JP5232986B2 - Polylactic acid modifier and polylactic acid resin composition. - Google Patents
Polylactic acid modifier and polylactic acid resin composition. Download PDFInfo
- Publication number
- JP5232986B2 JP5232986B2 JP2008103059A JP2008103059A JP5232986B2 JP 5232986 B2 JP5232986 B2 JP 5232986B2 JP 2008103059 A JP2008103059 A JP 2008103059A JP 2008103059 A JP2008103059 A JP 2008103059A JP 5232986 B2 JP5232986 B2 JP 5232986B2
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- Japan
- Prior art keywords
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- polylactic acid
- formula
- compound represented
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- Prior art date
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- 229920000747 poly(lactic acid) Polymers 0.000 title claims description 58
- 239000004626 polylactic acid Substances 0.000 title claims description 57
- 239000011342 resin composition Substances 0.000 title claims description 23
- 239000003607 modifier Substances 0.000 title claims description 20
- 229920000642 polymer Polymers 0.000 claims description 47
- 150000003498 tellurium compounds Chemical class 0.000 claims description 26
- 238000006116 polymerization reaction Methods 0.000 claims description 24
- -1 ditellurium compound Chemical class 0.000 claims description 18
- 125000003118 aryl group Chemical group 0.000 claims description 15
- 239000000203 mixture Substances 0.000 claims description 14
- 239000007869 azo polymerization initiator Substances 0.000 claims description 13
- 125000003107 substituted aryl group Chemical group 0.000 claims description 13
- 125000004209 (C1-C8) alkyl group Chemical group 0.000 claims description 11
- 229920003229 poly(methyl methacrylate) Polymers 0.000 claims description 10
- 239000004926 polymethyl methacrylate Substances 0.000 claims description 10
- 239000004793 Polystyrene Substances 0.000 claims description 9
- 125000006615 aromatic heterocyclic group Chemical group 0.000 claims description 9
- 229920002223 polystyrene Polymers 0.000 claims description 9
- 125000005740 oxycarbonyl group Chemical group [*:1]OC([*:2])=O 0.000 claims description 8
- 239000003505 polymerization initiator Substances 0.000 claims description 8
- 238000004898 kneading Methods 0.000 claims description 6
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 5
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 5
- 125000002252 acyl group Chemical group 0.000 claims description 4
- 125000003368 amide group Chemical group 0.000 claims description 4
- 239000003795 chemical substances by application Substances 0.000 claims description 2
- 150000001875 compounds Chemical class 0.000 description 25
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 21
- 238000006243 chemical reaction Methods 0.000 description 16
- 239000000243 solution Substances 0.000 description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 15
- 239000000178 monomer Substances 0.000 description 14
- 238000000034 method Methods 0.000 description 13
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 12
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 12
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical group C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 11
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 10
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- 239000007789 gas Substances 0.000 description 9
- 230000007062 hydrolysis Effects 0.000 description 8
- 238000006460 hydrolysis reaction Methods 0.000 description 8
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 8
- 238000002834 transmittance Methods 0.000 description 8
- 238000005481 NMR spectroscopy Methods 0.000 description 7
- 239000004372 Polyvinyl alcohol Substances 0.000 description 7
- 238000004458 analytical method Methods 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 7
- JPIIVHIVGGOMMV-UHFFFAOYSA-N ditellurium Chemical class [Te]=[Te] JPIIVHIVGGOMMV-UHFFFAOYSA-N 0.000 description 7
- 229920002451 polyvinyl alcohol Polymers 0.000 description 7
- 239000000047 product Substances 0.000 description 7
- 239000004094 surface-active agent Substances 0.000 description 7
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 6
- 229910052786 argon Inorganic materials 0.000 description 6
- 238000011156 evaluation Methods 0.000 description 6
- 125000005843 halogen group Chemical group 0.000 description 6
- 239000011347 resin Substances 0.000 description 6
- 229920005989 resin Polymers 0.000 description 6
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical class O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 6
- 238000012360 testing method Methods 0.000 description 6
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical group COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 5
- KYIKRXIYLAGAKQ-UHFFFAOYSA-N abcn Chemical compound C1CCCCC1(C#N)N=NC1(C#N)CCCCC1 KYIKRXIYLAGAKQ-UHFFFAOYSA-N 0.000 description 5
- 239000008367 deionised water Substances 0.000 description 5
- 229910021641 deionized water Inorganic materials 0.000 description 5
- 230000035484 reaction time Effects 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- 229910052714 tellurium Inorganic materials 0.000 description 5
- AVTLBBWTUPQRAY-UHFFFAOYSA-N 2-(2-cyanobutan-2-yldiazenyl)-2-methylbutanenitrile Chemical compound CCC(C)(C#N)N=NC(C)(CC)C#N AVTLBBWTUPQRAY-UHFFFAOYSA-N 0.000 description 4
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 4
- WYGWHHGCAGTUCH-UHFFFAOYSA-N 2-[(2-cyano-4-methylpentan-2-yl)diazenyl]-2,4-dimethylpentanenitrile Chemical compound CC(C)CC(C)(C#N)N=NC(C)(C#N)CC(C)C WYGWHHGCAGTUCH-UHFFFAOYSA-N 0.000 description 4
- VFXXTYGQYWRHJP-UHFFFAOYSA-N 4,4'-azobis(4-cyanopentanoic acid) Chemical compound OC(=O)CCC(C)(C#N)N=NC(C)(CCC(O)=O)C#N VFXXTYGQYWRHJP-UHFFFAOYSA-N 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 4
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 125000000217 alkyl group Chemical group 0.000 description 4
- 229920006167 biodegradable resin Polymers 0.000 description 4
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 4
- 125000003754 ethoxycarbonyl group Chemical group C(=O)(OCC)* 0.000 description 4
- 239000004310 lactic acid Substances 0.000 description 4
- 235000014655 lactic acid Nutrition 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 125000001160 methoxycarbonyl group Chemical group [H]C([H])([H])OC(*)=O 0.000 description 4
- SFLRURCEBYIKSS-UHFFFAOYSA-N n-butyl-2-[[1-(butylamino)-2-methyl-1-oxopropan-2-yl]diazenyl]-2-methylpropanamide Chemical compound CCCCNC(=O)C(C)(C)N=NC(C)(C)C(=O)NCCCC SFLRURCEBYIKSS-UHFFFAOYSA-N 0.000 description 4
- 229920000098 polyolefin Polymers 0.000 description 4
- 125000001424 substituent group Chemical group 0.000 description 4
- BIXCBWDGHACUIH-UHFFFAOYSA-N 1-(butylditellanyl)butane Chemical compound CCCC[Te][Te]CCCC BIXCBWDGHACUIH-UHFFFAOYSA-N 0.000 description 3
- DLFVBJFMPXGRIB-UHFFFAOYSA-N Acetamide Chemical compound CC(N)=O DLFVBJFMPXGRIB-UHFFFAOYSA-N 0.000 description 3
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical group [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 229910052783 alkali metal Inorganic materials 0.000 description 3
- 150000001340 alkali metals Chemical class 0.000 description 3
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 3
- 150000001342 alkaline earth metals Chemical class 0.000 description 3
- 125000003545 alkoxy group Chemical group 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 229920001400 block copolymer Polymers 0.000 description 3
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 3
- 229910052794 bromium Inorganic materials 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
- 229910052801 chlorine Inorganic materials 0.000 description 3
- 239000002270 dispersing agent Substances 0.000 description 3
- 239000000499 gel Substances 0.000 description 3
- 239000003999 initiator Substances 0.000 description 3
- 239000011777 magnesium Substances 0.000 description 3
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 3
- 235000019341 magnesium sulphate Nutrition 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 239000000693 micelle Substances 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 230000000704 physical effect Effects 0.000 description 3
- 230000000379 polymerizing effect Effects 0.000 description 3
- 229920001290 polyvinyl ester Polymers 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 239000000725 suspension Substances 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 3
- DRAQBUIVUGPBEB-UHFFFAOYSA-N (ethylditellanyl)ethane Chemical compound CC[Te][Te]CC DRAQBUIVUGPBEB-UHFFFAOYSA-N 0.000 description 2
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 2
- VUKYWZYFZZJLRZ-UHFFFAOYSA-N 2-[(1-amino-2-methyl-1-methyliminopropan-2-yl)diazenyl]-n',2-dimethylpropanimidamide;dihydrochloride Chemical compound Cl.Cl.CNC(=N)C(C)(C)N=NC(C)(C)C(=N)NC VUKYWZYFZZJLRZ-UHFFFAOYSA-N 0.000 description 2
- KWZULKIVMJKFKM-UHFFFAOYSA-N 2-[(1-amino-2-methyl-1-oxobutan-2-yl)diazenyl]-2-methylbutanamide Chemical compound CCC(C)(C(N)=O)N=NC(C)(CC)C(N)=O KWZULKIVMJKFKM-UHFFFAOYSA-N 0.000 description 2
- PFHOSZAOXCYAGJ-UHFFFAOYSA-N 2-[(2-cyano-4-methoxy-4-methylpentan-2-yl)diazenyl]-4-methoxy-2,4-dimethylpentanenitrile Chemical compound COC(C)(C)CC(C)(C#N)N=NC(C)(C#N)CC(C)(C)OC PFHOSZAOXCYAGJ-UHFFFAOYSA-N 0.000 description 2
- OZAIFHULBGXAKX-VAWYXSNFSA-N AIBN Substances N#CC(C)(C)\N=N\C(C)(C)C#N OZAIFHULBGXAKX-VAWYXSNFSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- 102100040409 Ameloblastin Human genes 0.000 description 2
- KXDAEFPNCMNJSK-UHFFFAOYSA-N Benzamide Chemical compound NC(=O)C1=CC=CC=C1 KXDAEFPNCMNJSK-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- 101000891247 Homo sapiens Ameloblastin Proteins 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- 102100020870 La-related protein 6 Human genes 0.000 description 2
- 108050008265 La-related protein 6 Proteins 0.000 description 2
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- 101100490446 Penicillium chrysogenum PCBAB gene Proteins 0.000 description 2
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- ALBJGICXDBJZGK-UHFFFAOYSA-N [1-[(1-acetyloxy-1-phenylethyl)diazenyl]-1-phenylethyl] acetate Chemical compound C=1C=CC=CC=1C(C)(OC(=O)C)N=NC(C)(OC(C)=O)C1=CC=CC=C1 ALBJGICXDBJZGK-UHFFFAOYSA-N 0.000 description 2
- 239000003125 aqueous solvent Substances 0.000 description 2
- 239000011324 bead Substances 0.000 description 2
- WPKWPKDNOPEODE-UHFFFAOYSA-N bis(2,4,4-trimethylpentan-2-yl)diazene Chemical compound CC(C)(C)CC(C)(C)N=NC(C)(C)CC(C)(C)C WPKWPKDNOPEODE-UHFFFAOYSA-N 0.000 description 2
