JP2016085301A - Anti-reflection articles, image display device, manufacturing method for anti-reflection articles, anti-reflection article-forming mold, and manufacturing method for anti-reflection article-forming mold - Google Patents

Abstract

PROBLEM TO BE SOLVED: To significantly reduce drawbacks of an anti-reflection article produced through a molding process using an anti-reflection article-forming mold compared to conventional products.SOLUTION: An anti-reflection article 1 has micro-protrusions densely arranged at a pitch that is no greater than the shortest wavelength in a wavelength band of anti-reflection target electromagnetic waves, and includes a repair mark 42 in a concave section of an article-forming mold, which is a protruded area protruding above apexes of surrounding micro-protrusions and having a size greater than that of the micro-protrusions, where a protrusion height D above the apexes of the surrounding micro-protrusions is no greater than 1 μm over the entire surface of the anti-reflection article.SELECTED DRAWING: Figure 14

Description

  The present invention relates to an antireflection article for preventing reflection by closely arranging a large number of minute protrusions at intervals equal to or shorter than the shortest wavelength of an electromagnetic wave wavelength band for preventing reflection.

  In recent years, regarding an antireflection film, which is a film-shaped antireflection article, there has been proposed a method for preventing reflection by arranging a large number of microprotrusions closely on the surface of a transparent substrate (transparent film) (patent) References 1-3). This method utilizes the principle of a so-called moth-eye structure, and the refractive index for incident light is continuously changed in the thickness direction of the substrate, whereby a discontinuous interface of refractive index is obtained. Is eliminated to prevent reflection.

  In the antireflection article according to this moth-eye structure, the microprojections are closely arranged so that the interval d between adjacent microprojections is equal to or less than the shortest wavelength Λmin (d ≦ Λmin) of the wavelength band of the electromagnetic wave to prevent reflection. . Moreover, each microprotrusion is produced so that a cross-sectional area may become small gradually toward the front end side from a transparent base material so that it may be planted on a transparent base material.

  Various uses have been proposed for such antireflection articles. For example, it can be placed on the light exit surface of various image display devices to reduce external light reflection such as sunlight on the screen to improve image visibility, or to form the microprojections on a sheet or plate-like transparent substrate Furthermore, by constructing a touch panel using an electrode in which a transparent conductive film such as ITO (indium tin oxide) is formed on the microprojection group, light reflection between the touch panel electrode and various adjacent members is performed. It has been proposed to reduce the occurrence of interference fringes, ghost images, and the like.

  The microprotrusions provided on such an antireflection article are formed by pressurizing and curing a shaping mold formed by closely arranging corresponding microholes to an ultraviolet curable resin or the like. Patent Documents 4 and 5 propose a device for correcting a convex portion (a so-called defect) generated on the surface of such a molding die.

  However, in the correction of such defects, a correction mark is formed on the mold surface due to a recess having a large aspect ratio (depth with respect to the hole diameter) and a large diameter as compared with the surrounding fine holes. May be visually observed on the mold surface. Such a correction mark is desired to be reduced as much as possible by visually observing and recognizing it as a defect in the antireflection article produced by the shaping process.

Japanese Patent Laid-Open No. 50-70040 Special Table 2003-531962 Japanese Patent No. 4632589 Japanese Patent No. 5578227 JP 2014-07312 A

  This invention is made | formed in view of such a condition, and it aims at reducing a fault further compared with the former regarding the anti-reflective article produced by the shaping process using the shaping die. .

  The present inventor has intensively studied to solve the above-mentioned problems, and according to the depth of the concave portion generated in the molding die by removing foreign matter or the like, the concave portion is backfilled to reduce the depth of the concave portion. The present invention has been completed.

    Specifically, the present invention provides the following.

(1) In an antireflection article in which microprotrusions are closely arranged, and an interval between the adjacent microprotrusions is equal to or less than the shortest wavelength of the wavelength band of electromagnetic waves for antireflection,
It has a correction mark of the concave part of the mold for molding,
The correction mark of the concave portion of the mold for molding is
Projecting from the apex of the surrounding microprotrusions is a convex part having a larger size than the microprotrusions,
An antireflective article in which the amount of protrusion from the apex of surrounding minute protrusions is less than 1 μm on the entire surface of the antireflective article.

  According to (1), the correction mark is a protrusion having a large size protruding from the apex of the surrounding microprojections, and the protruding amount from the apex of the surrounding microprojections is less than 1 μm on the entire surface of the antireflection article. Therefore, it is possible to reduce the enlargement of the concave portion related to the correction mark in the manufacturing process of the antireflection article so as not to lead to the defect, thereby preventing the defect from increasing. Thereby, a fault can be reduced compared with the past.

(2) In (1),
The correction mark of the concave portion of the mold for molding is
The size is less than 100 μm,
The antireflective article is
Furthermore, an antireflection article provided with a correction mark of a concave portion of a molding die by a molding process having a size of 100 μm or more.

  According to (2), since the size of the correction mark of the concave portion of the shaping mold is less than 100 μm, it can be prevented from being recognized as a defect. In addition, when the size of the defect is 100 μm or more, by dealing with the shaping process, it is possible to prevent the defect that is not recognized as a defect from being caused by enlargement of the defect.

(3) In (1) or (2),
The antireflective article is
An antireflection article formed by a molding treatment of a molding resin layer provided on a substrate surface.

  According to (3), it is possible to efficiently produce an antireflective article with reduced defects by a shaping process.

  (4) An image display device in which the antireflection article according to any one of (1), (2), and (3) is disposed on the panel surface of the image display panel.

  According to (4), the image display apparatus which has arrange | positioned the antireflection article | item formed by reducing a fault compared with the past can be provided.

(5) In (4),
The image display panel is a liquid crystal display panel;
The antireflective article is
An image display device integrated with a linear polarizing plate on the exit surface side of the liquid crystal display panel.

  According to (5), the work required for the arrangement of the antireflection article as compared with the prior art is made by arranging this optical film so that the antireflection article and the linearly polarizing plate are integrated to form an optical film. Can be provided, and an image display device can be provided in which an antireflection article having reduced defects as compared with the prior art is disposed.

(6) In the method for producing an antireflection article, in which microprotrusions are closely arranged, and the interval between adjacent microprotrusions is equal to or shorter than the shortest wavelength of the wavelength band of the electromagnetic wave for preventing reflection,
A mold creating step for fabricating a mold for molding having a microscopic hole corresponding to the microprojection;
A molding step of producing the antireflection article by producing the micro-projections on the surface of the substrate by a molding process using the molding die;
An inspection correction step of correcting the defect by inspecting the mold for molding,
The inspection correction step includes
A measuring step for measuring the depth of the concave portion on the surface of the mold for molding,
And a correction step by filling that corrects the depth of the recess to less than 1 μm by the filling process of the recess when the depth of the recess is 1 μm or more based on the depth of the recess measured in the measurement step. A method for manufacturing an antireflection article.

  According to (6), by correcting the depth of the recess to less than 1 μm, it is possible to reduce the enlargement of the recess related to the correction mark in the manufacturing process of the antireflective article so that the defect does not occur. It can be prevented from increasing. Thereby, the increase of the recessed part in the manufacture process of an antireflection article can be reduced, and a fault can be reduced compared with the past.

(7) In (6),
The inspection correction step includes
Furthermore, a defect detection step of detecting a defect due to a convex portion on the surface of the mold for molding,
A defect correction step of removing the defect detected in the defect detection step,
The measurement step and the correction step by the filling are performed after the defect correction step,
In the recess for measuring the depth in the measurement step, including a recess formed by removing the defect in the defect correction step,
The manufacturing method of the antireflection article which contains the recessed part formed by the removal of the defect by the said defect correction process in the recessed part corrected by the correction process by the said filling.

  According to (7), due to defects due to convex portions generated in the molding die during the manufacturing process of the molding die, foreign matters adhering to the molding die during the production process of the antireflection article, etc. As the defect is removed, the enlargement of the concave portion can be sufficiently reduced with respect to the defect due to the concave portion generated by the removal, and the defect can be further reduced as compared with the conventional case.

