JP2010175571A - Sample inspection device and sample inspection method - Google Patents

Abstract

[Purpose] To perform pattern inspection capable of eliminating a false image of a measurement image that occurs temporarily.
[Configuration] A measurement image generation unit that measures a pattern of a sample to generate a measurement image and a comparison unit that compares the measurement image with a reference image are provided. The measurement image generation unit includes two or more pixels. It has a light receiving device in which two or more time delay integration sensors using two or more line sensors are connected, and for each pixel of each time delay integration sensor, an average value of pixel values excluding abnormal pixel values is used as a measurement image. Or, the average value of pixel values excluding pixel values exceeding the reference value as abnormal pixel values is used as the measurement image, or the sum of the average value of pixel values and the predetermined value is set as the reference value, and the pixels exceed the reference value. Pixels that have average values of pixel values excluding values as abnormal pixel values as measurement images, or pixels whose absolute value of the difference between the pixel value and the average value of the pixel values of all time delay integration sensors exceeds the reference value Average value of pixel values excluding values as abnormal pixel values The constant image, specimen inspection apparatus.
[Selection] Figure 1

Description

  The present invention relates to inspection of a pattern of a sample, and more particularly to inspection of a defect of a very small pattern such as a photomask, a wafer, or a liquid crystal substrate used when manufacturing a semiconductor element or a liquid crystal display (LCD).

  As represented by a 1 gigabit class DRAM, a pattern constituting a large scale integrated circuit (LSI) is going to be on the order of submicron to nanometer. One of the major causes of a decrease in yield in the manufacture of LSI is a defect of a photomask used when an ultrafine pattern is exposed and transferred onto a semiconductor wafer by a photolithography technique. In particular, with the miniaturization of the pattern dimensions of LSIs formed on semiconductor wafers, the dimensions that must be detected as pattern defects have become extremely small. For this reason, an apparatus for inspecting such a defect has been developed.

  On the other hand, with the development of multimedia, LCDs are becoming larger in size of the liquid crystal substrate to 500 mm × 600 mm or more, and patterns such as TFTs formed on the liquid crystal substrate are being miniaturized. Therefore, it is required to inspect a very small pattern defect over a wide range. For this reason, there is an urgent need to develop a sample inspection apparatus for efficiently inspecting defects of a photomask used in manufacturing such a large area LCD pattern and a large area LCD in a short time.

  With conventional devices, a sensor for acquiring an image of a sample generates a false image that appears to have a minute pattern due to cosmic rays or electrical noise inside the sensor. There is no problem. Therefore, there is a technique for removing the influence of cosmic rays by installing a sensor for detecting the collision of cosmic rays with the sensor (see Patent Document 1), but the apparatus configuration is large and the configuration is complicated, There is a problem that the influence of noise generated inside the sensor remains.

JP-A-5-312955

(1) The present invention resides in accurate pattern inspection of a sample.
(2) Further, the present invention resides in a pattern inspection that can eliminate a false image of a measurement image that occurs temporarily.

