JP6602610B2

JP6602610B2 - Substrate, film-forming substrate manufacturing method and coating apparatus

Info

Publication number: JP6602610B2
Application number: JP2015175722A
Authority: JP
Inventors: 勝喜西中; 慎二梶原
Original assignee: Shibaura Mechatronics Corp
Current assignee: Shibaura Mechatronics Corp
Priority date: 2014-09-26
Filing date: 2015-09-07
Publication date: 2019-11-06
Anticipated expiration: 2035-09-07
Also published as: JP6793236B2; TWI672548B; TW201612603A; JP2020021090A; JP2016071352A

Description

本発明は、基板、膜形成基板の製造方法及び塗布装置に関する。 The present invention relates to a substrate, a method for manufacturing a film-formed substrate, and a coating apparatus.

従来、液晶表示装置では、基板の表示領域及びその周辺の領域からなる膜形成領域に、膜形成材料である液体（ここでは、配向膜材料液）がインクジェット法により塗布される。そして、基板の膜形成領域の周囲に一定の間隔をおいた位置にシール剤がディスペンス法により環状に塗布され、基板上のシール剤で囲まれた領域に液晶材料がディスペンス法により滴下塗布される。 2. Description of the Related Art Conventionally, in a liquid crystal display device, a liquid (here, an alignment film material liquid) that is a film forming material is applied to a film forming area including a display area of a substrate and a peripheral area by an inkjet method. Then, a sealing agent is applied in an annular shape by a dispensing method at a certain interval around the film forming region of the substrate, and a liquid crystal material is dropped and applied to a region surrounded by the sealing agent on the substrate by a dispensing method. .

ところで、インクジェット法で上述の膜形成材料である液体を基板の膜形成領域に塗布すると、この液体が基板上で濡れ広がり、シール剤を形成する領域まで到達してしまうことがある。液体がシール剤の形成領域まで広がって、シール剤形成領域に配向膜が形成されてしまうと、この配向膜の部分でシール剤の基板に対する密着性が悪くなる。 By the way, when the liquid, which is the above-described film forming material, is applied to the film forming region of the substrate by the ink jet method, the liquid may spread on the substrate and reach the region where the sealing agent is formed. If the liquid spreads to the sealant forming region and an alignment film is formed in the sealant forming region, the adhesion of the sealant to the substrate is deteriorated at the portion of the alignment film.

そこで、基板に塗布される膜形成材料の液体の膜形成領域外側への濡れ広がりを抑制するため、特許文献１に記載のように、基板上の膜形成領域と、それよりも外側のシール剤塗布領域との間に、膜形成領域を囲む凹溝を形成したものがある。基板上の凹溝より内側に塗布された液体が、周辺に向って濡れ広がる過程で、シール剤塗布領域まで濡れ広がらないように、液体の濡れ広がりを凹溝で止めるものである。 Therefore, in order to suppress the wetting and spreading of the liquid of the film forming material applied to the substrate to the outside of the film forming region, as described in Patent Document 1, the film forming region on the substrate and the sealing agent on the outside thereof There is one in which a concave groove surrounding the film formation region is formed between the coating region and the coating region. The liquid applied inside the concave groove on the substrate is stopped by the concave groove so that the liquid does not spread to the sealant application region in the process of spreading wet toward the periphery.

特開２００７−３２２６２７号公報JP 2007-322627 A

近年の動向として、携帯電話に代表される携帯端末等の液晶表示装置では、製品本体の大きさに対して表示領域の大きさをできるだけ大きくとることが要求されている。この結果、基板の一定の外形寸法の範囲内で、表示領域の外側領域が狭くなる傾向がある。 As a recent trend, in a liquid crystal display device such as a portable terminal typified by a mobile phone, it is required to make the display area as large as possible with respect to the size of the product body. As a result, the outer area of the display area tends to become narrower within the range of a certain external dimension of the substrate.

従って、基板上で膜形成領域を囲む領域に形成される凹溝と、表示領域との距離が近くなる。このため、基板上で凹溝より内側に滴下され、外側周辺に向けて濡れ広がる膜形成材料の液体が、凹溝に達するまでの過程で液量を減少せず、凹溝の縁で生ずる表面張力によって凹溝際に土手状に盛り上がった液溜まりを一時的に形成する。この液溜まりができると、基板上の内側から外側周縁に濡れ広がってきた液体の一部が、該液溜まりで跳ね返り、膜形成領域の内側に向って逆流する。これにより、表示領域の内部にまで、膜形成材料の膜厚のむらを生ずる。 Therefore, the distance between the concave groove formed in the region surrounding the film formation region on the substrate and the display region is reduced. For this reason, the surface of the groove formed on the edge of the groove does not reduce the amount of liquid in the film-forming material that is dripped inside the groove on the substrate and spreads wet toward the outer periphery. A liquid pool that rises like a bank is temporarily formed in the groove by the tension. When this liquid pool is formed, a part of the liquid that has spread from the inner side to the outer peripheral edge of the substrate rebounds in the liquid pool and flows backward toward the inner side of the film formation region. As a result, unevenness of the film forming material occurs even in the display area.

本発明の課題は、膜形成領域に生ずる膜厚のむらを抑制することにある。 An object of the present invention is to suppress unevenness in film thickness that occurs in a film formation region.

本発明は、膜形成領域の外周に沿う凹溝が形成された基板であって、前記凹溝と前記膜形成領域との間に、複数の凹部が並置された凹部群を備え、前記凹部群は、頂角が鋭角で、底辺が、前記凹溝の延在方向に平行で、かつ前記凹溝側に位置するように配置される二等辺三角形の凹部であることを特徴とする。
The present invention is a substrate on which a concave groove is formed along the outer periphery of a film forming region, and includes a concave group in which a plurality of concave portions are juxtaposed between the concave groove and the film forming region, and the concave group the apex angle at an acute angle, bottom, characterized in that a recess of the isosceles triangle are arranged so as to be positioned parallel to, and the groove side in the extending direction of the groove.

本発明によれば、膜形成領域に生ずる膜厚のむらを抑制することができる。 According to the present invention, it is possible to suppress unevenness in the film thickness that occurs in the film formation region.

図１は本発明が適用されてなる液晶表示パネルの一例を示す模式平面図である。FIG. 1 is a schematic plan view showing an example of a liquid crystal display panel to which the present invention is applied. 図２は塗布装置の一例を示す模式斜視図である。FIG. 2 is a schematic perspective view showing an example of a coating apparatus. 図３は実施例１の基板を示す模式断面図である。FIG. 3 is a schematic cross-sectional view showing the substrate of Example 1. 図４は実施例１の基板の要部を示す模式平面図である。FIG. 4 is a schematic plan view showing the main part of the substrate of Example 1. FIG. 図５は実施例２の基板の要部を示す模式平面図である。FIG. 5 is a schematic plan view showing the main part of the substrate of the second embodiment. 図６は実施例３の基板の要部を示す模式平面図である。FIG. 6 is a schematic plan view showing the main part of the substrate of Example 3. 図７は実施例４の基板の要部を示す模式平面図である。FIG. 7 is a schematic plan view showing the main part of the substrate of Example 4. 図８は実施例５の基板の要部を示す模式平面図である。FIG. 8 is a schematic plan view showing the main part of the substrate of Example 5. 図９は実施例６の基板の要部を示す模式平面図である。FIG. 9 is a schematic plan view showing the main part of the substrate of Example 6. 図１０は液滴の凹溝への滴下状態を示す模式図である。FIG. 10 is a schematic diagram showing a state in which droplets are dropped into the concave grooves. 図１１は凹溝、凹部の断面図である。FIG. 11 is a cross-sectional view of a groove and a recess.

