F conveyed by the exposure stage 18. Note that the alignment marks 60a to 60d may be formed in a portion other than the vicinity of the corner portion of the substrate F as long as it does not affect the image to be exposed and recorded. Further, it is possible to form a desired number of marks corresponding to the correction accuracy for deformation or the like of the substrate F.

  The exposure heads 24a to 24j are arranged in a staggered manner in two rows in a direction orthogonal to the moving direction (arrow Y direction) of the substrate F. FIG. 3 shows the configuration of each of the exposure heads 24a to 24j. For example, laser beams L output from a plurality of semiconductor lasers constituting the light source unit 28 are combined and introduced into the exposure heads 24 a to 24 j via the optical fiber 30. A rod lens 32, a reflection mirror 34, and a digital micromirror device (DMD) 36 are arranged in order at the exit end of the optical fiber 30 into which the laser beam L is introduced.

  Here, as shown in FIG. 4, the DMD 36 has a large number of micromirrors 40 (drawing elements) arranged in a lattice on an SRAM cell (memory cell) 38 in a swingable state. A material having high reflectivity such as aluminum is deposited on the surface of each micromirror 40. When a digital signal according to the drawing data is written from the DMD controller 42 to the SRAM cell 38, each micromirror 40 is tilted in a predetermined direction according to the signal, and the on / off state of the laser beam L is realized according to the tilted state. .

  In the emission direction of the laser beam L reflected by the DMD 36 whose on / off state is controlled, a large number of lenses are arranged corresponding to the first imaging optical lenses 44 and 46 that are the magnifying optical system and the micromirrors 40 of the DMD 36. The provided microlens array 48 and second imaging optical lenses 50 and 52 which are zoom optical systems are sequentially arranged. Before and after the micro lens array 48, micro aperture arrays 54 and 56 for removing stray light and adjusting the laser beam L to a predetermined diameter are disposed.

  As shown in FIGS. 5 and 6, the DMD 36 incorporated in each of the exposure heads 24a to 24j is set in a state inclined at a predetermined angle with respect to the moving direction of the substrate F (arrow Y direction) in order to achieve high resolution. The That is, by inclining the DMD 36 with respect to the moving direction of the substrate F, the interval between the micromirrors 40 constituting the DMD 36 in the direction perpendicular to the arrow Y direction (arrow X direction) is narrowed. The resolution of the recorded image can be increased. The resolution in the arrow Y direction can be adjusted by the moving speed of the substrate F. Note that exposure areas 58a to 58j, which are ranges exposed at a time by each of the exposure heads 24a to 24j, are set so as to overlap in the direction of the arrow X so that there is no joint between the exposure heads 24a to 24j. .

  The control circuit of the exposure recording apparatus 10 includes an image processing unit 70 that performs desired image processing on the run length data based on the position data of the alignment marks 60a to 60d acquired using the CCD cameras 22a and 22b, and the image processing. The run length data is decompressed and expanded into bitmap data, and an exposure unit 72 (drawing unit) that drives the DMD 36 to expose and record a two-dimensional image on the substrate F is provided.

  The image processing unit 70 includes a CPU 74 that performs image processing. The CPU 74 has an interface (I / F) 76 that receives run-length data that is drawing data transmitted from the RIP 8, and an interface that receives image data including alignment marks 60a to 60d imaged by the CCD cameras 22a and 22b. I / F) 78, a hard disk (HD) 82 for storing the received run-length data via a hard disk drive (HDD) 80, and reading and storing the run-length data and alignment information from the HD 82 and image processing by the CPU 74 A memory 84 for storing the run length data and an interface (I / F) 86 for transmitting the image processed run length data to the exposure unit 72 are connected via a bus 88.

  The HD 82 is the first run-length data (first drawing data) relating to the current two-dimensional image recorded on the substrate F, and the next two-dimensional image recorded on the substrate F following the first run-length data. It is assumed that it has a capacity necessary for storing the second run-length data (second drawing data).

