JPH0453564B2 - - Google Patents
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- Publication number
- JPH0453564B2 JPH0453564B2 JP63022612A JP2261288A JPH0453564B2 JP H0453564 B2 JPH0453564 B2 JP H0453564B2 JP 63022612 A JP63022612 A JP 63022612A JP 2261288 A JP2261288 A JP 2261288A JP H0453564 B2 JPH0453564 B2 JP H0453564B2
- Authority
- JP
- Japan
- Prior art keywords
- tank
- filter
- filtration
- liquid
- cleaning tank
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
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- Filtration Of Liquid (AREA)
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明はろ過処理装置に係り、特にろ過材の再
生をエヤリフトのエネルギを利用して行うろ過処
理装置に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a filtration treatment device, and more particularly to a filtration treatment device that regenerates a filter medium using the energy of an air lift.
懸濁液またはエマルジヨンのろ過方法としては、
タンクに入つている粒子状のろ過材からなるろ床
へ懸濁液等を供給し、ろ床を通して上方へ流し、
ろ過液を得る。しかしろ過材は徐々に懸濁液によ
り汚れていくので、これを連続的に洗浄して再使
用する必要がある。この洗浄する方法として、汚
れたろ過材をろ過槽から取出し別の洗浄槽で洗浄
して再びろ過槽に送り返すものと、ろ過槽内に設
けられた洗浄槽で、ろ過液の一部を使用して洗浄
するものとがある。後者の方法として例えば特公
昭56−51808号公報に開示された技術がある。こ
れは、ろ過槽の上部に洗浄槽を設け、洗浄槽から
汚れたろ過材を下に落下させるとともにろ過液の
一部を上方に導き、汚れたろ過材とろ過液とを対
向して流すことにより、汚れたろ過材は徐々に洗
浄されて落下してろ床に戻り、ろ過液は徐々に汚
れて上昇してゆき、汚染洗浄液として排出される
ものである。
Filtration methods for suspensions or emulsions include:
A suspension, etc. is supplied to a filter bed made of particulate filter media contained in a tank, and flows upward through the filter bed.
Obtain the filtrate. However, since the filter medium gradually becomes contaminated by the suspension, it is necessary to continuously wash it and reuse it. There are two cleaning methods: one takes the dirty filter media out of the filtration tank, washes it in another cleaning tank, and sends it back to the filtration tank, and the other uses a part of the filtrate in a cleaning tank installed inside the filtration tank. There are some items that need to be washed. As an example of the latter method, there is a technique disclosed in Japanese Patent Publication No. 56-51808. This is done by installing a cleaning tank at the top of the filtration tank, allowing dirty filter media to fall from the cleaning tank to the bottom, and guiding a portion of the filtrate upwards so that the dirty filter media and filtrate flow opposite each other. As a result, the dirty filter medium is gradually washed and falls back to the filter bed, and the filtrate gradually becomes dirty and rises, and is discharged as a contaminated cleaning liquid.
本発明の目的は、洗浄槽をろ過槽内に設け、ろ
過槽下部の汚れたろ過材を気体を利用して移送す
るとともに、この気体のエネルギを用いて行うろ
過処理装置を提供することにある。
An object of the present invention is to provide a filtration treatment device in which a cleaning tank is provided in a filtration tank, the dirty filter material at the bottom of the filtration tank is transferred using gas, and the energy of this gas is used to carry out the filtration treatment. .
