JP3775173B2 - Manufacturing method of microlens substrate - Google Patents

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a method for manufacturing a microlens substrate, a counter substrate for a liquid crystal panel, a liquid crystal panel, and a projection display device.
[0002]
[Prior art]
A projection display device that projects an image on a screen is known. In such a projection display device, a liquid crystal panel is mainly used for image formation.
[0003]
Among liquid crystal panels having such a configuration, there are known ones in which a large number of minute microlenses are provided at positions corresponding to the respective pixels of the liquid crystal panel in order to increase the light use efficiency. Such a microlens is usually formed on a microlens substrate provided in a liquid crystal panel.
[0004]
The microlens substrate has a glass substrate provided with a large number of hemispherical recesses, and a glass layer bonded via a resin layer to the surface of the glass substrate provided with the recesses, and the resin In the layer, the microlens is formed by the resin filled in the recess.
[0005]
In such a microlens substrate, first, an uncured resin is supplied onto the glass substrate, then the glass layer is bonded to the glass substrate through the resin, and then the resin is cured to form the resin layer. It is manufactured by doing.
[0006]
Thus, when manufacturing a microlens substrate, when joining a glass layer to a glass substrate, the resin which comprises a resin layer protrudes from these side surfaces, and the part which adheres arises.
[0007]
If such a portion is present, the glass layer may become an obstacle during operations such as grinding and polishing, and the operability may be reduced, and the glass layer and other surfaces of the microlens substrate may be damaged. is there.
[0008]
In Japanese Patent Laid-Open No. 9-90360, in order to prevent the resin from protruding from the glass substrate, a device in which, for example, a groove or a water repellent region is provided on the outer periphery of the region where the concave portion of the glass substrate is provided is proposed. Has been.
[0009]
By applying such grooves and water-repellent regions to a conventional microlens substrate, it is possible to prevent the resin from sticking out and adhering to the glass layer and the side surface of the glass substrate.
[0010]
However, in order to provide such a groove, a water-repellent region, etc. in the microlens substrate, a process (operation) for forming these is necessary, which is disadvantageous because it increases the manufacturing cost of the microlens substrate.
[0011]
[Problems to be solved by the invention]
An object of the present invention is to provide a method for manufacturing a microlens substrate, a counter substrate for a liquid crystal panel, a liquid crystal panel, and a projection display device that can easily remove unnecessary resin and have excellent manufacturing efficiency.
[0012]
[Means for Solving the Problems]
Such an object is achieved by the present inventions (1) to (23) below.
[0013]
(1) Laminate forming step of joining a second substrate via a resin on a first substrate provided with a plurality of recesses to form a laminate of the first substrate and the second substrate When,
A microlens forming step of solidifying the resin to form a microlens in the recess;
And a removing step of removing at least a part of the resin adhering to the side surface of the laminate.
[0014]
(2) The method for producing a microlens substrate according to (1), wherein the resin adhering to the side surface of the laminate is removed by bringing a removing liquid into contact with the resin adhering to the side surface of the laminate.
[0015]
(3) The method for manufacturing a microlens substrate according to (2) above, wherein the resin adhered to the side surface of the laminate is brought into contact with the removal solution by immersing the laminate in the removal solution.
[0016]
(4) The method for manufacturing a microlens substrate according to (2) or (3), wherein the removal liquid is brought into contact with the laminated body while the laminated body or the removal liquid is rocked or vibrated.
[0017]
(5) The microlens substrate manufacturing method according to any one of (2) to (4), wherein the removal liquid is an acid or alkaline aqueous solution that peels or dissolves the resin attached to the side surface of the laminate.
[0018]
(6) The method for manufacturing a microlens substrate according to any one of (2) to (4), wherein the removal liquid is an organic resin peeling liquid that peels or dissolves the resin attached to the side surface of the laminate. .
[0019]
(7) The method for producing a microlens substrate according to any one of (2) to (6), wherein the temperature of the removal liquid is 20 to 100 ° C.
[0020]
(8) The method for producing a microlens substrate according to any one of (2) to (7), wherein the contact time of the removal liquid is 30 seconds to 1 hour.
[0021]
(9) The method for manufacturing a microlens substrate according to any one of (1) to (8), further including a cleaning step of cleaning the stacked body after the removing step.
[0022]
(10) The cleaning is performed using a cleaning liquid,
The method for producing a microlens substrate according to (9), wherein the temperature difference between the cleaning liquid and the removal liquid is 40 ° C. or more.
[0023]
(11) The method for manufacturing a microlens substrate according to (9), wherein the cleaning is performed at least twice.
[0024]
(12) The cleaning is performed using a cleaning liquid,
First, the substrate is first cleaned using a first cleaning solution having a temperature difference from the removal solution of less than 40 ° C.
Next, the microlens substrate manufacturing method according to (11), wherein the second cleaning of the substrate is performed using a second cleaning liquid having a temperature lower than that of the first cleaning liquid.
[0025]
(13) The method for manufacturing a microlens substrate according to any one of (10) to (12), wherein water is used as the cleaning liquid.
[0026]
(14) The method for manufacturing a microlens substrate according to any one of (9) to (13), wherein the cleaning step is started within 60 minutes after the removing step.
[0027]
(15) The method for manufacturing a microlens substrate according to any one of (9) to (14), further including a step of adjusting a thickness of the second substrate after the cleaning step.
[0028]
(16) The method for manufacturing a microlens substrate according to any one of (1) to (15) above, wherein a distance between end surfaces of the first substrate and the second substrate facing each other is 100 μm or less.
[0029]
(17) A counter substrate for a liquid crystal panel, wherein a transparent conductive film is provided on the microlens substrate manufactured by the method for manufacturing a microlens substrate according to any one of (1) to (16). .
[0030]
(18) A microlens substrate manufactured by the method for manufacturing a microlens substrate according to any one of (1) to (16), a black matrix provided on the microlens substrate, and covering the black matrix A counter substrate for a liquid crystal panel, comprising a transparent conductive film.
[0031]
(19) A liquid crystal panel comprising the counter substrate for a liquid crystal panel according to (17) or (18).
[0032]
(20) A liquid crystal drive substrate provided with pixel electrodes, a liquid crystal panel counter substrate according to (17) or (18) bonded to the liquid crystal drive substrate, the liquid crystal drive substrate, and the liquid crystal panel counter substrate And a liquid crystal sealed in the gap.
