JP4857984B2 - Method for producing fluorine-containing diol and derivatives thereof - Google Patents
Method for producing fluorine-containing diol and derivatives thereof Download PDFInfo
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- JP4857984B2 JP4857984B2 JP2006197529A JP2006197529A JP4857984B2 JP 4857984 B2 JP4857984 B2 JP 4857984B2 JP 2006197529 A JP2006197529 A JP 2006197529A JP 2006197529 A JP2006197529 A JP 2006197529A JP 4857984 B2 JP4857984 B2 JP 4857984B2
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- 229910052731 fluorine Inorganic materials 0.000 title claims description 54
- 239000011737 fluorine Substances 0.000 title claims description 51
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 title claims description 49
- 150000002009 diols Chemical class 0.000 title claims description 44
- 238000004519 manufacturing process Methods 0.000 title claims description 15
- 238000006243 chemical reaction Methods 0.000 claims description 96
- 239000003054 catalyst Substances 0.000 claims description 32
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims description 23
- 229910052707 ruthenium Inorganic materials 0.000 claims description 23
- 229910052739 hydrogen Inorganic materials 0.000 claims description 22
- 238000000034 method Methods 0.000 claims description 22
- 239000001257 hydrogen Substances 0.000 claims description 18
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 16
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 claims description 15
- 150000002148 esters Chemical class 0.000 claims description 12
- 150000001252 acrylic acid derivatives Chemical class 0.000 claims description 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 6
- 229910052799 carbon Inorganic materials 0.000 claims description 4
- 239000000377 silicon dioxide Substances 0.000 claims description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 3
- 239000007790 solid phase Substances 0.000 claims description 3
- 239000002904 solvent Substances 0.000 description 36
- -1 fluorine ester Chemical class 0.000 description 24
- 238000006116 polymerization reaction Methods 0.000 description 18
- 239000002994 raw material Substances 0.000 description 17
- 239000000047 product Substances 0.000 description 15
- 239000000243 solution Substances 0.000 description 15
- 150000001875 compounds Chemical class 0.000 description 14
- 239000003112 inhibitor Substances 0.000 description 14
- 239000011347 resin Substances 0.000 description 13
- 229920005989 resin Polymers 0.000 description 13
- 239000000654 additive Substances 0.000 description 10
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 9
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 9
- 230000000996 additive effect Effects 0.000 description 8
- 239000011521 glass Substances 0.000 description 8
- 238000010438 heat treatment Methods 0.000 description 8
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 7
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 7
- MQSXWPKOXBDISN-UHFFFAOYSA-N 1-cyclohexyl-4,4,4-trifluoro-3-(trifluoromethyl)butane-1,3-diol Chemical compound FC(F)(F)C(O)(C(F)(F)F)CC(O)C1CCCCC1 MQSXWPKOXBDISN-UHFFFAOYSA-N 0.000 description 6
- OISVCGZHLKNMSJ-UHFFFAOYSA-N 2,6-dimethylpyridine Chemical compound CC1=CC=CC(C)=N1 OISVCGZHLKNMSJ-UHFFFAOYSA-N 0.000 description 6
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 6
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 239000012925 reference material Substances 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 5
- 239000000706 filtrate Substances 0.000 description 5
- 150000003303 ruthenium Chemical class 0.000 description 5
- 229910001220 stainless steel Inorganic materials 0.000 description 5
- 239000010935 stainless steel Substances 0.000 description 5
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 4
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 4
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 4
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 4
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 4
- DGEZNRSVGBDHLK-UHFFFAOYSA-N [1,10]phenanthroline Chemical compound C1=CN=C2C3=NC=CC=C3C=CC2=C1 DGEZNRSVGBDHLK-UHFFFAOYSA-N 0.000 description 4
- GGNQRNBDZQJCCN-UHFFFAOYSA-N benzene-1,2,4-triol Chemical compound OC1=CC=C(O)C(O)=C1 GGNQRNBDZQJCCN-UHFFFAOYSA-N 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- AUZONCFQVSMFAP-UHFFFAOYSA-N disulfiram Chemical compound CCN(CC)C(=S)SSC(=S)N(CC)CC AUZONCFQVSMFAP-UHFFFAOYSA-N 0.000 description 4
- 238000004817 gas chromatography Methods 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 239000000178 monomer Substances 0.000 description 4
- 239000011541 reaction mixture Substances 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 4
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 4
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 4
- BQCIDUSAKPWEOX-UHFFFAOYSA-N 1,1-Difluoroethene Chemical compound FC(F)=C BQCIDUSAKPWEOX-UHFFFAOYSA-N 0.000 description 3
- DLYKFPHPBCTAKD-UHFFFAOYSA-N 2-methoxy-10H-phenothiazine Chemical compound C1=CC=C2NC3=CC(OC)=CC=C3SC2=C1 DLYKFPHPBCTAKD-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- BZLVMXJERCGZMT-UHFFFAOYSA-N Methyl tert-butyl ether Chemical compound COC(C)(C)C BZLVMXJERCGZMT-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 150000001491 aromatic compounds Chemical class 0.000 description 3
- 239000006227 byproduct Substances 0.000 description 3
- UUAGAQFQZIEFAH-UHFFFAOYSA-N chlorotrifluoroethylene Chemical group FC(F)=C(F)Cl UUAGAQFQZIEFAH-UHFFFAOYSA-N 0.000 description 3
- 239000004210 ether based solvent Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- 238000005070 sampling Methods 0.000 description 3
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 3
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 3
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 description 2
- 0 *C(C(*)O)C(C(F)(F)F)(C(F)(F)F)O Chemical compound *C(C(*)O)C(C(F)(F)F)(C(F)(F)F)O 0.000 description 2
- WCBPJVKVIMMEQC-UHFFFAOYSA-N 1,1-diphenyl-2-(2,4,6-trinitrophenyl)hydrazine Chemical compound [O-][N+](=O)C1=CC([N+](=O)[O-])=CC([N+]([O-])=O)=C1NN(C=1C=CC=CC=1)C1=CC=CC=C1 WCBPJVKVIMMEQC-UHFFFAOYSA-N 0.000 description 2
- DOIVPHUVGVJOMX-UHFFFAOYSA-N 1,10-phenanthroline;ruthenium Chemical compound [Ru].C1=CN=C2C3=NC=CC=C3C=CC2=C1.C1=CN=C2C3=NC=CC=C3C=CC2=C1.C1=CN=C2C3=NC=CC=C3C=CC2=C1 DOIVPHUVGVJOMX-UHFFFAOYSA-N 0.000 description 2
- WJFKNYWRSNBZNX-UHFFFAOYSA-N 10H-phenothiazine Chemical compound C1=CC=C2NC3=CC=CC=C3SC2=C1 WJFKNYWRSNBZNX-UHFFFAOYSA-N 0.000 description 2
- JZODKRWQWUWGCD-UHFFFAOYSA-N 2,5-di-tert-butylbenzene-1,4-diol Chemical compound CC(C)(C)C1=CC(O)=C(C(C)(C)C)C=C1O JZODKRWQWUWGCD-UHFFFAOYSA-N 0.000 description 2
- VRLJBWKYHRJXGK-UHFFFAOYSA-N 4,4,4-trifluoro-3-hydroxy-1-phenyl-3-(trifluoromethyl)butan-1-one Chemical compound FC(F)(F)C(C(F)(F)F)(O)CC(=O)C1=CC=CC=C1 VRLJBWKYHRJXGK-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- UTGQNNCQYDRXCH-UHFFFAOYSA-N N,N'-diphenyl-1,4-phenylenediamine Chemical compound C=1C=C(NC=2C=CC=CC=2)C=CC=1NC1=CC=CC=C1 UTGQNNCQYDRXCH-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- YNPNZTXNASCQKK-UHFFFAOYSA-N Phenanthrene Natural products C1=CC=C2C3=CC=CC=C3C=CC2=C1 YNPNZTXNASCQKK-UHFFFAOYSA-N 0.000 description 2
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- SMZOGRDCAXLAAR-UHFFFAOYSA-N aluminium isopropoxide Chemical compound [Al+3].CC(C)[O-].CC(C)[O-].CC(C)[O-] SMZOGRDCAXLAAR-UHFFFAOYSA-N 0.000 description 2
- BKNBVEKCHVXGPH-UHFFFAOYSA-N anthracene-1,4,9,10-tetrol Chemical compound C1=CC=C2C(O)=C3C(O)=CC=C(O)C3=C(O)C2=C1 BKNBVEKCHVXGPH-UHFFFAOYSA-N 0.000 description 2
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 description 2
- 229940092714 benzenesulfonic acid Drugs 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 239000004927 clay Substances 0.000 description 2
- 229910052570 clay Inorganic materials 0.000 description 2
- 238000004440 column chromatography Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 125000006165 cyclic alkyl group Chemical group 0.000 description 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- 238000004821 distillation Methods 0.000 description 2
- CCIVGXIOQKPBKL-UHFFFAOYSA-M ethanesulfonate Chemical compound CCS([O-])(=O)=O CCIVGXIOQKPBKL-UHFFFAOYSA-M 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 150000002431 hydrogen Chemical group 0.000 description 2
- AUHZEENZYGFFBQ-UHFFFAOYSA-N mesitylene Substances CC1=CC(C)=CC(C)=C1 AUHZEENZYGFFBQ-UHFFFAOYSA-N 0.000 description 2
- 125000001827 mesitylenyl group Chemical group [H]C1=C(C(*)=C(C([H])=C1C([H])([H])[H])C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- 229940098779 methanesulfonic acid Drugs 0.000 description 2
- 239000005416 organic matter Substances 0.000 description 2
- 229950000688 phenothiazine Drugs 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 2
- 229910001925 ruthenium oxide Inorganic materials 0.000 description 2
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 description 2
- 238000007086 side reaction Methods 0.000 description 2
- 229910000029 sodium carbonate Inorganic materials 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- BYEAHWXPCBROCE-UHFFFAOYSA-N 1,1,1,3,3,3-hexafluoropropan-2-ol Chemical compound FC(F)(F)C(O)C(F)(F)F BYEAHWXPCBROCE-UHFFFAOYSA-N 0.000 description 1
- UPXUFKHOKCDHIX-UHFFFAOYSA-N 1,1,1-trifluoro-4-phenyl-2-(trifluoromethyl)butan-2-ol Chemical compound FC(F)(F)C(C(F)(F)F)(O)CCC1=CC=CC=C1 UPXUFKHOKCDHIX-UHFFFAOYSA-N 0.000 description 1
- 150000000185 1,3-diols Chemical class 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 239000004358 Butane-1, 3-diol Substances 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- RHQDFWAXVIIEBN-UHFFFAOYSA-N Trifluoroethanol Chemical compound OCC(F)(F)F RHQDFWAXVIIEBN-UHFFFAOYSA-N 0.000 description 1
- HSLZHYJEBCNJJU-UHFFFAOYSA-N [1-cyclohexyl-4,4,4-trifluoro-3-hydroxy-3-(trifluoromethyl)butyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(CC(O)(C(F)(F)F)C(F)(F)F)C1CCCCC1 HSLZHYJEBCNJJU-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000001253 acrylic acids Chemical class 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- XTKDAFGWCDAMPY-UHFFFAOYSA-N azaperone Chemical compound C1=CC(F)=CC=C1C(=O)CCCN1CCN(C=2N=CC=CC=2)CC1 XTKDAFGWCDAMPY-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000012267 brine Substances 0.000 description 1
- 235000019437 butane-1,3-diol Nutrition 0.000 description 1
- 239000012295 chemical reaction liquid Substances 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000002451 electron ionisation mass spectrometry Methods 0.000 description 1
- 230000032050 esterification Effects 0.000 description 1
- 238000005886 esterification reaction Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- VBZWSGALLODQNC-UHFFFAOYSA-N hexafluoroacetone Chemical compound FC(F)(F)C(=O)C(F)(F)F VBZWSGALLODQNC-UHFFFAOYSA-N 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- DCUFMVPCXCSVNP-UHFFFAOYSA-N methacrylic anhydride Chemical compound CC(=C)C(=O)OC(=O)C(C)=C DCUFMVPCXCSVNP-UHFFFAOYSA-N 0.000 description 1
- NCPHGZWGGANCAY-UHFFFAOYSA-N methane;ruthenium Chemical compound C.[Ru] NCPHGZWGGANCAY-UHFFFAOYSA-N 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- PSHKMPUSSFXUIA-UHFFFAOYSA-N n,n-dimethylpyridin-2-amine Chemical compound CN(C)C1=CC=CC=N1 PSHKMPUSSFXUIA-UHFFFAOYSA-N 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- ARJOQCYCJMAIFR-UHFFFAOYSA-N prop-2-enoyl prop-2-enoate Chemical class C=CC(=O)OC(=O)C=C ARJOQCYCJMAIFR-UHFFFAOYSA-N 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical compound O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
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- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
Description
本発明は、次世代フォトレジストに対応するモノマー原料として有用な化合物である式[2]で表される含フッ素ジオール The present invention relates to a fluorine-containing diol represented by the formula [2], which is a compound useful as a monomer raw material corresponding to a next-generation photoresist.
