JP3934144B2 - 変形自在の接点を備えた電気接続体 - Google Patents
変形自在の接点を備えた電気接続体 Download PDFInfo
- Publication number
- JP3934144B2 JP3934144B2 JP2005181280A JP2005181280A JP3934144B2 JP 3934144 B2 JP3934144 B2 JP 3934144B2 JP 2005181280 A JP2005181280 A JP 2005181280A JP 2005181280 A JP2005181280 A JP 2005181280A JP 3934144 B2 JP3934144 B2 JP 3934144B2
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- JP
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- contact
- interposer
- conductor
- layer
- contacts
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
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Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01R—ELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
- H01R12/00—Structural associations of a plurality of mutually-insulated electrical connecting elements, specially adapted for printed circuits, e.g. printed circuit boards [PCB], flat or ribbon cables, or like generally planar structures, e.g. terminal strips, terminal blocks; Coupling devices specially adapted for printed circuits, flat or ribbon cables, or like generally planar structures; Terminals specially adapted for contact with, or insertion into, printed circuits, flat or ribbon cables, or like generally planar structures
- H01R12/50—Fixed connections
- H01R12/51—Fixed connections for rigid printed circuits or like structures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01R—ELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
- H01R13/00—Details of coupling devices of the kinds covered by groups H01R12/70 or H01R24/00 - H01R33/00
- H01R13/02—Contact members
- H01R13/22—Contacts for co-operating by abutting
- H01R13/24—Contacts for co-operating by abutting resilient; resiliently-mounted
- H01R13/2407—Contacts for co-operating by abutting resilient; resiliently-mounted characterized by the resilient means
- H01R13/2414—Contacts for co-operating by abutting resilient; resiliently-mounted characterized by the resilient means conductive elastomers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01R—ELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
- H01R12/00—Structural associations of a plurality of mutually-insulated electrical connecting elements, specially adapted for printed circuits, e.g. printed circuit boards [PCB], flat or ribbon cables, or like generally planar structures, e.g. terminal strips, terminal blocks; Coupling devices specially adapted for printed circuits, flat or ribbon cables, or like generally planar structures; Terminals specially adapted for contact with, or insertion into, printed circuits, flat or ribbon cables, or like generally planar structures
- H01R12/70—Coupling devices
- H01R12/71—Coupling devices for rigid printing circuits or like structures
- H01R12/712—Coupling devices for rigid printing circuits or like structures co-operating with the surface of the printed circuit or with a coupling device exclusively provided on the surface of the printed circuit
- H01R12/714—Coupling devices for rigid printing circuits or like structures co-operating with the surface of the printed circuit or with a coupling device exclusively provided on the surface of the printed circuit with contacts abutting directly the printed circuit; Button contacts therefore provided on the printed circuit
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/44—Manufacturing insulated metal core circuits or other insulated electrically conductive core circuits
- H05K3/445—Manufacturing insulated metal core circuits or other insulated electrically conductive core circuits having insulated holes or insulated via connections through the metal core
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4611—Manufacturing multilayer circuits by laminating two or more circuit boards
- H05K3/4614—Manufacturing multilayer circuits by laminating two or more circuit boards the electrical connections between the circuit boards being made during lamination
- H05K3/462—Manufacturing multilayer circuits by laminating two or more circuit boards the electrical connections between the circuit boards being made during lamination characterized by laminating only or mainly similar double-sided circuit boards
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4611—Manufacturing multilayer circuits by laminating two or more circuit boards
- H05K3/4641—Manufacturing multilayer circuits by laminating two or more circuit boards having integrally laminated metal sheets or special power cores
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/0272—Adaptations for fluid transport, e.g. channels, holes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/0353—Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement
- H05K1/036—Multilayers with layers of different types
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/05—Insulated conductive substrates, e.g. insulated metal substrate
- H05K1/056—Insulated conductive substrates, e.g. insulated metal substrate the metal substrate being covered by an organic insulating layer
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/11—Printed elements for providing electric connections to or between printed circuits
- H05K1/115—Via connections; Lands around holes or via connections
- H05K1/116—Lands, clearance holes or other lay-out details concerning the surrounding of a via
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/03—Conductive materials
- H05K2201/0332—Structure of the conductor
- H05K2201/0364—Conductor shape
- H05K2201/0382—Continuously deformed conductors
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/09—Shape and layout
- H05K2201/09209—Shape and layout details of conductors
- H05K2201/095—Conductive through-holes or vias
- H05K2201/09536—Buried plated through-holes, i.e. plated through-holes formed in a core before lamination
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/09—Shape and layout
- H05K2201/09209—Shape and layout details of conductors