（実施例１）（図１〜図４）
本発明が適用されてなる液晶表示パネルは、図１に示すように、一点鎖線で示す膜形成領域２が、矩形状の基板１の表示領域ＤＡ及びその周辺の僅かな領域からなり、この膜形成領域２に、膜形成材料である液体（ここでは、配向膜材料液）が図２に示したインクジェット塗布装置１００により塗布される。そして、基板１の膜形成領域２の周囲には、一定の間隔をおいた位置にシール剤３がディスペンス法により環状に塗布され、基板１上のシール剤３で囲まれた領域に液晶材料（不図示）がディスペンス法により滴下塗布される。その後、対向基板（不図示）がシール剤３を介して貼り合わされて液晶材料が封入され、液晶表示パネルが形成される。なお「膜形成領域２」とは、塗布された液体によって膜が形成された領域ではなく、膜を形成する領域として設定した設計上の領域のことである。 Example 1 (FIGS. 1 to 4)
In the liquid crystal display panel to which the present invention is applied, as shown in FIG. 1, the film forming area 2 indicated by the alternate long and short dash line is composed of the display area DA of the rectangular substrate 1 and a small area around it. A liquid (here, an alignment film material liquid) that is a film forming material is applied to the formation region 2 by the ink jet coating apparatus 100 shown in FIG. Then, around the film forming region 2 of the substrate 1, a sealing agent 3 is annularly applied by a dispensing method at a predetermined interval, and a liquid crystal material (in the region surrounded by the sealing agent 3 on the substrate 1 is applied). (Not shown) is applied dropwise by a dispensing method. Thereafter, a counter substrate (not shown) is bonded through a sealant 3 to enclose a liquid crystal material, thereby forming a liquid crystal display panel. The “film formation region 2” is not a region where a film is formed by the applied liquid but a design region set as a region where a film is formed.

塗布装置１００は、図２に示す通り、架台１０１の上にＹ軸方向移動ステージ１０２を備え、Ｙ軸方向移動ステージ１０２の上面に設けた基板保持部材１０３の上に基板１を支持する。架台１０１の上には、Ｙ軸方向移動ステージ１０２を跨ぐ門型フレーム１０４が設けられ、門型フレーム１０４はＸ軸方向に並置された複数の塗布ヘッド１０５を備える。塗布装置１００は、Ｙ軸方向移動ステージ１０２によって基板１をＹ軸方向に移動しつつ、塗布ヘッド１０５のＸ軸方向に一定の間隔で設けられている多数のノズルから滴下される膜形成材料の液体を基板１のＹ軸方向に沿う各位置に滴下塗布する。塗布装置１００は、Ｙ軸方向移動ステージ１０２の移動、塗布ヘッド１０５の各ノズルからの液滴の滴下（ノズルから滴下される液滴の量や液滴の滴下間隔（周波数）等）を制御する制御装置１０６を備えている。 As shown in FIG. 2, the coating apparatus 100 includes a Y-axis direction moving stage 102 on a gantry 101, and supports the substrate 1 on a substrate holding member 103 provided on the upper surface of the Y-axis direction moving stage 102. On the gantry 101, a portal frame 104 straddling the Y-axis direction moving stage 102 is provided. The portal frame 104 includes a plurality of coating heads 105 juxtaposed in the X-axis direction. The coating apparatus 100 moves the substrate 1 in the Y-axis direction by the Y-axis direction moving stage 102, while film forming material dropped from a large number of nozzles provided at regular intervals in the X-axis direction of the coating head 105. The liquid is dropped and applied to each position along the Y-axis direction of the substrate 1. The coating apparatus 100 controls the movement of the Y-axis direction moving stage 102 and the dropping of droplets from each nozzle of the coating head 105 (the amount of droplets dropped from the nozzles, the droplet dropping interval (frequency), etc.). A control device 106 is provided.

図３は図１に示した基板１のＡ−Ａ断面を示し、図４は図１に示した基板１のＡＲ領域を示す。即ち、基板１にあっては、膜形成領域２の外周の辺に沿って、所定深さの長尺状をなす凹溝１０を形成し、本実施例では複数の凹溝１０が並置されてなる凹溝群１０Ｎを形成している。凹溝群１０Ｎは、膜形成領域２の外周に沿って互いに離隔する複数の凹溝１０（第１〜第ｎ凹溝１１、１２、１３…１ｎ（不図示））からなる。各凹溝１１、１２、１３…は、膜形成領域２の外周の各辺に平行に形成され、互いに複数重をなす。塗布装置１００は、凹溝群１０Ｎの各凹溝１１、１２、１３…が形成された基板１に、膜形成材料である液体を滴下塗布するものである。 3 shows an AA cross section of the substrate 1 shown in FIG. 1, and FIG. 4 shows an AR region of the substrate 1 shown in FIG. That is, in the substrate 1, a long groove 10 having a predetermined depth is formed along the outer peripheral side of the film formation region 2. In this embodiment, a plurality of grooves 10 are juxtaposed. The groove group 10N is formed. The concave groove group 10N includes a plurality of concave grooves 10 (first to n-th concave grooves 11, 12, 13... 1n (not shown)) spaced apart from each other along the outer periphery of the film forming region 2. Each of the concave grooves 11, 12, 13... Is formed in parallel to each side of the outer periphery of the film forming region 2 and has a plurality of overlapping each other. The coating device 100 applies a liquid, which is a film forming material, to the substrate 1 on which the concave grooves 11, 12, 13,... Of the concave groove group 10N are formed.

以下、本実施例をより詳細に説明する。
(a)塗布装置１００の塗布ヘッド１０５から滴下される膜形成材料の液体が、基板１の膜形成領域２に塗布されるのに先立って、膜形成領域２の外周に形成した凹溝１０（第１〜第ｎ凹溝１１、１２、１３…１ｎ）にも塗布される。従って、膜形成領域２に塗布され、外側周辺に向って濡れ広がり、凹溝１０の縁に到達した液体は、この凹溝１０の縁が既にこの凹溝１０内に塗布された液体で濡れているので、この凹溝１０の縁の液体と接触し一体化して、液溜りを形成することなくこの凹溝１０内に浸入する。 Hereinafter, this embodiment will be described in more detail.
(a) Before the liquid of the film forming material dropped from the coating head 105 of the coating apparatus 100 is applied to the film forming area 2 of the substrate 1, the concave grooves 10 ( Also applied to the first to n-th concave grooves 11, 12, 13. Accordingly, the liquid that has been applied to the film forming region 2 and spreads wet toward the outer periphery and reaches the edge of the groove 10, the edge of the groove 10 is wet with the liquid already applied in the groove 10. Therefore, the liquid contacts and integrates with the liquid at the edge of the groove 10 and enters the groove 10 without forming a liquid pool.

具体的には、図２の塗布装置１００に、まず、基板１が供給される。このとき、基板１は、長辺方向がＹ方向と平行になるように、基板保持部材１０３の上に供給される。基板保持部材１０３は、基板１の搬入／搬出ポジションである図２のＹ軸方向手前側に位置づけられている。基板１の供給が完了すると制御装置１０６が、Ｙ軸方向移動ステージ１０２を制御して基板保持部材１０３を図２のＹ軸方向奥側に向かって移動を開始させる。この移動中に、基板１上の凹溝群１０Ｎのうち、最も表示領域ＤＡに近い側、つまり、最も内側の凹溝１１に対して、塗布ヘッド１０５の各ノズルから液滴が吐出されて滴下される。 Specifically, first, the substrate 1 is supplied to the coating apparatus 100 of FIG. At this time, the substrate 1 is supplied onto the substrate holding member 103 so that the long side direction is parallel to the Y direction. The substrate holding member 103 is positioned on the near side in the Y-axis direction of FIG. When the supply of the substrate 1 is completed, the control device 106 controls the Y-axis direction moving stage 102 to start moving the substrate holding member 103 toward the back side in the Y-axis direction in FIG. During this movement, droplets are ejected from the nozzles of the application head 105 to the side closest to the display area DA, that is, the innermost concave groove 11 in the concave groove group 10N on the substrate 1 and dropped. Is done.