(1) In an embodiment of the present invention, a measurement image generation unit that measures a pattern of a sample to generate a measurement image and a comparison unit that compares the measurement image with a reference image are provided. A pixel value obtained by connecting two or more time delay integrating sensors using two or more line sensors composed of two or more pixels and excluding abnormal pixel values for the pixels of each time delay integrating sensor , That is, an average value of pixel values remaining after removing abnormal pixel values is used as a measurement image.
(2) In the embodiment of the present invention, a measurement image generation unit that measures a pattern of a sample to generate a measurement image, and a comparison unit that compares the measurement image with a reference image are provided. It has a light receiving device in which two or more time delay integration sensors using two or more line sensors composed of two or more pixels are connected, and the pixel value exceeding the reference value is abnormal for each pixel of each time delay integration sensor The sample inspection apparatus uses an average value of pixel values excluding pixel values as a measurement image.
(3) The embodiment of the present invention further includes a measurement image generation unit that generates a measurement image by measuring a pattern of a sample, and a comparison unit that compares the measurement image with a reference image. The unit has a light receiving device in which two or more time delay integration sensors using two or more line sensors composed of two or more pixels are connected, and for each pixel of each time delay integration sensor, an average pixel value and a predetermined value The sample inspection apparatus uses a sum of values as a reference value and an average value of pixel values excluding pixel values exceeding the reference value as abnormal pixel values as a measurement image.
(4) In the embodiment of the present invention, a measurement image generation unit that measures a pattern of a sample to generate a measurement image and a comparison unit that compares the measurement image with a reference image are provided. The unit includes a light receiving device in which three or more time delay integration sensors using two or more line sensors each including two or more pixels are connected. For each pixel of each time delay integration sensor, the pixel value and all the time In the sample inspection apparatus, an average value of pixel values obtained by excluding a pixel value whose absolute value of a difference from an average value of pixel values of the delay integration sensor exceeds a reference value as an abnormal pixel value is used as a measurement image.
(5) In the embodiment of the present invention, a measurement image generation unit that measures a pattern of a sample to generate a measurement image and a comparison unit that compares the measurement image with a reference image are provided. The unit has a light receiving device in which three or more time delay integration sensors using two or more line sensors composed of two or more pixels are connected, and the average value of the pixel values is calculated for each time delay integration sensor pixel. The average value difference, which is the absolute value of the difference between the pixel value of the i-th time delay integration sensor and the average value calculated using the pixel values of the 1 to i-1 time delay integration sensors, is the reference value. If the average value of the pixel values of the i-th time delay integration sensor and the pixel values of the 1 to i-1 time delay integration sensors is a new average value, and the difference between the average values is not less than the reference value Do not update the average value as an abnormal pixel value, This processing is repeated for all the pixels of the time delay integration sensor to obtain an average value, and the sample inspection apparatus uses the average value as a measurement image.
(6) In the embodiment of the present invention, a sample image is measured by measuring a pattern of a sample with a light receiving device in which two or more time delay integration sensors using two or more line sensors each including two or more pixels are connected. In the sample inspection method for generating the measurement image and comparing the reference image with the reference image, the average value of the pixel values excluding abnormal pixel values for the pixels of each time delay integration sensor is used as the measurement image. .

(1) The present invention can perform an accurate pattern inspection of a sample.
(2) Further, the present invention can perform pattern inspection that can eliminate a false image of a measurement image that occurs temporarily.

It is a block diagram for demonstrating the sample inspection apparatus and sample inspection method in embodiment. It is a conceptual diagram which shows the internal structure of the sample inspection apparatus in embodiment. It is a figure for demonstrating the acquisition procedure of a measurement image. It is a figure explaining the effect | action of the light-receiving part which has a some time delay integration sensor. It is a figure explaining the light reception process of a time delay integration sensor. It is explanatory drawing which discards a false image and acquires a measurement image. It is explanatory drawing which discards a false image and acquires a measurement image by making the sum of an average value and a predetermined value into a reference value. It is explanatory drawing which discards a false image and acquires a measurement image by making the sum of an average value and a predetermined value into a reference value. It is explanatory drawing which obtains a measurement image by discarding a fake image by sequentially comparing the difference between the average value and the measurement value with a reference value to obtain an average value.

Hereinafter, the details of the present invention will be described with reference to embodiments.
(Basic configuration of sample inspection)
FIG. 1 is a block diagram illustrating a sample inspection apparatus and a sample inspection method according to an embodiment of the present invention. The sample inspection apparatus 10 inspects a pattern 12 of a sample such as a photomask, a wafer, or a liquid crystal substrate. The sample inspection apparatus 10 eliminates the influence of a false image of an output image that is locally and temporarily generated due to radiation such as cosmic rays or electrical noise inside the sensor. And the pattern 12 of the sample is inspected. The sample inspection apparatus 10 measures the transmitted light and reflected light of the pattern 12 of the sample with the measurement image generation unit 14 and generates one or both of the transmitted image and the reflected image. The sample inspection apparatus 10 processes the design data 20 of the sample pattern by the reference image generation unit 22 to generate a reference image similar to the measurement image.

  The sample inspection apparatus 10 includes a comparison unit 24. The measurement image generation unit 14 compares the measurement image from which the false image is excluded with the reference image, and if the difference exceeds a predetermined value, the measurement image defect is detected. Determine. The comparison unit 24 uses the reference image generated by the reference image generation unit 22 as a standard image, performs a D-DB comparison with the measurement image from which the false image is excluded, or on the same sample generated by the measurement image generation unit 14 A measurement image from which the same pattern at different locations is imaged and the false image is eliminated is used as a reference image, and a DD comparison is made with the measurement image from which the false image is eliminated.