[0033]
(21) The liquid crystal panel according to (20), wherein the liquid crystal driving substrate is a TFT substrate having the pixel electrodes arranged in a matrix and thin film transistors connected to the pixel electrodes.
[0034]
(22) A projection display device comprising a light valve including the liquid crystal panel according to any one of (19) to (21), and projecting an image using at least one light valve. .
[0035]
(23) Three light valves corresponding to red, green, and blue that form an image, a light source, light from the light source is separated into red, green, and blue light, and the light valve corresponding to each light A projection type display device having a color separation optical system that leads to a color, a color synthesis optical system that synthesizes the images, and a projection optical system that projects the synthesized image,
The light valve includes the liquid crystal panel according to any one of (19) to (21).
[0036]
DETAILED DESCRIPTION OF THE INVENTION
In the present invention, the microlens substrate and the counter substrate for a liquid crystal panel include both an individual substrate and a wafer.
[0037]
Hereinafter, the present invention will be described in detail based on preferred embodiments shown in the accompanying drawings. Note that the microlens substrate shown in the following embodiments will be described as an example in which the microlens substrate is used as a constituent member of a liquid crystal panel.
[0038]
FIG. 1 is a schematic longitudinal sectional view showing an embodiment of a microlens substrate.
As shown in FIG. 1, the microlens substrate 1 includes a substrate (first substrate) 2 with a concave portion for microlenses provided with a plurality of (many) concave portions (concave portions for microlens) 3 having a concave curved surface. It has a surface layer (second substrate) 8 bonded via a resin layer (adhesive layer) 9 to the surface provided with the recess 3 of the substrate with recesses 2 for microlenses, and the resin layer 9 Then, the microlens 4 is formed of the resin filled in the recess 3.
[0039]
The substrate 2 with concave portions for microlenses is manufactured from a flat base material (transparent substrate) 29, and a plurality of (many) concave portions 3 are formed on the surface thereof.
[0040]
In the substrate 2 with concave portions for microlenses, the base material 29 is made of glass or the like, for example.
[0041]
When the microlens substrate 1 is used for a liquid crystal panel and the liquid crystal panel has a glass substrate (for example, a glass substrate 171 described later) in addition to the base material 29, the thermal expansion coefficient of the base material 29 is such that the liquid crystal panel It is preferable that it is substantially the same as the thermal expansion coefficient of the other glass substrate (for example, the ratio of both thermal expansion coefficients is about 1/10 to 10). As a result, in the obtained liquid crystal panel, warpage, deflection, peeling, and the like caused by differences in the thermal expansion coefficients of the two when the temperature changes are prevented.
[0042]
From this point of view, the base material 29 and the other glass substrate of the liquid crystal panel are preferably made of the same type of material. This effectively prevents warpage, deflection, peeling, and the like due to differences in the thermal expansion coefficient when the temperature changes.
[0043]
In particular, when the microlens substrate 1 is used for a high-temperature polysilicon TFT liquid crystal panel, the base material 29 is preferably made of quartz glass. The TFT liquid crystal panel has a TFT substrate as a liquid crystal driving substrate. For such a TFT substrate, quartz glass whose characteristics are unlikely to change depending on the manufacturing environment is preferably used. For this reason, by forming the base material 29 of quartz glass corresponding to this, it is possible to obtain a TFT liquid crystal panel excellent in stability, in which warpage, deflection and the like are unlikely to occur.
[0044]
The thickness of the base material 29 varies depending on various conditions such as the material constituting the base material 29 and the refractive index, but is usually about 0.3 to 5 mm, more preferably about 0.5 to 2 mm. . In the case where the microlens substrate 1 is configured such that light enters from the resin layer 9 side and exits from the base material 29 side, the thickness of the base material 29 is preferably about 10 to 1000 μm, and more preferably. Is about 20 to 150 μm.
[0045]
A resin layer (adhesive layer) 9 covering the recess 3 is provided on the upper surface of the substrate 2 with recesses for microlenses.
[0046]
The microlenses 4 are formed in the recesses 3 by filling the constituent material of the resin layer 9.
[0047]
The resin layer 9 can be made of, for example, a resin (adhesive) having a refractive index higher than that of the constituent material of the base material 29, such as an acrylic resin, an epoxy resin, or an acrylic epoxy type. It can be suitably configured with an ultraviolet curable resin or the like.
[0048]
A flat surface layer 8 is provided on the upper surface of the resin layer 9.
The surface layer (glass layer) 8 can be made of glass, for example. In this case, it is preferable that the thermal expansion coefficient of the surface layer 8 is approximately equal to the thermal expansion coefficient of the base material 29 (for example, the ratio of the thermal expansion coefficients of both is about 1/10 to 10). As a result, warpage, deflection, peeling, and the like caused by the difference in thermal expansion coefficient between the base material 29 and the surface layer 8 are prevented. Such an effect can be obtained more effectively if the base material 29 and the surface layer 8 are made of the same kind of material.
[0049]
When the microlens substrate 1 is used in a liquid crystal panel, the thickness of the surface layer 8 is usually about 5 to 1000 μm, more preferably about 10 to 150 μm from the viewpoint of obtaining necessary optical characteristics. When the liquid crystal panel is configured to receive light from the surface layer 8 side, the thickness of the surface layer 8 is preferably about 0.3 to 5 mm, more preferably about 0.5 to 2 mm. .
[0050]
In addition, the surface layer (barrier layer) 8 can also be comprised, for example with ceramics. As ceramics, for example, nitride ceramics such as AlN, SiN, TiN, and BN, Al ₂ O _Three TiO ₂ And oxide ceramics such as WC, TiC, ZrC, and TaC. When the surface layer 8 is made of ceramics, the thickness of the surface layer 8 is not particularly limited, but is preferably about 20 nm to 20 μm, and more preferably about 40 nm to 1 μm.
Such a surface layer 8 can be omitted if necessary.
[0051]
Such a microlens substrate 1 can be manufactured as follows, for example. Hereinafter, a method for manufacturing a microlens substrate will be described with reference to FIGS.
[0052]
First, a base material 29 made of, for example, an unprocessed glass substrate is prepared. As the base material 29, a material having a uniform thickness and free from bending and scratches is preferably used.
[0053]
<1> First, the mask layer 6 is formed on the surface of the base material 29 as shown in FIG. At the same time, a back surface protective layer 69 is formed on the back surface of the base material 29 (the surface opposite to the surface on which the mask layer 6 is formed).
[0054]
This mask layer 6 preferably has resistance in the operation in step <3> described later.
