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JP4973488B2 - Semiconductor device - Google Patents

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Publication number
JP4973488B2
JP4973488B2 JP2007333665A JP2007333665A JP4973488B2 JP 4973488 B2 JP4973488 B2 JP 4973488B2 JP 2007333665 A JP2007333665 A JP 2007333665A JP 2007333665 A JP2007333665 A JP 2007333665A JP 4973488 B2 JP4973488 B2 JP 4973488B2
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Prior art keywords
wiring board
semiconductor device
resin case
support column
hole
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JP2009158642A (en
Inventor
伸 征矢野
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Fuji Electric Co Ltd
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Fuji Electric Co Ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

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Abstract

<P>PROBLEM TO BE SOLVED: To provide a semiconductor device having a structure in which a wiring substrate is hardly detached from a supporting pole by suppressing the loosing of a screw for fixing the wiring substrate to have high reliability. <P>SOLUTION: This semiconductor device 1 includes: at least one semiconductor element housed in a resin case 20; a plurality of supporting poles 40 fixed to the resin case 20; and a wiring substrate 50 supported by being screwed in the supporting poles 40, and includes a structure in which the supporting poles 40 penetrating the substrate 50 and the substrate 50 are engaged with each other. Such an engaging is performed by a convex portion 40aa formed on a side face of the supporting pole 40 penetrating the substrate 50 and a concave portion 50a formed in the wiring substrate 50. By a semiconductor device 1 having such a structure, the loosing of a screw 60 for fixing the substrate 50 is suppressed, so that a semiconductor device having high reliability is achieved. <P>COPYRIGHT: (C)2009,JPO&amp;INPIT

Description

本発明は半導体装置に関し、特に半導体素子を樹脂ケース内に包容した半導体装置に関する。   The present invention relates to a semiconductor device, and more particularly to a semiconductor device in which a semiconductor element is enclosed in a resin case.

インバータ装置、無停電電源装置、工作機械、産業用ロボット等では、その本体装置とは独立して、パワー半導体素子を樹脂ケース内に包容(パッケージ)させた半導体装置(汎用モジュール)が使用されている。そして、このような半導体装置には、プリント基板等で代表される配線基板が取り付けられる場合が多い(例えば、特許文献1,2)。
特開2006−093255号公報(図4) 特開2001−036003号公報(図3)
Inverter devices, uninterruptible power supply devices, machine tools, industrial robots, etc., a semiconductor device (general-purpose module) in which a power semiconductor element is enclosed (packaged) in a resin case is used independently of the main body device. Yes. In many cases, a wiring board represented by a printed board or the like is attached to such a semiconductor device (for example, Patent Documents 1 and 2).
JP 2006-093255 A (FIG. 4) JP 2001-036003 A (FIG. 3)

しかしながら、上述した構造の半導体装置では、配線基板を樹脂ケースに設けた支柱にねじ止めにより直接的に取り付けている。
また、パワー半導体素子を搭載した半導体装置では、当該半導体装置を作動または停止することにより温度サイクルが発生する。
However, in the semiconductor device having the above-described structure, the wiring board is directly attached to the support provided on the resin case by screwing.
In a semiconductor device equipped with a power semiconductor element, a temperature cycle is generated by operating or stopping the semiconductor device.

従って、上述した構造の半導体装置では、配線基板が温度サイクルにて膨張或いは収縮すると、ねじ止めに用いられているねじが緩むという問題があった。
また、このような緩みが発生すると、配線基板と端子との間に断線が発生したり、配線基板に配設されている回路、素子等の劣化が進行し、半導体装置を長期間、使用できないという問題があった。
Therefore, the semiconductor device having the above-described structure has a problem that when the wiring board expands or contracts in a temperature cycle, a screw used for screwing loosens.
In addition, when such looseness occurs, disconnection occurs between the wiring board and the terminal, deterioration of circuits and elements disposed on the wiring board progresses, and the semiconductor device cannot be used for a long time. There was a problem.

本発明はこのような点に鑑みてなされたものであり、配線基板を固定するねじの緩みを抑制し、配線基板が上記支柱から外れ難い構造を有し、信頼性の高い半導体装置を提供することを目的とする。   The present invention has been made in view of the above points, and provides a highly reliable semiconductor device having a structure in which loosening of a screw for fixing a wiring board is suppressed and the wiring board does not easily come off from the support column. For the purpose.

上記課題を解決するために、本発明の一態様では、樹脂ケース内に包容された、少なくとも一つの半導体素子と、前記樹脂ケースに固定された複数の支柱と、前記支柱にねじ止めにより支持された配線基板と、を備え、前記配線基板内に貫通した前記支柱の側面に形成された凸部と前記配線基板に形成された凹部とが嵌合していることを特徴とする半導体装置が提供される。 In order to solve the above problems, according to one aspect of the present invention, at least one semiconductor element enclosed in a resin case, a plurality of columns fixed to the resin case, and supported by screws to the columns. A semiconductor device characterized in that a convex portion formed on a side surface of the support column penetrating into the wiring substrate and a concave portion formed in the wiring substrate are fitted. Is done.

