JP6279309B2 - Polishing cushion, polishing apparatus, polishing method, and article including an object polished by the polishing method - Google Patents

Description

  One aspect of the present invention relates to a polishing cushion, a polishing apparatus, a polishing method, and an article including an object polished by the polishing method.

  Conventionally, a polishing apparatus for polishing a metal material or the like is known. For example, a polishing apparatus including a polishing disk or a polishing wheel is in circulation. For example, the following Patent Document 1 describes a contact element that supports an abrasive belt and applies the abrasive belt to a workpiece. This contact element has a series of serrated peaks and the grooves separating the individual peaks are filled with a softer material than the peaks. Further, in Patent Document 2 below, a drive shaft that is eccentric with respect to a rotation shaft extending from a drive source provided in a drive unit and is rotatably connected to one end of the rotation shaft is rotated by rotation of the rotation shaft. An orbital sander drive device that orbitally moves a base plate that is supported by the drive unit and fixed to the other end of the drive shaft via a support post made of an elastic member by performing eccentric movement about the shaft core. Have been described.

British Patent Application No. 813963 U.S. Pat. No. 7,824,248

  It would be convenient if various types of polishing could be performed with a single polishing apparatus (in other words, for example, with a single polishing disk or endless polishing belt). For example, while the polishing surface is pressed against the object with a relatively high pressure, the workpiece surface is polished much, while the polishing surface is pressed against the object with a relatively low pressure to finely finish the processing surface. It is convenient if possible. In order to realize such a wide range of polishing modes with a single polishing apparatus, it is conceivable to arrange a cushion material on the back side of the polishing surface, but a desired polishing effect can be obtained only by using a conventional cushion material. Is difficult. Therefore, it is desired to realize a plurality of types of polishing modes as described above with a single polishing apparatus.

  The polishing cushion according to one aspect of the present invention includes a first outer layer facing one side of the polishing member and the support member, a second outer layer facing the other side of the polishing member and the support member, An inner layer located between the first outer layer and the second outer layer, and a plurality of spaces formed in the second outer layer into which the inner layer can enter, wherein the inner layer has a hardness of the first outer layer and the second outer layer. Lower than both hardnesses.

  In such a side surface, when pressure is applied to the polishing member during polishing, a part of the soft inner layer enters the space by the pressure. When the polishing member is applied to the object at a pressure that does not fill the entire space with the inner layer (that is, a relatively low pressure), the inner layer buffers the pressure, so that the polishing member is weakened to the work surface. It becomes possible to finish the surface finely. On the other hand, when the polishing member is applied to the object at a pressure that allows each space to be filled with the inner layer (that is, a relatively strong pressure), the inner layer is almost completely crushed and the pressure is hardly buffered. Almost all of the pressure is transmitted to the polishing member, so that the work surface is largely polished. As described above, by providing the outer layer with a space for the soft inner layer to enter, a plurality of types of polishing modes can be realized with a single polishing apparatus.

  According to one aspect of the present invention, a plurality of types of polishing modes can be realized with a single polishing apparatus.

1 is a perspective view of a polishing cushion according to an embodiment. It is a disassembled perspective view which shows an example of the polishing cushion which concerns on embodiment. It is a disassembled perspective view which shows another example of the cushion for grinding | polishing which concerns on embodiment. It is a perspective view which shows another example of the space of a polishing cushion. It is a perspective view which shows another example of the space of a polishing cushion. It is a perspective view which shows another example of the space of a polishing cushion. It is a perspective view which shows another example of the space of a polishing cushion. It is a perspective view which shows another example of the space of a polishing cushion. It is a perspective view which shows another example of the space of a polishing cushion. It is a perspective view which shows another example of the space of a polishing cushion. It is a figure of a portable grinder provided with the polishing cushion which concerns on embodiment. It is a disassembled perspective view which shows attachment of the cushion for grinding | polishing in a portable grinder. It is a perspective view of a grinding wheel provided with a cushion for grinding concerning an embodiment. It is a disassembled perspective view which shows attachment of the cushion for grinding | polishing in a grinding | polishing wheel. It is a figure of the single action sander provided with the cushion for grinding concerning an embodiment. It is a figure of a double action sander provided with the cushion for grinding concerning an embodiment. It is a disassembled perspective view which shows attachment of the cushion for grinding | polishing in a single action sander or a double action sander. It is sectional drawing which shows typically a mode that the cushion for grinding | polishing which concerns on embodiment changes with press. It is a table | surface which shows the result of the grinding | polishing amount and surface finish in an Example and a comparative example.

  Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. In the description of the drawings, the same or equivalent elements are denoted by the same reference numerals, and redundant description is omitted.

  First, the structure of the polishing cushion 10 according to the embodiment will be described with reference to FIGS. The polishing cushion 10 is an article disposed between a polishing member and a support member that are components of the polishing apparatus. In general, the purpose of polishing is not one. For example, there are several modes such as cutting a large number of surfaces of the object (surface to be processed) or finely finishing the surface. The polishing cushion 10 is used to realize such a plurality of types of polishing modes with a single polishing apparatus.

  Here, the term “polishing” in this specification is a concept including grinding. Further, the term “abrasive member” in this specification is a component having an abrasive surface that comes into contact with the surface of an object. Further, the term “support member” in the present specification is a component that directly or indirectly supports the polishing member and the polishing cushion 10 during polishing.

  As shown in FIG. 1, the polishing cushion 10 comprises at least three layers. Specifically, the polishing cushion 10 includes a first outer layer 11 facing one side of the polishing member and the support member, and a second outer layer 12 facing the other side of the polishing member and the support member. And an inner layer 13 positioned between these two outer layers. The first outer layer 11, the second outer layer 12, and the inner layer 13 are all flat, and these three layers are stacked with an adhesive. The thickness of each layer may be determined in consideration of the size of the polishing member, the type and size of the polishing apparatus, and the like.

  The first outer layer 11 and the second outer layer 12 are produced using, for example, natural rubber or synthetic rubber (for example, urethane rubber or chloroprene rubber) as a main raw material. On the other hand, the inner layer 13 is a foam obtained from, for example, natural rubber or synthetic rubber. Considering the buffering properties and elasticity of the inner layer 13, the foam is preferably the closed cell type rather than the open cell type, but of course, an open cell type foam may be used. Alternatively, the main raw material of the inner layer 13 may be natural rubber or synthetic rubber having a lower hardness than the first outer layer and the second outer layer 12.

  The hardness of the inner layer 13 is lower than both the hardness of the first outer layer 11 and the hardness of the second outer layer 12. The hardness of each layer is measured in accordance with “Vulcanized rubber and thermoplastic rubber—How to obtain hardness—” (JIS K6253 (2012 edition)), which is a standard for measuring the hardness of rubber. For example, if the inner layer 13 is so soft that it is difficult to measure with a type A durometer, the hardness of the inner layer 13 should be measured using a type E durometer. As long as the above relationship is satisfied, the specific numerical values of the hardness of the inner layer 13 and the hardness of the two outer layers are not limited. As an example, the hardness of the first outer layer 11 and the second outer layer 12 may be 70 in a type A durometer, and the hardness of the inner layer 13 may be 5 in a type E durometer. Alternatively, the hardness of the first outer layer 11 and the second outer layer 12 may be 50 with a type A durometer, and the hardness of the inner layer 13 may be 10 with a type E durometer. The hardness may be different between the first outer layer 11 and the second outer layer 12.

  A plurality of spaces 14 are formed in one of the two outer layers (referred to as the second outer layer 12 in this specification). As shown in FIG. 2, the space 14 may be a hole (a space without a bottom) 14 a penetrating from one surface of the second outer layer 12 to the opposite surface. Alternatively, the space 14 may be a recess (a space with a bottom) 14b formed on one surface of the second outer layer 12 as shown in FIG. In any case, the surface of the second outer layer 12 having the opening of the space 14 is bonded to the inner layer 13.

  2 and 3, the circular spaces 14 are arranged in a staggered manner, but the shape and arrangement of the spaces 14 are not limited to this. A part of the modification of space is shown in FIGS. In addition, in the modification of FIGS. 4-9, space is a through-hole, However, It may be a hollow naturally. In the modification of FIG. 10, the space is a depression.

