JP2011021205A - Insulating resin composition for printed wiring board and application thereof - Google Patents
Insulating resin composition for printed wiring board and application thereof Download PDFInfo
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- JP2011021205A JP2011021205A JP2010237879A JP2010237879A JP2011021205A JP 2011021205 A JP2011021205 A JP 2011021205A JP 2010237879 A JP2010237879 A JP 2010237879A JP 2010237879 A JP2010237879 A JP 2010237879A JP 2011021205 A JP2011021205 A JP 2011021205A
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- 239000011342 resin composition Substances 0.000 title claims abstract description 15
- 229920005989 resin Polymers 0.000 claims abstract description 37
- 239000011347 resin Substances 0.000 claims abstract description 37
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 22
- 239000003822 epoxy resin Substances 0.000 claims abstract description 21
- 229920000647 polyepoxide Polymers 0.000 claims abstract description 21
- 239000000126 substance Substances 0.000 claims abstract description 19
- 239000011889 copper foil Substances 0.000 claims abstract description 17
- 239000003963 antioxidant agent Substances 0.000 claims abstract description 12
- 230000003078 antioxidant effect Effects 0.000 claims abstract description 12
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims abstract description 11
- 150000001875 compounds Chemical class 0.000 claims abstract description 10
- 239000000203 mixture Substances 0.000 claims abstract description 10
- BGDOLELXXPTPFX-UHFFFAOYSA-N 3,4-dihydro-2h-1,2-benzoxazine Chemical group C1=CC=C2ONCCC2=C1 BGDOLELXXPTPFX-UHFFFAOYSA-N 0.000 claims abstract description 6
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 claims abstract description 6
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical group OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 claims description 23
- 235000013824 polyphenols Nutrition 0.000 claims description 13
- 239000000945 filler Substances 0.000 claims description 8
- GGNQRNBDZQJCCN-UHFFFAOYSA-N benzene-1,2,4-triol Chemical compound OC1=CC=C(O)C(O)=C1 GGNQRNBDZQJCCN-UHFFFAOYSA-N 0.000 claims description 6
- 150000008442 polyphenolic compounds Chemical class 0.000 claims description 6
- 239000003795 chemical substances by application Substances 0.000 claims description 4
- JPYHHZQJCSQRJY-UHFFFAOYSA-N Phloroglucinol Natural products CCC=CCC=CCC=CCC=CCCCCC(=O)C1=C(O)C=C(O)C=C1O JPYHHZQJCSQRJY-UHFFFAOYSA-N 0.000 claims description 3
- QCDYQQDYXPDABM-UHFFFAOYSA-N phloroglucinol Chemical compound OC1=CC(O)=CC(O)=C1 QCDYQQDYXPDABM-UHFFFAOYSA-N 0.000 claims description 3
- 239000011256 inorganic filler Substances 0.000 abstract description 3
- 229910003475 inorganic filler Inorganic materials 0.000 abstract description 3
- 238000004519 manufacturing process Methods 0.000 abstract description 3
- 239000004848 polyfunctional curative Substances 0.000 abstract 1
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 8
- 229920003986 novolac Polymers 0.000 description 8
- 238000006116 polymerization reaction Methods 0.000 description 7
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 238000002156 mixing Methods 0.000 description 6
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 5
- 229910052802 copper Inorganic materials 0.000 description 5
- 239000010949 copper Substances 0.000 description 5
- ZTQSAGDEMFDKMZ-UHFFFAOYSA-N Butyraldehyde Chemical compound CCCC=O ZTQSAGDEMFDKMZ-UHFFFAOYSA-N 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- 229930185605 Bisphenol Natural products 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 239000002966 varnish Substances 0.000 description 3
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 2
- 229930003836 cresol Natural products 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- PAFZNILMFXTMIY-UHFFFAOYSA-N cyclohexylamine Chemical compound NC1CCCCC1 PAFZNILMFXTMIY-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 239000004744 fabric Substances 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- -1 polycyclic phenols Chemical class 0.000 description 2