  The exposure unit 72 temporarily stores the run-length data transmitted from the I / F 86 of the image processing unit 70, decompresses the run-length data stored in the buffer 90, and expands the run-length data into bitmap data. The DMD 36 is configured based on the decompression conversion processing unit 92 that converts the frame data into the frame data according to the arrangement of the plurality of micromirrors 40 that constitutes the frame, the buffer 94 that temporarily stores the frame data, and the frame data stored in the buffer 94 A DMD controller 42 for controlling the micromirror 40 and exposing and recording a two-dimensional image on the substrate F;

  The exposure recording system 4 of the present embodiment is basically configured as described above. Next, its operation and effect will be described based on the flowcharts shown in FIGS. 7 is a flowchart relating to processing between the CAD device 6, the RIP 8, and the image processing unit 70, and FIG. 8 is a flowchart relating to processing between the image processing unit 70 and the exposure unit 72.

  First, using the CAD device 6, all drawing data of a two-dimensional image to be exposed and recorded on the substrate F is created (step S1). In the exposure recording system 4, a printed wiring pattern that is a two-dimensional image is recorded on a plurality of substrates F using the same drawing data, and the printed wiring patterns are stacked on each substrate F using different drawing data. It is assumed that a recording process is performed. Accordingly, the total drawing data is all drawing data for recording a plurality of different printed wiring patterns on the substrate F. Note that all the drawing data may include drawing data to be drawn on different substrates F.

  All drawing data created by the CAD device 6 is transmitted to the RIP 8 in the vector data format. The RIP 8 converts the vector data into raster image data format drawing data (step S2). Next, the RIP 8 performs a run-length encoding process on the raster image data and converts it into drawing data in a compressed run-length data format (step S3). In this case, the run-length data uses, for example, the number of 0 pixels constituting the drawing data that are continuous in the line direction of the two-dimensional image and the number of 1 pixels that make up the drawing data that are continuous in the line direction. Can be represented.

  The drawing data R (N) in the run length data format generated by the RIP 8 is set to N = 1 when the drawing data R (N) is the drawing data R (N) of the first printed wiring pattern (step S4). If the data is not being transmitted between the image processing unit 70 and the exposure unit 72, the data is transmitted to the image processing unit 70. If the data is being transmitted between the image processing unit 70 and the exposure unit 72, the data is transmitted to the image processing unit 70. Is set to a standby state (steps S5 and S6). In this case, transmission / reception of data among the RIP 8, the image processing unit 70, and the exposure unit 72 is managed and controlled by the system management server 11.

  The drawing data R (1) transmitted from the RIP 8 to the image processing unit 70 of the exposure recording apparatus 10 is stored in the HD 82 by the HDD 80 via the I / F 76 and the bus 88 based on the control of the CPU 74 (step S7). When the drawing data R (1) is composed of a large amount of data, the drawing data R (1) is divided into predetermined block data determined by the hardware constituting the exposure recording system 4, and steps S5 to S8 are performed for each block data. Repeat the process.

  When all the transmission processing of the drawing data R (1) to the image processing unit 70 is completed (step S8) and there is the next drawing data R (N) (step S9), N = N + 1 (step S10), step The processes of S5 to S9 are repeated. The HD 82 stores drawing data R (N) and drawing data R (N + 1) recorded on the substrate F after the drawing data R (N).

  In the image processing unit 70, when the exposure unit 72 records the drawing data R (N) of the first printed wiring pattern on the first substrate F (M), N = 1 and M = 1 are set (steps S11 and S12). . Next, the CPU 74 reads the drawing data R (1) from the HD 82, and stores the drawing data R (1) in the memory 84 via the bus 88 (step S13).