(8) In (6) or (7),
The measurement step includes
In addition, measure the size of the recess,
The correction process by filling is as follows:
If the size of the recess is less than 100 μm, correct the depth of the recess by filling,
The inspection correction step includes
The manufacturing method of the antireflection article further provided with the correction process by the shaping | molding process which forms a micro hole in the said recessed part by a shaping process, and corrects the said recessed part when the magnitude | size of the said recessed part is 100 micrometers or more.

  According to (8), when the size of the concave portion is 100 μm or more, the concave portion having a size that is recognized as a fault is corrected by forming a fine hole in the concave portion by a shaping process and correcting the concave portion. Can be prevented from being recognized, and the defects can be further reduced.

(9) Molding metal for shaping the microprojections of the antireflection article, in which the microprojections are closely arranged and the interval between the adjacent microprojections is equal to or less than the shortest wavelength of the wavelength band of the electromagnetic wave for preventing reflection In the mold,
With defect correction marks,
The correction mark of the defect is
A recess having a depth greater than that of the minute hole corresponding to the minute protrusion, and a size larger than that of the minute hole,
A mold for shaping an antireflective article whose depth is set to less than 1 μm from the root of the surrounding fine holes by filling with resin.

  According to (9), the depth of the concave portion is corrected to be less than 1 μm by filling the resin, thereby sufficiently reducing the expansion of the concave portion in the manufacturing process of the antireflection article. Can be reduced.

(10) In (9),
The correction mark of the defect is
The size is less than 100 μm,
The mold for shaping the antireflection article is:
Furthermore, the metal mold | die for manufacture of the antireflection article provided with the correction trace by the shaping | molding process whose size is 100 micrometers or more.

  According to (10), with respect to 100 μm or more which is a size recognized as a defect, the defect can be further reduced by being corrected by the shaping process.

(11) An antireflection article that molds the microprojections of an antireflection article in which microprojections are closely arranged and the interval between adjacent microprojections is equal to or less than the shortest wavelength of the wavelength band of an electromagnetic wave for preventing reflection In the manufacturing method of the molding die,
An inspection correction step of correcting the defect by inspecting the mold for molding,
The inspection correction step includes
A defect detection step of detecting defects due to convex portions on the surface of the mold for molding,
A defect correcting step for removing the defect detected in the defect detecting step;
A measuring step for measuring the depth of the concave portion on the surface of the mold for molding,
And a correction step by filling that corrects the depth of the recess to less than 1 μm by the filling process of the recess when the depth of the recess is 1 μm or more based on the depth of the recess measured in the measurement step. A method for producing a mold for shaping an antireflection article.

  According to (11), by correcting the depth of the concave portion to less than 1 μm by filling, the enlargement of the concave portion in the manufacturing process of the antireflection article can be sufficiently reduced, and defects can be reduced as compared with the conventional case. it can.

  With respect to the antireflection article produced by the shaping process using the shaping mold, the defects can be further reduced as compared with the conventional case.

1 is a conceptual perspective view showing an antireflection article according to a first embodiment of the present invention. It is a figure where it uses for description of an adjacent protrusion. It is a figure where it uses for description of the maximum point. It is a figure which shows a Delaunay figure. It is a frequency distribution diagram used for measurement of the distance between adjacent protrusions. It is a frequency distribution figure with which it uses for description of minute height. It is a figure which shows the manufacturing process of the antireflection article | item of FIG. It is a figure which shows the roll plate which concerns on the reflection preventing article of FIG. It is a figure which shows the manufacturing process of the roll plate of FIG. It is a figure where it uses for description of a defect. It is a flowchart which shows a test | inspection repair process. It is a figure where it uses for description of the correction by a shaping process. It is a figure where it uses for description of correction by filling of a filler. It is a figure where it uses for description of the anti-reflective article by correction of a recessed part.

[First Embodiment]
[Anti-reflective article]
FIG. 1 is a diagram (conceptual perspective view) showing an antireflection article according to a first embodiment of the present invention. This antireflection article 1 is an antireflection film whose overall shape is formed by a film shape. In the image display apparatus according to this embodiment, the antireflection article 1 is held by being attached to the panel surface (front side) of the image display panel. The antireflection article 1 allows a screen for extraneous light such as sunlight and electric light. Visibility is reduced to improve visibility. Here, the image display panel according to this embodiment is a liquid crystal display panel, and after a linearly polarizing plate disposed on the emission surface of the liquid crystal display panel is laminated and integrated with the antireflection article 1 in advance, A liquid crystal display panel is formed by being arranged in the cell. Thereby, in this embodiment, the operation | work which concerns on arrangement | positioning of the reflection preventing article 1 can be simplified.

  The antireflection article is not limited to a flat film shape, but may be a flat sheet shape or a flat plate shape (referred to as a film, a sheet, or a plate in order of relatively small thickness). In addition, instead of a flat shape, a curved shape, a three-dimensional film shape, a sheet shape, or a plate shape can be used, and various lenses, prisms, and other three-dimensional shapes are appropriately used depending on the application. Can be adopted.

  Here, the antireflection article 1 is produced by closely arranging a large number of minute protrusions on the surface of the substrate 2 made of a transparent film. A plurality of closely arranged microprotrusions is collectively referred to as a microprotrusion group. Here, the base material 2 is, for example, a cellulose resin such as TAC (Triacetylcellulose), an acrylic resin such as PMMA (polymethyl methacrylate), a polyester resin such as PET (Polyethylene terephthalate), PP (polypropylene), or the like. Polyolefin resins, vinyl resins such as PVC (polyvinyl chloride), and various transparent resin films such as PC (polycarbonate) can be applied. In the present embodiment, the antireflection article 1 is arranged on the surface of various image display panels such as a liquid crystal display panel, an electroluminescent display panel, and a plasma display panel of the image display device, thereby reflecting on the surfaces of these display panels. Reduces the reflected light to improve visibility. As described above, the shape of the antireflection article is not limited to the film shape, and various shapes can be adopted, so that the base material 2 can be used in addition to these materials, for example, according to the shape of the antireflection article. Various transparent inorganic materials such as glass such as soda glass, potash glass, lead glass, ceramics such as PLZT, quartz, and meteorite can be applied.

  The antireflection article 1 has an uncured resin layer 4 (hereinafter, appropriately referred to as a receiving layer or a microprojection layer) 4 that forms a micro uneven receiving layer composed of a group of microprojections on a substrate 2. Then, the receiving layer 4 is subjected to a molding treatment and cured, whereby the fine protrusions are arranged in close contact with the surface of the substrate 2. In this embodiment, an acrylate-based ultraviolet curable resin, which is one of the molding resins used for the molding process, is applied to the receiving layer 4 to form the ultraviolet curable resin layer 4 on the substrate 2. . The antireflection article 1 is manufactured so that the refractive index gradually changes in the thickness direction due to the uneven shape by the microprotrusions, and reduces the reflection of incident light in a wide wavelength range by the principle of the moth-eye structure.

  In this way, the microprotrusions produced in the antireflection article 1 are closely arranged so that the distance d between adjacent microprotrusions is equal to or less than the shortest wavelength Λmin (d ≦ Λmin) of the wavelength band of the electromagnetic wave to prevent reflection. The In this embodiment, since the main purpose is to improve visibility by arranging the image display panel, the shortest wavelength is set to the shortest wavelength (380 nm) in the visible light region in consideration of individual differences and viewing conditions. The distance d is set to 100 to 300 nm in consideration of variation. The adjacent minute protrusions related to the distance d are so-called adjacent minute protrusions, which are in contact with the hem portions of the minute protrusions, which are the base portions on the base 2 side. In the anti-reflective article 1, the minute projections are closely arranged so that when a line segment is created so as to sequentially follow the valleys between the minute projections, a large number of polygonal regions surrounding each minute projection are connected in plan view. Thus, a mesh-like pattern is produced. The adjacent minute protrusions related to the distance d are protrusions that share a part of the line segments constituting the mesh pattern.

