JPH04164923A - Polyphosphosilazane, its production, and phosphorated ceramic - Google Patents
Polyphosphosilazane, its production, and phosphorated ceramicInfo
- Publication number
- JPH04164923A JPH04164923A JP2292458A JP29245890A JPH04164923A JP H04164923 A JPH04164923 A JP H04164923A JP 2292458 A JP2292458 A JP 2292458A JP 29245890 A JP29245890 A JP 29245890A JP H04164923 A JPH04164923 A JP H04164923A
- Authority
- JP
- Japan
- Prior art keywords
- group
- polysilazane
- phosphorus
- polyphosphosilazane
- molecular weight
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000919 ceramic Substances 0.000 title claims description 31
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 229920001709 polysilazane Polymers 0.000 claims description 83
- 229910052698 phosphorus Inorganic materials 0.000 claims description 65
- 239000011574 phosphorus Substances 0.000 claims description 61
- -1 phosphorus compound Chemical class 0.000 claims description 55
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 48
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 43
- 229910052757 nitrogen Inorganic materials 0.000 claims description 35
- 239000010409 thin film Substances 0.000 claims description 27
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 24
- 229910052710 silicon Inorganic materials 0.000 claims description 19
- 239000010703 silicon Substances 0.000 claims description 17
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 16
- 125000000217 alkyl group Chemical group 0.000 claims description 14
- 239000000126 substance Substances 0.000 claims description 14
- 125000005843 halogen group Chemical group 0.000 claims description 13
- 125000003545 alkoxy group Chemical group 0.000 claims description 12
- 125000004432 carbon atom Chemical group C* 0.000 claims description 12
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 11
- 125000003282 alkyl amino group Chemical group 0.000 claims description 10
- 125000003118 aryl group Chemical group 0.000 claims description 10
- 125000003342 alkenyl group Chemical group 0.000 claims description 9
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 9
- 125000003277 amino group Chemical group 0.000 claims description 8
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 8
- 238000000034 method Methods 0.000 claims description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 4
- 229910052799 carbon Inorganic materials 0.000 claims description 4
- 238000004132 cross linking Methods 0.000 claims description 4
- 125000005103 alkyl silyl group Chemical group 0.000 claims description 3
- 238000006243 chemical reaction Methods 0.000 description 47
- 239000002904 solvent Substances 0.000 description 23
- 125000004122 cyclic group Chemical group 0.000 description 21
- 238000010521 absorption reaction Methods 0.000 description 20
- 229920000642 polymer Polymers 0.000 description 18
- 238000010438 heat treatment Methods 0.000 description 15
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 14
- 239000000758 substrate Substances 0.000 description 14
- 239000008096 xylene Substances 0.000 description 14
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 13
- 239000007795 chemical reaction product Substances 0.000 description 12
- 239000000706 filtrate Substances 0.000 description 12
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 9
- 239000007789 gas Substances 0.000 description 9
- 239000010408 film Substances 0.000 description 8
- 238000010304 firing Methods 0.000 description 8
- 125000000524 functional group Chemical group 0.000 description 8
- 239000007787 solid Substances 0.000 description 8
- 238000003756 stirring Methods 0.000 description 8
- 229910021529 ammonia Inorganic materials 0.000 description 7
- 238000005227 gel permeation chromatography Methods 0.000 description 7
- 239000000203 mixture Substances 0.000 description 7
- 239000012299 nitrogen atmosphere Substances 0.000 description 7
- 239000003960 organic solvent Substances 0.000 description 7
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 7
- 239000002994 raw material Substances 0.000 description 7
- 239000011541 reaction mixture Substances 0.000 description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 229920001002 functional polymer Polymers 0.000 description 6
- 229910052739 hydrogen Inorganic materials 0.000 description 6
- 238000007664 blowing Methods 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 5
- ZZUFCTLCJUWOSV-UHFFFAOYSA-N furosemide Chemical compound C1=C(Cl)C(S(=O)(=O)N)=CC(C(O)=O)=C1NCC1=CC=CO1 ZZUFCTLCJUWOSV-UHFFFAOYSA-N 0.000 description 5
- 239000001257 hydrogen Substances 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- GKTNLYAAZKKMTQ-UHFFFAOYSA-N n-[bis(dimethylamino)phosphinimyl]-n-methylmethanamine Chemical compound CN(C)P(=N)(N(C)C)N(C)C GKTNLYAAZKKMTQ-UHFFFAOYSA-N 0.000 description 5
- 125000000962 organic group Chemical group 0.000 description 5
- FKNQCJSGGFJEIZ-UHFFFAOYSA-N 4-methylpyridine Chemical compound CC1=CC=NC=C1 FKNQCJSGGFJEIZ-UHFFFAOYSA-N 0.000 description 4
- 229910006367 Si—P Inorganic materials 0.000 description 4
- 150000007514 bases Chemical class 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 238000003618 dip coating Methods 0.000 description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 4
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 4
- 125000004437 phosphorous atom Chemical group 0.000 description 4
- YWWDBCBWQNCYNR-UHFFFAOYSA-N trimethylphosphine Chemical compound CP(C)C YWWDBCBWQNCYNR-UHFFFAOYSA-N 0.000 description 4
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- 229910052581 Si3N4 Inorganic materials 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- KXVJCDKBHOHSOX-UHFFFAOYSA-N [O-][N+](=O)[ClH]P(=O)=O Chemical compound [O-][N+](=O)[ClH]P(=O)=O KXVJCDKBHOHSOX-UHFFFAOYSA-N 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 3
- 239000007810 chemical reaction solvent Substances 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 239000000284 extract Substances 0.000 description 3
- 229930195733 hydrocarbon Natural products 0.000 description 3
- 238000002329 infrared spectrum Methods 0.000 description 3
- XVDBWWRIXBMVJV-UHFFFAOYSA-N n-[bis(dimethylamino)phosphanyl]-n-methylmethanamine Chemical compound CN(C)P(N(C)C)N(C)C XVDBWWRIXBMVJV-UHFFFAOYSA-N 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 238000010926 purge Methods 0.000 description 3
- 230000009257 reactivity Effects 0.000 description 3
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 3
- 238000001228 spectrum Methods 0.000 description 3
- 239000007858 starting material Substances 0.000 description 3
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 3
- 238000005979 thermal decomposition reaction Methods 0.000 description 3
- 239000013638 trimer Substances 0.000 description 3
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- RGSFGYAAUTVSQA-UHFFFAOYSA-N Cyclopentane Chemical compound C1CCCC1 RGSFGYAAUTVSQA-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- KYQCOXFCLRTKLS-UHFFFAOYSA-N Pyrazine Chemical compound C1=CN=CC=N1 KYQCOXFCLRTKLS-UHFFFAOYSA-N 0.000 description 2
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- DIKBFYAXUHHXCS-UHFFFAOYSA-N bromoform Chemical compound BrC(Br)Br DIKBFYAXUHHXCS-UHFFFAOYSA-N 0.000 description 2
- 230000001680 brushing effect Effects 0.000 description 2
- 244000309464 bull Species 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- MROCJMGDEKINLD-UHFFFAOYSA-N dichlorosilane Chemical compound Cl[SiH2]Cl MROCJMGDEKINLD-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000000921 elemental analysis Methods 0.000 description 2
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- UAEPNZWRGJTJPN-UHFFFAOYSA-N methylcyclohexane Chemical compound CC1CCCCC1 UAEPNZWRGJTJPN-UHFFFAOYSA-N 0.000 description 2
- GDOPTJXRTPNYNR-UHFFFAOYSA-N methylcyclopentane Chemical compound CC1CCCC1 GDOPTJXRTPNYNR-UHFFFAOYSA-N 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 150000003018 phosphorus compounds Chemical class 0.000 description 2
- UHZYTMXLRWXGPK-UHFFFAOYSA-N phosphorus pentachloride Chemical compound ClP(Cl)(Cl)(Cl)Cl UHZYTMXLRWXGPK-UHFFFAOYSA-N 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 230000035484 reaction time Effects 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 150000003512 tertiary amines Chemical class 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- RXJKFRMDXUJTEX-UHFFFAOYSA-N triethylphosphine Chemical compound CCP(CC)CC RXJKFRMDXUJTEX-UHFFFAOYSA-N 0.000 description 2
- CYTQBVOFDCPGCX-UHFFFAOYSA-N trimethyl phosphite Chemical compound COP(OC)OC CYTQBVOFDCPGCX-UHFFFAOYSA-N 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- 125000004178 (C1-C4) alkyl group Chemical group 0.000 description 1
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 1
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 1
- PZHIWRCQKBBTOW-UHFFFAOYSA-N 1-ethoxybutane Chemical compound CCCCOCC PZHIWRCQKBBTOW-UHFFFAOYSA-N 0.000 description 1
- AWBIJARKDOFDAN-UHFFFAOYSA-N 2,5-dimethyl-1,4-dioxane Chemical compound CC1COC(C)CO1 AWBIJARKDOFDAN-UHFFFAOYSA-N 0.000 description 1
- AFABGHUZZDYHJO-UHFFFAOYSA-N 2-Methylpentane Chemical compound CCCC(C)C AFABGHUZZDYHJO-UHFFFAOYSA-N 0.000 description 1
- BSKHPKMHTQYZBB-UHFFFAOYSA-N 2-methylpyridine Chemical compound CC1=CC=CC=N1 BSKHPKMHTQYZBB-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- JVQIKJMSUIMUDI-UHFFFAOYSA-N 3-pyrroline Chemical compound C1NCC=C1 JVQIKJMSUIMUDI-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 1
- 102100028138 F-box/WD repeat-containing protein 7 Human genes 0.000 description 1
- 101001060231 Homo sapiens F-box/WD repeat-containing protein 7 Proteins 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- NHTMVDHEPJAVLT-UHFFFAOYSA-N Isooctane Chemical compound CC(C)CC(C)(C)C NHTMVDHEPJAVLT-UHFFFAOYSA-N 0.000 description 1
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 1
- JLTDJTHDQAWBAV-UHFFFAOYSA-N N,N-dimethylaniline Chemical compound CN(C)C1=CC=CC=C1 JLTDJTHDQAWBAV-UHFFFAOYSA-N 0.000 description 1
- 238000005481 NMR spectroscopy Methods 0.000 description 1
- PCNDJXKNXGMECE-UHFFFAOYSA-N Phenazine Natural products C1=CC=CC2=NC3=CC=CC=C3N=C21 PCNDJXKNXGMECE-UHFFFAOYSA-N 0.000 description 1
- WTKZEGDFNFYCGP-UHFFFAOYSA-N Pyrazole Chemical compound C=1C=NNC=1 WTKZEGDFNFYCGP-UHFFFAOYSA-N 0.000 description 1
- CZPWVGJYEJSRLH-UHFFFAOYSA-N Pyrimidine Chemical compound C1=CN=CN=C1 CZPWVGJYEJSRLH-UHFFFAOYSA-N 0.000 description 1
- 229910003814 SiH2NH Inorganic materials 0.000 description 1
- 229910003828 SiH3 Inorganic materials 0.000 description 1
- DHXVGJBLRPWPCS-UHFFFAOYSA-N Tetrahydropyran Chemical compound C1CCOCC1 DHXVGJBLRPWPCS-UHFFFAOYSA-N 0.000 description 1
- XMIJDTGORVPYLW-UHFFFAOYSA-N [SiH2] Chemical compound [SiH2] XMIJDTGORVPYLW-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- SMZOGRDCAXLAAR-UHFFFAOYSA-N aluminium isopropoxide Chemical compound [Al+3].CC(C)[O-].CC(C)[O-].CC(C)[O-] SMZOGRDCAXLAAR-UHFFFAOYSA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 230000008033 biological extinction Effects 0.000 description 1
- 229950005228 bromoform Drugs 0.000 description 1
- 239000004566 building material Substances 0.000 description 1
- 150000001721 carbon Chemical group 0.000 description 1
- OEERIBPGRSLGEK-UHFFFAOYSA-N carbon dioxide;methanol Chemical compound OC.O=C=O OEERIBPGRSLGEK-UHFFFAOYSA-N 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 230000015271 coagulation Effects 0.000 description 1
- 238000005345 coagulation Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 229920005565 cyclic polymer Polymers 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000006356 dehydrogenation reaction Methods 0.000 description 1
- KTQYJQFGNYHXMB-UHFFFAOYSA-N dichloro(methyl)silicon Chemical compound C[Si](Cl)Cl KTQYJQFGNYHXMB-UHFFFAOYSA-N 0.000 description 1
- JVSWJIKNEAIKJW-UHFFFAOYSA-N dimethyl-hexane Natural products CCCCCC(C)C JVSWJIKNEAIKJW-UHFFFAOYSA-N 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001879 gelation Methods 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- DMEGYFMYUHOHGS-UHFFFAOYSA-N heptamethylene Natural products C1CCCCCC1 DMEGYFMYUHOHGS-UHFFFAOYSA-N 0.000 description 1
- GNOIPBMMFNIUFM-UHFFFAOYSA-N hexamethylphosphoric triamide Chemical compound CN(C)P(=O)(N(C)C)N(C)C GNOIPBMMFNIUFM-UHFFFAOYSA-N 0.000 description 1
- 238000004128 high performance liquid chromatography Methods 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- GYNNXHKOJHMOHS-UHFFFAOYSA-N methyl-cycloheptane Natural products CC1CCCCCC1 GYNNXHKOJHMOHS-UHFFFAOYSA-N 0.000 description 1
- 125000000250 methylamino group Chemical group [H]N(*)C([H])([H])[H] 0.000 description 1
- 239000005048 methyldichlorosilane Substances 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- DAZXVJBJRMWXJP-UHFFFAOYSA-N n,n-dimethylethylamine Chemical compound CCN(C)C DAZXVJBJRMWXJP-UHFFFAOYSA-N 0.000 description 1
- 125000006606 n-butoxy group Chemical group 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- GNVRJGIVDSQCOP-UHFFFAOYSA-N n-ethyl-n-methylethanamine Chemical compound CCN(C)CC GNVRJGIVDSQCOP-UHFFFAOYSA-N 0.000 description 1
- 125000003506 n-propoxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 150000003003 phosphines Chemical class 0.000 description 1
- AQSJGOWTSHOLKH-UHFFFAOYSA-N phosphite(3-) Chemical class [O-]P([O-])[O-] AQSJGOWTSHOLKH-UHFFFAOYSA-N 0.000 description 1
- 150000003014 phosphoric acid esters Chemical class 0.000 description 1
- OJMIONKXNSYLSR-UHFFFAOYSA-N phosphorous acid Chemical compound OP(O)O OJMIONKXNSYLSR-UHFFFAOYSA-N 0.000 description 1
- FAIAAWCVCHQXDN-UHFFFAOYSA-N phosphorus trichloride Chemical compound ClP(Cl)Cl FAIAAWCVCHQXDN-UHFFFAOYSA-N 0.000 description 1
- PBMFSQRYOILNGV-UHFFFAOYSA-N pyridazine Chemical compound C1=CC=NN=C1 PBMFSQRYOILNGV-UHFFFAOYSA-N 0.000 description 1
- 239000012925 reference material Substances 0.000 description 1
- 150000003335 secondary amines Chemical class 0.000 description 1
- OLRJXMHANKMLTD-UHFFFAOYSA-N silyl Chemical compound [SiH3] OLRJXMHANKMLTD-UHFFFAOYSA-N 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- 125000005270 trialkylamine group Chemical group 0.000 description 1
- STCOOQWBFONSKY-UHFFFAOYSA-N tributyl phosphate Chemical compound CCCCOP(=O)(OCCCC)OCCCC STCOOQWBFONSKY-UHFFFAOYSA-N 0.000 description 1
- XTTGYFREQJCEML-UHFFFAOYSA-N tributyl phosphite Chemical compound CCCCOP(OCCCC)OCCCC XTTGYFREQJCEML-UHFFFAOYSA-N 0.000 description 1
- TUQOTMZNTHZOKS-UHFFFAOYSA-N tributylphosphine Chemical compound CCCCP(CCCC)CCCC TUQOTMZNTHZOKS-UHFFFAOYSA-N 0.000 description 1
- DQWPFSLDHJDLRL-UHFFFAOYSA-N triethyl phosphate Chemical compound CCOP(=O)(OCC)OCC DQWPFSLDHJDLRL-UHFFFAOYSA-N 0.000 description 1
- WVLBCYQITXONBZ-UHFFFAOYSA-N trimethyl phosphate Chemical compound COP(=O)(OC)OC WVLBCYQITXONBZ-UHFFFAOYSA-N 0.000 description 1
- RXPQRKFMDQNODS-UHFFFAOYSA-N tripropyl phosphate Chemical compound CCCOP(=O)(OCCC)OCCC RXPQRKFMDQNODS-UHFFFAOYSA-N 0.000 description 1
- KCTAHLRCZMOTKM-UHFFFAOYSA-N tripropylphosphane Chemical compound CCCP(CCC)CCC KCTAHLRCZMOTKM-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
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Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は新規ポリホスホシラザンとその製造方法及びリ
ン含有セラミックスに関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a novel polyphosphosilazane, a method for producing the same, and phosphorus-containing ceramics.
