JP2007100076A - Method for producing polymer using monomer containing active hydrogen - Google Patents
Method for producing polymer using monomer containing active hydrogen Download PDFInfo
- Publication number
- JP2007100076A JP2007100076A JP2006241129A JP2006241129A JP2007100076A JP 2007100076 A JP2007100076 A JP 2007100076A JP 2006241129 A JP2006241129 A JP 2006241129A JP 2006241129 A JP2006241129 A JP 2006241129A JP 2007100076 A JP2007100076 A JP 2007100076A
- Authority
- JP
- Japan
- Prior art keywords
- active hydrogen
- monomer
- organometallic compound
- polymer
- group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000178 monomer Substances 0.000 title claims abstract description 63
- 239000001257 hydrogen Substances 0.000 title claims abstract description 46
- 229910052739 hydrogen Inorganic materials 0.000 title claims abstract description 46
- 229920000642 polymer Polymers 0.000 title claims abstract description 43
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 title claims abstract description 38
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 25
- 150000002902 organometallic compounds Chemical class 0.000 claims abstract description 41
- 238000010539 anionic addition polymerization reaction Methods 0.000 claims abstract description 15
- 150000001875 compounds Chemical class 0.000 claims description 14
- 238000010306 acid treatment Methods 0.000 claims description 7
- 238000000034 method Methods 0.000 claims description 7
- 125000000129 anionic group Chemical group 0.000 claims description 4
- 239000004215 Carbon black (E152) Substances 0.000 claims description 3
- 229930195733 hydrocarbon Natural products 0.000 claims description 3
- 150000002430 hydrocarbons Chemical class 0.000 claims description 3
- 230000000737 periodic effect Effects 0.000 claims description 3
- 238000004581 coalescence Methods 0.000 claims description 2
- 150000002901 organomagnesium compounds Chemical class 0.000 claims description 2
- 230000000379 polymerizing effect Effects 0.000 claims description 2
- UFHFLCQGNIYNRP-VVKOMZTBSA-N Dideuterium Chemical compound [2H][2H] UFHFLCQGNIYNRP-VVKOMZTBSA-N 0.000 claims 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 abstract description 6
- 125000003277 amino group Chemical group 0.000 abstract description 5
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 abstract description 5
- 238000011282 treatment Methods 0.000 abstract description 5
- -1 C20 aryl radical Chemical class 0.000 description 21
- 238000006116 polymerization reaction Methods 0.000 description 15
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 14
- 229910052783 alkali metal Inorganic materials 0.000 description 10
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 8
- 150000002431 hydrogen Chemical class 0.000 description 8
- 229910052744 lithium Inorganic materials 0.000 description 8
- KWGKDLIKAYFUFQ-UHFFFAOYSA-M lithium chloride Chemical compound [Li+].[Cl-] KWGKDLIKAYFUFQ-UHFFFAOYSA-M 0.000 description 8
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 7
- 239000002904 solvent Substances 0.000 description 7
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 7
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- 239000003505 polymerization initiator Substances 0.000 description 6
- 150000003573 thiols Chemical class 0.000 description 6
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 5
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- MZRVEZGGRBJDDB-UHFFFAOYSA-N N-Butyllithium Chemical compound [Li]CCCC MZRVEZGGRBJDDB-UHFFFAOYSA-N 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- 150000001340 alkali metals Chemical class 0.000 description 4
- 125000004429 atom Chemical group 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- HQWPLXHWEZZGKY-UHFFFAOYSA-N diethylzinc Chemical compound CC[Zn]CC HQWPLXHWEZZGKY-UHFFFAOYSA-N 0.000 description 4
- 150000003440 styrenes Chemical class 0.000 description 4
- OOIBFPKQHULHSQ-UHFFFAOYSA-N (3-hydroxy-1-adamantyl) 2-methylprop-2-enoate Chemical compound C1C(C2)CC3CC2(O)CC1(OC(=O)C(=C)C)C3 OOIBFPKQHULHSQ-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 3
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- BTANRVKWQNVYAZ-UHFFFAOYSA-N butan-2-ol Chemical compound CCC(C)O BTANRVKWQNVYAZ-UHFFFAOYSA-N 0.000 description 3
- DNJIEGIFACGWOD-UHFFFAOYSA-N ethanethiol Chemical compound CCS DNJIEGIFACGWOD-UHFFFAOYSA-N 0.000 description 3
- 230000000977 initiatory effect Effects 0.000 description 3
- YIXJRHPUWRPCBB-UHFFFAOYSA-N magnesium nitrate Inorganic materials [Mg+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O YIXJRHPUWRPCBB-UHFFFAOYSA-N 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 229910052700 potassium Inorganic materials 0.000 description 3
- 239000011591 potassium Substances 0.000 description 3
- 238000000746 purification Methods 0.000 description 3
- 229910052708 sodium Inorganic materials 0.000 description 3
- 239000011734 sodium Substances 0.000 description 3
- 229910052725 zinc Inorganic materials 0.000 description 3
- 239000011701 zinc Substances 0.000 description 3
- 125000003837 (C1-C20) alkyl group Chemical group 0.000 description 2
- 125000006736 (C6-C20) aryl group Chemical group 0.000 description 2
- KBPLFHHGFOOTCA-UHFFFAOYSA-N 1-Octanol Chemical compound CCCCCCCCO KBPLFHHGFOOTCA-UHFFFAOYSA-N 0.000 description 2
- SDJHPPZKZZWAKF-UHFFFAOYSA-N 2,3-dimethylbuta-1,3-diene Chemical compound CC(=C)C(C)=C SDJHPPZKZZWAKF-UHFFFAOYSA-N 0.000 description 2
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 2
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 2
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 2
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 150000001339 alkali metal compounds Chemical class 0.000 description 2
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 2
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 2
- 150000001450 anions Chemical group 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 229910052792 caesium Inorganic materials 0.000 description 2
- TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical compound [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 238000004817 gas chromatography Methods 0.000 description 2
- AMXOYNBUYSYVKV-UHFFFAOYSA-M lithium bromide Chemical compound [Li+].[Br-] AMXOYNBUYSYVKV-UHFFFAOYSA-M 0.000 description 2
- DLEDOFVPSDKWEF-UHFFFAOYSA-N lithium butane Chemical compound [Li+].CCC[CH2-] DLEDOFVPSDKWEF-UHFFFAOYSA-N 0.000 description 2
- PQXKHYXIUOZZFA-UHFFFAOYSA-M lithium fluoride Chemical compound [Li+].[F-] PQXKHYXIUOZZFA-UHFFFAOYSA-M 0.000 description 2