の製造方法に関する。 It relates to the manufacturing method.
含フッ素ジオール類のアクリル酸、メタクリル酸等アクリル酸類のエステルは、次世代レジスト材料のモノマー原料として有望な化合物であり、該エステルを構成要素として含有するレジストは光の透過性、表面吸着性に優れていることが知られている(特許文献1)。本発明の目的化合物である式[2]で示される含フッ素ジオールに関しても、これから誘導される、式[4]で表される含フッ素エステル Esters of acrylic acids such as acrylic acid and methacrylic acid in fluorine-containing diols are promising compounds as monomer raw materials for next-generation resist materials, and resists containing these esters as constituents have light transmission and surface adsorption properties. It is known that it is excellent (Patent Document 1). The fluorine-containing diol represented by the formula [2], which is the target compound of the present invention, is also derived from the fluorine-containing ester represented by the formula [4].
(式中、R1はH,CmH2m+1,CnF2n+1の何れかの基を表す(m、nは各々1〜4の整数を表す)
も次世代レジスト材料のモノマー原料として有望な化合物である。
(In the formula, R 1 represents any group of H, C m H 2m + 1 , and C n F 2n + 1 (m and n each represents an integer of 1 to 4).
Is also a promising compound as a monomer raw material for next-generation resist materials.
本発明の目的物である、式[2]で示される含フッ素ジオールの関連する製造技術として、従来、式[5]で表される含フッ素ヒドロキシケトン As a production technique related to the fluorine-containing diol represented by the formula [2], which is the object of the present invention, conventionally, a fluorine-containing hydroxyketone represented by the formula [5]
(式中、R1は水素原子、または炭素数1〜7の鎖状もしくは環状アルキル基である。R2は炭素数1〜7の鎖状もしくは環状アルキル基、フェニル基または置換されたフェニル基である。R1およびR2はつながって環を形成していてもよい。)を、イソプロパノールを溶媒として、アルミニウムイソプロポキシドで還元し、式[6]で表される含フッ素ジオール類 (Wherein R 1 is a hydrogen atom, or a chain or cyclic alkyl group having 1 to 7 carbon atoms. R 2 is a chain or cyclic alkyl group having 1 to 7 carbon atoms, a phenyl group, or a substituted phenyl group. R 1 and R 2 may be linked to form a ring.) Is reduced with aluminum isopropoxide using isopropanol as a solvent, and fluorine-containing diols represented by the formula [6]
(式中、R1、R2は式[5]に同じ)
を得る方法が知られている(特許文献2)。
There is known a method of obtaining (Patent Document 2).
特許文献2の方法では、イソプロパノールを溶媒として、大量のアルミニウムイソプロポキシドを還元剤として使用しているので、アルミニウム廃棄物、含有機排水等を大量に排出するという問題があり、工業的規模で実施する場合には、負荷のかかるものであった。 In the method of Patent Document 2, since isopropanol is used as a solvent and a large amount of aluminum isopropoxide is used as a reducing agent, there is a problem of discharging a large amount of aluminum waste, waste water from an inclusion machine, and the like on an industrial scale. When implemented, it was a burden.
ここで本発明では、式[2]で示される含フッ素ジオールの製造方法を工業規模で実施しうる条件を提供することが課題であった。 Here, in this invention, it was a subject to provide the conditions which can implement the manufacturing method of the fluorine-containing diol shown by Formula [2] on an industrial scale.
本発明者らはかかる従来技術の問題点に鑑み、鋭意検討を行った。その結果、式[1]で示されるヒドロキシケトン In view of the problems of the prior art, the present inventors have intensively studied. As a result, the hydroxyketone represented by the formula [1]
をルテニウム触媒の存在下、水素により還元することにより、式[2]で示される含フッ素ジオール Is reduced with hydrogen in the presence of a ruthenium catalyst to give a fluorine-containing diol represented by the formula [2]
を穏和な反応条件で、廃棄物も少なく、収率良く製造できることを見出した(第1工程)。 Was found to be able to be produced in a good yield under mild reaction conditions with little waste (first step).
ここで、「ルテニウム触媒」とは、ルテニウム金属、またはルテニウムを担体(活性炭、アルミナ、シリカ、クレー等)に担持したものの他、ルテニウム塩(例えば、RuCl3,RuBr3、Ru(NO3)3など)、ルテニウム錯体(例えばRu(CO)5,Ru(NO)5,K4[Ru(CN)6]、Ru(phen)3Cl3(なおphenはフェナントロリンを表す))、酸化ルテニウム等のことを指す。 Here, the “ruthenium catalyst” refers to a ruthenium metal or ruthenium supported on a carrier (activated carbon, alumina, silica, clay, etc.) or a ruthenium salt (for example, RuCl 3 , RuBr 3 , Ru (NO 3 ) 3. Etc.), ruthenium complexes (eg Ru (CO) 5 , Ru (NO) 5 , K 4 [Ru (CN) 6 ], Ru (phen) 3 Cl 3 (where phen represents phenanthroline)), ruthenium oxide, etc. Refers to that.
本発明者らは、式[5]で表される含フッ素ヒドロキシケトン The present inventors have prepared a fluorine-containing hydroxyketone represented by the formula [5].
をルテニウム触媒の存在下、水素と接触させることにより、式[6]で表される含フッ素ジオール類を製造できることを見出し、既に特許出願している(特願2005−018862号)。 Has been found to be able to produce fluorine-containing diols represented by the formula [6] by contacting them with hydrogen in the presence of a ruthenium catalyst (Japanese Patent Application No. 2005-018862).
当該方法によれば、式[5]で表される出発化合物として、「R1がHであり、かつR2がシクロヘキシル基である化合物」(次の式[7]で表される化合物) According to this method, as a starting compound represented by the formula [5], “a compound in which R 1 is H and R 2 is a cyclohexyl group” (a compound represented by the following formula [7])
を用いることにより、本願の目的物である式[2]で表される含フッ素ジオールを製造できることになる。しかしながら、式[7]で表される化合物は非常に高価であり、大量の入手が困難という問題があった。 By using this, the fluorine-containing diol represented by the formula [2], which is the object of the present application, can be produced. However, the compound represented by the formula [7] is very expensive and has a problem that it is difficult to obtain a large amount.
ここで、本発明者らがさらに検討を続けたところ、式[1]で表されるヒドロキシケトンをルテニウム触媒の存在下、水素と接触させると、フェニル基も水素化(還元)された、式[2]で表される含フッ素ジオールが併せて生成することが判明した。 Here, when the present inventors continued further examination, when the hydroxyketone represented by the formula [1] was brought into contact with hydrogen in the presence of a ruthenium catalyst, the phenyl group was also hydrogenated (reduced). It was found that the fluorine-containing diol represented by [2] was produced together.
式[1]で表されるヒドロキシケトンは、ヘキサフルオロアセトンとアセトフェノンを原料としてごく安価に製造することができる化合物である。すなわち本発明の結果、式[2]で表される含フッ素ジオールを、式[7]に表される化合物を原料とする場合に比較して、経済的に格段に有利に製造できることとなった。 The hydroxyketone represented by the formula [1] is a compound that can be produced at a very low cost using hexafluoroacetone and acetophenone as raw materials. That is, as a result of the present invention, the fluorine-containing diol represented by the formula [2] can be produced in a particularly advantageous manner economically compared to the case where the compound represented by the formula [7] is used as a raw material. .