- LWMFAFLIWMPZSX-UHFFFAOYSA-N bis[2-(4,5-dihydro-1h-imidazol-2-yl)propan-2-yl]diazene Chemical compound N=1CCNC=1C(C)(C)N=NC(C)(C)C1=NCCN1 LWMFAFLIWMPZSX-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 2
- LCMDQKIQBKULEI-UHFFFAOYSA-N dimethyl ditelluride Chemical compound C[Te][Te]C LCMDQKIQBKULEI-UHFFFAOYSA-N 0.000 description 2
- VRLFOXMNTSYGMX-UHFFFAOYSA-N diphenyl ditelluride Chemical group C=1C=CC=CC=1[Te][Te]C1=CC=CC=C1 VRLFOXMNTSYGMX-UHFFFAOYSA-N 0.000 description 2
- 238000002845 discoloration Methods 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 229910052744 lithium Inorganic materials 0.000 description 2
- 229910052749 magnesium Inorganic materials 0.000 description 2
- 239000011572 manganese Substances 0.000 description 2
- ZQMHJBXHRFJKOT-UHFFFAOYSA-N methyl 2-[(1-methoxy-2-methyl-1-oxopropan-2-yl)diazenyl]-2-methylpropanoate Chemical compound COC(=O)C(C)(C)N=NC(C)(C)C(=O)OC ZQMHJBXHRFJKOT-UHFFFAOYSA-N 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- CYTJMBLSQUBVMS-UHFFFAOYSA-N n-[[2-cyanopropan-2-yl(formyl)amino]hydrazinylidene]formamide Chemical compound N#CC(C)(C)N(C=O)NN=NC=O CYTJMBLSQUBVMS-UHFFFAOYSA-N 0.000 description 2
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- QLNJFJADRCOGBJ-UHFFFAOYSA-N propionamide Chemical compound CCC(N)=O QLNJFJADRCOGBJ-UHFFFAOYSA-N 0.000 description 2
- 229940080818 propionamide Drugs 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- 238000010526 radical polymerization reaction Methods 0.000 description 2
- UQDJGEHQDNVPGU-UHFFFAOYSA-N serine phosphoethanolamine Chemical compound [NH3+]CCOP([O-])(=O)OCC([NH3+])C([O-])=O UQDJGEHQDNVPGU-UHFFFAOYSA-N 0.000 description 2
- 239000003381 stabilizer Substances 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- 239000003643 water by type Substances 0.000 description 2
- DNIAPMSPPWPWGF-GSVOUGTGSA-N (R)-(-)-Propylene glycol Chemical compound C[C@@H](O)CO DNIAPMSPPWPWGF-GSVOUGTGSA-N 0.000 description 1
- GETTZEONDQJALK-UHFFFAOYSA-N (trifluoromethyl)benzene Chemical compound FC(F)(F)C1=CC=CC=C1 GETTZEONDQJALK-UHFFFAOYSA-N 0.000 description 1
- BSSNZUFKXJJCBG-UPHRSURJSA-N (z)-but-2-enediamide Chemical compound NC(=O)\C=C/C(N)=O BSSNZUFKXJJCBG-UPHRSURJSA-N 0.000 description 1
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 1
- KPZGRMZPZLOPBS-UHFFFAOYSA-N 1,3-dichloro-2,2-bis(chloromethyl)propane Chemical compound ClCC(CCl)(CCl)CCl KPZGRMZPZLOPBS-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- FXEIVSYQEOJLBU-UHFFFAOYSA-N 1-$l^{1}-selanylethanimine Chemical compound CC([Se])=N FXEIVSYQEOJLBU-UHFFFAOYSA-N 0.000 description 1
- 238000005160 1H NMR spectroscopy Methods 0.000 description 1
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- VPIMDGCETSZFGC-UHFFFAOYSA-N 2-(propan-2-ylditellanyl)propane Chemical compound CC(C)[Te][Te]C(C)C VPIMDGCETSZFGC-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- UDRCRMHFHHTVSN-UHFFFAOYSA-N 2-chloro-n-(4-chlorophenyl)acetamide Chemical compound ClCC(=O)NC1=CC=C(Cl)C=C1 UDRCRMHFHHTVSN-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- 125000004172 4-methoxyphenyl group Chemical group [H]C1=C([H])C(OC([H])([H])[H])=C([H])C([H])=C1* 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- 239000004342 Benzoyl peroxide Substances 0.000 description 1
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 1
- 239000002028 Biomass Substances 0.000 description 1
- NIVVALBMNHCROA-UHFFFAOYSA-N C(CCCCC(N)=[Se])(N)=[Se] Chemical compound C(CCCCC(N)=[Se])(N)=[Se] NIVVALBMNHCROA-UHFFFAOYSA-N 0.000 description 1
- OZEBSVRCCLFFHP-UHFFFAOYSA-N CS(=O)(N)=[Se] Chemical compound CS(=O)(N)=[Se] OZEBSVRCCLFFHP-UHFFFAOYSA-N 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- 239000007818 Grignard reagent Substances 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- OHLUUHNLEMFGTQ-UHFFFAOYSA-N N-methylacetamide Chemical compound CNC(C)=O OHLUUHNLEMFGTQ-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- 229920002125 Sokalan® Polymers 0.000 description 1
- QIOZLISABUUKJY-UHFFFAOYSA-N Thiobenzamide Chemical compound NC(=S)C1=CC=CC=C1 QIOZLISABUUKJY-UHFFFAOYSA-N 0.000 description 1
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000003463 adsorbent Substances 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 125000004104 aryloxy group Chemical group 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- ZVSKZLHKADLHSD-UHFFFAOYSA-N benzanilide Chemical compound C=1C=CC=CC=1C(=O)NC1=CC=CC=C1 ZVSKZLHKADLHSD-UHFFFAOYSA-N 0.000 description 1
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 description 1
- 235000019400 benzoyl peroxide Nutrition 0.000 description 1
- 238000006065 biodegradation reaction Methods 0.000 description 1
- 230000000740 bleeding effect Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- SNCZNSNPXMPCGN-UHFFFAOYSA-N butanediamide Chemical compound NC(=O)CCC(N)=O SNCZNSNPXMPCGN-UHFFFAOYSA-N 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000004064 cosurfactant Substances 0.000 description 1
- 125000006165 cyclic alkyl group Chemical group 0.000 description 1
- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- VBWIZSYFQSOUFQ-UHFFFAOYSA-N cyclohexanecarbonitrile Chemical compound N#CC1CCCCC1 VBWIZSYFQSOUFQ-UHFFFAOYSA-N 0.000 description 1
- UKJLNMAFNRKWGR-UHFFFAOYSA-N cyclohexatrienamine Chemical group NC1=CC=C=C[CH]1 UKJLNMAFNRKWGR-UHFFFAOYSA-N 0.000 description 1
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 238000010556 emulsion polymerization method Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 125000002485 formyl group Chemical group [H]C(*)=O 0.000 description 1
- 125000002541 furyl group Chemical group 0.000 description 1
- 150000004795 grignard reagents Chemical class 0.000 description 1
- FBUVGICEZJFFOR-UHFFFAOYSA-N hexanedithioamide Chemical compound NC(=S)CCCCC(N)=S FBUVGICEZJFFOR-UHFFFAOYSA-N 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 239000003456 ion exchange resin Substances 0.000 description 1
- 229920003303 ion-exchange polymer Polymers 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- JJTUDXZGHPGLLC-UHFFFAOYSA-N lactide Chemical compound CC1OC(=O)C(C)OC1=O JJTUDXZGHPGLLC-UHFFFAOYSA-N 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000000622 liquid--liquid extraction Methods 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- WRIRWRKPLXCTFD-UHFFFAOYSA-N malonamide Chemical compound NC(=O)CC(N)=O WRIRWRKPLXCTFD-UHFFFAOYSA-N 0.000 description 1
- 229940099596 manganese sulfate Drugs 0.000 description 1
- 239000011702 manganese sulphate Substances 0.000 description 1
- 235000007079 manganese sulphate Nutrition 0.000 description 1
- SQQMAOCOWKFBNP-UHFFFAOYSA-L manganese(II) sulfate Chemical compound [Mn+2].[O-]S([O-])(=O)=O SQQMAOCOWKFBNP-UHFFFAOYSA-L 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- UQMLEZQYRFAOCA-UHFFFAOYSA-N methanesulfonothioamide Chemical compound CS(N)(=O)=S UQMLEZQYRFAOCA-UHFFFAOYSA-N 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 239000002808 molecular sieve Substances 0.000 description 1
- WVFLGSMUPMVNTQ-UHFFFAOYSA-N n-(2-hydroxyethyl)-2-[[1-(2-hydroxyethylamino)-2-methyl-1-oxopropan-2-yl]diazenyl]-2-methylpropanamide Chemical compound OCCNC(=O)C(C)(C)N=NC(C)(C)C(=O)NCCO WVFLGSMUPMVNTQ-UHFFFAOYSA-N 0.000 description 1
- WMRNGPYHLQSTDL-UHFFFAOYSA-N n-cyclohexyl-2-[[1-(cyclohexylamino)-2-methyl-1-oxopropan-2-yl]diazenyl]-2-methylpropanamide Chemical compound C1CCCCC1NC(=O)C(C)(C)N=NC(C)(C)C(=O)NC1CCCCC1 WMRNGPYHLQSTDL-UHFFFAOYSA-N 0.000 description 1
- NPFIXJIFUHTLRP-UHFFFAOYSA-N n-cyclohexyl-2-methylpropanamide Chemical compound CC(C)C(=O)NC1CCCCC1 NPFIXJIFUHTLRP-UHFFFAOYSA-N 0.000 description 1
- 125000003136 n-heptyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- AZTGEJBZSFKULT-UHFFFAOYSA-N n-phenylcyclohexanecarboxamide Chemical compound C1CCCCC1C(=O)NC1=CC=CC=C1 AZTGEJBZSFKULT-UHFFFAOYSA-N 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 125000000636 p-nitrophenyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)[N+]([O-])=O 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000008188 pellet Substances 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 125000006678 phenoxycarbonyl group Chemical group 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 239000004584 polyacrylic acid Substances 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 239000001103 potassium chloride Substances 0.000 description 1
- 235000011164 potassium chloride Nutrition 0.000 description 1
- OTYBMLCTZGSZBG-UHFFFAOYSA-L potassium sulfate Chemical compound [K+].[K+].[O-]S([O-])(=O)=O OTYBMLCTZGSZBG-UHFFFAOYSA-L 0.000 description 1
- 229910052939 potassium sulfate Inorganic materials 0.000 description 1
- 235000011151 potassium sulphates Nutrition 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 125000004742 propyloxycarbonyl group Chemical group 0.000 description 1
- 125000004076 pyridyl group Chemical group 0.000 description 1
- 125000000168 pyrrolyl group Chemical group 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 238000001226 reprecipitation Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 125000005930 sec-butyloxycarbonyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(OC(*)=O)C([H])([H])[H] 0.000 description 1
- 238000010008 shearing Methods 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 235000002639 sodium chloride Nutrition 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 238000000956 solid--liquid extraction Methods 0.000 description 1
- 238000000638 solvent extraction Methods 0.000 description 1
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 1
- 238000010558 suspension polymerization method Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000005931 tert-butyloxycarbonyl group Chemical group [H]C([H])([H])C(OC(*)=O)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000001544 thienyl group Chemical group 0.000 description 1
- YUKQRDCYNOVPGJ-UHFFFAOYSA-N thioacetamide Chemical compound CC(N)=S YUKQRDCYNOVPGJ-UHFFFAOYSA-N 0.000 description 1
- 150000003556 thioamides Chemical class 0.000 description 1
- DBGVGMSCBYYSLD-UHFFFAOYSA-N tributylstannane Chemical compound CCCC[SnH](CCCC)CCCC DBGVGMSCBYYSLD-UHFFFAOYSA-N 0.000 description 1
- 238000000108 ultra-filtration Methods 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 229920003169 water-soluble polymer Polymers 0.000 description 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Polymerization Catalysts (AREA)
- Biological Depolymerization Polymers (AREA)
Description
本発明は、ポリ乳酸用改質剤およびポリ乳酸樹脂組成物に関するものである。 The present invention relates to a polylactic acid modifier and a polylactic acid resin composition.
