JP2010214960A - 輻射線−硬化性組成物の粘度安定化 - Google Patents
輻射線−硬化性組成物の粘度安定化 Download PDFInfo
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- JP2010214960A JP2010214960A JP2010093166A JP2010093166A JP2010214960A JP 2010214960 A JP2010214960 A JP 2010214960A JP 2010093166 A JP2010093166 A JP 2010093166A JP 2010093166 A JP2010093166 A JP 2010093166A JP 2010214960 A JP2010214960 A JP 2010214960A
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Classifications
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- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
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Abstract
【解決手段】少なくとも1種のカチオン重合性化合物および/またはフリーラジカル重合性化合物、少なくとも1種の充填材、及び少なくとも1種のカチオンおよび/またはラジカル重合のための光開始剤よりなる混合物からなる輻射線−硬化性組成物において、該組成物全体の望ましくない粘度増加および続く早期重合を実質的に遅延させまたは防止するために有機粘度安定化材料を前記組成物と接触させる。
【選択図】なし
Description
由のため通常補充のみされる、カチオン硬化性ステレオリソグラフィ槽は許容できない粘度の増加を示すことが見いだされている。粘度の増加はステレオリソグラフィ成形品構築パラメーター(stereolithography part building parameter)が材料の特定の特性(例えば狭い特定の粘度範囲)に対してもともと決定されるという事実のため許容できない。粘度は徐々に増加するので、良好な成形品構築を達成するために新しい成形品構築パラメーターは連続的に発生させおよび最適化されなければならない。残念ながらステレオリソグラフィ成形品構築パラメーターの決定および最適化は長時間かつ費用のかかる工程であり、そして高度に専門化した使用者によってのみ行い得る。
面の性質に依存して酸性または塩基性または中性のいずれかであってよい。充填材または充填材の混合物のステレオリソグラフィ系(stereolithography systems) で使用するための輻射線−硬化性組成物への混込みは通常組成物の全体における粘度不安定化の問題をもたらす。
本発明は特にステレオリソグラフィ系で使用するための充填材入り組成物における粘度不安定化(粘度増加)に関連した非常に望ましくない問題を克服する。
物および少なくとも1種の表面処理された充填材よりなる輻射線−硬化性組成物を、前記充填材が表面処理されていないことのほかは同じ前記混合物に比べて前記表面処理が、組成物の粘度安定性を改良するように使用するステレオリソグラフィによる三次元製品の製造方法に関する。輻射線−硬化性組成物は所望により少なくとも1種のカチオン重合性化合物をさらに含む。充填材の表面は好ましくはベータ−(3,4−エポキシシクロヘキシル)エチルトリメトキシシラン、ガンマ−グリシドオキシプロピルトリメトキシシランおよびメチルトリエトキシシランで処理される。
。
合のための光開始剤よりなる混合物からなる安定化された輻射線−硬化性組成物に関する。
これらは例えば、モノオレフィンおよびジオレフィン例えばイソブチレン、ブタジエン、イソプレン、スチレン、α−メチルスチレン、ジビニルベンゼン、N−ビニルピロリドン、N−ビニルカルバゾールおよびアクロレイン、あるいはビニルエーテル、例えばメチルビニルエーテル、イソブチルビニルエーテル、トリメチルプロパントリビニルエーテル、エチレングリコールジビニルエーテル;環状ビニルエーテル、例えば3,4−ジヒドロ−2−ホルミル−2H−ピラン(二量体アクロレイン)および2−ヒドロキシメチル−3,4−ジヒドロ−2H−ピランの3,4−ジヒドロ−2H−ピラン−2−カルボン酸エステルならびにビニルエステル、例えば酢酸ビニルおよびステアリン酸ビニルのようなカチオン機構により重合できる、エチレン性不飽和化合物を含む。