JP4797248B2 - Pre-preg for printed wiring board and laminated board using the same - Google Patents
Pre-preg for printed wiring board and laminated board using the same Download PDFInfo
- Publication number
- JP4797248B2 JP4797248B2 JP2001018599A JP2001018599A JP4797248B2 JP 4797248 B2 JP4797248 B2 JP 4797248B2 JP 2001018599 A JP2001018599 A JP 2001018599A JP 2001018599 A JP2001018599 A JP 2001018599A JP 4797248 B2 JP4797248 B2 JP 4797248B2
- Authority
- JP
- Japan
- Prior art keywords
- epoxy resin
- prepreg
- parts
- printed wiring
- weight
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000003822 epoxy resin Substances 0.000 claims description 49
- 229920000647 polyepoxide Polymers 0.000 claims description 49
- 239000002966 varnish Substances 0.000 claims description 14
- 239000011521 glass Substances 0.000 claims description 13
- 239000011888 foil Substances 0.000 claims description 10
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 claims description 9
- 229910052751 metal Inorganic materials 0.000 claims description 9
- 239000002184 metal Substances 0.000 claims description 9
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 claims description 8
- -1 imidazole compound Chemical class 0.000 claims description 8
- 125000003118 aryl group Chemical group 0.000 claims description 7
- 239000002759 woven fabric Substances 0.000 claims description 7
- 239000004745 nonwoven fabric Substances 0.000 claims description 5
- 239000000454 talc Substances 0.000 claims description 5
- 229910052623 talc Inorganic materials 0.000 claims description 5
- 229920005989 resin Polymers 0.000 description 16
- 239000011347 resin Substances 0.000 description 16
- 239000003795 chemical substances by application Substances 0.000 description 15
- 239000011256 inorganic filler Substances 0.000 description 15
- 229910003475 inorganic filler Inorganic materials 0.000 description 15
- 238000003860 storage Methods 0.000 description 13
- 239000011342 resin composition Substances 0.000 description 11
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 9
- 239000004593 Epoxy Substances 0.000 description 8
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 5
- 239000011889 copper foil Substances 0.000 description 5
- 238000001035 drying Methods 0.000 description 4
- 238000000465 moulding Methods 0.000 description 4
- 229920003986 novolac Polymers 0.000 description 4
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 150000001412 amines Chemical class 0.000 description 3
- 125000003700 epoxy group Chemical group 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- LTVUCOSIZFEASK-MPXCPUAZSA-N (3ar,4s,7r,7as)-3a-methyl-3a,4,7,7a-tetrahydro-4,7-methano-2-benzofuran-1,3-dione Chemical compound C([C@H]1C=C2)[C@H]2[C@H]2[C@]1(C)C(=O)OC2=O LTVUCOSIZFEASK-MPXCPUAZSA-N 0.000 description 2
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 description 2
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 2
- LLPKQRMDOFYSGZ-UHFFFAOYSA-N 2,5-dimethyl-1h-imidazole Chemical compound CC1=CN=C(C)N1 LLPKQRMDOFYSGZ-UHFFFAOYSA-N 0.000 description 2
- VWSLLSXLURJCDF-UHFFFAOYSA-N 2-methyl-4,5-dihydro-1h-imidazole Chemical compound CC1=NCCN1 VWSLLSXLURJCDF-UHFFFAOYSA-N 0.000 description 2
- AERZMMNNWVZSNB-UHFFFAOYSA-N 3-dodec-1-ynyloxolane-2,5-dione Chemical compound CCCCCCCCCCC#CC1CC(=O)OC1=O AERZMMNNWVZSNB-UHFFFAOYSA-N 0.000 description 2
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 2
- 229920003319 Araldite® Polymers 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 150000008065 acid anhydrides Chemical class 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 2