近年、環境調和型ポリマーとして生分解性樹脂の研究が盛んに行われている。特に、生分解の観点だけでなく、カーボンニュートラルを可能にする植物を原料とするポリ乳酸が、コスト面や物性の高さからも高い注目を浴びている。しかしながら、その成形品では加水分解性などが劣るという問題点を有しており、本格的な展開には至っていない。
このような欠点を解決するものとして、例えば、(A)ポリ乳酸と、(B)ポリアルキルアクリル酸エステル及び/又はポリビニルエステルと、(C)ポリオレフィン及び(D)ポリアルキルアクリル酸エステルとポリオレフィンのブロック共重合体及び/又はポリビニルエステルとポリオレフィンとのブロック共重合体とを含むことを特徴とするポリ乳酸樹脂組成物が開示されている(特許文献1)。
In recent years, research on biodegradable resins as environmentally friendly polymers has been actively conducted. In particular, not only from the viewpoint of biodegradation, but also polylactic acid made from plants that enable carbon neutrality has attracted a great deal of attention because of its high cost and physical properties. However, the molded product has a problem that the hydrolyzability is inferior, and has not yet been developed in earnest.
Examples of solutions to such disadvantages include (A) polylactic acid, (B) polyalkyl acrylate ester and / or polyvinyl ester, (C) polyolefin and (D) polyalkyl acrylate ester and polyolefin. A polylactic acid resin composition comprising a block copolymer and / or a block copolymer of a polyvinyl ester and a polyolefin is disclosed (Patent Document 1).
しかし、ポリ乳酸樹脂組成物における(A)ポリ乳酸、(B)ポリアクリル酸エステル又はポリビニルエステル、(C)ポリオレフィン、及び(D)上記(B)と(C)とのブロック共重合体の配合割合は、(A)+(B)+(C)+(D)の100に対し、重量で、(A)が、5〜30%、(B)が20〜50%、(C)が5〜20%、(D)が20〜50%との開示があり、ポリ乳酸の配合量が3割以下となっており、ポリ乳酸の改質とは言い難い。また、ポリ乳酸を適切な汎用プラスチックと混和・混合させることにより、環境に対する負荷が小さく、加水分解を著しく抑制した新規なポリ乳酸樹脂組成物を提供することを目的としているが、効果の実証はない。
また、かかる問題を解決する目的で、汎用ポリエステル樹脂の耐加水分解性向上と同様に、カルボキシル基と反応する末端封鎖剤の使用がポリ乳酸にも検討された。例えば、脂肪族アルコールとカルボキシル基の縮合反応によりポリ乳酸の末端カルボキシル基を封鎖する方法(特許文献2、特許文献3)が提案されているが、アルコールとカルボキシル基の脱水縮合反応による末端封鎖と同時に副生成物として水分が生成し、その水分を除去するため真空脱水工程が必要となってくる。このようなアルコール化合物をポリ乳酸の成形工程で使用すると、発生する水分が気化したり、成形品に混入したりするため、成形品の外観が劣るばかりでなく、強度、耐熱性などの物性も低下する。また、ポリ乳酸重合工程で使用すると、重合速度が遅くなり、ポリ乳酸の分子量が低くなり、残存未反応物が多くなる等の問題点を生じる。
However, (A) polylactic acid, (B) polyacrylic acid ester or polyvinyl ester, (C) polyolefin, and (D) the block copolymer of (B) and (C) in the polylactic acid resin composition The ratio is 100% of (A) + (B) + (C) + (D) by weight, (A) being 5-30%, (B) being 20-50%, (C) being 5 There is a disclosure that -20% and (D) is 20-50%, and the blending amount of polylactic acid is 30% or less, and it is difficult to say that it is a modification of polylactic acid. In addition, by mixing and mixing polylactic acid with appropriate general-purpose plastics, the objective is to provide a novel polylactic acid resin composition that has a low environmental impact and significantly suppresses hydrolysis. Absent.
For the purpose of solving such problems, the use of an end-capping agent that reacts with a carboxyl group has been studied for polylactic acid as well as improving the hydrolysis resistance of general-purpose polyester resins. For example, a method of blocking terminal carboxyl groups of polylactic acid by condensation reaction of aliphatic alcohol and carboxyl group has been proposed (Patent Document 2, Patent Document 3). At the same time, moisture is generated as a by-product, and a vacuum dehydration step is required to remove the moisture. When such an alcohol compound is used in the molding process of polylactic acid, the generated moisture is vaporized or mixed into the molded product, so that the appearance of the molded product is not only inferior, but physical properties such as strength and heat resistance are also obtained. descend. Further, when used in the polylactic acid polymerization step, the polymerization rate is slowed, the molecular weight of polylactic acid is lowered, and the remaining unreacted product is increased.
本発明の課題は、ポリ乳酸用改質剤および耐加水分解性に優れたポリ乳酸樹脂組成物を提供することにある。 The subject of this invention is providing the polylactic acid resin composition excellent in the modifier for polylactic acid and hydrolysis resistance.
本発明は以下の発明に係る。
1.ポリメタクリル酸メチルのみからなるセグメント(A)とポリスチレンのみからなるセグメント(B)を有し、下記(イ)〜(ハ)の特徴を有するブロックポリマーであるポリ乳酸用改質剤。
(イ)セグメント(A)とセグメント(B)の重量比(A)/(B)が、0.4〜9.0
(ロ)ブロックポリマーの数平均分子量が、10,000〜100,000
(ハ)分子量分布 1.0〜2.0
2.ブロックポリマーが、有機テルル化合物系重合開始剤を用いて重合して得られたポリマーである上記に記載のポリ乳酸用改質剤。
3.有機テルル化合物系重合開始剤が、
(a)式(1)で表される有機テルル化合物、
(b)式(1)で表される有機テルル化合物とアゾ系重合開始剤の混合物、
(c)式(1)で表される有機テルル化合物と式(2)で表される有機ジテルル化合物の混合物、又は
(d)式(1)で表される有機テルル化合物、アゾ系重合開始剤及び式(2)で表される有機ジテルル化合物の混合物
のいずれかである上記に記載のポリ乳酸用改質剤。
The present invention relates to the following inventions.
1. A modifier for polylactic acid, which is a block polymer having the following characteristics (a) to (c), which has a segment (A) consisting only of polymethyl methacrylate and a segment (B) consisting only of polystyrene.
(A) The weight ratio (A) / (B) of the segment (A) to the segment (B) is 0.4 to 9.0.
(B) The number average molecular weight of the block polymer is 10,000 to 100,000.
(C) Molecular weight distribution 1.0-2.0
2. The modifier for polylactic acid as described above, wherein the block polymer is a polymer obtained by polymerization using an organic tellurium compound-based polymerization initiator.
3. Organic tellurium compound polymerization initiator,
(A) an organic tellurium compound represented by formula (1),
(B) a mixture of an organic tellurium compound represented by formula (1) and an azo polymerization initiator,
(C) A mixture of an organic tellurium compound represented by formula (1) and an organic ditellurium compound represented by formula (2), or (d) an organic tellurium compound represented by formula (1), an azo polymerization initiator. And the modifier for polylactic acid as described above, which is any one of a mixture of organic ditellurium compounds represented by formula (2).
(R1Te)2 (2)
(式中、R1は、上記と同じ。)
4.ポリ乳酸と、上記のいずれかに記載のポリ乳酸用改質剤とを混練して得られることを特徴とする改質されたポリ乳酸樹脂組成物。
(R 1 Te) 2 (2)
(In the formula, R 1 is the same as above.)
4). A modified polylactic acid resin composition obtained by kneading polylactic acid and any of the above-described modifiers for polylactic acid.
本発明のポリ乳酸用改質剤は、特に耐加水分解性を改質することができ、また、該ポリ乳酸用改質剤を配合したポリ乳酸樹脂組成物は耐加水分解性に優れる。驚くべきことに、本発明のポリ乳酸樹脂組成物は、ポリ乳酸が本来有している透明性を損なうことなく、優れた耐加水分解性を有している。 The polylactic acid modifier of the present invention can particularly modify hydrolysis resistance, and a polylactic acid resin composition containing the polylactic acid modifier is excellent in hydrolysis resistance. Surprisingly, the polylactic acid resin composition of the present invention has excellent hydrolysis resistance without impairing the transparency inherent in polylactic acid.
本発明でいうポリ乳酸とは、乳酸やラクチド等のオリゴマーを重合したもので、L体あるいはD体の光学純度は90%以上であると、融点が高く好ましい。本発明では、L体あるいはD体の光学純度が97%以上のものをホモポリ乳酸と呼ぶ。また、ポリ乳酸の性質を損なわない範囲で、乳酸以外の成分を共重合していても、ポリ乳酸以外のポリマーや粒子、難燃剤、帯電防止剤等の添加物を含有していても良い。ただし、バイオマス利用、生分解性の観点から、ポリマーとして乳酸モノマーは50重量%以上とすることが重要である。乳酸モノマーは好ましくは75重量%以上、より好ましくは96重量%以上である。また、ポリ乳酸ポリマーの分子量は、重量平均分子量で5万〜50万であると、力学特性と成形性のバランスが良く好ましい。 The polylactic acid as referred to in the present invention is obtained by polymerizing oligomers such as lactic acid and lactide, and the optical purity of L-form or D-form is preferably 90% or higher because of its high melting point. In the present invention, L-form or D-form having an optical purity of 97% or more is called homopolylactic acid. Moreover, in the range which does not impair the property of polylactic acid, you may copolymerize components other than lactic acid, or may contain additives, such as a polymer other than polylactic acid, particle | grains, a flame retardant, and an antistatic agent. However, from the viewpoint of biomass utilization and biodegradability, it is important that the lactic acid monomer is 50% by weight or more as a polymer. The lactic acid monomer is preferably 75% by weight or more, more preferably 96% by weight or more. Further, the molecular weight of the polylactic acid polymer is preferably 50,000 to 500,000 in terms of weight average molecular weight, which is preferable because of a good balance between mechanical properties and moldability.
本発明のポリ乳酸用改質剤は、ポリメタクリル酸メチルのみからなるセグメント(A)とポリスチレンのみからなるセグメント(B)を有し、下記(イ)〜(ハ)の特徴を有するブロックポリマーである。
(イ)セグメント(A)とセグメント(B)の重量比(A)/(B)が、0.4〜9.0
(ロ)ブロックポリマーの数平均分子量が、10,000〜100,000
(ハ)分子量分布 1.0〜2.0
The modifier for polylactic acid of the present invention is a block polymer having a segment (A) consisting only of polymethyl methacrylate and a segment (B) consisting only of polystyrene, and having the following characteristics (a) to (c). is there.
(A) The weight ratio (A) / (B) of the segment (A) to the segment (B) is 0.4 to 9.0.
(B) The number average molecular weight of the block polymer is 10,000 to 100,000.
(C) Molecular weight distribution 1.0-2.0
上記ブロックポリマーは、例えば、有機テルル化合物系重合開始剤を用いた重合により得ることができる。具体的には、
(a)式(1)で表される有機テルル化合物、
(b)式(1)で表される有機テルル化合物とアゾ系重合開始剤の混合物、
(c)式(1)で表される有機テルル化合物と式(2)で表される有機ジテルル化合物の混合物、又は
(d)式(1)で表される有機テルル化合物、アゾ系重合開始剤及び式(2)で表される有機ジテルル化合物の混合物
から選ばれる有機テルル化合物系重合開始剤を用いて重合する。
The block polymer can be obtained, for example, by polymerization using an organic tellurium compound polymerization initiator. In particular,
(A) an organic tellurium compound represented by formula (1),
(B) a mixture of an organic tellurium compound represented by formula (1) and an azo polymerization initiator,
(C) A mixture of an organic tellurium compound represented by formula (1) and an organic ditellurium compound represented by formula (2), or (d) an organic tellurium compound represented by formula (1), an azo polymerization initiator. And an organic tellurium compound-based polymerization initiator selected from a mixture of organic ditellurium compounds represented by formula (2).