- HSZCZNFXUDYRKD-UHFFFAOYSA-M lithium iodide Chemical compound [Li+].[I-] HSZCZNFXUDYRKD-UHFFFAOYSA-M 0.000 description 2
- 229910052749 magnesium Inorganic materials 0.000 description 2
- 239000011777 magnesium Substances 0.000 description 2
- KJJBSBKRXUVBMX-UHFFFAOYSA-N magnesium;butane Chemical compound [Mg+2].CCC[CH2-].CCC[CH2-] KJJBSBKRXUVBMX-UHFFFAOYSA-N 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 239000012299 nitrogen atmosphere Substances 0.000 description 2
- 239000002798 polar solvent Substances 0.000 description 2
- SUVIGLJNEAMWEG-UHFFFAOYSA-N propane-1-thiol Chemical compound CCCS SUVIGLJNEAMWEG-UHFFFAOYSA-N 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- SJMYWORNLPSJQO-UHFFFAOYSA-N tert-butyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(C)(C)C SJMYWORNLPSJQO-UHFFFAOYSA-N 0.000 description 2
- 125000006702 (C1-C18) alkyl group Chemical group 0.000 description 1
- PMJHHCWVYXUKFD-SNAWJCMRSA-N (E)-1,3-pentadiene Chemical compound C\C=C\C=C PMJHHCWVYXUKFD-SNAWJCMRSA-N 0.000 description 1
- GBVSONMCEKNESD-UHFFFAOYSA-N 1,1'-biphenyl;lithium Chemical group [Li].C1=CC=CC=C1C1=CC=CC=C1 GBVSONMCEKNESD-UHFFFAOYSA-N 0.000 description 1
- BGJSXRVXTHVRSN-UHFFFAOYSA-N 1,3,5-trioxane Chemical compound C1OCOCO1 BGJSXRVXTHVRSN-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- ILROLYQPRYHHFG-UHFFFAOYSA-N 1-$l^{1}-oxidanylprop-2-en-1-one Chemical group [O]C(=O)C=C ILROLYQPRYHHFG-UHFFFAOYSA-N 0.000 description 1
- OEVVKKAVYQFQNV-UHFFFAOYSA-N 1-ethenyl-2,4-dimethylbenzene Chemical compound CC1=CC=C(C=C)C(C)=C1 OEVVKKAVYQFQNV-UHFFFAOYSA-N 0.000 description 1
- NVZWEEGUWXZOKI-UHFFFAOYSA-N 1-ethenyl-2-methylbenzene Chemical compound CC1=CC=CC=C1C=C NVZWEEGUWXZOKI-UHFFFAOYSA-N 0.000 description 1
- JZHGRUMIRATHIU-UHFFFAOYSA-N 1-ethenyl-3-methylbenzene Chemical compound CC1=CC=CC(C=C)=C1 JZHGRUMIRATHIU-UHFFFAOYSA-N 0.000 description 1
- WHFHDVDXYKOSKI-UHFFFAOYSA-N 1-ethenyl-4-ethylbenzene Chemical compound CCC1=CC=C(C=C)C=C1 WHFHDVDXYKOSKI-UHFFFAOYSA-N 0.000 description 1
- QQHQTCGEZWTSEJ-UHFFFAOYSA-N 1-ethenyl-4-propan-2-ylbenzene Chemical compound CC(C)C1=CC=C(C=C)C=C1 QQHQTCGEZWTSEJ-UHFFFAOYSA-N 0.000 description 1
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 1
- TVJDPJGWJPLQJY-UHFFFAOYSA-N 2-(4-ethenylphenoxy)acetic acid Chemical compound OC(=O)COC1=CC=C(C=C)C=C1 TVJDPJGWJPLQJY-UHFFFAOYSA-N 0.000 description 1
- YUHNUWVOFAIGSC-UHFFFAOYSA-N 2-(4-ethenylphenyl)-n-methylethanamine Chemical compound CNCCC1=CC=C(C=C)C=C1 YUHNUWVOFAIGSC-UHFFFAOYSA-N 0.000 description 1
- TVUARPCSZQNJJZ-UHFFFAOYSA-N 2-(4-ethenylphenyl)ethanol Chemical compound OCCC1=CC=C(C=C)C=C1 TVUARPCSZQNJJZ-UHFFFAOYSA-N 0.000 description 1
- DXBXCXFOSGJETM-UHFFFAOYSA-N 2-(4-ethenylphenyl)propanoic acid Chemical compound OC(=O)C(C)C1=CC=C(C=C)C=C1 DXBXCXFOSGJETM-UHFFFAOYSA-N 0.000 description 1
- NPKPHSSEDYPYQI-UHFFFAOYSA-N 2-(4-prop-1-en-2-ylphenoxy)acetic acid Chemical compound CC(=C)C1=CC=C(OCC(O)=O)C=C1 NPKPHSSEDYPYQI-UHFFFAOYSA-N 0.000 description 1
- PZYUHNJHJJUFBE-UHFFFAOYSA-N 2-(4-prop-1-en-2-ylphenyl)ethanol Chemical compound CC(=C)C1=CC=C(CCO)C=C1 PZYUHNJHJJUFBE-UHFFFAOYSA-N 0.000 description 1
- LXUNZSDDXMPKLP-UHFFFAOYSA-N 2-Methylbenzenethiol Chemical compound CC1=CC=CC=C1S LXUNZSDDXMPKLP-UHFFFAOYSA-N 0.000 description 1
- DGAWPXLUGCQPIK-UHFFFAOYSA-N 2-ethenyl-1,3,5-tri(propan-2-yl)benzene Chemical compound CC(C)C1=CC(C(C)C)=C(C=C)C(C(C)C)=C1 DGAWPXLUGCQPIK-UHFFFAOYSA-N 0.000 description 1
- DBWWINQJTZYDFK-UHFFFAOYSA-N 2-ethenyl-1,4-dimethylbenzene Chemical compound CC1=CC=C(C)C(C=C)=C1 DBWWINQJTZYDFK-UHFFFAOYSA-N 0.000 description 1
- VHSHLMUCYSAUQU-UHFFFAOYSA-N 2-hydroxypropyl methacrylate Chemical compound CC(O)COC(=O)C(C)=C VHSHLMUCYSAUQU-UHFFFAOYSA-N 0.000 description 1
- AWVFUDODHLEBRT-UHFFFAOYSA-N 3-(4-ethenylphenyl)propanoic acid Chemical compound OC(=O)CCC1=CC=C(C=C)C=C1 AWVFUDODHLEBRT-UHFFFAOYSA-N 0.000 description 1
- BWDINYKFVODPRY-UHFFFAOYSA-N 3-(4-prop-1-en-2-ylphenyl)propanoic acid Chemical compound CC(=C)C1=CC=C(CCC(O)=O)C=C1 BWDINYKFVODPRY-UHFFFAOYSA-N 0.000 description 1
- IGLWCQMNTGCUBB-UHFFFAOYSA-N 3-methylidenepent-1-ene Chemical compound CCC(=C)C=C IGLWCQMNTGCUBB-UHFFFAOYSA-N 0.000 description 1
- NLHFDAUOBSZFKR-UHFFFAOYSA-N 3h-1,3-benzothiazole-2-thione;1,3-thiazolidine-2-thione Chemical compound S=C1NCCS1.C1=CC=C2SC(=S)NC2=C1 NLHFDAUOBSZFKR-UHFFFAOYSA-N 0.000 description 1
- DTJGMNVTTPUVFY-UHFFFAOYSA-N 4-(2-methylprop-2-enoyloxy)butanoic acid Chemical compound CC(=C)C(=O)OCCCC(O)=O DTJGMNVTTPUVFY-UHFFFAOYSA-N 0.000 description 1
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 description 1
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 1
- SPXDYPYJHCSREL-UHFFFAOYSA-N CCC(C)[Mg]C(C)CC Chemical compound CCC(C)[Mg]C(C)CC SPXDYPYJHCSREL-UHFFFAOYSA-N 0.000 description 1
- QFYWYCZNMLSZOA-UHFFFAOYSA-N CCCCC[Mg] Chemical compound CCCCC[Mg] QFYWYCZNMLSZOA-UHFFFAOYSA-N 0.000 description 1
- DBNGNEQZXBWPTJ-UHFFFAOYSA-N CCCC[Mg]C(C)CC Chemical compound CCCC[Mg]C(C)CC DBNGNEQZXBWPTJ-UHFFFAOYSA-N 0.000 description 1
- NTZRDKVFLPLTPU-UHFFFAOYSA-N CC[Na] Chemical compound CC[Na] NTZRDKVFLPLTPU-UHFFFAOYSA-N 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- LXXNWCFBZHKFPT-UHFFFAOYSA-N Ethyl 2-mercaptopropionate Chemical compound CCOC(=O)C(C)S LXXNWCFBZHKFPT-UHFFFAOYSA-N 0.000 description 1
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 1
- KWYHDKDOAIKMQN-UHFFFAOYSA-N N,N,N',N'-tetramethylethylenediamine Chemical compound CN(C)CCN(C)C KWYHDKDOAIKMQN-UHFFFAOYSA-N 0.000 description 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- NTVIBFNHMURTMP-UHFFFAOYSA-N [Li]CC=CC[Li] Chemical compound [Li]CC=CC[Li] NTVIBFNHMURTMP-UHFFFAOYSA-N 0.000 description 1
- ICKXMDGNIZPYRS-UHFFFAOYSA-N [Li]CCCCCC[Li] Chemical compound [Li]CCCCCC[Li] ICKXMDGNIZPYRS-UHFFFAOYSA-N 0.000 description 1
- DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 1
- 125000002777 acetyl group Chemical class [H]C([H])([H])C(*)=O 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 125000004183 alkoxy alkyl group Chemical group 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000005083 alkoxyalkoxy group Chemical group 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- WDIHJSXYQDMJHN-UHFFFAOYSA-L barium chloride Chemical class [Cl-].[Cl-].[Ba+2] WDIHJSXYQDMJHN-UHFFFAOYSA-L 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 229920001400 block copolymer Polymers 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 150000003842 bromide salts Chemical class 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 150000001733 carboxylic acid esters Chemical class 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- CMKBCTPCXZNQKX-UHFFFAOYSA-N cyclohexanethiol Chemical compound SC1CCCCC1 CMKBCTPCXZNQKX-UHFFFAOYSA-N 0.000 description 1