さらに、本発明者らは、上記反応が、特定の反応条件において、高選択率で進行することを見出した。すなわち、式[1]で表されるヒドロキシケトンをルテニウム触媒の存在下、水素と接触させることにより式[2]で表される含フッ素ジオールを生成する反応は、70℃以下という比較的低い温度で、特に高い選択率をもって進行することを見出した。 Furthermore, the present inventors have found that the above reaction proceeds at a high selectivity under specific reaction conditions. That is, the reaction for producing the fluorine-containing diol represented by the formula [2] by bringing the hydroxyketone represented by the formula [1] into contact with hydrogen in the presence of a ruthenium catalyst is performed at a relatively low temperature of 70 ° C. or less. It was found that the process proceeds with a particularly high selectivity.
芳香族化合物を、遷移金属触媒の存在下で、水素と接触させ、該化合物の芳香環をシクロヘキシル環に還元する反応は、一般に知られている反応である。しかしながら、この反応は一般に高い温度、反応圧力を必要とすることが多い。例えば次の反応 The reaction in which an aromatic compound is brought into contact with hydrogen in the presence of a transition metal catalyst and the aromatic ring of the compound is reduced to a cyclohexyl ring is a generally known reaction. However, this reaction generally requires high temperature and reaction pressure. For example, the following reaction
では、温度150−190℃、圧力6.9MPaという条件を必要とする(出典:S.J.Lapporte,W.R.Schuett,Journal of Organic Chemistry,第28巻,1947〜1948頁、1963年(米国))。このような過酷な条件では、反応器に要求される性能が高く、大量での合成に際しては操作が煩雑になる上、本発明の対象とする基質ではトリフルオロメチル基の分解等が懸念される。 Therefore, the conditions of a temperature of 150 to 190 ° C. and a pressure of 6.9 MPa are required (Source: SJ Lappporte, WR Schütt, Journal of Organic Chemistry, 28, 1947-1948, 1963 ( USA)). Under such harsh conditions, the performance required for the reactor is high, the operation becomes complicated in the synthesis in a large amount, and there is a concern about the decomposition of the trifluoromethyl group or the like in the substrate targeted by the present invention. .
ところが、本発明者らが本発明の基質について検討を行ったところ、上述の比較的低い温度でも反応が十分な速度で進行し、しかもこのような条件で、特に高い選択率をもって目的物が得られることが判った(実施例1)。これにより、目的とする式[2]で表される含フッ素ジオールの大量規模での製造が著しく容易になった。 However, when the present inventors examined the substrate of the present invention, the reaction proceeded at a sufficient speed even at the above-mentioned relatively low temperature, and the target product was obtained with a particularly high selectivity under such conditions. (Example 1). As a result, the production of the target fluorinated diol represented by the formula [2] on a large scale has been remarkably facilitated.
また、このようにして得られた式[2]で表される含フッ素ジオールを、式[3]で表されるアクリル酸誘導体 Further, the thus obtained fluorine-containing diol represented by the formula [2] is converted into an acrylic acid derivative represented by the formula [3].
(式中、R1はH,CmH2m+1,CnF2n+1の何れかの基を表す(m、nは各々1〜4の整数を表す)。XはF,Cl,または次の式[3a]で表される基 (In the formula, R 1 represents any one of H, C m H 2m + 1 , and C n F 2n + 1 (m and n each represents an integer of 1 to 4), X represents F, Cl, Or a group represented by the following formula [3a]
の何れかを表す。なお式[3a]中のR1の意味は、式[3]と同じ。)と反応させるこ
とで、次世代レジスト材料のモノマー原料として有望である、式[4]で表される含フッ素エステル
Represents one of the following. The meaning of R 1 in formula [3a] is the same as in formula [3]. The fluorine-containing ester represented by the formula [4], which is promising as a monomer raw material for next-generation resist materials
(式中、R1の意味は式[3]と同じ。)
を容易に製造できる(第2工程)。
(In the formula, the meaning of R 1 is the same as in formula [3].)
Can be easily manufactured (second step).
すなわち、本発明は、式[1]で示されるヒドロキシケトンをルテニウム触媒の存在下、水素により還元することを特徴とする、式[2]で表される含フッ素ジオールの製造方法を提供する。また、上記方法で得られた式[2]で表される含フッ素ジオールを、式[3]で表されるアクリル酸誘導体と反応させることを特徴とする、式[4]で表される含フッ素エステルの製造方法も併せて提供する。 That is, the present invention provides a method for producing a fluorine-containing diol represented by the formula [2], wherein the hydroxyketone represented by the formula [1] is reduced with hydrogen in the presence of a ruthenium catalyst. Further, the fluorine-containing diol represented by the formula [2] obtained by the above method is reacted with an acrylic acid derivative represented by the formula [3]. A method for producing a fluorine ester is also provided.
本発明によれば、ルテニウム触媒の存在下、水素により還元するという簡便な操作により、目的とする1−シクロヘキシル−4,4,4−トリフルオロ−3−(トリフルオロメチル)ブタン−1,3−ジオールを製造することができる。 According to the present invention, the desired 1-cyclohexyl-4,4,4-trifluoro-3- (trifluoromethyl) butane-1,3 is obtained by a simple operation of reduction with hydrogen in the presence of a ruthenium catalyst. -Diols can be produced.
以下、本発明につき、さらに詳細に説明する。本発明の方法は、バッチ式反応装置において実施することができる。以下においてその反応条件を述べるが、それぞれの反応装置において、当業者が容易に調節しうる程度の反応条件の変更を妨げるものではない。 Hereinafter, the present invention will be described in more detail. The process of the present invention can be carried out in a batch reactor. The reaction conditions will be described below, but this does not prevent changes in the reaction conditions that can be easily adjusted by those skilled in the art in each reaction apparatus.
本発明は、第1工程(式[1]で表されるヒドロキシケトンをルテニウム触媒の存在下、水素により還元することで、式[2]で表される含フッ素ジオールを得る工程)を必須の要素とし、必要に応じ、これに第2工程(第1工程で得られた式[2]で表される含フッ素ジオールを、式[3]で表されるアクリル酸誘導体と反応させることで、式[4]で表される含フッ素エステルを得る工程)を加えることによってなる(以下、スキーム1参照)。 In the present invention, the first step (the step of obtaining the fluorine-containing diol represented by the formula [2] by reducing the hydroxyketone represented by the formula [1] with hydrogen in the presence of a ruthenium catalyst) is essential. As an element, if necessary, the second step (the fluorine-containing diol represented by the formula [2] obtained in the first step is reacted with the acrylic acid derivative represented by the formula [3], Step of obtaining a fluorine-containing ester represented by the formula [4]) (see scheme 1 below).
まず、第1工程について説明する。第1工程では、式[1]で表されるヒドロキシケトンをルテニウム触媒の存在下、水素により還元することで、式[2]で表される含フッ素ジオールを得る工程である。 First, the first step will be described. The first step is a step of obtaining the fluorine-containing diol represented by the formula [2] by reducing the hydroxyketone represented by the formula [1] with hydrogen in the presence of a ruthenium catalyst.
式[1]で表されるヒドロキシケトンの合成法に関しては、特許文献2に開示された公知の方法により製造することができる。 The method for synthesizing the hydroxyketone represented by the formula [1] can be produced by a known method disclosed in Patent Document 2.
ここで、式[1]で表されるヒドロキシケトンをルテニウム触媒の存在下、水素により還元する際の反応温度及び反応圧力について、以下、詳細に述べる。 Here, the reaction temperature and reaction pressure when the hydroxyketone represented by the formula [1] is reduced with hydrogen in the presence of a ruthenium catalyst will be described in detail below.
まず、本反応を実施する際の反応温度は、詳細は後に述べるが、0℃〜150℃であり、10℃〜120℃が好ましく、30℃〜70℃が特に好ましい。0℃未満では反応速度が極めて遅く実用的製造法とはならない。 First, the reaction temperature for carrying out this reaction will be described in detail later, but it is 0 ° C to 150 ° C, preferably 10 ° C to 120 ° C, and particularly preferably 30 ° C to 70 ° C. If it is less than 0 degreeC, reaction rate will be very slow and will not become a practical manufacturing method.
また、100℃以上、例えば110℃では式[8]で表される副生成物 In addition, the by-product represented by the formula [8] at 100 ° C. or higher, for example, 110 ° C.
が増加しはじめ、目的の化合物の選択率が低下する(実施例2参照)。とりわけ、150℃を超える温度に加熱することは更なる目的化合物の選択率の低下を招き、エネルギー効率の観点からも経済的に好ましくない。 Begins to increase and the selectivity of the target compound decreases (see Example 2). In particular, heating to a temperature exceeding 150 ° C. causes a further decrease in the selectivity of the target compound, which is economically undesirable from the viewpoint of energy efficiency.
本反応では、反応温度を30〜70℃、特に40℃〜60℃(例えば50℃)にすることは、式[8]で表される副生成物は生成せずに、該目的物である式[2]で表される含フッ素ジオールを非常に高い選択率で得ることが可能であることから、特に好ましい実施態様の一つである(実施例1参照)。 In this reaction, setting the reaction temperature to 30 to 70 ° C., particularly 40 ° C. to 60 ° C. (for example, 50 ° C.) is the target product without generating the by-product represented by the formula [8]. Since the fluorine-containing diol represented by the formula [2] can be obtained with very high selectivity, it is one of the particularly preferred embodiments (see Example 1).