  In FIG. 4, the triangular spaces 14 are arranged in a staggered manner, and in FIG. 5, the rectangular spaces 14 are arranged in a staggered manner. Of course, the staggered arrangement is not essential. For example, the spaces 14 may be arranged in a lattice pattern. In FIGS. 6 to 10, each space has a slit shape. In FIG. 6, the spaces 14 extending along one side of the second outer layer 12 are arranged in a staggered manner. In FIG. 7, the space 14 extending along one side of the second outer layer 12 is aligned along a side orthogonal to the one side. In FIG. 8, the spaces 14 extending obliquely with respect to the outer edge of the second outer layer 12 are aligned. In FIG. 9, the zigzag spaces 14 are aligned. In FIG. 10, spaces 14 extending obliquely with respect to the outer edge of the second outer layer 12 are arranged in a net shape. Of course, the shape of the space 14 is not limited to these, and various shapes such as a hexagon, a star, an ellipse, a waveform, an arc, and a sector are conceivable.

  Spaces 14 having different shapes may be mixed in one second outer layer 12, for example, a triangular space 14 and a rectangular space 14 may be mixed, or the circular space 14 and the slit-shaped space 14 may be mixed. It may be mixed. Further, in one second outer layer 12, through holes and depressions may be mixed. Further, the size of each space 14 in one second outer layer 12 may vary, for example, a circular space 14 having a diameter of 1 cm and a circular space 14 having a diameter of 2 cm are mixed. May be.

  The ratio of the area | region of the space 14 in the whole 2nd outer layer 12, ie, the porosity, is not limited, For example, the porosity may be in the range of 50 to 80%. Since the shape or size of the space 14 in one second outer layer may vary, the porosity may vary depending on the position of the calculation target region. For example, in one second outer layer 12, there may be a case where the porosity near the periphery is 50% and the porosity near the center is 70%.

  Next, application examples of the polishing cushion 10 will be described with reference to FIGS. FIGS. 11 and 12 show an example in which the polishing cushion 10 is applied to a portable grinder 20. In this example, the polishing member is a polishing disk 21 and the support member is a pad 22. FIG. The polishing cushion 10 is processed according to the shape of the polishing disk 21 and the pad 22, and a through hole is formed at the center thereof. The polishing cushion 10 is detachably attached to the portable grinder 20 like the polishing disk 21 and the pad 22. As shown in FIG. 12, the user inserts these three components in the order of the pad 22, the polishing cushion 10, and the polishing disk 21 into the shaft 23 extending from the main body of the portable grinder 20. Then, the user fastens the pad 22, the polishing cushion 10, and the polishing disc 21 to the shaft 23 by tightening the nut 24 to the male screw formed at the end of the shaft 23.

  FIGS. 13 and 14 show an example in which the polishing cushion 10 is attached to the polishing wheel 30. In this example, the polishing member is an endless polishing belt 31 and the support member is a wheel 32. FIG. FIG. 14 shows a plurality of polishing cushions 10 that are shorter than the outer periphery of the wheel 32 (for example, eight polishing cushions 10 having a length that is 1/8 of the outer periphery). It may be endless (ie, a ring). The polishing cushion 10 is detachably mounted on the outer peripheral surface of the wheel 32. If a plurality of polishing cushions 10 are attached as shown in FIG. 14, an adhesive layer or an adhesive layer is further formed on the outer layer (second outer layer 12 in FIG. 14) of the polishing cushion 10 facing the wheel 32 side. Is done. In this case, the user attaches the polishing cushion 10 to the outer peripheral surface of the wheel 32 and then attaches the endless polishing belt 31 to the wheel 32. If the polishing cushion 10 is endless (ring), the user first attaches the polishing cushion 10 to the wheel 32 and then attaches the endless polishing belt 31 to the wheel 32.

