JP5109318B2 - Method for producing organic EL display using optical transfer sheet - Google Patents

Description

The present invention relates to an optical transfer sheet having a diffraction grating for extracting light from a light emitting layer of organic electroluminescence (organic EL), a manufacturing method thereof, and a manufacturing method of a stamper used therefor.

In recent years, liquid crystal displays have been actively used as display units for mobile phones, personal computers, and the like.

Since the liquid crystal display is a non-light emitting element, there is a limit to brightness, and further improvement in brightness is demanded from the market.
Therefore, an organic electroluminescence (organic EL) display body, which is a self-luminous element that can be expected to have further brightness, has attracted attention.

4 and 5 are cross-sectional views for explaining the structure and manufacturing method of an organic electroluminescence (organic EL) display.

In FIG. 4, 130 is a lower electrode, 120 is an organic EL material, 110 'is an upper electrode (ITO transparent electrode), 100 is a base material, and 140' is a diffraction grating layer.

As a method for manufacturing an organic electroluminescence (organic EL) display, first, the upper electrode material 110 is laminated on the base material 100 using a high-temperature process such as sputtering or vapor deposition. (See Fig. 4 (b))

The invention according to claim 2 is a method of manufacturing an organic EL display using an optical transfer sheet,
The optical transfer sheet is a step of forming a diffraction grating layer precursor layer for coating an ionizing radiation curable acrylic resin on a substrate and forming a diffraction grating layer precursor layer,
A grating pattern forming step for pressing a stamper on the diffraction grating layer precursor layer and forming a grating pattern on the diffraction grating layer precursor layer;
Ionizing radiation irradiation step for forming the diffraction grating layer by irradiating the grating pattern with ionizing radiation and curing the ionizing radiation curable acrylic resin;
An optical transfer sheet having a stamper removing step for removing the stamper,
The method for producing an organic EL display using an optical transfer sheet, wherein the ionizing radiation is an electron beam having a wavelength region of 100 nm or less.

Next, the organic EL material 120 is laminated on the upper electrode 110 ′ by using a spin coating method, a vapor deposition method, or the like to form a light emitting layer. (See Fig. 4 (d))

Next, the lower electrode 120 is formed by laminating a metal having a low work function, for example, magnesium, aluminum, lithium or the like, or an alloy of these metals on the organic EL material 120 by using a high temperature process such as vapor deposition or sputtering. Form. (See Fig. 4 (e))

Next, an ionizing radiation curable resin 140 such as an ultraviolet thermosetting silicone resin is formed on the surface of the substrate 100 opposite to the surface on which the upper electrode 110 ′ is formed using a die coating method, a screen printing method, or the like. Are laminated. (See Fig. 4 (f))

Finally, the stamper formed with a pattern complementary to the desired diffraction grating pattern is irradiated with ionizing radiation while being pressed against the ionizing radiation curable resin 140, and then the stamper is removed, whereby organic electroluminescence ( Organic EL) display is obtained. (See FIG. 4G) (see Patent Document 1)

Moreover, as a manufacturing method different from the above manufacturing method of the organic electroluminescence (organic EL) display, first, an ultraviolet thermosetting silicone resin or the like is formed on the substrate 1000 by using a die coating method, a screen printing method, or the like. The ionizing radiation curable resin 1100 is laminated. (See FIG. 5 (b))

Next, the stamper formed with a pattern complementary to the desired diffraction grating pattern is irradiated with ionizing radiation while being pressed against the ionizing radiation curable resin 1100, and then the stamper is removed, whereby the diffraction grating layer 1100 is removed. ′ Is formed. (See Fig. 5 (c))

Next, the upper electrode material 1200 is laminated on the surface of the substrate 1000 opposite to the surface on which the diffraction grating layer 500 ′ is formed using a high-temperature process such as sputtering or vapor deposition. (See Fig. 5 (d))

Next, the upper electrode 1200 ′ is formed by patterning the upper electrode material 1200 into a desired shape using a photolithography method or the like. (See Fig. 5 (e))

Next, the organic EL material 1300 is stacked on the upper electrode 1200 ′ by using a spin coat method, a vapor deposition method, or the like to form a light emitting layer. (See FIG. 5 (f))

