JPH05237707A - Coated tool - Google Patents
Coated toolInfo
- Publication number
- JPH05237707A JPH05237707A JP7529792A JP7529792A JPH05237707A JP H05237707 A JPH05237707 A JP H05237707A JP 7529792 A JP7529792 A JP 7529792A JP 7529792 A JP7529792 A JP 7529792A JP H05237707 A JPH05237707 A JP H05237707A
- Authority
- JP
- Japan
- Prior art keywords
- diffusion
- layer
- base metal
- coating
- ratio
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010410 layer Substances 0.000 claims abstract description 42
- 238000009792 diffusion process Methods 0.000 claims abstract description 21
- 229910052721 tungsten Inorganic materials 0.000 claims abstract description 14
- 238000000576 coating method Methods 0.000 claims abstract description 10
- 239000011248 coating agent Substances 0.000 claims abstract description 9
- 239000000956 alloy Substances 0.000 claims abstract description 7
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 7
- 239000011247 coating layer Substances 0.000 claims abstract description 7
- 150000004767 nitrides Chemical class 0.000 claims abstract description 4
- 229910052804 chromium Inorganic materials 0.000 claims abstract 2
- 229910052742 iron Inorganic materials 0.000 claims abstract 2
- 229910052750 molybdenum Inorganic materials 0.000 claims abstract 2
- 229910052759 nickel Inorganic materials 0.000 claims abstract 2
- 230000000737 periodic effect Effects 0.000 claims abstract 2
- 239000000758 substrate Substances 0.000 claims description 17
- 239000000463 material Substances 0.000 claims description 4
- 150000001247 metal acetylides Chemical class 0.000 claims 1
- 239000000126 substance Substances 0.000 abstract description 8
- 239000002184 metal Substances 0.000 abstract description 2
- 229910052751 metal Inorganic materials 0.000 abstract description 2
- 239000010953 base metal Substances 0.000 abstract 6
- JMANVNJQNLATNU-UHFFFAOYSA-N oxalonitrile Chemical compound N#CC#N JMANVNJQNLATNU-UHFFFAOYSA-N 0.000 abstract 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 10
- 238000000034 method Methods 0.000 description 7
- 238000007740 vapor deposition Methods 0.000 description 7
- 238000005520 cutting process Methods 0.000 description 6
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 229910002091 carbon monoxide Inorganic materials 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229910009043 WC-Co Inorganic materials 0.000 description 1
- LFYJSSARVMHQJB-QIXNEVBVSA-N bakuchiol Chemical compound CC(C)=CCC[C@@](C)(C=C)\C=C\C1=CC=C(O)C=C1 LFYJSSARVMHQJB-QIXNEVBVSA-N 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 238000003763 carbonization Methods 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 230000008094 contradictory effect Effects 0.000 description 1
- 239000010730 cutting oil Substances 0.000 description 1
- 238000005261 decarburization Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000005121 nitriding Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000006722 reduction reaction Methods 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
Landscapes
- Cutting Tools, Boring Holders, And Turrets (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は耐摩耗性に優れた、切削
用及び耐摩耗用の被覆超硬質合金工具に関するものであ
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cutting- and wear-resistant coated cemented carbide tool having excellent wear resistance.
【０００２】[0002]
【従来の技術】従来、超硬合金を基体とし、その表面に
耐摩耗性に富んだＴｉＣ、ＴｉＮなどの硬質皮膜を被覆
した被覆超硬合金工具は、表面の耐摩耗性と基体の強靭
性を兼ね備えており、広く実用に供されている。しかし
ＴｉＣ、Ａｌ2Ｏ3等の被覆合金は密着性、耐摩耗性の相
反する性能を兼ね備えるため、必ずしも論理たてられて
おらず、その次に来る皮膜の種類、蒸着時間等との関係
から管理されていないのが現状である。2. Description of the Related Art Conventionally, a coated cemented carbide tool in which a hard metal such as TiC or TiN having a high wear resistance is coated on the surface of a cemented carbide base has a surface wear resistance and a toughness of the base. It also has a wide range of practical uses. However, since coating alloys such as TiC and Al 2 O 3 have contradictory properties of adhesion and wear resistance, they are not always logically defined. From the relationship with the type of the next film, vapor deposition time, etc. Currently, it is not managed.