- H05K2201/095—Conductive through-holes or vias
- H05K2201/09554—Via connected to metal substrate
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/09—Shape and layout
- H05K2201/09209—Shape and layout details of conductors
- H05K2201/095—Conductive through-holes or vias
- H05K2201/096—Vertically aligned vias, holes or stacked vias
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/09—Shape and layout
- H05K2201/09818—Shape or layout details not covered by a single group of H05K2201/09009 - H05K2201/09809
- H05K2201/09827—Tapered, e.g. tapered hole, via or groove
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/10—Details of components or other objects attached to or integrated in a printed circuit board
- H05K2201/10227—Other objects, e.g. metallic pieces
- H05K2201/10378—Interposers
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/05—Patterning and lithography; Masks; Details of resist
- H05K2203/0548—Masks
- H05K2203/0554—Metal used as mask for etching vias, e.g. by laser ablation
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/05—Patterning and lithography; Masks; Details of resist
- H05K2203/0562—Details of resist
- H05K2203/0582—Coating by resist, i.e. resist used as mask for application of insulating coating or of second resist
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/13—Moulding and encapsulation; Deposition techniques; Protective layers
- H05K2203/1333—Deposition techniques, e.g. coating
- H05K2203/135—Electrophoretic deposition of insulating material
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/30—Details of processes not otherwise provided for in H05K2203/01 - H05K2203/17
- H05K2203/308—Sacrificial means, e.g. for temporarily filling a space for making a via or a cavity or for making rigid-flexible PCBs
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
- H05K3/0017—Etching of the substrate by chemical or physical means
- H05K3/0026—Etching of the substrate by chemical or physical means by laser ablation
- H05K3/0032—Etching of the substrate by chemical or physical means by laser ablation of organic insulating material
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4611—Manufacturing multilayer circuits by laminating two or more circuit boards
- H05K3/4623—Manufacturing multilayer circuits by laminating two or more circuit boards the circuit boards having internal via connections between two or more circuit layers before lamination, e.g. double-sided circuit boards
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/49126—Assembling bases
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/49155—Manufacturing circuit on or in base
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/49155—Manufacturing circuit on or in base
- Y10T29/49165—Manufacturing circuit on or in base by forming conductive walled aperture in base
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Combinations Of Printed Boards (AREA)
- Multi-Conductor Connections (AREA)
- Coupling Device And Connection With Printed Circuit (AREA)
- Production Of Multi-Layered Print Wiring Board (AREA)
- Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
- Structures For Mounting Electric Components On Printed Circuit Boards (AREA)
- Wire Bonding (AREA)
Description
次に、金属のような導電性構造材料を孔60内に被着するとともに、一時層の開口52および56内に被着される。被着処理は、孔および開口の表面に、パラジウム塩その他の被着促進剤のような物質を播種し、次いで、播種層の上にめっきを行って金属構造材料を被着することにより行うことができる。播種は、フォトレジスト層64および66の被着前に行われる。構造材料は、本体の孔の周面62を覆うとともに一時層の開口の周壁54および58を覆う連続した一体層74として被着される。構造材料層は、たな72を覆うとともに開口から半径方向外方へ延びるように配設すべきである。
構造金属 拡散バリヤ 耐食性
銅 ニッケル 金
ニッケル コバルト パラジウム
銀 なし Pd/Ni合金
タイプ 導電結合材料 パッド面
はんだ 錫95%、銀5% 錫
はんだ 錫60%、鉛40% 錫
はんだ 錫63%、鉛35%、銀2% 金
ろう 錫94%、金6% 金
拡散 金80%、ゲルマニウム20% 金
拡散 金80%、錫20% 金
拡散 錫90%、銀10% 金
ポリマ 銀50%のエポキシ 金
Claims (51)
- (a)第1の主要面(32)と、該第1の主要面と平行する方向と、前記第1の主要面と直交する垂直方向とを有する本体(30)と、
(b)前記本体内に配置された複数の導体(78、233)と、
(c)前記第1の主要面に配設された複数の接点(80、250、310、454)とを備える、超小形電子素子の表面の電気接点に対する接続を形成する間挿体であって、前記各接点は1つの前記導体に永続的に接合されかつ本体の表面上を半径方向外方に導体から離隔して延びており、前記各接点は導体から離隔する周辺部(84、254)を有しており、前記各接点は接点の周辺部が前記接点に加えられる前記本体へ向かう垂直な力に応答して接点と導体の接合部から半径方向外方へ拡張して変形するように構成され、超小形電子素子が前記第1の面と並置されかつ前記本体へ向けて付勢されたときに前記接点が超小形電子素子のパッドをぬぐうことを特徴とする間挿体。 - 前記各接点は接点(80)の周辺部(84、254)が本体へ向けて垂直方向下方にかつ半径方向外方へ導体から離隔して動くように変形するようになっていることを特徴とする請求項1に記載の間挿体。
- 前記各接点の周辺部(84、254)は前記本体から垂直方向上方に離隔しており、ギャップが前記接点の周辺部と前記本体との間に画成されていることを特徴とする請求項2に記載の間挿体。
- 前記各接点は連係する導体(78、233)に取着された中央部(86、252)と中央部から半径方向外方へ延びる周辺部(84、254)とを有することを特徴とする請求項3に記載の間挿体。
- 前記各中央部は前記本体と係合しており、前記各周辺部は前記本体から上方へ離隔して延びていることを特徴とする請求項4に記載の間挿体。
- 前記各中央領域が前記第1の面と直交する垂直軸線を中心とする回転体(86、252)の形態を概ねなし、前記各中央部は導体から離隔してリムを有し、前記各接点の周辺部(254)は中央部のリムに接続されていることを特徴とする請求項4に記載の間挿体。
- 前記各周辺部(254)は連係する中央部から延びる複数のタブを有することを特徴とする請求項4に記載の間挿体。
- 前記本体は前記第1の面に複数のくぼみ(227)を有し、前記中央部(252)の前記リムは前記くぼみに配置されかつ前記本体の前記第1の面からくぼんでおり、前記各タブ(254)は連係するくぼみから延びていることを特徴とする請求項7に記載の間挿体。
- 前記本体(30)は略円環面の部分を有することを特徴とする請求項7に記載の間挿体。
- 前記各接点の周辺部(254)は非円形であることを特徴とする請求項1に記載の間挿体。
- 前記各接点は半径方向外方へ導体から離れて延びる複数のタブ(254)を有し、前記各タブは導体の端部から離隔して先端部(256)を有することを特徴とする請求項10に記載の間挿体。
- 前記各接点の前記タブ(254)は接点と連係する導体(233)との接合部を中心に略対称のパターンで配置されていることを特徴とする請求項11に記載の間挿体。
- 前記各接点は4つの前記端部(254)を有し、前記略対称のパターンは4つ葉状パターンであることを特徴とする請求項12に記載の間挿体。
- 前記接点(80、250)は行と列とを有する略直線でできたグリッドに配置され、前記タブは前記行と列に対して略対角線に沿って延びることを特徴とする請求項13に記載の間挿体。
- 前記タブの前記先端部(250)は前記本体から垂直方向に離隔していることを特徴とする請求項11に記載の間挿体。
- 前記各接点は係合するパッドに前記タブを容易に接合させるようになっている導電結合材料(76、246)を含むことを特徴とする請求項1乃至15のいずれかに記載の間挿体。
- 前記導電結合材料(76、246)は、はんだ、ろう付合金、拡散結合合金およびポリマを含む導電材料よりなる群から選ばれることを特徴とする請求項16に記載の間挿体。
- 前記接点は金属であることを特徴とする請求項16に記載の間挿体。
- 前記各接点は連係する導体と一体に形成されていることを特徴とする請求項15に記載の間挿体。
- 前記各導体は前記第1の面と略直交して延びることを特徴とする請求項19に記載の間挿体。
- 前記接点は垂直方向上方に開口する凹部を画成し、間挿体は更に該凹部に配置される流動性導電材料(92)を備えることを特徴とする請求項1乃至15のいずれかに記載の間挿体。
- 前記流動性導電材料(92)は部分硬化されたエポキシ、未硬化のエポキシおよび熱可塑性樹脂よりなる群から選ばれるポリマを含むとともに、銀、金、金めっきされたニッケルおよび金めっきされたガラスよりなる群から選ばれる粒状充填材料を含むことを特徴とする請求項21に記載の間挿体。
- 前記各接点(80、250、310)は、中心から周辺部への水平方向の寸法が約400ミクロンよりも小さいことを特徴とする請求項1乃至15のいずれかに記載の間挿体。