また、本発明の一態様では、樹脂ケース内に包容された、少なくとも一つの半導体素子と、前記樹脂ケースに固定された複数の支柱と、前記支柱にねじ止めにより支持された配線基板と、を備え、前記配線基板内に貫通する前記支柱の側面の一部が前記配線基板と接触し、前記側面の他の部分が前記配線基板と離間し、前記側面の一部に形成された凸部と前記配線基板に形成された凹部とが嵌合している、ことを特徴とする半導体装置が提供される。 In one aspect of the present invention, at least one semiconductor element enclosed in a resin case, a plurality of support posts fixed to the resin case, and a wiring board supported by screwing to the support posts, wherein the portion of the side surface of said strut which penetrates the wiring substrate is in contact with the wiring board, the other portion is spaced apart from the wiring board side, the convex portion formed on a part of the side surface And a recess formed in the wiring board are fitted to each other .

また、本発明の一態様では、樹脂ケース内に包容された、少なくとも一つの半導体素子と、前記樹脂ケースに固定された複数の支柱と、前記支柱にねじ止めにより支持された配線基板と、を備え、前記配線基板に、第1の貫通孔と、前記第1の貫通孔に連通し、前記第1の貫通孔から遠ざかる方向に所定の幅で延在する第2の貫通孔とが設けられ、前記支柱は、前記樹脂ケースに固定される側の第1の部分と反対側の第2の部分とを備え、前記第2の部分は、前記第2の貫通孔に挿入され、前記第1の貫通孔の大きさは、前記第2の部分の外径よりも大きく、前記第2の貫通孔の前記所定の幅は、前記外径と同じか、または、前記外径に1mm以下の長さを加えたものと同じである、ことを特徴とする半導体装置が提供される。
In one aspect of the present invention, at least one semiconductor element enclosed in a resin case, a plurality of support posts fixed to the resin case, and a wiring board supported by screwing to the support posts, The wiring board is provided with a first through hole and a second through hole that communicates with the first through hole and extends with a predetermined width in a direction away from the first through hole. The support column includes a first portion fixed to the resin case and a second portion opposite to the first portion, and the second portion is inserted into the second through-hole, The size of the through hole is larger than the outer diameter of the second portion, and the predetermined width of the second through hole is the same as the outer diameter or a length of 1 mm or less to the outer diameter. There is provided a semiconductor device characterized by being the same as that to which the above is added .

上記手段によれば、配線基板を固定するねじの緩みが抑制され、配線基板が支柱から外れ難い構造の半導体装置が実現する。これにより、信頼性の高い半導体装置が実現する。   According to the above means, the loosening of the screw for fixing the wiring board is suppressed, and a semiconductor device having a structure in which the wiring board is hardly detached from the support is realized. Thereby, a highly reliable semiconductor device is realized.

以下、本実施の形態に係る半導体装置を、図面を参照して詳細に説明する。
<第1の実施の形態>
図1は第1の実施の形態に係る半導体装置の要部模式図である。ここで、図1(a)には、半導体装置の平面模式図が例示され、図1(b)には図1(a)の破線X−Yに沿った位置での断面の拡大図が表示されている。尚、図1では、例えば、インバータ回路、チョッパ回路等を備えた半導体モジュール(パワーモジュール)が例示されている。
Hereinafter, a semiconductor device according to the present embodiment will be described in detail with reference to the drawings.
<First Embodiment>
FIG. 1 is a schematic diagram of a main part of the semiconductor device according to the first embodiment. Here, FIG. 1A illustrates a schematic plan view of a semiconductor device, and FIG. 1B displays an enlarged view of a cross section at a position along the broken line XY in FIG. Has been. In FIG. 1, for example, a semiconductor module (power module) including an inverter circuit, a chopper circuit, and the like is illustrated.

図示する半導体装置1は、板厚が数ミリの金属ベース板10を基体とし、当該金属ベース板10上に形成された回路パターン(図示しない)に、パワー半導体素子であるIGBT(Insulated Gate Bipolar Transistor)素子、並びにFWD(Free Wheeling Diode)素子等が複数個、実装されている(図示しない)。そして、半導体装置1内には、更に、配線パターン、配線端子等が設けられ、上記回路が構成されている(図示しない)。更に、半導体装置1は、上述したパワー半導体素子等を樹脂ケース20によりパッケージングしている。   The illustrated semiconductor device 1 uses a metal base plate 10 having a thickness of several millimeters as a base, and an IGBT (Insulated Gate Bipolar Transistor) that is a power semiconductor element on a circuit pattern (not shown) formed on the metal base plate 10. A plurality of elements, FWD (Free Wheeling Diode) elements, and the like are mounted (not shown). The semiconductor device 1 is further provided with a wiring pattern, wiring terminals, and the like, and the circuit is configured (not shown). Furthermore, the semiconductor device 1 packages the above-described power semiconductor element and the like with a resin case 20.

