[go: up one dir, main page]

JP4860128B2 - ワイヤボンディング方法 - Google Patents

ワイヤボンディング方法 Download PDF

Info

Publication number
JP4860128B2
JP4860128B2 JP2004253339A JP2004253339A JP4860128B2 JP 4860128 B2 JP4860128 B2 JP 4860128B2 JP 2004253339 A JP2004253339 A JP 2004253339A JP 2004253339 A JP2004253339 A JP 2004253339A JP 4860128 B2 JP4860128 B2 JP 4860128B2
Authority
JP
Japan
Prior art keywords
bonding
wire
ball
capillary
semiconductor chip
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2004253339A
Other languages
English (en)
Other versions
JP2005086200A (ja
Inventor
震鎬 金
仁九 姜
相▲ヨープ▼ 李
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Samsung Electronics Co Ltd
Original Assignee
Samsung Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samsung Electronics Co Ltd filed Critical Samsung Electronics Co Ltd
Publication of JP2005086200A publication Critical patent/JP2005086200A/ja
Application granted granted Critical
Publication of JP4860128B2 publication Critical patent/JP4860128B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L24/85—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the groups H01L21/18 - H01L21/326 or H10D48/04 - H10D48/07 e.g. sealing of a cap to a base of a container
    • H01L21/60—Attaching or detaching leads or other conductive members, to be used for carrying current to or from the device in operation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/42—Wire connectors; Manufacturing methods related thereto
    • H01L24/47—Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L24/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02—Bonding areas; Manufacturing methods related thereto
    • H01L2224/0212—Auxiliary members for bonding areas, e.g. spacers
    • H01L2224/02122—Auxiliary members for bonding areas, e.g. spacers being formed on the semiconductor or solid-state body
    • H01L2224/02123—Auxiliary members for bonding areas, e.g. spacers being formed on the semiconductor or solid-state body inside the bonding area
    • H01L2224/02125—Reinforcing structures
    • H01L2224/02126—Collar structures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02—Bonding areas; Manufacturing methods related thereto
    • H01L2224/0212—Auxiliary members for bonding areas, e.g. spacers
    • H01L2224/02122—Auxiliary members for bonding areas, e.g. spacers being formed on the semiconductor or solid-state body
    • H01L2224/02163—Auxiliary members for bonding areas, e.g. spacers being formed on the semiconductor or solid-state body on the bonding area
    • H01L2224/02165—Reinforcing structures
    • H01L2224/02166—Collar structures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02—Bonding areas; Manufacturing methods related thereto
    • H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
    • H01L2224/0554—External layer
    • H01L2224/0555—Shape
    • H01L2224/05552—Shape in top view
    • H01L2224/05554—Shape in top view being square
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42—Wire connectors; Manufacturing methods related thereto
    • H01L2224/44—Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45—Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/45001—Core members of the connector
    • H01L2224/4501—Shape
    • H01L2224/45012—Cross-sectional shape
    • H01L2224/45015—Cross-sectional shape being circular
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42—Wire connectors; Manufacturing methods related thereto
    • H01L2224/44—Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45—Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/45001—Core members of the connector
    • H01L2224/45099—Material
    • H01L2224/451—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • H01L2224/45117—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 400°C and less than 950°C
    • H01L2224/45124—Aluminium (Al) as principal constituent
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42—Wire connectors; Manufacturing methods related thereto
    • H01L2224/44—Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45—Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/45001—Core members of the connector
    • H01L2224/45099—Material
    • H01L2224/451—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • H01L2224/45138—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
    • H01L2224/45144—Gold (Au) as principal constituent
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42—Wire connectors; Manufacturing methods related thereto
    • H01L2224/44—Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45—Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/45001—Core members of the connector
    • H01L2224/45099—Material
    • H01L2224/451—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • H01L2224/45138—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
    • H01L2224/45147—Copper (Cu) as principal constituent
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42—Wire connectors; Manufacturing methods related thereto
    • H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805—Shape
    • H01L2224/4809—Loop shape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42—Wire connectors; Manufacturing methods related thereto
    • H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805—Shape
    • H01L2224/4809—Loop shape
    • H01L2224/48095—Kinked
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42—Wire connectors; Manufacturing methods related thereto
    • H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481—Disposition
    • H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42—Wire connectors; Manufacturing methods related thereto
    • H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481—Disposition
    • H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42—Wire connectors; Manufacturing methods related thereto
    • H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481—Disposition
    • H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H01L2224/48247—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42—Wire connectors; Manufacturing methods related thereto
    • H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/484—Connecting portions
    • H01L2224/48463—Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond
    • H01L2224/48465—Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond the other connecting portion not on the bonding area being a wedge bond, i.e. ball-to-wedge, regular stitch
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42—Wire connectors; Manufacturing methods related thereto