- HPXRVTGHNJAIIH-UHFFFAOYSA-N cyclohexanol Chemical compound OC1CCCCC1 HPXRVTGHNJAIIH-UHFFFAOYSA-N 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 125000004494 ethyl ester group Chemical group 0.000 description 1
- BLHLJVCOVBYQQS-UHFFFAOYSA-N ethyllithium Chemical compound [Li]CC BLHLJVCOVBYQQS-UHFFFAOYSA-N 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- GNOIPBMMFNIUFM-UHFFFAOYSA-N hexamethylphosphoric triamide Chemical compound CN(C)P(=O)(N(C)C)N(C)C GNOIPBMMFNIUFM-UHFFFAOYSA-N 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 150000002483 hydrogen compounds Chemical class 0.000 description 1
- 229920000587 hyperbranched polymer Polymers 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 150000004694 iodide salts Chemical class 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 229910003002 lithium salt Inorganic materials 0.000 description 1
- 159000000002 lithium salts Chemical class 0.000 description 1
- URMHJZVLKKDTOJ-UHFFFAOYSA-N lithium;(3-methyl-1-phenylpentyl)benzene Chemical compound [Li+].C=1C=CC=CC=1[C-](CC(C)CC)C1=CC=CC=C1 URMHJZVLKKDTOJ-UHFFFAOYSA-N 0.000 description 1
- UUQLCJCZFWUWHH-UHFFFAOYSA-N lithium;1-phenylhexylbenzene Chemical compound [Li+].C=1C=CC=CC=1[C-](CCCCC)C1=CC=CC=C1 UUQLCJCZFWUWHH-UHFFFAOYSA-N 0.000 description 1
- UBJFKNSINUCEAL-UHFFFAOYSA-N lithium;2-methylpropane Chemical compound [Li+].C[C-](C)C UBJFKNSINUCEAL-UHFFFAOYSA-N 0.000 description 1
- WGOPGODQLGJZGL-UHFFFAOYSA-N lithium;butane Chemical compound [Li+].CC[CH-]C WGOPGODQLGJZGL-UHFFFAOYSA-N 0.000 description 1
- PDZGAEAUKGKKDE-UHFFFAOYSA-N lithium;naphthalene Chemical compound [Li].C1=CC=CC2=CC=CC=C21 PDZGAEAUKGKKDE-UHFFFAOYSA-N 0.000 description 1
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 1
- 235000019341 magnesium sulphate Nutrition 0.000 description 1
- IZWPPZMYNSBLNI-UHFFFAOYSA-N magnesium;2-methylpropane Chemical compound [Mg+2].C[C-](C)C.C[C-](C)C IZWPPZMYNSBLNI-UHFFFAOYSA-N 0.000 description 1
- WRYKIHMRDIOPSI-UHFFFAOYSA-N magnesium;benzene Chemical compound [Mg+2].C1=CC=[C-]C=C1.C1=CC=[C-]C=C1 WRYKIHMRDIOPSI-UHFFFAOYSA-N 0.000 description 1
- YHNWUQFTJNJVNU-UHFFFAOYSA-N magnesium;butane;ethane Chemical compound [Mg+2].[CH2-]C.CCC[CH2-] YHNWUQFTJNJVNU-UHFFFAOYSA-N 0.000 description 1
- WCFJMDWWJOCLSJ-UHFFFAOYSA-N magnesium;methanidylbenzene Chemical compound [Mg+2].[CH2-]C1=CC=CC=C1.[CH2-]C1=CC=CC=C1 WCFJMDWWJOCLSJ-UHFFFAOYSA-N 0.000 description 1
- 229940098779 methanesulfonic acid Drugs 0.000 description 1
- MKIJJIMOAABWGF-UHFFFAOYSA-N methyl 2-sulfanylacetate Chemical compound COC(=O)CS MKIJJIMOAABWGF-UHFFFAOYSA-N 0.000 description 1
- 150000004702 methyl esters Chemical class 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 125000000250 methylamino group Chemical group [H]N(*)C([H])([H])[H] 0.000 description 1
- 235000010755 mineral Nutrition 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- SEXOVMIIVBKGGM-UHFFFAOYSA-N naphthalene-1-thiol Chemical compound C1=CC=C2C(S)=CC=CC2=C1 SEXOVMIIVBKGGM-UHFFFAOYSA-N 0.000 description 1
- IJJSYKQZFFGIEE-UHFFFAOYSA-N naphthalene;potassium Chemical compound [K].C1=CC=CC2=CC=CC=C21 IJJSYKQZFFGIEE-UHFFFAOYSA-N 0.000 description 1
- URXNVXOMQQCBHS-UHFFFAOYSA-N naphthalene;sodium Chemical compound [Na].C1=CC=CC2=CC=CC=C21 URXNVXOMQQCBHS-UHFFFAOYSA-N 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 239000012038 nucleophile Substances 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- MMSLOZQEMPDGPI-UHFFFAOYSA-N p-Mentha-1,3,5,8-tetraene Chemical compound CC(=C)C1=CC=C(C)C=C1 MMSLOZQEMPDGPI-UHFFFAOYSA-N 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 description 1
- PMJHHCWVYXUKFD-UHFFFAOYSA-N piperylene Natural products CC=CC=C PMJHHCWVYXUKFD-UHFFFAOYSA-N 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 239000001103 potassium chloride Substances 0.000 description 1
- 235000011164 potassium chloride Nutrition 0.000 description 1
- ZYBHSWXEWOPHBJ-UHFFFAOYSA-N potassium;propan-2-ylbenzene Chemical compound [K+].C[C-](C)C1=CC=CC=C1 ZYBHSWXEWOPHBJ-UHFFFAOYSA-N 0.000 description 1
- ODBSOAATZFAZCB-UHFFFAOYSA-N prop-1-en-2-ylbenzene;sodium Chemical compound [Na].CC(=C)C1=CC=CC=C1 ODBSOAATZFAZCB-UHFFFAOYSA-N 0.000 description 1
- 125000006239 protecting group Chemical group 0.000 description 1
- HBCQSNAFLVXVAY-UHFFFAOYSA-N pyrimidine-2-thiol Chemical compound SC1=NC=CC=N1 HBCQSNAFLVXVAY-UHFFFAOYSA-N 0.000 description 1
- 229920005604 random copolymer Polymers 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 125000001412 tetrahydropyranyl group Chemical group 0.000 description 1
- 238000006276 transfer reaction Methods 0.000 description 1
- 125000004665 trialkylsilyl group Chemical group 0.000 description 1
- VOITXYVAKOUIBA-UHFFFAOYSA-N triethylaluminium Chemical compound CC[Al](CC)CC VOITXYVAKOUIBA-UHFFFAOYSA-N 0.000 description 1
- ORYGRKHDLWYTKX-UHFFFAOYSA-N trihexylalumane Chemical compound CCCCCC[Al](CCCCCC)CCCCCC ORYGRKHDLWYTKX-UHFFFAOYSA-N 0.000 description 1
- MCULRUJILOGHCJ-UHFFFAOYSA-N triisobutylaluminium Chemical compound CC(C)C[Al](CC(C)C)CC(C)C MCULRUJILOGHCJ-UHFFFAOYSA-N 0.000 description 1
- RIUWBIIVUYSTCN-UHFFFAOYSA-N trilithium borate Chemical compound [Li+].[Li+].[Li+].[O-]B([O-])[O-] RIUWBIIVUYSTCN-UHFFFAOYSA-N 0.000 description 1
- JLTRXTDYQLMHGR-UHFFFAOYSA-N trimethylaluminium Chemical compound C[Al](C)C JLTRXTDYQLMHGR-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- HEPBQSXQJMTVFI-UHFFFAOYSA-N zinc;butane Chemical compound [Zn+2].CCC[CH2-].CCC[CH2-] HEPBQSXQJMTVFI-UHFFFAOYSA-N 0.000 description 1
- DGVVWUTYPXICAM-UHFFFAOYSA-N β‐Mercaptoethanol Chemical group OCCS DGVVWUTYPXICAM-UHFFFAOYSA-N 0.000 description 1
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- Polymerisation Methods In General (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Abstract
【課題】水酸基、アミノ基、カルボキシル基等の活性水素を含有するモノマーであっても、簡単な処理を施すだけで、直接アニオン重合することができる重合体の製造方法、及びかかる製造方法により製造された重合体を提供すること。
【解決手段】活性水素を含有するモノマーに有機金属化合物を反応させた後、該有機金属化合物を反応させたモノマーをアニオン重合する重合体の製造方法、及びかかる製造方法により製造された重合体である。
【選択図】なし[PROBLEMS] To provide a method for producing a polymer which can be directly anionically polymerized even if it is a monomer containing an active hydrogen such as a hydroxyl group, an amino group or a carboxyl group, by simple treatment, and produced by such a production method. Provided polymer.