ここで、樹脂ケース20は、例えば、PPS(ポリ・フェニレン・サルファイド)製の樹脂であり、金属ベース板10の上端縁に固設されている。そして、樹脂ケース20の外枠には、例えば、上記IGBT素子の主電極に導通する、外部接続用端子30a,30bがインサート成形されている。このような外部接続用端子30a,30bは、例えば、銅(Cu)またはアルミニウム(Al)またはこれらの合金を主成分とした材質により構成されている。   Here, the resin case 20 is, for example, a resin made of PPS (polyphenylene sulfide), and is fixed to the upper end edge of the metal base plate 10. Then, on the outer frame of the resin case 20, for example, external connection terminals 30a and 30b that are electrically connected to the main electrode of the IGBT element are insert-molded. Such external connection terminals 30a and 30b are made of, for example, a material mainly composed of copper (Cu), aluminum (Al), or an alloy thereof.

また、樹脂ケース20の外枠には、支柱40が貫設されている。例えば、支柱40の下部40bの一部を樹脂ケース20の外枠に貫入することにより、当該外枠に支柱40が設置されている。   A support column 40 is provided in the outer frame of the resin case 20. For example, the column 40 is installed in the outer frame by penetrating a part of the lower part 40 b of the column 40 into the outer frame of the resin case 20.

また、半導体装置1においては、配線基板(プリント基板)50が支柱40に、取り付けられている。例えば、支柱40の上部40aを配線基板50に貫通させ、支柱40の下部40bの上端に、配線基板50の下面を接触させている。そして、ねじ60によるねじ止めにより、配線基板50が支柱40に固定・支持されている。   In the semiconductor device 1, a wiring board (printed board) 50 is attached to the support column 40. For example, the upper portion 40a of the support column 40 is penetrated through the wiring substrate 50, and the lower surface of the wiring substrate 50 is brought into contact with the upper end of the lower portion 40b of the support column 40. The wiring board 50 is fixed and supported on the support column 40 by screwing with the screw 60.

更に、半導体装置1においては、上述したねじ止めの他に、支柱40の上部40aと配線基板50とを嵌合させている。
このような嵌合は、例えば、支柱40の上部40aの側面に形成された凸部40aaと、配線基板50内に設けられた凹部50aとを、互いに衝合させ、凸部40aaと凹部50aとを接触させることにより実施している。
Further, in the semiconductor device 1, in addition to the above-described screwing, the upper portion 40a of the support column 40 and the wiring board 50 are fitted.
Such fitting is performed, for example, by causing the convex portion 40aa formed on the side surface of the upper portion 40a of the support column 40 and the concave portion 50a provided in the wiring board 50 to collide with each other, and the convex portion 40aa and the concave portion 50a It is carried out by contacting.

即ち、半導体装置1においては、配線基板50を、ねじ止めにより、支柱40に取り付けると共に、上記の嵌合により、支柱40に取り付けている。
尚、図1(b)においては、凸部40aaの断面形状として、逆V字型形状のものが例示されているが、このような断面形状は、逆V字型形状に限らない。例えば、断面形状は、逆W字型であってもよく、四角状であってもよい。或いは、支柱40の上部40aの表面に、アヤメローレット加工を施してもよい。
That is, in the semiconductor device 1, the wiring substrate 50 is attached to the support column 40 by screwing and is attached to the support column 40 by the above-described fitting.
In addition, in FIG.1 (b), although the thing of a reverse V shape is illustrated as a cross-sectional shape of convex part 40aa, such a cross-sectional shape is not restricted to a reverse V shape. For example, the cross-sectional shape may be an inverted W shape or a square shape. Alternatively, the surface of the upper portion 40a of the support column 40 may be subjected to iris knurl processing.

また、このような配線基板50の主面には、上記IGBT素子等を制御する回路等が形成されている(図示しない)。例えば、IC回路部、コンデンサ部、抵抗部等が配線基板50の主面に実装されている。   Further, a circuit or the like for controlling the IGBT element or the like is formed on the main surface of the wiring board 50 (not shown). For example, an IC circuit part, a capacitor part, a resistance part, and the like are mounted on the main surface of the wiring board 50.

また、支柱40の位置、数は、図1で示される構成に限定されるものではなく、必要に応じて、支柱40を半導体装置1の内部領域に設置してもよく、4個以外の数の支柱40を樹脂ケース20に配置してもよい。   Further, the position and the number of the support columns 40 are not limited to the configuration shown in FIG. 1, and the support columns 40 may be installed in the internal region of the semiconductor device 1 as necessary. The support column 40 may be disposed on the resin case 20.

また、ねじ60と支柱40との間には、図示する如く、ワッシャ61を挟んでもよい。
また、半導体装置1においては、配線基板50下に、IGBT素子の制御電極に導通するピン端子(制御用端子)70が複数個、設置している。そして、ピン端子70は、配線基板50を貫通し、配線基板50の主面に設けられた回路と、半田付けにより電気的に接続されている。
Further, a washer 61 may be sandwiched between the screw 60 and the support column 40 as shown in the figure.
In the semiconductor device 1, a plurality of pin terminals (control terminals) 70 that are connected to the control electrode of the IGBT element are installed under the wiring board 50. The pin terminal 70 penetrates the wiring board 50 and is electrically connected to a circuit provided on the main surface of the wiring board 50 by soldering.