    • H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/484—Connecting portions
    • H01L2224/4847—Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a wedge bond
    • H01L2224/48472—Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a wedge bond the other connecting portion not on the bonding area also being a wedge bond, i.e. wedge-to-wedge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42—Wire connectors; Manufacturing methods related thereto
    • H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/484—Connecting portions
    • H01L2224/48475—Connecting portions connected to auxiliary connecting means on the bonding areas, e.g. pre-ball, wedge-on-ball, ball-on-ball
    • H01L2224/48476—Connecting portions connected to auxiliary connecting means on the bonding areas, e.g. pre-ball, wedge-on-ball, ball-on-ball between the wire connector and the bonding area
    • H01L2224/48477—Connecting portions connected to auxiliary connecting means on the bonding areas, e.g. pre-ball, wedge-on-ball, ball-on-ball between the wire connector and the bonding area being a pre-ball (i.e. a ball formed by capillary bonding)
    • H01L2224/48478—Connecting portions connected to auxiliary connecting means on the bonding areas, e.g. pre-ball, wedge-on-ball, ball-on-ball between the wire connector and the bonding area being a pre-ball (i.e. a ball formed by capillary bonding) the connecting portion being a wedge bond, i.e. wedge on pre-ball
    • H01L2224/48479—Connecting portions connected to auxiliary connecting means on the bonding areas, e.g. pre-ball, wedge-on-ball, ball-on-ball between the wire connector and the bonding area being a pre-ball (i.e. a ball formed by capillary bonding) the connecting portion being a wedge bond, i.e. wedge on pre-ball on the semiconductor or solid-state body
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42—Wire connectors; Manufacturing methods related thereto
    • H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/485—Material
    • H01L2224/48505—Material at the bonding interface
    • H01L2224/48599—Principal constituent of the connecting portion of the wire connector being Gold (Au)
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42—Wire connectors; Manufacturing methods related thereto
    • H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/485—Material
    • H01L2224/48505—Material at the bonding interface
    • H01L2224/48699—Principal constituent of the connecting portion of the wire connector being Aluminium (Al)
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/74—Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies and for methods related thereto
    • H01L2224/78—Apparatus for connecting with wire connectors
    • H01L2224/7825—Means for applying energy, e.g. heating means
    • H01L2224/783—Means for applying energy, e.g. heating means by means of pressure
    • H01L2224/78301—Capillary
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/85—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
    • H01L2224/85009—Pre-treatment of the connector or the bonding area
    • H01L2224/8503—Reshaping, e.g. forming the ball or the wedge of the wire connector
    • H01L2224/85035—Reshaping, e.g. forming the ball or the wedge of the wire connector by heating means, e.g. "free-air-ball"
    • H01L2224/85045—Reshaping, e.g. forming the ball or the wedge of the wire connector by heating means, e.g. "free-air-ball" using a corona discharge, e.g. electronic flame off [EFO]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/85—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
    • H01L2224/85009—Pre-treatment of the connector or the bonding area
    • H01L2224/85051—Forming additional members, e.g. for "wedge-on-ball", "ball-on-wedge", "ball-on-ball" connections
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/85—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
    • H01L2224/8512—Aligning
    • H01L2224/85148—Aligning involving movement of a part of the bonding apparatus
    • H01L2224/85169—Aligning involving movement of a part of the bonding apparatus being the upper part of the bonding apparatus, i.e. bonding head, e.g. capillary or wedge
    • H01L2224/8518—Translational movements
    • H01L2224/85181—Translational movements connecting first on the semiconductor or solid-state body, i.e. on-chip, regular stitch
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/85—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
    • H01L2224/852—Applying energy for connecting
    • H01L2224/85201—Compression bonding
    • H01L2224/85205—Ultrasonic bonding
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/85—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
    • H01L2224/85909—Post-treatment of the connector or wire bonding area
    • H01L2224/85951—Forming additional members, e.g. for reinforcing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/42—Wire connectors; Manufacturing methods related thereto
    • H01L24/44—Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L24/45—Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/74—Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies
    • H01L24/78—Apparatus for connecting with wire connectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/00014—Technical content checked by a classifier the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01—Chemical elements
    • H01L2924/01006—Carbon [C]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01—Chemical elements
    • H01L2924/01013—Aluminum [Al]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01—Chemical elements
    • H01L2924/01029—Copper [Cu]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01—Chemical elements
    • H01L2924/01033—Arsenic [As]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01—Chemical elements
    • H01L2924/01075—Rhenium [Re]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01—Chemical elements
    • H01L2924/01079—Gold [Au]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01—Chemical elements
    • H01L2924/01082—Lead [Pb]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10—Details of semiconductor or other solid state devices to be connected
    • H01L2924/11—Device type
    • H01L2924/14—Integrated circuits
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151—Die mounting substrate
    • H01L2924/156—Material
    • H01L2924/15786—Material with a principal constituent of the material being a non metallic, non metalloid inorganic material
    • H01L2924/15787—Ceramics, e.g. crystalline carbides, nitrides or oxides