(Distance between protrusions)
The minute protrusions are defined in more detail as follows. In the antireflection by the moth-eye structure, the effective refractive index at the interface between the transparent substrate surface and the adjacent medium is continuously changed in the thickness direction to prevent reflection. It is necessary to satisfy the following conditions. With respect to the protrusion interval, which is one of these conditions, when the minute protrusions are regularly arranged at a constant period as disclosed in, for example, Japanese Patent Application Laid-Open No. 50-70040 and Japanese Patent No. 4632589, the adjacent spaces are adjacent to each other. The interval d between the minute projections to be performed is the projection arrangement period P (d = P). Thus, when the longest wavelength in the visible light band is λmax and the shortest wavelength is λmin, the minimum necessary condition that can exhibit the antireflection effect at the longest wavelength in the visible light band is Λmin = λmax. P ≦ λmax, and the necessary and sufficient condition that can exhibit the antireflection effect for all wavelengths in the visible light band is Λmin = λmin, and therefore P ≦ λmin.

  The wavelengths λmax and λmin may have some width depending on observation conditions, light intensity (luminance), individual differences, and the like, but are typically λmax = 780 nm and λmin = 380 nm. A preferable condition that can more reliably exhibit an antireflection effect for all wavelengths in the visible light band is d ≦ 300 nm, and a more preferable condition is d ≦ 200 nm. Note that the lower limit value of the period d is usually d ≧ 50 nm, preferably d ≧ 100 nm, for reasons such as the expression of the antireflection effect and the securing of the isotropic (low angle dependency) of the reflectance. On the other hand, the height H of the protrusion is set to H ≧ 0.2 × λmax = 156 nm (assuming λmax = 780 nm) from the viewpoint of exhibiting a sufficient antireflection effect.

  However, when the minute protrusions are irregularly arranged as in this embodiment, the distance d between the adjacent minute protrusions varies. More specifically, as shown in FIG. 2, when viewed from the normal direction of the front or back surface of the substrate, when the microprojections are not regularly arranged at a constant period, the repetition period P of the protrusions In some cases, the distance d between adjacent protrusions cannot be defined, and even the concept of adjacent protrusions is suspicious. Therefore, in such a case, it is calculated as follows.

  (1) That is, first, an in-plane arrangement of projections (planar shape of projection arrangement) is detected using an atomic force microscope (AFM) or a scanning electron microscope (SEM). FIG. 2 is an enlarged photograph actually obtained by an atomic force microscope.

  (2) Subsequently, the maximum point of the height of each protrusion (hereinafter simply referred to as the maximum point) is detected from the obtained in-plane arrangement. There are various methods for obtaining the maximum point, such as a method of sequentially comparing the planar view shape and the enlarged photograph of the corresponding cross-sectional shape to obtain the maximum point, and a method of obtaining the maximum point by image processing of the plan view enlarged photo. Can be applied. FIG. 3 is a diagram showing the detection result of the maximum point by the processing of the image data relating to the enlarged photograph shown in FIG. 2, and the portions indicated by black dots in this figure are the maximum points of the respective protrusions. In this process, image data is processed in advance by a low-pass filter having a Gaussian characteristic of 4.5 × 4.5 pixels, thereby preventing erroneous detection of the maximum point due to noise. Further, a maximum point was obtained in units of 1 nm (= 1 pixel) by sequentially scanning a filter for detecting a maximum value of 8 pixels × 8 pixels.

  (3) Next, a Delaunay diagram with the detected maximum point as a generating point is created. Here, Delaunay diagram is obtained by dividing the Voronoi region adjacent to the Voronoi region when the Voronoi division is performed with each local maximum as the generating point, and connecting the adjacent generating points with line segments. This is a net-like figure made up of triangular aggregates. Each triangle is called a Delaunay triangle, and a side of each triangle (a line segment connecting adjacent generating points) is called a Delaunay line. FIG. 4 is a diagram in which the Delaunay diagram (represented by white line segments) obtained from FIG. 3 is superimposed on the original image of FIG. The Delaunay diagram has a dual relationship with the Voronoi diagram. Voronoi division means that a plane is divided by a net-like figure made up of a closed polygon aggregate defined by perpendicular bisectors of line segments (Droney lines) connecting between adjacent generating points. A network figure obtained by Voronoi division is a Voronoi diagram, and each closed region is a Voronoi region.

  (4) Next, the frequency distribution of the line segment length of each Delaunay line, that is, the frequency distribution of the distance between adjacent maximum points (hereinafter referred to as the distance between adjacent protrusions) is obtained. FIG. 5 is a histogram of the frequency distribution created from the Delaunay diagram of FIG. As shown in FIGS. 2 and 10, when there is a groove or the like at the top of the protrusion, or when the top is divided into a plurality of peaks, from the obtained frequency distribution, A frequency distribution is created by removing data resulting from a fine structure having a concave portion at the top and a fine structure in which the top is split into a plurality of peaks, and selecting only the data of the projection body itself.

  Specifically, in a fine structure in which a concave portion exists at the top of the protrusion, or a fine structure related to a multi-modal micro protrusion in which the top is divided into a plurality of peaks, a single peak that does not have such a fine structure. The distance between adjacent local maximum points is clearly different from the numerical value range in the case of a sexual microprojection. Thus, by removing the corresponding data using this feature, only the data of the projection body itself is selected and the frequency distribution is detected. More specifically, for example, about 5 to 20 adjacent single-peaked microprojections are selected from an enlarged photograph of a microprojection (group) in plan view as shown in FIG. 2, and the distance between adjacent maximum points is selected. The value of is sampled and the value clearly deviates from the numerical range obtained by sampling (usually data whose value is ½ or less of the average distance between adjacent maximum points obtained by sampling) To detect the frequency distribution. In the example of FIG. 5, data having a distance between adjacent maximal points of 56 nm or less (the leftmost small mountain indicated by the arrow A) is excluded. FIG. 5 shows a frequency distribution before performing such exclusion processing. Incidentally, such exclusion processing may be executed by setting the above-described maximum inspection filter.

(5) The average value d _AVG and the standard deviation σ are obtained from the frequency distribution of the distance d between adjacent protrusions thus obtained. Here, when the frequency distribution obtained in this way is regarded as a normal distribution and the average value d _AVG and the standard deviation σ are obtained, the average value d _AVG = 158 nm and the standard deviation σ = 38 nm are obtained in the example of FIG. As a result, the maximum value of the distance d between adjacent protrusions is set to dmax = d _AVG + 2σ, and in this example, dmax = 234 nm.

The same method is applied to define the height of the protrusion. In this case, a relative height difference of each local maximum point position from a specific reference position is acquired from the local maximum point obtained by the above (2), and is histogrammed. FIG. 6 is a diagram showing a histogram of the frequency distribution of the protrusion height H with the protrusion root position obtained in this way as a reference (height 0). The average value _HAVG of the protrusion height and the standard deviation σ are obtained from the frequency distribution based on the histogram. Here in the example of FIG. 6, the mean value _H AVG = 178 nm, the standard deviation sigma = 30 nm. Thus in this example, the height of the projections is an average value _H AVG = 178 nm. In the histogram of the projection height H shown in FIG. 6, in the case of a multi-peak microprojection, the plurality of data are mixed for one projection because of having a plurality of vertices. Therefore, in this case, the frequency distribution is obtained by adopting the vertex having the highest height from among the plurality of vertices belonging to the same microprotrusion as the protuberance.

  In addition, the reference position when measuring the height of the protrusion described above is based on the valley bottom (minimum point of height) between the adjacent minute protrusions as a reference of height 0. However, when the height of the valley bottom itself varies depending on the location (for example, when the height of the valley bottom has undulation with a period larger than the distance between adjacent projections of the microprojections), (1) First, the base material 2 The average value of the height of each valley bottom measured from the front surface or the back surface is calculated in an area sufficient for the average value to be collected. (2) Next, a surface having the height of the average value and parallel to the front surface or the back surface of the substrate 2 is considered as a reference surface. (3) Then, the height of each microprotrusion from the reference surface is calculated by setting the reference surface to a height of 0 again.

