JP6515557B2 - 三次元造形物製造用部材、三次元造形物製造装置、三次元造形物の製造方法および三次元造形物 - Google Patents
三次元造形物製造用部材、三次元造形物製造装置、三次元造形物の製造方法および三次元造形物 Download PDFInfo
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- GMMAPXRGRVJYJY-UHFFFAOYSA-J tetrasodium 4-acetamido-5-hydroxy-6-[[7-sulfonato-4-[(4-sulfonatophenyl)diazenyl]naphthalen-1-yl]diazenyl]naphthalene-1,7-disulfonate Chemical compound [Na+].[Na+].[Na+].[Na+].OC1=C2C(NC(=O)C)=CC=C(S([O-])(=O)=O)C2=CC(S([O-])(=O)=O)=C1N=NC(C1=CC(=CC=C11)S([O-])(=O)=O)=CC=C1N=NC1=CC=C(S([O-])(=O)=O)C=C1 GMMAPXRGRVJYJY-UHFFFAOYSA-J 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- JOUDBUYBGJYFFP-FOCLMDBBSA-N thioindigo Chemical compound S\1C2=CC=CC=C2C(=O)C/1=C1/C(=O)C2=CC=CC=C2S1 JOUDBUYBGJYFFP-FOCLMDBBSA-N 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 235000010215 titanium dioxide Nutrition 0.000 description 1
- 125000005424 tosyloxy group Chemical group S(=O)(=O)(C1=CC=C(C)C=C1)O* 0.000 description 1
- SGHZCASSRKVVCL-UHFFFAOYSA-N tri(butan-2-yloxy)-ethylsilane Chemical compound CCC(C)O[Si](CC)(OC(C)CC)OC(C)CC SGHZCASSRKVVCL-UHFFFAOYSA-N 0.000 description 1
- RJNDDRZGJNVASH-UHFFFAOYSA-N tri(butan-2-yloxy)-methylsilane Chemical compound CCC(C)O[Si](C)(OC(C)CC)OC(C)CC RJNDDRZGJNVASH-UHFFFAOYSA-N 0.000 description 1
- MFWMNCMEHADIFK-UHFFFAOYSA-M tributyl(3-trimethoxysilylpropyl)azanium;bromide Chemical compound [Br-].CCCC[N+](CCCC)(CCCC)CCC[Si](OC)(OC)OC MFWMNCMEHADIFK-UHFFFAOYSA-M 0.000 description 1
- IZYSGILYXDPPNF-UHFFFAOYSA-M tributyl(3-trimethoxysilylpropyl)azanium;chloride Chemical compound [Cl-].CCCC[N+](CCCC)(CCCC)CCC[Si](OC)(OC)OC IZYSGILYXDPPNF-UHFFFAOYSA-M 0.000 description 1
- QORWJWZARLRLPR-UHFFFAOYSA-H tricalcium bis(phosphate) Chemical compound [Ca+2].[Ca+2].[Ca+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O QORWJWZARLRLPR-UHFFFAOYSA-H 0.000 description 1
- BACYXSNZANMSGE-UHFFFAOYSA-N trichloro(2-cyclohex-3-en-1-ylethyl)silane Chemical compound Cl[Si](Cl)(Cl)CCC1CCC=CC1 BACYXSNZANMSGE-UHFFFAOYSA-N 0.000 description 1
- FMYXZXAKZWIOHO-UHFFFAOYSA-N trichloro(2-phenylethyl)silane Chemical compound Cl[Si](Cl)(Cl)CCC1=CC=CC=C1 FMYXZXAKZWIOHO-UHFFFAOYSA-N 0.000 description 1
- GNXIZLXABHCZPO-UHFFFAOYSA-N trichloro(2-pyridin-2-ylethyl)silane Chemical compound Cl[Si](Cl)(Cl)CCC1=CC=CC=N1 GNXIZLXABHCZPO-UHFFFAOYSA-N 0.000 description 1
- BGSBEWOQSOBCCU-UHFFFAOYSA-N trichloro(3-phenoxypropyl)silane Chemical compound Cl[Si](Cl)(Cl)CCCOC1=CC=CC=C1 BGSBEWOQSOBCCU-UHFFFAOYSA-N 0.000 description 1