- 150000003141 primary amines Chemical class 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 230000004580 weight loss Effects 0.000 description 2
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- PFANXOISJYKQRP-UHFFFAOYSA-N 2-tert-butyl-4-[1-(5-tert-butyl-4-hydroxy-2-methylphenyl)butyl]-5-methylphenol Chemical compound C=1C(C(C)(C)C)=C(O)C=C(C)C=1C(CCC)C1=CC(C(C)(C)C)=C(O)C=C1C PFANXOISJYKQRP-UHFFFAOYSA-N 0.000 description 1
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 1
- 229920000049 Carbon (fiber) Polymers 0.000 description 1
- 229920000742 Cotton Polymers 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 150000003973 alkyl amines Chemical class 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 150000001448 anilines Chemical class 0.000 description 1
- 230000001588 bifunctional effect Effects 0.000 description 1
- 239000004842 bisphenol F epoxy resin Substances 0.000 description 1
- MIAKRAULTMFNJM-UHFFFAOYSA-K calcium;magnesium;carbonate;hydroxide Chemical compound [OH-].[Mg+2].[Ca+2].[O-]C([O-])=O MIAKRAULTMFNJM-UHFFFAOYSA-K 0.000 description 1
- 239000004917 carbon fiber Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 150000002013 dioxins Chemical class 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000012766 organic filler Substances 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 229940079877 pyrogallol Drugs 0.000 description 1
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000012783 reinforcing fiber Substances 0.000 description 1
- 238000007142 ring opening reaction Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000012209 synthetic fiber Substances 0.000 description 1
- 229920002994 synthetic fiber Polymers 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 239000013585 weight reducing agent Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
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- Manufacture Of Macromolecular Shaped Articles (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Epoxy Resins (AREA)
Abstract
Description
本発明は、多層プリント配線板の製造に有用な、高い耐薬品性及び銅箔引きはがし強さ(ピール強度)を有する絶縁樹脂材料に関する。 The present invention relates to an insulating resin material having high chemical resistance and copper foil peeling strength (peel strength), which is useful for manufacturing a multilayer printed wiring board.
民生用電子機器の小型化が進むに従い、それらに用いるプリント配線板はより高密度化し、微細配線化する傾向にある。また、近年、薄型化ファインピッチに対応した樹脂付き銅箔を使用したビルドアップ工法による薄板多層プリント配線板が多用されている。くわえて、欧州を中心として、環境問題に対する意識が高まり、廃棄など焼却時におけるダイオキシン等の有害ガス発生のおそれがない材料、特にハロゲン不使用の絶縁樹脂材料の導入が進められている。このため、ハロゲン不使用の絶縁樹脂シートを用いる多層プリント配線板に対し、銅箔引きはがし強さや耐溶剤性等の改善が求められている。 As miniaturization of consumer electronic devices progresses, printed wiring boards used for them tend to have higher density and finer wiring. In recent years, a thin multilayer printed wiring board by a build-up method using a resin-coated copper foil corresponding to a thin fine pitch has been widely used. In addition, mainly in Europe, awareness of environmental issues has increased, and materials that do not cause the generation of harmful gases such as dioxins during incineration such as disposal, especially halogen-free insulating resin materials, are being introduced. For this reason, there is a demand for improvements in the copper foil peeling strength, solvent resistance, and the like for multilayer printed wiring boards that use halogen-free insulating resin sheets.
従来、ハロゲン不使用の多層プリント配線板において、絶縁樹脂シートに用いるエポキシ樹脂組成物に、ビスフェノール系酸化防止剤を添加していた。しかし、ビスフェノール系酸化防止剤を含む樹脂組成物から得られる絶縁樹脂シートは、加圧・加温下のプレス成形では、樹脂硬化が充分ではない。そのため、得られるプリント配線板は、銅箔引きはがし強さや耐薬品性に劣っていた。 Conventionally, in a halogen-free multilayer printed wiring board, a bisphenol antioxidant has been added to the epoxy resin composition used for the insulating resin sheet. However, an insulating resin sheet obtained from a resin composition containing a bisphenol-based antioxidant is not sufficiently cured by press molding under pressure and heating. Therefore, the obtained printed wiring board was inferior in copper foil peeling strength and chemical resistance.
