JP2009285732A - Bonding material, manufacturing method of bonding material and semiconductor device - Google Patents

Abstract

Kind Code: A1 To apply a Zn-Al alloy having a melting point of 260 ° C. or higher for connection, to improve wettability at the time of connection, to reduce the process at the time of material production, and to improve connection reliability against thermal stress. Provided is a connecting material that makes it possible.
As a connection material, a Zn-based alloy layer 101 is provided on the outermost surface of an Al-based alloy layer 102. In particular, the Al-based alloy layer 102 has an Al content of 99 to 100 wt. %, Or the Zn-based alloy layer 101 has a Zn content of 90 to 100 wt. % Connection material. By using this connection material, formation of an Al oxide film on the surface of the connection material is suppressed at the time of connection, and good wetting that cannot be obtained with a Zn—Al alloy can be obtained. Further, when the Al-based alloy layer is left after the connection, since the soft Al functions as a stress buffer material, high connection reliability can be obtained.
[Selection] Figure 5

Description

  The present invention relates to a connection material technique, and more particularly to a structure and manufacturing method of the connection material, and a technique effective when applied to a semiconductor device, a power semiconductor device, a power module, and the like using the connection material.

  As a technique studied by the present inventors, a semiconductor device using a connection material will be described with reference to FIGS. FIG. 1 is a diagram showing the structure of a conventional semiconductor device. FIG. 2 is a diagram illustrating flashing by remelted solder.

  As shown in FIG. 1, the semiconductor device 7 is used for sealing after the semiconductor element 1 is connected to the frame 2 by the solder 3, and the inner lead of the lead 5 and the electrode of the semiconductor element 1 are wire-bonded by the wire 4. It is manufactured by being sealed with resin 6 or an inert gas.

  This semiconductor device 7 is reflow soldered to the printed circuit board with Sn-Ag-Cu-based medium temperature lead-free solder. The melting point of Sn—Ag—Cu-based lead-free solder is as high as about 220 ° C., and it is assumed that the connection portion is heated up to 260 ° C. during reflow connection. Therefore, high lead solder having a melting point of 290 ° C. or higher is used for die bonding of the semiconductor element inside the semiconductor device for the purpose of the temperature hierarchy. High lead solder has 85 wt. Compared to Sn-Pb eutectic solder prohibited by the RoHS Directive that has been in force since July 2006, the environmental load is large. Therefore, development of an alternative connection material that replaces high-lead solder is eagerly desired.

  Currently developed Sn-Ag-Cu solders have a melting point of 260 ° C or lower, so when used for die bonding of semiconductor elements, the solder melts during secondary mounting (maximum temperature 260 ° C). Resulting in. When the periphery of the connecting portion is molded with a resin, when the internal solder is melted, the solder expands from the interface between the sealing resin 6 and the frame 2 as shown in FIG. May leak. Or even if it does not leak, it acts to leak, and as a result, a large void 8 is formed in the solder after solidification, resulting in a defective product. Candidates for alternative materials include Au-Sn, Au-Si, Au-Ge, and other Au-based solders, Zn, Zn-Al-based solders, and Bi, Bi-Cu, Bi-Ag, and other solders in terms of melting point. It has been reported and is being studied around the world.

  However, the Au-based solder has 80 wt. % Or more, and there is difficulty in versatility in terms of cost. Bi-based solder has a thermal conductivity of about 9 W / mK, which is lower than that of current high lead solder, and it can be estimated that application to power semiconductor devices and power modules that require high heat dissipation is difficult. Zn and Zn-Al solder have a high thermal conductivity of about 100 W / mK, but are difficult to wet (especially Zn-Al solder), the solder is hard, and the semiconductor element is affected by thermal stress during cooling after connection. There are problems such as easy destruction.

  In Patent Document 1 and Patent Document 2, Al: 1 to 7 wt. %, Mg: 0.5 to 6 wt. %, Ga: 0.1 to 20 wt. %, P: 0.001 to 0.5 wt. %, The balance is Zn, Ge: 2-9 wt. %, Al: 2 to 9 wt. %, P: 0.001 to 0.5 wt. %, The balance is Zn or Ge: 2 to 9 wt. %, Al: 2 to 9 wt. %, Mg: 0.01 to 0.5 wt. %, P: 0.001 to 0.5 wt. % And the balance being Zn, the wettability of the Zn-based solder alloy to Cu and Ni is improved and the melting point is lowered. However, since Al or Mg is used as a component, Al oxide and Mg oxide generate a film on the surface of the melted portion by heating during connection. Since these films inhibit wetting, there is a possibility that sufficient wetting may not be obtained unless the film is mechanically broken by scrubbing or the like. In addition, since no improvement has been made with respect to the hardness of the solder, it cannot be expected to improve the destruction of the semiconductor element due to the thermal stress during cooling after connection or during temperature cycling.