- 前記本体(30、218)は前記第1の主要面から反対方向を向く第2の主要面を画成し、前記導体(78、233)の少なくとも幾つかは前記第1の主要面に隣接して配置される第1の端部と前記第2の主要面に隣接して配置される第2の端部とを有する貫通導体であり、前記接点(80、250)の少なくとも幾つかは前記貫通導体の前記第1の端部に永続的に接合されており、間挿体は前記貫通導体の前記第2の端部に永続的に接合される前記第2の主要面に第2端部接点(82、250)を更に備え、前記各第2端部接点は連係する導体から水平方向外方に延びており、前記各第2端部接点は導体から離隔して周辺部を有し、前記各第2端部は超小形電子素子が前記第2の面と並置されかつ前記本体に向けて付勢されると第2端部接点の周辺部が半径方向外方に導体から離隔して曲がって拡張するようになっており、前記間挿体は前記素子間に配置されると2つの超小形電子素子を電気的に相互接続することができることを特徴とする請求項1に記載の間挿体。
- 前記本体は略円環面の部分を有することを特徴とする請求項26に記載の間挿体。
- 前記接点のタブ(454)は前記本体から離れて上方を向く上面と該上面に設けられた凹凸(461)とを有し、該凹凸は接点に係合される接続パッドと係合してぬぐうことを特徴とする請求項7乃至9および10乃至15のいずれかに記載の間挿体。
- (a)回路パネル(98、260)と間挿体(95)とを積み重ねて前記間挿体の第1の面を前記パネルの面と対面させる積み重ね工程を備え、前記間挿体は本体(30、218)と本体の表面に隣接した端部を有する導体(78)とを有するとともに前記各導体に接点(80、82、250)を有し、前記各接点は連係する導体の端部を包囲する周辺部を有し、前記接点の前記周辺部は回路パネルのパッド(100、252、254)と対面するように配置され、更に
(b)前記接点の前記周辺部を前記接点と付勢係合させるとともに各接点(80、82、250)の周辺部を半径方向外方へ連係する導体の端部から離隔して拡張させることにより前記各周辺部が係合したパッドに対して水平方向に動いてパッドの表面をぬぐうように前記積み重ねられたパネルと間挿体とを圧縮する圧縮工程とを備える多層回路の製造方法。 - 前記圧縮工程の際に、前記各周辺部(84、254)は間挿体の本体へ向けて垂直方向下方に動くことを特徴とする請求項27に記載の方法。
- 前記積み重ね工程は1つの前記間挿体が各対をなす回路パネル間に配置され、しかも前記各間挿体の反対側を向く第1の水平面(222)と第2の水平面(224)とが前記パネルの面と対面するように複数の回路パネル(98、260)と少なくとも1つの前記間挿体(95)を互いに介在し合いかつ垂直方向に交互するように積み重ねる工程を備え、前記各間挿体の導体は間挿体の本体を介して延びる貫通導体(76、233)を含むとともに前記第1および第2の面に前記端部と前記接点を有し、前記複数のパネルのパッド(100)は前記貫通導体により相互に接続されることを特徴とする請求項28に記載の方法。
- 前記接点(80、250)を前記パッド(100)に結合する結合工程を更に備えることを特徴とする請求項34乃至36のいずれかに記載の方法。
- 前記結合工程は、前記積み重ねられたパネルと間挿体を瞬間的に加熱して前記接点と前記パッドとの界面の導電性結合材料(76、246)を活性化する瞬間加熱工程を含むことを特徴とする請求項30に記載の方法。
- 前記結合材料は前記接点(80、250)に担持されていることを特徴とする請求項31に記載の方法。
- 前記瞬間加熱工程は本体(218)を軟化させることにより、前記圧縮工程における前記周辺部の垂直方向の動きを容易にすることを特徴とする請求項31に記載の方法。
- 前記間挿体とパネルを融着させて実質上一体的な集合体を形成するように前記圧縮工程の際に前記間挿体と前記パネルとの界面で誘電結合材料を流動させる工程を更に備えることを特徴とする請求項30に記載の方法。
- 前記結合材料を流動させる前記工程は前記瞬間加熱工程を含むことを特徴とする請求項34に記載の方法。
- 前記各接点は凹部を画成しかつ流動性導電材料(92)を前記凹部に配設して備えており、前記流動性導電材料は前記積み重ねおよび圧縮工程において前記パッドと係合されることを特徴とする請求項27に記載の方法。
- 37.前記各接点は略半径方向外方へ連係する導体の端部から離隔して延びる複数のタブを有し、前記各タブは前記圧縮工程の際に連係する導体の端部から離隔する各タブの先端部が間挿体本体へ向けて下方向にかつ導体の端部から水平方向に離隔して動くように曲げられることを特徴とする請求項27項に記載の方法。
- (a)回路パネル(98、200)と間挿体(95)とを垂直方向に重合するように積み重ねて前記間挿体の第1の水平方向に延びる面を回路パネルの第1の水平方向に延びる面と対面させるとともに前記間挿体の前記第1の面の複数の導電接点を回路パネルのパッドと対面させる積み重ね工程と、
(b)前記接点を前記パッドと付勢係合させるとともに前記接点を変形させて各接点(80、250)の少なくともパッド(100、252、254)と係合する部分が係合するパッドに対して水平方向に動いてパッドの表面をぬぐうように前記積み重ねたパネルと間挿体を垂直方向に圧縮する工程と、
(c)前記各接点を係合された接点と結合させる結合工程とを備えることを特徴とする回路集成体の製造方法。 - 前記結合工程は積み重ねられた間挿体と回路パネルを瞬間的に加熱して前記接点と前記パッドとの界面の結合材料(76、246)を活性化する瞬間加熱工程を含み、前記結合材料は前記積み重ね工程に先だって前記接点、前記パッドまたはこれらの双方に存在することを特徴とする請求項38に記載の方法。
- 前記間挿体は前記水平方向に延びる面に誘電層(94、96)を有し、前記各接点は前記圧縮工程の際に前記誘電層と接触しかつ係合された接点に押圧する部分を有し、前記瞬間加熱工程は前記誘電層を軟化させて前記接点の変形を容易にすることを特徴とする請求項39に記載の方法。
- (a)第1の面を画成する本体(30)を提供する工程と、
(b)前記第1の面に開口(52)を有する第1の一時層(36)を配設する工程と、
(c)導電構造材料の層(74)を前記各開口に被着して前記構造材料を一時層の上に延設して接点を形成する被着工程と、
(d)前記接点を前記本体内の導体(78)に接続する工程と、
(e)前記一時層を除去して、前記本体の前記面から垂直方向上方に離隔する外方拡開周辺部(84)を前記接点に形成する除去工程とを備えることを特徴とする超小形電子間挿体の製造方法。 - 前記本体は前記一時層の前記開口と整合して前記面から内方へ延びる孔(60)を有し、前記接点を導体に接続する前記工程は前記構造材料を前記開口に被着する工程の際に前記孔に前記構造材料(74)を被着して前記導体(78)を形成することにより前記導体を前記接点と一体的に形成する工程を含み、前記本体は前記第1の面とは反対の第2の面を画成し、前記本体(30)の前記孔(60)は前記第1の面から前記第2の面へ延び、前記方法は更に前記孔と整合する開口を有する第2の一時層(38)を前記第2の面に配設する工程を備え、前記被着工程は前記構造材料が前記第2の一時層上を延びて接点(82)を前記第2の層に前記導体と一体的に形成するとともに前記接点を前記第1の面に形成するように前記第2の一時層の前記開口に前記構造材料を被着する工程を含み、前記除去工程は前記第2の一時層(38)を除去する工程を含むことを特徴とする請求項41に記載の方法。
- 前記本体に前記孔(60)を形成する前記工程は、前記本体の前記開口に前記一時層(36、38)を被着してから前記一時層をマスクとして使用して前記本体から材料を除去することにより行うことを特徴とする請求項42に記載の方法。
- 前記各開口は中心軸線(48)を有するとともに、水平方向外方へ前記中心軸線から離隔しかつ垂直方向上方へ前記第1の面から離れて拡開する壁(54、58)を有し、前記構造材料を被着する前記工程は前記外方に拡開する壁に前記構造材料を被着する工程を含むことを特徴とする請求項42または43に記載の方法。
- 前記各一時層(36、38)はアルミニウム、錫およびニッケルよりなる群から選ばれる金属から形成され、前記一時層を配設する前記工程は前記本体の前記面に前記金属を層として被着しかつ被着した金属層をマスクして前記開口を形成することによりマスクに開口を配設する工程と、マスク層を前記開口を介して等方性エッチング剤に曝す工程とを含むことを特徴とする請求項42または43に記載の方法。
- 前記一時層(36、38)はフォトレジストを含むことを特徴とする請求項42または43に記載の方法。
- (a)開放したくぼみ(227)を有する主要部を含む第1の面(222)を有する本体を提供する工程を備え、前記各くぼみは前記第1の面の主要部と略直交する中心軸線(210)と中心軸線から離れて外方へ拡開しかつ前記第1の面の主要部と併合する回転面の形態を実質上なす壁とを有し、前記本体は前記第1の面を画成する誘電材料を含み、更に
(b)導電構造材料を前記くぼみに被着して前記壁に層(232)を形成する被着工程と、
(c)前記各層が半径方向外方へ中心軸線から延び接点(250)を提供する複数のタブ(254)を形成するように前記各層の水平方向の拡がりを水平方向に制御する工程と、を備えることを特徴とする超小形電子間挿体の製造方法。 - 前記本体を提供する前記工程は前記本体に前記第1の面とは反対の方向を向く第2の面(222)を設ける工程を含み、前記第2の面はまた前記くぼみ(227)を有し、前記第2の面のくぼみは前記第2の面のくぼみと整合されかつ接続され、接続された各対をなすくぼみは両面が外方に拡開する連続した孔を形成するとともに前記第1および第2の面から離隔して狭いスロートを有し、前記被着工程は前記第1の面から前記各孔の前記第2の面へ連続体(233)として前記構造材料を被着する工程を含むことを特徴とする請求項47に記載の方法。
- 本体を提供する前記工程は孔(212)を有するシート(200)を提供する工程と、前記シートに誘電材料(218)を前記シートと適合するようにコーテイングする工程とを含むことを特徴とする請求項47に記載の方法。
- 前記シートを提供する工程は前記シートに反対側からエッチングを施して前記孔を形成することにより、前記孔に前記シートの表面から離隔した中心面の最も狭い部分へ向けてテーパを付す工程を含むことを特徴とする請求項49に記載の方法。
- 前記シートは導電性であり、コーティングを被着する前記工程は電位を前記シートに印加することにより誘電材料を電気泳動により被着する工程を含むことを特徴とする請求項49または50に記載の方法。
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US08/277,336 US5590460A (en) | 1994-07-19 | 1994-07-19 | Method of making multilayer circuit |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8505266A Division JPH10503055A (ja) | 1994-07-19 | 1995-07-19 | 変形自在の接点を備えた電気接続体 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2006032938A JP2006032938A (ja) | 2006-02-02 |
| JP3934144B2 true JP3934144B2 (ja) | 2007-06-20 |
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| Application Number | Title | Priority Date | Filing Date |
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| JP8505266A Pending JPH10503055A (ja) | 1994-07-19 | 1995-07-19 | 変形自在の接点を備えた電気接続体 |
| JP2005181280A Expired - Lifetime JP3934144B2 (ja) | 1994-07-19 | 2005-06-21 | 変形自在の接点を備えた電気接続体 |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8505266A Pending JPH10503055A (ja) | 1994-07-19 | 1995-07-19 | 変形自在の接点を備えた電気接続体 |
Country Status (8)
| Country | Link |
|---|---|
| US (4) | US5590460A (ja) |
| EP (2) | EP0803135B1 (ja) |
| JP (2) | JPH10503055A (ja) |
| KR (1) | KR100327004B1 (ja) |
| AT (2) | ATE263477T1 (ja) |
| AU (1) | AU3138995A (ja) |
| DE (2) | DE69532832T2 (ja) |
| WO (1) | WO1996002959A1 (ja) |
Families Citing this family (150)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5917707A (en) | 1993-11-16 | 1999-06-29 | Formfactor, Inc. | Flexible contact structure with an electrically conductive shell |
