JP5372954B2 - 構造および/または電気化学特性のための均質二重層の固体薄膜蒸着 - Google Patents
構造および/または電気化学特性のための均質二重層の固体薄膜蒸着 Download PDFInfo
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Description
米国政府は、米国エネルギー省とMidwest Research Instituteの一部門であるNational Renewable Energy Laboratoryとの間で締結された契約番号第DE−AC36−99GO10337号により、本発明に対する権利を有する。
Claims (19)
- 固体薄膜電気化学装置であって、
少なくとも1つの電極と、
該電極上に蒸着された電解質層と、
を備え、該電解質層が、
同一の材料で形成される第1および第2の層を含み、
前記第1の層が前記第2の層よりも薄く、かつ、緻密に形成された薄層であり、
前記第2の層が前記第1の層よりも厚く形成された厚層である固体薄膜電気化学装置。 - 前記第1の層が酸素および水のいずれかまたは両方に対する障壁を提供する、および、前記第2の層が機械的安定性を提供する、のいずれかまたは両方であって、両層が良好なイオン伝導体である請求項1記載の固体薄膜電気化学装置。
- 基板、第2の電極層、1または複数の集電装置および1または複数のエレクトロクロミック層のうちの1または複数をさらに備えた請求項1記載の固体薄膜電気化学装置。
- 前記電解質層が、リチウムイオン伝導性である請求項1記載の固体薄膜電気化学装置。
- 前記電極が、リチウムイオン反応性である請求項1記載の固体薄膜電気化学装置。
- 前記電極の一方または両方がリチウム化電極であって、前記電解質層がリチウムベースである請求項1記載の固体薄膜電気化学装置。
- 前記電極が、リチウム化金属酸化物、コバルト酸リチウム(LiCoO2)、マンガン酸リチウム(LiMnO2またはLiMn2O4)、ニッケル酸リチウム(LiNiO)、スピネルまたはコバルト、マンガンあるいはニッケルのうちの2以上の混合物、またはリチウム化金属リン酸塩、またはリン酸鉄リチウム(LiFePO4)のうちの1または複数を含む請求項1記載の固体薄膜電気化学装置。
- 前記電解質層が、ヨウ化リチウム(LiI)、リン酸リチウムオキシナイトライド(LiPON)、Li+輸送能力を有する固体ポリマーセパレータ、リチウム塩を含有する固体ポリマーセパレータ、リチウムおよびハロゲン複合材料、四ハロゲン化アルミニウムリチウム、四フッ化アルミニウムリチウム(LiAlF4)のうちの1または複数を含む固体電解質層である請求項1記載の固体薄膜電気化学装置。
- 前記電極が、リチウム金属、黒鉛、特定の金属酸化物、または別の炭素ベース形態のうちの1または複数を含む請求項1記載の固体薄膜電気化学装置。
- リチウム金属、黒鉛、金属酸化物、または別の炭素ベース形態のうちの1または複数を含む第2の電極をさらに備えた請求項1記載の固体薄膜電気化学装置。
- 薄膜電池、リチウムイオン電池、またはエレクトロクロミック装置のうちの1または複数であるか、あるいは一部である請求項1記載の固体薄膜電気化学装置。
- 前記第1および第2の層が、別の製造的特徴を使用して形成される請求項1記載の固体薄膜電気化学装置。
- 前記第1および第2の層が、異なる温度、圧力、速度、蒸着速度、濃度または別の大気条件のうちの1または複数を含む別の製造的特徴を使用して形成される請求項1記載の固体薄膜電気化学装置。
- 前記第1および第2の層が高真空にて形成され、該第1の層が、より緻密で低浸透性の層を形成するために、ある低圧下にて形成され、第2の層が、第1の層が形成される圧力よりも低真空の高圧にて形成される請求項1記載の固体薄膜電気化学装置。
- 前記第1および第2の層が高真空にて形成され、該第1の層が、より緻密で低浸透性の層を形成するために、ある低圧下にて形成され、第2の層が、第1の層が形成される圧力の100倍の高圧下で形成される請求項1記載の固体薄膜電気化学装置。
- 固体薄膜電気化学装置の製造方法であって、
電極を支持材上に蒸着する工程と、
電解質層を電極上に蒸着する工程と、を含み、該電解質層の蒸着工程が同一の材料で形成される第1および第2の層の電解質層を蒸着する工程を含み、該第1および第2の層が、前記第2の層よりも薄く緻密に形成される薄層の第1の層と、前記第1の層よりも厚く形成される厚層の第2の層を含む方法。 - 前記第1および第2の層の異なる緻密性が、種々の温度、圧力、速度、蒸着速度、濃度または別の大気条件のうちの1または複数を含む、1または複数の製造的特徴を変更することによってもたらされる請求項16記載の方法。
- 電極および同一の材料で構成される第1および第2の層を含む電解質層を含んでいる固体薄膜電気化学装置を形成する方法であって、電極層を形成する工程と、前記第2の層よりも薄く緻密に形成される薄層の前記第1の層を形成する工程と、前記第1の層よりも厚く形成される厚層の第2の層を形成する工程と、を含む方法。
- 前記第1の層が薄膜蒸着によって前記電極上に形成され、前記第2の層が異なる製造条件にて前記第1の層上に形成される請求項18記載の方法。
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/US2008/054894 WO2009108184A1 (en) | 2008-02-25 | 2008-02-25 | Homogeneous, dual layer, solid state, thin film deposition for structural and/or electrochemical characteristics |
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| Publication Number | Publication Date |
|---|---|
| JP2011508951A JP2011508951A (ja) | 2011-03-17 |
| JP5372954B2 true JP5372954B2 (ja) | 2013-12-18 |
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|---|---|
| US (1) | US8691447B2 (ja) |
| EP (1) | EP2248218B1 (ja) |
| JP (1) | JP5372954B2 (ja) |
| KR (1) | KR101442883B1 (ja) |
| WO (1) | WO2009108184A1 (ja) |
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- 2008-02-25 KR KR1020107018876A patent/KR101442883B1/ko active Active
- 2008-02-25 WO PCT/US2008/054894 patent/WO2009108184A1/en active Application Filing
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| Publication number | Publication date |
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| KR20100133367A (ko) | 2010-12-21 |
| US20100261067A1 (en) | 2010-10-14 |
| WO2009108184A1 (en) | 2009-09-03 |
| EP2248218B1 (en) | 2020-09-16 |
| US8691447B2 (en) | 2014-04-08 |
| KR101442883B1 (ko) | 2014-09-23 |
| JP2011508951A (ja) | 2011-03-17 |
| EP2248218A1 (en) | 2010-11-10 |
| EP2248218A4 (en) | 2011-12-28 |
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