JP2010260883A - Copolymer, resin composition containing the copolymer, and cured product thereof - Google Patents
Copolymer, resin composition containing the copolymer, and cured product thereof Download PDFInfo
- Publication number
- JP2010260883A JP2010260883A JP2009110298A JP2009110298A JP2010260883A JP 2010260883 A JP2010260883 A JP 2010260883A JP 2009110298 A JP2009110298 A JP 2009110298A JP 2009110298 A JP2009110298 A JP 2009110298A JP 2010260883 A JP2010260883 A JP 2010260883A
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- JP
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- Prior art keywords
- group
- copolymer
- monomer
- weight
- resin composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920001577 copolymer Polymers 0.000 title claims abstract description 72
- 239000011342 resin composition Substances 0.000 title claims description 34
- 239000000178 monomer Substances 0.000 claims abstract description 133
- 229920002554 vinyl polymer Polymers 0.000 claims abstract description 62
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims abstract description 60
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract description 31
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims abstract description 16
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 8
- 125000001183 hydrocarbyl group Chemical group 0.000 claims abstract 3
- -1 vinyl compound Chemical class 0.000 claims description 51
- 239000002981 blocking agent Substances 0.000 claims description 22
- 239000000203 mixture Substances 0.000 claims description 21
- 150000001875 compounds Chemical class 0.000 claims description 16
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 claims description 14
- 239000003505 polymerization initiator Substances 0.000 claims description 14
- 125000000217 alkyl group Chemical group 0.000 claims description 13
- 239000004593 Epoxy Substances 0.000 claims description 8
- 125000001931 aliphatic group Chemical group 0.000 claims description 7
- 239000000463 material Substances 0.000 claims description 6
- 125000000962 organic group Chemical group 0.000 claims description 4
- 239000003822 epoxy resin Substances 0.000 claims description 3
- 229920000647 polyepoxide Polymers 0.000 claims description 3
- 229930195734 saturated hydrocarbon Natural products 0.000 claims description 3
- 125000004191 (C1-C6) alkoxy group Chemical group 0.000 claims description 2
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 claims description 2
- 238000012719 thermal polymerization Methods 0.000 claims description 2
- 239000002904 solvent Substances 0.000 abstract description 38
- 239000000758 substrate Substances 0.000 abstract description 13
- 238000010521 absorption reaction Methods 0.000 abstract description 9
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 abstract description 6
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 31
- 238000001723 curing Methods 0.000 description 25
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 21
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 18
- 239000000243 solution Substances 0.000 description 18
- 150000002430 hydrocarbons Chemical group 0.000 description 16
- 238000012360 testing method Methods 0.000 description 16
- 239000011248 coating agent Substances 0.000 description 15
- 238000006116 polymerization reaction Methods 0.000 description 15
- 238000000576 coating method Methods 0.000 description 13
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 12
- 239000007787 solid Substances 0.000 description 12
- 239000003795 chemical substances by application Substances 0.000 description 11
- CYOAEBLVGSUAKP-UHFFFAOYSA-N 2-(4-ethenylphenyl)acetic acid Chemical group OC(=O)CC1=CC=C(C=C)C=C1 CYOAEBLVGSUAKP-UHFFFAOYSA-N 0.000 description 10
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 10
- 230000000052 comparative effect Effects 0.000 description 10
- 239000010419 fine particle Substances 0.000 description 10
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 description 9
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 9
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 9
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 9
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- 239000003054 catalyst Substances 0.000 description 9
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 9
- 238000000034 method Methods 0.000 description 9
- 229920000642 polymer Polymers 0.000 description 9
- 239000000126 substance Substances 0.000 description 9
- CRQSAKXMWFFXJG-UHFFFAOYSA-N 2-[(4-ethenylphenyl)methyl]oxirane Chemical compound C1=CC(C=C)=CC=C1CC1OC1 CRQSAKXMWFFXJG-UHFFFAOYSA-N 0.000 description 8
- LMJUROWCZGLHNG-UHFFFAOYSA-N 2-[2-(4-ethenylphenyl)ethyl]oxirane Chemical compound C1=CC(C=C)=CC=C1CCC1OC1 LMJUROWCZGLHNG-UHFFFAOYSA-N 0.000 description 8
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 8
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 8
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 8
- 150000001983 dialkylethers Chemical class 0.000 description 8
- 150000001346 alkyl aryl ethers Chemical class 0.000 description 7
- 125000003700 epoxy group Chemical group 0.000 description 7
- 230000005855 radiation Effects 0.000 description 7
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 6
- 239000002253 acid Substances 0.000 description 6
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 6
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 6
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 6
- 239000011521 glass Substances 0.000 description 6
- 229930195733 hydrocarbon Natural products 0.000 description 6
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 6
- 150000003254 radicals Chemical class 0.000 description 6
- 239000007818 Grignard reagent Substances 0.000 description 5
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 5
- 150000008065 acid anhydrides Chemical class 0.000 description 5
- 125000003545 alkoxy group Chemical group 0.000 description 5
- 125000002947 alkylene group Chemical group 0.000 description 5
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 5
- 150000004795 grignard reagents Chemical class 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 5
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 4
- 239000004215 Carbon black (E152) Substances 0.000 description 4
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 4
- 150000001412 amines Chemical class 0.000 description 4
- 235000019437 butane-1,3-diol Nutrition 0.000 description 4
- WQAQPCDUOCURKW-UHFFFAOYSA-N butanethiol Chemical compound CCCCS WQAQPCDUOCURKW-UHFFFAOYSA-N 0.000 description 4
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 4
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 4
- 125000004112 carboxyamino group Chemical group [H]OC(=O)N([H])[*] 0.000 description 4
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 4
- 238000011156 evaluation Methods 0.000 description 4
- 235000011187 glycerol Nutrition 0.000 description 4
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- KQNPFQTWMSNSAP-UHFFFAOYSA-N isobutyric acid Chemical compound CC(C)C(O)=O KQNPFQTWMSNSAP-UHFFFAOYSA-N 0.000 description 4
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 4
- 150000002923 oximes Chemical class 0.000 description 4
- 125000001820 oxy group Chemical class [*:1]O[*:2] 0.000 description 4
- 239000005011 phenolic resin Substances 0.000 description 4
- 229920001515 polyalkylene glycol Polymers 0.000 description 4
- 150000003839 salts Chemical class 0.000 description 4
- 150000005846 sugar alcohols Polymers 0.000 description 4
- DNIAPMSPPWPWGF-VKHMYHEASA-N (+)-propylene glycol Chemical compound C[C@H](O)CO DNIAPMSPPWPWGF-VKHMYHEASA-N 0.000 description 3
- YPFDHNVEDLHUCE-UHFFFAOYSA-N 1,3-propanediol Substances OCCCO YPFDHNVEDLHUCE-UHFFFAOYSA-N 0.000 description 3
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 3
- LCZVSXRMYJUNFX-UHFFFAOYSA-N 2-[2-(2-hydroxypropoxy)propoxy]propan-1-ol Chemical compound CC(O)COC(C)COC(C)CO LCZVSXRMYJUNFX-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 3
- 239000004202 carbamide Substances 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 3
- 239000012986 chain transfer agent Substances 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 3
- SZXQTJUDPRGNJN-UHFFFAOYSA-N dipropylene glycol Chemical compound OCCCOCCCO SZXQTJUDPRGNJN-UHFFFAOYSA-N 0.000 description 3
- 239000012776 electronic material Substances 0.000 description 3
- 239000000835 fiber Substances 0.000 description 3
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 3
- 150000002334 glycols Chemical class 0.000 description 3
- 125000004836 hexamethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[*:1] 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 239000003999 initiator Substances 0.000 description 3
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 3
- 239000011777 magnesium Substances 0.000 description 3
- 229910052749 magnesium Inorganic materials 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- WWZKQHOCKIZLMA-UHFFFAOYSA-M octanoate Chemical compound CCCCCCCC([O-])=O WWZKQHOCKIZLMA-UHFFFAOYSA-M 0.000 description 3
- 239000003973 paint Substances 0.000 description 3
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- 150000004714 phosphonium salts Chemical class 0.000 description 3
- 230000000704 physical effect Effects 0.000 description 3
- 229920001223 polyethylene glycol Polymers 0.000 description 3
- 229920000166 polytrimethylene carbonate Polymers 0.000 description 3
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 229910001220 stainless steel Inorganic materials 0.000 description 3
- 239000010935 stainless steel Substances 0.000 description 3
- 150000003512 tertiary amines Chemical class 0.000 description 3
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 3
- DTGKSKDOIYIVQL-WEDXCCLWSA-N (+)-borneol Chemical group C1C[C@@]2(C)[C@@H](O)C[C@@H]1C2(C)C DTGKSKDOIYIVQL-WEDXCCLWSA-N 0.000 description 2
- GRWFGVWFFZKLTI-IUCAKERBSA-N (-)-α-pinene Chemical compound CC1=CC[C@@H]2C(C)(C)[C@H]1C2 GRWFGVWFFZKLTI-IUCAKERBSA-N 0.000 description 2
- LTVUCOSIZFEASK-MPXCPUAZSA-N (3ar,4s,7r,7as)-3a-methyl-3a,4,7,7a-tetrahydro-4,7-methano-2-benzofuran-1,3-dione Chemical compound C([C@H]1C=C2)[C@H]2[C@H]2[C@]1(C)C(=O)OC2=O LTVUCOSIZFEASK-MPXCPUAZSA-N 0.000 description 2
- PMBXCGGQNSVESQ-UHFFFAOYSA-N 1-Hexanethiol Chemical compound CCCCCCS PMBXCGGQNSVESQ-UHFFFAOYSA-N 0.000 description 2
- GQHTUMJGOHRCHB-UHFFFAOYSA-N 2,3,4,6,7,8,9,10-octahydropyrimido[1,2-a]azepine Chemical compound C1CCCCN2CCCN=C21 GQHTUMJGOHRCHB-UHFFFAOYSA-N 0.000 description 2
- BTJPUDCSZVCXFQ-UHFFFAOYSA-N 2,4-diethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC(CC)=C3SC2=C1 BTJPUDCSZVCXFQ-UHFFFAOYSA-N 0.000 description 2
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 2
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 2
- WADSJYLPJPTMLN-UHFFFAOYSA-N 3-(cycloundecen-1-yl)-1,2-diazacycloundec-2-ene Chemical compound C1CCCCCCCCC=C1C1=NNCCCCCCCC1 WADSJYLPJPTMLN-UHFFFAOYSA-N 0.000 description 2
- URDOJQUSEUXVRP-UHFFFAOYSA-N 3-triethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CCO[Si](OCC)(OCC)CCCOC(=O)C(C)=C URDOJQUSEUXVRP-UHFFFAOYSA-N 0.000 description 2
- XDQWJFXZTAWJST-UHFFFAOYSA-N 3-triethoxysilylpropyl prop-2-enoate Chemical compound CCO[Si](OCC)(OCC)CCCOC(=O)C=C XDQWJFXZTAWJST-UHFFFAOYSA-N 0.000 description 2
- FYYIUODUDSPAJQ-UHFFFAOYSA-N 7-oxabicyclo[4.1.0]heptan-4-ylmethyl 2-methylprop-2-enoate Chemical compound C1C(COC(=O)C(=C)C)CCC2OC21 FYYIUODUDSPAJQ-UHFFFAOYSA-N 0.000 description 2
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 2
- 238000003747 Grignard reaction Methods 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- LSDPWZHWYPCBBB-UHFFFAOYSA-N Methanethiol Chemical compound SC LSDPWZHWYPCBBB-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- FZERHIULMFGESH-UHFFFAOYSA-N N-phenylacetamide Chemical compound CC(=O)NC1=CC=CC=C1 FZERHIULMFGESH-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- WTKZEGDFNFYCGP-UHFFFAOYSA-N Pyrazole Chemical compound C=1C=NNC=1 WTKZEGDFNFYCGP-UHFFFAOYSA-N 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 239000007983 Tris buffer Substances 0.000 description 2
- FYYIUODUDSPAJQ-XVBQNVSMSA-N [(1S,6R)-7-oxabicyclo[4.1.0]heptan-3-yl]methyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC1CC[C@H]2O[C@H]2C1 FYYIUODUDSPAJQ-XVBQNVSMSA-N 0.000 description 2
- IPTNXMGXEGQYSY-UHFFFAOYSA-N acetic acid;1-methoxybutan-1-ol Chemical compound CC(O)=O.CCCC(O)OC IPTNXMGXEGQYSY-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 125000002723 alicyclic group Chemical group 0.000 description 2
- 125000005370 alkoxysilyl group Chemical group 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 2
- UAHWPYUMFXYFJY-UHFFFAOYSA-N beta-myrcene Chemical compound CC(C)=CCCC(=C)C=C UAHWPYUMFXYFJY-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000003638 chemical reducing agent Substances 0.000 description 2
- 229930003836 cresol Natural products 0.000 description 2
- 239000003431 cross linking reagent Substances 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- VEZUQRBDRNJBJY-UHFFFAOYSA-N cyclohexanone oxime Chemical compound ON=C1CCCCC1 VEZUQRBDRNJBJY-UHFFFAOYSA-N 0.000 description 2
- 239000012954 diazonium Substances 0.000 description 2
- 150000001989 diazonium salts Chemical class 0.000 description 2
- JQVDAXLFBXTEQA-UHFFFAOYSA-N dibutylamine Chemical compound CCCCNCCCC JQVDAXLFBXTEQA-UHFFFAOYSA-N 0.000 description 2
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 150000002009 diols Chemical class 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- DMBHHRLKUKUOEG-UHFFFAOYSA-N diphenylamine Chemical compound C=1C=CC=CC=1NC1=CC=CC=C1 DMBHHRLKUKUOEG-UHFFFAOYSA-N 0.000 description 2
- WNAHIZMDSQCWRP-UHFFFAOYSA-N dodecane-1-thiol Chemical compound CCCCCCCCCCCCS WNAHIZMDSQCWRP-UHFFFAOYSA-N 0.000 description 2
- 229920001971 elastomer Polymers 0.000 description 2
- JBKVHLHDHHXQEQ-UHFFFAOYSA-N epsilon-caprolactam Chemical compound O=C1CCCCCN1 JBKVHLHDHHXQEQ-UHFFFAOYSA-N 0.000 description 2
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- NJRXVEJTAYWCQJ-UHFFFAOYSA-N thiomalic acid Chemical compound OC(=O)CC(S)C(O)=O NJRXVEJTAYWCQJ-UHFFFAOYSA-N 0.000 description 1
- KJAMZCVTJDTESW-UHFFFAOYSA-N tiracizine Chemical compound C1CC2=CC=CC=C2N(C(=O)CN(C)C)C2=CC(NC(=O)OCC)=CC=C21 KJAMZCVTJDTESW-UHFFFAOYSA-N 0.000 description 1
- ILJSQTXMGCGYMG-UHFFFAOYSA-N triacetic acid Chemical compound CC(=O)CC(=O)CC(O)=O ILJSQTXMGCGYMG-UHFFFAOYSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 1
- LENZDBCJOHFCAS-UHFFFAOYSA-N tris Chemical compound OCC(N)(CO)CO LENZDBCJOHFCAS-UHFFFAOYSA-N 0.000 description 1
- ANEFWEBMQHRDLH-UHFFFAOYSA-N tris(2,3,4,5,6-pentafluorophenyl) borate Chemical compound FC1=C(F)C(F)=C(F)C(F)=C1OB(OC=1C(=C(F)C(F)=C(F)C=1F)F)OC1=C(F)C(F)=C(F)C(F)=C1F ANEFWEBMQHRDLH-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000003643 water by type Substances 0.000 description 1
- 239000001993 wax Substances 0.000 description 1
- 230000004580 weight loss Effects 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- CHJMFFKHPHCQIJ-UHFFFAOYSA-L zinc;octanoate Chemical compound [Zn+2].CCCCCCCC([O-])=O.CCCCCCCC([O-])=O CHJMFFKHPHCQIJ-UHFFFAOYSA-L 0.000 description 1
- DGVVWUTYPXICAM-UHFFFAOYSA-N β‐Mercaptoethanol Chemical compound OCCS DGVVWUTYPXICAM-UHFFFAOYSA-N 0.000 description 1
- PAPBSGBWRJIAAV-UHFFFAOYSA-N ε-Caprolactone Chemical compound O=C1CCCCCO1 PAPBSGBWRJIAAV-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Epoxy Resins (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Abstract
【課題】耐溶剤性、耐吸湿性に優れ、溶剤に触れても基材に対して高い密着性に優れた硬化物を得ることのできる共重合体を提供する。
【解決手段】共重合体は、下記式(1)
(式中、R1は水素原子又はメチル基を示し、Xは炭素数1〜6の2価の炭化水素基を示す)で表されるビニル単量体Aに対応するモノマー単位と、(4−ビニルフェニル)酢酸であるビニル単量体Bに対応するモノマー単位を少なくとも含む。
【選択図】なしThe present invention provides a copolymer that is excellent in solvent resistance and moisture absorption resistance and that can obtain a cured product having excellent adhesion to a substrate even when touched with a solvent.