【０００３】また、密着性の観点からは基体主成分であ
るＷ、Ｔｉ、Ｃｏ等が拡散すれば、密着性は向上し、特
にＣｏが最表面に現れるような場合には悪影響を及ぼす
が、内層に適量存在する場合には、むしろ効果的でもあ
った。しかし、耐摩耗性の観点からみれば、もちろん剥
離をしないことが重要であるが、基体主成分であるＷ、
Ｔｉ、Ｃｏ等が拡散すればすくい面上のクレーター摩耗
が速くなり、工具寿命が短くなるなどの欠点もあった。Further, from the viewpoint of adhesion, if W, Ti, Co, etc., which are the main components of the substrate, diffuse, the adhesion is improved, and particularly when Co appears on the outermost surface, it has a bad effect. It was rather effective when it was present in an appropriate amount in the inner layer. However, from the viewpoint of wear resistance, it is of course important that no peeling occurs.
If Ti, Co, etc. diffuse, the crater wear on the rake face becomes faster and the tool life is shortened.
【０００４】このため、上記のどちらに主眼を置くかに
より、種々の皮膜を形成する方法が行われている。基体
との密着性が比較的良い皮膜を内層に被覆すれば、Ｗ、
Ｃｏ等の拡散は多くなり、その例としては内層にＴｉ
Ｃ層、ＴｉＣＮ層、ＴｉＮ層等がある。しかし、い
ずれも、Ｃを含む場合には脱炭相の問題もあり、Ｗ、Ｃ
ｏ、Ｔｉ、Ｃの各元素が反応するため複雑な様相となっ
ている。For this reason, various methods for forming a film are carried out depending on which one of the above-mentioned main points is placed. If the inner layer is coated with a film having relatively good adhesion to the substrate, W,
The diffusion of Co etc. increases, and as an example, Ti is used as the inner layer.
There are a C layer, a TiCN layer, a TiN layer and the like. However, both of them have a problem of decarburization phase when they contain C, and
Since each element of o, Ti and C reacts, it has a complicated appearance.
【０００５】[0005]
【発明が解決しようとする課題】本発明は、基体となる
超硬合金の構成物質と拡散を皮膜により解決するもので
あり、Ｃ、Ｗ、Ｃｏ等の基体を構成する物質の拡散を防
ぐために、最内層のＴｉＮまたはＴｉＣＮ層を低温で処
理すると共に、膜質を微細化し、その後通常の化学蒸着
法で様々な膜質を被覆しても、基体を構成する物質の拡
散を阻止するものである。DISCLOSURE OF THE INVENTION The present invention is to solve the constituent substance and diffusion of a cemented carbide as a substrate by means of a film, and to prevent the diffusion of substances constituting the substrate such as C, W and Co. When the innermost TiN or TiCN layer is processed at a low temperature, the film quality is made fine, and then various film properties are coated by a normal chemical vapor deposition method, the diffusion of the substance constituting the substrate is prevented.
【０００６】[0006]
【課題を解決するための手段及び作用】本発明は上記実
情に鑑み成されたものであり上記従来技術の欠点を改良
し、皮膜−基体間−特に基体構成物質の拡散に着目し、
特に耐摩耗性に優れる被覆超硬合金を提供することを目
的とするもので有る。そのため、本発明の被覆超硬合金
は、ＷＣ−Ｃｏ系、ＷＣ−ＴｉＣＮ−ＴａＣ−Ｃｏ系の
表面に、まず、最内層として７００〜９００℃で被覆す
るＴｉＮまたはＴｉＣＮを被覆する。この皮膜は、通常
の化学蒸着法が１０００℃前後でおこなわれているのに
対し、１００〜３００℃低温化しているため、蒸着時、
膜質中に基体構成物質が拡散せず、さらに低温で蒸着さ
れるため微細な膜質が得られるため、２層目以降の蒸着
に際して温度を上げてももＣｏ等の拡散を防止する効果
が大きい。SUMMARY OF THE INVENTION The present invention has been made in view of the above circumstances and has improved the above-mentioned drawbacks of the prior art, focusing on the diffusion between a film and a substrate, particularly a substrate constituent substance,
In particular, the object is to provide a coated cemented carbide having excellent wear resistance. Therefore, in the coated cemented carbide of the present invention, the surface of the WC-Co type or WC-TiCN-TaC-Co type is first coated with TiN or TiCN as the innermost layer at 700 to 900 ° C. This film has a low temperature of 100 to 300 ° C., whereas the ordinary chemical vapor deposition method is carried out at around 1000 ° C.