(Measurement image generator)
The measurement image generation unit 14 includes a light receiving device 30, a false image removal unit 40, and the like. As shown in FIG. 4, the light receiving device 30 includes a light receiving unit in which a plurality of time delay integrating sensors 32 are connected. The time delay integration sensor (TDI sensor) 32 uses a photodiode array, a CCD light receiving element, or the like, and is a sensor that integrates carriers (charges) by the number of integration stages in the traveling direction. The time delay integration sensor 32 can improve sensitivity in proportion to the number of stages, and can reduce noise such as variations in elements and fluctuations in illumination brightness. The false image removal unit 40 performs an arithmetic process such as comparison of the output value of the image received by each time delay integration sensor 32 with a reference value, calculation of an average value, and the like, which is not normally detected from the intensity of light. A large output value, that is, an abnormal pixel value exceeding a reference value, that is, a false image is removed. Here, the reference value is obtained in consideration of a large output value that is not normally detected or in consideration of values obtained by various arithmetic processes such as an average value of all output values.

(Sample inspection equipment)
FIG. 2 is a conceptual diagram showing the internal configuration of the sample inspection apparatus 10. The sample inspection apparatus 10 inspects a pattern defect of the sample 100 using a substrate such as a mask or a wafer as the sample 100. The sample inspection apparatus 10 includes an optical image acquisition unit 110, a control system circuit 150, and the like. The optical image acquisition unit 110 receives an autoloader 112, an illumination device 114 that generates illumination light, an XYθ table 116, an XYθ motor 118, a laser length measurement system 120, an enlargement optical system 122, a piezo element 124, transmitted light and reflected light. A light receiving device 30 having a time delay integration sensor 32 such as a CCD or a photodiode array, a false image removing unit 40, a sensor circuit 128, and the like are provided. In the control system circuit 150, a CPU 152 serving as a control computer is connected to a mass storage device 156, a memory device 158, a display device 160, a printing device 162, an autoloader control circuit 170, a table control circuit via a bus 154 serving as a data transmission path. 172, an autofocus control circuit 174, a development circuit 176, a reference circuit 178, a comparison circuit 180, a position circuit 182 and the like. The false image removing unit 40 may be disposed in the sensor circuit 128. Further, the expansion circuit 176, the reference circuit 178, the comparison circuit 180, and the position circuit 182 are connected to each other as shown in FIG.

  The measurement image generation unit 14 in FIG. 1 can be configured by the optical image acquisition unit 110 in FIG. The reference image generation unit 22 can be configured by a development circuit 176 and a reference circuit 178. The comparison unit 24 can be configured by the comparison circuit 180. In FIG. 2, description of components other than those necessary for describing the present embodiment is omitted. The sample inspection apparatus 10 usually includes other necessary configurations.

(Operation of optical image acquisition unit)
The sample 100 is automatically transported from the autoloader 112 driven by the autoloader control circuit 170 and placed on the XYθ table 116. The sample 100 is irradiated with light from above in order to obtain transmitted light by the illumination device 114, and is irradiated with light from below in order to obtain reflected light, although not shown. Below the sample 100, an magnifying optical system 122, a light receiving device 30, a false image removing unit 40, and a sensor circuit 128 are arranged. The light transmitted through or reflected by the sample 100 such as an exposure mask forms an optical image on the light receiving device 30 via the magnifying optical system 122. The autofocus control circuit 174 controls the piezo element 124 to absorb the deflection of the sample 100 and fluctuations in the Z-axis direction (perpendicular to the X-axis and Y-axis) of the XYθ table 116, and focus on the sample 100. Align.

  FIG. 3 is a diagram for explaining a measurement image acquisition procedure. The inspection area of the sample 100 is virtually divided by the scan width W in the Y-axis direction. That is, the inspection area is virtually divided into a plurality of strip-like stripes 102 having a scan width W. Further, the XYθ table 116 is controlled so that the divided stripes 102 are continuously scanned. The XYθ table 116 moves along the X axis, and the measurement image is acquired as the stripe 102. In FIG. 3, the stripe 102 has a rectangular shape having a scan width W in the Y-axis direction and a longitudinal direction having a length in the X-axis direction. The light transmitted through the sample 100 or the light reflected by the sample 100 enters the light receiving device 30 via the magnifying optical system 122. On the light receiving device 30, a part of a strip-shaped region of a virtually divided pattern as shown in FIG. 3 is formed as an enlarged optical image. Images with a scan width W as shown in FIG. 3 are continuously received. After acquiring the image in the first stripe 102, the light receiving device 30 continuously inputs the image having the scan width W while moving the image in the second stripe 102 in the opposite direction. When acquiring the image in the third stripe 102, the image is acquired while moving in the direction opposite to the direction in which the image in the second stripe 102 is acquired, that is, in the direction in which the image in the first stripe 102 is acquired. To do. The scan width W is about 2048 pixels, for example.

