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JP3312164B2 - Vacuum suction device - Google Patents

Vacuum suction device

Info

Publication number
JP3312164B2
JP3312164B2 JP8237195A JP8237195A JP3312164B2 JP 3312164 B2 JP3312164 B2 JP 3312164B2 JP 8237195 A JP8237195 A JP 8237195A JP 8237195 A JP8237195 A JP 8237195A JP 3312164 B2 JP3312164 B2 JP 3312164B2
Authority
JP
Japan
Prior art keywords
vacuum suction
vacuum
static pressure
sample
suction device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP8237195A
Other languages
Japanese (ja)
Other versions
JPH08279549A (en
Inventor
晴夫 露嵜
篤暢 宇根
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
NTT Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp, NTT Inc filed Critical Nippon Telegraph and Telephone Corp
Priority to JP8237195A priority Critical patent/JP3312164B2/en
Publication of JPH08279549A publication Critical patent/JPH08279549A/en
Application granted granted Critical
Publication of JP3312164B2 publication Critical patent/JP3312164B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691Handling of masks or workpieces
    • G03F7/707Chucks, e.g. chucking or un-chucking operations or structural details

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Jigs For Machine Tools (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、LSI製造装置におけ
るパターン転写装置、描画装置、各種プロセス製造装
置、検査測長装置、および研削、研磨、切断などの加工
装置に用いられる真空吸着装置に関し、特にその真空吸
着器に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a vacuum transfer device used for a pattern transfer device, a drawing device, various process manufacturing devices, an inspection and length measuring device, and a processing device such as grinding, polishing and cutting in an LSI manufacturing device. In particular, it relates to the vacuum adsorber.

【0002】[0002]

【従来の技術】従来、LSI製造において用いられるこ
の種の真空吸着装置は、図5(a)、(b)に示すよう
な真空吸着器を備えている。これを概略説明すると、1
は真空吸着器で、その上面中央部にはウエハ等の試料6
を吸着する多数の微小な突子2を有する真空吸着部3が
設けられ、さらにその外側には環状の突部からなるラン
ド部4が設けられている。ランド部4は突子2と同じ高
さを有し、上面が仕上げ加工されることにより高精度な
平面を形成している。同様に、突子2の上面も仕上げ加
工されることにより高精度な平面を形成している。ま
た、真空吸着器1の内部には一端が真空吸着部3の底面
3aに開口し、他端が真空吸着器1の下面1aに開口す
る4つの真空排気孔5が形成されており、その他端開口
部は図示しない真空ポンプに接続されている。
2. Description of the Related Art Conventionally, this kind of vacuum suction device used in LSI manufacturing is provided with a vacuum suction device as shown in FIGS. 5 (a) and 5 (b). This is briefly described as follows.
Is a vacuum suction device, and a sample 6 such as a wafer
A vacuum suction unit 3 having a large number of minute protrusions 2 for sucking is provided, and a land portion 4 including an annular protrusion is provided outside the vacuum suction unit 3. The land portion 4 has the same height as the projections 2, and a high-precision plane is formed by finishing the upper surface. Similarly, the upper surface of the projection 2 is also finished to form a highly accurate plane. Further, inside the vacuum adsorber 1, four vacuum exhaust holes 5 are formed, one end of which is open on the bottom surface 3a of the vacuum adsorber 3, and the other end is open on the lower surface 1a of the vacuum adsorber 1. The opening is connected to a vacuum pump (not shown).

【0003】このような構造において、真空吸着器1の
上面に試料6を載置した後、真空ポンプを作動させて試
料6の下部の空気を真空排気孔5から排気すると、真空
吸着部3が負圧となるため、試料6は突子2およびラン
ド部4上に吸着される。ランド部4の上面は突子2の上
面と同一平面を形成しており、試料6の外周縁部下面が
密接することで、ランド部4の内側、すなわち真空吸着
部3を真空封止する。試料6は真空吸着されることで突
子2およびランド部4の高精度に仕上げ加工された上面
に倣い、反りや曲がりが矯正される。
In such a structure, after the sample 6 is placed on the upper surface of the vacuum adsorber 1 and the air under the sample 6 is evacuated from the evacuation hole 5 by operating the vacuum pump, the vacuum adsorber 3 Due to the negative pressure, the sample 6 is adsorbed on the protrusion 2 and the land 4. The upper surface of the land portion 4 forms the same plane as the upper surface of the projection 2, and the inner surface of the land portion 4, that is, the vacuum suction portion 3 is vacuum-sealed when the lower surface of the outer peripheral edge of the sample 6 is in close contact. The sample 6 is vacuum-adsorbed and follows the upper surface of the protrusion 2 and the land portion 4 which have been finished with high precision, so that warpage and bending are corrected.

【0004】[0004]

【発明が解決しようとする課題】上記した従来の真空吸
着装置の真空吸着器にあっては、真空排気によって試料
6を真空吸着部3の突子2とランド部4の上面に吸着す
ることにより、試料6の反りや変形を矯正し平面にする
ことができる。また、突子2により真空吸着器1と試料
6との接触面積をきわめて小さくすることができるの
で、ダスト等による平面度の低下は殆ど生じない。この
場合、単に突子2のみで試料6を支承する構造にする
と、真空吸着部3が外部と連通して試料6を吸着するの
に十分な真空度が得られず、また外部の空気や加工液を
吸い込んでしまい、試料6や真空吸着器を汚染する。そ
こで、従来は真空吸着部3を真空封止するためにランド
部4を設けている。真空封止を十分に行うためにはラン
ド部4の幅を広くすることが必要となるが、幅が広くな
ればなるほど、ランド部4上にダスト等が付着する確率
が高くなり、試料の外周部を高精度な平面に矯正できな
いという問題があった。
In the above-described vacuum suction device of the conventional vacuum suction device, the sample 6 is sucked on the protrusion 2 of the vacuum suction portion 3 and the upper surface of the land portion 4 by evacuation. The warpage and deformation of the sample 6 can be corrected to make the sample 6 flat. Further, since the contact area between the vacuum adsorber 1 and the sample 6 can be extremely reduced by the projections 2, the flatness is hardly reduced by dust or the like. In this case, if the structure is such that the sample 6 is simply supported by the projection 2 alone, a sufficient degree of vacuum cannot be obtained for the vacuum suction unit 3 to communicate with the outside and suck the sample 6, and external air or processing The liquid is sucked, and contaminates the sample 6 and the vacuum adsorber. Therefore, conventionally, a land portion 4 is provided to vacuum seal the vacuum suction portion 3. In order to sufficiently perform vacuum sealing, it is necessary to increase the width of the land portion 4. However, as the width increases, the probability that dust or the like adheres to the land portion 4 increases. There was a problem that the part could not be corrected to a highly accurate flat surface.