If the protrusions are irregularly arranged, when this way the maximum value of the adjacent protrusions distance obtained by dmax = d AVG ₊ 2σ, average H _AVG height of projections are arranged regularly It has been found necessary to satisfy the above conditions. Specifically, the condition of the distance between the microprotrusions that exhibits the antireflection effect is dmax ≦ Λmin. The minimum necessary condition that can exhibit the antireflection effect at the longest wavelength in the visible light band is Λmin = λmax, and therefore dmax ≦ λmax, and the antireflection effect can be achieved for all wavelengths in the visible light band. The necessary and sufficient condition is Λmin = λmin, and therefore dmax ≦ λmin. A preferable condition that can more reliably exhibit the antireflection effect for all wavelengths in the visible light band is dmax ≦ 300 nm, and a more preferable condition is dmax ≦ 200 nm. Also, dmax ≧ 50 nm is usually satisfied and dmax ≧ 100 nm is preferable because of the antireflection effect and ensuring the isotropic (low angle dependency) of the reflectance. The height of the protrusion is set to _HAVG ≧ 0.2 × λmax = 156 nm (assuming λmax = 780 nm) in order to exhibit a sufficient antireflection effect.

2 to 6, dmax = 234 nm ≦ λmax = 780 nm, and it can be seen that the antireflection effect can be sufficiently achieved by satisfying the condition of dmax ≦ λmax. In addition, since the shortest wavelength λmin in the visible light band is 380 nm, it can be seen that the sufficient condition dmax ≦ λmin for exhibiting the antireflection effect in all visible light wavelength bands is also satisfied. When the average protrusion the height _H AVG = 178 nm Also, the average projection height _{H AVG} ≧ 0.2 × λmax = _156nm becomes (as the longest wavelength .lambda.max = 780 nm in the visible light wavelength band), realizing a sufficient antireflection effect It can be seen that the conditions regarding the height of the protrusions to satisfy are also satisfied. Note since the standard deviation sigma = 30 _nm, since the relationship between the _{H AVG -σ = 148nm <0.2 ×} λmax = 156nm is satisfied, statistically, more than 50% of the total protrusions, 84% or less It can be seen that the condition of the height of the protrusion (178 nm or more) is satisfied. From the observation results by AFM and SEM, and the analysis result of the height distribution of the microprojections, the multi-peak microprojections tend to occur more frequently with the microprojections with a higher height than the microprojections with a relatively low height. It turned out to be.

[Production process of anti-reflective article]
FIG. 7 is a diagram illustrating a manufacturing process of the antireflection article 1. In the manufacturing process 10, in the resin supply process, an uncured and liquid ultraviolet curable resin that forms a microprojection-shaped receiving layer (shaped resin layer) is applied to the base film 2 in the form of a belt-shaped film by the die 12. In addition, about application | coating of an ultraviolet curable resin, not only the case by the die | dye 12 but various methods are applicable. Subsequently, in the manufacturing process 10, the pressing roller 14 presses and presses the substrate 2 against the peripheral side surface of the roll plate 13 (molding mold) which is a mold for molding the antireflection article, thereby A liquid acrylate-based ultraviolet curable resin is brought into close contact with the material 2 in an uncured state, and the ultraviolet curable resin is sufficiently filled in the concave portions having fine irregularities formed on the peripheral side surface of the roll plate 13. In this state, in this manufacturing process, the ultraviolet curable resin is cured by irradiation with ultraviolet rays, and thereby a microprojection group is produced on the surface of the substrate 2. In this manufacturing process, the substrate 2 is peeled off from the roll plate 13 through the peeling roller 15 together with the cured ultraviolet curable resin. In the production process 10, an anti-reflection article 1 is produced by producing an adhesive layer or the like on the substrate 2 as necessary, and then cutting it into a desired size. Accordingly, the antireflection article 1 is mass-produced efficiently by sequentially molding the fine shape produced on the peripheral side surface of the roll plate 13 which is a mold for molding on the long base material 2 made of a roll material. The

[Molding mold]
FIG. 8 is a diagram illustrating a configuration of a roll plate 13 that is a mold for shaping the antireflection article 1. FIG. 8A is a perspective view showing the entire configuration of the roll plate 13. FIG. 8B is an enlarged view illustrating the configuration of the roll plate 13 in detail in the portion b of FIG. FIGS. 8C and 8D are enlarged views corresponding to FIG. 8B for explaining another configuration of the roll plate 13. 8B to 8D exaggerate the thicknesses of the adhesion layer 13b and the shaping portion 13c for easy understanding.

  The roll plate 13 has a fine concavo-convex shape formed on the peripheral side surface of the base material, which is a cylindrical metal material, by repeating anodizing treatment and etching treatment, and the fine concavo-convex shape is formed on the substrate 2 as described above. It is shaped. For this reason, a columnar or cylindrical member in which high-purity aluminum is provided at least on the peripheral side surface is used as the base material.

  Specifically, as shown in FIG. 8B, in one form of the roll plate 13, a high-purity aluminum pipe is applied to the base material 13a, and a fine surface is formed on the peripheral side surface of the base material 13a. The shaping part 13c which consists of uneven | corrugated shape is provided. Further, as shown in FIG. 8C, in another form of the roll plate 13, a hollow stainless steel pipe is applied to the base material 13a, and an application made of high-purity aluminum is directly applied to the peripheral side surface of the base material 13a. A mold part (molding layer) 13c is provided. In place of the stainless steel pipe, pipe material such as copper, aluminum, or resin may be applied. Moreover, this shaping part 13c is produced by sputtering, for example.

Furthermore, as shown in FIG. 8D, another form of the roll plate 13 is a molding part (molding layer) in which fine irregularities are formed on the peripheral side surface of the base material 13a via the adhesion layer 13b. ) 13c is provided. As an example, a hollow aluminum pipe is applied to the base material 13a, silicon dioxide (SiO ₂ ) is applied to the adhesion layer 13b, and high-purity aluminum is applied to the shaping portion 13c. Here, the adhesion layer 13b has a layer thickness of about 100 nm, and the shaping portion 13c has a layer thickness of about 400 nm. In place of the aluminum pipe, pipe material such as copper, stainless steel, or resin may be applied. The adhesion layer 13b is not limited to silicon dioxide, but other materials such as silicon monoxide (SiO), a mixture of silicon monoxide and silicon dioxide, tantalum oxide (Ta ₂ O ₅ ), titanium oxide (TiO ₂ , Ti ₃ O _5), tin oxide _(SnO 2), aluminum oxide _{(Al 2 0} 3), chromium oxide _{(Cr 2 O} 3), barium titanate (BaTiO _3), indium oxide _{(In 2 O} 3), zinc oxide ( ZnO, ZnO ₂ ), metal oxides such as TiC, SiC, BC, WC, nitrides such as TiN, SiN, CrN, BN, AIN, CN, ZrN, and barium fluoride ( BaF _2), magnesium fluoride _(MgF 2), magnesium oxide (MgO), diamond-like carbon (DLC), child using glassy carbon or the like It can also be. Even when the adhesion layer 13b is provided in this way, the shaping portion 13c is produced by sputtering, for example.

  In the roll plate 13, fine holes are densely formed on the peripheral side surface of the shaping portion (molding layer) 13 c by repeating the anodizing treatment and the etching treatment. The concavo-convex shape is produced by gradually increasing the diameter of the fine holes so as to have a larger diameter. As a result, the roll plate 13 is densely formed with fine holes whose diameter gradually decreases in the depth direction, and the antireflection article 1 has a diameter that gradually decreases as it approaches the top corresponding to the fine holes. A fine concavo-convex shape is produced by a large number of fine protrusions.