Next, a lower electrode 1400 is formed by laminating a metal having a low work function, for example, magnesium, aluminum, lithium, or an alloy of these metals on the organic EL material 1300 by vapor deposition, sputtering, or the like. An organic electroluminescence (organic EL) display is obtained. (See FIG. 5 (g)) (see Patent Document 2)

Japanese Patent No. 3800182 Japanese Patent No. 3711682

However, in the former manufacturing method, when the stamper is pressed, a load is applied to the upper electrode and the organic EL material, which may be destroyed.
In the latter manufacturing method, when the upper electrode, the organic EL material and the lower electrode are formed using a high temperature process, the uneven shape of the diffraction grating layer made of resin may be deformed by heat.

An object of the present invention is to provide an optical electroluminescence (organic EL) display for producing an organic electroluminescence (organic EL) display body so as not to apply a load due to a stamper press to an electrode or an organic EL material and to apply a high temperature load to a diffraction grating layer. It is to provide a transfer sheet, a manufacturing method thereof, and a stamper used therefor.

The invention according to claim 1 is a method for producing an organic EL display using an optical transfer sheet, wherein the optical transfer sheet is a polyester resin or a polycarbonate resin having a refractive index of 1.45 or more and less than 1.75. A step of forming a diffraction grating layer precursor layer to form a diffraction grating layer precursor layer by coating an ionizing radiation curable acrylic resin with a paste diluted to a solid content of 40 to 50% on a base material made of A step of pressing a stamper on the layer precursor layer, and forming a diffraction grating pattern on the diffraction grating layer precursor layer; irradiating the diffraction grating pattern with ionizing radiation; and Ionizing radiation irradiation step for forming the diffraction grating layer by curing, and a stamper removal step for removing the stamper A copy sheet, the ionizing radiation is a method for producing an organic EL display using the optical transfer sheet, which is a 200 to 300 [nm ultraviolet wavelength region of.

The invention according to claim 2 is a method for producing an organic EL display using an optical transfer sheet, wherein the optical transfer sheet is a polyester resin or a polycarbonate resin having a refractive index of 1.45 or more and less than 1.75. A step of forming a diffraction grating layer precursor layer for coating a base material comprising an ionizing radiation curable acrylic resin with a paste diluted to a solid content of 40 to 50% to form a diffraction grating layer precursor layer; By pressing a stamper on the precursor layer, forming a grating pattern on the diffraction grating layer precursor layer, irradiating the grating pattern with ionizing radiation, and curing the ionizing radiation curable acrylic resin An optical transfer sheet having an ionizing radiation irradiating step for forming the diffraction grating layer and a stamper removing step for removing the stamper. Te, wherein the ionizing radiation is a method for producing an organic EL display using the optical transfer sheet, characterized in that an electron beam of a wavelength range of not less 50 nm.

As a material for the first release layer, a material mainly composed of an acrylic resin and a silicone resin can be used.
In order to adjust the peel strength of the first release layer from the diffraction grating layer (ionizing radiation curable acrylic resin), the component amounts of the acrylic resin and the silicone resin are adjusted.

As the first release substrate, a polyester resin or a polyolefin resin can be used, and it is optimal to use polyethylene terephthalate from the viewpoint of securing adhesiveness with the acrylic resin contained in the first release layer.

As the substrate, a polyester resin or a polycarbonate resin can be used, and it is optimal to use polyethylene terephthalate from the viewpoint of securing adhesiveness with the diffraction grating layer (ionizing radiation curable acrylic resin).

As the material of the adhesive layer, a resin mainly composed of an acrylic resin, for example, an acrylic resin such as a (meth) acrylic ester resin, a tackifier, for example, rosin, dammar, a polyterpene resin, a petroleum resin , Cyclopentadiene resins, phenol resins, styrene resins, xylene resins, phenol resins, xylene resins, coumarone-indene resins, etc., and anti-aging agents, softening if necessary A resin to which an agent, a filler or the like is added can be used.

As a material for the second release layer, a material mainly composed of an acrylic resin and a silicone resin can be used.
In order to adjust the peel strength from the adhesive layer of the second release layer, the component amounts of the acrylic resin and the silicone resin are adjusted.

As a material for the second release substrate, a polyester resin or a polyolefin resin can be used, and polyethylene terephthalate is preferably used from the viewpoint of securing adhesiveness with the acrylic resin contained in the second release layer.

