JP5153079B2 - Organometallic complex - Google Patents

Description

  The present invention relates to a substance that can emit light by current excitation, and particularly relates to an organometallic complex that emits light by current excitation. In addition, the present invention relates to a light-emitting element, a light-emitting device, and an electronic device using the substance.

  A light-emitting element having a layer containing a light-emitting substance between a pair of electrodes is used as a pixel, a light source, or the like, and is provided in a light-emitting device such as a display device or a lighting device. When a current is passed between the pair of electrodes in the light-emitting element, fluorescence or phosphorescence is emitted from the excited light-emitting substance.

  Comparing fluorescence and phosphorescence, in the case of current excitation, theoretically, the internal quantum efficiency of phosphorescence is about three times the internal quantum efficiency of fluorescence. For this reason, it is considered that the use of a light-emitting substance that emits phosphorescence rather than fluorescence increases the light emission efficiency, and so far, substances that emit phosphorescence have been developed.

  For example, Patent Document 1 describes a metal complex having iridium as a central metal. According to Patent Document 1, a high-efficiency organic light-emitting device can be obtained by using this metal complex.

  In this manner, a light-emitting element that operates efficiently is obtained by using a metal complex. However, metals such as iridium and platinum used as the central metal of the metal complex are expensive. For this reason, there is a problem that the cost of raw materials for manufacturing a light emitting element increases when a metal complex is used.

JP 2005-506361 A

  An object of the present invention is to provide an organometallic complex that can emit phosphorescence. Another object of the present invention is to provide an organometallic complex that can be synthesized with high yield. It is another object of the present invention to provide a light emitting element that emits light efficiently and can be manufactured at low cost.

  One aspect of the present invention is an organometallic complex including a structure represented by the general formula (1).

In the general formula (1), R ¹ and R ² each represent hydrogen or an alkyl group, a halogen group, —CF ₃ , an alkoxy group, or an aryl group. M represents a Group 9 element or a Group 10 element in the periodic table. Here, among the alkyl groups, an alkyl group having 1 to 4 carbon atoms is preferable, and in particular, any group selected from a methyl group, an ethyl group, an isopropyl group, a sec-butyl group, and a tert-butyl group. Is preferred. Further, among the halogen groups, a fluoro group is particularly preferable because chemical stability is improved. Among the alkoxy groups, an alkoxy group having 1 to 4 carbon atoms is preferable, and a methoxy group is particularly preferable. Of the aryl groups, a phenyl group is particularly preferable. Further, iridium is particularly preferable among Group 9 elements, and platinum is particularly preferable among Group 10 elements.

  One aspect of the present invention is an organometallic complex represented by the general formula (2).

In the general formula (2), R ³ and R ⁴ each represent hydrogen or an alkyl group, a halogen group, —CF ₃ , an alkoxy group, or an aryl group. M represents a Group 9 element or a Group 10 element in the periodic table. L is a monoanionic ligand having a beta diketone structure, a monoanionic bidentate chelate ligand having a carboxyl group, or a monoanionic bidentate chelate ligand having a phenolic hydroxyl group Represents one of the following. Here, among the alkyl groups, an alkyl group having 1 to 4 carbon atoms is preferable, and in particular, any group selected from a methyl group, an ethyl group, an isopropyl group, a sec-butyl group, and a tert-butyl group. Is preferred. Further, among the halogen groups, a fluoro group is particularly preferable because chemical stability is improved. Among the alkoxy groups, an alkoxy group having 1 to 4 carbon atoms is preferable, and a methoxy group is particularly preferable. Of the aryl groups, a phenyl group is particularly preferable. Further, iridium is particularly preferable among Group 9 elements, and platinum is particularly preferable among Group 10 elements. Note that n is 2 when M is a Group 9 element and n is 1 when M is a Group 10 element.

  One aspect of the present invention is an organometallic complex including a structure represented by the general formula (3).

In the general formula (3), R ⁵ and R ⁶ each represent hydrogen or an alkyl group, a halogen group, —CF ₃ , an alkoxy group, or an aryl group. Here, among the alkyl groups, an alkyl group having 1 to 4 carbon atoms is preferable, and in particular, any group selected from a methyl group, an ethyl group, an isopropyl group, a sec-butyl group, and a tert-butyl group. Is preferred. Further, among the halogen groups, a fluoro group is particularly preferable because chemical stability is improved. Among the alkoxy groups, an alkoxy group having 1 to 4 carbon atoms is preferable, and a methoxy group is particularly preferable. Of the aryl groups, a phenyl group is particularly preferable.

  One aspect of the present invention is an organometallic complex including a structure represented by the general formula (4).

In the general formula (4), R ⁷ and R ⁸ each represent hydrogen or an alkyl group, a halogen group, —CF ₃ , an alkoxy group, or an aryl group. L is a monoanionic ligand having a beta diketone structure, a monoanionic bidentate chelate ligand having a carboxyl group, or a monoanionic bidentate chelate ligand having a phenolic hydroxyl group Represents one of the following. Here, among the alkyl groups, an alkyl group having 1 to 4 carbon atoms is preferable, and in particular, any group selected from a methyl group, an ethyl group, an isopropyl group, a sec-butyl group, and a tert-butyl group. Is preferred. Further, among the halogen groups, a fluoro group is particularly preferable because chemical stability is improved. Among the alkoxy groups, an alkoxy group having 1 to 4 carbon atoms is preferable, and a methoxy group is particularly preferable. Of the aryl groups, a phenyl group is particularly preferable. Note that n is 2 when M is a Group 9 element and n is 1 when M is a Group 10 element.

  In the organometallic complexes represented by the general formulas (2) and (4), L is specifically selected from ligands represented by the following structural formulas (1) to (7). Any ligand is preferred.

  One aspect of the present invention is an organometallic complex including a structure represented by the general formula (5).

In General Formula (5), R ^{9 to} R ¹² each represent hydrogen or an alkyl group, a halogen group, —CF ₃ , an alkoxy group, or an aryl group. M represents a Group 9 element or a Group 10 element in the periodic table. Here, among the alkyl groups, an alkyl group having 1 to 4 carbon atoms is preferable, and in particular, any group selected from a methyl group, an ethyl group, an isopropyl group, a sec-butyl group, and a tert-butyl group. Is preferred. Further, among the halogen groups, a fluoro group is particularly preferable because chemical stability is improved. Among the alkoxy groups, an alkoxy group having 1 to 4 carbon atoms is preferable, and a methoxy group is particularly preferable. Of the aryl groups, a phenyl group is particularly preferable. Further, iridium is particularly preferable among Group 9 elements, and platinum is particularly preferable among Group 10 elements.

  One aspect of the present invention is an organometallic complex represented by General Formula (6).

In the general formula ^{(6), R} 13 ~R ¹⁶ each represent hydrogen or an alkyl group, a halogen group,, -CF _3, alkoxy group, or an aryl group. M represents a Group 9 element or a Group 10 element in the periodic table. L is a monoanionic ligand having a beta diketone structure, a monoanionic bidentate chelate ligand having a carboxyl group, or a monoanionic bidentate chelate ligand having a phenolic hydroxyl group Represents one of the following. Here, among the alkyl groups, an alkyl group having 1 to 4 carbon atoms is preferable, and in particular, any group selected from a methyl group, an ethyl group, an isopropyl group, and a sec-butyl group is preferable. Further, among the halogen groups, a fluoro group is particularly preferable because chemical stability is improved. Among the alkoxy groups, an alkoxy group having 1 to 4 carbon atoms is preferable, and a methoxy group is particularly preferable. Of the aryl groups, a phenyl group is particularly preferable. Further, iridium is particularly preferable among Group 9 elements, and platinum is particularly preferable among Group 10 elements. Note that n is 2 when M is a Group 9 element and n is 1 when M is a Group 10 element.

  One aspect of the present invention is an organometallic complex including a structure represented by the general formula (7).

In the general formula ^{(7), R} 17 ~R ²⁰ each represent hydrogen or an alkyl group, a halogen group,, -CF _3, alkoxy group, or an aryl group. Here, among the alkyl groups, an alkyl group having 1 to 4 carbon atoms is preferable, and in particular, any group selected from a methyl group, an ethyl group, an isopropyl group, a sec-butyl group, and a tert-butyl group. Is preferred. Further, among the halogen groups, a fluoro group is particularly preferable because chemical stability is improved. Among the alkoxy groups, an alkoxy group having 1 to 4 carbon atoms is preferable, and a methoxy group is particularly preferable. Of the aryl groups, a phenyl group is particularly preferable.

  One aspect of the present invention is an organometallic complex represented by General Formula (8).

In the general formula (8), R ^{21 to} R ²⁴ each represent hydrogen or an alkyl group, a halogen group, —CF ₃ , an alkoxy group, or an aryl group. L is a monoanionic ligand having a beta diketone structure, a monoanionic bidentate chelate ligand having a carboxyl group, or a monoanionic bidentate chelate ligand having a phenolic hydroxyl group Represents one of the following. Here, among the alkyl groups, an alkyl group having 1 to 4 carbon atoms is preferable, and in particular, any group selected from a methyl group, an ethyl group, an isopropyl group, a sec-butyl group, and a tert-butyl group. Is preferred. Further, among the halogen groups, a fluoro group is particularly preferable because chemical stability is improved. Among the alkoxy groups, an alkoxy group having 1 to 4 carbon atoms is preferable, and a methoxy group is particularly preferable. Of the aryl groups, a phenyl group is particularly preferable. Note that n is 2 when M is a Group 9 element and n is 1 when M is a Group 10 element.

  In the organometallic complexes represented by the general formulas (6) and (8), L is specifically selected from ligands represented by the following structural formulas (1) to (7). Any ligand is preferred.

  One aspect of the present invention is an organometallic complex including a structure represented by the general formula (9).

In the general formula (9), R ^{25 to} R ³⁰ each represent hydrogen or an alkyl group, a halogen group, —CF ₃ , or an alkoxy group. M represents a group 9 element or a group 10 element in the periodic table of elements. Here, among the alkyl groups, an alkyl group having 1 to 4 carbon atoms is preferable, and in particular, any group selected from a methyl group, an ethyl group, an isopropyl group, a sec-butyl group, and a tert-butyl group. Is preferred. Further, among the halogen groups, a fluoro group is particularly preferable because chemical stability is improved. Among the alkoxy groups, an alkoxy group having 1 to 4 carbon atoms is preferable, and a methoxy group is particularly preferable. Further, iridium is particularly preferable among Group 9 elements, and platinum is particularly preferable among Group 10 elements.

  One aspect of the present invention is an organometallic complex represented by General Formula (10).

In General Formula (10), R ^{31 to} R ³⁶ each represent hydrogen, or an alkyl group, a halogen group, —CF ₃ , or an alkoxy group. M represents a Group 9 element or a Group 10 element in the periodic table. L is a monoanionic ligand having a beta diketone structure, a monoanionic bidentate chelate ligand having a carboxyl group, or a monoanionic bidentate chelate ligand having a phenolic hydroxyl group Represents one of the following. Here, among the alkyl groups, an alkyl group having 1 to 4 carbon atoms is preferable, and in particular, any group selected from a methyl group, an ethyl group, an isopropyl group, a sec-butyl group, and a tert-butyl group. Is preferred. Further, among the halogen groups, a fluoro group is particularly preferable because chemical stability is improved. Among the alkoxy groups, an alkoxy group having 1 to 4 carbon atoms is preferable, and a methoxy group is particularly preferable. Further, iridium is particularly preferable among Group 9 elements, and platinum is particularly preferable among Group 10 elements. Note that n is 2 when M is a Group 9 element and n is 1 when M is a Group 10 element.

  One aspect of the present invention is an organometallic complex including a structure represented by the general formula (11).

In General Formula (11), R ^{37 to} R ⁴² each represent hydrogen, or an alkyl group, a halogen group, —CF ₃ , or an alkoxy group. Here, among the alkyl groups, an alkyl group having 1 to 4 carbon atoms is preferable, and in particular, any group selected from a methyl group, an ethyl group, an isopropyl group, a sec-butyl group, and a tert-butyl group. Is preferred. Further, among the halogen groups, a fluoro group is particularly preferable because chemical stability is improved. Among the alkoxy groups, an alkoxy group having 1 to 4 carbon atoms is preferable, and a methoxy group is particularly preferable.

  One aspect of the present invention is an organometallic complex including a structure represented by the general formula (12).

In the general formula (12), R ^{43 to} R ⁴⁸ each represent hydrogen or an alkyl group, a halogen group, —CF ₃ , or an alkoxy group. L is a monoanionic ligand having a beta diketone structure, a monoanionic bidentate chelate ligand having a carboxyl group, or a monoanionic bidentate chelate ligand having a phenolic hydroxyl group Represents one of the following. Here, among the alkyl groups, an alkyl group having 1 to 4 carbon atoms is preferable, and in particular, any group selected from a methyl group, an ethyl group, an isopropyl group, a sec-butyl group, and a tert-butyl group. Is preferred. Further, among the halogen groups, a fluoro group is particularly preferable because chemical stability is improved. Among the alkoxy groups, an alkoxy group having 1 to 4 carbon atoms is preferable, and a methoxy group is particularly preferable. Note that n is 2 when M is a Group 9 element and n is 1 when M is a Group 10 element.

  In the organometallic complexes represented by the general formulas (10) and (12), L is specifically selected from ligands represented by the following structural formulas (1) to (7). Any ligand is preferred. All of the ligands represented by the structural formulas (1) to (7) are monoanionic ligands.

One aspect of the present invention is an organometallic complex including a structure represented by the general formula (1), in particular, R ¹ and R ² are each hydrogen or fluorine, and M is iridium or platinum. It is an organometallic complex.

One aspect of the present invention is an organometallic complex represented by the general formula (2). In particular, R ³ and R ⁴ are each hydrogen or fluorine, M is iridium or platinum, and L is acetylacetonate. The organometallic complex is any one of a ligand, a picolinato ligand, and a tetrakis (1-pyrazolyl) borate ligand. Specifically, it is an organometallic complex represented by the general formula (13).