それらはまた、カチオン重合性複素環式化合物、例えば、エチレンオキシド、プロピレンオキシド、エピクロロヒドリン、グリシジルエーテルまたは、一価アルコールまたはフェノール例えば、n−ブチルグリシジルエーテル、n−オクチルグリシジルエーテル、フェニルグリシジルエーテルおよびクレジルグリシジルエーテル;グリシジルアクリレート、グリシジルメタクリレート、スチレンオキシドおよびシクロヘキサンオキシド;3,3−ジメチルオキセタンおよび3,3−ジ(クロロメチル)オキセタンのようなオキセタン;テトラヒドロフラン;ジオキソラン、トリオキサンおよび1,3,6−トリオキサシクロオクタン;β−プロピオラクトン、γ−バレロラクトンおよびε−カプロラクトンのようなラクトン;スピロエーテルカーボネートスピロエーテルエステル;エチレンスルフィドおよびプロピレンスルフィドのようなチイラン;エポキシ樹脂;側鎖にグリシジル基を含む線状および枝分かれポリマー、例えばポリアクリレートおよびポリメタクリレートグリシジルエステルのホモポリマーおよびコポリマーである。他の適当なカチオン重合性化合物は、メチロール化合物であり、それらはアミノ樹脂例えばアミドのN−ヒドロキシメチル−、N−メトキシメチル−、N−n−ブトキシメチル−およびN−アセトキシメチル誘導体、またはアミド様化合物例えば環状尿素、例えばエチレン尿素(イミダゾリジン−2−オン)、ヒダントイン、ウロン(テトラヒドロオキサジアジン−4−オン)、1,2−プロピレン尿素(4−メチルイミダゾリジン−2−オン)、1,3−プロピレン尿素(ヘキサヒドロ−2H−ピリミド−2−オン)、ヒドロキシプロピレン尿素(5−ヒドロキシヘキサヒドロ−2H−ピリミド−2−オン)、1,3,5−メラミン、ならびにアセトグアナミン、ベンゾグアナミンおよびアジポグアナミンのような他のポリトリアジンを含む。所望ならば、N−ヒドロキシメチルおよびN−アセトキシメチル基の両方を含むアミノ樹脂、例えばヒドロキシ基の1ないし3個がメチル基によりエーテル化されている、ヘキサメチロールメラミンが使用され得る。他の適当なメチロール化合物はフェノール樹脂、特にフェノールおよびアルデヒドから製造されたレゾールである。この目的に適当なフェノール類はフェノール自体、レゾルシノール、2,2−ビス(p−ヒドロキシフェニル)プロパン、p−クロロフェノール;o−、m−またはp−クレゾール、キシレノール、p−第三ブチルフェノールお
よびp−ノニルフェノールのような1ないし9個の炭素原子を有するアルキル基の1ないし2個により置換されたフェノールならびにまたフェニル置換されたフェノール、特にp−フェニルフェノールである。フェノールにより縮合されるアルデヒドは好ましくはホルムアルデヒドであるが、他のアルデヒド例えばアセトアルデヒドおよびフルフラール、もまた適当である。所望ならばこのような硬化性フェノール−アルデヒド樹脂の混合物が使用できる。
Technology Marketing Corp.,642 Westover Road, コネチカット、スタンフォード(Stamford)または"Chemistry & Technology of UV & EB Formulations for Coatings, Inks & Paints", Vol. 3(edited by P.K.T.Oldring) に記載されており、参照により本明細書に組み込まれる。
Lがホウ素原子、リン原子、ヒ素原子またはアンチモン原子を表し、
Qがハロゲン原子を表すか、またはアニオンLQw -中の基Qの一部分はまたヒドロキシ基を表し、および
wがLの原子価+1に相当する整数を表す。)
で表わされる化合物である。炭素原子数6ないし18のアリール基の例は、フェニル基、ナフチル基、アントリル基およびフェナントリル基である。適した基として存在する置換基は、アルキル基、好ましくは炭素原子数1ないし6のアルキル基、例えばメチル基、エチル基、n−プロピル基、イソプロピル基、n−ブチル基、第二ブチル基、イソブチル基、第三−ブチル基および種々のペンチル基またはヘキシル異性体、アルコキシ基、好ましくは炭素原子数1ないし6のアルコキシ基、例えばメトキシ基、エトキシ基、プロポキシ基、ブトキシ基、ペントキシ基およびヘキソキシ基、アルキルチオ基、好ましくは炭素原子数1ないし6のアルキルチオ基、例えばメチルチオ基、エチルチオ基、プロピルチオ基、ブチルチオ基、ペンチルチオ基またはヘキシルチオ基、ハロゲン原子、例えばフッ素原子、塩素原子、臭素原子またはヨウ素原子、アミノ基、シアノ基、ニトロ基またはアリールチオ基、例えばフェニルチオ基である。特に有利なハロゲン原子Qの例は、塩素原子および特にはフッ素原子であり、アニオンLQw - の例は特にBF4 - 、PF6 - 、AsF6 - 、SbF6 - およびSbF5(OH)- である。LQw - タイプのアニオンはまた、CF3SO3 - により有利に置換することもできる。分子中に2またそれ以上のオニウム基を含む化合物、例えばジスルホニウム化合物はもちろん開始剤として適当である。G5 ,G6 およびG7 がフェニル基またはビフェニル基である、式(3)のカチオン性光開始剤化合物またはこれらの化合物の混合物が特に頻繁に使用される。