The refractive index of the diffraction grating layer is larger than the refractive index of air (n = 1.0), and the refractive index of the light extraction side electrode of the organic EL (the refractive index n of ITO widely used as the light extraction side electrode of the organic EL n = 1.9) is required, and n = 1.45 or more and less than 1.75 is preferable.

In the invention according to claim 2, the first release substrate is made of a polyester resin or a polyolefin resin,
The first release layer is mainly composed of an acrylic resin and a silicone resin,
Adhesive strength (180 ° peeling) between the first peeling layer and the diffraction grating layer measured at 20 to 25 ° C. and under a relative humidity of 60 to 70% measured using the method of JIS K-6854 is 2 × 10 The optical transfer sheet according to claim 1, wherein the transfer sheet is ^{5 to} 6 × 10 ⁵ Pa.

The adhesive strength between the first release layer and the diffraction grating layer needs to be smaller than the adhesive strength between the first release layer and the first release substrate, and is 2 × 10 ^{5 to} 6 × 10. ⁵ Pa is preferable, but it is more preferable if it is 3 × 10 ^{5 to} 5 × 10 ⁵ Pa while suppressing variations in handling.

The refractive index of the substrate is larger than the refractive index of air (n = 1.0), and the refractive index of the organic EL light extraction side electrode (the refractive index n = 1 of ITO widely used as the organic EL light extraction side electrode). .9) must be smaller than n, and preferably n = 1.45 or more and less than 1.75.

The refractive index of the adhesive layer is larger than the refractive index of air (n = 1.0), and the refractive index of the organic EL light extraction side electrode (the refractive index n = 1 of ITO widely used as the organic EL light extraction side electrode). .9) must be smaller than n, and preferably n = 1.45 or more and less than 1.75.

The adhesive strength between the second release layer and the adhesive layer may be smaller than the adhesive strength between the adhesive layer and the substrate, but from the viewpoint of peelability, 2 × 10 ^{5 to} 6 × 10 ⁵ Pa is required. preferable.

A method of manufacturing a stamper for forming a grating layer, a photoresist application step of applying a photoresist on a substrate for a stamper, exposing the full photoresists, followed by developing, the diffraction grating layer and the photoresist is exposed and developed to form a grid pattern and a phase complementary resist pattern having, on les resist pattern by sputtering, and the conductive layer forming step for forming a conductive layer made of Ni, using plating method, a plating process for forming a Ni layer on the conductive layer, that having a step of removing the substrate and photoresists for scan Tampa.

As the stamper substrate, an inorganic material having a smooth surface such as a glass plate can be used.
A positive resist can be used as the photoresist.
A positive resist is easier to process with a high-definition pattern than a negative resist.

As a coating method of the ionizing radiation curable acrylic resin on the substrate, a die coating method, a spin coating method, a screen printing method, a bar coating method, a gravure coating method, or the like can be used.

As a coating method of the ionizing radiation curable acrylic resin on the substrate, a die coating method, a spin coating method, a screen printing method, a bar coating method, or the like can be used.

By using this for the manufacture of an organic electroluminescence (organic EL) display body, organic electroluminescence (organic) is applied without applying a load due to stamper pressing to the electrode or the organic EL material, and without applying a high temperature load to the diffraction grating layer. EL) A display body can be manufactured.

Thereby, when separating the first release substrate from the diffraction grating layer, the first release layer can be removed together with the first release substrate without leaving the first release layer on the diffraction grating layer. .

The refractive index of the base material is larger than the refractive index of air (n = 1.0), and the refractive index of the organic EL light extraction side electrode (the refractive index of ITO widely used as the organic EL light extraction side electrode n = By making it smaller than 1.9), the reflection of the light emitted from the organic EL layer can be suppressed, and the light extraction efficiency from the organic electroluminescence (organic EL) display can be increased.

The refractive index of the adhesive layer is larger than the refractive index of air (n = 1.0), the refractive index of the organic EL light extraction side electrode (the refractive index n of ITO widely used as the organic EL light extraction side electrode = By making it smaller than 1.9), the reflection of the light emitted from the organic EL layer can be suppressed, and the light extraction efficiency from the organic electroluminescence (organic EL) display can be increased.