[0055]
From this point of view, examples of the material constituting the mask layer 6 include metals such as Au / Cr, Au / Ti, Pt / Cr, and Pt / Ti, silicon such as polycrystalline silicon (polysilicon) and amorphous silicon, Examples thereof include silicon nitride.
[0056]
The thickness of the mask layer 6 is not particularly limited, but is preferably about 0.01 to 10 μm, and more preferably about 0.1 to 1 μm. If the thickness is less than the lower limit of this range, the base material 29 may not be sufficiently protected. If the thickness exceeds the upper limit, the mask layer 6 may be easily peeled off due to internal stress of the mask layer 6.
[0057]
The mask layer 6 can be formed by, for example, a chemical vapor deposition method (CVD method), a vapor deposition method such as a sputtering method or a vapor deposition method, or plating.
[0058]
The back surface protective layer 69 is for protecting the back surface of the base material 29 in the subsequent steps. The back surface protective layer 69 suitably prevents the back surface of the base material 29 from being eroded or deteriorated. The back surface protective layer 69 can be made of the same material as that of the mask layer 6, for example. For this reason, the back surface protective layer 69 can be provided in the same manner as the mask layer 6 simultaneously with the formation of the mask layer 6. The back surface protective layer 69 may not be provided.
[0059]
<2> Next, as shown in FIG. 2B, a plurality of openings 61 are formed in the mask layer 6.
[0060]
The opening 61 is provided at a position where the recess 3 is formed. It is preferable that the shape (planar shape) of the opening 61 corresponds to the shape (planar shape) of the recess 3 to be formed.
[0061]
The opening 61 can be formed by, for example, a photolithography method. Specifically, first, a resist layer (not shown) having a pattern corresponding to the opening 61 is formed on the mask layer 6. Next, a part of the mask layer 6 is removed using the resist layer as a mask. Next, the resist layer is removed.
[0062]
The mask layer 6 can be partially removed by, for example, dry etching using CF gas, chlorine-based gas, or the like, or immersion (wet etching) in a stripping solution such as hydrofluoric acid + nitric acid aqueous solution or alkaline aqueous solution.
[0063]
<3> Next, as shown in FIG. 2C, a plurality of (many) concave portions 3 having concave curved surfaces are formed on the base material 29 using the openings 61.
[0064]
Examples of the method for forming the recess 3 include a dry etching method and a wet etching method. For example, by performing etching, the base material 29 is etched isotropically from the opening 61, and the concave portion 3 having a lens shape is formed. In particular, according to the wet etching method, it is possible to form the recess 3 having a more ideal lens shape. As an etchant for performing wet etching, for example, a hydrofluoric acid-based etchant is preferably used.
[0065]
<4> Next, as shown in FIG. 2D, the mask layer 6 is removed. At this time, the back surface protective layer 69 is also removed together with the removal of the mask layer 6.
[0066]
This can be achieved by, for example, immersion in a stripping solution (wet etching) such as an alkaline aqueous solution (eg, tetramethylammonium hydroxide aqueous solution), hydrochloric acid + nitric acid aqueous solution, hydrofluoric acid + nitric acid aqueous solution, dry etching using CF gas, chlorine-based gas, or the like. Etc.
[0067]
Thereby, as shown in FIG.2 (d), the board | substrate 2 with a concave part for microlenses by which the several (large number) recessed part 3 was formed in the surface is obtained.
[0068]
<5> Next, a resin having a refractive index higher than the refractive index of the material constituting the base material 29 is filled in the concave portion 3 of the obtained substrate 2 with concave portions for microlenses.
[0069]
This can be performed, for example, by applying an uncured resin (adhesive) to the entire surface of the base material 29 where the recesses 3 are formed.
[0070]
<6> Next, the surface layer 8 made of glass, for example, is placed on the resin supplied onto the base material 29 in the step <5> (the surface layer 8 is brought into close contact with the resin).
[0071]
<7> Next, the resin layer 9 is formed by solidifying (curing) the resin. As a result, the surface layer 8 is bonded to the microlens recessed substrate 2 via the resin layer 9. Further, in the concave portion 3, the microlens 4 is formed by the resin constituting the resin layer 9.
[0072]
The resin can be solidified by, for example, irradiating the resin with ultraviolet rays or an electron beam, or heating the resin.
[0073]
Through the above-described steps, a laminate (microlens substrate intermediate) 1 ′ of the substrate with concave portions for microlenses (first substrate) 2 and the surface layer (second substrate) 8 is obtained (FIG. 2 (e) and (See FIG. 3).
[0074]
In this laminated body 1 ′, the resin constituting the resin layer 9 is adhered to the side surface thereof, and an adhesion portion 91 is formed.
[0075]
The cause of the attachment 91 is as follows. In the step <6>, the substrate 2 with concave portions for microlenses is used to remove a certain amount of excess resin (resin more than necessary for constituting the resin layer 9) so that no bubbles remain in the concave portions 3. Then, the surface layer 8 is stacked on the upper surface and pressed from the upper surface. As a result, the resin flows so as to spread over the entire surface, and after the inside of the recess 3 is sufficiently filled, the excess part protrudes from the end of the laminate 1 ′ and adheres to the side surface of the laminate 1 ′. 91 is formed.
[0076]
Such an adhering portion 91 becomes an obstacle in the operation of adjusting the thickness of the surface layer 8 in the step <11> to be described later. For example, the operability of the surface layer 8 or the other laminated body 1 ′ is reduced. Inconveniences such as scratching (damaging) the surface occur. For this reason, the adhesion part 91 is removed from laminated body 1 '. Thereafter, the laminate 1 ′ is finally completed as the microlens substrate 1 by the following steps.
[0077]
<8> The adhesion part 91 is removed from the laminated body 1 ′.
The removal of the adhesion part 91 from the laminated body 1 ′ is performed, for example, by bringing the removal liquid into contact with the adhesion part 91.
[0078]
The operation of contacting the removing liquid with the adhesion part 91 is very simple, does not require a large-scale apparatus, and is suitable for mass processing of the laminated body 1 ′. It is advantageous for reduction. Further, such an operation process can be easily incorporated into the production line of the microlens substrate 1.