In the general formula (13), R ⁶¹ and R ⁶² each represent hydrogen or fluorine. M represents iridium or platinum. L represents a ligand represented by any one of structural formulas (36) to (38). n is n = 2 when M is iridium, and n = 1 when M is platinum.

  One embodiment of the present invention is a light-emitting element including an organometallic complex represented by any one of the general formulas (1) to (13). The light-emitting element includes a layer containing an organometallic complex represented by any one of the general formulas (1) to (13) between the electrodes, and when the current flows between the electrodes, the general formulas (1) to (1) It is preferable that the organometallic complex represented by any one of (13) is configured to emit light. In this manner, a light-emitting element using the organometallic complex of the present invention as a light-emitting substance can emit phosphorescence, and thus emits light efficiently. In addition, since the organometallic complex of the present invention can be synthesized with high yield and good productivity, a light-emitting element with reduced costs for raw materials can be manufactured by using the organometallic complex of the present invention.

  One embodiment of the present invention is a light-emitting device using a light-emitting element including an organometallic complex represented by any one of general formulas (1) to (13) as a pixel or a light source. Thus, since the light-emitting element of the present invention emits light efficiently, a light-emitting device driven with low power consumption can be obtained by using the light-emitting element of the present invention. In addition, since the light-emitting element of the present invention can be manufactured at low cost, by using the light-emitting element of the present invention, a light-emitting device with low manufacturing cost and low cost can be obtained.

  By carrying out the present invention, an organometallic complex that emits phosphorescence can be obtained. Further, by carrying out the present invention, an organometallic complex that can be synthesized with high yield can be obtained.

  By implementing the present invention, phosphorescence can be emitted, and a light-emitting element with particularly high internal quantum efficiency can be obtained. In addition, by implementing the present invention, a light-emitting element with low cost according to a raw material can be obtained.

  By implementing the present invention, a light-emitting device that emits light efficiently and has low manufacturing costs can be obtained.

  Hereinafter, one embodiment of the present invention will be described. However, the present invention can be implemented in many different modes, and those skilled in the art can easily understand that the modes and details can be variously changed without departing from the spirit and scope of the present invention. Is done. Therefore, the present invention is not construed as being limited to the description of the embodiment.

(Embodiment 1)
As one embodiment of the present invention, organometallic complexes represented by Structural Formulas (8) to (34) can be given. However, this invention is not limited to what was described here, The structure represented by either General formula (1), (3), (5), (7), (9), (11) It may be an organometallic complex containing or an organometallic complex represented by any one of the general formulas (2), (4), (6), (8), (10), (12), and (13).

The organometallic complex of the present invention described above emits phosphorescence. Therefore, by using the organometallic complex of the present invention as a light-emitting substance, a light-emitting element with high internal quantum efficiency and high light emission efficiency can be manufactured.
In addition, the organometallic complex of the present invention described above can be synthesized with high yield. Therefore, by using the organometallic complex of the present invention, a light-emitting element with low cost related to a raw material can be manufactured.

(Embodiment 2)
The mode of synthesis of the organometallic complex of the present invention will be described below. Note that the organometallic complex of the present invention is not limited only to the one obtained by the synthesis method described in this embodiment, and the general formulas (1), (3), (5), (7), ( 9), an organometallic complex having a structure represented by any one of (11), or general formulas (2), (4), (6), (8), (10), (12), (13) Any of the organometallic complexes represented by any of the above may be used.

[Organometallic Complex Represented by Structural Formulas (8) to (25)]
The organometallic complex of the present invention represented by any of structural formulas (8) to (25) is obtained by a synthesis method as represented by the following synthesis schemes (a-1) to (a-3). . First, as shown in the synthesis scheme (a-1), α-diketone and 1,2-cyclohexanediamine are subjected to dehydration condensation, and then dehydrogenated using iron (III) chloride or the like, whereby tetrahydroquinoxaline is converted into a skeleton. To synthesize the ligand. Then, as shown in the synthesis scheme (a-2), the synthesized ligand is mixed with iridium chloride hydrochloride hydrate and coordinated to iridium to synthesize a binuclear complex. Further, as shown in the synthesis scheme (a-3), the previously synthesized binuclear complex is reacted with a monoanionic ligand such as acetylacetone or picolinic acid to convert the monoanionic ligand into iridium. The organometallic complex of the present invention can be obtained by coordinating with.

In the synthesis schemes (a-1) to (a-3), R ⁴⁹ and R ⁵⁰ each represent one of hydrogen, a methyl group, a fluoro group, a —CF ₃ group, a methoxy group, and a phenyl group. L represents any one of acetylacetone, picolinic acid, and tetrapyrazolatoboronate.

  The method for synthesizing the organometallic complex of the present invention is not limited to those represented by the synthesis schemes (a-1) to (a-3). However, by applying a synthesis method including a step of obtaining a ligand using 1,2-cyclohexanediamine as a raw material as in the synthesis method of this embodiment, the organometallic complex of the present invention can be obtained with high yield. it can. This is because the yield in the synthesis of the ligand represented by the synthesis scheme (a-1) is particularly increased by using 1,2-cyclohexanediamine. Here, 1,2-cyclohexanediamine may be either a cis type or a trans type. Further, it may be 1,2-cyclohexanediamine having optical activity, or 1,2-cyclohexanediamine having no optical activity.

In the synthesis scheme (a-1), an α-diketone in which R ⁴⁹ and R ⁵⁰ are each represented by an ethyl group, an isopropyl group, a sec-butyl group, or an ethoxy group is used as a raw material. Other organometallic complexes of the present invention different from the organometallic complexes represented by (25) to (25) can be obtained. Further, by using a salt containing platinum such as potassium tetrachloroplatinate instead of iridium chloride hydrochloride hydrate, the organometallic complex of the present invention containing platinum as a central metal can also be obtained. Further, in place of acetylacetone, picolinic acid, and tetrapyrazolatoboronate, ligands such as dimethyl malonate, salicylaldehyde, and salicylideneamine are used to obtain structural formulas (2), (4) to (6 It is also possible to obtain an organometallic complex of the present invention containing a ligand represented by

[Organometallic Complex Represented by Structural Formulas (26) to (30)]
The organometallic complex of the present invention represented by any one of structural formulas (26) to (30) is obtained by a synthesis method represented by the following synthesis schemes (b-1) to (b-3). . As shown in the synthesis scheme (b-1), α-diketone and 1,2-cyclohexanediamine are subjected to dehydration condensation, and then dehydrogenated using iron (III) chloride or the like, whereby tetrahydroquinoxaline is contained in the skeleton. Synthesize a quantifier. Then, the synthesized ligand is mixed with iridium chloride hydrochloride hydrate and coordinated to iridium as represented by the synthesis scheme (b-2). Furthermore, as represented by the synthesis scheme (b-3), a monoanionic ligand is coordinated to iridium to synthesize a binuclear complex. Further, as shown in the synthesis scheme (b-3), the previously synthesized binuclear complex is reacted with a monoanionic ligand such as acetylacetone or picolinic acid to convert the monoanionic ligand into iridium. The organometallic complex of the present invention can be obtained by coordinating with.

In the synthesis schemes (b-1) to (b-3), R ^{51 to} R ⁵⁴ each represent any of a methyl group, a fluoro group, a —CF ₃ group, a methoxy group, and a phenyl group. L represents acetylacetone. Note that the α-diketone used in the reaction of the synthesis scheme (b-1) was substituted at the 3-position and 5-position with any of a methyl group, a fluoro group, a —CF ₃ group, a methoxy group, and a phenyl group. It can be obtained by reacting a Grignard reagent of benzene with 1,4-dimethylpiperazine-2,3-dione.

  The method for synthesizing the organometallic complex of the present invention is not limited to those represented by the synthesis schemes (b-1) to (b-3). However, by applying a synthesis method including a step of obtaining a ligand using 1,2-cyclohexanediamine as a raw material as in the synthesis method of this embodiment, the organometallic complex of the present invention can be obtained with high yield. it can. This is because by using 1,2-cyclohexanediamine, the yield in the synthesis of the ligand represented by the synthesis scheme (b-1) is particularly increased. Here, 1,2-cyclohexanediamine may be either a cis type or a trans type. Further, it may be 1,2-cyclohexanediamine having optical activity, or 1,2-cyclohexanediamine having no optical activity.

In addition, in the synthesis scheme (b-1), R ^{51 to} R ⁵⁴ are each formed by using an α-diketone represented by any one of an ethyl group, an isopropyl group, a sec-butyl group, and an ethoxy group as a raw material. Other organometallic complexes of the present invention different from the organometallic complexes represented by the structural formulas (26) to (30) can be obtained. Further, by using a salt containing platinum such as potassium tetrachloroplatinate instead of iridium chloride hydrochloride hydrate, the organometallic complex of the present invention containing platinum as a central metal can also be obtained. Further, by using a ligand such as picolinic acid, dimethyl malonate, salicylaldehyde, salicylideneamine, tetrapyrazolatoboronate instead of acetylacetone, the structural formulas (2) to (7) are used. It is also possible to obtain an organometallic complex of the present invention containing such a ligand.

[Organometallic Complex Represented by Structural Formulas (31) to (34)]
The organometallic complex of the present invention represented by any of structural formulas (31) to (34) is obtained by a synthesis method as represented by the following synthesis schemes (c-1) to (c-3). . As shown in the synthesis scheme (c-1), α-diketone and 1,2-cyclohexanediamine are subjected to dehydration condensation, and then dehydrogenated using iron (III) chloride or the like, whereby tetrahydroquinoxaline is contained in the skeleton. Synthesize a quantifier. Then, the synthesized ligand is mixed with iridium chloride hydrochloride hydrate and coordinated to iridium as represented by the synthesis scheme (c-2). Furthermore, as represented by the synthesis scheme (c-3), a monoanionic ligand is coordinated to iridium to synthesize a binuclear complex. Further, as shown in the synthesis scheme (c-3), the previously synthesized binuclear complex is reacted with a monoanionic ligand such as acetylacetone or picolinic acid to convert the monoanionic ligand into iridium. The organometallic complex of the present invention can be obtained by coordinating with.

Here, in the synthesis schemes (c-1) to (c-3), R ^{55 to} R ⁶⁰ each represent any of a methyl group, a fluoro group, a —CF ₃ group, and a methoxy group. L represents acetylacetone. The α-diketone used in the reaction of the synthesis scheme (c-1) is a Grignard reagent of benzene substituted at the 3rd, 4th, and 5th positions with a methyl group, a fluoro group, a —CF ₃ group, or a methoxy group. And 1,4-dimethylpiperazine-2,3-dione can be obtained.

  Note that the method for synthesizing the organometallic complex of the present invention is not limited to those represented by the synthesis schemes (c-1) to (c-3). However, by applying a synthesis method including a step of obtaining a ligand using 1,2-cyclohexanediamine as a raw material as in the synthesis method of this embodiment, the organometallic complex of the present invention can be obtained with high yield. it can. This is because the yield in the synthesis of the ligand represented by the synthesis scheme (c-1) is particularly increased by using 1,2-cyclohexanediamine. Here, 1,2-cyclohexanediamine may be either a cis type or a trans type. Further, it may be 1,2-cyclohexanediamine having optical activity, or 1,2-cyclohexanediamine having no optical activity.

In addition, in the synthesis scheme (c-1), R ^{55 to} R ⁶⁰ are each an α-diketone represented by any one of an ethyl group, an isopropyl group, a sec-butyl group, and an ethoxy group as a raw material. Other organometallic complexes of the present invention different from the organometallic complexes represented by the structural formulas (31) to (34) can be obtained. Further, by using a salt containing platinum such as potassium tetrachloroplatinate instead of iridium chloride hydrochloride hydrate, the organometallic complex of the present invention containing platinum as a central metal can also be obtained. Further, by using a ligand such as picolinic acid, dimethyl malonate, salicylaldehyde, salicylideneamine, tetrapyrazolatoboronate instead of acetylacetone, the structural formulas (2) to (7) are used. It is also possible to obtain an organometallic complex of the present invention containing such a ligand.

(Embodiment 3)
In this embodiment, an embodiment of a light-emitting element using the organometallic complex according to Embodiments 1 and 2 is described with reference to FIGS.

  FIG. 1 shows a light-emitting element having a light-emitting layer 113 between the first electrode 101 and the second electrode 102. The light-emitting layer 113 includes an organometallic complex including a structure represented by any of the general formulas (1), (3), (5), (7), (9), and (11), or the general formula The organometallic complex represented by any one of (2), (4), (6), (8), (10), (12), and (13) is included.

  Between the first electrode 101 and the second electrode 102, in addition to the light emitting layer 113, a hole injection layer 111, a hole transport layer 112, an electron transport layer 114, an electron injection layer 115, a blocking layer 121, and the like are also provided. Is provided. In these layers, when a voltage is applied so that the potential of the first electrode 101 is higher than the potential of the second electrode 102, holes are injected from the first electrode 101 side and the second electrode 102. They are stacked so that electrons are injected from the side.

  In such a light-emitting element, holes injected from the first electrode 101 side and electrons injected from the second electrode 102 side recombine in the light-emitting layer 113, and the organometallic complex is in an excited state. Is done. The excited organometallic complex of the present invention emits light when returning to the ground state. Thus, the organometallic complex of the present invention functions as a light emitting substance.

  Here, the light emitting layer 113 is a layer containing the organometallic complex of the present invention. The light emitting layer 113 may be a layer formed only from the organometallic complex of the present invention, but when concentration quenching occurs, in a layer made of a material having an energy gap larger than that of the light emitting material, A layer mixed so that the light-emitting substance is dispersed is preferable. By dispersing and including the organometallic complex of the present invention in the light-emitting layer 113, it is possible to prevent light emission from being quenched due to the concentration. Here, the energy gap refers to an energy gap between the LUMO level and the HOMO level.

