JP2012080034A - Pattern shape prediction program, and pattern shape prediction system - Google Patents

Abstract

A pattern shape prediction program capable of confirming a pattern shape without actually drawing an electron beam when manufacturing a mask pattern or the like using shot shape array drawing data in which a dose amount is associated with each shot shape A pattern shape prediction system is provided.
A pattern shape prediction device includes a step data storage unit that stores step data, a side correction table that stores a dose amount and a correction amount in association with each other, and step data. The shot shape correction unit 56a that creates a shape obtained by correcting the rectangle 3 based on the dose amount of the rectangle 3 of the side correction table 55a-1 and the correction amount of the side correction table 55a-1, and the shot shape correction unit 56a And an outer shape creation unit 56b for creating the predicted pattern shape 14.
[Selection] Figure 2

Description

  The present invention relates to a pattern shape prediction program and a pattern shape prediction system for a pattern shape drawn with an electron beam.

Conventionally, when a mask pattern is drawn with an electron beam on a mask, there has been a technique for dividing the mask data into a plurality of rectangular areas and creating drawing data for each rectangular area (for example, Patent Document 1).
On the other hand, as in the embodiment described later, a method has been proposed in which drawing data is created so that a plurality of rectangular data overlap, the dose is controlled for each shot, and a pattern is drawn on the mask. (For example, Patent Document 2). In this method, drawing data is created so that a desired resist shape can be drawn with a small number of shots by controlling the dose amount for each shot and allowing the overlapping of shots. In this method, drawing data such as a curved portion is converted into a rectangular shot shape having a larger area and coarser than conventional drawing data. A desired resist shape is drawn by the proximity effect due to scattering of the electron beam. This method is suitable for drawing a mask of a leading-edge product having a fine pattern in which the proximity effect appears more prominently, and can also be applied to the field of direct drawing where drawing is directly performed on a wafer with a charged particle beam.
However, this drawing technique has a problem that the pattern shape cannot be confirmed until the drawing is actually performed based on the drawing data.

JP 2005-79115 A International Publication No. 2010/025061

  An object of the present invention is to provide a pattern that can confirm a pattern shape without actually drawing an electron beam when manufacturing a mask pattern or the like using shot shape array drawing data in which a dose amount is associated with each shot shape. A shape prediction program and a pattern shape prediction system are provided.

  The present invention solves the problems by the following means. In addition, in order to make an understanding easy, although the code | symbol corresponding to embodiment of this invention is attached | subjected and demonstrated, it is not limited to this. In addition, the configuration described with reference numerals may be improved as appropriate, or at least a part thereof may be replaced with another configuration.

1st invention is drawing data created based on the shape of a drawing schedule pattern, and the computer (50, 250) is arranged so that a plurality of shot shapes overlap, and the dose amount is set for each shot shape. Storage means (55e) for storing the associated shot shape array drawing data, correction information storage means (55a-1, 255a-2) for storing the dose amount and the correction amount in association with each other, and the shot shape array Shot shape correction means (56a, 256a) for creating a corrected shot shape that is a shape obtained by correcting the shot shape of the drawing data based on the dose amount of each shot shape of the storage means and the correction amount of the correction information storage means ) And a combination of the corrected shot shapes based on the corrected shot shape created by the shot shape correcting means Contour creating unit (56b, 256b) to create a pattern predicted shape is a pattern shape prediction program for causing to function as.
According to a second invention, in the pattern shape prediction program according to the first invention, the computer (50, 250) compares the shape of the drawing-scheduled pattern with the pattern predicted shape created by the contour creation means by shape. The pattern shape prediction program is characterized by functioning as shape comparison means (56c) for verifying the difference.
According to a third aspect of the present invention, in the pattern shape prediction program of the first aspect, the shot shape correction means (56a, 256a) calculates the total dose amount of the portion of the portion where the shot shape overlaps, and performs the correction. A pattern shape prediction program characterized by functioning to create a shot shape.
According to a fourth aspect of the present invention, in the pattern shape prediction program of any one of the first to third aspects, the computer (50, 250) causes the computer (50, 250) to provide side correction information that is information for correcting a side shape of the shot shape. Functioning as correction information storage means (55a-1) to store, the shot shape correction means (56a-1) corrects the side of the shot shape based on the side correction information of the correction information storage means. It is a pattern shape prediction program characterized by making it function.
A fifth aspect of the invention is a pattern shape prediction program according to any one of the first to fourth aspects of the invention, wherein the computer (50, 250) is configured to detect outer corner correction information and inner corner information that are information for correcting outer corners. Each of the corrections that function as corner correction information storage means (255a-2) that stores at least one of inner corner correction information that is information to be corrected, and the shot shape correction means (256a-2) corrects the side. A pattern shape prediction program for causing a corner formed by a shot shape to function based on correction information stored in the corner correction information storage unit.
According to a sixth aspect of the present invention, in the pattern shape prediction program according to any one of the first to fifth aspects of the invention, the shot shape correcting unit functions to perform linear approximation as the corner correction. This is a shape prediction program.
According to a seventh invention, in the pattern shape prediction program according to any one of the first to sixth inventions, the shot shape correction means (256a) is used to correct the corners, and two line segments forming the corner are used. If the angle inside the figure is 180 degrees or more among the formed angles, it is determined whether or not the corner can be rounded based on the length of the line segment and the correction information of the corner correction information storage means, A pattern shape prediction program characterized in that when it is determined that R can be added, the corner is corrected, and when it is determined that the corner cannot be R, the function is performed so that the corner is not corrected.
In an eighth aspect of the pattern shape prediction program according to the seventh aspect of the invention, when the shot shape correction means (256a) determines that the corner cannot be rounded, linear approximation is performed according to the size of the corner R. It is a pattern shape prediction program characterized by functioning as described above.
According to a ninth invention, in the pattern shape prediction program according to any one of the first to eighth inventions, the storage means (55, 255) functions so as to store a minimum dose, and the shot shape correction means A divided shot shape is obtained by dividing (56a, 256a) into a portion where the shot shape overlaps and a portion where the shot shape does not overlap, and for each of the divided shot shapes, the total dose amount of the portion is calculated, and the divided shot shape The total dose amount of the storage unit is compared with the minimum dose amount of the storage unit, and when the dose is smaller than the minimum dose amount, a pattern shape prediction is made to function so as to delete the divided shot shape It is a program.
According to a tenth aspect of the invention, in the pattern shape prediction program according to any one of the first to ninth aspects of the invention, the storage means (55, 255) stores the maximum dose amount and the correction amount of the maximum dose amount. The shot shape correction means (56a, 256a) is divided into a portion where the shot shape overlaps and a portion where the shot shape does not overlap, and the total dose amount of the portion is determined for each of the divided shot shapes. The total dose amount is compared with the maximum dose amount of the storage means, and when the total dose amount of the divided shot shape is larger than the maximum dose amount, the correction amount of the maximum dose amount is calculated. It is a pattern shape prediction program characterized by being applied and functioning to create the corrected shot shape.
In an eleventh aspect of the invention, in the pattern shape prediction program according to any one of the first to tenth aspects of the invention, the storage means (55, 255) stores an allowable dose amount that is a dose amount at which the resist evaporates. To obtain a divided shot shape obtained by dividing the computer (56a, 256a) into a portion where the shot shape overlaps and a portion which does not overlap, and for each of the divided shot shapes, the total dose amount of the portion is calculated. Allowable dose amount comparison means (56a, 256a) for comparing the total dose amount of the divided shot shape with the allowable dose amount of the storage means, and the allowable dose amount comparison means to convert the divided shot shape into the allowable dose amount. It is characterized by functioning as notifying means (52) for notifying the user when it is determined that the amount is larger than the amount. It is a pattern shape prediction program.