凹溝１１は、Ｘ方向に沿う凹溝と、Ｙ方向に沿う凹溝があるが、Ｘ方向に沿う凹溝に対しては、基板１の先頭側に位置するＸ方向に沿う凹溝と後方側に位置する凹溝それぞれについて、その凹溝が塗布ヘッド１０５の各ノズルの下を通過するタイミングに合わせて、Ｘ方向に沿う凹溝に対応して位置する各ノズルから液滴を吐出させる。また、Ｙ方向に沿う凹溝については、その凹溝の先頭側の端部が塗布ヘッド１０５の下に到達してから後方側の端部が塗布ヘッド１０５の下を通過するまでの期間中、その凹溝に対向して位置するノズルから、液滴をＹ方向において予め設定された配置間隔で吐出させる。この液滴の滴下は、制御装置１０６によって制御される。つまり、制御装置１０６は、液体の液滴を、膜形成領域２に滴下する前に、凹溝１０に滴下するように、塗布ヘッド１０５を制御する。 The concave groove 11 includes a concave groove along the X direction and a concave groove along the Y direction. For the concave groove along the X direction, the concave groove and the rear along the X direction located on the leading side of the substrate 1. For each concave groove located on the side, droplets are ejected from each nozzle located corresponding to the concave groove along the X direction in accordance with the timing when the concave groove passes below each nozzle of the coating head 105. Further, for the groove along the Y direction, during the period from when the leading end of the groove reaches under the coating head 105 until the rear end passes under the coating head 105, Droplets are ejected from the nozzle located opposite to the concave groove at a predetermined arrangement interval in the Y direction. The dropping of the droplet is controlled by the control device 106. That is, the control device 106 controls the coating head 105 so that a liquid droplet is dropped into the concave groove 10 before being dropped onto the film forming region 2.

基板保持部材１０３が図２のＹ軸方向奥側の端部あるいは基板１が塗布ヘッド１０５を通過しきった位置に到達したら、今度は、搬入／搬出ポジションのある側へ向けて基板保持部材１０３が移動され、この移動中に、膜形成領域２内に対する液体の滴下塗布が行なわれる。この液体の滴下塗布は、塗布ヘッド１０５の下を基板１の膜形成領域２が通過するタイミングに合わせて、膜形成領域２に対向して位置する塗布ヘッド１０５における各ノズルから、膜形成領域２に対して予め設定された配置間隔で液滴が滴下されるように液滴を吐出させる。つまり、制御装置１０６は、液体の液滴を、凹溝１０に滴下した後に、膜形成領域２に滴下するように塗布ヘッド１０５を制御する。 When the substrate holding member 103 reaches the end on the far side in the Y-axis direction in FIG. 2 or the position where the substrate 1 has passed through the coating head 105, the substrate holding member 103 is now directed toward the side where the loading / unloading position is located. The liquid is dropped and applied to the film forming region 2 during the movement. This liquid drop application is performed from each nozzle in the coating head 105 positioned opposite to the film formation region 2 in accordance with the timing when the film formation region 2 of the substrate 1 passes under the coating head 105. In contrast, the liquid droplets are ejected so that the liquid droplets are dropped at a predetermined arrangement interval. That is, the control device 106 controls the coating head 105 so that a liquid droplet is dropped on the concave groove 10 and then dropped on the film forming region 2.

基板１が塗布ヘッド１０５の下を通過し終わり、基板１に対する液体の滴下塗布が完了し、基板保持部材１０３が搬入／搬出ポジションに到達すると、液体が塗布された基板１が搬出される。続いて処理する基板１があるのなら、入れ替わりに次の基板１が基板保持部材１０３に供給され、続いて処理する基板１が無くなるまで、上述の動作が繰り返し行なわれる。 When the substrate 1 finishes passing under the coating head 105, the liquid drop application to the substrate 1 is completed, and the substrate holding member 103 reaches the loading / unloading position, the substrate 1 coated with the liquid is unloaded. If there is a substrate 1 to be processed subsequently, the next substrate 1 is supplied to the substrate holding member 103 instead, and the above operation is repeated until there is no substrate 1 to be subsequently processed.

また、上述の凹溝１０に滴下する液滴の量は、滴下された液滴が凹溝１０における内側（表示領域ＤＡに近い側）に位置する縁部に接する量で滴下するものとし、その量（大きさ）は、実験によって決定することができ、凹溝の深さが大きくなる程、必要な液滴の量は大きくなる。上述の凹溝１０に滴下する液滴の量は、凹溝１０の同じ位置に滴下する液滴の量のことで、1滴で滴下しても、同じ位置に複数回滴下するようにしてもよい。 In addition, the amount of the liquid droplets dropped into the concave groove 10 described above is dropped in such an amount that the dropped liquid droplet is in contact with the edge located inside the concave groove 10 (the side close to the display area DA). The amount (size) can be determined by experiment, and the greater the depth of the groove, the greater the amount of droplets required. The amount of liquid droplets dropped onto the concave groove 10 is the amount of liquid droplets dropped onto the same position of the concave groove 10, whether it is dropped with one drop or multiple drops at the same position. Good.

このとき、液滴は、図１０の（Ａ）又は（Ｂ）に示すように凹溝１０の溝幅全体に行き渡っても良いし、図１０の（Ｃ）又は（Ｄ）に示すように凹溝１０の溝幅全体に行き渡らなくても良い。液滴は、少なくとも凹溝１０における内側（表示領域ＤＡに近い側）の縁に接するような位置となるように滴下すると良い。また、液滴は、凹溝１０に対して、連続して連なって滴下されても良いし、間隔をおいて滴下されても良い。間隔をおいて滴下されていても、膜形成領域２から濡れ広がってくる液体は、凹溝１０に滴下されて濡れている部分から液溜りを形成することなく凹溝１０内に侵入する。いずれにしても、凹溝１０内に、膜形成領域２から濡れ広がってきた液体を収容するスペースを確保できれば、膜形成領域２の内側から濡れ広がってきた液体の広がりを抑制できる。したがって、この点を考慮して凹溝１０へ滴下する液滴の量や液滴の滴下間隔を決める。この液滴の量や滴下間隔についても、実験で求めることができる。また、凹溝１０内における場所によって滴下量を変えても良い。 At this time, the droplet may spread over the entire groove width of the concave groove 10 as shown in FIG. 10A or 10B, or may be concave as shown in FIG. It is not necessary to spread over the entire width of the groove 10. The liquid droplets are preferably dropped so as to be at a position that contacts at least the inner edge (side closer to the display area DA) of the concave groove 10. Further, the droplets may be continuously dropped to the concave groove 10 or may be dropped at intervals. Even if it is dropped at intervals, the liquid spreading from the film forming region 2 drops into the concave groove 10 without dropping from the wetted portion. In any case, if a space for accommodating the liquid that has spread from the film formation region 2 can be secured in the concave groove 10, the spread of the liquid that has spread from the inside of the film formation region 2 can be suppressed. Therefore, in consideration of this point, the amount of droplets dropped onto the concave groove 10 and the droplet dropping interval are determined. The amount and interval of the droplets can also be obtained through experiments. Further, the dripping amount may be changed depending on the location in the groove 10.

更に、図１０では凹溝１０の最も内側の凹溝１１だけに液滴を滴下する例を示したがこれに限られず、それよりも外側の凹溝１２、１３…１ｎにも液体を滴下しても良い。こうすることで、例え一番内側の凹溝１１を乗り越えて液体が濡れ広がったとしても、その外側の凹溝１２、１３…１ｎのいずれかで濡れ広がりを留めることができる。もちろん、すべての凹溝１０に液滴を滴下することも、任意の凹溝１０のみに液滴を滴下することも同様である。膜形成領域２の液体の濡れ広がり状態によって適宜決定すれば良い。ただし、凹溝１１の縁に生じる液溜りによって、濡れ広がってきた液体の一部が跳ね返って表示領域ＤＡに及ぶことにより生じる膜形成材料の膜厚むらを効果的に抑制するためには、一番内側の凹溝１１に液滴を滴下しておくことが有効である。 Further, FIG. 10 shows an example in which the liquid droplet is dropped only on the innermost concave groove 11 of the concave groove 10. However, the present invention is not limited to this, and the liquid is also dropped on the outer concave grooves 12, 13,. May be. By doing so, even if the liquid gets over the innermost groove 11 and wets and spreads, the wet groove can be stopped by any one of the outer grooves 12, 13,. Of course, dropping a droplet into all the concave grooves 10 is the same as dropping a droplet into only the arbitrary concave grooves 10. What is necessary is just to determine suitably according to the wet spreading state of the liquid of the film formation area 2. FIG. However, in order to effectively suppress the film thickness unevenness of the film forming material that is caused by the liquid pool generated at the edge of the concave groove 11 rebounding and reaching the display area DA due to part of the liquid that has spread wet. It is effective to drop droplets into the inner concave groove 11.

