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JP2007207498A - Mechanism device - Google Patents

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JP2007207498A
JP2007207498A JP2006022927A JP2006022927A JP2007207498A JP 2007207498 A JP2007207498 A JP 2007207498A JP 2006022927 A JP2006022927 A JP 2006022927A JP 2006022927 A JP2006022927 A JP 2006022927A JP 2007207498 A JP2007207498 A JP 2007207498A
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lower electrode
upper electrode
substrate
mechanism device
electrode
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Naokuni Arima
尚邦 有馬
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Oki Sensor Device Corp
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Oki Sensor Device Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a mechanism device capable of preventing malfunction of an upper electrode sticking to a lower electrode due to Coulomb force, by widening a gap between the both electrodes in a method other than thickening of a sacrifice layer. <P>SOLUTION: The device is provided with a substrate 101 formed of an insulating material, a lower electrode 103 formed on the substrate 101, and an upper electrode 102 arranged at an opposite position of the lower electrode 103 and equipped with a cantilevered beam structure part 104 having a magnetic body. An open end part of a box-like glass package 111 is mounted on and fixed to a peripheral edge of the substrate 101 to cover the upper electrode 102 and the lower electrode 103 with it 111, and has a magnet 112 mounted on a top part the glass package 111. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

この発明は、片持ち梁構造を有する機構デバイスに係り、特に耐静電特性による誤動作を防止するようにしたものに関する。   The present invention relates to a mechanism device having a cantilever structure, and more particularly to a device that prevents malfunction due to electrostatic resistance.

従来の例えばマイクロリードスイッチとしての機構デバイスは、基板上に片持ち梁構造の上部電極と下部電極を備え、半導体プロセス(フォトリソグラフィ法)と電解メッキ法及びウエットエッチング技術を用いて形成したもので、例えば、ウエットエッチングで犠牲層を除去しギャップを形成したものについて説明する。
かかる従来の機構デバイスは、基板と、下部電極と、上部電極とを備えている。基板は、ガラスエポキシ樹脂で構成された絶縁基板上に、導電性材料としての銅箔が貼着されたいわゆるプリント基板で、銅箔は不要な部分が除去されて配線パターン化されている。
下部電極は、ニッケル層の表面全体を導電層で覆った構成を有している。導電層はそれぞれ半導体プロセス(フォトリソグラフィ法)及び電解メッキ法を用いて形成されており、導電層は金(接点材料)で構成されている。
A conventional mechanical device, for example, as a micro-reed switch, includes an upper electrode and a lower electrode having a cantilever structure on a substrate, and is formed using a semiconductor process (photolithography method), an electrolytic plating method, and a wet etching technique. For example, a case where a sacrificial layer is removed by wet etching to form a gap will be described.
Such a conventional mechanism device includes a substrate, a lower electrode, and an upper electrode. The board is a so-called printed board in which a copper foil as a conductive material is stuck on an insulating board made of glass epoxy resin, and unnecessary portions of the copper foil are removed to form a wiring pattern.
The lower electrode has a configuration in which the entire surface of the nickel layer is covered with a conductive layer. Each conductive layer is formed by using a semiconductor process (photolithography method) and an electrolytic plating method, and the conductive layer is made of gold (contact material).

ここで、金は、腐食に強いことから、金でニッケル層を覆うことにより、ニッケル層の酸化を防止でき、また、導電層自身の酸化も防止できて、接触抵抗の上昇が防止されて初期の導電性を維持でき、接点性能の安定化を図ることが可能となっている。
また、導電層を構成する材料には、機構デバイスの製造時の最終工程での犠牲層の除去におけるウエットエッチングの際に、ニッケル層が浸食されないように保護する役割も必要とされていることから、その面でも、最終工程のウエットエッチングで用いるエッチング液(ここでは塩化第二鉄)に対して耐エッチング性を有する金が用いられている。
Here, since gold is resistant to corrosion, by covering the nickel layer with gold, oxidation of the nickel layer can be prevented, and also oxidation of the conductive layer itself can be prevented, preventing an increase in contact resistance. Therefore, the contact performance can be stabilized.
In addition, the material constituting the conductive layer is also required to protect the nickel layer from being eroded during the wet etching in the removal of the sacrificial layer in the final process of manufacturing the mechanical device. Also on this surface, gold having etching resistance against the etching solution (here, ferric chloride) used in the wet etching in the final process is used.