- TTYRJPILQGWBOQ-UHFFFAOYSA-N trichloro(cyclohex-3-en-1-yl)silane Chemical compound Cl[Si](Cl)(Cl)C1CCC=CC1 TTYRJPILQGWBOQ-UHFFFAOYSA-N 0.000 description 1
- SIPHWXREAZVVNS-UHFFFAOYSA-N trichloro(cyclohexyl)silane Chemical compound Cl[Si](Cl)(Cl)C1CCCCC1 SIPHWXREAZVVNS-UHFFFAOYSA-N 0.000 description 1
- NAHQHOCDGCGAJH-UHFFFAOYSA-N trichloro(cyclohexylmethyl)silane Chemical compound Cl[Si](Cl)(Cl)CC1CCCCC1 NAHQHOCDGCGAJH-UHFFFAOYSA-N 0.000 description 1
- FCMZRNUHEXJWGB-UHFFFAOYSA-N trichloro(cyclopentyl)silane Chemical compound Cl[Si](Cl)(Cl)C1CCCC1 FCMZRNUHEXJWGB-UHFFFAOYSA-N 0.000 description 1
- MFISPHKHJHQREG-UHFFFAOYSA-N trichloro(oct-7-enyl)silane Chemical compound Cl[Si](Cl)(Cl)CCCCCCC=C MFISPHKHJHQREG-UHFFFAOYSA-N 0.000 description 1
- PYJJCSYBSYXGQQ-UHFFFAOYSA-N trichloro(octadecyl)silane Chemical compound CCCCCCCCCCCCCCCCCC[Si](Cl)(Cl)Cl PYJJCSYBSYXGQQ-UHFFFAOYSA-N 0.000 description 1
- RCHUVCPBWWSUMC-UHFFFAOYSA-N trichloro(octyl)silane Chemical compound CCCCCCCC[Si](Cl)(Cl)Cl RCHUVCPBWWSUMC-UHFFFAOYSA-N 0.000 description 1
- ORVMIVQULIKXCP-UHFFFAOYSA-N trichloro(phenyl)silane Chemical compound Cl[Si](Cl)(Cl)C1=CC=CC=C1 ORVMIVQULIKXCP-UHFFFAOYSA-N 0.000 description 1
- DOEHJNBEOVLHGL-UHFFFAOYSA-N trichloro(propyl)silane Chemical compound CCC[Si](Cl)(Cl)Cl DOEHJNBEOVLHGL-UHFFFAOYSA-N 0.000 description 1
- LPMVYGAHBSNGHP-UHFFFAOYSA-N trichloro(tetradecyl)silane Chemical compound CCCCCCCCCCCCCC[Si](Cl)(Cl)Cl LPMVYGAHBSNGHP-UHFFFAOYSA-N 0.000 description 1
- AHEMBBKAVCEZKE-UHFFFAOYSA-N trichloro(undecyl)silane Chemical compound CCCCCCCCCCC[Si](Cl)(Cl)Cl AHEMBBKAVCEZKE-UHFFFAOYSA-N 0.000 description 1
- ABADVTXFGWCNBV-UHFFFAOYSA-N trichloro-(4-chlorophenyl)silane Chemical compound ClC1=CC=C([Si](Cl)(Cl)Cl)C=C1 ABADVTXFGWCNBV-UHFFFAOYSA-N 0.000 description 1
- WOMUGKOOLXQCTQ-UHFFFAOYSA-N trichloro-(4-methylphenyl)silane Chemical compound CC1=CC=C([Si](Cl)(Cl)Cl)C=C1 WOMUGKOOLXQCTQ-UHFFFAOYSA-N 0.000 description 1
- RKHQQJXJQWFUAO-UPHRSURJSA-N trichloro-[(4z)-cyclooct-4-en-1-yl]silane Chemical compound Cl[Si](Cl)(Cl)C1CCC\C=C/CC1 RKHQQJXJQWFUAO-UPHRSURJSA-N 0.000 description 1
- KDXKVFHCTVZSJB-UHFFFAOYSA-N trichloro-[2-[4-(chloromethyl)phenyl]ethyl]silane Chemical compound ClCC1=CC=C(CC[Si](Cl)(Cl)Cl)C=C1 KDXKVFHCTVZSJB-UHFFFAOYSA-N 0.000 description 1
- KONHVWVBPIDGBH-UHFFFAOYSA-N trichloro-[3-(4-methoxyphenyl)propyl]silane Chemical compound COC1=CC=C(CCC[Si](Cl)(Cl)Cl)C=C1 KONHVWVBPIDGBH-UHFFFAOYSA-N 0.000 description 1