また、凹溝１０に対する液体の滴下と、膜形成領域２に対する液体の滴下とを別々に行なう例で説明したが、一緒に行なうようにしても良い。すなわち、基板１が塗布ヘッド１０５直下を通過する際に、凹溝１０への液滴の滴下を行うとともに、基板１の膜形成領域２にも液体の滴下を行う。これにより一回の基板保持部材１０３の移動で塗布が完了し、効率的な塗布ができる。また、Ｙ軸方向移動ステージ１０２の移動両端を基板１の搬入／搬出ポジションとすることで、さらに効率的に繰り返し基板１への塗布が行うことができる。 In addition, although the example in which the dropping of the liquid to the concave groove 10 and the dropping of the liquid to the film forming region 2 are performed separately has been described, they may be performed together. That is, when the substrate 1 passes just below the coating head 105, droplets are dropped on the concave grooves 10 and liquid are also dropped on the film forming region 2 of the substrate 1. Thereby, application | coating is completed by the movement of the board | substrate holding member 103 once, and efficient application | coating can be performed. In addition, by applying both the moving ends of the Y-axis direction moving stage 102 to the loading / unloading position of the substrate 1, it is possible to more efficiently and repeatedly apply the substrate 1 to the substrate 1.

塗布装置１００による上述(a)の液体の塗布は、凹溝１０に塗布（液滴を滴下）した後に、膜形成領域２に塗布する。つまり、膜形成領域２に塗布された液体が外側周辺に濡れ広がって凹溝１０の縁に到達するときには、すでに先行して凹溝１０に塗布済の液体が凹溝１０の縁を確実に濡らしている。従って、凹溝１０の縁に到達した液体による液溜りの形成を確実に生じにくくし、この液溜りによる液体の跳ね返りを確実に抑制し、膜厚むらの発生を確実に抑制できる。 The liquid application (a) by the coating apparatus 100 is applied to the film forming region 2 after being applied to the concave groove 10 (dropping a droplet). That is, when the liquid applied to the film forming region 2 spreads out around the outer periphery and reaches the edge of the groove 10, the liquid that has already been applied to the groove 10 prior to the groove 10 reliably wets the edge of the groove 10. ing. Therefore, the formation of a liquid pool due to the liquid reaching the edge of the concave groove 10 can be made difficult to occur reliably, the rebound of the liquid due to this liquid pool can be reliably suppressed, and the occurrence of film thickness unevenness can be reliably suppressed.

また、凹溝１０は、膜形成領域２の内側から表示領域ＤＡを超えて濡れ広がってきた液体がその中に浸入する分だけ、より外側の周辺に濡れ広がる液量を少なくし、シール剤塗布領域への濡れ広がりを抑制する効果も大きい。 Further, the concave groove 10 reduces the amount of liquid spreading wet around the outside by the amount that the liquid that has spread wet beyond the display area DA from the inside of the film forming area 2 and enters the outer area, and is applied with a sealing agent. The effect of suppressing the spread of wetting to the region is also great.

(b)基板１に形成された上述(a)の凹溝１０は、前述したように膜形成領域２の外周に互いに離隔する複数重をなすように設けられる凹溝群１０Ｎを形成し、更に、膜形成領域２の外周から離隔する外側の凹溝１０ほど溝幅Ｌi（ｉ＝1、2、3…）が小さいものとする。即ち、凹溝群１０Ｎを形成する複数の第１凹溝１１〜第ｎ凹溝１ｎのうち、膜形成領域２の外周に最も近接する第１凹溝１１の溝幅Ｌ1を最も大きくするものになり、濡れ広がってくる多量の液体を広幅の第１凹溝１１に受容して跳ね返り及び濡れ広がりを抑制し、その後、各凹溝１１、１２、１３…を通過してより少量となる液体をより狭幅Ｌ2、Ｌ3…の各凹溝１２、１３…内に順に受容して跳ね返り及び濡れ広がりを抑制する（Ｌ1＞Ｌ2＞Ｌ3…）。 (b) The groove 10 of (a) formed on the substrate 1 forms a groove group 10N provided on the outer periphery of the film forming region 2 so as to form a plurality of layers separated from each other, as described above. It is assumed that the groove width Li (i = 1, 2, 3,...) Is smaller in the outer concave groove 10 that is separated from the outer periphery of the film formation region 2. That is, the groove width L1 of the first groove 11 closest to the outer periphery of the film forming region 2 among the plurality of first grooves 11 to n that forms the groove group 10N is maximized. A large amount of liquid that spreads and gets wet is received in the wide first concave groove 11 to suppress rebound and wetting and spreading, and then a small amount of liquid that passes through the concave grooves 11, 12, 13. .. Are successively received in the concave grooves 12, 13... Having narrower widths L2, L3... To suppress the bounce and wetting and spreading (L1> L2> L3...).

つまり、液体を各凹溝１１、１２、１３…内に確実に受容し、塗布液のシール材塗布領域への濡れ広がりおよび、各凹溝１１、１２、１３…による上述(a)の液体跳ね返りの抑制効果によって膜形成領域２内の膜厚むらの発生を抑制しつつ、凹溝群１０Ｎが膜形成領域２の外周に直交する方向に沿ってなす全幅Ｗを、全ての凹溝１０が広幅とされる場合に比して小寸法化でき、製品本体内における凹溝群１０Ｎの占有スペースを小さくし、製品本体に対してより大きな表示領域ＤＡを確保できる。 That is, the liquid is reliably received in each of the concave grooves 11, 12, 13,..., The wetting and spreading of the coating liquid to the sealing material application region, and the liquid splash of the above-described (a) by the respective concave grooves 11, 12, 13,. While suppressing the occurrence of film thickness unevenness in the film formation region 2 due to the suppression effect, the entire width W formed by the groove group 10N along the direction orthogonal to the outer periphery of the film formation region 2 is increased. Compared with the case where it is taken, it can be reduced in size, the space occupied by the groove group 10N in the product body can be reduced, and a larger display area DA can be secured for the product body.

(c)基板１に形成された上述(b)の相隣る凹溝１０と凹溝１０の間の間隔Ｓi（ｉ＝1、2…）は、凹溝１０の溝幅Ｌiよりも小さい。これにより、上述(b)の凹溝群１０Ｎにおいて、凹溝１０と凹溝１０の間の間隔Ｓiを凹溝１０の溝幅Ｌi以上としたものに比し、各溝幅Ｌiの合計値に相隣る凹溝１０の間隔Ｓiの合計値を加えた凹溝群１０Ｎの全幅Ｗを一層小寸法化できる。従って、製品本体内における凹溝群１０Ｎの占有スペースを一層小さくし、製品本体に対して一層大きな表示領域ＤＡを確保できる。 (c) The distance Si (i = 1, 2,...) between the adjacent grooves 10 formed in the substrate 1 in the above-described (b) is smaller than the groove width Li of the grooves 10. Thereby, in the groove group 10N of the above-mentioned (b), the total value of the groove widths Li is compared with the case where the distance Si between the groove 10 and the groove 10 is not less than the groove width Li. The overall width W of the groove group 10N obtained by adding the total value of the intervals Si between the adjacent groove grooves 10 can be further reduced. Therefore, the space occupied by the groove group 10N in the product body can be further reduced, and a larger display area DA can be secured for the product body.