A method for producing a polymer in which an organometallic compound is reacted with a monomer containing active hydrogen and then the monomer obtained by reacting the organometallic compound is subjected to anionic polymerization, and a polymer produced by the production method. is there.
[Selection figure] None
Description
本発明は、活性水素を含有するモノマーを用いた重合体の製造方法に関し、詳しくは、直接アニオン重合できない活性水素を含有するモノマーを、直接重合可能なモノマーに変換し、アニオン重合を行う重合体の製造方法に関する。 The present invention relates to a method for producing a polymer using a monomer containing active hydrogen, and more specifically, a polymer that performs anionic polymerization by converting a monomer containing active hydrogen that cannot be directly anionically polymerized into a monomer that can be directly polymerized. It relates to the manufacturing method.
アニオン重合系において、水酸基、アミノ基、カルボキシル基等の活性水素を含有するモノマーは、開始剤や成長末端アニオンを失活させる重合阻害物質となるため、これらのモノマーを直接重合できないことは公知の事実である。したがって、これらの活性水素を有するモノマーをアニオン重合する際には、活性水素をアセタールやトリアルキルシリル等で保護していた。しかしながら、モノマーの保護化は、複雑な反応と後処理を有することや、活性水素に対して固有の保護基を選択しなければならない煩わしさがあること、さらには、モノマーの種類によっては形状が変化し再結晶が困難になることや、沸点が高くなることにより蒸留精製が困難になるといった種々の問題がある。 In anionic polymerization systems, it is known that monomers containing active hydrogen such as hydroxyl groups, amino groups, and carboxyl groups are polymerization inhibitors that deactivate initiators and growth terminal anions, and these monomers cannot be directly polymerized. It is a fact. Therefore, when anionic polymerization of these monomers having active hydrogen is performed, the active hydrogen is protected with acetal, trialkylsilyl or the like. However, the protection of the monomer has complicated reactions and post-treatments, has the troublesomeness of having to select a specific protecting group for the active hydrogen, and further, the shape depends on the type of the monomer. There are various problems such that it is difficult to recrystallize due to a change, and distillation purification becomes difficult due to a high boiling point.
他方、ジブチルマグネシウム等の有機金属化合物が、水、アルコールなどの活性水素化合物を除去する化合物として使用できることが開示されているが(特許文献1参照。)、これは、モノマーや溶媒中の不純物の除去に関するものであり、モノマーや溶媒の簡易精製方法に関するものである。 On the other hand, it is disclosed that an organometallic compound such as dibutylmagnesium can be used as a compound that removes active hydrogen compounds such as water and alcohol (see Patent Document 1). It relates to removal, and relates to a simple purification method for monomers and solvents.
本発明の課題は、水酸基、アミノ基、カルボキシル基等の活性水素を含有するモノマーであっても、簡単な処理を施すだけで、直接アニオン重合することができる重合体の製造方法、及びかかる製造方法により製造された重合体を提供することにある。 An object of the present invention is to provide a method for producing a polymer that can be directly anionically polymerized even if it is a monomer containing an active hydrogen such as a hydroxyl group, an amino group, or a carboxyl group, by simple treatment, and such production. It is to provide a polymer produced by the method.
本発明者らは、上記課題を解決すべく鋭意検討した結果、活性水素を含有するモノマーに、有機金属化合物を反応させるだけで、煩雑な精製等の後処理を行なわなくとも、所望のアニオン重合体を容易に製造することができることを見い出し、本発明を完成するに至った。 As a result of intensive studies to solve the above problems, the present inventors have made it possible to react a monomer containing active hydrogen only with an organometallic compound, without performing post-treatment such as complicated purification. It has been found that the coalescence can be easily produced, and the present invention has been completed.
すなわち、本発明は、(1)活性水素を含有するモノマーに有機金属化合物を反応させた後、該有機金属化合物を反応させたモノマーをアニオン重合することを特徴とする重合体の製造方法や、(2)有機金属化合物が、式(1) : (R1)nM で表される化合物(式中、R1は、C1〜C20アルキル基又はC6〜C20アリール基を表し、nが2以上の場合、R1は同一又は相異なっていてもよく、Mは、長周期型周期律表第2族、第12族又は第13族に属する原子を表し、nはMの原子価を表す。)であることを特徴とする(1)に記載の重合体の製造方法や、(3)有機金属化合物が、有機マグネシウム化合物、有機亜鉛化合物又は有機アルミニウム化合物であることを特徴とする(2)に記載の重合体の製造方法や、(4)活性水素を含有するモノマーが、重合に与る二重結合及び活性水素を含有する基が炭化水素で結合されているモノマーであることを特徴とする(1)〜(3)のいずれかに記載の重合体の製造方法に関する。 That is, the present invention includes (1) a method for producing a polymer, characterized by reacting an organometallic compound with a monomer containing active hydrogen and then anionic polymerization of the monomer reacted with the organometallic compound, (2) an organometallic compound of the formula (1): (R 1) a compound represented by n M (wherein, R 1 represents an C1~C20 alkyl or C6~C20 aryl radical, n is 2 or more In this case, R 1 may be the same or different, M represents an atom belonging to Group 2, 12 or 13 of the long periodic table, and n represents the valence of M. And (3) the organometallic compound is an organomagnesium compound, an organozinc compound or an organoaluminum compound (2) Or a method for producing the polymer according to (4). (1) to (3), wherein the monomer containing a reactive hydrogen is a monomer in which a group containing a double bond and an active hydrogen to be polymerized is bonded with a hydrocarbon The present invention relates to a method for producing the polymer.
また、本発明は、(5)活性水素1モルに対して、有機金属化合物が等モル以上存在する系内で、活性水素を含有するモノマー及び有機金属化合物を反応させることを特徴とする(1)〜(4)のいずれかに記載の重合体の製造方法や、(6)活性水素1モルに対して、有機金属化合物が1/nモル以上等モル未満(nは有機金属化合物の原子価を表す。)存在する系内で、活性水素を含有するモノマー及び有機金属化合物を反応させることを特徴とする(1)〜(4)のいずれかに記載の重合体の製造方法や、(7)有機金属化合物を反応させたモノマーをアニオン重合して得たポリマーに、酸処理を施して、活性水素を再生成させることを特徴とする前記(1)〜(6)のいずれかに記載の重合体の製造方法に関する。 Further, the present invention is characterized in that (5) a monomer containing an active hydrogen and an organometallic compound are reacted in a system in which the organometallic compound is present in an equimolar amount or more per 1 mole of active hydrogen (1). ) To (4), or (6) 1 mol of the organometallic compound per mol of active hydrogen, where n is the valence of the organometallic compound. (2) A method for producing a polymer according to any one of (1) to (4), wherein a monomer containing an active hydrogen and an organometallic compound are reacted in an existing system, The polymer according to any one of (1) to (6), wherein the polymer obtained by anionic polymerization of a monomer obtained by reacting an organometallic compound is subjected to an acid treatment to regenerate active hydrogen. The present invention relates to a method for producing a polymer.
さらに、本発明は、(8)前記(1)〜(7)のいずれかに記載の重合体の製造方法により得られたことを特徴とする重合体に関する。 Furthermore, the present invention relates to (8) a polymer obtained by the method for producing a polymer according to any one of (1) to (7).
本発明の製造方法によれば、水酸基やアミノ基、カルボキシル基等の活性水素を含有するモノマーも容易にアニオン重合を行なうことができる。得られたポリマーは、酸処理により簡単に官能基を再生成させることが可能になるため、分子量や分子量分布が制御された重合体や、酸により分解するポリマー材料として有用である。 According to the production method of the present invention, a monomer containing active hydrogen such as a hydroxyl group, an amino group, or a carboxyl group can be easily anionically polymerized. Since the obtained polymer can easily regenerate a functional group by acid treatment, it is useful as a polymer whose molecular weight or molecular weight distribution is controlled, or a polymer material that is decomposed by an acid.