- VBSUMMHIJNZMRM-UHFFFAOYSA-N triethoxy(2-phenylethyl)silane Chemical compound CCO[Si](OCC)(OCC)CCC1=CC=CC=C1 VBSUMMHIJNZMRM-UHFFFAOYSA-N 0.000 description 1
- AVYKQOAMZCAHRG-UHFFFAOYSA-N triethoxy(3,3,4,4,5,5,6,6,7,7,8,8,8-tridecafluorooctyl)silane Chemical compound CCO[Si](OCC)(OCC)CCC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F AVYKQOAMZCAHRG-UHFFFAOYSA-N 0.000 description 1
- FRGPKMWIYVTFIQ-UHFFFAOYSA-N triethoxy(3-isocyanatopropyl)silane Chemical compound CCO[Si](OCC)(OCC)CCCN=C=O FRGPKMWIYVTFIQ-UHFFFAOYSA-N 0.000 description 1
- DENFJSAFJTVPJR-UHFFFAOYSA-N triethoxy(ethyl)silane Chemical compound CCO[Si](CC)(OCC)OCC DENFJSAFJTVPJR-UHFFFAOYSA-N 0.000 description 1
- GWLYXRJHEZXQRX-UHFFFAOYSA-N triethoxy(furan-2-ylmethoxymethyl)silane Chemical compound CCO[Si](OCC)(OCC)COCC1=CC=CO1 GWLYXRJHEZXQRX-UHFFFAOYSA-N 0.000 description 1
- OYGYKEULCAINCL-UHFFFAOYSA-N triethoxy(hexadecyl)silane Chemical compound CCCCCCCCCCCCCCCC[Si](OCC)(OCC)OCC OYGYKEULCAINCL-UHFFFAOYSA-N 0.000 description 1
- WUMSTCDLAYQDNO-UHFFFAOYSA-N triethoxy(hexyl)silane Chemical compound CCCCCC[Si](OCC)(OCC)OCC WUMSTCDLAYQDNO-UHFFFAOYSA-N 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- FHVAUDREWWXPRW-UHFFFAOYSA-N triethoxy(pentyl)silane Chemical compound CCCCC[Si](OCC)(OCC)OCC FHVAUDREWWXPRW-UHFFFAOYSA-N 0.000 description 1
- UMFJXASDGBJDEB-UHFFFAOYSA-N triethoxy(prop-2-enyl)silane Chemical compound CCO[Si](CC=C)(OCC)OCC UMFJXASDGBJDEB-UHFFFAOYSA-N 0.000 description 1
- AMPGOMIFIUKMJG-UHFFFAOYSA-N triethoxy-(1,2,3,4,7,7-hexachloro-5-bicyclo[2.2.1]hept-2-enyl)silane Chemical compound ClC1=C(Cl)C2(Cl)C([Si](OCC)(OCC)OCC)CC1(Cl)C2(Cl)Cl AMPGOMIFIUKMJG-UHFFFAOYSA-N 0.000 description 1
- PADYPAQRESYCQZ-UHFFFAOYSA-N triethoxy-(4-methylphenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=C(C)C=C1 PADYPAQRESYCQZ-UHFFFAOYSA-N 0.000 description 1
- UDUKMRHNZZLJRB-UHFFFAOYSA-N triethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OCC)(OCC)OCC)CCC2OC21 UDUKMRHNZZLJRB-UHFFFAOYSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- NFMWFGXCDDYTEG-UHFFFAOYSA-N trimagnesium;diborate Chemical compound [Mg+2].[Mg+2].[Mg+2].[O-]B([O-])[O-].[O-]B([O-])[O-] NFMWFGXCDDYTEG-UHFFFAOYSA-N 0.000 description 1
- XYJRNCYWTVGEEG-UHFFFAOYSA-N trimethoxy(2-methylpropyl)silane Chemical compound CO[Si](OC)(OC)CC(C)C XYJRNCYWTVGEEG-UHFFFAOYSA-N 0.000 description 1
- UBMUZYGBAGFCDF-UHFFFAOYSA-N trimethoxy(2-phenylethyl)silane Chemical compound CO[Si](OC)(OC)CCC1=CC=CC=C1 UBMUZYGBAGFCDF-UHFFFAOYSA-N 0.000 description 1