[Roll plate manufacturing process]
FIG. 9 is a diagram illustrating a manufacturing process of the roll plate 13. In this manufacturing process, the peripheral side surface of the base material 13a is made into a super mirror surface by an electrolytic composite polishing method in which electrolytic elution action and abrasion action by abrasive grains are combined (electropolishing). Then, silicon dioxide is applied to the peripheral side surface of the base material 13a to form the adhesion layer 13b. Subsequently, in this step, aluminum is vapor-deposited or sputtered on the peripheral side surface of the base material 13a via the adhesion layer 13b to produce a high-purity aluminum layer (molding portion 13c). Subsequently, in this step, the anodizing step A1,..., AN, etching step E1,.

  In this manufacturing process, in the anodic oxidation process A1,..., AN, a fine hole is formed on the peripheral side surface of the shaping portion 13c by an anodic oxidation method, and the manufactured fine hole is further dug. Here, in the anodic oxidation step, various methods applied to the anodic oxidation of aluminum can be widely applied, for example, when a carbon rod, a stainless steel plate, or the like is used for the negative electrode. Further, as the solution, various neutral and acid solutions can be used. More specifically, for example, a sulfuric acid aqueous solution, an oxalic acid aqueous solution, a phosphoric acid aqueous solution and the like can be used. In the manufacturing steps A1,..., AN, the fine holes are formed in shapes corresponding to the target depth and the shape of the fine protrusions, respectively, by managing the liquid temperature, the applied voltage, the time for anodization, and the like.

  In the subsequent etching process E1,..., EN, the mold is immersed in an etching solution, the hole diameter of the fine hole produced and dug in the anodizing process A1,. These fine holes are shaped so that the hole diameter becomes smaller and smoother. As the etching solution, various etching solutions that are applied to this type of treatment can be widely applied. More specifically, for example, a sulfuric acid aqueous solution, an oxalic acid aqueous solution, a phosphoric acid aqueous solution, or the like can be used. As a result, in this manufacturing process, the anodizing process and the etching process are alternately performed a plurality of times, so that fine holes for forming are formed on the peripheral side surface of the base material.

[Defect of roll plate]
By the way, the roll plate 13 produced in this way may cause defects due to convex portions due to various foreign substances floating in the air adhering during production. In addition, when forming a molded part made of aluminum by sputtering, needle-shaped protrusions (so-called nodules) are generated on the target, and foreign matter made of the same material as the molded part is formed on the surface of the molded part by the nodules. May cause defects due to convex portions. In addition, such foreign matters are attached in the manufacturing process of the antireflective article and cannot be removed by washing or the like. In this case, a defect due to the convex portion is generated. Further, in the roll plate, when the cured ultraviolet curable resin is peeled off together with the base material in the shaping treatment step related to the antireflection article, the shaping portion may be locally peeled off. The defective portion becomes a defect due to the concave portion.

  FIG. 10 is a diagram for explaining such a defect. When the foreign matter E adheres to the surface of the shaping portion before the microhole formation by the anodic oxidation treatment and the etching treatment, a defect due to the convex portion is generated as shown in FIG. A fine hole is produced in a part (part not hidden by the foreign substance E), and no fine hole is produced in the part to which the foreign substance E adheres. In addition, when this adhered foreign material E is due to aluminum in sputtering at the time of forming the molded part, a fine hole is also formed on the surface of the foreign material E, but the foreign material E is the same as in FIG. A minute hole is not formed in a portion hidden in the area. In this case, the convex part by this foreign material E becomes a defect.

  On the other hand, when a foreign substance adheres to the adhesion layer, the peripheral surface of the base material, etc., and the shaping part is produced with this foreign substance still attached, as shown in FIG. By forming the shaping portion so as to cover the foreign matter, the surface shape of the shaping portion is formed in a convex shape so that the portion of the foreign matter protrudes, resulting in a defect due to the convex portion. In this case, a fine hole is formed on the entire surface including the convex portion.

  Further, when the foreign matter E adheres during the production process of the antireflection article 1, as shown in FIG. 10 (a 3), a fine hole is formed on the flat surface, and the foreign matter E adheres to this surface. As shown in FIG. 10 (a4), when the molded part is peeled off locally when the cured ultraviolet curable resin is peeled off together with the base material, the peeled part becomes a concave part. It becomes a defect. In addition, such a defect due to the recess formed by peeling off the surface material, when the recess is formed by peeling only the portion of the fine hole on the outermost surface, when the shaping layer is peeled off, Although the shaping layer may be formed by being peeled off integrally with the adhesion layer, etc., in the following, these will be collectively described as defects due to the recesses formed by peeling off the shaping portion.

  Such a defect hinders the formation of minute protrusions by close arrangement in the shaping process, and is recognized as a defect depending on the size of the antireflection article. Therefore, in this embodiment, in the roll plate manufacturing process, the inspection and repair process shown in FIG. 11 is executed, and in the antireflection article manufacturing process, the inspection and repair process shown in FIG. Detect and repair defects. More specifically, in the roll plate manufacturing process, the inspection and repair process is performed after the creation of the fine holes is completed and the roll plate is washed and dried. Further, in the manufacturing process of the antireflection article, this inspection / repair process is executed every time the base material 2 is processed by a predetermined number of rolls.

  In this inspection and repair process, in the defect detection process (SP2), defects are detected by setting a roll plate in the inspection and repair apparatus and observing the peripheral side surface with a microscope. Subsequently, in the inspection and repair process, the defect detected by laser irradiation is corrected (SP3). Here, the correction of the defect by the laser is applied to a defect (FIGS. 10A1 to 10A3) detected as a convex portion on the peripheral side surface of the roll plate. In this embodiment, the defects that protrude from the peripheral side surface of the roll plate are blown off by this laser irradiation to delete the defects, thereby correcting the defects. This defect correction by laser irradiation is performed when the height of the defect is equal to or higher than a certain level, and as a result, there is a possibility that the defect is recognized as a defect in the antireflection article. In some cases, the antireflection article is excluded from irradiation because there is no risk of being recognized as a defect. In addition, when the height of this defect is a certain level or more, it is a case where the height of the part is 3 micrometers or more with respect to the adjacent peripheral part (average height of fine uneven | corrugated shape).

  Here, in the antireflective article, when there is a portion where no microprojection is locally produced and the size of this portion is less than 100 μm, this portion is not recognized as a defect, and the size of this portion If the thickness exceeds 100 μm, it is recognized as a defect. Thereby, in the roll plate, it is considered that only defects having a size of 100 μm or more should be corrected. However, even if the defect is less than 100 μm in size, if the height is high, the defect part protrudes abruptly from the periphery, so that air is locally involved in the manufacturing process and the size is 100 μm or more. This makes it impossible to produce microprojections in this area, which is recognized as a defect in the antireflection article. Thereby, in this embodiment, even if the defect is less than 100 μm in size, if the height is 3 μm or more, it is corrected by laser irradiation, and the roll plate is efficiently corrected. The height is set to 3 μm or more because the antireflection function of the antireflection article 1 is deteriorated when the height of the defect of the roll plate 13 is at least half the thickness of the ultraviolet curable resin layer 4 in the antireflection article 1. This is due to the fact that the thickness of the ultraviolet curable resin layer 4 to be manufactured is about half of the thickness.

  Here, the laser light used for correcting the defect may be ultraviolet light, visible light, infrared light, or the like, and is not particularly limited. Various lasers capable of removing this type of defect, such as a YAG (Yttrium Aluminum Garnet) laser, CO2 laser, and excimer laser, can be used as the light source. These lasers can be pulsed lasers or continuous lasers. In this embodiment, a YAG (Yttrium Aluminum Garnet) laser is used to irradiate a laser having a wavelength of 532 nm and a pulse period of 6 nsec to remove defects.