  In Patent Document 3, an In, Ag, and Au layer is provided on the outermost surface of a Zn—Al alloy, thereby suppressing oxidation of the Zn—Al alloy surface and improving wettability. However, in order to provide the In, Ag, and Au layers, treatments such as plating and vapor deposition are indispensable on the Zn—Al surface, which leads to an increase in material manufacturing processes. Similarly to the above, when In is added, the hardness can be reduced, but an effect that suppresses the destruction of the semiconductor element due to the thermal stress during cooling after connection cannot be expected.

JP 2002-358539 A JP 2004-358540 A JP 2002-261104 A

  The present inventor thought that a high lead solder could be replaced by a Zn-Al alloy. In the above prior art, the following points have not been considered. Sufficient wetting cannot be ensured because Al is contained in the Zn-Al alloy. By performing the surface treatment on the Zn—Al-based alloy, the number of processes at the time of material production increases. The destruction of the semiconductor element due to thermal stress during cooling after connection or during temperature cycling cannot be suppressed.

  Therefore, in view of these points, the object of the present invention is to apply a Zn-Al alloy having a melting point of 260 ° C. or higher to the connection, improve the wetting at the time of connection, and the process at the time of manufacturing the material. An object of the present invention is to provide a connection material that can reduce the connection reliability against thermal stress.

  The above and other objects and novel features of the present invention will be apparent from the description of this specification and the accompanying drawings.

  Of the inventions disclosed in the present application, the outline of typical ones will be briefly described as follows.

  The present invention provides a connection material in which a Zn-based alloy layer is provided on the outermost surface of an Al-based alloy layer. In particular, the Al-based alloy layer has an Al content of 99 to 100 wt. %, Or the Zn content of the Zn-based alloy layer is 90 to 100 wt. % Of connecting material.

  Moreover, this invention provides the manufacturing method of the connection material which manufactures the Al-type alloy layer on a Zn-type alloy layer, and the connection material used as a Zn-type alloy layer on it by clad rolling or pressure forming. It is.

  The present invention also provides a semiconductor device (die bonding structure) for connecting a semiconductor element to a frame, a semiconductor device for connecting a metal cap to a substrate (hermetic sealing structure), and a semiconductor device for connecting by a bump using the connection material. (Flip chip mounting structure) is provided.

  Among the inventions disclosed in the present application, effects obtained by typical ones will be briefly described as follows.

  According to the present invention, since the connection material having the Zn-based alloy layer provided on the outermost surface of the Al-based alloy layer is used, the formation of the Al oxide film on the surface of the connection material is suppressed during connection, and good wetting can be obtained. it can. Further, since the Al-based alloy layer functions as a stress buffer after connection, high connection reliability can be obtained. As a result, a Zn-Al alloy having a melting point of 260 ° C. or higher is applied to the connection, the wetting at the time of connection is improved, the process at the time of manufacturing the material is reduced, and the connection reliability against thermal stress is improved. It becomes possible.

It is a figure which shows the structure of the conventional semiconductor device. FIG. 2 is a diagram illustrating flashing by remelted solder in the semiconductor device of FIG. 1. It is a figure explaining clad rolling in an embodiment of the invention. In embodiment of this invention, it is a figure explaining pressure molding. It is a figure which shows the cross section of the connection material in embodiment of this invention. It is a figure which shows the structure of the connection material of FIG. In embodiment of this invention, it is a figure which shows the cross section of the semiconductor device using the connection material (Examples 1-12) of FIG. FIG. 8 is a view showing a cross-sectional photograph of a connection portion made of a connection material in the semiconductor device of FIG. 7. In the semiconductor device of FIG. 7, it is a figure which shows the wettability and the result of a reflow test with a comparative example. In embodiment of this invention, it is a figure which shows the cross section of another semiconductor device using the connection material (Examples 13-24) of FIG. FIG. 8 is a view showing a metal cap integrated with a connection material in the semiconductor device of FIG. 7. In the semiconductor device of FIG. 10, it is a figure which shows the result of a wettability with a comparative example. FIG. 7 is a diagram showing a cross section and a mounting structure of still another semiconductor device using the connection material of FIG. 6 in the embodiment of the present invention.

  Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. Note that components having the same function are denoted by the same reference symbols throughout the drawings for describing the embodiment, and the repetitive description thereof will be omitted.

(Outline of the embodiment of the present invention)
A first invention is to provide a connection material in which a Zn-based alloy layer is provided on the outermost surface of an Al-based alloy layer. In the case of a Zn—Al alloy, since Al is a component, an Al oxide film is formed on the surface at the moment of melting, so that sufficient wetting cannot be obtained unless the oxide film is mechanically broken. In the case of the present invention, since the surface of the connecting material is a Zn-based alloy containing Al only to the extent of impurities, it is sufficient before the Zn-based alloy reacts with the Al-based alloy to form an Al oxide film at the time of connection. Wetting can be ensured. Further, since the melted portion becomes a Zn—Al-based alloy at the time of connection, the melting point is lowered to around 380 ° C. Accordingly, since the melting point of Zn is lowered from 420 ° C., the thermal stress generated during cooling after connection can be reduced as compared with pure Zn, and the breakdown of the semiconductor element can be suppressed. By leaving the Al alloy layer at the time of connection, soft Al functions as a stress buffer material, so that connection reliability can be improved. If the temperature is 380 ° C. or higher even when the temperature does not increase to the melting point of Zn 420 ° C. at the time of connection, diffusion proceeds between the contacted Zn layer and Al layer, and a Zn—Al eutectic with a melting point 380 ° C. is formed. Therefore, connection is possible.

In the second invention, the Al-based alloy layer has an Al content of 99 to 100 wt. It is to provide a connection material that is%. As the purity of Al approaches 100%, it becomes softer and it becomes easier to obtain a stress buffering function. On the other hand, the Al purity is 99 wt. If it is less than%, the 0.2% proof stress and hardness become hard, so it becomes difficult to obtain a stress buffering function. The 0.2% proof stress is desirably 30 N / mm ² or less. The thickness of the Al layer is preferably 30 to 200 μm. If the thickness is 30 μm or less, the thermal stress cannot be sufficiently buffered, and chip cracks may occur. When the thickness is 200 μm or more, Al, Mg, Ag, and Zn have a larger coefficient of thermal expansion than that of the Cu frame, so that the effect of the coefficient of thermal expansion is increased, which may lead to a decrease in reliability such as generation of chip cracks.

  In a third aspect of the invention, the Zn-based alloy layer has a Zn content of 90 to 100 wt. It is to provide a connecting material having an Al content of less than 0.01 wt. Al contained in the Zn-based alloy is 0.01 wt. If it is at least%, there is a risk that good wetting may not be obtained due to an increase in the amount of Al oxide film on the surface of the connection material during connection. The thickness of the Zn-based alloy layer is desirably 5 to 100 μm. When the thickness is less than 5 μm, it becomes difficult to ensure the wetness of the entire connection portion.

  A fourth invention is to provide a manufacturing method for manufacturing a connection material to be an Al-based alloy layer on a Zn-based alloy layer and a Zn-based alloy layer thereon by clad rolling. As shown in FIG. 3, when the clad rolling is performed using the roller 103, the Zn-based alloy layer 101a and the Al-based alloy layer 102a come into contact with each other, and at the same time, large deformation occurs due to pressure. The oxide film formed on the surface of the layer 102a is broken and is metal-bonded by the new surface. In the clad rolling, no thermal load is applied up to a temperature at which the diffusion of Zn and Al becomes remarkable. Therefore, Al does not diffuse to the surface Zn layer and reach the outermost layer, and good wetting can be obtained at the time of connection.

  A fifth invention is to provide a manufacturing method for manufacturing a connection material to be an Al-based alloy layer on a Zn-based alloy layer and a Zn-based alloy layer thereon by pressure molding. As shown in FIG. 4, when the pressure forming is performed using the pressure forming machine 104, the Zn-based alloy layer 101b and the Al-based alloy layer 102b come into contact with each other, and at the same time, a large deformation occurs due to the pressure. In addition, the oxide film formed on the surface of the Al-based alloy layer 102b is broken and is metal-bonded by the new surface. In pressure molding, if the thermal load is not applied to a temperature at which the diffusion of Zn and Al becomes significant, Al will not diffuse to the surface Zn layer and reach the outermost layer, and good wetting will be obtained at the time of connection. Is possible.