本発明の重合体の製造方法としては、活性水素を含有するモノマーに有機金属化合物を反応させた後、該有機金属化合物を反応させたモノマーをアニオン重合する方法であれば特に制限されるものではなく、本発明において、活性水素を含有するモノマーに有機金属化合物を反応させる方法としては、例えば、有機金属化合物含有溶媒中に活性水素を含有するモノマーを添加して反応させる方法や、活性水素を含有するモノマー含有溶媒中に有機金属化合物を添加して反応させる方法が挙げられ、アニオン重合開始剤は、かかる反応後に添加することが好ましい。活性水素を含有するモノマーと有機金属化合物との反応温度は、特に制限されず、例えば、−50℃〜150℃以下の範囲で行うことができる。 The method for producing the polymer of the present invention is not particularly limited as long as it is a method in which an organometallic compound is reacted with an active hydrogen-containing monomer and then the monomer reacted with the organometallic compound is subjected to anionic polymerization. In the present invention, as a method of reacting an organometallic compound with a monomer containing active hydrogen, for example, a method of reacting by adding a monomer containing active hydrogen into an organometallic compound-containing solvent, Examples thereof include a method in which an organometallic compound is added to the monomer-containing solvent to be reacted, and the anionic polymerization initiator is preferably added after the reaction. The reaction temperature between the monomer containing active hydrogen and the organometallic compound is not particularly limited, and can be, for example, in the range of −50 ° C. to 150 ° C. or less.
本発明においては、活性水素を含有するモノマーに有機金属化合物を反応させることにより、従来困難であった活性水素を含有するモノマーのアニオン重合を直接的に極めて容易に行うことができる。 In the present invention, by reacting an organometallic compound with a monomer containing active hydrogen, anionic polymerization of the monomer containing active hydrogen, which has been difficult in the past, can be carried out directly and very easily.
また、本発明においては、上記のように有機金属化合物を反応させたモノマーをアニオン重合して製造した重合体に、酸処理を施して、活性水素を再生成させることができる。酸処理に使用する酸としては、塩酸、臭酸、硫酸、硝酸、ホウ酸、メタンスルホン酸等の無機酸や、酢酸等の有機酸を挙げることができる。酸処理の処理温度は、特に制限されず、例えば、−10℃〜150℃の範囲で行うことができる。 In the present invention, the active hydrogen can be regenerated by subjecting the polymer produced by anionic polymerization of the monomer reacted with the organometallic compound as described above to an acid treatment. Examples of the acid used for the acid treatment include inorganic acids such as hydrochloric acid, odorous acid, sulfuric acid, nitric acid, boric acid and methanesulfonic acid, and organic acids such as acetic acid. The treatment temperature of the acid treatment is not particularly limited, and can be performed, for example, in the range of −10 ° C. to 150 ° C.
本発明において用いられる活性水素を含有するモノマーとしては、水酸基、アミノ基、カルボキシル基等の活性水素を含有する基を有し、かつ、アニオン重合性不飽和結合を有するモノマーであれば特に制限されるものではなく、重合に与る二重結合と活性水素を含有する基がアルキレン等の炭化水素で結合されているモノマーであることが好ましく、スチレン誘導体、(メタ)アクリル酸エステル誘導体を好ましく例示することができ、これらは1種単独で、又は2種以上を組み合わせて用いることができる。 The monomer containing active hydrogen used in the present invention is not particularly limited as long as it is a monomer having an active hydrogen-containing group such as a hydroxyl group, an amino group, or a carboxyl group and having an anionically polymerizable unsaturated bond. It is preferably a monomer in which a group containing a double bond for polymerization and a group containing active hydrogen is bonded with a hydrocarbon such as alkylene, and styrene derivatives and (meth) acrylic acid ester derivatives are preferably exemplified. These can be used alone or in combination of two or more.
具体的に、スチレン誘導体としては、p−(2−ヒドロキシエチル)スチレン、p−(2−ヒドロキシエチル)−α−メチルスチレン、p−[2−(N−メチルアミノ)エチル]スチレン、p−[2−(N−メチルアミノ)エチル]α−メチルスチレン、p−カルボキシメトキシスチレン、p−カルボキシメトキシ−α−メチルスチレン、p−(1−カルボキシエチル)スチレン、p−(1−カルボキシエチル)−α−メチルスチレン、p−(2−カルボキシエチル)スチレン、p−(2−カルボキシエチル)−α−メチルスチレン等を挙げることができる。 Specifically, examples of the styrene derivative include p- (2-hydroxyethyl) styrene, p- (2-hydroxyethyl) -α-methylstyrene, p- [2- (N-methylamino) ethyl] styrene, p- [2- (N-methylamino) ethyl] α-methylstyrene, p-carboxymethoxystyrene, p-carboxymethoxy-α-methylstyrene, p- (1-carboxyethyl) styrene, p- (1-carboxyethyl) -Α-methylstyrene, p- (2-carboxyethyl) styrene, p- (2-carboxyethyl) -α-methylstyrene and the like can be mentioned.
また、(メタ)アクリル酸エステル誘導体としては、2−ヒドロキシエチルメタクリレート、2−ヒドロキシプロピルメタクリレート、3−ヒドロキシ−1−アダマンチルメタクリレート、3−カルボキシプロピルメタクリレート等のほか、以下に示す脂環式又は芳香族置換基を有する誘導体を挙げることができる。 In addition, (meth) acrylic acid ester derivatives include 2-hydroxyethyl methacrylate, 2-hydroxypropyl methacrylate, 3-hydroxy-1-adamantyl methacrylate, 3-carboxypropyl methacrylate and the like, as well as the following alicyclic or aromatic And derivatives having a group substituent.
本発明においては、前記活性水素を含有するモノマーと共重合する目的でその他のモノマーを使用することができ、ランダム共重合体やブロック共重合体を製造することができる。このとき、活性水素を含有するモノマーは、例えば、1モル%以上、5モル%以上で、100モル%未満使用することができる。 In the present invention, other monomers can be used for the purpose of copolymerizing with the active hydrogen-containing monomer, and a random copolymer or a block copolymer can be produced. At this time, the active hydrogen-containing monomer can be used in an amount of, for example, 1 mol% or more and 5 mol% or more and less than 100 mol%.
その他のモノマーとしては、アニオン重合性不飽和結合を有するものであれば特に制限されるものではなく、スチレン及びその誘導体(スチレン系モノマー)、ブタジエン及びその誘導体(ブタジエン系モノマー)、(メタ)アクリル酸エステル及びその誘導体((メタ)アクリル酸エステル系モノマー)を好ましく例示することができ、これらは1種単独で、又は2種以上を組み合わせて用いることができる。 Other monomers are not particularly limited as long as they have an anionically polymerizable unsaturated bond. Styrene and its derivatives (styrene monomers), butadiene and its derivatives (butadiene monomers), (meth) acrylic Acid esters and derivatives thereof ((meth) acrylic acid ester monomers) can be preferably exemplified, and these can be used alone or in combination of two or more.
具体的に、スチレン系モノマーとしては、スチレン、α−アルキルスチレン、核置換スチレン等を例示することができる。核置換基としては、重合開始能力があるアニオン種及び重合開始能力がないアニオン種に対して不活性な基であれば特に制限されず、具体的には、アルキル基、アルコキシアルキル基、アルコキシ基、アルコキシアルコキシ基、t−ブトキシカルボニル基、t−ブトキシカルボニルメチル基、テトラヒドロピラニル基等を例示することができる。さらに、スチレン誘導体の具体例としては、α−メチルスチレン、α−メチル−p−メチルスチレン、p−メチルスチレン、m−メチルスチレン、o−メチルスチレン、p−エチルスチレン、2,4−ジメチルスチレン、2,5−ジメチルスチレン、p−イソプロピルスチレン、2,4,6−トリイソプロピルスチレン、p−t−ブトキシスチレン、p−t−ブトキシ−α−メチルスチレン、m−t−ブトキシスチレン等を挙げることができる。 Specifically, examples of the styrene monomer include styrene, α-alkylstyrene, and nucleus-substituted styrene. The nuclear substituent is not particularly limited as long as it is a group that is inactive with respect to an anionic species having a polymerization initiating ability and an anionic species having no initiating ability for polymerization. Specifically, an alkyl group, an alkoxyalkyl group, an alkoxy group , Alkoxyalkoxy groups, t-butoxycarbonyl groups, t-butoxycarbonylmethyl groups, tetrahydropyranyl groups, and the like. Further, specific examples of the styrene derivative include α-methylstyrene, α-methyl-p-methylstyrene, p-methylstyrene, m-methylstyrene, o-methylstyrene, p-ethylstyrene, 2,4-dimethylstyrene. 2,5-dimethylstyrene, p-isopropylstyrene, 2,4,6-triisopropylstyrene, pt-butoxystyrene, pt-butoxy-α-methylstyrene, mt-butoxystyrene, etc. be able to.