  On the other hand, the exposure recording apparatus 10 attracts and holds the substrate F (1) on the exposure stage 18 (step S14), then moves the exposure stage 18 to the scanner 26 side, and the alignment mark formed on the substrate F (1). Images including 60a to 60d are taken by the CCD cameras 22a and 22b (step S15). Image data including the imaged alignment marks 60 a to 60 d is stored in the memory 84 via the I / F 78 and the bus 88.

  The CPU 74 calculates the position data of the alignment marks 60a to 60d with respect to the exposure stage 18 from the image data of the alignment marks 60a to 60d, and based on the position data, the mounting position shift of the substrate F (1) with respect to the exposure stage 18; Alignment data for adjusting deformation or the like of the substrate F (1) is calculated, and alignment processing is performed on the drawing data R (1) stored in the memory 84 using the alignment data (step S16).

  The alignment-processed drawing data R (1) is transmitted to the exposure unit 72 via the bus 88 and the I / F 86 (step S17) and temporarily stored in the buffer 90.

  The decompression conversion processing unit 92 of the exposure unit 72 decompresses the drawing data R (1) in the run length data format stored in the buffer 90 and develops it into bitmap data. Next, the decompression conversion processing unit 92 converts the bitmap data into frame data composed of an array in the address continuous direction set in the plurality of micromirrors 40 constituting the DMD 36 and stores the frame data in the buffer 94.

  Then, the exposure recording apparatus 10 moves the exposure stage 18 from the scanner 26 side to the CCD cameras 22a and 22b side, and the DMD controller 42 sends the frame data related to the drawing data R (1) stored in the buffer 94 to the DMD 36. Then, a desired image is exposed and recorded on the substrate F (1) (step S18).

  That is, the laser beam L output from the light source unit 28 is introduced into the exposure heads 24 a to 24 j via the optical fiber 30. The introduced laser beam L enters the DMD 36 from the rod lens 32 via the reflection mirror 34.

  The DMD controller 42 reads frame data from the buffer 94 and controls each micromirror 40 constituting the DMD 36 on and off. The laser beam L selectively reflected in a desired direction by the respective micromirrors 40 constituting the DMD 36 is expanded by the first imaging optical lenses 44 and 46, and then the microaperture array 54, the microlens array 48, and the microlens. It is adjusted to a predetermined diameter via the aperture array 56, and then adjusted to a predetermined magnification by the second imaging optical lenses 50 and 52 and guided to the substrate F (1). The exposure stage 18 moves along the surface plate 14, and a desired two-dimensional image is formed on the substrate F (1) by a plurality of exposure heads 24a to 24j arranged in a direction orthogonal to the moving direction of the exposure stage 18. The exposure is recorded. In this case, a desired two-dimensional image is exposed and recorded at the target position with reference to the alignment marks 60a to 60d.

  When the exposure recording with the drawing data R (1) on the substrate F (1) is completed (step S19), the substrate F (1) is removed from the exposure stage 18 (step S20), and there is a next substrate F (M) ( In step S21), M = M + 1 is set (step S22), and the processes in steps S14 to S21 are repeated. It should be noted that a desired printed wiring pattern is formed on the substrate F (1) on which the two-dimensional image is exposed and recorded through development processing and etching processing.

  After two-dimensional images based on the drawing data R (1) are exposed and recorded on all the substrates F (M) (step S21), when there is next drawing data R (N) (step S23), N = N + 1 is set (step S24), and the processing of steps S12 to S23 is repeated. In this case, the drawing data R (N + 1) is exposed and recorded on the substrate F (M) on which the printed wiring pattern based on the drawing data R (N) is recorded.

  If the drawing data R (N) consists of a large amount of data, the drawing data R (N) is divided into predetermined block data determined by the hardware constituting the exposure recording system 4, and each block data is used as a unit in step S17. The process of S19 may be repeated.