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- FLBJFXNAEMSXGL-UHFFFAOYSA-N het anhydride Chemical compound O=C1OC(=O)C2C1C1(Cl)C(Cl)=C(Cl)C2(Cl)C1(Cl)Cl FLBJFXNAEMSXGL-UHFFFAOYSA-N 0.000 description 2
- 239000012948 isocyanate Substances 0.000 description 2
- VYKXQOYUCMREIS-UHFFFAOYSA-N methylhexahydrophthalic anhydride Chemical compound C1CCCC2C(=O)OC(=O)C21C VYKXQOYUCMREIS-UHFFFAOYSA-N 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 150000002989 phenols Chemical class 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 230000008961 swelling Effects 0.000 description 2
- MTZUIIAIAKMWLI-UHFFFAOYSA-N 1,2-diisocyanatobenzene Chemical compound O=C=NC1=CC=CC=C1N=C=O MTZUIIAIAKMWLI-UHFFFAOYSA-N 0.000 description 1
- ZXHZWRZAWJVPIC-UHFFFAOYSA-N 1,2-diisocyanatonaphthalene Chemical compound C1=CC=CC2=C(N=C=O)C(N=C=O)=CC=C21 ZXHZWRZAWJVPIC-UHFFFAOYSA-N 0.000 description 1
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- FBHPRUXJQNWTEW-UHFFFAOYSA-N 1-benzyl-2-methylimidazole Chemical compound CC1=NC=CN1CC1=CC=CC=C1 FBHPRUXJQNWTEW-UHFFFAOYSA-N 0.000 description 1
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- 229940093475 2-ethoxyethanol Drugs 0.000 description 1
- SHYARJUKNREDGB-UHFFFAOYSA-N 2-ethyl-5-methyl-4,5-dihydro-1h-imidazole Chemical compound CCC1=NCC(C)N1 SHYARJUKNREDGB-UHFFFAOYSA-N 0.000 description 1
- YTWBFUCJVWKCCK-UHFFFAOYSA-N 2-heptadecyl-1h-imidazole Chemical compound CCCCCCCCCCCCCCCCCC1=NC=CN1 YTWBFUCJVWKCCK-UHFFFAOYSA-N 0.000 description 1
- NCVGSSQICKMAIA-UHFFFAOYSA-N 2-heptadecyl-4,5-dihydro-1h-imidazole Chemical compound CCCCCCCCCCCCCCCCCC1=NCCN1 NCVGSSQICKMAIA-UHFFFAOYSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 2-phenyl-1h-imidazole Chemical compound C1=CNC(C=2C=CC=CC=2)=N1 ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 0.000 description 1
- BKCCAYLNRIRKDJ-UHFFFAOYSA-N 2-phenyl-4,5-dihydro-1h-imidazole Chemical compound N1CCN=C1C1=CC=CC=C1 BKCCAYLNRIRKDJ-UHFFFAOYSA-N 0.000 description 1
- FUOZJYASZOSONT-UHFFFAOYSA-N 2-propan-2-yl-1h-imidazole Chemical compound CC(C)C1=NC=CN1 FUOZJYASZOSONT-UHFFFAOYSA-N 0.000 description 1
- BTYIFQSAIPDZQW-UHFFFAOYSA-N 2-propan-2-yl-4,5-dihydro-1h-imidazole Chemical compound CC(C)C1=NCCN1 BTYIFQSAIPDZQW-UHFFFAOYSA-N 0.000 description 1
- LLEASVZEQBICSN-UHFFFAOYSA-N 2-undecyl-1h-imidazole Chemical compound CCCCCCCCCCCC1=NC=CN1 LLEASVZEQBICSN-UHFFFAOYSA-N 0.000 description 1
- FQHUDZKKDCTQET-UHFFFAOYSA-N 2-undecyl-4,5-dihydro-1h-imidazole Chemical compound CCCCCCCCCCCC1=NCCN1 FQHUDZKKDCTQET-UHFFFAOYSA-N 0.000 description 1
- UPMLOUAZCHDJJD-UHFFFAOYSA-N 4,4'-Diphenylmethane Diisocyanate Chemical compound C1=CC(N=C=O)=CC=C1CC1=CC=C(N=C=O)C=C1 UPMLOUAZCHDJJD-UHFFFAOYSA-N 0.000 description 1
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 1
- CPHGOBGXZQKCKI-UHFFFAOYSA-N 4,5-diphenyl-1h-imidazole Chemical compound N1C=NC(C=2C=CC=CC=2)=C1C1=CC=CC=C1 CPHGOBGXZQKCKI-UHFFFAOYSA-N 0.000 description 1
- JJUVAPMVTXLLFR-UHFFFAOYSA-N 5-methyl-2-phenyl-4,5-dihydro-1h-imidazole Chemical compound N1C(C)CN=C1C1=CC=CC=C1 JJUVAPMVTXLLFR-UHFFFAOYSA-N 0.000 description 1
- KNDQHSIWLOJIGP-UHFFFAOYSA-N 826-62-0 Chemical compound C1C2C3C(=O)OC(=O)C3C1C=C2 KNDQHSIWLOJIGP-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 1
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 1
- 239000005057 Hexamethylene diisocyanate Substances 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- FDLQZKYLHJJBHD-UHFFFAOYSA-N [3-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=CC(CN)=C1 FDLQZKYLHJJBHD-UHFFFAOYSA-N 0.000 description 1