  The XYθ table 116 is driven by the table control circuit 172 under the control of the CPU 152. It can be moved by a drive system such as a three-axis (XY-θ) motor 118 that drives in the X-axis direction, the Y-axis direction, and the θ-direction. For example, step motors can be used as these X motor, Y motor, and θ motor. The movement position of the XYθ table 116 is measured by the laser length measurement system 120 and supplied to the position circuit 182. The light receiving device 30 acquires electronic data of the same pattern by a plurality of time delay integration sensors 32. The false image removal unit 40 uses the electronic data of the same pattern of each time delay integration sensor to eliminate false images caused by cosmic rays or electrical noise. The sensor circuit 128 outputs electronic data of the optical image from which the false image is excluded as a measurement image. The measurement image output from the sensor circuit 128 is sent to the comparison circuit 180 together with data indicating the position of the sample 100 on the XYθ table 116 output from the position circuit 182. The sample 100 on the XYθ table 116 is automatically discharged by the autoloader control circuit 170 after the inspection is completed. Note that the measurement image is, for example, 8-bit unsigned data, and represents the brightness gradation of each pixel.

(Pattern reception procedure with time delay integration sensor)
FIG. 4 shows a light receiving device 30 in which three first to third time delay integration sensors 32a, 32b, and 32c are connected. Each time delay integration sensor includes six stages of line sensors 34a to 34f in FIG. 4, but includes a number of line sensors 34 such as 256 stages and 512 stages. Each of the line sensors 34a to 34f has ten pixels 36 in the horizontal direction in FIG. 4, but includes a large number of pixels 36 such as 1024 and 2048, for example. Each of the first to third time delay integration sensors 32 a to 32 c includes first to third buffer memories 38 a to 38 c, and discharges the carrier generated by the time delay integration sensor 32 to the buffer memory 38. The buffer memory 38 temporarily holds image information received by the time delay integration sensor 32.

  As an example in which the light receiving device 30 receives the pattern of the sample 100, the light of the sample pattern A is projected while moving upward from below the light receiving device 30, as shown in FIG. At that time, each of the time delay integration sensors 32a to 32c of the light receiving device 30 receives the pattern A and moves the generated carrier upward. The carrier that has reached the upper end is discharged to the buffer memories 38a to 38c corresponding to the time delay integration sensors 32a to 32c. The first time delay integration sensor 32a receives the pattern A earlier than the other time delay integration sensors and discharges it to the first buffer memory 38a, and the second time delay integration sensor 32b then receives the pattern A and receives the first pattern A. The third time delay integration sensor 32c finally receives the pattern A and discharges it to the third buffer memory 38c.

  FIG. 5 shows steps S1 to S5 in which one time delay integration sensor 32 having five line sensors 34a to 34e receives the pattern A. Step S1 shows a state in which the first line sensor 34a receives the pattern at the upper end of the pattern A and accumulates an amount of carriers (charges) corresponding to the amount of received light. Step S2 shows a state in which the carriers accumulated by the first line sensor 34a are transferred to the second line sensor 34b. In FIG. 5, the thickness of the line is increased as the pattern having a larger amount of received light.

  In step S3, the second line sensor 34b receives the pattern at the upper end of the pattern A, the first line sensor 34a receives the pattern slightly below the upper end of the pattern A, and accumulates an amount of carriers according to the amount of received light. Indicates the state. Therefore, the upper end of the pattern A of the second line sensor 34b indicates that the accumulation of carriers is increasing. The pattern slightly lower than the upper end of the pattern A of the first line sensor 34a indicates that the accumulation of carriers is not more than the upper end. Step S4 shows a state in which the carriers accumulated by the second line sensor 34b are transferred to the third line sensor 34c, and the carriers accumulated by the first line sensor 34a are transferred to the second line sensor 34b.