  A twelfth aspect of the present invention is drawing data created based on the shape of a drawing-scheduled pattern, arranged so that a plurality of shot shapes overlap, and shot shape array drawing data in which a dose amount is associated with each shot shape Storage means (55e) for storing the correction information storage means (55a-1, 255a-2) for storing the dose amount and the correction amount in association with each other, and the shot shape of the shot shape array drawing data, Shot shape correction means (56a, 256a) for creating a corrected shot shape which is a shape corrected based on the dose amount of each shot shape of the storage means and the correction amount of the correction information storage means, and the shot shape correction means Creates a predicted pattern shape that is a combination of the corrected shot shapes based on the corrected shot shape created by That the contour creating unit (56b, 256b), a pattern shape prediction system comprising a.

  In a thirteenth aspect of the invention, the computer (50, 250) is drawing data created based on the shape of a drawing-scheduled pattern, and is arranged so that a plurality of shot shapes overlap, and the dose amount is set for each shot shape. Storage means (55e) for storing the associated shot shape array drawing data, correction information storage means (55a-1, 255a-2) for storing the dose amount and the correction amount in association with each other, and the shot shape array Shot shape correction means (56a, 256a) for creating a corrected shot shape that is a shape obtained by correcting the shot shape of the drawing data based on the dose amount of each shot shape of the storage means and the correction amount of the correction information storage means ) And the respective corrected shot shapes based on the corrected shot shapes created by the shot shape correcting means An external shape creation means (56b, 256b) for creating a pattern predicted shape that is a shape, and an image (FIG. 5) of the difference between the planned pattern shape to be drawn and the predicted pattern shape is obtained. A pattern shape verification program that functions as shape comparison means (56c) that determines that there is an abnormality when the value is equal to or greater than a predetermined determination value.

  14th invention is drawing data created based on the shape of a drawing scheduled pattern, and is arranged so that a plurality of shot shapes overlap, and shot shape array drawing data in which a dose amount is associated with each shot shape Storage means (55e) for storing the correction information storage means (55a-1, 255a-2) for storing the dose amount and the correction amount in association with each other, and the shot shape of the shot shape array drawing data, Shot shape correction means (56a, 256a) for creating a corrected shot shape which is a shape corrected based on the dose amount of each shot shape of the storage means and the correction amount of the correction information storage means, and the shot shape correction means Creates a predicted pattern shape that is a combination of the corrected shot shapes based on the corrected shot shape created by And an external shape creation means (56b, 256b) and an image (FIG. 9) of the difference between the drawing-scheduled pattern shape and the predicted pattern shape, and the area of the obtained difference image is equal to or larger than a predetermined determination value. A pattern shape verification system comprising shape comparison means (56c) for determining that there is an abnormality.

According to the present invention, the following effects can be obtained.
In the first and twelfth inventions, the pattern predicted shape is created from the shot shape array drawing data, so the pattern shape can be confirmed based on the shot shape array drawing data without actually drawing the pattern on a photomask or the like. it can. For this reason, it is possible to reduce the design cost without using an expensive drawing apparatus.
Note that the drawing technique using shot shape array drawing data can significantly reduce the drawing time because the number of shots is much smaller than in the prior art. However, since the outer shape and the like of the shot shape array drawing data is significantly different from the shape of the pattern to be drawn, there is a problem that the final pattern shape cannot be confirmed unless the drawing is actually performed on a photomask or the like.
As described above, the present invention can solve these problems, and can practically use a drawing method in which the pattern shape uses shot shape array drawing data.
Since the second invention compares the shape of the pattern to be drawn drawn on the photomask or the like with the pattern predicted shape and verifies the difference, by confirming that the difference between these shapes is large, An error in the shot shape array drawing data can be confirmed.

According to the third aspect of the invention, the pattern prediction shape can be created by accurately reflecting the dose amount of the portion where the shot shape overlaps.
According to the fourth aspect of the invention, the shape of the side of the shot shape can be made thicker or thinner based on the side correction information.

In the fifth aspect of the invention, the sides are corrected and the corners are further corrected, so that the pattern predicted shape can be created more accurately.
In the sixth aspect of the invention, since the straight line approximation is performed as the corner correction, the corner correction processing can be easily performed.

In the seventh invention, when it is determined that the corner can be rounded, the corner is corrected. On the other hand, when it is determined that the corner cannot be rounded, the corner is not corrected. Can be attached. In addition, a pattern predicted shape can be created more accurately than in the case where no R is applied without making such a determination.
In the eighth invention, when it is determined that the corner cannot be rounded, a linear approximation is performed according to the size of the corner R. Therefore, even if the corner cannot be rounded, the corner can be corrected. Can be created accurately.

In the ninth aspect, since the divided shot shape is deleted when the total dose amount of each portion of the divided shot shape is smaller than the minimum dose amount, the pattern prediction processing of this portion is not necessary, and the pattern of this portion is changed. Since it can be deleted, the load on the apparatus can be reduced and the pattern can be predicted more accurately. Further, it is possible to increase the accuracy of error detection of shot shape array drawing data.
In the tenth aspect of the invention, when the total dose amount of each part of the divided shot is larger than the maximum dose amount, the correction amount of the maximum dose amount is applied.Therefore, when there is a maximum dose amount that does not further expand, The pattern can be predicted more accurately.
In the eleventh aspect of the invention, when it is determined that the total dose amount of each part of the divided shot shape is larger than the allowable dose amount, the user is informed, so that the resist evaporates and scatters due to overdose, and the chamber is contaminated. Can be prevented.

  In the thirteenth and fourteenth aspects, an image of the difference between the pattern pattern to be drawn and the predicted pattern shape is obtained, and when the area of the obtained image of the difference is equal to or greater than a predetermined determination value, it is automatically determined that there is an abnormality Since the error inspection of the shot shape array drawing data can be performed only by confirming the data in the area having the abnormality, the inspection efficiency is remarkably improved.

It is a figure explaining the pattern drawing method of a 1st embodiment. It is a figure explaining the structure of the pattern drawing system 20 of 1st Embodiment. It is a figure explaining the pattern shape prediction process of 1st Embodiment. It is a figure explaining the pattern shape prediction process of 1st Embodiment. It is a figure explaining the pattern shape prediction process when there is an error in the stepped data 2-1 of the first embodiment. It is a figure explaining the shape comparison process of 1st Embodiment. It is a flowchart which shows the pattern prediction process of 1st Embodiment. It is a block diagram of the pattern drawing system 220 of 2nd Embodiment. It is a figure explaining the corner correction table 255a-2 of 2nd Embodiment, and a corner process. It is a figure explaining the corner correction table 355a-2 and corner processing of 3rd Embodiment.