また、半導体装置1にあっては、樹脂ケース20及び金属ベース板10で取り囲まれた空間に、半導体素子、半導体素子に接続された金属ワイヤ等の保護を目的として、例えば、ゲルまたはエポキシ樹脂を主成分とする封止用樹脂が充填されている(図示しない)。   In the semiconductor device 1, for example, a gel or an epoxy resin is used in the space surrounded by the resin case 20 and the metal base plate 10 for the purpose of protecting the semiconductor element and the metal wire connected to the semiconductor element. A sealing resin as a main component is filled (not shown).

このように半導体装置1では、配線基板50を、上記の嵌合及びねじ60によるねじ止めにより、支柱40に取り付けることができる。また、支柱40の上部40aと配線基板50とを嵌合させていることから、半導体装置1に温度サイクルが生じても、配線基板50の伸縮による応力が直接的に、ねじ60に伝動しない構造となっている。従って、配線基板50が伸縮しても、半導体装置1は、ねじ60が緩み難い構造を有している。   As described above, in the semiconductor device 1, the wiring board 50 can be attached to the support column 40 by the above-described fitting and screwing with the screw 60. Further, since the upper portion 40a of the support column 40 and the wiring board 50 are fitted, a structure in which the stress due to the expansion / contraction of the wiring board 50 is not directly transmitted to the screw 60 even if a temperature cycle occurs in the semiconductor device 1. It has become. Therefore, even if the wiring board 50 expands and contracts, the semiconductor device 1 has a structure in which the screw 60 is difficult to loosen.

その結果、配線基板50は、支柱40に強固に固定され、上述したような、配線基板50とピン端子70との間の断線が抑制される。また、配線基板50に配設されている回路、半導体素子等の劣化が抑制される。これにより、半導体装置1を長期間にわたり、使用することができる。   As a result, the wiring board 50 is firmly fixed to the support column 40, and the disconnection between the wiring board 50 and the pin terminal 70 as described above is suppressed. In addition, deterioration of circuits, semiconductor elements and the like disposed on the wiring board 50 is suppressed. Thereby, the semiconductor device 1 can be used over a long period of time.

また、半導体装置1が外部から振動、衝撃等を受け、ねじ60が支柱40から離反したとしても、配線基板50が支柱40の上部40aに嵌合されているために、配線基板50は、支柱40から離反することはない。   Even if the semiconductor device 1 is subjected to vibration, impact, or the like from the outside, and the screw 60 is separated from the support column 40, the wiring substrate 50 is connected to the upper portion 40a of the support column 40. There is no separation from 40.

また、半導体装置1においては、配線基板50を支柱40にねじ止めする前に、配線基板50を支柱40の上部40aに嵌合することができるので、配線基板50の取り付け、位置決めが容易になる。   In the semiconductor device 1, since the wiring board 50 can be fitted to the upper part 40 a of the support 40 before the wiring board 50 is screwed to the support 40, the wiring board 50 can be easily attached and positioned. .

また、支柱40に取り付ける配線基板50の枚数は、特に1枚に限ることはなく、複数の配線基板50を、所定の間隔を設けて支柱40に取り付けてもよい。
また、配線基板50の上下の主面に配線パターンを配設する場合、或いは複数の配線基板50を支柱40に設ける場合には、支柱40の材質を、例えば、銅(Cu)等の金属製としてもよい。このような材質の支柱40を設ければ、当該支柱40を配線基板50の上下の主面に配設された配線パターン、或いは、夫々の配線基板50の主面に配設された配線パターンのビア電極とすることもできる。
Further, the number of wiring boards 50 attached to the support column 40 is not particularly limited to one, and a plurality of wiring boards 50 may be attached to the support column 40 with a predetermined interval.
Further, when wiring patterns are provided on the upper and lower main surfaces of the wiring board 50, or when a plurality of wiring boards 50 are provided on the support 40, the material of the support 40 is made of metal such as copper (Cu), for example. It is good. When the support 40 made of such a material is provided, the support 40 is arranged on the upper and lower main surfaces of the wiring board 50 or the wiring patterns provided on the main surfaces of the respective wiring boards 50. A via electrode can also be used.

尚、半導体装置1内に配置する半導体素子は、上述したIGBT素子に限らず、パワーMOSFET(Metal Oxide Semiconductor Field Effect Transistor)を配置してもよい。   The semiconductor element arranged in the semiconductor device 1 is not limited to the IGBT element described above, and a power MOSFET (Metal Oxide Semiconductor Field Effect Transistor) may be arranged.

次に、半導体装置1を変形させた形態について説明する。尚、以下に示す全ての図においては、図1と同一の部材には、同一の符号を付し、その説明の詳細については省略する。   Next, a modified form of the semiconductor device 1 will be described. In all the drawings shown below, the same members as those in FIG. 1 are denoted by the same reference numerals, and detailed description thereof will be omitted.