The copolymer has the following formula (1):
(Wherein R 1 represents a hydrogen atom or a methyl group, and X represents a divalent hydrocarbon group having 1 to 6 carbon atoms), and a monomer unit corresponding to the vinyl monomer A represented by (4 At least monomer units corresponding to vinyl monomer B which is -vinylphenyl) acetic acid.
[Selection figure] None
Description
本発明は、エポキシ基を有するビニルフェニル単量体に対応するモノマー単位及びカルボキシル基を有するビニルフェニル単量体に対応するモノマー単位を含む共重合体、該共重合体を含む硬化性樹脂組成物、及び該組成物を硬化して得られる硬化物に関する。本発明の共重合体は、塗料、コーティング剤、粘接着剤、電子材料用途(保護膜、封止材料など)等に使用できる。 The present invention relates to a copolymer comprising a monomer unit corresponding to a vinylphenyl monomer having an epoxy group and a monomer unit corresponding to a vinylphenyl monomer having a carboxyl group, and a curable resin composition comprising the copolymer And a cured product obtained by curing the composition. The copolymer of the present invention can be used for paints, coating agents, adhesives, electronic materials (protective films, sealing materials, etc.) and the like.
C−C二重結合を有する不飽和モノマーをラジカル重合して得られる重合体は、種々の用途に広く使用されているが、この重合体を熱や光により架橋できれば、機能性高分子としての用途にも使用することが可能である。従来、熱や光により硬化して硬化塗膜を形成しうる組成物として、側鎖にエポキシ基を有する重合体を含む硬化性樹脂組成物、側鎖にイソシアネート基を有する重合体を含む硬化性樹脂組成物、アルコキシシラン基を含む重合体に、酸、塩基、有機金属触媒等を添加した硬化性樹脂組成物などが知られている。しかし、これらの硬化性樹脂組成物から得られる硬化塗膜では、硬化性、基材への密着性、膜硬度、耐熱性、耐薬品性、保存安定性等の要求性能をすべて満足させることはできない。 A polymer obtained by radical polymerization of an unsaturated monomer having a C—C double bond is widely used in various applications. If this polymer can be crosslinked by heat or light, it can be used as a functional polymer. It can also be used for applications. Conventionally, as a composition that can be cured by heat or light to form a cured coating film, a curable resin composition containing a polymer having an epoxy group in the side chain, a curable composition containing a polymer having an isocyanate group in the side chain A curable resin composition in which an acid, a base, an organometallic catalyst, or the like is added to a resin composition or a polymer containing an alkoxysilane group is known. However, cured coatings obtained from these curable resin compositions do not satisfy all required performance such as curability, adhesion to substrates, film hardness, heat resistance, chemical resistance, and storage stability. Can not.
特開2000−297082号公報には、硬化物の物性を向上させる目的で、ω−ハロアルキル−スチレンなどを金属マグネシウムと反応させて製造したグリニャール試薬を、エピクロロヒドリン等と反応させて得られたエポキシ基含有ラジカル重合性化合物にスチレン類、ブタジエン等のジエン類、(メタ)アクリル酸メチル等の(メタ)アクリル酸エステル類、また(メタ)アクリル酸等のラジカル重合性化合物を単量体成分として含有してなる共重合体が提案されている。しかしながら、この共重合体からなる硬化性樹脂組成物から得られる硬化塗膜は、耐溶剤性、耐吸湿性、及び溶剤に触れた後の基材に対する密着性についての性能が不十分である。 JP-A-2000-297082 discloses a Grignard reagent produced by reacting ω-haloalkyl-styrene or the like with metal magnesium for the purpose of improving the physical properties of a cured product, and obtained by reacting with epichlorohydrin or the like. Epoxy group-containing radical polymerizable compounds, monomers such as styrenes, dienes such as butadiene, (meth) acrylic esters such as methyl (meth) acrylate, and radical polymerizable compounds such as (meth) acrylic acid Copolymers containing as components have been proposed. However, the cured coating film obtained from the curable resin composition comprising this copolymer has insufficient performance in terms of solvent resistance, moisture absorption resistance, and adhesion to the substrate after being exposed to the solvent.
従って、本発明の目的は、耐溶剤性、耐吸湿性、及び溶剤に触れた後の基材に対する密着性に優れた硬化物を得ることのできる共重合体、該共重合体を含む硬化性樹脂組成物及びその硬化物を提供することにある。 Accordingly, an object of the present invention is to provide a copolymer capable of obtaining a cured product excellent in solvent resistance, moisture absorption resistance, and adhesion to a substrate after being exposed to the solvent, and curability containing the copolymer. It is providing the resin composition and its hardened | cured material.
本発明者らは、上記目的を達成するため鋭意検討した結果、特定構造のエポキシ基を有するビニルフェニル単量体に対応するモノマー単位及び特定構造のカルボキシル基を有するビニルフェニル単量体に対応するモノマー単位を少なくとも含む共重合体を含有する硬化性樹脂組成物を基材に塗布して硬化させると、耐溶剤性、耐吸湿性、及び溶剤に触れた後の基材に対する密着性に優れた硬化塗膜が得られることを見いだし、本発明を完成した。 As a result of intensive studies to achieve the above object, the present inventors have responded to a monomer unit corresponding to a vinylphenyl monomer having an epoxy group having a specific structure and a vinylphenyl monomer having a carboxyl group having a specific structure. When a curable resin composition containing a copolymer containing at least a monomer unit is applied to a substrate and cured, it is excellent in solvent resistance, moisture absorption resistance, and adhesion to the substrate after touching the solvent. The present inventors have found that a cured coating film can be obtained and completed the present invention.
すなわち、本発明は、下記式(1)
で表されるビニル単量体Aに対応するモノマー単位と、下記式(2)
A monomer unit corresponding to the vinyl monomer A represented by the following formula (2):
前記共重合体は、さらに、下記式(3)
で表されるビニル単量体Cに対応するモノマー単位を含んでいてもよい。
The copolymer further includes the following formula (3):
The monomer unit corresponding to the vinyl monomer C represented by these may be included.
上記式(3)中のR3としては、下記式(4a)
で表される基、下記式(4b)
で表される基が挙げられる。
As R 3 in the above formula (3), the following formula (4a)
A group represented by formula (4b):
The group represented by these is mentioned.
本発明は、また、前記の共重合体に、光及び/又は熱重合開始剤が配合されている硬化性樹脂組成物を提供する。 The present invention also provides a curable resin composition in which a light and / or thermal polymerization initiator is blended with the copolymer.
前記硬化性樹脂組成物は、さらに、多官能ビニル化合物、多官能チオール化合物、エポキシ化合物及び/又はエポキシ樹脂が配合されていてもよい。 The curable resin composition may further contain a polyfunctional vinyl compound, a polyfunctional thiol compound, an epoxy compound, and / or an epoxy resin.
本発明は、さらにまた、前記の硬化性樹脂組成物を硬化して得られる硬化物を提供する。 The present invention further provides a cured product obtained by curing the curable resin composition.
本発明の共重合体を含む硬化性樹脂組成物を硬化させることにより、優れた耐溶剤性、耐吸湿性を有するとともに、溶剤に触れても高い密着性を有する硬化物を得ることができる。また、本発明の共重合体を含む硬化性樹脂組成物は硬化性にも優れている。そのため、塗料、コーティング剤、粘接着剤等として利用でき、特に電子材料分野で好適に使用できる。 By curing the curable resin composition containing the copolymer of the present invention, it is possible to obtain a cured product having excellent solvent resistance and moisture absorption resistance and high adhesion even when touched with a solvent. Moreover, the curable resin composition containing the copolymer of this invention is excellent also in sclerosis | hardenability. Therefore, it can be used as a paint, a coating agent, an adhesive, and the like, and can be suitably used particularly in the field of electronic materials.
本発明の共重合体は、前記式(1)で示されるエポキシ基を有するビニルフェニル単量体Aに対応するモノマー単位と、前記式(2)で示されるカルボキシル基を有するビニルフェニル単量体Bに対応するモノマー単位とを少なくとも含んでいる。この共重合体を含む硬化性樹脂組成物を熱や活性エネルギー線により硬化させると、前記エポキシ基及びカルボキシル基が硬化に寄与して、諸物性、特に基材密着性及び耐溶剤性に優れた硬化物を与える。なお、本発明の共重合体はランダム共重合体であってもブロック共重合体であってもよい。 The copolymer of the present invention includes a monomer unit corresponding to the vinylphenyl monomer A having an epoxy group represented by the formula (1) and a vinylphenyl monomer having a carboxyl group represented by the formula (2). And at least a monomer unit corresponding to B. When the curable resin composition containing this copolymer is cured by heat or active energy rays, the epoxy group and carboxyl group contribute to the curing, and are excellent in various physical properties, in particular, substrate adhesion and solvent resistance. Give a cured product. The copolymer of the present invention may be a random copolymer or a block copolymer.
[ビニル単量体A]
式(1)で表されるビニル単量体Aにおいて、R1は水素原子又はメチル基を示し、Xは炭素数1〜6の2価の炭化水素基を示す。炭素数1〜6の2価の炭化水素基としては、例えば、メチレン、エチレン、プロピレン、トリメチレン、テトラメチレン、エチルエチレン、ペンタメチレン、ヘキサメチレン基等の直鎖又は分岐鎖状のアルキレン基などが挙げられる。これらのうち、特に、メチレン基、エチレン基、プロピレン基などの低炭素数(例えば炭素数1〜3)の直鎖又は分岐鎖状アルキレン基が好ましい。
[Vinyl monomer A]
In the vinyl monomer A represented by formula (1), R 1 represents a hydrogen atom or a methyl group, X represents a divalent hydrocarbon group having 1 to 6 carbon atoms. Examples of the divalent hydrocarbon group having 1 to 6 carbon atoms include linear or branched alkylene groups such as methylene, ethylene, propylene, trimethylene, tetramethylene, ethylethylene, pentamethylene, and hexamethylene groups. Can be mentioned. Among these, a linear or branched alkylene group having a low carbon number (for example, 1 to 3 carbon atoms) such as a methylene group, an ethylene group, or a propylene group is particularly preferable.
式(1)で表されるビニル単量体Aとしては、例えば、下記式(5)で示される4−ビニルベンジルオキシランが挙げられる。4−ビニルベンジルオキシランは、下記式(6)で示されるグリニャール試薬とエピクロロヒドリンとを反応させることにより製造できる。下記式(6)で示されるグリニャール試薬は、クロロスチレンとグリニャール反応用マグネシウムとを反応させて得られる。 Examples of the vinyl monomer A represented by the formula (1) include 4-vinylbenzyloxirane represented by the following formula (5). 4-vinylbenzyl oxirane can be produced by reacting a Grignard reagent represented by the following formula (6) with epichlorohydrin. The Grignard reagent represented by the following formula (6) is obtained by reacting chlorostyrene and Grignard reaction magnesium.
また、式(1)で表されるビニル単量体Aとして、下記式(7)で示される4−ビニルフェネチルオキシランが挙げられる。4−ビニルフェネチルオキシランは、下記式(8)で示されるグリニャール試薬とエピクロロヒドリンとを反応させることにより製造できる。下記式(8)で示されるグリニャール試薬は、クロロメチルスチレンとグリニャール反応用マグネシウムとを反応させて得られる。 Examples of the vinyl monomer A represented by the formula (1) include 4-vinylphenethyloxirane represented by the following formula (7). 4-Vinylphenethyloxirane can be produced by reacting a Grignard reagent represented by the following formula (8) with epichlorohydrin. The Grignard reagent represented by the following formula (8) is obtained by reacting chloromethylstyrene with Grignard reaction magnesium.
ビニル単量体Aに対応するモノマー単位の本発明の共重合体に占める割合は、共重合体を構成する全モノマー単位に対して、例えば、1〜95重量%、好ましくは5〜80重量%、さらに好ましくは10〜70重量%である。この割合が少なすぎると耐溶剤性が低下する場合があり、多すぎると密着性が低下する場合がある。 The proportion of the monomer unit corresponding to the vinyl monomer A in the copolymer of the present invention is, for example, 1 to 95% by weight, preferably 5 to 80% by weight, based on all monomer units constituting the copolymer. More preferably, it is 10 to 70% by weight. If this ratio is too small, the solvent resistance may decrease, and if it is too large, the adhesion may decrease.
[ビニル単量体B]
ビニル単量体Bは前記式(2)で表される(4−ビニルフェニル)酢酸である。ビニル単量体Bに対応するモノマー単位の本発明の共重合体に占める割合は、共重合体を構成する全モノマー単位に対して、例えば、1〜95重量%、好ましくは5〜80重量%、さらに好ましくは10〜70重量%である。この割合が少なすぎると密着性が低下する場合があり、多すぎると耐吸湿性が低下する場合がある。
[Vinyl monomer B]
The vinyl monomer B is (4-vinylphenyl) acetic acid represented by the formula (2). The proportion of the monomer unit corresponding to the vinyl monomer B in the copolymer of the present invention is, for example, 1 to 95% by weight, preferably 5 to 80% by weight, based on all monomer units constituting the copolymer. More preferably, it is 10 to 70% by weight. If this ratio is too small, the adhesion may be lowered, and if it is too much, the moisture absorption resistance may be lowered.