(First embodiment)
Embodiments of the present invention will be described below with reference to the drawings.
First, the pattern drawing method of the first embodiment will be described.
FIG. 1 is a diagram illustrating a pattern drawing method according to the first embodiment.
Pattern drawing in the first embodiment is performed by the following steps.
(1) As shown in FIG. 1A, the designer creates design data 1. The design data 1 is obtained by creating a desired wiring pattern shape to be actually formed on the semiconductor wafer 6. The design data 1 is created using a design device 30 such as CAD (see FIG. 2).
(2) As shown in FIG. 1B, the designer creates mask data 1 </ b> A (drawing scheduled pattern) based on the design data 1. The mask data 1A is polygonal data created using a technique such as OPC (Optical Proximity Effect Correction). The mask data 1A may be created using a design device 30 (see FIG. 2) such as CAD, or may be created using a dedicated design device. In the embodiment, an example in which the design apparatus 30 is used will be described.

(3) As shown in FIG. 1 (c-1), stepped data 2 (corresponding to shot shape array drawing data) is further created from the mask data 1A. FIG. 1C-1 shows the stepped data 2 corresponding to the shape in the two-dot chain line of the mask data 1A in FIG.
The stepped data 2 is obtained by arranging a plurality of rectangles 3 based on the mask data 1A. Each rectangle 3 corresponds to a shot shape when an electron beam is drawn. The stepped data 2 is arranged so that a plurality of rectangles 3 overlap with each other, and the amount of electron beam irradiated for each rectangle 3 (hereinafter referred to as “dose amount”) is associated.
The stepped data 2 may be created using a design device 30 (see FIG. 2) such as CAD, or may be created using a dedicated design device. In the embodiment, an example in which the design apparatus 30 is used will be described.

(4) As shown in FIG. 1D, the mask pattern 5 is drawn on the photomask 4 using the stepped data 2 by the drawing device 40 (see FIG. 2). The drawing apparatus 40 draws an electron beam with a dose amount associated with each rectangle 3 by using an aperture having a shape corresponding to each rectangle 3. The dose amount may be adjusted by changing the intensity of the electron beam per time for each shot, or changing the irradiation time for each shot while keeping the illuminance constant.
(5) As shown in FIG. 1E, the photomask 4 is transferred onto the semiconductor wafer 6 by an exposure device such as a stepper, and a wiring pattern 7 is formed on the semiconductor wafer 6.

Here, the shape of the mask pattern 5 formed by using the stepped data 2 in the step (4) is a drawing in which rectangles having different shapes are combined based on the design data 1 as has been conventionally performed. The data 102 is created (see FIG. 1C-2), and the shape is similar to the shape in which the mask pattern is drawn on the photomask based on the drawing data 102. The reason for this is as follows.
When the stepped data 2 is used, the outer corner 3a of the rectangle 3 becomes smaller as the amount of the electron beam irradiated becomes smaller at the tip, so that the contour of the mask pattern 5 becomes thinner on the inner side. Becomes a curve. Further, since the rectangle 3 overlaps the inner corner portion 3b, the electron beam is irradiated for each shot, the dose increases, the contour of the mask pattern 5 bulges outward, and the contour becomes a curve. For this reason, as shown in FIG. 1D, a mask pattern 5 having a shape in which corner portions are smoothly connected with a curve is drawn on the photomask 4.

  The stepped data 2 of the present embodiment has a smaller number of rectangles 3 than the conventional drawing data 102, so that data creation is easy. Furthermore, when the mask pattern 5 is drawn on the photomask 4, the number of shots can be remarkably reduced as compared with the conventional case. For this reason, the production time of the photomask 4 can be significantly reduced, and the operation time of the expensive drawing apparatus 40 can be reduced, so that the cost of the photomask 4 can be reduced.

However, since the shape of the stepped data 2 is significantly different from the shapes of the mask data 1A and the mask pattern 5, is the stepped data 2 accurate in the process before actually drawing the mask pattern 5? It is difficult to evaluate whether or not. Therefore, in this embodiment, as described below, the shape of the mask pattern 5 to be created can be predicted at the stage of the stepped data 2.
Hereinafter, the creation of the stepped data 2 and the configuration and method for predicting the mask pattern 5 from the stepped data 2 will be mainly described. In order to predict the mask pattern 5 from the stepped data, the dose amount for each shot is integrated for each pixel in the drawing area, and compared with the resist pattern formation limit exposure amount, a resist pattern obtained by exposure / development ( Although there is a method for simulating the mask pattern 5) shape, the amount of calculation becomes enormous and is not suitable for practical use.

FIG. 2 is a diagram illustrating the configuration of the pattern drawing system 20 according to the first embodiment.
The pattern drawing system 20 includes a design device 30, a drawing device 40, and a pattern shape prediction device 50 (pattern shape prediction system). The design apparatus 30, the drawing apparatus 40, and the pattern shape prediction apparatus 50 are connected to each other via a communication network such as a LAN or the Internet, and can transmit / receive information to / from each other.

The design device 30 is a CAD or the like for a designer to design a wiring pattern. The design device 30 includes a design device operation unit 31, a design device display unit 32, a design device transmission / reception unit 33, a design device storage unit 35, and a design device control unit 36.
The design device operation unit 31 is an operation device or an input device such as a mouse or a keyboard operated by a designer in order to input information to the design device 30.
The design device display unit 32 is a monitor that displays design data 1, mask data 1A, and the like.
The design device transmission / reception unit 33 is a portion that transmits / receives information to / from other devices such as the drawing device 40 and the pattern shape prediction device 50. The design device transmission / reception unit 33 includes an interface for communicating with other devices.

The design device storage unit 35 is a storage device such as a hard disk or a semiconductor memory element for storing programs, information, and the like necessary for the operation of the design device 30. The design device storage unit 35 includes a mask data creation program 35a, a stepped data creation program 35b, a design data storage unit 35c, a mask data storage unit 35d, and a stepped data storage unit 35e.
The mask data creation program 35a is a program for converting design data 1 into mask data 1A. The mask data creation program 35a performs conversion processing using a technique such as OPC.
The stepped data creation program 35b is a program for converting the mask data 1A into the stepped data 2.
The design data storage unit 35c is a storage area for storing the design data 1 of the wiring pattern.
The mask data storage unit 35d is a storage area for storing mask data 1A converted from the design data 1.
The stepped data storage unit 35e is a storage area for storing stepped data 2 converted from the mask data 1A.

The design device control unit 36 is a control unit for comprehensively controlling the design device 30 and includes, for example, a CPU (central processing unit). The design device control unit 36 includes a mask data creation unit 36a and a stepped data creation unit 36b.
The mask data creation unit 36a is a control unit that converts the design data 1 into mask data 1A in accordance with the mask data creation program 35a. The mask data creation unit 36a stores the created mask data 1A in the mask data storage unit 35d.
The stepped data creation unit 36b is a control unit that converts the mask data 1A into the stepped data 2 in accordance with the stepped data creation program 35b. The stepped data creation unit 36b stores the created stepped data 2 in the stepped data storage unit 35e.