本発明の目的は、銅箔引きはがし強さ及び耐薬品性に優れたハロゲン不使用の絶縁樹脂シートを提供することである。 An object of the present invention is to provide a halogen-free insulating resin sheet excellent in copper foil peeling strength and chemical resistance.
本発明は、エポキシ樹脂、フェノール系硬化剤、ジヒドロベンゾオキサジン環を有する化合物、ポリビニルブチラール樹脂及び無機充填材を含む樹脂組成物であって、ポリフェノール系酸化防止剤を含有することを特徴とするエポキシ樹脂組成物に関する。 The present invention is a resin composition comprising an epoxy resin, a phenolic curing agent, a compound having a dihydrobenzoxazine ring, a polyvinyl butyral resin, and an inorganic filler, characterized in that it contains a polyphenolic antioxidant. The present invention relates to a resin composition.
本発明は、更に、上記の樹脂組成物を、銅箔又はキャリアフィルムに塗布、乾燥させた絶縁樹脂シート、及びその樹脂シートを用いた電子デバイスに関する。 The present invention further relates to an insulating resin sheet obtained by applying and drying the above resin composition to a copper foil or a carrier film, and an electronic device using the resin sheet.
本発明のハロゲン不使用であるポリフェノール系酸化防止剤を含むエポキシ樹脂組成物、本発明の組成物を用いた多層プリント配線板用絶縁樹脂シートは、銅箔引きはがし強さが増大し、かつ耐薬品性が向上するという優れた効果を奏する。 The epoxy resin composition containing a polyphenol-based antioxidant which is halogen-free according to the present invention and the insulating resin sheet for multilayer printed wiring boards using the composition according to the present invention have increased copper foil peeling strength and are resistant to resistance. There is an excellent effect of improving chemical properties.
以下、本発明の例を詳細に説明する。
本発明で用い得るエポキシ樹脂としては、二官能以上のエポキシ樹脂が用いることができる。例えば、ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、ビスフェノールS型エポキシ樹脂、樹環式エポキシ樹脂、フェノールノボラック型エポキシ樹脂、クレゾールノボラック型エポキシ樹脂、ビスフェノールAノボラック型エポキシ樹脂、多官能フェノールのジグリジルエーテル化物、これらの水素添加物等があり、単独で、又は2種類以上組合せて用いることができる。また、このエポキシ樹脂に対する分子量及びこれらエポキシ樹脂を混合する方法は、温度に制限されない。
Hereinafter, examples of the present invention will be described in detail.
As the epoxy resin that can be used in the present invention, a bifunctional or higher functional epoxy resin can be used. For example, bisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol S type epoxy resin, dendritic epoxy resin, phenol novolac type epoxy resin, cresol novolac type epoxy resin, bisphenol A novolac type epoxy resin, polyfunctional phenol digly There exist a dietherified substance, these hydrogenated substances, etc., and it can be used individually or in combination of 2 or more types. Moreover, the molecular weight with respect to this epoxy resin and the method of mixing these epoxy resins are not restrict | limited to temperature.
本発明で用い得るフェノール系硬化剤は、フェノール性水酸基を2個以上有するフェノール系硬化剤である。例えば、ノボラック樹脂等が挙げられ、フェノールノボラック樹脂、クレゾールノボラック樹脂、キシレン−ノボラック樹脂、メラミン−ノボラック樹脂等が好ましく、これらは単独で、又は組合せて用いることができる。 The phenolic curing agent that can be used in the present invention is a phenolic curing agent having two or more phenolic hydroxyl groups. For example, a novolak resin etc. are mentioned, A phenol novolak resin, a cresol novolak resin, a xylene-novolak resin, a melamine-novolak resin, etc. are preferable, These can be used individually or in combination.
