JP4874512B2 - 基材からアルミノケイ酸塩物質を除去する方法及びそれに用いる組成物 - Google Patents
基材からアルミノケイ酸塩物質を除去する方法及びそれに用いる組成物 Download PDFInfo
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- JP4874512B2 JP4874512B2 JP2003358811A JP2003358811A JP4874512B2 JP 4874512 B2 JP4874512 B2 JP 4874512B2 JP 2003358811 A JP2003358811 A JP 2003358811A JP 2003358811 A JP2003358811 A JP 2003358811A JP 4874512 B2 JP4874512 B2 JP 4874512B2
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- aluminosilicate
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- superalloy
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- 239000000758 substrate Substances 0.000 title claims description 58
- 238000000034 method Methods 0.000 title claims description 54
- 239000000203 mixture Substances 0.000 title claims description 49
- 239000000463 material Substances 0.000 title claims description 43
- 229910000323 aluminium silicate Inorganic materials 0.000 title claims description 28
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 title claims description 27
- 239000002253 acid Substances 0.000 claims description 69
- 238000000576 coating method Methods 0.000 claims description 29
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 28
- 239000012720 thermal barrier coating Substances 0.000 claims description 24
- 230000008569 process Effects 0.000 claims description 23
- 239000011248 coating agent Substances 0.000 claims description 21
- 229910000601 superalloy Inorganic materials 0.000 claims description 18
- 230000007797 corrosion Effects 0.000 claims description 14
- 238000005260 corrosion Methods 0.000 claims description 14
- 229910052759 nickel Inorganic materials 0.000 claims description 14
- 238000005524 ceramic coating Methods 0.000 claims description 13
- 239000007788 liquid Substances 0.000 claims description 10
- 239000000356 contaminant Substances 0.000 claims description 9
- 239000003112 inhibitor Substances 0.000 claims description 9
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 8
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims description 8
- 229910052782 aluminium Inorganic materials 0.000 claims description 8
- 150000004673 fluoride salts Chemical class 0.000 claims description 8
- LDDQLRUQCUTJBB-UHFFFAOYSA-O azanium;hydrofluoride Chemical group [NH4+].F LDDQLRUQCUTJBB-UHFFFAOYSA-O 0.000 claims description 7
- 229910017052 cobalt Inorganic materials 0.000 claims description 7
- 239000010941 cobalt Substances 0.000 claims description 7
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 7
- 239000002243 precursor Substances 0.000 claims description 7
- 229910052719 titanium Inorganic materials 0.000 claims description 7
- 239000000126 substance Substances 0.000 claims description 6
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 4
- 229910052751 metal Inorganic materials 0.000 claims description 4
- 239000002184 metal Substances 0.000 claims description 4
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 4
- 229910052726 zirconium Inorganic materials 0.000 claims description 4
- BRPQOXSCLDDYGP-UHFFFAOYSA-N calcium oxide Chemical compound [O-2].[Ca+2] BRPQOXSCLDDYGP-UHFFFAOYSA-N 0.000 claims description 3
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 claims description 3
- 239000000292 calcium oxide Substances 0.000 claims description 3
- 229910052733 gallium Inorganic materials 0.000 claims description 3
- 229910052732 germanium Inorganic materials 0.000 claims description 3
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 claims description 3
- 239000000395 magnesium oxide Substances 0.000 claims description 3
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 claims description 3
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 3
- 229910052710 silicon Inorganic materials 0.000 claims description 3
- FLVIGYVXZHLUHP-UHFFFAOYSA-N N,N'-diethylthiourea Chemical compound CCNC(=S)NCC FLVIGYVXZHLUHP-UHFFFAOYSA-N 0.000 claims description 2
- 230000003628 erosive effect Effects 0.000 claims description 2
- BFXAWOHHDUIALU-UHFFFAOYSA-M sodium;hydron;difluoride Chemical compound F.[F-].[Na+] BFXAWOHHDUIALU-UHFFFAOYSA-M 0.000 claims description 2
- 230000002378 acidificating effect Effects 0.000 claims 3
- 239000000243 solution Substances 0.000 description 15
- 150000007513 acids Chemical class 0.000 description 12
- 150000001875 compounds Chemical class 0.000 description 12
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 12