- XVZMLSWFBPLMEA-UHFFFAOYSA-N trimethoxy(2-pyridin-2-ylethyl)silane Chemical compound CO[Si](OC)(OC)CCC1=CC=CC=N1 XVZMLSWFBPLMEA-UHFFFAOYSA-N 0.000 description 1
- JLGNHOJUQFHYEZ-UHFFFAOYSA-N trimethoxy(3,3,3-trifluoropropyl)silane Chemical compound CO[Si](OC)(OC)CCC(F)(F)F JLGNHOJUQFHYEZ-UHFFFAOYSA-N 0.000 description 1
- YJDOIAGBSYPPCK-UHFFFAOYSA-N trimethoxy(3-morpholin-4-ylpropyl)silane Chemical compound CO[Si](OC)(OC)CCCN1CCOCC1 YJDOIAGBSYPPCK-UHFFFAOYSA-N 0.000 description 1
- FTDRQHXSYGDMNJ-UHFFFAOYSA-N trimethoxy(3-pyrrol-1-ylpropyl)silane Chemical compound CO[Si](OC)(OC)CCCN1C=CC=C1 FTDRQHXSYGDMNJ-UHFFFAOYSA-N 0.000 description 1
- RKLXSINPXIQKIB-UHFFFAOYSA-N trimethoxy(oct-7-enyl)silane Chemical compound CO[Si](OC)(OC)CCCCCCC=C RKLXSINPXIQKIB-UHFFFAOYSA-N 0.000 description 1
- NMEPHPOFYLLFTK-UHFFFAOYSA-N trimethoxy(octyl)silane Chemical compound CCCCCCCC[Si](OC)(OC)OC NMEPHPOFYLLFTK-UHFFFAOYSA-N 0.000 description 1
- LFRDHGNFBLIJIY-UHFFFAOYSA-N trimethoxy(prop-2-enyl)silane Chemical compound CO[Si](OC)(OC)CC=C LFRDHGNFBLIJIY-UHFFFAOYSA-N 0.000 description 1
- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 description 1
- XQEGZYAXBCFSBS-UHFFFAOYSA-N trimethoxy-(4-methylphenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=C(C)C=C1 XQEGZYAXBCFSBS-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- MAFQBSQRZKWGGE-UHFFFAOYSA-N trimethoxy-[2-[4-(2-trimethoxysilylethyl)phenyl]ethyl]silane Chemical compound CO[Si](OC)(OC)CCC1=CC=C(CC[Si](OC)(OC)OC)C=C1 MAFQBSQRZKWGGE-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 1
- FYZFRYWTMMVDLR-UHFFFAOYSA-M trimethyl(3-trimethoxysilylpropyl)azanium;chloride Chemical compound [Cl-].CO[Si](OC)(OC)CCC[N+](C)(C)C FYZFRYWTMMVDLR-UHFFFAOYSA-M 0.000 description 1
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
- 229920006163 vinyl copolymer Polymers 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000013585 weight reducing agent Substances 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
- 239000012463 white pigment Substances 0.000 description 1
- 229920001221 xylan Polymers 0.000 description 1
- 150000004823 xylans Chemical class 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 125000006839 xylylene group Chemical group 0.000 description 1
- 239000001052 yellow pigment Substances 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- 229910052984 zinc sulfide Inorganic materials 0.000 description 1