本発明で用い得るジヒドロベンゾオキサジン環を有する化合物としては、ジヒドロベンゾオキサジン環の開環反応により硬化する樹脂系を用いることができる。例えば、フェノール性水酸基を有する化合物と、ホルマリン及び1級アミンとから製造することができる。フェノール性水酸基を有する化合物として、例えば、多官能フェノール、多環式フェノール等が挙げられ、ビフェノール化合物、ビスフェノール化合物、トリスフェノール化合物、テトラフェノール化合物、フェノール樹脂が好ましい。1級アミンとしては、例えば、非置換又は置換アルキルアミン、シクロアミン、アニリン等が挙げられ、メチルアミン、シクロヘキシルアミン、アニリン、置換アニリン等が好ましい。 As the compound having a dihydrobenzoxazine ring that can be used in the present invention, a resin system that cures by a ring-opening reaction of a dihydrobenzoxazine ring can be used. For example, it can be produced from a compound having a phenolic hydroxyl group, formalin and a primary amine. Examples of the compound having a phenolic hydroxyl group include polyfunctional phenols and polycyclic phenols, and biphenol compounds, bisphenol compounds, trisphenol compounds, tetraphenol compounds, and phenol resins are preferable. Examples of the primary amine include unsubstituted or substituted alkylamine, cycloamine, and aniline, and methylamine, cyclohexylamine, aniline, substituted aniline, and the like are preferable.
本発明のポリビニルブチラール樹脂の重合度又はブチラール化度は、限定されない。しかし、平均重合度が500〜3000であり、ブチラール化度が60mol%以上であるものが好ましい。更に、平均重合度が1500〜2500であり、ブチラール化度が65mol%以上であるものがより好ましい。例えば、エスレックスBX−1(積水化学工業(株)製:平均重合度1700、ブチラール化度65mol%)、エスレックスBX−2(積水化学工業(株)製:平均重合度1700、ブチラール化度65mol%)、電化ブチラール4000−2(電気化学工業(株)製:平均重合度1000、ブチラール化度75mol%)、電化ブチラール5000−A(電気化学工業(株)製:平均重合度2000、ブチラール化度80mol%)などが挙げられる。これらの樹脂を、単独で、又は2種類以上組合せて用いることができる。ポリビニルブチラールの配合量は、製膜性と、難燃性及び耐熱性との双方のバランスを考慮すると、固形ワニス分の全量100重量部当り、5〜30重量部が好ましい。 The degree of polymerization or degree of butyralization of the polyvinyl butyral resin of the present invention is not limited. However, those having an average degree of polymerization of 500 to 3000 and a degree of butyralization of 60 mol% or more are preferred. Furthermore, it is more preferable that the average degree of polymerization is 1500 to 2500 and the degree of butyralization is 65 mol% or more. For example, Eslex BX-1 (manufactured by Sekisui Chemical Co., Ltd .: average polymerization degree 1700, butyralization degree 65 mol%), Eslex BX-2 (manufactured by Sekisui Chemical Co., Ltd .: average polymerization degree 1700, butyralization degree) 65 mol%), electrified butyral 4000-2 (manufactured by Denki Kagaku Kogyo Co., Ltd .: average polymerization degree 1000, butyral degree of 75 mol%), electrified butyral 5000-A (manufactured by Denki Kagaku Kogyo Co., Ltd .: average degree of polymerization 2000, butyral) Conversion degree 80 mol%). These resins can be used alone or in combination of two or more. The blending amount of polyvinyl butyral is preferably 5 to 30 parts by weight per 100 parts by weight of the total amount of the solid varnish, considering the balance between film forming properties, flame retardancy and heat resistance.
本発明で用い得る充填材として、無機充填材、有機充填材、強化用繊維等を用いることができる。例えば、ステープルファイバー、糸、綿布、ガラスクロス、ガラスマット、ガラス繊維、炭素繊維、石英繊維、難燃性合成繊維、シリカ粉、炭酸カルシウム水酸化マグネシウム、水酸化アルミニウム等であり、単独で、又は組合せて用いることができる。これらの充填材は、予めカップリング剤により表面の疎水処理をしておくと樹脂との界面接着性を向上させることに効果がある。充填材の配合量は、固形ワニス分の全量100重量部当り、製膜性と難燃性のバランスを考慮すると、20〜60重量部が好ましく、30〜50重量部がより好ましい。 As fillers that can be used in the present invention, inorganic fillers, organic fillers, reinforcing fibers, and the like can be used. For example, staple fiber, yarn, cotton cloth, glass cloth, glass mat, glass fiber, carbon fiber, quartz fiber, flame retardant synthetic fiber, silica powder, calcium carbonate magnesium hydroxide, aluminum hydroxide, etc., alone or Can be used in combination. These fillers are effective in improving the interfacial adhesion to the resin if the surface is subjected to hydrophobic treatment with a coupling agent in advance. The blending amount of the filler is preferably 20 to 60 parts by weight and more preferably 30 to 50 parts by weight in consideration of the balance between film forming property and flame retardancy per 100 parts by weight of the total amount of the solid varnish.