[0079]
The method of contacting the removal liquid to the attachment portion 91 is not particularly limited. For example, a method of immersing the entire laminate 1 ′ in the removal liquid, a method of immersing only the attachment portion 91 in the removal liquid, and a portion where the removal liquid is attached. The method of spraying (showering) directly to 91 etc. is mentioned, Among these, the method of immersing the whole laminated body 1 'in a removal liquid is preferable. By using such a contact method (immersion method) of the removal liquid to the adhesion part 91, the adhesion part 91 is more easily and reliably removed from the laminate 1 ′. Moreover, this immersion method has the advantage that many laminated bodies 1 'can be processed simultaneously, and it is advantageous for mass production.
[0080]
When attention is paid to the method of contacting the removal liquid to the adhering portion 91, the thickness of the resin layer 9, more specifically, the substrate 2 with concave portions for microlenses (where the original thickness is provided) and The distance between the end surfaces facing each other with the surface layer 8 is preferably 100 μm or less, and more preferably 20 μm or less. By reducing the thickness of the resin layer 9 in this way, the removal liquid enters the laminated body 1 ′, that is, near the portion where the concave portion 3 of the substrate 2 with the microlens concave portion is formed. Can be prevented more reliably. For this reason, it is possible to suitably prevent the resin layer 9 from floating or peeling off.
[0081]
Further, in this case, it is preferable to perform the laminate 1 ′ itself or the removal liquid while vibrating, for example, swinging or ultrasonic vibration. Thereby, the removal efficiency from the laminated body 1 'of the adhesion part 91 improves.
[0082]
Such a removing liquid may be any one that can peel or dissolve the adhering portion 91. For example, an acid or alkali aqueous solution, an organic resin peeling liquid, or the like can be used.
[0083]
As the acid aqueous solution, for example, one or two or more of aqueous solutions of sulfuric acid, hydrochloric acid, nitric acid, phosphoric acid, chromic acid, formic acid and the like can be used.
[0084]
Although it does not specifically limit as a density | concentration of acid aqueous solution, For example, it is preferable to set it as about 10 to 30%.
[0085]
The pH of the acid aqueous solution is not particularly limited, but is preferably about 1-2, for example.
[0086]
As the aqueous alkaline solution, for example, one or a combination of two or more of aqueous solutions of sodium hydroxide, potassium hydroxide, calcium hydroxide, sodium hydrogen carbonate, ammonia and the like can be used.
[0087]
Although it does not specifically limit as a density | concentration of aqueous alkali solution, For example, it is preferable to set it as about 5 to 50%.
[0088]
Moreover, it is although it does not specifically limit as pH of aqueous alkali solution, For example, it is preferable to set it as about 10-14.
[0089]
Moreover, you may add oxidizing agents, such as hydrogen peroxide, a hypochlorite, a chlorite, for example in acid or alkali aqueous solution as needed.
[0090]
As the organic resin stripping solution, for example, one or two or more of N-methylpyrrolidone, monobutyl ether, dimethylformamide, acetonitrile, dichloromethane and the like can be used.
[0091]
Although it does not specifically limit as temperature of such a removal liquid, For example, it is preferable that it is about 20-100 degreeC, and it is more preferable that it is about 40-100 degreeC. By setting the temperature of the removal agent within the above range, the removal efficiency of the adhesion portion 91 from the stacked body 1 ′ is improved.
[0092]
In addition, the contact time between the adhering portion 91 and the removal liquid is not particularly limited, but for example, it is preferably about 30 seconds to 1 hour, and more preferably about 2 to 40 minutes. By making the contact time of the removal liquid within the above range, the removal efficiency of the adhesion portion 91 from the stacked body 1 ′ is improved.
[0093]
Note that, according to the present invention, the removal of the adhering portion 91 is performed prior to the below-described step <11>. For this reason, in the operation of adjusting the thickness of the surface layer 8, the adhering portion 91 becomes an obstacle, and the operability thereof is reduced, or the surface of the surface layer 8 and other laminate 1 ′ is scratched (damaged). Can be prevented more reliably.
[0094]
Further, such an adhesion portion 91 does not necessarily have to be removed as long as it is removed to the extent that there is no problem in manufacturing the liquid crystal panel facing substrate 10 and the liquid crystal panel 16 described later.
[0095]
<9> The laminated body 1 ′ from which the adhesion portion 91 has been removed is washed. Thereby, the removal liquid remaining on the outer peripheral portion of the laminate 1 ′ can be removed. Such cleaning is performed using, for example, a cleaning liquid.
[0096]
In this case, the cleaning operation of the laminated body 1 ′ is extremely simple and does not require a large-scale apparatus, which is advantageous for reducing the manufacturing cost of the microlens substrate 1.
[0097]
As such a cleaning liquid, for example, various waters such as pure water, ultrapure water, distilled water, and RO water, and various organic solvents such as acetone, ethyl acetate, methanol, and ethanol can be used. Among these, as the cleaning liquid, it is preferable to use various kinds of water such as pure water, ultrapure water, distilled water, and RO water, and it is more preferable to use ultrapure water.
[0098]
When the laminated body 1 ′ is washed using ultrapure water, the precipitation of impurities can be prevented at a high level.
[0099]
Further, such a cleaning of the laminated body 1 ′ may be performed once, or may be performed twice or more (a plurality of times) under different cleaning conditions (for example, composition of the cleaning liquid, temperature, etc.). Such cleaning has the following advantages depending on the number of cleanings.
[0100]
When the laminated body 1 ′ is cleaned once, the number of cleaning steps can be reduced, which is advantageous for reducing the manufacturing cost of the microlens substrate 1.
[0101]
In this case, the cleaning liquid is preferably used with a temperature difference of about 40 ° C. or more from the removal liquid. When the temperature difference between the cleaning liquid and the removal liquid is set as described above, defects in the resin layer 9 are visualized, so that defects in the resin layer 9 can be identified at a relatively early stage in the manufacturing process of the microlens substrate 1. Become. For this reason, for example, compared with the case where a defect of the resin layer 9 is found at the stage of manufacturing the liquid crystal panel, etc., it is advantageous in reducing the manufacturing cost.
[0102]
On the other hand, when the laminate 1 ′ is washed twice or more (a plurality of times), the removal liquid remaining on the surface of the laminate 1 ′ can be more reliably removed.
[0103]
When the composition of the cleaning liquid is changed as the cleaning condition, for example, the following can be performed. The laminated body 1 ′ is washed with an acid or alkaline aqueous solution as the first washing liquid used for the first time (first washing), and then the laminated body 1 is used at least once with the water as the washing liquid. 'Wash it.