| US5476211A (en) | 1993-11-16 | 1995-12-19 | Form Factor, Inc. | Method of manufacturing electrical contacts, using a sacrificial member |
| US7073254B2 (en) * | 1993-11-16 | 2006-07-11 | Formfactor, Inc. | Method for mounting a plurality of spring contact elements |
| US7200930B2 (en) | 1994-11-15 | 2007-04-10 | Formfactor, Inc. | Probe for semiconductor devices |
| US20020053734A1 (en) | 1993-11-16 | 2002-05-09 | Formfactor, Inc. | Probe card assembly and kit, and methods of making same |
| US7084656B1 (en) | 1993-11-16 | 2006-08-01 | Formfactor, Inc. | Probe for semiconductor devices |
| US5989936A (en) * | 1994-07-07 | 1999-11-23 | Tessera, Inc. | Microelectronic assembly fabrication with terminal formation from a conductive layer |
| US6361959B1 (en) | 1994-07-07 | 2002-03-26 | Tessera, Inc. | Microelectronic unit forming methods and materials |
| US6117694A (en) * | 1994-07-07 | 2000-09-12 | Tessera, Inc. | Flexible lead structures and methods of making same |
| US6828668B2 (en) * | 1994-07-07 | 2004-12-07 | Tessera, Inc. | Flexible lead structures and methods of making same |
| US5590460A (en) | 1994-07-19 | 1997-01-07 | Tessera, Inc. | Method of making multilayer circuit |
| US8033838B2 (en) * | 1996-02-21 | 2011-10-11 | Formfactor, Inc. | Microelectronic contact structure |
| US5994152A (en) | 1996-02-21 | 1999-11-30 | Formfactor, Inc. | Fabricating interconnects and tips using sacrificial substrates |
| US6247228B1 (en) | 1996-08-12 | 2001-06-19 | Tessera, Inc. | Electrical connection with inwardly deformable contacts |
| AU6237498A (en) * | 1996-12-13 | 1998-07-17 | Tessera, Inc. | Microelectronic assembly fabrication with terminal formation from a conductive layer |
| US6820330B1 (en) | 1996-12-13 | 2004-11-23 | Tessera, Inc. | Method for forming a multi-layer circuit assembly |
| US5950070A (en) * | 1997-05-15 | 1999-09-07 | Kulicke & Soffa Investments | Method of forming a chip scale package, and a tool used in forming the chip scale package |
| US5977642A (en) * | 1997-08-25 | 1999-11-02 | International Business Machines Corporation | Dendrite interconnect for planarization and method for producing same |
| FR2770339B1 (fr) * | 1997-10-27 | 2003-06-13 | Commissariat Energie Atomique | Structure munie de contacts electriques formes a travers le substrat de cette structure et procede d'obtention d'une telle structure |
| US6357112B1 (en) * | 1997-11-25 | 2002-03-19 | Tessera, Inc. | Method of making connection component |
| US6016005A (en) * | 1998-02-09 | 2000-01-18 | Cellarosi; Mario J. | Multilayer, high density micro circuit module and method of manufacturing same |
| US6423907B1 (en) | 1998-02-09 | 2002-07-23 | Tessera, Inc. | Components with releasable leads |
| US6329605B1 (en) * | 1998-03-26 | 2001-12-11 | Tessera, Inc. | Components with conductive solder mask layers |
| US6226862B1 (en) | 1998-04-30 | 2001-05-08 | Sheldahl, Inc. | Method for manufacturing printed circuit board assembly |
| JP2000022337A (ja) * | 1998-06-30 | 2000-01-21 | Matsushita Electric Works Ltd | 多層配線板及びその製造方法 |
| US6492201B1 (en) | 1998-07-10 | 2002-12-10 | Tessera, Inc. | Forming microelectronic connection components by electrophoretic deposition |
| WO2000011755A1 (de) * | 1998-08-17 | 2000-03-02 | Infineon Technologies Ag | Kontaktiervorrichtung, insbesondere zum ankontaktieren von elektrischen bauelementen und schaltungsträgern, sowie verfahren zu deren herstellung |
| US6713685B1 (en) * | 1998-09-10 | 2004-03-30 | Viasystems Group, Inc. | Non-circular micro-via |
| US6306752B1 (en) | 1998-09-15 | 2001-10-23 | Tessera, Inc. | Connection component and method of making same |
| US6331735B1 (en) | 1998-09-25 | 2001-12-18 | Advanced Micro Devices, Inc. | Method to improve chip scale package electrostatic discharge performance and suppress marking artifacts |
| US6239485B1 (en) | 1998-11-13 | 2001-05-29 | Fujitsu Limited | Reduced cross-talk noise high density signal interposer with power and ground wrap |
| JP3635219B2 (ja) * | 1999-03-11 | 2005-04-06 | 新光電気工業株式会社 | 半導体装置用多層基板及びその製造方法 |
| US6675469B1 (en) * | 1999-08-11 | 2004-01-13 | Tessera, Inc. | Vapor phase connection techniques |
| DE60027141T2 (de) * | 1999-10-26 | 2006-12-28 | Ibiden Co., Ltd., Ogaki | Gedruckte mehrschichtleiterplatte und herstellungsverfahren für gedruckte mehrschichtleiterplatte |
| US6521844B1 (en) * | 1999-10-29 | 2003-02-18 | International Business Machines Corporation | Through hole in a photoimageable dielectric structure with wired and uncured dielectric |
| US6198170B1 (en) * | 1999-12-16 | 2001-03-06 | Conexant Systems, Inc. | Bonding pad and support structure and method for their fabrication |
| US6206708B1 (en) * | 2000-01-13 | 2001-03-27 | Lucent Technologies, Inc. | Through via plate electrical connector and method of manufacture thereof |
| US6461892B2 (en) | 2000-01-26 | 2002-10-08 | Tessera, Inc. | Methods of making a connection component using a removable layer |
| US6444921B1 (en) | 2000-02-03 | 2002-09-03 | Fujitsu Limited | Reduced stress and zero stress interposers for integrated-circuit chips, multichip substrates, and the like |
| US6804881B1 (en) * | 2000-05-12 | 2004-10-19 | Shipley Company, L.L.C. | Multilayer circuit board manufacturing process |
| KR100496841B1 (ko) * | 2000-05-15 | 2005-06-22 | 몰렉스 인코포레이티드 | 엘라스토머 전기 커넥터 |
| US6499214B2 (en) * | 2000-05-26 | 2002-12-31 | Visteon Global Tech, Inc. | Method of making a circuit board |
| JP2002043467A (ja) * | 2000-07-31 | 2002-02-08 | Hitachi Chem Co Ltd | 半導体パッケージ用基板とその製造方法およびその基板を用いた半導体パッケージ並びに半導体パッケージの製造方法 |
| US6585903B1 (en) * | 2000-09-06 | 2003-07-01 | Visteon Global Tech. Inc. | Electrical circuit board and a method for making the same |
| WO2002043144A1 (en) * | 2000-11-20 | 2002-05-30 | Conexant Systems, Inc. | Structure for bonding pad and method for its fabrication |
| US6465361B1 (en) * | 2001-02-20 | 2002-10-15 | Advanced Micro Devices, Inc. | Method for preventing damage of low-k dielectrics during patterning |