- 230000005856 abnormality Effects 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- IMUDHTPIFIBORV-UHFFFAOYSA-N aminoethylpiperazine Chemical compound NCCN1CCNCC1 IMUDHTPIFIBORV-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 230000001588 bifunctional effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 229910052570 clay Inorganic materials 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 1
- 125000005442 diisocyanate group Chemical group 0.000 description 1
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 1
- 239000000347 magnesium hydroxide Substances 0.000 description 1
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 1
- QOHMWDJIBGVPIF-UHFFFAOYSA-N n',n'-diethylpropane-1,3-diamine Chemical compound CCN(CC)CCCN QOHMWDJIBGVPIF-UHFFFAOYSA-N 0.000 description 1
- 150000002903 organophosphorus compounds Chemical class 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- QCTJRYGLPAFRMS-UHFFFAOYSA-N prop-2-enoic acid;1,3,5-triazine-2,4,6-triamine Chemical compound OC(=O)C=C.NC1=NC(N)=NC(N)=N1 QCTJRYGLPAFRMS-UHFFFAOYSA-N 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 125000000467 secondary amino group Chemical group [H]N([*:1])[*:2] 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 238000002076 thermal analysis method Methods 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 1
- 238000009849 vacuum degassing Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000010456 wollastonite Substances 0.000 description 1
- 229910052882 wollastonite Inorganic materials 0.000 description 1
- DIHAURBCYGTGCV-UHFFFAOYSA-N xi-4,5-Dihydro-2,4(5)-dimethyl-1H-imidazole Chemical compound CC1CN=C(C)N1 DIHAURBCYGTGCV-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Reinforced Plastic Materials (AREA)
- Epoxy Resins (AREA)
Description
【0001】
【発明の属する技術分野】
本発明は、プリント配線板をはじめとする電気絶縁材料として使用するプリント配線板用プリプレグおよびそれを用いた積層板に関する。特に、保存安定性と成形性に優れたプリント配線板用プリプレグ、および成形性、耐熱性、ガラス転移温度(以下「Tg」という。)特性に優れた積層板に関する。
【0002】
【従来の技術】
電気・電子機器等に使用される金属張積層板は、たとえば、ガラスクロス等の基材にエポキシ樹脂組成物等の熱硬化性樹脂ワニスを含浸した後、加熱し半硬化させて(Bステージ状態)プリプレグを作製し、次にこのプリプレグを所要枚数重ね、さらに銅箔等の金属箔をその片側又は両側に配して積層し、この積層体を加熱・加圧して成形を行うことによって製造されている。また、多層の金属張積層板は、上記の方法で得られた積層板の表面の金属箔をエッチングして導体回路を形成し、その導体回路を形成した積層板の表裏面に、上記と同様に、プリプレグを所要枚数重ね、金属箔をその片側又は両側に配して積層し、この積層体を加熱・加圧して成形を行うことによって製造されている。
【0003】
プリント配線板用プリプレグに使用されるエポキシ樹脂組成物には、一般的に、2個以上のエポキシ基を有するエポキシ樹脂、アミン系硬化剤、および硬化促進剤が使用されている。
【0004】
近年、プリント配線板の高密度化、薄型化、高速伝送性に伴い、プリント配線板材料には、成形性、耐熱性、およびTgの向上が要求されている。このため、多層プリント配線板に用いられるプリプレグにおいても、成形性が良好であり、高耐熱性、高Tg、保存安定性に優れるものが要求されている。
【0005】
このような要求に対して、たとえば、特開平5−43655号公報に、イソシアネート化合物とハロゲン化グリシジル化合物および非ハロゲン化グリシジル化合物を含むエポキシ樹脂と硬化剤とを含む樹脂組成物の発明が開示されている。この樹脂組成物は、難燃性、耐熱性、貯蔵安定性、硬化の均一性に優れていることが同号報に記載されている。しかしながら、このイソシアネート変性エポキシ樹脂は、従来の2官能エポキシ樹脂に比べて反応性が遅く、このため、硬化剤が従来のエポキシ樹脂と同量の場合には、硬化促進剤の配合量を1.5倍程度に高める必要があり、プレス成形時において樹脂流れが大きくなり、成形が困難であった。
【0006】
【発明が解決しようとする課題】
本発明は、保存安定性と成形性に優れたプリント配線板用プリプレグ、および成形性、耐熱性、Tgに優れた積層板を得ることができるプリプレグ用樹脂組成物を提供し、これを用いたプリント配線板用プリプレグ、積層板を提供することを目的とする。
【0007】
【課題を解決するための手段】
本発明は、エポキシ樹脂の分子構造中に芳香族ジイソシアネートで変性されている芳香族ジイソシアネート変性エポキシ樹脂と、硬化剤と、硬化促進剤と、無機充填剤と、を含むワニスをガラス織布またはガラス不織布に含浸し、加熱し、Bステージ化したプリント配線板用プリプレグである。また、エポキシ樹脂総量に対して、芳香族ジイソシアネート変性エポキシ樹脂を少なくとも5重量%と、硬化剤1〜5重量%と、硬化促進剤0.1〜1重量%と、無機充填剤5〜50重量%と、を含むワニスをガラス織布またはガラス不織布に含浸し、加熱し、Bステージ化したプリント配線板用プリプレグである。さらに、本発明は、プリプレグの40℃30日間の保管におけるゲルタイム減少率が20%以下、樹脂流れが15%以下であるプリント配線板用プリプレグである。
【0008】
本発明は、このように、特に、芳香族ジイソシアネート変性エポキシ樹脂と無機充填剤とを同時に添加することで、反応が遅い芳香族ジイソシアネート変性エポキシ樹脂において、驚くべきことに、硬化促進剤を通常のエポキシ樹脂の場合と同量にしても、樹脂流れを抑制でき、成形性に優れたプリプレグを得ることができることを見出し、これをプリント配線板用プリプレグに適用したものである。
【0009】
本発明は、さらに、これらのプリプレグの片面または両面に金属箔を積層した金属張積層板である。
【0010】
【発明の実施の形態】
本発明に用いる、芳香族ジイソシアネート変性エポキシ樹脂は、分子内に少なくとも2個以上のエポキシ基を有するエポキシ樹脂を芳香族ジイソシアネートで変性されたものであれば、特に限定されなず、これらを臭素化したイソシアネート変性エポキシ樹脂であってもよい。たとえば、芳香族ジイソシアネート変性エポキシ樹脂としては、旭化成エポキシ(株)製の商品名 ARALDITE AER 4152 が、また臭素化イソシアネート変性エポキシ樹脂としては、同社製の商品名ARALDITE AER 4100が例示できる。また、このイソシアネート変性エポキシ樹脂と2個以上のエポキシ基を有する未変性のエポキシ樹脂とを混合して用いることもできる。この場合、イソシアネート変性エポキシ樹脂は、エポキシ樹脂総量に対して少なくとも5重量%、好ましくは、少なくとも10重量%含有すると、本発明の目的を達成することができる。