本実施例の凹溝群１０Ｎでは、第１凹溝１１〜第３凹溝１３の溝幅Ｌ1〜Ｌ3を、Ｌ1＝0.18mm、Ｌ2＝0.09mm、Ｌ3＝0.06mmとしている。また、第１凹溝１１と第２凹溝１２の間隔Ｓ1、第２凹溝１２と第３凹溝１３の間隔Ｓ2を、Ｓ1＝Ｓ2＝0.01ｍｍとしている。このような寸法の凹溝１０を形成した基板１に対して、上述の塗布を行なったところ、表示領域ＤＡ内に形成された配向膜のむらを抑制することができた。 In the groove group 10N of the present embodiment, the groove widths L1 to L3 of the first groove 11 to the third groove 13 are L1 = 0.18 mm, L2 = 0.09 mm, and L3 = 0.06 mm. Further, the distance S1 between the first groove 11 and the second groove 12, and the distance S2 between the second groove 12 and the third groove 13 are set to S1 = S2 = 0.01 mm. When the above-described application was performed on the substrate 1 on which the groove 10 having such dimensions was formed, unevenness of the alignment film formed in the display area DA could be suppressed.

（実施例２）（図５）
実施例２の基板１を説明する。
(d)基板１に形成された凹溝１０と表示領域ＤＡとの間に、所定深さの複数の凹部２０が並置された凹部群２０Ｎを配置し、各凹部２０の形状は、膜形成領域２に塗布された液体が膜形成領域２から凹溝１０に向かう方向に比べて、その反対方向である凹溝１０から膜形成領域２に向かう方向の方が流れ難くなる形状からなる。なお、本実施例において、各凹部２０は、膜形成領域２の外周縁に沿って所定のピッチ間隔で配置される。 (Example 2) (FIG. 5)
The substrate 1 of Example 2 will be described.
(d) A recess group 20N in which a plurality of recesses 20 having a predetermined depth are arranged in parallel is disposed between the recess groove 10 formed in the substrate 1 and the display area DA. Compared to the direction from the film forming region 2 toward the concave groove 10, the liquid applied to 2 has a shape in which the opposite direction from the concave groove 10 toward the film forming region 2 is less likely to flow. In the present embodiment, the recesses 20 are arranged along the outer peripheral edge of the film forming region 2 at a predetermined pitch interval.

凹部群２０Ｎは、膜形成領域２の内側から外側への液体の流れに比べ、その反対方向への逆流を流れ難くする。具体的には、凹部群２０Ｎの各凹部２０によって形成される各凹部２０の間が、膜形成領域２に塗布された液体が濡れ広がる時の主な道筋となる。そして、各凹部２０の間は、膜形成領域２内側（表示領域ＤＡに近い側）が広く、外側に向かって狭まるように構成する。また、表示領域ＤＡに向かう側は、凹部２０を形成する面が表示領域ＤＡに対して平行とならないように構成する。すなわち、凹溝１０側から表示領域ＤＡ側に向かっては各凹部２０の間は狭くなっているので、液体が流れにくくなっていて、膜形成領域２の内側から濡れ広がって凹溝１０の溝際に液溜まりができ、この液溜まりで液の流れの跳ね返りが生じたとしても、その跳ね返りのために生じた内側へ向かう流れ（逆流）を抑制する（減衰させる）ものになる。 The recess group 20N makes it difficult to flow back in the opposite direction compared to the flow of liquid from the inside to the outside of the film forming region 2. Specifically, the space between the recesses 20 formed by the recesses 20 of the recess group 20N is a main route when the liquid applied to the film forming region 2 spreads out. And between each recessed part 20, it is comprised so that the film formation area 2 inner side (side near display area DA) may be wide, and it may narrow toward the outer side. Further, the side toward the display area DA is configured such that the surface on which the recess 20 is formed is not parallel to the display area DA. That is, since the space between the concave portions 20 is narrowed from the concave groove 10 side toward the display area DA side, it is difficult for the liquid to flow, and the groove of the concave groove 10 spreads wet from the inside of the film forming region 2. In this case, a liquid pool is formed, and even if the liquid flow rebounds in the liquid pool, the inward flow (back flow) generated due to the rebound is suppressed (attenuated).

凹部群２０Ｎは、凹部群２０Ｎが無い場合に比べて、外側（膜形成領域２から凹溝１０に向かう方向）に向かって濡れ広がる流れに対して抵抗になるので、凹溝１０の溝際に到達するときの流れの速さを、凹部群２０Ｎが無い場合と比べて低減させることができる。液体が液溜まりにぶつかる速度が遅いほど液の流れの跳ね返りは小さくなるので、結果的に、凹部群２０Ｎは跳ね返りの抑制に寄与する。更に、濡れ広がる液体は凹部群２０Ｎを通過するときに各凹部２０内に流れ込むので、このことによって、凹溝群１０Ｎに向かって流れる液体の量が低減され、結果として、凹溝１０の縁際での液体の跳ね返りが抑制され、膜形成領域２内に生ずる膜厚のむらを抑制できる。 Since the recess group 20N becomes resistant to the flow that spreads outward (in the direction from the film forming region 2 toward the recess groove 10) compared to the case where there is no recess group 20N, The speed of the flow when it reaches can be reduced as compared with the case where there is no recess group 20N. The slower the speed at which the liquid collides with the liquid pool, the smaller the rebound of the flow of the liquid. As a result, the recess group 20N contributes to suppression of the rebound. Furthermore, since the liquid spreading wet flows into each recess 20 when passing through the recess group 20N, this reduces the amount of liquid flowing toward the recess group 10N, and as a result, the edge of the recess 10 Thus, the rebounding of the liquid in the film can be suppressed, and unevenness of the film thickness occurring in the film forming region 2 can be suppressed.

また、凹部２０に液体が流れ込んで、凹部２０に液体が溜まった状態になったときでも、凹溝１０側から膜形成領域２に向かう方向への流れを抑制する効果が得られることは実験によって確認されている。基板１の表面および凹部２０を覆った液体の膜を観察したところ、凹部２０の輪郭に沿って液体膜に土手状の盛り上がりが認められ、凹部２０の輪郭に沿って形成された液体膜の盛り上がり部分が、凹溝１０側から膜形成領域２に向かう方向への流れに対して抵抗となり、この流れが抑制されていると推測される。 Moreover, even when the liquid flows into the recess 20 and the liquid is accumulated in the recess 20, an effect of suppressing the flow in the direction from the recess 10 toward the film forming region 2 can be obtained by experiments. It has been confirmed. When the liquid film covering the surface of the substrate 1 and the recess 20 was observed, a bank-like swell was recognized along the contour of the recess 20 and the swell of the liquid film formed along the contour of the recess 20 was observed. The portion becomes a resistance to the flow in the direction from the groove 10 side toward the film forming region 2, and it is assumed that this flow is suppressed.

凹部２０内に液体が侵入していてもしていなくても、凹部２０の輪郭で液体が盛り上がるが、その輪郭を形成する線は、表示領域ＤＡと平行とならず角度をなしている。このため、この凹部２０の輪郭部での液体の盛り上がりによって生じる跳ね返りは、直接表示領域ＤＡ側に向かわず、また並置される各凹部２０の輪郭からの跳ね返り同士が干渉し合い弱めるので、膜形成領域２内に生ずる膜厚のむらを抑制できる。 Whether the liquid has entered the recess 20 or not, the liquid rises at the contour of the recess 20, but the line forming the contour is not parallel to the display area DA and forms an angle. For this reason, the rebound caused by the rise of the liquid in the contour portion of the recess 20 does not directly go to the display area DA side, and the rebound from the contour of the recesses 20 arranged side by side interferes with each other and weakens. Unevenness of the film thickness generated in the region 2 can be suppressed.

(e)基板１に形成された上述の凹部群２０Ｎを構成する各凹部２０は、頂角が鋭角の二等辺三角形からなる凹部２１であり、底辺が、凹溝１０の延在方向に平行かつ凹溝１０側に位置するように配置することにより、上述(d)の液体の流れを確実に形成できる。 (e) Each of the recesses 20 constituting the above-described recess group 20N formed on the substrate 1 is a recess 21 made of an isosceles triangle having an acute angle, and the base is parallel to the extending direction of the recess 10 and By disposing it so as to be positioned on the concave groove 10 side, the liquid flow (d) described above can be reliably formed.