上記課題は、ろ過処理対象液をろ過材によりろ
過するろ過槽と、該ろ過槽の下部に蓄積する汚染
ろ過材を該ろ過槽内の液と共に気体を注入して混
合体として上方へ移送する移送手段と、該移送手
段の上部を包含し該混合体の汚染ろ過材を洗浄す
る洗浄槽とからなり、
前記ろ過槽が、下部にろ過処理対象液供給手段
を設け、ろ過液液位近傍にろ過液取出手段を有
し、所定レベルまでろ過材を充填し、
前記洗浄槽が、下部に洗浄したろ過材の排出
に所定の抵抗を与える抵抗体を設け、頂部に開口
端が前記ろ過液液位より高い位置にくるようにし
た溢液管とこの溢液管より溢れた汚染洗浄液を排
出する排出口を設けたろ過処理装置により達成さ
れ、また、洗浄槽に対し移送手段の吐出口上部に
衝突手段を設けることが好ましく、また、抵抗体
として洗浄槽の下部にスカートを設け、その下部
がろ過槽内のろ過材まで達しているようにするこ
とがよく、また、ろ過液取出手段へ到る径路にせ
きを設けこのせきの高さを加減して前記ろ過液液
位を調整するようにするとよい。
The above-mentioned problem consists of a filtration tank that filters the liquid to be filtered using a filtration material, and a transfer system in which the contaminated filtration material that accumulates at the bottom of the filtration tank is transported upward as a mixture by injecting gas with the liquid in the filtration tank. and a cleaning tank that includes the upper part of the transfer means and washes the contaminated filter medium of the mixture, and the filter tank has a means for supplying the liquid to be filtered at the lower part, and the filter is provided near the filtrate liquid level. The cleaning tank has a liquid extraction means and is filled with filter media to a predetermined level, and the cleaning tank is provided with a resistor that provides a predetermined resistance to discharge of the washed filter media at the bottom, and an open end at the top is filled with the filter media to a predetermined level. This is achieved by a filtration device equipped with an overflow pipe located at a higher position and an outlet for discharging contaminated cleaning liquid overflowing from the overflow pipe. It is preferable to provide means, and it is also preferable to provide a skirt at the bottom of the cleaning tank as a resistor so that the bottom reaches the filter material in the filtration tank, and also to reach the filtrate extraction means. It is preferable to provide a weir in the path and adjust the height of the weir to adjust the level of the filtrate.
ろ過槽に入つているろ過材からなるろ床へろ過
処理対象液を供給し、ろ床を通して上方へ流しろ
過液を得る。ろ過槽の汚れたろ過材は洗浄槽内へ
送られ、洗浄槽で液を脈動することによりろ過材
についた汚れはろ過材から分離して浮上し、ろ過
材は沈降するので汚れた洗浄液を排出し、洗浄さ
れたろ過材をろ過槽に戻す。
A liquid to be filtered is supplied to a filter bed made of a filter medium contained in a filter tank, and flows upward through the filter bed to obtain a filtrate. The dirty filter media in the filter tank is sent into the cleaning tank, and by pulsating the liquid in the cleaning tank, the dirt on the filter media is separated from the filter media and floats to the surface.The filter media settles, and the dirty cleaning fluid is discharged. and return the cleaned filter media to the filter tank.
洗浄槽に汚れたろ過材をろ過槽内の液と共に気
体を注入してその浮力を利用して上方へ移送し、
洗浄槽より洗浄されたろ過材を排出するが、この
排出に抵抗を付加し、洗浄槽の液圧が所定値越え
ると内部の液を排出するようにして所定圧以下に
してあるので、排出の抵抗と液圧を所定値以下に
することにより洗浄槽内は準密閉状態が形成さ
れ、気体の気泡の上昇流によつて洗浄槽の液が脈
動し、この上昇流と脈動によりろ過材についた汚
れを分離し、浮上し、排出する一方、洗浄槽の下
部から抵抗に抗して洗浄されたろ過材が降下す
る。さらに注入気体に曝気された汚れには微少な
気泡が付くこと、および洗浄液の圧力変化により
脱気作用が生じ、これによつて生じた微少な気泡
も汚れに付き、この微少な気泡の付着により汚れ
は浮上し、排出される。また、洗浄槽内へ気体と
一緒になつて上昇してきた汚れたろ過材とろ過槽
内の液よりなる混合体を衝突手段に衝突させ、こ
の衝突と、衝突によつて生じる乱流によつて汚れ
をろ過材より分離し、上方へ上昇させ、排出す
る。 Gas is injected into the cleaning tank along with the liquid in the filter tank, and the buoyancy is used to transport the dirty filter material upwards.
The cleaned filter media is discharged from the cleaning tank, but a resistance is added to this discharge, and when the liquid pressure in the cleaning tank exceeds a predetermined value, the liquid inside is discharged to reduce the pressure to below a predetermined value. By lowering the resistance and liquid pressure below a predetermined value, a quasi-sealed state is formed inside the cleaning tank, and the liquid in the cleaning tank pulsates due to the upward flow of gas bubbles, and this upward flow and pulsation causes the liquid to adhere to the filter media. While dirt is separated, floated, and discharged, the cleaned filter material descends against resistance from the bottom of the cleaning tank. Furthermore, minute air bubbles are attached to the dirt that has been aerated with the injected gas, and a deaeration effect occurs due to the change in the pressure of the cleaning solution, and the minute air bubbles generated by this also adhere to the dirt. Dirt floats to the surface and is discharged. In addition, a mixture of the dirty filter material and the liquid in the filter tank that has risen together with the gas into the cleaning tank is made to collide with the collision means, and due to this collision and the turbulence generated by the collision, Dirt is separated from the filter media, lifted upwards, and discharged.