第1工程における反応圧力(水素圧をいう。以下同じ)は、通常0.1〜6MPa(絶対圧。以下、本明細書において同じ。)であるが、0.15〜4.0MPaが好ましく、0.2〜4.0MPaが特に好ましい。但し、好まれる反応圧力には、温度への依存性がある。すなわち、比較的高い温度(80℃以上)で反応を行う場合には、1.0MPa以下の反応圧力でも十分な速度で反応が進行し、それが好適なことが多いが、低い温度(80℃未満)で反応を行う場合には、より高い反応圧力(例えば1.6MPa以上)が好適なことが多い。例えば、30〜70℃で反応を行う場合には、1.6〜4.0MPaの反応圧力が特に好ましい。反応圧力は、反応温度、後述する触媒の種類、量などの諸条件に応じて、最適化することが望ましい。 The reaction pressure (referred to as hydrogen pressure; hereinafter the same) in the first step is usually 0.1 to 6 MPa (absolute pressure; hereinafter the same in this specification), preferably 0.15 to 4.0 MPa, 0.2 to 4.0 MPa is particularly preferable. However, the preferred reaction pressure has temperature dependence. That is, when the reaction is performed at a relatively high temperature (80 ° C. or higher), the reaction proceeds at a sufficient rate even at a reaction pressure of 1.0 MPa or lower, which is often preferable, but it is preferable that the reaction is performed at a low temperature (80 ° C.). A lower reaction pressure (eg, 1.6 MPa or more) is often preferred. For example, when the reaction is performed at 30 to 70 ° C., a reaction pressure of 1.6 to 4.0 MPa is particularly preferable. It is desirable to optimize the reaction pressure in accordance with various conditions such as the reaction temperature and the type and amount of the catalyst described later.
なお、0.1MPa未満の反応圧力でも、反応は進行するが、十分な反応速度を得るために、150℃を上回る温度が要求されることがあり、副反応が促進される結果となるため、好ましくない。一方、6MPaを超えると、高度の圧力に耐え得る反応容器等が必要となり、煩雑となるため、好ましくない。 The reaction proceeds even at a reaction pressure of less than 0.1 MPa, but in order to obtain a sufficient reaction rate, a temperature higher than 150 ° C. may be required, resulting in a side reaction being promoted. It is not preferable. On the other hand, when the pressure exceeds 6 MPa, a reaction vessel that can withstand a high pressure is required, which is not preferable because it becomes complicated.
第1工程において使用されるルテニウム触媒としては、ルテニウム金属、またはルテニウムを担体(活性炭、アルミナ、シリカ、クレー等)に担持したものの他、ルテニウム塩(例えば、RuCl3,RuBr3、Ru(NO3)3など)、ルテニウム錯体(例えばRu(CO)5,Ru(NO)5,K4[Ru(CN)6]、Ru(phen)3Cl3(なおphenはフェナントロリンを表す))、酸化ルテニウム等が、用いられる。 Examples of the ruthenium catalyst used in the first step include ruthenium metal or ruthenium supported on a support (activated carbon, alumina, silica, clay, etc.), or a ruthenium salt (for example, RuCl 3 , RuBr 3 , Ru (NO 3)). 3 ), ruthenium complexes (eg Ru (CO) 5 , Ru (NO) 5 , K 4 [Ru (CN) 6 ], Ru (phen) 3 Cl 3 (where phen represents phenanthroline)), ruthenium oxide Etc. are used.
この中でも、特に入手のしやすさ及び取り扱いのしやすさの観点から、ルテニウムを担体に担持した固相触媒が好ましい。これらの固相触媒は、例えばルテニウム塩を溶液に溶かし、この溶液を担体に含浸させた後、加熱しながら、H2ガスで還元処理することで調製できる。特にRu/C(ルテニウム−カーボン触媒)、ルテニウム−アルミナ触媒、ルテニウム−シリカ触媒は商業的に容易に入手でき、活性も高いことから好ましい。これらは含水品(例えば、触媒全重量中、50重量%の水を含む製品)を使用すると特に取扱いやすい。またこれらの触媒の固体成分(水以外の成分)中のRuの含量には特別な制限はないが、2重量〜10重量%程度(例えば5重量%)のものが、入手も容易で、安定性も高く、取扱いやすいため、好ましく用いられる。 Among these, a solid-phase catalyst in which ruthenium is supported on a carrier is particularly preferable from the viewpoint of easy availability and handling. These solid-phase catalysts can be prepared, for example, by dissolving a ruthenium salt in a solution, impregnating the solution with a support, and then reducing with H 2 gas while heating. In particular, Ru / C (ruthenium-carbon catalyst), ruthenium-alumina catalyst, and ruthenium-silica catalyst are preferred because they are readily available commercially and have high activity. These are particularly easy to handle when using water-containing products (for example, products containing 50% by weight of water in the total weight of the catalyst). In addition, there is no particular restriction on the Ru content in the solid components (components other than water) of these catalysts, but those with about 2 to 10% by weight (for example, 5% by weight) are easily available and stable. It is preferably used because of its high properties and easy handling.
なお、これらのルテニウム触媒の複数種類を共存させて反応を行うこともできるが、通常、特別のメリットはない。 The reaction can be carried out in the presence of a plurality of these ruthenium catalysts, but usually there is no special merit.
ルテニウム触媒の量は、式[1]で表されるヒドロキシケトン1モルあたり、Ru原子換算で通常0.0002モル〜0.04モルであり、0.0004モル〜0.02モルが好ましく、0.001モル〜0.01モルがさらに好ましい。ルテニウム触媒が上記下限値よりも少ないと、反応速度が低下し、上限値よりも多いと経済的に好ましくない。 The amount of the ruthenium catalyst is usually 0.0002 mol to 0.04 mol, preferably 0.0004 mol to 0.02 mol, in terms of Ru atom, per mol of the hydroxyketone represented by the formula [1]. 0.001 mol to 0.01 mol is more preferable. When the ruthenium catalyst is less than the above lower limit, the reaction rate decreases, and when it is more than the upper limit, it is not economically preferable.
本反応において溶媒を使用することができる。使用可能な溶媒の種類に特別な制限はないが、ジエチルエーテル、メチル-t-ブチルエーテル、ジイソプロピルエーテル、テトラヒドロフラン等のエーテル系溶媒、メタノール、エタノール、プロパノール、2−プロパノール、トリフルオロエタノール、1,1,1,3,3,3−ヘキサフルオロ−2−プロパノール等のアルコール系溶媒が好ましく、これらは単独で用いても、複数の溶媒を併用しても良い。本反応に使用する溶媒の溶媒量は式[1]で表されるヒドロキシケトン1gに対して0.005〜100gであり、0.01〜20gが好ましく、0.1〜10gがより好ましい。100gを超えると生産性の観点から経済的に好ましくない。 A solvent can be used in this reaction. There are no particular limitations on the type of solvent that can be used, but ether solvents such as diethyl ether, methyl-t-butyl ether, diisopropyl ether, and tetrahydrofuran, methanol, ethanol, propanol, 2-propanol, trifluoroethanol, 1,1 , 1,3,3,3-hexafluoro-2-propanol and the like are preferable, and these may be used alone or in combination with a plurality of solvents. The amount of the solvent used in this reaction is 0.005 to 100 g, preferably 0.01 to 20 g, more preferably 0.1 to 10 g, based on 1 g of hydroxyketone represented by the formula [1]. If it exceeds 100 g, it is not economically preferable from the viewpoint of productivity.
本反応において、四フッ化エチレン樹脂、クロロトリフルオロエチレン樹脂、フッ化ビニリデン樹脂、PFA樹脂、ガラスなどを内部にライニングしたもの、グラス容器、もしくはステンレスで製作した反応器を使用することができる。 In this reaction, a tetrafluoroethylene resin, a chlorotrifluoroethylene resin, a vinylidene fluoride resin, a PFA resin, a glass lined inside, a glass vessel, or a reactor made of stainless steel can be used.
本発明を実施する方法は限定されるものではないが、望ましい態様の一例につき、詳細を述べる。 Although the method for carrying out the present invention is not limited, details will be described with respect to an example of a desirable embodiment.
反応条件に耐えられる反応器に式[1]で表されるヒドロキシケトン、溶媒、触媒を加え、外部より加熱しながら水素を供給して反応を進行させる。反応に要する時間は、反応温度、触媒の種類、量に依存する。反応器内の圧力等からH2の消費状況を随時観察し、H2の消費が事実上完了した段階で反応を終了することが好ましい。 A hydroxyketone represented by the formula [1], a solvent, and a catalyst are added to a reactor that can withstand reaction conditions, and hydrogen is supplied from the outside while heating to advance the reaction. The time required for the reaction depends on the reaction temperature, the type and amount of the catalyst. It is preferable to observe the state of consumption of H 2 as needed from the pressure in the reactor, etc., and terminate the reaction when the consumption of H 2 is virtually completed.
サンプリング等により原料の消費をモニタリングし、反応が終了したのを確認し、反応液を冷却する。製造された式[2]で表される含フッ素ジオールは公知の方法を適用して精製されるが、例えば、得られた反応液から触媒を濾別した後、濾液を蒸留するかまたは濾液から晶析することにより容易に式[2]で表される含フッ素ジオールを得ることが可能である。 The consumption of the raw material is monitored by sampling or the like, it is confirmed that the reaction is completed, and the reaction liquid is cooled. The produced fluorinated diol represented by the formula [2] is purified by applying a known method. For example, after filtering the catalyst from the obtained reaction solution, the filtrate is distilled or the filtrate is used. By crystallization, it is possible to easily obtain the fluorinated diol represented by the formula [2].
次に、第2工程について説明する。第2工程は、第1工程で得られた式[2]で表される含フッ素ジオールを、式[3]で表されるアクリル酸誘導体 Next, the second step will be described. In the second step, the fluorine-containing diol represented by the formula [2] obtained in the first step is replaced with the acrylic acid derivative represented by the formula [3].
(式中、R1はH,CmH2m+1,CnF2n+1の何れかの基を表す(m、nは各々1〜4の整数を表す)。XはF,Cl,または次の式[3a]で表される基 (In the formula, R 1 represents any one of H, C m H 2m + 1 , and C n F 2n + 1 (m and n each represents an integer of 1 to 4), X represents F, Cl, Or a group represented by the following formula [3a]
の何れかを表す。なお式[3a]中のR1の意味は、式[3]と同じ。)と反応させることで、式[4]で表される含フッ素エステル Represents one of the following. The meaning of R 1 in formula [3a] is the same as in formula [3]. ) -Containing fluorine ester represented by the formula [4]
(式中、R1、の意味は式[3]と同じ。)
を得る工程である。
(In the formula, the meaning of R 1 is the same as in formula [3].)