ポリシラザンについては、ベルヒドロシラザン、ポリオ
ルガノ(ヒドロ)シラザン、ポリメタロシラザン(金属
として、例えば、Ti、 AQ、 Zr、 B等を含む
)等が報告されているが、ポリホスホシラザンについて
の報告はない。Regarding polysilazane, perhydrosilazane, polyorgano(hydro)silazane, polymetallosilazane (containing metals such as Ti, AQ, Zr, B, etc.) have been reported, but there are no reports on polyphosphosilazane. .
本発明者らは、ポリシラザンとリン化合物とを反応させ
ることにより、ポリホスホシラザンを得ることを見出す
とともに、このポリホスホシラザンは、各種基材との接
着性にすぐれ、デイツプコーティングやスプレーコーテ
ィング等の簡単なコーティング法により容易に薄膜を作
製することができ、そして、この薄膜を熱処理すると、
従来のポリシラザンから得られるセラミック薄膜に比較
して、高屈折率の透明セラミックス薄膜が得られること
を見出した。The present inventors have discovered that polyphosphosilazane can be obtained by reacting polysilazane with a phosphorus compound, and this polyphosphosilazane has excellent adhesiveness to various substrates, and can be used for dip coating, spray coating, etc. A thin film can be easily produced using a simple coating method, and when this thin film is heat-treated,
It has been found that a transparent ceramic thin film with a higher refractive index can be obtained compared to ceramic thin films obtained from conventional polysilazane.
そこで1本発明は、各種基材に対する接着性にすぐれる
とともに、熱処理により高屈折率の透明性セラミックス
薄膜を与える新規ポリシラザンとその製造方法及びリン
含有セラミックスを提供することをその課題とする。Accordingly, one object of the present invention is to provide a new polysilazane, a method for producing the same, and a phosphorus-containing ceramic that exhibits excellent adhesion to various substrates and provides a transparent ceramic thin film with a high refractive index upon heat treatment.
本発明によれば、ポリシラザンにおいて、下記一般式(
i)−(iv)で表わされる架橋結合の少なくとも一種
を有し、リン/ケイ素原子比が0.01〜5の範囲内で
かつ数平均分子量が約200−500,000のポリホ
スホシラザンが提供される。According to the present invention, in polysilazane, the following general formula (
Provided is a polyphosphosilazane having at least one of the crosslinking bonds represented by i) to (iv), having a phosphorus/silicon atomic ratio within the range of 0.01 to 5, and having a number average molecular weight of about 200 to 500,000. be done.
(式中、R6は水素原子、ハロゲン原子、炭素原子数1
〜20個を有するアルキル基、アルケニル基。(In the formula, R6 is a hydrogen atom, a halogen atom, a carbon atom number of 1
-20 alkyl groups, alkenyl groups.
シクロアルキル基、アリール基、アルコキシ基、アルキ
ルアミノ基、水酸基又はアミノ基であり、R7はR6の
うち窒素原子を有する基の窒素原子に結合している残基
である)
また、本発明によれば、分子中に少なくともSiH結合
又はSiNH結合を有する数平均分子量が約100−s
o 、 oooのポリシラザンと、下記一般式(1)−
(V)で表わされるリン化合物を反応させて、リン/ケ
イ素原子比が0.01〜5の範囲内にあり、かつ数平均
分子量が200〜500 、000であるポリホスホシ
ラザンを得ることを特徴とするポリホスホシラザンの製
造方法が提供される。(a cycloalkyl group, an aryl group, an alkoxy group, an alkylamino group, a hydroxyl group, or an amino group, and R7 is a residue bonded to the nitrogen atom of a group having a nitrogen atom among R6). For example, a molecule having at least a SiH bond or a SiNH bond and a number average molecular weight of about 100-s
o, ooo polysilazane and the following general formula (1)-
A phosphorus compound represented by (V) is reacted to obtain a polyphosphosilazane having a phosphorus/silicon atomic ratio in the range of 0.01 to 5 and a number average molecular weight of 200 to 500,000. A method for producing a polyphosphosilazane is provided.
(1)P(R4)3 (■)((R4)2PN)n (III) P(R4)。(1)P(R4)3 (■) ((R4)2PN)n (III) P(R4).
(IV) R20゜
(V)OP(R4)3
(これらの式中、R4は同一でも異なっていてもよく、
水素原子、ハロゲン原子、炭素原子数1〜20個を有す
るアルキル基、アルケニル基、シクロアルキル基、アリ
ール基、アルコキシ基、アルキルアミノ基、水酸基又は
アミノ基であり、nは2以上の整数である)
さらに、本発明によれば、少なくともケイ素、窒素及び
リンを含有し、リン/ケイ素原子比が0.01〜5の範
囲にあるセラミックスであって、該セラミックスは式S
i−0−P、 Si−P又はP−Nで表わされる結合を
有することを特徴とするリン含有セラミックスが提供さ
れる。(IV) R20°(V)OP(R4)3 (In these formulas, R4 may be the same or different,
A hydrogen atom, a halogen atom, an alkyl group, an alkenyl group, a cycloalkyl group, an aryl group, an alkoxy group, an alkylamino group, a hydroxyl group, or an amino group having 1 to 20 carbon atoms, and n is an integer of 2 or more. ) Furthermore, according to the present invention, there is provided a ceramic containing at least silicon, nitrogen and phosphorus and having a phosphorus/silicon atomic ratio in the range of 0.01 to 5, the ceramic having the formula S
A phosphorus-containing ceramic is provided which is characterized by having a bond represented by i-0-P, Si-P or PN.
本発明で原料として用いるポリシラザンは、分子中に少
なくともSiH結合又はSiNH結合を有する数平均分
子量が約100〜so 、 oooの範囲にあるもので
ある。このようなポリシラザンには、ベルヒドロポリシ
ラザン、ポリオルガノ(ヒドロ)ポリシラザン、ポリメ
タロシラザンが包含される6ポリシラザンに反応させる
リン化合物としては、前記一般式(1)〜(V)で表わ
されるものが用いられる。その具体例としては、アルキ
ルホスフィンやアリールホスフィン(例えば、トリメチ
ルホスフィン、トリエチルホスフィン、トリプロピルホ
スフィン、トリブチルホスフィン、トリフェニルホスフ
ィン等):亜リン酸エステル(例えば、トリメチルホス
ファイト、トリエチルホスファイト、トリプロピルホス
ファイト、トリブチルホスファイト等);リン酸エステ
ル(例えば、トリメチルホスフェイト、トリエチルホス
フェイト、トリプロピルホスフェイト、トリブチルホス
フェイト等);アミドホスフィン(例えばヘキサメチル
ホスホラストリアミド、ヘキサメチルホスホリックトリ
アミド等);ホスファゼン(例えば、ホスホニトリツク
クロライドトリマー)、ハロゲン化ホスフィン(例えば
、三塩化リン、五塩化リン等);リン酸等が挙げられる
。The polysilazane used as a raw material in the present invention has at least a SiH bond or a SiNH bond in the molecule and has a number average molecular weight in the range of about 100 to so, ooo. Such polysilazane includes perhydropolysilazane, polyorgano(hydro)polysilazane, and polymetallosilazane.As the phosphorus compound to be reacted with the 6-polysilazane, those represented by the general formulas (1) to (V) are used. It will be done. Specific examples include alkylphosphines and arylphosphines (e.g., trimethylphosphine, triethylphosphine, tripropylphosphine, tributylphosphine, triphenylphosphine, etc.); phosphites (e.g., trimethylphosphine, triethylphosphine, triphenylphosphine, etc.); phosphite, tributyl phosphite, etc.); phosphate esters (e.g., trimethyl phosphate, triethyl phosphate, tripropyl phosphate, tributyl phosphate, etc.); amidophosphines (e.g., hexamethylphosphorustriamide, hexamethylphosphoric triamide); etc.); phosphazenes (e.g., phosphonitric chloride trimer); halogenated phosphines (e.g., phosphorus trichloride, phosphorus pentachloride, etc.); and phosphoric acid.
すなわち、本発明のポリホスホシラザンにおいては、そ
の原料として用いるポリシラザンに第1の特徴を有する
。That is, the polyphosphosilazane of the present invention has the first characteristic in the polysilazane used as its raw material.
このようなポリシラザンとリン化合物との反応及びその
反応によって得られる化合物の構造は、リン化合物の種
類に依存する。The reaction between polysilazane and a phosphorus compound and the structure of the compound obtained by the reaction depend on the type of the phosphorus compound.
例えば、リン化合物として一般式(1)で表わされるp
(R’ )3を用いる場合、得られるポリホスホシラ
ザンは、ポリシラザンの主骨格中の少なくとも一部のケ
イ素原子に結合した水素原子及び/又は窒素原子に結合
した水素原子とp(R4)3とが反応して、そのケイ素
原子及び/又は窒素原子がP(R4)。For example, p represented by general formula (1) as a phosphorus compound
When (R')3 is used, the resulting polyphosphosilazane has hydrogen atoms bonded to at least some silicon atoms and/or hydrogen atoms bonded to nitrogen atoms in the main skeleton of the polysilazane, and p(R4)3. reacts, and the silicon atom and/or nitrogen atom becomes P(R4).
と縮合した側鎖基あるいは、環状、架橋構造を有するこ
とを特徴とする化合物である。It is a compound characterized by having a side chain group condensed with or having a cyclic or crosslinked structure.
次に、ポリシラザンとリン化合物との反応について詳述
する。Next, the reaction between polysilazane and a phosphorus compound will be described in detail.