  Here, when the defects protruding from the surface are removed by the laser irradiation in this way, as shown in FIGS. 10B1 and 10B2, concave portions are formed in the corresponding portions. Here, in this recess, the antireflection function is locally impaired in the antireflection article because the minute projections cannot be produced by the shaping process. As described above, when the size of the portion where the antireflection function is impaired is 100 μm or more, it is recognized as a defect in the antireflection article. Even in the concave portion generated by such correction, the antireflection article 1 in which the size W of the concave portion is 100 μm or more is a region where the antireflection function in which the minute protrusion is not formed is impaired. Will be recognized as a drawback. In addition, even if there is a defect due to the concave portion formed by peeling off the shaping portion described above with reference to FIG. 10 (a4), a region having a size W of 100 μm or more is recognized as a defect.

  Accordingly, in this embodiment, the size W of the concave portion due to the correction mark and the size W of the concave portion formed by peeling off the shaping portion are measured, and the measurement result applies to the concave portion having a size of 100 μm or more. A fine hole is produced by mold processing, and the concave portion is repaired. Note that this size is defined by the largest size in the width direction when the concave portion has a circular shape in a plan view but has a diameter, but has a deformed shape such as an elliptical shape. Therefore, for example, when the recess has an elliptical shape in plan view, the size W is the length of the long axis.

  However, even when the size W is less than 100 μm, when the depth D is deep, when the ultraviolet curable resin is peeled off, a large stress is applied to the part, and the surrounding shaping part is peeled off. become. In this way, the part where the surrounding shaped part is peeled off gradually increases the size W of the concave part, and eventually the size W becomes 100 μm or more and is shaped and recognized as a defect. . Therefore, in this case, the roll plate is gradually deteriorated.

  Therefore, in this embodiment, when measuring the size W of the recess, the depth D is also measured. When the depth D is equal to or greater than a certain value, the depth of the recess is reduced by filling the resin, and the roll plate To prevent deterioration. The depth D is set to a depth at which the filled resin does not protrude from the peripheral side surface due to the filling of the resin (no defect is formed). In practice, the filling of the resin into such a recess requires the filling of a minute amount of resin, so that the depth D is 1 μm or more (from the peripheral side surface of the roll plate) from the viewpoint of controlling the minute amount. This is executed in the case of the measured depth (from the root of the surrounding fine hole to the deepest portion of the recess).

  Thereby, in this embodiment, in the correction mark measurement process (SP4 in FIG. 11) of the inspection / repair process, the size W and the depth D of the recesses are measured by correcting the defects, including the recesses by peeling off the molded part. To do. Subsequently, a concave portion having a size W of 100 μm or more is selected from the measurement result (SP6), and a fine hole to be used for creating a microprojection is produced for the selected portion by re-correction by a forming process (SP6). Further, a recess having a depth D of 1 μm or more is selected from the recesses having a size of less than 100 μm (SP7), and this recess is re-corrected by filling with resin to reduce the depth D. Further, a recess having a size of less than 100 μm and a depth D of less than 1 μm is left untreated.

[Correction by molding process]
FIG. 12 is a diagram for explaining the recess correction process (SP6) by the shaping process. In this correction step, the concave portion 21 (FIG. 12A) having a size of 100 μm or more formed on the peripheral side surface of the roll plate 13 is corrected.

  In this step, as shown in FIG. 12 (B), a curable repair agent 23 is dropped into the concave portion 21 by a microdispenser 22 and filled in an appropriate amount.

  Examples of the curable repair agent 23 include urethane acrylate, acrylate monomer, UV curable resin containing 2-hydroxypropyl acrylate, liquid glass, thermosetting resin, water glass, acrylate resin (instant adhesive) Etc.) can be used as appropriate. Among these, an ultraviolet curable resin or liquid glass can be particularly preferably used as the curable repair agent 23.

  Subsequently, in this manufacturing process, as shown in FIG. 12 (C), curing of the repairing mold plate 24 with the uneven shape formed by the fine protrusions formed on the surface is slightly advanced within a possible range. The uneven shape of the repairing mold 24 is obtained by bringing it onto the semi-cured curable repair agent 23 and pressing it, and irradiating it with ultraviolet rays to cure the curable repair material 23. Is shaped (FIG. 12D).

  As the repairing plate 24 for repairing, the surface of the semi-cured curable repair agent 23 filled in the concave portion 21 of the roll plate 13 is provided with a concavo-convex shape due to close arrangement of fine holes corresponding to close arrangement of fine protrusions. A resin film, a resin sheet, a metal plate, or the like having a corresponding uneven shape that can be shaped formed on its surface can be used. Furthermore, for example, the antireflective article 1 produced by the shaping process using the roll plate 13 itself, or the molding plate 24 for repair can be used as it is.

  Thereafter, in this step, the repairing mold plate 24 is peeled off from the roll plate 13 (FIG. 12E), thereby completing the correction of the concave portion by the molding process.

  As described above, by forming a concave / convex shape with a close structure of fine holes by a forming process for a concave portion having a size of 100 μm or more, it can be prevented from being recognized as a defect in the antireflection article 1. Thus, the increase in defects can be reduced.

[Correction by filling]
FIG. 13 is a diagram for explanation (SP7, SP8) regarding correction by filling. In the correction by the filling, a concave portion having a size W of less than 100 μm and a depth D of 1 μm or more is targeted (FIG. 13A). In this manufacturing process, the filler 31 is dropped by the microdispenser 32 to fill the concave portion with the filler 31 (FIG. 13B). Here, the curable repair material mentioned above about the correction by the shaping process can be applied to the filler 31. In this embodiment, the liquid of the filler 31 is dropped by dropping the filler 31 while monitoring the height of the liquid surface of the filler 31 dropped on the concave based on the depth of the concave measured in advance. Depth related to the surface (depth from the root of the surrounding microhole) D is less than 1 μm, so that this liquid level does not rise above the surrounding (so as not to jump out from the base of the surrounding microhole) Filler 31 is filled.

  Thereafter, the filler 31 is cured by irradiation with ultraviolet rays, thereby completing the correction of the concave portion.

  In addition, when the depth D is less than 1 μm, the recess is left without being filled with any filler, so that the recess is left with a recess similar to a correction mark due to filling with the filler.

  Thus, about the recessed part with a depth of 1 micrometer or more, when peeling a base material by a shaping process by making a depth shallow by filling with a filler, it is the stress concerning the said recessed part (with peeling force) And the molded portion around the concave portion can be prevented from being peeled off. As a result, the size of the concave portion becomes 100 μm or more due to the enlargement of the concave portion. It is possible to reduce deterioration to Thereby, a fault can be reduced compared with the past.

  By executing the inspection and repairing process in this manner, the roll plate 13 is provided with a defect correction mark, a size of less than 100 μm, and a correction mark due to a concave portion having a depth of less than 1 μm. In addition, in this correction mark, a correction mark whose depth is less than 1 μm by filling the resin and a correction mark that is left without being filled with resin because the depth is less than 1 μm are mixed. become. Furthermore, in addition to such a correction mark, a correction mark by a molding process having a size of 100 μm or more and a fine hole produced by the molding process is provided.

[Detailed structure of anti-reflective article by roll plate after correction process]
FIG. 14 is a diagram showing a detailed configuration of an antireflection article produced by a roll plate that has undergone such a correction process. As described above, by forming the concave / convex shape of the fine hole in the concave portion having a size of 100 μm or more by the shaping process, the antireflection article 1 has a minute height higher than that of the surrounding area at a portion where the corresponding size W1 is 100 μm or more. Thus, a correction mark 41 is formed, in which microprotrusions are formed with a height displaced by less than ± 1 μm.

  Further, it corresponds to a concave portion whose depth is reduced by filling with a filler, or a concave portion left when the depth is less than 1 μm. A correction mark 42 in which the protrusion amount D1 from the top of the protrusion is less than 1 μm is formed. As a result, the correction mark of the antireflection article 1 is set so that the amount of protrusion from the apex of the surrounding minute protrusions is less than 1 μm on the entire surface of the antireflection article.

[Second Embodiment]
In this embodiment, the correction of the concave portion by the shaping process is omitted, the filler is filled with the depth D of the concave portion, the deep concave portion is shallowed, and the shallow concave portion is left as it is.