本発明で使用する有機テルル化合物は、式(1)で表される。 The organic tellurium compound used in the present invention is represented by the formula (1).
R1で示される基は、具体的には次の通りである。
C1〜C8のアルキル基としては、メチル基、エチル基、n−プロピル基、イソプロピル基、シクロプロピル基、n−ブチル基、sec−ブチル基、tert−ブチル基、シクロブチル基、n−ペンチル基、n−ヘキシル基、n−ヘプチル基、n−オクチル基等の炭素数1〜8の直鎖状、分岐鎖状又は環状のアルキル基を挙げることができる。好ましいアルキル基としては、炭素数1〜4の直鎖状又は分岐鎖状のアルキル基が良い。より好ましくは、メチル基、エチル基又はn−ブチル基が良い。
アリール基としては、フェニル基、ナフチル基等を挙げることができる。好ましいアリール基としては、フェニル基が良い。置換アリールの置換基としては、例えばC1〜C8のアルキル基、C1〜C8のアルコキシ基、ハロゲン原子、水酸基、アミノ基、ニトロ基、シアノ基、−CORaで示されるカルボニル含有基(Ra=C1〜C8のアルキル基、アリール基、C1〜C8のアルコキシ基、アリーロキシ基)、スルホニル基、トリフルオロメチル基等を挙げることができる。
好ましい置換アリール基としては、トリフルオロメチル置換フェニル基が良い。
また、これら置換基は、1個又は2個置換しているのが良く、パラ位若しくはオルト位が好ましい。
芳香族へテロ環基としては、ピリジル基、ピロール基、フリル基、チエニル基等を挙げることができる。
Specific examples of the group represented by R 1 are as follows.
Examples of the C 1 to C 8 alkyl group include methyl group, ethyl group, n-propyl group, isopropyl group, cyclopropyl group, n-butyl group, sec-butyl group, tert-butyl group, cyclobutyl group, and n-pentyl. Examples thereof include linear, branched or cyclic alkyl groups having 1 to 8 carbon atoms such as a group, n-hexyl group, n-heptyl group and n-octyl group. A preferable alkyl group is a linear or branched alkyl group having 1 to 4 carbon atoms. More preferably, a methyl group, an ethyl group, or an n-butyl group is good.
Examples of the aryl group include a phenyl group and a naphthyl group. A preferred aryl group is a phenyl group. Examples of the substituent of the substituted aryl, an alkyl group of C 1 -C 8, alkoxy group of C 1 -C 8, a halogen atom, a hydroxyl group, an amino group, a nitro group, a cyano group, a carbonyl-containing group represented by -COR a (R a = C 1 -C 8 alkyl group, aryl group, C 1 -C 8 alkoxy group, aryloxy group), sulfonyl group, trifluoromethyl group and the like can be mentioned.
A preferred substituted aryl group is a trifluoromethyl-substituted phenyl group.
These substituents may be substituted one or two, and the para position or ortho position is preferable.
Examples of the aromatic heterocyclic group include a pyridyl group, a pyrrole group, a furyl group, and a thienyl group.
R2及びR3で示される各基は、具体的には次の通りである。
C1〜C8のアルキル基としては、上記R1で示したアルキル基と同様のものを挙げることができる。
Each group represented by R 2 and R 3 is specifically as follows.
Examples of the C 1 to C 8 alkyl group include the same alkyl groups as those described above for R 1 .
R4で示される各基は、具体的には次の通りである。
アリール基、置換アリール基、芳香族へテロ環基としては上記R1で示した基と同様のものを挙げることができる。
アシル基としては、ホルミル基、アセチル基、ベンゾイル基等を挙げることができる。
アミド基としては、アセトアミド、マロンアミド、スクシンアミド、マレアミド、ベンズアミド、2−フルアミド等のカルボン酸アミド、チオアセトアミド、ヘキサンジチオアミド、チオベンズアミド、メタンチオスルホンアミド等のチオアミド、セレノアセトアミド、ヘキサンジセレノアミド、セレノベンズアミド、メタンセレノスルホンアミド等のセレノアミド、N−メチルアセトアミド、ベンズアニリド、シクロヘキサンカルボキサニリド、2,4'−ジクロロアセトアニリド等のN−置換アミド等を挙げることができる。
オキシカルボニル基としては、−COORb(Rb=H、C1〜C8のアルキル基、アリール基)で示される基を挙げることができる。
具体的には、カルボキシル基、メトキシカルボニル基、エトキシカルボニル基、プロポキシカルボニル基、n−ブトキシカルボニル基、sec−ブトキシカルボニル基、tert−ブトキシカルボニル基、n−ペントキシカルボニル基、フェノキシカルボニル基等を挙げることができる。
Specific examples of each group represented by R 4 are as follows.
Examples of the aryl group, substituted aryl group, and aromatic heterocyclic group include the same groups as those described above for R 1 .
Examples of the acyl group include a formyl group, an acetyl group, and a benzoyl group.
Examples of the amide group include carboxylic acid amides such as acetamide, malonamide, succinamide, maleamide, benzamide, and 2-fluamide, thioamides such as thioacetamide, hexanedithioamide, thiobenzamide, and methanethiosulfonamide, selenoacetamide, hexanediselenoamide, Examples include selenoamides such as selenobenzamide and methaneselenosulfonamide, N-substituted amides such as N-methylacetamide, benzanilide, cyclohexanecarboxanilide, and 2,4′-dichloroacetanilide.
Examples of the oxycarbonyl group include a group represented by —COOR b (R b = H, C 1 to C 8 alkyl group, aryl group).
Specifically, carboxyl group, methoxycarbonyl group, ethoxycarbonyl group, propoxycarbonyl group, n-butoxycarbonyl group, sec-butoxycarbonyl group, tert-butoxycarbonyl group, n-pentoxycarbonyl group, phenoxycarbonyl group, etc. Can be mentioned.
好ましいオキシカルボニル基としては、メトキシカルボニル基、エトキシカルボニル基が良い。
好ましいR4で示される各基としては、アリール基、置換アリール基、オキシカルボニル基又はシアノ基が良い。
好ましいアリール基としては、フェニル基が良い。
好ましい置換アリール基としては、ハロゲン原子置換フェニル基、トリフルオロメチル置換フェニル基が良い。
また、これらの置換基は、ハロゲン原子の場合は、1〜5個置換しているのが良い。
アルコキシ基やトリフルオロメチル基の場合は、1個又は2個置換しているのが良く、1個置換の場合は、パラ位若しくはオルト位が好ましく、2個置換の場合は、メタ位が好ましい。
好ましいオキシカルボニル基としては、メトキシカルボニル基、エトキシカルボニル基が良い。
Preferred oxycarbonyl groups are a methoxycarbonyl group and an ethoxycarbonyl group.
Each group represented by R 4 is preferably an aryl group, a substituted aryl group, an oxycarbonyl group or a cyano group.
A preferred aryl group is a phenyl group.
Preferred examples of the substituted aryl group include a halogen atom substituted phenyl group and a trifluoromethyl substituted phenyl group.
In addition, in the case of a halogen atom, these substituents are preferably substituted by 1 to 5 pieces.
In the case of an alkoxy group or a trifluoromethyl group, one or two substituents may be substituted. In the case of one substitution, the para position or the ortho position is preferable, and in the case of two substitutions, the meta position is preferable. .
Preferred oxycarbonyl groups are a methoxycarbonyl group and an ethoxycarbonyl group.
好ましい(1)で示される有機テルル化合物としては、R1がC1〜C4のアルキル基またはフェニル基を示し、R2及びR3が、水素原子又はC1〜C4のアルキル基を示し、R4が、アリール基、置換アリール基、オキシカルボニル基で示される化合物が良い。
特に好ましくは、R1が、C1〜C4のアルキル基またはフェニル基を示し、R2及びR3が、水素原子又はC1〜C4のアルキル基を示し、R4が、フェニル基、置換フェニル基、メトキシカルボニル基、エトキシカルボニル基が良い。
As the preferred organic tellurium compound represented by (1), R 1 represents a C 1 to C 4 alkyl group or phenyl group, and R 2 and R 3 represent a hydrogen atom or a C 1 to C 4 alkyl group. , R 4 is preferably an aryl group, a substituted aryl group, or an oxycarbonyl group.
Particularly preferably, R 1 represents a C 1 to C 4 alkyl group or a phenyl group, R 2 and R 3 represent a hydrogen atom or a C 1 to C 4 alkyl group, and R 4 represents a phenyl group, A substituted phenyl group, a methoxycarbonyl group, and an ethoxycarbonyl group are preferable.
式(1)で示される有機テルル化合物は、具体的には次の通りである。
(メチルテラニルメチル)ベンゼン、(メチルテラニルメチル)ナフタレン、エチル−2−メチル−2−メチルテラニル−プロピオネート、エチル−2−メチル−2−n−ブチルテラニル−プロピオネートや、特許文献2及び3等に記載された有機テルル化合物の全てを例示することができる。
The organic tellurium compound represented by the formula (1) is specifically as follows.
(Methylterranylmethyl) benzene, (methylterranylmethyl) naphthalene, ethyl-2-methyl-2-methylterranyl-propionate, ethyl-2-methyl-2-n-butylterranyl-propionate, Patent Documents 2 and 3, etc. All of the described organic tellurium compounds can be exemplified.
式(1)で示される有機テルル化合物の製造方法は特に限定されず、特許文献4及び5等に記載された公知の方法等により製造することができる。
Xで示される基としては、フッ素、塩素、臭素又はヨウ素等のハロゲン原子を挙げることができる。好ましくは、塩素、臭素が良い。
M(R1)m (4)
〔R1は、上記と同じ。Mは、アルカリ金属、アルカリ土類金属又は銅原子を示す。Mがアルカリ金属の時、mは1、Mがアルカリ土類金属の時、mは2、Mが銅原子の時、mは1または2を示す。〕
Examples of the group represented by X include halogen atoms such as fluorine, chlorine, bromine and iodine. Preferably, chlorine and bromine are good.
M (R 1 ) m (4)
[R 1 is the same as above. M represents an alkali metal, alkaline earth metal or copper atom. When M is an alkali metal, m is 1, when M is an alkaline earth metal, m is 2, and when M is a copper atom, m is 1 or 2. ]
Mで示されるものとしては、リチウム、ナトリウム、カリウム等のアルカリ金属、マグネシウム、カルシウム等のアルカリ土類金属、銅を挙げることができる。好ましくは、リチウムが良い。
なお、Mがマグネシウムの時、化合物(4)はMg(R1)2でも、或いはR1MgX(Xは、ハロゲン原子)で表される化合物(グリニャール試薬)でもよい。Xは、好ましくは、塩素、臭素が良い。
Examples of M include alkali metals such as lithium, sodium and potassium, alkaline earth metals such as magnesium and calcium, and copper. Lithium is preferable.
When M is magnesium, the compound (4) may be Mg (R 1 ) 2 or a compound represented by R 1 MgX (X is a halogen atom) (Grignard reagent). X is preferably chlorine or bromine.