さらに上述の脈動作用と衝突による作用および
微少気泡付着作用を併用することにより汚れの分
離、排出が促進される。 Furthermore, by combining the above-mentioned pulsation action, impact action, and microbubble adhesion action, separation and discharge of dirt is promoted.
またろ過液液位を変えることによりろ過液と抵
抗体を介して通じている洗浄槽の静的液位を調整
して脈動を制御する。 In addition, by changing the filtrate level, the static level of the cleaning tank, which communicates with the filtrate via a resistor, is adjusted to control pulsation.
以下、本発明の一実施例を第１図により説明す
る。第１図は本実施例の縦断面図を示す。
An embodiment of the present invention will be described below with reference to FIG. FIG. 1 shows a longitudinal sectional view of this embodiment.
ろ過処理装置は、上部は大気圧に開放されてお
り下部はすり鉢状で胴部は円筒状のろ過槽１、こ
のろ過槽１のすり鉢部を貫通して設けられ、頭部
にかさ状転流板を付けた原水供給管２、ろ過槽１
のろ過水水位近傍に設けられたろ過水取出口３、
ろ過水取出口３の入口近傍に設けられ、その高さ
を加減できるせき板４、ろ過槽１の中心軸上の上
部に配設し円筒状で下部がすり鉢状に減径してお
り洗浄したろ過材を放出する開口を有する洗浄槽
５、洗浄槽５の中心軸上でほぼ中央に設けられた
かさ状の衝突板６、洗浄槽５の下部開口部下部に
設けられ、その長さＨがろ過材１５にまで達する
スカート７、洗浄槽５の上部でろ過水水位とほぼ
同じ位置に設けられ中心軸上に開口を有する頂板
８、頂板８の開口部上方に設けられその長さがほ
ぼｈの円筒状放出口９、頂板８より上方に洗浄槽
５と同一径の延長壁を有し頂板８のレベルに排出
口を有する汚染洗浄液排出部１０、ろ過槽１の下
部に汚れたろ過材の吸入口を有しスカート７を貫
通して衝突板６より所定長さ低い位置に吐出口を
有しろ過槽１の中心軸上に配設されたエヤリフト
１１、エヤリフト１１の汚れたろ過材吸入口内に
吐出口を有する空気供給管１２、エヤリフト１１
の下方に設けられた下部かさ１３、エヤリフト１
１の吐出口に設けられた上部かさ１４、ろ過槽１
に充填され、その頂部がスカート７の下端と接し
ているろ過材１５、により構成される。 The filtration treatment device includes a filter tank 1 whose upper part is open to atmospheric pressure, whose lower part is mortar-shaped, and whose body is cylindrical.It is installed through the mortar part of this filter tank 1, and has an umbrella-shaped diversion at the head. Raw water supply pipe with plate 2, filter tank 1
a filtrate water outlet 3 provided near the filtrate water level;
A weir plate 4 is provided near the inlet of the filtrate water outlet 3, and its height can be adjusted.A weir plate 4 is provided at the upper part of the central axis of the filtration tank 1, and is cylindrical in shape and has a reduced diameter in the shape of a mortar at the bottom for cleaning. A cleaning tank 5 having an opening for discharging filter media, an umbrella-shaped collision plate 6 provided approximately at the center on the central axis of the cleaning tank 5, and a collision plate 6 provided at the bottom of the lower opening of the cleaning tank 5, the length H of which is A skirt 7 that reaches up to the filter medium 15, a top plate 8 that is provided at the top of the cleaning tank 5 at approximately the same position as the filtrate water level and has an opening on the central axis, and a skirt 7 that is provided above the opening of the top plate 8 and whose length is approximately h. A cylindrical discharge port 9, a contaminated cleaning liquid discharge part 10 having an extension wall of the same diameter as the cleaning tank 5 above the top plate 8 and a discharge port at the level of the top plate 8, and a dirty cleaning liquid discharge part 10 at the bottom of the filter tank 1. An air lift 11 that has an inlet and an outlet that penetrates the skirt 7 and is located a predetermined length lower than the collision plate 6 and is disposed on the central axis of the filtration tank 1, inside the dirty filter media inlet of the air lift 11. Air supply pipe 12 and air lift 11 having a discharge port at
Lower umbrella 13 provided below, air lift 1
Upper umbrella 14 provided at the discharge port of 1, filtration tank 1
The filter material 15 is filled with a filter material 15, the top of which is in contact with the lower end of the skirt 7.