[0104]
Moreover, when changing the temperature of a washing | cleaning liquid as washing conditions, it can be as follows, for example. The temperature of the first cleaning liquid used for the first time (first cleaning) is such that the temperature difference from the removal liquid is less than about 40 ° C., and the temperature of the second cleaning liquid used for the second time (second cleaning) is The temperature of the cleaning liquid is decreased stepwise or continuously so that the temperature is lower than the temperature of one cleaning liquid. Thereby, since laminated body 1 'will be cooled slowly, the burden to the resin layer 9 will reduce and the quality change and deterioration of the resin layer 9 will be prevented more reliably.
[0105]
Further, the cleaning of the laminate 1 ′ is preferably started within 60 minutes and more preferably within 20 minutes after the completion of the step <8>. By starting the cleaning of the laminated body 1 ′ within the above range, it is possible to suitably prevent dirt from adhering to the surface of the laminated body 1 ′ and to reduce the manufacturing time of the microlens substrate 1. become.
[0106]
<10> The laminated body 1 ′ after the cleaning is dried (moisture removed) as necessary.
[0107]
In the step <9>, when the cleaning liquid is used for cleaning, the laminated body 1 ′ is dried by, for example, removing the cleaning liquid by rotating the laminated body 1 ′ at high speed, or removing the cleaning liquid by natural drying. A method of forcibly removing a cleaning liquid by blowing a gas such as air or nitrogen gas, and a stationary atmosphere in a vapor atmosphere of isopropanol, substituting with water adhering to the surface of the laminate 1 'and evaporating A drying method or the like can be used.
[0108]
In addition, this process can be abbreviate | omitted when the laminated body 1 'is wash | cleaned without using a washing | cleaning liquid in the said process <9>.
[0109]
<11> Then, the thickness of the surface layer 8 of the laminate 1 ′ that has been dried in the step <10> is adjusted as necessary.
[0110]
This is performed, for example, by subjecting the surface layer 8 to grinding, polishing, etching or the like.
[0111]
In addition, this process can be abbreviate | omitted when the laminated | stacked surface layer 8 is the optimal thickness for performing a subsequent process.
[0112]
Through the above steps, the microlens substrate 1 shown in FIG. 1 can be obtained.
When the surface layer 8 is made of ceramics, the microlens substrate 1 can be manufactured as follows. The following description will focus on the differences from the method for manufacturing the microlens substrate 1 described above.
First, the same steps as the steps <1> to <5> are performed.
[0113]
<6 ′> Next, a mold material (second substrate; not shown) is placed on the resin (the mold material is brought into close contact with the resin).
As this mold material, one having a flat surface (surface in contact with the resin) is preferably used.
[0114]
<7 ′> Next, the resin is cured to form the resin layer 9.
[0115]
Next, the same steps as the steps <8> to <11> are performed.
<12 ′> Next, the mold material is removed from the resin layer 9. That is, mold release is performed.
[0116]
<13 ′> Thereafter, the surface layer 8 made of ceramics is formed on the resin layer 9.
[0117]
The surface layer 8 can be formed by, for example, a vapor deposition method such as sputtering, CVD, or vapor deposition.
[0118]
Thereby, the microlens board | substrate 1 which has the surface layer 8 comprised with ceramics can be obtained.
[0119]
It goes without saying that the microlens substrate in the present invention can be used for various substrates and various applications such as a microlens substrate for CCD and a microlens substrate for optical communication elements, in addition to the counter substrate for liquid crystal panel and the liquid crystal panel described below. Yes.
[0120]
For example, a black matrix 11 having openings 111 is formed on the surface layer 8 of the microlens substrate 1, and then a transparent conductive film 12 is formed so as to cover the black matrix 11. Can be manufactured (see FIG. 4).
[0121]
The black matrix 11 and the transparent conductive film 12 may be provided not on the surface layer 8 but on the substrate 2 with concave portions for microlenses.
[0122]
The black matrix 11 has a light shielding function and is made of, for example, a metal such as Cr, Al, Al alloy, Ni, Zn, or Ti, a resin in which carbon, titanium, or the like is dispersed.
[0123]
The transparent conductive film 12 has conductivity, for example, indium tin oxide (ITO), indium oxide (IO), tin oxide (SnO). ₂ ) Etc.
[0124]
The black matrix 11 is formed, for example, by forming a thin film to be the black matrix 11 on the surface layer 8 by a vapor deposition method (for example, vapor deposition, sputtering, etc.), and then forming a resist film having a pattern of openings 111 on the thin film. Then, wet etching is performed to form an opening 111 in the thin film, and then the resist film is removed to provide the thin film.
[0125]
Moreover, the transparent conductive film 12 can be provided by vapor phase film-forming methods, such as vapor deposition and sputtering, for example.
[0126]
Thus, the counter substrate 10 for liquid crystal panels can be obtained by forming the black matrix 11 and the transparent conductive film 12 on the microlens substrate 1. When the microlens substrate 1 does not have the surface layer 8, the black matrix 11 or the transparent conductive film 12 may be directly formed on the resin layer 9.
The black matrix 11 may not be provided.
[0127]
Hereinafter, a liquid crystal panel (liquid crystal optical shutter) using such a counter substrate for a liquid crystal panel will be described with reference to FIG.
[0128]
As shown in FIG. 4, the liquid crystal panel (TFT liquid crystal panel) 16 of the present invention includes a TFT substrate (liquid crystal drive substrate) 17, a liquid crystal panel counter substrate 10 bonded to the TFT substrate 17, a TFT substrate 17, and a liquid crystal. And a liquid crystal layer 18 made of liquid crystal sealed in a gap with the panel counter substrate 10.
[0129]
The liquid crystal panel counter substrate 10 is provided on the microlens substrate 1, the surface layer 8 of the microlens substrate 1, the black matrix 11 in which the opening 111 is formed, and the black matrix 11 on the surface layer 8 so as to cover the black matrix 11. The transparent conductive film (common electrode) 12 is provided.
[0130]
The TFT substrate 17 is a substrate for driving the liquid crystal of the liquid crystal layer 18. The TFT substrate 17 is a glass substrate 171 and a plurality of (many) pixel electrodes 172 provided on the glass substrate 171 and arranged in a matrix (matrix). And a plurality of (many) thin film transistors (TFTs) 173 corresponding to the respective pixel electrodes 172. In FIG. 4, the description of the sealing material, the alignment film, the wiring, and the like is omitted.
[0131]
In the liquid crystal panel 16, the TFT substrate 17 and the liquid crystal panel counter substrate 10 are separated from each other by a certain distance so that the transparent conductive film 12 of the liquid crystal panel counter substrate 10 and the pixel electrode 172 of the TFT substrate 17 face each other. Are joined.