本発明で使用する有機ジテルル化合物は、式(2)で表される。
(R1Te)2 (2)
(R1は、C1〜C8のアルキル基、アリール基、置換アリール基又は芳香族ヘテロ環基を示す。)
The organic ditellurium compound used in the present invention is represented by the formula (2).
(R 1 Te) 2 (2)
(R 1 represents a C 1 to C 8 alkyl group, aryl group, substituted aryl group or aromatic heterocyclic group.)
R1で示される基は、式(1)において示した通りである。
好ましい式(2)で示される化合物としては、R1がC1〜C4のアルキル基、フェニル基の化合物である。
The group represented by R 1 is as shown in Formula (1).
A preferable compound represented by the formula (2) is a compound in which R 1 is a C 1 to C 4 alkyl group or a phenyl group.
式(2)で示される化合物は、具体的には、ジメチルジテルリド、ジエチルジテルリド、ジ−n−プロピルジテルリド、ジイソプロピルジテルリド、ジシクロプロピルジテルリド、ジ−n−ブチルジテルリド、ジ−sec−ブチルジテルリド、ジ−tert−ブチルジテルリド、ジシクロブチルジテルリド、ジフェニルジテルリド、ビス−(p−メトキシフェニル)ジテルリド、ビス−(p−アミノフェニル)ジテルリド、ビス−(p−ニトロフェニル)ジテルリド、ビス−(p−シアノフェニル)ジテルリド、ビス−(p−スルホニルフェニル)ジテルリド、ジナフチルジテルリド、ジピリジルジテルリド等が挙げられる。好ましくは、ジメチルジテルリド、ジエチルジテルリド、ジ−n−プロピルジテルリド、ジ−n−ブチルジテルリド、ジフェニルジテルリドが良い。 Specifically, the compound represented by the formula (2) includes dimethylditelluride, diethylditelluride, di-n-propylditelluride, diisopropylditelluride, dicyclopropylditelluride, di-n- Butyl ditelluride, di-sec-butyl ditelluride, di-tert-butyl ditelluride, dicyclobutyl ditelluride, diphenyl ditelluride, bis- (p-methoxyphenyl) ditelluride, bis- (p-aminophenyl) ditelluride, bis- (p -Nitrophenyl) ditelluride, bis- (p-cyanophenyl) ditelluride, bis- (p-sulfonylphenyl) ditelluride, dinaphthylditelluride, dipyridylditelluride and the like. Preferred are dimethyl ditelluride, diethyl ditelluride, di-n-propyl ditelluride, di-n-butyl ditelluride, and diphenyl ditelluride.
また本発明では重合速度の促進を目的にアゾ系重合開始剤を使用してもよい。アゾ系重合開始剤は、通常のラジカル重合で使用するアゾ系重合開始剤であれば特に制限なく使用することができる。 In the present invention, an azo polymerization initiator may be used for the purpose of accelerating the polymerization rate. The azo polymerization initiator can be used without particular limitation as long as it is an azo polymerization initiator used in normal radical polymerization.
例えば2,2'−アゾビス(イソブチロニトリル)(AIBN)、2,2'−アゾビス(2−メチルブチロニトリル)(AMBN)、2,2'−アゾビス(2,4−ジメチルバレロニトリル)(ADVN)、1,1'−アゾビス(1−シクロヘキサンカルボニトリル)(ACHN)、ジメチル−2,2'−アゾビスイソブチレート(MAIB)、4,4'−アゾビス(4−シアノバレリアン酸)(ACVA)、1,1'−アゾビス(1−アセトキシ−1−フェニルエタン)、2,2'−アゾビス(2−メチルブチルアミド)、2,2'−アゾビス(4−メトキシ−2,4−ジメチルバレロニトリル)、2,2'−アゾビス(2−メチルアミジノプロパン)二塩酸塩、2,2'−アゾビス[2−(2−イミダゾリン−2−イル)プロパン]、2,2'−アゾビス[2−メチル−N−(2−ヒドロキシエチル)プロピオンアミド]、2,2'−アゾビス(2,4,4−トリメチルペンタン)、2−シアノ−2−プロピルアゾホルムアミド、2,2'−アゾビス(N−ブチル−2−メチルプロピオンアミド)、2,2'−アゾビス(N−シクロヘキシル−2−メチルプロピオンアミド)等が挙げられる。 For example, 2,2′-azobis (isobutyronitrile) (AIBN), 2,2′-azobis (2-methylbutyronitrile) (AMBN), 2,2′-azobis (2,4-dimethylvaleronitrile) (ADVN), 1,1′-azobis (1-cyclohexanecarbonitrile) (ACHN), dimethyl-2,2′-azobisisobutyrate (MAIB), 4,4′-azobis (4-cyanovaleric acid) (ACVA) 1,1′-azobis (1-acetoxy-1-phenylethane), 2,2′-azobis (2-methylbutyramide), 2,2′-azobis (4-methoxy-2,4- Dimethylvaleronitrile), 2,2′-azobis (2-methylamidinopropane) dihydrochloride, 2,2′-azobis [2- (2-imidazolin-2-yl) propane], 2,2′-azobis [ 2-Methyl-N- 2-hydroxyethyl) propionamide], 2,2′-azobis (2,4,4-trimethylpentane), 2-cyano-2-propylazoformamide, 2,2′-azobis (N-butyl-2-methyl) Propionamide), 2,2′-azobis (N-cyclohexyl-2-methylpropionamide) and the like.
これらのアゾ開始剤は反応条件に応じて適宜選択するのが好ましい。例えば低温重合(40℃以下)の場合は2,2'−アゾビス(2,4−ジメチルバレロニトリル)(ADVN)、2,2'−アゾビス(4−メトキシ−2,4−ジメチルバレロニトリル)、中温重合(40〜80℃)の場合は2,2'−アゾビス(イソブチロニトリル)(AIBN)、2,2'−アゾビス(2−メチルブチロニトリル)(AMBN)、ジメチル−2,2'−アゾビスイソブチレート(MAIB)、1,1'−アゾビス(1−アセトキシ−1−フェニルエタン)、4,4'−アゾビス(4−シアノバレリアン酸)(ACVA)、2,2'−アゾビス(2−メチルブチルアミド)、2,2'−アゾビス(2−メチルアミジノプロパン)二塩酸塩、2,2'−アゾビス[2−(2−イミダゾリン−2−イル)プロパン]、高温重合(80℃以上)の場合は1,1'−アゾビス(1−シクロヘキサンカルボニトリル)(ACHN)、2−シアノ−2−プロピルアゾホルムアミド、2,2'−アゾビス(N−ブチル−2−メチルプロピオンアミド)、2,2'−アゾビス(N−シクロヘキシル−2−メチルプロピオンアミド)、2,2'−アゾビス(2,4,4−トリメチルペンタン)、2,2'−アゾビス[2−メチル−N−(2−ヒドロキシエチル)プロピオンアミド]を用いるのがよい。 These azo initiators are preferably selected as appropriate according to the reaction conditions. For example, in the case of low temperature polymerization (40 ° C. or lower), 2,2′-azobis (2,4-dimethylvaleronitrile) (ADVN), 2,2′-azobis (4-methoxy-2,4-dimethylvaleronitrile), In the case of medium temperature polymerization (40-80 ° C.), 2,2′-azobis (isobutyronitrile) (AIBN), 2,2′-azobis (2-methylbutyronitrile) (AMBN), dimethyl-2,2 '-Azobisisobutyrate (MAIB), 1,1'-azobis (1-acetoxy-1-phenylethane), 4,4'-azobis (4-cyanovaleric acid) (ACVA), 2,2'- Azobis (2-methylbutyramide), 2,2′-azobis (2-methylamidinopropane) dihydrochloride, 2,2′-azobis [2- (2-imidazolin-2-yl) propane], high temperature polymerization ( 1,1'- in the case of 80 ° C or higher) Zobis (1-cyclohexanecarbonitrile) (ACHN), 2-cyano-2-propylazoformamide, 2,2′-azobis (N-butyl-2-methylpropionamide), 2,2′-azobis (N-cyclohexyl) 2-methylpropionamide), 2,2′-azobis (2,4,4-trimethylpentane), 2,2′-azobis [2-methyl-N- (2-hydroxyethyl) propionamide] Is good.
本発明のブロックポリマーのセグメント(A)は、メタクリル酸メチルモノマーを重合することで得られる。また、本発明のブロックポリマーのセグメント(B)は、スチレンモノマーを重合することで得られる。 The segment (A) of the block polymer of the present invention is obtained by polymerizing a methyl methacrylate monomer. The segment (B) of the block polymer of the present invention can be obtained by polymerizing a styrene monomer.
本発明のポリ乳酸用改質剤は、セグメント(A)を重合し、次いでセグメント(B)を重合する。反応させる順番によりセグメント(B)−セグメント(A)のものも得ることができる。
上記で、セグメントを製造後、そのまま次のブロックの反応を開始しても良いし、一度反応を終了後、精製してから次のセグメントの反応を開始しても良い。
モノマーと式(1)の化合物の使用割合としては、得られる共重合体の分子量或いは分子量分布により適宜調節すればよいが、通常、式(1)の化合物1molに対して、モノマーを20〜4,000mol、好ましくは40〜1,300molとするのが良い。
The modifier for polylactic acid of the present invention polymerizes segment (A) and then polymerizes segment (B). Depending on the order of reaction, the segment (B) -segment (A) can also be obtained.
In the above, after the segment is manufactured, the reaction of the next block may be started as it is, or after the reaction is finished once, the reaction of the next segment may be started after purification.
The proportion of the monomer and the compound of formula (1) used may be appropriately adjusted depending on the molecular weight or molecular weight distribution of the copolymer obtained. Usually, the monomer is used in an amount of 20 to 4 with respect to 1 mol of the compound of formula (1). 1,000 mol, preferably 40 to 1,300 mol.
式(1)の化合物とアゾ系重合開始剤の使用割合は、通常、式(1)の化合物1molに対して、アゾ系重合開始剤0.01〜100mol、好ましくは0.1〜10mol、特に好ましくは0.1〜5molとするのが良い。 The use ratio of the compound of formula (1) and the azo polymerization initiator is usually 0.01-100 mol, preferably 0.1-10 mol, particularly azo polymerization initiator, with respect to 1 mol of the compound of formula (1). Preferably it is 0.1-5 mol.
式(1)の化合物と式(2)の化合物を併用する場合、その使用量としては、通常、式(1)の化合物1molに対して、式(2)の化合物0.01〜100mol、好ましくは0.05〜10mol、特に好ましくは0.1〜5molとするのが良い。 When the compound of the formula (1) and the compound of the formula (2) are used in combination, the use amount thereof is usually 0.01 to 100 mol of the compound of the formula (2) with respect to 1 mol of the compound of the formula (1), preferably Is 0.05 to 10 mol, particularly preferably 0.1 to 5 mol.
式(1)の化合物、式(2)の化合物及びアゾ系重合開始剤を併用する場合、その使用量としては、通常、式(1)の化合物と式(2)の化合物の合計1molに対して、アゾ系重合開始剤0.01〜100mol、好ましくは0.1〜10mol、特に好ましくは0.1〜5molとするのが良い。 When the compound of the formula (1), the compound of the formula (2) and the azo polymerization initiator are used in combination, the amount used is usually 1 mol of the total of the compound of the formula (1) and the compound of the formula (2). The azo polymerization initiator may be 0.01 to 100 mol, preferably 0.1 to 10 mol, and particularly preferably 0.1 to 5 mol.