次に動作を説明する。 Next, the operation will be explained.
原水供給管２より流入した原水は上部のかさ状
衝突板６で下方円状に広く分散し、次いでろ過材
１５よりなるろ床を上昇しながら汚れをろ過材１
５に付着し、ろ過されてろ液相区域１６に到る。
ろ過材１５としては普通砂などが使われる。ろ過
材１５は原水供給管２頭部近傍より下のものが最
も汚れており、上に行くにつれて汚れは少くなつ
ていく。しかし、汚れたろ過材１５がエヤリフト
１１の吸入口より上方へ連続的に移送されるの
で、ろ過材１５下方へ降下してゆく。エヤリフト
１１の下部かさ１３はろ過材１５が下方へ流れる
案内となつている。ろ液相区域１６のろ過水の水
位はせき４のレベルによつて決る。このせきのレ
ベルを調整すると洗浄槽５内の静的液位を調整す
ることができる。せき４を越えたろ過水はろ過水
取出口３より取出される。空気供給管１２に空気
を供給するとエヤリフト１１の吸入口近傍の汚れ
たろ過材１５はその周囲の原水と共に吸入され洗
浄槽５内で吐出される。この吐出口から吐出され
た汚れたろ過材１５、原水、空気の気泡は直上の
かさ形の衝突板６と衝突し円状に広がるとともに
下方へ方向転換する。この方向転換によつて汚れ
たろ過材１５から汚れが分離し、ろ過材１５は下
方へ降下する。このとき上部かさ１４はこの案内
として働く。分離した汚れは上昇する。また、エ
ヤリフト１１の空気の不規則な気泡の連続上昇に
より脈動的エネルギが生じ、洗浄槽５の下部開口
の下に取付けられたスカート７は中に詰つた降下
中のろ過材１５とろ床が連続することにより洗浄
槽５内の液がスカート７より流出するのに対して
抵抗を生じ、頂板８上に設けられた高さｈの放出
口９は、ろ過槽１のろ過水水位よりｈだけ高くな
つているので、洗浄槽５は準密閉状態となり、脈
動エネルギによつて洗浄槽内液は脈動を生じ、こ
の脈動により汚れたろ過材１５から汚れが分離さ
れ、さらに沈降した汚れも浮上する。また気泡に
曝気された汚れには微少な気泡が付き、さらに洗
浄槽内液の脈動による圧力変化によつて脱気作用
が生じ微少な気泡が発生し汚れに付着するので汚
れはさらに上昇しやすくなる。上昇した汚れは洗
浄水と共に脈動による放出口９の液位が放出口９
の上端を越えたときに放出され、汚染洗浄液排出
部１０より排出される。 The raw water flowing in from the raw water supply pipe 2 is widely dispersed in a downward circular shape by the upper umbrella-shaped collision plate 6, and then ascends the filter bed made of filter material 15, removing dirt from the filter material 1.
5 and is filtered to reach the filtrate phase zone 16.