上部電極は、フォトリソグラフィ法及び電解メッキ法を用いてそれぞれ形成された片持ち梁構造部と、磁性体部とを有している。片持ち梁構造部は、銅箔上にその底面が接触する基部と、該基部に支持された梁部とで構成され、耐エッチング性を有する導電性材料である金(接点材料)で構成されている。ここで、接点材料として金を用いることにより、上述したように接点性能安定化を図ることが可能となる。
また、金は硬度が低く柔軟性のある材料であることから、片持ち梁構造部を金で構成することにより、片持ち梁構造部の梁部を磁力によって下部電極側に引き寄せる際に、微小な磁力でも動作することが可能となり、よって、高感度のマイクロリードスイッチとしての機構デバイスを構成することが可能となる(例えば、特許文献1参照)。
特開2003−311698号公報(第1頁、第1図)
The upper electrode has a cantilever structure portion formed by using a photolithography method and an electrolytic plating method, and a magnetic body portion. The cantilever structure part is composed of a base part whose bottom surface is in contact with a copper foil and a beam part supported by the base part, and is composed of gold (contact material) which is a conductive material having etching resistance. ing. Here, by using gold as the contact material, the contact performance can be stabilized as described above.
In addition, since gold is a flexible material with low hardness, the cantilever structure is made of gold, so that when the beam of the cantilever structure is pulled toward the lower electrode by magnetic force, Therefore, it is possible to configure a mechanism device as a highly sensitive micro-reed switch (see, for example, Patent Document 1).
Japanese Unexamined Patent Publication No. 2003-311698 (first page, FIG. 1)

しかしながら、上記従来の機構デバイスにおいて、上部電極における片持ち梁構造部の梁部と下部電極の間にはクーロン力が働き、梁部と下部電極の間に形成したギャップは5μmと非常に狭いことから、クーロン力により印加電圧にして数V程度で接点が吸引し、接点開閉中に誤動作を起こすという問題があった。
そこで、片持ち梁構造部を有する上部電極と下部電極の間に形成する接点ギャップを広くするためには、犠牲層を厚くする必要があるが、厚い犠牲層を形成するにはウエットエッチングを行うために形成時間が非常にかかるという問題点があった。
However, in the conventional mechanism device described above, the Coulomb force acts between the beam portion and the lower electrode of the cantilever structure portion in the upper electrode, and the gap formed between the beam portion and the lower electrode is very narrow as 5 μm. Therefore, there has been a problem that the contact is attracted at a voltage of about several volts by the Coulomb force, and malfunction occurs during the opening and closing of the contact.
In order to widen the contact gap formed between the upper electrode and the lower electrode having the cantilever structure, it is necessary to increase the thickness of the sacrificial layer, but wet etching is performed to form a thick sacrificial layer. Therefore, there is a problem that it takes a long time to form.

この発明に係る機構デバイスは、絶縁材料で形成された基板と、基板上に形成された下部電極と、基板上に形成され、下部電極の対向位置に配置され、磁性体を具備する片持ち梁構造部を有する上部電極とを備え、前記基板の周縁に箱状のパッケージの開口端部を取り付け固定し、該パッケージで前記上部電極と前記下部電極とを覆い、前記パッケージの上部に磁石を取り付けるようにしたものである。   A mechanism device according to the present invention includes a substrate formed of an insulating material, a lower electrode formed on the substrate, a cantilever formed on the substrate and disposed at a position facing the lower electrode, and having a magnetic material An upper electrode having a structure portion, and an opening end of a box-shaped package is attached and fixed to the periphery of the substrate, the upper electrode and the lower electrode are covered with the package, and a magnet is attached to the upper portion of the package It is what I did.