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 description 1
- 229910052845 zircon Inorganic materials 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/20—Apparatus for additive manufacturing; Details thereof or accessories therefor
- B29C64/245—Platforms or substrates
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F10/00—Additive manufacturing of workpieces or articles from metallic powder
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F10/00—Additive manufacturing of workpieces or articles from metallic powder
- B22F10/10—Formation of a green body
- B22F10/14—Formation of a green body by jetting of binder onto a bed of metal powder
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F10/00—Additive manufacturing of workpieces or articles from metallic powder
- B22F10/30—Process control
- B22F10/38—Process control to achieve specific product aspects, e.g. surface smoothness, density, porosity or hollow structures
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F12/00—Apparatus or devices specially adapted for additive manufacturing; Auxiliary means for additive manufacturing; Combinations of additive manufacturing apparatus or devices with other processing apparatus or devices
- B22F12/30—Platforms or substrates
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F7/00—Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression
- B22F7/002—Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression of porous nature
- B22F7/004—Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression of porous nature comprising at least one non-porous part
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28B—SHAPING CLAY OR OTHER CERAMIC COMPOSITIONS; SHAPING SLAG; SHAPING MIXTURES CONTAINING CEMENTITIOUS MATERIAL, e.g. PLASTER
- B28B1/00—Producing shaped prefabricated articles from the material
- B28B1/001—Rapid manufacturing of 3D objects by additive depositing, agglomerating or laminating of material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/10—Processes of additive manufacturing
- B29C64/165—Processes of additive manufacturing using a combination of solid and fluid materials, e.g. a powder selectively bound by a liquid binder, catalyst, inhibitor or energy absorber
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/10—Processes of additive manufacturing
- B29C64/171—Processes of additive manufacturing specially adapted for manufacturing multiple 3D objects