Thereby, when separating the second release substrate from the adhesive layer, the second release layer can be removed together with the second release substrate without leaving the second release layer on the adhesive layer.

By manufacturing the stamper in this manner, a stamper excellent in transferability and durability can be manufactured at low cost.

By using ultraviolet rays having a wavelength region of 100 to 380 nm as the ionizing radiation, a diffraction grating layer having a fine pattern of 1 μm or less can be produced in a short time at a low cost.

By using an electron beam having a wavelength region of 100 nm or less as the ionizing radiation, a diffraction grating layer having a fine pattern of 1 μm or less can be produced in a short time at a low cost.

First, the structure of the optical transfer sheet of the present invention will be described with reference to FIG.

13 is a first release substrate, 12 is a first release layer, 11 ″ is a diffraction grating layer, 10 is a base material, 14 is an adhesive layer, 15 is a second release layer, and 16 is a second release substrate. is there.

Next, the manufacturing method of the optical transfer sheet of the present invention and the manufacturing method of the stamper used therefor will be described with reference to FIG.

First, a glass plate is used as the stamper substrate 1, and a positive photoresist 2 is applied on the glass plate. (See Fig. 1 (b))

The positive type resist has a higher resolution than the negative type resist and is suitable as a material used for a stamper that requires high definition as in the present invention.

In order to improve the adhesion between the photoresist 2 and the glass plate (stamper substrate 1), the surface of the glass plate (stamper substrate 1) may be subjected to vapor treatment with HMDS (hexamethyldisilazane).

Next, by exposing the photoresist 2 at the diffraction limit using a laser (for example, a HeCd laser (wavelength 442 nm) or the like) and an optical mask (NA (numerical aperture) is 0.89 to 0.91). Then, the positive photoresist 2 is solubilized. (See Fig. 1 (c))

Next, the solubilized photoresist 2 'is removed (developed) using an alkaline solution. (See Fig. 1 (d))

Next, a Ni conductive layer 3 is formed on the photoresist 2 ″ by sputtering. (See Fig. 1 (e))

Next, the Ni plating layer 4 is formed on the Ni conductive layer 3 by using a plating method using the Ni conductive layer 3 as an electrode. (See Fig. 1 (f))

Next, the stamper 5 is obtained by removing the stamper substrate 1 and the photoresist 2 ″. (See Fig. 1 (g))

Next, a paste 11 mainly composed of an ionizing radiation curable acrylic resin is laminated on the substrate 10. (See Fig. 2 (b))

As paste 11 having ionizing radiation curable acrylic resin as a main component, paste obtained by diluting ultraviolet curable acrylic resin or electron beam curable acrylic resin to a solid content of 40 to 50% using a solvent such as methyl ethyl ketone (MEK). Can be used.

As the substrate 10, a polyester resin having a refractive index of 1.45 or more and less than 1.75 or a polycarbonate resin having a refractive index of 1.45 or more and less than 1.75 can be used.

The refractive index of the substrate 10 is larger than the refractive index of air (n = 1.0), and the refractive index of the organic EL light extraction side electrode (the refractive index n of ITO widely used as the organic EL light extraction side electrode = By making it smaller than 1.9), the reflection of the light emitted from the organic EL layer can be suppressed, and the light extraction efficiency from the organic electroluminescence (organic EL) display can be increased.

Polyester resin and polycarbonate resin have high mechanical strength, and have a light transmittance in the visible light region of 450 to 600 nm of 80 to 97%. It is suitable as a material used for an electroluminescence (organic EL) display.

As a method for laminating the paste 11 containing ionizing radiation curable acrylic resin as a main component on the substrate 10, a known die coating method, spin coating method, screen printing method, bar coating method, gravure coating method, or the like may be used. it can.

Next, the stamper 5 is pressed against the paste 11 whose main component is an ionizing radiation curable acrylic resin to form a diffraction grating pattern 11 ′. (See FIG. 2 (c))

Next, the diffraction grating layer 11 ″ is formed by irradiating the diffraction grating pattern 11 ′ with ionizing radiation. (See Fig. 2 (d))

As the ionizing radiation, ultraviolet rays having a wavelength region of 100 to 380 nm or electron beams having a wavelength region of 100 nm or less can be used.
By using the ultraviolet ray and the electron beam, a diffraction grating layer having a fine pattern of 1 μm or less can be produced in a short time and at a low cost.