ブタジエン誘導体としては、1,3−ブタジエン、イソプレン、2,3−ジメチルブタジエン、2−エチル−1,3−ブタジエン、1,3−ペンタジエン等を挙げることができる。 Examples of butadiene derivatives include 1,3-butadiene, isoprene, 2,3-dimethylbutadiene, 2-ethyl-1,3-butadiene, 1,3-pentadiene, and the like.
(メタ)アクリル酸エステル誘導体としては、エステルアルコール残基の炭素数が1〜20のものが反応性の観点より好ましく、具体的には、メチルエステル、エチルエステル、イソプロピルエステル、n−ブチルエステル等を挙げることができる。 As the (meth) acrylic acid ester derivative, those having an ester alcohol residue of 1 to 20 carbon atoms are preferred from the viewpoint of reactivity, and specifically, methyl ester, ethyl ester, isopropyl ester, n-butyl ester, etc. Can be mentioned.
本発明において用いられる有機金属化合物としては、活性水素を含有するモノマーと反応して、かかる活性水素を含有するモノマーを直接アニオン重合可能なモノマーに変換できる化合物であれば特に制限されるものではなく、式(1)で表される化合物(以下、化合物(1)という。)を好ましく例示することができる。 The organometallic compound used in the present invention is not particularly limited as long as it is a compound that can react with a monomer containing active hydrogen and convert the monomer containing active hydrogen into a monomer that can be directly anionically polymerized. A compound represented by formula (1) (hereinafter referred to as compound (1)) can be preferably exemplified.
式(1): (R1)nM Formula (1): (R 1 ) n M
前記式(1)において、R1は、C1〜C20アルキル基又はC6〜C20アリール基を表す。C1〜C20アルキル基としては、メチル基、エチル基、n−プロピル基、イソプロピル基、n−ブチル基、s−ブチル基、t−ブチル基、イソブチル基、アミル基、ヘキシル基、ベンジル基等が挙げられる。また、C6〜C20アリール基としては、フェニル基、ナフチル基等が挙げられる。 In the formula (1), R 1 represents a C1-C20 alkyl group or a C6-C20 aryl group. Examples of the C1-C20 alkyl group include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, s-butyl group, t-butyl group, isobutyl group, amyl group, hexyl group, and benzyl group. Can be mentioned. Moreover, as a C6-C20 aryl group, a phenyl group, a naphthyl group, etc. are mentioned.
nはMの原子価を表し、nが2以上のとき、R1は同一又は相異なっていてもよい。Mは、マグネシウム、カルシウム等の長周期型周期律表第2族に属する原子;亜鉛、カドミウム等の同第12族に属する原子;又はアルミニウム等の同第13族に属する原子;を表す。 n represents the valence of M, and when n is 2 or more, R 1 may be the same or different. M represents an atom belonging to Group 2 of the long periodic table such as magnesium or calcium; an atom belonging to Group 12 such as zinc or cadmium; or an atom belonging to Group 13 such as aluminum.
化合物(1)の具体例としては、ジ−n−ブチルマグネシウム、ジ−t−ブチルマグネシウム、ジ−s−ブチルマグネシウム、n−ブチル−s−ブチルマグネシウム、n−ブチル−エチルマグネシウム、ジ−n−アミルマグネシウム、ジベンジルマグネシウム、ジフェニルマグネシウム等の有機マグネシウム化合物;ジエチル亜鉛、ジブチル亜鉛等の有機亜鉛化合物;トリメチルアルミニウム、トリエチルアルミニウム、トリイソブチルアルミニウム、トリn−ヘキシルアルミニウム等の有機アルミニウム化合物;等が挙げられ、ジアルキルマグネシウム、ジアルキル亜鉛、トリアルキルアルミニウムが好ましく、ジアルキル亜鉛、トリアルキルアルミニウムが特に好ましい。これらは1種単独で、又は2種以上を組み合わせて用いることができる。 Specific examples of the compound (1) include di-n-butyl magnesium, di-t-butyl magnesium, di-s-butyl magnesium, n-butyl-s-butyl magnesium, n-butyl-ethyl magnesium, di-n. -Organomagnesium compounds such as amylmagnesium, dibenzylmagnesium, and diphenylmagnesium; Organozinc compounds such as diethylzinc and dibutylzinc; Organoaluminum compounds such as trimethylaluminum, triethylaluminum, triisobutylaluminum, and tri-n-hexylaluminum; Dialkyl magnesium, dialkyl zinc, and trialkyl aluminum are preferable, and dialkyl zinc and trialkyl aluminum are particularly preferable. These can be used individually by 1 type or in combination of 2 or more types.
本発明の有機金属化合物(n価)の使用量は、例えば、活性水素1モルに対して、1/n〜20モルの範囲で使用することができる。本発明の製造方法により、リニアのポリマーを(直接)製造する場合、有機金属化合物の使用量は、活性水素1モルに対して、等モル以上使用することが好ましく、1.5モル以上使用することがより好ましく、2〜10モルの範囲で使用することがさらに好ましい。 The usage-amount of the organometallic compound (n value) of this invention can be used in the range of 1 / n-20 mol with respect to 1 mol of active hydrogens, for example. When a linear polymer is produced (directly) by the production method of the present invention, the amount of the organometallic compound used is preferably equimolar or more, based on 1 mol of active hydrogen, and is 1.5 mol or more. It is more preferable to use in the range of 2 to 10 mol.
他方、有機金属化合物(n価)の使用量を、活性水素1モルに対して、等モル未満、好ましくは0.8モル以下、より好ましくは0.6モル以下(ただし、1/nモル以上)の範囲とすることにより、有機金属化合物をコアモノマーとするスターポリマーや、有機金属化合物を架橋モノマーとしたハイブランチドポリマーを容易に合成することができる。より詳細には、有機金属化合物が2価の場合、活性水素1モルに対して、1/2〜0.8モルであることが好ましく、1/2〜0.6モルであることがより好ましい。また、有機金属化合物が3価の場合、活性水素1モルに対して、1/3〜0.8モルであることが好ましく、1/3〜0.6モルであることがより好ましい。 On the other hand, the amount of the organometallic compound (n-valent) used is less than equimolar, preferably 0.8 mol or less, more preferably 0.6 mol or less (however, 1 / n mol or more) with respect to 1 mol of active hydrogen. ), A star polymer having an organometallic compound as a core monomer and a hyperbranched polymer having an organometallic compound as a crosslinking monomer can be easily synthesized. More specifically, when the organometallic compound is divalent, it is preferably 1/2 to 0.8 mol, more preferably 1/2 to 0.6 mol, relative to 1 mol of active hydrogen. . Moreover, when an organometallic compound is trivalent, it is preferable that it is 1 / 3-0.8 mol with respect to 1 mol of active hydrogen, and it is more preferable that it is 1 / 3-0.6 mol.
得られた重合体は、酸処理を行なうことにより容易に分解してリニアポリマーに戻すことができる。従って、この重合体に加えて光や熱で酸発生する化合物を含有する樹脂組成物は、レジストとして好適に使用することができる。 The obtained polymer can be easily decomposed back to a linear polymer by acid treatment. Therefore, in addition to this polymer, a resin composition containing a compound capable of generating an acid by light or heat can be suitably used as a resist.
本発明において用いられるアニオン重合開始剤としては、求核剤であって、アニオン重合性モノマーの重合を開始させる働きを有するものであれば特に制限されるものではなく、例えば、アルカリ金属、有機アルカリ金属化合物等を使用することができる。 The anionic polymerization initiator used in the present invention is not particularly limited as long as it is a nucleophile and has a function of initiating polymerization of an anion polymerizable monomer. For example, alkali metal, organic alkali Metal compounds and the like can be used.