| US6630743B2 (en) * | 2001-02-27 | 2003-10-07 | International Business Machines Corporation | Copper plated PTH barrels and methods for fabricating |
| US6951707B2 (en) * | 2001-03-08 | 2005-10-04 | Ppg Industries Ohio, Inc. | Process for creating vias for circuit assemblies |
| US7228623B2 (en) * | 2001-03-08 | 2007-06-12 | Ppg Industries Ohio, Inc. | Process for fabricating a multi layer circuit assembly |
| US6713587B2 (en) | 2001-03-08 | 2004-03-30 | Ppg Industries Ohio, Inc. | Electrodepositable dielectric coating compositions and methods related thereto |
| US6671950B2 (en) | 2001-03-08 | 2004-01-06 | Ppg Industries Ohio, Inc. | Multi-layer circuit assembly and process for preparing the same |
| US8065795B2 (en) | 2001-03-08 | 2011-11-29 | Ppg Industries Ohio, Inc | Multi-layer circuit assembly and process for preparing the same |
| US7000313B2 (en) * | 2001-03-08 | 2006-02-21 | Ppg Industries Ohio, Inc. | Process for fabricating circuit assemblies using electrodepositable dielectric coating compositions |
| JP2002298946A (ja) * | 2001-03-30 | 2002-10-11 | Jst Mfg Co Ltd | 樹脂ハンダを用いた電気接続具、電気コネクタ及びこれらへの電線接続方法 |
| JP2002298940A (ja) * | 2001-03-30 | 2002-10-11 | Jst Mfg Co Ltd | 樹脂ハンダを用いた電気接触子、電気コネクタ及びこれらのプリント配線板への接続方法 |
| JP2002298962A (ja) * | 2001-03-30 | 2002-10-11 | Jst Mfg Co Ltd | 樹脂ハンダを用いた電気接触子、電気コネクタ及びこれらのプリント配線板への接続方法 |
| JP2002298995A (ja) * | 2001-03-30 | 2002-10-11 | Jst Mfg Co Ltd | 樹脂ハンダを用いた同軸ケーブルの結束部材及び同軸ケーブルの電気コネクタ並びに結束部材の同軸ケーブル又は電気コネクタへの接続方法 |
| JP2002298938A (ja) * | 2001-03-30 | 2002-10-11 | Jst Mfg Co Ltd | 樹脂ハンダを用いたツイストペアケーブルの電気コネクタ及びこの電気コネクタへの電線接続方法 |
| JP2002298993A (ja) * | 2001-03-30 | 2002-10-11 | Jst Mfg Co Ltd | 片方に樹脂ハンダを用いた一対の電気コネクタ |
| US7049929B1 (en) | 2001-05-01 | 2006-05-23 | Tessera, Inc. | Resistor process |
| US6982387B2 (en) * | 2001-06-19 | 2006-01-03 | International Business Machines Corporation | Method and apparatus to establish circuit layers interconnections |
| US6730134B2 (en) * | 2001-07-02 | 2004-05-04 | Intercon Systems, Inc. | Interposer assembly |
| GB0125443D0 (en) * | 2001-10-23 | 2001-12-12 | Novartis Ag | Organic Compounds |
| US6873027B2 (en) * | 2001-10-26 | 2005-03-29 | International Business Machines Corporation | Encapsulated energy-dissipative fuse for integrated circuits and method of making the same |
| US6653214B1 (en) | 2002-01-03 | 2003-11-25 | The United States Of America As Represented By The Secretary Of The Air Force | Measured via-hole etching |
| US6977345B2 (en) * | 2002-01-08 | 2005-12-20 | International Business Machines Corporation | Vents with signal image for signal return path |
| US7754976B2 (en) * | 2002-04-15 | 2010-07-13 | Hamilton Sundstrand Corporation | Compact circuit carrier package |
| US20060213685A1 (en) * | 2002-06-27 | 2006-09-28 | Wang Alan E | Single or multi-layer printed circuit board with improved edge via design |
| AU2003248743A1 (en) * | 2002-06-27 | 2004-01-19 | Ppg Industries Ohio, Inc. | Single or multi-layer printed circuit board with recessed or extended breakaway tabs and method of manufacture thereof |
| US6824959B2 (en) | 2002-06-27 | 2004-11-30 | Ppg Industries Ohio, Inc. | Process for creating holes in polymeric substrates |
| DE10258094B4 (de) * | 2002-12-11 | 2009-06-18 | Qimonda Ag | Verfahren zur Ausbildung von 3-D Strukturen auf Wafern |
| US7071420B2 (en) * | 2002-12-18 | 2006-07-04 | Micron Technology, Inc. | Methods and apparatus for a flexible circuit interposer |
| KR100455891B1 (ko) * | 2002-12-24 | 2004-11-06 | 삼성전기주식회사 | 커패시터 내장형 인쇄회로기판 및 그 제조 방법 |
| US7802360B2 (en) * | 2003-01-29 | 2010-09-28 | General Dynamics Advanced Information Systems, Inc. | Methods for filling holes in printed wiring boards |
| US7758351B2 (en) * | 2003-04-11 | 2010-07-20 | Neoconix, Inc. | Method and system for batch manufacturing of spring elements |
| US7113408B2 (en) * | 2003-06-11 | 2006-09-26 | Neoconix, Inc. | Contact grid array formed on a printed circuit board |
| US7056131B1 (en) | 2003-04-11 | 2006-06-06 | Neoconix, Inc. | Contact grid array system |
| US7628617B2 (en) * | 2003-06-11 | 2009-12-08 | Neoconix, Inc. | Structure and process for a contact grid array formed in a circuitized substrate |
| US7597561B2 (en) * | 2003-04-11 | 2009-10-06 | Neoconix, Inc. | Method and system for batch forming spring elements in three dimensions |
| US20050120553A1 (en) * | 2003-12-08 | 2005-06-09 | Brown Dirk D. | Method for forming MEMS grid array connector |
| US7114961B2 (en) * | 2003-04-11 | 2006-10-03 | Neoconix, Inc. | Electrical connector on a flexible carrier |
| US20070020960A1 (en) * | 2003-04-11 | 2007-01-25 | Williams John D | Contact grid array system |
| US8584353B2 (en) * | 2003-04-11 | 2013-11-19 | Neoconix, Inc. | Method for fabricating a contact grid array |
| US20100167561A1 (en) * | 2003-04-11 | 2010-07-01 | Neoconix, Inc. | Structure and process for a contact grid array formed in a circuitized substrate |
| US7244125B2 (en) * | 2003-12-08 | 2007-07-17 | Neoconix, Inc. | Connector for making electrical contact at semiconductor scales |
| JP2004319384A (ja) * | 2003-04-18 | 2004-11-11 | Alps Electric Co Ltd | 電子回路ユニット |
| US6845665B2 (en) * | 2003-04-28 | 2005-01-25 | Analog Devices, Inc. | Micro-machined multi-sensor providing 2-axes of acceleration sensing and 1-axis of angular rate sensing |
| US6767758B1 (en) | 2003-04-28 | 2004-07-27 | Analog Devices, Inc. | Micro-machined device structures having on and off-axis orientations |
| US6848304B2 (en) * | 2003-04-28 | 2005-02-01 | Analog Devices, Inc. | Six degree-of-freedom micro-machined multi-sensor |
| US6837107B2 (en) * | 2003-04-28 | 2005-01-04 | Analog Devices, Inc. | Micro-machined multi-sensor providing 1-axis of acceleration sensing and 2-axes of angular rate sensing |
| US7137827B2 (en) * | 2003-11-17 | 2006-11-21 | International Business Machines Corporation | Interposer with electrical contact button and method |
| US20050227510A1 (en) * | 2004-04-09 | 2005-10-13 | Brown Dirk D | Small array contact with precision working range |