【0011】
本発明に用いるエポキシ樹脂の硬化剤としては、アミン類、フェノール類、酸無水物等が挙げられるが、電気絶縁性ワニス用に通常用いられているものであれば、特に限定されない。アミン類としては、ジエチルアミン、ジエチレントリアミン、トリエチレンテトラミン、ジエチルアミノプロピルアミン、アミノエチルピペラジン、メンセンジアミン、メタキシリレンジアミン、ジシアンジアミド、ジアミノジフェニルメタン、ジアミノジフェニルスルフォン、メチレンジアニリン、メタフェニレンジアミン等があげられる。なかでも、耐熱性、Bステージ状態での保存安定性の点で、ジシアンジアミドが好ましい。フェノール類としては、ビフェノール、ビスフェノールA、ビスフェノールF、フェノールノボラック、クレゾールノボラック、ビスフェノールAノボラックおよびこれらのハロゲン化物、アルキル基置換体等があげられる。なかでも、Tgの点で、ビスフェノールAノボラックが好ましい。酸無水物としては、無水ヘキサヒドロフタル酸(HPA)、無水テトラヒドロフタル酸(THPA)、無水ピロメリット酸(PMDA)、無水クロレンド酸(HET)、無水ナディック酸(NA)、無水メチルナディック酸(MNA)、無水ドデシニルコハク酸(DDSA)、無水フタル酸(PA)、メチルヘキサヒドロ無水フタル酸(MeHPA)、無水マレイン酸等があげられる。なかでも、耐熱性、難燃性の点で、無水クロレンド酸(HET)が好ましい。
【0012】
これらの硬化剤は、1種類であってもよく、また2種類以上の硬化剤を混合して使用することもできる。また、硬化剤の含有量は、エポキシ樹脂100重量部に対し、1〜5重量部が好ましく、2〜4重量部がより好ましい。
【0013】
本発明に用いる硬化促進剤としては、イミダゾール化合物、有機リン化合物、第3級アミン、第4級アンモニウム塩等を用いることができる。中でも、第2級アミノ基をアクリロニトリル、イソシアネート、メラミン、アクリレート等でマスク化したイミダゾール化合物を用いると、保存安定性がより優れるプリプレグを得ることができるので好ましい。イミダゾール化合物としては、イミダゾール、2−メチルイミダゾール、2−エチル−4−メチルイミダゾール、2−フェニルイミダゾール、2−ウンデシルイミダゾール、1−ベンジル−2−メチルイミダゾール、2−ヘプタデシルイミダゾール、4、5−ジフェニルイミダゾール、2−メチルイミダゾリン、2−エチル−4−メチルイミダゾリン、2−フェニルイミダゾリン、2−ウンデシルイミダゾリン、2−ヘプタデシルイミダゾリン、2−イソプロピルイミダゾール、2、4−ジメチルイミダゾール、2−フェニル−4−メチルイミダゾール、2−メチルイミダゾリン、2−イソプロピルイミダゾリン、2、4−ジメチルイミダゾリン、2−フェニル−4−メチルイミダゾリン等があげられる。なかでも、Tg、耐熱性、反応性の点で、2−エチル−4−メチルイミダゾールが好ましい。マスク化剤としては、アクリロニトリル、フェニレンジイソシアネート、トルエンジイソシアネート、ナフタレンジイソシアネート、ヘキサメチレンジイソシアネート、メチレンビスフェニルイソシアネート、メラミンアクリレート等があげられる。
【0014】
これらの硬化促進剤は、単独で使用することができるほか、2種類以上の硬化促進剤を併用して使用することもできる。また、硬化促進剤の含有量は、エポキシ樹脂100重量部に対し、0.1〜1重量部が好ましく、0.2〜0.5重量部がより好ましい。
【0015】
本発明に用いる無機充填剤としては、プリプレグの樹脂流れを抑制できるものであれば特に限定されない。たとえば、水酸化アルミニウム、シリカ、タルク、ワラストナイト、水酸化マグネシウム、クレー等を使用することができ、特に、樹脂流れ抑制効果が大きく加工性に優れるタルクが好ましい。また、積層板の特性に応じて、無機充填剤を2種類以上併用することもできる。
【0016】
無機充填剤の含有量は、プリプレグの樹脂流れを抑制し作業性や加工性の点から、エポキシ樹脂100重量部に対し、5〜50重量部が好ましく、10〜20重量部がより好ましい。さらに、ワニスの粘度および塗工性の点から、無機充填剤の平均粒子径は、2〜20μmが好ましく、3〜10μmがより好ましい。
【0017】
上記したイソシアネート変性エポキシ樹脂、硬化剤、硬化促進剤および無機充填剤は、本発明のプリント配線板用プリプレグに必須の成分である。特に、イソシアネート変性エポキシ樹脂を含むエポキシ樹脂を使用する場合、無機充填剤の果たす役割は大きい。すなわち、無機充填剤を含有せずに、イソシアネート変性エポキシ樹脂、硬化剤、硬化促進剤のみを配合する樹脂組成物では、エポキシ樹脂がジイソシアネートで変性されているので反応が遅く、このため、通常のエポキシ樹脂を用いる場合における硬化促進剤の量を配合すると、ワニスのゲルタイムが長くなり生産効率が低下する。この解決方法として、硬化促進剤の配合量を、通常のエポキシ樹脂の場合よりも多量に添加することで、ワニスのゲルタイムを短縮して効率良くプリプレグを作製することが可能であるが、しかしこの場合は、プレス成形時の樹脂ながれが大きくなり、板厚や成形性が悪化する。一方、無機充填剤を配合すると、硬化促進剤の配合量を通常のエポキシ樹脂の場合と同量にしても、樹脂流れを抑制でき、成形性に優れたプリプレグを得ることができる。
【0018】
また、本発明では、必要に応じて、着色剤、酸化防止剤、還元剤、紫外線不透過剤等の添加剤を加えることもできる。
【0019】
本発明の樹脂組成物をワニス化する溶剤は、比較的低沸点の、メチルエチルケトン、アセトン、メチルイソブチルケトン、2−エトキシエタノール、トルエン、ブチルセルソルブ、メタノール、エタノール、2−メトキシエタノールなどを用いるのが好ましい。
【0020】
ワニスの製造は、らいかい機、3本ロール及びビーズミル等により、またこれらを組み合わせて行なうことができる。また、ワニスとした後、真空脱気によりワニス中の気泡を除去することが好ましい。
【0021】
プリプレグは、上記のイソシアネート変性エポキシ樹脂、硬化剤、硬化促進剤および無機充填剤ならびに必要に応じて添加する添加剤を溶剤中で配合して得たエポキシ樹脂ワニスを、ガラス織布またはガラス不織布に含浸させて、乾燥することにより得ることができる。使用するガラス織布またはガラス不織布の種類は、特に限定されず、厚さ0.02〜0.4mmのものを、目的のプリプレグまたは積層板の厚さに合わせて使用することができる。プリプレグを製造する時の乾燥条件は、乾燥温度80〜200℃、乾燥時間1〜30分間の間で、適宜選択することができる。
【0022】
上記の方法で作製したプリプレグを、目的とする積層板の厚みに合わせて積層し、その片側または両側に金属箔を重ね、加熱加圧して積層板を製造する。金属箔としては、銅箔やアルミ箔を用いることができるが、他の金属箔を用いることもできる。金属箔の厚みは通常5〜200μmである。
【0023】
積層板製造時の加熱温度は、150〜190℃、より好ましくは160〜180℃であり、圧力は1〜8MPa、より好ましくは1〜4MPaである。これらの条件は、プリプレグの特性、プレス機の能力、目的の積層板の厚み等により決定することができる。
【0024】
【実施例】
以下に本発明を、実施例を用いて詳細に説明するが、本発明はこれに限定されるものではない。また以下では、「部」は「重量部」を示す。
【0025】
(実施例1)
臭素化ビスフェノールA型エポキシ樹脂 90部
(エポキシ当量480、Br含有率22%)
イソシアネート変性エポキシ樹脂 (旭化成(株)製) 10部
(エポキシ当量335)
ヂシアンジアミド 2.7部
2−エチル−4−メチルイミダゾール 0.3部
タルク(竹原化学(株)製、平均粒径7μm) 樹脂100部に対して10部
上記の樹脂組成物をメチルエチルケトンに溶解し、不揮発分65%のワニスを作製した。このワニスを、ガラス織布(厚み0.2mm、坪量210g/m2)に樹脂分が45%になるように含浸、乾燥しプリプレグを得た。このプリプレグを4枚重ね、その両面に厚さ18μmの銅箔を配し、170℃、90分、4MPaの条件でプレス成形し、厚さ0.8mmのFR−4グレードの積層板を得た。
