JP3894693B2

JP3894693B2 - Coating defect removal method and coating defect removal polishing machine

Info

Publication number: JP3894693B2
Application number: JP35593999A
Authority: JP
Inventors: 規章清水
Original assignee: 3M Innovative Properties Co
Current assignee: 3M Innovative Properties Co
Priority date: 1999-12-15
Filing date: 1999-12-15
Publication date: 2007-03-22
Anticipated expiration: 2019-12-15
Also published as: JP2001179590A

Description

【０００１】
【発明の属する技術分野】
本発明は、例えば自動車の車体表面のような塗装面に発生した、いわゆる、ぶつ、又は、たれ、等と呼ばれるような、微細な凸状の塗装欠陥を除去するための塗装欠陥除去方法、及び該塗装欠陥除去方法を実行するために用いる塗装欠陥除去用研磨機に関する。
【０００２】
【従来の技術】
例えば自動車の車体については、洗浄後、前処理、電着塗装、中塗塗装、上塗塗装の各工程を経るが、特に、上記上塗塗装後において、車体の美観を良くする必要から、上記上塗塗装にて塗装面に発生した、いわゆる、「ぶつ」、「たれ」、「ざら」と呼ばれるような微細な凸状の塗装欠陥を除去する磨き修正工程が必要である。尚、上記ぶつ等は、塗装面が平滑とならずに、凸部を生じた現象であり、アクリルメラミン樹脂系、アミノアルキド樹脂系、ウレタン樹脂系に代表される塗料の凝集物や、異物、被塗装面上のゴミ、スプレーダストの付着や、部分的な過剰塗布が原因で発生する。一般的には、上記ぶつの大きさは約２ｍｍ径以下であり、その高さは０．５ｍｍ程度であり、上記たれの大きさは幅、長さともに約２〜５ｍｍ、最大１０ｍｍ程度で、高さは約０．５ｍｍ程度である。従来、上記磨き修正工程では、上塗面の上記ぶつ等をナイフで削った後、例えば１５００〜２０００番程度の細目のサンドペーパを用いて研磨機又は人手にて研ぎ、その後コンパウンドや艶出しワックスで磨き上げている。
【０００３】
【発明が解決しようとする課題】
上記研磨機としては、上記サンドペーパを取り付けるヘッド部が、図１０に示すように該ヘッド部１を取り付けかつ駆動する、当該研磨機の駆動軸２を中心にして、約３０度の揺動角度にて往復運動するタイプや、上記駆動軸２に対して偏芯した位置に設けられ駆動軸２の回転にて駆動軸２の軸周り方向に回転する支持軸３に上記ヘッド部１が回転自在に取り付けられており上記駆動軸２が回転することで、図１１に示すように、上記ヘッド部１が、上記駆動軸２の軸周り方向に公転するとともに上記支持軸３の軸周り方向にも自転する、ダブルアクションと呼ばれる回転運動タイプがある。
しかしながらこれらの往復運動タイプや回転運動タイプの研磨機では、図１０及び図１１から明らかなように、上記ヘッド部１の中心部分と、外周部分とでは、ヘッド部、つまり該ヘッド部に取り付けられた上記サンドペーパの移動量に差が生じる。即ち、上記ぶつ等に対して研磨機の上記ヘッド部が接触する場所、例えば上記中心部分と上記外周部分とによって研磨量に差が生じてしまう。したがって、上記ぶつ等を研磨するために最適な上記ヘッド部の場所は上記ヘッド部内で非常に狭い範囲であるので、上記磨き修正作業を行うには熟練を要するという問題がある。
【０００４】
又、上記研磨機は、図１２に示すように、上記駆動軸の回転のオン、オフを操作する操作部４の真下に上記ヘッド部１が存在するため、上記ぶつ等の存在位置と、ヘッド部１との相対的な位置関係が作業中に確認し難いという問題もある。
【０００５】
又、上記サンドペーパは、図１３に示すように、基材５上に高さの異なる研磨用粒子６が接着された形態にてなるので、研磨された塗装面における凹凸の高低差を示すＲｙ値が約０．６μｍ程度と大きく、その結果、上記サンドペーパによる研磨作業後に行われる上記コンパウンド等を用いたバフ研磨作業に約３０〜４０秒程度を要してしまうという問題がある。さらに又、上記研磨用粒子６の高さが異なることに起因して、背の高い研磨用粒子は基材５から剥離しやすく、又、研磨用粒子自体の磨耗、目詰りを起こしやすいため、一つのサンドペーパにて研磨できる上記ぶつ等の処理個数が約２〜５個と少ないという問題がある。
本発明はこのような問題点を解決するためになされたもので、研磨機を使用する作業者の習熟度によらず、作業効率よく、かつ塗装欠陥を効率良く除去可能な、塗装欠陥除去方法、及び塗装欠陥除去用研磨機を提供することを目的とする。
【０００６】
【課題を解決するための手段】
本発明の第１態様の塗装欠陥除去方法は、塗装面に発生した凸状の塗装欠陥を研磨材料にて研磨して上記塗装欠陥を除去する塗装欠陥除去方法において、
上記塗装欠陥が上記研磨材料に接触する上記研磨材料上の位置にかかわらず、上記研磨材料による上記塗装欠陥の研磨量がほぼ一定となるオービタル運動にて上記研磨材料を駆動して上記塗装欠陥を除去することを特徴とする。
【０００７】
又、上記研磨材料は、３０μｍ以下の砥粒と接着剤との混合物を基材上に、それぞれがほぼ同一の形状及び高さを有する多角錐体状及び多角錐台状の少なくとも一方にて格子状に配列してなるように構成することもできる。
【０００８】
又、上記基材は、上記塗装欠陥の除去動作に影響しない硬度を有する薄肉材であり、上記オービタル運動にて上記研磨材料を駆動する研磨機に研磨材料取付部を介して上記研磨材料が取り付けられるとき、上記研磨材料取付部の硬度は、ＪＩＳ（日本工業規格）Ｋ６３０１に規定する硬度で５０度以上９０度未満であるように構成することもできる。
【０００９】
又、上記オービタル運動は、上記研磨材料を回転駆動する公転中心軸から１〜５ｍｍにて偏芯した位置に設けられた支持軸に自転せず固定されて上記研磨材料が取り付けられた状態にて、上記公転中心軸がその軸周り方向へ回転することで行われるように構成することもできる。
【００１０】
又、本発明の第２態様の塗装欠陥除去用研磨機は、上記第１態様の塗装欠陥除去方法を実行する塗装欠陥除去用研磨機であって、
当該塗装欠陥除去用研磨機に備わる研磨材料取付部には、研磨し得る範囲が直径で１０〜５０ｍｍとなる大きさの上記研磨材料が取り付けられ、
研磨作業時において、上記研磨材料の回転駆動のオン、オフを操作する当該塗装欠陥除去用研磨機の操作部に上記研磨材料が隠れず、かつ上記塗装欠陥の存在位置と上記研磨材料との相対的な位置関係が研磨作業中に確認できる目視可能位置に、上記研磨材料取付部を配置したことを特徴とする。
【００１１】
【発明の実施の形態】