[ビニル単量体C]
本発明の共重合体は、式(1)で表されるビニル単量体Aに対応するモノマー単位と、式(2)で表されるビニル単量体Bに対応するモノマー単位に加えて、さらに、前記式(3)で表されるビニル単量体Cに対応するモノマー単位を含んでいてもよい。式(3)中、R2は水素原子又はメチル基を示し、R3は炭素数が1〜24の有機基を示す。aは0又は1の整数である。なお、ビニル単量体Cにはビニル単量体A及びBは含まれない。
[Vinyl monomer C]
The copolymer of the present invention, in addition to the monomer unit corresponding to the vinyl monomer A represented by the formula (1) and the monomer unit corresponding to the vinyl monomer B represented by the formula (2), Furthermore, a monomer unit corresponding to the vinyl monomer C represented by the formula (3) may be included. In formula (3), R 2 represents a hydrogen atom or a methyl group, and R 3 represents an organic group having 1 to 24 carbon atoms. a is an integer of 0 or 1; Vinyl monomer C does not include vinyl monomers A and B.
前記有機基としては、置換基を有していてもよい炭化水素基、ケイ素原子含有基、複素環式基、これらの2以上が1又は2以上の連結基を介して結合している基等が挙げられる。炭化水素基としては、アルキル基、アルケニル基、アルキニル基等の脂肪族炭化水素基;シクロアルキル基、シクロアルケニル基、橋架け炭素環式基等の脂環式炭化水素基;芳香族炭化水素基が挙げられる。連結基としては、エーテル結合(−O−)、チオエーテル結合(−S−)、エステル結合(−COO−)、アミド結合(−CONH−)、ウレア結合、ウレタン結合、カルボニル基(−CO−)、−NH−、これらが2以上結合した基等が挙げられる。 Examples of the organic group include a hydrocarbon group which may have a substituent, a silicon atom-containing group, a heterocyclic group, a group in which two or more of these are bonded via one or more linking groups, and the like Is mentioned. Examples of the hydrocarbon group include an aliphatic hydrocarbon group such as an alkyl group, an alkenyl group, and an alkynyl group; an alicyclic hydrocarbon group such as a cycloalkyl group, a cycloalkenyl group, and a bridged carbocyclic group; an aromatic hydrocarbon group Is mentioned. Examples of the linking group include an ether bond (—O—), a thioether bond (—S—), an ester bond (—COO—), an amide bond (—CONH—), a urea bond, a urethane bond, and a carbonyl group (—CO—). , -NH-, a group in which two or more of these are bonded, and the like.
[ブロックされたイソシアネート基を有するビニル単量体]
前記式(3)で表されるビニル単量体Cとして、R3が前記式(4a)で表される基である化合物、すなわち、ブロックされたイソシアネート基(以下、ブロックイソシアネート基と称する場合がある)を有するビニル単量体が挙げられる。式(4a)中、R4は炭素数1〜8の2価の脂肪族飽和炭化水素基を示す。R5はイソシアネート基のブロック剤R5Hの残基を示す。ブロックイソシアネート基は熱により脱ブロック化し、活性なイソシアネート基が生成する。
[Vinyl monomer having blocked isocyanate group]
As the vinyl monomer C represented by the formula (3), a compound in which R 3 is a group represented by the formula (4a), that is, a blocked isocyanate group (hereinafter sometimes referred to as a blocked isocyanate group). And vinyl monomers having a certain). In formula (4a), R 4 represents a C 1-8 divalent aliphatic saturated hydrocarbon group. R 5 represents a residue of an isocyanate group blocking agent R 5 H. The blocked isocyanate group is deblocked by heat to produce an active isocyanate group.
R4における炭素数1〜8の2価の飽和脂肪族炭化水素基としては、例えば、メチレン基、エチレン基、トリメチレン基、プロピレン基、テトラメチレン基、ペンタメチレン基、ヘキサメチレン基、ヘプタメチレン基、オクタメチレン基等の直鎖状又は分岐鎖状の2価の飽和脂肪族炭化水素基(アルキレン基)が挙げられる。これらの中でも、エチレン基、トリメチレン基、プロピレン基等の炭素数2〜4の2価の飽和脂肪族炭化水素基が好ましい。 Examples of the divalent saturated aliphatic hydrocarbon group having 1 to 8 carbon atoms in R 4 include a methylene group, an ethylene group, a trimethylene group, a propylene group, a tetramethylene group, a pentamethylene group, a hexamethylene group, and a heptamethylene group. And a linear or branched divalent saturated aliphatic hydrocarbon group (alkylene group) such as an octamethylene group. Among these, C2-C4 bivalent saturated aliphatic hydrocarbon groups, such as ethylene group, trimethylene group, and propylene group, are preferable.
イソシアネート基のブロック剤R5Hとしては、イソシアネートのブロック化に使用されうることが知られているブロック剤、例えば、フェノール系、ラクタム系、活性メチレン系、アルコール系、メルカプタン系、酸アミド系、イミド系、アミン系、イミダゾール系、尿素系、カルバミン酸塩系、イミン系、オキシム系などの公知のブロック剤がいずれも使用されうる。イソシアネート基のブロック剤R5Hとしては、例えば、ホルムアルドキシム、アセトアルドキシム、アセトキシム、メチルエチルケトキシム、メチルイソブチルケトキシム、ジエチルケトキシム、シクロヘキサノンオキシム、ジアセチルモノオキシム、ベンゾフェノンオキシムなどのオキシム系ブロック剤;3,5−ジメチルピラゾールなどのピラゾール系ブロック剤;メタノール、エタノール等のアルコール系ブロック剤;フェノール、クレゾールなどのフェノール系ブロック剤;ブチルメルカプタン、ヘキシルメルカプタン等のメルカプタン系ブロック剤;アセトアニリド、ε−カプロラクタム、γ−ブチロラクタム等の酸アミド系ブロック剤;マロン酸ジメチル、アセト酢酸メチルなどの活性メチレン系ブロック剤;コハク酸イミド、マレイン酸イミドなどのイミド系ブロック剤;尿素系ブロック剤;N−フェニルカルバミン酸フェニル、2−オキサゾリドンなどのカルバミン酸系ブロック剤;ジフェニルアミン、アニリンなどのアミン系ブロック剤;エチレンイミン、ポリエチレンイミン等のイミン系ブロック剤などが挙げられる。 As the isocyanate group blocking agent R 5 H, blocking agents known to be used for blocking isocyanates, for example, phenol-based, lactam-based, active methylene-based, alcohol-based, mercaptan-based, acid amide-based, Any known blocking agent such as imide, amine, imidazole, urea, carbamate, imine, and oxime may be used. Examples of the isocyanate group blocking agent R 5 H include oxime blocking agents such as formaldoxime, acetoaldoxime, acetoxime, methyl ethyl ketoxime, methyl isobutyl ketoxime, diethyl ketoxime, cyclohexanone oxime, diacetyl monooxime, and benzophenone oxime. A pyrazole block agent such as 3,5-dimethylpyrazole; an alcohol block agent such as methanol and ethanol; a phenol block agent such as phenol and cresol; a mercaptan block agent such as butyl mercaptan and hexyl mercaptan; an acetanilide and ε- Acid amide blocking agents such as caprolactam and γ-butyrolactam; active methylene blocking agents such as dimethyl malonate and methyl acetoacetate; succinimide, Imide-based blocking agents such as maleic imide; urea-based blocking agents; N-phenylcarbamic acid phenyl, 2-carbazolidone and other carbamic acid-based blocking agents; diphenylamine, aniline and other amine-based blocking agents; ethyleneimine, polyethyleneimine and the like Examples include imine blocking agents.
イソシアネート基のブロック剤としては、硬化性樹脂組成物の製造ラインにおいてゲル化が生じないような安定性の高いブロック剤が好ましい。ブロック剤の脱ブロック温度は、例えば100〜300℃、好ましくは150〜250℃の範囲である。上記のブロック剤のなかでも、オキシム系ブロック剤、ピラゾール系ブロック剤が好ましい。 As the isocyanate group blocking agent, a highly stable blocking agent which does not cause gelation in the production line of the curable resin composition is preferable. The deblocking temperature of the blocking agent is, for example, 100 to 300 ° C, preferably 150 to 250 ° C. Of the above blocking agents, oxime blocking agents and pyrazole blocking agents are preferred.
特に好ましいブロック剤には、下記式(9)
で表されるオキシム系ブロック剤が含まれる。
Particularly preferred blocking agents include the following formula (9)
The oxime block agent represented by these is included.
R9及びR10における炭素数1〜8のアルキル基としては、例えば、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、イソブチル基、s−ブチル基、t−ブチル基、ペンチル基、ヘキシル基、オクチル基等の直鎖状又は分岐鎖状アルキル基が挙げられる。これらのなかでも、メチル基、エチル基、プロピル基等の炭素数1〜4の直鎖状又は分岐鎖状アルキル基が好ましい。R9及びR10が互いに結合して隣接する炭素原子とともに結合する環としては、例えば、シクロブタン環、シクロペンタン環、シクロヘキサン環等の3〜12員程度(好ましくは5又は6員)のシクロアルカン環などが挙げられる。 Examples of the alkyl group having 1 to 8 carbon atoms in R 9 and R 10 include, for example, methyl group, ethyl group, propyl group, isopropyl group, butyl group, isobutyl group, s-butyl group, t-butyl group, pentyl group, Examples thereof include linear or branched alkyl groups such as hexyl group and octyl group. Among these, a linear or branched alkyl group having 1 to 4 carbon atoms such as a methyl group, an ethyl group, and a propyl group is preferable. Examples of the ring in which R 9 and R 10 are bonded to each other together with adjacent carbon atoms include, for example, about 3 to 12 membered (preferably 5 or 6 membered) cycloalkane such as cyclobutane ring, cyclopentane ring, cyclohexane ring and the like. A ring etc. are mentioned.
式(3)におけるR3が式(4a)で表される基であるビニル単量体の代表的な例として、メタクリル酸2−[O−(1′−メチルプロピリデンアミノ)カルボキシアミノ]エチル(=2−(1−メチルプロピリデンアミノオキシカルボニルアミノエチル)メタクリレート)[商品名「カレンズMOI−BM」、昭和電工株式会社製、下記式(10a)]、メタクリル酸2−(3,5−ジメチルピラゾール−1−イル)カルボニルアミノエチル[商品名「カレンズMOI−BP」、昭和電工株式会社製、下記式(10b)]等が挙げられる。なお、商品名「カレンズMOI−BM」の脱ブロック温度は、50%脱ブロック温度が130℃、90%脱ブロック温度が150℃である。また、商品名「カレンズMOI−BP」の脱ブロック温度は、50%脱ブロック温度が100℃、90%脱ブロック温度が120℃である。式(3)におけるR3が式(4a)で表される基であるビニル単量体としては、これらから選択される1種又は2種以上を組み合わせて用いることができる。 As a typical example of a vinyl monomer in which R 3 in formula (3) is a group represented by formula (4a), 2- [O- (1′-methylpropylideneamino) carboxyamino] ethyl methacrylate (= 2- (1-methylpropylideneaminooxycarbonylaminoethyl) methacrylate) [trade name “Karenz MOI-BM”, manufactured by Showa Denko KK, formula (10a) below], methacrylic acid 2- (3,5- And dimethylpyrazol-1-yl) carbonylaminoethyl [trade name “Karenz MOI-BP”, manufactured by Showa Denko KK, the following formula (10b)]. As for the deblocking temperature of the trade name “Karenz MOI-BM”, the 50% deblocking temperature is 130 ° C., and the 90% deblocking temperature is 150 ° C. Further, the deblocking temperature of the trade name “Karenz MOI-BP” is 50 ° C. deblocking temperature of 100 ° C. and 90% deblocking temperature of 120 ° C. As the vinyl monomer in which R 3 in the formula (3) is a group represented by the formula (4a), one or more selected from these can be used in combination.
本発明の共重合体において、式(3)におけるR3が式(4a)で表される基であるビニル単量体に対応するモノマー単位の脱ブロック化は下記式(11)のようにして進行する。この脱ブロック化により生じたイソシアネート基が硬化性基として作用する。イソシアネート基は、主に基材に対する密着性の向上に寄与する。
式(3)におけるR3が式(4a)で表される基であるビニル単量体に対応するモノマー単位の共重合体に占める割合は、共重合体を構成する全モノマー単位に対して、例えば、1〜95重量%、好ましくは5〜80重量%、さらに好ましくは10〜70重量%である。この割合が少なすぎると密着性が低下する場合があり、多すぎると耐溶剤性が低下する場合がある。 The proportion of the monomer unit corresponding to the vinyl monomer in which R 3 in the formula (3) is a group represented by the formula (4a) is based on the total monomer units constituting the copolymer, For example, it is 1 to 95% by weight, preferably 5 to 80% by weight, and more preferably 10 to 70% by weight. If this ratio is too small, the adhesion may be lowered, and if it is too much, the solvent resistance may be lowered.
[アルコキシシリル基を有するビニル単量体]
前記式(3)で表されるビニル単量体Cとして、R3が前記式(4b)で表される基である化合物、すなわち、アルコキシシリル基含有ビニル単量体が挙げられる。式(4b)中、Eは単結合又は2価の炭化水素基を示す。R6及びR7は、同一又は異なって、炭素数1〜6のアルキル基又は炭素数1〜6のアルコキシ基を示す。R8は炭素数1〜6のアルキル基を示す。bは1〜10(好ましくは1〜5)の整数である。Eによって表される2価の炭化水素基としては、例えば、メチレン基、エチレン基、プロピレン基、テトラメチレン基、エチルエチレン基、ペンタメチレン基、ヘキサメチレン基等の直鎖または分岐鎖状のアルキレン基などが挙げられる。これらのうち、特に、メチレン基、エチレン基、プロピレン基などの炭素数1〜3の直鎖又は分岐鎖状アルキレン基が好ましい。
[Vinyl monomer having alkoxysilyl group]
Examples of the vinyl monomer C represented by the formula (3) include compounds in which R 3 is a group represented by the formula (4b), that is, an alkoxysilyl group-containing vinyl monomer. In the formula (4b), E represents a single bond or a divalent hydrocarbon group. R 6 and R 7 are the same or different and each represents an alkyl group having 1 to 6 carbon atoms or an alkoxy group having 1 to 6 carbon atoms. R 8 represents an alkyl group having 1 to 6 carbon atoms. b is an integer of 1 to 10 (preferably 1 to 5). Examples of the divalent hydrocarbon group represented by E include linear or branched alkylene such as methylene group, ethylene group, propylene group, tetramethylene group, ethylethylene group, pentamethylene group and hexamethylene group. Groups and the like. Among these, a C1-C3 linear or branched alkylene group such as a methylene group, an ethylene group, or a propylene group is particularly preferable.