以上説明したようにこの発明によれば、絶縁材料で形成された基板と、基板上に形成された下部電極と、基板上に形成され、下部電極の対向位置に配置され、磁性体を具備する片持ち梁構造部を有する上部電極とを備え、前記基板の周縁に箱状のパッケージの開口端部を取り付け固定し、該パッケージで前記上部電極と前記下部電極とを覆い、前記パッケージの上部に磁石を取り付けるようにしたので、磁石から発生する磁場により磁性体が磁化して磁石側に吸引され、磁性体を有する上部電極が上部方向に反らせられるため、上部電極と下部電極の間のギャップを犠牲層の厚みを厚くすること以外の方法で広くすることができ、ギャップが広がったことにより、上部電極が下部電極にクーロン力により張り付く誤動作を防止することができるという効果を有する。
また、上部電極と下部電極の間のギャップが広がったことにより、機構デバイスをマイクロスイッチとして利用する場合に上部電極と下部電極に印加する印加電圧を高く設定することができるという効果もある。
As described above, according to the present invention, a substrate formed of an insulating material, a lower electrode formed on the substrate, a substrate formed on the substrate, disposed at a position facing the lower electrode, and provided with a magnetic material. An upper electrode having a cantilever structure, and an opening end of a box-shaped package is attached and fixed to the periphery of the substrate, the upper electrode and the lower electrode are covered with the package, and the upper portion of the package is covered with the upper electrode. Since the magnet is attached, the magnetic body is magnetized by the magnetic field generated from the magnet and attracted to the magnet side, and the upper electrode having the magnetic body is deflected in the upper direction, so the gap between the upper electrode and the lower electrode is increased. The sacrificial layer can be widened by a method other than increasing the thickness, and the gap can be widened to prevent malfunction of the upper electrode sticking to the lower electrode due to Coulomb force. It has the effect of.
Further, since the gap between the upper electrode and the lower electrode is widened, there is an effect that the applied voltage applied to the upper electrode and the lower electrode can be set high when the mechanical device is used as a microswitch.

図1は本発明の実施の形態に係る機構デバイスの構成を示す斜視図、図2は同機構デバイスの磁場の影響で上方に反った上部電極の様子を示す斜視図、図3は同機構デバイスの電磁石の影響で上部電極が下部電極に接触する様子を示す斜視図、図4は同機構デバイスの上部電極のギャップ量と印加電圧の関係のデータを得るための測定回路を示す回路図である。
図1において、本発明の実施の形態に係る機構デバイス100は、基板101と、上部電極102と、下部電極103とを備えている。
基板101は、ガラスエポキシ樹脂で構成された絶縁基板上に、導電性材料としての銅箔が貼着されたいわゆるプリント基板で、銅箔は不要な部分が除去されて配線パターン化されている。
1 is a perspective view showing a configuration of a mechanism device according to an embodiment of the present invention, FIG. 2 is a perspective view showing a state of an upper electrode warped upward due to the magnetic field of the mechanism device, and FIG. FIG. 4 is a circuit diagram showing a measurement circuit for obtaining data on the relationship between the gap amount of the upper electrode and the applied voltage of the mechanism device. .
In FIG. 1, a mechanism device 100 according to an embodiment of the present invention includes a substrate 101, an upper electrode 102, and a lower electrode 103.
The substrate 101 is a so-called printed board in which a copper foil as a conductive material is attached on an insulating substrate made of glass epoxy resin, and unnecessary portions of the copper foil are removed to form a wiring pattern.

上部電極102は、フォトリソグラフィ法及び電解メッキ法を用いてそれぞれ形成された片持ち梁構造部104と、磁性体105とを有している。片持ち梁構造部104は、基板101の銅箔上にその底面が接触する基部106と、該基部106に支持された梁部107とで構成されている。磁性体105はニッケル層の表面全体を導電層で覆った構成を有している。この導電層も耐エッチング性を有する導電性材料である金(接点材料)で構成されている。   The upper electrode 102 includes a cantilever structure portion 104 and a magnetic body 105 that are formed by using a photolithography method and an electrolytic plating method, respectively. The cantilever structure 104 includes a base 106 whose bottom surface is in contact with the copper foil of the substrate 101, and a beam 107 supported by the base 106. The magnetic body 105 has a configuration in which the entire surface of the nickel layer is covered with a conductive layer. This conductive layer is also made of gold (contact material) which is a conductive material having etching resistance.

下部電極102は、ニッケル層の表面全体を導電層で覆った構成を有している。導電層はそれぞれ半導体プロセス(フォトリソグラフィ法)及び電解メッキ法を用いて形成されており、導電層は耐エッチング性を有する導電性材料である金(接点材料)で構成されている。   The lower electrode 102 has a configuration in which the entire surface of the nickel layer is covered with a conductive layer. Each conductive layer is formed by using a semiconductor process (photolithography method) and an electrolytic plating method, and the conductive layer is made of gold (contact material) which is a conductive material having etching resistance.