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Wire Bonding (AREA)

Description

本発明は、電子パッケージングに関するものであって、さらに詳細にはワイヤボンディング方法、半導体チップ、及び半導体パッケージに関する。
一般に、電子パッケージは、ハウジングと「半導体素子」、「チップ」または「ダイ」と呼ばれる集積回路等の連結からなり、電子システムを形成する。パッケージはチップを支持するとともに外部環境から保護し、且つ、チップやシステムから発生する熱を除去する手段、またはチップに信号と電力を供給するための電気的接続を提供する。
ワイヤボンディング技術とは、パッケージ内部の電気的接続に用いられる従来の技術である。このとき、ボンディングワイヤとして、金(Au)やアルミニウム(Al)、銅(Cu)を使用する場合もある。ワイヤの一端はチップに連結され、他端は基板、すなわち、リードフレームをはじめとする印刷回路基板、セラミック基板、フレキシブル回路基板などに連結される。
従来のワイヤボンディング技術は、チップにボールボンディングを、基板にステッチボンディングを行う。すなわち、ワイヤボンダ(wire bonder)のキャピラリ(capillary)の終端下に出てきたワイヤのテールにボールを形成させた後、熱または超音波振動を加えてキャピラリにより押し付けて半導体チップのボンディングパッドにボンディングする。そして、キャピラリを用いて一定の軌跡のループ(loop)を作った後基板のボンディング位置にてウェッジ型ステッチボンドを形成する。
しかし、ボンディングワイヤのループを安定に形成・維持するためには、半導体チップの上面に対するボンディングワイヤの高さを十分に維持しなければならない。すなわち、ワイヤの直径によって異なる場合もあるが、チップの上面に対するボンディングワイヤの高さを１００μｍ以上にしなければならない。従って、既存のワイヤボンディング法は半導体パッケージの薄形化における障害要因として作用している。
こうした問題を解決するための努力として、バンプリバースボンディング技術が開発された。バンプリバースボンディングは、基板にボールボンディングを、半導体チップにステッチボンディングを行うものである。半導体チップにステッチボンディングをすることによってチップのボンディングパッドにボールバンプを載置することができ、それにより、ボンディングパッド上にループを形成せずワイヤボンディングを実現することができる。上記関連技術として、１９９４年７月１２日付及び１９９８年４月７日付の２つの従来技術文献、そして、２００２年８月１３日の別の従来技術文献に開示されている（例えば、特許文献１乃至３参照）。
米国特許第５，３２８，０７９号明細書 米国特許第５，７３５，０３０号明細書 韓国登録特許公報第０３５００８４号明細書
しかし、バンプリバースボンディング(bump-reverse bonding)は、図７に示すように、キャピラリの動きが多いために、ワイヤボンディング工程時間が長くなる問題がある。すなわち、半導体チップのボンディングパッド５２においてボールバンプ８２を形成する工程を行った後、配線基板のボンディング位置６２へ移動させて、ボンディング位置６２にボールボンディングをした後半導体チップのボンディングパッド５２へ再移動してステッチボンディングすることにより仕上げる。
前述したように、半導体チップ５０のボンディングパッド５２と基板のボンディング位置６２とをボンディングワイヤにより連結するために、キャピラリの往復運動が必要である。ここで、実線矢印は、キャピラリの移動による実質的なワイヤボンディング工程が行われる移動経路を表し、点線矢印は実質的なワイヤボンディング工程前のキャピラリの移動経路を表す。
従って、本発明の目的は、ワイヤボンディング中にキャピラリの不要な移動時間を最小化することによりワイヤボンディング時間を最小化できるワイヤボンディング法を提供することにある。
上記目的を達成するために、本発明は、ボンディングパッドを有する半導体チップが実装され、上記半導体チップの近接にボンディング位置が形成されている配線基板を備える段階と、上記ボンディングパッドとボンディング位置を接続するためのボンディングワイヤを備える段階と、上記半導体チップのボンディングパッド上にボールバンプを形成する段階と、上記ボールバンプ上に上記ボンディングワイヤの第１ステッチボンドを形成する段階と、上記ボンディング位置に上記ボンディングワイヤの第２ステッチボンドを形成する段階とを有することを特徴とするワイヤボンディング方法を提供する。