本発明の実施形態における塗装欠陥除去方法、及び該塗装欠陥除去方法を実行する塗装欠陥除去用研磨機について、図を参照しながら以下に説明する。尚、各図において同じ構成部分については同じ符号を付している。又、本実施形態においても、対象とする塗装欠陥は、上述した「ぶつ」、「たれ」、「ざら」と呼ばれるような、塗装面における微細な凸状の塗装欠陥であり、又、本実施形態の塗装欠陥除去方法は、上述の上塗塗装後の上記磨き修正工程にて実行される。尚、本実施形態の塗装欠陥除去方法は、上記磨き修正工程での実行に限定されるものではなく、後述するように、使用する研磨材料を変更すること等で上記中塗塗装にて発生した上記ぶつ等の塗装欠陥の除去にも適用可能である。
【００１２】
上記研磨材料について説明する。特開平７−１８８４２９号公報に開示され、又、図１に示すように、上記研磨材料１００は、スリーＭ社製の商品名「トライザクト」にて販売されている研磨材料であり、基材１１２上に、それぞれがほぼ同一の形状及び高さを有する複数の研磨コンポジット１１１を格子状に配列した形態にてなる。基材１１２は、上記ぶつ等のような塗装欠陥の除去動作に影響を及ぼさない程度の硬度を有する薄肉体であり、本実施形態では７５μｍ厚のポリエステルフィルムにてなる。基材１１２のその他の材料としては、従来のサンドペーパに基材として用いられている薄肉紙等であってもよい。
【００１３】
上記研磨コンポジット１１１は、砥粒１１４と接着剤１１５との混合物にてなる。上記砥粒１１４は、２０μｍ以下、好ましくは１〜１０μｍ、本実施形態では平均粒径で５μｍの大きさで、ＳｉＣ材にてなる。上記接着剤１１５は、バインダーと可塑材とからなり、上記バインダーとして本実施形態ではアクリル樹脂材を使用している。このような研磨コンポジット１１１のそれぞれは、同一の形状及び大きさを有し、本実施形態では三角錐形状にてなり、図２に示すように格子状に配列されている。研磨コンポジット１１１の大きさについて、三角錐の一辺の寸法Ｐが０．１〜０．３ｍｍ、本実施形態では０．１３ｍｍ、研磨コンポジット１１１の配列ピッチＱが本実施形態では０．１３ｍｍ、配列における行の幅Ｒが本実施形態では０．１３ｍｍ、研磨コンポジット１１１の高さＳが２０〜１５０μｍ、本実施形態では７５μｍであり、１ｍｍ²当たりの研磨コンポジット１１１の密度は、１０〜１００個、本実施形態では５５個である。
尚、研磨コンポジット１１１の形状は、上述の三角錐に限定されず、他に例えば四角錐等や、三角錐台等の多角錐体状又は多角錐台状であってもよい。又、上記多角錐体状又は多角錐台状とが混在していてもよい。
【００１４】
このような研磨コンポジット１１１を有する研磨材料１００は、図示するように各研磨コンポジット１１１の高さＳがほぼ均一であることから、上記Ｒｙ値が約０．３μｍ程度にすることができ、上記サンドペーパの場合に比べて良好である。その結果、上記バフ研磨作業は約５〜１０秒程度しか要せず上記サンドペーパの場合に比べて約３〜６倍程、バフ研磨作業時間を短縮することができる。
さらに又、各研磨コンポジット１１１が角錐形状であることから、各研磨コンポジット１１１が磨り減ったとしても角錐台形状になるので、以下に説明するようなサイズにてなる研磨材料１００を後述の塗装欠陥除去用研磨機に取り付けて塗装欠陥の除去作業を行った場合、一つの研磨材料１００にて約１０〜２０個の上記ぶつ等の塗装欠陥を除去することができる。よって、研磨材料１００にあっては、上記サンドペーパの場合に比べて約４〜５倍程、寿命が長くなる。
【００１５】
上述の研磨コンポジット１１１を有する研磨材料１００は、図３に示すように平面形状にて円形状や多角形状に裁断されて使用される。上記円形状の場合、研磨し得る範囲が直径Ｔで１０〜５０ｍｍ程度となる大きさであり、例えば正方形の場合には一辺Ｕが７〜３５ｍｍ程度となる。このような大きさは、後述する研磨機のオービタル運動のオービタル径が約２〜１０ｍｍであることとの関係に基づいて、上記ぶつ等の塗装欠陥を除去するのに適切な大きさである。即ち、上記ぶつ等の塗装欠陥の大きさは、上述のように数ｍｍ程度であるので、研磨材料１００の研磨し得る直径Ｔの範囲が例えば７０ｍｍ程度のように、上記ぶつ等の塗装欠陥に比して研磨材料１００が非常に大きいときには、上記塗装欠陥以外の塗装面をも研磨してしまい、一方、５ｍｍ程度の小さい場合には、研磨面を水平に保つのが困難になり研磨安定性に欠けてしまう。よっていずれの場合も上記塗装欠陥の除去が効果的に行われない。従って、研磨材料１００の上記研磨し得る範囲は、直径で１０〜５０ｍｍが最適とされる。
又、上記オービタル径が約２〜１０ｍｍであるのは、上記ぶつ等の塗装欠陥の大きさが数ｍｍ程度であることに起因した適正値であり、上記オービタル径が上記適正値を超えるときには、研磨力は増すが研磨面を水平に維持するのが困難になり作業が困難になる。一方、上記適正値未満のときには、研磨力が低下し研磨時間が長くなってしまう。
【００１６】
上述したような円形状や角形状の平面形状にてなる研磨材料１００が取り付けられる上記塗装欠陥除去用研磨機について説明する。
図４に示す塗装欠陥除去用研磨機１３０は、駆動源１３１と、オービタル運動変換部１３２と、支持板１３９と、研磨ヘッド部１３３と、研磨材料取付部１３４と、操作部１３５とを備える。上記操作部１３５は、塗装欠陥除去用研磨機１３０に供給されている圧縮空気の上記駆動源１３１への供給、遮断を行う部分であり、研磨作業者がノブ１３５１を押下することで上記供給が行われ、離すことで上記遮断が行われる。
【００１７】
上記研磨材料取付部１３４は、上記支持板１３９に支持される上記研磨ヘッド部１３３に取り付けられており、上記研磨材料１００を取り付けるための部材である。よってその形状は、研磨材料１００の平面形状に対応した形状が好ましい。尚、例えば研磨材料取付部１３４の平面形状が円形であり研磨材料１００の平面形状も円形であるとき、研磨材料取付部１３４の直径寸法よりも研磨材料１００の直径寸法の方が約１〜３ｍｍ程度大きい。
研磨材料取付部１３４は、ゴム等の弾性のあるシート材から作製されており、研磨材料１００は接着剤を用いて上記研磨材料取付部１３４に取り付けられる。上記研磨材料取付部１３４の硬度は、研磨不良発生率に関与する。即ち、出願人の行った実験では、１９９５年度版のＪＩＳ（日本工業規格）Ｋ６３０１に規定される硬度にて、６０度の硬度を有する研磨材料取付部１３４に上記研磨材料１００を取り付けて上記ぶつ等の塗装欠陥の除去を行った場合、１００個の上記塗装欠陥当たり除去できなかった個数は０〜１個であった。一方、上記硬度が２０度である研磨材料取付部１３４に同じ研磨材料１００を取り付けた場合には、１００個当たり１０〜１５個の削り残しが生じた。又、９０度の硬度の研磨材料取付部１３４の場合では、過剰な研磨となってしまい塗装面に傷がつく場合もあった。
このような実験結果から、研磨材料取付部１３４の硬度は、１９９５年度版のＪＩＳＫ６３０１に規定される硬度にて、５０度以上、９０度未満、好ましくは６０度に設定する。