The substance constituting the substrate does not diffuse into the film quality, and a fine film quality is obtained because it is vapor-deposited at a low temperature. Therefore, even if the temperature is increased during vapor deposition of the second and subsequent layers, the effect of preventing diffusion of Co and the like is great.
【０００７】本発明の超硬質合金基体の表面は、ＷＣ−
Ｃｏ系、ＷＣ−ＴｉＣＮ−ＴａＣ−Ｃｏ系、またはその
表面に脱ベータ層、脱バインダー処理等を行ったもので
もかまわない。低温で最内層を被覆するため、基体−皮
膜界面に生ずる脱炭層も生じにくく、いろいろな材種に
適用できる特徴がある。The surface of the cemented carbide substrate of the present invention is WC-
It may be a Co type, a WC-TiCN-TaC-Co type, or the surface of which is subjected to a debeta layer, a binder removal treatment, or the like. Since the innermost layer is coated at a low temperature, a decarburized layer formed at the substrate-coating interface is unlikely to occur, and it is characterized by being applicable to various material types.
【０００８】本発明における被覆方法としては、既知の
成膜法を応用することによって可能であり、例えば内層
を構成するＴｉＣＮまたはＴｉＮ皮膜については、蒸着
温度を７００〜９００℃で被覆すればよく Ｔｉ（ＣＨ3）ＣＮ＋２Ｈ2→ＴｉＣＮ＋４Ｈ（ＣＨ3） ＴｉＣｌ4＋２Ｎ2＋２Ｈ2→ＴｉＮ＋４ＨＣｌ ＣＨ4 →Ｃ＋２Ｈ2 Ｔｉ＋Ｃ →ＴｉＣ あるいは、 ＴｉＣｌ4＋２Ｈ2→Ｔｉ＋４ＨＣｌ Ｔｉ＋１／２Ｎ2 →ＴｉＮ のように、Ｔｉのハロゲン化物を気化し、還元及び炭化
あるいは窒化反応によって得ることができる。また本発
明は最内層を被覆するときだけ低温化し、２層目以降の
被覆に付いては通常の温度で行わないと成膜速度が遅く
なり非能率的である。The coating method in the present invention can be carried out by applying a known film forming method. For example, for the TiCN or TiN film constituting the inner layer, the vapor deposition temperature should be 700 to 900 ° C. (CH 3 ) CN + 2H 2 → TiCN + 4H (CH 3 ) TiCl 4 + 2N 2 + 2H 2 → TiN + 4HCl CH 4 → C + 2H 2 Ti + C → TiC or TiCl 4 + 2H 2 → Ti + 4HCl Ti + 1 / 2N 2 → TiN, Ti halide Can be obtained by vaporization and reduction and carbonization or nitriding reaction. Further, in the present invention, the temperature is lowered only when the innermost layer is coated, and the coating rate of the second and subsequent layers is inefficient because the deposition rate becomes slow unless it is performed at a normal temperature.
【０００９】次に、本発明においては、内層の厚さを
１．０〜５μｍ、２層目以降の厚さを０．５〜１０μｍ
とすることが望ましい。その理由はＴｉＮ、ＴｉＣＮの
うちのいずれか一種からなる内層の厚さが１．０μｍ未
満では拡散の防止が十分でなく、また５μｍを超えると
ＴｉＣＮ等の層は低温で化学蒸着しているため、厚膜に
するには、蒸着に長時間を要するためである。Next, in the present invention, the thickness of the inner layer is 1.0 to 5 μm, and the thickness of the second and subsequent layers is 0.5 to 10 μm.
Is desirable. The reason is that if the thickness of the inner layer made of any one of TiN and TiCN is less than 1.0 μm, diffusion is not sufficiently prevented, and if it exceeds 5 μm, the layer such as TiCN is chemically vapor-deposited at low temperature. This is because vapor deposition requires a long time to form a thick film.
