JPH04161341A - Manufacture of ink jet recording head - Google Patents
Manufacture of ink jet recording headInfo
- Publication number
- JPH04161341A JPH04161341A JP28804490A JP28804490A JPH04161341A JP H04161341 A JPH04161341 A JP H04161341A JP 28804490 A JP28804490 A JP 28804490A JP 28804490 A JP28804490 A JP 28804490A JP H04161341 A JPH04161341 A JP H04161341A
- Authority
- JP
- Japan
- Prior art keywords
- base plate
- substrate
- resin layer
- thermal curing
- substrates
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 7
- 239000011347 resin Substances 0.000 claims abstract description 30
- 229920005989 resin Polymers 0.000 claims abstract description 30
- 238000000034 method Methods 0.000 claims abstract description 14
- 238000001029 thermal curing Methods 0.000 claims abstract description 5
- 239000000758 substrate Substances 0.000 claims description 54
- 229920001187 thermosetting polymer Polymers 0.000 claims description 24
- 238000010304 firing Methods 0.000 claims description 3
- 238000001723 curing Methods 0.000 claims description 2
- 239000010410 layer Substances 0.000 abstract description 24
- 229920001721 polyimide Polymers 0.000 abstract description 11
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract description 10
- 229910052710 silicon Inorganic materials 0.000 abstract description 10
- 239000010703 silicon Substances 0.000 abstract description 10
- 239000009719 polyimide resin Substances 0.000 abstract description 9
- 239000012790 adhesive layer Substances 0.000 abstract description 5
- 238000000059 patterning Methods 0.000 abstract description 4
- 239000011241 protective layer Substances 0.000 abstract description 2
- 238000003491 array Methods 0.000 abstract 1
- 229920005992 thermoplastic resin Polymers 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 description 8
- 239000010408 film Substances 0.000 description 7
- 239000000853 adhesive Substances 0.000 description 5
- 230000001070 adhesive effect Effects 0.000 description 5
- 230000008961 swelling Effects 0.000 description 5
- 238000013007 heat curing Methods 0.000 description 3
- 238000009413 insulation Methods 0.000 description 3
- 239000004642 Polyimide Substances 0.000 description 2
- 230000008602 contraction Effects 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- RCJVRSBWZCNNQT-UHFFFAOYSA-N dichloridooxygen Chemical compound ClOCl RCJVRSBWZCNNQT-UHFFFAOYSA-N 0.000 description 2
- 235000010724 Wisteria floribunda Nutrition 0.000 description 1
- 239000002318 adhesion promoter Substances 0.000 description 1
- 239000012752 auxiliary agent Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical compound [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Landscapes
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明はインクジェット記録ヘッドの製造方法に関し、
特に2枚の基板を接合しこれら2枚の基板間の熱硬化型
樹脂層をインク流路として形成するものに関する。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a method for manufacturing an inkjet recording head,
In particular, it relates to a device in which two substrates are bonded together and a thermosetting resin layer between these two substrates is formed as an ink flow path.
(従来の技術)
従来、インクジェット記録ヘッドの製造方法としては、
特開昭61−230954号公報、特開昭62−336
48号公報、特開昭63−34152号公報に示される
ように、複数のヘッドの発熱体、配線電極と厚膜絶縁層
が形成された第一の基板と、この第一の基板と同数のヘ
ッドのインク流路を形成した第二の基板とを位置合わせ
て接着した後、各ヘッドに切断分離する方法がある。(Prior Art) Conventionally, the method of manufacturing an inkjet recording head is as follows:
JP-A-61-230954, JP-A-62-336
As shown in Publication No. 48 and Japanese Patent Laid-open Publication No. 63-34152, a first substrate on which heating elements, wiring electrodes, and thick film insulation layers of a plurality of heads are formed, and the same number of substrates as the first substrate, There is a method in which the heads are aligned and bonded to a second substrate on which an ink flow path is formed, and then the heads are cut and separated into individual heads.
しかし第6図に示すように、厚膜絶縁層の熱硬化型樹脂
パターン2は硬化時の熱収縮により端部に盛り上がり1
2が発生し、2枚の基板間にすき間を生じ均一な密着が
困難であった。However, as shown in FIG. 6, the thermosetting resin pattern 2 of the thick film insulation layer swells at the end due to thermal contraction during curing.
2 occurred, and a gap was created between the two substrates, making it difficult to achieve uniform adhesion.
熱硬化型樹脂として例えば感光性ポリイミド樹脂を使用
した場合通常400°Cで熱硬化することでイミド化率
がほぼ100%に達するが、熱硬化時の変形盛り上がり
を少なくするため例えば200°Cで熱硬化するとイミ
ド化率は85%程度に留まり、絶縁性、熱的安定性、化
学的安定性で問題がある。For example, when photosensitive polyimide resin is used as a thermosetting resin, the imidization rate reaches almost 100% by thermosetting at 400°C, but in order to reduce deformation and swelling during thermosetting, it is When thermally cured, the imidization rate remains at about 85%, and there are problems with insulation, thermal stability, and chemical stability.
また、接着不良を防ぐため熱硬化型樹脂層上の接着剤を
多量に使用すると、第7図13に示すように、2枚の基
板を接着したとき接着剤がはみ出し、インク流路部14
にまわり込みインク滴の吐出量が変化してしまう。Furthermore, if a large amount of adhesive is used on the thermosetting resin layer to prevent poor adhesion, the adhesive will bulge out when two substrates are bonded together, as shown in FIG.
The amount of ink droplets ejected changes as the ink droplets wrap around the ink droplets.
(発明が解決しようとする課題)
本発明はこれら2枚の基板間の熱硬化型樹脂層をインク
流路として形成するものにおいて、熱硬化型樹脂層パタ
ーン端部の盛り上がりによる密着不良を解決するための
新規な製造方法を提案するものである。(Problems to be Solved by the Invention) The present invention solves the problem of poor adhesion due to swelling at the edges of the thermosetting resin layer pattern in a device in which the thermosetting resin layer between these two substrates is formed as an ink flow path. We propose a new manufacturing method for this purpose.
(課題を解決するための手段)
本発明は熱硬化型樹脂を用いインク流路を形成するイン
クジェット記録ヘッドの製造方法において、第1の基板
上に熱硬化型樹脂層をインク流路状に形成した後プリベ
ークする第1の工程と、第2の基板上に熱硬化型樹脂の
薄層を形成する第2の工程と、前記第1と第2の工程を
行った前記第1の基板と第2の基板とを焼成し熱硬化さ
せることなく熱硬化型樹脂層を互いに対向させるように
接合する第3の工程と、前記第3の工程の後前記第1の
基板と第2の基板上の熱硬化型樹脂を焼成し熱硬化させ
る第4の工程とからなることを特徴とするインクジェッ
ト記録ヘッドの製造方法。基板上に熱硬化型樹脂層パタ
ーンを形成した後、熱硬化する前に基板同士を接合し、
しかる後、熱硬化するものである。(Means for Solving the Problems) The present invention provides a method for manufacturing an inkjet recording head in which an ink channel is formed using a thermosetting resin, in which a thermosetting resin layer is formed in the shape of an ink channel on a first substrate. a first step of pre-baking after the first step; a second step of forming a thin layer of thermosetting resin on the second substrate; a third step of bonding the thermosetting resin layers so as to face each other without firing and thermosetting the second substrate; and after the third step, bonding the first substrate and the second substrate. A method for manufacturing an inkjet recording head, comprising a fourth step of firing and thermosetting a thermosetting resin. After forming a thermosetting resin layer pattern on the substrate, the substrates are bonded together before thermosetting.
After that, it is thermally cured.
(作用)
本発明によれば、基板同士の接合はパターン端部の盛り
上がりの生じる熱硬化する前におこなわれるため、基板
同士を接合してもすきまを生じない。(Function) According to the present invention, since the substrates are bonded to each other before thermal curing that causes swelling at the end of the pattern, no gap is created even when the substrates are bonded to each other.
またパターン端部は接合した基板にすきまなく直接接し
ているため熱硬化しても盛り上がりが抑えられ、基板同
士が剥がれることはない。Furthermore, since the pattern ends are in direct contact with the bonded substrates without any gaps, swelling is suppressed even when the pattern is cured by heat, and the substrates do not separate from each other.
以下、実施例によって本発明について説明する。The present invention will be explained below with reference to Examples.
(実施例1)
第1図aに示す第1の基板であるシリコン基板1には第
1図すに示す発熱抵抗体アレイ4、配線電極5、図示し
ない保護層が複数のヘッド分設けられている。保護層の
感光性ポリイミド樹脂(例えばCHIBA−GEIGY
社製5electilux HTR−3−200)は発
熱抵抗体、配線電極を設けた基板1上にスピンコードし
、100’Cで20分間プリベークした後発熱抵抗体部
に相当する開口部3とチップ外部との配線部を除去する
ためバターニング露光、現像を行う。(Example 1) A silicon substrate 1, which is a first substrate shown in FIG. There is. Protective layer photosensitive polyimide resin (e.g. CHIBA-GEIGY
5electilux HTR-3-200) is spin-coded onto a substrate 1 provided with a heating resistor and wiring electrodes, and after prebaking at 100'C for 20 minutes, an opening 3 corresponding to the heating resistor part and the outside of the chip are coated. In order to remove the wiring part, patterning exposure and development are performed.
この段階では熱硬化後に見られるパターン周囲の盛り上
がりは生じていない
一方、第2図aおよび第2図すに示すように、ノズル部
を形成するための第2基板であるシリコン基板6には第
1の基板に対応して溝部7、インクリザーバ一部8が形
成され、溝部7およびインクリザーバ一部8は図中破線
に沿ってダイシングソー等で溝加工により連結させイン
クの流路を形成しである。ついで第1のシリコン基板l
上の樹脂層と接合する面には第2図Cの接着層9が形成
される。At this stage, there is no swelling around the pattern that can be seen after heat curing, but as shown in FIGS. A groove portion 7 and an ink reservoir portion 8 are formed corresponding to the substrate 1, and the groove portion 7 and the ink reservoir portion 8 are connected by groove machining with a dicing saw or the like along the broken line in the figure to form an ink flow path. It is. Then the first silicon substrate l
The adhesive layer 9 shown in FIG. 2C is formed on the surface to be bonded to the upper resin layer.
この接着層9の形成方法としては、まず、平面性のある
基板またはフィルム上に接着層としての樹脂層(ここで
はポリイミド樹脂で例えばCHIBA−GEIGY社製
8electilux HTR−3−100)をスピン
コード等の方法により塗布し、第2のシリコン基板6に
転写する。したがって、この方法によれば溝部7等の否
接触部には樹脂が入り込まず、111m程度の薄い接着
層が形成できる。The adhesive layer 9 is formed by first applying a resin layer (polyimide resin, e.g. 8electilux HTR-3-100 manufactured by CHIBA-GEIGY) as an adhesive layer on a flat substrate or film using a spin cord or the like. It is applied and transferred to the second silicon substrate 6 by the method described in (a). Therefore, according to this method, the resin does not enter non-contact parts such as the groove 7, and a thin adhesive layer of about 111 m can be formed.
以上の方法により第1および第2の基板上に樹脂層を形
成した後、位置あわせを行い第3図aの如く接合する。After forming resin layers on the first and second substrates by the above method, they are aligned and bonded as shown in FIG. 3a.
このとき、前述したように第1の基板上に形成された樹
脂膜層は熱硬化前であるため収縮変形により盛り上がり
を生じていない。したがって、この状態で2枚の基板に
圧力をかけるとすき間のない状態で密着接合できる。At this time, as described above, the resin film layer formed on the first substrate has not yet been thermally cured, and therefore does not bulge due to contraction and deformation. Therefore, if pressure is applied to the two substrates in this state, they can be closely bonded without any gaps.
さらに仮止めを行った後、最終的に400°Cで1時間
熱硬化すると同時に完全に接着する。After further temporary fixing, the adhesive was finally heat cured at 400°C for 1 hour and completely bonded at the same time.
接着の終了した基板は第3図すに示すようにダイシング
ソーで個々のヘッドとなるチップに切断分離され、さら
に、インク供給口の取付けおよび電気的接続を行い、印
字可能なヘッドとなる。The bonded substrate is cut and separated into chips that will become individual heads using a dicing saw, as shown in FIG. 3, and furthermore, an ink supply port is attached and electrical connections are made to form a printable head.
(実施例2)
一第4図aおよび第4図すは本発明を用いた他の実施例
である。(Example 2) Figures 4a and 4 show another example using the present invention.
発熱抵抗体、電極等が形成された第一のシリコン基板l
上に、(実施例1)同様に感光性ポリイミド樹脂層(例
えばCHIBA−GEIGY社製5electilux
HTR−3−200)をスピンコードし、100°Cl
2O分間プリベークする。さらに、パターニング露光、
現像のプロセスによりインク流路壁9を形成する。A first silicon substrate l on which a heating resistor, electrodes, etc. are formed.
On top, a photosensitive polyimide resin layer (for example, 5electilux manufactured by CHIBA-GEIGY) was applied in the same manner as in Example 1.
HTR-3-200) was spin-coded and 100°Cl
Pre-bake for 20 minutes. Furthermore, patterning exposure,
The ink channel wall 9 is formed by the development process.
一方、第二のシリコン基板は異方性エツチングによりイ
ンクリザーバ部のみ形成されている。On the other hand, only the ink reservoir portion is formed on the second silicon substrate by anisotropic etching.
第二のシリコン基板の、第一のシリコン基板と接合する
面には感光性ポリイミド樹脂層(例えばCHIBA−G
EIGY社製5electilux HTR−3−10
0)を直接スピンコード、もしくはフィルム等へスピン
コードした後、第二のシリコン基板に転写することで形
成する。A photosensitive polyimide resin layer (for example, CHIBA-G
5electilux HTR-3-10 manufactured by EIGY
0) is directly spin-coded or spin-coded onto a film or the like, and then transferred onto a second silicon substrate.
次に、第一、第二の基板を位置あわせし、第4図aの如
く接着する。この実施例では第一の基板上にインク流路
壁が形成されているため、(実施例1)に比較して位置
あわせが容易である。Next, the first and second substrates are aligned and bonded together as shown in FIG. 4a. In this embodiment, since the ink channel wall is formed on the first substrate, alignment is easier than in (Embodiment 1).
しかる後、400°Cで1時間熱硬化すると同時に完全
に接着する。Thereafter, it was heat cured at 400° C. for 1 hour to completely adhere.
接着の終了した基板は第4図すに示すようにダイシング
ソーで個々のヘッドに分割され、さらに、インク供給口
の取付けおよび電気的接続を行い、印字可能なヘッドと
なる。The bonded substrate is divided into individual heads using a dicing saw, as shown in FIG. 4, and an ink supply port is attached and electrical connections are made to form a printable head.
(実施例3) 第5図は本発明を用いたもう一つの実施例である。(Example 3) FIG. 5 shows another embodiment using the present invention.
発熱抵抗体、電極等が形成された第一のシリコン基板1
上に、(実施例1)同様に感光性ポリイミド樹脂層(例
えばCHIBA−GEIGY社製8electilux
HTR−3−200)をスピンコードし、100°Cl
2O分間プリベークする。さらに、発熱抵抗体およびチ
ップと外部との電気的接続部を除くようパターニング露
光、現像のプロセスを行う。本実施例ではここで一度4
00°C11時間の熱硬化を行う。A first silicon substrate 1 on which a heating resistor, electrodes, etc. are formed.
On top, a photosensitive polyimide resin layer (for example, 8electilux manufactured by CHIBA-GEIGY) was applied in the same manner as in Example 1.
HTR-3-200) was spin-coded and 100°Cl
Pre-bake for 20 minutes. Furthermore, patterning exposure and development processes are performed to remove the heating resistor and the electrical connection between the chip and the outside. In this example, once 4
Heat curing is performed at 00°C for 11 hours.
次に、(実施例2)同様にポリイミド樹脂層を再度塗布
した後100°Cl2O分間プリベークし、インク流路
壁を形成するよう露光、現像により、パターニングする
。しかる後第二のシリコン基板と接合し、400°C1
1時間の熱硬化を行う。Next, in the same manner as in Example 2, a polyimide resin layer is applied again, prebaked for 100 DEG Cl2O minutes, and patterned by exposure and development to form an ink channel wall. After that, it is bonded to a second silicon substrate and heated at 400°C.
Heat cure for 1 hour.
この実施例によればインク流路壁をすべて同一の物質で
構成されるためインク吐出時にぬれ性等の違いによる方
向性の不安定さを解消できるという利点も兼ね備えてい
る。According to this embodiment, since all the walls of the ink flow path are made of the same material, it also has the advantage that instability in directionality due to differences in wettability etc. during ink ejection can be eliminated.
それぞれの実施例では第1の基板1上に形成した樹脂層
として感光性ポリイミドをあげたが、ポリイミド樹脂を
使用した場合には、高温で熱硬化できるためイミド化率
を高めることができ、より安定したインク流路の作製が
可能となった。またパターニングできるものであればこ
れに限るものではない。例えば、非感光性ポリイミドで
も、レジスト等を使用してパターニングすることも可能
であり、また、リストン(登録商標)等のドライフィル
ムレジストをラミネートした後、露光、現像によりパタ
ーニングしてもかまわない。In each of the examples, photosensitive polyimide was used as the resin layer formed on the first substrate 1, but when polyimide resin is used, it can be thermally cured at high temperatures, so the imidization rate can be increased, and the It became possible to create a stable ink flow path. Moreover, it is not limited to this as long as it can be patterned. For example, even non-photosensitive polyimide can be patterned using a resist, or a dry film resist such as Liston (registered trademark) may be laminated and then patterned by exposure and development.
さらに、第2の基板上の樹脂も同様に、熱硬化と同時に
接着でくるものであれば使用できる。Furthermore, the resin on the second substrate can be similarly used as long as it can be thermally cured and bonded at the same time.
また、必要に応じてアミノシラン系接着促進剤等の接着
補助剤を基板上に塗布してから樹脂層を形成することに
より、密着力を向上してもよい。Further, if necessary, adhesion may be improved by applying an adhesion auxiliary agent such as an aminosilane adhesion promoter onto the substrate before forming the resin layer.
さらに、他のインクジェット方式(例えばピエゾ素子を
用いたもの)であっても、2枚の基板を張り合わせる工
程については、本発明の方法を適用することができる。Furthermore, the method of the present invention can be applied to other inkjet methods (for example, those using piezo elements) in the process of bonding two substrates together.
(発明の効果)
以上、述べたように本発明によれば、2枚の基板を接着
する際に生じる基板の浮き等による密着不良部品がきわ
めて少なくなり、歩留りが向上する。(Effects of the Invention) As described above, according to the present invention, the number of parts with poor adhesion due to lifting of the substrates, etc. that occurs when two substrates are bonded is extremely reduced, and the yield is improved.
第1図は発熱素子の形成された第一の基板、第2図はノ
ズル部を形成するための溝とインクリザーバを有する第
2の基板、第3.4.5図は本発明の実施例による2枚
の基板の接合時の状態および切断により個別化されたヘ
ッド、第6図は従来技術による熱硬化したときにみられ
る凹凸、7図は従来技術による接着剤が多すぎてノズル
部に接着剤が入り込んだ様子。
1.6基板、2厚膜熱硬化型樹脂、4発熱体、5電極7
溝部、8インクリザ一バ一部、9薄膜熱硬化型樹脂、1
0インク流路壁
出願人 富士ゼロックス株式会社Fig. 1 shows a first substrate on which a heating element is formed, Fig. 2 shows a second substrate having a groove for forming a nozzle part and an ink reservoir, and Fig. 3.4.5 shows an embodiment of the present invention. Figure 6 shows the state of bonding two substrates together and the heads separated by cutting. Figure 6 shows the unevenness seen when heat-cured using the conventional technique. Figure 7 shows the state of the nozzle due to too much adhesive due to the conventional technique. It looks like the adhesive has gotten into it. 1.6 substrates, 2 thick film thermosetting resins, 4 heating elements, 5 electrodes 7
Groove, 8 Ink reservoir part, 9 Thin film thermosetting resin, 1
0 ink channel wall applicant Fuji Xerox Co., Ltd.
Claims (1)
ト記録ヘッドの製造方法において、第1の基板上に熱硬
化型樹脂層をインク流路状に形成した後プリベークする
第1の工程と、第2の基板上に熱硬化型樹脂の薄層を形
成する第2の工程と、 前記第1と第2の工程を行った前記第1の基板と第2の
基板とを焼成し熱硬化させることなく熱硬化型樹脂層を
互いに対向させるように接合する第3の工程と、 前記第3の工程の後前記第1の基板と第2の基板上の熱
硬化型樹脂を焼成し熱硬化させる第4の工程とからなる
ことを特徴とするインクジェット記録ヘッドの製造方法
。[Claims] In a method for manufacturing an inkjet recording head in which an ink channel is formed using a thermosetting resin, a first step is performed in which a thermosetting resin layer is formed in the shape of an ink channel on a first substrate and then prebaked. a second step of forming a thin layer of thermosetting resin on a second substrate; and firing the first and second substrates that have undergone the first and second steps. a third step of joining the thermosetting resin layers so as to face each other without thermal curing; and after the third step, baking the thermosetting resins on the first substrate and the second substrate. and a fourth step of thermally curing the inkjet recording head.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP28804490A JPH04161341A (en) | 1990-10-25 | 1990-10-25 | Manufacture of ink jet recording head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP28804490A JPH04161341A (en) | 1990-10-25 | 1990-10-25 | Manufacture of ink jet recording head |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH04161341A true JPH04161341A (en) | 1992-06-04 |
Family
ID=17725110
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP28804490A Pending JPH04161341A (en) | 1990-10-25 | 1990-10-25 | Manufacture of ink jet recording head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH04161341A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1994006570A1 (en) * | 1992-09-21 | 1994-03-31 | Compaq Computer Corporation | Method and apparatus for coating a passivation film on ink channels of an ink jet printhead |
| EP0659564A3 (en) * | 1993-12-22 | 1997-01-15 | Canon Kk | Ink jet head cartridge and ink jet apparatus. |
| JPH09501855A (en) * | 1993-08-30 | 1997-02-25 | サージン・サージカル・インスツルメンテーション・インコーポレーテッド | Laparoscopic safety device |
| GB2410466A (en) * | 2004-01-29 | 2005-08-03 | Hewlett Packard Development Co | A method of making an inkjet printhead |
| JP2012532037A (en) * | 2009-06-29 | 2012-12-13 | ヴィデオジェット テクノロジーズ インコーポレイテッド | Solvent resistant thermal inkjet printhead |
-
1990
- 1990-10-25 JP JP28804490A patent/JPH04161341A/en active Pending
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1994006570A1 (en) * | 1992-09-21 | 1994-03-31 | Compaq Computer Corporation | Method and apparatus for coating a passivation film on ink channels of an ink jet printhead |
| US5462600A (en) * | 1992-09-21 | 1995-10-31 | Compaq Computer Corporation | Apparatus for film coated passivation of ink channels in ink jet printhead |
| US5481285A (en) * | 1992-09-21 | 1996-01-02 | Compaq Computer Corporation | Ink jet printhead manufactured by a film coated passivation process |
| US5506034A (en) * | 1992-09-21 | 1996-04-09 | Compaq Computer Corporation | Workpiece manufactured by a film coated passivation process |
| JPH09501855A (en) * | 1993-08-30 | 1997-02-25 | サージン・サージカル・インスツルメンテーション・インコーポレーテッド | Laparoscopic safety device |
| EP0659564A3 (en) * | 1993-12-22 | 1997-01-15 | Canon Kk | Ink jet head cartridge and ink jet apparatus. |
| GB2410466A (en) * | 2004-01-29 | 2005-08-03 | Hewlett Packard Development Co | A method of making an inkjet printhead |
| US8388117B2 (en) | 2004-01-29 | 2013-03-05 | Hewlett-Packard Development Company, L.P. | Method of making an inkjet printhead |
| JP2012532037A (en) * | 2009-06-29 | 2012-12-13 | ヴィデオジェット テクノロジーズ インコーポレイテッド | Solvent resistant thermal inkjet printhead |
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