さらに、本発明は、ボンディングパッドを有する半導体チップが実装され、上記半導体チップの近方にボンディング位置が形成されている配線基板を備える段階と、上記ボンディングパッドとボンディング位置を連結するためにキャピラリを通じてワイヤを提供する段階と、上記キャピラリの下に出てきたワイヤの終端にボールを形成する段階と、上記ワイヤのボールを押し付けることによって上記半導体チップのボンディングパッドにボールバンプを形成する段階と、上記ボールバンプをボンディングパッドに保持するためにワイヤから切断段階と、上記ワイヤをボールバンプ上に押し付けることにより上記ボールバンプ上に第１ステッチボンドを形成する段階と、ワイヤを緩めながら上記キャピラリが上記ボンディングパッドより上記配線基板のボンディング位置へ移動させる段階と、上記ボンディング位置にワイヤを押し付けることにより上記配線基板のボンディング位置に第２ステッチボンドを形成する段階と、上記第２ステッチボンドを上記キャピラリ内部にあるワイヤから切断する段階とを有することを特徴とするワイヤボンディング方法を提供する。
半導体チップのボンディングパッドにボールバンプを予め形成するワイヤボンディング方法を提供する。
本発明は、ボールバンプを形成しているボンディングパッドを有する半導体チップが実装され、上記半導体チップの近方にボンディング位置を形成している配線基板を備える段階と、上記ボンディングパッドとボンディング位置を接続するためのボンディングワイヤを備える段階と、上記ボールバンプ上に上記ボンディングワイヤの第１ステッチボンドを形成する段階と、ワイヤを緩めながらキャピラリがボンディングパッドよりボンディング位置へ移動させる段階と、上記ボンディング位置に上記ボンディングワイヤの第２ステッチボンドを形成する段階と、上記第２ステッチボンドを上記キャピラリ内部にあるワイヤから切断する段階とを有する。
本発明による半導体チップは、基板のボンディング位置とワイヤボンディングのための少なくとも一つ以上のボンディングパッドと、その上に形成されたボールステッチバンプとを備える。
本発明による半導体パッケージは、基板の少なくとも一つ以上のボンディング位置とのワイヤボンディングのために、少なくとも一つ以上のボンディングパッドと、上記ボンディングパッド上に形成されているボールステッチバンプを備える半導体チップと、上記少なくとも一つ以上のボンディングパッドのボールステッチバンプとのワイヤボンディングのために、少なくとも一つ以上のボンディング位置の半導体基板とを備える。
本発明によるワイヤボンディング方法に用いるボンディングワイヤとして金線、アルミニウム線または銅線を有し、配線基板としてリードフレーム、印刷回路基板、セラミック基板またはフレキシブル回路基板等を挙げることができる。
以下、添付図面を参照して本発明の実施例をさらに詳細に説明する。図面において同様の図面符号は同様の構成要素を表す。
図１乃至図６は、本発明の実施例による半導体素子のワイヤボンディング方法を示す図である。
本実施形態によるワイヤボンディング工程は、図１に示すように、半導体チップ１０が実装された配線基板２０を備える段階からスタートする。半導体チップ１０は、上面に多数個のボンディングパッド１２が形成されており、ボンディングパッド１２を除く上面は保護層１４により被覆され保護されている。配線基板２０の上面に半導体チップ１０に近接して多数個のボンディング位置２２が形成されている。配線基板２０として、リードフレームをはじめとする印刷回路基板、セラミック基板、フレキシブル回路基板などが用いられる。
次に、図２及び図３に示すように、半導体チップ１０のボンディングパッド１２にボールバンプ４２を形成する段階が行われる。ＥＦＯ（Electric Frame Off）放電を通じてキャピラリ３０の終端に突出したボンディングワイヤ４０終端にボールを形成した後、半導体チップのボンディングパッド１２に所定の荷重と超音波エネルギーをキャピラリ３０の下端に伝達すると、ボール４１が押し付けられボールバンプ４２がボンディングパッド１２に形成される。次いで、キャピラリ３０が上昇しながらワイヤボンダのクランプ３２を用いてボンディングワイヤ４０を切断する。従って、ボールバンプ４２は、ボンディングワイヤ４０から切断されボンディングパッド１２に位置するようになる。