It is the process of obtaining.
式[3]で表されるアクリル酸誘導体の置換基R1としては、H、メチル、トリフルオロメチルが、式[4]で表される生成物の有用性から特に好ましい。 As the substituent R 1 of the acrylic acid derivative represented by the formula [3], H, methyl and trifluoromethyl are particularly preferred from the usefulness of the product represented by the formula [4].
本工程は、一般的なエステル化の手段によればよいが、好ましい方法、条件等につき、以下に述べる。 This step may be performed by a general means of esterification, but preferable methods, conditions and the like are described below.
まず、式[3]で表されるアクリル酸誘導体がα−置換アクリル酸ハロゲン化物の場合について説明する。本工程は塩基の共存下、行うことが好ましい。塩基としては、トリメチルアミン、トリエチルアミン、ピリジン、2,6−ジメチルピリジン、ジメチルアミノピリジン、炭酸ナトリウム、炭酸カリウム、水酸化ナトリウム、水酸化カリウムからなる群より選ばれる少なくとも一種のものが、好適に用いられる。これらのうちピリジン、2,6−ジメチルピリジンが特に好ましい。 First, the case where the acrylic acid derivative represented by the formula [3] is an α-substituted acrylic acid halide will be described. This step is preferably performed in the presence of a base. As the base, at least one selected from the group consisting of trimethylamine, triethylamine, pyridine, 2,6-dimethylpyridine, dimethylaminopyridine, sodium carbonate, potassium carbonate, sodium hydroxide, and potassium hydroxide is preferably used. . Of these, pyridine and 2,6-dimethylpyridine are particularly preferred.
本工程において使用する塩基の量は式[2]で表される含フッ素ジオール1モルに対して0.2〜2モルであり、0.5〜1.5が好ましく、0.9〜1.2モルがより好ましい。式[2]で表される含フッ素ジオ−ル1モルに対して塩基の量が0.2モル未満では反応の選択率、目的物の収率共に低下し、2モルを超えると反応に関与しない塩基の量が増加するため経済的に好ましくない。 The amount of the base used in this step is 0.2 to 2 mol, preferably 0.5 to 1.5, and preferably 0.9 to 1. mol per mol of the fluorinated diol represented by the formula [2]. Two moles are more preferred. When the amount of the base is less than 0.2 mol relative to 1 mol of the fluorine-containing diol represented by the formula [2], both the selectivity of the reaction and the yield of the target product are lowered. When the amount exceeds 2 mol, the reaction is involved. This is economically unfavorable because the amount of base to be used increases.
本工程において使用するα−置換アクリル酸ハロゲン化物の量は式[2]で表される含フッ素ジオール1モルに対して0.2〜2モルであり、0.5〜1.5モルが好ましく、0.9〜1.2モルがより好ましい。式[2]で表される含フッ素ジオール1モルに対してα−置換アクリル酸ハロゲン化物の量が0.2モル未満では反応の選択率、目的物の収率共に低下し、2モルを超えると反応に関与しないα−置換アクリル酸ハロゲン化物が増加し、廃棄の手間から経済的に好ましくない。 The amount of the α-substituted acrylic acid halide used in this step is 0.2 to 2 mol, preferably 0.5 to 1.5 mol, relative to 1 mol of the fluorinated diol represented by the formula [2]. 0.9 to 1.2 mol is more preferable. When the amount of the α-substituted acrylate halide is less than 0.2 mol relative to 1 mol of the fluorine-containing diol represented by the formula [2], both the selectivity of the reaction and the yield of the target product are lowered, and the amount exceeds 2 mol. And α-substituted acrylate halides which are not involved in the reaction increase, which is economically undesirable from the time of disposal.
本工程においては副生成物として塩基のハロゲン化水素酸塩(フッ化水素酸塩、塩酸塩)が析出する。操作性を改善するため溶媒を使用する必要がある。使用可能な溶媒の種類に特別な制限はないが、ベンゼン、トルエン、キシレン、メシチレン等の芳香族化合物、ジエチルエーテル、メチル-t-ブチルエーテル、ジイソプロピルエーテル、テトラヒドロフラン等のエーテル系溶媒、塩化メチレン、クロロホルム、四塩化炭素等のハロゲン系溶媒が好ましく、これらは単独で用いても、複数の溶媒を併用しても良い。 In this step, a base hydrohalide (hydrofluoride, hydrochloride) is precipitated as a by-product. It is necessary to use a solvent to improve operability. There are no particular restrictions on the type of solvent that can be used, but aromatic compounds such as benzene, toluene, xylene, and mesitylene, ether solvents such as diethyl ether, methyl-t-butyl ether, diisopropyl ether, and tetrahydrofuran, methylene chloride, and chloroform And halogen-based solvents such as carbon tetrachloride are preferable, and these may be used alone or in combination with a plurality of solvents.
本工程に使用する溶媒の溶媒量は式[2]で表される含フッ素ジオール1gに対して0.5〜100gであり、1〜20gが好ましく、2〜10gがより好ましい。溶媒量が式[2]で表される含フッ素ジオール1gに対して0.5g未満では、反応中に析出する塩基のフッ化水素酸塩、塩酸塩のスラリー濃度が高過ぎるため操作性が低下する。100gを超えると生産性の観点から経済的に好ましくない。 The amount of the solvent used in this step is 0.5 to 100 g, preferably 1 to 20 g, and more preferably 2 to 10 g based on 1 g of the fluorinated diol represented by the formula [2]. If the amount of the solvent is less than 0.5 g relative to 1 g of the fluorinated diol represented by the formula [2], the slurry concentration of the hydrofluoric acid salt and hydrochloride of the base precipitated during the reaction is too high, so that the operability is lowered. To do. If it exceeds 100 g, it is not economically preferable from the viewpoint of productivity.
本工程を実施する際の反応温度は−50〜200℃であり、−20〜150℃が好ましく、0℃〜120℃がより好ましい。−50℃未満では反応速度が極めて遅く実用的製造法とはならない。また、200℃を超えると原料のα−置換アクリル酸ハロゲン化物もしくは生成物の式[4]で表される含フッ素エステルが重合することから好ましくない。 The reaction temperature for carrying out this step is −50 to 200 ° C., preferably −20 to 150 ° C., and more preferably 0 ° C. to 120 ° C. If it is less than -50 degreeC, reaction rate will be very slow and it will not become a practical manufacturing method. On the other hand, if it exceeds 200 ° C., the raw material α-substituted acrylate halide or the fluorine-containing ester represented by the formula [4] is polymerized.
本工程の反応において原料のα−置換アクリル酸ハロゲン化物もしくは生成物の含フッ素エステル化合物が重合することを防止することを目的として、重合禁止剤を共存させて行っても良い。使用する重合禁止剤はヒドロキノン、メトキノン、2,5−ジ−t−ブチルヒドロキノン、1,2,4−トリヒドロキシベンゼン、2,5−ビステトラメチルブチルヒドロキノン、ロイコキニザリン、ノンフレックスF、ノンフレックスH、ノンフレックスDCD、ノンフレックスMBP、オゾノン35、フェノチアジン、2−メトキシフェノチアジン、テトラエチルチウラム ジスルフィド、1,1−ジフェニル−2−ピクリルヒドラジル、1,1−ジフェニル−2−ピクリルヒドラジン、Q−1300、Q−1301から選ばれる少なくとも一種の化合物である。上記の重合禁止剤は市販品であり容易に入手可能である。 In the reaction of this step, the polymerization may be carried out in the presence of a polymerization inhibitor for the purpose of preventing the raw material α-substituted acrylate halide or the product fluorine-containing ester compound from being polymerized. Polymerization inhibitors used are hydroquinone, methoquinone, 2,5-di-t-butylhydroquinone, 1,2,4-trihydroxybenzene, 2,5-bistetramethylbutylhydroquinone, leucoquinizarin, nonflex F, nonflex H , Non-flex DCD, non-flex MBP, ozonone 35, phenothiazine, 2-methoxyphenothiazine, tetraethylthiuram disulfide, 1,1-diphenyl-2-picrylhydrazyl, 1,1-diphenyl-2-picrylhydrazine, Q- 1300 or at least one compound selected from Q-1301. The above polymerization inhibitors are commercially available products and can be easily obtained.
本工程に使用する重合禁止剤の量は原料の式[2]で表される含フッ素ジオール1モルに対して0〜0.1モルであり、0.00001〜0.05モルが好ましく、0.0001〜0.01モルがより好ましい。重合禁止剤の量が原料の式[2]で表される含フッ素ジオール1モルに対して0.1モルを超えても重合を防止する能力に大きな差異はなく、そのため、経済的に好ましくない。 The amount of the polymerization inhibitor used in this step is 0 to 0.1 mol, preferably 0.00001 to 0.05 mol, based on 1 mol of the fluorine-containing diol represented by the raw material formula [2]. 0.0001 to 0.01 mol is more preferable. Even if the amount of the polymerization inhibitor exceeds 0.1 mol with respect to 1 mol of the fluorine-containing diol represented by the formula [2] of the raw material, there is no significant difference in the ability to prevent the polymerization, and this is economically undesirable. .
本工程の反応を行う反応器は、四フッ化エチレン樹脂、クロロトリフルオロエチレン樹脂、フッ化ビニリデン樹脂、PFA樹脂、ガラスなどを内部にライニングしたもの、グラス容器、もしくはステンレスで製作したものが好ましい。 The reactor for carrying out the reaction in this step is preferably a tetrafluoroethylene resin, a chlorotrifluoroethylene resin, a vinylidene fluoride resin, a PFA resin, a glass lined inside, a glass vessel, or a stainless steel. .
次に式[3]で表されるアクリル酸誘導体がα−置換アクリル酸無水物の場合の、本工程の反応を説明する。 Next, the reaction in this step when the acrylic acid derivative represented by the formula [3] is an α-substituted acrylic acid anhydride will be described.