この実施の形態1では、機構デバイス100のクーロン力で上部電極102が誤動作しないように上部電極102と下部電極103の間のギャップ110を広く形成する方法として、次のような構成を採用している。
図2に示す機構デバイス100をウエットエッチングした後に乾燥させ、上部電極102と下部電極103の間にギャップ110を形成した後、機構デバイス100の基板101の周縁に箱状のガラスパッケージ111の開口端部を取り付け固定し、ガラスパッケージ111で上部電極102と下部電極103を覆い、そのガラスパッケージ111の上部に磁石112を取り付けた構成としている。
In the first embodiment, the following configuration is adopted as a method of forming a wide gap 110 between the upper electrode 102 and the lower electrode 103 so that the upper electrode 102 does not malfunction due to the Coulomb force of the mechanism device 100. Yes.
The mechanism device 100 shown in FIG. 2 is wet-etched and dried to form a gap 110 between the upper electrode 102 and the lower electrode 103, and then the opening end of the box-shaped glass package 111 on the periphery of the substrate 101 of the mechanism device 100. The upper electrode 102 and the lower electrode 103 are covered with a glass package 111, and a magnet 112 is attached to the upper portion of the glass package 111.

このように構成したことにより、磁石112から発生する磁場120により磁性体105が磁化し、磁性体105の根元側105aにS極が誘導され、反対側である先端側105bにN極が誘導され、磁性体105が磁石112に吸引されることから、磁性体105を具備する上部電極102は常に上部方向に反らせられるため、上部電極102と下部電極103の間のギャップ110を広くすることができ、犠牲層の厚みを厚くすること以外の方法でギャップを広くすることができる。   With this configuration, the magnetic body 105 is magnetized by the magnetic field 120 generated from the magnet 112, the south pole is induced on the base side 105 a of the magnetic body 105, and the north pole is induced on the opposite end side 105 b. Since the magnetic body 105 is attracted by the magnet 112, the upper electrode 102 including the magnetic body 105 is always warped upward, so that the gap 110 between the upper electrode 102 and the lower electrode 103 can be widened. The gap can be widened by a method other than increasing the thickness of the sacrificial layer.

次に、本発明の実施の形態に係る機構デバイス100の動作について図3に基づいて説明する。
機構デバイス100のエッチング工程後の乾燥工程により、上部電極102と下部電極103の間にギャップ110を形成した後に、機構デバイス100をガラスパッケージ111で覆い、そのガラスパッケージ111の上部に磁石112を設けると、図3に示すように、磁石112からの磁場120によって上部電極102が磁化され、上部方向(吸引される方向123)に吸引されることで、上部電極102と下部電極103のギャップ110が犠牲層の厚み以上に形成される。
Next, the operation of the mechanism device 100 according to the embodiment of the present invention will be described with reference to FIG.
After a gap 110 is formed between the upper electrode 102 and the lower electrode 103 by a drying process after the etching process of the mechanism device 100, the mechanism device 100 is covered with the glass package 111, and a magnet 112 is provided on the glass package 111. As shown in FIG. 3, the upper electrode 102 is magnetized by the magnetic field 120 from the magnet 112 and is attracted in the upper direction (direction 123 to be attracted), so that the gap 110 between the upper electrode 102 and the lower electrode 103 is changed. More than the thickness of the sacrificial layer.

このように犠牲層の厚み以上にギャップ110が形成された機構デバイス113をマイクロスイッチとして利用する場合、図4に示すように、機構デバイス100の直下に電磁石124を設置し、電磁石124に電圧を印加して磁場125を発生させる。
これにより、電磁石124に発生する磁場125をガラスパッケージ111の上部に備えた磁石119の磁場120より十分強くすることで、機構デバイス100の上部電極102に形成された磁性体105が磁化され、上部電極102は下部電極103の方向128に吸引されて上部電極102が下部電極103に接触してスイッチオンする。
When the mechanism device 113 in which the gap 110 is formed more than the thickness of the sacrificial layer is used as a microswitch, an electromagnet 124 is installed immediately below the mechanism device 100 as shown in FIG. Applied to generate a magnetic field 125.
Accordingly, the magnetic body 105 formed on the upper electrode 102 of the mechanism device 100 is magnetized by making the magnetic field 125 generated in the electromagnet 124 sufficiently stronger than the magnetic field 120 of the magnet 119 provided on the upper portion of the glass package 111. The electrode 102 is attracted in the direction 128 of the lower electrode 103, and the upper electrode 102 contacts the lower electrode 103 and is switched on.