  The drawing apparatus 40 is an electron beam drawing apparatus that draws the mask pattern 5 on the photomask 4. The drawing device 40 receives the stepped data 2 transmitted from the design device 30 and draws the mask pattern 5 based on this. The drawing device 40 draws the mask pattern 5 using the aperture corresponding to the rectangle 3 of the stepped data 2.

The pattern shape prediction device 50 is a device that predicts the shape of the mask pattern 5 created on the photomask based on the mask data 1A created by the design device 30.
The pattern shape prediction device 50 includes a prediction device operation unit 51, a prediction device display unit 52, a prediction device transmission / reception unit 53, a prediction device storage unit 55, and a prediction device control unit 56.
The computer referred to in the present invention refers to an information processing device including a storage device, a control device, and the like. The pattern shape prediction device 50 includes an information processing device including a prediction device storage unit 55, a prediction device control unit 56, and the like. And is included in the concept of the computer of the present invention.

The prediction device operation unit 51 is an operation device such as a mouse or a keyboard, an input device, or the like for the user to operate the pattern shape prediction device 50.
The prediction device display unit 52 is a monitor that displays the pattern prediction shape 14 (see FIG. 3 (i)) and the comparison result between the pattern prediction shape 14 and the mask data 1A.
The prediction device transmission / reception unit 53 is a portion that transmits and receives information between the design device 30 and the drawing device 40, and is the same portion as the design device transmission / reception unit 33. The prediction device transmission / reception unit 53 receives and acquires the design data 1 and the stepped data 2 transmitted by the design device 30.

The prediction device storage unit 55 is a storage device such as a hard disk or a semiconductor memory element for storing programs, information, and the like necessary for the operation of the pattern shape prediction device 50.
The prediction device storage unit 55 includes a shape prediction program 55a (pattern shape prediction program), a mask data storage unit 55d, and a stepped data storage unit 55e.

The shape prediction program 55a is a program for creating the pattern predicted shape 14 or comparing the mask data 1A based on the mask data 1A. The shape prediction program 55a includes a side correction table 55a-1 (correction information storage unit) (see FIG. 3E).
The side correction table 55a-1 is a table that stores the total dose amount and the side correction amount in association with each other. As will be described later, the side correction table 55a-1 is referred to by the side correction unit 56a-1 during the side correction processing.
The mask data storage unit 55d is a storage area for storing the mask data 1A transmitted by the design apparatus 30.
The stepped data storage unit 55e is a storage area for storing the stepped data 2 transmitted by the design apparatus 30.

The prediction device control unit 56 is a control unit for comprehensively controlling the pattern shape prediction device 50, and includes, for example, a CPU. The prediction device control unit 56 appropriately reads and executes various programs stored in the prediction device storage unit 55, thereby realizing various functions according to the present invention in cooperation with the hardware described above.
The prediction device control unit 56 includes a shot shape correction unit 56a, an outline creation unit 56b, a pattern shape comparison unit 56c, and a bus for transmitting information between these control units as necessary.

The shot shape correction unit 56a is a control unit that corrects the rectangle 3 of the stepped data 2 based on the dose amount of each rectangle 3 and the correction amount of the correction information storage unit. The shot shape correction unit 56a includes a side correction unit 56a-1.
The side correction unit 56a-1 is a control unit that corrects the side of the rectangle 3 based on the side correction table 55a-1.
The outer shape creation unit 56b creates a pattern predicted shape 14 (see FIG. 4I) that is a shape obtained by combining the corrected shot shapes created by the shot shape correction unit 56a based on the arrangement of the stepped data 2. Part.
The pattern shape comparison unit 56c calculates the area of the difference between the pattern of the mask data 1A (see FIG. 4A) in the mask data storage unit 55d and the pattern of the pattern predicted shape 14 (see FIG. 4I). The control unit verifies whether the conversion is correctly performed.

Next, the pattern shape prediction process of the pattern shape prediction apparatus 50 will be described.
FIG. 3 (FIGS. 3-1 and 3-2) is a diagram for explaining pattern shape prediction processing according to the first embodiment.
FIG. 4 is a diagram illustrating the pattern shape prediction process when there is an error in the stepped data 2-1 of the first embodiment.
In FIG. 4, the branch number “2” is attached to the drawing corresponding to each drawing of FIG. For example, FIG. 4C-2 is a diagram corresponding to FIG.
It is assumed that the stepped data 2 created by the design device 30 is stored in the pattern shape prediction device 50 as a premise for performing the pattern shape prediction processing. Further, in FIG. 3, for ease of understanding, the mask data 1A is described as a shape corresponding to a circle. However, even mask data having a complicated shape can be processed in the same manner. Further, in the case of an ideal mask pattern that does not assume trapezoidal division, the mask data 1A may be a smooth curve instead of a polygonal shape.

The pattern shape prediction apparatus 50 performs pattern shape prediction processing according to the following order.
(Stepped data extraction process)
The shot shape correcting unit 56a extracts the rectangles 3 and the dose amounts associated with the rectangles 3 based on the stepped data 2 in the stepped data storage unit 55e.
In the stepped data 2 in FIG. 3B, one large-sized rectangle 3a is arranged at the center, and four small-sized rectangles 3b to 3e are arranged so as to overlap the rectangle 3a. In addition, a dose amount D2 is associated with the rectangle 3a, and a dose amount D1 is associated with the rectangles 3b to 3e. The numerical value of the dose amount described here is a value that is determined simultaneously when creating stepped data (referred to as shot shape array drawing data) from the mask data 1A. The dose amount in the following example is “ The description is based on the premise that the magnitude relationship is D1 <D2 <D3.

(Total dose calculation processing)
As shown in FIG. 3C, the shot shape correcting unit 56a identifies an area where the rectangles 3a to 3e that are shot shapes overlap as a new figure, and sets the stepped data 2 to each of the rectangles 3a to 3e. Recognized as an aggregate of divided figures (called divided shot shapes) divided by the sides, and the total dose of each divided figure is calculated. That is, the initial shot shape is divided so that one divided shot shape becomes one total dose amount in the total dose amount after the drawing is completed, and the pattern prediction by the edge correction processing is enabled.
In this example, the shot shape correcting unit 56a converts the stepped data 2 into a polygon 10a at the center, four rectangles 10b to 10e that are located outside and overlapping, and four rectangles that are located outside. Newly recognized as 10f to 10i.
Further, the shot shape correcting unit 56a calculates the total dose amount of each figure as the total dose amount D2 of the polygon 10a and the rectangles 10f to 10i as the total dose amount D1. Since the rectangles 10b to 10e are irradiated with overlapping electron beams, the shot shape correction unit 56a calculates the total dose amount of the rectangles 10b to 10e as a total dose amount D3 (= D1 + D2).
Thereby, the pattern prediction can be performed by accurately reflecting the total dose amount of the rectangles 10b to 10e, which are the overlapping portions of the rectangles 3a to 3d.

(Edge correction processing)
As shown in FIG. 3D, the shot shape correction unit 56a performs side correction processing on each side of the divided figure. The shot shape correction unit 56a refers to the side correction table 55a-1 shown in FIG. 3E, performs side correction processing, and creates corrected shot shapes that are correction shapes of the rectangles 3a to 3e.
The side correction table 55a-1 stores the dose amount D1 and the correction amount −60 nm in association with each other, stores the dose amount D2 and 0 nm in association with each other, and stores the dose amount D3 and correction amount +40 nm in association with each other. To do. When the correction amount is negative (−), it means correction of the inward side that is the direction in which the divided figure is thinned. When the correction amount is 0, the side of the divided figure is corrected. This means that the correction amount is positive (+), which means correction of the edge toward the outside, which is the direction of thickening the divided figure.