In the case of irradiating ultraviolet rays, a carbon arc, a metal halide lamp, an ultrahigh pressure mercury lamp, a high pressure mercury lamp, a low pressure mercury lamp, or the like is used, and the ultraviolet rays are irradiated in a wavelength region of 100 to 380 nm, preferably 200 to 300 nm.

When irradiating with an electron beam, various electron beam accelerators such as a dynamitron type, a linear type, a cockroft Walton type, a bandegraph type, a resonant transformer type, an insulated core transformer type, a high frequency type, etc. are used, preferably 100 nm or less, preferably An electron beam is irradiated in a wavelength region of 50 nm or less.

Next, the stamper 5 is removed. (See Fig. 2 (e))

Next, the 1st peeling layer 12 and the 1st peeling substrate 13 are laminated | stacked on the diffraction grating layer 11 ''. (See FIG. 2 (f) and FIG. 3 (g))

As a material for the first release layer 12, a paste in which a silicone resin is added to an acrylic resin can be used.

By adding a silicone resin to the acrylic resin, the peel strength between the diffraction grating layer 11 ″ and the first release layer 12 can be adjusted.

Adhesive strength (180 ° peeling) between the diffraction grating layer 11 ″ and the first peeling layer 12 (according to JIS K-6854, 20 to 25 ° C., relative humidity 60 to 70% lower) is 2 × 10 ^5. ˜6 × 10 ⁵ Pa is preferred.
By doing so, when the first release substrate 13 is separated from the diffraction grating layer 11 ″, the first release substrate 13 is not left on the diffraction grating layer 11 ″. Can be separated and removed together.

As the material of the first release substrate 13, a polyester resin or a polyolefin resin can be used, and it is preferable to use polyethylene terephthalate from the viewpoint of securing adhesiveness with the acrylic resin contained in the first release layer.

As a laminating method, a known wet laminating method in which the first release substrate 13 is laminated on the paste immediately after applying a paste obtained by adding a silicone resin to an acrylic resin on the diffraction grating layer 11 ″ is used. be able to.

Next, the adhesive layer 14 is laminated on the surface of the substrate 10 opposite to the surface on which the diffraction grating layer 11 ″ is formed. (See Fig. 3 (h))

As a method for laminating the adhesive layer 14, a resin mainly composed of an acrylic resin, for example, an acrylic resin such as a (meth) acrylic ester resin, a tackifier, for example, rosin, dammar, polyterpene resin, petroleum Resin, cyclopentadiene resin, phenol resin, styrene resin, xylene resin, phenol resin, xylene resin, coumarone-indene resin, etc., and an anti-aging agent if necessary , A resin added with a softening agent, a filler, etc., on the surface of the substrate 10 opposite to the surface on which the diffraction grating layer 11 ″ is formed, a known die coating method, spin coating method, screen printing method, bar coating method, A lamination method such as a gravure coating method can be used.

Next, the second release layer 15 is laminated on the second release substrate 16. (See Fig. 3 (i))

As a material for the second release layer 15, a paste in which a silicone resin is added to an acrylic resin can be used.

By adding a silicone resin to the acrylic resin, the peel strength between the adhesive layer 14 and the second release layer 15 can be adjusted.

As a method of laminating the second release layer 15 on the second release substrate 16, a paste obtained by adding a silicone resin to an acrylic resin is used as a known die coating method, spin coating method, screen printing method, bar coating method, gravure method. A lamination method such as a coating method can be used.

Finally, the pressure-sensitive adhesive layer 14 and the second release layer 15 are pressure-bonded to obtain an optical transfer sheet. (See FIG. 3 (j) and FIG. 3 (k))

First, the surface of a glass plate (manufactured by Corning, 1737 (trade name)) was cleaned with an automatic cleaning device manufactured by Shimada Rika Co., Ltd., and then this glass plate was HMDS (hexamethyldisilazane) (Tokyo) A vapor treatment was performed for 2 minutes at 90 ° C. using steam produced by Oka Kogyo Co., Ltd. (OAP (trade name)).