There is no particular limitation on a substance used for bringing the organometallic complex of the present invention into a dispersed state, but 2,3-bis (4-diphenylaminophenyl) quinoxaline (abbreviation: TPAQn), 4,4′-bis [N— In addition to a compound having an arylamine skeleton such as (1-naphthyl) -N-phenylamino] biphenyl (abbreviation: NPB), 4,4′-di (N-carbazolyl) biphenyl (abbreviation: CBP), 4,4 Carbazole derivatives such as', 4 ''-tri (N-carbazolyl) triphenylamine (abbreviation: TCTA), bis [2- (2-hydroxyphenyl) pyridinato] zinc (abbreviation: Znpp ₂ ), bis [2- A metal complex such as (2-hydroxyphenyl) benzoxazolate] zinc (abbreviation: ZnBOX) is preferable. One or two or more substances may be selected from these substances and mixed so that the organometallic complex of the present invention is in a dispersed state. Thus, the layer containing a plurality of compounds can be formed by using a co-evaporation method. Here, co-evaporation refers to a vapor deposition method in which raw materials are vaporized from a plurality of vapor deposition sources provided in one processing chamber, the vaporized raw materials are mixed in a gas phase state, and deposited on an object to be processed.

  There is no particular limitation on the first electrode 101 and the second electrode 102. Indium tin oxide (ITO), indium tin oxide containing silicon oxide, or indium oxide containing 2 to 20 wt% zinc oxide is used. In addition, gold (Au), platinum (Pt), nickel (Ni), tungsten (W), chromium (Cr), molybdenum (Mo), iron (Fe), cobalt (Co), copper (Cu), palladium (Pd ) Or the like. In addition to aluminum, an alloy of magnesium and silver, an alloy of aluminum and lithium, or the like can be used to form the first electrode 101. Note that there is no particular limitation on a method for forming the first electrode 101 and the second electrode 102, and the first electrode 101 and the second electrode 102 can be formed using, for example, a sputtering method or an evaporation method. Note that in order to extract emitted light to the outside, a film of indium tin oxide or the like or silver, aluminum, or the like having a thickness of several nanometers to several tens of nanometers is formed. It is preferable to form one or both of the second electrodes 102.

Further, a hole transport layer 112 may be provided between the first electrode 101 and the light emitting layer 113 as shown in FIG. Here, the hole transport layer is a layer having a function of transporting holes injected from the first electrode 101 side to the light-emitting layer 113. In this manner, by providing the hole transport layer 112, the distance between the first electrode 101 and the light-emitting layer 113 can be increased. As a result, due to the metal contained in the first electrode 101, It is possible to prevent the light emission from being quenched. The hole transport layer is preferably formed using a substance having a high hole transport property, and particularly preferably formed using a substance having a hole mobility of 1 × 10 ⁻⁶ cm ² / Vs or higher. Note that a substance having a high hole-transport property has a higher hole mobility than an electron, preferably a value of the ratio of the hole mobility to the electron mobility (= hole mobility / electron mobility). Is a substance larger than 100. Specific examples of a substance that can be used to form the hole-transport layer 112 include 4,4′-bis [N- (1-naphthyl) -N-phenylamino] biphenyl (abbreviation: NPB), 4, 4′-bis [N- (3-methylphenyl) -N-phenylamino] biphenyl (abbreviation: TPD), 4,4 ′, 4 ″ -tris (N, N-diphenylamino) triphenylamine (abbreviation: TDATA), 4,4 ′, 4 ″ -tris [N- (3-methylphenyl) -N-phenylamino] triphenylamine (abbreviation: MTDATA), 4,4′-bis {N- [4- ( N, N-di-m-tolylamino) phenyl] -N-phenylamino} biphenyl (abbreviation: DNTPD), 1,3,5-tris [N, N-di (m-tolyl) amino] benzene (abbreviation: m -MTDAB), 4,4 ', 4''- Li (N- carbazolyl) triphenylamine (abbreviation: TCTA), phthalocyanine _{(abbreviation:} H 2 Pc), copper phthalocyanine (abbreviation: CuPc), or vanadyl phthalocyanine (abbreviation: VOPc), and the like. Further, the hole transport layer 112 may be a layer having a multilayer structure formed by combining two or more layers made of the substances described above.

Further, an electron transport layer 114 may be provided between the second electrode 102 and the light emitting layer 113 as shown in FIG. Here, the electron transporting layer is a layer having a function of transporting electrons injected from the second electrode 102 to the light emitting layer 113. In this manner, by providing the electron transport layer 114, the distance between the second electrode 102 and the light-emitting layer 113 can be increased, and as a result, light is emitted due to the metal contained in the second electrode 102. Can be prevented from quenching. The electron transport layer is preferably formed using a substance having a high electron transport property, and particularly preferably formed using a substance having an electron mobility of 1 × 10 ⁻⁶ cm ² / Vs or higher. Note that a substance having a high electron-transport property has a higher electron mobility than holes, and preferably has a ratio of electron mobility to hole mobility (= electron mobility / hole mobility). It is a substance larger than 100. Specific examples of a substance that can be used for forming the electron-transport layer 114 include tris (8-quinolinolato) aluminum (abbreviation: Alq ₃ ), tris (4-methyl-8-quinolinolato) aluminum (abbreviation: Almq _3). ), Bis (10-hydroxybenzo [h] -quinolinato) beryllium (abbreviation: BeBq ₂ ), bis (2-methyl-8-quinolinolato) -4-phenylphenolato-aluminum (abbreviation: BAlq), bis [2- In addition to metal complexes such as (2-hydroxyphenyl) benzoxazolate] zinc (abbreviation: Zn (BOX) ₂ ), bis [2- (2-hydroxyphenyl) benzothiazolate] zinc (abbreviation: Zn (BTZ) ₂ ) 2- (4-biphenylyl) -5- (4-tert-butylphenyl) -1,3,4-oxadiazole (approximately) Name: PBD), 1,3-bis [5- (p-tert-butylphenyl) -1,3,4-oxadiazol-2-yl] benzene (abbreviation: OXD-7), 3- (4- tert-butylphenyl) -4-phenyl-5- (4-biphenylyl) -1,2,4-triazole (abbreviation: TAZ), 3- (4-tert-butylphenyl) -4- (4-ethylphenyl) -5- (4-biphenylyl) -1,2,4-triazole (abbreviation: p-EtTAZ), bathophenanthroline (abbreviation: BPhen), bathocuproin (abbreviation: BCP), 4,4-bis (5-methylbenzoxa) And sol-2-yl) stilbene (abbreviation: BzOs). Further, the electron transport layer 114 may be a multilayer structure formed by combining two or more layers made of the above-described substances.

Note that the hole transport layer 112 and the electron transport layer 114 may be formed using a bipolar substance in addition to the substances described above. A bipolar substance is the ratio of the mobility of one carrier to the mobility of the other carrier when the mobility of one of the electrons or holes is compared with the mobility of the other carrier. A substance having a value of 100 or less, preferably 10 or less. Examples of the bipolar substance include TPAQn, 2,3-bis {4- [N- (1-naphthyl) -N-phenylamino] phenyl} -dibenzo [f, h] quinoxaline (abbreviation: NPDiBzQn), and the like. It is done. Among bipolar substances, it is particularly preferable to use a substance having a hole and electron mobility of 1 × 10 ⁻⁶ cm ² / Vs or more. Alternatively, the hole transport layer 112 and the electron transport layer 114 may be formed using the same bipolar substance.

Further, a hole injection layer 111 may be provided between the first electrode 101 and the hole transport layer 112 as shown in FIG. The hole injection layer 111 is a layer having a function of assisting injection of holes from the first electrode 101 to the hole transport layer 112. By providing the hole injection layer 111, the difference in ionization potential between the first electrode 101 and the hole transport layer 112 is reduced, and holes are easily injected. The hole injection layer 111 has a lower ionization potential than the substance forming the hole transport layer 112 and a higher ionization potential than the substance forming the first electrode 101, or the hole transport layer 112. It is preferable to use a substance whose energy band is bent when it is provided as a 1 to 2 nm thin film between the first electrode 101 and the first electrode 101. Specific examples of a substance that can be used to form the hole-injecting layer 111 include phthalocyanine-based compounds such as phthalocyanine (abbreviation: H ₂ Pc) and copper phthalocyanine (CuPC), or poly (ethylenedioxythiophene) / Examples thereof include a polymer such as a poly (styrenesulfonic acid) aqueous solution (PEDOT / PSS). That is, the hole injection layer 111 can be formed by selecting a material whose ionization potential in the hole injection layer 111 is relatively smaller than the ionization potential in the hole transport layer 112. Note that in the case where the hole-injection layer 111 is provided, the first electrode 101 is preferably formed using a substance having a high work function such as indium tin oxide.

  Further, an electron injection layer 115 may be provided between the second electrode 102 and the electron transport layer 114 as shown in FIG. Here, the electron injection layer 115 is a layer having a function of assisting injection of electrons from the second electrode 102 to the electron transport layer 114. By providing the electron injection layer 115, the difference in electron affinity between the second electrode 102 and the electron transport layer 114 is reduced, and electrons are easily injected. The electron injection layer 115 is a substance having a higher electron affinity than the substance forming the electron transport layer 114 and a lower electron affinity than the substance forming the second electrode 102, or the electron transport layer 114 and the second transport layer 114. It is preferable to use a substance whose energy band is bent when it is provided as a 1 to 2 nm thin film between the electrode 102 and the electrode 102. Specific examples of a substance that can be used to form the electron injection layer 115 include alkali metal or alkaline earth metal, alkali metal fluoride, alkaline earth metal fluoride, alkali metal oxide, and alkaline earth. Examples thereof include inorganic substances such as metal oxides. In addition to inorganic substances, substances that can be used to form the electron transport layer 114 such as BPhen, BCP, p-EtTAZ, TAZ, and BzOs are also used for forming the electron transport layer 114 from these substances. By selecting a substance having a higher electron affinity than the substance, the substance can be used as a substance for forming the electron injection layer 115. That is, the electron injecting layer 115 can be formed by selecting a substance whose electron affinity in the electron injecting layer 115 is relatively larger than that in the electron transporting layer 114. Note that in the case where the electron injecting layer 115 is provided, the first electrode 101 is preferably formed using a substance having a low work function such as aluminum.

  In the light-emitting element of the present invention described above, the hole injection layer 111, the hole transport layer 112, the light-emitting layer 113, the electron transport layer 114, and the electron injection layer 115 are formed by an evaporation method, an inkjet method, or a coating method, respectively. Or any other method. Further, the first electrode 101 or the second electrode 102 may be formed by any method such as a sputtering method or an evaporation method.

  Further, a hole generation layer may be provided instead of the hole injection layer 111, or an electron generation layer may be provided instead of the electron injection layer 115. By providing the hole generating layer or the electron generating layer, a light emitting element in which a voltage increase depending on the thickness of the layer is extremely small can be manufactured.

  Here, the hole generation layer is a layer that generates holes. By mixing at least one substance selected from substances having a higher hole mobility than electrons and a substance having an electron accepting property with respect to a substance having a higher hole mobility than electrons, Alternatively, the hole generating layer can be formed by mixing at least one substance selected from bipolar substances and a substance that exhibits an electron accepting property with respect to the bipolar substance. Here, as a substance having a higher mobility of holes than electrons, a substance similar to the substance that can be used to form the hole-transport layer 112 can be used. As for the bipolar substance, the bipolar substance described above such as TPAQn can be used. In addition, among substances having higher mobility of holes than electrons and bipolar substances, it is particularly preferable to use a substance containing triphenylamine in the skeleton. By using a substance containing triphenylamine in the skeleton, holes are more easily generated. As the substance exhibiting electron accepting properties, it is preferable to use a metal oxide such as molybdenum oxide, vanadium oxide, ruthenium oxide, or rhenium oxide.

The electron generating layer is a layer that generates electrons. Choose from bipolar substances by mixing substances that have higher electron mobility than holes and substances that exhibit electron donating properties for substances that have higher electron mobility than holes. The electron generating layer can be formed by mixing at least one of the above substances and a substance that exhibits an electron donating property with respect to the bipolar substance. Here, as a substance having higher electron mobility than holes, a substance similar to the substance that can be used to form the electron-transport layer 114 can be used. As for the bipolar substance, the bipolar substance described above such as TPAQn can be used. Moreover, as the substance exhibiting electron donating property, a substance selected from alkali metals and alkaline earth metals, specifically, lithium (Li), calcium (Ca), sodium (Na), potassium (K), Magnesium (Mg) or the like can be used. Further, alkali metal oxides or alkaline earth metal oxides, alkali metal nitrides, alkaline earth metal nitrides, etc., specifically lithium oxide (Li ₂ O), calcium oxide (CaO), sodium oxide At least one substance selected from (Na ₂ O), potassium oxide (K ₂ O), magnesium oxide (MgO), and the like can also be used as the substance exhibiting electron donating properties. Further, an alkali metal fluoride, an alkaline earth metal fluoride, specifically, at least one substance selected from lithium fluoride (LiF), cesium fluoride (CsF), calcium fluoride (CaF ₂ ), and the like is also an electron. It can be used as a substance exhibiting donating properties. Further, at least one substance selected from alkali metal nitride, alkaline earth metal nitride, and the like, specifically, calcium nitride, magnesium nitride, and the like can also be used as the substance exhibiting electron donating properties.

  Further, a blocking layer may be provided between the light emitting layer 113 and the hole transporting layer 112 or between the light emitting layer 113 and the electron transporting layer 114. The blocking layer transports holes or electrons to the light-emitting layer 113, and holes injected from the first electrode 101 side or electrons injected from the second electrode 102 side penetrate the light-emitting layer and pass through the other side. This is a layer having a layer having a function of suppressing the escape to the electrode side and a function of suppressing the excitation energy generated in the light emitting layer from moving from the light emitting layer to another layer. As shown in FIG. 1, the blocking layer 121 provided between the light emitting layer 113 and the electron transport layer 114 and having a function of suppressing penetration of holes is also called a hole blocking layer. By providing the blocking layer, reduction in recombination efficiency due to carrier penetration can be suppressed, and light emission efficiency can be increased. Further, by providing a blocking layer, it is possible to reduce the unexpected emission of another substance different from the luminescent substance due to the transfer of excitation energy, such as a substance forming an electron transport layer. Can do.