<第2の実施の形態>
図2は第2の実施の形態に係る半導体装置の要部模式図である。ここで、図2(a)には、半導体装置2に設けられた支柱周辺部の平面模式図が例示され、図2(b)には図2(a)の破線X−Yに沿った位置での断面図が表示されている。尚、図2(a)には、図2(b)に表示した、ねじ60並びにワッシャ61が表示されていない。
<Second Embodiment>
FIG. 2 is a schematic diagram of a main part of a semiconductor device according to the second embodiment. Here, FIG. 2A illustrates a schematic plan view of the periphery of the pillar provided in the semiconductor device 2, and FIG. 2B illustrates a position along the broken line XY in FIG. A cross-sectional view at is displayed. In FIG. 2A, the screw 60 and the washer 61 shown in FIG. 2B are not displayed.

第2の実施の形態に係る半導体装置2は、半導体装置1と同様の構造を有している。但し、上記樹脂ケース20の外枠に設けられた支柱41の周辺部の形態を変形させている。
図示するように、樹脂ケース20の外枠には、支柱41の下部41bの一部が貫設されている。そして、支柱41の上部41aを配線基板50に貫通させ、当該支柱41の下部41bの上端に、配線基板50の下面を接触させている。また、配線基板50は、ねじ60によるねじ止めにより、支柱41に固定・支持されている。
The semiconductor device 2 according to the second embodiment has the same structure as the semiconductor device 1. However, the form of the peripheral part of the support | pillar 41 provided in the outer frame of the said resin case 20 is changed.
As shown in the drawing, a part of the lower portion 41 b of the support column 41 is provided through the outer frame of the resin case 20. And the upper part 41a of the support | pillar 41 is penetrated to the wiring board 50, and the lower surface of the wiring board 50 is made to contact the upper end of the lower part 41b of the said support | pillar 41. Further, the wiring board 50 is fixed and supported on the support column 41 by screwing with a screw 60.

但し、第2の実施の形態に係る半導体装置2においては、支柱41の近傍の配線基板50に、例えば、2個の孔部50bを設け、支柱41の上部41aの一部に配線基板50の一部を接触させている。   However, in the semiconductor device 2 according to the second embodiment, for example, two holes 50b are provided in the wiring substrate 50 in the vicinity of the support column 41, and the wiring substrate 50 is partially formed on the upper portion 41a of the support column 41. A part is in contact.

即ち、半導体装置2においては、配線基板50の一部を、支柱41の上部41aの一部に接触させ、ねじ60によるねじ止めにより、配線基板50を支柱41に取り付けている。   That is, in the semiconductor device 2, a part of the wiring board 50 is brought into contact with a part of the upper portion 41 a of the support 41 and the wiring board 50 is attached to the support 41 by screwing with the screw 60.

このような構造であれば、上記の如く、配線基板50の伸縮が生じても、伸縮により発する応力が上記の接触部分において緩和される。また、配線基板50の一部を、支柱41の上部41aの一部に接触させているために、当該応力が直接的に、ねじ60に伝動することがない。従って、半導体装置2は、配線基板50が伸縮しても、ねじ60が緩み難い構造を有している。   With such a structure, as described above, even if the wiring substrate 50 expands and contracts, the stress generated by the expansion and contraction is relieved at the contact portion. In addition, since a part of the wiring board 50 is brought into contact with a part of the upper portion 41 a of the support column 41, the stress is not directly transmitted to the screw 60. Therefore, the semiconductor device 2 has a structure in which the screw 60 is not easily loosened even when the wiring substrate 50 is expanded or contracted.

その結果、上述したような、配線基板50とピン端子70との間の断線が抑制される。また、配線基板50に配設されている回路、半導体素子等の劣化が抑制される。これにより、半導体装置2を長期間にわたり、使用することができる。   As a result, the disconnection between the wiring board 50 and the pin terminal 70 as described above is suppressed. In addition, deterioration of circuits, semiconductor elements and the like disposed on the wiring board 50 is suppressed. Thereby, the semiconductor device 2 can be used over a long period of time.

また、支柱41の周辺部の配線基板50の形態は、図2で示される構成に限定されるものではなく、必要に応じて、その形態を変形してもよい。
例えば、図3、図4に、第2の実施の形態を変形した例を示す。
Moreover, the form of the wiring board 50 in the peripheral portion of the support column 41 is not limited to the configuration shown in FIG. 2, and the form may be modified as necessary.
For example, FIG. 3 and FIG. 4 show an example in which the second embodiment is modified.

先ず、図3(a)に示すように、支柱41の近傍の配線基板50に、3個の孔部50bを設け、配線基板50の一部を支柱41の上部41aの一部に接触させてもよい。
また、図3(b)に示すように、支柱41の近傍の配線基板50に、4個の孔部50bを設け、配線基板50の一部を支柱41の上部41aの一部に接触させてもよい。
First, as shown in FIG. 3A, three holes 50b are provided in the wiring board 50 in the vicinity of the column 41, and a part of the wiring substrate 50 is brought into contact with a part of the upper part 41a of the column 41. Also good.
Further, as shown in FIG. 3B, four holes 50 b are provided in the wiring board 50 in the vicinity of the column 41, and a part of the wiring substrate 50 is brought into contact with a part of the upper part 41 a of the column 41. Also good.