  The polishing cushion 10 can also be applied to the single action sander 40A shown in FIG. 15 and the double action sander 40B shown in FIG. These polishing apparatuses 40A and 40B include a common polishing pad 41 shown in detail in FIG. In this polishing pad 41, the polishing member is a polishing disk 42 and the support member is a pad 43. The polishing cushion 10 is processed according to the shape of the polishing disk 42 and the pad 43. The polishing cushion 10 is detachably attached to the single action sander 40A or the double action sander 40B. As shown in FIG. 17, the user attaches a pad 43 to the shaft 44 extending from the main body of the polishing apparatus 40A or 40B, attaches the polishing cushion 10 to the pad 43, and attaches the polishing disk 42 to the polishing cushion 10. wear. Note that the sticking can be realized with a hook-and-loop fastener or an adhesive. By this series of operations, the pad 43, the polishing cushion 10, and the polishing disk 42 are fixed to the shaft 44.

  Regardless of the type of polishing apparatus, there are two modes of use of the polishing cushion 10. First, as shown in FIGS. 11 to 17, the second outer layer 12 formed with a plurality of spaces 14 faces the support member (pad 22, wheel 32, or pad 43) and does not have the space 14. In this method, the polishing cushion 10 is attached to the polishing apparatus so that the first outer layer 11 faces the polishing member (the polishing disk 21, the endless polishing belt 31, or the polishing disk 42). The other is a method of attaching the polishing cushion 10 to the polishing apparatus such that the second outer layer 12 faces the polishing member and the first outer layer 11 faces the support member.

  As described above, the types of the polishing apparatus and the usage modes of the polishing cushion are various. In any case, the user can use the polishing apparatus in which the polishing cushion 10 is disposed between the polishing member and the support member. Polish the object. The polished object is provided as an article as it is or as a part of the article.

  When the user presses the surface of the polishing member against the object to polish the surface to be processed, the inner layer of the polishing cushion 10 disposed between the polishing member 50 and the support member 60 as shown in FIG. 13 enters the space 14 formed in the second outer layer 12. As shown in the middle part of FIG. 18, when the user applies the polishing member 50 to the object at a pressure that does not completely fill the space 14 (that is, a relatively low pressure), the inner layer 13 reduces the pressure. Since the buffering is performed, the polishing member 50 can be weakly applied to the surface to be processed, and as a result, the surface can be finely finished. On the other hand, as shown in the lower part of FIG. 18, when the user hits the polishing member 50 against the object with a pressure that allows the space 14 to be completely filled with the inner layer 13 (that is, a relatively high pressure), Is almost completely crushed between the first outer layer 11 and the second outer layer 12, and the space 14 is filled with the inner layer 13, so that the inner layer 13 hardly buffers the pressure. As a result, almost all of the pressure can be transmitted to the polishing member 50 to polish the surface of the object much.

  In a polishing cushion that does not have a space through which a soft inner layer can enter, the inner layer hardly deforms, so that the inner layer hardly absorbs pressure. As a result, even if many objects can be polished, it is difficult to finish the work surface finely. On the other hand, according to the present embodiment, by providing the second outer layer 12 with the space 14 into which the soft inner layer 13 enters, a plurality of types of polishing modes can be realized with a single polishing apparatus.

  As described above, the polishing cushion according to one aspect of the present invention has the first outer layer facing one side of the polishing member and the support member, and the other side of the polishing member and the support member. A second outer layer, an inner layer located between the first outer layer and the second outer layer, and a plurality of spaces formed in the second outer layer into which the inner layer can enter, wherein the hardness of the inner layer is that of the first outer layer. It is lower than both the hardness and the hardness of the second outer layer.

  A polishing apparatus according to one aspect of the present invention includes the above polishing cushion, a polishing member, and a support member.

  A polishing method according to one aspect of the present invention is a polishing method using a polishing apparatus, and polishes an object using a polishing apparatus in which a polishing cushion is disposed between a polishing member and a support member. A first outer layer facing the one side of the polishing member and the support member, a second outer layer facing the other side of the polishing member and the support member, and a first outer layer An inner layer located between the first outer layer and the second outer layer, and a plurality of spaces formed in the second outer layer into which the inner layer can enter, wherein the inner layer has both the hardness of the first outer layer and the hardness of the second outer layer. Lower than.

  Further, an article according to one aspect of the present invention includes an object polished by the above polishing method.