Ordinary sand or the like is used as the filter material 15. The filter media 15 below the vicinity of the head of the raw water supply pipe 2 is the most contaminated, and the dirt becomes less as it goes up. However, since the dirty filter medium 15 is continuously transferred upward from the suction port of the air lift 11, the filter medium 15 descends below. The lower umbrella 13 of the air lift 11 serves as a guide for the filter medium 15 to flow downward. The level of the filtrate in the filtrate phase zone 16 depends on the level of the weir 4. By adjusting the level of this weir, the static liquid level in the cleaning tank 5 can be adjusted. The filtrated water that has exceeded the weir 4 is taken out from the filtrated water outlet 3. When air is supplied to the air supply pipe 12, the dirty filter material 15 near the suction port of the air lift 11 is sucked in together with surrounding raw water and discharged into the cleaning tank 5. The dirty filter medium 15, raw water, and air bubbles discharged from this discharge port collide with the umbrella-shaped collision plate 6 directly above, spread in a circle, and change direction downward. Due to this change in direction, the dirt is separated from the dirty filter medium 15, and the filter medium 15 descends downward. At this time, the upper umbrella 14 acts as a guide. Separated dirt rises. In addition, pulsating energy is generated due to the continuous rise of irregular air bubbles in the air lift 11, and the skirt 7 installed under the lower opening of the cleaning tank 5 has a continuous flow of filter media 15 stuck inside and falling filter bed. This creates resistance to the liquid in the cleaning tank 5 flowing out from the skirt 7, and the discharge port 9 at a height h provided on the top plate 8 is raised by h above the filtrate water level in the filtration tank 1. As a result, the cleaning tank 5 is in a semi-sealed state, and the liquid in the cleaning tank pulsates due to the pulsating energy, and this pulsation separates dirt from the dirty filter medium 15, and furthermore, the settled dirt also floats to the surface. In addition, minute air bubbles are attached to the aerated dirt, and the pressure change due to the pulsation of the liquid in the cleaning tank causes a degassing effect, generating minute air bubbles that adhere to the dirt, making the dirt more likely to rise. Become. The liquid level at the discharge port 9 due to the pulsation of the rising dirt and the cleaning water increases to the discharge port 9.
It is discharged when it exceeds the upper end of the contaminated cleaning liquid and is discharged from the contaminated cleaning liquid discharge section 10.
洗浄槽５を準密閉状態に保つために必要なスカ
ート７の抵抗値は圧力損失としてρHで表わすと、
放出口のヘツド圧をρhとし、
ρH＞ρh
の条件を満す必要がある。 The resistance value of the skirt 7 required to keep the cleaning tank 5 in a quasi-sealed state is expressed as pressure loss by ρH .
The head pressure at the outlet is ρ h , and the condition ρ H > ρ h must be satisfied.
本発明によれば、汚れたろ過材を気体によりろ
過槽液と共に洗浄槽に移送して洗浄槽液に脈動を
発生させ汚れとろ過材を分離し、汚れた洗浄水を
排出し、一方洗浄したろ過材をろ床に連続的に戻
し、連続して原液をろ過処理できる。またこの汚
れたろ過材洗浄にはろ過水を使用しないので、ろ
過効率が高い。
According to the present invention, the dirty filter medium is transferred to the cleaning tank together with the filter tank liquid by gas, pulsation is generated in the cleaning tank liquid to separate the dirt and the filter medium, and the dirty cleaning water is discharged, while cleaning is performed. The filter material is continuously returned to the filter bed, and the undiluted solution can be continuously filtered. Furthermore, since filtered water is not used to clean the dirty filter media, filtration efficiency is high.
また、汚れたろ過材をろ過槽液と共に気体によ
つて上昇させ、洗浄槽内の衝突手段に衝突させ汚
れたろ過材から汚れを分離できる。 Further, the dirty filter medium is raised by gas together with the filter tank liquid and collided with the collision means in the cleaning tank, so that the dirt can be separated from the dirty filter medium.
さらに洗浄槽内の脈動作用および衝突手段への
衝突作用を組合せることにより確実に、効果的に
汚れをろ過材分離できる。 Furthermore, by combining the pulsating action in the cleaning tank and the impacting action on the impacting means, dirt can be reliably and effectively separated from the filter medium.
第１図は本発明の一実施例の縦断面図である。
１……ろ過槽、２……処理水供給管、３……ろ
過水取出口、４……せき、５……洗浄槽、６……
衝突板、７……スカート、８……頂板、９……放
出口、１０……汚染洗浄液排出部、１１……エヤ
リフト、１２……空気供給管、１３……下部か
さ、１４……上部かさ、１５……ろ過材。
FIG. 1 is a longitudinal sectional view of an embodiment of the present invention. 1... Filter tank, 2... Treated water supply pipe, 3... Filtered water outlet, 4... Weir, 5... Washing tank, 6...