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 8
- 238000001816 cooling Methods 0.000 description 8
- 238000009792 diffusion process Methods 0.000 description 8
- 238000012545 processing Methods 0.000 description 8
- 150000003839 salts Chemical class 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 7
- 239000012634 fragment Substances 0.000 description 7
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- 229910000951 Aluminide Inorganic materials 0.000 description 6
- 239000000654 additive Substances 0.000 description 6
- 229910052742 iron Inorganic materials 0.000 description 6
- 239000010936 titanium Substances 0.000 description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 5
- 239000000919 ceramic Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 238000007654 immersion Methods 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 4
- 230000002411 adverse Effects 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 4
- 239000000956 alloy Substances 0.000 description 4
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 4
- 229910052804 chromium Inorganic materials 0.000 description 4
- 239000011651 chromium Substances 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 239000008188 pellet Substances 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 3
- 239000007769 metal material Substances 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 239000011253 protective coating Substances 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- 229920006362 Teflon® Polymers 0.000 description 2
- 238000013019 agitation Methods 0.000 description 2
- -1 alkyl sulfonic acids Chemical class 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 239000003344 environmental pollutant Substances 0.000 description 2
- 238000011049 filling Methods 0.000 description 2
- 238000011065 in-situ storage Methods 0.000 description 2
- 229910052500 inorganic mineral Inorganic materials 0.000 description 2
- 230000000670 limiting effect Effects 0.000 description 2
- 239000011707 mineral Substances 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 239000011733 molybdenum Substances 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- 150000007524 organic acids Chemical class 0.000 description 2
- 235000005985 organic acids Nutrition 0.000 description 2
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 239000002683 reaction inhibitor Substances 0.000 description 2
- 230000000717 retained effect Effects 0.000 description 2
- 238000002791 soaking Methods 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- 239000000080 wetting agent Substances 0.000 description 2
- NRGGMCIBEHEAIL-UHFFFAOYSA-N 2-ethylpyridine Chemical compound CCC1=CC=CC=N1 NRGGMCIBEHEAIL-UHFFFAOYSA-N 0.000 description 1
- BSKHPKMHTQYZBB-UHFFFAOYSA-N 2-methylpyridine Chemical compound CC1=CC=CC=N1 BSKHPKMHTQYZBB-UHFFFAOYSA-N 0.000 description 1
- BMYNFMYTOJXKLE-UHFFFAOYSA-N 3-azaniumyl-2-hydroxypropanoate Chemical compound NCC(O)C(O)=O BMYNFMYTOJXKLE-UHFFFAOYSA-N 0.000 description 1
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical compound S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- 229910000531 Co alloy Inorganic materials 0.000 description 1
- 241000501667 Etroplus Species 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 229910017855 NH 4 F Inorganic materials 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- NPXOKRUENSOPAO-UHFFFAOYSA-N Raney nickel Chemical compound [Al].[Ni] NPXOKRUENSOPAO-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 229910001347 Stellite Inorganic materials 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 239000003929 acidic solution Substances 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 238000003915 air pollution Methods 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- 239000002956 ash Substances 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- ZFXVRMSLJDYJCH-UHFFFAOYSA-N calcium magnesium Chemical compound [Mg].[Ca] ZFXVRMSLJDYJCH-UHFFFAOYSA-N 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000004568 cement Substances 0.000 description 1
- 239000002738 chelating agent Substances 0.000 description 1
- AHICWQREWHDHHF-UHFFFAOYSA-N chromium;cobalt;iron;manganese;methane;molybdenum;nickel;silicon;tungsten Chemical compound C.[Si].[Cr].[Mn].[Fe].[Co].[Ni].[Mo].[W] AHICWQREWHDHHF-UHFFFAOYSA-N 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000001066 destructive effect Effects 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 238000010494 dissociation reaction Methods 0.000 description 1