【0026】
(実施例2)
臭素化イソシアネート変性エポキシ樹脂(旭化成(株)製) 100部
(エポキシ当量345、Br含有率21%)
ヂシアンジアミド 2.9部
2−エチル−4−メチルイミダゾール 0.3部
タルク(同上) 樹脂100部に対して10部
上記の樹脂組成物を使用し、実施例1と同様のゲルタイムになるようなプリプレグを作製し、厚さ0.8mmのFR−4グレードの積層板を得た。
【0027】
(比較例1)
臭素化ビスフェノールA型エポキシ樹脂 100部
(エポキシ当量480、Br含有率22%)
ヂシアンジアミド 2.6部
2−エチル−4−メチルイミダゾール 0.2部
上記樹脂組成物を使用し、実施例1と同様のゲルタイムになるようなプリプレグを作製し、厚さ0.8mmのFR−4グレードの積層板を得た。
【0028】
(比較例2)
臭素化ビスフェノールA型エポキシ樹脂 90部
(エポキシ当量480、Br含有率22%)
イソシアネート変性エポキシ樹脂(旭化成(株)製) 10部
(エポキシ当量335)
ヂシアンジアミド 2.7部
2−エチル−4−メチルイミダゾール 0.3部
上記樹脂組成物を使用し、実施例1と同様のゲルタイムになるようなプリプレグを作製し、厚さ0.8mmのFR−4グレードの積層板を得た。
【0029】
(比較例3)
臭素化イソシアネート変性エポキシ樹脂(旭化成(株)製) 100部
(エポキシ当量345、Br含有率21%)
ヂシアンジアミド 2.9部
2−エチル−4−メチルイミダゾール 0.3部
上記樹脂組成物を使用し、実施例1と同様のゲルタイムになるようなプリプレグを作製し、厚さ0.8mmのFR−4グレードの積層板を得た。
【0030】
実施例1、2および比較例1、2、3で得られたプリプレグについて、保存安定性と樹脂ながれを評価した。また、このプリプレグを用いた積層板について、成形性、Tg、耐熱性を評価した。結果を表1に示す。
【0031】
【表1】
【0032】
プリプレグの保存安定性は、40℃保管条件によるゲルタイム減少率を測定し、また、樹脂流れは、JIS−C−6521に準拠して測定した。積層板の成形性は、板厚と基材面外観を評価した。板厚は、50点の板厚測定を行なって標準偏差を算出し、また、基材面外観は、銅箔を全面エッチングして除去し、ボイドやカスレの有無を評価した。Tgは、熱分析法(Thermal Mechanical Analysis:TMA)を用いて、JIS−C−6481に準拠して測定した。耐熱性は、表面の銅箔をエッチングで除去し、120℃、2気圧の水蒸気中(PCT:Pressure Cooker Test)で所定時間処理後、260℃のはんだ槽に20秒間浸漬させ、ミーズリングやフクレの有無について目視にて評価した。評価基準は、○は異常なし、△はミーズリング発生あり、×はフクレの発生ありとした。
【0033】
表1の結果より明らかなように、本発明の樹脂組成物である実施例1、2は、ゲルタイム減少率が小さくプリプレグ保存性に優れ、樹脂流れ、成形性、Tg、はんだ耐熱性が優れる。一方、イソシアネート変性エポキシ樹脂と無機充填剤をともに含有しない比較例1は、プリプレグ保存性が著しく低下し、Tgが低く、はんだ耐熱性もPCT5時間処理で一部にミーズリングが発生し、6時間処理ですべてフクレが発生した。また、イソシアネート変性エポキシ樹脂を含有するが無機充填剤を含有しない比較例2、3は、比較例1よりはTg、耐熱性が改善されているが、樹脂流れが著しく低下し、板厚偏差の低下、ボイドやカスレの発生が認められる。
【0034】
【発明の効果】
本発明によれば、エポキシ樹脂の分子構造中に芳香族ジイソシアネートで変性されているエポキシ樹脂と、硬化剤と、硬化促進剤と、無機充填剤と、を必須成分として含有するワニスを使用することで、保存安定性に優れたプリプレグおよび成形性、耐熱性およびTgを向上させた積層板を得ることができる。[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a printed wiring board prepreg used as an electrical insulating material such as a printed wiring board, and a laminate using the same. In particular, the present invention relates to a printed wiring board prepreg excellent in storage stability and moldability, and a laminate excellent in moldability, heat resistance, and glass transition temperature (hereinafter referred to as “Tg”) characteristics.
[0002]
[Prior art]
For example, a metal-clad laminate used in electrical / electronic equipment is impregnated with a thermosetting resin varnish such as an epoxy resin composition on a substrate such as a glass cloth, and then heated and semi-cured (B stage state) ) Prepare a prepreg, then stack the required number of prepregs, and stack metal foil such as copper foil on one or both sides, and heat and press the laminate to form. ing. In addition, the multilayer metal-clad laminate is formed by etching the metal foil on the surface of the laminate obtained by the above method to form a conductor circuit, and on the front and back surfaces of the laminate on which the conductor circuit is formed, as described above. In addition, it is manufactured by stacking a required number of prepregs, laminating metal foils on one side or both sides thereof, and heating and pressurizing the laminated body.
[0003]
Generally, an epoxy resin having two or more epoxy groups, an amine curing agent, and a curing accelerator are used in the epoxy resin composition used for the prepreg for a printed wiring board.
[0004]
In recent years, with the increase in density, thickness, and high-speed transmission of printed wiring boards, printed wiring board materials are required to be improved in moldability, heat resistance, and Tg. For this reason, prepregs used for multilayer printed wiring boards are also required to have good moldability, high heat resistance, high Tg, and excellent storage stability.