アルカリ金属としては、リチウム、ナトリウム、カリウム、セシウム等が挙げられる。有機アルカリ金属化合物としては、上記アルカリ金属のアルキル化物、アリル化物、アリール化物等が挙げられる。具体的には、エチルリチウム、n−ブチルリチウム、sec−ブチルリチウム、t−ブチルリチウム、エチルナトリウム、リチウムビフェニル、リチウムナフタレン、リチウムトリフェニル、ナトリウムナフタレン、カリウムナフタレン、α−メチルスチレンナトリウムジアニオン、1,1−ジフェニルヘキシルリチウム、1,1−ジフェニル−3−メチルペンチルリチウム、1,4−ジリチオ−2−ブテン、1,6−ジリチオヘキサン、ポリスチリルリチウム、クミルカリウム、クミルセシウム等を使用できる。これらのアニオン重合開始剤は1種単独で、又は2種以上を組み合わせて用いることができる。 Examples of the alkali metal include lithium, sodium, potassium, cesium and the like. Examples of the organic alkali metal compound include alkylated products, allylated products, and arylated products of the above alkali metals. Specifically, ethyl lithium, n-butyl lithium, sec-butyl lithium, t-butyl lithium, ethyl sodium, lithium biphenyl, lithium naphthalene, lithium triphenyl, sodium naphthalene, potassium naphthalene, α-methylstyrene sodium dianion, 1 1,1-diphenylhexyl lithium, 1,1-diphenyl-3-methylpentyl lithium, 1,4-dilithio-2-butene, 1,6-dilithiohexane, polystyryl lithium, cumyl potassium, cumyl cesium and the like can be used. These anionic polymerization initiators can be used alone or in combination of two or more.
アニオン重合開始剤の使用量は、用いるアニオン重合性モノマーに対して、通常0.001〜0.2当量、好ましくは0.005〜0.1当量である。この範囲のアニオン重合開始剤を用いることによって、目的とする重合体を収率よく製造することができる。 The usage-amount of an anionic polymerization initiator is 0.001-0.2 equivalent normally with respect to the anionic polymerizable monomer to be used, Preferably it is 0.005-0.1 equivalent. By using an anionic polymerization initiator in this range, the target polymer can be produced with high yield.
本発明においては、必要に応じて、アルカリ金属塩、アルカリ土類金属塩、アルコール類やチオール類のアルカリ金属塩、カルボン酸類、アミン類等の添加剤を重合開始時、または重合中に添加することができる。 In the present invention, additives such as alkali metal salts, alkaline earth metal salts, alkali metal salts of alcohols and thiols, carboxylic acids, and amines are added at the start of polymerization or during polymerization as necessary. be able to.
本発明に用いられるアルカリ金属塩及びアルカリ土類金属塩としては、具体的には、ナトリウム、カリウム、バリウム、マグネシウムの硫酸塩、硝酸塩、ホウ酸塩等の鉱酸塩やハロゲン化物を例示することができ、より具体的には、リチウムやバリウムの塩化物、臭化物、ヨウ化物や、ホウ酸リチウム、硝酸マグネシウム、塩化ナトリウム、塩化カリウム等を挙げることができ、これらの中でも、リチウムのハロゲン化物、例えば塩化リチウム、臭化リチウム、ヨウ化リチウム又はフッ化リチウムが好ましく、特に塩化リチウムが好ましい。これらは1種単独で、又は2種以上を組み合わせて用いることができる。 Specific examples of the alkali metal salt and alkaline earth metal salt used in the present invention include mineral salts and halides such as sodium, potassium, barium, magnesium sulfate, nitrate, and borate. More specifically, lithium and barium chlorides, bromides, iodides, lithium borate, magnesium nitrate, sodium chloride, potassium chloride and the like can be mentioned, among these, lithium halides, For example, lithium chloride, lithium bromide, lithium iodide or lithium fluoride is preferable, and lithium chloride is particularly preferable. These can be used individually by 1 type or in combination of 2 or more types.
アルカリ金属アルコキシドとしては、特にリチウムアルコキシドが好ましく、具体的には、メタノール、エタノール、イソプロパノール、2-ブタノール、オクタノール、ベン
ジルアルコール、ジエチレングリコールモノメチルエーテル、シクロヘキサノール等のC1〜C24のアルコールのリチウム塩を挙げることができ、これらは1種単独で、又は2種以上を組み合わせて用いることができる。
As the alkali metal alkoxide, lithium alkoxide is particularly preferable, and specific examples include lithium salts of C1-C24 alcohols such as methanol, ethanol, isopropanol, 2-butanol, octanol, benzyl alcohol, diethylene glycol monomethyl ether, and cyclohexanol. These can be used alone or in combination of two or more.
チオールのアルカリ金属塩におけるチオール類としては、脂肪族、芳香族の種類に関係なく使用可能であるが、芳香族チオール類が好ましく、更に好ましくは含窒素芳香族チオール類である。具体的には、エタンチオールやプロパンチオールおよびシクロヘキシルシオール等のC1〜C18のアルキルチオールやシクロアルキルチオール、メルカプトエタノールやp−メルカプロフェノール等の水酸基を含有するチオール、メルカプト酢酸メチルやメルカプトプロピオン酸エチル等のカルボン酸エステルを含有するチオール、ベンゼンチオールやトルエンチオールおよびナフタレンチオール等の芳香族チオール、メルカプトチアゾリンメルカプトベンズチアゾリンおよびメルカプトピリミジン等の含窒素芳香族チオール等を挙げることができる。また、チオールのアルカリ金属塩におけるアルカリ金属としては、リチウム、ナトリウム、カリウム等が挙げられ、リチウムが特に好ましい。 The thiols in the alkali metal salt of thiol can be used regardless of the type of aliphatic or aromatic, but aromatic thiols are preferred, and nitrogen-containing aromatic thiols are more preferred. Specifically, C1-C18 alkyl thiols such as ethanethiol, propanethiol and cyclohexyl thiol, thiols containing hydroxyl groups such as mercaptoethanol and p-mercaprophenol, methyl mercaptoacetate and ethyl mercaptopropionate. Thiols containing carboxylic acid esters such as benzene, aromatic thiols such as toluene thiol and naphthalene thiol, and nitrogen-containing aromatic thiols such as mercaptothiazoline mercaptobenzthiazoline and mercaptopyrimidine. Moreover, examples of the alkali metal in the alkali metal salt of thiol include lithium, sodium, and potassium, and lithium is particularly preferable.
これら添加剤の使用量は、重合に影響しない範囲で任意に使用でき、例えば、重合開始剤に対して、1/10〜100倍モルで使用することができ、1/2〜20倍モルで使用することが好ましい。 The amount of these additives used can be arbitrarily used within a range that does not affect the polymerization. For example, the additive can be used in an amount of 1 to 10 to 100 mol, or 1/2 to 20 times the mol of the polymerization initiator. It is preferable to use it.
本発明に用いられる重合溶媒としては、重合反応に関与せず、かつ重合体と相溶性のある極性溶媒であれば特に制限されず、具体的にはジエチルエーテル、テトラヒドロフラン(THF)、ジオキサン、トリオキサン等のエーテル系化合物、テトラメチルエチレンジアミン、ヘキサメチルホスホリックトリアミド等の第3級アミンを例示することができ、特にTHFが好ましい。また、これらの溶媒は、1種単独で、又は2種以上の混合溶媒として用いることができる。 The polymerization solvent used in the present invention is not particularly limited as long as it is a polar solvent that does not participate in the polymerization reaction and is compatible with the polymer. Specifically, diethyl ether, tetrahydrofuran (THF), dioxane, trioxane And tertiary amines such as tetramethylethylenediamine and hexamethylphosphoric triamide, and THF is particularly preferred. Moreover, these solvent can be used individually by 1 type or as a 2 or more types of mixed solvent.
さらに、極性の低い脂肪族、芳香族又は脂環式炭化水素化合物であっても、重合体と比較的相溶性があれば、極性溶媒と組み合わせることにより使用することができ、具体的には、へキサンとTHFの組み合わせを例示できる。 Furthermore, even a low polarity aliphatic, aromatic or alicyclic hydrocarbon compound can be used by combining it with a polar solvent, as long as it is relatively compatible with the polymer. A combination of hexane and THF can be exemplified.
本発明における重合温度は、移動反応や停止反応等の副反応が起こらず、単量体が消費され重合が完結する温度範囲であれば特に制限されないが、−70℃以上、重合溶媒沸点以下の温度範囲で行なわれることが好ましい。また、単量体の重合溶媒に対する濃度は、特に制限されないが、通常、1〜40重量%の範囲であり、2〜15重量%の範囲であることが好ましい。 The polymerization temperature in the present invention is not particularly limited as long as it is a temperature range in which side reactions such as transfer reaction and termination reaction do not occur and the monomer is consumed and the polymerization is completed, but it is −70 ° C. or higher and the polymerization solvent boiling point or lower. It is preferably performed in the temperature range. The concentration of the monomer with respect to the polymerization solvent is not particularly limited, but is usually in the range of 1 to 40% by weight, and preferably in the range of 2 to 15% by weight.