そして、電磁石124への電圧の印加を停止すると、磁場が消滅し、磁場の消滅によって上部電極102及び下部電極103間の磁気吸引力も消滅し、上部電極102のスティフネスおよびガラスパッケージ11の上部に設けた磁石112の磁場120により、上部電極102は元の位置に復帰して非接触になりスイッチオフとなる。   When the application of voltage to the electromagnet 124 is stopped, the magnetic field disappears, and the magnetic attractive force between the upper electrode 102 and the lower electrode 103 disappears due to the disappearance of the magnetic field, and the stiffness of the upper electrode 102 and the upper portion of the glass package 11 are provided. Due to the magnetic field 120 of the magnet 112, the upper electrode 102 returns to its original position and becomes non-contact and is switched off.

以上のように本発明の実施の形態によれば、機構デバイス100をガラスパッケージ111で覆い、そのガラスパッケージ111の上部に設けた磁石112の磁場120を用いて磁性体105を具備する上部電極102を上部方向に吸引させることで、上部電極102と下部電極103の間にギャップ110を犠牲層の厚み以上に形成することが可能となる。
これにより、上部電極102と下部電極103の間に働くクーロン力は接点のギャップ110が広がったことにより、C=εS/d(c−静電容量{F}、ε=誘電率、S=面積、d=接点間距離)の関係から静電容量が減少し、上部電極102が下部電極103にクーロン力で張り付く誤動作を防止できる。
As described above, according to the embodiment of the present invention, the mechanism device 100 is covered with the glass package 111, and the upper electrode 102 including the magnetic body 105 using the magnetic field 120 of the magnet 112 provided on the upper portion of the glass package 111. Can be formed in the upper direction, so that the gap 110 can be formed between the upper electrode 102 and the lower electrode 103 to be larger than the thickness of the sacrificial layer.
As a result, the Coulomb force acting between the upper electrode 102 and the lower electrode 103 is increased by increasing the contact gap 110, so that C = εS / d (c−capacitance {F}, ε = dielectric constant, S = area , D = distance between contacts), the capacitance is reduced, and the malfunction of the upper electrode 102 sticking to the lower electrode 103 by the Coulomb force can be prevented.

図5は機構デバイスの上部電極のギャップ量と印加電圧の関係のデータを得るための測定回路を示し、Vは出力電圧を可変して出力し、出力電圧が分かる電圧電源である。そして、電圧電源Vの電圧が上部電極103と下部電極102とに印加されるように接続されている。そして、図5に示す測定回路で電圧電源Vにより上部電極103と下部電極102とに種々の電圧を印加し、上部電極103が下部電極102に接触すると電圧降下を生じるので、そのときの上部電極103と下部電極102とに印加した電圧と上部電極103と下部電極102とのギャップ量は分かっているため、種々の印加電圧とギャップ量との関係をグラフに表したのが、図6の上部電極とギャップ量と印加電圧の関係を示すグラフである。
図6のグラフに示すように、本発明の実施の形態のように、上部電極102と下部電極103との接点ギャップ量を広げ、例えば50μmにすることで、数V程度だった印加電圧を75V程度まで上げることができる。
FIG. 5 shows a measurement circuit for obtaining data on the relationship between the gap amount of the upper electrode of the mechanical device and the applied voltage, and V is a voltage power source that outputs the output voltage by varying the output voltage and can know the output voltage. And it connects so that the voltage of the voltage power supply V may be applied to the upper electrode 103 and the lower electrode 102. Then, in the measurement circuit shown in FIG. 5, various voltages are applied to the upper electrode 103 and the lower electrode 102 by the voltage power source V, and a voltage drop occurs when the upper electrode 103 contacts the lower electrode 102. Since the voltage applied to 103 and the lower electrode 102 and the gap amount between the upper electrode 103 and the lower electrode 102 are known, the relationship between the various applied voltages and the gap amount is shown in the graph in FIG. It is a graph which shows the relationship between an electrode, gap amount, and an applied voltage.
As shown in the graph of FIG. 6, as in the embodiment of the present invention, the contact voltage between the upper electrode 102 and the lower electrode 103 is increased to, for example, 50 μm, so that the applied voltage, which was about several volts, is 75 V. Can be raised to a certain extent.

上記実施の形態では、機構デバイス1を覆う部材としてガラスパッケージ11を用いているが、ガラスパッケージでなくても樹脂パッケージでも良く、また金属パッケージでも良いが、この場合は基板101に銅箔が貼着されているので、絶縁部材を介して取り付けるようにすればよい。   In the above embodiment, the glass package 11 is used as a member covering the mechanism device 1. However, a resin package or a metal package may be used instead of the glass package. In this case, a copper foil is pasted on the substrate 101. Since it is attached, it may be attached via an insulating member.