【００１０】Ｔｉの炭化物、窒化物、炭窒化物、Ａｌ2
Ｏ3から構成される２層目以降の厚さが０．５μｍ未満
では耐摩耗性が不十分であり、また１０μｍを超えると
全体の厚さが厚くなり脆く成るため、欠損しやすくな
る。このため２層目以降の厚さは０．５〜１０μｍとす
るのが望ましい。また、この層の構造はＴｉの炭化物、
窒化物、炭窒化物を組み合わせた方が特性を効果的に発
揮できるため、多層とすることが望ましい。Carbide, nitride, carbonitride of Ti, Al 2
If the thickness of the second and subsequent layers made of O 3 is less than 0.5 μm, the abrasion resistance is insufficient, and if it exceeds 10 μm, the entire thickness becomes thick and brittle, so that the chip tends to be damaged. Therefore, the thickness of the second and subsequent layers is preferably 0.5 to 10 μm. The structure of this layer is Ti carbide,
A combination of nitride and carbonitride can exhibit the characteristics more effectively, so that it is desirable to use a multilayer structure.
【００１１】次ぎに、Ｗ強度比を ０≦Ｗ／（４ａ＋５
ａ＋６ａ＋Ｆｅ族）≦０．０４としたのは、０．０４を
越えると拡散により異相を生じ易くなり、また０が望ま
しいが２層目以降の膜質、膜厚等により蒸着時間、蒸着
温度が異なるためこの範囲とした。Ｃｏ強度比を ０≦
Ｃｏ／（４ａ＋５ａ＋６ａ＋Ｆｅ族）≦０．０２とした
のは０．０２を越えると拡散により異相を生じ易くな
り、また０が望ましいが２層目以降の膜質、膜厚等によ
り蒸着時間、蒸着温度が異なるため若干拡散を生ずるこ
ともありこの範囲とした。またＷ、Ｃｏともに基体より
拡散するものであるから、内層では量的に増えるが、最
外層に向かって濃度勾配を有し、特に２層目以降では、
ほぼ０であることが重要である。Next, the W intensity ratio is 0 ≦ W / (4a + 5)
a + 6a + Fe group) ≦ 0.04 is because if more than 0.04, a different phase is likely to occur due to diffusion, and 0 is desirable, but the vapor deposition time and vapor deposition temperature differ depending on the film quality and film thickness of the second and subsequent layers. This range is set. Co intensity ratio is 0 ≦
The reason that Co / (4a + 5a + 6a + Fe group) ≦ 0.02 is set is that if 0.02 is exceeded, a different phase is likely to occur due to diffusion. Since it is different, some diffusion may occur, so this range is set. Since both W and Co diffuse from the substrate, the amount increases in the inner layer, but there is a concentration gradient toward the outermost layer, and especially in the second and subsequent layers,
It is important that it is almost zero.
【００１２】[0012]
【実施例】次に本発明による被覆超硬質合金を実施例に
よって具体的に説明する。但し、本発明はこれら実施例
の範囲に限定されるものでないことは言うまでもない。
超硬質体の基体としてＷＣ７２％、８％ＴｉＣ、（Ｔａ
Ｎｂ）Ｃ１１％、Ｃｏ９％（重量％）なる組成に粉末を
配合し、真空中１４００℃で一時間焼結し、得られた焼
結体からＧ級のスローアウェィチップを作成した。EXAMPLES Next, the coated cemented carbide according to the present invention will be specifically described by way of examples. However, it goes without saying that the present invention is not limited to the scope of these examples.
72% WC, 8% TiC, (Ta
Nb) C11% and Co9% (weight%) was mixed with powder, and the mixture was sintered in vacuum at 1400 ° C. for 1 hour, and a G grade throwaway chip was prepared from the obtained sintered body.
【００１３】（１）試料Ｎｏ１の成膜条件 スローアウェィチップを耐熱合金製反応容器内で８００
℃に加熱し、２０Ｔｏｒｒの減圧化でＴｉ（ＣＨ3）Ｃ
Ｎ ４％ Ｎ2 ４％、Ｈ2 ９２％の割合で混合したガ
スを５ｌ／ｍｉｎの流量で送り、２時間反応させ２μｍ
のＴｉＣＮ被覆層を得た。その後１０Ｔｏｒｒに真空排
気し、１０００℃に昇温し、ＴｉＣｌ4４％ ＣＨ4 ４
％ Ｈ2 ９２％の割合で混合したガスを２０ｍｉｎ流
し、ＴｉＣ膜を生成し、ついでＮ2ガスを順次供給して
ＴｉＣＮ膜を３μｍ成膜した。ＡｌＣｌ3 ５％ ＣＯ2
５％、ＣＯ １５％ Ｈ2 ７５％の割合で混合した
ガスを供給し、温度は１０００℃、２時間保持し、１．
５μｍのＡｌ2Ｏ3層を被覆した。(1) Film-forming conditions for sample No. 1 Slow away chips were placed in a heat-resistant alloy reaction container for 800 times.