As shown in FIG. 3D, for example, the shot shape correction unit 56a performs the following processing in the lower part of the stepped data 2.
The polygon 10a is not corrected because it is the total dose D2.
Since the rectangle 10b is the total dose D3, each side of the rectangle 10b is corrected outward by +60 nm to create the rectangle 10b-2.
Since the rectangle 10f is the total dose D1, each side of the rectangle 10f is corrected 40 nm inward to create the rectangle 10f-2.
The shot shape correction unit 56a maintains the shape of the polygon 10a by this correction processing, reduces the rectangle 10f arranged on the outermost side, and enlarges the rectangle 10b arranged on the inner side. Then, an outer corner 10j-2 is created in the inner corner 10j shown in FIG. 3C, and the inner corner 10j is complemented in a step shape. Thereby, the pattern shape prediction apparatus 50 can bring the shape of the stepped data 2 close to the shape of the mask pattern 5.
Note that a method for obtaining the side correction amount corresponding to the dose amount Dn between the dose amount D2 and the dose amount D3 using the side correction table 55a-1 is, for example, the side correction amount value closer to D2 and D3. There is a method of performing quantization (approximate value), and as a more accurate method, a method of linearly interpolating the side correction amount can also be applied. In order to obtain the side correction amount of the dose amount Dn (D2 ≦ Dn ≦ D3) by linear interpolation, assuming that the side correction amount E2 nm is the dose amount D2 and the side correction amount E3 nm is the dose amount D3.
((Dn−D2) × E3 nm + (D3−Dn) × E2 nm) / (D3−D2)
It can be calculated by the following formula. Similar quantization and linear interpolation can be applied to a corner correction table 255a-2 (see FIG. 7) described later.

The correction reflects the resist pattern shape after the phenomenon when the mask pattern 5 is drawn with an electron beam by actually using the stepped data 2. That is, when the total dose amount of the divided figure is large, a large amount of electron beams are irradiated, so that the mask pattern 5 is formed to be thicker than the divided figure (for example, rectangles 10b to 10e), On the other hand, when the total dose amount of the divided figure is small, only a small amount of electron beam is irradiated, so that the mask pattern 5 is formed to be thinner than the divided figure (for example, rectangles 10f to 10i). In some cases, the mask pattern 5 has a dose amount that is patterned in the same size as the divided figure (for example, a polygon 10a).
That is, when the design apparatus 30 described above converts the mask data 1A into the stepped data 2, the pattern formation after such a phenomenon is predicted in advance, and the shape of the rectangle 3 and its dose amount are calculated. That is why.

  Then, the shot shape correction unit 56a corrects all the divided figures 10a to 10i, and creates the side correction shape data 11 shown in FIG.

(Side correction shape outline processing)
The outline creation unit 56b extracts the outline of the side correction shape data 11 and converts the side correction shape data 11 into the polygon graphic data 12. Specifically, a sum (logical sum) of a plurality of figures constituting the edge correction shape data 11 is formed, the outermost side is extracted to form a contour line, and polygon figure data 12 is obtained.

(Corner processing)
As shown in FIG. 3 (h), the outer shape creation unit 56b creates a tangent circle with a radius of 50 nm at the corner of the outer corner, that is, the corner of the corner whose angle inside the figure is less than 180 degrees, and provides the corner R. . The outer shape creation unit 56b performs the corner process on all outer corners to create the R-attached shape data 13.

(Shape outline processing with R)
As illustrated in FIG. 3I, the contour creation unit 56 b extracts the contour line of the R-attached shape data 13 and creates the final pattern predicted shape 14.
Thereby, the pattern shape prediction apparatus 50 can predict the pattern shape without actually drawing an electron beam on the photomask.

(Shape comparison process)
The pattern shape comparison unit 56c can accurately detect the missing pattern, the addition of an extra pattern, the incorrect designation of the dose amount, etc. when the mask data 1A is converted into the stepped data 2. Thus, the area of the difference between the shapes of the mask data 1A and the pattern predicted shape 14 is calculated and compared. If the stepped data 2 is left as it is, it is difficult to detect an error that has occurred during conversion. In addition, since the shape is greatly different from the original mask data 1A, the correct conversion is performed by a method such as overlaying the original data with the stepped data 2 and calculating and comparing the difference. However, since the area of the difference in shape is relatively large, an error location cannot be detected or pseudo errors frequently occur, so accurate comparison and verification cannot be performed. Therefore, by predicting the resist shape formed on the photomask 4 from the stepped data 2 and comparing and verifying the predicted shape and the original data before conversion, a pseudo error does not occur and high-speed verification can be performed.
For example, after the mask data 1A and the pattern predicted shape 14 are converted into raster data, the pattern shape comparison unit 56c compares the shapes constituting them for each pixel, and counts the number of pixels having a difference, thereby counting these. Differences in shape can be compared and evaluated by area (ie, area of difference). The comparison result of the shapes can be notified to the user as an error location by displaying, for example, the pattern predicted shape 14 having a difference area of a certain value or more in a conspicuous color.

As shown in FIG. 4C-2, for example, when the mask data 1A is converted into the stepped data 2-1, by the design device 30, the same rectangle 3c-2 is placed at the same position due to a conversion error or the like. Suppose that they are arranged in double. In this case, even if the stepped data 2-1 is displayed on the prediction device display unit 52, it is extremely difficult for the user to confirm the conversion error by visual observation. Even when extracting the area of the difference from the data, it is difficult to determine the error.
Even when the rectangles are not arranged at exactly the same position, the stepped data 2-1 has irregular and complicated arrangements of rectangles with different shapes, so the user can also visually confirm the conversion error. Even when using the data extracted from the outline and extracting the area of the difference in shape from the original data by a computer, changes in the resist pattern shape in the exposure and development process are not taken into account, and an error occurs. Is difficult to distinguish.

On the other hand, since the pattern shape prediction device 50 creates the pattern prediction shape 14 from the stepped data 2 by performing the above processing, the user can display the pattern prediction shape 14 on the prediction device display unit 52, thereby Can visually confirm the mask pattern 5 drawn by the stepped data 2.
In the case of the stepped data 2-1 shown in FIG. 4C-2, the prediction device control unit 56 converts the stepped data 2-1 into the polygon graphic data 12-1 by performing the above-described processing. Conversion is performed (see FIG. 4G-2), and finally a pattern prediction shape 14-1 having an irregular shape is created (see FIG. 4I-2).
If the user visually recognizes the pattern predicted shape 14-1, the user can confirm that there is an error in the stepped data 2-1, and calculate the area of the difference between the shape of the mask data 1A and the pattern predicted shape 14-1. If a result is displayed on the prediction apparatus display part 52, the error of the stepped data 2-1 can be confirmed easily.