[0005]
In response to such a demand, for example, JP-A-5-43655 discloses an invention of a resin composition containing an epoxy compound containing an isocyanate compound, a halogenated glycidyl compound and a non-halogenated glycidyl compound, and a curing agent. ing. The same publication describes that this resin composition is excellent in flame retardancy, heat resistance, storage stability, and uniformity of curing. However, the reactivity of this isocyanate-modified epoxy resin is slower than that of the conventional bifunctional epoxy resin. Therefore, when the curing agent is the same amount as the conventional epoxy resin, the blending amount of the curing accelerator is 1. It was necessary to increase it to about 5 times, and the resin flow became large at the time of press molding, and molding was difficult.
[0006]
[Problems to be solved by the invention]
The present invention provides a prepreg for a printed wiring board having excellent storage stability and moldability, and a resin composition for prepreg that can obtain a laminate having excellent moldability, heat resistance, and Tg. It aims at providing the prepreg for printed wiring boards, and a laminated board.
[0007]
[Means for Solving the Problems]
The present invention relates to a glass woven fabric or glass comprising a varnish containing an aromatic diisocyanate-modified epoxy resin modified with an aromatic diisocyanate in the molecular structure of the epoxy resin, a curing agent, a curing accelerator, and an inorganic filler. It is a prepreg for a printed wiring board that is impregnated into a nonwoven fabric and heated to be a B-stage. Moreover, at least 5 wt% of the aromatic diisocyanate-modified epoxy resin, 1 to 5 wt% of the curing agent, 0.1 to 1 wt% of the curing accelerator, and 5 to 50 wt% of the inorganic filler with respect to the total amount of the epoxy resin. % Is impregnated into a glass woven fabric or a glass nonwoven fabric and heated to be a B-stage prepreg for a printed wiring board. Furthermore, the present invention is a printed wiring board prepreg in which the gel time reduction rate during storage at 40 ° C. for 30 days is 20% or less and the resin flow is 15% or less.
[0008]
In this way, the present invention, surprisingly, in the aromatic diisocyanate-modified epoxy resin having a slow reaction, particularly by adding the aromatic diisocyanate-modified epoxy resin and the inorganic filler at the same time, It has been found that even if the amount is the same as that of the epoxy resin, the resin flow can be suppressed and a prepreg excellent in moldability can be obtained, and this is applied to a prepreg for a printed wiring board.
[0009]
The present invention is further a metal-clad laminate in which a metal foil is laminated on one side or both sides of these prepregs.
[0010]
DETAILED DESCRIPTION OF THE INVENTION
The aromatic diisocyanate-modified epoxy resin used in the present invention is not particularly limited as long as an epoxy resin having at least two epoxy groups in the molecule is modified with aromatic diisocyanate. Isocyanate-modified epoxy resin may be used. For example, as an aromatic diisocyanate-modified epoxy resin, trade name ARALDITE AER 4152 manufactured by Asahi Kasei Epoxy Co., Ltd. can be exemplified, and as a brominated isocyanate-modified epoxy resin, trade name ARALDITE AER 4100 manufactured by the same company can be exemplified. Moreover, this isocyanate-modified epoxy resin and an unmodified epoxy resin having two or more epoxy groups can be mixed and used. In this case, when the isocyanate-modified epoxy resin is contained at least 5% by weight, preferably at least 10% by weight, based on the total amount of the epoxy resin, the object of the present invention can be achieved.
[0011]
Examples of the epoxy resin curing agent used in the present invention include amines, phenols, acid anhydrides and the like, but are not particularly limited as long as they are usually used for electrically insulating varnishes. Examples of amines include diethylamine, diethylenetriamine, triethylenetetramine, diethylaminopropylamine, aminoethylpiperazine, mensendiamine, metaxylylenediamine, dicyandiamide, diaminodiphenylmethane, diaminodiphenylsulfone, methylenedianiline, metaphenylenediamine, and the like. . Of these, dicyandiamide is preferable in terms of heat resistance and storage stability in the B-stage state. Examples of the phenols include biphenol, bisphenol A, bisphenol F, phenol novolak, cresol novolak, bisphenol A novolak, halides thereof, and alkyl group-substituted products. Of these, bisphenol A novolak is preferable in terms of Tg. Acid anhydrides include hexahydrophthalic anhydride (HPA), tetrahydrophthalic anhydride (THPA), pyromellitic anhydride (PMDA), chlorendic anhydride (HET), nadic anhydride (NA), and methyl nadic anhydride (MNA), dodecynyl succinic anhydride (DDSA), phthalic anhydride (PA), methylhexahydrophthalic anhydride (MeHPA), maleic anhydride and the like. Of these, chlorendic anhydride (HET) is preferable in terms of heat resistance and flame retardancy.
[0012]
These curing agents may be of one type, or two or more types of curing agents can be mixed and used. Moreover, 1-5 weight part is preferable with respect to 100 weight part of epoxy resins, and, as for content of a hardening | curing agent, 2-4 weight part is more preferable.
[0013]
As the curing accelerator used in the present invention, an imidazole compound, an organic phosphorus compound, a tertiary amine, a quaternary ammonium salt, or the like can be used. Among them, it is preferable to use an imidazole compound in which a secondary amino group is masked with acrylonitrile, isocyanate, melamine, acrylate, or the like, because a prepreg with better storage stability can be obtained. Examples of imidazole compounds include imidazole, 2-methylimidazole, 2-ethyl-4-methylimidazole, 2-phenylimidazole, 2-undecylimidazole, 1-benzyl-2-methylimidazole, 2-heptadecylimidazole, 4, 5 -Diphenylimidazole, 2-methylimidazoline, 2-ethyl-4-methylimidazoline, 2-phenylimidazoline, 2-undecylimidazoline, 2-heptadecylimidazoline, 2-isopropylimidazole, 2,4-dimethylimidazole, 2-phenyl Examples include -4-methylimidazole, 2-methylimidazoline, 2-isopropylimidazoline, 2,4-dimethylimidazoline, 2-phenyl-4-methylimidazoline. Of these, 2-ethyl-4-methylimidazole is preferable in terms of Tg, heat resistance, and reactivity. Examples of the masking agent include acrylonitrile, phenylene diisocyanate, toluene diisocyanate, naphthalene diisocyanate, hexamethylene diisocyanate, methylene bisphenyl isocyanate, and melamine acrylate.