反応は、通常、無溶媒で行うが、ラジカル重合で一般に使用される有機溶媒或いは水性溶媒を使用しても構わない。使用できる有機溶媒としては、例えば、ベンゼン、トルエン、N,N−ジメチルホルムアミド(DMF)、ジメチルスルホキシド(DMSO)、アセトン、2−ブタノン(メチルエチルケトン)、ジオキサン、ヘキサフルオロイソプロパオール、クロロホルム、四塩化炭素、テトラヒドロフラン(THF)、酢酸エチル、トリフルオロメチルベンゼン等が挙げられる。また、水性溶媒としては、例えば、水、メタノール、エタノール、イソプロパノール、n−ブタノール、エチルセロソルブ、ブチルセロソルブ、1−メトキシ−2−プロパノール、ジアセトンアルコール等が挙げられる。溶媒の使用量としては適宜調節すればよいが、例えば、ビニルモノマー1gに対して、溶媒を0.01〜50ml、好ましくは、0.05〜10mlが、特に好ましくは、0.1〜1mlが良い。 The reaction is usually carried out without a solvent, but an organic solvent or an aqueous solvent generally used in radical polymerization may be used. Examples of the organic solvent that can be used include benzene, toluene, N, N-dimethylformamide (DMF), dimethyl sulfoxide (DMSO), acetone, 2-butanone (methyl ethyl ketone), dioxane, hexafluoroisopropol, chloroform, tetrachloride. Examples thereof include carbon, tetrahydrofuran (THF), ethyl acetate, trifluoromethylbenzene and the like. Examples of the aqueous solvent include water, methanol, ethanol, isopropanol, n-butanol, ethyl cellosolve, butyl cellosolve, 1-methoxy-2-propanol, diacetone alcohol and the like. The amount of the solvent used may be adjusted as appropriate. For example, 0.01 to 50 ml, preferably 0.05 to 10 ml, particularly preferably 0.1 to 1 ml of the solvent is used per 1 g of the vinyl monomer. good.
次に、上記混合物を攪拌する。反応温度、反応時間は、得られるポリマーの分子量或いは分子量分布により適宜調節すればよいが、通常、0〜150℃で、1分〜100時間撹拌する。好ましくは、20〜100℃で、0.1〜30時間撹拌するのが良い。更に好ましくは、20〜80℃で、0.1〜15時間撹拌するのが良い。このように低い重合温度及び短い重合時間であっても高い収率と精密な分子量分布を得ることができるのが、本発明の特徴である。この時、圧力は、通常、常圧で行われるが、加圧或いは減圧しても構わない。 Next, the mixture is stirred. The reaction temperature and reaction time may be appropriately adjusted depending on the molecular weight or molecular weight distribution of the polymer to be obtained, but are usually stirred at 0 to 150 ° C. for 1 minute to 100 hours. Preferably, stirring is performed at 20 to 100 ° C. for 0.1 to 30 hours. More preferably, stirring is performed at 20 to 80 ° C. for 0.1 to 15 hours. It is a feature of the present invention that a high yield and a precise molecular weight distribution can be obtained even at such a low polymerization temperature and a short polymerization time. At this time, the pressure is usually a normal pressure, but may be increased or decreased.
反応終了後、常法により使用溶媒や残存モノマーを減圧下除去して目的ポリマーを取り出したり、目的ポリマー不溶溶媒を使用して再沈澱処理により目的物を単離する。反応処理については、目的物に支障がなければどのような処理方法でも行う事ができる。 After completion of the reaction, the solvent or residual monomer is removed under reduced pressure by a conventional method to take out the target polymer, or the target product is isolated by reprecipitation using a target polymer insoluble solvent. The reaction treatment can be performed by any treatment method as long as there is no problem with the object.
また本発明で開始剤として用いる有機テルル化合物は水に対して安定であるため、本発明のポリマーは下記に示す特許文献6等に記載された水系での重合方法により合成できる。
即ち、エマルション重合法は界面活性剤を使用し、主にミセル中で重合する。必要に応じてポリビニルアルコール類等の水溶性高分子などの分散剤を用いても良い。これらの界面活性剤は1種類、又は2種類以上で組み合わせて使用することができる。かかる界面活性剤の使用量は、全モノマー100重量部に対して、0.3〜50重量部であることが好ましく、より好ましくは0.5〜50重量部である。又、水の使用量は、全モノマー100重量部に対して、50〜2000重量部であることが好ましく、より好ましくは70〜1500重量部である。重合温度は特に限定されないが、0〜100℃の範囲で行うことが好ましく、より好ましくは40〜90℃である。反応時間は、反応温度または用いるモノマー組成物の組成、界面活性剤や重合開始剤の種類等に応じ、重合反応が完結するように適宜設定すればよい。好ましくは24時間以内である。
Moreover, since the organic tellurium compound used as an initiator in the present invention is stable to water, the polymer of the present invention can be synthesized by an aqueous polymerization method described in Patent Document 6 and the like shown below.
That is, the emulsion polymerization method uses a surfactant and polymerizes mainly in micelles. You may use dispersing agents, such as water-soluble polymers, such as polyvinyl alcohol, as needed. These surfactants can be used alone or in combination of two or more. The amount of the surfactant used is preferably 0.3 to 50 parts by weight, more preferably 0.5 to 50 parts by weight with respect to 100 parts by weight of the total monomers. Moreover, it is preferable that the usage-amount of water is 50-2000 weight part with respect to 100 weight part of all the monomers, More preferably, it is 70-1500 weight part. Although superposition | polymerization temperature is not specifically limited, It is preferable to carry out in the range of 0-100 degreeC, More preferably, it is 40-90 degreeC. What is necessary is just to set reaction time suitably so that a polymerization reaction may be completed according to reaction temperature or the composition of the monomer composition to be used, the kind of surfactant or a polymerization initiator, etc. Preferably within 24 hours.
懸濁重合法は分散剤を使用し、主にミセルを介さないで重合する。必要に応じてこれらの分散剤と共に、塩化ナトリウム、塩化カリウム、硫酸ナトリウム、硫酸カリウム、硫酸マンガン等の分散助剤を併用してもよい。かかる水分散安定剤の使用量は、全モノマー100重量部に対して、0.01〜30重量部であることが好ましく、より好ましくは0.05〜10重量部、特に好ましくは0.1〜5重量部である。又、水の使用量は、全モノマー100重量部に対して、50〜2000重量部であることが好ましく、より好ましくは70〜1500重量部である。重合温度は特に限定されないが、0〜100℃の範囲で行うことが好ましく、より好ましくは40〜90℃である。反応時間は、反応温度または用いるモノマー組成物の組成、水分散安定剤や重合開始剤の種類等に応じ、重合反応が完結するように適宜設定すればよい。好ましくは24時間以内である。 In the suspension polymerization method, a dispersant is used, and polymerization is mainly performed without using micelles. If necessary, a dispersing aid such as sodium chloride, potassium chloride, sodium sulfate, potassium sulfate, or manganese sulfate may be used in combination with these dispersing agents. The amount of the water dispersion stabilizer used is preferably from 0.01 to 30 parts by weight, more preferably from 0.05 to 10 parts by weight, particularly preferably from 0.1 to 100 parts by weight based on 100 parts by weight of the total monomers. 5 parts by weight. Moreover, it is preferable that the usage-amount of water is 50-2000 weight part with respect to 100 weight part of all the monomers, More preferably, it is 70-1500 weight part. Although superposition | polymerization temperature is not specifically limited, It is preferable to carry out in the range of 0-100 degreeC, More preferably, it is 40-90 degreeC. What is necessary is just to set reaction time suitably so that a polymerization reaction may be completed according to reaction temperature or the composition of the monomer composition to be used, the kind of water dispersion stabilizer, a polymerization initiator, etc. Preferably within 24 hours.
ミニエマルション重合法は界面活性剤及び共界面活性剤を使用し、ホモジナイザーや超音波装置を用いてモノマーを強制分散した後、主にミセルを介さないで重合する。かかる界面活性剤や共界面活性剤の使用量は、全モノマーに対して、0.3〜50重量部、特に好ましくは0.5〜50部である。超音波照射時間は、0.1〜10分、特に好ましくは0.2〜5分である。
該ポリマーの分子量は、反応時間、式(1)の化合物の量および式(2)の化合物の量により調整可能であるが、数平均分子量で10,000〜100,000ポリマーを用いるのが好ましく、より好ましくは40,000〜80,000の数平均分子量を有するポリマーを用いるのがよい。数平均分子量が10,000未満では成形加工時の金型汚染や長期使用でのブリードアウトが起こる可能性がある。数平均分子量が100,000を越えると得られる樹脂組成物が不透明となる。 The molecular weight of the polymer can be adjusted by the reaction time, the amount of the compound of formula (1) and the amount of the compound of formula (2), but it is preferable to use a polymer having a number average molecular weight of 10,000 to 100,000. More preferably, a polymer having a number average molecular weight of 40,000 to 80,000 is used. If the number average molecular weight is less than 10,000, mold contamination during molding and bleeding out after long-term use may occur. When the number average molecular weight exceeds 100,000, the resulting resin composition becomes opaque.
該ポリマーの分子量分布(PD=Mw/Mn)は、1.0〜2.0の間で制御される。更に、分子量分布1.05〜1.90、更には1.05〜1.80のより狭い分子量分布を持ったポリ乳酸用改質剤を得ることができる。
セグメント(A)とセグメント(B)の比は、分子量同様、反応時間、式(1)の化合物の量および式(2)の化合物の量により調整可能であるが、重量比(A)/(B)が0.4〜9.0、好ましくは0.4〜7.0、より好ましくは0.6〜5.0である。
The molecular weight distribution (PD = Mw / Mn) of the polymer is controlled between 1.0 and 2.0. Furthermore, it is possible to obtain a modifier for polylactic acid having a molecular weight distribution of 1.05 to 1.90, and further narrow molecular weight distribution of 1.05 to 1.80.
The ratio of the segment (A) to the segment (B) can be adjusted by the reaction time, the amount of the compound of the formula (1) and the amount of the compound of the formula (2) as well as the molecular weight, but the weight ratio (A) / ( B) is 0.4 to 9.0, preferably 0.4 to 7.0, more preferably 0.6 to 5.0.
該ポリ乳酸用改質剤の全光線透過率は、95%以上、好ましくは、98%〜99.9%が良い。95%未満の場合は、ポリ乳酸樹脂組成物の変色の原因になり、成形体に色の変化を与えてしまう。
また、500nmでの透過率は、95%以上、好ましくは、98%〜99.9%が良い。95%未満の場合は、ポリ乳酸樹脂組成物の変色の原因になり、成形体に色の変化を与えてしまう。
よって、該共重合体は、全光線透過率95%以上、且つ、500nmでの透過率95%以上である。好ましくは、全光線透過率98%以上、且つ、500nmでの透過率98%以上が良い。
The total light transmittance of the modifier for polylactic acid is 95% or more, preferably 98% to 99.9%. If it is less than 95%, it will cause discoloration of the polylactic acid resin composition and give the molded product a color change.
Further, the transmittance at 500 nm is 95% or more, preferably 98% to 99.9%. If it is less than 95%, it will cause discoloration of the polylactic acid resin composition and give the molded product a color change.
Therefore, the copolymer has a total light transmittance of 95% or more and a transmittance at 500 nm of 95% or more. Preferably, the total light transmittance is 98% or more and the transmittance at 500 nm is 98% or more.