dが1,2,3,4または5を表し、
Tが求核性でないアニオン、例えば、BF4 - 、PF6 - 、AsF6 - 、SbF6 - 、CF3SO3 - 、C2F5SO3 -、n−C3F7SO3 -、n−C4F9SO3 - 、n−C6F13SO3 - 、
n−C8F17SO3 - 、C6F5SO3 - 、リンタングステート(PO40W12 3-)またはシリコンタングステート(SiO40W12 4-)を表し、
G8 がπ−アレーンを表し、および
G9 がπ−アレーンのアニオン、特にシクロペンタジエニルアニオンを表す。)で表わされる。ここで適当なπ−アレーンG8 およびπ−アレーンG9 のアニオンの例はEP−A−94915に示される。重要なπ−アレーンG8 は、トルエン、キシレン、エチルベンゼン、クメン、メトキシベンゼン、メチルナフタレン、ピレン、ペリレン、スチルベン、ジフェニレンオキサイドおよびジフェニレンスルフィドである。特に好ましいものはクメン、メチルナフタレンまたはスチルベンで示される。アニオンTは特にPF6 - ,AsF6 - ,SbF6 - ,CF3SO3 - ,C2F5SO3 - ,n−C3F7SO3 - ,n−C4F9SO3 - ,n−C6F13SO3 - またはn−C8F17SO3 - である。メタロセン塩のようなフェロセン塩は一般に、また酸化剤と共に使用され得る。このような組合せはEP−A−126712号に開示されている。
リメトキシシランおよびメチルトリエトキシシランを使用する。表面処理された充填材に関していえば、充填材に対するpH値はいずれかの表面処理操作の前に決定される。
は、エポキシ系に対する粘度安定剤(重合阻害剤)としては今までに使用されていない。
ベンゾイン、ベンゾインメチルエーテル、ベンゾインエチルエーテルおよびベンゾインイソプロピルエーテル、ベンゾインフェニルエーテルのようなベンゾインエーテル、およびベンゾインアセテート;アセトフェノン類、例えばアセトフェノン、2,2−ジメトキシアセトフェノンおよび1,1−ジクロロアセトフェノン;ベンジル、ベンジルケタール類例えばベンジルジメチルケタールおよびベンジルジエチルケタール;アントラキノン類、例えば2−メチルアントラキノン、2−エチルアントラキノン、2−第三ブチルアントラキノン、1−クロロアントラキノンおよび2−アミルアントラキノン;さらにまたトリフェニルホスフィン;ベンゾイルホスフィンオキシド例えば2,4,6−トリメチルベンゾイルジフェニルホスフィンオキシド〔ルツィリン(Luzirin )TPO〕;ベンゾフェノン類例えばベンゾフェノンおよび4,4′−ビス(N,N′−ジメチルアミノ)ベンゾフェノン;チオキサントン類およびキサントン類;アクリジン誘導体;フェナジン誘導体;キノキサリン誘導体または1−フェニル−1,2−プロパンジオン 2−O−ベンゾイルオキシム;1−アミノフェニルケトン、または1−ヒドロキシフェニルケトン例えば1−ヒドロキシシクロヘキシルフェニルケトン、フェニル1−ヒドロキシイソプロピルケトンおよび4−イソプロピルフェニル1−ヒドロキシイソプロピルケトンであり、これらの全ては公知である。
dye counterion compound) からなり、該化合物は化学線を吸収し、そして(メタ)アクリレートまたはビニル化合物のような物質の重合を開始させるフリーラジカルを生成することができる。イオン染料−カウンターイオン化合物を含む新規な混合物は400ないし700nmの適した波長範囲内の可視光線を使用してこのよう可変的に硬化することができる。イオン染料−カウンターイオン化合物およびその作用機構は公知であり、例えばEP−A−0223587および米国特許第4751102;4772530および4772541号に開示されている。言及し得る適したイオン染料−カウンターイオン化合物の例はアニオン染料−ヨードニウムイオン錯体、アニオン染料−ピリリウムイオン錯体および特に次式:
または脂環式または飽和もしくは不飽和複素環式基を表す。)で表されるカチオン染料−ボレートアニオン化合物である。
充填材入り組成物を反応器で製造する。成分を以下の手法で添加する。ベース液状樹脂LLS71040(Ciba Specialty Chemicals Corporation, ニューヨーク, タリータウン(tarrytown)から入手でき、それはまたCiba Specialty Chemicals Corporationから入手できるLLS71050に非常に類似する)中に、以下の成分を添加する:
TMN−6(湿潤剤、Union Carbide,コネチカット, ダンブリー(Dambury) 0.25重量%
SAG−47(脱泡剤、Osi Chemicals, Corp., ニュージャージー、リッジフィールドパーク(Ridgefield Park)0.08重量%、および
表1に記載した量の、BDMA(有機粘度安定剤)。
得られた溶液を室温で30分間攪拌する。次に沈降防止剤、エーロシル(Aerosil)R972〔沈降防止剤〕を表1に記載した量で添加する。40重量%で充填材〔イムシル(Imsil)A8〕を添加するがその前に混合物を再度室温で20分間混合する。この充填材入り組成物を室温で30分間攪拌し、続いて65℃で1.5時間加熱する。充填材入り系(filled systems)をさらに一夜中速で剪断混合(shear mixing) 下攪拌する。実験の結果を表1に示す。
下記表1に示した結果は420ないし500ppmで使用した(試料116−43Dおよび43E)、ベンジル−N,N'−ジメチルアミン,BDMAのような有機塩基である
、粘度安定化材料が充填材入り組成物を安定化することを証明する。しかし、最適よりも低いレベルでのBDMAの使用では、ゲル化し易い不安定な充填材入り組成物を生成する(試料116−43AAから116−43C)
充填材入り組成物を反応器で製造する。成分を以下の手法で添加する。ベース液状樹脂SL5410(Ciba Specialty Chemicals Corporation, ニューヨーク, タリータウンから入手できる)中に、以下の成分を添加する:
TMN−6(湿潤剤) 0.35重量%
SAG−47(脱泡剤)0.10重量%、および
表2に記載した量の、BDMA(有機安定剤)
得られた溶液を室温で30分間攪拌する。次いでエーロシル(Aerosil)R972〔沈降防止剤〕を2.5重量%で添加する。充填材〔イムシル(Imsil)A8〕を添加するがその前に混合物を再度室温で20分間混合する。充填材入り組成物を室温で30分間攪拌し、続いて65℃で1.5時間加熱する。充填材入り系をさらに一夜中速で剪断混合下で攪拌する。実験の結果を表2に示す。
下記表2に示した結果は450ないし1200ppmで使用した(試料116−51Fないし51J)、粘度安定化材料BDMAが充填材入り組成物を安定化することをさらに明らかにする。50−300ppmのような(試料116−51Aないし51E)低濃度では、組成物の粘度が増加し、そして充填材入り組成物は使用不可能である。加えてより高濃度では、BDMAが触媒として作用するので、粘度は許容できない程高い速度で増加する(不安定な系)。本実施例は未だ安定な樹脂を生成するが、この粘度不安定性の増加は116−51Hないし116−51Jにより明白である。
充填材入り組成物を反応器で製造する。成分を以下の手法で添加する。ベース液状樹脂SLS5170(Ciba Specialty Chemicals Corporation, ニューヨーク, タリータウンから入手できる)中に、以下の成分を添加する:
TMN−6(湿潤剤) 0.10重量%
SAG−47(脱泡剤)0.10重量%、および
表3に記載した量の、BDMA(有機塩基安定剤)
得られた溶液を室温で30分間攪拌する。次いで沈降防止剤エーロシル(Aerosil)R972〔沈降防止剤〕を2重量%で添加する。充填材〔イムシル(Imsil)A8およびフェルドスパー−ミンスパー(Feldspar-Minsper) 10を表3に記載する量で添加する〕を添加するがその前に混合物を再度室温で20分間混合する。充填材入り組成物を室温で30分間攪拌し、続いて65℃で1.5時間加熱する。充填材入り系をさらに一夜中速で剪断混合下に攪拌する。実験の結果を表3に示す。
表3を参照すると、BDMA0.03%(300ppm)を含む試料116−13Aは完全に安定化されている。BDMA不在下(試料116−9A)では、組成物は7日後使用不可能になり、そして14日後にゲル化する。BDMA1000−5000ppm(試料116−13Bおよび13C)を添加することによって、充填材入り組成物は不安定化しそしてゲルになる。不安定性は高濃度のBDMAにおいてはBDMAが触媒として作用し、これによりゲル反応を開始させるという事実のためであると信じられている。
表3はさらに、9より高いpH値をもつ少なくとも1種の充填材(フェルドスパー、ミンスパー(Minspar)10、試料116−13D及び13E参照)を含む充填材入り組成物を使用することによって、充填材入り組成物が有機塩基安定化材料の不在下においてさえも安定化されることを示す。ミンスパー10の添加なしでは、充填材入り組成物は不安定であり、そして65℃において7日後使用不可能になり、65℃において14日後ゲルになる(試料116−9A)。安定化された試料(116−13Dおよび13−E)は39日間65℃で加熱された後でも低い、使用可能な粘度を示す。