  In step S5, the third line sensor 34c receives light at the upper end of the pattern A, the second line sensor 34b receives a pattern slightly lower than the upper end of the pattern A, and the first line sensor 34a receives from the upper end of the pattern A. Furthermore, the lower pattern is received, and the amount of carriers corresponding to the amount of received light is accumulated. Therefore, the upper end of the pattern A of the third line sensor 34c has a larger amount of accumulated carriers, and the pattern slightly lower than the upper end of the pattern A of the second line sensor 34b has a larger amount of accumulated carriers. A pattern further below the upper end of the pattern A shows a state where the accumulation of carriers is small.

  As described above, the time delay integration sensor 32 accumulates the pattern image of the sample with the passage of time, so even if a temporary false image such as cosmic rays or electrical noise occurs in the sensor, the influence is reduced. However, in the present embodiment, by using a plurality of time delay integration sensors 32, it is possible to remove the influence of the temporarily generated false image.

(Reference image generation)
The design data 20 used when forming the pattern of the sample 100 is stored in the mass storage device 156. The design data 20 is input from the mass storage device 156 to the expansion circuit 176 by the CPU 152. As a design data development process, the development circuit 176 converts the design data of the sample 100 into binary or multivalued original image data, and the original image data is sent to the reference circuit 178. The reference circuit 178 performs an appropriate filter process on the original image data to generate a reference image. It can be said that the measurement image obtained from the sensor circuit 128 is in a state in which a filter is applied due to the resolution characteristics of the magnifying optical system 122, the aperture effect of the light receiving device 30, and the like. In this state, since there is a difference between the measurement image and the original image data on the design side, the original image data on the design side can be filtered by the reference circuit 178 to match the measurement image.

(First embodiment)
FIG. 6 shows the first embodiment of the inspection of the pattern of the sample, and shows the relationship between the light receiving device 30 and the false image removing unit 40. The light receiving device 30 uses two or more time delay integration sensors 32 using two or more stages of line sensors, and here, N time delay integration sensors 32a, 32b,. -32n is shown. As shown in FIG. 5, the time delay integration sensor 32 accumulates the measurement data while transferring the measurement data in synchronization with the movement of the pattern A of the sample. Since noise due to cosmic rays or the like is generally temporarily generated for local pixels, the false image removal unit 40 calculates and removes the output value of the abnormal luminance to obtain a measurement image. By performing the inspection as a measurement image corresponding to the pattern of the sample to be measured, it is possible to perform a highly sensitive inspection without being influenced by the false image. As an example of this removal processing, in the case of a light receiving device 30 in which N time delay integration sensors 32 using n stage line sensors 34 are connected, noise due to cosmic rays appearing in each time delay integration sensor 32 is n × N. Since it appears N times as compared with one time delay integration sensor using a stage line sensor, as shown in FIG. 6, the time delay integration sensor 32 whose output value is equal to or less than a predetermined reference value is shown. By calculating the average value of the set and inspecting this as a measurement image corresponding to the pattern of the sample to be measured, high-sensitivity inspection is possible without being affected by the false image. The reference value is determined in consideration of a value that is not normally measured from the intensity of light, and is, for example, about 240 gradations.

  Specifically, in the false image removal unit 40, the output value (pixel value) of each pixel 36 of the first time delay integration sensor 32a is compared with a reference value, and if it exceeds the reference value, it is determined as a false image, Discarded. Similarly, for the second to Nth time delay integration sensors (TDI2 to TDIN) 32b to 32n, it is determined whether or not each output value is equal to or less than a reference value (step S10). Pixel values that are not less than the reference value are discarded as false images (step S11). Pixel values below the reference value are summed and calculated as an average value (step S12). The average value is sent to the comparison unit 24 as a measurement image that does not include a false image, and is compared with a reference image to inspect for the presence or absence of a defect (step S13).

(Second Embodiment)
FIG. 7 shows a second embodiment, using two or more time delay integration sensors 32 using two or more stages of line sensors 34, and integrating all time delay integrations to a predetermined value specified in advance. What added the average value of the output of the sensor 32 is used as a reference value. In the first embodiment, for each output value of each sensor, one reference value is used as a reference to determine whether to use it as measurement pattern data. However, noise due to cosmic rays or the like is generally an output value. Therefore, a value obtained by adding the average value of the outputs of all the time delay integration sensors 32 to a predetermined value designated in advance is used as a reference value. The output image used for the inspection is used as a measurement image by calculating the average value of the set of time delay integration sensors 32 that is equal to or less than the reference value. Thereby, a false image can be eliminated more precisely. The predetermined value is set in consideration of the stability of the output characteristics of the time delay integration sensor 32, and is set to about 20 gradations, for example. Thereby, it is possible to remove noise caused by cosmic rays having energy smaller than that of the first embodiment.