R6、R7及びR8によって示される炭素数1〜6のアルキル基としては、例えば、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、イソブチル基、s−ブチル基、ペンチル基、ヘキシル基等の直鎖状又は分岐鎖状アルキル基が挙げられる。これらのなかでも、メチル基、エチル基、プロピル基、イソプロピル基等の炭素数1〜3の直鎖状又は分岐鎖状アルキル基が好ましい。 Examples of the alkyl group having 1 to 6 carbon atoms represented by R 6 , R 7 and R 8 include, for example, methyl group, ethyl group, propyl group, isopropyl group, butyl group, isobutyl group, s-butyl group, pentyl group, Examples thereof include a linear or branched alkyl group such as a hexyl group. Among these, a linear or branched alkyl group having 1 to 3 carbon atoms such as a methyl group, an ethyl group, a propyl group, and an isopropyl group is preferable.
R6及びR7によって示される炭素数1〜6のアルコキシ基としては、例えば、メトキシ基、エトキシ基、プロポキシ基、イソプロポキシ基、ブトキシ基、イソブトキシ基、s−ブトキシ基、ペントキシ基、ヘキシルオキシ基等の直鎖状又は分岐鎖状アルコキシ基が挙げられる。 Examples of the alkoxy group having 1 to 6 carbon atoms represented by R 6 and R 7 include methoxy group, ethoxy group, propoxy group, isopropoxy group, butoxy group, isobutoxy group, s-butoxy group, pentoxy group, hexyloxy And linear or branched alkoxy groups such as groups.
式(3)におけるR3が式(4b)で表される基であるビニル単量体としては、例えば、ビニルトリメトキシシラン、ビニルトリエトキシシラン、ビニルメチルジメトキシシラン、ビニルメチルジエトキシシラン、γ−(メタ)アクリロイルオキシプロピルトリメトキシシラン、γ−(メタ)アクリロイルオキシプロピルトリエトキシシラン、γ−(メタ)アクリロイルオキシプロピルメチルジメトキシシラン、γ−(メタ)アクリロイルオキシプロピルメチルジエトキシシラン、γ−(メタ)アクリロイルオキシプロピルトリエトキシシラン、β−(メタ)アクリロイルオキシエチルトリメトキシシラン、β−(メタ)アクリロイルオキシエチルトリエトキシシラン、γ−(メタ)アクリロイルオキシブチルフェニルジメトキシシラン、γ−(メタ)アクリロイルオキシブチルフェニルジエトキシシラン等のアルコキシシリル基含有重合性不飽和化合物等が挙げられる。式(3)におけるR3が式(4b)で表される基であるビニル単量体としては、これらから選択される1種又は2種以上を組み合わせて用いることができる。 Examples of the vinyl monomer in which R 3 in the formula (3) is a group represented by the formula (4b) include vinyltrimethoxysilane, vinyltriethoxysilane, vinylmethyldimethoxysilane, vinylmethyldiethoxysilane, γ -(Meth) acryloyloxypropyltrimethoxysilane, γ- (meth) acryloyloxypropyltriethoxysilane, γ- (meth) acryloyloxypropylmethyldimethoxysilane, γ- (meth) acryloyloxypropylmethyldiethoxysilane, γ- (Meth) acryloyloxypropyltriethoxysilane, β- (meth) acryloyloxyethyltrimethoxysilane, β- (meth) acryloyloxyethyltriethoxysilane, γ- (meth) acryloyloxybutylphenyldimethoxysilane, γ- (me ) Acryloyloxy-butylphenyl diethoxy silane alkoxysilyl group-containing polymerizable unsaturated compounds such as and the like. As a vinyl monomer whose R < 3 > in Formula (3) is group represented by Formula (4b), it can be used combining 1 type (s) or 2 or more types selected from these.
式(3)におけるR3が式(4b)で表される基であるビニル単量体に対応するモノマー単位の共重合体に占める割合は、共重合体を構成する全モノマー単位に対して、例えば、1〜95重量%、好ましくは5〜80重量%、さらに好ましくは10〜70重量%である。この割合が少なすぎると密着性が低下する場合があり、多すぎると耐溶剤性が低下したり、塗膜が脆くなり密着性が低下する場合がある。 The proportion of the monomer unit corresponding to the vinyl monomer in which R 3 in the formula (3) is a group represented by the formula (4b) is based on the total monomer units constituting the copolymer, For example, it is 1 to 95% by weight, preferably 5 to 80% by weight, and more preferably 10 to 70% by weight. If this ratio is too small, the adhesion may be lowered, and if it is too much, the solvent resistance may be lowered, or the coating film becomes brittle and the adhesion may be lowered.
前記式(3)で表されるビニル単量体Cとしては、式(3)におけるR3が式(4a)で表される基であるビニル単量体、式(3)におけるR3が式(4b)で表される基であるビニル単量体のほか、例えば、(メタ)アクリル酸エステル、芳香族ビニル化合物、ヒドロキシル基含有単量体などが挙げられる。これらの単量体は、単独で又は2種以上組み合わせて使用できる。 The vinyl monomer C represented by the formula (3) is a vinyl monomer in which R 3 in the formula (3) is a group represented by the formula (4a), and R 3 in the formula (3) is a formula. In addition to the vinyl monomer which is a group represented by (4b), for example, (meth) acrylic acid esters, aromatic vinyl compounds, hydroxyl group-containing monomers and the like can be mentioned. These monomers can be used alone or in combination of two or more.
前記(メタ)アクリル酸エステルは、下記式(12)で表される。
前記R12における炭素数1〜15の炭化水素基としては、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、イソブチル基、s−ブチル基、t−ブチル基、ペンチル基、ヘキシル基、オクチル基、2−エチルヘキシル基、デシル基等のアルキル基;シクロヘキシル基、ジシクロペンタニル基、イソボルニル基等の脂環式炭化水素基;フェニル基等のアリール基;ベンジル、1−フェニルエチル、2−フェニルエチル基等のアラルキル基;これらが2以上結合した基等が挙げられる。 Examples of the hydrocarbon group having 1 to 15 carbon atoms in R 12 include methyl group, ethyl group, propyl group, isopropyl group, butyl group, isobutyl group, s-butyl group, t-butyl group, pentyl group, hexyl group, Alkyl groups such as octyl group, 2-ethylhexyl group and decyl group; alicyclic hydrocarbon groups such as cyclohexyl group, dicyclopentanyl group and isobornyl group; aryl groups such as phenyl group; benzyl, 1-phenylethyl, 2 An aralkyl group such as a phenylethyl group; a group in which two or more of these are bonded.
前記R12における炭素数1〜15の炭化水素基が有していてもよい炭化水素基置換オキシ基としては、例えば、メトキシ基、エトキシ基等のアルコキシ基(例えば、炭素数1〜10のアルコキシ基);フェノキシ基等のアリールオキシ基;シクロヘキシルオキシ基、ジシクロペンタニルオキシ基等の脂環式炭化水素基置換オキシ基;ベンジルオキシ基等のアラルキルオキシ基などの炭素数1〜15(好ましくは、炭素数1〜12)の炭化水素基置換オキシ基などが挙げられる。 Examples of the hydrocarbon group-substituted oxy group that the hydrocarbon group having 1 to 15 carbon atoms in R 12 may have include an alkoxy group such as a methoxy group and an ethoxy group (for example, an alkoxy group having 1 to 10 carbon atoms). Group); aryloxy group such as phenoxy group; alicyclic hydrocarbon group-substituted oxy group such as cyclohexyloxy group and dicyclopentanyloxy group; carbon number 1 to 15 such as aralkyloxy group such as benzyloxy group (preferably Includes a hydrocarbon group-substituted oxy group having 1 to 12 carbon atoms.
(メタ)アクリル酸エステルの代表的な例としては、例えば、メチル(メタ)アクリレート、エチル(メタ)アクリレート、ブチル(メタ)アクリレート、2−エチルヘキシル(メタ)アクリレート、フェニル(メタ)アクリレート、シクロヘキシル(メタ)アクリレート、ジシクロペンタニル(メタ)アクリレート、ジシクロペンタニルオキシエチル(メタ)アクリレート、イソボニル(メタ)アクリレート、ベンジル(メタ)アクリレート、フェニルエチル(メタ)アクリレートなどが挙げられる。 Representative examples of (meth) acrylic acid esters include, for example, methyl (meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, phenyl (meth) acrylate, cyclohexyl ( Examples include meth) acrylate, dicyclopentanyl (meth) acrylate, dicyclopentanyloxyethyl (meth) acrylate, isobornyl (meth) acrylate, benzyl (meth) acrylate, and phenylethyl (meth) acrylate.
芳香族ビニル化合物としては、例えば、スチレン、α−メチルスチレン、ビニルトルエン、ビニルナフタレン、ビニルビフェニルなどが挙げられる。 Examples of the aromatic vinyl compound include styrene, α-methylstyrene, vinyl toluene, vinyl naphthalene, vinyl biphenyl, and the like.
ヒドロキシル基含有単量体としては、例えば、2−ヒドロキシエチル(メタ)アクリレート、ヒドロキシプロピル(メタ)アクリレート、2,3−ジヒドロキシブチル(メタ)アクリレート、4−ヒドロキシブチル(メタ)アクリレート、6−ヒドロキシヘキシル(メタ)アクリレート、8−ヒドロキシオクチル(メタ)アクリレート等のヒドロキシアルキル(メタ)アクリレート、4−ヒドロキシメチルシクロヘキシル(メタ)アクリレート、ポリアルキレングリコールモノ(メタ)アクリレート等の、多価アルコールとアクリル酸またはメタクリル酸とのモノエステル化物、上記多価アルコールとアクリル酸又はメタクリル酸とのモノエステル化物にε−カプロラクトンを開環重合した化合物(ダイセル化学工業株式会社製、プラクセルFAシリーズ、プラクセルFMシリーズ等)や、エチレンオキサイド、若しくはプロピレンオキサイドを開環重合したヒドロキシル基含有化合物などが挙げられる。 Examples of the hydroxyl group-containing monomer include 2-hydroxyethyl (meth) acrylate, hydroxypropyl (meth) acrylate, 2,3-dihydroxybutyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate, and 6-hydroxy. Polyhydric alcohol and acrylic acid such as hexyl (meth) acrylate, hydroxyalkyl (meth) acrylate such as 8-hydroxyoctyl (meth) acrylate, 4-hydroxymethylcyclohexyl (meth) acrylate, polyalkylene glycol mono (meth) acrylate, etc. Alternatively, a compound obtained by ring-opening polymerization of ε-caprolactone to a monoesterified product with methacrylic acid, or a monoesterified product of the above polyhydric alcohol with acrylic acid or methacrylic acid (product of Daicel Chemical Industries, Plaxel) A series, PLACCEL FM series, etc.), ethylene oxide, or propylene oxide ring-opening polymerization with hydroxyl group-containing compounds, and the like.
本発明において、ビニル単量体Aに対応するモノマー単位及びビニル単量体Bに対応するモノマー単位の総和の共重合体に占める割合は、共重合体を構成する全モノマー単位に対して、例えば、20重量%以上、好ましくは30重量%以上、さらに好ましくは40重量%以上である。この割合が少なすぎると耐溶剤性と密着性が十分に発揮されない場合がある。 In the present invention, the proportion of the monomer units corresponding to the vinyl monomer A and the total monomer units corresponding to the vinyl monomer B in the copolymer is, for example, , 20% by weight or more, preferably 30% by weight or more, and more preferably 40% by weight or more. If this ratio is too small, the solvent resistance and adhesion may not be sufficiently exhibited.
ビニル単量体Aに対応するモノマー単位、ビニル単量体Bに対応するモノマー単位、ビニル単量体Cに対応するモノマー単位に対応するモノマー単位の総和の共重合体に占める割合は、共重合体を構成する全モノマー単位に対して、例えば、40重量%以上、好ましくは50重量%以上、さらに好ましくは60重量%以上である。この割合が少なすぎると耐溶剤性と密着性が十分に発揮されない場合がある。 The ratio of the monomer unit corresponding to vinyl monomer A, the monomer unit corresponding to vinyl monomer B, and the monomer unit corresponding to vinyl monomer C to the total copolymer is For example, it is 40% by weight or more, preferably 50% by weight or more, and more preferably 60% by weight or more based on all monomer units constituting the coalescence. If this ratio is too small, the solvent resistance and adhesion may not be sufficiently exhibited.
本発明の共重合体において、ビニル単量体Aに対応するモノマー単位、ビニル単量体Bに対応するモノマー単位、ビニル単量体にCに対応するモノマー単位はそれぞれ、1種であってもよく、2種以上で存在していてもよい。 In the copolymer of the present invention, the monomer unit corresponding to the vinyl monomer A, the monomer unit corresponding to the vinyl monomer B, and the vinyl monomer corresponding to C may each be one type. Well, two or more types may be present.
本発明の共重合体は、ビニル単量体Aに対応するモノマー単位及びビニル単量体Bに対応するモノマー単位のみで構成されていてもよいが、必要に応じてビニル単量体Cに対応するモノマー単位に対応するモノマー単位を含んでいてもよい。また、ビニル単量体Aに対応するモノマー単位、ビニル単量体Bに対応するモノマー単位、ビニル単量体Cに対応するモノマー単位に加えて、他の単量体に対応するモノマー単位を含んでいてもよい。他の単量体に対応するモノマー単位としては、ビニル単量体A及びビニル単量体Bと共重合可能な重合性単量体に対応するモノマー単位であって、耐溶剤性、耐吸湿性及び耐溶剤試験後の基材に対する密着性を損なわないような構造単位であれば特に限定されない。 The copolymer of the present invention may be composed only of a monomer unit corresponding to the vinyl monomer A and a monomer unit corresponding to the vinyl monomer B, but corresponds to the vinyl monomer C if necessary. The monomer unit corresponding to the monomer unit to be included may be included. In addition to the monomer unit corresponding to the vinyl monomer A, the monomer unit corresponding to the vinyl monomer B, the monomer unit corresponding to the vinyl monomer C, the monomer unit corresponding to another monomer is included. You may go out. The monomer unit corresponding to the other monomer is a monomer unit corresponding to a polymerizable monomer copolymerizable with vinyl monomer A and vinyl monomer B, and has solvent resistance and moisture absorption resistance. And if it is a structural unit which does not impair the adhesiveness with respect to the base material after a solvent resistance test, it will not specifically limit.