使用するα−置換アクリル酸無水物の量は、式[2]で表される含フッ素ジオール1モルに対して通常0.5〜5モルであり、0.7〜3モルが好ましく、1〜2モルがより好ましい。式[2]で表される含フッ素ジオール1モルに対してα−置換アクリル酸無水物の量が0.5モル未満では反応の転化率、目的物の収率が共に十分でなく、5モルを超えると反応に関与しないα−置換アクリル酸無水物が増加し、廃棄の手間から経済的に好ましくない。 The amount of the α-substituted acrylic anhydride to be used is usually 0.5 to 5 mol, preferably 0.7 to 3 mol, based on 1 mol of the fluorinated diol represented by the formula [2]. Two moles are more preferred. If the amount of α-substituted acrylic acid anhydride is less than 0.5 mol relative to 1 mol of the fluorine-containing diol represented by the formula [2], the conversion rate of the reaction and the yield of the target product are not sufficient, and 5 mol If it exceeds 1, α-substituted acrylic anhydride that does not participate in the reaction increases, which is economically undesirable from the time of disposal.
反応を促進するために添加剤を添加することができる。使用される添加剤としてはメタンスルホン酸、エタンスルホン酸、p−トルエンスルホン酸、ベンゼンスルホン酸、トリフルオロメタンスルホン酸等有機スルホン酸類、ルイス酸類の群から選ばれる少なくとも一種の酸が、好適に用いられる。本反応に使用する添加剤の量は基質の式[2]で表される含フッ素ジオール1モルに対して0.01〜2モルあり、0.02〜1.8が好ましく、0.05〜1.5モルがより好ましい。基質の式[2]で表される含フッ素ジオール1モルに対して添加剤の量が0.01モル未満では反応の転化率、目的物の収率共に低下し、2モルを超えると反応に関与しない添加剤の量が増加するため経済的に好ましくない。 Additives can be added to promote the reaction. As the additive used, at least one acid selected from the group of organic sulfonic acids such as methanesulfonic acid, ethanesulfonic acid, p-toluenesulfonic acid, benzenesulfonic acid, trifluoromethanesulfonic acid and Lewis acids is preferably used. It is done. The amount of the additive used for this reaction is 0.01 to 2 mol, preferably 0.02 to 1.8, preferably 0.05 to 1.8 mol per mol of the fluorine-containing diol represented by the formula [2] of the substrate. 1.5 moles is more preferred. If the amount of the additive is less than 0.01 mol with respect to 1 mol of the fluorine-containing diol represented by the formula [2] of the substrate, both the conversion rate of the reaction and the yield of the target product are reduced. This is economically undesirable because the amount of additive not involved increases.
本反応を実施する際の反応温度は添加剤を添加しない場合は通常80〜200℃、好ましくは100〜180℃、さらに好ましくは120〜160℃である。この場合80℃未満では反応速度が極めて遅く、200℃を超えると原料のα−置換アクリル酸無水物もしくは生成物の式[4]で表される含フッ素エステルが重合することがあるから好ましくない。添加剤を添加する場合は0〜80℃、好ましくは10〜70℃、さらに好ましくは20〜60℃である。この場合0℃未満では反応速度が遅く実用的製造法とはならない。また、80℃を超えると副反応が進行し易くなり、目的物の含フッ素エステル化合物の選択率が低下することがあるから好ましくない。本発明においては、添加剤を加えた方が低い温度で十分な反応性が得られ、選択率が向上するので好ましい。すなわち、メタンスルホン酸、エタンスルホン酸、p−トルエンスルホン酸、ベンゼンスルホン酸、トリフルオロメタンスルホン酸等の添加剤を系内に共存させ、20〜60℃の温度範囲で、反応を実施することは、本工程の特に好ましい態様の一つである。 When this reaction is carried out, the reaction temperature is usually from 80 to 200 ° C, preferably from 100 to 180 ° C, more preferably from 120 to 160 ° C when no additive is added. In this case, the reaction rate is very slow at less than 80 ° C., and if it exceeds 200 ° C., the raw α-substituted acrylic acid anhydride or the fluorine-containing ester represented by the formula [4] may be polymerized, which is not preferable. . When adding an additive, it is 0-80 degreeC, Preferably it is 10-70 degreeC, More preferably, it is 20-60 degreeC. In this case, if it is less than 0 ° C., the reaction rate is slow and it is not a practical production method. Moreover, when it exceeds 80 degreeC, a side reaction will advance easily and it is unpreferable since the selectivity of the target fluorine-containing ester compound may fall. In the present invention, it is preferable to add an additive because sufficient reactivity is obtained at a low temperature and the selectivity is improved. That is, it is possible to carry out the reaction in the temperature range of 20 to 60 ° C. by coexisting additives such as methanesulfonic acid, ethanesulfonic acid, p-toluenesulfonic acid, benzenesulfonic acid, and trifluoromethanesulfonic acid in the system. This is one of the particularly preferred embodiments of this step.
本反応は、無溶媒でも進行するが反応の均一性、反応後の操作性を考慮すると溶媒を使用するのが望ましい。使用可能な溶媒の種類に特別な制限はないが、ベンゼン、トルエン、キシレン、メシチレン等の芳香族化合物、ジエチルエーテル、メチル−t−ブチルエーテル、ジイソプロピルエーテル、テトラヒドロフラン等のエーテル系溶媒、塩化メチレン、クロロホルム、四塩化炭素等のハロゲン系溶媒が好ましく、これらは単独で用いても、複数の溶媒を併用しても良い。 This reaction proceeds even without solvent, but it is desirable to use a solvent in consideration of the uniformity of the reaction and the operability after the reaction. There are no particular restrictions on the type of solvent that can be used, but aromatic compounds such as benzene, toluene, xylene, and mesitylene, ether solvents such as diethyl ether, methyl-t-butyl ether, diisopropyl ether, and tetrahydrofuran, methylene chloride, and chloroform And halogen-based solvents such as carbon tetrachloride are preferable, and these may be used alone or in combination with a plurality of solvents.
本反応に使用する溶媒の量は式[2]で表される含フッ素ジオール1gに対して通常0.1〜100gであり、0.5〜50gが好ましく、1〜20gがより好ましい。溶媒量が式[2]で表される含フッ素ジオール1gに対して0.1g未満では溶媒を使用するメリットを十分に引き出せない。100gを超えると生産性の観点から経済的に好ましくない。 The amount of the solvent used in this reaction is usually 0.1 to 100 g, preferably 0.5 to 50 g, more preferably 1 to 20 g based on 1 g of the fluorinated diol represented by the formula [2]. If the amount of the solvent is less than 0.1 g with respect to 1 g of the fluorine-containing diol represented by the formula [2], the merit of using the solvent cannot be sufficiently extracted. If it exceeds 100 g, it is not economically preferable from the viewpoint of productivity.
この反応においてα−置換アクリル酸無水物もしくは生成物(含フッ素エステル化合物)が重合することを防止することを目的として、重合禁止剤を共存させて行っても良く、通常は重合禁止剤を使用することが望ましい。使用する重合禁止剤はヒドロキノン、メトキノン、2,5−ジ−t−ブチルヒドロキノン、1,2,4−トリヒドロキシベンゼン、2,5−ビステトラメチルブチルヒドロキノン、ロイコキニザリン、ノンフレックスF、ノンフレックスH、ノンフレックスDCD、ノンフレックスMBP、オゾノン35、フェノチアジン、2−メトキシフェノチアジン、テトラエチルチウラム ジスルフィド、1,1−ジフェニル−2−ピクリルヒドラジル、1,1−ジフェニル−2−ピクリルヒドラジン、Q−1300、Q−1301から選ばれる少なくとも一種の化合物である。上記の重合禁止剤は市販品であり容易に入手可能である。 In order to prevent the polymerization of α-substituted acrylic anhydride or product (fluorinated ester compound) in this reaction, it may be carried out in the presence of a polymerization inhibitor, and usually a polymerization inhibitor is used. It is desirable to do. Polymerization inhibitors used are hydroquinone, methoquinone, 2,5-di-t-butylhydroquinone, 1,2,4-trihydroxybenzene, 2,5-bistetramethylbutylhydroquinone, leucoquinizarin, nonflex F, nonflex H , Non-flex DCD, non-flex MBP, ozonone 35, phenothiazine, 2-methoxyphenothiazine, tetraethylthiuram disulfide, 1,1-diphenyl-2-picrylhydrazyl, 1,1-diphenyl-2-picrylhydrazine, Q- 1300 or at least one compound selected from Q-1301. The above polymerization inhibitors are commercially available products and can be easily obtained.
本発明に使用する重合禁止剤の量は原料の式[2]で表される含フッ素ジオール1モルに対して通常0.00001〜0.1モルであり、0.0001〜0.05モルが好ましく、0.001〜0.01モルがより好ましい。重合禁止剤の量が原料の式[2]で表される含フッ素ジオール1モルに対して0.1モルを超えても重合を防止する能力に大きな差異はなく、そのため、経済的に好ましくない。 The amount of the polymerization inhibitor used in the present invention is usually 0.00001 to 0.1 mol, and 0.0001 to 0.05 mol per mol of the fluorine-containing diol represented by the raw material formula [2]. Preferably, 0.001 to 0.01 mol is more preferable. Even if the amount of the polymerization inhibitor exceeds 0.1 mol with respect to 1 mol of the fluorine-containing diol represented by the formula [2] of the raw material, there is no significant difference in the ability to prevent the polymerization, and this is economically undesirable. .
この反応に使用される反応器は、四フッ化エチレン樹脂、クロロ−トリフルオロエチレン樹脂、フッ化ビニリデン樹脂、PFA樹脂、ガラスなどを内部にライニングしたもの、グラス容器、もしくはステンレスで製作したものが好ましい。 The reactor used in this reaction is made of tetrafluoroethylene resin, chloro-trifluoroethylene resin, vinylidene fluoride resin, PFA resin, glass lined inside, glass container, or stainless steel. preferable.
第2工程を実施する方法は限定されるものではないが、望ましい態様の一例につき、詳細を述べる。 Although the method of performing the second step is not limited, the details of an example of a desirable mode will be described.