  Here, drawing data R (N) transmission processing from the RIP 8 to the image processing unit 70 (step S6), drawing data R (N) transmission processing from the image processing unit 70 to the exposure unit 72 (step S17), and This will be described with reference to FIGS. In FIGS. 9 and 10, portions between blocks where processing is interrupted are indicated by dotted lines, and portions between blocks where processing is continued are indicated by solid lines.

  First, as shown in FIG. 9, when the drawing data R (N) is transmitted from the image processing unit 70 to the exposure unit 72 to perform exposure recording, the CPU 74 of the image processing unit 70 stores the drawing data stored in the memory 84. Alignment processing is performed on R (N), and the processed drawing data R (N) is transmitted to the exposure unit 72 via the bus 88 and the I / F 86. At this time, the CPU 74 occupies the bus 88 and concentrates on the processing for the memory 84 and the bus 88 and interrupts the control for the HD 82. Accordingly, the system management server 11 does not perform the transmission process of the drawing data R (N) from the RIP 8 to the image processing unit 70 (step S5). The drawing data R (N) transmitted to the exposure unit 72 is processed by the decompression conversion processing unit 92, and the DMD 36 is driven via the DMD controller 42 to perform exposure recording on the substrate F (M). During this time, the system management server 11 sequentially transmits drawing data R (N) from the image processing unit 70 to the exposure unit 72 in parallel with exposure recording.

  On the other hand, in the exposure recording apparatus 10, while the substrate F (M) is being loaded on the exposure stage 18 (step S14), the alignment measurement processing of the substrate F (M) is performed using the CCD cameras 22a and 22b. (Step S15) While the substrate F (M) is being unloaded from the exposure stage 18 (Step S20), the drawing data R (N) is transmitted from the image processing unit 70 to the exposure unit 72 to perform exposure processing. Therefore, the bus 88 of the image processing unit 70 is vacant.

  Therefore, the system management server 11 controls the RIP 8 and the image processing unit 70 to obtain drawing data R (N + 1) necessary for the next exposure processing from the RIP 8 to the I / F 76 and the image processing unit 70 as shown in FIG. The data is transmitted via the bus 88 and stored in the HD 82. In addition, the drawing data R (N + 1) stored in the HD 82 can be stored in the memory 84 via the bus 88 and can be prepared for the next exposure recording.

  In this case, the exposure recording system 4 repeats loading and unloading of the plurality of substrates F (M) to expose and record the drawing data R (N), and then loads and unloads the plurality of substrates F (M) again. The next drawing data R (N + 1) is repeatedly recorded by exposure. Accordingly, the next drawing data R (N + 1) is transferred to the image processing unit 70 using the loading, alignment measurement processing, and unloading times of the substrate F (M) when performing exposure recording with the drawing data R (N). Can be sent to. As a result, after the exposure recording of the drawing data R (N) on the substrate F (M) is completed, the exposure recording by the next drawing data R (N + 1) can be started promptly.

  Note that the exposure recording apparatus 10 described above includes, for example, exposure of a dry film resist (DFR) in a manufacturing process of a multilayer printed wiring board (PWB) and manufacture of a liquid crystal display (LCD). It can be suitably used for applications such as color filter formation in the process, DFR exposure in the TFT manufacturing process, and DFR exposure in the plasma display panel (PDP) manufacturing process. The present invention can be similarly applied to a drawing apparatus provided with an ink jet recording head.

It is a block diagram of the exposure recording system of this embodiment. It is a block diagram of the exposure recording apparatus of this embodiment. It is a schematic block diagram of the exposure head in the exposure recording apparatus of this embodiment. It is explanatory drawing of DMD which comprises the exposure head of this embodiment. FIG. 5 is an explanatory diagram of a relationship between an exposure head in the exposure recording apparatus of the present embodiment and a substrate positioned on an exposure stage. It is an explanatory view of the relationship between the exposure head in the exposure recording apparatus of the present embodiment and the exposure area on the substrate. It is a flowchart of the process between the CAD apparatus, RIP, and image processing part which comprise the exposure recording system of this embodiment. It is a flowchart of the process between the image processing part and exposure part which comprise the exposure recording system of this embodiment. It is explanatory drawing of the process in RIP and exposure recording apparatus which comprise the exposure recording system of this embodiment. It is explanatory drawing of the process in RIP and exposure recording apparatus which comprise the exposure recording system of this embodiment.