本発明の共重合体は、ビニル単量体A及びビニル単量体B、必要に応じてビニル単量体C、他の単量体をビニル重合させて得ることができる。重合に用いられる重合開始剤としては、公知慣用のラジカル開始剤を使用することができ、例えば、2,2’−アゾビスイソブチロニトリル、2,2’−アゾビス(2,4−ジメチルバレロニトリル)、2,2’−アゾビス(4−メトキシ−2,4−ジメチルバレロニトリル)、ジメチル−2,2’−アゾビス(2−メチルプロピオネート)、2,2−アゾビス(イソ酪酸)ジメチル、ジエチル−2,2’−アゾビス(2−メチルプロピオネート)、ジブチル−2,2’−アゾビス(2−メチルプロピオネート)等のアゾ化合物、ベンゾイルペルオキシド、ラウロイルペルオキシド、t−ブチルペルオキシピバレート、1,1−ビス(t−ブチルペルオキシ)シクロヘキサン等の有機過酸化物、過酸化水素などが挙げられる。過酸化物をラジカル重合開始剤として使用する場合、還元剤を組み合わせてレドックス型の開始剤としてもよい。上記のなかでもアゾ化合物が好ましく、特に、2,2’−アゾビスイソブチロニトリル、2,2’−アゾビス(2,4−ジメチルバレロニトリル)、2,2−アゾビス(イソ酪酸)ジメチルが好ましい。 The copolymer of the present invention can be obtained by vinyl polymerization of vinyl monomer A and vinyl monomer B, and if necessary, vinyl monomer C and other monomers. As the polymerization initiator used for the polymerization, known and commonly used radical initiators can be used. For example, 2,2′-azobisisobutyronitrile, 2,2′-azobis (2,4-dimethylvalero) Nitrile), 2,2′-azobis (4-methoxy-2,4-dimethylvaleronitrile), dimethyl-2,2′-azobis (2-methylpropionate), 2,2-azobis (isobutyric acid) dimethyl , Azo compounds such as diethyl-2,2′-azobis (2-methylpropionate), dibutyl-2,2′-azobis (2-methylpropionate), benzoyl peroxide, lauroyl peroxide, t-butylperoxypi Examples thereof include barate, organic peroxides such as 1,1-bis (t-butylperoxy) cyclohexane, hydrogen peroxide, and the like. When a peroxide is used as a radical polymerization initiator, a redox initiator may be combined with a reducing agent. Of these, azo compounds are preferred, and in particular, 2,2′-azobisisobutyronitrile, 2,2′-azobis (2,4-dimethylvaleronitrile), and 2,2-azobis (isobutyric acid) dimethyl are preferred. preferable.
重合開始剤の使用量は、円滑な共重合を損なわない範囲で適宜選択できるが、通常、全単量体成分及び重合開始剤の総量に対して、1〜30重量%程度であり、好ましくは5〜25重量%程度である。 The amount of the polymerization initiator used can be appropriately selected within a range that does not impair smooth copolymerization, but is usually about 1 to 30% by weight, preferably based on the total amount of all monomer components and polymerization initiator. It is about 5 to 25% by weight.
本発明においては、ラジカル重合において一般的に使用されている連鎖移動剤を併用してもよい。具体例としては、チオール類(n−ドデシルメルカプタン、n−オクチルメルカプタン、n−ブチルメルカプタン、tert−ブチルメルカプタン、n−ラウリルメルカプタン、メルカプトエタノール、メルカプトプロパノール、トリエチレングリコールジメルカプタン等)、チオール酸類(メルカプトプロピオン酸、チオ安息香酸、チオグリコール酸、チオリンゴ酸等)、アルコール類(イソプロピルアルコール等)、アミン類(ジブチルアミン等)、次亜燐酸塩類(次亜燐酸ナトリウム等)、α−メチルスチレンダイマ−、タービノーレン、ミルセン、リモネン、α−ピネン、β−ピネン等を挙げることができる。前記連鎖移動剤の量は、ラジカル重合性単量体の全量に対して、好ましくは0.001〜3重量%である。連鎖移動剤を使用する場合は、予め重合性ビニル単量体に混合させておくことが好ましい。 In the present invention, a chain transfer agent generally used in radical polymerization may be used in combination. Specific examples include thiols (such as n-dodecyl mercaptan, n-octyl mercaptan, n-butyl mercaptan, tert-butyl mercaptan, n-lauryl mercaptan, mercaptoethanol, mercaptopropanol, triethylene glycol dimercaptan). Mercaptopropionic acid, thiobenzoic acid, thioglycolic acid, thiomalic acid, etc.), alcohols (isopropyl alcohol, etc.), amines (dibutylamine, etc.), hypophosphites (sodium hypophosphite, etc.), α-methylstyrene dimer -, Terbinolene, myrcene, limonene, α-pinene, β-pinene and the like. The amount of the chain transfer agent is preferably 0.001 to 3% by weight with respect to the total amount of the radical polymerizable monomer. When using a chain transfer agent, it is preferable to mix with a polymerizable vinyl monomer in advance.
本発明において、重合は、溶液重合、塊状重合、懸濁重合、塊状−懸濁重合、乳化重合など、スチレン系ポリマーやアクリル系ポリマーを製造する際に用いる公知慣用の方法により行うことができる。これらの中でも溶液重合が好ましい。各単量体及び重合開始剤は、それぞれ、反応系に一括供給してもよく、その一部又は全部を反応系に滴下してもよい。例えば、一定温度に保持したモノマーと重合溶媒の混合液中に、重合開始剤を重合溶媒に溶解した溶液を滴下して重合する方法や、予め単量体、重合開始剤を重合溶媒に溶解させた溶液を、一定温度に保持した重合溶媒中に滴下して重合する方法(滴下重合法)などを採用できる。 In this invention, superposition | polymerization can be performed by the well-known and usual method used when manufacturing a styrene polymer and an acrylic polymer, such as solution polymerization, block polymerization, suspension polymerization, block-suspension polymerization, and emulsion polymerization. Among these, solution polymerization is preferable. Each monomer and polymerization initiator may be supplied all at once to the reaction system, or a part or all of them may be dropped into the reaction system. For example, a method in which a solution in which a polymerization initiator is dissolved in a polymerization solvent is dropped into a mixed solution of a monomer and a polymerization solvent kept at a constant temperature, or the monomer and the polymerization initiator are dissolved in the polymerization solvent in advance. A method in which the solution is dropped into a polymerization solvent maintained at a constant temperature for polymerization (drop polymerization method) can be employed.
本発明における共重合体は、重合溶媒中で共重合されることが好ましい。重合溶媒は単量体組成等に応じて適宜選択でき、例えば、エーテル(ジエチルエーテル;エチレングリコールモノ又はジアルキルエーテル、ジエチレングリコールモノ又はジアルキルエーテル、プロピレングリコールモノ又はジアルキルエーテル、プロピレングリコールモノ又はジアリールエーテル、ジプロピレングリコールモノ又はジアルキルエーテル、トリプロピレングリコールモノ又はジアルキルエーテル、1,3−プロパンジオールモノ又はジアルキルエーテル、1,3−ブタンジオールモノ又はジアルキルエーテル、1,4−ブタンジオールモノ又はジアルキルエーテル、グリセリンモノ,ジ又はトリアルキルエーテル等のグリコールエーテル類などの鎖状エーテル;テトラヒドロフラン、ジオキサン等の環状エーテルなど)、エステル(酢酸メチル、酢酸エチル、酢酸ブチル、酢酸イソアミル、乳酸エチル、3−メトキシプロピオン酸メチル、3−エトキシプロピオン酸エチル、C5-6シクロアルカンジオールモノ又はジアセテート、C5-6シクロアルカンジメタノールモノ又はジアセテート等のカルボン酸エステル類;エチレングリコールモノアルキルエーテルアセテート、エチレングリコールモノ又はジアセテート、ジエチレングリコールモノアルキルエーテルアセテート、ジエチレングリコールモノ又はジアセテート、プロピレングリコールモノアルキルエーテルアセテート、プロピレングリコールモノ又はジアセテート、ジプロピレングリコールモノアルキルエーテルアセテート、ジプロピレングリコールモノ又はジアセテート、1,3−プロパンジオールモノアルキルエーテルアセテート、1,3−プロパンジオールモノ又はジアセテート、1,3−ブタンジオールモノアルキルエーテルアセテート、1,3−ブタンジオールモノ又はジアセテート、1,4−ブタンジオールモノアルキルエーテルアセテート、1,4−ブタンジオールモノ又はジアセテート、グリセリンモノ,ジ又はトリアセテート、グリセリンモノ又はジC1-4アルキルエーテルジ又はモノアセテート、トリプロピレングリコールモノアルキルエーテルアセテート、トリプロピレングリコールモノ又はジアセテート等のグリコールアセテート類又はグリコールエーテルアセテート類など)、ケトン(アセトン、メチルエチルケトン、メチルイソブチルケトン、シクロヘキサノン、3,5,5−トリメチル−2−シクロヘキセン−1−オンなど)、アミド(N,N−ジメチルアセトアミド、N,N−ジメチルホルムアミドなど)、スルホキシド(ジメチルスルホキシドなど)、アルコール(メタノール、エタノール、プロパノール、C5-6シクロアルカンジオール、C5-6シクロアルカンジメタノールなど)、炭化水素(ベンゼン、トルエン、キシレン等の芳香族炭化水素、ヘキサン等の脂肪族炭化水素、シクロヘキサン等の脂環式炭化水素など)、これらの混合溶媒などが挙げられる。重合温度は、例えば30〜150℃程度の範囲で適宜選択できる。 The copolymer in the present invention is preferably copolymerized in a polymerization solvent. The polymerization solvent can be appropriately selected according to the monomer composition and the like. For example, ether (diethyl ether; ethylene glycol mono or dialkyl ether, diethylene glycol mono or dialkyl ether, propylene glycol mono or dialkyl ether, propylene glycol mono or diaryl ether, Propylene glycol mono or dialkyl ether, tripropylene glycol mono or dialkyl ether, 1,3-propanediol mono or dialkyl ether, 1,3-butanediol mono or dialkyl ether, 1,4-butanediol mono or dialkyl ether, glycerin mono , Chain ethers such as glycol ethers such as di- or trialkyl ethers; cyclic ethers such as tetrahydrofuran and dioxane), Ether (methyl acetate, ethyl acetate, butyl acetate, isoamyl acetate, ethyl lactate, methyl 3-methoxypropionate, ethyl 3-ethoxypropionate, C 5-6 cycloalkane diol mono- or diacetate, C 5-6 cycloalkane Carboxylic acid esters such as methanol mono or diacetate; ethylene glycol monoalkyl ether acetate, ethylene glycol mono or diacetate, diethylene glycol monoalkyl ether acetate, diethylene glycol mono or diacetate, propylene glycol monoalkyl ether acetate, propylene glycol mono or di Acetate, dipropylene glycol monoalkyl ether acetate, dipropylene glycol mono or diacetate, 1,3-propanediol monoa Alkyl ether acetate, 1,3-propanediol mono- or diacetate, 1,3-butanediol monoalkyl ether acetate, 1,3-butanediol mono- or diacetate, 1,4-butanediol monoalkyl ether acetate, 1, Glycol acetate such as 4-butanediol mono or diacetate, glycerin mono, di or triacetate, glycerin mono or di C1-4 alkyl ether di or monoacetate, tripropylene glycol monoalkyl ether acetate, tripropylene glycol mono or diacetate Or glycol ether acetates), ketones (acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, 3,5,5-trimethyl-2-cyclohexene-1-o ), Amide (N, N-dimethylacetamide, N, N-dimethylformamide, etc.), sulfoxide (dimethylsulfoxide, etc.), alcohol (methanol, ethanol, propanol, C 5-6 cycloalkanediol, C 5-6 cyclo And alkanedimethanol), hydrocarbons (aromatic hydrocarbons such as benzene, toluene and xylene, aliphatic hydrocarbons such as hexane, alicyclic hydrocarbons such as cyclohexane), and mixed solvents thereof. The polymerization temperature can be appropriately selected within a range of about 30 to 150 ° C., for example.
上記方法により本発明における共重合体が得られる。共重合体の重量平均分子量は、例えば500〜100000、好ましくは1000〜40000、さらに好ましくは2000〜30000程度である。重量平均分子量が少なすぎると耐溶剤性と密着性が低下する場合があり、多すぎると粘度が上昇することにより、共重合体の取り扱いが困難となる場合がある。 The copolymer in this invention is obtained by the said method. The weight average molecular weight of the copolymer is, for example, about 500 to 100,000, preferably 1000 to 40000, and more preferably about 2000 to 30000. If the weight average molecular weight is too small, the solvent resistance and adhesion may be lowered. If the weight average molecular weight is too large, the viscosity may be increased, and the copolymer may be difficult to handle.
上記の方法により得られた重合液は、必要に応じて、固形分濃度を調整したり、溶媒交換したり、濾過処理を施した後、さらに必要に応じて、硬化触媒[熱酸発生剤(熱硬化触媒、熱カチオン重合開始剤)、光酸発生剤(光硬化触媒、光カチオン重合開始剤)]、光ラジカル開始剤、硬化剤、硬化促進剤、添加剤(充填剤、消泡剤、難燃剤、酸化防止剤、紫外線吸収剤、着色剤、低応力化剤、可とう性付与剤、ワックス類、樹脂、架橋剤、ハロゲントラップ剤、レベリング剤、濡れ改良剤など)を配合することにより、硬化性樹脂組成物を得ることができる。また、重合により生成したポリマーを沈殿又は最沈殿等により精製し、この精製したポリマーを前記の適宜な添加物とともに用途に応じた溶媒に溶解することにより、硬化性樹脂組成物を得ることもできる。 The polymerization solution obtained by the above-described method may be prepared by adjusting the solid content concentration, exchanging the solvent, or performing a filtration treatment, if necessary, followed by a curing catalyst [thermal acid generator ( Thermosetting catalyst, thermal cationic polymerization initiator), photoacid generator (photocuring catalyst, photocationic polymerization initiator)], photo radical initiator, curing agent, curing accelerator, additive (filler, antifoaming agent, By blending flame retardants, antioxidants, UV absorbers, colorants, stress reducing agents, flexibility-imparting agents, waxes, resins, cross-linking agents, halogen trapping agents, leveling agents, wetting improvers, etc.) A curable resin composition can be obtained. Moreover, the polymer produced | generated by superposition | polymerization is refine | purified by precipitation or the most precipitation, etc., The curable resin composition can also be obtained by melt | dissolving this refined polymer with the said appropriate additive in the solvent according to a use. .
前記硬化触媒のうち、熱酸発生剤としては、例えば、サンエイドSI−45、同左SI−47、同左SI−60、同左SI−60L、同左SI−80、同左SI−80L、同左SI−100、同左SI−100L、同左SI−145、同左SI−150、同左SI−160、同左SI−110L、同左SI−180L(以上、三新化学工業社製品、商品名)、CI−2921、CI−2920、CI−2946、CI−3128、CI−2624、CI−2639、CI−2064(以上、日本曹達(株)社製品、商品名)、CP−66、CP−77(旭電化工業社製品、商品名)、FC−520(3M社製品、商品名)などに代表されるジアゾニウム塩、ヨードニウム塩、スルホニウム塩、ホスホニウム塩、セレニウム塩、オキソニウム塩、アンモニウム塩等を使用できる。 Among the curing catalysts, as the thermal acid generator, for example, Sun-Aid SI-45, Same as left SI-47, Same as left SI-60, Same as left SI-60L, Same as left SI-80, Same as left SI-80L, Same as left SI-100, Same as SI-100L, Same as left SI-145, Same as left SI-150, Same as left SI-160, Same as left SI-110L, Same as left SI-180L (above, Sanshin Chemical Co., Ltd., product name), CI-2921, CI-2920 CI-2946, CI-3128, CI-2624, CI-2638, CI-2064 (product of Nippon Soda Co., Ltd., product name), CP-66, CP-77 (product of Asahi Denka Kogyo Co., Ltd., product) Name), FC-520 (product of 3M, product name), diazonium salt, iodonium salt, sulfonium salt, phosphonium salt, selenium salt, oxonium salt Ammonium salts, and the like can be used.