  Note that various methods can be used as a method for calculating and determining and notifying the area of the difference in shape. For example, if the pattern shape comparison unit 56c displays the mask data 1A and the pattern predicted shape 14 so as to overlap each other and displays a non-overlapping portion with a conspicuous color, the difference between the mask data 1A and the pattern predicted shape 14 can be achieved with a simple process. To the user.

FIG. 5 is a diagram illustrating the shape comparison process according to the first embodiment.
FIG. 5 shows an outline of a method for automatically extracting abnormal portions by comparing the shapes of patterns.
FIG. 5A shows a stepped data (shot shape array data) 2 composed of three rectangles created for the mask data 1A based on the semicircular mask data (drawing planned pattern) 5 by a two-dot chain line. . Further, the missing portion 2n of the stepped data 2 is indicated by a shaded rectangle, and the pattern predicted shape 14 generated for the stepped data 2 having the missing portion 2n is indicated by a broken line.
A portion corresponding to the missing portion 2n of the pattern predicted shape 14 is greatly deviated from the mask pattern 5 and is an error (abnormal) portion.

FIG. 5B shows an image 8 of the difference between the mask pattern 5 and the pattern predicted shape 14 hatched with diagonal lines.
When the mask pattern 5 and the pattern predicted shape 14 are both raster-developed and converted into a binary image, the difference image 8 can be obtained by exclusive OR (XOR) of logical operations. , 8-8, 8-4,..., 8-8 are connected in series. Here, the area of the island-like portion 8-2 of the difference image 8 corresponding to the missing portion 2n of the stepped data 2 is particularly large, and the error portion is automatically detected by evaluating the size of the area of the island-like portion. it can. Specifically, for the difference image 8 expressed by a binary image, the island-shaped portions are identified by the labeling function of the connected region of particle analysis, and the area of each identified island portion is measured. An error location can be automatically detected by setting an island portion whose area is equal to or greater than a predetermined determination value as an error location.
Further, as shown in FIG. 5C, the pattern drawing area is divided into grid areas of a predetermined size, and the pixels of the image 8 of the difference in shape between the mask pattern 5 and the pattern predicted shape 14 in each area. If the ratio of the number of difference pixels in the grid area is greater than a certain value, it can be automatically estimated that there is a pattern error. The division size of the lattice region is preferably in the range of about half to ten times the area of the difference to be detected from the viewpoint of detection performance.

FIG. 6 is a flowchart illustrating the pattern prediction process according to the first embodiment.
In process step S (hereinafter simply referred to as “S”) 1, the prediction device control unit 56 starts a series of processes.
In S2, the prediction device transmission / reception unit 53 receives and acquires the mask data 1A and the stepped data 2 transmitted by the design device 30 (data acquisition step). The prediction device control unit 56 stores the acquired mask data 1A and stepped data 2 in the mask data storage unit 55d and the stepped data storage unit 55e, respectively.

In S3, the prediction device control unit 56 performs the stepped data extraction process described above (see FIG. 3B).
In S4, the prediction device control unit 56 performs the total dose calculation process described above (see FIG. 3C).
In S5, the prediction device control unit 56 performs the above-described edge correction process (see FIG. 3D) and creates the edge correction shape data 11 (see FIG. 3F).

In S6, the prediction device control unit 56 performs the above-described edge correction shape outline processing (see FIG. 3G).
In S <b> 7, the prediction device control unit 56 performs the corner processing described above (see FIG. 3H), and creates the R-attached shape data 13.
In S <b> 8, the prediction device control unit 56 performs the above-described R-attached shape outline processing on the R-attached shape data 13 to create the pattern predicted shape 14 (see FIG. 3I).

In S <b> 9, the prediction device control unit 56 displays the pattern prediction shape 14 on the prediction device display unit 52. The user can determine whether or not there is an error in the stepped data 2 by visually checking the pattern predicted shape 14 and determining whether or not the shape is irregular.
In S10, the prediction device control unit 56 performs the shape comparison process described above.
In S <b> 11, the prediction device control unit 56 displays a comparison result between the shape of the mask data 1 </ b> A and the shape of the pattern prediction shape 14 on the prediction device display unit 52. The user can determine an error in the stepped data 2 by confirming the comparison result.
And the prediction apparatus control part 56 complete | finishes a series of processes (S12).

  As described above, the pattern shape prediction apparatus 50 according to the present embodiment creates the pattern prediction shape 14 from the stepped data 2, so that the pattern shape can be confirmed without actually drawing the mask pattern 5. Further, the pattern shape prediction device 50 can notify the result of the shape comparison between the stepped data 2 and the mask pattern 5, and can easily determine whether or not the stepped data 2 has an error.

(Second Embodiment)
Next, a second embodiment of the present invention will be described.
The second embodiment is an embodiment obtained by improving the corner processing from the first embodiment.
Note that, in the following description and drawings, the same reference numerals or the same reference numerals are given to the portions that perform the same functions as those in the first embodiment described above, and overlapping descriptions will be omitted as appropriate.
FIG. 7 is a block diagram of the pattern drawing system 220 of the second embodiment.
FIG. 8 is a diagram illustrating the corner correction table 255a-2 and corner processing according to the second embodiment.

As shown in FIG. 7, the pattern shape prediction apparatus 250 includes a side correction table 55a-1 and a corner correction table 255a-2 (corner correction information storage unit) in the shape prediction program 255a.
The side correction table 55a-1 is the same as 55a-1 of the first embodiment (see FIG. 3E).
As shown in FIG. 8A, the corner correction table 255a-2 stores the total dose amount, the R value of the outer corner R, and the R value of the inner corner R in association with each other. The outer corner R is a corner R provided at a corner where the angle formed inside the figure is less than 180 degrees, while the inner corner R is a corner R provided at a corner where the angle formed is greater than 180 degrees. is there.

The pattern shape prediction apparatus 250 includes a side correction unit 56a-1 and a corner correction unit 256a-2 in the shot shape correction unit 256a.
The side correction unit 56a-1 is the same as that in the first embodiment.
The corner correction unit 256a-2 is a control unit that performs corner processing described later.

A corner process of the pattern shape prediction apparatus 250 according to the second embodiment will be described.
FIG. 8B is an enlarged view showing a part of the side correction shape data 211.
As a premise, it is assumed that side-corrected shape data 211 in which the sides of the rectangle 3 are corrected is generated as in the first embodiment.
The edge correction shape data 211 of this part is composed of three figures 211a to 211c, and has an outer corner 211d, an inner corner 211e, and an outer corner 211f. The figures 211a to 211c have total doses D2, D3, and D1, respectively.

The corner correction unit 256a-2 refers to the corner correction table 255a-2 and performs corner processing as follows (see FIG. 8C).
The outer corner R of R = 20 nm is provided based on the total dose D2 of the figure 211a that forms the outer corner 211d.
Based on the total dose D3 of the figure 211b that opposes the inner corner 211e, an inner corner R of R = 30 nm is provided (see FIG. 8C).
If the corner processing of both the outer corner 211d and the inner corner 211e cannot be performed because the length L of the side 211g is short, the corner correction unit 256a-2 performs the corner processing only for the outer corner R.
A corner R of R = 30 nm is provided based on the total dose D1 of the figure 211c that forms the outer corner 211f (see FIG. 8C).
The corner correction unit 256a-2 performs the above corner processing on all the corners of the edge correction shape data 211. Subsequent outline processing, shape comparison processing, and the like are the same as those in the first embodiment.