さらに他の実施形態によると、半導体チップ製造過程において、ワイヤ４０を使用せずボンディングパッド１２にボールバンプ４２を予め形成することもできる。
次いで、図４に示すように、ボールバンプ４２上にボールステッチ状ステッチボンド４４を形成する段階が行われる。すなわち、ボンディングワイヤ４０を切断してボールバンプ４２を形成した後、ボールバンプ４２上にキャピラリ３０が下降してくる。そして、キャピラリ３０は、超音波エネルギーを使用したか否かに関係なくワイヤ４０テールを所定の荷重により押し付けてボールバンプ４２上にボールステッチ状ステッチボンド４４を形成する。その後、ワイヤ４０を緩めながら基板のボンディング位置２２へ移動させる。
本発明の実施形態において、ボールバンプ４２を形成した後、直に、ボールバンプ４２上にボールステッチ状ステッチボンド４４を形成するので、ボールステッチ状ステッチボンド４４においてボールバンプ４２とワイヤ４０との間の接合の信頼性が著しく、且つ、良好な信頼性を確保することができる。
図５に示すように、配線基板のボンディング位置２２にボンディングワイヤ４０の別のステッチボンド４６を形成する。すなわち、ボールバンプ４２にボールステッチ状ステッチボンド４４を形成した後、ワイヤを緩めながらキャピラリ３０がボンディング位置２２へ移動する。その後、キャピラリ３０は、ワイヤ４０を所定の圧力で押し付けてボンディング位置２２にボンディングワイヤ４０を押し付けてボンディング位置２２にステッチボンド４６を形成する。
図６に示すように、キャピラリ３０が上昇するとき、クランプ３２がワイヤを把持しているため、ステッチボンド４６からワイヤ４０が切断される。その後、キャピラリ３０はボールを形成するために次のボンディングパッド１２へ移動する。
図８に示すように、ワイヤボンディング方法において、キャピラリ３０がボンディングパッド１２よりボンディング位置２２へ移動するために、再びボンディングパッド１２に戻る必要がなく、キャピラリ３０の移動経路を最小化することができる。従って、ワイヤボンディングにかかる時間が減少し、従来のワイヤボンディング作業に比べて著しく効率的である。
ボールステッチボンドやステッチ-ボールボンドとを用いた従来技術に比べて、本発明のワイヤボンディング技術は、ボールステッチ状ステッチボンドとステッチボンドとを用いて半導体チップと基板とを連結する。従って、ボールボンドを使用せず済むようになるので、ボールボンド上にワイヤループを形成する必要がなく、且つ、ワイヤの高さを減少させることができる。これは、半導体チップのボンディングパッドと基板のボンディング位置との間の高さが異なる場合において一層効果的である。従来では、半導体チップ上にワイヤループが突き出ていたが、本発明では、ワイヤの高さを半導体チップの高さに縮めることができた。
一方、本明細書と図面に開示された本発明の実施例は理解を助けるための特定の実施形態を例示したに過ぎず、本発明の範囲を限定するものではない。ここに開示された実施例の他にも本発明の技術的思想を逸脱しない範囲内における種々の変形例が実施可能であることは当業者には自明である。
本発明の実施形態による配線基板に半導体チップが実装されている状態を示す図である。 本発明の実施形態による半導体チップのボンディングパッド上にボールバンプを形成する段階を示す図である。 本発明の実施形態による半導体チップのボンディングパッド上にボールバンプを形成する段階を示す図である。 本発明の実施形態によるボールバンプにボンディングワイヤからなるボールステッチ状ステッチボンドを形成する段階を示す図である。 本発明の実施形態による配線基板にステッチボンドを形成する段階を示す図面である。 本発明の実施形態による配線基板にステッチボンドを形成する段階を示す図面である。 従来技術によるワイヤボンディング方法によるキャピラリの移動経路を示す図である。 本発明の実施形態によるワイヤボンディング方法によるキャピラリの移動経路を示す図である。
符号の説明
１０ 半導体チップ
１２ ボンディングパッド
１４ 保護層
２０ 配線基板
２２ リード
３０ キャピラリ
３２ ワイヤクランプ
４０ ボンディングワイヤ
４２ ボールバンプ
４４ ボールステッチ状ステッチボンド
４６ ステッチボンド

