JP5723068B2 - Method and computing device for anodizing aluminum parts - Google Patents

Description

  The present invention relates generally to manufacturing and component formation. More particularly, this embodiment relates to the final appearance improvement of an anodized metal part.

  The appearance of a computing system or computing device is important to many consumers. In particular, an aesthetically pleasing and aesthetically clean device without any seams, burrs, marks or other irregularities can feel better and desirable than a device that is less aesthetically pleasing. Creating an aesthetically pleasing and durable appearance for computing systems and other devices including metal parts may involve the use of anodized metal parts.

  Anodization of metal parts, among other advantages, hardens and strengthens the surface, increases resistance to corrosion and abrasion, and provides better adhesion to paint primers and adhesives, It is generally well known that the outer surface of such components can be improved. In addition, the appearance of the anodized surface is uniform and aesthetically favorable, especially with respect to aluminum. It is also generally well known that anodization tends to change the crystal structure or other fine texture of the metal material. However, this is generally not a problem because the advantages of anodizing aluminum and other metals often outweigh any costs or disadvantages.

  Unfortunately, the appearance of an anodized metal part or part system is not intact or complete, and the fine structure of the part (s) can include defects, irregularities, or trace amounts of Ti, B, Foreign substances such as Cu, Fe, Si and the like are included. The presence of such defects or irregularities, such as seams or cracks, that can occur in the weld zone can become apparent during anodization. This can be the appearance of the anodized metal part (s) with black lines, white lines, pits, or other flaws that are exposed or otherwise evident as a result of the anodizing process. Such minor amounts of minor “black line” scratches may be acceptable in some cases, but such results reduce aesthetic value and often eliminate or recycle parts in the manufacturing process. There is a possibility of increasing the amount.

  Many designs and methods used for anodizing metal parts and components have generally worked in the past, but result in an increased appearance rate of acceptable parts that are acceptable and visually favorable. There is an ongoing need to provide further designs and methods for anodizing metal parts. In particular, what is desired is anodization of metal parts with inherent internal defects or flaws, but is final in appearance and is less likely to result in elimination or recycling of parts for cosmetic reasons. An improved design and method that enables anodization of metal parts resulting in an anodized finish.

  This application describes various embodiments relating to systems and methods for anodizing metal parts having inherent internal defects or flaws, which systems and methods are further aesthetically pleasing and for aesthetic reasons. Produces a final anodized finish that is less likely to fail or recycle parts. This can be done by using, at least in part, manufacturing systems and methods that employ dedicated degreasing, chemical polishing and anodizing processes for the processing of metal parts.

  In various embodiments, a system configured for the manufacture of anodized metal parts can include at least a degreasing station, a chemical polishing station, and an anodizing station. The degreasing station may be configured to degrease individual metals using an alkaline solution containing a mild cleaning agent, the alkaline solution having a pH in the range of about 8-9. The chemical polishing station chemically polishes the degreased metal part at a temperature in the range of about 105-115 degrees Celsius for about 15-30 seconds by using a chemical polishing solution containing one or more dedicated additives. It may be constituted as follows. The anodization station may be configured to anodize the chemically polished part at a voltage in the range of about 12.5 to 14.5 volts for about 15 to 20 minutes. More specifically, chemical polishing can be performed for about 15 seconds, while anodization can be performed for about 15 minutes.

  In various detailed embodiments, other types of metal parts can be processed, but the system may be specially configured for use with aluminum parts. An additional system station is configured to neutralize or activate the metal part between degreasing and chemical polishing, and after processing the part by the degreasing station, the metal part is moved to tap water. One or more rinse stations configured to be rinsed with and one or more deionized rinses configured to rinse the metal part with deionized water after the part has been processed by the chemical polishing station And a station. A still further system station is configured to smut the anodized metal part in a nitric acid solution at a temperature of about 25 degrees Celsius for about 30 seconds, The sealing station and the sealed metal part configured to be sealed using an acetate solution applied at a temperature in the range of about 92-96 degrees Celsius for about 10-15 minutes A bake station configured to bake at a temperature in the range of about 85-90 degrees Celsius. In one specific embodiment, the chemical polishing solution comprises about 76-82 wt% phosphoric acid, 18-20 wt% sulfuric acid, 1-5 wt% nitric acid, 1-1.5 wt% corrosion inhibitor addition. Agent, 1 to 1.5% by weight buffer, and a minor amount of an aliphatic alcohol ethoxyl compound.