【0005】本発明は上記した従来の問題点に鑑みてな
されたもので、その目的とするところは、突子のみによ
る支承にも拘らず試料を確実に吸着することができ、試
料外周部においてもダスト等の影響を受けず、試料を高
い平面に矯正することができる真空吸着装置を提供する
ことにある。
The present invention has been made in view of the above-mentioned conventional problems, and an object of the present invention is to allow a sample to be surely adsorbed irrespective of a support by only a protrusion, and to be used in a sample outer peripheral portion. Another object of the present invention is to provide a vacuum suction device that can correct a sample to a high flat surface without being affected by dust or the like.

【0006】[0006]

【課題を解決するための手段】上記目的を達成するた
め、本発明は、上面が同一平面上にある同一の太さから
なる多数の突子のみによって試料を支承し、内部に真空
ポンプに接続される真空排気孔を設けた真空吸着器を備
えた真空吸着装置であって、前記真空吸着器の上面に前
記真空排気孔が連通する凹部によって形成された真空吸
着部と、この真空吸着部を取り囲む環状の突部によって
形成された第1の静圧シール部と、この第1の静圧シー
ル部を取り囲む環状溝と、この環状溝を取り囲む環状の
突部によって形成された第2の静圧シール部とを設け、
前記真空吸着器の内部に一端が前記環状溝に連通し他端
が前記真空吸着器の側面に開口して陽圧供給手段に接続
される陽圧供給孔を設け、前記第1、第2の静圧シール
部の突子を真空吸着部の突子よりきわめて短く設定する
ことにより前記第1、第2の静圧シール部の上面と前記
試料との間に微小隙間が形成されるようにし、前記第2
の静圧シール部を前記第1の静圧シール部より低くした
ことを特徴とする。また、本発明は、上面が同一平面上
にある多数の突子のみによって試料を支承し、内部に真
空ポンプに接続される真空排気孔を設けた真空吸着器を
備えた真空吸着装置であって、前記真空吸着器の上面に
真空吸着部と、この真空吸着部を取り囲み前記真空排気
孔が連通する真空排気溝と、前記真空吸着部と同一平面
を形成し前記真空排気溝を取り囲む環状の第1の静圧シ
ール部と、この第1の静圧シール部を取り囲む環状溝
と、前記真空吸着部および第1の静圧シール部と同一平
面を形成し前記環状溝を取り囲む環状の第2の静圧シー
ル部とを設け、前記真空吸着器の内部に前記環状溝に連
通する陽圧供給孔を設けたことを特徴とする。
In order to achieve the above object, the present invention provides a method in which a sample is supported only by a large number of protrusions having the same thickness on the same upper surface and connected to a vacuum pump inside. A vacuum suction device provided with a vacuum suction device provided with a vacuum exhaust hole, wherein a vacuum suction portion formed by a concave portion communicating with the vacuum exhaust hole on the upper surface of the vacuum suction device; and A first hydrostatic seal formed by the surrounding annular protrusion, an annular groove surrounding the first static pressure seal, and a second static pressure formed by the annular protrusion surrounding the annular groove And a seal part,
A positive pressure supply hole having one end communicating with the annular groove and the other end opened to a side surface of the vacuum suction device and connected to a positive pressure supply means is provided inside the vacuum suction device, and the first and second holes are provided. the projections of the static pressure seal portion as small gap is formed between the first by setting extremely shorter than projections of the vacuum suction portion, and the upper surface of the second static pressure seal portion and the sample , The second
Characterized in that the static pressure seal portion is lower than the first static pressure seal portion . Further, the present invention is a vacuum suction device provided with a vacuum suction device that supports a sample only by a large number of protrusions whose upper surfaces are on the same plane and has a vacuum exhaust hole connected to a vacuum pump inside. A vacuum suction portion on the upper surface of the vacuum suction device, a vacuum exhaust groove surrounding the vacuum suction portion and communicating with the vacuum exhaust hole, and an annular second groove formed on the same plane as the vacuum suction portion and surrounding the vacuum exhaust groove . 1 static pressure seal portion, an annular groove surrounding the first static pressure seal portion, and an annular second groove forming the same plane as the vacuum suction portion and the first static pressure seal portion and surrounding the annular groove. A static pressure seal portion is provided, and a positive pressure supply hole communicating with the annular groove is provided inside the vacuum suction device.

【0007】[0007]

【作用】本発明においては、試料を接触面がきわめて小
さい突子のみで支承するから、ダスト等による平面度に
及ぼす影響がほとんどない。また、本発明は2つの静圧
シール部を真空吸着部の外側に設けて試料との間に微小
隙間を形成するとともに、環状溝に陽圧空気を供給して
いる。こうすることにより真空排気時に静圧シール部と
試料との間の微小隙間が大きな抵抗となるため、真空吸
着部に吸い込まれる空気の量はきわめて僅かで、真空吸
着部を真空排気することができ、試料を吸着する。一
方、陽圧空気の供給によって、静圧シール部が陽圧状態
となるから外部からダストや加工液が侵入するのを阻止
される。この陽圧空気の一部は真空吸着部に流れ込む
が、静圧シール部と試料との間に設けた微小隙間が大き
な抵抗となるため、真空吸着部内に流れ込む陽圧空気の
量は僅かで、試料の真空吸着には影響を及ぼさない。ま
た、環状溝内にシール部材を設け、このシール部材を真
空吸着時および陽圧空気の供給時に試料に密着させる
と、真空吸着部を真空封止するので、外部の空気や加工
液が侵入することがない。
In the present invention, since the sample is supported only by the projection having an extremely small contact surface, there is almost no influence on the flatness due to dust or the like. In the present invention, two static pressure seal portions are provided outside the vacuum suction portion to form a minute gap between the sample and the sample, and positive pressure air is supplied to the annular groove. By doing so, the minute gap between the static pressure seal part and the sample at the time of vacuum evacuation has a large resistance, so the amount of air sucked into the vacuum suction part is extremely small, and the vacuum suction part can be evacuated. , Adsorb the sample. On the other hand, the supply of the positive pressure air causes the static pressure seal portion to be in a positive pressure state, so that the intrusion of dust and machining fluid from the outside is prevented. A part of this positive pressure air flows into the vacuum suction part, but since the minute gap provided between the static pressure seal part and the sample has a large resistance, the amount of positive pressure air flowing into the vacuum suction part is small, It does not affect the vacuum adsorption of the sample. Further, when a seal member is provided in the annular groove, and the seal member is brought into close contact with the sample during vacuum suction and supply of positive pressure air, the vacuum suction portion is vacuum-sealed, so that external air and processing liquid enter. Nothing.