[0132]
The glass substrate 171 is preferably made of quartz glass for the reasons described above.
[0133]
The pixel electrode 172 drives the liquid crystal of the liquid crystal layer 18 by charging and discharging with the transparent conductive film (common electrode) 12. The pixel electrode 172 is made of, for example, the same material as that of the transparent conductive film 12 described above.
[0134]
The thin film transistor 173 is connected to the corresponding pixel electrode 172 in the vicinity. The thin film transistor 173 is connected to a control circuit (not shown) and controls a current supplied to the pixel electrode 172. Thereby, charging / discharging of the pixel electrode 172 is controlled.
[0135]
The liquid crystal layer 18 contains liquid crystal molecules (not shown), and the alignment of the liquid crystal molecules, that is, the liquid crystal changes corresponding to the charge / discharge of the pixel electrode 172.
[0136]
In such a liquid crystal panel 16, normally, one microlens 4, one opening 111 of the black matrix 11 corresponding to the optical axis Q of the microlens 4, one pixel electrode 172, and such a pixel One thin film transistor 173 connected to the electrode 172 corresponds to one pixel.
[0137]
Incident light L incident from the counter substrate 10 side for the liquid crystal panel passes through the substrate 2 with concave portions for microlenses and is condensed when passing through the microlenses 4, while opening the resin layer 9, the surface layer 8, and the black matrix 11. 111, the transparent conductive film 12, the liquid crystal layer 18, the pixel electrode 172, and the glass substrate 171 are transmitted. At this time, since a polarizing plate (not shown) is usually disposed on the incident side of the microlens substrate 1, the incident light L is linearly polarized when the incident light L passes through the liquid crystal layer 18. . At this time, the polarization direction of the incident light L is controlled in accordance with the alignment state of the liquid crystal molecules in the liquid crystal layer 18. Therefore, the luminance of the emitted light can be controlled by transmitting the incident light L transmitted through the liquid crystal panel 16 through a polarizing plate (not shown).
[0138]
As described above, the liquid crystal panel 16 includes the microlens 4, and the incident light L that has passed through the microlens 4 is collected and passes through the openings 111 of the black matrix 11. On the other hand, the incident light L is shielded in a portion where the opening 111 of the black matrix 11 is not formed. Therefore, in the liquid crystal panel 16, unnecessary light is prevented from leaking from portions other than the pixels, and attenuation of the incident light L at the pixel portions is suppressed. For this reason, the liquid crystal panel 16 has a high light transmittance in the pixel portion, and can form a bright and clear image with a relatively small amount of light.
[0139]
The liquid crystal panel 16 is obtained by, for example, aligning the TFT substrate 17 manufactured by a known method and the counter substrate 10 for liquid crystal panel, and then joining the two through a sealing material (not shown). The liquid crystal can be injected into the gap portion from the sealing hole (not shown) of the gap portion formed by the above, and then the sealing hole is closed. Thereafter, a polarizing plate may be attached to the incident side or the emission side of the liquid crystal panel 16 as necessary.
[0140]
In the liquid crystal panel 16, a TFT substrate is used as the liquid crystal drive substrate. However, a liquid crystal drive substrate other than the TFT substrate, for example, a TFD substrate, an STN substrate, or the like may be used as the liquid crystal drive substrate.
[0141]
Hereinafter, a projection display device (liquid crystal projector) using the liquid crystal panel 16 will be described.
[0142]
FIG. 5 is a diagram schematically showing an optical system of the projection display device of the present invention.
As shown in the figure, the projection display apparatus 300 includes a light source 301, an illumination optical system including a plurality of integrator lenses, a color separation optical system (light guide optical system) including a plurality of dichroic mirrors, and the like. A liquid crystal light valve (liquid crystal optical shutter array) 24 corresponding to red (liquid crystal optical shutter array) 24 corresponding to red, a liquid crystal light valve (liquid crystal optical shutter array) 25 corresponding to green (liquid crystal optical shutter array) 25, and a liquid crystal light valve corresponding to blue (for blue) ) A liquid crystal light valve (liquid crystal light shutter array) 26, a dichroic prism (color combining optical system) 21 formed with a dichroic mirror surface 211 reflecting only red light and a dichroic mirror surface 212 reflecting only blue light, and projection And a lens (projection optical system) 22.
[0143]
The illumination optical system includes integrator lenses 302 and 303. The color separation optical system includes mirrors 304, 306, and 309, a dichroic mirror 305 that reflects blue light and green light (transmits only red light), a dichroic mirror 307 that reflects only green light, and a dichroic that reflects only blue light. A mirror (or a mirror that reflects blue light) 308 and condenser lenses 310, 311, 312, 313, and 314 are included.
[0144]
The liquid crystal light valve 25 includes the liquid crystal panel 16 described above and a first polarizing plate (not shown) bonded to the incident surface side of the liquid crystal panel 16 (the surface side where the microlens substrate is located, that is, the side opposite to the dichroic prism 21). And a second polarizing plate (not shown) bonded to the exit surface side of the liquid crystal panel 16 (the surface side facing the microlens substrate, that is, the dichroic prism 21 side). The liquid crystal light valves 24 and 26 have the same configuration as the liquid crystal light valve 25. The liquid crystal panels 16 included in the liquid crystal light valves 24, 25 and 26 are connected to driving circuits (not shown).
[0145]
In the projection display device 300, the dichroic prism 21 and the projection lens 22 constitute the optical block 20. The optical block 20 and liquid crystal light valves 24, 25 and 26 fixedly installed on the dichroic prism 21 constitute a display unit 23.
[0146]
Hereinafter, the operation of the projection display apparatus 300 will be described.
White light (white light beam) emitted from the light source 301 passes through the integrator lenses 302 and 303. The light intensity (luminance distribution) of the white light is made uniform by the integrator lenses 302 and 303.
[0147]
The white light transmitted through the integrator lenses 302 and 303 is reflected to the left side in FIG. 5 by the mirror 304, and blue light (B) and green light (G) of the reflected light are respectively reflected by the dichroic mirror 305 in FIG. The red light (R) is reflected downward and passes through the dichroic mirror 305.
[0148]
The red light transmitted through the dichroic mirror 305 is reflected downward in FIG. 5 by the mirror 306, and the reflected light is shaped by the condenser lens 310 and enters the liquid crystal light valve 24 for red.