本発明で用い得るポリフェノール系酸化防止剤としては、3価以上のポリフェノールが好ましい。更に、トリヒドロキシベンゼンが好ましく、例えば、1,2,3−トリヒドロキシベンゼン、1,2,4−トリヒドロキシベンゼン、1,3,5−トリヒドロキシベンゼンが挙げられる。これらの酸化防止剤は、単独で、又は2種類以上組合せて用いることができる。配合量は、充填材100重量部当り、酸化防止効果とワニスの硬化時間のバランスを考慮すると、0.1〜5.0重量部が好ましく、0.5〜2.0重量部がより好ましい。 As the polyphenol-based antioxidant that can be used in the present invention, trivalent or higher polyphenols are preferable. Further, trihydroxybenzene is preferable, and examples thereof include 1,2,3-trihydroxybenzene, 1,2,4-trihydroxybenzene, and 1,3,5-trihydroxybenzene. These antioxidants can be used alone or in combination of two or more. The blending amount is preferably 0.1 to 5.0 parts by weight and more preferably 0.5 to 2.0 parts by weight in consideration of the balance between the antioxidant effect and the varnish curing time per 100 parts by weight of the filler.
本発明の樹脂組成物は、所望により有機溶媒を添加、混合しワニス化して使用することができる。有機溶剤としては、充填材を除いた樹脂分を溶解するものを用いることができる。例えば、アルコール、アセトン、トルエン、キシレン、ケトン、アミド、ピロリドンなどが挙げられ、メタノール、エタノール、イソプロピルアルコール、トルエン、メチルエチルケトン、シクロヘキサノン、ジメチルホルムアミド、N−メチルピロリドンが好ましい。これらは単独で、又は2種類以上組合せて用いることができる。 The resin composition of the present invention can be used after adding an organic solvent and varnishing if desired. As an organic solvent, what dissolve | melts the resin part except a filler can be used. For example, alcohol, acetone, toluene, xylene, ketone, amide, pyrrolidone and the like can be mentioned, and methanol, ethanol, isopropyl alcohol, toluene, methyl ethyl ketone, cyclohexanone, dimethylformamide, and N-methylpyrrolidone are preferable. These can be used alone or in combination of two or more.
上記のように、本発明の配合で得られたワニス状の樹脂組成物を、キャリアフィルムに塗布した後、60℃〜180℃の範囲で溶剤を除去し、熱硬化させて、絶縁樹脂シートの作製に用いることができる。塗布方法は、特に限定されない。本発明において、キャリアフィルムとは、PET、PBT、PPO等の乾燥温度(60〜180℃)に耐える有機フィルム、銅、アルミニウム、ニッケル、銀等の金属箔等であり、それらを単独で、又は組合せて用いることができる。本発明の絶縁樹脂シートを、回路加工した両面配線板の両面に配して積層し、その後真空下でプレスラミネートすることにより(例えば、保持温度180℃、保持圧力3.0MPa、保持時間90分)、多層プリント配線板を製造することができる。プレスラミネート(加熱圧着)は、良好な成形性及び樹脂性能を考慮すると、保持温度170〜220℃が好ましく、180〜200℃がより好ましい。圧力は2.0〜7.0MPaが好ましく、3.0〜5.0MPaがより好ましい。保持時間は10〜180分が好ましく、70〜120分がより好ましい。 As mentioned above, after apply | coating to the carrier film the varnish-like resin composition obtained by the mixing | blending of this invention, a solvent is removed in the range of 60 degreeC-180 degreeC, it is made to thermoset, and an insulating resin sheet is used. Can be used for production. The application method is not particularly limited. In the present invention, the carrier film is an organic film that can withstand a drying temperature (60 to 180 ° C.) such as PET, PBT, and PPO, a metal foil such as copper, aluminum, nickel, silver, and the like. Can be used in combination. The insulating resin sheet of the present invention is placed on both sides of a circuit-processed double-sided wiring board, laminated, and then press-laminated under vacuum (for example, holding temperature 180 ° C., holding pressure 3.0 MPa, holding time 90 minutes) ), A multilayer printed wiring board can be manufactured. In view of good moldability and resin performance, the press lamination (thermocompression bonding) is preferably a holding temperature of 170 to 220 ° C, more preferably 180 to 200 ° C. The pressure is preferably 2.0 to 7.0 MPa, more preferably 3.0 to 5.0 MPa. The holding time is preferably 10 to 180 minutes, more preferably 70 to 120 minutes.