式(1)および式(2)で表される有機テルル化合物を開始剤として用いる場合、−TeR1の形態でテルル原子がポリマー末端に残存する場合がある(R1は、上記と同じ)。
テルル原子が末端に残存したポリマーは着色しており、金属性の元素であるため、得られたポリ乳酸用改質剤を配合したポリ乳酸樹脂組成物の透明性の向上や異物混入防止の観点から、この残存テルル原子を含めた金属含量は、樹脂全体に対して1000ppm以下であり、特に200ppm以下であることが好ましい。
When the organic tellurium compounds represented by formula (1) and formula (2) are used as an initiator, a tellurium atom may remain at the polymer terminal in the form of -TeR 1 (R 1 is the same as above).
Since the polymer in which the tellurium atom remains at the terminal is colored and is a metallic element, the transparency of the polylactic acid resin composition containing the resulting polylactic acid modifier and the prevention of contamination Therefore, the metal content including the remaining tellurium atoms is 1000 ppm or less, and particularly preferably 200 ppm or less, based on the entire resin.
分子末端に残存するテルル原子は重合反応終了後、トリブチルスタナンやチオール化合物などの用いるラジカル還元方法や、さらに活性炭、シリカゲル、活性アルミナ、活性白土、モレキュラーシーブスおよび高分子吸着剤なで吸着する方法、イオン交換樹脂などで金属を吸着させる方法や、また、過酸化水素水や過酸化ベンゾイル等の過酸化物を添加したり、空気や酸素を系中に吹き込むことでポリマー末端のテルル原子を酸化分解させ、水洗や適切な溶媒を組み合わせることにより残留テルル化合物を除去する液−液抽出法や固−液抽出法、特定の分子量以下のもののみを抽出除去する限外ろ過等の溶液状態での精製方法や、また、これらの方法を組み合わせることもできる。 The tellurium atom remaining at the molecular end is adsorbed after completion of the polymerization reaction using a radical reduction method such as tributylstannane or a thiol compound, and further activated carbon, silica gel, activated alumina, activated clay, molecular sieves and polymer adsorbent. , A method of adsorbing metal with ion exchange resin, etc., or adding a peroxide such as hydrogen peroxide or benzoyl peroxide, or blowing air or oxygen into the system to oxidize the tellurium atom at the end of the polymer In liquid state such as liquid-liquid extraction method or solid-liquid extraction method that removes residual tellurium compounds by combining with water washing and appropriate solvent, and ultrafiltration that extracts and removes only those with specific molecular weight or less A purification method and these methods can also be combined.
本発明の樹脂組成物は、ポリ乳酸樹脂と該ポリ乳酸用改質剤とを混練して得ることができる。樹脂組成物におけるポリ乳酸用改質剤の割合は、0.1〜50重量%が好ましい。より好ましくは1〜50重量%であり、さらに好ましくは5〜30重量%である。
混練方法としては特に制限はなく、ポリ乳酸溶融状態下で機械的にせん断を行うことが出来ればよい。具体的な装置としては、押出機、特に二軸押出機が好ましい。
二軸押出機を用いる場合、ポリ乳酸を押出機の上流側のフィード口から供給し、改質剤を下流側のフィード口から供給する方法や、ポリ乳酸と改質剤を予めブレンダー等で混合しておき、フィード口から供給する方法が考えられるが、特に制限はない。押出機のスクリューアレンジにも特に制限はないが、ニーディングゾーンを設けることが好ましい。
The resin composition of the present invention can be obtained by kneading a polylactic acid resin and the polylactic acid modifier. The proportion of the polylactic acid modifier in the resin composition is preferably 0.1 to 50% by weight. More preferably, it is 1-50 weight%, More preferably, it is 5-30 weight%.
There is no restriction | limiting in particular as a kneading method, What is necessary is just to be able to perform mechanical shearing in a polylactic acid melted state. As a specific apparatus, an extruder, particularly a twin screw extruder is preferable.
When using a twin screw extruder, polylactic acid is supplied from the feed port on the upstream side of the extruder and a modifier is supplied from the feed port on the downstream side, or polylactic acid and the modifier are mixed in advance by a blender or the like. A method of supplying from the feed port is conceivable, but there is no particular limitation. Although there is no restriction | limiting in particular also in the screw arrangement of an extruder, It is preferable to provide a kneading zone.
以下、本発明を実施例に基づいて具体的に説明するが何らこれらに限定されるものではない。また、実施例および比較例において、各種物性測定は以下の機器により測定を行った。
1H−NMR:ブルカー・バイオスピン AVANCE 500(500MHz)
分子量及び分子量分布:ゲルパーミエーションクロマトグラフ 日本ウォーターズ GPCV−2000(カラム:東ソー TSK−GEL GMHXL + TSK−GEL MultiporeHXL−M、ポリスチレンスタンダード:東ソーTSK
Standard)
ポリマー中のTe含量:ICP/MS
EXAMPLES Hereinafter, although this invention is demonstrated concretely based on an Example, it is not limited to these at all. In Examples and Comparative Examples, various physical properties were measured using the following equipment.
1 H-NMR: Bruker BioSpin AVANCE 500 (500 MHz)
Molecular weight and molecular weight distribution: Gel permeation chromatograph Nippon Waters GPCV-2000 (Column: Tosoh TSK-GEL GMH XL + TSK-GEL Multipore H XL- M, polystyrene standard: Tosoh TSK
Standard)
Te content in polymer: ICP / MS
実施例1
(ポリスチレン−ポリメタクリル酸メチルジブロックポリマーの合成)
1L四つ口フラスコに脱イオン水414mlを加え、30分間アルゴンガスをバブリングし、ポリビニルアルコールKH−17〔日本合成化学工業(株)〕414mgを加え、溶解させた。200ml四つ口フラスコにスチレン〔和光純薬工業(株)試薬〕125g(1.20mol)を加え、30分間アルゴンガスをバブリングし、エチル−2−メチル−2−n−ブチルテラニル−プロピオネート1.54g(5.13mmol)、ジブチルジテルリド 947mg(2.56mmol)、および1,1'−アゾビス(1−シクロヘキサンカルボニトリル)626mg(2.56mmol)を加えた。得られたスチレン溶液を上記のポリビニルアルコール水溶液に加え、90℃で27時間反応させた。NMR分析により、重合率は98%であった。またGPC分析により、数平均分子量20,200、PD=1.14であった。
Example 1
(Synthesis of polystyrene-polymethyl methacrylate diblock polymer)
414 ml of deionized water was added to a 1 L four-necked flask, and argon gas was bubbled for 30 minutes, and 414 mg of polyvinyl alcohol KH-17 [Nippon Gosei Chemical Co., Ltd.] was added and dissolved. 125 g (1.20 mol) of styrene [Wako Pure Chemical Industries, Ltd.] was added to a 200 ml four-necked flask, and argon gas was bubbled for 30 minutes to give 1.54 g of ethyl-2-methyl-2-n-butylterranyl-propionate. (5.13 mmol), 947 mg (2.56 mmol) of dibutyl ditelluride, and 626 mg (2.56 mmol) of 1,1′-azobis (1-cyclohexanecarbonitrile) were added. The obtained styrene solution was added to the aqueous polyvinyl alcohol solution and reacted at 90 ° C. for 27 hours. According to NMR analysis, the polymerization rate was 98%. Moreover, it was number average molecular weight 20,200 and PD = 1.14 by GPC analysis.
次に、上記で得られたポリスチレン懸濁液より水を除去し、メタクリル酸メチル〔三菱ガス化学(株)〕280g(2.80mol)を加え、ポリスチレンを溶解し、先ほど除去した水を再度加え、80℃で22時間反応させた。反応終了後、反応液をろ過、脱イオン水828mLで洗浄し、得られたポリマービーズを酢酸エチル1Lに溶解した。その溶液を1mol/lのNaOHを含む飽和食塩水1Lで2回洗浄、続いて飽和食塩水1Lで1回洗浄し、硫酸マグネシウムで乾燥、ろ別した。得られた酢酸エチル溶液を撹拌しているメタノール5L中に注いだ。沈殿したポリマーをろ過、乾燥することによりポリスチレン−ポリメタクリル酸メチルジブロックポリマー329g(収率81%)を得た。GPC分析により、数平均分子量48,800、PD=1.51であった。またNMR分析より、得られたブロックポリマーのセグメント(A)及びセグメント(B)の重量比(A)/(B)は、2.13であった。 Next, water is removed from the polystyrene suspension obtained above, 280 g (2.80 mol) of methyl methacrylate [Mitsubishi Gas Chemical Co., Ltd.] is added, the polystyrene is dissolved, and the water removed earlier is added again. And reacted at 80 ° C. for 22 hours. After completion of the reaction, the reaction solution was filtered and washed with 828 mL of deionized water, and the resulting polymer beads were dissolved in 1 L of ethyl acetate. The solution was washed twice with 1 L of saturated brine containing 1 mol / l NaOH, then washed once with 1 L of saturated brine, dried over magnesium sulfate, and filtered. The obtained ethyl acetate solution was poured into 5 L of stirring methanol. The precipitated polymer was filtered and dried to obtain 329 g of polystyrene-polymethyl methacrylate diblock polymer (yield 81%). According to GPC analysis, the number average molecular weight was 48,800 and PD was 1.51. From the NMR analysis, the weight ratio (A) / (B) of the segment (A) and the segment (B) of the obtained block polymer was 2.13.
(生分解性樹脂組成物の作製と評価)
ポリ乳酸〔ユニチカ(株)製 TE−4000〕に上記のブロックポリマーを30%添加し、ラボプラストミル〔東洋精機(株)製〕で混練した。混練条件は200℃、60rpm、5分間とした。取り出した樹脂組成物を粉砕、ペレット化後、射出成形にて厚み3mmのダンベル片を作製した。粉砕ペレットを用いて、耐久性評価を行った。耐久性評価方法は、試験片を60℃、湿度90%条件下で加水分解させ、GPC(Waters製)を用いて数平均分子量(Mn)を測定し、その半減期を比較した。また、ダンベル片を用いて、透明性の評価を行った。透明性の評価は、分光光度計で得られる700nmの透過率を比較した。結果を表1に示す。
(Production and evaluation of biodegradable resin composition)
30% of the above block polymer was added to polylactic acid [TE-4000 manufactured by Unitika Ltd.] and kneaded with Laboplast Mill [manufactured by Toyo Seiki Co., Ltd.]. The kneading conditions were 200 ° C., 60 rpm, and 5 minutes. The taken out resin composition was pulverized and pelletized, and then a dumbbell piece having a thickness of 3 mm was produced by injection molding. Durability evaluation was performed using the pulverized pellets. In the durability evaluation method, the test piece was hydrolyzed under the conditions of 60 ° C. and 90% humidity, the number average molecular weight (Mn) was measured using GPC (manufactured by Waters), and the half lives were compared. In addition, transparency was evaluated using dumbbell pieces. For the evaluation of transparency, the transmittance of 700 nm obtained by a spectrophotometer was compared. The results are shown in Table 1.