Next, a photoresist (positive type photoresist) (manufactured by Tokyo Ohka Kogyo Co., Ltd., OFPR-800 (trade name)) is applied to the vapor treated surface of the glass plate at 4000 rpm for 30 seconds using a spin coater manufactured by Yuasa. The film was applied so that the film thickness was in the range of 3 ± 1 μm under the above spin coating conditions, and then pre-baked for 50 minutes at 90 ° C. in a clean oven manufactured by DAITRON.

Next, using a laser interference exposure apparatus, the wavelength is incident on the pre-baked photoresist at an incident angle of 40 degrees from three directions through an optical system mask (NA (numerical aperture) 0.90) having a predetermined pattern. Exposure was performed by irradiation with a 442 nm HeCd laser.

Next, using a 0.3% tetramethylammonium aqueous solution, development processing was performed at 25 ° C. for 60 seconds, and then rinse treatment with ultrapure water was performed for 25 seconds, followed by drying.

Next, in a DC parallel plate type magnetron sputtering apparatus (Va-Rian, XM-8 (trade name)), an initial vacuum is formed by using a Ni target as a sputtering target and an Ar gas having a pressure of 0.3 Pa as a sputtering gas. A Ni conductive layer having a thickness of 600 mm was formed on the photoresist by sputtering Ni at a degree of 5 × 10 ⁻³ Pa and an RF power of 300 W.

Next, the following Ni plating solution was produced.
Nickel sulfamate tetrahydrate ... 500g / L
Boric acid ... 37g / L
pH ... 3.8

Next, the Ni conductive layer is dipped in the Ni plating solution kept at 40 ° C., and plated under the condition of an energization current time integral value of 300 AH, whereby a thickness of 300 μm is formed on the Ni conductive layer. A nickel plating film was formed.

Next, the stamper was obtained by removing the stamper substrate and the photoresist.

Next, a paste obtained by diluting UV curable acrylic monomer R128H (trade name) (manufactured by Nippon Kayaku Co., Ltd.) to a solid content of 45% by mass using methyl ethyl ketone (MEK) was added to a 25 μm thick polyethylene terephthalate film (Lumirror T60). (Product Name)) Using a bar coater (made by Toray Industries, Inc.), a film thickness of 3 ± 1 μm was applied, and then dried at 90 ° C. for 5 minutes.

Next, after applying the pressure of 1 MPa on the application surface of the ultraviolet curable acrylic resin R128H (trade name) (manufactured by Nippon Kayaku Co., Ltd.) for 1 minute, the polyethylene terephthalate film (Lumirror T60 (product) Name)) A diffraction grating layer is formed by irradiating ultraviolet rays having a wavelength of 250 nm with energy of 750 mJ / cm ² from the surface opposite to the stamper pressure contact surface (made by Toray Industries, Inc.) to cure the ultraviolet curable acrylic resin. Then, the stamper was removed.

Next, a peeling varnish 45-3 (trade name) (manufactured by Showa Ink Co., Ltd.) mainly composed of an acrylic resin and a silicone resin is diluted with methyl ethyl ketone (MEK) so as to have a solid content of 10% by mass. After coating on the diffraction grating layer using a roll coating method and drying methyl ethyl ketone (MEK), a polyethylene terephthalate film (NSC (trade name)) having a thickness of 12 μm on the coating surface (manufactured by Teijin DuPont Films Ltd.) ).

Next, an acrylic pressure-sensitive adhesive (FINETAC SPS-1016 (product) is formed on the surface opposite to the diffraction grating layer forming surface of the polyethylene terephthalate film (Lumirror T60 (product name)) (manufactured by Toray Industries, Inc.) having a thickness of 25 μm. Name)) A mixed solution of 100 parts by weight (manufactured by Dainippon Ink Chemical Co., Ltd.) and 1 part by weight of a crosslinking agent (DN-750-45 (trade name)) (manufactured by Dainippon Ink Chemical Co., Ltd.) is applied, and 100 ° C. And dried for 5 minutes to form a 40 μm thick adhesive layer.

Next, a peeling varnish 45-3 (trade name) (manufactured by Showa Ink Co., Ltd.) mainly composed of an acrylic resin and a silicone resin is diluted with methyl ethyl ketone (MEK) so as to have a solid content of 10% by mass. It is applied on a polyethylene terephthalate film (NSC (trade name)) (manufactured by Teijin DuPont Films Co., Ltd.) having a thickness of 12 μm by using a roll coating method, and then methyl ethyl ketone (MEK) is dried. An optical transfer sheet was obtained by pressure bonding the layers.