After heating to ℃ and reducing the pressure to 20 Torr, Ti (CH 3 ) C
Gas mixed with N 4% N 2 4% and H 2 92% was fed at a flow rate of 5 l / min and reacted for 2 hours to 2 μm.
A TiCN coating layer of Then, the chamber was evacuated to 10 Torr and heated to 1000 ° C., and TiCl 4 4% CH 4 4 was added.
A gas mixed with 92% of H 2 was flowed for 20 min to form a TiC film, and then N 2 gas was sequentially supplied to form a TiCN film of 3 μm. AlCl 3 5% CO 2
A mixed gas of 5% CO 15% H 2 75% was supplied, and the temperature was maintained at 1000 ° C. for 2 hours.
A 5 μm Al 2 O 3 layer was coated.
【００１４】（２）試料Ｎｏ２の成膜条件 耐熱合金製反応容器内で８００℃に加熱し、２０Ｔｏｒ
ｒの減圧化でＴｉＣｌ4 ４％ Ｎ2 ４％ Ｈ2 ９６
％の割合で混合したガスを５ｌ／ｍｉｎの流量で流し、
１時間反応させ２μｍのＴｉＮ被覆層を得た。その後、
試料Ｎｏ１と同様の方法により被覆した。 （３）試料Ｎｏ３の成膜条件 従来例のひとつである耐熱合金製反応容器内で１０００
℃に加熱し、２０Ｔｏｒｒの減圧化でＴｉＣｌ4 ４％
ＣＨ4 ２％ Ｎ2 ３０％、Ｈ2 ６４％の割合で混
合したガスを５ｌ／ｍｉｎの流量で流し、２時間反応さ
せ２μｍのＴｉＣＮ被覆層を得た。その後、試料Ｎｏ１
と同様の方法によりに被覆した。(2) Film-forming conditions for sample No. 2 Heated to 800 ° C. in a heat-resistant alloy reaction vessel and set to 20 Torr.
At a reduced pressure of r, TiCl 4 4% N 2 4% H 2 96
The mixed gas at a flow rate of 5 l / min,
The reaction was carried out for 1 hour to obtain a 2 μm TiN coating layer. afterwards,
The coating was performed by the same method as in sample No1. (3) Film-forming conditions for sample No. 3 1000 in a heat-resistant alloy reaction container, which is one of conventional examples.
Heated to ℃, reduced pressure of 20 Torr TiCl 4 4%
A gas mixed with CH 4 2% N 2 30% and H 2 64% was caused to flow at a flow rate of 5 l / min and reacted for 2 hours to obtain a 2 μm TiCN coating layer. After that, sample No1
Was coated by the same method.
【００１５】次いで、皮膜構造を調査するため、研摩し
ＴＥＭ（透過型電子顕微鏡）にて、組織観察・成分分析
を行いＷ、Ｃｏ、Ｔａ等の拡散の状況を測定した。その
結果を図１に示す。図１の結果より、従来製造方法で行
うと、基体中のＣｏ、Ｗ等の拡散がおおく、境界より数
ミクロンにわたり分析された。それに対し、低温で蒸着
した場合にはほとんど拡散が生じていなかった。Then, in order to investigate the film structure, polishing and TEM (transmission electron microscope) were used to observe the structure and analyze the components to measure the diffusion state of W, Co, Ta and the like. The result is shown in FIG. From the result of FIG. 1, when the conventional manufacturing method was used, the diffusion of Co, W, etc. in the substrate was small, and the analysis was conducted over several microns from the boundary. In contrast, when vapor deposition was performed at a low temperature, almost no diffusion occurred.
【００１６】これら３種のチップを用い以下の切削条
件、すなわち鋳物連続切削 被削材 ＦＣ２５（ＨＢ２３０） 切削速度 １８０ｍ／ｍｉｎ 送り ０．３ｍｍ／ｒｅｖ 切り込み １．５ｍｍ 水溶性切削油使用 で切削試験を行った。平均逃げ面摩耗量が０．４ｍｍ、
クレーター摩耗が０．１ｍｍのどちらかに達した時間を
寿命と判断した。Using these three types of chips, the following cutting conditions were used: casting continuous cutting work material FC25 (HB230) cutting speed 180 m / min feed 0.3 mm / rev depth of cut 1.5 mm cutting test using water-soluble cutting oil went. The average flank wear amount is 0.4 mm,
The time when the crater wear reached either 0.1 mm was judged as the life.