【0008】[0008]

【実施例】以下、本発明を図面に示す実施例に基づいて
詳細に説明する。図1(a)、(b)は本発明に係る真
空吸着装置を構成する真空吸着器の第1の実施例を示す
平面図および要部の拡大断面図である。なお、図中従来
技術の欄で説明したものと同一構成部材等については同
一符号を付し、その詳細な説明を省略する。同図におい
て、本実施例における厚肉の円板状に形成した真空吸着
器1には、上面中央部に小さな四角で示す多数の微小な
突子2を有する円形の凹部によって形成された真空吸着
部3が設けられ、その外側に同じく多数の微小な突子1
1,12をそれぞれ有する環状の突部からなる第1,第
2の静圧シール部13,14が同心円状に突設されてい
る。また、本実施例はこれら両静圧シール部13,14
間に陽圧部を形成する環状溝15を設け、真空吸着器1
の内部に真空排気孔5と陽圧供給孔17を形成したもの
である。真空吸着部3の深さD、言い換えれば突子2の
高さは100μmから1mm程度である。第1の静圧シ
ール部13と第2の静圧シール部14の高さ(真空吸着
部3の底面3aからの高さ)は等しく、かつ真空吸着部
3の深さDより僅かに(100分の1から10分の1程
度)小さい。真空吸着部3および第1、第2の静圧シー
ル部13,14の各突子2,11,12は同一の太さの
ピン状に形成され、その上面が高精度な平面に仕上げ加
工されるとともに同一平面を形成している。第1、第2
の静圧シール部13,14の突子11,12の高さdは
数μm〜50μm以下で、真空吸着部3の突子2の高さ
Dよりかなり短い。このため、第1、第2の静圧シール
部13,14と試料6との間には微小隙間23,24が
それぞれ形成される。そして、これらの突子2,11,
12は、円形、正方形等の適宜な断面形状を有し、試料
6との接触面積を減らすためにできるだけ細く形成され
るとともに、真空吸着時に試料6の厚さに応じて試料6
に撓みを生じさせない程度の間隔をおいて設けられる。
なお、突子2,11,12の材料としてはセラミック
ス、鉄、チタン等が用いられ、真空吸着器1の材料とし
てはセラミックス、焼き入れした金属等が用いられる。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, the present invention will be described in detail based on embodiments shown in the drawings. FIGS. 1A and 1B are a plan view and an enlarged cross-sectional view of a main part of a first embodiment of a vacuum suction device constituting a vacuum suction device according to the present invention. In the drawings, the same components as those described in the section of the related art are denoted by the same reference numerals, and detailed description thereof will be omitted. In FIG. 1, a vacuum suction device 1 formed in a thick disk shape in this embodiment has a vacuum suction formed by a circular concave portion having a large number of small protrusions 2 indicated by small squares in the center of the upper surface. A portion 3 is provided, on the outside of which a plurality of minute protrusions 1 are also provided.
First and second static pressure seal portions 13 and 14 each formed of an annular protrusion having respective 1 and 12 are protruded concentrically. Further, in the present embodiment, these two static pressure seal portions 13 and 14 are used.
An annular groove 15 forming a positive pressure portion is provided between the vacuum suction device 1
Is formed with a vacuum exhaust hole 5 and a positive pressure supply hole 17 inside. The depth D of the vacuum suction part 3, in other words, the height of the projection 2 is about 100 μm to 1 mm. The height of the first static pressure seal portion 13 and the height of the second static pressure seal portion 14 (the height from the bottom surface 3a of the vacuum suction portion 3) are equal to each other and slightly smaller than the depth D of the vacuum suction portion 3 by (100). (About 1/10 to 1/10) small. The vacuum suction part 3 and each of the projections 2, 11, 12 of the first and second hydrostatic seal parts 13, 14 are formed into pins having the same thickness, and the upper surface thereof is finished to a highly accurate flat surface. And form the same plane. 1st, 2nd
The height d of the protrusions 11 and 12 of the static pressure seal portions 13 and 14 is several μm to 50 μm or less, and is considerably shorter than the height D of the protrusion 2 of the vacuum suction portion 3. Therefore, minute gaps 23 and 24 are formed between the first and second static pressure seal portions 13 and 14 and the sample 6, respectively. And these rams 2,11,
Numeral 12 has an appropriate cross-sectional shape such as a circle or a square, and is formed as thin as possible in order to reduce the contact area with the sample 6.
Are provided at intervals that do not cause bending.
In addition, ceramics, iron, titanium, or the like is used as a material of the protrusions 2, 11, and 12, and a ceramic, a quenched metal, or the like is used as a material of the vacuum adsorber 1.

【0009】前記真空排気孔5の一端は前記真空吸着部
3の底面3aに開口し、他端が真空吸着器1の側面に開
口して図示しない真空ポンプに接続されている。前記陽
圧供給孔17の一端は前記環状溝15の外周壁に開口
し、他端が真空吸着器1の側面に開口して図示しないコ
ンプレッサ等の陽圧供給手段に接続されている。
One end of the vacuum evacuation hole 5 opens to the bottom surface 3a of the vacuum suction part 3, and the other end opens to the side surface of the vacuum suction device 1 and is connected to a vacuum pump (not shown). One end of the positive pressure supply hole 17 opens to the outer peripheral wall of the annular groove 15 and the other end opens to the side surface of the vacuum adsorber 1 and is connected to positive pressure supply means such as a compressor (not shown).