- 230000005593 dissociations Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000010881 fly ash Substances 0.000 description 1
- 239000000446 fuel Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- 229940071870 hydroiodic acid Drugs 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229910001026 inconel Inorganic materials 0.000 description 1
- 229910017053 inorganic salt Inorganic materials 0.000 description 1
- 238000011005 laboratory method Methods 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 238000003760 magnetic stirring Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 229940098779 methanesulfonic acid Drugs 0.000 description 1
- 229910000907 nickel aluminide Inorganic materials 0.000 description 1
- PCLURTMBFDTLSK-UHFFFAOYSA-N nickel platinum Chemical compound [Ni].[Pt] PCLURTMBFDTLSK-UHFFFAOYSA-N 0.000 description 1
- 229910001235 nimonic Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 235000021317 phosphate Nutrition 0.000 description 1
- ACVYVLVWPXVTIT-UHFFFAOYSA-N phosphinic acid Chemical compound O[PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-N 0.000 description 1
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 231100000719 pollutant Toxicity 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 230000002829 reductive effect Effects 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical class [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910002076 stabilized zirconia Inorganic materials 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- ISIJQEHRDSCQIU-UHFFFAOYSA-N tert-butyl 2,7-diazaspiro[4.5]decane-7-carboxylate Chemical compound C1N(C(=O)OC(C)(C)C)CCCC11CNCC1 ISIJQEHRDSCQIU-UHFFFAOYSA-N 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- 239000013585 weight reducing agent Substances 0.000 description 1
- 229910001233 yttria-stabilized zirconia Inorganic materials 0.000 description 1
- RUDFQVOCFDJEEF-UHFFFAOYSA-N yttrium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
- C23G1/02—Cleaning or pickling metallic material with solutions or molten salts with acid solutions
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
- C23G1/02—Cleaning or pickling metallic material with solutions or molten salts with acid solutions
- C23G1/10—Other heavy metals
Landscapes
- Chemical & Material Sciences (AREA)
- Metallurgy (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Turbine Rotor Nozzle Sealing (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Detergent Compositions (AREA)
- ing And Chemical Polishing (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Catalysts (AREA)
Description
(a)化学式HXAF6を有する少なくとも1つの酸を含有する水性組成物を用いて基材を処理する段階と、
(b)酸性フッ化塩及び腐食抑制剤を用いて基材を処理する段階と、
を含み、組成物中の酸性フッ化塩の量はセラミック皮膜を侵食するのに十分な量であり、組成物中の腐食防止剤の量は、酸性フッ化塩の侵食から金属性基材を保護するのに十分な量である。
Claims (10)
- 金属性基材からアルミノケイ酸塩系物質の汚染物で覆われたセラミック皮膜の少なくとも一部を除去する方法であって、
(a)化学式HXAF6(式中、AはSi、Ge、Ti、Zr、Al、及びGaからなる群から選択され、xは1−6である)を有する少なくとも1つの酸又は前記酸の前駆物質を含有する水性組成物で前記基材を処理して前記アルミノケイ酸塩系物質を除去する段階と、次いで
(b)酸性フッ化塩及び腐食抑制剤を用いて前記基材を処理して、前記酸性フッ化塩による侵食から前記金属性基材を保護しつつ、前記アルミノケイ酸塩系物質の下層のセラミック皮膜を侵食する段階と
を含むことを特徴とする方法。 - 前記アルミノケイ酸塩系物質が、酸化カルシウム、酸化マグネシウム、酸化アルミニウム、及び酸化ケイ素を含有することを特徴とする請求項1に記載の方法。
- 前記アルミノケイ酸塩系物質が、5重量%から35重量%の酸化カルシウム、2重量%から35重量%の酸化マグネシウム、5重量%から15重量%の酸化アルミニウム、及び5重量%から55重量%の酸化ケイ素を含有することを特徴とする請求項2に記載の方法。
- 前記基材がニッケル系超合金又はコバルト系超合金を含有することを特徴とする請求項1乃至請求項3のいずれか1項に記載の方法。
- 前記基材がジルコニア系断熱皮膜によって覆われた超合金基材であり、前記水性組成物がH2SiF6又はH2ZrF6の少なくとも1つを含む、請求項1乃至請求項4のいずれか1項に記載の方法。
- 前記超合金が、タービンエンジンの部品であることを特徴とする請求項5に記載の方法。
- 前記段階(a)における処理が、45℃から90℃の範囲に保持された前記水性組成物の液浴中に前記基材を浸漬することによって行われ、前記基材が、液浴内に浸漬されている間に前記組成物がかき混ぜられ又はかき回され、前記液浴内のH2SiF6又はH2ZrF6の濃度(合計)が0.2Mから3.5Mであることを特徴とする請求項5に記載の方法。
- 前記セラミック皮膜がジルコニアを含有するものであり、前記酸性フッ化塩がフッ化水素アンモニウム又はフッ化水素ナトリウムであることを特徴とする請求項1乃至請求項7のいずれか1項に記載の方法。
- 前記酸性フッ化塩がフッ化水素アンモニウムであり、前記腐食抑制剤が硫酸及び1,3−ジエチルチオ尿素を含有することを特徴とする請求項1乃至請求項8のいずれか1項に記載の方法。
- 前記金属性基材と前記セラミック皮膜との間に施されたボンド皮膜が、前記処理段階(a)又は(b)によって影響を受けないことを特徴とする請求項8に記載の方法。
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/277,279 US6916429B2 (en) | 2002-10-21 | 2002-10-21 | Process for removing aluminosilicate material from a substrate, and related compositions |
| US10/277,279 | 2002-10-21 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004143597A JP2004143597A (ja) | 2004-05-20 |
| JP2004143597A5 JP2004143597A5 (ja) | 2006-12-07 |