このように、半導体装置2においては、配線基板50の一部と、支柱41の上部41aの一部とを、2乃至4個の箇所で、互いに接触させ、配線基板50をねじ60によるねじ止めにより、支柱41に取り付けている。このように、半導体装置2は、配線基板50が伸縮しても、ねじ60が緩み難い構造を有している。   As described above, in the semiconductor device 2, a part of the wiring board 50 and a part of the upper portion 41 a of the support column 41 are brought into contact with each other at two to four locations, and the wiring board 50 is screwed with the screw 60. Is attached to the column 41. As described above, the semiconductor device 2 has a structure in which the screw 60 is difficult to loosen even when the wiring substrate 50 expands and contracts.

また、図4に示すように、半導体装置2においては、支柱41に代えて、上述した支柱40を用いてもよい。
このような構造であれば、配線基板50を、上記の嵌合及びねじ60によるねじ止めにより、支柱40に取り付けることができる。従って、図4に例示する半導体装置2では、上記の効果に加え、ねじ60がより緩み難い構造を有している。
Also, as shown in FIG. 4, in the semiconductor device 2, the above-described support column 40 may be used instead of the support column 41.
With such a structure, the wiring board 50 can be attached to the support column 40 by the above-described fitting and screwing with the screw 60. Therefore, in the semiconductor device 2 illustrated in FIG. 4, in addition to the above effects, the screw 60 has a structure that is more difficult to loosen.

<第3の実施の形態>
図5、図6は第3の実施の形態に係る半導体装置の要部模式図である。ここで、各図の図(a)には、半導体装置3に設けられた支柱周辺部の平面模式図が例示され、図(b)には図(a)の破線X−Yに沿った位置での断面図が表示されている。
<Third Embodiment>
5 and 6 are schematic views of the main part of the semiconductor device according to the third embodiment. Here, each figure (a) illustrates a schematic plan view of the periphery of the pillar provided in the semiconductor device 3, and (b) is a position along the broken line XY in FIG. (A). A cross-sectional view at is displayed.

第3の実施の形態に係る半導体装置3は、半導体装置1と同様の構造を有している。但し、上記樹脂ケース20の外枠に設けられた支柱41の周辺部の形態を変形させている。
図5に示すように、樹脂ケース20の外枠には、支柱41の下部41bの一部が貫設されている。そして、支柱41の上部41aを配線基板50に貫通させ、当該支柱41の下部41bの上端に、配線基板50の下面を接触させている。また、配線基板50は、上記ねじ60によるねじ止めにより、支柱41に固定・支持されている。
The semiconductor device 3 according to the third embodiment has the same structure as the semiconductor device 1. However, the form of the peripheral part of the support | pillar 41 provided in the outer frame of the said resin case 20 is changed.
As shown in FIG. 5, a part of the lower portion 41 b of the support column 41 is provided through the outer frame of the resin case 20. And the upper part 41a of the support | pillar 41 is penetrated to the wiring board 50, and the lower surface of the wiring board 50 is made to contact the upper end of the lower part 41b of the said support | pillar 41. Further, the wiring board 50 is fixed and supported on the support column 41 by screwing with the screw 60.

但し、第3の実施の形態に係る半導体装置3においては、支柱41の近傍の配線基板50に、例えば、連通する貫通孔50c,50dを設けている。また、貫通孔50cの径は、支柱41の上部41aの外径よりも大きく、貫通孔50dの短手方向の幅は、支柱41の上部41aの外径と同幅に構成されている。尚、貫通孔50dと支柱41の上部41aとの間には、例えば、1mm以下のクリアランスを設けてもよい。   However, in the semiconductor device 3 according to the third embodiment, the wiring substrate 50 in the vicinity of the support column 41 is provided with, for example, through holes 50c and 50d that communicate with each other. Further, the diameter of the through hole 50 c is larger than the outer diameter of the upper portion 41 a of the support column 41, and the width in the short direction of the through hole 50 d is configured to be the same as the outer diameter of the upper portion 41 a of the support column 41. For example, a clearance of 1 mm or less may be provided between the through hole 50d and the upper portion 41a of the support column 41.

そして、配線基板50を、支柱41に取り付ける場合は、図5に示すように、支柱41の上部41aを配線基板50の貫通孔50cに貫入し、配線基板50の下面を支柱41の下部41bの上端に接触させた後、図中に示した矢印の方向に配線基板50を移動させる。このような移動により、図6に示すように、支柱41の上部41aが配線基板50の貫通孔50dに貫入する。そして、支柱41の上部41aを配線基板50の貫通孔50dに貫入させた状態で、ねじ60によるねじ止めにより、配線基板50を支柱41に取り付ける。   And when attaching the wiring board 50 to the support | pillar 41, as shown in FIG. 5, the upper part 41a of the support | pillar 41 penetrates into the through-hole 50c of the wiring board 50, and the lower surface of the wiring board 50 is made into the lower part 41b of the support | pillar 41. After contacting the upper end, the wiring board 50 is moved in the direction of the arrow shown in the figure. By such movement, the upper portion 41a of the support column 41 penetrates into the through hole 50d of the wiring board 50 as shown in FIG. Then, the wiring board 50 is attached to the pillar 41 by screwing with the screw 60 in a state where the upper portion 41 a of the pillar 41 is inserted into the through hole 50 d of the wiring board 50.