ポリシラザンのSi−H結合と、p (R’ ) 3の
うち、アルコキシ基を有する物質との反応では、リン化
合物P (OR’ )J’3−m(Rsハフ )Li
キル基、m=1.2.3)(7)フルコキシ(OR”
)がSi−H結合の水素原子を引き抜いてR’Hを生じ
て脱離することにより、Si−0−P結合が形成される
。In the reaction between the Si-H bond of polysilazane and a substance having an alkoxy group among p(R')3, a phosphorus compound P(OR')J'3-m(RsHuff)Li
Kill group, m=1.2.3) (7) Flukoxy (OR”
) extracts the hydrogen atom of the Si-H bond to form R'H and is eliminated, thereby forming a Si-0-P bond.
一方、ポlJ:、z5ザン(7)N−HM合と、p (
oR’ )mP3−1mとの反応では、P (OR4)
J’z−mにより、N−H結合の水素原子が引き抜かれ
、下記のようにN−P結合が形成される。On the other hand, polJ:, z5zan (7) N-HM combination and p (
oR') In the reaction with mP3-1m, P(OR4)
The hydrogen atom of the N-H bond is extracted by J'z-m, and an N-P bond is formed as shown below.
P(ORs)IIIR’、−1は最大3官能性であるこ
とができるので、出発P(OR4)mR’a−+aの種
類あるいは反応条件に応じて、生成するポリホスホシラ
ザンはリンに関して1〜3官能性の重合体であることが
できる。Since P(ORs)IIIR',-1 can be up to trifunctional, depending on the type of starting P(OR4)mR'a-+a or the reaction conditions, the polyphosphosilazane formed can have between 1 and 1 with respect to phosphorus. It can be a trifunctional polymer.
1官能性重合体はポリシラザンの主鎖のSi及び/又は
Nにペンダント基が導入された下記構造を有する。The monofunctional polymer has the following structure in which a pendant group is introduced into Si and/or N of the main chain of polysilazane.
2〜3官能性重合体ではポリシラザン骨格にPg子を介
して環状、架橋構造が形成される。環状構造はP(OR
4)、−1R’、−、を分子内の2個の官能基が、ポリ
シラザンの隣り合うケイ素原子及び窒素原子と縮合した
構造が含まれる。架橋構造はP(OR4)m−4R4゜
−1の2個以上の官能基が、2分子以上のポリシラザン
と縮合した場合に生じる。In di- or tri-functional polymers, a cyclic, crosslinked structure is formed in the polysilazane skeleton via Pg atoms. The cyclic structure is P(OR
4), -1R', - includes a structure in which two functional groups in the molecule are condensed with adjacent silicon atoms and nitrogen atoms of polysilazane. A crosslinked structure is generated when two or more functional groups of P(OR4)m-4R4°-1 are condensed with two or more molecules of polysilazane.
「
また、3官能性重合体の中には上記の環状構造と架橋構
造を同時に有するものもある。通常、ポリシラザンP(
OR4)、R’3−+mとの反応により、式(3)〜(
8)で示した重合体が得られる。"Also, some trifunctional polymers have the above-mentioned cyclic structure and crosslinked structure at the same time. Usually, polysilazane P (
OR4), by reaction with R'3-+m, formulas (3) to (
The polymer shown in 8) is obtained.
以上の様にポリシラザンからポリホスホシラザンへの構
造上の変化は、ポリシラザンの骨格を基本に新たにペン
ダント基、あるいは環状、架橋構造が形成されることで
ある。As described above, the structural change from polysilazane to polyphosphosilazane is that a new pendant group or cyclic or crosslinked structure is formed based on the polysilazane skeleton.
ポリシラザンのSi−1(結合と、p (R’ Lのう
ち、ハロゲン原子を有する物質との反応では、リン化合
物PXI++(R4)z−m(Xはハロゲン原子、m=
1.2.3)のハロゲン原子が、Si−H結合の水素原
子を引き抜いてHXを生じて脱離することにより、Si
−P結合が形成される。In the reaction between the Si-1 bond of polysilazane and a substance having a halogen atom in p
The halogen atom in 1.2.3) withdraws the hydrogen atom from the Si-H bond to form HX and is eliminated, thereby forming a Si
-P bond is formed.
一方、ポリシラザンの〜H結合と、ハロゲン原子を有す
るリン化合物との反応では、N−H結合の水素原子が引
き抜かれ、下記のようにN−P結合が形成される。On the other hand, in the reaction between the ~H bond of polysilazane and a phosphorus compound having a halogen atom, the hydrogen atom of the N-H bond is extracted and an N-P bond is formed as described below.
リン化合物PXll(R4)−+wはハロゲン原子の数
により、最大3官能性であることができるので、生成す
るポリホスホシラザンはリンに関して1〜3官能性の重
合体であることができる。1官能性重合体はポリシラザ
ンの主鎖のSi及び/又はNにペンダント基が導入され
た下記構造を有する。Since the phosphorus compound PXll(R4)-+w can be up to trifunctional depending on the number of halogen atoms, the resulting polyphosphosilazane can be a mono- to trifunctional polymer with respect to phosphorus. The monofunctional polymer has the following structure in which a pendant group is introduced into Si and/or N of the main chain of polysilazane.
2−3官能性重合体ではポリシラザン骨格にP原子を介
して環状、架橋構造が形成される。環状構造はリン化合
物1分子内の2個の官能基が、ポリシラザンの隣り合う
ケイ素原子及び窒素原子と縮合した構造が含まれる。架
橋構造はリン化合物の2個以上の官能基が、2分子以上
のポリシラザンと縮合した場合に生じる。In the 2-3 functional polymer, a cyclic, crosslinked structure is formed in the polysilazane skeleton via P atoms. The cyclic structure includes a structure in which two functional groups in one molecule of the phosphorus compound are condensed with adjacent silicon atoms and nitrogen atoms of polysilazane. A crosslinked structure occurs when two or more functional groups of a phosphorus compound are condensed with two or more molecules of polysilazane.
また、3官能性重合体の中には上記の環状構造と架橋構
造を同時に有するものもある。Moreover, some trifunctional polymers have the above-mentioned cyclic structure and crosslinked structure at the same time.
ポリシラザンのSi−H結合とリン化合物P(I(4)
、のうち水素原子を有する物質との反応では、リン化合
物PH1l(R”)3−rmの水素原子が、Si−H結
合の水素原子を引き抜いてH2を生じて脱離することに
より。Si-H bond of polysilazane and phosphorus compound P(I(4)
In the reaction with a substance having a hydrogen atom, the hydrogen atom of the phosphorus compound PH1l(R'')3-rm extracts the hydrogen atom of the Si-H bond to generate H2 and is eliminated.
Si−P結合が形成される。A Si-P bond is formed.
一方、ポリシラザンのN−H結合と水素原素子を有する
リン化合物との反応では、N−H結合の水素原子が引き
抜かれ、下記のようにN−P結合が形成される。On the other hand, in the reaction between the N-H bond of polysilazane and a phosphorus compound having a hydrogen atom element, the hydrogen atom of the N-H bond is extracted and an N-P bond is formed as described below.
リン化合物PI(m(R4)3−*は水素原子の数によ
り、最大3官能性であることができるのでリン化合物p
x、、(R4)i−eaについて説明したと同様の構造
を有するポリホスホシラザンを生成することができる。Since the phosphorus compound PI(m(R4)3-* can be up to trifunctional depending on the number of hydrogen atoms, the phosphorus compound p
Polyphosphosilazane having a structure similar to that described for x, , (R4)i-ea can be produced.
ポリシラザンのSi−H結合とリン化合物P(R4)、
のうち、アルキル基、アルケニル基、シクロアルキル基
、アリール基、アルキルアミノ基を有する物質との反応
では、リン化合物p(R4)3の有機基が、Si−H結
合の水素原子を引き抜いてR’Hを生じて脱離すること
により、Si−P結合が形成される。Si-H bond of polysilazane and phosphorus compound P(R4),
Among these, in the reaction with a substance having an alkyl group, an alkenyl group, a cycloalkyl group, an aryl group, or an alkylamino group, the organic group of the phosphorus compound p(R4)3 withdraws the hydrogen atom of the Si-H bond to form R. By generating 'H and eliminating it, a Si-P bond is formed.
但し、アルキルアミノ基の内、窒素原子に結合する基の
一方が水素原子の場合は、脱水素反応が起き、下記の反
応によりSi−N−P結合が形成される。However, when one of the alkylamino groups bonded to the nitrogen atom is a hydrogen atom, a dehydrogenation reaction occurs and a Si-N-P bond is formed by the reaction described below.
一方、ポリシラザンのN−H結合と、アルキル基、アル
ケニル基、シクロアルキル基、アリール基又はアルキル
アミノ基を有するリン化合物との反応では、N−H結合
の水素原子が引き抜かれ、下記のようにN−P結合が形
成される。On the other hand, in the reaction between the N-H bond of polysilazane and a phosphorus compound having an alkyl group, alkenyl group, cycloalkyl group, aryl group, or alkylamino group, the hydrogen atom of the N-H bond is extracted and the following reaction occurs. An N-P bond is formed.
リン化合物P(R4)3は最大3官能性であることがで
きるので、出発リン化合物の種類あるいは反応条件に応
じて、生成するポリホスホシラザンは前記のリン化合物
PXm(R4)a−wrやPI(ml(R4)3−11
を用いた場合と同様の構造を有する。Since the phosphorus compound P(R4)3 can be up to trifunctional, depending on the type of starting phosphorus compound or the reaction conditions, the resulting polyphosphosilazane may be the phosphorus compound PXm(R4)a-wr or PI. (ml(R4)3-11
It has the same structure as when using .
ポリシラザンのSi−H結合とリン化合物P(R4)2
のうち、アミノ基、水酸基を有する物質との反応では、
リン化合物PZII(R4)3−*(Zはアミノ基又は
水酸基)のZ中の水素原子が、Si−H結合の水素原子
を引き抜いてH2を生じて脱離することにより、Si−
N−P結合あるいはSi−0−P結合が形成される。Si-H bond of polysilazane and phosphorus compound P(R4)2
Among these, in the reaction with substances having amino groups and hydroxyl groups,
The hydrogen atom in Z of the phosphorus compound PZII (R4) 3-* (Z is an amino group or a hydroxyl group) extracts the hydrogen atom of the Si-H bond to generate H2 and desorb, thereby forming Si-
An N-P bond or a Si-0-P bond is formed.
一方、ポリシラザンのN−H結合と、アミノ基や水酸基
を有するリン化合物との反応では、N−H結合の水素原
子が引き抜かれ、下記のようにN−P結合あるいはN−
0−P結合が形成される。On the other hand, in the reaction between the N-H bond of polysilazane and a phosphorus compound having an amino group or a hydroxyl group, the hydrogen atom of the N-H bond is extracted, resulting in an N-P bond or N-
A 0-P bond is formed.
リン化合物PZm(R4)a−tmはアミノ基、水酸基
の数により、最大3官能性であることができるので、生
成するポリホスホシラザンはリンに関して1〜3官能性
の重合体であることができる。1官能性重合体はポリシ
ラザンの主鎖のSi及び/又はNにペンダント基が導入
された下記構造を有する。Since the phosphorus compound PZm(R4)a-tm can be up to trifunctional depending on the number of amino groups and hydroxyl groups, the resulting polyphosphosilazane can be a mono- to trifunctional polymer with respect to phosphorus. . The monofunctional polymer has the following structure in which a pendant group is introduced into Si and/or N of the main chain of polysilazane.
2〜3官能性重合体ではポリシラザン骨格にP原子を介
して環状、架橋構造が形成される。環状構造はリン化合
物1分子内の2個の官能基が、ポリシラザンの隣り合う
ケイ素原子及び窒素原子と縮合した構造が含まれる。架
橋構造はリン化合物の2個以上の官能基が、2分子以上
のポリシラザンと縮合した場合に生じる。In a di- or tri-functional polymer, a cyclic, crosslinked structure is formed in the polysilazane skeleton via a P atom. The cyclic structure includes a structure in which two functional groups in one molecule of the phosphorus compound are condensed with adjacent silicon atoms and nitrogen atoms of polysilazane. A crosslinked structure occurs when two or more functional groups of a phosphorus compound are condensed with two or more molecules of polysilazane.
^・
■
「
また、3官能性重合体の中には上記の環状構造と架橋構
造を同時に有するものもある。^・ ■ “Also, some trifunctional polymers have the above-mentioned cyclic structure and crosslinked structure at the same time.
次に、ポリシラザンとホスファゼン((R2’PN)n
)のうちn=3の物質との反応について以下に示す。Next, polysilazane and phosphazene ((R2'PN)n
), the reaction with n=3 substances is shown below.
ポリシラザンのSi−)1結合と(R24PN)、の反
応では(R’□PN)、のR4基が−SiH結合の水素
原子を引き抜いて、R4Hを生じて脱離することにより
Si−P結合が形成される。In the reaction between the Si-)1 bond of polysilazane and (R24PN), the R4 group of (R'□PN) pulls out the hydrogen atom of the -SiH bond, producing R4H and eliminating it, thereby forming the Si-P bond. It is formed.
一方、ポリシラザンのN)I結合と(R’□PN)3の
反応では(R’2PN)、のR4によりNH結合の水素
原子が引き抜かれ、N−P結合が新たに形成される。On the other hand, in the reaction between the N)I bond of polysilazane and (R'□PN)3, the hydrogen atom of the NH bond is extracted by R4 of (R'2PN), and a new N-P bond is formed.
(R4□PN)3は最大6官能性であることができるの
で、出発する(R’□PN)、の種類あるいは反応条件
に応じて生成するポリホスホシラザンはホスファゼン分
子に関して1〜3官能性の重合体であることができる。Since (R4□PN)3 can be up to hexafunctional, depending on the type of starting (R'□PN) or the reaction conditions, the resulting polyphosphosilazane has a mono- to trifunctionality with respect to the phosphazene molecule. It can be a polymer.