- B29C64/182—Processes of additive manufacturing specially adapted for manufacturing multiple 3D objects in parallel batches
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/20—Apparatus for additive manufacturing; Details thereof or accessories therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y10/00—Processes of additive manufacturing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y30/00—Apparatus for additive manufacturing; Details thereof or accessories therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y80/00—Products made by additive manufacturing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F10/00—Additive manufacturing of workpieces or articles from metallic powder
- B22F10/60—Treatment of workpieces or articles after build-up
- B22F10/68—Cleaning or washing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/25—Process efficiency
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Automation & Control Theory (AREA)
- Composite Materials (AREA)
- Ceramic Engineering (AREA)
- Powder Metallurgy (AREA)
Description
本発明の三次元造形物製造用部材は、粒子を含む組成物を用いて形成された層を積層することにより三次元造形物を製造する三次元造形物製造装置に用いられる部材であって、
ステージ上に載置され、前記層と接触するものであり、
前記層との接触面に孔部が設けられた部位を有するものであることを特徴とする。
これにより、ステージ上に三次元造形物製造用部材を安定的に載置することができ、三次元造形物製造用部材の取扱いのし易さが特に優れたものとなる。
孔部を有する三次元造形物製造用部材と、
前記三次元造形物製造用部材が載置されるステージと、
前記孔部を介して前記層を吸引する吸引手段とを備えることを特徴とする。
平面視した際に、孔部を有する三次元造形物製造用部材と重なり合う領域に、粒子を含む層形成用組成物を用いて前記層を形成する層形成工程と、
前記粒子を結合し結合部を形成する結合部形成工程とを含む一連の工程を繰り返し行い、
前記一連の工程を行う際に、前記孔部を介して前記層を吸引することを特徴とする。
これにより、寸法精度に優れた三次元造形物を提供することができる。
これにより、寸法精度に優れた三次元造形物を提供することができる。
まず、本発明の三次元造形物の製造方法、三次元造形物製造用部材について説明する。
≪層形成工程≫
層形成工程では、粒子を含む組成物(層形成用組成物)11を用いて、所定の厚さを有する層1を形成する(1a、1d)。
本工程では、平坦化手段を用いて、層1を表面が平坦化されたものとして形成する。
これにより、前述したような効果がより顕著に発揮される。
次に、当該層1に対し、層1を構成する粒子を結合するための結着液12を付与する(1b、1e)。
前述したように、層1の吸引は、前記一連の工程のうち少なくとも一部の工程において行うものであればよいが、結着液付与工程において層1の吸引を行うことにより、以下のような効果が得られる。
結着液付与工程で層1に結着液12を付与した後、層1に付与された結着液12に含まれる結合剤を硬化させ、硬化部(結合部)13を形成する(1c、1f)。
吸引の条件は、適宜変更してもよい。
そして、前記のような一連の工程を繰り返し行い(1g)、その後、後処理工程として、各層1を構成する粒子のうち、結合剤により結合していないもの(未結合粒子)を除去する未結合粒子除去工程(1h)を行う。これにより、三次元造形物10が取り出される。
次に、本発明の三次元造形物製造装置について説明する。
制御部2は、コンピューター21と、駆動制御部22とを有している。
これにより、厚さの均一性の高い層1を容易かつ確実に形成することができる。また、製造される三次元造形物10において、不本意な変形等が生じることを効果的に防止することができる。
前述したような本発明の三次元造形物製造装置によれば、寸法精度に優れた三次元造形物を、優れた生産性、優れた安定性で製造することができる。
次に、本発明の三次元造形物の製造に用いる組成物(層形成用組成物)について詳細に説明する。
三次元造形用粉末を構成する粒子の構成材料としては、例えば、無機材料や有機材料、これらの複合体等が挙げられる。
粒子に施された疎水化処理としては、粒子(母粒子)の疎水性を高める処理であればいかなるものであってもよいが、炭化水素基を導入するものであるのが好ましい。