Next, using a tensile tester (manufactured by Toyo Holdin Co., Ltd., Tensilon UTM-m-50 (trade name)) in accordance with JIS K-6854, the first release substrate at 23 ° C. and 65% relative humidity When the adhesive strength (180 ° peeling) of the diffraction grating layer was measured, the adhesive strength was 3 × 10 ⁵ Pa.

Next, using a tensile tester (Tensilon UTM-m-50 (trade name) manufactured by Toyo Holdings Co., Ltd.), the second release substrate is compliant with JIS K-6854 at 23 ° C. and 65% relative humidity. When the adhesive strength (180 ° peeling) of the adhesive layer was measured, the adhesive strength was 5 × 10 ⁵ Pa.

Next, when the refractive index of the diffraction grating layer in the wavelength region of 590 nm was measured using a spectrophotometer (manufactured by JASCO Corporation, V-550 (trade name)), the refractive index was 1.53. It was.

Next, when the refractive index of the base material (polyethylene terephthalate) in the wavelength region of 590 nm was measured using a spectrophotometer (manufactured by JASCO Corporation, V-550 (trade name)), the refractive index was 1. 59.

Next, when the refractive index of the adhesive layer in the wavelength region of 590 nm was measured using a spectrophotometer (manufactured by JASCO Corporation, V-550 (trade name)), the refractive index was 1.51. .

First, a polyethylene terephthalate film having a thickness of 25 μm was prepared by using a paste obtained by diluting an electron beam curable acrylic resin (X-585-954M (trade name), manufactured by Seiden Chemical Co., Ltd.) to a solid content of 45% by mass using methyl ethyl ketone (MEK). (Lumirror T60 (trade name)) (manufactured by Toray Industries, Inc.) (refractive index 1.57) was applied to a film thickness of 4 μm using a bar coater, and then dried at 90 ° C. for 5 minutes.

Next, after press-contacting the stamper used in Example 1 on the application surface of the electron beam curable acrylic resin (X-585-954M (trade name) manufactured by Seiden Chemical Co., Ltd.) under a pressure of 1 MPa for 1 minute. From the back surface of the polyethylene terephthalate film (Lumirror T60 (trade name)) (manufactured by Toray Industries, Inc.), an electron beam accelerator is used to irradiate an electron beam having an acceleration voltage of 200 keV and a wavelength of 90 nm to cure the electron beam. The diffraction grating layer was formed by curing the type acrylic resin, and then the stamper was removed.

Next, a release varnish 45-3 (trade name) (manufactured by Showa Ink Co., Ltd.) mainly composed of an acrylic resin and a silicone resin is diluted with a solvent so as to have a solid content of 10% by mass. On the layer, a roll coating method was applied and the solvent was dried. Then, a polyethylene terephthalate film (NSC (trade name)) (manufactured by Teijin DuPont Films Co., Ltd.) having a thickness of 12 μm was laminated on the coating surface by pressure bonding.

Next, an acrylic pressure-sensitive adhesive (FINETAC SPS-1016 (product) is formed on the surface opposite to the diffraction grating layer forming surface of the polyethylene terephthalate film (Lumirror T60 (product name)) (manufactured by Toray Industries, Inc.) having a thickness of 25 μm. Name)) A mixed solution of 100 parts by weight (manufactured by Dainippon Ink Chemical Co., Ltd.) and 1 part by weight of a crosslinking agent (DN-750-45 (trade name)) (manufactured by Dainippon Ink Chemical Co., Ltd.) is applied, and 100 ° C. And dried for 5 minutes to form a 40 μm thick adhesive layer.

Next, a peeling varnish 45-3 (trade name) (manufactured by Showa Ink Co., Ltd.) mainly composed of an acrylic resin and a silicone resin is diluted with methyl ethyl ketone (MEK) so as to have a solid content of 10% by mass. It is applied on a polyethylene terephthalate film (NSC (trade name)) (manufactured by Teijin DuPont Films Co., Ltd.) having a thickness of 12 μm by using a roll coating method, and then methyl ethyl ketone (MEK) is dried. An optical transfer sheet was obtained by pressure bonding the layers.