  In further embodiments, various methods of manufacturing metal parts having aesthetically pleasing surface finishes are provided. The steps of the method can include degreasing the metal part, chemically polishing the degreased metal part, and anodizing the chemically polished part. Specifically, the degreasing step can be performed using a mild detergent and an alkaline solution having a pH of about 8-9. Also, the chemical polishing step can be performed using a solution having one or more dedicated additives at a temperature in the range of about 105-115 degrees Celsius for about 15-30 seconds. Further, the anodizing step can be performed at a voltage in the range of about 12.5 to 14.5 volts for about 15 to 20 minutes. More specifically, the chemical polishing step can be performed for about 15 seconds, while the anodizing step can be performed for about 15 minutes. Again, the subject metal part may be aluminum and may be designed to be used, for example, in a computing device. Other metals and other forms of devices are possible.

  The additional process steps include a step of activating the degreased metal part between the degreasing step and the chemical polishing step, and a step of rinsing the degreased metal component with tap water after the degreasing step. Rinsing the chemically polished metal part with deionized water after the chemical polishing step; and smut removing the anodized metal part in a nitric acid solution at a temperature of about 25 degrees Celsius for about 30 seconds; Sealing the anodized metal part using an acetate solution applied at a temperature in the range of about 92-96 degrees Celsius for about 15 minutes; and sealing the sealed metal part for about 10-15 Baking for minutes at a temperature of about 85-90 degrees Celsius can be included.

  In a further embodiment, the computing device includes a processor, one or more input components coupled to the processor, one or more output components coupled to the processor, and at least one anodized metal component. And an outer housing. Specifically, the anodized metal component (s) may be defatted in a mild detergent and an alkaline solution having a pH in the range of about 8-9, for about 15-30 seconds, about 105 degrees Celsius. May be chemically polished using a solution having one or more dedicated additives at a temperature in the range of ˜115 degrees and a voltage in the range of about 12.5-14.5 volts for about 15-20 minutes. May be anodized. More specifically, the chemical polishing step can be performed for about 15 seconds, while the anodization can be performed for about 15 minutes. The anodized metal component (s) can include anodized aluminum. The outer housing can also include one or more microstructure defects that are not made noticeable as a result of the anodization process.

  Other devices, methods, features and advantages of the present invention will be or will be apparent to those skilled in the art upon review of the following figures and detailed description. It is intended that all additional systems, methods, features and advantages be included within this description, be within the scope of the invention and be protected by the accompanying claims.

The drawings included are for illustrative purposes only and serve to provide examples of possible structures and arrangements of the disclosed system and method for anodizing metal parts. These drawings in no way limit any changes in form and detail that may be made to the invention by those skilled in the art without departing from the spirit and scope of the invention.
1 is a front view of an exemplary computing device having one or more external metal parts that can be processed according to various embodiments of the invention. FIG. 1B is a side view of the exemplary computing device of FIG. 1A. FIG. 1 is a block diagram of a representative metal part finishing system. FIG. 1 is a block diagram of an alternative metal part finishing system according to an embodiment of the present invention. FIG. 2 is a flow chart of one method of manufacturing an anodized metal part. 6 is a flowchart of an alternative method of manufacturing an anodized metal component according to an embodiment of the present invention.

  Exemplary applications of the apparatus and method according to the present invention are described in this section. These examples are provided only for the purpose of providing further context and helping the understanding of the present invention. Thus, it will be apparent to one skilled in the art that the present invention may be practiced without some or all of these specific details. In other instances, well known process steps have not been described in detail in order not to unnecessarily obscure the present invention. Other applications are possible and the following examples should not be construed as limiting.

  In the following detailed description, references are made to the accompanying drawings that form a part hereof, and in which are shown by way of illustration specific embodiments of the invention. Although these embodiments have been described in sufficient detail to enable those skilled in the art to practice the invention, these examples are not limiting and other embodiments may be used, and It is understood that changes may be made without departing from the spirit or scope.