| US20050128948A1 (en) * | 2003-12-11 | 2005-06-16 | Chen-Chi Kuo | Locally stored portion of a calendar structure indicating when interfaces will become available to transmit packets |
| US7090503B2 (en) * | 2004-03-19 | 2006-08-15 | Neoconix, Inc. | Interposer with compliant pins |
| US7347698B2 (en) * | 2004-03-19 | 2008-03-25 | Neoconix, Inc. | Deep drawn electrical contacts and method for making |
| US20050205988A1 (en) * | 2004-03-19 | 2005-09-22 | Epic Technology Inc. | Die package with higher useable die contact pad area |
| US7383632B2 (en) * | 2004-03-19 | 2008-06-10 | Neoconix, Inc. | Method for fabricating a connector |
| US7025601B2 (en) * | 2004-03-19 | 2006-04-11 | Neoconix, Inc. | Interposer and method for making same |
| US7094063B1 (en) * | 2004-04-30 | 2006-08-22 | Agilent Technologies, Inc. | High density interconnect |
| WO2005119765A2 (en) * | 2004-06-02 | 2005-12-15 | Tessera, Inc. | Assembly including vertical and horizontal joined circuit panels |
| US7547978B2 (en) | 2004-06-14 | 2009-06-16 | Micron Technology, Inc. | Underfill and encapsulation of semiconductor assemblies with materials having differing properties |
| WO2005121762A1 (en) * | 2004-06-14 | 2005-12-22 | Oxford Biosensors Ltd | Micro-band electrode manufacturing method |
| US20060000642A1 (en) * | 2004-07-01 | 2006-01-05 | Epic Technology Inc. | Interposer with compliant pins |
| US7354276B2 (en) * | 2004-07-20 | 2008-04-08 | Neoconix, Inc. | Interposer with compliant pins |
| TWI235019B (en) * | 2004-07-27 | 2005-06-21 | Unimicron Technology Corp | Process of conductive column and circuit board with conductive column |
| US7105918B2 (en) * | 2004-07-29 | 2006-09-12 | Micron Technology, Inc. | Interposer with flexible solder pad elements and methods of manufacturing the same |
| US7235431B2 (en) * | 2004-09-02 | 2007-06-26 | Micron Technology, Inc. | Methods for packaging a plurality of semiconductor dice using a flowable dielectric material |
| JP4354889B2 (ja) * | 2004-09-02 | 2009-10-28 | アルプス電気株式会社 | コネクタ用基板 |
| US7021941B1 (en) * | 2004-10-19 | 2006-04-04 | Speed Tech Corp. | Flexible land grid array connector |
| WO2006137896A2 (en) * | 2004-12-16 | 2006-12-28 | International Business Machines Corporation | Metalized elastomeric probe structure |
| US7771208B2 (en) * | 2004-12-16 | 2010-08-10 | International Business Machines Corporation | Metalized elastomeric electrical contacts |
| JPWO2006064863A1 (ja) * | 2004-12-17 | 2008-06-12 | イビデン株式会社 | プリント配線板 |
| TW200644261A (en) * | 2005-06-06 | 2006-12-16 | Megica Corp | Chip-package structure and manufacturing process thereof |
| US7683266B2 (en) * | 2005-07-29 | 2010-03-23 | Sanyo Electric Co., Ltd. | Circuit board and circuit apparatus using the same |
| US20070050738A1 (en) * | 2005-08-31 | 2007-03-01 | Dittmann Larry E | Customer designed interposer |
| US7357644B2 (en) * | 2005-12-12 | 2008-04-15 | Neoconix, Inc. | Connector having staggered contact architecture for enhanced working range |
| TW200743268A (en) * | 2006-05-02 | 2007-11-16 | Hon Hai Prec Ind Co Ltd | Electrical connector |
| US7666008B2 (en) * | 2006-09-22 | 2010-02-23 | Onanon, Inc. | Conductive elastomeric and mechanical pin and contact system |
| TWI342172B (en) * | 2007-01-02 | 2011-05-11 | Advanced Semiconductor Eng | Circuit board and method for manufacturing the same |
| US8832936B2 (en) * | 2007-04-30 | 2014-09-16 | International Business Machines Corporation | Method of forming metallized elastomeric electrical contacts |
| US7712210B2 (en) * | 2007-06-07 | 2010-05-11 | Endicott Interconnect Technologies, Inc. | Method of providing a printed circuit board with an edge connection portion |
| US8008188B2 (en) | 2007-06-11 | 2011-08-30 | Ppg Industries Ohio, Inc. | Method of forming solid blind vias through the dielectric coating on high density interconnect substrate materials |
| US7923298B2 (en) | 2007-09-07 | 2011-04-12 | Micron Technology, Inc. | Imager die package and methods of packaging an imager die on a temporary carrier |
| US20090229988A1 (en) * | 2007-09-19 | 2009-09-17 | Anestel Corporation | Methods For Providing Composite Asperities |
| JP4809308B2 (ja) * | 2007-09-21 | 2011-11-09 | 新光電気工業株式会社 | 基板の製造方法 |
| DE202008001997U1 (de) * | 2008-02-14 | 2008-04-03 | Rosenberger Hochfrequenztechnik Gmbh & Co. Kg | Kontaktfeder |
| US8431831B2 (en) * | 2008-10-08 | 2013-04-30 | Oracle America, Inc. | Bond strength and interconnection in a via |
| JP5360900B2 (ja) * | 2009-11-04 | 2013-12-04 | 北川工業株式会社 | 導電部品 |
| US8263879B2 (en) | 2009-11-06 | 2012-09-11 | International Business Machines Corporation | Axiocentric scrubbing land grid array contacts and methods for fabrication |
| US8007287B1 (en) * | 2010-03-22 | 2011-08-30 | Tyco Electronics Corporation | Connector system having contact overlapping vias |
| US9689897B2 (en) * | 2010-06-03 | 2017-06-27 | Hsio Technologies, Llc | Performance enhanced semiconductor socket |
| US8431445B2 (en) | 2011-06-01 | 2013-04-30 | Toyota Motor Engineering & Manufacturing North America, Inc. | Multi-component power structures and methods for forming the same |
| US9093396B2 (en) * | 2011-10-31 | 2015-07-28 | Masahiro Lee | Silicon interposer systems |
| US8641428B2 (en) | 2011-12-02 | 2014-02-04 | Neoconix, Inc. | Electrical connector and method of making it |
| US8926343B2 (en) * | 2012-11-16 | 2015-01-06 | Tyco Electronics Corporation | Electrical interconnect device employing an array of conductive elastomer columns |
| US9039425B2 (en) | 2013-01-21 | 2015-05-26 | Tyco Electronics Corporation | Electrical interconnect device |
| US9680273B2 (en) | 2013-03-15 | 2017-06-13 | Neoconix, Inc | Electrical connector with electrical contacts protected by a layer of compressible material and method of making it |
| JP2015049986A (ja) * | 2013-08-30 | 2015-03-16 | 富士通株式会社 | コネクタ及びその製造方法 |
| WO2015066464A1 (en) | 2013-11-01 | 2015-05-07 | Quell Corporation | Very low inductance flexible electrical connector insert |