  In such a side surface, when pressure is applied to the polishing member during polishing, a part of the soft inner layer enters the space by the pressure. When the polishing member is applied to the object at a pressure that does not fill the entire space with the inner layer (that is, a relatively low pressure), the inner layer buffers the pressure, so that the polishing member is weakened to the work surface. It becomes possible to finish the surface finely. On the other hand, when the polishing member is applied to the object at a pressure that allows each space to be filled with the inner layer (that is, a relatively strong pressure), the inner layer is almost completely crushed and the pressure is hardly buffered. Almost all of the pressure is transmitted to the polishing member, so that the work surface is largely polished. As described above, by providing the outer layer with a space for the soft inner layer to enter, a plurality of types of polishing modes can be realized with a single polishing apparatus.

  In another aspect of the present invention, the first outer layer that does not have a space into which the inner layer can enter may face the polishing member side, and the second outer layer may face the support member side. By not providing a space in the first outer layer facing the polishing member, the pressure applied to the polishing cushion is transmitted almost uniformly from the first outer layer to the polishing member, so that the work surface can be polished without unevenness. It becomes possible.

  In another aspect of the present invention, the surface of the second outer layer in which openings in a plurality of spaces are formed may be bonded to the inner layer. In this case, since there is no intervening material between the inner layer and the opening, the inner layer easily enters the space, and the thickness of the inner layer is easily adjusted accordingly.

  In another aspect of the present invention, the plurality of spaces may be through holes. By making the space a through-hole, the volume of the inner layer that enters the space can be maximized, so that it is easy to apply a relatively low pressure to the polishing member. Further, since the formation of the through-hole is easier than in the case of forming the depression, the polishing cushion can be easily produced correspondingly.

  EXAMPLES Hereinafter, although this invention is demonstrated concretely based on an Example, this invention is not limited to them at all.

  As an example, a three-layer polishing cushion corresponding to the polishing cushion 10 was prepared. The main raw material of the first outer layer and the second outer layer was chloroprene rubber, and the main raw material of the inner layer was also chloroprene rubber. In the examples, the hardness of the first outer layer and the second outer layer was 50 in the type A durometer standard, and the hardness of the inner layer was 5 in the type E durometer standard. Moreover, the thickness of the 1st outer layer and the 2nd outer layer was 2 mm, and the thickness of the inner layer was 3 mm. The plurality of spaces formed in the second outer layer are circular through holes, and the through holes are arranged in a staggered pattern. The porosity was 50 to 80%.

  On the other hand, as a comparative example, a two-layer polishing cushion composed of one outer layer (corresponding to the first outer layer 11 in the above embodiment) having no space and an inner layer was prepared. The main raw materials and hardness of each layer were the same as those in the comparative example.

  The configuration other than the polishing cushion and the object to be polished were common to the examples and comparative examples. As a polishing apparatus, a centerless polishing machine manufactured by Hammond Roto-Finish Co, Inc. in Kalamazoo, Michigan, USA, Nisshinbo Hammond OD-2 (Nissinbo Hammond OD-2) -2) was used. Trizact ™ 363FC A35 manufactured by 3M Company in St. Paul, Minnesota, USA was employed as the polishing belt. The width of the abrasive belt was 5.08 cm (2 inches). As an object to be polished, a carbon steel rod having a diameter of 5.08 centimeters (2 inches) was used. The pressure during polishing was defined by the load current (ampere) of the centerless polishing machine.

  In the examples and comparative examples, the rod was polished with a centerless grinder twice, when the pressure was increased (load current was 4 amperes) and when the pressure was decreased (load current was 0.5 amperes). Here, the high pressure is a pressure such that the space in the second outer layer is completely filled with the inner layer in the embodiment (see the lower part of FIG. 18), and the low pressure is the pressure in the second outer layer in the embodiment. The pressure is such that a part of the space is not filled with the inner layer (see the middle part of FIG. 18). In both the examples and comparative examples, the polishing time was 1.5 seconds per 5.08 cm (2 inches, ie the length corresponding to the width of the polishing belt) in the length direction of the rod. FIG. 19 shows the result of the polishing in two aspects, the polishing amount and the surface finish. The amount of polishing was defined by the amount of reduction in the diameter of the rod, and the surface finish was defined by the surface roughness (more specifically, arithmetic average roughness (Ra)).