  The present disclosure relates generally to the manufacture of various metal housings and other computer components, and to manufacturing systems and processes configured to process and anodize such metal components. Although the following specific embodiments have been described with respect to a computer or computing device, other metal components and configurations are described herein without departing from the claimed invention features below. It will be readily appreciated that the elements may be processed similarly. For example, such parts can be used outside of refrigerators, valves, toys, or any other item with anodized parts that may be appropriate. Further alternatives will be readily understood by those skilled in the art.

  Referring first to FIGS. 1A and 1B, exemplary computing devices having one or more external metal parts that can be processed according to various embodiments of the present invention are illustrated in front and side views, respectively. The computing device 10 may be, for example, an iMac (registered trademark) personal computer commercially available from Apple, Inc. However, it will be readily appreciated that a wide variety of computing devices or other items having metal components are equally applicable to the systems and processes of the present invention. The computing device 10 can include an outer housing 20 that includes one or more anodized metal components. For example, the outer housing 20 can be formed from anodized aluminum. The display device 30 can be housed in the outer housing 20. The outer housing 20 can have a front-offset bottom 21 that borders the bottom of the display area, as well as an upper frame 22 that surrounds the remainder of the display area. A concave setback region (not shown) can be formed on the bottom 21 and / or just inside the frame 22 of the outer housing 20. In addition, a stand 40 or other similar structure can be used to support the entire computing device 10.

  As can be seen in FIGS. 1A and 1B, the overall structure and arrangement of the frame 22 and bottom 21 of the outer housing 20 generally secure and support the display cover in a location suitable for viewing the display device 30 therethrough. It is a simple way. As will be readily appreciated, the external housing 20 may include one or more processors, storage units, speakers, additional displays or indicators, buttons or other input devices, video cards, sound cards, power supplies, various ports, etc. Various additional computer components can also be housed therein. In some embodiments, the entire outer housing 20 is formed from a single piece of material, despite the fact that the housing may be formed from two or more parts that are welded, bonded, or otherwise joined together. The appearance that has been made can be exhibited. For example, the bottom 21 offset at the front may include a front portion that is welded, glued or otherwise secured to the remainder of the outer housing 20. In such an example, one or more cosmetic defects or defects may occur in the splice area 23 when the integrated parts 20, 21 are anodized or otherwise finished.

  Although a desktop computing device 10 is shown for purposes of illustration, many other forms of computing devices may similarly employ external metal components suitable for the finishing systems and methods provided herein. It will be readily understood that it can have. Examples of such other devices include a media playback device, a mobile phone, a tablet computing device, and the like. In addition, many other metal parts and components used for items other than computing devices may also be processed and finished using the various systems and methods disclosed herein.

  Turning now to FIG. 2, a representative metal part finishing system is illustrated in block diagram form. The metal part finishing system 200 can include a plurality of stations configured to process or process metal parts. As will be readily appreciated, such stations can include solution vessels with solutions therein, piping, nozzles and other fluid delivery components, drains, heaters, voltage applicators, and the like. The first station can be a degreasing station 210 followed by a tap water rinse station 212. A suitable defatted formulation for station 210 can be comprised of sodium hydroxide, sodium carbonate and surface activated components, which can be, for example, at a concentration of about 0.5 g / L.

  An alkaline etching station 220 can then be installed to provide alkaline etching for degreased metal parts. The alkaline etchant may include a sodium hydroxide based solution having a relatively high alkaline pH of about 13-18. After the alkaline etching station 220, another tap water rinse station 222 can be provided. There may also be a smut removal station 224 that may contain a nitric smut removal solution. Another tap water rinse station 226 can then be placed next to the smut removal station 224. As will be readily appreciated, rinsing may be performed at the same station in some arrangements, such that stations 212, 222 and 226 are actually the same station.

  A chemical polishing station 230 can be used to facilitate chemical polishing of metal parts. The chemical polishing solution can be, for example, 250 g / L sulfuric acid and 750 g / L phosphoric acid. Chemical polishing can be performed at a temperature of about 78-86 degrees Celsius for about 20-70 seconds. As will be readily appreciated, a deionized water rinse station 232 can then be provided after the chemical polishing station 230.