【００１８】
又、研磨材料取付部１３４は、本実施形態の場合のように、弾力性のあるシート材に限定されるものではない。例えば、多数の突起を形成した２枚の板状体について、その一方の板状体の突起間に形成される隙間に他方の板状体の突起を嵌合させて上記２枚の板状体を接合させたり、若しくは逆Ｊ字形の多数の繊維状体が起毛された２枚のシート材について互いの上記繊維状体を絡み合わせて上記２枚のシート材を接合させたりする、いわゆる面ファスナーを、研磨材料取付部１３４として用いることもできる。この場合、研磨材料取付部１３４の硬度は上記面ファスナーの硬度となる。
【００１９】
又、上述から明らかとなるが、研磨材料取付部１３４の硬度は、塗装面の表面粗さを制御するのにも役立つ。つまり、例えば自動車における塗装面にあっては、例えばゆず肌のように比較的平滑度が悪い場合が好まれる場合や、最近のように平滑度の良いものが好まれる場合等、時代により変化する。このような変化に対応するためにも、研磨材料取付部１３４の硬度は重要なポイントである。
【００２０】
駆動源１３１、オービタル運動変換部１３２、研磨材料取付部１３４部分は、図６にその概略を示すように構成されている。即ち、駆動源１３１の回転シャフト１３１１には支持シャフト取付部材１３１２が固定され、該支持シャフト取付部材１３１２には、回転シャフト１３１１の回転軸である公転中心軸１３６から１〜５ｍｍにて偏芯した位置に、ベアリング１３１３を介して支持シャフト１３１４が取り付けられている。該支持シャフト１３１４には、支持板１３９が取り付けられ、該支持板１３９には研磨ヘッド部１３３が取り付けられ、研磨ヘッド部１３３には研磨材料取付部１３４が取り付けられている。さらに、支持板１３９と、駆動源１３１等を収納するケーシング材１３１５とは、例えばゴム製の弾性材にてなる回転止め材１３２１にて連結されている。
【００２１】
よって、駆動源１３１により回転シャフト１３１１がその軸周り方向へ回転することで、支持シャフト１３１４は公転中心軸１３６を中心として公転し、該公転に伴い支持板１３９及び研磨ヘッド部１３３も、図６に２点鎖線にて可動範囲を示すように、公転中心軸１３６を中心として公転する。但し、上述のように支持板１３９は、回転止め材１３２１にてケーシング材１３１５に連結されているので、研磨ヘッド部１３３及び支持シャフト１３１４は、支持軸１３７を回転中心として支持シャフト１３１４の支持回り方向へ自転することはない。又、塗装欠陥除去用研磨機１３０にあっては、図４及び図６に示すように、研磨ヘッド部１３３、研磨材料取付部１３４及び研磨材料１００は、支持板１３９の一端部分に配置されており、かつ上述のように自転しないことから、支持板１３９が公転中心軸１３６を中心として公転するとき、研磨ヘッド部１３３、研磨材料取付部１３４及び研磨材料１００が公転中心軸１３６を中心として公転中心軸１３６の周りを回転することはない。即ち、研磨ヘッド部１３３、研磨材料取付部１３４及び研磨材料１００は、自転することなく、公転中心軸１３６から偏芯した量にてオービタル運動する。そのオービタル径は、上記偏芯量の２倍に等しく、本実施形態では上記２〜１０ｍｍである。尚、図６に、研磨材料取付部１３４、研磨材料１００、及び回転止め材１３２１の可動範囲を２点鎖線にて示している。
【００２２】
このように研磨材料１００が上記オービタル運動、即ち研磨材料１００が自転することなく公転のみを行うことで、図８に模式的に図示するように、研磨材料１００の研磨面のいずれの場所においても研磨材料１００の移動量に差異は生じない。即ち、図１０に示す上述の往復運動タイプや、図１１に示す回転運動タイプのように、研磨材料の外周部分と中心部分とで移動量に差異が生じることは、本実施形態におけるオービタル運動ではない。
したがって、研磨部材１００が上記オービタル運動することで、上記ぶつ等の塗装欠陥が研磨材料１００に接触する研磨材料１００上の位置にかかわらず、研磨材料１００による上記塗装欠陥の研磨量はほぼ一定となる。その結果、上記磨き修正作業を行うに当たり、作業者の習熟度が問われることはなく、研磨品質を均一化することができる。
【００２３】
さらに、図４に示す塗装欠陥除去用研磨機１３０では、研磨作業時において、研磨材料１００が上記操作部１３５に隠れず、かつ上記塗装欠陥の存在位置と研磨材料１００との相対的な位置関係が研磨作業中に確認できるように、符号１３８にて示す目視可能位置に、研磨ヘッド部１３３に備わる上記研磨材料取付部１３４及び研磨材料１００を配置している。したがって、研磨作業時において、作業者は、操作部１３５を操作しながら上記塗装欠陥の存在位置と研磨材料１００との相対的な位置関係を確認でき、作業効率よく、かつ塗装欠陥を効率良く除去することができる。
【００２４】
塗装欠陥除去用研磨機１３０の変形例としては、図５に示す塗装欠陥除去用研磨機１４０がある。塗装欠陥除去用研磨機１４０は、上記駆動源１３１に相当する駆動源１４１と、上記オービタル運動変換部１３２に相当するオービタル運動変換部１４２と、上記支持板１３９に相当する支持板１４９と、上記研磨ヘッド部１３３に相当する研磨ヘッド部１４３と、上記研磨材料取付部１３４に相当する研磨材料取付部１４４と、上記操作部１３５に相当する操作部１４５とを備える。これらの各構成部分の機能及び動作は、上述した塗装欠陥除去用研磨機１３０の構成部分の機能及び動作に同じであるので、ここでの説明は省略する。
【００２５】
又、上記駆動源１４１、上記オービタル運動変換部１４２、上記研磨材料取付部１４４部分の概略構成を図７に示している。図６との対比において、回転シャフト１４１１は上記回転シャフト１３１１に相当し、支持シャフト取付部材１４１２は上記支持シャフト取付部材１３１２に相当し、ベアリング１４１３は上記ベアリング１３１３に相当し、支持シャフト１４１４は上記支持シャフト１３１４に相当し、ケーシング材１４１５は上記ケーシング材１３１５に相当し、回転止め材１４２１は上記回転止め材１３２１に相当する。これらの各構成部分の機能及び動作は、上述した塗装欠陥除去用研磨機１３０の場合に同じであるので、ここでの説明は省略する。但し、図５及び図７に示すように、研磨材料１００は、研磨ヘッド部１４３のほぼ全面に対応して取り付けられるので、研磨ヘッド部１４３の回転動作と同様に回転する。
【００２６】
以上のように構成された研磨材料１００及び塗装欠陥除去用研磨機を使用して行う塗装欠陥除去方法について説明する。尚、研磨機は塗装欠陥除去用研磨機１３０を使用する。
本実施形態では直径３０ｍｍの大きさにてなる円形の研磨材料１００を塗装欠陥除去用研磨機１３０の研磨材料取付部１３４に取り付ける。尚、該取り付けは、感圧接着剤若しくは上述の面ファスナーにより行われる。
次に作業者は、操作部１３５のノブ１３５１を押下して研磨部材１００を上記オービタル運動させる。本実施形態の場合、上記オービタル径は３ｍｍである。研磨部材１００の回転量は、３０００〜１５０００ｒｐｍ程度となるが、５０００〜１００００ｒｐｍ程度が好ましい。本実施形態では７０００ｒｐｍである。