  Hereinafter, embodiments and examples based on the first to fifth inventions described above will be specifically described. Here, a connection material manufactured by clad rolling used mainly for die bonding of semiconductor devices, power semiconductor devices, power modules and the like will be described as an example.

(Embodiment)
FIG. 5 shows a cross section of the connection material in the embodiment of the present invention. The connection material in this embodiment is a Zn-based alloy layer (simply referred to as Zn layer, Zn) 101 from the bottom, an Al-based alloy layer (also simply referred to as Al layer, Al) 102 in the middle, and a Zn-based alloy at the top. The layer (simply referred to as Zn layer, Zn) 101 is formed. As shown in FIG. 3 described above, this connecting material was manufactured by laminating a Zn-based alloy layer 101a, an Al-based alloy layer 102a, and a Zn-based alloy layer 101a, that is, performing clad rolling.

  FIG. 6 shows all of the manufactured connection materials (referred to herein as clad materials). In the clad material 1, the thicknesses of the Zn layer, the Al layer, and the Zn layer are 10, 50, and 10 μm, respectively. The clad material 2 is 20, 50, and 20 μm, and the clad material 3 is 20, 100, and 20 μm.

(Examples 1-12)
In Examples 1 to 12, as shown in FIG. 7, the connection material 10 is used for die bonding of the semiconductor device 11. The semiconductor device 11 includes a semiconductor element 1, a frame 2 connecting the semiconductor element 1, a lead 5 having one end serving as an external terminal, and a wire 4 connecting the other end of the lead 5 and the electrode of the semiconductor element 1. And a resin 6 for sealing the semiconductor element 1 and the wire 4 with resin, and the semiconductor element 1 and the frame 2 are connected by a connecting material 10.

In the manufacture of the semiconductor device 11, the connection material 10 is supplied onto the frame 2 plated with Cu or Ni, Ni / Ag, Ni / Au plating, the semiconductor element 1 is laminated, and then N ₂ while pressing. 400 ° C. for 1 min. Die bonding was performed by heating. The cross section of the connection part in that case is shown in FIG. Between the frame 2 and the Al layer of the connection material 10 is a Zn—Al alloy layer formed by reaction of Zn and Al during connection. The same applies between the semiconductor element 1 and the Al layer of the connection material 10. Thereafter, the semiconductor element 1 and the lead 5 were wire-bonded with a wire 4 and sealed with a sealing resin 6 at 180 ° C.

  Regarding Examples 1 to 12 (using the clad materials 1, 2 and 3 in FIG. 6), wettability during die bonding and connection maintainability after three reflow tests of the semiconductor device at a maximum temperature of 260 ° C. or higher The evaluation results are shown in FIG. Regarding the wettability, the case where 90% or more wetness was obtained with respect to the area of the semiconductor element, the case where it was less than 90% and 75% or more, Δ, and the case where it was less than 75% were evaluated as x. For the reflow test at 260 ° C. (maximum temperature), the case where the connection area after the reflow test was reduced by 5% or more with respect to the connection area before the reflow test was evaluated as “B” when less than 5%.

  As a result of this evaluation, when connecting using connecting materials of clad materials 1, 2, 3 (Zn / Al / Zn), it is 90% or more for Ni, Ni / Ag, Ni / Au plated frames. I got wet. However, it was about 80% wet with respect to the Cu peeled frame, which was Δ. About the reflow test of 260 degreeC, the connection area did not change before and after a test in any case of Examples 1-12.

  On the other hand, in the case of Comparative Examples 1 to 4 using a conventional connection material (Zn-6Al (wt.%), Zn), a strong Al oxide film is formed on the surface of the molten Zn-Al alloy. Therefore, in all cases, the wetness was less than 75% with respect to the frame. In particular, in the case of a Cu-plated or Ni-plated frame, it could hardly be wetted. In Comparative Examples 5 to 8, wetting of 90% or more was obtained by connecting at a temperature of Zn melting point of 420 ° C. or higher. However, the thermal stress caused by the difference in thermal expansion coefficient between the semiconductor element and the Cu frame during cooling after connection cannot be relaxed, and the semiconductor element is destroyed. When the semiconductor device was manufactured and the reflow test was performed for the material that was not damaged, the semiconductor element was broken.