充填材入り組成物を反応器で製造する。成分を以下の手法で添加する。ベース液状樹脂SLS5170(Ciba Specialty Chemicals Corporation, ニューヨーク, タリータウンから入手できる)中に、以下の成分を添加する:
TMN−6(湿潤剤) 0.1重量%およびSAG−47(脱泡剤)0.10重量%。得られた溶液を室温で30分間攪拌する。次いでエーロシル(Aerosil)R972〔沈降防止剤〕を2重量%で添加する。充填材混合物イムシル(Imsil)A8、17重量%及びアルミナ三水和物10重量%の充填材混合物を添加するがその前に混合物を再度室温で20分間混合する。充填材入り組成物を室温で30分間攪拌し、続いて65℃で1.5時間加熱する。充填材入り系を一夜中速で剪断混合下にさらに攪拌する。22℃で測定された粘度は2540cpsであった。充填材入り組成物を65℃で18日間老化させた。老化の間粘度は35,000cpsに増加した。粘度の増加はステレオリソグラフィ用途のための安定な組成物としては非常に高い。粘度の問題を克服するため、BDMAを新たに作成した組成物に添加する(150ppm)。新たな充填材入り組成物を65℃において18日間老化させた;その粘度増加は最小限だった。
Claims (9)
- 少なくとも1種の輻射線重合性化合物、少なくとも1種の充填材、及び少なくとも1種の重合のための光開始剤よりなる混合物からなる輻射線−硬化性組成物を使用するステレオリソグラフィによる三次元製品の製造方法であって、有機塩基の形の有機粘度安定化材料は該組成物全体の粘度増加を遅延させまたは防止するために該組成物の中に配合され、安定化材料が立体障害性第三ベンジル−N,N'−アミンもしくはアリール−N,N'−アミンを組成物の重量に基づいて5重量ppm乃至5000重量ppmの範囲にある、方法。
- 前記輻射線重合性化合物がカチオン重合性化合物である請求項1記載の方法。
- 前記輻射線重合性化合物がフリーラジカル重合性化合物である請求項1記載の方法。
- 前記輻射線重合性化合物の少なくとも1種が少なくとも1,2−エポキシド、ビニルエーテル、ラクトン、アセタール、環状スルフィド、環状エーテルまたはシロキサン基を含む請求項2記載の方法。
- 有機安定化材料がベンジル−N,N'−ジメチルアミン(BDMA)である請求項1記載の方法。
- 前記輻射線−硬化性組成物が少なくとも1種のフリーラジカルにより硬化可能な化合物、または該フリーラジカル重合性化合物の2またはそれ以上の混合物、およびフリーラジカル重合のための光開始剤を含む請求項1記載の方法。
- 少なくとも1種のカチオン重合性化合物および/または少なくとも1種のラジカル重合性化合物、少なくとも1種の充填材および、少なくとも1種のカチオンおよび/またはラジカル重合のための光開始剤よりなる混合物ならびに有機塩基安定化材料からなる輻射線−硬化性組成物を化学線に曝露することからなり、前記安定化材料が立体障害性第三ベンジル−N,N'−アミンもしくはアリール−N,N'−アミンを組成物の重量に基づいて5重量ppm乃至5000重量ppmの範囲にある、請求項1で定義された方法により製造された硬化した三次元製品。
- ステレオリソグラフィのための安定化された充填材入り組成物の製造方法であって、少なくとも1種のカチオン重合性化合物および/または少なくとも1種のラジカル重合性化合物、少なくとも1種の充填材、少なくとも1種のカチオンおよび/またはラジカル重合のための光開始剤ならびに有機塩基安定化材料よりなる混合物を反応器内で混合することからなり、前記安定化材料が立体障害性第三ベンジル−N,N'−アミンもしくはアリール−N,N'−アミンを組成物の重量に基づいて5重量ppm乃至5000重量ppmの範囲にある、方法。
- 少なくとも1種の輻射線重合性化合物、少なくとも1種の充填材、少なくとも1種の重合のための光開始剤、および有機塩基の形の有機粘度安定化材料よりなる混合物からなる安定化された輻射線−硬化性ステレオリソグラフィ組成物であって、前記安定化材料は、立体障害性第三ベンジル−N,N'−アミンもしくはアリール−N,N'−アミンを組成物の重量に基づいて5重量ppm乃至5000重量ppmの範囲にある、組成物。
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- 1998-07-10 AU AU88599/98A patent/AU751062B2/en not_active Ceased