| JP4874512B2 true JP4874512B2 (ja) | 2012-02-15 |
Family
ID=32093246
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003358811A Expired - Fee Related JP4874512B2 (ja) | 2002-10-21 | 2003-10-20 | 基材からアルミノケイ酸塩物質を除去する方法及びそれに用いる組成物 |
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| US (1) | US6916429B2 (ja) |
| EP (1) | EP1431421A1 (ja) |
| JP (1) | JP4874512B2 (ja) |
| BR (1) | BR0304031A (ja) |
| CA (1) | CA2444929C (ja) |
| SG (1) | SG114634A1 (ja) |
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| DE102005049249B4 (de) * | 2005-10-14 | 2018-03-29 | MTU Aero Engines AG | Verfahren zur Entschichtung eines Gasturbinenbauteils |
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| US7832461B2 (en) * | 2006-04-28 | 2010-11-16 | Hewlett-Packard Development Company, L.P. | Cooling systems and methods |
| US20080069751A1 (en) * | 2006-09-20 | 2008-03-20 | Lawrence Bernard Kool | Method of neutralizing acid exhaust gas |
| JP5132920B2 (ja) * | 2006-11-22 | 2013-01-30 | 東京エレクトロン株式会社 | 塗布・現像装置および基板搬送方法、ならびにコンピュータプログラム |
| US8021491B2 (en) * | 2006-12-07 | 2011-09-20 | Lawrence Bernard Kool | Method for selectively removing coatings from metal substrates |
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| EP2584069A1 (de) * | 2011-10-21 | 2013-04-24 | Siemens Aktiengesellschaft | Vorbehandlung bei einer Fluoridionen-Reinigung und Verfahren |
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| US10501839B2 (en) * | 2018-04-11 | 2019-12-10 | General Electric Company | Methods of removing a ceramic coating from a substrate |
| CN119506899A (zh) | 2018-11-22 | 2025-02-25 | 艺康美国股份有限公司 | 用来增强污垢去除的酸性cip/cop清洗组合物 |
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Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2501349A (en) * | 1946-05-10 | 1950-03-21 | Westinghouse Electric Corp | Insulation for magnetic material |
| US3514407A (en) * | 1966-09-28 | 1970-05-26 | Lockheed Aircraft Corp | Chemical polishing of titanium and titanium alloys |
| US4277289A (en) * | 1978-07-19 | 1981-07-07 | Aluminum Pechiney | Process for removing titaniferous and silico-aluminous incrustations from surfaces |
| US4713119A (en) * | 1986-03-20 | 1987-12-15 | Stauffer Chemical Company | Process for removing alkali metal aluminum silicate scale deposits from surfaces of chemical process equipment |
| DE3917867A1 (de) * | 1989-06-01 | 1990-12-06 | Hoechst Ceram Tec Ag | Verfahren zur abscheidung von gold |
| US5464479A (en) * | 1994-08-31 | 1995-11-07 | Kenton; Donald J. | Method for removing undesired material from internal spaces of parts |
| US5660885A (en) * | 1995-04-03 | 1997-08-26 | General Electric Company | Protection of thermal barrier coating by a sacrificial surface coating |
| DE19680259T1 (de) * | 1995-04-06 | 1997-06-19 | Gen Electric | Verfahren und Verbundstoff zum Schutz eines Wärmesperren-Überzuges durch einen undurchlässigen Sperrüberzug |
| US6238743B1 (en) * | 2000-01-20 | 2001-05-29 | General Electric Company | Method of removing a thermal barrier coating |
| US6379749B2 (en) * | 2000-01-20 | 2002-04-30 | General Electric Company | Method of removing ceramic coatings |
| US6833328B1 (en) * | 2000-06-09 | 2004-12-21 | General Electric Company | Method for removing a coating from a substrate, and related compositions |
| US6863738B2 (en) | 2001-01-29 | 2005-03-08 | General Electric Company | Method for removing oxides and coatings from a substrate |
| US6758914B2 (en) * | 2001-10-25 | 2004-07-06 | General Electric Company | Process for partial stripping of diffusion aluminide coatings from metal substrates, and related compositions |
-
2002
- 2002-10-21 US US10/277,279 patent/US6916429B2/en not_active Expired - Lifetime
-
2003
- 2003-10-09 CA CA2444929A patent/CA2444929C/en not_active Expired - Fee Related
- 2003-10-17 EP EP03256567A patent/EP1431421A1/en not_active Withdrawn
- 2003-10-20 SG SG200306261A patent/SG114634A1/en unknown
- 2003-10-20 BR BR0304031-3A patent/BR0304031A/pt not_active Application Discontinuation
- 2003-10-20 JP JP2003358811A patent/JP4874512B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| SG114634A1 (en) | 2005-09-28 |
| CA2444929A1 (en) | 2004-04-21 |
| EP1431421A1 (en) | 2004-06-23 |
| JP2004143597A (ja) | 2004-05-20 |
| US20040074873A1 (en) | 2004-04-22 |
| BR0304031A (pt) | 2005-05-31 |
| CA2444929C (en) | 2011-11-22 |
| US6916429B2 (en) | 2005-07-12 |
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