尚、膜形成領域２の外周縁において、相直交する２辺（縦辺と横辺）のコーナー部に直に臨む位置には二等辺三角形からなる凹部２２が配置される。凹部２２は、凹部２１と同一形状の二等辺三角形をなし、底辺が凹溝１０側に位置し、底辺に直交する中心軸が膜形成領域２の外周の縦辺と横辺に対して４５度をなすように斜めに配置される。 In the outer periphery of the film formation region 2, a recess 22 made of an isosceles triangle is disposed at a position directly facing the corners of two mutually orthogonal sides (vertical side and horizontal side). The concave portion 22 is an isosceles triangle having the same shape as the concave portion 21, the base is located on the concave groove 10 side, and the central axis perpendicular to the base is 45 degrees with respect to the vertical and horizontal sides of the outer periphery of the film forming region 2. It is arranged diagonally so as to form

また、膜形成領域２の外周において、相直交する二辺（縦辺と横辺）のコーナー部に直に臨む位置で、上述の二等辺三角形からなる凹部２２の両側には、凹部２１、２２よりも例えば辺の長さを半分とした小形状の二等辺三角形からなる凹部２３が配置される。凹部２３は、底辺が凹溝１０の延在方向に平行で、凹溝１０側に位置するように配置される。各凹部２３の底辺は各凹部２１の底辺と同一直線上に配置される。 In addition, on the outer periphery of the film forming region 2, the concave portions 21, 22 are provided on both sides of the concave portion 22 made of the above-mentioned isosceles triangle at a position directly facing the corner portions of two orthogonal sides (vertical side and horizontal side). For example, a concave portion 23 made of a small isosceles triangle having a half side length is disposed. The concave portion 23 is arranged so that the bottom is parallel to the extending direction of the concave groove 10 and located on the concave groove 10 side. The bottom of each recess 23 is arranged on the same straight line as the bottom of each recess 21.

本実施例の凹部群２０Ｎでは、凹部２１、２２の底辺の長さａ、高さｂを、ａ＝0.06mm、ｂ＝0.10mmとし、凹部２３の長さｃ、高さｄを、ｃ＝0.03mm、ｄ＝0.05mmとしている。また、相隣る凹部２１のピッチ間隔ｐ1を、ｐ1＝0.1mmとし、相隣る凹部２１と凹部２３の配置間隔ｐcを、ｐc＝0.085mmとしている。このような寸法の凹部群２０Ｎを形成することで、表示領域ＤＡ内に形成された配向膜のむらがより一層抑制された。 In the recess group 20N of the present embodiment, the lengths a and heights b of the bottoms of the recesses 21 and 22 are a = 0.06 mm and b = 0.10 mm, and the length c and height d of the recess 23 are c = 0.03 mm and d = 0.05 mm. Further, the pitch interval p1 between the adjacent recesses 21 is set to p1 = 0.1 mm, and the arrangement interval pc between the adjacent recesses 21 and the recesses 23 is set to pc = 0.085 mm. By forming the recess group 20N having such dimensions, the unevenness of the alignment film formed in the display area DA was further suppressed.

尚、凹部群２０Ｎにあっては、例えば相隣る二等辺三角形からなる凹部２１のピッチ間隔ｐ1を、ｐ1＝0.08mmとし、凹部２１の密度を大きくすることもできる。 In the recess group 20N, for example, the pitch interval p1 of the recesses 21 made of adjacent isosceles triangles can be set to p1 = 0.08 mm, and the density of the recesses 21 can be increased.

（実施例３）（図６）
実施例３が実施例１と異なる点は、基板１に形成される凹部群２０Ｎの構成である。実施例３の凹部群２０Ｎは、相隣る凹部２１と凹部２１の間、及び相隣る凹部２１と凹部２２の間に、凹部２２の両側に配置した凹部２３と同一形状である小形状の二等辺三角形からなる凹部２４を配置したことにある。各凹部２４の頂点は各凹部２１、２２の頂点と同一直線上に配置され、かつ相隣る凹部２１、２２の間の中央、及び相隣る凹部２１と凹部２２の間の中央に配置される。相隣る凹部２４のピッチ間隔ｐ2を、ｐ2＝0.1mmとしている。このような寸法で凹部２４を配置したことによっても、表示領域ＤＡ内に形成された配向膜のむらが抑制された。 Example 3 (FIG. 6)
The third embodiment is different from the first embodiment in the configuration of the recess group 20N formed on the substrate 1. The recess group 20N of the third embodiment has a small shape that is the same shape as the recesses 23 arranged on both sides of the recesses 22 between the adjacent recesses 21 and 21 and between the adjacent recesses 21 and 22. That is, a recess 24 made of an isosceles triangle is arranged. The apex of each recess 24 is arranged on the same straight line as the apex of each recess 21, 22, and is arranged in the center between adjacent recesses 21, 22 and in the center between adjacent recesses 21 and 22. The The pitch interval p2 between the adjacent recesses 24 is set to p2 = 0.1 mm. By arranging the recess 24 with such dimensions, the unevenness of the alignment film formed in the display area DA is also suppressed.

（実施例４）（図７）
実施例４が実施例３と異なる点は、基板１に形成される凹部群２０Ｎの構成である。実施例４の凹部群２０Ｎは、相隣る凹部２１と凹部２１の間、及び相隣る凹部２１と凹部２２の間に配置される各凹部２４の頂点を、各凹部２１、２２の頂点を結ぶ直線よりも凹溝１０の側に距離ｅ＝0.025mmだけ後退させたものである。このような寸法で凹部２４を配置したことによっても、実施例３と同様に、表示領域ＤＡ内に形成された配向膜のむらが抑制された。 (Example 4) (FIG. 7)
The fourth embodiment differs from the third embodiment in the configuration of the recess group 20N formed in the substrate 1. In the concave group 20N of the fourth embodiment, the apexes of the respective concave portions 24 arranged between the adjacent concave portions 21 and the concave portions 21 and between the adjacent concave portions 21 and 22 are defined as the apexes of the respective concave portions 21 and 22. The distance e = 0.025 mm is set back from the connecting straight line toward the concave groove 10. Also by arranging the recesses 24 with such dimensions, the unevenness of the alignment film formed in the display area DA was suppressed as in Example 3.

（実施例５）（図８）
実施例５が実施例１と異なる点は、基板１に形成される凹部群２０Ｎの構成にある。実施例５の凹部群２０Ｎは、相隣る凹部２１と凹部２１の間、及び相隣る凹部２１と凹部２２の間に、菱形からなる凹部２５を配置したものである。凹部２５の短い方の対角線の長さｆ、長い方の対角線の長さｇを、ｆ＝0.03mm、ｇ＝0.10mmとしている。各凹部２５の長い方の対角線上にある２つの頂点のそれぞれは各凹部２１、２２の頂点と底辺のそれぞれと同一直線上に配置され、かつ相隣る凹部２１と凹部２１の間の中央、及び相隣る凹部２１と凹部２２の間の中央に配置される。このような形状及び寸法で凹部２５を配置した場合でも、表示領域ＤＡ内に形成された配向膜のむらが抑制された。 (Example 5) (FIG. 8)
The fifth embodiment differs from the first embodiment in the configuration of the recess group 20N formed in the substrate 1. In the recess group 20N of the fifth embodiment, the recesses 25 made of rhombus are arranged between the adjacent recesses 21 and 21 and between the adjacent recesses 21 and 22. The shorter diagonal length f of the concave portion 25 and the longer diagonal length g are set to f = 0.03 mm and g = 0.10 mm. Each of the two vertices on the longer diagonal of each recess 25 is arranged on the same straight line as each of the top and bottom of each recess 21, 22, and the center between the adjacent recesses 21 and 21, And it arrange | positions in the center between the recessed part 21 and the recessed part 22 which adjoin each other. Even when the concave portion 25 is arranged in such a shape and size, unevenness of the alignment film formed in the display area DA is suppressed.