  In the light-emitting element of the present invention as described above, other layers different from the light-emitting layer, specifically, a hole injection layer, a hole transport layer, an electron transport layer, an electron injection layer, or the like are provided. Whether or not is optional, the practitioner of the invention may select as appropriate. However, when a hole transport layer and an electron transport layer are provided, an effect of reducing the occurrence of quenching due to the metal contained in the electrode, the hole injection layer, the electron injection layer or the like can be obtained. . Further, by providing an electron injection layer, a hole injection layer, or the like, it is possible to obtain an effect that electrons or holes can be efficiently injected from the electrode.

The light-emitting element of the present invention described above uses, for example, the organometallic complexes of the present invention whose structural formulas are listed in Embodiment Mode 1 as the light-emitting substance. The luminance per unit voltage or the luminance per unit current density is good.
Further, in the light-emitting element of the present invention, when the organometallic complex of the present invention is included as a light-emitting substance, an effect of reducing the cost related to a material used for manufacturing the light-emitting element can be obtained. This is because the organometallic complex of the present invention can be synthesized with high yield as described in Embodiment Mode 2, that is, it is an organometallic complex with reduced manufacturing costs.

(Embodiment 4)
Since the light-emitting element of the present invention using the organometallic complex of the present invention as a light-emitting substance emits light efficiently, the light-emitting device of the present invention using the light-emitting element of the present invention as a pixel can be operated with low power consumption. it can. This is because, as described in Embodiment 3, the light emitting element of the present invention has good luminance per unit voltage or luminance per unit current density. Therefore, by using the light emitting element of the present invention as a pixel, This is because the power (= current × voltage) required to emit light with a specific luminance can be reduced.
In addition, a light-emitting device of the present invention using a light-emitting element manufactured at low cost by using the organometallic complex of the present invention as a pixel is low in manufacturing cost and low in price. In this embodiment, a circuit configuration and a driving method of a light-emitting device having a display function will be described with reference to FIGS.

  FIG. 2 is a schematic view of the light emitting device (the light emitting device according to this embodiment) to which the present invention is applied as viewed from above. In FIG. 2, a pixel portion 6511, a source signal line driver circuit 6512, a write gate signal line driver circuit 6513, and an erase gate signal line driver circuit 6514 are provided over a substrate 6500. The source signal line drive circuit 6512, the write gate signal line drive circuit 6513, and the erase gate signal line drive circuit 6514 are each an FPC (flexible printed circuit) 6503 which is an external input terminal via a wiring group. Connected. The source signal line driver circuit 6512, the writing gate signal line driver circuit 6513, and the erasing gate signal line driver circuit 6514 receive a video signal, a clock signal, a start signal, a reset signal, and the like from the FPC 6503, respectively. . A printed wiring board (PWB) 6504 is attached to the FPC 6503. Note that the driver circuit portion is not necessarily provided over the same substrate as the pixel portion 6511 as described above. For example, an IC chip mounted on an FPC on which a wiring pattern is formed (TCP) or the like is used. It may be used and provided outside the substrate.

  In the pixel portion 6511, a plurality of source signal lines extending in the column direction are arranged side by side in the row direction. In addition, current supply lines are arranged side by side in the row direction. In the pixel portion 6511, a plurality of gate signal lines extending in the row direction are arranged side by side in the column direction. In the pixel portion 6511, a plurality of sets of circuits including light-emitting elements are arranged.

  FIG. 3 is a diagram illustrating a circuit for operating one pixel. The circuit illustrated in FIG. 3 includes a first transistor 901, a second transistor 902, and a light emitting element 903.

  Each of the first transistor 901 and the second transistor 902 is a three-terminal element including a gate electrode, a drain region, and a source region, and has a channel region between the drain region and the source region. Here, since the source region and the drain region vary depending on the structure and operating conditions of the transistor, it is difficult to limit which is the source region or the drain region. Therefore, in this embodiment, regions functioning as a source or a drain are referred to as a first electrode of a transistor and a second electrode of the transistor, respectively.

  The gate signal line 911 and the writing gate signal line driving circuit 913 are provided so as to be electrically connected or disconnected by a switch 918. The gate signal line 911 and the erasing gate signal line driver circuit 914 are provided so as to be electrically connected or disconnected by a switch 919. The source signal line 912 is provided so as to be electrically connected to either the source signal line driver circuit 915 or the power source 916 by the switch 920. The gate of the first transistor 901 is electrically connected to the gate signal line 911. The first electrode of the first transistor is electrically connected to the source signal line 912, and the second electrode is electrically connected to the gate electrode of the second transistor 902. The first electrode of the second transistor 902 is electrically connected to the current supply line 917, and the second electrode is electrically connected to one electrode included in the light-emitting element 903. Note that the switch 918 may be included in the write gate signal line driver circuit 913. The switch 919 may also be included in the erase gate signal line driver circuit 914. Further, the switch 920 may also be included in the source signal line driver circuit 915.

  There is no particular limitation on the arrangement of transistors, light-emitting elements, and the like in the pixel portion, but they can be arranged as shown in the top view of FIG. In FIG. 4, the first electrode of the first transistor 1001 is connected to the source signal line 1004, and the second electrode is connected to the gate electrode of the second transistor 1002. The first electrode of the second transistor is connected to the current supply line 1005, and the second electrode is connected to the electrode 1006 of the light emitting element. Part of the gate signal line 1003 functions as a gate electrode of the first transistor 1001.

  Next, a driving method will be described. FIG. 5 is a diagram for explaining the operation of a frame over time. In FIG. 5, the horizontal direction represents the passage of time, and the vertical direction represents the number of scanning stages of the gate signal line.

  When image display is performed using the light emitting device of the present invention, the screen rewriting operation is repeatedly performed during the display period. The number of rewrites is not particularly limited, but is preferably at least about 60 times per second so that a person viewing the image does not feel flicker. Here, a period during which one screen (one frame) is rewritten is referred to as one frame period.

As shown in FIG. 5, one frame is time-divided into four subframes 501, 502, 503, and 504 including a writing period 501a, 502a, 503a, and 504a and a holding period 501b, 502b, 503b, and 504b. . A light emitting element to which a signal for emitting light is given is in a light emitting state in the holding period. The ratio of the length of the holding period in each subframe is as follows: first subframe 501: second subframe 502: third subframe 503: fourth subframe 504 = 2 ³ : 2 ² : 2 ¹ : 2 ⁰ = 8: 4: 2: 1. As a result, 4-bit gradation can be expressed. However, the number of bits and the number of gradations are not limited to those described here. For example, eight subframes may be provided so that 8-bit gradation can be performed.

  An operation in one frame will be described. First, in the subframe 501, the write operation is performed in order from the first row to the last row. Therefore, the start time of the writing period differs depending on the row. From the row in which the writing period 501a ends, the storage period 501b is started in order. In the holding period, the light-emitting element to which a signal for emitting light is given is in a light-emitting state. Further, the processing proceeds to the next subframe 502 in order from the row in which the holding period 501b ends, and the writing operation is performed in order from the first row to the last row as in the case of the subframe 501. The above operation is repeated until the holding period 504b of the subframe 504, and the operation in the subframe 504 is completed. When the operation in the subframe 504 is completed, the process proceeds to the next frame. Thus, the accumulated time of the light emission in each subframe is the light emission time of each light emitting element in one frame. Various display colors having different brightness and chromaticity can be formed by changing the light emission time for each light emitting element and combining them in various ways within one pixel.

  When it is desired to forcibly end the holding period in the row that has already finished writing and has shifted to the holding period before the writing up to the last row is completed as in the subframe 504, after the holding period 504b. It is preferable to provide an erasing period 504c and control to forcibly enter a non-light emitting state. Then, the row that is forcibly set to the non-light-emitting state is kept in the non-light-emitting state for a certain period (this period is referred to as a non-light-emitting period 504d). Then, immediately after the writing period of the last row is completed, the writing period of the next subframe (or frame) is started in order from the first row. Accordingly, it is possible to prevent the writing period of the subframe 504 and the writing period of the next subframe from overlapping.

  In this embodiment, the subframes 501 to 504 are arranged in order from the longest holding period. However, the subframes 501 to 504 are not necessarily arranged as in the present embodiment. Alternatively, a long holding period and a short holding period may be arranged at random. In addition, the subframe may be further divided into a plurality of frames. That is, the gate signal line may be scanned a plurality of times during the period when the same video signal is applied.

  Here, the operation of the circuit shown in FIG. 3 in the writing period and the erasing period will be described.

  First, the operation in the writing period will be described. In the writing period, the gate signal line 911 in the n-th row (n is a natural number) is electrically connected to the writing gate signal line driving circuit 913 via the switch 918 and is connected to the erasing gate signal line driving circuit 914. Is disconnected. The source signal line 912 is electrically connected to the source signal line driver circuit through the switch 920. Here, a signal is input to the gate of the first transistor 901 connected to the gate signal line 911 in the n-th row (n is a natural number), and the first transistor 901 is turned on. At this time, video signals are simultaneously input to the source signal lines from the first column to the last column. Note that the video signals input from the source signal lines 912 in each column are independent from each other. A video signal input from the source signal line 912 is input to the gate electrode of the second transistor 902 through the first transistor 901 connected to each source signal line. At this time, the light-emitting element 903 determines whether to emit light or not according to a signal input to the second transistor 902. For example, in the case where the second transistor 902 is a p-channel transistor, the light-emitting element 903 emits light by inputting a low level signal to the gate electrode of the second transistor 902. On the other hand, in the case where the second transistor 902 is an n-channel transistor, the light-emitting element 903 emits light when a high level signal is input to the gate electrode of the second transistor 902.

  Next, the operation in the erasing period will be described. In the erasing period, the gate signal line 911 in the n-th row (n is a natural number) is electrically connected to the erasing gate signal line driving circuit 914 via the switch 919, and is connected to the writing gate signal line driving circuit 913. Not connected. The source signal line 912 is electrically connected to the power source 916 through the switch 920. Here, a signal is input to the gate of the first transistor 901 connected to the gate signal line 911 in the n-th row, and the first transistor 901 is turned on. At this time, the erase signal is simultaneously input to the source signal lines from the first column to the last column. The erase signal input from the source signal line 912 is input to the gate electrode of the second transistor 902 through the first transistor 901 connected to each source signal line. At this time, current supplied from the current supply line 917 to the light-emitting element 903 is blocked by a signal input to the second transistor 902. Then, the light emitting element 903 is forced to emit no light. For example, in the case where the second transistor 902 is a p-channel transistor, the light-emitting element 903 does not emit light when a high level signal is input to the gate electrode of the second transistor 902. On the other hand, in the case where the second transistor 902 is an n-channel transistor, the light emitting element 903 does not emit light by inputting a low level signal to the gate electrode of the second transistor 902.

  In the erasing period, for the nth row (n is a natural number), a signal for erasing is input by the operation as described above. However, as described above, the nth row may be an erasing period and the other row (mth row (m is a natural number)) may be a writing period. In such a case, it is necessary to input a signal for erasure to the n-th row and a signal for writing to the m-th row using the source signal line in the same column. It is preferable to operate as described above.

  The gate signal line 911 and the erasing gate signal line driving circuit 914 are immediately disconnected after the light emitting element 903 in the n-th row does not emit light by the operation in the erasing period described above. The switch 920 is switched to connect the source signal line 912 and the source signal line driver circuit 915. Then, the source signal line and the source signal line driver circuit 915 are connected, and the gate signal line 911 and the writing gate signal line driver circuit 913 are connected. Then, a signal is selectively input from the writing gate signal line driving circuit 913 to the m-th signal line, the first transistor is turned on, and the source signal line driving circuit 915 receives the final signal from the first column. A signal for writing is input to the source signal lines up to the column. By this signal, the m-th row light emitting element emits light or does not emit light.

  Immediately after the writing period for the m-th row is completed as described above, the erasing period for the (n + 1) -th row is started. For this purpose, the gate signal line 911 and the writing gate signal line driving circuit 913 are disconnected, and the switch 920 is switched to connect the source signal line to the power source 916. Further, the gate signal line 911 and the writing gate signal line driving circuit 913 are disconnected, and the gate signal line 911 is connected to the erasing gate signal line driving circuit 914. Then, a signal is selectively input from the erasing gate signal line driving circuit 914 to the gate signal line of the (n + 1) th row to turn on the signal to the first transistor, and an erasing signal is input from the power supply 916. In this way, immediately after the erasing period of the (n + 1) th row is completed, the writing period of the (m + 1) th row is started. Thereafter, similarly, the erasing period and the writing period may be repeated until the erasing period of the last row is operated.

  In this embodiment, the mode in which the m-th writing period is provided between the n-th erasing period and the (n + 1) -th erasing period has been described. An m-th writing period may be provided between the period and the n-th erasing period.

  In this embodiment, when the non-light emission period 504d is provided as in the subframe 504, the erase gate signal line driver circuit 914 and a certain gate signal line are disconnected from each other, and the write gate The operation of connecting the signal line driver circuit 913 and the other gate signal lines is repeated. Such an operation may be performed particularly in a frame in which a non-light emitting period is not provided.

(Embodiment 5)
One mode of a cross-sectional structure of a light-emitting device including the light-emitting element of the present invention is described with reference to FIGS.

  In FIG. 6, a transistor 11 provided for driving the light emitting element 12 of the present invention is surrounded by a dotted line. The light-emitting element 12 includes a layer 15 in which a layer that generates holes, a layer that generates electrons, and a layer that contains a light-emitting substance are stacked between the first electrode 13 and the second electrode 14. It is a light emitting element. The drain of the transistor 11 and the first electrode 13 are electrically connected by a wiring 17 penetrating the first interlayer insulating film 16 (16a, 16b, 16c). The light emitting element 12 is separated from another light emitting element provided adjacent thereto by a partition wall layer 18. The light-emitting device of the present invention having such a structure is provided over the substrate 10 in this embodiment.