  That is, in the correction of the defect related to the convex portion, the size of the concave portion created by removing the defect can be reduced by controlling the laser light quantity, the beam diameter, the irradiation time, and the like. Also, by purifying the roll plate manufacturing process and the anti-reflective object manufacturing process, the number and size of adhered foreign substances can be reduced, thereby reducing the size of the recesses created by removing defects. Can do. Moreover, the size of the concave portion generated by peeling off the molded portion can be reduced by managing the molding process using the roll plate. As a result, the size and frequency of occurrence of recesses having a size of 100 μm or more can be reduced to such an extent that they do not cause a practical problem. Thereby, in this embodiment, the correction of the concave portion by the shaping process is omitted, the filler is filled with the depth D of the concave portion, the deep concave portion is shallowed, and the shallow concave portion is left, As a result, the occurrence of defects is reduced as compared with the prior art.

  As in this embodiment, simply filling the filler with the depth D of the recesses to make the deeper recesses shallower can reduce the defects as compared with the prior art.

[Other Embodiments]
The specific configuration suitable for the implementation of the present invention has been described in detail above. However, the present invention can be variously modified from the configuration of the above-described embodiment without departing from the spirit of the present invention, and further the conventional configuration. Can be combined.

  That is, in the above-described embodiment, the case where the number of repetitions of the anodizing treatment and the etching treatment is set to 3 (to 5) each is described, but the present invention is not limited to this, and the number of repetitions is set to other times. In addition, the present invention can be widely applied to the case where the process is repeated a plurality of times and the final process is anodizing.

  In the first embodiment described above, the case where the antireflection article is arranged on the front side of various image display panels such as a liquid crystal display panel, an electroluminescent display panel, a plasma display panel, etc. has been described. The invention is not limited to this, and is widely applied to, for example, a case where the reflection loss of incident light from the backlight to the liquid crystal display panel is reduced by reducing the reflection loss of incident light from the backlight (increasing incident light utilization efficiency). be able to. Here, the surface side of the image display panel is a light output surface of the image display panel and also a surface on the image observer side. The back side of the image display panel is the opposite side of the surface of the image display panel. In the case of a transmissive image display apparatus using a backlight (back light source), the incident light from the backlight is incident. It is also a surface.

  Moreover, although the above-mentioned embodiment described the case where the anti-reflective article by a film shape was produced by the shaping process using a roll plate, this invention is not limited to this, The transparent base material which concerns on the shape of an anti-reflective article Depending on the shape, for example, when creating an antireflection article by processing a sheet using a shaping mold with a specific curved shape, such as a flat plate, the process related to the shaping process, the mold is the antireflection article It can change suitably according to the shape of the transparent base material which concerns on a shape.

  In the above-described embodiment, the case where an acrylate-based ultraviolet curable resin is applied to the shaping resin has been described. However, the present invention is not limited to this, and various ultraviolet-curable resins such as epoxy-based and polyester-based resins, or acrylates are used. Wide range when using various materials such as electron beam curable resins such as epoxy, epoxy and polyester, thermosetting resins such as urethane, epoxy, and polysiloxane, and molding resins in various curing forms The present invention can be applied, and further, for example, it can be widely applied to a case where a heated thermoplastic resin is pressed and shaped.

  Further, in the above-described embodiment, as shown in FIG. 1, microprojections are formed on the receiving layer 4 of the laminate formed by laminating the receiving layer (ultraviolet curable resin layer) 4 on one surface of the substrate 2. The antireflection article 1 is formed by shaping the group 5 and curing the receiving layer 4. The layer structure is a two-layer laminate. However, the present invention is not limited to such a form. Although the illustration is omitted, the antireflection article 1 of the present invention may have a single-layer configuration in which the minute protrusion group 5 is formed directly on one surface of the base material 2 without interposing another layer. Alternatively, one or more intermediate layers on one surface of the substrate 2 (layers that improve substrate surface performance such as interlayer adhesion, coating suitability, surface smoothness, etc. Also referred to as primer layer, anchor layer, etc. 3), the receiving layer 4 may be formed, and a laminate of three or more layers may be formed by shaping the microprojection group 5 on the surface of the receiving layer.

Furthermore, in the above-described embodiment, as shown in FIG. 1, the minute projection group 5 is formed only on one surface of the substrate 2 (directly or via another layer). It is not limited to such a form. A configuration in which the minute projection groups 5 are formed on both surfaces of the substrate 2 (directly or via other layers) may be employed.
Although not shown, in the antireflection article 1 of the present invention as shown in FIG. 1 and the like, the surface opposite to the surface on which the microprojections are formed of the substrate 2 (the lower surface of the substrate 2 in FIG. 1). Various adhesive layers are formed on the adhesive layer, and a release film (release paper) is laminated on the surface of the adhesive layer so as to be peelable. In such a form, the release film is peeled and removed to expose the adhesive layer, and the antireflection article 1 of the present invention can be laminated and laminated on the desired surface of the desired article by the adhesive layer. The antireflection performance can be easily imparted to a desired article. As the adhesive, various types of known adhesive forms such as a pressure-sensitive adhesive (pressure-sensitive adhesive), a two-component curable adhesive, an ultraviolet curable adhesive, a thermosetting adhesive, and a hot melt adhesive can be used. .

  Although not shown in the drawings, in the antireflection article 1 of the present invention as shown in FIG. 1 and the like, storage, transportation, buying and selling, and post-processing are performed with a protective film that can be peeled off on the surface on which the microprojection group 5 is formed. Or it can also be set as the form which peels and removes this protective film at an appropriate time after performing construction. In such a form, it is possible to prevent the antireflection performance from being deteriorated due to damage or contamination of the microprojection group during storage, transportation and the like.

  In the above-described embodiment, the case where the antireflection article with the film shape is arranged on the front side surface of the image display panel or the incident surface of the illumination light has been described. However, the present invention is not limited to this and is applied to various applications. be able to. Specifically, it should be applied to applications that are placed on the back surface (image display panel side) of the surface side member such as a touch panel, various window materials, various optical filters, etc. installed on the screen of the image display panel through a gap. Can do. In this case, it is possible to prevent interference fringes such as Newton rings due to light interference between the image display panel and the surface side member, and between the light emission surface of the image display panel and the light incident surface side of the surface side member. Thus, it is possible to prevent ghost images due to multiple reflections, and to achieve effects such as reduction of reflection loss with respect to image light emitted from the screen and entering these surface side members.

  Alternatively, a transparent electrode constituting the touch panel is formed on a film or plate-like transparent substrate with a group of microprojections specific to the present invention, and a transparent conductive film such as ITO (indium tin oxide) is further formed on the group of microprojections. The formed one can be used. In this case, it is possible to prevent light reflection between the touch panel electrode and the counter electrode or various members adjacent to the touch panel electrode, thereby reducing the occurrence of interference fringes, ghost images, and the like.

  Moreover, you may make it arrange | position on both surfaces of the glass plate surface (external side) used for a show window of a store, or the surface and the back surface (product or exhibition side). In this case, it is possible to improve the visibility for customers and spectators of products, artworks, etc. by preventing light reflection on the surface of the glass plate.

  Further, the present invention can be widely applied to the case where the lens or prism is used on various optical devices such as glasses, a telescope, a camera, a video camera, a gun sighting mirror (sniper scope), binoculars, a periscope, and the like. In this case, the visibility by preventing light reflection on the lens or prism surface can be improved. Furthermore, it can also be applied to the case where it is arranged on the surface of a printed part (characters, photos, drawings, etc.) of a book to prevent light reflection on the surface of characters and the like and improve the visibility of characters and the like. In addition, it should be placed on the surface of signs (posters, posters, various other stores, streets, exterior walls, etc.) (road guidance, maps, smoking cessation, entrances, emergency exits, no entry, etc.) to improve visibility. Can do. In addition, a light entrance surface of a window material for a lighting fixture using an incandescent bulb, light emitting diode, fluorescent lamp, mercury lamp, EL (electroluminescence), etc. By arranging it on the side, it is possible to prevent the light reflection of the light incident surface of the window material, reduce the reflection loss of the light source light, and improve the light utilization efficiency. Furthermore, it can arrange | position on the display window surface (display observer side) of a timepiece and other various measuring devices, the light reflection of these display window surfaces can be prevented, and visibility can be improved.