[0149]
Green light of blue light and green light reflected by the dichroic mirror 305 is reflected to the left side in FIG. 5 by the dichroic mirror 307, and the blue light passes through the dichroic mirror 307.
[0150]
The green light reflected by the dichroic mirror 307 is shaped by the condenser lens 311 and enters the green liquid crystal light valve 25.
[0151]
Further, the blue light transmitted through the dichroic mirror 307 is reflected on the left side in FIG. 5 by the dichroic mirror (or mirror) 308, and the reflected light is reflected on the upper side in FIG. 5 by the mirror 309. The blue light is shaped by the condenser lenses 312, 313, and 314, and enters the liquid crystal light valve 26 for blue.
[0152]
As described above, the white light emitted from the light source 301 is separated into the three primary colors of red, green, and blue by the color separation optical system, and is guided to the corresponding liquid crystal light valve and enters.
[0153]
At this time, each pixel (the thin film transistor 173 and the pixel electrode 172 connected thereto) of the liquid crystal panel 16 included in the liquid crystal light valve 24 is subjected to switching control by a driving circuit (driving means) that operates based on a red image signal. (On / off), ie modulated.
[0154]
Similarly, green light and blue light enter the liquid crystal light valves 25 and 26, respectively, and are modulated by the respective liquid crystal panels 16, thereby forming a green image and a blue image. At this time, each pixel of the liquid crystal panel 16 included in the liquid crystal light valve 25 is subjected to switching control by a drive circuit that operates based on an image signal for green, and each pixel of the liquid crystal panel 16 included in the liquid crystal light valve 26 is used for blue color. Switching control is performed by a drive circuit that operates based on the image signal.
[0155]
As a result, red light, green light, and blue light are modulated by the liquid crystal light valves 24, 25, and 26, respectively, and a red image, a green image, and a blue image are formed, respectively.
[0156]
The red image formed by the liquid crystal light valve 24, that is, red light from the liquid crystal light valve 24, enters the dichroic prism 21 from the surface 213, is reflected to the left side in FIG. 5 by the dichroic mirror surface 211, and is dichroic mirrored. The light passes through the surface 212 and exits from the exit surface 216.
[0157]
Further, the green image formed by the liquid crystal light valve 25, that is, the green light from the liquid crystal light valve 25, enters the dichroic prism 21 from the surface 214, passes through the dichroic mirror surfaces 211 and 212, and exits. The light exits from the surface 216.
[0158]
Further, the blue image formed by the liquid crystal light valve 26, that is, the blue light from the liquid crystal light valve 26 is incident on the dichroic prism 21 from the surface 215, and is reflected by the dichroic mirror surface 212 to the left in FIG. The light passes through the dichroic mirror surface 211 and exits from the exit surface 216.
[0159]
Thus, the light of each color from the liquid crystal light valves 24, 25 and 26, that is, the images formed by the liquid crystal light valves 24, 25 and 26 are synthesized by the dichroic prism 21, thereby forming a color image. Is done. This image is projected (enlarged projection) on the screen 320 installed at a predetermined position by the projection lens 22.
[0160]
【Example】
A microlens substrate was manufactured as follows.
[0161]
First, a raw quartz glass substrate (transparent substrate) having a thickness of about 1.2 mm was prepared as a base material. Next, this quartz glass substrate was cleaned by immersing it in a cleaning solution (mixed solution of sulfuric acid and hydrogen peroxide solution) at 85 ° C. to clean the surface.
[0162]
-1- A 0.4 μm thick polycrystalline silicon film was formed on the front and back surfaces of this quartz glass substrate by CVD.
[0163]
This is done by placing a quartz glass substrate in a CVD furnace set at 600 ° C. and 80 Pa, and adding SiH. _Four At a rate of 300 mL / min.
[0164]
-2- Next, an opening corresponding to the recess to be formed was formed in the formed polycrystalline silicon film.
[0165]
This was done as follows. First, a resist layer having a concave pattern to be formed was formed on the polycrystalline silicon film. Next, the polycrystalline silicon film was dry-etched with CF gas to form openings. Next, the resist layer was removed.
[0166]
-3- Next, the quartz glass substrate was immersed in an etching solution (mixed aqueous solution of 10 wt% hydrofluoric acid + 10 wt% glycerin) for 120 minutes to perform wet etching (etching temperature 30 ° C.) to form a recess on the quartz glass substrate. .
[0167]
-4- Next, the quartz glass substrate was immersed in a 15 wt% tetramethylammonium hydroxide aqueous solution for 5 minutes to remove the polycrystalline silicon films formed on the front and back surfaces.
This obtained the board | substrate with a recessed part for microlenses.
[0168]
-5- Next, an ultraviolet (UV) curable acrylic optical adhesive (refractive index of 1.60) is applied without bubbles on the surface of the substrate with the concave portion for microlens, on which the concave portion is formed. A quartz glass cover glass (surface layer) was bonded to the optical adhesive, and then the optical adhesive was cured by irradiating the optical adhesive with ultraviolet rays to obtain a laminate.
[0169]
When the cover glass was joined, the optical adhesive (resin) protruded and adhered to the side surface of the laminate.
[0170]
-6 Prepare a treatment tank containing a mixed aqueous solution of 85% 80% sulfuric acid and 20% hydrogen peroxide (removed solution, pH = 1.0), and swing the laminate in this treatment tank. While being immersed for 30 minutes, the resin adhering to the side surface of the laminate was removed.
[0171]
-7- One minute after the completion of the step-6-, ultrapure water (cleaning liquid) at 25 ° C. was showered and washed on the laminate 1 ′.
[0172]
-8- Next, the laminate was set in a centrifuge, and ultrapure water was removed and dried at 5,000 rpm for 20 minutes.
[0173]
-9- Finally, the cover glass was ground and polished to a thickness of 50 μm to obtain a microlens substrate having a structure as shown in FIG.
In the obtained microlens substrate, the thickness of the resin layer was 12 μm.
[0174]
(Example 2)
In Step-6, the laminate was fixed and immersed in the treatment tank, and the resin adhering to the side surface of the laminate was removed while vibrating the removal liquid with ultrasonic waves, and Step-7- 1 minute after the completion of step-6-, first, the laminated body 1 ′ is washed with ultrapure water (first cleaning liquid) at 65 ° C. and then with ultrapure water (second cleaning liquid) at 25 ° C. A microlens substrate similar to that of Example 1 was manufactured except that the above was performed.