  The present invention has been described in detail based on the embodiments. However, the present invention is not limited to the above embodiment. The present invention can be variously modified without departing from the gist thereof.

  In the above embodiment, the polishing cushion 10 has a three-layer structure, but the polishing cushion may have four or more layers. However, the adhesive layer for attaching the first outer layer and the inner layer and the adhesive layer for attaching the second outer layer and the inner layer are not considered here. That is, another layer other than the adhesive layer may be present between the first outer layer and the inner layer, or between the second outer layer and the inner layer. However, the layer existing between the outer layer and the inner layer in which the space is formed needs to be thin or soft enough not to prevent the inner layer from entering the space. Or another layer may be affixed on the outer side of a 1st outer layer, and another layer may be affixed on the outer side of a 2nd outer layer.

  In the above embodiment, the space 14 is formed only in the second outer layer 12, but the space into which the inner layer enters may be formed in both the first outer layer and the second outer layer. In this case, the shape, size, and location of the space may be the same or different between the first outer layer and the second outer layer.

  When the polishing cushion 10 is used, another member may be interposed between the polishing cushion 10 and the polishing member, or another member may be interposed between the polishing cushion 10 and the support member. Also good. That is, the outer surface of the polishing cushion 10 may not be in contact with the polishing member or the support member.

  DESCRIPTION OF SYMBOLS 10 ... Cushion for grinding | polishing, 11 ... 1st outer layer, 12 ... 2nd outer layer, 13 ... Inner layer, 14 ... Space, 14a ... Through-hole (space), 14b ... Depression (space), 21 ... Polishing disk (abrasive member), DESCRIPTION OF SYMBOLS 22 ... Pad (support member), 31 ... Endless polishing belt (polishing member), 32 ... Wheel (support member), 42 ... Polishing disk (polishing member), 43 ... Pad (support member), 50 ... Polishing member, 60 ... Support member.

Claims (7)

A first outer layer facing one side of the polishing member and the support member;
A second outer layer facing the other side of the polishing member and the support member;
An inner layer located between the first outer layer and the second outer layer;
A plurality of spaces formed in the second outer layer, into which the inner layer can enter,
A polishing cushion, wherein the hardness of the inner layer is lower than both the hardness of the first outer layer and the hardness of the second outer layer. The first outer layer does not have a space into which the inner layer can enter and faces the polishing member;
The polishing cushion according to claim 1, wherein the second outer layer faces the support member.   The polishing cushion according to claim 1 or 2, wherein a surface of the second outer layer in which openings of the plurality of spaces are formed is bonded to the inner layer.   The polishing cushion according to any one of claims 1 to 3, wherein the plurality of spaces are through holes. A polishing cushion according to any one of claims 1 to 4, and
The polishing member;
A polishing apparatus comprising the support member. A polishing method using a polishing apparatus,
Polishing the object using the polishing apparatus in which a polishing cushion is disposed between the polishing member and the support member,
The polishing cushion is
A first outer layer facing one side of the polishing member and the support member;
A second outer layer facing the other side of the polishing member and the support member;
An inner layer located between the first outer layer and the second outer layer;
A plurality of spaces formed in the second outer layer and into which the inner layer can enter,
The polishing method, wherein the hardness of the inner layer is lower than both the hardness of the first outer layer and the hardness of the second outer layer. A method for producing an article polished using a polishing apparatus,
Including a step of obtaining a polished article by polishing an object using the polishing apparatus in which a polishing cushion is disposed between a polishing member and a support member,
The polishing cushion is
A first outer layer facing one side of the polishing member and the support member;
A second outer layer facing the other side of the polishing member and the support member;
An inner layer located between the first outer layer and the second outer layer;
A plurality of spaces formed in the second outer layer into which the inner layer can enter;
With
The hardness of the inner layer is lower than both the hardness of the first outer layer and the hardness of the second outer layer,
A method for producing a polished article.

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