  An anodizing station 240 can then be used to anodize the chemically polished part. For example, anodization can be performed using 220 g / L sulfuric acid at a voltage of about 14.5 to 15.5 volts for about 23 to 26 minutes. Subsequent to the anodization of the metal parts, a sealing station 250 and a bake station 260 can also be provided, and the functions, temperatures and times used in these final stations are generally well known to those skilled in the art.

  Continuing with FIG. 3, an alternative metal part finishing system according to an embodiment of the present invention is similarly shown in block diagram form. The metal part finishing system 300 is similar in some respects to the system 200, but has some notable differences. Specifically, details regarding the degreasing station 310, chemical polishing station 320, and anodizing station 330 should be noted as being significantly different from those relating to the system 200. Furthermore, although an alkaline etching station is not provided, a surface activation station is added instead.

  Starting with the degreasing station 310, a preferred degreasing liquid for the station can be comprised of a mild detergent contained in a weakly alkaline solution having a pH of about 8-9, for example. This makes it possible to obtain effective degreasing of metal parts without exposing the parts to highly alkaline solutions with severe properties such as those used in the previous examples. In one particular example, the mild detergent may be the Upland 102 model industrial detergent provided by HangZhou Ylang Chemical Company, China. The tap water rinse station 312 can then be used after the metal parts are degreased at the degreasing station 310. The tap water rinse station 312 may include the use of three separate cleaning tanks for efficient and effective rinsing of metal parts. In addition, ultrasonic vibration may be applied to any of the stations 310-340 as desired for the fluid in the station 312 as well as for a given manufacturing system.

  An activation station 314 can then be provided to activate the surface of the metal part after the degreasing and rinsing stations. As a specific example, a 150 g / L nitric acid solution can be applied at about 25 degrees Celsius for about 30 seconds, resulting in effective activation of the degreased metal part. Another tap water rinse station 316 can then be provided. In some examples, the tap water rinse stations 312 and 316 may actually be the same station, if desired.

  A chemical polishing station 320 can then be provided for chemical polishing of metal parts. The chemical polishing solution used can contain one or more dedicated additives. In one embodiment, the additive can be found in the 2022 product model metal working fluid provided by HangZhou Phang Chemical Company of China. By using these specific additives, the resulting special chemical polishing solution is then about 76-82 wt% phosphoric acid, 18-20 wt% sulfuric acid, 1-5 wt% nitric acid, 1- 1.5 wt% corrosion inhibitor additive, 1 to 1.5 wt% buffering agent, and trace amounts of aliphatic alcohol ethoxyl compounds. Actual polishing using this dedicated solution can be performed at a temperature in the range of about 105-115 degrees Celsius for about 15-30 seconds, which is generally higher and shorter than the previous examples. It is. More specifically, chemical polishing can be performed for about 15 seconds. As will be readily appreciated, a deionized water rinse station 322 can then be provided after the chemical polishing station 320. The smut removal station 324 can then be used to smut the metal parts. Such desmutting can include a nitric acid solution having a concentration of less than about 100 g / L, and can be performed, for example, at about 25 degrees Celsius for about 30 seconds. Other smut removal details or variations are possible.

  An anodizing station 330 can then be used to anodize the chemically polished part. For example, anodization can be performed using 200 g / L sulfuric acid at a voltage of about 12.5 to 14.5 volts for about 15 to 20 minutes. More specifically, anodization can be performed for about 15 minutes. Compared to the previous example, this is a low concentration solution that is used for a short time at low voltage. Then another smut removal station 332 can be used to smut the metal parts after anodization. Again, such desmutting may include a nitric acid solution having a concentration of less than about 100 g / L, and may be performed, for example, at about 25 degrees Celsius for about 30 seconds.

  The sealing station 340 can then be used to provide a sealing function. For example, sealing can be performed using an acetate solution at about 95 degrees Celsius for about 10 minutes. The bake station can then be used to provide a bake function. For example, baking can be performed at about 85 to 90 degrees Celsius for about 10 minutes.