[0014]
These curing accelerators can be used alone, or two or more curing accelerators can be used in combination. Moreover, 0.1-1 weight part is preferable with respect to 100 weight part of epoxy resins, and, as for content of a hardening accelerator, 0.2-0.5 weight part is more preferable.
[0015]
The inorganic filler used in the present invention is not particularly limited as long as the resin flow of the prepreg can be suppressed. For example, aluminum hydroxide, silica, talc, wollastonite, magnesium hydroxide, clay and the like can be used, and talc having a large resin flow suppressing effect and excellent workability is particularly preferable. Further, two or more kinds of inorganic fillers can be used in combination according to the properties of the laminated board.
[0016]
The content of the inorganic filler is preferably 5 to 50 parts by weight and more preferably 10 to 20 parts by weight with respect to 100 parts by weight of the epoxy resin from the viewpoint of workability and workability by suppressing the resin flow of the prepreg. Furthermore, the average particle diameter of the inorganic filler is preferably 2 to 20 μm and more preferably 3 to 10 μm from the viewpoint of the viscosity of the varnish and the coatability.
[0017]
The above-mentioned isocyanate-modified epoxy resin, curing agent, curing accelerator and inorganic filler are essential components for the prepreg for printed wiring board of the present invention. In particular, when an epoxy resin including an isocyanate-modified epoxy resin is used, the role played by the inorganic filler is large. That is, in a resin composition containing only an isocyanate-modified epoxy resin, a curing agent, and a curing accelerator without containing an inorganic filler, the reaction is slow because the epoxy resin is modified with diisocyanate. When the amount of the curing accelerator in the case of using an epoxy resin is blended, the gel time of the varnish becomes longer and the production efficiency is lowered. As a solution to this, it is possible to shorten the gel time of the varnish and efficiently produce a prepreg by adding a larger amount of the curing accelerator than in the case of a normal epoxy resin. In this case, the resin flow during press molding increases, and the plate thickness and moldability deteriorate. On the other hand, when an inorganic filler is blended, the resin flow can be suppressed and a prepreg excellent in moldability can be obtained even if the curing accelerator is blended in the same amount as that of a normal epoxy resin.
[0018]
Moreover, in this invention, additives, such as a coloring agent, antioxidant, a reducing agent, and an ultraviolet opaque agent, can also be added as needed.
[0019]
As a solvent for varnishing the resin composition of the present invention, methyl ethyl ketone, acetone, methyl isobutyl ketone, 2-ethoxyethanol, toluene, butyl cellosolve, methanol, ethanol, 2-methoxyethanol, etc. having a relatively low boiling point are used. Is preferred.
[0020]
The production of the varnish can be carried out using a rough machine, a three-roller, a bead mill or the like, or a combination thereof. In addition, after forming the varnish, it is preferable to remove bubbles in the varnish by vacuum degassing.
[0021]
The prepreg is a glass woven fabric or glass nonwoven fabric obtained by blending the epoxy resin varnish obtained by blending the above-mentioned isocyanate-modified epoxy resin, curing agent, curing accelerator, inorganic filler, and additives to be added if necessary in a solvent. It can be obtained by impregnating and drying. The kind of glass woven fabric or glass nonwoven fabric to be used is not particularly limited, and a glass woven fabric having a thickness of 0.02 to 0.4 mm can be used according to the thickness of the target prepreg or laminate. The drying conditions for producing the prepreg can be appropriately selected between a drying temperature of 80 to 200 ° C. and a drying time of 1 to 30 minutes.
[0022]
The prepreg produced by the above method is laminated according to the thickness of the target laminate, and a metal foil is laminated on one side or both sides thereof, and heated and pressed to produce a laminate. As the metal foil, copper foil or aluminum foil can be used, but other metal foils can also be used. The thickness of the metal foil is usually 5 to 200 μm.
[0023]
The heating temperature at the time of laminate production is 150 to 190 ° C, more preferably 160 to 180 ° C, and the pressure is 1 to 8 MPa, more preferably 1 to 4 MPa. These conditions can be determined by the characteristics of the prepreg, the capacity of the press, the thickness of the target laminate, and the like.
[0024]
【Example】
Hereinafter, the present invention will be described in detail with reference to examples, but the present invention is not limited thereto. In the following, “part” means “part by weight”.
[0025]
(Example 1)
90 parts of brominated bisphenol A type epoxy resin (epoxy equivalent 480, Br content 22%)
Isocyanate-modified epoxy resin (Asahi Kasei Co., Ltd.) 10 parts (epoxy equivalent 335)
Dicyandiamide 2.7 parts 2-ethyl-4-methylimidazole 0.3 parts talc (manufactured by Takehara Chemical Co., Ltd., average particle size 7 μm) 10 parts per 100 parts of resin The above resin composition was dissolved in methyl ethyl ketone, A varnish having a nonvolatile content of 65% was prepared. This varnish was impregnated into a glass woven fabric (thickness 0.2 mm, basis weight 210 g / m 2 ) so that the resin content was 45% and dried to obtain a prepreg. Four prepregs were stacked, and a copper foil with a thickness of 18 μm was placed on both sides of the prepreg, and press molding was performed at 170 ° C. for 90 minutes at 4 MPa to obtain a FR-4 grade laminate having a thickness of 0.8 mm. .
[0026]
(Example 2)
Brominated isocyanate-modified epoxy resin (Asahi Kasei Corporation) 100 parts (epoxy equivalent 345, Br content 21%)
Dicyandiamide 2.9 parts 2-ethyl-4-methylimidazole 0.3 parts talc (same as above) 10 parts per 100 parts of resin Using the above resin composition, a prepreg having the same gel time as in Example 1 To obtain a FR-4 grade laminate having a thickness of 0.8 mm.
[0027]
(Comparative Example 1)
Brominated bisphenol A type epoxy resin 100 parts (epoxy equivalent 480, Br content 22%)
Dicyandiamide 2.6 parts 2-ethyl-4-methylimidazole 0.2 parts Using the above resin composition, a prepreg having the same gel time as in Example 1 was prepared, and FR-4 having a thickness of 0.8 mm A graded laminate was obtained.