[0175]
Example 3
A microlens substrate similar to that of Example 1 was manufactured except that N-methylpyrrolidone (removal solution) was used in Step-6.
[0176]
(Evaluation 1)
About each microlens board | substrate of Examples 1-3, the state of the side surface and the surface of a cover glass was respectively observed visually.
[0177]
As a result, in each of the microlens substrates manufactured in Examples 1 to 3, the resin adhering to the side surfaces is almost completely removed, and the surface of the cover glass has defects such as scratches. I was not able to admit.
[0178]
In addition, each of the microlens substrates manufactured in Examples 1 to 3 has a difference between the quartz glass substrate and the cover glass before and after Step-6, and the resin layer in a portion close to the side surface of the microlens substrate. Defects such as floating and peeling were not recognized, and the quality was good.
[0179]
(Evaluation 2)
About each microlens board | substrate manufactured in Examples 1-3, the light shielding film (thickness 0.16 micrometer) by which the opening was provided in the position corresponding to the microlens of a cover glass, respectively using sputtering method and the photolithographic method ( Cr film), that is, a black matrix was formed. Further, an ITO film (transparent conductive film) having a thickness of 0.15 μm was formed on the black matrix by a sputtering method to manufacture a counter substrate for a liquid crystal panel.
[0180]
Furthermore, after aligning the counter substrate for liquid crystal panels and a separately prepared TFT substrate (the glass substrate is made of quartz glass), both were bonded via a sealing material. Next, a liquid crystal is injected into the gap from the gap hole formed between the counter substrate for the liquid crystal panel and the TFT substrate, and then the TFT liquid crystal having a structure as shown in FIG. Each panel was manufactured.
[0181]
Thereafter, a liquid crystal projector (projection display device) having a structure as shown in FIG. 5 was assembled using a TFT liquid crystal panel. As a result, any of the obtained projection images of the liquid crystal projector could be suitably projected.
[0182]
When a microlens substrate whose surface layer is made of ceramics is manufactured, and a liquid crystal panel and a projection display device are manufactured using the microlens substrate in the same manner as described above, the liquid crystal panel and the projection display device are also suitable. I was able to project. In addition, in the step-5-5, the microlens substrate was obtained by bonding a mold material (partner body: second substrate) having a release agent applied to the surface instead of a cover glass to a resin (adhesive); After completion of Steps 6- to -8-, the mold material was peeled off from the resin; thereafter, substantially the same as Example 1 except that a 1 μm thick AlN film was formed on the resin layer by sputtering. Manufactured.
[0183]
【The invention's effect】
As described above, according to the present invention, unnecessary resin can be easily removed, and a microlens substrate can be efficiently manufactured.
[0184]
In particular, according to the present invention, unnecessary resin can be removed from a large number of laminated bodies at the same time, which is advantageous when mass-producing microlens substrates.
[0185]
Furthermore, according to the present invention, it is possible to provide a liquid crystal panel capable of projecting a suitable image, and further a projection display device.
[Brief description of the drawings]
FIG. 1 is a schematic longitudinal sectional view showing an embodiment of a microlens substrate in the present invention.
FIG. 2 is a diagram for explaining a method of manufacturing a microlens substrate in the present invention.
FIG. 3 is a schematic longitudinal sectional view showing a microlens substrate intermediate in the present invention.
FIG. 4 is a schematic longitudinal sectional view showing an embodiment of a liquid crystal panel of the present invention.
FIG. 5 is a diagram schematically showing an optical system of a projection display apparatus in an embodiment of the present invention.
[Explanation of symbols]
1 Microlens substrate
1 'Laminate
2 Substrate with concave for microlenses
29 Base material
3 recess
4 Microlens
6 Mask layer
61 opening
69 Back side protective layer
8 Surface
9 Resin layer
91 Adhering part
10 Counter substrate for LCD panel
11 Black matrix
111 opening
12 Transparent conductive film
16 LCD panel
17 TFT substrate
171 Glass substrate
172 Pixel electrode
173 Thin film transistor
18 Liquid crystal layer
300 Projection display
301 light source
302, 303 Integrator lens
304, 306, 309 Mirror
305, 307, 308 Dichroic mirror
310-314 Condensing lens
320 screens
20 Optical block
21 Dichroic Prism
211, 212 Dichroic mirror surface
213-215
216 Output surface
22 Projection lens
23 Display unit
24-26 Liquid crystal light valve

Claims (10)

  A laminated body forming step of bonding a second substrate via a resin on a first substrate provided with a plurality of recesses to form a laminated body of the first substrate and the second substrate; A microlens formation step of solidifying a resin to form a microlens in the concave portion; and a removal step of removing at least a part of the resin adhering to the side surface of the laminate. A method for producing a microlens substrate, wherein a resin adhering to a side surface of the laminate is removed by bringing a removing liquid into contact with the resin adhering to the side surface of the body.   The method for manufacturing a microlens substrate according to claim 1, wherein a resin adhering to a side surface of the laminated body is brought into contact with the removing liquid by immersing the laminated body in the removing liquid.   The method for manufacturing a microlens substrate according to claim 1 or 2, wherein the removal liquid is brought into contact with the laminated body while the laminated body or the removal liquid is rocked or vibrated.   The method for manufacturing a microlens substrate according to any one of claims 1 to 3, wherein the removal liquid is an acid or alkaline aqueous solution that peels or dissolves the resin attached to the side surface of the laminate.   The method for manufacturing a microlens substrate according to any one of claims 1 to 3, wherein the removing liquid is an organic resin peeling liquid that peels or dissolves a resin attached to a side surface of the laminate.   The method for manufacturing a microlens substrate according to any one of claims 1 to 5, wherein the temperature of the removal liquid is 20 to 100 ° C.   The method for producing a microlens substrate according to claim 1, wherein the contact time of the removal liquid is 30 seconds to 1 hour.   The method of manufacturing a microlens substrate according to claim 1, further comprising a cleaning step of cleaning the stacked body after a removing step of removing the resin adhering to the side surface of the stacked body.   The method for manufacturing a microlens substrate according to claim 8, wherein the cleaning is performed using a cleaning liquid, and a temperature difference between the cleaning liquid and the removal liquid is 40 ° C. or more.   The cleaning is performed using a cleaning liquid. First, the substrate is first cleaned using a first cleaning liquid having a temperature difference from the removal liquid of less than 40 ° C., and then lower than the first cleaning liquid. The method for manufacturing a microlens substrate according to claim 9, wherein the second cleaning of the temperature is performed.

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