(ア)式[3]で表されるアクリル酸誘導体がα−置換アクリル酸ハロゲン化物の場合
反応条件に耐えられる反応器に塩基、溶媒、原料の式[2]で表される含フッ素ジオール、α−置換アクリル酸ハロゲン化物および重合禁止剤を加え、攪拌しながら外部より加熱して反応を進行させる。サンプリング等により原料の消費をモニタリングし、反応が終了したのを確認し、反応液を冷却するのが好ましい。
(A) When the acrylic acid derivative represented by the formula [3] is an α-substituted acrylic halide, a fluorine-containing diol represented by the formula [2] of a base, a solvent and a raw material in a reactor that can withstand the reaction conditions An α-substituted acrylate halide and a polymerization inhibitor are added, and the reaction is allowed to proceed by heating from outside while stirring. It is preferable to monitor the consumption of the raw material by sampling or the like, confirm that the reaction is completed, and cool the reaction solution.
本発明の方法で製造された式[4]で表される含フッ素エステルは公知の方法を適用して精製されるが、例えば、反応液中に含まれる塩基の塩酸塩をろ過により除去後、濾液を塩酸水溶液、炭酸ナトリウム水溶液、塩化ナトリウム水溶液の順で処理し、さらに溶媒を留去することで粗有機物が得られる。得られた粗有機物はカラムクロマトグラフィーや蒸留等の精製を行うことで高純度の式[4]で表される含フッ素エステルを得ることができる。 The fluorine-containing ester represented by the formula [4] produced by the method of the present invention is purified by applying a known method. For example, after removing the base hydrochloride contained in the reaction solution by filtration, The filtrate is treated with an aqueous hydrochloric acid solution, an aqueous sodium carbonate solution and an aqueous sodium chloride solution in this order, and the solvent is distilled off to obtain a crude organic material. The obtained crude organic matter can be purified by column chromatography, distillation or the like to obtain a high purity fluorine-containing ester represented by the formula [4].
(イ)式[3]で表されるアクリル酸誘導体がα−置換アクリル酸無水物の場合
反応条件に耐えられる反応器に溶媒、原料の式[2]で表される含フッ素ジオール、α−置換アクリル酸無水物、重合禁止剤及び添加剤を加え、攪拌しながら外部より加熱して反応を進行させる。サンプリング等により原料の消費をモニタリングし、反応が終了したのを確認し、反応液を冷却するのが好ましい。本発明の方法で製造された式[4]で表される含フッ素エステルは公知の方法を適用して精製されるが、例えば、反応液を水、炭酸水素ナトリウム水溶液、食塩水の順で処理し、さらに溶媒を留去することで粗有機物が得られる。得られた粗有機物はカラムクロマトグラフィーや蒸留等の精製を行うことで高純度の式[4]で表される含フッ素エステルを得ることができる。
(A) When the acrylic acid derivative represented by the formula [3] is an α-substituted acrylic anhydride, a reactor that can withstand the reaction conditions, a solvent, a raw material fluorine-containing diol represented by the formula [2], α- A substituted acrylic anhydride, a polymerization inhibitor and an additive are added, and the reaction is allowed to proceed by heating from outside while stirring. It is preferable to monitor the consumption of the raw material by sampling or the like, confirm that the reaction is completed, and cool the reaction solution. The fluorine-containing ester represented by the formula [4] produced by the method of the present invention is purified by applying a known method. For example, the reaction solution is treated in the order of water, an aqueous sodium bicarbonate solution, and brine. Further, the organic solvent can be obtained by distilling off the solvent. The obtained crude organic matter can be purified by column chromatography, distillation or the like to obtain a high purity fluorine-containing ester represented by the formula [4].
以下、実施例により本発明を詳細に説明するがこれらの実施態様に限られない。ここで、組成分析値の「%」とは、反応混合物の一部を採取してガスクロマトグラフィーによって測定して得られた「面積%」を表す。
[実施例1]
1−シクロヘキシル−4,4,4−トリフルオロ−3−(トリフルオロメチル)ブタン−1,3−ジオールの製造(第1工程)
圧力計、温度計及び攪拌機を備えた1Lステンレス鋼製耐圧反応器にジイソプロピルエ−テル355g、4,4,4−トリフルオロ−3−ヒドロキシ−1−フェニル−3−(トリフルオロメチル)ブタン−1−オン350g (1.22モル)、5%Ru/C(50%含水品、エヌ・イ−ケムキャット製)を35.0g入れ、反応器内を水素で置換した後、オイルバスにより加熱し、内温50℃、反応圧力2.6MPa(絶対圧)で反応させた。16時間後、室温まで冷却し反応を終了とした。反応液をサンプリングして組成をガスクロマトグラフィーにより測定したところ、溶媒として使用したジイソプロピルエ−テルを除くと目的とする1−シクロヘキシル−4,4,4−トリフルオロ−3−(トリフルオロメチル)ブタン−1,3−ジオールが96.0%、その他が4.0%であった。触媒の5%Ru/Cを濾別し、濾液から溶媒留去後、ヘキサンから再結晶して目的とする1−シクロヘキシル−4,4,4−トリフルオロ−3−(トリフルオロメチル)ブタン−1,3−ジオールが97.5%の純度で318.2g得られた。収率は91%であった。
1H NMR(溶媒:CDCl3,基準物質:TMS);δ4.01(s,1H),6.31(s,1H),2.2(m, 2H),2.06(m, 3H),1.60(m, 6H),1.21(m, 3H).
19F NMR(溶媒:CDCl3,基準物質:CCl3F);δ−75.9(d,J=10.7Hz, 3F), −72.9(d, J =9.16Hz, 3F).
CI MS m/z(relative intensity):277(100.0), 211(26.3), 83(55.8).
[実施例2]
1−シクロヘキシル−4,4,4−トリフルオロ−3−(トリフルオロメチル)ブタン−1,3−ジオールの製造(第1工程)
温度計及び圧力計を備えた10MPa耐圧100mLステンレス鋼製反応器に四フッ化エチレン樹脂で被覆された撹拌子、4,4,4−トリフルオロ−3−ヒドロキシ−1−フェニル−3−(トリフルオロメチル)ブタン−1−オン3.0g(0.010モル)、5%Ru/C触媒0.3g(10wt%)、及びジイソプロピルエーテル10mLを入れ、反応器内を水素で置換した後、攪拌機で撹拌、オイルバスにより110℃で加熱しながら水素を0.6(絶対圧)MPaで連続導入した。4時間後、内圧の低下がおさまったことを確認して室温まで冷却し、反応液をガスクロマトグラフィーにより測定したところ、溶媒として使用したジイソプロピルエーテルを除くと目的とする1−シクロヘキシル−4,4,4−トリフルオロ−3−(トリフルオロメチル)ブタン−1,3−ジオールが69.0%、4−シクロヘキシル−1,1,1−トリフルオロ−2−(トリフルオロメチル)ブタン−2−オールが29.9%、その他が1.1%であった。
[実施例3]
1−シクロヘキシル−4,4,4−トリフルオロ−3−ヒドロキシ−3−(トリフルオロメチル)ブチル 2−メチルアクリレートの製造(第2工程)
撹拌装置、温度計、還流冷却器を備えたガラス製1L3つ口フラスコに1−シクロヘキシル−4,4,4−トリフルオロ−3−(トリフルオロメチル)ブタン−1,3−ジオール296.5g(1モル)、メタクリル酸無水物170.8g(1.1モル)、トリフルオロメタンスルホン酸1.0g、重合禁止剤として2−メトキシフェノチアジン0.1gを入れ、130℃で加熱攪拌した。3時間後、原料1−シクロヘキシル−4,4,4−トリフルオロ−3−(トリフルオロメチル)ブタン−1,3−ジオールの転化率が99%以上となったところで反応を終了とした。室温まで冷却した後、反応混合物を減圧下、蒸留して112−115℃/0.09kPaの留分を集めたところ、目的とする1−シクロヘキシル−4,4,4−トリフルオロ−3−ヒドロキシ−3−(トリフルオロメチル)ブチル 2−メチルアクリレートが96%の純度で312.8g得られた。収率は90%であった。1H NMR(溶媒:CDCl3,基準物質:TMS);δ6.19(d, J = 1.2, 1H),5.68(d,J = 1.2, 1H),4.89(dt, J = 3.9, 4.1, 1H), 2.41 (dd, J = 3.4, 3.7, 1H), 2.11 (dd, 1.2, 2.2, 1H),1.96 (s, 3H), 1.76 (m, 6H), 1.20 (m, 6H).
19F NMR(溶媒:CDCl3,基準物質:CCl3F);δ−77.07 (q, J = 9.1Hz, 3F), −79.39 (q, J = 9.1Hz, 3F).
CI MS m/z(relative intensity):69(100),276(24),362(M+, 0.6).
[比較例1]
圧力計、温度計及び攪拌機を備えたガラス製100mL耐圧反応器に4,4,4−トリフルオロ−3−ヒドロキシ−1−フェニル−3−(トリフルオロメチル)ブタン−1−オン10.4g(0.04モル)、10%Pd/C(50%含水品、エヌ・イ−ケムキャット製)1.0g、及びジイソプロピルエーテル20mLを入れ、反応器内を水素で置換した後、40℃で加熱しながら水素を1.0MPa(絶対圧)で連続導入した。12時間後、室温まで冷却し、反応混合物24.5gを得た。反応液をサンプリングして組成をガスクロマトグラフィーにより測定したところ、溶媒として使用したジイソプロピルエーテルを除くと4,4,4−トリフルオロ−1−フェニル−3−(トリフルオロメチル)ブタン−1,3−ジオールが97.1%、その他が2.9%であった。この反応混合物から触媒の10%Pd/Cを濾別、濾液から溶媒を留去し、つづいて減圧下、蒸留して、140℃〜143℃/2.0kPaの留分を集めたところ、4,4,4−トリフルオロ−1−フェニル−3−(トリフルオロメチル)ブタン−1,3−ジオールが98.6%の純度で7.97g得られた。収率は76.1%であった。
1H NMR(溶媒:CDCl3,基準物質:TMS);δ7.24−7.34(m, 5H),
6.41(s, 1H), 5.24(d, J =11.7Hz, 1H), 2.91(s, 1H), 2.18−2.40(m, 2H).
19F NMR(溶媒:CDCl3,基準物質:CCl3F);δ−75.8 (q, J =9.92Hz, 3F), −79.7 (q, J =9.92Hz, 3F).