  Note that the transistor 11 illustrated in FIG. 6 is a top-gate transistor in which a gate electrode is provided on the opposite side of the substrate with a semiconductor layer as a center. However, the structure of the transistor 11 is not particularly limited, and may be, for example, a bottom gate type. In the case of a bottom gate, the semiconductor layer forming a channel may be formed with a protective film (channel protection type), or the semiconductor layer forming the channel may be partially concave ( Channel etch type).

  Further, the semiconductor layer included in the transistor 11 may be either crystalline or non-crystalline. Moreover, a semi-amorphous etc. may be sufficient.

The semi-amorphous semiconductor is as follows. A semiconductor having an intermediate structure between amorphous and crystalline (including single crystal and polycrystal) and having a third state that is stable in terms of free energy, has a short-range order, and has a lattice distortion. It contains a crystalline region. Further, at least a part of the region in the film contains crystal grains of 0.5 to 20 nm. The Raman spectrum is shifted to the lower wavenumber side than 520 cm ⁻¹ . In X-ray diffraction, diffraction peaks of (111) and (220) that are derived from the Si crystal lattice are observed. In order to terminate dangling bonds (dangling bonds), hydrogen or halogen is contained at least 1 atomic% or more. It is also called a so-called microcrystalline semiconductor (microcrystal semiconductor). SiH ₄ , Si ₂ H ₆ , SiH ₂ Cl ₂ , SiHCl ₃ , SiCl ₄ , or SiF ₄ is formed by glow discharge decomposition (plasma CVD). These gases may be diluted with H ₂ , or H ₂ and one or more kinds of rare gas elements selected from He, Ar, Kr, and Ne. The dilution rate is in the range of 2 to 1000 times. The pressure is generally in the range of 0.1 Pa to 133 Pa, and the power supply frequency is 1 MHz to 120 MHz, preferably 13 MHz to 60 MHz. The substrate heating temperature may be 300 ° C. or less, preferably 100 to 250 ° C. As an impurity element in the film, impurities of atmospheric components such as oxygen, nitrogen, and carbon are desirably 1 × 10 ²⁰ / cm ³ or less, and in particular, the oxygen concentration is 5 × 10 ¹⁹ / cm ³ or less, preferably 1 × 10 ¹⁹ / cm ³ or less.

  Further, specific examples of the crystalline semiconductor layer include those made of single crystal or polycrystalline silicon, silicon germanium, or the like. These may be formed by laser crystallization, or may be formed by crystallization by a solid phase growth method using nickel or the like, for example.

  Note that in the case where the semiconductor layer is formed of an amorphous material, for example, amorphous silicon, the transistor 11 and other transistors (transistors constituting a circuit for driving a light emitting element) are all configured by N-channel transistors. It is preferable that the light-emitting device have a structured circuit. Other than that, a light-emitting device having a circuit including any one of an N-channel transistor and a P-channel transistor, or a light-emitting device including a circuit including both transistors may be used.

  Further, the first interlayer insulating film 16 may be a multilayer as shown in FIGS. 6A, 6B, or 6C, or may be a single layer. Note that 16a is made of an inorganic material such as silicon oxide or silicon nitride, and 16b is acrylic or siloxane (note that siloxane is a compound having a Si—O—Si bond as a main skeleton. Also, hydrogen or a methyl group Etc.) and a self-flattening material such as silicon oxide that can be coated. Further, 16c is made of a silicon nitride film containing argon (Ar). In addition, there is no limitation in particular about the substance which comprises each layer, You may use things other than what was described here. Moreover, you may further combine the layer which consists of substances other than these. As described above, the first interlayer insulating film 16 may be formed using both an inorganic material and an organic material, or may be formed of any one of an inorganic material and an organic material.

  The partition layer 18 preferably has a shape in which the radius of curvature continuously changes at the edge portion. The partition layer 18 is formed using acrylic, siloxane, resist, silicon oxide, or the like. The partition wall layer 18 may be formed of any one of an inorganic film and an organic film, or may be formed using both.

  In FIGS. 6A to 6C, only the first interlayer insulating film 16 is provided between the transistor 11 and the light-emitting element 12, but the first interlayer is formed as shown in FIG. In addition to the insulating film 16 (16a, 16b), the second interlayer insulating film 19 (19a, 19b) may be provided. In the light emitting device shown in FIG. 6B, the first electrode 13 penetrates through the second interlayer insulating film 19 and is connected to the wiring 17.

  Similar to the first interlayer insulating film 16, the second interlayer insulating film 19 may be a multilayer including the second layer insulating films 19a and 19b, or may be a single layer. The second interlayer insulating film 19a is made of a material having self-flatness such as acrylic, siloxane, or silicon oxide that can be coated. Further, the second interlayer insulating film 19b is made of a silicon nitride film containing argon (Ar). In addition, there is no limitation in particular about the substance which comprises each layer, You may use things other than what was described here. Moreover, you may further combine the layer which consists of substances other than these. As described above, the second interlayer insulating film 19 may be formed using both an inorganic material and an organic material, or may be formed of any one of an inorganic material and an organic material.

  In the light-emitting element 12, when both the first electrode and the second electrode are formed using a light-transmitting substance, the first electrode and the second electrode are represented by the white arrows in FIG. Light emission can be extracted from both the electrode 13 side and the second electrode 14 side. In addition, in the case where only the second electrode 14 is formed using a light-transmitting substance, light emission is extracted only from the second electrode 14 side as represented by a white arrow in FIG. 6B. be able to. In this case, it is preferable that the first electrode 13 is made of a material having a high reflectivity, or a film (reflective film) made of a material having a high reflectivity is provided below the first electrode 13. In addition, in the case where only the first electrode 13 is formed using a light-transmitting substance, light emission is extracted only from the first electrode 13 side as represented by a white arrow in FIG. be able to. In this case, it is preferable that the second electrode 14 is made of a highly reflective material, or a reflective film is provided above the second electrode 14.

  In addition, the light emitting element 12 may be one in which the layer 15 is stacked so as to operate when a voltage is applied so that the potential of the second electrode 14 is higher than the potential of the first electrode 13. Alternatively, the layer 15 may be stacked so as to operate when a voltage is applied so that the potential of the second electrode 14 is lower than the potential of the first electrode 13. In the former case, the transistor 11 is an N-channel transistor, and in the latter case, the transistor 11 is a P-channel transistor.

  As described above, in this embodiment, the active light-emitting device in which the driving of the light-emitting element is controlled by the transistor has been described. However, the present invention may be applied not only to the active light-emitting device but also to a passive light-emitting device.

  FIG. 7 is a perspective view of a passive light emitting device manufactured by applying the present invention. In FIG. 7, an electrode 1902 and an electrode 1906 are provided between a substrate 1901 and a substrate 1907. The electrode 1902 and the electrode 1906 are provided so as to intersect. Further, a light-emitting layer 1905 (shown by a broken line so that an arrangement of the electrode 1902, the partition wall layer 1904, and the like can be seen) is provided between the electrode 1902 and the electrode 1906. Note that a hole-transport layer, an electron-transport layer, or the like may be provided between the light-emitting layer 1905 and the electrode 1902 or between the light-emitting layer 1905 and the electrode 1906. An end portion of the electrode 1902 is covered with a partition layer 1904. A passive light emitting device can also be driven with low power consumption by including the light emitting element of the present invention that operates at a low driving voltage.

(Embodiment 6)
Since a light-emitting device including the light-emitting element of the present invention can be operated at a low driving voltage, an economical electronic device with low power consumption can be obtained according to the present invention. In addition, since a light-emitting device manufactured using the light-emitting element of the present invention has low manufacturing cost, a low-cost electronic device can be obtained by using the light-emitting device of the present invention for a display portion.

  FIG. 8 shows an embodiment of an electronic apparatus of the present invention in which a light emitting device to which the present invention is applied is mounted.

  FIG. 8A illustrates a computer according to the present invention, in which the light-emitting device using the organometallic complex of the present invention described in Embodiments 1 and 2 as a light-emitting substance is arranged in a matrix. Is included in the display portion 5523. In this manner, a computer can be completed by incorporating a light-emitting device having a light-emitting element including the organometallic complex of the present invention as a display portion. The computer in FIG. 8A includes a display portion 5523, a main body 5521 mounted with a hard disk, a CPU, and the like, a housing 5522 for holding the display portion 5523, a keyboard 5524, and the like. Since such a computer is completed using the organometallic complex of the present invention synthesized with high yield, the raw material cost is low and the price is low. Further, since the computer according to the present invention uses the light emitting device of the present invention driven with low power consumption for the display portion, the power consumption for display is small and economical.

  FIG. 8B illustrates a telephone according to the present invention. The light-emitting device of the present invention in which light-emitting elements using the organometallic complex of the present invention described in Embodiments 1 and 2 as a light-emitting substance are arranged in a matrix. Is included in a display portion 5551 incorporated in a main body 5552. In this manner, a telephone can be completed by incorporating a light-emitting device having a light-emitting element including the organometallic complex of the present invention as a display portion. 8B includes a display portion 5551, an audio output portion 5554, an audio input portion 5555, operation switches 5556 and 5557, an antenna 5553, and the like. In this manner, a telephone can be completed by incorporating a light-emitting device having a light-emitting element including the organometallic complex of the present invention as a display portion. Since such a telephone is completed using the organometallic complex of the present invention synthesized with high yield, the raw material cost is easy and the price is low. Further, since the telephone according to the present invention uses the light emitting device of the present invention driven with low power consumption for the display portion, the power consumption for display is small and economical.

  FIG. 8C illustrates a television receiver according to the present invention, in which light-emitting elements using the organometallic complex of the present invention described in Embodiments 1 and 2 as a light-emitting substance are arranged in a matrix. The display portion 5531 includes a light emitting device. In this manner, a television receiver can be completed by incorporating a light-emitting device having a light-emitting element including the organometallic complex of the present invention as a display portion. The television set in FIG. 8C is provided with a housing 5532 and a speaker 5533 for holding the display portion 5531 in addition to the display portion 5531. In this manner, a television receiver can be completed by incorporating a light-emitting device having a light-emitting element including the organometallic complex of the present invention as a display portion. Since such a television receiver is completed using the organometallic complex of the present invention synthesized with high yield, the raw material cost is easy and the price is low. In addition, the television receiver according to the present invention uses the light emitting device of the present invention driven with low power consumption for the display portion, so that it consumes less power for display and is economical.

  As described above, the electronic device of the present invention including the light emitting device of the present invention in the display portion includes a computer, a telephone, and the like as described with reference to FIGS. In addition, an electronic device in which a light emitting device including the light emitting element of the present invention is mounted on a display unit such as a navigation device, a video, or a camera is also included.

[Synthesis Example 1]
Organometallic complex (name: (acetylacetonato) bis [2,3-diphenyl-5,6,7,8-tetrahydroquinoxalinato] iridium (III) represented by the structural formula (8) and one of the present inventions) , An abbreviation: Ir (dpqtH) ₂ (acac)) will be described.
[Step 1: Synthesis of Ligand (abbreviation: DPQtH)]
First, using ethanol 150 mL as a solvent, 5.84 g of benzyl [manufactured by Tokyo Chemical Industry Co., Ltd.] and 3.17 g of trans-1,2-cyclohexanediamine [manufactured by Kanto Chemical Co., Ltd.] were mixed and refluxed for 3 hours. After refluxing, the mixture was allowed to cool to room temperature, and the resulting precipitate was filtered. By recrystallizing the filtrate with ethanol, 2,3-diphenyl-4a, 5,6,7,8,8a-hexahydroquinoxaline was obtained (pale yellow crystals, yield 96%).
Next, 7.66 g of 2,3-diphenyl-4a, 5,6,7,8,8a-hexahydroquinoxaline obtained above and 8.62 g of iron (III) chloride were mixed using 80 mL of ethanol as a solvent. The mixture was gently heated and stirred at about 50 ° C. for 3 hours. After stirring, water was added to the mixture to obtain a precipitate. The precipitate was collected by filtration to obtain ligand 2,3-diphenyl-5,6,7,8-tetrahydroquinoxaline (abbreviation: DPQtH) (milky white powder, yield 88%). A synthesis scheme (d-1) of Step 1 is shown below.

[Step 2: Synthesis of a binuclear complex (abbreviation: [Ir (dpqtH) ₂ Cl] ₂ ))
Next, using a mixed liquid of 30 mL of 2-ethoxyethanol and 10 mL of water as a solvent, 3.98 g of the ligand DPQtH obtained above, iridium chloride hydrochloride hydrate (IrCl ₃ · HCl · H ₂ O) [ 1.65 g of Sigma-Aldrich] was mixed and refluxed for 18 hours under a nitrogen atmosphere. Thereafter, the precipitated solid was filtered to obtain [Ir (dpqtH) ₂ Cl] ₂ (red powder, yield 98%). A synthesis scheme (d-2) of Step 3 is shown below.

[Step 3: Organometallic Compound of the Present Invention (Abbreviation: Synthesis of Ir (dpqtH) ₂ (acac)]
Furthermore, 2.06 g of [Ir (dpqtH) ₂ Cl] ₂ obtained above was mixed using 30 mL of 2-ethoxyethanol as a solvent, 0.40 mL of acetylacetone, and 1.37 g of sodium carbonate, and the mixture was mixed with a nitrogen atmosphere. Reflux for 17 hours below. Thereafter, the resulting precipitate was filtered to obtain an orange powder (yield 53%). A synthesis scheme (d-3) relating to the synthesis of Step 3 is shown below.

When the obtained orange powder was analyzed by nuclear magnetic resonance spectroscopy ( ¹ H-NMR), the following results were obtained, which is one of the organometallic complexes of the present invention and represented by the structural formula (8). It was found to be Ir (dpqtH) ₂ (acac). Moreover, the chart of ¹ H-NMR is shown in FIG.