(3,3,3−トリフルオロプロピル)トリメトキシシラン、1−トリメトキシシリル−2−(クロロメチル)フェニルエタン、2−(トリメトキシシリル)エチルフェニルスルホニルアジド、β−トリメトキシシリルエチル−2−ピリジン、トリメトキシシリルプロピルジエチレントリアミン、N−(3−トリメトキシシリルプロピル)ピロール、N−トリメトキシシリルプロピル−N,N,N−トリブチルアンモニウムブロマイド、N−トリメトキシシリルプロピル−N,N,N−トリブチルアンモニウムクロライド、N−トリメトキシシリルプロピル−N,N,N−トリメチルアンモニウムクロライド、ビニルメチルジエトキシラン、ビニルトリエトキシシラン、ビニルトリメトキシシラン、ビニルメチルジメトキシシラン、ビニルジメチルメトキシシラン、ビニルジメチルエトキシシラン、ビニルメチルジクロロシラン、ビニルフェニルジクロロシラン、ビニルフェニルジエトキシシラン、ビニルフェニルジメチルシラン、ビニルフェニルメチルクロロシラン、ビニルトリフェノキシシラン、ビニルトリス−t−ブトキシシラン、アダマンチルエチルトリクロロシラン、アリルフェニルトリクロロシラン、3−アミノフェノキシジメチルビニルシラン、フェニルトリクロロシラン、フェニルジメチルクロロシラン、フェニルメチルジクロロシラン、ベンジルトリクロロシラン、ベンジルジメチルクロロシラン、ベンジルメチルジクロロシラン、フェネチルジイソプロピルクロロシラン、フェネチルトリクロロシラン、フェネチルジメチルクロロシラン、フェネチルメチルジクロロシラン、5−(ビシクロヘプテニル)トリクロロシラン、2−(ビシクロヘプチル)ジメチルクロロシラン、2−(ビシクロヘプチル)トリクロロシラン、1,4−ビス(トリメトキシシリルエチル)ベンゼン、ブロモフェニルトリクロロシラン、3−フェノキシプロピルジメチルクロロシラン、3−フェノキシプロピルトリクロロシラン、t−ブチルフェニルクロロシラン、t−ブチルフェニルメトキシシラン、t−ブチルフェニルジクロロシラン、p−(t−ブチル)フェネチルジメチルクロロシラン、p−(t−ブチル)フェネチルトリクロロシラン、1,3−(クロロジメチルシリルメチル)ヘプタコサン、((クロロメチル)フェニルエチル)ジメチルクロロシラン、((クロロメチル)フェニルエチル)メチルジクロロシラン、((クロロメチル)フェニルエチル)トリクロロシラン、((クロロメチル)フェニルエチル)トリメトキシシラン、クロロフェニルトリクロロシラン、2−シアノエチルトリクロロシラン、2−シアノエチルメチルジクロロシラン、3−シアノプロピルメチルジエトキシシラン、3−シアノプロピルメチルジクロロシラン、3−シアノプロピルジメチルエトキシシラン、3−シアノプロピルトリクロロシラン、フッ化アルキルシラン等を挙げることができ、これらから選択される1種または2種以上を組み合わせて用いることができる。
これにより、粒子の疎水性をより高いものとすることができる。また、容易かつ確実に、各粒子や粒子表面の各部位(外部に開放する空孔を有するものである場合には、空孔内部の表面を含む)での疎水化処理の程度の均一性をより高いものとすることができる。
層形成用組成物11中における粒子の含有率は、8質量%以上100質量%以下であるのが好ましく、10質量%以上100質量%以下であるのがより好ましい。
層形成用組成物11は、粒子に加えて、溶剤を含むものであってもよい。
これにより、前述したような効果がより顕著に発揮される。
層形成用組成物11は、バインダーを含むものであってもよい。
水溶性樹脂は、少なくともその一部が水系溶剤に可溶なものであればよいが、例えば、25℃における水に対する溶解度(水100gに溶解可能な質量)が5[g/100g水]以上のものであるのが好ましく、10[g/100g水]以上のものであるのがより好ましい。
これにより、前述した機能をより効果的に発揮することができる。
これにより、前述した機能をより効果的に発揮することができる。
また、層形成用組成物11は、前述した以外の成分を含むものであってもよい。このような成分としては、例えば、重合開始剤;重合促進剤;浸透促進剤;湿潤剤(保湿剤);定着剤;防黴剤;防腐剤;酸化防止剤;紫外線吸収剤;キレート剤;pH調整剤等が挙げられる。
次に、本発明の三次元造形物10の製造に用いる結着液について詳細に説明する。
結着液12は、少なくとも結合剤を含むものである。
結着液12は、結合剤として、少なくとも硬化性樹脂を含むものである。
CH2=C(R1)COOCH2CH(R2)OH (1)
(ただし、式(1)中、R1およびR2は、それぞれ独立に、HまたはCH3を示す。)
また、結着液12は、前述した以外の成分を含むものであってもよい。このような成分としては、例えば、顔料、染料等の各種着色剤;分散剤;界面活性剤;重合開始剤;重合促進剤;溶剤;浸透促進剤;湿潤剤(保湿剤);定着剤;防黴剤;防腐剤;酸化防止剤;紫外線吸収剤;キレート剤;pH調整剤;増粘剤;フィラー;凝集防止剤;消泡剤等が挙げられる。
前記無機顔料の中でも、好ましい白色を呈するためには、酸化チタンが好ましい。
本発明の三次元造形物は、前述したような製造方法、製造装置を用いて製造することができる。
これにより、寸法精度に優れた三次元造形物を提供することができる。
後処理工程としては、例えば、洗浄工程、バリ取り等を行う形状調整工程、着色工程、被覆層形成工程、未硬化の結合剤を確実に硬化させるための紫外線照射処理を行う結合剤硬化完了工程等が挙げられる。
1…層
11…組成物(層形成用組成物)
12…結着液
13…硬化部(結合部)
100…三次元造形物製造装置
2…制御部
21…コンピューター
22…駆動制御部
3…組成物供給部(層形成用組成物供給部)
4…層形成部
41…ステージ
411…孔部
42…スキージー(平坦化手段)