■官能性重合体は、ポリシラザンの主鎖のSi及び/又
はNにペンダント基が導入された下記構造を有する。(2) The functional polymer has the following structure in which a pendant group is introduced into Si and/or N of the main chain of polysilazane.
2〜6官能性重合体では、ポリシラザン骨格にホスファ
ゼン分子を介して環状、架橋構造が形成される。In the 2- to 6-functional polymer, a cyclic, crosslinked structure is formed in the polysilazane skeleton via phosphazene molecules.
環状構造は、ホスファゼン1分子内の2個以上の官能基
が同一のポリシラザン分子のケイ素原子及/又は窒素原
子と縮合した構造が含まれる。架橋構造はホスファゼン
の2個以上の官能基が2分子以上のポリシラザンと縮合
した場合に生じる。The cyclic structure includes a structure in which two or more functional groups in one molecule of phosphazene are condensed with a silicon atom and/or a nitrogen atom of the same polysilazane molecule. A crosslinked structure occurs when two or more functional groups of phosphazene are condensed with two or more molecules of polysilazane.
また、3官能性以上の重合体の中には、上記の環状構造
と架橋構造を同時に有するものである。Moreover, some trifunctional or higher functional polymers have the above-mentioned cyclic structure and crosslinked structure at the same time.
本発明で用いるポリシラザンは、分子内に少なくともS
i−H結合、あるいはSi−N−H結合を有するポリシ
ラザンであるが、ポリシラザン単独は勿論のこと、ポリ
シラザンと他のポリマーとの共重合体やポリシラザンと
他の化合物との混合物でも利用できる。The polysilazane used in the present invention has at least S in its molecule.
Although it is a polysilazane having an i-H bond or a Si-N-H bond, not only polysilazane alone but also a copolymer of polysilazane and other polymers or a mixture of polysilazane and other compounds can be used.
本発明で用いるポリシラザンには、鎖状、環状、あるい
は架橋構造を有するもの、あるいは分子内にこれら複数
の構造を同時に有するものがあり、これら単独でもある
いは混合物でも利用できる。The polysilazane used in the present invention includes those having a chain, cyclic, or crosslinked structure, or those having a plurality of these structures simultaneously in the molecule, and these can be used alone or as a mixture.
本発明で好ましく用いられるポリシラザンとしては、下
記一般式(VI)で表わされる単位から主骨格を有する
数平均分子量が約100〜50,000のポリシラザン
が挙げられる。Examples of the polysilazane preferably used in the present invention include polysilazane having a main skeleton composed of units represented by the following general formula (VI) and having a number average molecular weight of about 100 to 50,000.
(式中、R1,R” 、R3は水素原子、アルキル基、
アルケニル基、シクロアルキル基、アリール基又はこれ
らの基以外でケイ素に直結する基が炭素である基、アル
キルシリル基、アルキルアミノ基、アルコキシ基を表わ
す。但し、R’ 、R2,R3の少なくとも1個は水素
原子である。)
−船釣には、前記一般式(VI)のR1,R2及びR3
は水素、炭素原子数1〜5個のアルキル基、炭素原子数
2〜6個のアルケニル基、炭素原子数5〜7個のシクロ
アルキル基、アリール基、炭素原子数1〜4個のアルキ
ルシリル基、炭素原子数1〜5個のアルキルアミノ基、
炭素原子数1〜5個のアルコキシ基からなる群から選ば
れるものが立体障害が小さいので好ましく、より好まし
くは水素原子、メチル基、エチル基、ビニル基、アリル
基、メチルアミノ基。(In the formula, R1, R'', R3 are hydrogen atoms, alkyl groups,
It represents an alkenyl group, a cycloalkyl group, an aryl group, or a group other than these groups in which the group directly bonded to silicon is carbon, an alkylsilyl group, an alkylamino group, or an alkoxy group. However, at least one of R', R2, and R3 is a hydrogen atom. ) - For boat fishing, R1, R2 and R3 of the general formula (VI)
is hydrogen, an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 2 to 6 carbon atoms, a cycloalkyl group having 5 to 7 carbon atoms, an aryl group, an alkylsilyl group having 1 to 4 carbon atoms. group, an alkylamino group having 1 to 5 carbon atoms,
Those selected from the group consisting of alkoxy groups having 1 to 5 carbon atoms are preferred because of their low steric hindrance, and more preferred are hydrogen atoms, methyl groups, ethyl groups, vinyl groups, allyl groups, and methylamino groups.
エチルアミノ基、メトキシ基及びエトキシ基から選ばれ
る。selected from ethylamino, methoxy and ethoxy groups.
一般式(VI)でR1,t+2及びR3に水素原子を有
するものは、ベルヒドロポリシラザンであり、その製造
法は例えば特開昭60−145903号公報、D、5e
yferthらCommunication of A
m、Cer、Soc、、C−13,January19
83、に報告されている。これらの方法で得られるもの
は、種々の構造を有するポリマーの混合物であるが、基
本的には分子内に鎖状部分と環状部分を含み、
一+SiH2NH洩−+SiH2N5−+SiH3)。The compound having hydrogen atoms in R1, t+2 and R3 in the general formula (VI) is perhydropolysilazane, and its production method is disclosed, for example, in JP-A-60-145903, D, 5e.
Communication of A
m,Cer,Soc,,C-13,January19
It was reported in 83. What is obtained by these methods is a mixture of polymers having various structures, but basically contains a chain part and a cyclic part in the molecule (1+SiH2NH+SiH2N5-+SiH3).
(a+b+c=1)の化学式で表わすことができる。ベ
ルヒドロポリシラザンの構造の一例を示すと下記の如く
である。It can be represented by the chemical formula (a+b+c=1). An example of the structure of perhydropolysilazane is shown below.
一般式(VI)でR1及びR2に水素原子、R3にメチ
ル基を有するポリシラザンの製造法は、D、5erfe
rthらPolym、Prepr、 、Arm、Che
tx、Soc、 、Div、Polym、Chem、
。The method for producing polysilazane having hydrogen atoms in R1 and R2 and a methyl group in R3 in general formula (VI) includes D, 5erfe
rth et Polym, Prepr, Arm, Che
tx, Soc, , Div, Polym, Chem,
.
25.10(1984)に報告されている。この方法に
より得られるポリシラザンは、繰り返し単位が一+Si
H。25.10 (1984). The polysilazane obtained by this method has a repeating unit of 1+Si.
H.
NCH,+−の鎖状ポリマーと環状ポリマーであり、い
ずれも架橋構造をもたない。NCH, +- chain polymer and cyclic polymer, neither of which has a crosslinked structure.
一般式(VI)でR1及びR3に水素原子、R2に有機
基を有するポルオルガノ(ヒドロ)シラザンの製造法は
、D、5eyferthらPolym、Prepr、
、Am、Chen+、Soc、、Div、Polym、
chem、、25.10(1984)、特開昭61−8
9230号公報に報告されている。これらの方法により
得られるポリシラザンは、−+R2SiHNH+−を繰
り返し単位として、主として重合度が3〜5の環状構造
を有するものや、
(R”SiHN1()x((R”SiH)1.5N)1
−x(0,4<x<1)の化学式で示される分子内に鎖
状構造と環状構造を同時に有するものである。A method for producing polyorgano(hydro)silazane having a hydrogen atom in R1 and R3 and an organic group in R2 in the general formula (VI) is described by D., 5eyferth et al. Polym, Prepr.
,Am,Chen+,Soc,,Div,Polym,
chem, 25.10 (1984), JP-A-61-8
It is reported in Publication No. 9230. The polysilazane obtained by these methods mainly has a cyclic structure with a degree of polymerization of 3 to 5 with -+R2SiHNH+- as a repeating unit, or (R"SiHN1()x((R"SiH)1.5N)1
It has both a chain structure and a cyclic structure within the molecule represented by the chemical formula -x (0,4<x<1).
一般式(VI)で81に水素原子、R2及びR3に有機
基を有するポリシラザン、またR1及びR2に有機基、
R3に水素原子を有するものは一+R1R”SiNR3
)を繰り返し単位として、主に重合度が3〜5の環状構
造を有している。Polysilazane having a hydrogen atom at 81 and an organic group at R2 and R3 in the general formula (VI), and an organic group at R1 and R2,
Those with a hydrogen atom in R3 are 1+R1R”SiNR3
) as a repeating unit and mainly has a cyclic structure with a degree of polymerization of 3 to 5.
次に本発明で用いるポリシラザンの内、一般式(VI)
以外のものの代表例をあげる。Next, among the polysilazane used in the present invention, general formula (VI)
Here are some representative examples of other things.
ポリオルガノ(ヒドロ)シラザンの中には、D、5ey
ferthらCommunication of Am
、Cer、Soc、、C−132,July 1984
.が報告している様な分子内に架橋構造を有するものも
ある。−例を示すと下記の如くである。Among the polyorgano(hydro)silazane, D, 5ey
Communication of Am
,Cer,Soc,,C-132,July 1984
.. Some have a cross-linked structure within the molecule, as reported by. - Examples are as follows.
また、特開昭49−69717号公報に報告されている
様なR1SiX3(X:ハロゲン)のアンモニア分解に
よって得られる架橋構造を有するポリシラザン(R1S
i(NH)X)、あるいはR1SiX3及びR” □S
iX2(7)共アンモニア分解によって得られる下記の
構造を有するポリシラザンも本発明の出発原料として用
いることができる。In addition, polysilazane (R1S
i(NH)X), or R1SiX3 and R" □S
Polysilazane having the following structure obtained by iX2(7) co-ammonia decomposition can also be used as a starting material in the present invention.
本発明で用いるポリシラザンにおいて、一般式(VI)
で表わされる単位からなる主鎖骨格を有する場合、その
一般式(1)で表わされる単位は、上記にも明らかな如
く環状化することがあり、その場合にはその環状部分が
末端基となり、このように環状化されない場合には、主
鎖骨格の末端はR1゜R2,R’と同様の基又は水素で
あることができる。In the polysilazane used in the present invention, general formula (VI)
When the main chain skeleton is composed of units represented by the formula (1), the unit represented by the general formula (1) may be cyclized as shown above, and in that case, the cyclic portion becomes the terminal group, When not cyclized in this way, the terminal of the main chain skeleton can be a group similar to R1°R2,R' or hydrogen.
ポリシラザンには、以上の如く有機溶媒に可溶なものの
ほか、例えば下図に示すものの様に有機溶媒に不溶なも
のも原料として利用できるが、これらはリン化合物との
反応生成物も有機溶媒に不溶であるため、応用面での制
限を受けることになる。In addition to polysilazane that is soluble in organic solvents as described above, polysilazane that is insoluble in organic solvents, such as those shown in the figure below, can also be used as raw materials, but the reaction products of these with phosphorus compounds are also insoluble in organic solvents Therefore, it is subject to limitations in terms of application.
[Si (NH)2)nM 、B111y、Bull、
Soc、Chem、Fr、 、 183 (1962)
[Si、N3H)nM 、B111y 、Bull、S
oc、Chem 、Fr、 、 1550 (1961
)■
(si2(N)l、 ))□ C3x3(NH4
))。[Si(NH)2)nM, B111y, Bull,
Soc, Chem, Fr, 183 (1962)
[Si, N3H)nM, B111y, Bull, S
oc, Chem, Fr, , 1550 (1961
)■ (si2(N)l, ))□ C3x3(NH4
)).
M、B111y、Compt、Rend、 、 250
,4163 (1960) ;251 、1639 (
1960)本発明で用いるポリシラザンは、約100〜
50,000の数平均分子量を有するもので、環状ポリ
シラザン、鎖状ポリシラザンあるいはそれらの混合物か
ら構成される。本発明において好ましく用いられる原料
ポリシラザンは、数平均分子量的250〜20,000
、より好ましくは約500〜10,000である。分子
量が小さすぎると、リン化合物との反応生成物も低分子
量となり、性状が粘性液体のため、応用面で制限をうけ
るばかりでなく、焼成工程中の飛散量が大きく、セラミ
ックス収率が低いので好ましくない。分子量が大きすぎ
ると、リン化合物との反応生成物が溶媒不溶又はゲルに
なるやすいため、好ましくない。M, B111y, Compt, Rend, , 250
, 4163 (1960); 251, 1639 (
1960) The polysilazane used in the present invention has a molecular weight of about 100 to
It has a number average molecular weight of 50,000 and is composed of cyclic polysilazane, linear polysilazane, or a mixture thereof. The raw material polysilazane preferably used in the present invention has a number average molecular weight of 250 to 20,000.
, more preferably about 500 to 10,000. If the molecular weight is too small, the reaction product with the phosphorus compound will also have a low molecular weight, and the property will be a viscous liquid, which will not only limit the application, but also cause a large amount of scattering during the firing process, resulting in a low ceramic yield. Undesirable. If the molecular weight is too large, the reaction product with the phosphorus compound tends to be insoluble in the solvent or becomes a gel, which is not preferable.
本発明で用いるリン化合物は、前記した一般式(1)〜
(V)のいずれかで表わされるものである。The phosphorus compound used in the present invention has the general formula (1) to
(V).
本発明の新規ポリホスホシラザンの数平均分子量は20
0〜50万、好ましくは800〜20万の範囲内である
。The number average molecular weight of the novel polyphosphosilazane of the present invention is 20
It is in the range of 0 to 500,000, preferably 800 to 200,000.
本発明のポリホスホシラザンを製造するには、数平均分
子量が約100〜5万のポリシラザンと、前記一般式(
1)、(If )、(nl)、(IV)又は(V)で表
わされるリン化合物を反応させる。In order to produce the polyphosphosilazane of the present invention, a polysilazane having a number average molecular weight of about 100 to 50,000 and the general formula (
1) A phosphorus compound represented by (If), (nl), (IV) or (V) is reacted.
本発明に用いるポリシラザンは特に制約はなく、入手可
能なものを用いることができるが、リン化合物との反応
性の点で、一般式(Vl)で表わされるポリシラザンに
おいて、R”、R2及びR3が立体障害の小さい基であ
るものが好ましい。即ち、R1,R”及びR3としては
水素原子及びC□〜、のアルキル基が好ましく、水素原
子及びC□−2のアルキル基がさらに好ましい。There are no particular restrictions on the polysilazane used in the present invention, and any available one can be used.However, in terms of reactivity with phosphorus compounds, in the polysilazane represented by the general formula (Vl), R'', R2, and R3 are Groups with low steric hindrance are preferred. That is, R1, R'' and R3 are preferably a hydrogen atom and an alkyl group of C□-2, and more preferably a hydrogen atom and an alkyl group of C□-2.
本発明で用いるリン化合物は、特に制約はないが、反応
性の点で、式(1)−(V)におけるR4は水素原子及
びハロゲン原子及びC□〜2゜のアルキル基及びアルコ
キシ基が好ましく、水素原子及びハロゲン原子及びCニ
ー□。のアルキル基及びアルコキシ基がさらに好ましく
、水素原子及びハロゲン原子及びC1−4のアルキル基
及びアルコキシ基が最も好ましい。−船釣には、式(1
)〜(V)のR4は水素原子、ハロゲン原子、炭素原子
数1〜10個のアルキル基、炭素原子数1〜10個のア
ルコキシ基、炭素原子数1〜10個のアリール基から選
ばれることが好ましく、メチル基、エチル基、n−プロ
ピル基、j−プロピル基、n−ブチル基、i−ブチル基
、t−ブチル基、フェニル基、ベンジル基、トリル基、
メトキシ基、エトキシ基、n−プロポキシ基、i−プロ
ポキシ基、n−ブトキシ基、j−ブトキシ基、t−ブト
キシ基、及びフェノキシ基から選ばれることがより好ま
しい。The phosphorus compound used in the present invention is not particularly limited, but from the viewpoint of reactivity, R4 in formula (1)-(V) is preferably a hydrogen atom, a halogen atom, and an alkyl group or alkoxy group having C□ to 2°. , hydrogen atoms and halogen atoms, and Cney □. More preferred are alkyl groups and alkoxy groups, and most preferred are hydrogen atoms, halogen atoms, and C1-4 alkyl groups and alkoxy groups. -For boat fishing, the formula (1
) to (V), R4 is selected from a hydrogen atom, a halogen atom, an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, and an aryl group having 1 to 10 carbon atoms. are preferable, and methyl group, ethyl group, n-propyl group, j-propyl group, n-butyl group, i-butyl group, t-butyl group, phenyl group, benzyl group, tolyl group,
It is more preferably selected from methoxy group, ethoxy group, n-propoxy group, i-propoxy group, n-butoxy group, j-butoxy group, t-butoxy group, and phenoxy group.
ポリシラザンとリン化合物との混合比は、P/Si原子
比が0.001から100になるように、好ましくは0
.01から60になるように、さらに好ましくは0.0
2から1.5になる様に規定する。リン化合物の混合割
合をこれより増やすとポリシラザンとの反応性を高める
ことなく、単にリン化合物が未反応のまま回収され、ま
た少ないと顕著な高分子量化が起こらない。The mixing ratio of polysilazane and phosphorus compound is preferably 0 so that the P/Si atomic ratio is from 0.001 to 100.
.. 01 to 60, more preferably 0.0
It is specified to be between 2 and 1.5. If the mixing ratio of the phosphorus compound is increased more than this, the phosphorus compound will simply be recovered unreacted without increasing the reactivity with the polysilazane, and if it is less than this, significant increase in molecular weight will not occur.
反応は、無溶媒で行なうこともできるが、有機溶媒を使
用する時に比べて反応制御が難しく、ゲル状物質が生成
する場合もあるので、一般に有機溶媒を用いた方が良い
。溶媒としては芳香族炭化水素、脂肪族炭化水素、脂環
式炭化水素等の炭化水素溶媒;ハロゲン化炭化水素;脂
肪族エーテル;脂環式エーテル類が使用できる。好まし
い溶媒は、塩化メチレン、クロロホルム、四塩化炭素、
ブロモホルム、塩化エチレン、塩化エチルデン、トリク
ロロエタン、エチルエーテル、イソプロピルエーテル、
エチルブチルエーテル、ブチルエーテル、1.2−ジオ
キシエタン、ジオキサン、ジメチルジオキサン、テトラ
ヒドロフラン、テトラヒドロピラン等のエーテル類や、
ペンタン、ヘキサン、メチルペンタン、ヘプタン、イソ
へブタン、オクタン、イソオクタン、シクロペンタン、
メチルシクロペンタン、シクロヘキサン、メチルシクロ
ヘキサン、ベンゼン、トルエン、キシレン、エチルベン
ゼン等の炭化水素等である。The reaction can be carried out without a solvent, but it is more difficult to control the reaction than when using an organic solvent, and a gel-like substance may be produced, so it is generally better to use an organic solvent. As the solvent, hydrocarbon solvents such as aromatic hydrocarbons, aliphatic hydrocarbons, and alicyclic hydrocarbons; halogenated hydrocarbons; aliphatic ethers; and alicyclic ethers can be used. Preferred solvents are methylene chloride, chloroform, carbon tetrachloride,
Bromoform, ethylene chloride, ethyldene chloride, trichloroethane, ethyl ether, isopropyl ether,
Ethers such as ethyl butyl ether, butyl ether, 1,2-dioxyethane, dioxane, dimethyldioxane, tetrahydrofuran, tetrahydropyran,
Pentane, hexane, methylpentane, heptane, isohbutane, octane, isooctane, cyclopentane,
These include hydrocarbons such as methylcyclopentane, cyclohexane, methylcyclohexane, benzene, toluene, xylene, and ethylbenzene.
高分子量ポリホスホシラザンを得るためには、塩基性条
件下でポリシラザンとリン化合物との反応を行なうのが
好ましい。この場合、塩基性条件とは、反応系に塩基性
化合物、例えば、第3級アミン類や立体障害性の基を有
する第2級アミン類等を共存させることを意味する。こ
のような塩基性条件は、反応溶媒中に塩基性化合物を添
加することによって形成し得る他、反応溶媒として塩基
性溶媒又は塩基性溶媒と前記非塩基性溶媒との混合物を
用いることによって形成することができる。In order to obtain a high molecular weight polyphosphosilazane, it is preferable to react the polysilazane and the phosphorus compound under basic conditions. In this case, basic conditions mean that a basic compound such as tertiary amines or secondary amines having a sterically hindered group is allowed to coexist in the reaction system. Such basic conditions can be formed by adding a basic compound to the reaction solvent, or by using a basic solvent or a mixture of a basic solvent and the non-basic solvent as the reaction solvent. be able to.
塩基性化合物の添加量は、反応溶媒100重量部に対し
少なくとも5重量部、好ましくは20重量部以上である
。塩基性化合物の添加量がこれより少なくなると、著し
い高分子量化の効果がなくなる。The amount of the basic compound added is at least 5 parts by weight, preferably 20 parts by weight or more, per 100 parts by weight of the reaction solvent. If the amount of the basic compound added is less than this, there will be no significant effect of increasing the molecular weight.
塩基性溶媒としては、出発原料であるポリシラザン及び
リン化合物を分解しないものであれば任意のものが使用
できる。このようなものとしては、例えば、トリメチル
アミン、ジメチルエチルアミン、ジエチルメチルアミン
及びトリエチルアミン等のトリアルキルアミン、ピリジ
ン、ピコリン。Any basic solvent can be used as long as it does not decompose the starting materials polysilazane and phosphorus compound. These include, for example, trialkylamines such as trimethylamine, dimethylethylamine, diethylmethylamine and triethylamine, pyridine, picoline.
ジメチルアニリン、ピラジン、ピリミジン、ピリダジン
及びこれらの誘導体等の第3Rアミン類の他、ピロール
、3−ピロリン、ピラゾール、2−ピラゾリル、及びそ
れらの混合物等を挙げることができる。In addition to tertiary amines such as dimethylaniline, pyrazine, pyrimidine, pyridazine, and derivatives thereof, pyrrole, 3-pyrroline, pyrazole, 2-pyrazolyl, and mixtures thereof can be mentioned.
反応温度は反応系を液体系に保持する範囲にするのが好
ましい。ポリホスホシラザンの高分子量化をさらに進め
るには溶媒の沸点以上で反応させることもできるが、ポ
リホスホシラザンの熱分解によるゲル化を防ぐため、一
般に200℃以下、好ましくは一78℃〜150℃にす
るのが好ましい。The reaction temperature is preferably within a range that maintains the reaction system in a liquid state. To further increase the molecular weight of polyphosphosilazane, it is possible to carry out the reaction at a temperature above the boiling point of the solvent, but in order to prevent gelation due to thermal decomposition of polyphosphosilazane, the reaction temperature is generally below 200°C, preferably from -78°C to 150°C. It is preferable to
圧力は常圧が好ましい。加圧にすることには特に制約は
ないが、減圧下では、低沸点成分が留去され、収率が低
下するので好ましくない。反応時間は、一般に30分か
ら1日程度であるが、ポリホスホシラザンの高分子量化
をさらに進めるには、反応時間は延長することが好まし
い。The pressure is preferably normal pressure. Although there are no particular restrictions on pressurization, it is not preferable to use reduced pressure because low-boiling components are distilled off and the yield decreases. The reaction time is generally about 30 minutes to one day, but in order to further increase the molecular weight of polyphosphosilazane, it is preferable to extend the reaction time.
また、反応雰囲気としては原料のリン化合物及びポリシ
ラザンあるいは生成物のポリホスホシラザンの酸化や加
水分解を防ぐため、乾燥させた不活性雰囲気、例えば乾
燥窒素、乾燥アルゴン等が好ましい。The reaction atmosphere is preferably a dry inert atmosphere, such as dry nitrogen or dry argon, in order to prevent oxidation or hydrolysis of the raw material phosphorus compound and polysilazane or the product polyphosphosilazane.
本発明の反応は貴金属等の高価な゛触媒を必要としない
点で有利である。The reaction of the present invention is advantageous in that it does not require expensive catalysts such as noble metals.
生成物のポリホスホシラザンと出発原料のリン化合物と
は、リン化合物の減圧留去あるいはゲルパーミェーショ
ンクロマトグラフィー、高速液体クロマトグラフィー等
によって分離することができる。The polyphosphosilazane product and the phosphorus compound as a starting material can be separated by distillation of the phosphorus compound under reduced pressure, gel permeation chromatography, high performance liquid chromatography, or the like.
本発明の方法で得られる新規ポリホスホシラザンは、ポ
リシラザンの一部のケイ素−水素結合がリン化合物の水
素原子や、ハロゲン原子又は有機基と縮合し、新たにケ
イ素−(酸素)−リン結合又はケイ素−窒素−リン結合
を形成し、かつ/又は、ポリシラザンの一部の窒素−水
素結合もリン化合物と縮合した構造を有する重合体であ
る。In the novel polyphosphosilazane obtained by the method of the present invention, some of the silicon-hydrogen bonds of the polysilazane are condensed with the hydrogen atoms, halogen atoms, or organic groups of the phosphorus compound, resulting in new silicon-(oxygen)-phosphorus bonds or It is a polymer having a structure in which silicon-nitrogen-phosphorus bonds are formed and/or some nitrogen-hydrogen bonds in polysilazane are also condensed with a phosphorus compound.
本発明の新規ポリホスホシラザンは、前記のことかられ
かるように、次の一般式(i)〜(iv)で表わされる
リン原子を含む架橋基によって架橋された構造を有する
ものである。As can be seen from the above, the novel polyphosphosilazane of the present invention has a structure crosslinked by a crosslinking group containing a phosphorus atom represented by the following general formulas (i) to (iv).
7〒
(i ) (ii) (iii)
(■)本発明のホスホシラザンは、このような架橋
基により高分子化されていることから、その分子量は、
当然のことながら、原料ポリシラザンよりも増加された
ものとなる。−船釣には、本発明の目的とする新規ポリ
ホスホシラザンは、数平均分子量200〜soo、oo
o、好ましくは、 800−200,000を有する。7〒 (i) (ii) (iii)
(■) Since the phosphosilazane of the present invention is polymerized by such crosslinking groups, its molecular weight is
Naturally, the amount is increased compared to the raw material polysilazane. -For boat fishing, the novel polyphosphosilazane targeted by the present invention has a number average molecular weight of 200 to soo, oo
o, preferably 800-200,000.
本発明によるポリホスホシラザンの場合、ポリホスホン
、ラザン中のリン原子とケイ素原子との比は0.01以
上5以下の範囲内にあり、かつ有機溶媒に可溶である。In the case of the polyphosphosilazane according to the present invention, the ratio of phosphorus atoms to silicon atoms in the polyphosphone or lasane is within the range of 0.01 or more and 5 or less, and is soluble in an organic solvent.
本発明により得られたポリホスホシラザンは、原料ポリ
シラザンよりも架橋構造や分子量が増加するので、凝固
性が向上し、常温ですみやかな賦形化が可能である。ま
た、高分子量であることによって、高温焼成時の蒸発損
失を小さくでき、セラミックス収率が向上する。例えば
、本発明のポリホスホシラザンによれば70%以上、さ
らには80%以上のセラミック収率が得られる。The polyphosphosilazane obtained according to the present invention has a crosslinked structure and a larger molecular weight than the raw material polysilazane, and thus has improved coagulation properties and can be shaped quickly at room temperature. Furthermore, due to the high molecular weight, evaporation loss during high-temperature firing can be reduced, and the yield of ceramics can be improved. For example, according to the polyphosphosilazane of the present invention, a ceramic yield of 70% or more, and even 80% or more can be obtained.
本発明のポリホスホシラザンは、雰囲気ガス下、あるい
は真空中で焼成することにより、簡単にセラミックスに
変換される。雰囲気ガスとしては窒素が好都合であるが
、アルゴン、アンモニアを用いることもできる。また、
窒素、アンモニア、アルゴン、水素等の混合ガスを利用
することもできる。The polyphosphosilazane of the present invention is easily converted into ceramics by firing under atmospheric gas or in vacuum. Nitrogen is convenient as the atmospheric gas, but argon or ammonia can also be used. Also,
A mixed gas of nitrogen, ammonia, argon, hydrogen, etc. can also be used.
焼成温度は、一般には、700〜1900℃の範囲内で
ある。焼成温度が低すぎると焼成に長時間を要し、また
あまり高くしてもエネルギーコスト的に不利である。The firing temperature is generally in the range of 700 to 1900°C. If the firing temperature is too low, the firing takes a long time, and if the firing temperature is too high, it is disadvantageous in terms of energy cost.
昇温速度は、一般には、0.1℃/分〜300℃/分の
範囲内である。昇温速度が遅すぎると焼成に長時間を要
し、また速すぎると熱分解、収縮が一時に起こるためセ
ラミックス中のクラック発生原因となる。ポリホスホシ
ラザンの熱分解が主としておこる600℃以下の温度範
囲において昇温速度を0.5℃/分〜50℃/分に制御
することで良好な結果が得られる。The heating rate is generally within the range of 0.1°C/min to 300°C/min. If the heating rate is too slow, firing will take a long time, and if it is too fast, thermal decomposition and shrinkage will occur all at once, causing cracks in the ceramic. Good results can be obtained by controlling the temperature increase rate to 0.5°C/min to 50°C/min in the temperature range of 600°C or lower where the thermal decomposition of polyphosphosilazane mainly occurs.
本発明のポリホスホシラザンは、有機溶媒に可溶であり
、各種基材に対してすぐれた接着性を有する。本発明の
ポリホスホシラザンは、塗布性にすぐれ、デイツプコー
ティングや、スプレーコーティング等の簡便なコーティ
ングにより基材上に薄膜を容易に形成することができる
。そして、このようにして基材上に成形されたポリホス
ホシラザンの薄膜は、熱処理により、透明セラミックス
膜とすることができる。このセラミックス膜は、基材に
対する接着性、耐熱性、耐食性、耐摩耗性にすぐれる上
、屈折率が高いという特徴を有する。The polyphosphosilazane of the present invention is soluble in organic solvents and has excellent adhesive properties to various substrates. The polyphosphosilazane of the present invention has excellent coating properties, and a thin film can be easily formed on a substrate by simple coating such as dip coating or spray coating. The polyphosphosilazane thin film thus formed on the base material can be made into a transparent ceramic film by heat treatment. This ceramic film is characterized by excellent adhesion to the substrate, heat resistance, corrosion resistance, and abrasion resistance, as well as a high refractive index.
従って、本発明のポリホスホシラザンは、反射防止膜等
の光学材料及び光学材料のコーテイング材として利用さ
れる他、マイクロエレクトロニクス、航空宇宙産業、自
動車産業、建築材料等の分野における新素材として応用
することができる。Therefore, the polyphosphosilazane of the present invention can be used as an optical material such as an antireflection film and a coating material for an optical material, and can also be applied as a new material in fields such as microelectronics, aerospace industry, automobile industry, and building materials. be able to.
次に本発明を実施例によりさらに詳細に説明する。 Next, the present invention will be explained in more detail with reference to Examples.
参考例1
内容積IQの四つロフラスコにガス吹き込み管、メカニ
カルスターラー、ジュワーコンデンサーを装置した。反
応器内部を脱酸素した乾燥窒素で置換した後、四つロフ
ラスコに脱気した乾燥ピリジン490−を入れ、これを
氷冷した。次にジクロロシラン51.6gを加えると白
色固体状のアダクト(SiH2CQ2・2C,H,N)
が生成した。反応混合物を氷冷し、撹拌しながら、水酸
化ナトリウム管及び活性炭管を通して精製したアンモニ
ア51.0gを吹き込んだ。Reference Example 1 A four-loop flask with an internal volume of IQ was equipped with a gas blowing pipe, a mechanical stirrer, and a dewar condenser. After the inside of the reactor was replaced with deoxygenated dry nitrogen, degassed dry pyridine 490- was placed in a four-bottle flask and cooled on ice. Next, when 51.6 g of dichlorosilane was added, a white solid adduct (SiH2CQ2.2C,H,N) was formed.
was generated. The reaction mixture was ice-cooled, and while stirring, 51.0 g of purified ammonia was blown into the reaction mixture through a sodium hydroxide tube and an activated carbon tube.
反応終了後、反応混合物を遠心分離し、乾燥ピリジンを
用いて洗浄した後、更に窒素雰囲気下でろ過し、ろ液8
50−を得た。ろ液5−から溶媒を減圧留去すると樹脂
固体状ベルヒドロポリシラザン0.102gが得られた
。After the reaction is completed, the reaction mixture is centrifuged, washed with dry pyridine, and further filtered under a nitrogen atmosphere to obtain a filtrate 8.
I got 50-. The solvent was distilled off from the filtrate 5- under reduced pressure to obtain 0.102 g of resinous solid perhydropolysilazane.
得られたポリマーの数平均分子量はGPCにより測定し
たところ、980であった。また、このポリマーのIR
(赤外吸収)スペクトル(溶媒:乾燥0−キレン;ベル
ヒドロポリシラザンの濃度:10.2g/12)を検討
すると、波数(cm−” )3350(見かけの吸光係
数ε:0.557ug−1cm−1及び1175のNH
に基づく吸収;2170(ε=3.14)のSiHに基
づく吸収;1020〜820のSiH及びSiNS1に
基づく吸収を示すことが確認された。またこのポリマー
の” HNMR(プロトン核磁気共鳴)スペクトル(6
0MHz溶媒CDC4□/基準物質TMS)を検討する
と、いずれも幅広い吸収を示していることが確認された
。即ち64.8及び4.4(br、SiH);1.5(
br。The number average molecular weight of the obtained polymer was 980 as measured by GPC. Also, the IR of this polymer
Examining the (infrared absorption) spectrum (solvent: dry 0-kylene; concentration of perhydropolysilazane: 10.2 g/12), the wave number (cm-'') was 3350 (apparent extinction coefficient ε: 0.557 ug-1 cm- 1 and 1175 NH
Absorption based on SiH of 2170 (ε=3.14); Absorption based on SiH and SiNS1 of 1020 to 820. In addition, the HNMR (proton nuclear magnetic resonance) spectrum (6
When examining the 0 MHz solvent CDC4□/reference material TMS), it was confirmed that both showed broad absorption. i.e. 64.8 and 4.4 (br, SiH); 1.5 (
br.
NH)の吸収が確認された。Absorption of NH) was confirmed.
参考例2 参考例1と同一の装置を用いて反応を行った。Reference example 2 The reaction was carried out using the same apparatus as in Reference Example 1.
即ち、参考例1で示した四つロフラスコに脱気した乾燥
テトラヒドロフラン450−を入れ、これをドライアイ
ス−メタノール浴で冷却した。次にジクロロシラン46
.2gを加えた。この溶液を冷却し、撹拌しながら無水
メチルアミン44.2gを窒素との混合ガスとして吹き
込んだ。That is, 450 kg of degassed dry tetrahydrofuran was placed in the four-loaf flask shown in Reference Example 1, and cooled in a dry ice-methanol bath. Next, dichlorosilane 46
.. Added 2g. This solution was cooled, and 44.2 g of anhydrous methylamine was blown into the solution as a mixed gas with nitrogen while stirring.
反応終了後、反応混合物を遠心分離し、乾燥テトラヒド
ロフランを用いて洗浄した後、さらに窒素雰囲気下でろ
過してろ液820−を得た。溶媒を減圧留去すると粘性
油状N−メチルシラザンが8.4g得られた。得られた
ポリマーの数平均分子量は、GPCにより測定したとこ
ろ1100であった。After the reaction was completed, the reaction mixture was centrifuged, washed with dry tetrahydrofuran, and then filtered under a nitrogen atmosphere to obtain filtrate 820-. When the solvent was distilled off under reduced pressure, 8.4 g of viscous oily N-methylsilazane was obtained. The number average molecular weight of the obtained polymer was 1100 as measured by GPC.
参考例3
内容積IQの四つロスターラーにガス吹き込み管、メカ
ニカルスターラー、ジュワーコンデンサーを装置した。Reference Example 3 A four-roster stirrer with an internal volume of IQ was equipped with a gas blowing pipe, a mechanical stirrer, and a dewar condenser.
反応器内部を脱酸素した乾燥窒素で置換した後、四つロ
フラスコに乾燥ジクロロメタン300m11及びメチル
ジクロロシラン24.3g(0,211mol)を入れ
、氷冷した。撹拌しながら、水酸化ナトリウム管及び活
性炭管を通して精製したアンモニア18.1g(1,0
6mol)を吹き込んだ。After purging the inside of the reactor with deoxygenated dry nitrogen, 300 ml of dry dichloromethane and 24.3 g (0,211 mol) of methyldichlorosilane were placed in a four-bottle flask and cooled on ice. While stirring, 18.1 g of purified ammonia (1,0
6 mol) was injected.
反応終了後、反応混合物を遠心分離し、乾燥ジクロロメ
タンを用いて洗浄後、更に窒素雰囲気下でろ過した。ろ
液から溶媒を減圧留去すると無色透明のメチル(ヒドロ
)シラザンを8.81g得た。この生成物の数平均分子
量はGPCにより測定したところ、380であった。After the reaction was completed, the reaction mixture was centrifuged, washed with dry dichloromethane, and further filtered under a nitrogen atmosphere. The solvent was distilled off from the filtrate under reduced pressure to obtain 8.81 g of colorless and transparent methyl (hydro)silazane. The number average molecular weight of this product was 380 as measured by GPC.
参考例4
参考例1で得られたベルヒドロ余りシラザンのピリジン
溶液(ベルヒドロポリシラザンの濃度:5゜25重量%
)120m12を、内容積300IIII2の耐圧反応
容器に入れ、アルミニウムトリイソプロポキシド13.
Og(0、0636moQ)を加え、密閉系で120℃
で3時間撹拌しながら反応を行なった。反応終了後、反
応混合物をろ過し、ろ液としてポリアルミノシラザンを
得た。Reference Example 4 A pyridine solution of the perhydropolysilazane obtained in Reference Example 1 (concentration of perhydropolysilazane: 5°25% by weight)
) was placed in a pressure-resistant reaction vessel with an internal volume of 300III2, and aluminum triisopropoxide 13.
Add Og (0,0636moQ) and heat at 120℃ in a closed system.
The reaction was carried out with stirring for 3 hours. After the reaction was completed, the reaction mixture was filtered to obtain polyaluminosilazane as a filtrate.
実施例1
内容積IQの四つロフラスコに、ガス吹き込み管、メカ
ニカルスターラ、ジュワーコンデンサーを装置した。反
応器内部を脱酸素した乾燥窒素で置換した後、トリメチ
ルホスファイト410m12 (3,50+++oΩ)
を四つロフラスコに入れ、参考例1で得られたベルヒド
ロポリシラザンのピリジン溶液(ベルヒドロポリシラザ
ンの濃度=5.0重量%)300−を加え、窒素気流下
で80℃で3時間撹拌しながら反応を行なった。反応終
了後、溶媒を0−キシレンに置換した後、反応混合物を
遠心分離し、ろ過してろ液を得た。ろ液の溶媒を圧力1
0mmHg、温度40℃で減圧留去したところ、溶媒再
可溶性の無い茶色粉末が得られた。Example 1 A four-loop flask with an internal volume of IQ was equipped with a gas blowing pipe, a mechanical stirrer, and a dewar condenser. After purging the inside of the reactor with deoxygenated dry nitrogen, 410 m12 of trimethyl phosphite (3,50+++oΩ) was added.
were placed in a flask, 300% of the pyridine solution of perhydropolysilazane obtained in Reference Example 1 (concentration of perhydropolysilazane = 5.0% by weight) was added, and the mixture was stirred at 80°C for 3 hours under a nitrogen stream. The reaction was carried out. After the reaction was completed, the solvent was replaced with 0-xylene, and the reaction mixture was centrifuged and filtered to obtain a filtrate. The solvent in the filtrate is heated to a pressure of 1
When the residue was distilled off under reduced pressure at 0 mmHg and a temperature of 40°C, a brown powder with no solvent resolubility was obtained.
反応生成物の数平均分子量はGPCで測定したところ、
1515であった。そのIRスペクトルを分析したとこ
ろ、波数3400cm−”、1200cm−1にN)I
に基づく吸収、2200cm−’にSiHに基づく吸収
、1020〜820cm−’にSi)I及びNSiNに
基づく吸収、2950cm−”、2850c++−”、
1460cm−1にC1(に基づく吸収、108108
O”にSiOに基づく吸収が観測された。The number average molecular weight of the reaction product was measured by GPC.
It was 1515. When we analyzed its IR spectrum, we found that the wave number was 3400cm-'' and 1200cm-1.
absorption based on SiH at 2200 cm-', absorption based on Si) I and NSiN from 1020 to 820 cm-', 2950 cm-'', 2850c++-'',
Absorption based on C1 at 1460 cm-1, 108108
Absorption based on SiO was observed in O''.
上記反応生成物をアンモニア中で1000℃まで昇温速
度3℃/分で加熱し、熱分解することで、茶灰色の固体
を77.1重量%の収率で得た。この固体の元素分析の
値は、重量基準で、Si;44.2%、N;21.1%
、O;28.5%八へ;3.43%であった。The above reaction product was heated in ammonia to 1000° C. at a heating rate of 3° C./min and thermally decomposed to obtain a brownish-gray solid at a yield of 77.1% by weight. The values of elemental analysis of this solid are, on a weight basis, Si: 44.2%, N: 21.1%
, O; 28.5%, O; 3.43%.
実施例2
実施例1で得られたポリホスホシラザンの0−キシレン
溶液(ポリホスホシラザンの濃度5.0重量%)をスピ
ンコータによって窒素雰囲気下でシリコン基板にコーテ
ィングした。このコーティング薄膜を窒素中で800℃
まで昇温速度3℃7分で加熱し、透明なSi−N−P系
セラミックス薄膜を得た。Example 2 The 0-xylene solution of polyphosphosilazane obtained in Example 1 (polyphosphosilazane concentration: 5.0% by weight) was coated on a silicon substrate in a nitrogen atmosphere using a spin coater. This coating thin film was heated to 800°C in nitrogen.
A transparent Si--N--P ceramic thin film was obtained by heating at a heating rate of 3° C. for 7 minutes.
このセラミックス薄膜の膜厚及び屈折率をエリプソメー
タにて測定したところ、膜厚958人、屈折率1.9で
あった。When the thickness and refractive index of this ceramic thin film were measured using an ellipsometer, the film thickness was 958 mm and the refractive index was 1.9.
実施例3
内容積1001II2の四つロフラスコにガス吹き込み
管、メカニカルスターラー、ジュワーコンデンサーを装
置した。反応器内部を脱酸素した乾燥窒素で置換した後
、参考例1で得られたベルヒドロポリシラザンの0−キ
シレン溶液(ベルヒドロポリシラザンの濃度=5.0重
量%)10−を四つロフラスコに入れ、さらにヘキサメ
チルホスホラストリアミド2d (0,01moQ)を
加えて、窒素気流下80℃で3時間撹拌しながら反応を
行なった。室温に冷却後、反応生成物の溶媒を圧力10
+imHg、温度40℃で減圧留去したところ、茶色粉
末が得られた。Example 3 A four-loop flask with an internal volume of 1001II2 was equipped with a gas blowing tube, a mechanical stirrer, and a dewar condenser. After purging the inside of the reactor with deoxidized dry nitrogen, four 0-xylene solutions of perhydropolysilazane obtained in Reference Example 1 (concentration of perhydropolysilazane = 5.0% by weight) 10- were placed in a flask. Further, hexamethylphosphorustriamide 2d (0.01 moQ) was added, and the reaction was carried out with stirring at 80° C. for 3 hours under a nitrogen stream. After cooling to room temperature, the solvent of the reaction product was reduced to a pressure of 10
When the residue was distilled off under reduced pressure at +imHg and a temperature of 40°C, a brown powder was obtained.
反応生成物の数平均分子量はGPCで測定したところ、
2304であった。そのIRスペクトルを分析したとこ
ろ、波数3400cm−”、1200cm−’にNHに
基づく吸収、 2200cm−”にSiHに基づく吸収
、1020−850co+−1にSiH及びNSiNに
基づく吸収、2900cm−1,2800cm−1,1
480cm−”、 1460cm−1にCHに基づく吸
収、1080c+o−1にCNに基づく吸収が観測され
た。さらにその”HNNHスペクトル(CDCQ、、T
MS内部基準)を分析したところ、64.7ppm+(
br、SiH2)、δ4,3ppm(br。The number average molecular weight of the reaction product was measured by GPC.
It was 2304. Analysis of the IR spectrum revealed that the wave number was 3400cm-'', absorption based on NH at 1200cm-', absorption based on SiH at 2200cm-'', absorption based on SiH and NSiN at 1020-850co+-1, and absorption based on SiH and NSiN at 2900cm-1 and 2800cm-1. 1,1
480cm-", absorption based on CH at 1460cm-1, and absorption based on CN at 1080c+o-1. Furthermore, the "HNNH spectrum (CDCQ, T
MS internal standard) was analyzed and found to be 64.7 ppm+(
br, SiH2), δ4,3ppm (br.
5L)13 )、δ2.7ppm、δ2.5ppm(C
H,N)、1.3ppm(br。5L)13), δ2.7ppm, δ2.5ppm (C
H, N), 1.3 ppm (br.
NH)の吸収が観測された。Absorption of NH) was observed.
この反応生成物をアンモニア中で1000℃まで昇温速
度3℃/分で加熱し、熱分解することで、黒色固体を9
2.6重量%の収率で得た。得られたセラックスの元素
分析の値は重量基準で、Si;58%、 N;24゜4
%、 C;4.3%、0;9.22%、P;4%であっ
た。This reaction product is heated to 1000°C in ammonia at a temperature increase rate of 3°C/min to thermally decompose the black solid to 9
Obtained with a yield of 2.6% by weight. The values of elemental analysis of the obtained selacs are based on weight: Si: 58%, N: 24°4
%, C: 4.3%, 0: 9.22%, P: 4%.
また、この反応生成物の0−キシレン溶液(ポリホスホ
シラザンの濃度5.0重量%)を実施例2と同様にスピ
ンコータでシリコン基板にコーティングし、800℃ま
で昇温速度3℃/分で加熱したところ、得られたセラミ
ックス薄膜の膜厚は940人、屈折率は1.8であった
。In addition, a 0-xylene solution of this reaction product (polyphosphosilazane concentration: 5.0% by weight) was coated on a silicon substrate using a spin coater in the same manner as in Example 2, and heated to 800°C at a heating rate of 3°C/min. As a result, the thickness of the obtained ceramic thin film was 940 mm, and the refractive index was 1.8.
実施例4
内容積200−の四つロフラスコに、ガス吹きこみ管、
メカニカルスターラ、ジュワーコンデンサーを装置した
。反応器内部を脱酸素した乾燥窒素で置換した後、参考
例1で得られたベルヒドロポリシラザンのピリジン溶液
(ベルヒドロポリシラザン)の濃度;5.0重量%)3
0dを四つロフラスコに入れ、ホスホニトリツククロラ
イドトリマーのピリジン溶液(ホスホニトリツククロラ
イドトリマーの濃度:3.70重量%)21.7nmを
加え、窒素気流下、室温で25時間撹拌しながら反応を
行った。反応終了後、溶媒を0−キシレンに置換した後
ろ過し、ろ液を得た。Example 4 A four-bottle flask with an internal volume of 200 cm was equipped with a gas blowing pipe,
Equipped with mechanical stirrer and dewar condenser. After replacing the inside of the reactor with deoxygenated dry nitrogen, the concentration of the pyridine solution of perhydropolysilazane (perhydropolysilazane) obtained in Reference Example 1: 5.0% by weight)3
0d was placed in a flask, 21.7 nm of a pyridine solution of phosphonitric chloride trimer (concentration of phosphonitric chloride trimer: 3.70% by weight) was added, and the reaction was stirred at room temperature for 25 hours under a nitrogen stream. went. After the reaction was completed, the solvent was replaced with 0-xylene and filtered to obtain a filtrate.
ろ液中のポリホスホシラザンの数平均分子量をGPCで
測定したところ1299であった。そのホスホシラザン
のIRスペクトルを分析したところ、波数3400cm
−”、1200cl−’にN)Iに基づく吸収、220
0cmSiHに基づく吸収、102102O−820”
にSiH及びNSiNに基づく吸収、1220cm−1
にPNに基づく吸収が観測された。The number average molecular weight of polyphosphosilazane in the filtrate was measured by GPC and found to be 1299. When the IR spectrum of the phosphosilazane was analyzed, the wave number was 3400 cm.
-'', 1200cl-' absorption based on N) I, 220
Absorption based on 0 cm SiH, 102102O-820”
Absorption based on SiH and NSiN, 1220 cm
Absorption based on PN was observed.
実施例5
実施例4で得られたポリホスホシラザンの0−キシレン
溶液(ポリホスホシラザンの濃度、10重量%)をデイ
ツプコートによってガラス基板にコーティングした。こ
のコーティング薄膜を窒素中で200℃まで昇温速度3
℃/分で加熱し、透明なSi−N−P膜を得た。Example 5 The 0-xylene solution of polyphosphosilazane obtained in Example 4 (concentration of polyphosphosilazane: 10% by weight) was coated on a glass substrate by dip coating. This coated thin film was heated to 200℃ in nitrogen at a rate of 3.
Heating was performed at a rate of °C/min to obtain a transparent Si-N-P film.
このセラミックス薄膜の膜厚及び屈折率は5600人及
び1.6であった。The thickness and refractive index of this ceramic thin film were 5600 and 1.6.
実施例6
内容積100−の四つロフラスコに実施例1と同様に装
置して反応器内部を乾燥窒素で置換した。参考例2で得
られたN−メチルポリシラザンのγ−ピコリン溶液(N
−メチルポリシラザンの濃度10.0重量%)30dを
四つロフラスコに入れ、さらにトリメチルホスファイト
1.2+all(0,01mon)を加えて窒素気流下
80℃で3時間撹拌しながら、反応を行った。生成した
茶褐色の沈殿を遠心分離し、さらに上溝をろ過し、ろ液
の溶媒を実施例1と同様に減圧留去したところ、濃茶褐
色のゴム状固体が得られた。Example 6 A four-bottle flask with an internal volume of 100 mm was equipped in the same manner as in Example 1, and the inside of the reactor was purged with dry nitrogen. A γ-picoline solution of N-methylpolysilazane obtained in Reference Example 2 (N
- Four 30 d of methylpolysilazane (concentration 10.0% by weight) were placed in a Lough flask, and 1.2+all (0.01 mon) of trimethyl phosphite was added, and the reaction was carried out with stirring at 80°C for 3 hours under a nitrogen stream. . The produced brown precipitate was centrifuged, the upper channel was filtered, and the solvent of the filtrate was distilled off under reduced pressure in the same manner as in Example 1, to obtain a dark brown rubbery solid.
また、この反応生成物のγ−ピコリン溶液(ポリホスホ
シラザンの濃度5.0重量幻を実施例2と同様にスピン
コータでシリコン基板にコーティングし、800℃まで
昇温速度3℃/分で加熱したところ、得られたセラミッ
クス薄膜の膜厚は876人、屈折率1゜8であった。In addition, a γ-picoline solution of this reaction product (polyphosphosilazane with a concentration of 5.0% by weight) was coated on a silicon substrate using a spin coater in the same manner as in Example 2, and heated to 800°C at a heating rate of 3°C/min. The thickness of the obtained ceramic thin film was 876 mm, and the refractive index was 1.8.
実施例7
参考例3で得られたメチルヒドロポリシラザンの0−キ
シレン溶液(メチルヒドロポリシラザンの濃度6.0重
量%)100−を内容積300m1llの耐圧反応容器
に入れ、五塩化リン4.2g(0,02mo12)を加
えて密閉系で120℃で3時間撹拌しながら反応を行な
った。Example 7 100 - of the 0-xylene solution of methylhydropolysilazane obtained in Reference Example 3 (concentration of methylhydropolysilazane 6.0% by weight) was placed in a pressure-resistant reaction vessel with an internal volume of 300ml, and 4.2g of phosphorus pentachloride ( 0.02mol12) was added thereto, and the reaction was carried out in a closed system at 120°C with stirring for 3 hours.
白色沈殿をろ別し、ろ液の溶媒を実施例1と同様に減圧
留去したところ、無色透明なゴム状固体が4.8g得ら
れた。The white precipitate was filtered off, and the solvent of the filtrate was distilled off under reduced pressure in the same manner as in Example 1, to obtain 4.8 g of a colorless and transparent rubbery solid.
実施例8
実施例7で得られたポリホスホシラザンの0−キシレン
溶液(ポリホスホシラザンの濃度10重量%)を、はけ
塗りによって窒素雰囲気下でシリコン基板にコーティン
グした。このコーティング薄膜を窒素中で800℃まで
昇温速度30℃/分で加熱し、透明なSi−N−P薄膜
を得た。このセラミックス薄膜の膜厚及び屈折率は95
00人及び1.8であった。Example 8 The 0-xylene solution of polyphosphosilazane obtained in Example 7 (concentration of polyphosphosilazane 10% by weight) was coated on a silicon substrate by brushing under a nitrogen atmosphere. This coated thin film was heated in nitrogen to 800°C at a heating rate of 30°C/min to obtain a transparent Si-N-P thin film. The thickness and refractive index of this ceramic thin film are 95
00 people and 1.8.
実施例9
内容積100dの四つロフラスコに実施例1と同様に装
置して1反応器内部を乾燥窒素で置換した。Example 9 A four-hole flask having an internal volume of 100 d was equipped in the same manner as in Example 1, and the inside of one reactor was purged with dry nitrogen.
参考例4で得られたポリアルミノシラザンの0−キシレ
ン溶液(ポリアルミノシラザンの濃度5.0重量%)4
0−を四つロフラスコに入れ、さらにヘキサメチルホス
ホラストリアミド4.0Ilil!(0,02moΩ)
を加えて窒素気流下80℃で3時間撹拌しながら反応を
行った。反応生成物をろ過し、得られたろ液の溶媒を実
施例1と同様に減圧留去したところ、黄色固体1.5g
が得られた。0-xylene solution of polyaluminosilazane obtained in Reference Example 4 (concentration of polyaluminosilazane 5.0% by weight) 4
0- into a flask, and then add 4.0 Ilil of hexamethylphosphorustriamide! (0.02moΩ)
was added, and the reaction was carried out with stirring at 80° C. for 3 hours under a nitrogen stream. When the reaction product was filtered and the solvent of the obtained filtrate was distilled off under reduced pressure in the same manner as in Example 1, 1.5 g of yellow solid was obtained.
was gotten.
この反応生成物の0−キシレン溶液(ポリホスホアルミ
ノシラザンの濃度5.0重量%)を実施例2と同様にス
ピンコータにてシリコン基板にコーティングし、800
℃まで昇温速度3℃/分で加熱したところ得られたセラ
ミックス薄膜の膜厚は960人、屈折率は1.8であっ
た。An 0-xylene solution of this reaction product (polyphosphoaluminosilazane concentration: 5.0% by weight) was coated on a silicon substrate using a spin coater in the same manner as in Example 2.
When heated to a temperature of 3° C./min, the resulting ceramic thin film had a thickness of 960 mm and a refractive index of 1.8.
比較例1 参考例Iで得られたベルヒドロポリシラザンの。Comparative example 1 of the perhydropolysilazane obtained in Reference Example I.
−キシレン溶液(ベルヒドロポリシラザンの濃度;5゜
0重量%)をスピンコータによって窒素雰囲気下でシリ
コン基板にコーティングした。このコーテイング膜を窒
素中でgoo℃まで昇温速度3℃/分で加熱し、透明な
窒化珪素薄膜を得た。このセラミックス薄膜の膜厚及び
屈折率をエリプンメータにて測定したところ、膜厚91
0人、屈折率1.6であった。- A xylene solution (concentration of perhydropolysilazane: 5.0% by weight) was coated on a silicon substrate using a spin coater under a nitrogen atmosphere. This coating film was heated in nitrogen at a heating rate of 3°C/min to goo°C to obtain a transparent silicon nitride thin film. When the film thickness and refractive index of this ceramic thin film were measured using an ellipse meter, the film thickness was 91.
0 people, and the refractive index was 1.6.
比較例2 参考例1で得られたベルヒドロポリシラザンの。Comparative example 2 of perhydropolysilazane obtained in Reference Example 1.
−キシレン溶液(ベルヒドロポリシラザンの濃度:l0
00重量%)をデイツプコートによってガラス基板にコ
ーティングした。このコーティング薄膜を窒素中で20
0℃まで昇温速度3℃/分で加熱し、透明な窒化珪素薄
膜を得た、このセラミックス薄膜の膜厚及び屈折率はそ
れぞれ6100人及び1.3であった。-Xylene solution (concentration of perhydropolysilazane: 10
00% by weight) was coated on a glass substrate by dip coating. This coated thin film was coated in nitrogen for 20 minutes.
A transparent silicon nitride thin film was obtained by heating to 0° C. at a heating rate of 3° C./min. The thickness and refractive index of this ceramic thin film were 6100 and 1.3, respectively.
比較例2
参考例3で得られたメチルヒドロポリシラザンの0−キ
シレン溶液(メチルヒドロポリシラザンの濃度;6.0
重量%)をはけ塗りによって窒素雰囲気下でシリコン基
板にコーティングした。このコーティング薄膜を窒素中
で800℃まで昇温速度3℃/分で加熱し、透明な窒化
珪素薄膜を得た。このセラミックス薄膜の膜厚及び屈折
率は9130人及び1.6であった。Comparative Example 2 0-xylene solution of methylhydropolysilazane obtained in Reference Example 3 (concentration of methylhydropolysilazane: 6.0
% by weight) was coated onto a silicon substrate by brushing under a nitrogen atmosphere. This coated thin film was heated in nitrogen to 800° C. at a heating rate of 3° C./min to obtain a transparent silicon nitride thin film. The thickness and refractive index of this ceramic thin film were 9130 and 1.6.
Claims (5)
v)で表わされる架橋結合の少なくとも一種を含有し、
リン/ケイ素原子比が0.01〜5の範囲内にありかつ
数平均分子量が約200〜500,000のポリホスホ
シラザン。 (i)▲数式、化学式、表等があります▼;(ii)▲
数式、化学式、表等があります▼; (iii)▲数式、化学式、表等があります▼;(iV
)▲数式、化学式、表等があります▼ (式中、R^6は水素原子、ハロゲン原子、炭素原子数
1〜20個を有するアルキル基、アルケニル基、シクロ
アルキル基、アリール基、アルコキシ基、アルキルアミ
ノ基、水酸基又はアミノ基であり、R^7はR^6のう
ち窒素原子を有する基の窒素原子に結合している残基で
ある)(1) In polysilazane, the following general formulas (i) to (i
v) contains at least one type of crosslinking bond represented by
A polyphosphosilazane having a phosphorus/silicon atomic ratio in the range of 0.01 to 5 and a number average molecular weight of about 200 to 500,000. (i)▲There are mathematical formulas, chemical formulas, tables, etc.▼; (ii)▲
There are mathematical formulas, chemical formulas, tables, etc. ▼; (iii) ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼; (iV
) ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ (In the formula, R^6 is a hydrogen atom, a halogen atom, an alkyl group having 1 to 20 carbon atoms, an alkenyl group, a cycloalkyl group, an aryl group, an alkoxy group, It is an alkylamino group, hydroxyl group, or amino group, and R^7 is a residue bonded to the nitrogen atom of a group having a nitrogen atom among R^6)
を有する数平均分子量が約100〜50,000のポリ
シラザンと、下記一般式( I )〜(V)で表わされる
リン化合物を反応させて、リン/ケイ素原子比が0.0
1〜5の範囲内にあり、かつ数平均分子量が200〜5
00,000であるポリホスホシラザンを得ることを特
徴とするポリホスホシラザンの製造方法。 ( I )P(R^4)_3 (II)((R^4)_2PN)_n (III)P(R^4)_5 (IV)P_2O_5 (V)OP(R^4)_3 (これらの式中、R^4は同一でも異なっていてもよく
、水素原子、ハロゲン原子、炭素原子数1〜20個を有
するアルキル基、アルケニル基、シクロアルキル基、ア
リール基、アルコキシ基、アルキルアミノ基、水酸基又
はアミノ基であり、nは2以上の整数である)(2) A polysilazane having at least a SiH bond or a SiNH bond in the molecule and having a number average molecular weight of about 100 to 50,000 is reacted with a phosphorus compound represented by the following general formulas (I) to (V) to produce phosphorus/ Silicon atomic ratio is 0.0
within the range of 1 to 5, and the number average molecular weight is 200 to 5
A method for producing polyphosphosilazane, characterized by obtaining polyphosphosilazane having a molecular weight of 0.00,000. (I)P(R^4)_3 (II)((R^4)_2PN)_n (III)P(R^4)_5 (IV)P_2O_5 (V)OP(R^4)_3 (These formulas In the formula, R^4 may be the same or different, and is a hydrogen atom, a halogen atom, an alkyl group having 1 to 20 carbon atoms, an alkenyl group, a cycloalkyl group, an aryl group, an alkoxy group, an alkylamino group, a hydroxyl group. or an amino group, n is an integer of 2 or more)
式、化学式、表等があります▼ (VI) (式中、R^1,R^2,R^3は水素原子、アルキル
基、アルケニル基、シクロアルキル基、アリール基又は
これらの基以外でケイ素に直結する基が炭素である基、
アルキルシリル基、アルキルアミノ基、アルコキシ基を
表わすが、R^1,R^2,R^3の少なくとも1個は
水素原子である) で表わされる単位からなる主骨格を有する数平均分子量
が約100〜50,000のポリシラザンである請求項
2の方法。(3) The polysilazane mainly has the general formula (VI): ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ (VI) (In the formula, R^1, R^2, R^3 are hydrogen atoms, alkyl groups, alkenyl group, cycloalkyl group, aryl group, or a group other than these groups in which the group directly bonded to silicon is carbon,
It represents an alkylsilyl group, an alkylamino group, or an alkoxy group, in which at least one of R^1, R^2, and R^3 is a hydrogen atom) and has a number average molecular weight of approximately 3. The method of claim 2, wherein the polysilazane has a molecular weight of 100 to 50,000.
/ケイ素原子比が0.01〜5の範囲にあるセラミック
スであって、該セラミックスは式Si−0−P、Si−
P又はP−Nで表わされる結合を有することを特徴とす
るリン含有セラミックス。(4) Ceramics containing at least silicon, nitrogen and phosphorus and having a phosphorus/silicon atomic ratio in the range of 0.01 to 5, the ceramics having the formula Si-0-P, Si-
A phosphorus-containing ceramic characterized by having a bond represented by P or PN.
を有する透明薄膜である請求項3のリン含有セラミック
ス。(5) The phosphorus-containing ceramic according to claim 3, wherein the ceramic is a transparent thin film having a refractive index of at least 1.6.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP02292458A JP3114989B2 (en) | 1990-10-30 | 1990-10-30 | Polyphosphosilazane, method for producing the same, and phosphorus atom-containing ceramics |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP02292458A JP3114989B2 (en) | 1990-10-30 | 1990-10-30 | Polyphosphosilazane, method for producing the same, and phosphorus atom-containing ceramics |
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| Publication Number | Publication Date |
|---|---|
| JPH04164923A true JPH04164923A (en) | 1992-06-10 |
| JP3114989B2 JP3114989B2 (en) | 2000-12-04 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP02292458A Expired - Lifetime JP3114989B2 (en) | 1990-10-30 | 1990-10-30 | Polyphosphosilazane, method for producing the same, and phosphorus atom-containing ceramics |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3114989B2 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5459114A (en) * | 1992-11-26 | 1995-10-17 | Tonen Corporation | Method for producing ceramic products |
| WO2005007748A1 (en) | 2003-07-18 | 2005-01-27 | Az Electronic Materials (Japan) K.K. | Phosphorus-containing silazane composition, phosphorus-containing siliceous film, phosphorus-containing siliceous filler, method for producing phosphorus-containing siliceous film, and semiconductor device |
| JP2005350304A (en) * | 2004-06-10 | 2005-12-22 | Az Electronic Materials Kk | Silazane compound having hexahedral structure, method for producing the same, and coating composition using the same |
| CN109485853A (en) * | 2017-09-11 | 2019-03-19 | 中国科学院化学研究所 | A kind of polysiloxanes/Perhydropolysilazane hybridized polymer and its synthetic method |
-
1990
- 1990-10-30 JP JP02292458A patent/JP3114989B2/en not_active Expired - Lifetime
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5459114A (en) * | 1992-11-26 | 1995-10-17 | Tonen Corporation | Method for producing ceramic products |
| WO2005007748A1 (en) | 2003-07-18 | 2005-01-27 | Az Electronic Materials (Japan) K.K. | Phosphorus-containing silazane composition, phosphorus-containing siliceous film, phosphorus-containing siliceous filler, method for producing phosphorus-containing siliceous film, and semiconductor device |
| JPWO2005007748A1 (en) * | 2003-07-18 | 2006-11-30 | Azエレクトロニックマテリアルズ株式会社 | Phosphorus-containing silazane composition, phosphorus-containing siliceous film, phosphorus-containing siliceous filler, method for producing phosphorus-containing siliceous film, and semiconductor device |
| US7368491B2 (en) * | 2003-07-18 | 2008-05-06 | Az Electronic Materials Usa Corp. | Phosphorus-containing silazane composition, phosphorus-containing siliceous film, phosphorus-containing siliceous filler, method for producing phosphorus-containing siliceous film, and semiconductor device |
| JP4920252B2 (en) * | 2003-07-18 | 2012-04-18 | Azエレクトロニックマテリアルズ株式会社 | Phosphorus-containing silazane composition, phosphorus-containing siliceous film, phosphorus-containing siliceous filler, method for producing phosphorus-containing siliceous film, and semiconductor device |
| JP2005350304A (en) * | 2004-06-10 | 2005-12-22 | Az Electronic Materials Kk | Silazane compound having hexahedral structure, method for producing the same, and coating composition using the same |
| CN109485853A (en) * | 2017-09-11 | 2019-03-19 | 中国科学院化学研究所 | A kind of polysiloxanes/Perhydropolysilazane hybridized polymer and its synthetic method |
| CN109485853B (en) * | 2017-09-11 | 2020-09-08 | 中国科学院化学研究所 | Polysiloxane/perhydropolysilazane hybrid polymer and synthetic method thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3114989B2 (en) | 2000-12-04 |
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