| US9692188B2 (en) | 2013-11-01 | 2017-06-27 | Quell Corporation | Flexible electrical connector insert with conductive and non-conductive elastomers |
| US9859624B2 (en) * | 2016-04-29 | 2018-01-02 | Deere & Company | Electrical connector assembly |
| JP6733493B2 (ja) * | 2016-10-25 | 2020-07-29 | 株式会社オートネットワーク技術研究所 | 電気接点、コネクタ端子対、およびコネクタ対 |
| DE102017002150A1 (de) * | 2017-03-06 | 2018-09-06 | Rosenberger Hochfrequenztechnik Gmbh & Co. Kg | Elektrisches Kontaktelement |
| US10750614B2 (en) * | 2017-06-12 | 2020-08-18 | Invensas Corporation | Deformable electrical contacts with conformable target pads |
| CN109787007A (zh) * | 2017-11-15 | 2019-05-21 | 富士康(昆山)电脑接插件有限公司 | 电连接器及其导电端子 |
| JP7032128B2 (ja) * | 2017-12-25 | 2022-03-08 | 住友電工プリントサーキット株式会社 | プリント配線板及びプリント配線板の製造方法 |
| US10531577B1 (en) * | 2019-01-31 | 2020-01-07 | At&S Austria Technologie & Systemtechnik Aktiengesellschaft | Forming through holes through exposed dielectric material of component carrier |
| US12407123B1 (en) | 2020-11-23 | 2025-09-02 | Quell Corporation | Electrically dissipative flexible unitary connector insert |
| KR20220160967A (ko) * | 2021-05-28 | 2022-12-06 | (주)티에스이 | 이종 재질의 다층 회로기판 및 그 제조 방법 |
| WO2024020819A1 (zh) * | 2022-07-27 | 2024-02-01 | 京东方科技集团股份有限公司 | 功能基板及其制备方法、电子设备 |
Family Cites Families (66)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2745898A (en) | 1952-09-20 | 1956-05-15 | Gen Electric | Insulated electric conductors |
| US3190953A (en) * | 1961-06-15 | 1965-06-22 | Martin Marietta Corp | Channel flanged capillary eyelet for printed circuit boards |
| US3316618A (en) * | 1963-12-09 | 1967-05-02 | Rca Corp | Method of making connection to stacked printed circuit boards |
| US3316619A (en) * | 1963-12-09 | 1967-05-02 | Rca Corp | Method of making connections to stacked printed circuit boards |
| US3509270A (en) * | 1968-04-08 | 1970-04-28 | Ney Co J M | Interconnection for printed circuits and method of making same |
| US3541222A (en) * | 1969-01-13 | 1970-11-17 | Bunker Ramo | Connector screen for interconnecting adjacent surfaces of laminar circuits and method of making |
| US3628106A (en) | 1969-05-05 | 1971-12-14 | Gen Electric | Passivated semiconductor device with protective peripheral junction portion |
| BE756568A (fr) | 1969-10-09 | 1971-03-01 | Kabel Metallwerke Ghh | Cables electriques et procede pour leur fabrication |
| US3616532A (en) * | 1970-02-02 | 1971-11-02 | Sperry Rand Corp | Multilayer printed circuit electrical interconnection device |
| DE2119567C2 (de) * | 1970-05-05 | 1983-07-14 | International Computers Ltd., London | Elektrische Verbindungsvorrichtung und Verfahren zu ihrer Herstellung |
| US3892646A (en) | 1970-08-17 | 1975-07-01 | Ibm | Process for selectively forming electrophoretic coatings on electrical contacts |
| GB1387587A (en) * | 1971-07-22 | 1975-03-19 | Plessey Co Ltd | Electrical interconnectors and connector assemblies |
| US3739469A (en) * | 1971-12-27 | 1973-06-19 | Ibm | Multilayer printed circuit board and method of manufacture |
| US3911475A (en) | 1972-04-19 | 1975-10-07 | Westinghouse Electric Corp | Encapsulated solid state electronic devices having a sealed lead-encapsulant interface |
| US3908187A (en) | 1973-01-02 | 1975-09-23 | Gen Electric | High voltage power transistor and method for making |
| US3904934A (en) * | 1973-03-26 | 1975-09-09 | Massachusetts Inst Technology | Interconnection of planar electronic structures |
| US4074342A (en) * | 1974-12-20 | 1978-02-14 | International Business Machines Corporation | Electrical package for lsi devices and assembly process therefor |
| US4070077A (en) * | 1976-06-01 | 1978-01-24 | E. I. Du Pont De Nemours And Company | Circuit board eyelet |
| US4225900A (en) * | 1978-10-25 | 1980-09-30 | Raytheon Company | Integrated circuit device package interconnect means |
| SE435343B (sv) | 1978-12-05 | 1984-09-24 | Thams Johan Petter B | Forfarande vid beleggning vid skarpa kanter pa metallforemal |
| US4249302A (en) * | 1978-12-28 | 1981-02-10 | Ncr Corporation | Multilayer printed circuit board |
| JPS55156395A (en) * | 1979-05-24 | 1980-12-05 | Fujitsu Ltd | Method of fabricating hollow multilayer printed board |
| US4548451A (en) * | 1984-04-27 | 1985-10-22 | International Business Machines Corporation | Pinless connector interposer and method for making the same |
| US4601916A (en) | 1984-07-18 | 1986-07-22 | Kollmorgen Technologies Corporation | Process for bonding metals to electrophoretically deposited resin coatings |
| US4592816A (en) | 1984-09-26 | 1986-06-03 | Rohm And Haas Company | Electrophoretic deposition process |
| JPS61147593A (ja) | 1984-12-20 | 1986-07-05 | 神東塗料株式会社 | 導電性接着剤層を付与したフレキシブル回路基材およびその製造方法 |
| US4685210A (en) * | 1985-03-13 | 1987-08-11 | The Boeing Company | Multi-layer circuit board bonding method utilizing noble metal coated surfaces |
| US4729809A (en) * | 1985-03-14 | 1988-03-08 | Amp Incorporated | Anisotropically conductive adhesive composition |
| DE3517796A1 (de) | 1985-05-17 | 1986-11-20 | Hoechst Ag, 6230 Frankfurt | Verfahren zur herstellung von elektrisch isolierendem basismaterial fuer die fertigung von durchkontaktierten leiterplatten |
| US4760105A (en) | 1985-10-09 | 1988-07-26 | Westinghouse Electric Corp. | Polyimide modified epoxy resins in aqueous emulsions for lamination and electrodeposition |
| US4655519A (en) * | 1985-10-16 | 1987-04-07 | Amp Incorporated | Electrical connector for interconnecting arrays of conductive areas |
| US4743710A (en) | 1985-10-18 | 1988-05-10 | Kollmorgen Technologies Corporation | Coaxial interconnection boards |
| US4902606A (en) * | 1985-12-20 | 1990-02-20 | Hughes Aircraft Company | Compressive pedestal for microminiature connections |
| US4716049A (en) * | 1985-12-20 | 1987-12-29 | Hughes Aircraft Company | Compressive pedestal for microminiature connections |
| US4924353A (en) * | 1985-12-20 | 1990-05-08 | Hughes Aircraft Company | Connector system for coupling to an integrated circuit chip |