  Specifically, in the false image removal unit 40, first, an average value of output values of the respective pixels 36 of the first to Nth time delay integration sensors (TDI1 to TDIN) 32a to 32n is calculated (step S20). The sum of the calculated average value and a predetermined value is obtained and used as a reference value, which is compared with the output value of each pixel of the first to Nth time delay integration sensors (step S21). If it exceeds the reference value, it is determined to be a false image and discarded (step S22). Pixel values below the reference value are summed and calculated as an average value (step S23). The average value is sent to the comparison unit 24 as a measurement image that does not include a false image, and is compared with a reference image to inspect for the presence or absence of a defect (step S13).

(Third embodiment)
FIG. 8 shows a third embodiment, in which three or more time delay integration sensors 32 using two or more line sensors 34 are connected. When the absolute value of the difference between the output values of all the time delay integration sensors 32 and the output values of the individual time delay integration sensors 32 exceeds a preset reference value, the output values are discarded. The average value of the other output values of the time delay integration sensor 32 is used as the measurement image. Thus, when the number of time delay integration sensors 32 affected by noise is less than half, noise can be removed by majority vote. This reference value is, for example, about 20 gradations.

  Specifically, in the false image removal unit 40, first, an average value of output values of the pixels 36 of the first to Nth time delay integration sensors (TDI1 to TDIN) 32a to 32n is calculated (step S30). The absolute value of the difference between the calculated average value and the output value of each pixel of each time delay integration sensor is calculated and compared with a reference value given in advance (step S31). If it is not less than the reference value, it is determined to be a false image and discarded (step S32). Pixel values below the reference value are summed and calculated as an average value (step S33). The average value is sent to the comparison unit 24 as a measurement image that does not include a false image, and is compared with a reference image to inspect for the presence or absence of a defect (step S13).

(Fourth embodiment)
FIG. 9 shows a fourth embodiment, in which three or more time delay integration sensors using two or more line sensors 34 are connected. In the second and third embodiments, the average value of the plurality of time delay integration sensors 32 is calculated and then compared with the output value of each individual time delay integration sensor 32. In the embodiment, as shown in FIG. 9, in the N time delay integration sensors (1, 2,..., I,..., N), the output value of the i-th time delay integration sensor 32 and 1 to i. If the absolute value of the difference (hereinafter referred to as the average value difference) is not lower than a predetermined reference value specified in advance, the i th The output value of the time delay integration sensor 32 is discarded. When the average value difference is lower than the reference value, the output value of the i-th time delay integration sensor 32 is added to update the average value. This process is executed from the output value of the second time delay integration sensor 32 to the last Nth time delay integration sensor 32 in order. As a result, the first average value calculation process in the second and third embodiments can be omitted, and a more effective inspection can be performed without waiting until the pixel values from all the time delay integration sensors 32 are output. It can be carried out. The reference value is set in consideration of the stability of the output characteristics of all the time delay integration sensors 32 of the light receiving device 30, and is set to about 20 gradations, for example.

  Specifically, in the false image removal unit 40, first, as an initialization process, the pointer i = 2 is set, and the average value = the output value of the first time delay integration sensor 32 is set (step S40). Next, the output value of the second (i = 2) time delay integration sensor 32 is read (step S41) and compared with the average value. When the average value difference is not lower than the reference value (step S42), The output value of the second sensor is discarded (step S43). When the average value difference is lower than the reference value (step S42), the output value of the second time delay integration sensor 32 is added to update the average value (step S44). Next, it is checked whether or not the time delay integration sensor 32 is the last one (step S45). If it is not the last time delay integration sensor, 1 is added to the pointer i (step S46). The output image of the next time delay integration sensor 32 is read (step S41), the same processing is performed, and the process is executed up to the last time delay integration sensor 32. The finally obtained average value is sent to the comparison unit 24 as a measurement image that does not include a false image, and is compared with a reference image to inspect for the presence or absence of defects (step S13).

  The embodiments have been described above with reference to specific examples. As shown in these embodiments, image quality degradation due to false images caused by cosmic rays or electrical noise inside the sensor affects the detection sensitivity of defects when inspecting a sample, so the sensitivity is increased. Therefore, it is important to perform inspection using a sensor that does not output a false image. Therefore, it is possible to detect false images caused by cosmic rays incident on the sensor and electrical noise generated inside the sensor, and by removing them from the accumulated data, it is possible to suppress false defects caused by noise and to perform inspection with high detection sensitivity. it can. The inspection in these embodiments is performed on all pixels of the measurement image, or only the pixels requiring particularly high precision are performed as necessary, or only on the pixels having a high probability of generating a false image. You may go.