Claims (3)

  1. ボンディングパッドを有する半導体チップが実装され、前記半導体チップに近接してボンディング位置が形成される配線基板を備える段階と、
    前記ボンディングパッドとボンディング位置を接続するためにキャピラリを通じてボンディングワイヤを提供する段階と、
    前記キャピラリの下に出てきたボンディングワイヤの一端にボールを形成する段階と、
    前記ボンディングパッド上に前記ボンディングワイヤのボールを押し付けて前記半導体チップのボンディングパッド上にボールバンプを形成する段階と、
    前記ボールバンプをボンディングパッド上に保持するために前記ボンディングワイヤから切断する段階と、
    前記ボールバンプ上に前記ボンディングワイヤを押し付けて前記ボールバンプ上に前記ボンディングワイヤの第１ステッチボンドを形成する段階と、
    前記ボンディングワイヤを緩めながらボンディングパッドよりボンディング位置へ前記キャピラリを移動させる段階と、
    前記ボンディング位置に前記ボンディングワイヤを押し付けて前記ボンディング位置に前記ボンディングワイヤの第２ステッチボンドを形成する段階と、
    前記キャピラリ内部のボンディングワイヤから前記第２ステッチボンドを切断する段階と、
    を有することを特徴とする、ワイヤボンディング方法。
  2. 前記ボンディングワイヤは、金線、アルミニウム線、または銅線であることを特徴とする、請求項１に記載のワイヤボンディング方法。
  3. 前記配線基板は、リードフレーム、印刷回路基板、セラミック基板またはフレキシブル回路基板であることを特徴とする、請求項１に記載のワイヤボンディング方法。
JP2004253339A 2003-09-04 2004-08-31 ワイヤボンディング方法 Expired - Fee Related JP4860128B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR2003-061760 2003-09-04
KR10-2003-0061760A KR100536898B1 (ko) 2003-09-04 2003-09-04 반도체 소자의 와이어 본딩 방법

Publications (2)

Publication Number Publication Date
JP2005086200A JP2005086200A (ja) 2005-03-31
JP4860128B2 true JP4860128B2 (ja) 2012-01-25

Family

ID=34225410

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004253339A Expired - Fee Related JP4860128B2 (ja) 2003-09-04 2004-08-31 ワイヤボンディング方法

Country Status (3)

Country Link
US (1) US7067413B2 (ja)
JP (1) JP4860128B2 (ja)
KR (1) KR100536898B1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20220009937A (ko) 2020-07-15 2022-01-25 가부시키가이샤 신가와 와이어 본딩 장치 및 반도체 장치의 제조 방법