| US4793814A (en) * | 1986-07-21 | 1988-12-27 | Rogers Corporation | Electrical circuit board interconnect |
| US4714646A (en) | 1986-03-24 | 1987-12-22 | International Business Machines Corporation | Electrophoretic insulation of metal circuit board core |
| US4695870A (en) * | 1986-03-27 | 1987-09-22 | Hughes Aircraft Company | Inverted chip carrier |
| US4788766A (en) * | 1987-05-20 | 1988-12-06 | Loral Corporation | Method of fabricating a multilayer circuit board assembly |
| JPH01225197A (ja) | 1988-03-04 | 1989-09-08 | Canon Inc | プリント回路基板の製造方法 |
| JPH02117192A (ja) * | 1988-10-27 | 1990-05-01 | Mitsubishi Electric Corp | 印刷配線板の製造方法 |
| US5252548A (en) | 1989-06-09 | 1993-10-12 | Oki Electric Industry Co., Ltd. | Method of forming an oxide superconductor/semiconductor junction |
| US4954878A (en) * | 1989-06-29 | 1990-09-04 | Digital Equipment Corp. | Method of packaging and powering integrated circuit chips and the chip assembly formed thereby |
| US5471151A (en) | 1990-02-14 | 1995-11-28 | Particle Interconnect, Inc. | Electrical interconnect using particle enhanced joining of metal surfaces |
| US5047830A (en) * | 1990-05-22 | 1991-09-10 | Amp Incorporated | Field emitter array integrated circuit chip interconnection |
| US5148266A (en) | 1990-09-24 | 1992-09-15 | Ist Associates, Inc. | Semiconductor chip assemblies having interposer and flexible lead |
| US5148265A (en) | 1990-09-24 | 1992-09-15 | Ist Associates, Inc. | Semiconductor chip assemblies with fan-in leads |
| US5142775A (en) * | 1990-10-30 | 1992-09-01 | International Business Machines Corporation | Bondable via |
| US5129142A (en) * | 1990-10-30 | 1992-07-14 | International Business Machines Corporation | Encapsulated circuitized power core alignment and lamination |
| US5037312A (en) * | 1990-11-15 | 1991-08-06 | Amp Incorporated | Conductive gel area array connector |
| US5227588A (en) * | 1991-03-25 | 1993-07-13 | Hughes Aircraft Company | Interconnection of opposite sides of a circuit board |
| US5288377A (en) | 1991-06-05 | 1994-02-22 | Macdermid, Incorporated | Process for the manufacture of printed circuits using electrophoretically deposited organic resists |
| US5167512A (en) * | 1991-07-05 | 1992-12-01 | Walkup William B | Multi-chip module connector element and system |
| US5153986A (en) | 1991-07-17 | 1992-10-13 | International Business Machines | Method for fabricating metal core layers for a multi-layer circuit board |
| US5173055A (en) * | 1991-08-08 | 1992-12-22 | Amp Incorporated | Area array connector |
| US5131852A (en) * | 1991-08-23 | 1992-07-21 | Amp Incorporated | Electrical socket |
| US5152695A (en) * | 1991-10-10 | 1992-10-06 | Amp Incorporated | Surface mount electrical connector |
| US5232548A (en) * | 1991-10-29 | 1993-08-03 | International Business Machines Corporation | Discrete fabrication of multi-layer thin film, wiring structures |
| US5224265A (en) * | 1991-10-29 | 1993-07-06 | International Business Machines Corporation | Fabrication of discrete thin film wiring structures |
| US5282312A (en) * | 1991-12-31 | 1994-02-01 | Tessera, Inc. | Multi-layer circuit construction methods with customization features |
| US5228861A (en) * | 1992-06-12 | 1993-07-20 | Amp Incorporated | High density electrical connector system |
| US5632631A (en) | 1994-06-07 | 1997-05-27 | Tessera, Inc. | Microelectronic contacts with asperities and methods of making same |
| US5590460A (en) * | 1994-07-19 | 1997-01-07 | Tessera, Inc. | Method of making multilayer circuit |
| US5659952A (en) | 1994-09-20 | 1997-08-26 | Tessera, Inc. | Method of fabricating compliant interface for semiconductor chip |
| US5597470A (en) | 1995-06-18 | 1997-01-28 | Tessera, Inc. | Method for making a flexible lead for a microelectronic device |
| US5808874A (en) | 1996-05-02 | 1998-09-15 | Tessera, Inc. | Microelectronic connections with liquid conductive elements |
-
1994
- 1994-07-19 US US08/277,336 patent/US5590460A/en not_active Expired - Lifetime
-
1995
- 1995-07-19 AU AU31389/95A patent/AU3138995A/en not_active Abandoned
- 1995-07-19 AT AT99119308T patent/ATE263477T1/de not_active IP Right Cessation
- 1995-07-19 DE DE1995632832 patent/DE69532832T2/de not_active Expired - Fee Related
- 1995-07-19 EP EP95927327A patent/EP0803135B1/en not_active Expired - Lifetime
- 1995-07-19 WO PCT/US1995/009201 patent/WO1996002959A1/en active IP Right Grant
- 1995-07-19 EP EP99119308A patent/EP0969706B1/en not_active Expired - Lifetime
- 1995-07-19 DE DE69516725T patent/DE69516725T2/de not_active Expired - Fee Related
- 1995-07-19 JP JP8505266A patent/JPH10503055A/ja active Pending
- 1995-07-19 AT AT95927327T patent/ATE192609T1/de not_active IP Right Cessation
- 1995-07-19 KR KR1019970700427A patent/KR100327004B1/ko not_active Expired - Lifetime
-
1996
- 1996-08-12 US US08/695,642 patent/US6239386B1/en not_active Expired - Lifetime
-
1998
- 1998-07-17 US US09/118,735 patent/US6266874B1/en not_active Expired - Lifetime
-
2000
- 2000-09-01 US US09/653,930 patent/US6274820B1/en not_active Expired - Lifetime
-
2005
- 2005-06-21 JP JP2005181280A patent/JP3934144B2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| EP0803135A4 (ja) | 1997-10-29 |
| US6274820B1 (en) | 2001-08-14 |
| DE69532832D1 (de) | 2004-05-06 |
| JPH10503055A (ja) | 1998-03-17 |
| EP0969706A2 (en) | 2000-01-05 |
| US6239386B1 (en) | 2001-05-29 |
| KR100327004B1 (ko) | 2002-04-17 |
| DE69516725D1 (de) | 2000-06-08 |
| ATE192609T1 (de) | 2000-05-15 |
| ATE263477T1 (de) | 2004-04-15 |
| KR970705201A (ko) | 1997-09-06 |
| AU3138995A (en) | 1996-02-16 |
| EP0969706B1 (en) | 2004-03-31 |
| EP0969706A3 (en) | 2002-05-02 |
| US6266874B1 (en) | 2001-07-31 |
| EP0803135B1 (en) | 2000-05-03 |
| DE69516725T2 (de) | 2000-10-26 |
| DE69532832T2 (de) | 2005-01-13 |
| US5590460A (en) | 1997-01-07 |
| JP2006032938A (ja) | 2006-02-02 |
| EP0803135A1 (en) | 1997-10-29 |
| WO1996002959A1 (en) | 1996-02-01 |
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