本発明の樹脂組成物から絶縁樹脂シートを形成することができる。本発明のシートは、本発明の樹脂組成物を乾燥させて、一定の形状を有する固体化したものを意味する。好ましくは層状又は膜状であり、これらを積層して用いることができる。くわえて、本発明のシートを所望の形状に更に成形することができる。本発明のシートは、耐薬品性に優れ、アルカリ性溶液中での重量減少が、好ましくは100μg・cm-2以下であり、より好ましくは80μg・cm-2以下である。 An insulating resin sheet can be formed from the resin composition of the present invention. The sheet | seat of this invention means the solidified thing which dried the resin composition of this invention and has a fixed shape. Preferably, it is layered or film-like, and these can be laminated and used. In addition, the sheet of the present invention can be further formed into a desired shape. The sheet of the present invention has excellent chemical resistance, and the weight loss in an alkaline solution is preferably 100 μg · cm −2 or less, more preferably 80 μg · cm −2 or less.
また、本発明のシートは、積層させた場合の銅箔引きはがし強さが、好ましくは0.90kN・m-1以上であり、より好ましくは0.95kN・m-1以上である。 Further, the sheet of the present invention has a copper foil peeling strength when laminated, preferably 0.90 kN · m −1 or more, more preferably 0.95 kN · m −1 or more.
本発明の樹脂シートを用いた電子デバイスとしては、特に限定されないが、プリント配線板用の銅張り積層板などが挙げられる。また、本発明の樹脂シートを一部に用いる、例えば配線板又は半導体チップと接着して用いる電子デバイスを含む。例えば、BGA(ball grid array)パッケージ、素子搭載用のPGA(pin grid array)等が挙げられる。 Although it does not specifically limit as an electronic device using the resin sheet of this invention, The copper clad laminated board for printed wiring boards etc. are mentioned. Moreover, the electronic device which uses the resin sheet of this invention for a part, for example, adhere | attaches with a wiring board or a semiconductor chip is included. For example, a BGA (ball grid array) package, an element mounting PGA (pin grid array), and the like can be given.
以下に本発明を実施例により詳細に説明するが、本発明はこれらの実施例に限定されるものではない。なお、実施例中、部とは、すべて重量部を示す。 EXAMPLES The present invention will be described in detail below with reference to examples, but the present invention is not limited to these examples. In the examples, all parts are parts by weight.