  As described above, according to Examples 1 to 12, when the connection material 10 according to the present embodiment is used for die bonding of the semiconductor device 11, Al is 0.01 wt. Since a Zn-based alloy layer not containing more than 50% is provided on the outermost surface of the Al-based alloy layer, formation of an Al oxide film on the surface of the connection material is suppressed during connection, and good wetting that cannot be obtained with a Zn-Al alloy is obtained. Can do. Further, when the Al-based alloy layer is left after the connection, since the soft Al functions as a stress buffer material, high connection reliability can be obtained.

(Examples 13 to 24)
Examples 13-24 use this connection material 10a as a sealing material of the semiconductor device 21 which needs airtight sealing, as shown in FIG. The semiconductor device 21 includes a semiconductor element 1, a module substrate 23 that connects the semiconductor element 1, a lead 5 having one end serving as an external terminal, and a wire that connects the other end of the lead 5 and the electrode of the semiconductor element 1. 4 and a metal cap 22 that hermetically seals the semiconductor element 1 and the wire 4 and is connected to the module substrate 23. The module substrate 23 and the metal cap 22 are connected by a connection material 10a. In the semiconductor device 21, chip parts and the like are also connected on the module substrate 23.

  In the manufacture of the semiconductor device 21, after connecting the semiconductor element 1 and the chip component to the module substrate 23 with Sn-based lead-free solder 3, or a conductive adhesive, Cu powder / Sn powder composite material, etc., The connection material 10a was placed between the module substrate 23 and the metal cap 22, and the connection was made while applying pressure at 400 ° C.

  As for the metal cap, as shown in FIG. 11, the metal alloy 24 such as Kovar and Invar, the Al-based alloy layer 102 and the Zn-based alloy layer 101 are processed together by clad rolling to perform hermetic sealing. Therefore, the metal cap 22a integrated with the connection material may be used.

  The results of evaluating the wettability during die bonding for Examples 13 to 24 (using the clad materials 1, 2 and 3 in FIG. 6) are shown in FIG. Regarding the wettability, when the wettability capable of maintaining the airtightness with respect to the sealed area was obtained, the case where the airtightness could not be maintained due to ◯, voids, cracks, etc. was evaluated as x.

  As a result of this evaluation, when connecting using connecting materials of clad materials 1, 2, 3 (Zn / Al / Zn), the frame of Ni, Ni / Ag, Ni / Au plating is sufficiently airtight. Sustainable wetting was obtained. However, the Cu peeled frame was evaluated as x due to non-wetting and voids.

  On the other hand, in the case of Comparative Examples 9 to 12 using the conventional connection material (Zn-6Al (wt.%)), A strong Al oxide film is formed on the surface of the molten Zn-Al alloy. It was not wet and could not be hermetically sealed due to voids.

  As described above, according to Examples 13 to 24, by using the connection material 10a in the present embodiment as a sealing material for the semiconductor device 21, formation of an Al oxide film on the surface of the connection material during connection is suppressed. Wetting can be obtained to maintain sufficient airtightness.

  In the semiconductor device 21 as shown in FIG. 10, it is also possible to connect the semiconductor element 1 and the module substrate 23 by using the present connection material 10 instead of the lead-free solder 3, in this case, The effect similar to Examples 1-12 can be acquired.

(Other examples)
In another embodiment, as shown in FIG. 13, the connection material 10b is used as a bump of a semiconductor device 31 that requires flip chip mounting. The semiconductor device 31 includes the semiconductor element 1, and the semiconductor element 1 and a substrate 34 on which the semiconductor element 1 is mounted are connected by a connection material 10b.

  In the manufacture of the semiconductor device 31, the connection material 10 b is composed of a pad obtained by applying Ni or Ni / Au plating 36 to the Cu wiring 35 of the substrate 34, and an electrode obtained by applying Zn plating 33 to the Al wiring 32 of the semiconductor element 1. The connection was made with pressure at 380 ° C.

  Also in other examples, by using the connection material 10b in the present embodiment as a bump of the semiconductor device 31, formation of an Al oxide film on the surface of the connection material is suppressed at the time of connection, and good wetting is obtained. Can do.