次に作業者は、上記ぶつ等の塗装欠陥部分に水又は潤滑材を塗布した後、上記塗装欠陥部分に研磨部材１００を水平に当てる。このとき、３ｋｇ以下の力にて、好ましくは５００〜８００ｇ程度の力にて研磨部材１００を上記塗装欠陥へ押し当てる。尚、該押圧力は、上記塗装欠陥の大きさや、上記ぶつ、上記たれ等の種類により変化させる。
作業者は、上記塗装欠陥の除去具合を確認しながら一つの上記塗装欠陥が除去されるまで研磨作業を行い、終了した時点で研磨材料１００の回転を停止させる。そして、次の塗装欠陥の除去へ移り、すべての塗装欠陥について研磨作業が終了するまで上述の動作を繰り返す。
【００２７】
以上説明したように、研磨材料１００を取り付けた本実施形態の塗装欠陥除去用研磨機１３０を使用して塗装欠陥除去動作を行うことで以下の効果を奏する。即ち、研磨材料１００は上記オービタル運動することから、上記ぶつ等の塗装欠陥が研磨材料１００に接触する研磨材料１００上の位置にかかわらず、研磨材料１００による上記塗装欠陥の研磨量はほぼ一定となり、作業者の習熟度に関係なく研磨品質を均一化することができる。又、研磨材料１００を使用することで、上述のように、上記サンドペーパの場合に比べて、バフ研磨作業時間を短縮することができ、かつ寿命も長くなる。又、塗装欠陥除去用研磨機１３０において、目視可能位置１３８に、研磨ヘッド部１３３に備わる上記研磨材料取付部１３４及び研磨材料１００を配置したことから、研磨作業時において、作業者は、操作部１３５を操作しながら上記塗装欠陥の存在位置と研磨材料１００との相対的な位置関係を確認できる。
したがって、塗装欠陥除去用研磨機を使用する作業者の習熟度によらず、作業効率よく、かつ塗装欠陥を効率良く除去することが可能となる。
【００２８】
以上の説明は、上記上塗塗装後における上記磨き修正工程にて実行する場合を例に採り行ったが、本実施形態の塗装欠陥除去方法は、以下に示すように、上記中塗塗装にて発生した上記ぶつ等の塗装欠陥の除去にも適用可能である。
上記中塗塗装後の場合においては、上記上塗塗装後の場合に比べて上記塗装欠陥を粗く除去してもよいことから、上記研磨材料１００に代えて、図９に示すような研磨材料１０１を使用する。研磨材料１０１では、それぞれが四角錐形状の研磨コンポジット１０１１を基材上に格子状に配列した形態にてなり、図９に示す寸法Ｖが０．４０〜０．６４ｍｍ、寸法Ｗが０．４２〜０．５１ｍｍ、研磨コンポジット１０１１の高さは０．３７ｍｍであり、１ｍｍ²当たり３〜６個の研磨コンポジット１０１１を有する。又、この場合、砥粒は３０μｍ以下、好ましくは５〜２０μｍ、平均粒径１０μｍの大きさであり、Ａｌ₂Ｏ₃にてなる。
【００２９】
このような研磨材料１０１であって例えば直径３０ｍｍの円形にてなる研磨材料１０１を、例えば上記塗装欠陥除去用研磨機１３０の研磨材料取付部１３４に取り付け、上述した磨き修正工程の場合と同様に、オービタル運動させて塗装欠陥の除去作業を行う。但し、研磨材料１０１を上記塗装欠陥へ押圧する押圧力は、上述の磨き修正工程の場合に比べて約１．５〜２倍程度大きくする。
このような欠陥除去方法により、上記中塗塗装にて発生した上記ぶつ等の塗装欠陥の除去動作においても、上述の磨き修正工程の場合と同様の効果を得ることができる。
【００３０】
【発明の効果】
以上詳述したように本発明の第１態様の塗装欠陥除去方法によれば、研磨材料をオービタル運動させて塗装欠陥を除去することから、ぶつ等の塗装欠陥が研磨材料に接触する研磨材料上の位置にかかわらず、研磨材料による塗装欠陥の研磨量はほぼ一定となり、作業者の習熟度に関係なく研磨品質を均一化することができる。
【００３１】
又、上記第１態様において、上記研磨材料は多角錐体状物を格子状に配列した形態にてなることから、従来のサンドペーパを使用する場合に比べて、研磨作業後のバフ研磨作業時間を短縮することができ、かつ研磨材料自体の寿命を長くすることができる。
【００３２】
又、上記第１態様において、研磨材料取付部の硬度を規定したことから、研磨対象となる塗装欠陥の単位数当たりにおける削り残し数を低減することができる。
【００３３】
又、本発明の第２態様の塗装欠陥除去用研磨機によれば、上記第１態様の塗装欠陥除去方法を実行でき、さらに、研磨材料取付部を目視可能位置に配置したことで、研磨作業時において、作業者は、操作部を操作しながら塗装欠陥の存在位置と研磨材料との相対的な位置関係を確認でき、作業効率よく、かつ塗装欠陥を効率良く除去することができる。
【図面の簡単な説明】
【図１】本発明の実施形態である塗装欠陥除去方法及び塗装欠陥除去用研磨機に使用される研磨部材の断面図である。
【図２】図１に示す研磨部材の平面図である。
【図３】図１に示す研磨部材を塗装欠陥除去用研磨機に取り付けるときの上記研磨部材の平面形状を示す図である。
【図４】本発明の実施形態である塗装欠陥除去用研磨機の斜視図である。
【図５】図４に示す塗装欠陥除去用研磨機の変形例における斜視図である。
【図６】図４に示す塗装欠陥除去用研磨機における駆動部分の概略構造を示す図である。
【図７】図５に示す塗装欠陥除去用研磨機における駆動部分の概略構造を示す図である。
【図８】図４及び図５に示す塗装欠陥除去用研磨機に取り付けた研磨部材がオービタル運動をしたときの状態を説明するための概念図である。
【図９】本発明の実施形態である塗装欠陥除去方法及び塗装欠陥除去用研磨機に使用され、中塗塗装後の研磨作業に使用される研磨部材の平面図である。
【図１０】研磨部材における従来の運動を説明するための図である。
【図１１】研磨部材における従来の運動を説明するための図である。
【図１２】従来における研磨機の斜視図である。
【図１３】従来のサンドペーパの断面図である。
【符号の説明】
１００、１０１…研磨材料、１１２…基材、
１３０…塗装欠陥除去用研磨機、１３４…研磨材料取付部、１３５…操作部、１３６…公転中心軸、１３７…支持軸、１３８…目視可能位置、
１４０…塗装欠陥除去用研磨機、１４４…研磨材料取付部、１４５…操作部。[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a coating defect removing method for removing fine convex coating defects, such as so-called bumps or sags, generated on a painted surface such as the surface of a car body of an automobile, and the like. The present invention relates to a polisher for removing coating defects used for executing the method for removing coating defects.