Next, when the adhesive strength between the first release substrate and the diffraction grating layer was measured using the same measurement method as in Example 1, the adhesive strength was 4 × 10 ⁵ Pa.

Next, when the adhesive strength between the second release substrate and the adhesive layer was measured using the same measurement method as in Example 1, the adhesive strength was 5 × 10 ⁵ Pa.

Next, when the refractive index of the diffraction grating layer was measured using the same measurement method as in Example 1, the refractive index was 1.54.

Next, when the refractive index of the base material (polyethylene terephthalate) was measured using the same measurement method as in Example 1, the refractive index was 1.59.

Next, when the refractive index of the adhesion layer was measured using the measuring method similar to Example 1, the refractive index was 1.51.

The optical transfer sheet of the present invention, the manufacturing method thereof, and the manufacturing method of the stamper used therefor are various display devices such as organic EL display devices and inorganic EL display devices, and commercial displays such as signboards and neon using them. Available to:

It is sectional drawing for demonstrating the manufacturing method of the optical transfer sheet of this invention, and the manufacturing method of the stamper used for it. It is sectional drawing for demonstrating the structure of the optical transfer sheet of this invention. It is sectional drawing for demonstrating the structure of the optical transfer sheet of this invention. It is sectional drawing for demonstrating the structure and manufacturing method of the conventional organic electroluminescent (organic EL) display body. It is sectional drawing for demonstrating the structure and manufacturing method of the conventional organic electroluminescent (organic EL) display body.

Explanation of symbols

1 .... Stamper substrate 2 .... Photoresist 2 '... Solubilized photoresist 2 "... Photoresist 3 ... ... Ni conductive layer 4 ... Ni plating layer 5 ... Stamp 10 ... Base material 11 ... Ionizing radiation curable acrylic resin Paste 11 'as a main component ... Diffraction grating pattern 11 "... Diffraction grating layer 12 ... First release layer 13 ... First release substrate 14 ····································································································· '... upper electrode 120 ... organic EL material 130 ... lower electrode 140 ... ionizing radiation curable resin 140' ... Diffraction grating layer 1000 ... Base material 1100 ... Ionizing radiation curable resin 1100 '... Diffraction grating layer 1200 ... ... Upper electrode material 1200' ... Upper electrode 1300 ... Organic EL Material 1400 ··· Lower electrode

Claims (2)

An organic EL display manufacturing method using an optical transfer sheet,
The optical transfer sheet is coated with a paste obtained by diluting an ionizing radiation curable acrylic resin to a solid content of 40 to 50% on a base material made of a polyester resin or a polycarbonate resin having a refractive index of 1.45 or more and less than 1.75 , Forming the diffraction grating layer precursor layer to form the diffraction grating layer precursor layer;
Pressing a stamper on the diffraction grating layer precursor layer, and forming a diffraction grating pattern on the diffraction grating layer precursor layer; and
Ionizing radiation irradiation step for forming the diffraction grating layer by irradiating the diffraction grating pattern with ionizing radiation and curing the ionizing radiation curable acrylic resin;
An optical transfer sheet having a stamper removing step for removing the stamper,
The method for producing an organic EL display using an optical transfer sheet, wherein the ionizing radiation is ultraviolet rays having a wavelength region of 200 to 300 nm. An organic EL display manufacturing method using an optical transfer sheet,
The optical transfer sheet is coated with a paste obtained by diluting an ionizing radiation curable acrylic resin to a solid content of 40 to 50% on a base material made of a polyester resin or a polycarbonate resin having a refractive index of 1.45 or more and less than 1.75 , Forming a diffraction grating layer precursor layer for forming a diffraction grating layer precursor layer;
A grating pattern forming step for pressing a stamper on the diffraction grating layer precursor layer and forming a grating pattern on the diffraction grating layer precursor layer;
Ionizing radiation irradiation step for forming the diffraction grating layer by irradiating the grating pattern with ionizing radiation and curing the ionizing radiation curable acrylic resin;
An optical transfer sheet having a stamper removing step for removing the stamper,
The method for producing an organic EL display using an optical transfer sheet, wherein the ionizing radiation is an electron beam having a wavelength region of 50 nm or less.