  As a result of different details in the metal part finishing system 300 with respect to the previous embodiment (especially degreasing station 310, chemical polishing station 320 and anodizing station 330), improved results in the final appearance of the metal part Can be realized. Specifically, many black lines, white lines, pits and other appearance defects are less noticeable despite the presence of minor scratches on the substrate or problems that usually cause such appearance problems. . Thus, it has been found that the use of the system 300 of FIG. 3 and the corresponding process of FIG. 5 results in a significantly improved appearance of the anodized component. That is, using the system 200 and the corresponding process of FIG. 4 can use the system 300 and the corresponding process of FIG. 5 even if it can result in more noticeable visual flaws in the finished anodized metal part. If not. Thus, if a metal part includes one or more microstructure defects such as defects, such defects should be noticeable in the final appearance as a result of the anodization process used in system 300 and FIG. It has not been.

  FIG. 4 provides a flowchart of an exemplary method of manufacturing an anodized metal part. This flowchart generally represents a process that can be implemented using the system 200 described above in FIG. After the initial step 400, the degreasing mix can be used in process step 402 to degrease metal parts. Such a degreasing compounding liquid can be comprised from sodium hydroxide, sodium carbonate, and a surface activation component, for example. After degreasing step 402, a tap water rinse can also be performed. In a subsequent process step 404, an alkaline etching procedure is performed using a sodium hydroxide based solution having a relatively high alkaline pH of about 13-18. Again, a tap water rinse may be performed after this alkaline etching step 404.

  In a subsequent process step 406, smut removal can be performed on metal parts using such smut removal using a 30-40 wt% nitric acid solution. This can be done, for example, at room temperature for about 30-60 seconds. Again, a tap water rinse may be performed after this smut removal step 406. Chemical polishing can then be performed on the metal part in process step 408. Such chemical polishing can be performed using a solution containing 250 g / L sulfuric acid and 750 g / L phosphoric acid at a temperature of about 78-86 degrees Celsius for about 20-70 seconds. After this chemical polishing step 408, a water rinse can also be performed and may involve the use of deionized water.

  In a subsequent process step 410, the metal part can then be anodized using sulfuric acid at a concentration of 220 g / L at a voltage of about 15 (± 0.5) volts for about 23-26 minutes. . Subsequent process step 412 can include sealing the anodized metal part in a solution of nickel acetate and water at a temperature of about 92-96 degrees Celsius for about 15 minutes. Process step 414 may then include baking the sealed part for about 10-15 minutes at about 80-100 degrees Celsius. The method then ends at end step 416.

  Finally, in FIG. 5, a flow chart illustrating an alternative method of manufacturing an anodized metal part according to one embodiment of the present invention is provided. It will be appreciated that the steps provided are for illustrative purposes only and other steps may be included in the process as desired. Furthermore, the order of the steps may be changed as necessary, and it is not necessary to perform all the steps in various examples. For example, if desired, the smut removal step 516 may be performed early in the process. In other examples, various additional water rinsing steps may be performed and repeated throughout the process.

  After the start step 500, the appropriate metal parts can be degreased in process step 502. Again, this may be an aluminum part, but other types of metals can be used. As in the previous embodiment of FIG. 3, degreasing can be performed in a weak alkaline solution having a pH of about 8-9. More particularly, the pH may be about 8.5. Other details regarding degreasing may be the same as or substantially the same as provided above in the embodiment of FIG. Following degreasing, the metal parts can then be cleaned or rinsed as needed using tap water in process step 504. Such tap water rinsing can be performed by, for example, a three-tank process.

  In a subsequent process step 506, the metal part can then be activated in nitric acid solution. In one example, a 150 g / L nitric acid solution can be applied at about 25 degrees Celsius for about 30 seconds. Another optional tap water rinse can then be performed in process step 508. Again, such a tap water rinse can be performed, for example, in a three tank process. Chemical polishing of the metal part can then be performed in process step 510. Again, as in the previous embodiment of FIG. 3, chemical polishing can be performed using a chemical polishing solution that includes one or more dedicated additives, which can take approximately 15-30 seconds, It can be performed at a temperature of about 105 to 115 degrees Celsius. Other details regarding chemical polishing may be the same as or substantially the same as those provided in the embodiment of FIG.