[0002]
[Prior art]
For example, for car bodies, after washing, pre-treatment, electrodeposition coating, intermediate coating, and top coating processes are performed. In particular, after the top coating, it is necessary to improve the appearance of the car body. Therefore, there is a need for a polishing correction process for removing fine convex coating defects such as so-called “bump”, “sag”, and “zara” generated on the painted surface. In addition, the above-mentioned bumps and the like are phenomena in which the coated surface is not smooth, and a convex portion is generated, and a coating aggregate represented by acrylic melamine resin system, amino alkyd resin system, urethane resin system, foreign matter, It is caused by dust on the surface to be painted, spray dust, and partial overcoating. In general, the size of the bump is about 2 mm or less in diameter, the height is about 0.5 mm, the size of the sagging is about 2 to 5 mm in width and length, and about 10 mm at the maximum. The height is about 0.5 mm. Conventionally, in the polishing correction step, the above-mentioned surface of the coated surface is shaved with a knife, and then sharpened with a sanding machine or manually using a fine sandpaper of about 1500 to 2000, for example, and then polished with a compound or polishing wax. Raised.
[0003]
[Problems to be solved by the invention]
As the polishing machine, the head portion to which the sandpaper is attached has an oscillation angle of about 30 degrees around the drive shaft 2 of the polishing machine, which attaches and drives the head portion 1 as shown in FIG. The head portion 1 is rotatable on a support shaft 3 that is provided in a position that is reciprocally moved, or that is provided at an eccentric position with respect to the drive shaft 2 and rotates in the direction around the axis of the drive shaft 2 by rotation of the drive shaft 2. When the drive shaft 2 is attached and rotated, as shown in FIG. 11, the head portion 1 revolves in the direction around the drive shaft 2 and rotates in the direction around the support shaft 3 as well. There is a rotary motion type called double action.
However, in these reciprocating type and rotary type polishing machines, as is apparent from FIGS. 10 and 11, the central portion and the outer peripheral portion of the head portion 1 are attached to the head portion, that is, the head portion. In addition, there is a difference in the amount of movement of the sandpaper. That is, a difference in polishing amount occurs depending on where the head portion of the polishing machine contacts the bump or the like, for example, the central portion and the outer peripheral portion. Accordingly, since the optimum location of the head portion for polishing the bumps and the like is within a very narrow range within the head portion, there is a problem that skill is required to perform the polishing correction work.
[0004]
Further, as shown in FIG. 12, the polishing machine has the head unit 1 directly below the operation unit 4 for turning on / off the rotation of the drive shaft. There is also a problem that it is difficult to confirm the relative positional relationship with the unit 1 during the work.
[0005]
Further, as shown in FIG. 13, the sandpaper has a form in which abrasive particles 6 having different heights are adhered to the base material 5, so that the Ry value indicating the level difference of the unevenness on the polished coated surface. As a result, there is a problem that about 30 to 40 seconds are required for the buffing operation using the compound or the like performed after the sandpaper polishing operation. Furthermore, due to the height of the abrasive particles 6 being different, tall abrasive particles are easily peeled off from the base material 5, and the abrasive particles themselves are easily worn and clogged. There is a problem that the number of treatments such as the above-mentioned bumps that can be polished with one sandpaper is as small as about 2 to 5.
The present invention has been made to solve such problems, and is a coating defect removal method capable of efficiently removing coating defects efficiently regardless of the level of proficiency of an operator who uses a polishing machine. It is another object of the present invention to provide a polishing machine for removing coating defects.
[0006]
[Means for Solving the Problems]
The coating defect removal method of the first aspect of the present invention is a coating defect removal method for removing the coating defect by polishing a convex coating defect generated on a painted surface with an abrasive material.
Regardless of the position on the polishing material where the coating defect contacts the polishing material, the polishing material is driven by an orbital motion in which the polishing amount of the coating defect by the polishing material is substantially constant. It is characterized by removing.
[0007]
Further, the polishing material is a lattice of at least one of a polygonal pyramid shape and a polygonal frustum shape each having a substantially same shape and height on a base material with a mixture of abrasive grains of 30 μm or less and an adhesive. It can also be configured to be arranged in a shape.
[0008]
Further, the base material is a thin material having a hardness that does not affect the removal operation of the coating defect, and the abrasive material is attached to a polishing machine that drives the abrasive material by the orbital motion via an abrasive material attachment portion. In this case, the hardness of the abrasive material mounting portion can be configured to be not less than 50 degrees and less than 90 degrees as defined in JIS (Japanese Industrial Standard) K6301.
[0009]
Further, the orbital motion is fixed to the support shaft provided at a position eccentric by 1 to 5 mm from the revolution center axis for rotationally driving the abrasive material without being rotated and the abrasive material is attached. The revolving center axis can be configured to rotate around the axis.
[0010]
Further, the polishing machine for removing coating defects according to the second aspect of the present invention is a polishing machine for removing coating defects that executes the coating defect removing method according to the first aspect,
The abrasive material mounting portion provided in the polishing machine for removing coating defects is attached with the abrasive material having a diameter of 10 to 50 mm in a range that can be polished,
During the polishing operation, the polishing material is not hidden in the operation portion of the polishing machine for removing the coating defect, which is used to turn on / off the rotational drive of the polishing material, and the relative position between the position of the coating defect and the polishing material The polishing material mounting portion is disposed at a position where the visual positional relationship can be confirmed during the polishing operation.
[0011]
DETAILED DESCRIPTION OF THE INVENTION
A coating defect removing method and a coating defect removing polishing machine that executes the coating defect removing method according to an embodiment of the present invention will be described below with reference to the drawings. In addition, the same code | symbol is attached | subjected about the same component in each figure. Also, in this embodiment, the target coating defects are fine convex coating defects on the painted surface as referred to as “bump”, “sag”, and “zara” described above. The method for removing defects in form is executed in the polishing correction step after the above-described top coating. In addition, the coating defect removal method of the present embodiment is not limited to the execution in the polishing correction step, and as described later, the above-mentioned generated in the intermediate coating by changing the polishing material to be used, etc. It can also be applied to remove coating defects such as bumps.
[0012]
The polishing material will be described. As disclosed in Japanese Patent Laid-Open No. 7-188429 and as shown in FIG. 1, the abrasive material 100 is an abrasive material sold under the trade name “Trizact” manufactured by Three M Company. On top, a plurality of polishing composites 111 each having substantially the same shape and height are arranged in a grid pattern. The base material 112 is a thin-walled body having a hardness that does not affect the operation of removing coating defects such as bumps, and is made of a 75 μm thick polyester film in this embodiment. The other material of the substrate 112 may be a thin paper or the like used as a substrate for conventional sandpaper.
[0013]
The abrasive composite 111 is made of a mixture of abrasive grains 114 and an adhesive 115. The abrasive grains 114 are 20 μm or less, preferably 1 to 10 μm. In this embodiment, the average grain size is 5 μm, and is made of a SiC material. The adhesive 115 includes a binder and a plastic material, and an acrylic resin material is used as the binder in the present embodiment. Each of such polishing composites 111 has the same shape and size, and in the present embodiment, has a triangular pyramid shape and is arranged in a lattice shape as shown in FIG. Regarding the size of the polishing composite 111, the dimension P of one side of the triangular pyramid is 0.1 to 0.3 mm, 0.13 mm in this embodiment, and the arrangement pitch Q of the polishing composite 111 is 0.13 mm in this embodiment. The width R of the row is 0.13 mm in this embodiment, the height S of the polishing composite 111 is 20 to 150 μm, and in this embodiment is 75 μm. ² The density of the hit abrasive composite 111 is 10 to 100, and 55 in this embodiment.