¹ H-NMR. δ (CDCl ₃ ): 7.84 (m, 4H), 7.50 (m, 6H), 6.87 (d, 2H), 6.54 (4H), 6.41 (d, 2H), 5 .04 (s, 1H), 3.08 (m, 6H), 2.69 (2H), 1.87 (m, 6H), 1.73 (2H), 1.67 (s, 6H)

Further, when the decomposition temperature T _d of the obtained organometallic compound Ir (dpqtH) ₂ (acac) was measured by a differential thermothermal gravimetric simultaneous measurement apparatus (TG / DTA 320 type, manufactured by Seiko Denshi Co., Ltd.), T _d = 332 It was found that the film had a good heat resistance.

Next, Ir (dpqtH) ₂ (acac) was measured in dichloromethane at room temperature for absorption spectrum (UV-Vis spectrophotometer, V550 type manufactured by JASCO Corporation) and emission spectrum (fluorescence meter FS920 manufactured by Hamamatsu Photonics Co., Ltd.). It was. The results are shown in FIG. In FIG. 10, the horizontal axis represents wavelength (nm) and the vertical axis represents absorption and emission intensities (arbitrary units). As can be seen from FIG. 10, the absorption spectrum of the organometallic compound Ir (dpqtH) ₂ (acac) of the present invention has peaks at 331 nm, 441 nm, 500 nm and 550 nm. In addition, the emission spectrum of Ir (dpqtH) ₂ (acac) had a peak at 590 nm and emitted orange light.

The obtained Ir _(dpqtH) gas was injected containing oxygen dichloromethane solution containing 2 (acac), the light emission intensity when made to emit light Ir _(dpqtH) 2 _(acac) with dissolved oxygen Examined. Also, argon was injected into a dichloromethane solution including the obtained Ir _(dpqtH) 2 _(acac), was examined emission intensity when made to emit light Ir _(dpqtH) 2 _(acac) with dissolved argon. As a result, the light emission derived from Ir (dpqtH) ₂ (acac) has a tendency similar to that of a substance that emits phosphorescence, in which the light emission intensity in the state in which argon is dissolved is stronger than the light emission intensity in the state in which oxygen is dissolved. It was found that From this, it was confirmed that light emission derived from Ir (dpqtH) ₂ (acac) was phosphorescence.

[Synthesis Example 2]
In this synthesis example, an organometallic complex represented by the structural formula (16) (name: bis [2,3-bis (4-fluorophenyl) -5,6,7,8-tetrahydroquinoxa) A method for synthesizing [Rinato] (picolinato) iridium (III), abbreviated as Ir (FdpqtH) ₂ (pic)) will be described.

[Step 1: Synthesis of Ligand (HfdpqtH)]
First, using 300 mL of ethanol as a solvent, 12.07 g of 4,4′-difluorobenzyl [manufactured by Tokyo Chemical Industry] and 5.60 g of trans-1,2-cyclohexanediamine [manufactured by Tokyo Chemical Industry] are mixed, and the mixture is mixed with a nitrogen atmosphere. Reflux for 3 hours under. After refluxing, the mixture is allowed to cool to room temperature, and the precipitated crystals are removed by filtration to give 2,3-bis (4-fluorophenyl) -4a, 5,6,7,8,8a-hexahydroquinoxaline. (Light yellow plate crystals, 94% yield).
Next, 6.90 g of 2,3-bis (4-fluorophenyl) -4a, 5,6,7,8,8a-hexahydroquinoxaline obtained above with 150 mL of ethanol as a solvent and iron chloride (III 6.90 g) was mixed, and the mixture was gently heated and stirred at about 50 ° C. for 3 hours. After stirring, water was added to the mixture to precipitate a precipitate, and the resulting precipitate was removed by filtration and washed with ethanol. The washed precipitate was recrystallized with ethanol to obtain a ligand 2,3-bis (4-fluorophenyl) -5,6,7,8-tetrahydroquinoxaline (abbreviation: HfdpqtH) (milky white powder) , Yield 68%). A synthesis scheme (e-1) of Step 1 is shown below.

[Step 2: Binuclear Complex (Synthesis of [Ir (FdpqtH) ₂ Cl] ₂ )
Next, using a mixed solution of 30 mL of 2-ethoxyethanol and 10 mL of water as a solvent, 4.70 g of the ligand FDPQtH obtained above, iridium (III) chloride hydrate (IrCl ₃ .H ₂ O) [ 1.74 g of Sigma-Aldrich] was mixed, and the mixture was refluxed for 18 hours under a nitrogen atmosphere. Thereafter, the precipitated solid was filtered to obtain a binuclear complex [Ir (FdpqtH) ₂ Cl] ₂ as a yellow-orange powder (yield 93%). A synthesis scheme (e-2) of Step 2 is shown below.

[Step 3: Synthesis of Organometallic Complex of the Present Invention (Ir (FdpqtH) ₂ (pic))]
Furthermore, 0.90 g of [Ir (FdpqtH) ₂ Cl] ₂ obtained above and 0.51 g of picolinic acid [manufactured by Tokyo Chemical Industry Co., Ltd.] were mixed using 20 mL of 2-ethoxyethanol as a solvent, and 20 under a nitrogen atmosphere. Refluxed for hours. Thereafter, the precipitated solid was filtered to obtain a yellow powder (yellow powder, yield 59%). A synthesis scheme (e-3) of Step 3 is shown below.

When the obtained yellow powder was analyzed by nuclear magnetic resonance spectroscopy ( ¹ H-NMR), the following results were obtained, which is one of the organometallic complexes of the present invention and represented by the structural formula (16). It was found to be Ir (FdpqtH) ₂ (pic). The analysis result of ¹ H-NMR is shown below, and the chart of ¹ H-NMR is shown in FIGS. 16 (A) and 16 (B). FIG. 16B is an enlarged view of a part of FIG. 16A in the vertical direction.

¹ H-NMR. δ (CDCl ₃ ): 8.31 (d, 1H), 8.26 (d, 1H), 7.94 (td, 1H), 7.85 (m, 2H), 7.68 (m, 2H) 7.53 (m, 1H), 7.31-7.19 (m, 4H), 6.97-6.86 (m, 2H), 6.43 (td, 1H), 6.33 (td) , 1H), 6.20 (dd, 1H), 5.87 (dd, 1H), 3.25-2.73 (m, 5H), 1.91 (m, 2H), 1.52 (m, 9H).

In addition, the decomposition temperature T _d of the obtained organometallic complex Ir (FdpqtH) ₂ (pic) of the present invention was measured by TG / DTA (TG / DTA 320 type manufactured by Seiko Denshi Co., Ltd.). However, it was found that T _d = 342 ° C. and good heat resistance was exhibited.

Next, measurement of Ir (FdpqtH) ₂ (pic) absorption spectrum (ultraviolet-visible spectrophotometer, model V550 manufactured by JASCO Corporation) and emission spectrum (fluorometer FS920 manufactured by Hamamatsu Photonics Co., Ltd.) was degassed in dichloromethane solution. At room temperature. The results are shown in FIG. In FIG. 17, the horizontal axis represents wavelength (nm) and the vertical axis represents intensity (arbitrary unit). As can be seen from FIG. 17, the organometallic complex Ir (FdpqtH) ₂ (pic) of the present invention has absorption peaks at 302 nm, 351 nm, 425 nm, 460 nm and 520 nm. The emission spectrum was yellow-green emission having an emission peak at 550 nm.

[Synthesis Example 3]
In this synthesis example, an organometallic complex represented by the structural formula (22) (name: bis [2,3-bis (4-fluorophenyl) -5,6,7,8-tetrahydroquinoxa) A method for synthesizing [Linato] [tetrakis (1-pyrazolyl) borato] iridium (III), abbreviated as Ir (FdpqtH) ₂ (bpz ₄ )) will be described.

First, 1.10 g of the binuclear complex [Ir (FdpqtH) ₂ Cl] ₂ obtained in Step 2 of Synthesis Example ₂ was suspended in 40 mL of dichloromethane. Next, a solution in which 0.40 g of silver trifluoromethanesulfonate (abbreviation: Ag (OTf)) was dissolved in 40 mL of methanol as a solvent was added dropwise to the suspension. The mixture after dropping was stirred at room temperature for 2 hours, and the resulting suspension was centrifuged. The obtained supernatant was separated by decantation and concentrated to dryness. Further, 0.70 g of a solid obtained by concentration and drying with 30 mL of acetonitrile as a solvent and tetrakis (1-pyrazolyl) borate potassium salt (manufactured by Acros Organics) were mixed, and the mixture was added under a nitrogen atmosphere. By refluxing for 18 hours, a yellow powder was obtained (yellow powder, 38% yield). A synthesis scheme (f-1) is shown below.

When the obtained yellow powder was analyzed by nuclear magnetic resonance spectroscopy ( ¹ H-NMR), the following results were obtained, which is one of the organometallic complexes of the present invention and represented by the structural formula (22). It was found to be Ir (FdpqtH) ₂ (bpz ₄ ). The analysis result of ¹ H-NMR is shown below, and the chart of ¹ H-NMR is shown in FIGS. 18 (A) and 18 (B). FIG. 18B is an enlarged view of a part of FIG. 18A in the vertical direction.

¹ H-NMR. δ (ACENETE-d ₆ ): 7.70-7.63 (m, 6H), 7.30-7.10 (m, 8H), 6.92-6.83 (m, 2H), 6.41 -6.27 (m, 4H), 6.20-6.14 (m, 2H), 6.11-6.00 (m, 4H), 2.89 (m, 2H), 1.68-1 .47 (m, 14H).

Further, when the decomposition temperature T _d of the obtained organometallic complex Ir (FdpqtH) ₂ (bpz ₄ ) of the present invention was measured by TG / DTA, T _d = 346 ° C., indicating good heat resistance. all right.

Next, measurement of Ir (FdpqtH) ₂ (bpz ₄ ) absorption spectrum (UV-visible spectrophotometer, V550 type manufactured by JASCO Corporation) and emission spectrum (fluorescence meter, FS920 manufactured by Hamamatsu Photonics Co., Ltd.) was performed using degassed dichloromethane. The solution was used at room temperature. The results are shown in FIG. In FIG. 19, the horizontal axis represents wavelength (nm) and the vertical axis represents intensity (arbitrary unit). As can be seen from FIG. 19, the organometallic complex Ir (FdpqtH) ₂ (bpz ₄ ) of the present invention has absorption peaks at 344 nm, 412 nm, 440 nm (sh) and 475 nm (sh). The emission spectrum was orange emission having an emission peak at 600 nm.

[Synthesis Example 4]
In this synthesis example, an organometallic complex represented by the structural formula (10) (name: (acetylacetonato) bis [2,3-bis (4-fluorophenyl) -5,6,7, 8-tetrahydroquinoxalinato] iridium (III), abbreviation: Ir (FdpqtH) ₂ (acac)) will be described.

2.26 g of the binuclear complex [Ir (FdpqtH) ₂ Cl] ₂ obtained in Step 2 of Synthesis Example 2 was mixed with 30 mL of 2-ethoxyethanol, 0.47 mL of acetylacetone, and 1.62 g of sodium carbonate. The mixture was refluxed for 16 hours under a nitrogen atmosphere. Thereafter, the precipitated solid was filtered to obtain an orange powder (orange powder, yield 39%). A synthesis scheme (g-1) is shown below.

When the obtained orange powder was analyzed by nuclear magnetic resonance spectroscopy ( ¹ H-NMR), the following results were obtained, which is one of the organometallic complexes of the present invention and represented by the structural formula (10). It was found to be Ir (FdpqtH) ₂ (acac). The analysis result of ¹ H-NMR is shown below, and the chart of ¹ H-NMR is shown in FIGS. 20 (A) and 20 (B). FIG. 20B is an enlarged view of a part of FIG. 20A in the vertical direction.

¹ H-NMR. δ (CDCl ₃ ): 7.81 (t, 4H), 7.21 (m, 4H), 6.85 (m, 2H), 6.30 (td, 2H), 6.03 (dd, 2H) , 5.06 (s, 1H), 3.18-2.93 (m, 6H), 2.67-2.58 (m, 2H), 1.99-1.77 (m, 8H), 1 .68 (s, 6H).

Further, when the decomposition temperature T _d of the obtained organometallic complex Ir (FdpqtH) ₂ (acac) of the present invention was measured by TG / DTA, it was found that T _d = 332 ° C. and good heat resistance was exhibited. It was.

Next, a degassed dichloromethane solution was used to measure Ir (FdpqtH) ₂ (acac) absorption spectrum (UV550 spectrophotometer, model V550 manufactured by JASCO Corporation) and emission spectrum (fluorescence meter FS920 manufactured by Hamamatsu Photonics Co., Ltd.). At room temperature. The results are shown in FIG. In FIG. 21, the horizontal axis represents wavelength (nm) and the vertical axis represents absorption intensity (arbitrary unit). As can be seen from FIG. 21, the organometallic complex Ir (FdpqtH) ₂ (acac) of the present invention has absorption peaks at 295 nm, 357 nm, 432 nm, 475 nm and 535 nm (sh). The emission spectrum was yellow emission with an emission peak at 565 nm.

[Synthesis Example 5]
In this synthesis example, an organometallic complex represented by the following structural formula (35) (name: (acetylacetonato) [2,3-bis (4-fluorophenyl) -5,6,7, 8-tetrahydroquinoxalinato] platinum (II), abbreviation: Pt (FdpqtH) (acac)) will be described.

First, 2.15 g of ligand Hfdpqt obtained in Step 1 of Synthesis Example 2 and potassium tetrachloroplatinate (K ₂ [PtCl ₄ ]) using a mixed solution of 30 mL of 2-ethoxyethanol and 10 mL of water as a solvent. 1.11 g was mixed, and the mixture was heated and stirred at 80 ° C. for 17 hours under a nitrogen atmosphere. After stirring, the solvent was removed from the mixture, and the resulting powder was washed with ethanol and dried overnight under reduced pressure. Next, using 30 mL of 2-ethoxyethanol as a solvent, 0.41 mL of the powder, acetylacetone, and 1.42 g of sodium carbonate were mixed, and the mixture was refluxed for 16 hours in a nitrogen atmosphere. After the obtained precipitate was filtered, the filtrate was washed with methanol and recrystallized with dichloromethane to obtain an orange powder. A synthesis scheme (h-1) is shown below.