As described above, the pattern shape prediction apparatus 250 according to the present embodiment performs corner processing corresponding to the total dose amount, thereby adding an R to the corner with respect to the edge correction shape data 211, thereby providing a more accurate pattern. Predicted shapes can be generated. Further, a more accurate shape comparison can be performed by performing a shape comparison process on the predicted pattern shape.
Note that the corner may be rounded by either the outer corner or the inner corner. Even in this case, the pattern predicted shape can be created by reflecting the total dose amount of each figure.

(Third embodiment)
Next, a third embodiment of the present invention will be described.
In the third embodiment, the corner processing is changed from the first embodiment, and the corner processing is performed by linear approximation.
FIG. 9 is a diagram illustrating the corner correction table 355a-2 and corner processing according to the third embodiment.
Note that the configuration of the pattern shape prediction apparatus of the third embodiment is substantially the same as that of the second embodiment, and only the processing described later is different.

FIG. 9A illustrates the corner correction table 355a-2.
The corner correction table 355a-2 is stored in the shape prediction program (see the shape prediction program 255a shown in FIG. 7). The corner correction table 355a-2 stores the total dose amount, the outer corner value, and the inner corner value in association with each other. The outer corner value and the inner corner value will be described later.

A corner process of the pattern shape prediction apparatus according to the third embodiment will be described.
FIG. 9B is an enlarged view showing a part of the side correction shape data 311, and the configuration thereof is the same as that of the second embodiment. However, it is different that the length L of the side 311g is less than 50 nm.
The corner correction unit refers to the corner correction table 355a-2 and performs corner processing as follows.

  Based on the total dose D1 of the figure 311c forming the outer corner 311f, the outer corner value 30nm is extracted, and the corners are connected so as to connect the points 311f-1 and 311f-2 having the outer corner value 30nm from the tip of the outer corner 311f. Processing is performed (see FIG. 9C). That is, a process of chamfering C = 30 nm is performed.

  On the other hand, the same processing cannot be performed in a portion where the outer corner 311d and the inner corner 311e are continuous (see dotted lines). In other words, corner processing is performed so as to connect the points 311d-1 and 311d-2 based on the outer corner value 20nm corresponding to the figure 311a forming the outer corner 311d, while corresponding to the figure 311b facing the inner corner 311e. When corner processing is performed so as to connect the points 311e-1 and 311e-2 based on the inner corner value of 30 nm, the side 311g does not remain because the length L of the side 311g is less than 50 nm.

Therefore, the corner correction unit performs corner processing so as to connect the point 311d-1 corresponding to the outer corner 311d and the point 311e-1 corresponding to the inner corner 311e (see FIG. 9C).
Thereby, the pattern prediction shape reflecting the dose amount of the unit shape can be created.
As shown in FIG. 9D, the correction of the outer corner 311d and the inner corner 311e may be performed by connecting the points 311d-1 and 311e-1 and the midpoint 311h of the side 311g with a straight line. . Even in this case, the pattern predicted shape can be created by reflecting the total dose amount of each figure.

  As described above, the pattern shape prediction apparatus of this embodiment can create an accurate pattern prediction shape by performing corner processing corresponding to the total dose. Further, a more accurate shape comparison can be performed by performing a shape comparison process on the predicted pattern shape.

  Although the embodiments of the present invention have been described above, the present invention is not limited to the above-described embodiments, and various modifications and changes can be made as in the modifications described later, and these are also included in the present invention. Within the technical scope. In addition, the effects described in the embodiments are merely a list of the most preferable effects resulting from the present invention, and the effects of the present invention are not limited to those described in the embodiments. It should be noted that the above-described embodiment and modifications described later can be used in appropriate combination, but detailed description thereof is omitted.

(Deformation)
(1) In the second embodiment, when the corner processing of both the outer corner R and the inner corner R cannot be performed because the length L of the side 211g is short, the corner correction unit 256a-2 is any one of them. Although the example which performs the corner process of this was demonstrated, it is not limited to this. For example, when it is determined that both corner processes cannot be performed, the corner correction unit 256a-2 may perform a corner process by linear approximation for both the corner processes as in the third embodiment. Thereby, the pattern predicted shape can be created reflecting the corner R to be created.

(2) In the embodiment, an example of predicting a pattern shape drawn with an electron beam on a photomask has been shown, but the present invention is not limited to this. For example, a pattern shape drawn directly on a semiconductor wafer with an electron beam may be predicted.

(3) In the embodiment, the example in which the shot shape correction unit performs the corner processing on the side correction shape data is shown, but the present invention is not limited to this. For example, the shot shape correction unit may directly perform outline processing on the side correction shape data to create a pattern predicted shape. Even in this case, pattern prediction reflecting the total dose amount can be performed.

(4) In the embodiment, an example in which the shot shape correction unit corrects each divided figure (divided shot shape) has been described, but the present invention is not limited to this. If a divided shot shape having a dose amount lower than the minimum dose amount for patterning the resist exists, the pattern is not formed even if developed. Therefore, for example, the minimum dose amount is stored in the prediction device storage unit, and the shot shape correction unit compares the total dose amount of each divided shot shape with the minimum dose amount of the prediction device storage unit, and performs the division. When the dose amount of the shot shape is smaller than the minimum dose amount, the divided shot shape may be deleted.
This eliminates the need for pattern prediction processing for this portion, and the pattern for this portion can be deleted. Therefore, the load on the pattern shape prediction apparatus can be reduced, and pattern prediction can be performed more accurately.

(5) In the embodiment, the shot shape correction unit has shown an example in which correction is performed so that the pattern becomes thicker as the total dose amount is larger for each divided figure (divided shot shape), but the present invention is not limited to this. In the case where there is a maximum dose amount at which the pattern does not bulge any more, the pattern does not become thick even if irradiation is performed more than the maximum dose amount. For this reason, for example, the maximum dose amount and the correction amount of the maximum dose amount are stored in the prediction device storage unit, and the shot shape correction unit stores the total dose amount of each divided shot shape and the maximum dose of the prediction device storage unit. When the overlapping portion is larger than the maximum dose amount, the correction shot shape may be created by applying the correction amount of the maximum dose amount.
Thereby, pattern prediction can be performed more accurately.

(6) In the embodiment, an example in which the prediction device display unit displays the comparison result of the figure of the mask data and the figure of the pattern prediction shape in the area of the shape difference is shown, but the present invention is not limited to this. When the total dose is larger than the allowable dose, the resist may evaporate due to overdose, which may contaminate the chamber or the like. Therefore, the allowable dose amount is stored in the prediction device storage unit, and the shot shape correction unit (allowable dose amount comparison unit) determines that the total dose amount of each divided shot shape is greater than the allowable dose amount by the allowable dose amount comparison unit. If it is determined that the divided shot shape is larger than the allowable dose amount, the prediction device display unit may notify the user that the divided shot shape is larger than the allowable dose amount by warning display (for example, warning display of red characters). Further, a speaker for outputting sound may be provided to output a warning sound.
Thereby, contamination of the chamber or the like can be prevented.