The shape of the polishing composite 111 is not limited to the triangular pyramid described above, and may be a polygonal pyramid shape such as a quadrangular pyramid, a triangular frustum, or a polygonal frustum. The polygonal pyramid shape or the polygonal frustum shape may be mixed.
[0014]
In the polishing material 100 having such a polishing composite 111, since the height S of each polishing composite 111 is substantially uniform as shown in the figure, the Ry value can be set to about 0.3 μm. It is better than the case of. As a result, the buffing operation only takes about 5 to 10 seconds, and the buffing operation time can be shortened by about 3 to 6 times compared to the sandpaper.
Furthermore, since each abrasive composite 111 has a pyramidal shape, even if each abrasive composite 111 is worn down, it becomes a truncated pyramid shape. Therefore, an abrasive material 100 having a size as described below is applied to a coating defect described later. When the removal defect is removed by attaching to a removal polishing machine, about 10 to 20 coating defects such as the above-mentioned bumps can be removed with one abrasive material 100. Therefore, in the polishing material 100, the life is increased by about 4 to 5 times compared to the case of the sand paper.
[0015]
The polishing material 100 having the above-described polishing composite 111 is used after being cut into a circular shape or a polygonal shape in a planar shape as shown in FIG. In the case of the circular shape, the range that can be polished is such that the diameter T is about 10 to 50 mm. For example, in the case of a square, one side U is about 7 to 35 mm. Such a size is an appropriate size for removing coating defects such as bumps based on the relationship that the orbital diameter of the orbital motion of the polishing machine described later is about 2 to 10 mm. That is, since the size of the coating defect such as the bump is about several millimeters as described above, the range of the diameter T that can be polished by the polishing material 100 is, for example, about 70 mm. On the other hand, when the polishing material 100 is very large, the coated surface other than the above-described coating defects is also polished. On the other hand, when the polishing material is as small as 5 mm, it becomes difficult to keep the polished surface horizontal and polishing stability. Will be lacking. Therefore, in any case, removal of the coating defect is not effectively performed. Accordingly, the polishing range of the polishing material 100 is optimally 10 to 50 mm in diameter.
Further, the orbital diameter is about 2 to 10 mm is an appropriate value due to the size of the coating defect such as the bump being about several mm, and when the orbital diameter exceeds the appropriate value, Although the polishing power increases, it becomes difficult to keep the polishing surface horizontal, and the work becomes difficult. On the other hand, when the value is less than the appropriate value, the polishing power decreases and the polishing time becomes longer.
[0016]
The coating defect removing polishing machine to which the polishing material 100 having a circular or square planar shape as described above is attached will be described.
The coating defect removing polishing machine 130 shown in FIG. 4 includes a drive source 131, an orbital motion conversion unit 132, a support plate 139, a polishing head unit 133, an abrasive material attachment unit 134, and an operation unit 135. The operation unit 135 is a part that supplies and shuts off the compressed air supplied to the paint defect removing polishing machine 130 to the drive source 131, and the supply is performed when the polishing operator depresses the knob 1351. The above-mentioned blocking is performed by releasing.
[0017]
The abrasive material attaching part 134 is attached to the abrasive head part 133 supported by the support plate 139 and is a member for attaching the abrasive material 100. Therefore, the shape is preferably a shape corresponding to the planar shape of the polishing material 100. For example, when the planar shape of the abrasive material mounting portion 134 is circular and the planar shape of the abrasive material 100 is also circular, the diameter size of the abrasive material 100 is about 1 to 3 mm than the diameter size of the abrasive material mounting portion 134. About big.
The abrasive material attaching portion 134 is made of an elastic sheet material such as rubber, and the abrasive material 100 is attached to the abrasive material attaching portion 134 using an adhesive. The hardness of the abrasive material attachment portion 134 is related to the defective polishing occurrence rate. That is, in the experiment conducted by the applicant, the abrasive material 100 was attached to the abrasive material attachment portion 134 having a hardness of 60 degrees at the hardness specified in JIS (Japanese Industrial Standard) K 6301 of the 1995 edition. When removing coating defects such as bumps, the number that could not be removed per 100 coating defects was 0 to 1. On the other hand, when the same abrasive material 100 was attached to the abrasive material attachment portion 134 having the hardness of 20 degrees, 10 to 15 uncut parts were generated per 100 pieces. In addition, in the case of the abrasive material attachment portion 134 having a hardness of 90 degrees, excessive polishing may occur and the coated surface may be damaged.
From such experimental results, the hardness of the abrasive material attachment portion 134 is set to 50 degrees or more and less than 90 degrees, preferably 60 degrees, according to the hardness specified in JIS K 6301 of the 1995 edition.
[0018]
Further, the abrasive material attaching portion 134 is not limited to the elastic sheet material as in the present embodiment. For example, for two plate-like bodies formed with a large number of protrusions, the two plate-like bodies are formed by fitting the protrusions of the other plate-like body into a gap formed between the protrusions of one of the plate-like bodies. So-called hook-and-loop fastener that joins the two sheet materials by intertwining the fibrous bodies with each other with respect to two sheet materials on which a large number of inverted J-shaped fibrous bodies are raised Can also be used as the abrasive material attachment portion 134. In this case, the hardness of the abrasive material attachment portion 134 is the hardness of the surface fastener.
[0019]
Further, as will be apparent from the above, the hardness of the abrasive material attaching portion 134 is also useful for controlling the surface roughness of the painted surface. In other words, for example, in the case of a painted surface in an automobile, the case where a relatively poor smoothness such as a yuzu skin is preferred, or a case where a good smoothness is preferred like recently, changes depending on the times. . In order to cope with such changes, the hardness of the abrasive material attaching portion 134 is an important point.
[0020]
The drive source 131, the orbital motion converting unit 132, and the abrasive material attaching unit 134 are configured as schematically shown in FIG. That is, a support shaft attachment member 1312 is fixed to the rotation shaft 1311 of the drive source 131, and the support shaft attachment member 1312 is eccentric by 1 to 5 mm from the revolution center axis 136 which is the rotation axis of the rotation shaft 1311. A support shaft 1314 is attached to the position via a bearing 1313. A support plate 139 is attached to the support shaft 1314, a polishing head part 133 is attached to the support plate 139, and an abrasive material attachment part 134 is attached to the polishing head part 133. Further, the support plate 139 and the casing material 1315 that houses the drive source 131 and the like are connected by a rotation stopping material 1321 made of, for example, a rubber elastic material.
[0021]
Therefore, when the rotation shaft 1311 is rotated in the direction around the axis by the drive source 131, the support shaft 1314 revolves around the revolution center axis 136, and the support plate 139 and the polishing head portion 133 are also rotated along with the revolution. As shown by the two-dot chain line in FIG. However, as described above, since the support plate 139 is connected to the casing material 1315 by the anti-rotation material 1321, the polishing head portion 133 and the support shaft 1314 are supported around the support shaft 1314 with the support shaft 137 as the rotation center. It does not rotate in the direction. Further, in the coating defect removing polishing machine 130, as shown in FIGS. 4 and 6, the polishing head portion 133, the polishing material attaching portion 134, and the polishing material 100 are arranged at one end portion of the support plate 139. In addition, as described above, when the support plate 139 revolves around the revolution center axis 136, the polishing head part 133, the polishing material attachment part 134, and the polishing material 100 revolve around the revolution center axis 136. There is no rotation around the central axis 136. That is, the polishing head portion 133, the polishing material attachment portion 134, and the polishing material 100 are orbitally moved by an amount eccentric from the revolution center axis 136 without rotating. The orbital diameter is equal to twice the amount of eccentricity, and is 2 to 10 mm in the present embodiment. In FIG. 6, the movable range of the abrasive material attachment portion 134, the abrasive material 100, and the rotation stopper 1321 is indicated by a two-dot chain line.