光酸発生剤としては、例えば、サイラキュアUVI−6970、サイラキュアUVI−6974、サイラキュアUVI−6990、サイラキュアUVI−950(以上、米国ユニオンカーバイド社製、商品名)、イルガキュア261(チバ・スペシャルティ・ケミカルズ社製、商品名)、SP−150、SP−151、SP−170、オプトマーSP−171(以上、旭電化工業株式会社製、商品名)、CG−24−61(チバ・スペシャルティ・ケミカルズ社製、商品名)、DAICATII(ダイセル化学工業社製、商品名)、UVAC1591(ダイセル・サイテック(株)社製、商品名)、CI−2064、CI−2639、CI−2624、CI−2481、CI−2734、CI−2855、CI−2823、CI−2758(以上、日本曹達社製品、商品名)、PI−2074(ローヌプーラン社製、商品名、ペンタフルオロフェニルボレートトルイルクミルヨードニウム塩)、FFC509(3M社製品、商品名)、BBI−102、BBI−101、BBI−103、MPI−103、TPS−103、MDS−103、DTS−103、NAT−103、NDS−103(ミドリ化学社製、商品名)、CD−1012(米国、Sartomer社製、商品名)などに代表されるジアゾニウム塩、ヨードニウム塩、スルホニウム塩、ホスホニウム塩、セレニウム塩、オキソニウム塩、アンモニウム塩等を使用できる。 Examples of the photoacid generator include Cyracure UVI-6970, Cyracure UVI-6974, Cyracure UVI-6990, Cyracure UVI-950 (above, trade name of Union Carbide, USA), Irgacure 261 (Ciba Specialty Chemicals) Product name), SP-150, SP-151, SP-170, Optomer SP-171 (above, manufactured by Asahi Denka Kogyo Co., Ltd., product name), CG-24-61 (manufactured by Ciba Specialty Chemicals, Product name), DAICATII (manufactured by Daicel Chemical Industries, Ltd., product name), UVAC1591 (manufactured by Daicel-Cytec Co., Ltd., product name), CI-2064, CI-2639, CI-2624, CI-2481, CI-2734 , CI-2855, CI-2823, CI-2758 , Nippon Soda Co., Ltd., trade name), PI-2074 (Rhone-Poulenc, trade name, pentafluorophenyl borate toluylcumyl iodonium salt), FFC509 (3M product, trade name), BBI-102, BBI-101 , BBI-103, MPI-103, TPS-103, MDS-103, DTS-103, NAT-103, NDS-103 (trade name, manufactured by Midori Chemical Co., Ltd.), CD-1012 (trade name, manufactured by Sartomer, USA) ) And the like, and diazonium salts, iodonium salts, sulfonium salts, phosphonium salts, selenium salts, oxonium salts, ammonium salts, and the like can be used.
光ラジカル開始剤としては、例えばベンゾフェノン、アセトフェノンベンジル、ベンジルジメチルケトン、ベンゾイン、ベンゾインメチルエーテル、ベンゾインエチルエーテル、ベンゾインイソプロピルエーテル、ジメトキシアセトフェノン、ジメトキシフェニルアセトフェノン、ジエトキシアセトフェノン、ジフェニルジサルファイト、オルトベンゾイル安息香酸メチル、4−ジメチルアミノ安息香酸エチル(日本化薬(株)製 カヤキュアEPA等)、2,4−ジエチルチオキサンソン(日本化薬(株)製 カヤキュアDETX等)、2−メチル−1−[4−(メチル)フェニル]−2−モルホリノプロパノン−1(チバガイギ−(株)製 イルガキュア907等)、テトラ(t−ブチルパーオキシカルボニル)ベンゾフェノン、ベンジル、2−ヒドロキシ−2−メチル−1−フェニル−プロパン−1−オン、4,4−ビスジエチルアミノベンゾフェノン、2,2'−ビス(2−クロロフェニル)−4,5,4´,5´−テトラフェニル−1,2´−ビイミダゾ−ル(保土谷化学(株)製 B−CIM等)等を単独、もしくは混合して使用することができ、必要に応じて光増感剤を加えることができる。 Examples of the photo radical initiator include benzophenone, acetophenone benzyl, benzyl dimethyl ketone, benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, dimethoxyacetophenone, dimethoxyphenylacetophenone, diethoxyacetophenone, diphenyldisulfite, orthobenzoylbenzoate. Methyl 4-ethylaminobenzoate (Nippon Kayaku Co., Ltd. Kayacure EPA), 2,4-diethylthioxanthone (Nippon Kayaku Co., Ltd. Kayacure DETX etc.), 2-methyl-1- [4- (methyl) phenyl] -2-morpholinopropanone-1 (manufactured by Ciba-Gigi-Irgacure 907, etc.), tetra (t-butylperoxycarbonyl) benzophenone, benzyl, -Hydroxy-2-methyl-1-phenyl-propan-1-one, 4,4-bisdiethylaminobenzophenone, 2,2'-bis (2-chlorophenyl) -4,5,4 ', 5'-tetraphenyl- 1,2′-biimidazole (B-CIM, etc., manufactured by Hodogaya Chemical Co., Ltd.) or the like can be used alone or in combination, and a photosensitizer can be added as necessary.
硬化触媒の添加量は、硬化性樹脂組成物中の前記共重合体(樹脂分)に対して、例えば0.05〜10重量%、好ましくは0.5〜5重量%である。硬化触媒は単独で又は2種以上を組み合わせて使用できる。前記添加量が0.05重量%未満であると、硬化触媒としての性能が発揮されないという問題が起こる場合があり、5重量%を超えると、硬化触媒が残存することにより、硬化不良を起こし耐溶剤性が低下するという問題が起こる場合がある。 The addition amount of the curing catalyst is, for example, 0.05 to 10% by weight, preferably 0.5 to 5% by weight with respect to the copolymer (resin component) in the curable resin composition. A curing catalyst can be used individually or in combination of 2 or more types. If the added amount is less than 0.05% by weight, there may be a problem that the performance as a curing catalyst is not exhibited. If the added amount exceeds 5% by weight, the curing catalyst remains, causing poor curing and resistance. There may be a problem that the solvent property is lowered.
硬化剤としては、例えば、フェノール樹脂、酸無水物などが挙げられる。フェノール樹脂としては、例えば、フェノール又はクレゾールをホルムアルデヒドを用いて重合させた樹脂を使用できる。この樹脂は、ジシクロペンタジエン、ナフタレン、ビフェニルなどの脂環式化合物又は芳香族化合物を共重合させたものであってもよい。フェノール樹脂の添加量は、本発明の共重合体100重量部に対して、例えば0〜200重量部(例えば5〜200重量部程度)の範囲で適宜選択できる。 As a hardening | curing agent, a phenol resin, an acid anhydride, etc. are mentioned, for example. As the phenol resin, for example, a resin obtained by polymerizing phenol or cresol using formaldehyde can be used. This resin may be a copolymer of an alicyclic compound or aromatic compound such as dicyclopentadiene, naphthalene, or biphenyl. The addition amount of a phenol resin can be suitably selected, for example in the range of 0-200 weight part (for example, about 5-200 weight part) with respect to 100 weight part of copolymers of this invention.
酸無水物としては、多塩基酸無水物が挙げられ、具体的には、無水フタル酸、無水トリメリット酸、無水ピロメリット酸、ベンゾフェノンテトラカルボン酸無水物、Δ4−テトラヒドロ無水フタル酸、4−メチル−Δ4−テトラヒドロ無水フタル酸、3−メチル−Δ4−テトラヒドロ無水フタル酸、無水ナジック酸、無水メチルナジック酸、水素化メチルナジック酸無水物、4−(4−メチル−3−ペンテニル)テトラヒドロ無水フタル酸、無水コハク酸、無水アジピン酸、無水マレイン酸、無水セバシン酸、無水ドデカン二酸、メチルシクロヘキセンテトラカルボン酸無水物、ドデセニル無水コハク酸、ヘキサヒドロ無水フタル酸、4−メチルヘキサヒドロ無水フタル酸、3−メチルヘキサヒドロ無水フタル酸、ビニルエーテル−無水マレイン酸共重合体、アルキルスチレン無水マレイン酸共重合体等が挙げられる。酸無水物の配合量は、本発明の共重合体100重量部に対して、例えば0〜160重量部(例えば20〜160重量部程度)の範囲で適宜選択できる。 Examples of the acid anhydride include polybasic acid anhydrides. Specifically, phthalic anhydride, trimellitic anhydride, pyromellitic anhydride, benzophenonetetracarboxylic anhydride, Δ 4 -tetrahydrophthalic anhydride, 4 -Methyl-Δ 4 -tetrahydrophthalic anhydride, 3-methyl-Δ 4 -tetrahydrophthalic anhydride, nadic anhydride, methyl nadic anhydride, hydrogenated methyl nadic anhydride, 4- (4-methyl-3-pentenyl) ) Tetrahydrophthalic anhydride, succinic anhydride, adipic anhydride, maleic anhydride, sebacic anhydride, dodecanedioic anhydride, methylcyclohexene tetracarboxylic anhydride, dodecenyl succinic anhydride, hexahydrophthalic anhydride, 4-methylhexahydro Phthalic anhydride, 3-methylhexahydrophthalic anhydride, vinyl ether-maleic anhydride Acid copolymers, alkyl styrene-maleic anhydride copolymer and the like. The compounding quantity of an acid anhydride can be suitably selected, for example in the range of 0-160 weight part (for example, about 20-160 weight part) with respect to 100 weight part of copolymers of this invention.
硬化剤としてフェノール樹脂や酸無水物を用いた場合には、硬化促進剤を共に用いることが好ましい。硬化促進剤としては、一般に使用されるものであれば特に制限されないが、ジアザビシクロウンデセン系硬化促進剤(ジアザビシクロアルケン類)、リン酸エステル、ホスフィン類などのリン系硬化促進剤や、3級アミンもしくは4級アンモニウム塩などのアミン系硬化促進剤が挙げられる。ジアザビシクロウンデセン系硬化促進剤としては、例えば、1,8−ジアザビシクロ[5.4.0]ウンデセン−7(DBU)及びその塩を挙げることができるが、特に、1,8−ジアザビシクロ[5.4.0]ウンデセン−7のオクチル酸塩、スルホン酸塩、オルソフタル酸塩、石炭酸塩等の有機酸塩が好ましい。上記の他の硬化促進剤としては、具体的には、例えば、ベンジルジメチルアミン、2,4,6−トリス(ジメチルアミノメチル)フェノール等の3級アミン、2−エチル−4−メチルイミダゾール、1−シアノエチル−2−エチル−4−メチルイミダゾール等のイミダゾール類、テトラ−n−ブチルホスホニウム−O,O−ジエチルホスホロジチオエートなどの芳香族を含まないリン化合物(ホスホニウム塩等)、3級アミン塩、4級アンモニウム塩、オクチル酸スズ等の金属塩等の公知の化合物を挙げることができる。さらに、上記ジアザビシクロアルケン類の有機酸塩とともに、金属有機酸塩を併用することができる。金属有機酸塩としては、例えば、オクチル酸スズ、オクチル酸亜鉛、ナフテン酸スズ、ナフテン酸亜鉛などが挙げられる。硬化促進剤の使用量は、本発明の共重合体100重量部に対して、例えば0〜3重量部(例えば0.05〜3重量部程度)の範囲で適宜選択できる。 When a phenol resin or acid anhydride is used as the curing agent, it is preferable to use a curing accelerator together. The curing accelerator is not particularly limited as long as it is generally used. However, phosphorus curing accelerators such as diazabicycloundecene curing accelerators (diazabicycloalkenes), phosphate esters, phosphines, Examples include amine-based curing accelerators such as tertiary amines and quaternary ammonium salts. Examples of the diazabicycloundecene-based curing accelerator include 1,8-diazabicyclo [5.4.0] undecene-7 (DBU) and salts thereof. In particular, 1,8-diazabicyclo [ 5.4.0] Organic salts of undecene-7 such as octylate, sulfonate, orthophthalate, and coalate are preferred. Specific examples of the other curing accelerator include tertiary amines such as benzyldimethylamine and 2,4,6-tris (dimethylaminomethyl) phenol, 2-ethyl-4-methylimidazole, 1 -Phosphorus compounds (phosphonium salts, etc.) that do not contain aromatics, such as imidazoles such as cyanoethyl-2-ethyl-4-methylimidazole, tetra-n-butylphosphonium-O, O-diethyl phosphorodithioate, and tertiary amines Known compounds such as salts, metal salts such as quaternary ammonium salts and tin octylate can be exemplified. Furthermore, a metal organic acid salt can be used in combination with the organic acid salt of the diazabicycloalkenes. Examples of the metal organic acid salt include tin octylate, zinc octylate, tin naphthenate, and zinc naphthenate. The usage-amount of a hardening accelerator can be suitably selected in the range of 0-3 weight part (for example, about 0.05-3 weight part) with respect to 100 weight part of copolymers of this invention, for example.
前記架橋剤としては、例えば、多官能性アルコール化合物や多官能性チオール化合物類等を使用できる。 As said crosslinking agent, a polyfunctional alcohol compound, polyfunctional thiol compounds, etc. can be used, for example.
多官能性アルコール化合物としては、ヒドロキシル基を2個以上有する化合物であればよく、例えば、エチレングリコール、ジエチレングリコール、トリエチレングリコール、プロピレングリコール、ジプロピレングリコール、1,3−ブチレングリコール、1,4−ブチレングリコール、グリセリン、ジグリセリン、D−グルコース、D−グルシトール、イソプレングリコール、ブタンジオール、1,5−ペンタンジオール、1 ,6−ヘキサンジオール、1,9−ノナンジオール、ネオペンチルグリコール等の多価アルコール類、ポリエチレングリコール類、ポリプロピレングリコール類、ポリブチレングリコール類、ポリテトラメチレングリコール類などのポリアルキレングリコール類、ポリカプロラクトンジオール類、ポリカプロラクトントリオール類、ポリカーボネートジオール類などが挙げられる。 The polyfunctional alcohol compound may be a compound having two or more hydroxyl groups. For example, ethylene glycol, diethylene glycol, triethylene glycol, propylene glycol, dipropylene glycol, 1,3-butylene glycol, 1,4- Multivalents such as butylene glycol, glycerin, diglycerin, D-glucose, D-glucitol, isoprene glycol, butanediol, 1,5-pentanediol, 1,6-hexanediol, 1,9-nonanediol, neopentyl glycol Polyalkylene glycols such as alcohols, polyethylene glycols, polypropylene glycols, polybutylene glycols, polytetramethylene glycols, polycaprolactone diols, polycaprolacs Examples include tontriols and polycarbonate diols.