  Furthermore, it is placed on the inside, outside, or both sides of the windows of the cockpits (driver's cabs, wheelhouses) of vehicles such as automobiles, railway vehicles, ships, and aircraft to prevent reflection of indoor and outdoor light from the windows. Thus, it is possible to improve the visibility of the outside world of the driver (driver, driver). Furthermore, it can be arranged on the surface of a night vision device lens or window material used for crime prevention monitoring, gun sighting, astronomical observation, etc. to improve visibility at night and in the dark.

  Furthermore, the surface of the transparent substrate (window glass, etc.) that forms windows, doors, partitions, wall surfaces, etc. of buildings such as houses, stores, offices, schools, hospitals, etc. (inside, outside, or both sides) It is possible to improve the visibility of the outside world or the daylighting efficiency. Furthermore, it can arrange | position on the surface of a greenhouse, the transparent sheet | seat of an agricultural greenhouse, or a transparent board (window material), and can improve the sunlight lighting efficiency. Furthermore, it can arrange | position on the solar cell surface and can improve the utilization efficiency (power generation efficiency) of sunlight.

  Furthermore, in the above-described embodiment, the wavelength band of the electromagnetic wave for preventing reflection is exclusively the visible light band (all or part of the visible light band), but the present invention is not limited to this, and the electromagnetic wave for preventing reflection. May be set to a wavelength band other than visible light rays such as infrared rays and ultraviolet rays. In that case, the shortest wavelength Λmin in the wavelength band of the electromagnetic wave may be set to the shortest wavelength in which the antireflection effect in the wavelength band of infrared rays, ultraviolet rays, etc. is desired in each conditional expression. For example, when it is desired to prevent reflection in the infrared band where the shortest wavelength Λmin is 850 nm, the distance d between adjacent protrusions (or its maximum value dmax) may be designed to be 850 nm or less, for example, d (dmax) = 800 nm. . In this case, an antireflection effect cannot be expected in the visible light band (380 to 780 nm), and an antireflection article exhibiting an antireflection effect for infrared rays having a wavelength of 850 nm or more can be obtained.

  In the various exemplary embodiments described above, when the film-shaped antireflection article of the present invention is disposed on the front surface, back surface, or both front and back surfaces of a transparent substrate such as a glass plate, it is disposed and covered over the entire surface of the transparent substrate. In addition, it can be arranged only in a partial area. As an example of this, for example, for a single window glass, a film-shaped antireflection article is attached to the indoor side surface only with an adhesive in a square area at the center, and an antireflection article is provided in the other areas. The case where it does not stick can be mentioned. In the case where the antireflection article is arranged only in a partial area of the transparent substrate, it is easy to visually recognize the presence of the transparent substrate without special display or a collision prevention fence, etc. The effect of reducing the risk of collision and injury, and the effect that both the prevention of peeping indoors (indoors) and the transparency of the transparent substrate (in the region where the antireflection article is disposed) can be achieved.

DESCRIPTION OF SYMBOLS 1 Antireflection article 2 Base material 4 Ultraviolet curable resin layer, receiving layer 5 Minute protrusion 6 Molding trace 10 Manufacturing process 12 Die 13 Roll plate 13a Base material 13b Adhesion layer 13c Molding part 14, 15 Roller 21 Concave part 22, 32 Micro dispenser 41
23 Curing Repair Agent 24 Repairing Plate 41, 42 Correction Mark E Foreign Material

Claims (11)

In the antireflection article in which the microprotrusions are closely arranged and the interval between the adjacent microprotrusions is equal to or less than the shortest wavelength of the wavelength band of the electromagnetic wave to prevent reflection,
It has a correction mark of the concave part of the mold for molding,
The correction mark of the concave portion of the mold for molding is
Projecting from the apex of the surrounding microprotrusions is a convex part having a larger size than the microprotrusions,
An antireflection article, wherein the entire surface of the antireflection article has a protrusion amount of less than 1 μm from the apex of the surrounding minute protrusions. The correction mark of the concave portion of the mold for molding is
The size is less than 100 μm,
The antireflective article is
The antireflection article according to claim 1, further comprising a correction mark of a concave portion of the molding die by a molding process having a size of 100 μm or more. The antireflective article is
The antireflection article according to claim 1, wherein the antireflection article is formed by a forming process of a forming resin layer provided on the surface of the substrate. An image display device in which the antireflection article according to any one of claims 1, 2, and 3 is disposed on a panel surface of an image display panel. The image display panel is a liquid crystal display panel;
The antireflective article is
The image display device according to claim 4, wherein the image display device is integrated with a linear polarizing plate on an emission surface side of the liquid crystal display panel. In the method for producing an antireflection article, in which microprotrusions are closely arranged, and the interval between adjacent microprotrusions is equal to or less than the shortest wavelength of the wavelength band of the electromagnetic wave to prevent reflection,
A mold creating step for fabricating a mold for molding having a microscopic hole corresponding to the microprojection;
A molding step of producing the antireflection article by producing the micro-projections on the surface of the substrate by a molding process using the molding die;
An inspection correction step of correcting the defect by inspecting the mold for molding,
The inspection correction step includes
A measuring step for measuring the depth of the concave portion on the surface of the mold for molding,
And a correction step by filling that corrects the depth of the recess to less than 1 μm by the filling process of the recess when the depth of the recess is 1 μm or more based on the depth of the recess measured in the measurement step. A method for manufacturing an antireflection article. The inspection correction step includes
Furthermore, a defect detection step of detecting a defect due to a convex portion on the surface of the mold for molding,
A defect correction step of removing the defect detected in the defect detection step,
The measurement step and the correction step by the filling are performed after the defect correction step,
In the recess for measuring the depth in the measurement step, including a recess formed by removing the defect in the defect correction step,
The method for manufacturing an antireflection article according to claim 6, wherein the concave portion to be corrected by the correction step by the filling includes a concave portion formed by removing the defect by the defect correcting step. The measurement step includes
In addition, measure the size of the recess,
The correction process by filling is as follows:
If the size of the recess is less than 100 μm, correct the depth of the recess by filling,
The inspection correction step includes
The reflection according to claim 6 or 7, further comprising: a correction step by a forming process of forming a fine hole in the recess by a forming process and correcting the recessed part when the size of the recess is 100 μm or more. Method for manufacturing prevention article. In the molding die for molding the microprojections of the antireflection article, in which the microprojections are closely arranged and the interval between the adjacent microprojections is equal to or less than the shortest wavelength of the wavelength band of the electromagnetic wave for preventing reflection,
With defect correction marks,
The correction mark of the defect is
A recess having a depth greater than that of the minute hole corresponding to the minute protrusion, and a size larger than that of the minute hole,
A mold for shaping an anti-reflective article, the depth of which is set to less than 1 μm from the root of the surrounding fine holes by filling the resin. The correction mark of the defect is
The size is less than 100 μm,
The mold for shaping the antireflection article is:
The mold for manufacturing an antireflective article according to claim 9, further comprising a correction mark by a molding process having a size of 100 μm or more. For shaping an antireflection article that molds the microprojections of an antireflection article in which the microprojections are closely arranged and the interval between adjacent microprojections is equal to or less than the shortest wavelength of the wavelength band of the electromagnetic wave for preventing reflection In the mold manufacturing method,
An inspection correction step of correcting the defect by inspecting the mold for molding,
The inspection correction step includes
A defect detection step of detecting defects due to convex portions on the surface of the mold for molding,
A defect correcting step for removing the defect detected in the defect detecting step;
A measuring step for measuring the depth of the concave portion on the surface of the mold for molding,
And a correction step by filling that corrects the depth of the recess to less than 1 μm by the filling process of the recess when the depth of the recess is 1 μm or more based on the depth of the recess measured in the measurement step. A method for producing a mold for shaping an antireflection article.