[0022]
As described above, the polishing material 100 performs only the orbital motion, that is, the revolution without the rotation of the polishing material 100, so that the polishing material 100 can be placed anywhere on the polishing surface of the polishing material 100 as schematically shown in FIG. There is no difference in the amount of movement of the polishing material 100. That is, as in the above-described reciprocating motion type shown in FIG. 10 and the rotational motion type shown in FIG. Absent.
Therefore, when the polishing member 100 performs the orbital motion, the polishing amount of the coating defect by the polishing material 100 is substantially constant regardless of the position on the polishing material 100 where the coating defect such as the bump contacts the polishing material 100. Become. As a result, in performing the polishing correction work, the skill level of the worker is not questioned, and the polishing quality can be made uniform.
[0023]
Further, in the coating defect removing polishing machine 130 shown in FIG. 4, the polishing material 100 is not hidden by the operation unit 135 during the polishing operation, and the relative positional relationship between the position of the coating defect and the polishing material 100 is present. The polishing material mounting portion 134 and the polishing material 100 provided in the polishing head portion 133 are disposed at a visible position indicated by reference numeral 138 so that the polishing material 100 can be confirmed during the polishing operation. Therefore, at the time of the polishing operation, the operator can confirm the relative positional relationship between the position of the coating defect and the polishing material 100 while operating the operation unit 135, and can efficiently remove the coating defect. can do.
[0024]
As a modification of the coating defect removing polishing machine 130, there is a coating defect removing polishing machine 140 shown in FIG. The coating defect removing polishing machine 140 includes a drive source 141 corresponding to the drive source 131, an orbital motion conversion unit 142 corresponding to the orbital motion conversion unit 132, a support plate 149 corresponding to the support plate 139, and the above. A polishing head part 143 corresponding to the polishing head part 133, an abrasive material attaching part 144 corresponding to the abrasive material attaching part 134, and an operating part 145 corresponding to the operating part 135 are provided. Since the functions and operations of these components are the same as the components and functions of the above-described coating defect removal polishing machine 130, description thereof is omitted here.
[0025]
Further, FIG. 7 shows a schematic configuration of the drive source 141, the orbital motion converting portion 142, and the abrasive material attaching portion 144. In comparison with FIG. 6, the rotary shaft 1411 corresponds to the rotary shaft 1311, the support shaft mounting member 1412 corresponds to the support shaft mounting member 1312, the bearing 1413 corresponds to the bearing 1313, and the support shaft 1414 The casing material 1415 corresponds to the support shaft 1314, the casing material 1315 corresponds to the casing material 1315, and the rotation stopping material 1421 corresponds to the rotation stopping material 1321. Since the functions and operations of these components are the same as those of the above-described coating defect removing polishing machine 130, description thereof is omitted here. However, as shown in FIGS. 5 and 7, the polishing material 100 is attached corresponding to almost the entire surface of the polishing head portion 143, and thus rotates in the same manner as the rotation operation of the polishing head portion 143.
[0026]
A coating defect removal method performed using the polishing material 100 configured as described above and a coating defect removal polishing machine will be described. The polishing machine uses a polishing machine 130 for removing coating defects.
In this embodiment, a circular abrasive material 100 having a diameter of 30 mm is attached to the abrasive material attaching portion 134 of the paint defect removing polisher 130. The attachment is performed with a pressure sensitive adhesive or the above-described hook-and-loop fastener.
Next, the operator presses the knob 1351 of the operation unit 135 to cause the abrasive member 100 to perform the orbital motion. In the case of this embodiment, the orbital diameter is 3 mm. The rotation amount of the polishing member 100 is about 3000 to 15000 rpm, preferably about 5000 to 10000 rpm. In this embodiment, it is 7000 rpm.
Next, after applying water or a lubricant to the coating defect portion such as the bump, the worker applies the polishing member 100 horizontally to the coating defect portion. At this time, the polishing member 100 is pressed against the coating defect with a force of 3 kg or less, preferably with a force of about 500 to 800 g. The pressing force is changed depending on the size of the coating defect and the type of the bump or the sagging.
The operator performs a polishing operation while confirming the degree of removal of the coating defect until one of the coating defects is removed, and stops the rotation of the polishing material 100 when it is finished. Then, the process proceeds to removal of the next coating defect, and the above-described operation is repeated until the polishing operation is completed for all the coating defects.
[0027]
As described above, the following effects can be obtained by performing the coating defect removal operation using the coating defect removing polishing machine 130 of the present embodiment to which the polishing material 100 is attached. That is, since the polishing material 100 performs the orbital motion, the polishing amount of the coating defect by the polishing material 100 becomes almost constant regardless of the position on the polishing material 100 where the coating defect such as the bump contacts the polishing material 100. The polishing quality can be made uniform regardless of the level of proficiency of the operator. In addition, by using the polishing material 100, as described above, the buffing work time can be shortened and the life can be extended as compared with the case of the sandpaper. Further, in the polishing machine 130 for removing coating defects, the abrasive material mounting part 134 and the abrasive material 100 provided in the polishing head part 133 are arranged at the visible position 138. The relative positional relationship between the position of the coating defect and the polishing material 100 can be confirmed while operating 135.
Therefore, it is possible to efficiently remove the coating defects efficiently regardless of the skill level of the operator who uses the polishing machine for removing the coating defects.
[0028]
The above description has been made by taking the case of executing the polishing correction process after the top coating as an example, but the coating defect removal method of the present embodiment occurred in the intermediate coating as shown below. It can also be applied to the removal of coating defects such as bumps.
In the case after the intermediate coating, the coating defects may be roughly removed as compared with the case after the top coating. Therefore, instead of the polishing material 100, a polishing material 101 as shown in FIG. 9 is used. To do. The abrasive material 101 has a configuration in which abrasive composites 1011 each having a quadrangular pyramid shape are arranged in a lattice pattern on a substrate, and the dimension V shown in FIG. 9 is 0.40 to 0.64 mm, and the dimension W is 0.42. ~ 0.51mm, the height of the abrasive composite 1011 is 0.37mm, 1mm ² Three to six abrasive composites 1011 are included. In this case, the abrasive grains are 30 μm or less, preferably 5 to 20 μm, and the average particle size is 10 μm. ₂ O _Three It becomes.
[0029]
Such an abrasive material 101 having a circular shape with a diameter of 30 mm, for example, is attached to, for example, the abrasive material attachment portion 134 of the paint defect removing polishing machine 130, and in the same manner as in the above-described polishing correction process. The orbital motion is used to remove paint defects. However, the pressing force for pressing the abrasive material 101 against the coating defect is increased by about 1.5 to 2 times compared to the above-described polishing correction process.
By such a defect removal method, the same effect as that in the above-described polishing correction step can be obtained also in the operation of removing coating defects such as the bumps generated in the intermediate coating.