  In the above description, what is described as “to part”, “to circuit” or “to process” and “to step” can be configured by a computer-operable program. Or you may make it implement by not only the program used as software but the combination of hardware and software. Alternatively, a combination with firmware may be used. Alternatively, a combination of these may be realized. When configured by a program, the program is recorded on a recording medium such as a magnetic disk device, a magnetic tape device, an FD, or a ROM (Read Only Memory).

  The present invention is not limited to the specific examples described above. In each embodiment, the inspection position is scanned by moving the XYθ table 116. However, the XYθ table 116 may be fixed and other optical systems may be moved. That is, relative movement may be performed. In addition, although descriptions of parts that are not directly necessary for the description of the present invention, such as the device configuration and control method, are omitted, the required device configuration and control method can be appropriately selected and used. In addition, all sample inspection apparatuses that include the elements of the present invention and whose design can be appropriately changed by those skilled in the art are included in the scope of the present invention.

DESCRIPTION OF SYMBOLS 10 ... Sample inspection apparatus 12 ... Sample pattern 14 ... Measurement image generation part 20 ... Sample pattern design data 22 ... Reference image generation part 24 ... Comparison part 30 ... Light receiving device 32 ... time delay integration sensor (TDI)
34... Line sensor 36... Pixel 38... Buffer memory 40... False image removal unit 100 .. sample 102 .. stripe 110 .. optical image acquisition unit 112 .. autoloader 114. 1140 ・ Reflective lighting device 116 ・ XY-theta table 118 ・ XY-motor 120 ・ Laser measurement system 122 ・ Magnification optical system 124 ・ Piezo element 128 ・ ・ Sensor circuit 140 ・ ・ Fake image removal unit 150 ・ ・ Control system Circuit 152 ... CPU
154 ·· Bus 156 · · Mass storage device 158 · · Memory device 160 · · Display device 162 · · Printing device 170 · · Autoloader control circuit 172 · · Table control circuit 174 · · Autofocus control circuit 176 · · Expansion circuit 178 .. Reference circuit 180 .. Comparison circuit 182 .. Position circuit

Claims (5)

A measurement image generator for measuring a pattern of the sample to generate a measurement image;
A comparison unit that compares the measurement image with the reference image,
The measurement image generator has a light receiving device in which two or more time delay integration sensors using two or more line sensors composed of two or more pixels are connected, and the pixel value integrated and output by each time delay integration sensor A sample inspection apparatus using an average value of pixel values obtained by removing an abnormal pixel value from the measurement image as a measurement image. The sample inspection apparatus according to claim 1,
The measurement image generation unit is an average value of pixel values obtained by removing, as the abnormal pixel value, a pixel value exceeding a reference value of a preset pixel value from pixel values integrated and output by each time delay integration sensor A sample inspection apparatus using the measurement image as the measurement image. The sample inspection apparatus according to claim 1,
The measurement image generation unit uses the average value of pixel values integrated and output by each time delay integration sensor as a reference value, and outputs the reference value from among the pixel values integrated and output by each time delay integration sensor. A sample inspection apparatus in which an average value of pixel values obtained by excluding pixel values exceeding a value as the abnormal pixel value is used as the measurement image. The sample inspection apparatus according to claim 1,
The measurement image generation unit has a light receiving device in which three or more time delay integration sensors using two or more line sensors composed of two or more pixels are connected, and the pixel value integrated and output by each time delay integration sensor And each time delay integration with a pixel value whose absolute value of the difference between the average value of the pixel values integrated and output by all the time delay integration sensors exceeds a preset reference value of the pixel value as the abnormal pixel value A sample inspection apparatus in which an average value of pixel values excluded from pixel values integrated and output by a sensor is used as the measurement image. A measurement image is generated by measuring a pattern of a sample with a light receiving device in which two or more time delay integration sensors using two or more line sensors each including two or more pixels are connected, and the measurement image and a reference image are compared. In the sample inspection method,
A sample inspection method in which an average value of pixel values obtained by removing abnormal pixel values from pixel values integrated and output by each time delay integration sensor is used as a measurement image.

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