このように、半導体装置3では、配線基板50の一部を、支柱41の上部41aの一部に接触させ、ねじ60によるねじ止めにより、支柱41に取り付けている。
このような構造であれば、上記の如く、配線基板50の伸縮が生じても、伸縮により発する応力が上述した接触部分において緩和される。また、支柱41の上部41aを配線基板50の貫通孔50dに貫入させているために、当該応力が直接的に、ねじ60に伝動することがない。従って、半導体装置3は、配線基板50が伸縮しても、ねじ60が緩み難い構造を有している。
As described above, in the semiconductor device 3, a part of the wiring board 50 is brought into contact with a part of the upper portion 41 a of the support column 41 and attached to the support column 41 by screwing with the screw 60.
With such a structure, as described above, even if the wiring substrate 50 expands and contracts, the stress generated by the expansion and contraction is relieved at the contact portion described above. Further, since the upper portion 41 a of the support column 41 is penetrated into the through hole 50 d of the wiring board 50, the stress is not directly transmitted to the screw 60. Therefore, the semiconductor device 3 has a structure in which the screw 60 is not easily loosened even when the wiring substrate 50 is expanded or contracted.

その結果、上述したような、配線基板50とピン端子70との間の断線が抑制される。また、配線基板50に配設されている回路、半導体素子等の劣化が抑制される。これにより、半導体装置3を長期間にわたり、使用することができる。   As a result, the disconnection between the wiring board 50 and the pin terminal 70 as described above is suppressed. In addition, deterioration of circuits, semiconductor elements and the like disposed on the wiring board 50 is suppressed. Thereby, the semiconductor device 3 can be used over a long period of time.

特に、配線基板50が多層配線構造を備えている場合には、配線基板50の厚み方向に負荷(例えば、貫入による摩擦力)が印加されると、配線基板50の各層が剥離するという現象が度々起きる。   In particular, when the wiring board 50 has a multilayer wiring structure, when a load (for example, frictional force due to penetration) is applied in the thickness direction of the wiring board 50, each layer of the wiring board 50 is peeled off. Get up often.

しかし、半導体装置3では、配線基板50の貫通孔50cに支柱41の上部41aを非接触で貫入することができる。また、貫入後に、配線基板50を横方向に移動させて、配線基板50の貫通孔50dに支柱41の上部41aを貫入することができる。   However, in the semiconductor device 3, the upper portion 41 a of the support column 41 can be inserted into the through hole 50 c of the wiring board 50 in a non-contact manner. In addition, after the penetration, the wiring board 50 can be moved in the lateral direction, and the upper portion 41 a of the support column 41 can be penetrated into the through hole 50 d of the wiring board 50.

従って、半導体装置3では、配線基板50の装着時に、その厚み方向に負荷がかかることがない。その結果、半導体装置3では、上述した剥離が起き難い構造となっている。
また、図7に、第3の実施の形態を変形した例を示す。ここで、図(a)には、半導体装置4に設けられた支柱周辺部の平面模式図が例示され、図(b)には図(a)の破線X−Yに沿った位置での断面図が表示されている。
Therefore, in the semiconductor device 3, no load is applied in the thickness direction when the wiring board 50 is mounted. As a result, the semiconductor device 3 has a structure in which the above-described peeling hardly occurs.
FIG. 7 shows an example in which the third embodiment is modified. Here, FIG. 1A illustrates a schematic plan view of the periphery of a support provided in the semiconductor device 4, and FIG. 2B illustrates a cross-section at a position along the broken line XY in FIG. The figure is displayed.

図示するように、半導体装置4においては、上記の支柱41に代えて、上述した支柱40を用いている。
このような構造であれば、配線基板50を、上記の嵌合及びねじ60によるねじ止めにより、支柱40に取り付けることができる。従って、図7に例示する半導体装置4では、上記の効果に加え、ねじ60がより緩み難い構造を有している。
As shown in the figure, in the semiconductor device 4, the above-described support column 40 is used instead of the support column 41.
With such a structure, the wiring board 50 can be attached to the support column 40 by the above-described fitting and screwing with the screw 60. Therefore, the semiconductor device 4 illustrated in FIG. 7 has a structure in which the screw 60 is more difficult to loosen in addition to the above effects.

尚、第1乃至第3の実施の形態は、夫々が独立の実施の形態となるものではない。必要に応じて、第1乃至第3の実施の形態のうち、複数の実施の形態を複合させてもよい。   It should be noted that the first to third embodiments are not independent embodiments. A plurality of embodiments of the first to third embodiments may be combined as necessary.