多官能性チオール化合物としては、チオール基を2個以上有する化合物であればよく、例えば、ヘキサンジチオール 、デカンジチオール 、1,4−ブタンジオールビスチオプロピオネート、1,4−ブタンジオールビスチオグリコレート、エチレングリコールビスチオグリコレート、エチレングリコールビスチオプロピオネート、トリメチロールプロパントリスチオグリコレート、トリメチロールプロパントリスチオプロピオネート、トリメチロールプロパントリス(3−メルカプトブチレート)、ペンタエリスリトールテトラキスチオグリコレート、ペンタエリスリトールテトラキスチオプロピオネート、トリメルカプトプロピオン酸トリス(2−ヒドロキシエチル)イソシアヌレート、1,4−ジメチルメルカプトベンゼン、2、4、6−トリメルカプト−s−トリアジン、2−(N,N−ジブチルアミノ)−4,6−ジメルカプト−s−トリアジン、テトラエチレングリコールビス3−メルカプトプロピオネート、トリメチロールプロパントリス3−メルカプトプロピオネート、トリス(3−メルカプトプロピニルオキシエチル)イソシアヌレート、ペンタエリスリトールテトラキス3−メルカプトプロピオネート、ジペンタエリスリトールテトラキス3−メルカプトプロピオネート、1,4−ビス(3−メルカプトブチリルオキシ)ブタン、1,3,5−トリス(3−メルカブトブチルオキシエチル)−1,3,5−トリアジン−2,4,6(1H,3H,5H)−トリオン、ペンタエリスリトールテトラキス(3−メルカプトブチレート)などが挙げられる。多官能性アルコール化合物や多官能性チオール化合物類は1種単独であってもよく、2種以上存在していてもよい。 The polyfunctional thiol compound may be a compound having two or more thiol groups. For example, hexanedithiol, decanedithiol, 1,4-butanediol bisthiopropionate, 1,4-butanediol bisthioglyco Rate, ethylene glycol bisthioglycolate, ethylene glycol bisthiopropionate, trimethylolpropane tristhioglycolate, trimethylolpropane tristhiopropionate, trimethylolpropane tris (3-mercaptobutyrate), pentaerythritol tetrakisthio Glycolate, pentaerythritol tetrakisthiopropionate, trimercaptopropionic acid tris (2-hydroxyethyl) isocyanurate, 1,4-dimethylmercaptobenzene, 2, 4, -Trimercapto-s-triazine, 2- (N, N-dibutylamino) -4,6-dimercapto-s-triazine, tetraethylene glycol bis3-mercaptopropionate, trimethylolpropane tris3-mercaptopropionate , Tris (3-mercaptopropynyloxyethyl) isocyanurate, pentaerythritol tetrakis 3-mercaptopropionate, dipentaerythritol tetrakis 3-mercaptopropionate, 1,4-bis (3-mercaptobutyryloxy) butane, , 3,5-tris (3-mercaptobutyloxyethyl) -1,3,5-triazine-2,4,6 (1H, 3H, 5H) -trione, pentaerythritol tetrakis (3-mercaptobutyrate), etc. Is mentioned. One type of polyfunctional alcohol compound or polyfunctional thiol compound may be used alone, or two or more types may be present.
硬化性樹脂組成物には感放射線性成分を配合することもできる。感放射線性成分としては、多官能性(メタ)アクリレート[多官能性ウレタン(メタ)アクリレート、多官能性エポキシ(メタ)アクリレート(エポキシ基にアクリル酸を付加したタイプ)を含む]等の多官能ビニル化合物、多官能性エポキシ化合物等のエポキシ化合物又はエポキシ樹脂などが挙げられる。多官能性(メタ)アクリレートと熱または放射線重合開始剤、多官能性エポキシ化合物と熱または放射線酸発生剤を組み合わせて配合してもよい。これら感放射線性成分や熱または放射線重合開始剤、熱または放射線酸発生剤はそれぞれ1種単独であってもよく、2種以上存在していてもよい。 A radiation sensitive component can also be mix | blended with curable resin composition. As the radiation sensitive component, multifunctional such as multifunctional (meth) acrylate [including multifunctional urethane (meth) acrylate, multifunctional epoxy (meth) acrylate (type in which acrylic acid is added to epoxy group)] Examples thereof include epoxy compounds such as vinyl compounds and polyfunctional epoxy compounds, and epoxy resins. A polyfunctional (meth) acrylate and a heat or radiation polymerization initiator, or a polyfunctional epoxy compound and a heat or radiation acid generator may be combined. Each of these radiation-sensitive components, heat or radiation polymerization initiators, and heat or radiation acid generators may be used alone or in combination of two or more.
多官能性(メタ)アクリレートの具体例としては、エチレングリコール、プロピレングリコールなどのアルキレングリコールのジ(メタ)アクリレート類、ポリエチレングリコール、ポリプロピレングリコールなどのポリアルキレングリコールのジ(メタ)アクリレート類、両末端ヒドロキシポリブタジエン、両末端ヒドロキシポリイソプレン、両末端ヒドロキシポリカプリラクトンなどの両末端ヒドロキシル化重合体のジ(メタ)アクリレート類、グリセリン、1,2,4,−ブタントリオール、トリメチロールアルカン、テトラメチロールアルカン、ペンタエリスリトール、ジペンタエリスリトールなどの3価以上の多価アルコールのポリ(メタ)アクリレート類、3価以上の多価アルコールのポリアルキレングリコール付加物のポリ(メタ)アクリレート類、1,4−シクロヘキサンジオール、1,4−ベンゼンジオール類などの環式ポリオールのポリ(メタ)アクリレート類、ポリエステル(メタ)アクリレート、エポキシ(メタ)アクリレート、ウレタン(メタ)アクリレート、アルキッド樹脂(メタ)アクリレート、シリコン樹脂(メタ)アクリレート、スピラン樹脂(メタ)アクリレート等のオリゴ(メタ)アクリレートなどが挙げられる。これらは1種単独であってもよく、2種以上存在していてもよい。 Specific examples of polyfunctional (meth) acrylates include di (meth) acrylates of alkylene glycols such as ethylene glycol and propylene glycol, di (meth) acrylates of polyalkylene glycols such as polyethylene glycol and polypropylene glycol, both ends Di (meth) acrylates of both end hydroxylated polymers such as hydroxypolybutadiene, both end hydroxypolyisoprene and both end hydroxypolycaprilactone, glycerin, 1,2,4, -butanetriol, trimethylolalkane, tetramethylolalkane , Poly (meth) acrylates of trihydric or higher polyhydric alcohols such as pentaerythritol, dipentaerythritol, poly (polyalkylene glycol adducts of trihydric or higher polyhydric alcohols ( ) Acrylates, poly (meth) acrylates of cyclic polyols such as 1,4-cyclohexanediol, 1,4-benzenediols, polyester (meth) acrylate, epoxy (meth) acrylate, urethane (meth) acrylate, Examples thereof include oligo (meth) acrylates such as alkyd resin (meth) acrylate, silicon resin (meth) acrylate, and spirane resin (meth) acrylate. These may be used alone or in combination of two or more.
多官能性エポキシ化合物としては、例えば、商品名「セロキサイド2021」、商品名「セロキサイド2081」、商品名「セロキサイド3000」、商品名「EHPE3150」、商品名「エポリードGT401」(以上、ダイセル化学工業株式会社製)、商品名「エポライト4000」(共栄社化学製)などを使用できる。これらは1種単独であってもよく、2種以上存在していてもよい。 As the multifunctional epoxy compound, for example, the trade name “Celoxide 2021”, the trade name “Celoxide 2081”, the trade name “Celoxide 3000”, the trade name “EHPE3150”, the trade name “Epolide GT401” (above, Daicel Chemical Industries Ltd.) Company name), trade name "Epolite 4000" (manufactured by Kyoeisha Chemical Co., Ltd.) and the like. These may be used alone or in combination of two or more.
硬化性樹脂組成物には、ガラス微粒子、金属酸化物微粒子、ゴム微粒子、セラミック微粒子等の微粒子を配合してもよい。微粒子、金属酸化物微粒子、ゴム微粒子、セラミック微粒子等の微粒子を配合してもよい。また、ガラス繊維、ファイバー繊維、ケプラ繊維を配合してもよい。これらは単独で又は2種以上を組み合わせて使用できる。 The curable resin composition may contain fine particles such as glass fine particles, metal oxide fine particles, rubber fine particles, and ceramic fine particles. Fine particles such as fine particles, metal oxide fine particles, rubber fine particles, and ceramic fine particles may be blended. Moreover, you may mix | blend glass fiber, a fiber fiber, and a Kepla fiber. These can be used alone or in combination of two or more.
こうして得られる硬化性樹脂組成物は、硬化により、優れた耐溶剤性、耐吸湿性を有し、且つ溶剤に触れても高い密着性を有する硬化物(硬化皮膜等)を得ることができる。そのため、塗料、コーティング剤、粘接着剤等として有用であり、特に電子材料分野で好適に使用できる。 The curable resin composition thus obtained can obtain a cured product (cured film or the like) having excellent solvent resistance and moisture absorption resistance and high adhesion even when touched by the solvent. Therefore, it is useful as a paint, a coating agent, an adhesive, and the like, and can be suitably used particularly in the field of electronic materials.
上記硬化性樹脂組成物を硬化させることにより諸物性に優れた硬化物が得られる。例えば、上記硬化性樹脂組成物を、スピンコーター、スリットコーターなどの方式によって、各種基材又は基板へ塗工して塗膜を形成した後、該塗膜を硬化させることにより硬化物を得ることができる。基材又は基板としては、ガラス、セラミック、シリコンウエハ、金属、プラスチックなどが挙げられる。スピンコーターやスリットコーター等による塗工は公知の方法により行うことができる。 By curing the curable resin composition, a cured product having excellent physical properties can be obtained. For example, the curable resin composition is applied to various substrates or substrates by a method such as a spin coater or a slit coater to form a coating film, and then a cured product is obtained by curing the coating film. Can do. Examples of the base material or substrate include glass, ceramic, silicon wafer, metal, and plastic. Coating with a spin coater, slit coater, or the like can be performed by a known method.
塗膜の硬化は加熱すること、あるいは活性エネルギー線を照射し露光すること、又は露光後に加熱することにより行われる。上記硬化性樹脂組成物を熱により硬化させる場合、加熱温度は50℃から260℃の範囲、好ましくは80℃から240℃の範囲である。また、上記硬化性樹脂組成物を光により硬化させる場合、露光には種々の波長の光線、例えば、紫外線、X線、g線、i線、エキシマレーザーなどが使用される。硬化後の塗膜の厚みは、用途によって適宜選択できるが、一般には0.1〜40μm、好ましくは0.3〜20μm、より好ましくは0.5〜10μm程度である。 Curing of the coating film is performed by heating, irradiating and irradiating active energy rays, or heating after exposure. When the curable resin composition is cured by heat, the heating temperature is in the range of 50 ° C to 260 ° C, preferably in the range of 80 ° C to 240 ° C. When the curable resin composition is cured by light, light of various wavelengths, for example, ultraviolet rays, X-rays, g-rays, i-rays, excimer lasers, etc. are used for exposure. Although the thickness of the coating film after hardening can be suitably selected according to a use, generally it is 0.1-40 micrometers, Preferably it is 0.3-20 micrometers, More preferably, it is about 0.5-10 micrometers.
以下に、実施例に基づいて本発明をより詳細に説明するが、本発明はこれらの実施例により限定されるものではない。なお、生成した共重合体の重量平均分子量(ポリスチレン換算)及び分散度(重量平均分子量Mw/数平均分子量Mn)は、以下の条件にて測定した。
装置:検出器:RID-10A(島津製作所)
ポンプ:LC-10ADVP(島津製作所)
システムコントローラー:SCL-10AVP(島津製作所)
デガッサー:DGU-14A(島津製作所)
オートインジェクター:SIL-10AF(島津製作所)
カラム:Waters Styragel HR3, Styragel HR4, Styragel HR5 計3本
移動相:THF(テトラヒドロフラン)
流量:1mL/min
温度:オーブン(40℃)、RI(40℃)
検出器:RI POLARITY(+)
注入量:50μL
Hereinafter, the present invention will be described in more detail based on examples, but the present invention is not limited to these examples. In addition, the weight average molecular weight (polystyrene conversion) and dispersion degree (weight average molecular weight Mw / number average molecular weight Mn) of the produced | generated copolymer were measured on condition of the following.
Device: Detector: RID-10A (Shimadzu Corporation)
Pump: LC-10ADVP (Shimadzu Corporation)
System controller: SCL-10AVP (Shimadzu Corporation)
Degasser: DGU-14A (Shimadzu Corporation)
Autoinjector: SIL-10AF (Shimadzu Corporation)
Column: Waters Styragel HR3, Styragel HR4, Styragel HR5, 3 in total Mobile phase: THF (tetrahydrofuran)
Flow rate: 1mL / min
Temperature: Oven (40 ° C), RI (40 ° C)
Detector: RI POLARITY (+)
Injection volume: 50μL
実施例1
還流冷却器、滴下ロート及び撹拌機を備えた1Lのフラスコ内に窒素を適量流して窒素雰囲気とし、4−ビニルフェネチルオキシラン30重量部を入れ、撹拌しながら80℃まで加熱した。次いで、該フラスコ内に、(4−ビニルフェニル)酢酸70重量部を、メトキシブチルアセテート(ダイセル化学工業社製)10重量部に溶解した溶液を滴下ポンプを用いて約4時間かけて滴下した。一方、重合開始剤2,2′−アゾビスイソブチロニトリル0.9重量部をメトキシブチルアセテート40重量部に溶解した溶液を別の滴下ポンプを用いて約4時間かけてフラスコ内に滴下した。重合開始剤の滴下が終了した後、約3時間同温度に保持し、その後室温まで冷却して、固形分50重量%の共重合体溶液を得た。生成した共重合体の重量平均分子量Mwは14000、分散度2.10であった。
Example 1
An appropriate amount of nitrogen was flowed into a 1 L flask equipped with a reflux condenser, a dropping funnel and a stirrer to form a nitrogen atmosphere, 30 parts by weight of 4-vinylphenethyloxirane was added, and the mixture was heated to 80 ° C. with stirring. Next, a solution prepared by dissolving 70 parts by weight of (4-vinylphenyl) acetic acid in 10 parts by weight of methoxybutyl acetate (manufactured by Daicel Chemical Industries) was dropped into the flask over about 4 hours using a dropping pump. On the other hand, a solution prepared by dissolving 0.9 parts by weight of a polymerization initiator 2,2′-azobisisobutyronitrile in 40 parts by weight of methoxybutyl acetate was dropped into the flask using another dropping pump over about 4 hours. . After completion of dropping of the polymerization initiator, the temperature was maintained at the same temperature for about 3 hours, and then cooled to room temperature to obtain a copolymer solution having a solid content of 50% by weight. The produced copolymer had a weight average molecular weight Mw of 14,000 and a dispersity of 2.10.