（実施例６）（図９）
実施例６が実施例４と異なる点は、基板１に形成される凹部群２０Ｎの構成にある。実施例６の凹部群２０Ｎは、実施例４の凹部群２０Ｎにおける各凹部２１を、実施例５で用いた凹部２５と同一形状の菱形からなる凹部２６に代えたものである。このような形状および寸法で凹部２６を配置した場合でも、実施例３と同様に、表示領域ＤＡ内に形成された配向膜のむらが抑制された。 Example 6 (FIG. 9)
Example 6 is different from Example 4 in the configuration of a recess group 20N formed in the substrate 1. In the recess group 20N of the sixth embodiment, each recess 21 in the recess group 20N of the fourth embodiment is replaced with a recess 26 made of a rhombus having the same shape as the recess 25 used in the fifth embodiment. Even in the case where the concave portion 26 is arranged in such a shape and size, unevenness of the alignment film formed in the display area DA is suppressed as in the third embodiment.

以上、本発明の実施例を図面により詳述したが、本発明の具体的な構成はこの実施例に限られるものではなく、本発明の要旨を逸脱しない範囲の設計の変更等があっても本発明に含まれる。例えば、本発明の基板１は、複数の凹溝１０からなる凹溝群１０Ｎを配置するものに限らず、単一の凹溝１０を配置してなるものでも良い。 The embodiment of the present invention has been described in detail with reference to the drawings. However, the specific configuration of the present invention is not limited to this embodiment, and even if there is a design change or the like without departing from the gist of the present invention. It is included in the present invention. For example, the substrate 1 of the present invention is not limited to the one in which the groove group 10 </ b> N including the plurality of grooves 10 is disposed, and may be a substrate in which a single groove 10 is disposed.

また、上述の実施例２〜６では、膜形成領域２の外周縁に沿って、相直交する２辺（縦辺と横辺）のコーナー部に直に臨む位置に、二等辺三角形からなる凹部２２が配置されている。但し、この凹部２２は、配置されていなくても良い。また、上述の実施例２〜６では、相隣る凹部２１と凹部２２の間であって、凹部２２の両側に、小形状の二等辺三角形の凹部２３が配置されている。また、実施例３、４では、相隣る凹部２１と凹部２１の間及び相隣る凹部２１と凹部２２の間に、凹部２３と同一形状である凹部２４が配置されている。これらの凹部２３、凹部２４についても、必ずしも配置しなくても良い。さらに、上述の実施例におけるコーナー部に、三角形状の凹部２２、凹部２３、凹部２４、菱形の凹部２５又は凹部２６を適宜置き換えて配置しても良く、あるいはこれらを適宜組み合わせて配置しても良い。 Further, in the above-described Examples 2 to 6, a recess made of an isosceles triangle is located at a position directly facing the corners of two orthogonal sides (vertical side and horizontal side) along the outer peripheral edge of the film forming region 2. 22 is arranged. However, the recess 22 may not be arranged. In Examples 2 to 6 described above, the small isosceles triangular recesses 23 are arranged between the adjacent recesses 21 and 22 and on both sides of the recesses 22. Further, in Examples 3 and 4, a recess 24 having the same shape as the recess 23 is disposed between the adjacent recesses 21 and the recesses 21 and between the adjacent recesses 21 and the recesses 22. These recesses 23 and recesses 24 are not necessarily arranged. Furthermore, the triangular concave portion 22, the concave portion 23, the concave portion 24, the rhombic concave portion 25 or the concave portion 26 may be appropriately replaced at the corner portion in the above-described embodiment, or these may be appropriately combined. good.

また、実施例２では、膜形成領域２への液体の塗布に先立って、凹溝１０への液滴の滴下を行うことは必ずしも必要ではない。但し、凹部２０に、実施例１のように、塗布すべき液体の液滴を、膜形成領域２への塗布に先立って、凹部２０に滴下しておいても良い。このようにすれば、膜形成領域２への液体の滴下によって濡れ広がる液体が、凹部群２０Ｎを通過するときに、各凹部２０内に流れ込むことを促進できる。もちろん、膜形成領域２への滴下の前に、実施例１と同様に、凹溝１０に液滴を滴下しておいても良い。これにより、凹溝１０の縁際での液体の跳ね返りがより一層抑制され、膜形成領域２内に生ずる膜厚のむらを抑制できる。 In the second embodiment, it is not always necessary to drop the liquid droplets into the concave groove 10 before applying the liquid to the film forming region 2. However, a liquid droplet to be applied may be dropped into the recess 20 prior to application to the film forming region 2 as in the first embodiment. In this way, it is possible to promote that the liquid that gets wet by the dripping of the liquid into the film forming region 2 flows into the recesses 20 when passing through the recess group 20N. Of course, a droplet may be dropped into the concave groove 10 in the same manner as in the first embodiment before dropping onto the film forming region 2. Thereby, the splash of the liquid at the edge of the concave groove 10 is further suppressed, and the film thickness unevenness generated in the film forming region 2 can be suppressed.

さらに、実施例１と同様に、凹部２０を有する基板の凹溝１０の幅を、膜形成領域２より遠ざかるに従って狭くなるようにしても良いし、相隣る凹溝１０と凹溝１０の間の間隔Ｓiを、凹溝１０の溝幅Ｌiよりも小さくしても良い。これにより、実施例１と同様に、表示領域ＤＡ内に形成された配向膜のむらを抑制しつつ、製品本体内における凹溝群１０Ｎの占有スペースを小さくし、製品本体に対してより大きな表示領域ＤＡを確保できる。 Further, as in the first embodiment, the width of the groove 10 of the substrate having the recess 20 may be made narrower as the distance from the film forming region 2 increases, or between the adjacent grooves 10. The interval Si may be smaller than the groove width Li of the recessed groove 10. Thus, as in the first embodiment, while suppressing unevenness of the alignment film formed in the display area DA, the occupied space of the groove group 10N in the product body is reduced, and the display area is larger than the product body. DA can be secured.

尚、凹溝は、膜形成領域２の外周を囲む環状であっても良いし、長尺な凹溝を複数配列したものであっても良い。また、凹溝１０は、膜形成領域２の外周で閉じた環状とすることには限定されず、一部に隙間がある形状であってもよい。 In addition, the annular groove surrounding the outer periphery of the film forming region 2 may be used, or a plurality of long concave grooves may be arranged. Further, the concave groove 10 is not limited to an annular shape closed at the outer periphery of the film forming region 2, and may have a shape with a gap in part.

また、前述の実施例では凹部群を二等辺三角形及び菱形の凹部で構成したが、他の形状、例えば、円形、楕円形、三角形や菱形以外の多角形、星型等であっても良い。各凹部２０の形状は、膜形成領域２に塗布された液体が、膜形成領域２から凹溝１０に向かう方向に比べて、凹溝１０から膜形成領域２に向かう方向の方が流れ難くなる形状、配置であればよく、異なる形状、配置の組合せであっても良い。 In the above-described embodiment, the recess group is formed of isosceles triangles and diamond-shaped recesses. However, other shapes such as a circle, an ellipse, a polygon other than a triangle and a diamond, and a star may be used. The shape of each recess 20 is such that the liquid applied to the film formation region 2 is less likely to flow in the direction from the groove 10 to the film formation region 2 than in the direction from the film formation region 2 to the groove 10. Any shape and arrangement may be used, and a combination of different shapes and arrangements may be used.

また、凹溝や凹部の縁は曲面あるいは斜面を有していてもよい。例えば、膜形成領域２の外周に沿う凹溝１０が形成された基板１であって、凹溝１０と膜形成領域２との間に、複数の凹部２０が並置された凹部群２０Ｎを備えるとともに、この凹部群２０Ｎの各凹部２０の形状は、基板１上に塗布された液体が、膜形成領域２から凹溝１０に向かう方向に比べて凹溝１０から膜形成領域２に向かう方向には流れ難い形状をなし、凹溝１０及び凹部２０の一方若しくは双方の縁に、曲面若しくは斜面を有する基板１であってもよい。図１１に、基板１の凹溝１０、凹部２０の縁に垂直面を有する例（Ａ）、斜面を有する例（Ｂ）、曲面を有する例（Ｃ）を示す。 Moreover, the edge of a ditch | groove or a recessed part may have a curved surface or a slope. For example, the substrate 1 is provided with a concave groove 10 along the outer periphery of the film forming region 2, and includes a concave group 20N in which a plurality of concave portions 20 are juxtaposed between the concave groove 10 and the film forming region 2. The shape of each recess 20 of this recess group 20N is such that the liquid applied on the substrate 1 is in the direction from the groove 10 toward the film formation region 2 as compared to the direction from the film formation region 2 toward the recess 10. The substrate 1 may have a shape that is difficult to flow and has a curved surface or a slope on one or both edges of the concave groove 10 and the concave portion 20. FIG. 11 shows an example (A) having a vertical surface at the edge of the groove 10 and the recess 20 of the substrate 1, an example (B) having a slope, and an example (C) having a curved surface.