また、本発明においては、得られる重合体の分子量を更に正確に規定するため、一定の単量体を重合した後、その分子量をGPC等で把握し、更に所望する重合体の分子量に必要とされる単量体を加え分子量を調整する多段重合を用いることにより、より精密に分子量を規定することが可能となる。 In the present invention, in order to more accurately define the molecular weight of the obtained polymer, after polymerizing a certain monomer, the molecular weight is grasped by GPC or the like, and further required for the desired molecular weight of the polymer. The molecular weight can be regulated more precisely by using multi-stage polymerization in which the monomer is added and the molecular weight is adjusted.
以下、実施例により本発明をより具体的に説明するが、本発明の技術的範囲はこれらの例示に限定されるものではない。 EXAMPLES Hereinafter, although an Example demonstrates this invention more concretely, the technical scope of this invention is not limited to these illustrations.
塩化リチウム0.58g(13.8mmol)を加えたTHF160g中に、窒素雰囲気下、−50℃でジエチル亜鉛溶液4.57g(6.2mmol)を加え、続いて、t−ブチルメタクリレート6.40g(45.0mmol)と3−ヒドロキシアダマンチルメタクリレート1.18g(5.0mmol)を加え、30分攪拌した。その後、n−BuLi溶液1.41g(3.4mmol)を加え、80分間攪拌し、35%塩酸2.61(25.8mmol)を加えキリングし、更に室温で10分間攪拌した。このキリング溶液をガスクロマトグラフィーで測定してみるとモノマー残存していなかった。また、GPC測定を行なうと分子量(Mw)9820、分散度(重量平均分子量(Mw)/数平均分子量(Mn))=1.08のポリマーが生成していた。 In 160 g of THF to which 0.58 g (13.8 mmol) of lithium chloride was added, 4.57 g (6.2 mmol) of diethylzinc solution was added at −50 ° C. under a nitrogen atmosphere, followed by 6.40 g of t-butyl methacrylate ( 45.0 mmol) and 1.18 g (5.0 mmol) of 3-hydroxyadamantyl methacrylate were added and stirred for 30 minutes. Thereafter, 1.41 g (3.4 mmol) of n-BuLi solution was added and stirred for 80 minutes, 2.61 (35. 8 mmol) of 35% hydrochloric acid was added, and the mixture was further stirred at room temperature for 10 minutes. When this killing solution was measured by gas chromatography, no monomer remained. Further, when GPC measurement was performed, a polymer having a molecular weight (Mw) of 9820 and a dispersity (weight average molecular weight (Mw) / number average molecular weight (Mn)) = 1.08 was produced.
塩化リチウム0.47g(11.2mmol)を加えたTHF160g中に、窒素雰囲気下、−50℃でn−BuLi溶液1.73g(4.2mmol)を加え、続いて、クロトン酸t−ブチル0.56(3.9mmol)を加え、40分間攪拌した。その後、ジエチル亜鉛溶液3.08g(4.2mmol)を加え、1分間攪拌した。この溶液に、THF11g中に3−ヒドロキシアダマンチルメタクリレート1.18g(5.0mmol)とt−ブチルメタクリレート6.11g(43.0mmol)を加え、更にジエチル亜鉛溶液4.53g(6.1mmol)を4回に分けて加えたものを6分かけて滴下し、滴下終了後60分間攪拌し、酢酸1.3gを加えキリングした。このキリング溶液をガスクロマトグラフィーで測定してみるとモノマー残存していなかった。また、GPC測定を行なうとトップピークで分子量14450と4750の二ピークが認められた。キリング溶液に35%塩酸2.8gを加え、室温で10分間攪拌した溶液をGPC測定を行なうと、分子量(Mw)5040、分散度=1.2のポリマーが生成し、トップピークで分子量14450のピークは消失していた。 In 160 g of THF to which 0.47 g (11.2 mmol) of lithium chloride was added, 1.73 g (4.2 mmol) of an n-BuLi solution was added at −50 ° C. in a nitrogen atmosphere, followed by 0. 56 (3.9 mmol) was added and stirred for 40 minutes. Thereafter, 3.08 g (4.2 mmol) of diethyl zinc solution was added and stirred for 1 minute. To this solution, 1.18 g (5.0 mmol) of 3-hydroxyadamantyl methacrylate and 6.11 g (43.0 mmol) of t-butyl methacrylate were added in 11 g of THF, and 4.53 g (6.1 mmol) of diethylzinc solution was further added. What was added in portions was added dropwise over 6 minutes. After completion of the addition, the mixture was stirred for 60 minutes, and 1.3 g of acetic acid was added to kill it. When this killing solution was measured by gas chromatography, no monomer remained. Further, when GPC measurement was performed, two peaks with molecular weights of 14450 and 4750 were recognized as top peaks. When GPC measurement was performed on a solution obtained by adding 2.8 g of 35% hydrochloric acid to a killing solution and stirring at room temperature for 10 minutes, a polymer having a molecular weight (Mw) of 5040 and a dispersity of 1.2 was formed, and a molecular weight of 14450 was observed at the top peak. The peak disappeared.
Claims (8)
式(1) : (R1)nM
(式中、R1は、C1〜C20アルキル基又はC6〜C20アリール基を表し、nが2以上の場合、R1は同一又は相異なっていてもよく、Mは、長周期型周期律表第2族、第12族又は第13族に属する原子を表し、nはMの原子価を表す。) The method for producing a polymer according to claim 1, wherein the organometallic compound is a compound represented by the formula (1).
Formula (1): (R 1 ) n M
(In the formula, R 1 represents a C1 to C20 alkyl group or a C6 to C20 aryl group, and when n is 2 or more, R 1 may be the same or different, and M is a long-period periodic table. Represents an atom belonging to Group 2, Group 12 or Group 13, and n represents the valence of M.)
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| JPS5953506A (en) * | 1982-09-22 | 1984-03-28 | Tounen Sekiyu Kagaku Kk | Manufacture of styrene derivative polymer |
| JPH10298248A (en) * | 1997-02-27 | 1998-11-10 | Sekisui Chem Co Ltd | Acrylic copolymer, acrylic block copolymer, and self-adhesive composition |
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| JP2001505943A (en) * | 1996-12-10 | 2001-05-08 | ビーエーエスエフ アクチェンゲゼルシャフト | Method for anionic polymerization of acrylate and methacrylate |
| WO2001079312A1 (en) * | 2000-04-19 | 2001-10-25 | Idemitsu Petrochemical Co., Ltd. | Process for producing functional styrene copolymer and functional styrene copolymer |
| JP2001342381A (en) * | 2000-03-27 | 2001-12-14 | Sanyo Chem Ind Ltd | Coating agent and coating |
| JP2003327627A (en) * | 2002-05-09 | 2003-11-19 | Mitsubishi Rayon Co Ltd | Method for producing (meth) acrylate copolymer |
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| JPS5953506A (en) * | 1982-09-22 | 1984-03-28 | Tounen Sekiyu Kagaku Kk | Manufacture of styrene derivative polymer |
| JP2000513761A (en) * | 1996-05-03 | 2000-10-17 | ディーエスエム エヌ.ブイ. | Method for producing functional polyolefin |
| JP2001505943A (en) * | 1996-12-10 | 2001-05-08 | ビーエーエスエフ アクチェンゲゼルシャフト | Method for anionic polymerization of acrylate and methacrylate |
| JPH10298248A (en) * | 1997-02-27 | 1998-11-10 | Sekisui Chem Co Ltd | Acrylic copolymer, acrylic block copolymer, and self-adhesive composition |
| JP2001342381A (en) * | 2000-03-27 | 2001-12-14 | Sanyo Chem Ind Ltd | Coating agent and coating |
| WO2001079312A1 (en) * | 2000-04-19 | 2001-10-25 | Idemitsu Petrochemical Co., Ltd. | Process for producing functional styrene copolymer and functional styrene copolymer |
| JP2003327627A (en) * | 2002-05-09 | 2003-11-19 | Mitsubishi Rayon Co Ltd | Method for producing (meth) acrylate copolymer |
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