実施例2
単量体組成を、4−ビニルベンジルオキシラン50重量部、(4−ビニルフェニル)酢酸50重量部に変更する以外は、実施例1と同様の操作を行い、固形分42重量%の共重合体溶液を得た。生成した共重合体の重量平均分子量Mwは18000、分散度1.80であった。
Example 2
A copolymer having a solid content of 42% by weight, except that the monomer composition is changed to 50 parts by weight of 4-vinylbenzyloxirane and 50 parts by weight of (4-vinylphenyl) acetic acid. A solution was obtained. The produced copolymer had a weight average molecular weight Mw of 18000 and a dispersity of 1.80.
実施例3
単量体組成を、4−ビニルベンジルオキシラン35重量部、4−ビニルフェネチルオキシラン35重量部、(4−ビニルフェニル)酢酸30重量部に変更する以外は、実施例1と同様の操作を行い、固形分55重量%の共重合体溶液を得た。生成した共重合体の重量平均分子量Mwは18000、分散度2.20であった。
Example 3
The same procedure as in Example 1 was performed except that the monomer composition was changed to 35 parts by weight of 4-vinylbenzyloxirane, 35 parts by weight of 4-vinylphenethyloxirane, and 30 parts by weight of (4-vinylphenyl) acetic acid. A copolymer solution having a solid content of 55% by weight was obtained. The produced copolymer had a weight average molecular weight Mw of 18000 and a dispersity of 2.20.
実施例4
単量体組成を、4−ビニルベンジルオキシラン30重量部、(4−ビニルフェニル)酢酸40重量部、メタクリル酸2−[O−(1’−メチルプロピリデンアミノ)カルボキシアミノ]エチル(商品名「カレンズMOI−BM」、昭和電工株式会社製)30重量部に変更する以外は、実施例1と同様の操作を行い、固形分49重量%の共重合体溶液を得た。生成した共重合体の重量平均分子量Mwは13000、分散度2.00であった。
Example 4
The monomer composition is 30 parts by weight of 4-vinylbenzyloxirane, 40 parts by weight of (4-vinylphenyl) acetic acid, 2- [O- (1′-methylpropylideneamino) carboxyamino] ethyl methacrylate (trade name “ Except for changing to 30 parts by weight of “Karenz MOI-BM” (manufactured by Showa Denko KK), a copolymer solution having a solid content of 49% by weight was obtained in the same manner as in Example 1. The produced copolymer had a weight average molecular weight Mw of 13,000 and a dispersity of 2.00.
実施例5
単量体組成を、4−ビニルフェネチルオキシラン30重量部、(4−ビニルフェニル)酢酸40重量部、γ−メタクリロキシプロピルトリエトキシシラン(東レ・ダウコーニング株式会社製、商品名SZ6063)30重量部に変更する以外は、実施例1と同様の操作を行い、固形分45%の共重合体溶液を得た。生成した共重合体の重量平均分子量Mwは26000、分散度2.80であった。
Example 5
The monomer composition is 30 parts by weight of 4-vinylphenethyloxirane, 40 parts by weight of (4-vinylphenyl) acetic acid, 30 parts by weight of γ-methacryloxypropyltriethoxysilane (trade name SZ6063, manufactured by Toray Dow Corning Co., Ltd.). A copolymer solution having a solid content of 45% was obtained in the same manner as in Example 1 except that the copolymer solution was changed to. The produced copolymer had a weight average molecular weight Mw of 26000 and a dispersity of 2.80.
実施例6
単量体組成を、4−ビニルベンジルオキシラン30重量部、(4−ビニルフェニル)酢酸40重量部、メタクリル酸2−O−(1’−メチルプロピリデンアミノ)カルボキシアミノ]エチル(商品名「カレンズMOI−BM」、昭和電工株式会社製)15重量部、γ−メタクリロキシプロピルトリエトキシシラン(東レ・ダウコーニング株式会社製、商品名SZ6063)15重量部に変更する以外は、実施例1と同様の操作を行い、固形分47重量%の共重合体溶液を得た。生成した共重合体の重量平均分子量Mwは19000、分散度2.30であった。
Example 6
The monomer composition is 30 parts by weight of 4-vinylbenzyloxirane, 40 parts by weight of (4-vinylphenyl) acetic acid, 2-O- (1′-methylpropylideneamino) carboxyamino] ethyl methacrylate (trade name “Karenz “MOI-BM” (manufactured by Showa Denko KK) 15 parts by weight, γ-methacryloxypropyltriethoxysilane (manufactured by Toray Dow Corning Co., Ltd., trade name SZ6063) 15 parts by weight Thus, a copolymer solution having a solid content of 47% by weight was obtained. The resulting copolymer had a weight average molecular weight Mw of 19000 and a dispersity of 2.30.
比較例1
単量体組成を、4−ビニルベンジルオキシラン100重量部のみに変更する以外は、実施例1と同様の操作を行い、固形分40重量%の共重合体溶液を得た。生成した共重合体の重量平均分子量Mwは18000、分散度1.70であった。
Comparative Example 1
Except changing the monomer composition to only 100 parts by weight of 4-vinylbenzyloxirane, the same operation as in Example 1 was performed to obtain a copolymer solution having a solid content of 40% by weight. The produced copolymer had a weight average molecular weight Mw of 18000 and a dispersity of 1.70.
比較例2
単量体組成を、4−ビニルフェネチルオキシラン100重量部のみに変更する以外は、実施例1と同様の操作を行い、固形分42重量%の共重合体溶液を得た。生成した共重合体の重量平均分子量Mwは24000、分散度1.80であった。
Comparative Example 2
Except for changing the monomer composition to only 100 parts by weight of 4-vinylphenethyloxirane, the same operation as in Example 1 was performed to obtain a copolymer solution having a solid content of 42% by weight. The produced copolymer had a weight average molecular weight Mw of 24,000 and a dispersity of 1.80.
比較例3
単量体組成を、メタクリル酸グリシジル50重量部、(4−ビニルフェニル)酢酸50重量部に変更する以外は、実施例1と同様の操作を行い、固形分54重量%の共重合体溶液を得た。生成した共重合体の重量平均分子量Mwは19000、分散度2.10であった。
Comparative Example 3
Except for changing the monomer composition to 50 parts by weight of glycidyl methacrylate and 50 parts by weight of (4-vinylphenyl) acetic acid, the same operation as in Example 1 was carried out to obtain a copolymer solution having a solid content of 54% by weight. Obtained. The resulting copolymer had a weight average molecular weight Mw of 19000 and a dispersity of 2.10.
比較例4
単量体組成を、メタクリル酸3,4−エポキシシクロヘキシルメチル(商品名「サイクロマー M100」、ダイセル化学工業株式会社製)50重量部、(4−ビニルフェニル)酢酸50重量部に変更する以外は、実施例1と同様の操作を行い、固形分51重量%の共重合体溶液を得た。生成した共重合体の重量平均分子量Mwは22000、分散度2.25であった。
Comparative Example 4
Except for changing the monomer composition to 3,4-epoxycyclohexylmethyl methacrylate (trade name “Cyclomer M100”, manufactured by Daicel Chemical Industries, Ltd.) and 50 parts by weight of (4-vinylphenyl) acetic acid. The same operation as in Example 1 was performed to obtain a copolymer solution having a solid content of 51% by weight. The produced copolymer had a weight average molecular weight Mw of 22000 and a dispersity of 2.25.
比較例5
単量体組成を、4−ビニルフェネチルオキシラン70重量部、メタクリル酸30重量部に変更する以外は、実施例1と同様の操作を行い、固形分54重量%の共重合体溶液を得た。生成した共重合体の重量平均分子量Mwは20000、分散度2.10であった。
Comparative Example 5
Except changing the monomer composition to 70 parts by weight of 4-vinylphenethyloxirane and 30 parts by weight of methacrylic acid, the same operation as in Example 1 was performed to obtain a copolymer solution having a solid content of 54% by weight. The produced copolymer had a weight average molecular weight Mw of 20000 and a dispersity of 2.10.
評価試験
(1)評価用試験片の作製
基材に、各実施例及び比較例で得られた共重合体溶液(硬化性樹脂組成物)をスピンコーターで塗布したのち、80℃のホットプレートで10分間加熱後、230℃のオーブン中で60分間加熱することで各評価用試験片を作製した。基材として、ガラス板とステンレス板を用いた。
Evaluation test (1) Preparation of test piece for evaluation After applying the copolymer solution (curable resin composition) obtained in each Example and Comparative Example to a base material with a spin coater, on a hot plate at 80 ° C. After heating for 10 minutes, each evaluation test piece was produced by heating in an oven at 230 ° C. for 60 minutes. A glass plate and a stainless steel plate were used as the base material.
(2)耐溶剤性
実施例及び比較例において、ガラス板で作製した評価用試験片へ、イソプロピルアルコール(IPA)、メチルエチルケトン(MEK)、N―メチルピロリドン(NMP)をそれぞれ1滴づつ滴下し、10分間放置した。その後水洗し、溶剤を滴下した箇所が全く変化していなかったら◎、僅かに溶剤の跡が残るが、拭き取れば消えるようであれば○、溶剤の跡が残り、拭き取っても消えないようであれば△、全面的に変色していたら×とした。ステンレス板で作製した評価用試験片を用いた場合も同様の結果が得られた。
(2) Solvent resistance In Examples and Comparative Examples, isopropyl alcohol (IPA), methyl ethyl ketone (MEK), and N-methyl pyrrolidone (NMP) were dropped on each of the test pieces prepared with glass plates, Left for 10 minutes. After washing with water, if the location where the solvent has been dripped has not changed at all ◎, a trace of the solvent will remain, but if it disappears if wiped off, ○ will leave a trace of the solvent and will not disappear even if wiped off. △, if it was completely discolored, x. Similar results were obtained when using test specimens made of stainless steel plates.
(3)密着性(耐溶剤試験後)
実施例及び比較例において、耐溶剤性試験を実施した箇所についてJIS K−5600−5−6に準拠し、基材からの剥離により密着性を測定した。また、JIS K−5600−5−6 8.3 表1 試験結果の分類で規定された分類に従って下記基準に基づいてガラス板及びステンレス板について評価した。
◎・・・試験結果の分類の「0」であった。
○・・・試験結果の分類の「1」であった。
△・・・試験結果の分類の「2」であった。
×・・・試験結果の分類の「3」「4」であった。
(3) Adhesion (after solvent resistance test)
In the examples and comparative examples, the adhesiveness was measured by peeling from the substrate in accordance with JIS K-5600-5-6 for the places where the solvent resistance test was performed. Moreover, according to the classification | category prescribed | regulated by the classification | category of JIS K-5600-5-6 8.3 Table 1 test result, it evaluated about the glass plate and the stainless steel plate based on the following reference | standard.
A: The test result classification was “0”.
○: It was “1” in the classification of the test results.
Δ: “2” in the classification of test results.
X: “3” and “4” in the classification of the test results.
(4)耐吸湿性
実施例及び比較例において、ガラス板で作製した評価用試験片を、温度20℃/湿度65%の恒温恒湿槽にて24時間養生し、その後塗膜をTG/DTA(示差熱熱重量同時測定装置)により測定した。
1%重量減少時の温度が200℃以上のものは○、100〜200℃のものは△、100℃以下は×とした。
(4) Hygroscopic resistance In the examples and comparative examples, the test specimens made of glass plates were cured for 24 hours in a constant temperature and humidity chamber at a temperature of 20 ° C./humidity of 65%, and the coating film was then treated with TG / DTA. It was measured by (differential thermothermal gravimetric simultaneous measurement device).
The temperature when the 1% weight loss was 200 ° C. or higher was evaluated as “◯”, the temperature between 100 ° C. and 200 ° C. as “Δ”, and the temperature at 100 ° C. or lower as “X”.
評価試験の結果を表1に示す。 The results of the evaluation test are shown in Table 1.
表1中の略語は以下のものを表す。
DN−1:4−ビニルベンジルオキシラン
DN−2:4−ビニルフェネチルオキシラン
GMA:メタクリル酸グリシジル
サイクロマーM100:メタクリル酸3,4−エポキシシクロヘキシルメチル(ダイセル化学工業株式会社製)
CMSCA:(4−ビニルフェニル)酢酸
MOI−BM:メタクリル酸2−[O−(1’−メチルプロピリデンアミノ)カルボキシアミノ]エチル(昭和電工株式会社製)
SZ6030:γ−メタクリロキシプロピルトリメトキシシラン(東レ・ダウコーニング社製)
Abbreviations in Table 1 represent the following.
DN-1: 4-vinylbenzyloxirane DN-2: 4-vinylphenethyloxirane GMA: glycidyl methacrylate cyclomer M100: 3,4-epoxycyclohexylmethyl methacrylate (manufactured by Daicel Chemical Industries, Ltd.)
CMSCA: (4-vinylphenyl) acetic acid MOI-BM: 2- [O- (1′-methylpropylideneamino) carboxyamino] ethyl methacrylate (manufactured by Showa Denko KK)
SZ6030: γ-methacryloxypropyltrimethoxysilane (manufactured by Dow Corning Toray)
表より明らかなように、実施例の硬化性樹脂組成物から得られた硬化塗膜は、耐溶剤性、耐溶剤試験後の基材に対する密着性、耐吸湿性の何れの点でも優れていた。これに対し、比較例の硬化性樹脂組成物から得られた硬化塗膜は、何れの点でも劣っていた。 As is apparent from the table, the cured coating films obtained from the curable resin compositions of the examples were excellent in both solvent resistance, adhesion to the substrate after the solvent resistance test, and moisture absorption resistance. . On the other hand, the cured coating film obtained from the curable resin composition of the comparative example was inferior in any respect.
Claims (9)
で表されるビニル単量体Aに対応するモノマー単位と、下記式(2)
A monomer unit corresponding to the vinyl monomer A represented by the following formula (2):
で表されるビニル単量体Cに対応するモノマー単位を含む請求項1記載の共重合体。 Further, the following formula (3)
The copolymer of Claim 1 containing the monomer unit corresponding to the vinyl monomer C represented by these.
で表される基である請求項2記載の共重合体。 R 3 in the above formula (3) is the following formula (4a)
The copolymer of Claim 2 which is group represented by these.
で表される基である請求項2記載の共重合体。 R 3 in the above formula (3) is the following formula (4b)
The copolymer of Claim 2 which is group represented by these.
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| JP2010285542A (en) * | 2009-06-11 | 2010-12-24 | Daicel Chem Ind Ltd | Copolymer, resin composition containing the copolymer, and cured product thereof |
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| JP2010285542A (en) * | 2009-06-11 | 2010-12-24 | Daicel Chem Ind Ltd | Copolymer, resin composition containing the copolymer, and cured product thereof |
| JP2010285541A (en) * | 2009-06-11 | 2010-12-24 | Daicel Chem Ind Ltd | Copolymer, curable resin composition containing the copolymer, and cured product thereof |
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| US9093263B2 (en) | 2013-09-27 | 2015-07-28 | Az Electronic Materials (Luxembourg) S.A.R.L. | Underlayer composition for promoting self assembly and method of making and using |
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| US11067893B2 (en) | 2016-12-21 | 2021-07-20 | Merck Patent Gmbh | Compositions and processes for self-assembly of block copolymers |
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