このように曲面あるいは斜面とすることで、縁に生じる表面張力を弱めて、凹溝１０や凹部２０の輪郭部での液体の盛り上がりが抑制され、この盛り上がりによって生じる液体の跳ね返りも抑制される。また、液体の凹溝１０や凹部２０内への侵入が容易となり、液体の濡れ広がりを受容して濡れ広がりを抑制することがより確実にできる。このような曲面あるいは斜面は、凹溝１０や凹部２０の全周あるいはすべての縁に設けてもよいし、縁の一部、例えば、表示領域ＤＡ側の縁にのみ設けてもよい。表示領域ＤＡ側の縁に設けると、液体の表示領域ＤＡ側への跳ね返りを抑制しつつ、より外側の周辺に濡れ広がる液量を少なくし、シール剤塗布領域への濡れ広がりを抑制する効果も大きい。もちろん、凹溝１０や凹部２０の縁を曲面あるいは斜面としたうえで、実施例１同様に液滴を滴下してもよい。これにより、上記の効果をさらに高めることができる。 By using a curved surface or an inclined surface in this manner, the surface tension generated at the edge is weakened, and the rise of the liquid at the contour of the concave groove 10 and the concave portion 20 is suppressed, and the splashing of the liquid caused by this rise is also suppressed. In addition, the liquid can easily enter the concave groove 10 and the concave portion 20, and the wet spread of the liquid can be received and the wet spread can be suppressed more reliably. Such a curved surface or inclined surface may be provided on the entire circumference or all edges of the recessed groove 10 or the recessed part 20, or may be provided only on a part of the edge, for example, the edge on the display area DA side. When provided at the edge on the display area DA side, it suppresses the splashing of the liquid to the display area DA side, reduces the amount of liquid that spreads to the outer periphery, and also suppresses the spread of wetting to the sealant application area. large. Of course, the droplets may be dropped as in the first embodiment after the edges of the concave groove 10 and the concave portion 20 are curved surfaces or inclined surfaces. Thereby, said effect can further be heightened.

また、膜形成領域の外周に沿う第１の流動調整部が形成された基板１であって、第１の流動調整部と膜形成領域２との間に、複数の第２の流動調整部が並置された第２の流動調整部群を備えるとともに、各第２の流動調整部の形状は、基板１上に塗布された液体が、膜形成領域２から第１の流動調整部に向かう方向に比べて、第１の流動調整部から膜形成領域２に向かう方向には流れ難い形状をなす基板１であってもよい。 In addition, the substrate 1 is provided with the first flow adjusting unit along the outer periphery of the film forming region, and a plurality of second flow adjusting units are provided between the first flow adjusting unit and the film forming region 2. The second flow adjustment unit group is provided in parallel, and the shape of each second flow adjustment unit is such that the liquid applied on the substrate 1 is directed from the film formation region 2 toward the first flow adjustment unit. In comparison, the substrate 1 may have a shape that hardly flows in the direction from the first flow adjusting unit toward the film forming region 2.

第１の流動調整部、第２の流動調整部における「流動調整」は、液体の流動を抑制又は促進することをいう。ここで、第１の流動調整部、第２の流動調整部は、凹部２０であっても、凸部であってもよい。つまり、基板１における表示領域ＤＡと同一の高さの平坦面に対して、窪んでいるか、突出しているかは問わない。第１の流動調整部及び第２の流動調整部が双方とも凹部２０であってもよいし、双方とも凸部であってもよい。第１の流動調整部及び第２の流動調整部のいずれか一方が凹部２０で、他方が凸部であってもよい。 “Flow adjustment” in the first flow adjustment unit and the second flow adjustment unit refers to suppressing or promoting the flow of liquid. Here, the first flow adjustment unit and the second flow adjustment unit may be the concave portion 20 or the convex portion. That is, it does not matter whether the substrate 1 is depressed or protrudes with respect to a flat surface having the same height as the display area DA. Both the first flow adjustment unit and the second flow adjustment unit may be the concave portion 20 or both may be the convex portion. Either one of the first flow adjustment unit and the second flow adjustment unit may be the concave portion 20 and the other may be the convex portion.

また、第２の流動調整部は、頂角が鋭角の二等辺三角形で、この二等辺三角形の底辺が、第１の流動調整部の延在方向に平行で、かつ第１の流動調整部側に位置するように配置されていてもよい。 The second flow adjustment unit is an isosceles triangle having an acute angle, and the base of the isosceles triangle is parallel to the extending direction of the first flow adjustment unit and the first flow adjustment unit side. You may arrange | position so that it may be located in.

第１の流動調整部は、膜形成領域の外周に互いに離隔する複数重をなすように設けられる第１の流動調整部群を形成し、膜形成領域２の外周から離隔する外側の第１の流動調整部ほど幅が小さくてもよい。 The first flow adjusting portion forms a first flow adjusting portion group provided on the outer periphery of the film forming region so as to form a plurality of layers separated from each other, and the first first flow adjusting portion is arranged outside the outer periphery of the film forming region 2. The width may be smaller as the flow adjusting portion.

さらに、第１の流動調整部、第２の流動調整部における縁に、曲面あるいは斜面を有してもよい。例えば、第１の流動調整部又は第２の流動調整部が凸部の場合に、縁部の側面を曲面あるいは傾斜面を有する形状としてもよい。 Furthermore, you may have a curved surface or a slope in the edge in a 1st flow control part and a 2nd flow control part. For example, when the first flow adjustment part or the second flow adjustment part is a convex part, the side surface of the edge part may have a curved surface or an inclined surface.

また、前述の実施例では、インクジェット式の塗布ヘッドを用いる例で説明したが、液体を液滴状にして滴下するものであれば、他の方式の塗布ヘッドを用いるものにも適用可能である。 Further, in the above-described embodiments, the example using the ink jet type coating head has been described. However, as long as the liquid is dropped in the form of droplets, it can be applied to those using other types of coating heads. .

１基板
２膜形成領域
１０Ｎ凹溝群
１０、１１、１２、１３凹溝
２０Ｎ凹部群
２０、２１、２２、２３、２４、２５、２６凹部
１００塗布装置

DESCRIPTION OF SYMBOLS 1 Substrate 2 Film formation area 10N Concave groove group 10, 11, 12, 13 Concave groove 20N Concave group 20, 21, 22, 23, 24, 25, 26 Concave 100 Coating device

Claims

A substrate on which a ditch is formed along the outer periphery of the film formation region,
A recess group in which a plurality of recesses are juxtaposed between the recess groove and the film forming region,
The concave group is an isosceles triangular concave part arranged so that the apex angle is acute and the base is parallel to the extending direction of the concave groove and located on the concave groove side. substrate.

2. The substrate according to claim 1, wherein the recess group further includes a diamond-shaped recess disposed such that a longer diagonal line is orthogonal to an extending direction of the recess.

A substrate on which a ditch is formed along the outer periphery of the film formation region,
Between the concave groove and the film forming region, comprising a concave group in which a plurality of concave portions are juxtaposed,
The concave grooves form a plurality of concave groove groups provided on the outer periphery of the film forming region so as to be separated from each other, and the outer concave groove separated from the outer periphery of the film forming region has a smaller groove width. The substrate according to claim 1 or 2, characterized in that

A method for producing a film-formed substrate, comprising: applying a liquid droplet as a film-forming material dropwise to the film-forming region of the substrate using the substrate according to claim 1.

5. The method of manufacturing a film-formed substrate according to claim 4, wherein the liquid droplets are dropped on the film formation region after being dropped on the concave grooves.