【００１７】試料Ｎｏ（３）のスローアウェイチップは
２５分間の切削で寿命に達しているのに対し、本発明に
よる（１）、（２）は表１から明からかなように４０〜
５０分間切削出来るた。また本発明によるチップの寿命
はいずれも平均逃げ面の摩耗によるものでありクレータ
ー摩耗は寿命まで切削してもブレークされず良好な摩耗
形態を示した。The indexable insert of sample No. (3) has reached the end of its life by cutting for 25 minutes, while (1) and (2) according to the present invention show 40 to 40 as apparent from Table 1.
It can be cut for 50 minutes. Further, the life of the chips according to the present invention was due to the wear of the average flank, and the crater wear did not break even after cutting to the end of the life and showed a good wear form.
【００１８】[0018]
【発明の効果】上述のように、本発明被覆超硬工具は、
最内層に微細かつ低温処理したＴｉＮまたはＴｉＣＮを
被覆し、２層目以降に通常温度で被覆したことにより、
最内層が基体中のＷ、Ｃｏ等の物質の拡散を防止するた
め、膜全体の耐摩耗性が向上し、膜質本来の性能が発揮
され、また２層目以降は通常の化学蒸着法により様々な
膜を被覆しても最内層に於いて拡散を防止しているため
影響が少ない。As described above, the coated carbide tool of the present invention is
By coating the innermost layer with fine and low-temperature treated TiN or TiCN and coating the second and subsequent layers at normal temperature,
Since the innermost layer prevents the diffusion of substances such as W and Co in the substrate, the abrasion resistance of the entire film is improved, the original performance of the film quality is exhibited, and the second and subsequent layers can be varied by ordinary chemical vapor deposition methods. Even if it is covered with a different film, it has little influence because it prevents diffusion in the innermost layer.
【図１】図１は透過型電子顕微鏡による、本発明被覆超
硬工具の基体表面から最外層に向かっての成分分析の結
果を示す。FIG. 1 shows the results of component analysis from the substrate surface of the coated cemented carbide tool of the present invention toward the outermost layer by a transmission electron microscope.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 松根 厳 東京都江東区東陽４−１−13 日立ツール 株式会社内 (72)発明者 鷲見 暁夫 千葉県成田市新泉13番地の２ 日立ツール 株式会社成田工場内 (72)発明者 高橋 利尚 東京都江東区東陽４−１−13 日立ツール 株式会社内 (72)発明者 植田 広志 千葉県成田市新泉13番地の２ 日立ツール 株式会社成田工場内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Takeshi Matsune, 4-1-13 Toyo, Koto-ku, Tokyo Hitachi Tool Co., Ltd. (72) Inventor Akio Washimi, 13 Shinnai, Narita, Chiba Prefecture Hitachi Tool Co., Ltd. Narita Inside the factory (72) Inventor Toshihisa Takahashi 4-1-13 Toyo, Koto-ku, Tokyo Inside Hitachi Tool Co., Ltd. (72) Inventor Hiroshi Ueda 2 13 Shinshin, Narita-shi, Chiba Inside Hitachi Tool Co., Ltd. Narita factory
Claims (2)
物、窒化物、炭窒化物の一種以上とＦｅ、Ｎｉ、Ｃｏ、
Ｗ、Ｍｏ、Ｃｒの一種以上とよりなる超硬質合金を基体
とし、基体表面より２層以上被覆し、かつ内層の厚さを
１．０〜５μｍ、２層目以降の厚さを０．５〜１０μｍ
とする被覆工具において、基体表面より被覆外層に向か
って基体中の主成分であるＷ、Ｃｏの拡散がｘ線強度比
に於いて Ｗ強度比 ０≦Ｗ／（４ａ＋５ａ＋６ａ＋Ｆｅ族）≦０．０４ Ｃｏ強度比 ０≦Ｃｏ／（４ａ＋５ａ＋６ａ＋Ｆｅ族）≦０．０２ の範囲内であることを特徴とする被覆工具。1. One or more of carbides, nitrides and carbonitrides of groups 4a, 5a and 6a of the periodic table and Fe, Ni, Co,
A base material is a super-hard alloy composed of one or more of W, Mo, and Cr, the base material surface is coated with two or more layers, and the inner layer has a thickness of 1.0 to 5 μm and the second and subsequent layers have a thickness of 0.5. ~ 10 μm
In the coated tool, the diffusion of W and Co, which are the main components in the substrate, from the surface of the substrate toward the coating outer layer is the X-ray intensity ratio. W intensity ratio 0 ≦ W / (4a + 5a + 6a + Fe group) ≦ 0.04 Co A coated tool having a strength ratio of 0 ≦ Co / (4a + 5a + 6a + Fe group) ≦ 0.02.