実施例2
(ポリスチレン−ポリメタクリル酸メチルジブロックポリマーの合成)
1L四つ口フラスコに脱イオン水400mlを加え、30分間アルゴンガスをバブリングし、ポリビニルアルコールKH−17〔日本合成化学工業(株)〕400mgを加え、溶解させた。200ml四つ口フラスコにスチレン〔和光純薬工業(株)試薬〕135g(1.30mol)を加え、30分間アルゴンガスをバブリングし、エチル−2−メチル−2−n−ブチルテラニル−プロピオネート886mg(2.96mmol)、ジブチルジテルリド545mg(1.48mmol)、および1,1'−アゾビス(1−シクロヘキサンカルボニトリル)361mg(1.48mmol)を加えた。得られたスチレン溶液を上記のポリビニルアルコール水溶液に加え、90℃で24時間反応させた。NMR分析により、重合率は96%であった。またGPC分析により、数平均分子量28,600、PD=1.15であった。
次に、上記で得られたポリスチレン懸濁液に、メタクリル酸メチル〔三菱ガス化学(株)〕107g(1.06mol)を80℃で12時間かけて滴下し、滴下終了後さらに80℃で18時間反応させた。反応終了後、反応液をろ過、脱イオン水800mLで洗浄し、得られたポリマービーズを酢酸エチル800mlに溶解した。その溶液を1mol/LのNaOHを含む飽和食塩水800mlで2回洗浄、続いて飽和食塩水800mlで1回洗浄し、硫酸マグネシウムで乾燥、ろ別した。得られた酢酸エチル溶液を撹拌しているメタノール4L中に注いだ。沈殿したポリマーをろ過、乾燥することによりポリスチレン−ポリメタクリル酸メチルジブロックポリマー210g(収率87%)を得た。GPC分析により、数平均分子量39,100、PD=1.33であった。またNMR分析より、得られたブロックポリマーのセグメント(A)及びセグメント(B)の重量比(A)/(B)は、0.69であった。
Example 2
(Synthesis of polystyrene-polymethyl methacrylate diblock polymer)
400 ml of deionized water was added to a 1 L four-necked flask, and argon gas was bubbled for 30 minutes, and 400 mg of polyvinyl alcohol KH-17 [Nippon Gosei Chemical Co., Ltd.] was added and dissolved. To a 200 ml four-necked flask, 135 g (1.30 mol) of styrene [Wako Pure Chemical Industries, Ltd. reagent] was added, and argon gas was bubbled for 30 minutes to obtain 886 mg of ethyl-2-methyl-2-n-butylterranyl-propionate (2 .96 mmol), 545 mg (1.48 mmol) of dibutyl ditelluride, and 361 mg (1.48 mmol) of 1,1′-azobis (1-cyclohexanecarbonitrile) were added. The obtained styrene solution was added to the aqueous polyvinyl alcohol solution and reacted at 90 ° C. for 24 hours. According to NMR analysis, the polymerization rate was 96%. Moreover, it was number average molecular weight 28,600 and PD = 1.15 by GPC analysis.
Next, 107 g (1.06 mol) of methyl methacrylate [Mitsubishi Gas Chemical Co., Ltd.] was dropped into the polystyrene suspension obtained above at 80 ° C. over 12 hours. Reacted for hours. After completion of the reaction, the reaction solution was filtered and washed with 800 mL of deionized water, and the resulting polymer beads were dissolved in 800 mL of ethyl acetate. The solution was washed twice with 800 ml of saturated brine containing 1 mol / L NaOH, then washed once with 800 ml of saturated brine, dried over magnesium sulfate, and filtered. The obtained ethyl acetate solution was poured into 4 L of stirring methanol. The precipitated polymer was filtered and dried to obtain 210 g of polystyrene-polymethyl methacrylate diblock polymer (yield 87%). According to GPC analysis, the number average molecular weight was 39,100 and PD was 1.33. From the NMR analysis, the weight ratio (A) / (B) of the segment (A) and the segment (B) of the obtained block polymer was 0.69.
(生分解性樹脂組成物の作製と評価)
ブロックポリマーを10%添加した以外は、実施例1と同様にして樹脂試験片を作製し、試験を行なった。結果を表1に示す。
(Production and evaluation of biodegradable resin composition)
A resin test piece was prepared and tested in the same manner as in Example 1 except that 10% of the block polymer was added. The results are shown in Table 1.
比較例1
ポリ乳酸〔ユニチカ(株)製 TE−4000〕のみの樹脂試験片を作成し、試験を行なった。結果を表1に示す。
Comparative Example 1
Resin test pieces made only of polylactic acid [TE-4000 manufactured by Unitika Ltd.] were prepared and tested. The results are shown in Table 1.
比較例2
市販のモディパーMS10B〔日本油脂(株)製〕を用いて比較用樹脂組成物を作成した。ポリ乳酸に10%添加し、実施例1と同様にして樹脂試験片を作製し、試験を行なった。
モディパーMS10Bとは、ポリスチレンーポリメタクリル酸メチルジブロックポリマーである。GPC分析により、数平均分子量89,200、PD=2.63であった。
Comparative Example 2
A comparative resin composition was prepared using a commercially available Modiper MS10B (manufactured by NOF Corporation). A resin test piece was prepared in the same manner as in Example 1 by adding 10% to polylactic acid, and the test was performed.
Modiper MS10B is a polystyrene-polymethyl methacrylate diblock polymer. According to GPC analysis, the number average molecular weight was 89,200 and PD was 2.63.
比較例3 (ポリメタクリル酸メチル−ポリスチレンジブロックポリマーの合成)
1L四つ口フラスコに脱イオン水144mlを加え、30分間アルゴンガスをバブリングし、ポリビニルアルコールKH−17〔日本合成化学工業(株)〕432mgを加え、溶解させた。100ml四つ口フラスコにメタクリル酸メチル〔三菱ガス化学(株)〕44.9g(450mmol)を加え、30分間アルゴンガスをバブリングし、エチル−2−メチル−2−n−ブチルテラニル−プロピオネート1.93g(6.43mmol)、ジブチルジテルリド 475mg(1.29mmol)、を加えた。得られたメタクリル酸メチル溶液を上記のポリビニルアルコール水溶液に加え、80℃で16時間反応させた。NMR分析により、重合率は100%であった。またGPC分析により、数平均分子量7,250、PD=1.44であった。
次に、上記で得られたポリメタクリル酸メチル懸濁液より水を除去し、スチレン〔和光純薬工業(株)試薬〕844g(8.10mol)を加え、ポリメタクリル酸メチルを溶解し、90℃で30時間反応させた。NMR分析により、重合率は52.3%であった。酢酸エチル1.5Lで希釈した。その溶液を1mol/lのNaOHを含む飽和食塩水1Lで2回洗浄、続いて飽和食塩水1Lで1回洗浄し、硫酸マグネシウムで乾燥、ろ別した。得られた酢酸エチル溶液を撹拌しているメタノール6L中に注いだ。沈殿したポリマーをろ過、乾燥することによりポリメタクリル酸メチル−ポリスチレンジブロックポリマー386g(収率43%)を得た。GPC分析により、数平均分子量58,800、PD=1.21であった。またNMR分析より、得られたブロックポリマーのセグメント(A)及びセグメント(B)の重量量比(A)/(B)は、0.09であった。
Comparative Example 3 (Synthesis of polymethyl methacrylate-polystyrene diblock polymer)
144 ml of deionized water was added to a 1 L four-necked flask, and argon gas was bubbled for 30 minutes, and 432 mg of polyvinyl alcohol KH-17 [Nippon Gosei Chemical Co., Ltd.] was added and dissolved. To a 100 ml four-necked flask was added 44.9 g (450 mmol) of methyl methacrylate [Mitsubishi Gas Chemical Co., Ltd.], bubbled with argon gas for 30 minutes, and 1.93 g of ethyl-2-methyl-2-n-butylteranyl-propionate. (6.43 mmol), 475 mg (1.29 mmol) of dibutyl ditelluride were added. The obtained methyl methacrylate solution was added to the aqueous polyvinyl alcohol solution and reacted at 80 ° C. for 16 hours. According to NMR analysis, the polymerization rate was 100%. Moreover, it was number average molecular weight 7,250 and PD = 1.44 by GPC analysis.
Next, water was removed from the polymethyl methacrylate suspension obtained above, 844 g (8.10 mol) of styrene [Wako Pure Chemical Industries, Ltd.] was added, and polymethyl methacrylate was dissolved. The reaction was carried out at 30 ° C. for 30 hours. According to NMR analysis, the polymerization rate was 52.3%. Dilute with 1.5 L of ethyl acetate. The solution was washed twice with 1 L of saturated brine containing 1 mol / l NaOH, then washed once with 1 L of saturated brine, dried over magnesium sulfate, and filtered. The obtained ethyl acetate solution was poured into 6 L of stirring methanol. The precipitated polymer was filtered and dried to obtain 386 g of polymethyl methacrylate-polystyrene diblock polymer (43% yield). According to GPC analysis, the number average molecular weight was 58,800, and PD = 1.21. From the NMR analysis, the weight ratio (A) / (B) of the segment (A) and the segment (B) of the obtained block polymer was 0.09.
(生分解性樹脂組成物の作製と評価)
実施例2と同様にして樹脂試験片を作製し、試験を行なった。結果を表1に示す。
(Production and evaluation of biodegradable resin composition)
Resin test pieces were prepared and tested in the same manner as in Example 2. The results are shown in Table 1.
表1に示すように本発明に従う実施例1、2の樹脂組成物は、比較例1のポリ乳酸のみと比較して、数平均分子量低下の半減期が飛躍的に長くなっており耐加水分解性に優れている。また、透過率からもわかるように透明度の低下が抑えられている。ブロックポリマーを合成する際に、セグメントの重量比、数平均分子量、及び分子量分布を制御することで、高い耐加水分解性と透明性を兼ね備えた樹脂組成物が得られた。比較例2〜3は、耐加水分解性が不十分であると共に不透明であった。 As shown in Table 1, the resin compositions of Examples 1 and 2 according to the present invention have a significantly longer half-life for decreasing the number average molecular weight than the polylactic acid of Comparative Example 1 alone. Excellent in properties. Further, as can be seen from the transmittance, the decrease in transparency is suppressed. When synthesizing the block polymer, a resin composition having both high hydrolysis resistance and transparency was obtained by controlling the weight ratio, number average molecular weight, and molecular weight distribution of the segments. In Comparative Examples 2 to 3, the hydrolysis resistance was insufficient and opaque.
Claims (2)
(イ)セグメント(A)とセグメント(B)の重量比(A)/(B)が、0.4〜9.0
(ロ)ブロックポリマーの数平均分子量が、40,000〜100,000
(ハ)分子量分布 1.0〜2.0
ブロックポリマーが、有機テルル化合物系重合開始剤を用いて重合して得られたポリマーであり、
有機テルル化合物系重合開始剤が、
(a)式(1)で表される有機テルル化合物、
(b)式(1)で表される有機テルル化合物とアゾ系重合開始剤の混合物、
(c)式(1)で表される有機テルル化合物と式(2)で表される有機ジテルル化合物の混合物、又は
(d)式(1)で表される有機テルル化合物、アゾ系重合開始剤及び式(2)で表される有機ジテルル化合物の混合物
のいずれかであるポリ乳酸用改質剤。
(R 1 Te) 2 (2)
(式中、R 1 は、上記と同じ。) A polylactic acid modifier having a segment (A) consisting only of polymethyl methacrylate and a segment (B) consisting only of polystyrene, which is a block polymer having the following characteristics (a) to (c) :
(A) The weight ratio (A) / (B) of the segment (A) to the segment (B) is 0.4 to 9.0.
(Ii) the number average molecular weight of the block polymer, 4 0,000~100,000
(C) Molecular weight distribution 1.0-2.0
The block polymer is a polymer obtained by polymerization using an organic tellurium compound-based polymerization initiator,
Organic tellurium compound polymerization initiator,
(A) an organic tellurium compound represented by formula (1),
(B) a mixture of an organic tellurium compound represented by formula (1) and an azo polymerization initiator,
(C) a mixture of an organic tellurium compound represented by formula (1) and an organic ditellurium compound represented by formula (2), or
(D) Mixture of organic tellurium compound represented by formula (1), azo polymerization initiator and organic ditellurium compound represented by formula (2)
The modifier for polylactic acid which is either.
(R 1 Te) 2 (2)
(In the formula, R 1 is the same as above.)
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