1A Mask data 2 Stepped data (Shot shape array drawing data)
DESCRIPTION OF SYMBOLS 5 Mask pattern 50 Pattern shape prediction apparatus 55a, 255a Shape prediction program 55a-1 Side correction table 56a Shot shape correction part 56b Outline creation part 56c Pattern shape comparison part 255a-2, 355a-2 Corner correction table 256a-2 Corner correction part

Claims (14)

Computer
Storage means for storing shot shape array drawing data, which is drawing data created based on the shape of a drawing-scheduled pattern, arranged so that a plurality of shot shapes overlap, and a dose amount associated with each shot shape ,
Correction information storage means for storing the dose amount and the correction amount in association with each other;
Shot shape correction means for creating a corrected shot shape that is a shape obtained by correcting the shot shape of the shot shape array drawing data based on the dose amount of each shot shape of the storage means and the correction amount of the correction information storage means When,
Based on the corrected shot shape created by the shot shape correcting means, an outer shape creating means for creating a pattern predicted shape that is a shape obtained by combining the corrected shot shapes;
A pattern shape prediction program characterized by being made to function. In the pattern shape prediction program according to claim 1,
Making the computer function as a shape comparison unit that compares the shape of the drawing-scheduled pattern with the pattern predicted shape created by the outer shape creation unit by shape and verifies the difference;
Pattern shape prediction program characterized by In the pattern shape prediction program according to claim 1,
Causing the shot shape correcting means to function to create a corrected shot shape by calculating a total dose amount of a portion where the shot shape overlaps;
Pattern shape prediction program characterized by In the pattern shape prediction program according to any one of claims 1 to 3,
Causing the computer to function as correction information storage means for storing side correction information that is information for correcting the shape of the side of the shot shape;
Causing the shot shape correcting means to function to correct a side of the shot shape based on the side correction information of the correction information storage means;
Pattern shape prediction program characterized by In the pattern shape prediction program according to any one of claims 1 to 4,
Causing the computer to function as corner correction information storage means for storing at least one of outer corner correction information that is information for correcting an outer corner and inner corner correction information that is information for correcting an inner corner;
Causing the shot shape correcting means to function to correct corners formed by the corrected shot shapes obtained by correcting the sides based on correction information in the corner correction information storage means;
Pattern shape prediction program characterized by In the pattern shape prediction program according to any one of claims 1 to 5,
Allowing the shot shape correction means to function as a linear approximation as the corner correction;
Pattern shape prediction program characterized by In the pattern shape prediction program according to any one of claims 1 to 6,
When the shot shape correction means corrects the corner and the angle inside the figure is 180 degrees or more among the angles formed by the two line segments forming the corner, the length of the line segment and the corner correction It is determined whether or not the corner can be rounded based on the correction information of the information storage means. When it is determined that the corner can be rounded, the corner is corrected. On the other hand, when it is determined that the corner cannot be rounded, the corner is To make it work without correction,
Pattern shape prediction program characterized by In the pattern shape prediction program according to claim 7,
When the shot shape correcting means determines that the corner cannot be rounded, the shot shape correcting means functions to approximate a straight line according to the size of the corner R;
Pattern shape prediction program characterized by In the pattern shape prediction program according to any one of claims 1 to 8,
Causing the storage means to function to store a minimum dose amount;
The shot shape correcting means obtains a divided shot shape that is divided into a portion where the shot shape overlaps and a portion that does not overlap, and for each of the divided shot shapes, the total dose amount of the portion is calculated, and the divided shot shape The total dose amount of the storage means and the minimum dose amount of the storage means, and if less than the minimum dose amount, to function to delete the divided shot shape,
Pattern shape prediction program characterized by In the pattern shape prediction program according to any one of claims 1 to 9,
The storage means functions to store a maximum dose amount and a correction amount of the maximum dose amount;
The shot shape correcting means obtains a divided shot shape that is divided into a portion where the shot shape overlaps and a portion that does not overlap, and for each of the divided shot shapes, the total dose amount of the portion is calculated, and the total dose amount and Comparing the maximum dose amount of the storage means, and applying the correction amount of the maximum dose amount when the total dose amount of the divided shot shape is larger than the maximum dose amount, and correcting the shot shape To function to create
Pattern shape prediction program characterized by In the pattern shape prediction program according to any one of claims 1 to 10,
The storage means functions to store an allowable dose that is a dose at which the resist evaporates;
The computer,
Obtaining a divided shot shape divided into a portion where the shot shape overlaps and a portion not overlapping, for each of the divided shot shapes, the total dose amount of the portion is calculated, the total dose amount of the divided shot shape, An allowable dose amount comparing means for comparing the allowable dose amount of the storage means;
Functioning as a notifying means for notifying a user when it is determined by the allowable dose amount comparing means that the divided shot shape is larger than the allowable dose amount;
Pattern shape prediction program characterized by Storage means for storing shot shape array drawing data, which is drawing data created based on the shape of a drawing-scheduled pattern, arranged so that a plurality of shot shapes overlap, and a dose amount associated with each shot shape ,
Correction information storage means for storing the dose amount and the correction amount in association with each other;
Shot shape correction means for creating a corrected shot shape that is a shape obtained by correcting the shot shape of the shot shape array drawing data based on the dose amount of each shot shape of the storage means and the correction amount of the correction information storage means When,
Based on the corrected shot shape created by the shot shape correcting means, an outer shape creating means for creating a pattern predicted shape that is a shape obtained by combining the corrected shot shapes;
A pattern shape prediction system comprising: Computer
Storage means for storing shot shape array drawing data, which is drawing data created based on the shape of a drawing-scheduled pattern, arranged so that a plurality of shot shapes overlap, and a dose amount associated with each shot shape ,
Correction information storage means for storing the dose amount and the correction amount in association with each other;
Shot shape correction means for creating a corrected shot shape that is a shape obtained by correcting the shot shape of the shot shape array drawing data based on the dose amount of each shot shape of the storage means and the correction amount of the correction information storage means When,
Based on the corrected shot shape created by the shot shape correcting means, an outer shape creating means for creating a pattern predicted shape that is a shape obtained by combining the corrected shot shapes;
A shape comparison means for obtaining an image of a difference between the drawing-scheduled pattern shape and the pattern predicted shape, and determining that there is an abnormality when an area of the obtained difference image is equal to or greater than a predetermined determination value;
A pattern shape verification program characterized by being made to function. Storage means for storing shot shape array drawing data, which is drawing data created based on the shape of a drawing-scheduled pattern, arranged so that a plurality of shot shapes overlap, and a dose amount associated with each shot shape ,
Correction information storage means for storing the dose amount and the correction amount in association with each other;
Shot shape correction means for creating a corrected shot shape that is a shape obtained by correcting the shot shape of the shot shape array drawing data based on the dose amount of each shot shape of the storage means and the correction amount of the correction information storage means When,
Based on the corrected shot shape created by the shot shape correcting means, an outer shape creating means for creating a pattern predicted shape that is a shape obtained by combining the corrected shot shapes;
A shape comparison means for obtaining an image of a difference between the drawing-scheduled pattern shape and the pattern predicted shape, and determining that there is an abnormality when an area of the obtained difference image is equal to or greater than a predetermined determination value;
A pattern shape verification system comprising:

Images