Explanation of symbols

DESCRIPTION OF SYMBOLS 4 ... Exposure recording system 6 ... CAD apparatus 8 ... RIP 10 ... Exposure recording apparatus 11 ... System management server 18 ... Exposure stage 22a, 22b ... CCD camera 24a-24j ... Exposure head 36 ... DMD 60a-60d ... Alignment mark 70 ... Image Processing unit 72 ... Exposure unit 74 ... CPU 82 ... HD
84 ... Memory 90, 94 ... Buffer 92 ... Decompression conversion processing unit F ... Substrate

Claims (10)

In a drawing processing device for drawing a two-dimensional image on a recording medium based on drawing data,
A drawing data supply unit for supplying the drawing data;
An image processing unit having a memory for storing the drawing data transmitted from the drawing data supply unit, and performing predetermined image processing on the drawing data;
A drawing unit that draws the two-dimensional image on the recording medium based on the image-processed drawing data transmitted from the image processing unit;
A transmission control unit that controls transmission processing of the drawing data transmitted from the drawing data supply unit to the drawing unit via the image processing unit;
The transmission control unit performs transmission processing of the drawing data from the drawing data supply unit to the memory of the image processing unit, and outputs the drawing data that has undergone image processing from the image processing unit to the drawing unit. A drawing processing apparatus, which is performed during a period other than a transmission period. The apparatus of claim 1.
The memory is configured to be capable of storing first drawing data transmitted to the drawing unit and second drawing data continuous in time series with respect to the first drawing data. . The apparatus of claim 1.
The transmission control unit performs a process of transmitting the image-processed drawing data from the image processing unit to the drawing unit in parallel with the process of the drawing unit drawing the two-dimensional image on the recording medium. A drawing processing apparatus characterized by the above. The apparatus of claim 1.
The transmission control unit transmits the drawing data from the drawing data supply unit to the memory of the image processing unit in parallel with the process of attaching / detaching the recording medium to / from the drawing stage. apparatus. The apparatus of claim 1.
The transmission control unit transmits the drawing data from the drawing data supply unit to the memory of the image processing unit in parallel with the alignment measurement processing of the recording medium with respect to the drawing unit. . The apparatus of claim 1.
The drawing processing apparatus, wherein the drawing unit includes a plurality of drawing elements that are driven according to the plurality of drawing data and form a plurality of drawing points on the recording medium. In a drawing processing method for drawing a two-dimensional image on a recording medium based on drawing data,
Transmitting the drawing data from the drawing data supply unit to the image processing unit;
Performing predetermined image processing on the drawing data transmitted to the image processing unit;
Transmitting the image-processed drawing data from the image processing unit to the drawing unit;
Drawing the two-dimensional image on the recording medium based on the drawing data transmitted to the drawing unit;
The drawing data transmission process from the drawing data supply unit to the image processing unit is performed during a period other than the period during which the drawing data is transmitted from the image processing unit to the drawing unit. Drawing processing method. The method of claim 7, wherein
The drawing processing method, wherein the drawing data transmission process from the image processing unit to the drawing unit is performed in parallel with a process in which the drawing unit draws the two-dimensional image on the recording medium. The method of claim 7, wherein
The drawing processing method, wherein the drawing data transmission process from the drawing data supply unit to the image processing unit is performed in parallel with a process of attaching / detaching the recording medium to / from the drawing stage. The method of claim 7, wherein
The drawing processing method, wherein the drawing data transmission process from the drawing data supply unit to the image processing unit is performed in parallel with the recording medium alignment measurement process for the drawing unit.

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