本発明の実施の形態に係る機構デバイスの構成を示す斜視図。The perspective view which shows the structure of the mechanism device which concerns on embodiment of this invention. 同機構デバイスの磁場の影響で上部方向に反った上部電極の様子を示す斜視図。The perspective view which shows the mode of the upper electrode which curved in the upper direction by the influence of the magnetic field of the mechanism device. 同機構デバイスの電磁石の影響で上部電極が下部電極に接触する様子を示す斜視図。The perspective view which shows a mode that an upper electrode contacts a lower electrode under the influence of the electromagnet of the mechanism device. 同機構デバイスの上部電極のギャップ量と印加電圧の関係のデータを得るための測定回路を示す回路図。The circuit diagram which shows the measurement circuit for obtaining the data of the relationship between the gap amount of the upper electrode of the mechanism device, and an applied voltage. 同機構デバイスの上部電極のギャップ量と印加電圧の関係を示すグラフ。The graph which shows the relationship between the gap amount of the upper electrode of the mechanism device, and applied voltage.

符号の説明Explanation of symbols

100 機構デバイス、101 基板、102 上部電極、103 下部電極、104 片持ち梁構造、105 磁性体、107 基部、108 梁部、110 ギャップ、111 ガラスパッケージ、112 磁石。
100 mechanical device, 101 substrate, 102 upper electrode, 103 lower electrode, 104 cantilever structure, 105 magnetic body, 107 base, 108 beam, 110 gap, 111 glass package, 112 magnet.

Claims (2)

絶縁材料で形成された基板と、基板上に形成された下部電極と、基板上に形成され、下部電極の対向位置に配置され、磁性体を具備する片持ち梁構造部を有する上部電極とを備えた機構デバイスにおいて、
前記基板の周縁に箱状のパッケージの開口端部を取り付け固定し、該パッケージで前記上部電極と前記下部電極とを覆い、前記パッケージの上部に磁石を取り付けたことを特徴とする機構デバイス。
A substrate formed of an insulating material; a lower electrode formed on the substrate; and an upper electrode formed on the substrate and disposed at a position opposite to the lower electrode and having a cantilever structure having a magnetic material. In the mechanism device provided,
A mechanism device, wherein an opening end of a box-shaped package is attached and fixed to a peripheral edge of the substrate, the upper electrode and the lower electrode are covered with the package, and a magnet is attached to the upper portion of the package.
前記パッケージはガラス、合成樹脂又は金属で形成されていることを特徴とする請求項1記載の機構デバイス。
The mechanism device according to claim 1, wherein the package is made of glass, synthetic resin, or metal.
JP2006022927A 2006-01-31 2006-01-31 Mechanism device Pending JP2007207498A (en)

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Cited By (1)

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JPH06223686A (en) * 1992-12-15 1994-08-12 Asulab Sa Lead contactor and its manufacture
JPH07176255A (en) * 1993-12-20 1995-07-14 Nippon Signal Co Ltd:The Planer electromagnetic relay and manufacture thereof

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Publication number Priority date Publication date Assignee Title
JPH06223686A (en) * 1992-12-15 1994-08-12 Asulab Sa Lead contactor and its manufacture
JPH07176255A (en) * 1993-12-20 1995-07-14 Nippon Signal Co Ltd:The Planer electromagnetic relay and manufacture thereof

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20180016138A1 (en) * 2008-04-22 2018-01-18 International Business Machines Corporation Mems switches with reduced switching voltage and methods of manufacture
US10640373B2 (en) * 2008-04-22 2020-05-05 International Business Machines Corporation Methods of manufacturing for MEMS switches with reduced switching voltage
US10647569B2 (en) 2008-04-22 2020-05-12 International Business Machines Corporation Methods of manufacture for MEMS switches with reduced switching voltage
US10745273B2 (en) 2008-04-22 2020-08-18 International Business Machines Corporation Method of manufacturing a switch
US10836632B2 (en) 2008-04-22 2020-11-17 International Business Machines Corporation Method of manufacturing MEMS switches with reduced switching voltage
US10941036B2 (en) 2008-04-22 2021-03-09 International Business Machines Corporation Method of manufacturing MEMS switches with reduced switching voltage

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