実施例1
充填材100部当り、ビスフェノールFエポキシ樹脂(GK−5079:新日鐵化学(株)製)20部、ジヒドロベンゾオキサジン環を有する化合物(VR−2000M:日立化成工業(株)製))70部、メラミン変性フェノール樹脂(LA−7054:大日本インキ化学工業(株)製)15部、ポリビニルブチラール樹脂(HS−3Z:積水化学工業(株)製)15部、水酸化アルミニウム(CL−303:住友化学工業(株)製)100部、1,2,3−トリヒドロキシベンゼン(ピロガロール:和光純薬工業(株)製)0.5部で配合し、混合することによりワニス状のエポキシ樹脂組成物を得た。この組成物を厚さ12μmの銅箔に塗布後、130℃で3分間、次いで150℃で3分間乾燥させて、樹脂厚:80μm、樹脂流れ:10%、レオメータの最低溶融粘度3000ポイズである絶縁樹脂シートを得た。得られた絶縁接着シートを内層板の両側に配した後、真空条件下圧力3.0MPa、保持温度180℃の条件で90分間加熱圧着して、両面銅張り積層板を形成した。
Example 1
70 parts of bisphenol F epoxy resin (GK-5079: manufactured by Nippon Steel Chemical Co., Ltd.), compound having a dihydrobenzoxazine ring (VR-2000M: manufactured by Hitachi Chemical Co., Ltd.)) per 100 parts of filler , 15 parts of melamine modified phenolic resin (LA-7054: manufactured by Dainippon Ink & Chemicals, Inc.), 15 parts of polyvinyl butyral resin (HS-3Z: manufactured by Sekisui Chemical Co., Ltd.), aluminum hydroxide (CL-303: Sumitomo Chemical Co., Ltd.) 100 parts, 1,2,3-trihydroxybenzene (Pyrogallol: Wako Pure Chemical Industries, Ltd.) 0.5 part blended and mixed to form a varnish-like epoxy resin composition I got a thing. This composition is applied to a copper foil having a thickness of 12 μm and dried at 130 ° C. for 3 minutes and then at 150 ° C. for 3 minutes. The resin thickness is 80 μm, the resin flow is 10%, and the rheometer has a minimum melt viscosity of 3000 poise. An insulating resin sheet was obtained. The obtained insulating adhesive sheet was disposed on both sides of the inner layer board, and then thermocompression bonded for 90 minutes under a vacuum condition of a pressure of 3.0 MPa and a holding temperature of 180 ° C. to form a double-sided copper clad laminate.
得られた両面銅張り積層板の銅箔引きはがし強さ及び耐薬品性を下記の方法で評価した。 The copper foil peeling strength and chemical resistance of the obtained double-sided copper-clad laminate were evaluated by the following methods.
評価方法
銅箔引きはがし強さ(ピール強度):絶縁樹脂シートを加熱圧着した銅張り積層板を用いて、外層銅箔に10mm幅のパターンを形成した。この外層銅箔を、引き剥がし速度50mm・min−1で引張試験機(島津オートグラフ製S−100)を用いて引き剥がして、引き剥がしに要する力で評価した。
耐薬品性(耐アルカリ性):全面をエッチングした評価基板1dm2の基板サンプルを乾燥した。その後、予め50℃に加温しておいた5%水酸化ナトリウム液に所定時間浸漬した。浸漬処理前後の重量差を求め、その重量減少量により耐薬品性を評価した。
Evaluation method Copper foil peeling strength (peel strength): A 10 mm wide pattern was formed on the outer layer copper foil using a copper-clad laminate obtained by heat-pressing an insulating resin sheet. This outer layer copper foil was peeled off using a tensile tester (S-100, manufactured by Shimadzu Autograph) at a peeling speed of 50 mm · min −1 and evaluated by the force required for peeling.
Chemical resistance (alkali resistance): A substrate sample of 1 dm 2 of the evaluation substrate etched on the entire surface was dried. Thereafter, it was immersed in a 5% sodium hydroxide solution preheated to 50 ° C. for a predetermined time. The difference in weight before and after the immersion treatment was determined, and the chemical resistance was evaluated based on the weight loss.
実施例2
1,2,3−トリヒドロキシベンゼン0.5部を、5.0部に代えた以外は、実施例1と同様にして、両面銅張り積層板を形成し、評価した。
Example 2
A double-sided copper-clad laminate was formed and evaluated in the same manner as in Example 1 except that 0.5 part of 1,2,3-trihydroxybenzene was replaced with 5.0 parts.
実施例3
1,2,3−トリヒドロキシベンゼン0.5部を、1,2,4−トリヒドロキシベンゼン(和光純薬工業(株)製)0.5部に代えた以外は、実施例1と同様にして、両面銅張り積層板を形成し、評価した。
Example 3
Example 1 was repeated except that 0.5 part of 1,2,3-trihydroxybenzene was replaced with 0.5 part of 1,2,4-trihydroxybenzene (manufactured by Wako Pure Chemical Industries, Ltd.). Then, a double-sided copper-clad laminate was formed and evaluated.