[0028]
(Comparative Example 2)
90 parts of brominated bisphenol A type epoxy resin (epoxy equivalent 480, Br content 22%)
Isocyanate-modified epoxy resin (Asahi Kasei Corporation) 10 parts (epoxy equivalent 335)
Dicyandiamide 2.7 parts 2-ethyl-4-methylimidazole 0.3 parts Using the above resin composition, a prepreg having the same gel time as in Example 1 was prepared, and FR-4 having a thickness of 0.8 mm A graded laminate was obtained.
[0029]
(Comparative Example 3)
Brominated isocyanate-modified epoxy resin (Asahi Kasei Corporation) 100 parts (epoxy equivalent 345, Br content 21%)
Dicyandiamide 2.9 parts 2-Ethyl-4-methylimidazole 0.3 parts Using the above resin composition, a prepreg having the same gel time as in Example 1 was prepared, and FR-4 having a thickness of 0.8 mm A graded laminate was obtained.
[0030]
The prepregs obtained in Examples 1 and 2 and Comparative Examples 1, 2, and 3 were evaluated for storage stability and resin flow. Moreover, the moldability, Tg, and heat resistance were evaluated about the laminated board using this prepreg. The results are shown in Table 1.
[0031]
[Table 1]
[0032]
The storage stability of the prepreg was measured by the gel time reduction rate under storage conditions at 40 ° C., and the resin flow was measured according to JIS-C-6521. The moldability of the laminated plate was evaluated on the plate thickness and the substrate surface appearance. The plate thickness was measured by measuring the plate thickness at 50 points, and the standard deviation was calculated. In addition, the appearance of the substrate surface was evaluated by checking the presence or absence of voids and scum by removing the entire copper foil by etching. Tg was measured according to JIS-C-6481 using a thermal analysis method (Thermal Mechanical Analysis: TMA). For heat resistance, the copper foil on the surface is removed by etching, treated in water vapor at 120 ° C. and 2 atm (PCT: Pressure Cooker Test) for a predetermined time, then immersed in a solder bath at 260 ° C. for 20 seconds, and then subjected to measling and swelling. The presence or absence of was evaluated visually. The evaluation criteria are as follows: ○ indicates no abnormality, Δ indicates occurrence of mising, and × indicates occurrence of swelling.
[0033]
As is clear from the results in Table 1, Examples 1 and 2, which are resin compositions of the present invention, have a small gel time reduction rate and excellent prepreg storage, and excellent resin flow, moldability, Tg, and solder heat resistance. On the other hand, Comparative Example 1 containing neither an isocyanate-modified epoxy resin nor an inorganic filler has a significantly reduced prepreg storage stability, a low Tg, and a soldering heat resistance that is partly mesling after PCT for 5 hours. There was a bulge in the process. Further, Comparative Examples 2 and 3 containing an isocyanate-modified epoxy resin but not containing an inorganic filler have improved Tg and heat resistance as compared with Comparative Example 1, but the resin flow is remarkably lowered and the plate thickness deviation is reduced. Decrease, generation of voids and blurring are observed.
[0034]
【The invention's effect】
According to the present invention, the use of a varnish containing, as essential components, an epoxy resin modified with an aromatic diisocyanate in the molecular structure of the epoxy resin, a curing agent, a curing accelerator, and an inorganic filler. Thus, a prepreg having excellent storage stability and a laminate having improved moldability, heat resistance and Tg can be obtained.
Claims (2)
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001018599A JP4797248B2 (en) | 2001-01-26 | 2001-01-26 | Pre-preg for printed wiring board and laminated board using the same |
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| Application Number | Priority Date | Filing Date | Title |
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| JP2001018599A JP4797248B2 (en) | 2001-01-26 | 2001-01-26 | Pre-preg for printed wiring board and laminated board using the same |
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| Application Number | Title | Priority Date | Filing Date |
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| JP2010232192A Division JP2011063804A (en) | 2010-10-15 | 2010-10-15 | Prepreg for printed circuit board and laminated board using the same |
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| JP2002223048A JP2002223048A (en) | 2002-08-09 |
| JP4797248B2 true JP4797248B2 (en) | 2011-10-19 |
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| JP4639729B2 (en) * | 2004-09-30 | 2011-02-23 | 住友ベークライト株式会社 | Resin composition |
| JP4715152B2 (en) * | 2004-10-05 | 2011-07-06 | 住友ベークライト株式会社 | Resin composition and semiconductor device produced using resin composition |
| JP4961903B2 (en) * | 2006-04-27 | 2012-06-27 | 日立化成工業株式会社 | Epoxy resin composition, epoxy resin prepreg, metal-clad laminate and printed wiring board |
| JP5039707B2 (en) * | 2006-09-14 | 2012-10-03 | パナソニック株式会社 | Epoxy resin composition for printed wiring board, resin composition varnish, prepreg, metal-clad laminate, printed wiring board, and multilayer printed wiring board |
| JP2008291056A (en) * | 2007-05-22 | 2008-12-04 | Asahi Kasei Chemicals Corp | Epoxy resin composition, prepreg using the same, and metal foil-clad laminate and printed wiring board using the same |
| CN101864146B (en) * | 2010-06-13 | 2012-02-15 | 宏昌电子材料股份有限公司 | Epoxy resin composition for printed circuit copper-clad plate |
| JP6374714B2 (en) * | 2014-06-26 | 2018-08-15 | 旭化成株式会社 | Epoxy resin composition, adhesive, cured product, and electronic member |
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| EP0729484B1 (en) * | 1993-11-02 | 2000-03-01 | The Dow Chemical Company | Cure inhibited epoxy resin compositions and laminates prepared from the compositions |
| JPH07316252A (en) * | 1994-05-27 | 1995-12-05 | Sumitomo Chem Co Ltd | Method and composition for producing epoxy resin having excellent dielectric properties |
| JPH1160677A (en) * | 1997-08-19 | 1999-03-02 | Hitachi Chem Co Ltd | Epoxy resin composition for printed wiring board, and prepreg and metal-clad laminate prepared by using the same |
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