EI-MS m/z(relative intensity):288(M+, 0.8), 201(3.5), 109(3.4), 107(100), 79(63), 77(35), 69(8.8), 51(12).
このように、比較例1では、本発明の目的物である、1−シクロヘキシル−4,4,4−トリフルオロ−3−(トリフルオロメチル)ブタン−1,3−ジオールを得ることはできなかった。
EXAMPLES Hereinafter, although an Example demonstrates this invention in detail, it is not restricted to these embodiments. Here, “%” of the composition analysis value represents “area%” obtained by collecting a part of the reaction mixture and measuring it by gas chromatography.
[Example 1]
Production of 1-cyclohexyl-4,4,4-trifluoro-3- (trifluoromethyl) butane-1,3-diol (first step)
355 g of diisopropyl ether, 4,4,4-trifluoro-3-hydroxy-1-phenyl-3- (trifluoromethyl) butane in a 1 L stainless steel pressure-resistant reactor equipped with a pressure gauge, a thermometer and a stirrer 1-one 350 g (1.22 mol), 55.0 Ru / C (50% water-containing product, manufactured by N.I. Catcat) 35.0 g was added, the inside of the reactor was replaced with hydrogen, and then heated in an oil bath. The reaction was carried out at an internal temperature of 50 ° C. and a reaction pressure of 2.6 MPa (absolute pressure). After 16 hours, the reaction was terminated by cooling to room temperature. The reaction solution was sampled and the composition was measured by gas chromatography. The target 1-cyclohexyl-4,4,4-trifluoro-3- (trifluoromethyl) was obtained except for diisopropyl ether used as a solvent. Butane-1,3-diol was 96.0% and the others were 4.0%. 5% Ru / C of the catalyst was filtered off, the solvent was distilled off from the filtrate, and then recrystallized from hexane to obtain the desired 1-cyclohexyl-4,4,4-trifluoro-3- (trifluoromethyl) butane- 318.2 g of 1,3-diol was obtained with a purity of 97.5%. The yield was 91%.
1 H NMR (solvent: CDCl 3 , reference material: TMS); δ 4.01 (s, 1H), 6.31 (s, 1H), 2.2 (m, 2H), 2.06 (m, 3H) , 1.60 (m, 6H), 1.21 (m, 3H).
19 F NMR (solvent: CDCl 3 , reference material: CCl 3 F); δ-75.9 (d, J = 10.7 Hz, 3F), −72.9 (d, J = 9.16 Hz, 3F).
CI MS m / z (relative intensity): 277 (100.0), 211 (26.3), 83 (55.8).
[Example 2]
Production of 1-cyclohexyl-4,4,4-trifluoro-3- (trifluoromethyl) butane-1,3-diol (first step)
A stirrer coated with tetrafluoroethylene resin in a 10 MPa pressure resistant 100 mL stainless steel reactor equipped with a thermometer and a pressure gauge, 4,4,4-trifluoro-3-hydroxy-1-phenyl-3- (tri Fluoromethyl) butan-1-one (3.0 g, 0.010 mol), 5% Ru / C catalyst (0.3 g, 10 wt%), and diisopropyl ether (10 mL) were added, and the reactor was purged with hydrogen. Then, hydrogen was continuously introduced at 0.6 (absolute pressure) MPa while heating at 110 ° C. with an oil bath. After 4 hours, it was confirmed that the decrease in internal pressure had stopped, and the reaction solution was cooled to room temperature. The reaction solution was measured by gas chromatography, and the target 1-cyclohexyl-4,4 was obtained except for diisopropyl ether used as a solvent. , 4-trifluoro-3- (trifluoromethyl) butane-1,3-diol is 69.0%, 4-cyclohexyl-1,1,1-trifluoro-2- (trifluoromethyl) butane-2- All was 29.9% and others were 1.1%.
[Example 3]
Production of 1-cyclohexyl-4,4,4-trifluoro-3-hydroxy-3- (trifluoromethyl) butyl 2-methyl acrylate (second step)
296.5 g of 1-cyclohexyl-4,4,4-trifluoro-3- (trifluoromethyl) butane-1,3-diol was added to a glass 1 L three-necked flask equipped with a stirrer, a thermometer, and a reflux condenser ( 1 mol), 170.8 g (1.1 mol) of methacrylic anhydride, 1.0 g of trifluoromethanesulfonic acid, and 0.1 g of 2-methoxyphenothiazine as a polymerization inhibitor were added and stirred at 130 ° C. with heating. After 3 hours, the reaction was terminated when the conversion rate of the starting material 1-cyclohexyl-4,4,4-trifluoro-3- (trifluoromethyl) butane-1,3-diol reached 99% or more. After cooling to room temperature, the reaction mixture was distilled under reduced pressure to collect a fraction of 112-115 ° C./0.09 kPa, and the desired 1-cyclohexyl-4,4,4-trifluoro-3-hydroxy was collected. 312.8 g of -3- (trifluoromethyl) butyl 2-methyl acrylate was obtained with a purity of 96%. The yield was 90%. 1 H NMR (solvent: CDCl 3 , reference material: TMS); δ 6.19 (d, J = 1.2, 1H), 5.68 (d, J = 1.2, 1H), 4.89 (dt , J = 3.9, 4.1, 1H), 2.41 (dd, J = 3.4, 3.7, 1H), 2.11 (dd, 1.2, 2.2, 1H), 1.96 (s, 3H), 1.76 (m, 6H), 1.20 (m, 6H).
19 F NMR (solvent: CDCl 3 , reference material: CCl 3 F); δ-77.07 (q, J = 9.1 Hz, 3F), −79.39 (q, J = 9.1 Hz, 3F).
CI MS m / z (relative intensity): 69 (100), 276 (24), 362 (M + , 0.6).
[Comparative Example 1]
A glass 100 mL pressure-resistant reactor equipped with a pressure gauge, a thermometer and a stirrer was charged with 10.4 g of 4,4,4-trifluoro-3-hydroxy-1-phenyl-3- (trifluoromethyl) butan-1-one ( 0.04 mol) 10 g Pd / C (50% water-containing product, manufactured by N-Chemcat) 1.0 g and diisopropyl ether 20 mL were added, and the inside of the reactor was replaced with hydrogen, followed by heating at 40 ° C. Hydrogen was continuously introduced at 1.0 MPa (absolute pressure). After 12 hours, the mixture was cooled to room temperature to obtain 24.5 g of a reaction mixture. The reaction solution was sampled and the composition was measured by gas chromatography. As a result, 4,4,4-trifluoro-1-phenyl-3- (trifluoromethyl) butane-1,3 was obtained except for diisopropyl ether used as a solvent. -Diol was 97.1% and the others were 2.9%. The reaction mixture was filtered to remove 10% Pd / C of the catalyst, the solvent was distilled off from the filtrate, and then distilled under reduced pressure to collect a fraction of 140 ° C to 143 ° C / 2.0 kPa. , 4,4-trifluoro-1-phenyl-3- (trifluoromethyl) butane-1,3-diol was obtained with a purity of 98.6%, 7.97 g. The yield was 76.1%.
1 H NMR (solvent: CDCl 3 , reference material: TMS); δ 7.24-7.34 (m, 5H),
6.41 (s, 1H), 5.24 (d, J = 11.7 Hz, 1H), 2.91 (s, 1H), 2.18-2.40 (m, 2H).
19 F NMR (solvent: CDCl 3 , reference material: CCl 3 F); δ-75.8 (q, J = 9.92 Hz, 3F), −79.7 (q, J = 9.92 Hz, 3F).
EI-MS m / z (relative intensity): 288 (M + , 0.8), 201 (3.5), 109 (3.4), 107 (100), 79 (63), 77 (35), 69 (8.8), 51 (12).
Thus, in Comparative Example 1, 1-cyclohexyl-4,4,4-trifluoro-3- (trifluoromethyl) butane-1,3-diol, which is an object of the present invention, cannot be obtained. It was.
Claims (5)
の製造方法。
An acrylic acid derivative represented by the formula [3] produced from the fluorine-containing diol represented by the formula [2] produced by the method according to claim 1.
Manufacturing method.
Priority Applications (1)
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| JP2006197529A JP4857984B2 (en) | 2005-08-03 | 2006-07-20 | Method for producing fluorine-containing diol and derivatives thereof |
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| JP2006197529A JP4857984B2 (en) | 2005-08-03 | 2006-07-20 | Method for producing fluorine-containing diol and derivatives thereof |
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| JP2010275498A (en) | 2009-06-01 | 2010-12-09 | Central Glass Co Ltd | Fluorine-containing compound, fluorine-containing polymer, resist composition, topcoat composition, and method for forming pattern |
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| US3662071A (en) * | 1966-05-17 | 1972-05-09 | Du Pont | Pharmaceutical composition comprising certain 1,3-substituted glycols |
| JPS59225134A (en) * | 1983-06-06 | 1984-12-18 | Towa Kasei Kogyo Kk | Preparation of 1-(1-hydroxyethyl)-4-isobutylcyclohexane |
| FR2583414B1 (en) * | 1985-06-18 | 1987-07-31 | Charbonnages Ste Chimique | PROCESS FOR THE MANUFACTURE OF FLUORINATED ALKYL (METH) ACRYLATES. |
| JPS62185032A (en) * | 1986-02-06 | 1987-08-13 | Taiho Yakuhin Kogyo Kk | Method for producing 1-(1-hydroxyethyl)-alkylcyclohexane |
| US6806026B2 (en) * | 2002-05-31 | 2004-10-19 | International Business Machines Corporation | Photoresist composition |
| JP4667035B2 (en) * | 2003-12-26 | 2011-04-06 | セントラル硝子株式会社 | Process for producing 1,1-bis (trifluoromethyl) -1,3-diols acrylic ester |
| JP4324569B2 (en) * | 2004-01-27 | 2009-09-02 | セントラル硝子株式会社 | Process for producing fluorine-containing 2,4-diols and derivatives thereof |
| JP4359519B2 (en) * | 2004-02-17 | 2009-11-04 | セントラル硝子株式会社 | 1,1-bis (trifluoromethyl) -1,3-diols acrylic ester and method for producing the same |
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