[0030]
【The invention's effect】
As described above in detail, according to the coating defect removal method of the first aspect of the present invention, since the coating defect is removed by orbital movement of the polishing material, the coating defect such as a bump is on the polishing material in contact with the polishing material. Regardless of the position, the polishing amount of the coating defect due to the polishing material is substantially constant, and the polishing quality can be made uniform regardless of the level of proficiency of the operator.
[0031]
Further, in the first aspect, since the polishing material is in a form in which polygonal pyramids are arranged in a lattice shape, the buffing operation time after the polishing operation is reduced as compared with the case of using conventional sandpaper. It can be shortened and the life of the polishing material itself can be extended.
[0032]
Moreover, in the said 1st aspect, since the hardness of the polishing material attachment part was prescribed | regulated, the number of uncut parts per unit number of the coating defect used as grinding | polishing object can be reduced.
[0033]
Further, according to the polishing machine for removing coating defects according to the second aspect of the present invention, the polishing method for removing coating defects according to the first aspect can be executed, and further, the polishing material mounting portion is arranged at a position where it can be visually checked. In some cases, the operator can confirm the relative positional relationship between the presence position of the coating defect and the polishing material while operating the operation unit, and can efficiently remove the coating defect.
[Brief description of the drawings]
FIG. 1 is a cross-sectional view of a polishing member used in a coating defect removing method and a coating defect removing polishing machine according to an embodiment of the present invention.
FIG. 2 is a plan view of the polishing member shown in FIG.
FIG. 3 is a diagram showing a planar shape of the polishing member when the polishing member shown in FIG. 1 is attached to a polishing machine for removing coating defects.
FIG. 4 is a perspective view of a paint defect removing polishing machine according to an embodiment of the present invention.
FIG. 5 is a perspective view of a modified example of the paint defect removing polishing machine shown in FIG. 4;
6 is a view showing a schematic structure of a drive portion in the paint defect removing polishing machine shown in FIG. 4;
7 is a view showing a schematic structure of a drive portion in the paint defect removing polishing machine shown in FIG. 5;
FIG. 8 is a conceptual diagram for explaining a state when an abrasive member attached to the paint defect removing polisher shown in FIGS. 4 and 5 performs an orbital motion.
FIG. 9 is a plan view of a polishing member that is used in a polishing defect removing method and a coating defect removing polishing machine that is an embodiment of the present invention, and that is used for polishing work after intermediate coating.
FIG. 10 is a view for explaining a conventional motion in an abrasive member.
FIG. 11 is a diagram for explaining a conventional motion in an abrasive member.
FIG. 12 is a perspective view of a conventional polishing machine.
FIG. 13 is a cross-sectional view of a conventional sandpaper.
[Explanation of symbols]
100, 101 ... Abrasive material, 112 ... Base material,
DESCRIPTION OF SYMBOLS 130 ... Polishing machine for paint defect removal, 134 ... Abrasive material attachment part, 135 ... Operation part, 136 ... Revolution center axis, 137 ... Support axis, 138 ... Visible position,
140: Polishing machine for removing coating defects, 144: Abrasive material mounting section, 145: Operation section.

Claims

A coating defect removing method for removing the coating defects by polishing fine convex coating defects generated on the painted surface such as bumps and sagging with a polishing material (100, 101) in a polishing correction process after top coating. In
As a polishing machine for removing coating defects, the polishing material mounting portion (134, 144) provided in the polishing machine for removing coating defects is mounted with the above-mentioned polishing material having a diameter of 10 to 50 mm. In the polishing operation, the polishing material is not hidden in the operation part (135, 145) of the polishing machine for removing coating defects, which operates to turn on / off the rotational drive of the polishing material, and the position where the coating defects exist Preparing a paint defect removing polishing machine in which the polishing material mounting portion is disposed at a visually observable position (138) where the relative positional relationship between the polishing material and the polishing material can be confirmed during the polishing operation :
Next, using the polishing machine, the orbital motion in which the polishing amount of the coating defect by the polishing material is substantially constant regardless of the position on the polishing material where the coating defect contacts the polishing material. removing the coating defect drives the abrasive material:
Next, the process of polishing with compound and polishing wax :
A method for removing coating defects, comprising:

The polishing material comprises a mixture of abrasive grains of 30 μm or less and an adhesive on a base material (112), and at least one of a polygonal pyramid shape and a polygonal frustum shape each having substantially the same shape and height. ^2. The coating defect removing method according to claim 1, wherein the coating defects are arranged in a lattice pattern, the height of the mixture is 20 to 150 [mu] m, and the density of the mixture is 10 to 100 pieces / mm < ² > .

The base material is a thin material having a hardness that does not affect the removal operation of the coating defect, and an abrasive material mounting portion (134, 144) is attached to a polishing machine (130, 140) that drives the abrasive material by the orbital motion. The method for removing a coating defect according to claim 2 , wherein when the abrasive material is attached via a hardness, the hardness of the abrasive material attachment portion is not less than 50 degrees and less than 90 degrees as defined in JIS (Japanese Industrial Standard) K6301. .

The orbital motion is fixed to the support shaft (137) provided at a position eccentric by 1 to 5 mm from the revolving central shaft (136) for rotationally driving the abrasive material without rotating, and the abrasive material is attached. The coating defect removing method according to any one of claims 1 to 3, wherein the method is performed by rotating the revolution center axis in a direction around the axis.

A polishing machine for removing coating defects that removes the above coating defects by polishing fine convex coating defects such as bumps, sagging, etc., with polishing materials in the polishing correction process after top coating. ,
1) The coating defect removing polishing machine includes a coating defect removing polishing machine (130, 140), a drive source (131, 141), an orbital motion converter (131, 142), and a support plate (139, 149). ), A polishing head part (133, 143), an abrasive material attachment part (134, 144), and an operation part (135, 145),
2) Support shaft attachment members (1312, 1412) are fixed to the rotation shafts (1311, 1411) of the drive source (131, 141), and the rotation shafts (1312, 1312) are attached to the rotation shafts (1312, 1312). Since the support shaft (1314, 1414) is attached via a bearing (1313, 1413) at a position deviated from 1-5 mm from the revolution center axis (136, 146) which is the rotation axis of 1311, 1411), The polishing head portion (133, 143), the polishing material attachment portion (134, 144), and the polishing material 100 are orbitally moved by an amount eccentric from the revolution center axis (136, 146) without rotating. And
3) Here, a) The polishing material mounting portion (134, 144) provided in the paint defect removing polishing machine is mounted with the polishing material having a diameter of 10 to 50 mm in a range that can be polished, b) In the polishing material mounting portion, during the polishing operation, the polishing head portion (133, 143) is not directly under the operation portion (135, 145), and the rotation driving of the polishing material is turned on / off. The polishing material is not hidden in the operation portion (135, 145) of the coating defect removing polishing machine, and the relative positional relationship between the position of the coating defect and the polishing material can be confirmed during the polishing operation. It is arranged at the visible position (138),
A polishing machine for removing coating defects.

The polishing material is a lattice of a mixture of abrasive grains and an adhesive of 30 μm or less on a base material (112) in at least one of a polygonal pyramid and a polygonal frustum each having substantially the same shape and height. The height of the mixture is 20-150 μm, and the density of the mixture is 10-100 / mm ²² The polishing machine for removing coating defects according to claim 5.

The polishing machine for removing coating defects according to claim 5 or 6, wherein the hardness of the abrasive material mounting portion (134, 144) is not less than 50 degrees and less than 90 degrees as defined in JIS (Japanese Industrial Standard) K6301.