  A deionized water rinse can then be performed in process step 512. This deionized water rinse can be similarly performed in a three tank process. Smut removal can then be performed on the metal part in process step 514. Such desmutting can include a nitric acid solution having a concentration of less than about 100 g / L, which can be performed at about 25 degrees Celsius for about 30 seconds. In a subsequent process step 516, the metal part can be anodized. Specifically, anodization can be performed using 200 g / L sulfuric acid at a voltage in the range of about 12.5 to 14.5 volts for about 15 to 20 minutes. More particularly, a voltage of about 13.5 volts can be used. Then, in process step 518, another smut removal can be performed on the metal part, and such smut removal is the same as or similar to the smut removal in step 514.

  A sealing function can then be performed in process step 520. Sealing can be performed using an acetate solution at about 95 degrees Celsius for about 10 minutes. A bake can then be performed at process step 522, and such a bake is performed at about 85-90 degrees Celsius for about 10 minutes. The method then ends at end step 524. In addition to the details described above, it will be readily appreciated that one or more of the solution-based processes or rinses can be performed as desired using an ultrasonic vibration tank or bath.

Although the invention described above has been described in detail by way of illustration and example for purposes of clarity and understanding, the invention described above is subject to numerous other specific modifications without departing from the spirit or essential characteristics of the invention. It will be appreciated that examples and embodiments may be implemented. It will be understood that certain changes and modifications may be practiced, and the invention is not limited by the details described above, but is defined by the scope of the appended claims.

Claims (8)

A method for anodizing aluminum parts,
The aluminum component comprises a first portion and a second portion which is Awa connect to each other in the joining region, said joining region comprises more resulting microstructure defects stitching process,
The method
Comprising the steps of degreasing said aluminum component in an alkaline solution having a mild detergent, the alkaline solution has a pH in the range of 8-9, the steps,
The defatted already aluminum components, comprising the steps of chemical polishing 1 5-30 seconds, at a temperature in the range of 1 05 to 115 ° Celsius, using a solution in which the chemical polishing has one or more dedicated additives And the process performed
The chemical polished parts to 1 5 to 20 minutes, and a step of anodic oxidation at a voltage in the range of 1 2.5 to 14.5 volts,
The method, wherein the microstructure defects are not visually noticeable after the degreasing, chemical polishing, and anodizing. The method of claim 1 , wherein the aluminum component is designed for use in a computing device. The method according to claim 1 , further comprising activating the degreased aluminum part between the degreasing step and the chemical polishing step. The method according to claim 1 , further comprising rinsing the degreased aluminum part with tap water after the degreasing step. The method of claim 1 , further comprising rinsing the degreased aluminum part with deionized water after the chemical polishing step. The anodized aluminum parts, 3 0 seconds, further comprising the step of desmutting in centigrade 2 of 5 degrees temperature nitric acid solution, The method of claim 1. A step of sealing the anodized aluminum parts, using a 1 5 minute feeding acetate solution applied at a temperature in the range of Mr 9 2 to 96 degrees,
The aluminum parts of the resin encapsulated, 1 0-15 minutes, feeding the steps of baking at a temperature in the range of 8 5 to 90 degrees Mr.
The method of claim 1 , further comprising: A computing device,
A processor;
One or more input components coupled to the processor;
One or more output components coupled to the processor;
An outer housing comprising at least one anodized aluminum component;
Wherein the at least one anodized aluminum component includes a first portion and a second portion which is Awa connect to each other in the joining region, said joining region comprises more resulting microstructure defects stitching process, mild degreased in an alkaline solution having a pH in the range of Do detergent及beauty 8-9, 1 5-30 seconds, at a temperature in the range of Mr 1 05-115 degrees intake, a solution having one or more dedicated additives use the chemical polishing, and, 1 5 to 20 minutes, anodized at a voltage ranging from 1 2.5 to 14.5 volts, the microstructure defects, the degreasing, chemical polishing, and anodic oxidation A computing device, characterized in that it is not visually noticeable later.

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