43…ガイドレール
44…組成物仮置部
45…側面支持部(枠体)
5…結着液吐出部(結着液付与手段)
6…紫外線照射手段(硬化手段)
7…吸引手段
8…三次元造形物製造用部材(造形プレート)
81…第1の部位
811…孔部
82…第2の部位
Claims (10)
- 粒子を含む組成物を用いて形成された層を積層することにより三次元造形物を製造する三次元造形物製造装置であって、
空孔を有する三次元造形物製造用部材と、
前記三次元造形物製造用部材が載置される、孔部を有するステージと、
前記空孔及び前記孔部を介して前記層を吸引する吸引手段とを備え、
前記三次元造形物製造用部材は、前記空孔を有する第1の部位と、前記空孔を有さないまたは前記空孔が封止された第2の部位とを有することを特徴とする三次元造形物製造装置。 - 前記孔部の幅は前記空孔の径よりも大きいことを特徴とする請求項1に記載の三次元造形物製造装置。
- 前記孔部の平面形状が円形である特徴とする請求項1または2に記載の三次元造形物製造装置。
- 前記三次元造形物製造用部材は、板状をなすものである請求項1ないし3のいずれか1項に記載の三次元造形物製造装置。
- 前記第2の部位は、前記層を平面視した際に、前記層のうち前記三次元造形物の実体部を構成する部位と重なり合わない領域に設けられたものである請求項4に記載の三次元造形物製造装置。
- 前記三次元造形物製造用部材は、金属材料またはセラミックス材料で構成された粒子の焼結体で構成された部位を有するものである請求項1ないし5のいずれか1項に記載の三次元造形物製造装置。
- 前記空孔の平均空孔径は、0.1μm以上100μm以下である請求項1ないし6のいずれか1項に記載の三次元造形物製造装置。
- 前記組成物は、前記粒子に加え、溶剤を含むものである請求項1ないし7のいずれか1項に記載の三次元造形物製造装置。
- 層を積層することにより三次元造形物を製造する三次元造形物の製造方法であって、
平面視した際に、孔部を有するステージに載置され、空孔を有する第1の部位と、前記空孔を有さないまたは前記空孔が封止された第2の部位とを有する三次元造形物製造用部材と重なり合う領域に、粒子を含む層形成用組成物を用いて前記層を形成する層形成工程と、
前記粒子を結合し結合部を形成する結合部形成工程とを含む一連の工程を繰り返し行い、
前記一連の工程を行う際に、前記空孔と前記孔部を介して前記層を吸引することを特徴とする三次元造形物の製造方法。 - 層形成用組成物を用いて形成された前記層に対して結着液を付与することにより、前記結合部を形成する請求項9に記載の三次元造形物の製造方法。
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| DE102012109262A1 (de) * | 2012-09-28 | 2014-04-03 | Bundesrepublik Deutschland, vertreten durch das Bundesministerium für Wirtschaft und Technologie, dieses vertreten durch den Präsidenten der BAM, Bundesanstalt für Materialforschung und -prüfung | Verfahren zur Stabilisierung eines Pulverbetts mittels Unterdruck für die additive Fertigung |
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| JP2015112846A (ja) * | 2013-12-13 | 2015-06-22 | セイコーエプソン株式会社 | 三次元造形物製造装置、三次元造形物の製造方法および三次元造形物 |
| US20160082670A1 (en) * | 2014-09-22 | 2016-03-24 | Mobium Solutions, Llc | Stage for use in a 3d printer |
| JP6900920B2 (ja) * | 2018-02-20 | 2021-07-07 | 新東工業株式会社 | ステージ機構、付加製造装置及び付加製造方法 |
-
2015
- 2015-02-04 JP JP2015020009A patent/JP6515557B2/ja not_active Expired - Fee Related
-
2016
- 2016-02-03 US US15/014,089 patent/US20160221269A1/en not_active Abandoned
- 2016-02-03 CN CN201610076907.5A patent/CN105835360A/zh active Pending
-
2021
- 2021-09-16 US US17/477,153 patent/US11911962B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| US11911962B2 (en) | 2024-02-27 |
| US20160221269A1 (en) | 2016-08-04 |
| JP2016141085A (ja) | 2016-08-08 |
| CN105835360A (zh) | 2016-08-10 |
| US20220001605A1 (en) | 2022-01-06 |
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