実施例4
1,2,3−トリヒドロキシベンゼン0.5部を、1,3,5−トリヒドロキシベンゼン(和光純薬工業(株)製)0.5部に代えた以外は、実施例1と同様にして、両面銅張り積層板を形成し、評価した。
Example 4
Example 1 was repeated except that 0.5 part of 1,2,3-trihydroxybenzene was replaced with 0.5 part of 1,3,5-trihydroxybenzene (manufactured by Wako Pure Chemical Industries, Ltd.). Then, a double-sided copper-clad laminate was formed and evaluated.
比較例1
1,2,3−トリヒドロキシベンゼン0.5部を、1,2−ジヒドロキシベンゼン(和光純薬工業(株)製)0.5部に代えた以外は、実施例1と同様にして、両面銅張り積層板を形成し、評価した。
Comparative Example 1
Both surfaces are the same as in Example 1 except that 0.5 part of 1,2,3-trihydroxybenzene is replaced with 0.5 part of 1,2-dihydroxybenzene (manufactured by Wako Pure Chemical Industries, Ltd.). A copper clad laminate was formed and evaluated.
比較例2
1,2,3−トリヒドロキシベンゼン0.5部を、ビスフェノール酸化防止剤(ヨシノックスBB:丸善石油化学(株)製)0.5部に代えた以外は、実施例1と同様にして、両面銅張り積層板を形成し、評価した。
Comparative Example 2
Both sides were carried out in the same manner as in Example 1 except that 0.5 part of 1,2,3-trihydroxybenzene was replaced with 0.5 part of bisphenol antioxidant (Yoshinox BB: manufactured by Maruzen Petrochemical Co., Ltd.). A copper clad laminate was formed and evaluated.
比較例3
1,2,3−トリヒドロキシベンゼンを添加しない以外は、実施例1と同様にして、両面銅張り積層板を形成し、評価した。
Comparative Example 3
A double-sided copper-clad laminate was formed and evaluated in the same manner as in Example 1 except that 1,2,3-trihydroxybenzene was not added.
実施例1〜4及び比較例1〜3に関する銅箔引きはがし強さ及び耐薬品性の結果を、表1に示す。 Table 1 shows the results of peel strength and chemical resistance of Examples 1 to 4 and Comparative Examples 1 to 3.
表1から明らかなとおり、本発明の組成物を用いて作製した積層板は、高い銅箔引きはがし強さを示した。また、本発明の積層板は、重量減少率が少なく、耐薬品性においても優れていた。 As is clear from Table 1, the laminate produced using the composition of the present invention exhibited high copper foil peeling strength. In addition, the laminate of the present invention has a low weight reduction rate and is excellent in chemical resistance.
Claims (8)
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| JPH1171501A (en) * | 1997-08-29 | 1999-03-16 | Hitachi Chem Co Ltd | Epoxy resin composition and cured material using the same |
| JPH11130939A (en) * | 1997-10-29 | 1999-05-18 | Hitachi Chem Co Ltd | Epoxy resin composition and cured product thereof |
| JPH11158352A (en) * | 1997-11-27 | 1999-06-15 | Hitachi Chem Co Ltd | Epoxy resin composition, epoxy resin prepreg and epoxy resin laminate |
| JP2001049091A (en) * | 1999-08-11 | 2001-02-20 | Toshiba Chem Corp | Build-up type multi-layer printed wiring board, resin composition and resin film used therefor |
| JP4951816B2 (en) * | 2001-03-30 | 2012-06-13 | 日立化成工業株式会社 | Insulating resin composition for printed wiring board and use thereof |
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| JP2008516064A (en) * | 2004-10-11 | 2008-05-15 | ヘンケル コマンディットゲゼルシャフト アウフ アクチエン | Aging resistant coatings and adhesive composites |
| CN105599328A (en) * | 2016-01-13 | 2016-05-25 | 中国大唐集团科学技术研究院有限公司 | Manufacturing method of PVB (polyvinyl butyral) film for solar photovoltaic power generation equipment |
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