面より被覆外層に向かって基体中の主成分であるＷ、Ｃ
ｏの拡散が最内層に於いて、濃度勾配を有し、かつ、２
層目以降に於いてはほぼ０であることを特徴とする被覆
工具。2. The coated tool according to claim 1, wherein W and C which are the main components in the substrate from the surface of the substrate toward the outer coating layer.
The diffusion of o has a concentration gradient in the innermost layer, and 2
The coated tool is characterized in that it is almost 0 after the first layer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7529792A JP2733809B2 (en) | 1992-02-26 | 1992-02-26 | Coated tool |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7529792A JP2733809B2 (en) | 1992-02-26 | 1992-02-26 | Coated tool |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH05237707A true JPH05237707A (en) | 1993-09-17 |
| JP2733809B2 JP2733809B2 (en) | 1998-03-30 |
Family
ID=13572175
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7529792A Expired - Fee Related JP2733809B2 (en) | 1992-02-26 | 1992-02-26 | Coated tool |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2733809B2 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2013157472A1 (en) | 2012-04-19 | 2013-10-24 | 住友電工ハードメタル株式会社 | Surface-coated cutting tool |
| WO2014054591A1 (en) * | 2012-10-01 | 2014-04-10 | 日立ツール株式会社 | Hard film coating tool and method for manufacturing said tool |
| KR20190032454A (en) | 2016-08-25 | 2019-03-27 | 스미또모 덴꼬오 하드메탈 가부시끼가이샤 | Cutting tool and manufacturing method thereof |
| JP2020151805A (en) * | 2019-03-20 | 2020-09-24 | 三菱マテリアル株式会社 | Surface-coated cutting tool with hard coating layer exhibiting excellent wear resistance |
-
1992
- 1992-02-26 JP JP7529792A patent/JP2733809B2/en not_active Expired - Fee Related
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2013157472A1 (en) | 2012-04-19 | 2013-10-24 | 住友電工ハードメタル株式会社 | Surface-coated cutting tool |
| EP3064610A1 (en) | 2012-04-19 | 2016-09-07 | Sumitomo Electric Hardmetal Corp. | Surface-coated cutting tool |
| US9457407B2 (en) | 2012-04-19 | 2016-10-04 | Sumitomo Electric Hardmetal Corp. | Surface-coated cutting tool |
| WO2014054591A1 (en) * | 2012-10-01 | 2014-04-10 | 日立ツール株式会社 | Hard film coating tool and method for manufacturing said tool |
| CN104703734A (en) * | 2012-10-01 | 2015-06-10 | 日立工具股份有限公司 | Hard film coating tool and method for manufacturing said tool |
| JPWO2014054591A1 (en) * | 2012-10-01 | 2016-08-25 | 三菱日立ツール株式会社 | Hard film coated tool and manufacturing method thereof |
| US9534292B2 (en) | 2012-10-01 | 2017-01-03 | Hitachi Tool Engineering, Ltd. | Hard-coated tool and its production method |
| KR20190032454A (en) | 2016-08-25 | 2019-03-27 | 스미또모 덴꼬오 하드메탈 가부시끼가이샤 | Cutting tool and manufacturing method thereof |
| US11020805B2 (en) | 2016-08-25 | 2021-06-01 | Sumitomo Electric Hardmetal Corp. | Cutting tool and method for manufacturing the same |
| JP2020151805A (en) * | 2019-03-20 | 2020-09-24 | 三菱マテリアル株式会社 | Surface-coated cutting tool with hard coating layer exhibiting excellent wear resistance |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2733809B2 (en) | 1998-03-30 |
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