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005159267A (ja) * 2003-10-30 2005-06-16 Shinkawa Ltd 半導体装置及びワイヤボンディング方法
JP4298665B2 (ja) 2005-02-08 2009-07-22 株式会社新川 ワイヤボンディング方法
KR20060091622A (ko) * 2005-02-16 2006-08-21 삼성테크윈 주식회사 와이어 본딩 방법
JP2009503822A (ja) * 2005-07-26 2009-01-29 マイクロボンズ・インコーポレイテッド 絶縁ワイヤボンドを用いてパッケージ集積回路を組み立てるためのシステムおよび方法
US20070216026A1 (en) * 2006-03-20 2007-09-20 Adams Zhu Aluminum bump bonding for fine aluminum wire
CH697970B1 (de) * 2006-03-30 2009-04-15 Oerlikon Assembly Equipment Ag Verfahren zur Herstellung einer Wedge Wedge Drahtbrücke.
KR100752664B1 (ko) * 2006-06-15 2007-08-29 삼성전자주식회사 와이어 루프를 갖는 반도체 디바이스, 그 형성 방법 및와이어 루프를 형성하기 위한 와이어 본딩 장치
KR100833187B1 (ko) * 2006-11-02 2008-05-28 삼성전자주식회사 반도체 패키지의 와이어 본딩방법
US20090020872A1 (en) * 2007-07-19 2009-01-22 Shinkawa Ltd. Wire bonding method and semiconductor device
US9331049B2 (en) 2008-07-11 2016-05-03 Nippon Steel & Sumikin Materials Co., Ltd. Bonding structure of bonding wire
WO2010098500A1 (ja) 2009-02-27 2010-09-02 三洋電機株式会社 半導体装置及びその製造方法
US8093707B2 (en) * 2009-10-19 2012-01-10 National Semiconductor Corporation Leadframe packages having enhanced ground-bond reliability
US9620954B2 (en) 2010-12-13 2017-04-11 Infineon Technologies Americas Corp. Semiconductor package having an over-temperature protection circuit utilizing multiple temperature threshold values
US9362215B2 (en) 2010-12-13 2016-06-07 Infineon Technologies Americas Corp. Power quad flat no-lead (PQFN) semiconductor package with leadframe islands for multi-phase power inverter
US9324646B2 (en) 2010-12-13 2016-04-26 Infineon Technologies America Corp. Open source power quad flat no-lead (PQFN) package
US9355995B2 (en) 2010-12-13 2016-05-31 Infineon Technologies Americas Corp. Semiconductor packages utilizing leadframe panels with grooves in connecting bars
US9659845B2 (en) 2010-12-13 2017-05-23 Infineon Technologies Americas Corp. Power quad flat no-lead (PQFN) package in a single shunt inverter circuit
US9443795B2 (en) 2010-12-13 2016-09-13 Infineon Technologies Americas Corp. Power quad flat no-lead (PQFN) package having bootstrap diodes on a common integrated circuit (IC)
US8587101B2 (en) 2010-12-13 2013-11-19 International Rectifier Corporation Multi-chip module (MCM) power quad flat no-lead (PQFN) semiconductor package utilizing a leadframe for electrical interconnections
US9524928B2 (en) 2010-12-13 2016-12-20 Infineon Technologies Americas Corp. Power quad flat no-lead (PQFN) package having control and driver circuits
US9449957B2 (en) 2010-12-13 2016-09-20 Infineon Technologies Americas Corp. Control and driver circuits on a power quad flat no-lead (PQFN) leadframe
US9711437B2 (en) 2010-12-13 2017-07-18 Infineon Technologies Americas Corp. Semiconductor package having multi-phase power inverter with internal temperature sensor
JP2012195459A (ja) * 2011-03-16 2012-10-11 Sharp Corp ワイヤーボンディング方法、及び、半導体装置
US8609525B2 (en) 2011-03-21 2013-12-17 Stats Chippac Ltd. Integrated circuit packaging system with interconnects and method of manufacture thereof
JP2013084848A (ja) * 2011-10-12 2013-05-09 Asahi Kasei Electronics Co Ltd 半導体装置及びワイヤーボンディング方法
WO2021155537A1 (en) * 2020-02-06 2021-08-12 Texas Instruments Incorporated Copper wire bond on gold bump on semiconductor die bond pad
GB2604433B (en) * 2020-12-23 2023-05-03 Skyworks Solutions Inc Apparatus and methods for tool mark free stitch bonding