【0010】このような構造において、図示しない真空
ポンプによって真空排気孔5内の空気を排気すると、空
気は矢印21で示す方向に流れ、真空吸着部3内が負圧
となる。したがって、試料6は大気圧によって突子2,
11,12の上面に押しつけられて反りや曲がりが矯正
される。この時、第1の静圧シール部13は、その上面
が突子11の上面より僅かに低く設定されることにより
試料6の裏面との間に微小隙間23を形成しているの
で、真空吸着部3に流れ込む空気の量はきわめて少な
く、真空吸着部3を真空排気することができ、試料6を
吸着することができる。次に、コンプレッサ等の陽圧供
給手段の作動によって陽圧空気22を陽圧供給孔17を
通じて環状溝15に供給し、環状溝15および第1、第
2の静圧シール部13,14を陽圧状態にする。そし
て、この陽圧空気22は、試料6と第1、第2の静圧シ
ール部13,14間の微小隙間24を通って真空吸着部
3と真空吸着器1の外部に排出される。この時、第1の
静圧シール部13は陽圧空気に対して大きな抵抗となる
ため、真空吸着部3に流れ込む陽圧空気22の量はきわ
めて僅かである。したがって、試料6の真空吸着には影
響を及ぼすことがない。また、第2の静圧シール部14
から外部に排出される陽圧空気は、試料6の裏面外周部
に付着したダストを除去し、また加工時に真空吸着器1
内に加工液やダストが侵入するのを阻止する。したがっ
て、試料6の裏面と真空吸着器1の真空吸着面、すなわ
ち突子2,11,12の上面の汚染を防止することがで
きる。
In such a structure, when the air in the evacuation hole 5 is exhausted by a vacuum pump (not shown), the air flows in the direction shown by the arrow 21 and the inside of the vacuum suction part 3 becomes a negative pressure. Therefore, the sample 6 is moved by the pressure
It is pressed against the upper surfaces of 11 and 12 to correct warpage and bending. At this time, the first static pressure seal portion 13 has a small gap 23 formed between the first static pressure seal portion 13 and the back surface of the sample 6 by setting the upper surface thereof slightly lower than the upper surface of the projection 11, and thus the vacuum suction is performed. The amount of air flowing into the section 3 is extremely small, the vacuum suction section 3 can be evacuated, and the sample 6 can be suctioned. Next, the positive pressure air 22 is supplied to the annular groove 15 through the positive pressure supply hole 17 by the operation of the positive pressure supply means such as a compressor, and the annular groove 15 and the first and second static pressure seal portions 13 and 14 are positively charged. Pressurize. Then, the positive pressure air 22 is discharged to the outside of the vacuum suction unit 3 and the vacuum suction unit 1 through the minute gap 24 between the sample 6 and the first and second static pressure seal portions 13 and 14. At this time, since the first static pressure seal portion 13 has a large resistance to the positive pressure air, the amount of the positive pressure air 22 flowing into the vacuum suction portion 3 is extremely small. Therefore, the vacuum suction of the sample 6 is not affected. Further, the second hydrostatic seal portion 14
The positive pressure air discharged to the outside removes dust adhering to the outer peripheral portion of the back surface of the sample 6, and removes the vacuum adsorber 1 during processing.
Prevents machining fluid and dust from entering inside. Therefore, contamination of the back surface of the sample 6 and the vacuum suction surface of the vacuum suction device 1, that is, the upper surfaces of the projections 2, 11, and 12 can be prevented.

【0011】一例として、500μmより厚い試料6を
吸着する場合、突子2,11,12の間隔を1mm、突
子2,11,12の大きさを1辺が0.2mmの角形と
すると、試料6の撓みは殆ど観察されず、かつ試料6の
裏面と突子2,11,12の上面との接触率は4%とき
わめて小さい。したがって、試料6の被吸着面全面にわ
たってダストの影響は小さく、高い平面度が得られる。
また、突子2,11,12をピン状に形成しているの
で、ダスト等の付着も少ない。
As an example, when a sample 6 thicker than 500 μm is adsorbed, if the interval between the protrusions 2, 11, 12 is 1 mm and the size of the protrusions 2, 11, 12 is 0.2 mm on each side, The bending of the sample 6 is hardly observed, and the contact ratio between the back surface of the sample 6 and the upper surfaces of the projections 2, 11, and 12 is as extremely small as 4%. Therefore, the influence of dust is small over the entire surface of the sample 6 to be attracted, and high flatness can be obtained.
Further, since the protrusions 2, 11, and 12 are formed in a pin shape, adhesion of dust and the like is small.

【0012】図2(a)、(b)は本発明の第2の実施
例を示す真空吸着器の平面図および要部の拡大断面図で
ある。この実施例における真空吸着器1は、真空吸着器
1の上面中央部を円形の真空吸着部3とし、この真空吸
着部3の外側に環状の真空排気溝30、環状の第1の静
圧シール部13、環状溝15および第2の静圧シール部
14を同心円状に設けたものである。また、真空吸着部
3および第1、第2の静圧シール部13,14に断面形
状が円形からなる多数の微小な突子2,11,12をそ
れぞれ突設し、かつ真空吸着器1の内部に真空排気孔5
と陽圧供給孔17を形成したものである。真空吸着部3
と第1、第2の静圧シール部13,14の突子2,1
1,12が突設されている面は、同一平面を形成してい
る。また、突子2,11,12は、高さdが例えば数μ
mから50μmで全て等しく、上面が同一平面を形成し
ている。このため、試料6と真空吸着部3、第1、第2
の静圧シール部13,14との間にはそれぞれきわめて
微小な隙間が形成される。真空排気孔5の一端は前記真
空排気溝30に接続され、他端が真空吸着器1の側面に
開口し、図示しないポンプに接続されている。真空排気
溝30は、真空の立ち上がりを向上させるために真空排
気孔5を多数形成する代わりに設けられている。
FIGS. 2 (a) and 2 (b) are a plan view and an enlarged sectional view of a main part of a vacuum suction device showing a second embodiment of the present invention. In the vacuum suction device 1 of this embodiment, the center of the upper surface of the vacuum suction device 1 is a circular vacuum suction portion 3, an annular vacuum exhaust groove 30 is provided outside the vacuum suction portion 3, and an annular first static pressure seal is provided. The portion 13, the annular groove 15, and the second hydrostatic seal portion 14 are provided concentrically. In addition, a large number of minute projections 2, 11, 12 each having a circular cross-section are projected from the vacuum suction section 3 and the first and second hydrostatic seal sections 13, 14. Vacuum exhaust hole 5 inside
And positive pressure supply holes 17 are formed. Vacuum suction part 3
And the protrusions 2, 1 of the first and second hydrostatic seal portions 13, 14.
The surfaces on which the projections 1 and 12 are provided form the same plane. In addition, the protrusions 2, 11, and 12 have a height d of, for example, several μm.
m to 50 μm are all the same, and the upper surface forms the same plane. For this reason, the sample 6 and the vacuum suction part 3, the first and the second
Very small gaps are formed between the static pressure seal portions 13 and 14, respectively. One end of the evacuation hole 5 is connected to the evacuation groove 30, and the other end is opened on a side surface of the vacuum adsorber 1 and is connected to a pump (not shown). The evacuation groove 30 is provided instead of forming a large number of evacuation holes 5 in order to improve the rise of vacuum.

【0013】このような構造においても試料6の裏面と
突子2,11,12との接触率はきわめて小さく、した
がって、試料6の被吸着面全面にわたってダストによる
影響は小さく、高い平面度が得られる。また、第1の静
圧シール部13を真空吸着部3の外側に設け、試料6と
の間に微小隙間を形成しているので、真空吸着時にダス
ト等が真空吸着部3に流れ込むことがなく、また陽圧空
気の供給時には真空吸着部3に流れ込む陽圧空気22の
量を少なくすることができる。したがって、試料6を確
実に真空吸着することができる。また、環状溝15の外
側に第2の静圧シール部14を設け、試料6との間に微
小隙間を形成しているので、第2の静圧シール部14を
陽圧状態にすることができ、加工液やダストが侵入する
のを確実に防止することができる。
Even in such a structure, the contact ratio between the back surface of the sample 6 and the projections 2, 11, and 12 is extremely small. Therefore, the influence of dust on the entire surface of the sample 6 to be attracted is small, and high flatness can be obtained. Can be Further, since the first static pressure seal portion 13 is provided outside the vacuum suction portion 3 to form a minute gap with the sample 6, dust and the like do not flow into the vacuum suction portion 3 during vacuum suction. In addition, the amount of the positive pressure air 22 flowing into the vacuum suction unit 3 during the supply of the positive pressure air can be reduced. Therefore, the sample 6 can be reliably vacuum-adsorbed. Further, since the second static pressure seal portion 14 is provided outside the annular groove 15 and a minute gap is formed between the second static pressure seal portion 14 and the sample 6, the second static pressure seal portion 14 can be brought into a positive pressure state. It is possible to reliably prevent the machining liquid and dust from entering.

【0014】図3は本発明の第3の実施例を示す真空吸
着器の要部の拡大断面図である。この実施例における真
空吸着器1は、図1に示した第1の実施例における第2
の静圧シール部14の高さを第1の静圧シール部13よ
り若干低く設定し、試料6と第2の静圧シール部14間
の微小隙間24を試料6と第1の静圧シール部13間の
微小隙間23より大きく設定したものである。その他の
構成は同様である。
FIG. 3 is an enlarged sectional view of a main part of a vacuum suction device showing a third embodiment of the present invention. The vacuum suction device 1 in this embodiment is different from the second embodiment in the first embodiment shown in FIG.
The height of the static pressure seal portion 14 is set slightly lower than that of the first static pressure seal portion 13, and the minute gap 24 between the sample 6 and the second static pressure seal portion 14 is formed between the sample 6 and the first static pressure seal portion. This is set to be larger than the minute gap 23 between the portions 13. Other configurations are the same.

【0015】このような構造において、真空吸引孔5内
の空気を排気して試料6を真空吸引した後、陽圧供給孔
17より環状溝15に陽圧空気22を供給する。この
時、真空吸着部3と環状溝15間の差圧は、陽圧空気2
2を真空吸着器1の外部に吹き出す第2の静圧シール部
14の外側の大気圧と環状溝15間の差圧より大きいた
め、陽圧空気22は真空吸着部3へ多く流れようとする
が、第2の静圧シール部14と試料6間の微小隙間24
が試料6と第1の静圧シール部13間の微小隙間23よ
り大きく設定されているので、第2の静圧シール部14
の抵抗が小さくなり、大部分の陽圧空気22は微小隙間
24を通って真空吸着器1の外部へ排出される。したが
って、このような構造においても真空吸着部3を確実に
真空封止することができ、外部から加工液が微小隙間2
4に侵入するのを阻止することができる。
In such a structure, after the air in the vacuum suction hole 5 is evacuated and the sample 6 is evacuated, the positive pressure air 22 is supplied from the positive pressure supply hole 17 to the annular groove 15. At this time, the differential pressure between the vacuum suction part 3 and the annular groove 15 is
The positive pressure air 22 tends to flow into the vacuum suction unit 3 because the pressure difference between the atmospheric pressure outside the second static pressure seal part 14 and the annular groove 15 is larger than the pressure difference between the annular groove 15. Is a minute gap 24 between the second hydrostatic seal portion 14 and the sample 6.
Is set to be larger than the minute gap 23 between the sample 6 and the first static pressure sealing portion 13, so that the second static pressure sealing portion 14
Of the positive pressure air 22 is discharged to the outside of the vacuum adsorber 1 through the minute gap 24. Therefore, even in such a structure, the vacuum suction part 3 can be reliably vacuum-sealed, and the processing liquid is externally supplied to the minute gap 2.
4 can be prevented.

【0016】図4は本発明の第4の実施例を示す真空吸
着器の要部の拡大断面図である。この実施例における真
空吸着器1は、図1に示した第1の実施例の環状溝15
に2枚のシール部材33を備えたリング32を嵌挿し、
これらシール部材33によって真空吸着部3を真空封止
するようにしたものである。
FIG. 4 is an enlarged sectional view of a main part of a vacuum suction device showing a fourth embodiment of the present invention. The vacuum suction device 1 in this embodiment is different from the annular groove 15 of the first embodiment shown in FIG.
A ring 32 provided with two seal members 33 is fitted into the
The vacuum suction part 3 is vacuum-sealed by these seal members 33.

【0017】前記リング32は、環状溝15の内周壁に
沿って着脱自在に嵌挿されている。リング32の上下面
の径方向外側半分は、全周にわたって内側半分よりも一
段低く形成されることにより環状の段差部37,38を
それぞれ形成している。各シール部材33はポリイミド
などの高分子膜によって形成されたきわめて薄い(10
μm〜30μm程度)リング状のシートからなり、その
径方向内側半分が全周にわたってリング32の上下面に
それぞれ固着されている。そして、シール部材33の外
側半分はリング32に固着されておらず、前記段差部3
7,38の上方および下方にそれぞれ延在している。上
側のシール部材33は、真空排気時および陽圧空気の供
給時に試料6の裏面に密着することにより、真空吸着部
3を真空封止する。下側のシール部材33は、陽圧空気
22の供給時に環状溝15の内底面に押し付けられるこ
とにより、環状溝15の内周壁とリング32との隙間を
シールする。段差部37,38はシール部材33との間
に隙間を設け、これらシール部材に対して陽圧空気22
が作用し易くする。また、上側段差部37は不使用時の
上側シート部材33の垂れ下がりを防止し、下側段差部
38は真空排気時の下側シート部材33の上方への変形
を少なくする。
The ring 32 is detachably fitted along the inner peripheral wall of the annular groove 15. The radially outer halves of the upper and lower surfaces of the ring 32 are formed one step lower than the inner halves over the entire circumference, thereby forming annular steps 37 and 38, respectively. Each seal member 33 is formed of a very thin (10
A ring-shaped sheet is fixed to the upper and lower surfaces of the ring 32 over the entire circumference. The outer half of the seal member 33 is not fixed to the ring 32, and the step portion 3
It extends above and below 7, 38, respectively. The upper seal member 33 adheres tightly to the back surface of the sample 6 at the time of evacuation and supply of positive pressure air, thereby vacuum-sealing the vacuum suction unit 3. The lower sealing member 33 seals the gap between the inner peripheral wall of the annular groove 15 and the ring 32 by being pressed against the inner bottom surface of the annular groove 15 when the positive pressure air 22 is supplied. The steps 37 and 38 provide a gap between the sealing member 33 and the positive-pressure air 22
Makes it easier to work. The upper step portion 37 prevents the upper sheet member 33 from sagging when not in use, and the lower step portion 38 reduces upward deformation of the lower sheet member 33 during evacuation.

【0018】このような構造において、ウエハなどの試
料6を真空吸着器1上に載置し、真空ポンプにより真空
排気孔5を真空排気すると、試料6は突子2,11,1
2上に吸着される。したがって、試料6は突子2,1
1,12の上面に倣い、反りや曲がりが矯正される。こ
の時、上側のシール部材33は図に示すように上方に吸
い上げられて試料6の裏面に密着し真空吸着部3を真空
封止する。
In such a structure, a sample 6 such as a wafer is placed on the vacuum adsorber 1 and the vacuum exhaust hole 5 is evacuated by a vacuum pump.
2 is adsorbed. Therefore, the sample 6 has the protrusions 2 and 1
According to the upper surfaces of the first and the second, the warpage and the bending are corrected. At this time, the upper seal member 33 is sucked upward as shown in the figure and closely adheres to the back surface of the sample 6 to vacuum seal the vacuum suction part 3.

【0019】次に、陽圧供給孔17から陽圧空気22を
環状溝15に供給すると、第1、第2の静圧シール部1
3,14が陽圧空気22に対して大きな抵抗となるた
め、環状溝15が陽圧状態となり、上側のシール部材3
3を試料6の裏面に押し付け、下側のシール部材33を
環状溝15の内底面に押し付ける。したがって、真空吸
着部3は完全に真空封止される。この状態で加工液を流
し、試料6の加工を行えば、第2の静圧シール部14さ
らには環状溝15、第1の静圧シール部13および真空
吸着部3へ加工液が侵入するのを阻止することができ
る。したがって、上記した第1、第2の実施例と同様に
試料6の裏面と真空吸着器1の真空吸着面の汚染を防止
することができる。
Next, when the positive pressure air 22 is supplied to the annular groove 15 from the positive pressure supply hole 17, the first and second static pressure seal portions 1 are supplied.
3 and 14 have a large resistance to the positive pressure air 22, so that the annular groove 15 is in a positive pressure state, and the upper seal member 3
3 is pressed against the back surface of the sample 6, and the lower seal member 33 is pressed against the inner bottom surface of the annular groove 15. Therefore, the vacuum suction part 3 is completely vacuum-sealed. In this state, if the working fluid is flowed and the sample 6 is worked, the working fluid enters the second static pressure seal part 14, the annular groove 15, the first static pressure seal part 13, and the vacuum suction part 3. Can be prevented. Therefore, similarly to the first and second embodiments described above, it is possible to prevent the back surface of the sample 6 and the vacuum suction surface of the vacuum suction device 1 from being contaminated.

【0020】また、このような構造においては、大きく
上方に反った試料6を吸着する際に効果を発揮する。す
なわち、上方に大きく反った試料6の場合、その裏面外
周部が突子12と接触せず、第2の静圧シール部14と
の間に大きな隙間が形成されることになるため、真空排
気孔5内の空気を排気しても真空吸着部3の真空度は上
がらないが、環状溝15にリング32とシール部材33
を設けておくと、上側のシール部材33の外周側端部が
上方に持ち上げられて試料6の裏面に密着し、真空吸着
部3を塞ぐ。したがって、真空吸着部3の真空度が上が
り、試料6を吸着する。また、上側のシール部材33は
環状溝15に陽圧空気22が供給されると、試料6の裏
面に押し付けられるため真空吸着部3を的確に塞ぐ。一
方、下側のシール部材33は、陽圧空気22が環状溝1
5に供給されると、環状溝15の内底面に押し付けられ
るので、環状溝15の内周壁とリング32との隙間をシ
ールする。
Further, such a structure is effective in adsorbing the sample 6 which has warped largely upward. That is, in the case of the sample 6 which is largely warped upward, the outer peripheral portion of the back surface does not come into contact with the protrusion 12 and a large gap is formed between the sample 6 and the second hydrostatic seal portion 14. Even if the air in the hole 5 is exhausted, the degree of vacuum of the vacuum suction part 3 does not increase, but the ring 32 and the sealing member 33
Is provided, the outer peripheral end of the upper seal member 33 is lifted upward and adheres to the back surface of the sample 6 to close the vacuum suction unit 3. Therefore, the degree of vacuum of the vacuum suction unit 3 is increased, and the sample 6 is suctioned. Further, when the positive pressure air 22 is supplied to the annular groove 15, the upper seal member 33 is pressed against the back surface of the sample 6, thereby closing the vacuum suction section 3 accurately. On the other hand, the lower seal member 33 is configured such that the positive-pressure air 22
5 is pressed against the inner bottom surface of the annular groove 15 to seal the gap between the inner peripheral wall of the annular groove 15 and the ring 32.

【0021】また、本実施例においては、リング32を
環状溝15内にその内周壁に沿って着脱自在に設けてい
るため、大きく反った試料6を真空吸着する場合にのみ
適用し、その他の場合には取り外すことができる。した
がって、シール部材33の劣化を防ぎ、長期にわたって
使用することができる。
In this embodiment, since the ring 32 is provided in the annular groove 15 so as to be detachable along the inner peripheral wall thereof, the present invention is applied only when the largely warped sample 6 is vacuum-adsorbed. If it can be removed. Therefore, deterioration of the seal member 33 can be prevented, and the seal member 33 can be used for a long time.

【0022】なお、上記した第1〜第4の実施例はいず
れも突子2,11,12を微小なピン状に形成した例を
示したが、これに限らず環状や渦巻状の細長い突子であ
ってもよい。また、上記した第1〜第4の実施例はいず
れも真空吸着部3を円形に形成したが、矩形や楕円形に
形成してもよい。また、図4に示した第4の実施例にお
いてはリング32の上下面にシール部材33をそれぞれ
固着した例を示したが、上面にのみ固着した場合でも微
小隙間23を真空封止することができる。
In each of the first to fourth embodiments described above, the projections 2, 11, and 12 are formed as minute pins, but the invention is not limited thereto. May be a child. Further, in all of the first to fourth embodiments, the vacuum suction portion 3 is formed in a circular shape, but may be formed in a rectangular shape or an elliptical shape. Further, in the fourth embodiment shown in FIG. 4, an example is shown in which the seal members 33 are fixed to the upper and lower surfaces of the ring 32, respectively. it can.

【0023】[0023]

【発明の効果】以上説明したように本発明に係る真空吸
着装置は、上面が同一平面上にある同一太さからなる多
数の突子のみによって試料を支承し、内部に真空ポンプ
に接続される真空排気孔を設けた真空吸着器を備えた真
空吸着装置であって、前記真空吸着器の上面に前記真空
排気孔が連通する凹部によって形成された真空吸着部
と、この真空吸着部を取り囲む環状の突部によって形成
された第1の静圧シール部と、この第1の静圧シール部
を取り囲む環状溝と、この環状溝を取り囲む環状の突部
によって形成された第2の静圧シール部とを設け、前記
真空吸着器の内部に一端が前記環状溝に連通し他端が前
記真空吸着器の側面に開口して陽圧供給手段に接続され
る陽圧供給孔を設け、前記第1、第2の静圧シール部の
突子を真空吸着部の突子よりきわめて短く設定すること
により前記第1、第2の静圧シール部の上面と前記試料
との間に微小隙間が形成されるようにしたので、従来の
ように試料の裏面外周部を支承するランド部を設ける必
要がなく突子のみによって支承するから、試料と真空吸
着器の接触面積を小さくすることができる。したがっ
て、ダストの影響が少なく、試料の反りや曲がりを矯正
して高い平面を得ることができる。また、加工時に第
1、第2の静圧シール部は陽圧状態となることにより外
部からダストや加工液が侵入することはない。
As described above, in the vacuum suction apparatus according to the present invention, the sample is supported only by a number of protrusions having the same thickness on the upper surface and connected to the vacuum pump. What is claimed is: 1. A vacuum suction device comprising a vacuum suction device provided with a vacuum exhaust hole, comprising: a vacuum suction portion formed on a top surface of the vacuum suction device by a concave portion communicating with the vacuum exhaust hole; and a ring surrounding the vacuum suction portion. , A first hydrostatic seal portion formed by the projections, an annular groove surrounding the first hydrostatic seal portion, and a second hydrostatic seal portion formed by the annular protrusion surrounding the annular groove A positive pressure supply hole having one end communicating with the annular groove and the other end opened to a side surface of the vacuum adsorber and connected to positive pressure supply means inside the vacuum adsorber; And the protrusion of the second static pressure seal portion is By setting the length to be extremely shorter than that of the sample, a minute gap is formed between the upper surfaces of the first and second hydrostatic seal portions and the sample. Since it is not necessary to provide a land portion to be supported and only the protrusion is used, the contact area between the sample and the vacuum adsorber can be reduced. Therefore, the influence of dust is small, and a high flat surface can be obtained by correcting the warpage or bending of the sample. In addition, since the first and second static pressure seal portions are in a positive pressure state during processing, dust and processing liquid do not enter from outside.

【0024】また、本発明は、真空吸着部を凹部によっ
て形成したので、真空排気部内の真空圧分布が均一とな
り、試料を良好に吸着することができる。
Further, in the present invention, since the vacuum suction portion is formed by the concave portion, the vacuum pressure distribution in the vacuum exhaust portion becomes uniform, and the sample can be suctioned satisfactorily.

【0025】また、本発明は、真空吸着部と第1,第2
の静圧シール部を同一平面に形成したので、真空吸着器
の加工形成が容易である。
Also, the present invention provides a vacuum suction part and first and second
Since the static pressure seal portion is formed on the same plane, the vacuum suction device can be easily formed.

【0026】また、本発明は、真空吸着器に真空吸着部
と第1の静圧シール部との間に環状の真空排気溝を形成
し、これに真空排気孔を接続したので、真空排気時の真
空の立ち上がりを向上させることができ、短時間で試料
を真空吸着することができる。
Further, according to the present invention, a vacuum evacuation groove is formed between the vacuum suction part and the first static pressure seal part in the vacuum adsorber, and a vacuum evacuation hole is connected to this groove. Can be improved, and the sample can be vacuum-adsorbed in a short time.

【0027】また、本発明は、第1,第2の静圧シール
部間に環状溝を設け、この環状溝に環状のシール部材を
備えたリングを配置し、真空吸引時および陽圧空気の供
給時にシール部材を試料の裏面に密着させるようにした
ので、真空吸着時および陽圧空気の供給時に真空吸着部
を確実に真空封止することができる。また、このような
シール部材を用いると、上方に大きく反った試料を吸着
する際に真空吸着部の真空度を上げることができ、試料
を確実に真空吸着することができる。
Further, according to the present invention, an annular groove is provided between the first and second static pressure seal portions, and a ring provided with an annular seal member is disposed in the annular groove. Since the seal member is brought into close contact with the back surface of the sample at the time of supply, the vacuum suction portion can be reliably vacuum-sealed at the time of vacuum suction and at the time of supply of positive pressure air. Further, when such a seal member is used, the degree of vacuum of the vacuum suction part can be increased when a sample that is greatly warped upward is sucked, and the sample can be reliably sucked by vacuum.

【0028】さらに、本発明は、第2の静圧シール部を
第1の静圧シール部より低く設定し、陽圧空気に対する
第2の静圧シール部の抵抗を第1の静圧シール部の抵抗
より小さくしたので、陽圧空気を試料と第2の静圧シー
ル部間の微小隙間を通って真空吸着器の外部に排出する
ことができ、第1の静圧シール部に流れ込む空気の量を
少なくすることができる。
Further, according to the present invention, the second static pressure seal portion is set lower than the first static pressure seal portion, and the resistance of the second static pressure seal portion to positive pressure air is reduced by the first static pressure seal portion. , The positive pressure air can be discharged to the outside of the vacuum adsorber through the minute gap between the sample and the second static pressure seal portion, and the air flowing into the first static pressure seal portion can be discharged. The amount can be reduced.

【図面の簡単な説明】[Brief description of the drawings]

【図1】 (a)、(b)は本発明に係る真空吸着装置
を構成する真空吸着器の第1の実施例を示す平面図およ
び要部の拡大断面図である。
FIGS. 1 (a) and 1 (b) are a plan view and an enlarged sectional view of a main part showing a first embodiment of a vacuum suction device constituting a vacuum suction device according to the present invention.

【図2】 (a)、(b)は本発明の第2の実施例を示
す真空吸着器の平面図および要部の拡大断面図である。
FIGS. 2A and 2B are a plan view and an enlarged sectional view of a main part of a vacuum suction device showing a second embodiment of the present invention.

【図3】 本発明の第3の実施例を示す真空吸着器の要
部の拡大断面図である。
FIG. 3 is an enlarged sectional view of a main part of a vacuum suction device showing a third embodiment of the present invention.

【図4】 本発明の第4の実施例を示す真空吸着器の要
部の拡大断面図である。
FIG. 4 is an enlarged sectional view of a main part of a vacuum suction device showing a fourth embodiment of the present invention.

【図5】 (a)、(b)は従来の真空吸着器の平面図
および要部の拡大断面図である。
FIGS. 5A and 5B are a plan view and an enlarged sectional view of a main part of a conventional vacuum suction device.

【符号の説明】[Explanation of symbols]

1…真空吸着器、2…突子、3…真空吸着部、4…ラン
ド部、5…真空排気孔、6…試料、11,12…突子、
13…第1の静圧シール部、14…第2の静圧シール
部、15…環状溝、17…陽圧供給孔、22…陽圧空
気、23,24…微小隙間、30…真空排気溝、31…
静圧シール部、32…リング、33…シール部材、35
…微小隙間、37,38…段差部。
DESCRIPTION OF SYMBOLS 1 ... Vacuum adsorber, 2 ... Projection, 3 ... Vacuum adsorption part, 4 ... Land part, 5 ... Vacuum exhaust hole, 6 ... Sample, 11, 12 ... Projection,
13: first static pressure seal portion, 14: second static pressure seal portion, 15: annular groove, 17: positive pressure supply hole, 22: positive pressure air, 23, 24: minute gap, 30: vacuum exhaust groove , 31 ...
Static pressure seal part, 32 ... ring, 33 ... seal member, 35
... minute gaps, 37, 38 ... steps.

───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 昭63−226939(JP,A) 特開 昭62−221130(JP,A) 特開 昭62−24639(JP,A) 特開 昭63−141670(JP,A) 特開 平5−326677(JP,A) 特開 平5−235151(JP,A) 実開 昭59−187147(JP,U) 実開 昭59−36245(JP,U) 実開 昭60−130647(JP,U) 実開 昭58−18341(JP,U) 実開 昭62−100835(JP,U) 実開 平7−31245(JP,U) (58)調査した分野(Int.Cl.7,DB名) H01L 21/68 H01L 21/301 H01L 21/304 H01L 21/027 H01L 21/46 ──────────────────────────────────────────────────続 き Continuation of front page (56) References JP-A-63-226939 (JP, A) JP-A-62-221130 (JP, A) JP-A-62-24639 (JP, A) JP-A-63-22639 141670 (JP, A) JP-A-5-326677 (JP, A) JP-A-5-235151 (JP, A) Japanese Utility Model Application No. Sho 59-187147 (JP, U) Japanese Utility Model Application No. Sho 59-36245 (JP, U) Japanese Utility Model Showa 60-130647 (JP, U) Japanese Utility Model Showa 58-18341 (JP, U) Japanese Utility Model Showa 62-100835 (JP, U) Japanese Utility Model Utility Model 7-31245 (JP, U) (58) (Int.Cl. 7 , DB name) H01L 21/68 H01L 21/301 H01L 21/304 H01L 21/027 H01L 21/46

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 上面が同一平面上にある同一の太さから
なる多数の突子のみによって試料を支承し、内部に真空
ポンプに接続される真空排気孔を設けた真空吸着器を備
えた真空吸着装置であって、前記真空吸着器の上面に前
記真空排気孔が連通する凹部によって形成された真空吸
着部と、この真空吸着部を取り囲む環状の突部によって
形成された第1の静圧シール部と、この第1の静圧シー
ル部を取り囲む環状溝と、この環状溝を取り囲む環状の
突部によって形成された第2の静圧シール部とを設け、
前記真空吸着器の内部に一端が前記環状溝に連通し他端
が前記真空吸着器の側面に開口して陽圧供給手段に接続
される陽圧供給孔を設け、前記第1、第2の静圧シール
部の突子を真空吸着部の突子よりきわめて短く設定する
ことにより前記第1、第2の静圧シール部の上面と前記
試料との間に微小隙間が形成されるようにし、前記第2
の静圧シール部を前記第1の静圧シール部より低くした
ことを特徴とする真空吸着装置。
1. A vacuum provided with a vacuum adsorber which supports a sample only by a number of protrusions having the same thickness and having the same upper surface and having a vacuum exhaust hole connected to a vacuum pump inside. A suction device, comprising: a vacuum suction portion formed by a concave portion in which the vacuum exhaust hole communicates with an upper surface of the vacuum suction device; and a first static pressure seal formed by an annular protrusion surrounding the vacuum suction portion. An annular groove surrounding the first hydrostatic seal portion, and a second hydrostatic seal portion formed by an annular protrusion surrounding the annular groove,
A positive pressure supply hole having one end communicating with the annular groove and the other end opened to a side surface of the vacuum suction device and connected to a positive pressure supply means is provided inside the vacuum suction device, and the first and second holes are provided. the projections of the static pressure seal portion as small gap is formed between the first by setting extremely shorter than projections of the vacuum suction portion, and the upper surface of the second static pressure seal portion and the sample , The second
The vacuum suction device according to claim 1, wherein the static pressure seal portion is lower than the first static pressure seal portion .
【請求項2】 上面が同一平面上にある多数の突子のみ
によって試料を支承し、内部に真空ポンプに接続される
真空排気孔を設けた真空吸着器を備えた真空吸着装置で
あって、前記真空吸着器の上面に真空吸着部と、この真
空吸着部を取り囲み前記真空排気孔が連通する真空排気
溝と、前記真空吸着部と同一平面を形成し前記真空排気
を取り囲む環状の第1の静圧シール部と、この第1の
静圧シール部を取り囲む環状溝と、前記真空吸着部およ
び第1の静圧シール部と同一平面を形成し前記環状溝を
取り囲む環状の第2の静圧シール部とを設け、前記真空
吸着器の内部に前記環状溝に連通する陽圧供給孔を設け
たことを特徴とする真空吸着装置。
2. A vacuum suction device comprising a vacuum suction device provided with a vacuum evacuation hole for supporting a sample only by a large number of projections having an upper surface on the same plane, and having a vacuum pumping hole connected to a vacuum pump therein. Forming a vacuum suction portion on the upper surface of the vacuum suction device, a vacuum exhaust groove surrounding the vacuum suction portion and communicating with the vacuum exhaust hole, and forming the vacuum exhaust portion on the same plane as the vacuum suction portion;
An annular first static pressure sealing portion surrounding the groove, an annular groove surrounding the first static pressure sealing portion, and an annular groove forming the same plane as the vacuum suction portion and the first static pressure sealing portion; A vacuum suction device, comprising: an annular second static pressure seal portion surrounding the positive pressure supply hole communicating with the annular groove inside the vacuum suction device.
JP8237195A 1995-04-07 1995-04-07 Vacuum suction device Expired - Lifetime JP3312164B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8237195A JP3312164B2 (en) 1995-04-07 1995-04-07 Vacuum suction device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8237195A JP3312164B2 (en) 1995-04-07 1995-04-07 Vacuum suction device

Publications (2)

Publication Number Publication Date
JPH08279549A JPH08279549A (en) 1996-10-22
JP3312164B2 true JP3312164B2 (en) 2002-08-05

Family

ID=13772739

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8237195A Expired - Lifetime JP3312164B2 (en) 1995-04-07 1995-04-07 Vacuum suction device

Country Status (1)

Country Link
JP (1) JP3312164B2 (en)

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