When the obtained orange powder was analyzed by nuclear magnetic resonance spectroscopy ( ¹ H-NMR), the following results were obtained, which is one of the organometallic complexes of the present invention and represented by the structural formula (10). It was found to be Pt (FdpqtH) (acac). The analysis result of ¹ H-NMR is shown below, and the chart of ¹ H-NMR is shown in FIGS. 22 (A) and 22 (B). FIG. 22B is an enlarged view of a part of FIG. 22A in the vertical direction.

¹ H-NMR. δ (CDCl ₃ ): 7.24 (m, 2H), 7.24-7.13 (m, 3H), 6.56 (dd, 1H), 6.44 (td, 1H), 5.55 ( s, 1H), 3.56 (brm, 2H), 3.02 (brm, 2H), 2.04 (s, 3H), 1.98 (s, 3H), 1.94 (brm, 4H).

Further, when the decomposition temperature T _d of the obtained organometallic complex Pt (FdpqtH) (acac) of the present invention was measured by TG-DTA, it was T _d = 239 ° C.

Next, measurement of Pt (FdpqtH) (acac) absorption spectrum (UV-visible spectrophotometer, V550 type manufactured by JASCO Corporation) and emission spectrum (fluorescence meter FS920 manufactured by Hamamatsu Photonics Co., Ltd.) was carried out using a degassed dichloromethane solution. Used at room temperature. The results are shown in FIG. In FIG. 23, the horizontal axis represents wavelength (nm) and the vertical axis represents intensity (arbitrary unit). As can be seen from FIG. 23, the organometallic complex Pt (FdpqtH) (acac) of the present invention has absorption peaks at 324 nm, 357 nm, 389 nm, 439 nm and 469 nm. The emission spectrum was red-orange emission having an emission peak at 620 nm.

In this example, a method for manufacturing a light-emitting element using Ir (dpqtH) ₂ (acac) synthesized by the method described in Synthesis Example 1 as a light-emitting substance and operation characteristics of the light-emitting element will be described.

  As illustrated in FIG. 11, indium tin oxide containing silicon oxide was formed over a glass substrate 301 by a sputtering method, so that a first electrode 302 was formed. The thickness of the first electrode 302 was set to 110 nm. The electrodes were formed to have a square shape with a size of 2 mm × 2 mm.

  Next, the glass substrate 301 on which the first electrode 302 was formed was fixed to a holder provided in the vacuum evaporation apparatus so that the surface on which the first electrode was formed was downward.

Next, after evacuating the vacuum apparatus and reducing the pressure to 1 × 10 ⁻⁴ Pa, the first layer 303 containing NPB and molybdenum oxide is formed on the first electrode 302 by vapor deposition. It formed by the vapor deposition method. In this example, hexavalent molybdenum oxide (MoO ₃ ) was used as the molybdenum oxide. The thickness of the first layer 303 was set to 50 nm. The molar ratio of NPB to molybdenum oxide was 1: 2 = NPB: molybdenum oxide. The first layer 303 is a layer that functions as a hole generating layer when the light emitting element is operated.

  Next, the second layer 304 was formed on the first layer 303 by vapor deposition using NPB. The thickness of the second layer 304 was set to 10 nm. The second layer 304 is a layer that functions as a hole transport layer when the light emitting element is operated.

Next, a third layer 305 containing CBP and Ir (dpqtH) ₂ (acac) was formed over the second layer 304 by a co-evaporation method. The thickness of the third layer 305 is set to 30 nm, and the mass ratio of CBP to Ir (dpqtH) ₂ (acac) is 1: 0.025 = CBP: Ir (dpqtH) ₂ (acac) (molar ratio) When converted, it was set to be 1: 0.014 = CBP: Ir (dpqtH) ₂ (acac)). As a result, Ir (dpqtH) ₂ (acac) is dispersed in a layer made of CBP. The third layer 305 functions as a light emitting layer when the light emitting element is operated.

  Next, a fourth layer 306 was formed over the third layer 305 by vapor deposition using BCP. The thickness of the fourth layer 306 was set to 20 nm. The fourth layer 306 is a layer that functions as a hole blocking layer when the light emitting element is operated.

Next, a fifth layer 307 was formed over the fourth layer 306 by vapor deposition using Alq ₃ . The thickness of the fifth layer 307 was set to 30 nm. The fifth layer 307 functions as an electron transport layer when the light emitting element is operated.

  Next, a sixth layer 308 was formed over the fifth layer 307 by vapor deposition using calcium fluoride. The thickness of the sixth layer 308 was set to 1 nm. The sixth layer 308 functions as an electron injection layer when the light emitting element is operated.

  Next, the second electrode 309 was formed over the sixth layer 308 using aluminum. The thickness of the second electrode 309 was set to 200 nm.

In the light-emitting element manufactured as described above, a current flows when a voltage is applied so that the potential of the first electrode 302 is higher than the potential of the second electrode 309, and the third element functions as a light-emitting layer. In the layer 305, electrons and holes are recombined to generate excitation energy, and light is emitted when the excited Ir (dpqtH) ₂ (acac) returns to the ground state.

  The light-emitting element was sealed in a glove box under a nitrogen atmosphere so that the light-emitting element was not exposed to the air, and then the operating characteristics of the light-emitting element were measured. The measurement was performed at room temperature (atmosphere kept at 25 ° C.).

The measurement results are shown in FIGS. FIG. 12 shows the current density-luminance characteristics, FIG. 13 shows the voltage-luminance characteristics, and FIG. 14 shows the brightness-current efficiency characteristics. In FIG. 12, the horizontal axis represents current density (mA / cm ² ) and the vertical axis represents luminance (cd / m ² ). In FIG. 13, the horizontal axis represents voltage (V) and the vertical axis represents luminance (cd / m ² ). In FIG. 14, the horizontal axis represents luminance (cd / m ² ) and the vertical axis represents current efficiency (cd / A). From these results, it was found that the light-emitting element manufactured in this example had a current density of 2.29 mA / cm ² when a voltage of 8 V was applied, and emitted light with a luminance of 490 cd / m ² . . Note that the current efficiency when emitting light with a luminance of 490 cd / m ² was 21 cd / A, which was 10% when converted to external quantum efficiency (= number of photons / number of electrons). By applying the stacked structure as shown in this embodiment, light emission derived from the organometallic complex of the present invention can be obtained favorably.

  FIG. 15 shows an emission spectrum of the light-emitting element manufactured in this example. In FIG. 15, the horizontal axis represents wavelength (nm) and the vertical axis represents intensity (arbitrary unit). FIG. 15 shows that the light-emitting element of this example has an emission spectrum peak at 580 nm and emits orange light.

In this example, a method for manufacturing a light-emitting element using Ir (FdpqtH) ₂ (pic) synthesized in Synthesis Example 2 as a light-emitting substance and operation characteristics thereof will be described with reference to FIGS.

  As shown in FIG. 24, an indium tin oxide containing silicon oxide was formed over a glass substrate 401 by a sputtering method, so that a first electrode 402 was formed. The thickness of the first electrode 402 was set to 110 nm.

  Next, the glass substrate 401 on which the first electrode 402 was formed was fixed to a holder provided in the vacuum evaporation apparatus so that the surface on which the first electrode was formed was downward.

Next, after reducing the pressure in the vacuum apparatus to 1 × 10 ⁻⁴ Pa, the first layer 403 was formed on the first electrode 402 using DNTPD. The thickness of the first layer 403 was set to 50 nm. The first layer 403 functions as a hole injection layer when the light emitting element is operated.

  Next, the second layer 404 was formed on the first layer 403 by evaporation using NPB. The thickness of the second layer 404 was set to 10 nm. The second layer 404 is a layer that functions as a hole transport layer when the light emitting element is operated.

Next, a third layer 405 containing CBP and Ir (FdpqtH) ₂ (pic) was formed over the second layer 404 by a co-evaporation method. The thickness of the third layer 405 is set to 30 nm, and the mass ratio of CBP to Ir (FdpqtH) ₂ (pic) is 1: 0.05 = CBP: Ir (FdpqtH) ₂ (pic). did. As a result, Ir (FdpqtH) ₂ (pic) is contained in a layer using CBP as a substrate (matrix). The third layer 405 functions as a light emitting layer when the light emitting element is operated. In such a case, Ir (FdpqtH) ₂ (pic) is called a guest, and CBP is called a host.

  Next, a fourth layer 406 was formed over the third layer 405 by vapor deposition using BCP. The thickness of the fourth layer 406 was set to 20 nm. The fourth layer 406 functions as an electron transport layer when the light emitting element is operated.

Next, a fifth layer 407 containing Alq ₃ and Li was formed over the fourth layer 406 by a co-evaporation method. The thickness of the fifth layer 407 was set to 30 nm. The mass ratio between Alq ₃ and Li was 1: 0.01 = Alq ₃ : Li. The fifth layer 407 is a layer that functions as an electron injection layer when the light emitting element is operated.

  Next, a second electrode 408 was formed over the fifth layer 407 using aluminum. The thickness of the second electrode 408 was set to 200 nm.

In the light-emitting element manufactured as described above, a current flows when a voltage is applied so that the potential of the first electrode 402 is higher than the potential of the second electrode 408, and the third element functions as a light-emitting layer. In the layer 405, electrons and holes are recombined to generate excitation energy, and light is emitted when the excited Ir (FdpqtH) ₂ (pic) returns to the ground state.

  The light-emitting element was sealed in a glove box under a nitrogen atmosphere so that the light-emitting element was not exposed to the air, and then the operating characteristics of the light-emitting element were measured. The measurement was performed at room temperature (atmosphere kept at 25 ° C.).

The measurement results are shown in FIGS. FIG. 25 shows the results of the current density-luminance characteristics, FIG. 26 shows the results of the voltage-luminance characteristics, and FIG. 27 shows the results of the brightness-current efficiency characteristics. In FIG. 25, the horizontal axis represents current density (mA / cm ² ) and the vertical axis represents luminance (cd / m ² ). In FIG. 26, the horizontal axis represents voltage, and the vertical axis represents luminance (cd / m ² ). In FIG. 27, the horizontal axis represents luminance (cd / m ² ) and the vertical axis represents current efficiency (cd / A). From these results, it was found that the light-emitting element of this example emitted light with a current density of 3.86 mA / cm ² and a luminance of 942 cd / m ² when a voltage of 9 V was applied. Moreover, the current efficiency at this time was 24.4 cd / A, and the external quantum efficiency was 10.8%, showing high efficiency. Furthermore, when the light was emitted at a luminance of 20.6 cd / m ² , the external quantum efficiency showed a maximum value of 13.7%.

  In addition, an emission spectrum of the light-emitting element manufactured in this example is shown in FIG. In FIG. 28, the horizontal axis represents wavelength (nm) and the vertical axis represents intensity (arbitrary unit). Further, the chromaticity coordinates in the CIE color system are (x, y) = (0.51, 0.48), and it was found that the light emitting element of this example exhibited yellow light emission.

As can be seen from FIG. 28, the light emitting element of this example can obtain a trapezoidal emission spectrum (half-value width = 140 nm) with little change in emission intensity in the wavelength band of 550 to 650 nm. Therefore, the light-emitting element of this example is combined with the light-emitting element showing a light emission spectrum having a gentle peak shape with little change in emission intensity in the wavelength band of 450 to 550 nm so that the emission spectrum is synthesized (for example, White light can be obtained by simultaneously emitting light). In addition, the light-emitting element of this example is further provided with a layer containing a light-emitting substance that exhibits a light emission spectrum with a gentle peak shape with little change in emission intensity in the wavelength band of 450 to 550 nm, and Ir (FdpqtH) ₂ (pic) White light can also be obtained by forming a layer provided between the electrodes so that the luminescent material and the luminescent material emit light simultaneously.

In this example, operation characteristics of a light-emitting element using Ir (FdpqtH) ₂ (bpz ₄ ) synthesized in Synthesis Example 3 as a light-emitting substance will be described with reference to FIGS.

The light-emitting element manufactured in this example is different from the light-emitting element of Example 3 in that Ir (FdpqtH) ₂ (bpz ₄ ) is used instead of Ir (FdpqtH) ₂ (pic), but other configurations (each layer) The materials, layer thicknesses, mass ratios, and the like used for forming the same are the same as those of the light-emitting element of Example 3. Therefore, the description of Example 3 is referred to for the manufacturing method and the element structure, and the description is omitted here.

Measurement results on the operating characteristics of the manufactured light-emitting element are shown in FIGS. FIG. 29 shows the results of the current density-luminance characteristics, FIG. 30 shows the results of the voltage-luminance characteristics, and FIG. 31 shows the results of the brightness-current efficiency characteristics. In FIG. 29, the horizontal axis represents current density (mA / cm ² ) and the vertical axis represents luminance (cd / m ² ). In FIG. 30, the horizontal axis represents voltage (V) and the vertical axis represents luminance (cd / m ² ). In FIG. 31, the horizontal axis represents luminance (cd / m ² ) and the vertical axis represents current efficiency (cd / A). From these results, it was found that the light-emitting element of this example emitted light with a current density of 7.29 mA / cm ² and a luminance of 1050 cd / m ² when a voltage of 9.2 V was applied. At this time, the current efficiency was 14.4 cd / A, and the external quantum efficiency was 7.76%, showing high efficiency. Furthermore, when the light was emitted at a luminance of 7.78 cd / m ² , the external quantum efficiency showed a maximum value of 11.0%.

  FIG. 32 shows an emission spectrum of the light-emitting element manufactured in this example. In FIG. 32, the horizontal axis represents wavelength (nm) and the vertical axis represents intensity (arbitrary unit). Further, the chromaticity coordinates in the CIE color system are (x, y) = (0.54, 0.45), and it was found that the light-emitting element of this example exhibited yellow-orange light emission.