- 1998-07-10 BR BR9811801-3A patent/BR9811801A/pt not_active Application Discontinuation
- 1998-07-10 KR KR1020007000410A patent/KR20010021846A/ko not_active Withdrawn
- 1998-07-10 CA CA002296587A patent/CA2296587A1/en not_active Abandoned
- 1998-07-10 EP EP98940197A patent/EP0998696A2/en not_active Withdrawn
- 1998-07-10 WO PCT/EP1998/004284 patent/WO1999005572A2/en not_active Application Discontinuation
- 1998-07-10 JP JP2000504488A patent/JP4614030B2/ja not_active Expired - Lifetime
- 1998-07-14 US US09/115,086 patent/US6099787A/en not_active Expired - Fee Related
- 1998-07-20 TW TW087111783A patent/TW396296B/zh active
- 1998-07-20 ZA ZA986424A patent/ZA986424B/xx unknown
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2000
- 2000-01-19 NO NO20000264A patent/NO20000264L/no unknown
- 2000-05-31 US US09/584,444 patent/US6350403B1/en not_active Expired - Lifetime
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| JPH0577324A (ja) * | 1991-02-14 | 1993-03-30 | E I Du Pont De Nemours & Co | 粘度低下性組成物を利用して立体物を形成するための方法および装置 |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
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| JP2016010870A (ja) * | 2014-06-27 | 2016-01-21 | セイコーエプソン株式会社 | 三次元造形物の製造方法および三次元造形物 |
| JP2018137211A (ja) * | 2017-01-25 | 2018-08-30 | デルファイ・テクノロジーズ・インコーポレーテッド | 機能強化された端子保持ビームを備える電気コネクタシステム |
Also Published As
| Publication number | Publication date |
|---|---|
| WO1999005572A2 (en) | 1999-02-04 |
| TW396296B (en) | 2000-07-01 |
| BR9811801A (pt) | 2000-09-19 |
| IL133108A0 (en) | 2001-03-19 |
| US6350403B1 (en) | 2002-02-26 |
| AU8859998A (en) | 1999-02-16 |
| JP4614030B2 (ja) | 2011-01-19 |
| JP4884548B2 (ja) | 2012-02-29 |
| ZA986424B (en) | 1999-01-21 |
| CA2296587A1 (en) | 1999-02-04 |
| WO1999005572A3 (en) | 1999-04-15 |
| US6099787A (en) | 2000-08-08 |
| NO20000264D0 (no) | 2000-01-19 |
| NO20000264L (no) | 2000-01-19 |
| IL133108A (en) | 2003-07-06 |
| JP2001511425A (ja) | 2001-08-14 |
| AU751062B2 (en) | 2002-08-08 |
| KR20010021846A (ko) | 2001-03-15 |
| EP0998696A2 (en) | 2000-05-10 |
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