第1の実施の形態に係る半導体装置の要部模式図である。It is a principal part schematic diagram of the semiconductor device which concerns on 1st Embodiment. 第2の実施の形態に係る半導体装置の要部模式図である。It is a principal part schematic diagram of the semiconductor device which concerns on 2nd Embodiment. 第2の実施の形態の変形例に係る半導体装置の要部模式図である(その1)。It is a principal part schematic diagram of the semiconductor device which concerns on the modification of 2nd Embodiment (the 1). 第2の実施の形態の変形例に係る半導体装置の要部模式図である(その2)。It is a principal part schematic diagram of the semiconductor device which concerns on the modification of 2nd Embodiment (the 2). 第3の実施の形態に係る半導体装置の要部模式図である(その1)。It is a principal part schematic diagram of the semiconductor device which concerns on 3rd Embodiment (the 1). 第3の実施の形態に係る半導体装置の要部模式図である(その2)。It is a principal part schematic diagram of the semiconductor device which concerns on 3rd Embodiment (the 2). 第3の実施の形態の変形例に係る半導体装置の要部模式図である。It is a principal part schematic diagram of the semiconductor device which concerns on the modification of 3rd Embodiment.

符号の説明Explanation of symbols

1,2,3 半導体装置
10 金属ベース板
20 樹脂ケース
30a,30b 外部接続用端子
40,41 支柱
40a,41a 上部
40aa 凸部
40b,41b 下部
50 配線基板
50a 凹部
50b 孔部
50c,50d 貫通孔
60 ねじ
61 ワッシャ
70 ピン端子
1, 2, 3 Semiconductor device 10 Metal base plate 20 Resin case 30a, 30b External connection terminal 40, 41 Post 40a, 41a Upper 40aa Protrusion 40b, 41b Lower 50 Wiring board 50a Recess 50b Hole 50c, 50d Through hole 60 Screw 61 Washer 70 Pin terminal

Claims (5)

樹脂ケース内に包容された、少なくとも一つの半導体素子と、
前記樹脂ケースに固定された複数の支柱と、
前記支柱にねじ止めにより支持された配線基板と、
を備え、
前記配線基板内に貫通した前記支柱の側面に形成された凸部と前記配線基板に形成された凹部とが嵌合していることを特徴とする半導体装置。
At least one semiconductor element enclosed in a resin case;
A plurality of columns fixed to the resin case;
A wiring board supported by screwing to the support;
With
A semiconductor device, wherein a convex portion formed on a side surface of the pillar penetrating into the wiring substrate and a concave portion formed in the wiring substrate are fitted.
樹脂ケース内に包容された、少なくとも一つの半導体素子と、At least one semiconductor element enclosed in a resin case;
前記樹脂ケースに固定された複数の支柱と、  A plurality of columns fixed to the resin case;
前記支柱にねじ止めにより支持された配線基板と、  A wiring board supported by screwing to the support;
を備え、  With
前記配線基板内に貫通する前記支柱の側面の一部が前記配線基板と接触し、前記側面の他の部分が前記配線基板と離間し、  A part of the side surface of the column penetrating into the wiring board is in contact with the wiring board, and the other part of the side surface is separated from the wiring board,
前記側面の一部に形成された凸部と前記配線基板に形成された凹部とが嵌合している、  The convex part formed in a part of the side and the concave part formed in the wiring board are fitted,
ことを特徴とする半導体装置。  A semiconductor device.
前記側面の一部と前記配線基板とが、2乃至4個の箇所で、互いに接触していることを特徴とする請求項2記載の半導体装置。The semiconductor device according to claim 2, wherein a part of the side surface and the wiring board are in contact with each other at two to four locations. 樹脂ケース内に包容された、少なくとも一つの半導体素子と、At least one semiconductor element enclosed in a resin case;
前記樹脂ケースに固定された複数の支柱と、  A plurality of columns fixed to the resin case;
前記支柱にねじ止めにより支持された配線基板と、  A wiring board supported by screwing to the support;
を備え、  With
前記配線基板に、第1の貫通孔と、前記第1の貫通孔に連通し、前記第1の貫通孔から遠ざかる方向に所定の幅で延在する第2の貫通孔とが設けられ、  The wiring board is provided with a first through hole and a second through hole that communicates with the first through hole and extends with a predetermined width in a direction away from the first through hole,
前記支柱は、前記樹脂ケースに固定される側の第1の部分と反対側の第2の部分とを備え、前記第2の部分は、前記第2の貫通孔に挿入され、  The support column includes a first portion fixed to the resin case and a second portion opposite to the first portion, and the second portion is inserted into the second through hole,
前記第1の貫通孔の大きさは、前記第2の部分の外径よりも大きく、前記第2の貫通孔の前記所定の幅は、前記外径と同じか、または、前記外径に1mm以下の長さを加えたものと同じである、  The size of the first through hole is larger than the outer diameter of the second portion, and the predetermined width of the second through hole is the same as the outer diameter or 1 mm in the outer diameter. Is the same as adding the following length:
ことを特徴とする半導体装置。  A semiconductor device.
前記第2の部分の側面に形成された凸部と前記配線基板に形成された凹部とが嵌合していることを特徴とする請求項4記載の半導体装置。The semiconductor device according to claim 4, wherein a convex portion formed on a side surface of the second portion and a concave portion formed on the wiring board are fitted.
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