Collision plate, 7...Skirt, 8...Top plate, 9...Discharge port, 10...Contaminated cleaning liquid discharge section, 11...Air lift, 12...Air supply pipe, 13...Lower cover, 14...Upper cover , 15...Filtering material.
Claims (1)
槽と、該ろ過槽の下部に蓄積する汚染ろ過材を該
ろ過槽内の液と共に気体を注入して混合体として
上方へ移送する移送手段と、該移送手段の上部を
包含し該混合体の汚染ろ過材を洗浄する洗浄槽と
からなり、 前記ろ過槽が、下部にろ過処理対象液供給手段
を設け、ろ過液液位近傍にろ過液取出手段を有
し、所定レベルまでろ過材を充填し、 前記洗浄槽が、下部に洗浄したろ過材の排出に
所定の抵抗を与える抵抗体を設け、頂部に開口端
が前記ろ過液液位より高い位置にくるようにした
溢液管とこの溢液管より溢れた汚染洗浄液を排出
する排出口を設けたことを特徴とするろ過処理装
置。 ２ 前記洗浄槽が、前記移送手段の吐出口上部に
衝突手段を設けたことを特徴とする請求項１記載
のろ過処理装置。 ３ 前記抵抗体が、前記洗浄槽の下部に設けたス
カートで、その下端が前記ろ過槽内のろ過材まで
達していることを特徴とする請求項１又は２記載
のろ過処理装置。 ４ 前記ろ過液取出手段へ到る径路にせきを設け
このせきの高さを加減して前記ろ過液液位を調整
することを特徴とする請求項１，２または３記載
のろ過処理装置。[Scope of Claims] 1. A filtration tank that filters a liquid to be filtered using a filtration material, and a contaminated filtration material that accumulates at the bottom of the filtration tank, together with the liquid in the filtration tank, by injecting gas and moving the mixture upward as a mixture. It is composed of a transfer means for transferring, and a cleaning tank that includes the upper part of the transfer means and washes the contaminated filter material of the mixture, and the filter tank is provided with a means for supplying the liquid to be filtered at the lower part, and the liquid level of the filtrate is adjusted. The cleaning tank has a filtrate extraction means nearby and is filled with filter media to a predetermined level, and the washing tank is provided with a resistor at the bottom that provides a predetermined resistance to discharge of the washed filter media, and an open end at the top is filled with the filter material to a predetermined level. A filtration processing device characterized by being provided with an overflow pipe located at a position higher than the liquid level and an outlet for discharging contaminated cleaning liquid overflowing from the overflow pipe. 2. The filtration treatment apparatus according to claim 1, wherein the cleaning tank is provided with a collision means above the discharge port of the transfer means. 3. The filtration treatment apparatus according to claim 1 or 2, wherein the resistor is a skirt provided at a lower part of the cleaning tank, and a lower end thereof reaches a filter material in the filter tank. 4. The filtration treatment apparatus according to claim 1, 2 or 3, wherein a weir is provided in the path leading to the filtrate extraction means, and the height of the weir is adjusted to adjust the filtrate level.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63022612A JPH01199610A (en) | 1988-02-02 | 1988-02-02 | Filtration processing equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63022612A JPH01199610A (en) | 1988-02-02 | 1988-02-02 | Filtration processing equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01199610A JPH01199610A (en) | 1989-08-11 |
| JPH0453564B2 true JPH0453564B2 (en) | 1992-08-27 |
Family
ID=12087660
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63022612A Granted JPH01199610A (en) | 1988-02-02 | 1988-02-02 | Filtration processing equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01199610A (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4524430B2 (en) * | 2001-03-12 | 2010-08-18 | Ｄｏｗａメタルマイン株式会社 | Filter cleaning method and apparatus |
| JP2002361009A (en) * | 2001-06-06 | 2002-12-17 | Maezawa Ind Inc | Moving bed type sand filter |
| KR101114737B1 (en) * | 2005-05-31 | 2012-02-29 | 삼성전자주식회사 | Method for reporting packet received result in a mobile communication system |
| JP5818360B2 (en) * | 2012-03-27 | 2015-11-18 | 株式会社クボタ | Moving bed type filtration tank and septic tank equipped with moving bed type filtration tank |
-
1988
- 1988-02-02 JP JP63022612A patent/JPH01199610A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH01199610A (en) | 1989-08-11 |
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Free format text: JAPANESE INTERMEDIATE CODE: R313533 |
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