  As mentioned above, the invention made by the present inventor has been specifically described based on the embodiment. However, the present invention is not limited to the embodiment, and various modifications can be made without departing from the scope of the invention. Needless to say.

  That is, in the above description, the application of the present invention has been described by taking die bonding of a semiconductor device as an example, but the present invention can be applied to various semiconductor devices as long as the semiconductor device is die bonded. These include, for example, alternator diodes, IGBT modules, front-end modules such as RF modules, automobile power modules, and the like.

  In the above description, the case where the semiconductor device is mounted on the module substrate by reflow is described as an example. However, for example, the present invention can be applied to a case where the semiconductor device is used in an MCM (Multi Chip Module) configuration.

DESCRIPTION OF SYMBOLS 1 ... Semiconductor element, 2 ... Frame, 3 ... Solder, 4 ... Wire, 5 ... Lead, 6 ... Resin for sealing, 7 ... Semiconductor device, 8 ... Void, 10, 10a, 10b ... Connection material, 11 ... Semiconductor device 21 ... Semiconductor device 22, 22a ... Metal cap, 23 ... Module substrate, 24 ... Metal alloy, 31 ... Semiconductor device, 32 ... Al wiring, 33 ... Zn plating, 34 ... Substrate, 35 ... Cu wiring, 36 ... Ni Or Ni / Au plating, 101... Zn-based alloy layer, 102... Al-based alloy layer, 103.

Claims (9)

An Al-based alloy layer and a Zn-based alloy layer provided on the outermost surface of the Al-based alloy layer,
The Zn-based alloy layer has an Al content of 0.01 wt. A connecting material characterized by being less than%. The connection material according to claim 1,
The Al content of the Al-based alloy layer is 99 to 100 wt. The connection material characterized by%. The connection material according to claim 1,
The Zn-based alloy layer has a Zn content of 90 to 100 wt. The connection material characterized by%. The connection material according to claim 1,
The Zn-based alloy layer is provided on each of two opposing outermost surfaces of the Al-based alloy layer. An Al-based alloy layer is stacked on the first Zn-based alloy layer, a second Zn-based alloy layer is stacked on the Al-based alloy layer, and manufactured by clad rolling or pressure forming,
The first Zn-based alloy layer and the second Zn-based alloy layer have a Zn content of 90 to 100 wt. %, And the Al content is 0.01 wt. The manufacturing method of the connection material characterized by being less than%. A semiconductor element;
A frame for connecting the semiconductor elements;
A lead whose one end is an external terminal;
A wire connecting the other end of the lead and the electrode of the semiconductor element;
A resin for resin-sealing the semiconductor element and the wire;
The connection material for connecting the semiconductor element and the frame comprises an Al-based alloy layer and a Zn-based alloy layer provided on the outermost surface of the Al-based alloy layer,
The Zn-based alloy layer has a Zn content of 90 to 100 wt. %, And the Al content of the Zn-based alloy layer is 0.01 wt. A semiconductor device characterized by being less than%. A semiconductor element;
A substrate for connecting the semiconductor elements;
A lead whose one end is an external terminal;
A wire connecting the other end of the lead and the electrode of the semiconductor element;
A metal cap that hermetically seals the semiconductor element and the wire and connects to the substrate;
The connection material for connecting the substrate and the metal cap comprises an Al-based alloy layer and a Zn-based alloy layer provided on the outermost surface of the Al-based alloy layer,
The Zn-based alloy layer has a Zn content of 90 to 100 wt. %, The Zn-based alloy layer has an Al content of 0.01 wt. A semiconductor device characterized by being less than%. The semiconductor device according to claim 7.
The connecting material for connecting the semiconductor element and the substrate is composed of an Al-based alloy layer and a Zn-based alloy layer provided on the outermost surface of the Al-based alloy layer, and the Zn content of the Zn-based alloy layer is 90-100 wt. %, The Zn-based alloy layer has an Al content of 0.01 wt. A semiconductor device characterized by being less than%. Having a semiconductor element,
The connection material for connecting the semiconductor element and the substrate on which the semiconductor element is mounted includes an Al-based alloy layer and a Zn-based alloy layer provided on the outermost surface of the Al-based alloy layer,
The Zn-based alloy layer has a Zn content of 90 to 100 wt. %, The Zn-based alloy layer has an Al content of 0.01 wt. A semiconductor device characterized by being less than%.

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