As can be seen from FIG. 32, the light emitting element of this example can obtain a light emission spectrum having a gentle peak shape (half width = 145 nm) with little change in light emission intensity in the wavelength band of 550 to 650 nm. Accordingly, white light can be obtained by combining the light emitting element of this example with a light emitting element having an emission spectrum having a wide peak in the wavelength band of 450 to 550 nm so that the emission spectrum is synthesized (for example, simultaneously emitting light). Can be obtained. In addition, the light-emitting element of this example is provided with a layer containing a light-emitting substance that exhibits a light emission spectrum with a gentle peak shape with little change in emission intensity in the wavelength band of 450 to 550 nm, and Ir (FdpqtH) ₂ (bpz ₄ White light can also be obtained by forming a layer provided between the electrodes so that the light-emitting substance emits light at the same time.

In this example, a method for manufacturing a light-emitting element using Ir (FdpqtH) ₂ (acac) synthesized in Synthesis Example 4 as a light-emitting substance and operation characteristics thereof will be described with reference to FIGS.

  As shown in FIG. 24, an indium tin oxide containing silicon oxide was formed over a glass substrate 401 by a sputtering method, so that a first electrode 402 was formed. The thickness of the first electrode 402 was set to 110 nm.

  Next, the glass substrate 401 on which the first electrode 402 was formed was fixed to a holder provided in the vacuum evaporation apparatus so that the surface on which the first electrode was formed was downward.

Next, after the pressure in the vacuum apparatus was reduced to 1 × 10 ⁻⁴ Pa, a first layer 403 containing NPB and molybdenum oxide was formed on the first electrode 402 by a co-evaporation method. In this example, hexavalent molybdenum oxide (MoO ₃ ) was used as the molybdenum oxide. The thickness of the first layer 403 was set to 50 nm. The molar ratio of NPB and molybdenum oxide was 1: 1 = NPB: molybdenum oxide. The first layer 403 functions as a hole generation layer when the light emitting element is operated.

  Next, the second layer 404 was formed over the first layer 403 by evaporation using TCTA. The thickness of the second layer 404 was set to 10 nm. The second layer 404 is a layer that functions as a hole transport layer when the light emitting element is operated.

Next, a third layer 405 containing CBP and Ir (FdpqtH) ₂ (acac) was formed over the second layer 404 by a co-evaporation method. The thickness of the third layer 405 is set to 30 nm, and the mass ratio of CBP to Ir (FdpqtH) ₂ (acac) is 1: 0.01 = CBP: Ir (FdpqtH) ₂ (acac). did. As a result, Ir (FdpqtH) ₂ (acac) is contained in a layer using CBP as a substrate (matrix). The third layer 405 functions as a light emitting layer when the light emitting element is operated. In such a case, Ir (FdpqtH) ₂ (acac) is called a guest, and CBP is called a host.

  Next, a fourth layer 406 was formed over the third layer 405 by vapor deposition using TAZ. The thickness of the fourth layer 406 was set to 20 nm. The fourth layer 406 functions as an electron transport layer when the light emitting element is operated.

  Next, a fifth layer 407 containing TAZ and Li was formed over the fourth layer 406 by a co-evaporation method. The thickness of the fifth layer 407 was set to 30 nm. The mass ratio of TAZ and Li was 1: 0.01 = TAZ: Li. The fifth layer 407 is a layer that functions as an electron injection layer when the light emitting element is operated.

  Next, a second electrode 408 was formed over the fifth layer 407 using aluminum. The thickness of the second electrode 408 was set to 200 nm.

In the light-emitting element manufactured as described above, a current flows when a voltage is applied so that the potential of the first electrode 402 is higher than the potential of the second electrode 408, and the third element functions as a light-emitting layer. In the layer 405, electrons and holes are recombined to generate excitation energy, and light is emitted when the excited Ir (FdpqtH) ₂ (acac) returns to the ground state.

  After the light-emitting element was sealed in a sealing apparatus in a nitrogen atmosphere so that the light-emitting element was not exposed to the air, the operating characteristics of the light-emitting element were measured. The measurement was performed at room temperature (atmosphere kept at 25 ° C.).

The measurement results are shown in FIGS. FIG. 33 shows the results of the current density-luminance characteristics, FIG. 34 shows the results of the voltage-luminance characteristics, and FIG. 35 shows the results of the brightness-current efficiency characteristics. In FIG. 33, the horizontal axis represents current density (mA / cm ² ) and the vertical axis represents luminance (cd / m ² ). In FIG. 34, the horizontal axis represents voltage, and the vertical axis represents luminance (cd / m ² ). In FIG. 35, the horizontal axis represents luminance (cd / m ² ) and the vertical axis represents current efficiency (cd / A). From these results, it was found that when the voltage of 6.4 V was applied, the light-emitting element of this example emitted current with a current density of 2.47 mA / cm ² and emitted light with a luminance of 915 cd / m ² . . In addition, the current efficiency at this time was 37.0 cd / A, and the external quantum efficiency was 13.8%, showing high efficiency. Furthermore, when the light was emitted at a luminance of 38.7 cd / m ² , the external quantum efficiency showed a maximum value of 15.0%.

  FIG. 36 shows an emission spectrum of the light-emitting element manufactured in this example. In FIG. 36, the horizontal axis represents wavelength (nm) and the vertical axis represents intensity (arbitrary unit). Further, the chromaticity coordinates in the CIE color system are (x, y) = (0.52, 0.48), and it was found that the light-emitting element of this example exhibited yellow light emission.

As can be seen from FIG. 36, the light emitting element of this example can obtain a light emission spectrum having a gentle peak shape (half width = 100 nm) with little change in light emission intensity in the wavelength band of 550 to 650 nm. Therefore, the light-emitting element of this example is combined with the light-emitting element showing a light emission spectrum having a gentle peak shape with little change in emission intensity in the wavelength band of 450 to 550 nm so that the emission spectrum is synthesized (for example, White light can be obtained by simultaneously emitting light). In addition, the light-emitting element of this example is further provided with a layer containing a light-emitting substance that exhibits a gentle peak-shaped emission spectrum with little change in emission intensity in the wavelength band of 450 to 550 nm, and Ir (FdpqtH) ₂ (acac) White light can also be obtained by forming a layer provided between the electrodes so that the luminescent material and the luminescent material emit light simultaneously.

4A and 4B illustrate one embodiment of a light-emitting device of the present invention. 4A and 4B illustrate a light-emitting device to which the present invention is applied. FIG. 6 illustrates a circuit included in a light-emitting device to which the present invention is applied. The top view of the light-emitting device to which this invention is applied. 4A and 4B illustrate a frame operation of a light-emitting device to which the present invention is applied. Sectional drawing of the light-emitting device to which this invention is applied. 4A and 4B illustrate a light-emitting device to which the present invention is applied. The figure of the electronic device to which this invention is applied. The chart obtained by analyzing by ¹ H-NMR of the organometallic complex synthesized in Synthesis Example 1. FIG. 6 shows an absorption spectrum and an emission spectrum of an organometallic complex synthesized in Synthesis Example 1. 4A and 4B illustrate a method for manufacturing the light-emitting element of Example 1. FIG. FIG. 6 shows current density-luminance characteristics when the light emitting device of Example 2 is operated. FIG. 6 is a diagram illustrating voltage-luminance characteristics when the light emitting device of Example 2 is operated. FIG. 6 shows luminance-current efficiency characteristics when the light-emitting device of Example 2 is operated. FIG. 6 shows an emission spectrum obtained when the light emitting device of Example 2 is operated. The chart obtained by analyzing by ¹ H-NMR of the organometallic complex of the present invention synthesized in Synthesis Example 2. 10A and 10B show an absorption spectrum and an emission spectrum of an organometallic complex synthesized in Synthesis Example 2. The chart obtained by analyzing by ¹ H-NMR of the organometallic complex of the present invention synthesized in Synthesis Example 3. FIG. 6 shows an absorption spectrum and an emission spectrum of an organometallic complex synthesized in Synthesis Example 3. The chart obtained by analyzing by ¹ H-NMR of the organometallic complex of the present invention synthesized in Synthesis Example 4. FIG. 6 shows an absorption spectrum and an emission spectrum of an organometallic complex synthesized in Synthesis Example 4. The chart obtained by analyzing by ¹ H-NMR of the organometallic complex of the present invention synthesized in Synthesis Example 5. FIG. 10 shows an absorption spectrum and an emission spectrum of an organometallic complex synthesized in Synthesis Example 5. 8A and 8B illustrate a method for manufacturing the light-emitting elements of Examples 3 and 4. FIG. FIG. 10 shows current density-luminance characteristics when the light-emitting device of Example 3 is operated. FIG. 10 is a graph illustrating voltage-luminance characteristics when the light-emitting device of Example 3 is operated. FIG. 6 is a graph showing luminance-current efficiency when the light-emitting device of Example 3 is operated. FIG. 10 shows an emission spectrum obtained when the light-emitting device of Example 3 is operated. FIG. 10 shows current density-luminance characteristics when the light-emitting device of Example 4 is operated. FIG. 10 is a graph illustrating voltage-luminance characteristics when the light-emitting device of Example 4 is operated. FIG. 10 is a graph showing luminance-current efficiency when the light-emitting device of Example 4 is operated. FIG. 10 shows an emission spectrum obtained when the light-emitting device of Example 4 is operated. FIG. 10 shows current density-luminance characteristics when the light-emitting device of Example 5 is operated. FIG. 10 shows voltage-luminance characteristics when the light-emitting device of Example 5 is operated. FIG. 11 is a graph showing luminance-current efficiency when the light-emitting device of Example 5 is operated. FIG. 10 shows an emission spectrum obtained when the light-emitting device of Example 5 was operated.

Explanation of symbols

DESCRIPTION OF SYMBOLS 10 Substrate 11 Transistor 12 Light emitting element 13 1st electrode 14 2nd electrode 15 Layer 16 Interlayer insulation film 17 Wiring 18 Partition layer 19 Interlayer insulation film 101 1st electrode 102 2nd electrode 111 Hole injection layer 112 Hole Transport layer 113 Light emitting layer 114 Electron transport layer 115 Electron injection layer 121 Blocking layer 301 Substrate 302 First electrode 303 First layer 304 Second layer 305 Third layer 306 Fourth layer 307 Fifth layer 308 Second 6th layer 309 2nd electrode 401 Substrate 402 1st electrode 403 1st layer 404 2nd layer 405 3rd layer 406 4th layer 407 5th layer 408 2nd electrode 501 subframe 502 sub Frame 503 Subframe 504 Subframe 901 Transistor 902 Transistor 903 Light emitting element 911 Gate signal line 912 Source signal line 91 Write gate signal line drive circuit 914 Erase gate signal line drive circuit 915 Source signal line drive circuit 916 Power supply 917 Current supply line 918 Switch 919 Switch 920 Switch 1001 Transistor 1002 Transistor 1003 Gate signal line 1004 Source signal line 1005 Current supply line 1006 electrode 1901 substrate 1902 electrode 1904 partition layer 1905 light emitting layer 1906 electrode 1907 substrate 501a writing period 501b holding period 502a writing period 502b holding period 503a writing period 503b holding period 504a writing period 504b holding period 504c erasing period 504d non-light emitting period 5521 main body 5522 Case 5523 Display portion 5524 Keyboard 5531 Display portion 5532 Case 5533 Speaker 5551 Display portion 5552 Body 5553 Antenna 5554 Audio output unit 5555 Audio input unit 5556 Operation switch 6500 Substrate 6503 FPC
6504 Printed Wiring Board (PWB)
6511 Pixel portion 6512 Source signal line drive circuit 6513 Write gate signal line drive circuit 6514 Erase gate signal line drive circuit

Claims (8)

An organometallic complex represented by the general formula (2).

^(Wherein, R 3, ^{R 4} are each hydrogen, A alkyl group, a halogen group, -CF _3, alkoxy group, and an aryl group. Further, M represents a Group 9 element or a Group 10 element L represents a monoanionic ligand, n is n = 2 when M is a Group 9 element, and n is 1 when M is a Group 10 element.) An organometallic complex represented by the general formula (4).

^(Wherein, R 7, ^{R 8} each represent hydrogen, an alkyl group having a carbon number of 1-4, a halogen group, -CF _3, alkoxy group having 1 to 4 carbon atoms, or a phenyl group. Further, L represents a monoanionic ligand.) An organometallic complex represented by the general formula (6).

^(Wherein, R 13 ^{to R 16} are each hydrogen, A alkyl group, a halogen group, -CF _3, alkoxy group, and an aryl group. Further, M represents a Group 9 element or a Group 10 element L represents a monoanionic ligand, n is n = 2 when M is a Group 9 element, and n is 1 when M is a Group 10 element.) An organometallic complex represented by the general formula (8).

^(Wherein, R 21 ^{to R 24} each represents hydrogen, an alkyl group having a carbon number of 1-4, a halogen group, -CF _3, alkoxy group having 1 to 4 carbon atoms, or a phenyl group. Further, L represents a monoanionic ligand.) An organometallic complex represented by the general formula (10).

^(Wherein, R 31 ^{to R 36} are each hydrogen, A alkyl group, a halogen group, -CF _3, represents any one of an alkoxy group. Further, M represents a Group 9 element or a Group 10 element. L represents a monoanionic ligand, n is n = 2 when M is a Group 9 element, and n is 1 when M is a Group 10 element.) An organometallic complex represented by the general formula (12).

^(Wherein, R 43 ^{to R 48} each represents hydrogen, an alkyl group having a carbon number of 1-4, a halogen group, -CF _3, one of the alkoxy group having 1 to 4 carbon atoms. Further, L is mono- Represents an anionic ligand.) The monoanionic ligand is a ligand represented by any one of structural formulas (1) to (7). The organometallic complex described in 1.
An organometallic complex represented by the general formula (13).

(In the formula, R ⁶¹ and R ⁶² each represent hydrogen or fluorine. M represents iridium or platinum. L is represented by any one of structural formulas (36) to (38). Represents a ligand, n is n = 2 when M is iridium and n = 1 when M is platinum.