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55118643A (en) 1979-03-06 1980-09-11 Toshiba Corp Wire bonding process
JPS61280626A (ja) * 1985-05-08 1986-12-11 Sanyo Electric Co Ltd ワイヤボンデイング方法
JPH04293244A (ja) 1991-03-22 1992-10-16 Citizen Watch Co Ltd Ｉｃ実装構造
JPH04294552A (ja) 1991-03-25 1992-10-19 Matsushita Electron Corp ワイヤーボンディング方法
KR100243555B1 (ko) 1992-12-31 2000-02-01 윤종용 반도체패키지 및 그 제조방법
US5328079A (en) * 1993-03-19 1994-07-12 National Semiconductor Corporation Method of and arrangement for bond wire connecting together certain integrated circuit components
EP0632484B1 (en) * 1993-06-30 1996-10-23 STMicroelectronics S.r.l. Method and apparatus for connecting wires between a semiconductor chip and corresponding pins
JPH07335682A (ja) 1994-06-07 1995-12-22 Iwate Toshiba Electron Kk 半導体装置及びその製造方法
US5527740A (en) * 1994-06-28 1996-06-18 Intel Corporation Manufacturing dual sided wire bonded integrated circuit chip packages using offset wire bonds and support block cavities
KR0148883B1 (ko) 1995-05-17 1998-12-01 김광호 이중 와이어 본딩을 이용한 반도체 패키지
US6329278B1 (en) * 2000-01-03 2001-12-11 Lsi Logic Corporation Multiple row wire bonding with ball bonds of outer bond pads bonded on the leads
KR100350084B1 (ko) 2000-08-24 2002-08-24 에스티에스반도체통신 주식회사 반도체 패키지의 와이어 본딩방법
JP2002280414A (ja) * 2001-03-22 2002-09-27 Mitsubishi Electric Corp 半導体装置およびその製造方法
JP2003059961A (ja) * 2001-08-16 2003-02-28 Mitsubishi Electric Corp ワイヤボンディング方法、および半導体装置
US6787926B2 (en) * 2001-09-05 2004-09-07 Taiwan Semiconductor Manufacturing Co., Ltd Wire stitch bond on an integrated circuit bond pad and method of making the same
JP4014912B2 (ja) * 2001-09-28 2007-11-28 株式会社ルネサステクノロジ 半導体装置
US20030222338A1 (en) * 2002-01-04 2003-12-04 Sandisk Corporation Reverse wire bonding techniques
US7229906B2 (en) * 2002-09-19 2007-06-12 Kulicke And Soffa Industries, Inc. Method and apparatus for forming bumps for semiconductor interconnections using a wire bonding machine

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20220009937A (ko) 2020-07-15 2022-01-25 가부시키가이샤 신가와 와이어 본딩 장치 및 반도체 장치의 제조 방법
US12107070B2 (en) 2020-07-15 2024-10-01 Shinkawa Ltd. Wire bonding apparatus and method for manufacturing semiconductor device

Also Published As

Publication number Publication date
US20050054186A1 (en) 2005-03-10
JP2005086200A (ja) 2005-03-31
KR20050023972A (ko) 2005-03-10
US7067413B2 (en) 2006-06-27
KR100536898B1 (ko) 2005-12-16

Similar Documents

Publication Publication Date Title
JP4860128B2 (ja) ワイヤボンディング方法
US7176570B2 (en) Method for forming bump, semiconductor element having bumps and method of manufacturing the same, semiconductor device and method of manufacturing the same, circuit board, and electronic equipment
US7064425B2 (en) Semiconductor device circuit board, and electronic equipment
US6921016B2 (en) Semiconductor device and method of manufacturing the same, circuit board, and electronic equipment
JP2004221257A (ja) ワイヤボンディング方法及びワイヤボンディング装置
JP2003197669A (ja) ボンディング方法及びボンディング装置
US20080272487A1 (en) System for implementing hard-metal wire bonds
US20100181675A1 (en) Semiconductor package with wedge bonded chip
JP2006278407A (ja) 半導体装置の製造方法
CN100464418C (zh) 半导体装置及其制造方法
US20080136027A1 (en) Method of bonding wire of semiconductor package
KR100808510B1 (ko) 와이어 본딩 방법
JPH11354569A (ja) ワイヤボンディング方法および装置ならびに半導体装置の製造方法
JP3923379B2 (ja) 半導体装置
KR100660821B1 (ko) 와이어본딩 방법
KR100485590B1 (ko) 솔더 페이스트 프린트를 이용한 웨이퍼 범핑 방법
JP2000012598A (ja) キャピラリおよびそれを用いたワイヤボンディング方法ならびに装置および半導体装置の製造方法
JPH11251357A (ja) ワイヤボンディング方法および装置
JP2000277559A (ja) 半導体パッケージ及びその製造方法
JP2007035863A (ja) 半導体装置
JP2000138254A (ja) 配線装置及び配線構造及び半導体装置及び半導体装置の製造方法
JP2000068316A (ja) 集積回路装置
JPH11186316A (ja) ワイヤーボンディング装置および方法ならびにリードフレーム
JPH10199913A (ja) ワイヤボンディング方法
JPH04256330A (ja) ワイヤーボンディング方法及びワイヤーボンディング装置

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20060324

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20080624

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20090331

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20090630

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20090811

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20091110

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20091111

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20100601

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20100826

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20100914

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20101214

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20110405

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20110630

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20111004

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20111102

R150 Certificate of patent or registration of utility model

Ref document number: 4860128

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20141111

Year of fee payment: 3

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees