JPH0527456A - Photosensitive material and its production - Google Patents
Photosensitive material and its productionInfo
- Publication number
- JPH0527456A JPH0527456A JP3761291A JP3761291A JPH0527456A JP H0527456 A JPH0527456 A JP H0527456A JP 3761291 A JP3761291 A JP 3761291A JP 3761291 A JP3761291 A JP 3761291A JP H0527456 A JPH0527456 A JP H0527456A
- Authority
- JP
- Japan
- Prior art keywords
- coating
- silicone oil
- layer
- group
- charge
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Photoreceptors In Electrophotography (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は電子写真に用いられる高
画質、高耐久性の感光体及びその製造方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a photoreceptor having high image quality and high durability used in electrophotography and a method for producing the same.
【0002】[0002]
【従来の技術】従来負帯電性の感光体において、表面層
を形成する電荷輸送層中にシリコーンオイルを含有せし
めて塗布加工性を改善し、塗布加工に基因して発生する
感光体の画像欠陥を改善する技術は、例えば特公平2-46
938号に提案されている。即ち該公報においては、フィ
ルム状支持体上に電荷発生層を設け、該層上にシリコー
ンオイルを固形分に対して0.001〜0.5wt%(10〜5000pp
m)含有する電荷輸送層を設けた感光体が記載されてい
る。なお前記公報の具体的実施例中には、前記電荷輸送
層用塗布液をスリットコータにより電荷発生層上に塗布
加工することが記載されている。2. Description of the Related Art In a conventional negatively charged photoreceptor, a charge transport layer forming a surface layer contains silicone oil to improve coating workability and image defects of the photoreceptor caused by coating work. Techniques for improving
Proposed in No. 938. That is, in this publication, a charge generating layer is provided on a film-shaped support, and silicone oil is added to the layer in an amount of 0.001 to 0.5 wt% (10 to 5000 pp) based on the solid content.
m) A photoreceptor provided with a charge transport layer containing is described. In the specific examples of the above publications, it is described that the charge transport layer coating liquid is applied to the charge generation layer by a slit coater.
【0003】[0003]
【発明が解決しようとする問題点】ところで前記公報記
載の感光体は、電荷発生層を下層とし、電荷輸送層を上
層とした負帯電性の感光体であり、像形成時コロナ放電
器により負の帯電を付与する際オゾンが多量に発生して
環境を悪化せしめるという問題があり、電荷輸送層を下
層とし、電荷発生層を上層とした感光体であって、帯電
時オゾンの発生が少ない正帯電用感光体の開発が望まれ
る。The photoreceptor described in the above publication is a negatively chargeable photoreceptor having a charge generation layer as a lower layer and a charge transport layer as an upper layer, and is negatively charged by a corona discharger during image formation. However, there is a problem that a large amount of ozone is generated when the electric charge is applied, and the environment is deteriorated.Therefore, the photoconductor has a charge transport layer as a lower layer and a charge generation layer as an upper layer, and ozone is less likely to be generated during charging. Development of a charging photoreceptor is desired.
【0004】通常、電荷発生層のような薄膜を支持体上
に形成する場合は、シリコーンオイル等の表面平滑剤を
用いる必要がないとされている。即ち電荷発生層は通常
1μm以下の薄層とされるため塗布液を塗布した後、乾
燥過程で対流現象等に基づく表面性悪化を生ずる暇もな
く乾燥が終了する。このため特に前記表面性の悪化を防
止するための例えばシリコーンオイル等の表面平滑剤を
用いる必要がない。It is generally said that it is not necessary to use a surface smoothing agent such as silicone oil when forming a thin film such as a charge generating layer on a support. That is, since the charge generation layer is usually a thin layer having a thickness of 1 μm or less, after the application of the coating solution, the drying is completed without any time during which the surface property is deteriorated due to a convection phenomenon or the like. Therefore, it is not necessary to use a surface smoothing agent such as silicone oil for preventing the deterioration of the surface property.
【0005】他方電荷輸送層のような厚膜を支持体上に
形成する場合、特に前記特公平2-46938号の場合のよう
に良好な表面性が要請される表面層として電荷輸送層を
形成する場合は、シリコーンオイル等の表面平滑剤の使
用が必要とされる。即ち電荷輸送層は通常10〜30μmの
層厚が必要であって、塗布後の乾燥が長引き、乾燥の過
程で塗膜中に対流現象を生じて感光層の表面性を悪化さ
せるので、該対流現象を阻止して平滑な表面層の形成に
寄与するシリコーンオイル等の表面平滑剤の使用が必要
となる。On the other hand, when a thick film such as a charge transport layer is formed on a support, the charge transport layer is formed as a surface layer which is required to have good surface properties, as in the case of JP-B-2-46938. If so, the use of a surface smoothing agent such as silicone oil is required. That is, the charge transport layer usually requires a layer thickness of 10 to 30 μm, and drying after coating is prolonged, and a convection phenomenon occurs in the coating film during the drying process to deteriorate the surface property of the photosensitive layer. It is necessary to use a surface smoothing agent such as silicone oil that prevents the phenomenon and contributes to the formation of a smooth surface layer.
【0006】そこで前記公報記載の感光体の場合のよう
に下層の電荷発生層にはシリコーンオイルを含ませず、
上層の電荷輸送層にシリコーンオイルを含有させること
により、前記下層の電荷発生層も上層の電荷輸送層も共
に良好な塗膜が得られ、電子写真特性に優れた感光体が
得られる。しかしながら本発明者等の実験によれば、前
記オゾン対策として下層に電荷輸送層を設け、上層に電
荷発生層を設けて正帯電用感光体をうる場合は全く状況
が異なってくる。即ち下層のシリコーンオイルを含む電
荷輸送層上に電荷発生用の塗布液を塗布する場合、その
ままでは、塗布液の濡れが悪く、はじきを生じて良好な
電荷発生層の形成が困難であった。Therefore, unlike the case of the photoreceptor described in the above publication, the lower charge generation layer does not contain silicone oil,
By containing silicone oil in the upper charge transport layer, a good coating film can be obtained for both the lower charge generation layer and the upper charge transport layer, and a photoreceptor having excellent electrophotographic characteristics can be obtained. However, according to the experiments conducted by the present inventors, the situation is completely different when a positive charge photoconductor is obtained by providing a charge transport layer as a lower layer and a charge generating layer as an upper layer as countermeasures against ozone. That is, when the coating liquid for charge generation is applied onto the lower layer of the charge transport layer containing silicone oil, the wetness of the coating liquid is poor as it is, and repellency occurs, making it difficult to form a favorable charge generation layer.
【0007】本発明の目的は前記の問題を排除して、高
画質、高耐久性が付与された感光体及び塗布加工性、生
産性にすぐれた前記感光体の製造方法を提供することに
ある。SUMMARY OF THE INVENTION An object of the present invention is to eliminate the above-mentioned problems and provide a photoreceptor having high image quality and high durability and a method for producing the photoreceptor having excellent coating processability and productivity. .
【0008】[0008]
【問題点を解決するための手段】本発明者等はこの問題
につき鋭意検討を加えた結果、前記はじきの原因が下層
としての電荷輸送層の表面と、上層として塗布する電荷
輸送層用塗布液との相互関係にあることに気付き、本発
明を完成したのである。The inventors of the present invention have made extensive studies on this problem, and as a result, the cause of the repellency is that the surface of the charge transport layer as the lower layer and the coating liquid for the charge transport layer to be applied as the upper layer. It was found that there is a mutual relationship with and completed the present invention.
【0009】即ち前記本発明の目的は;導電性支持体上
に、電荷輸送層及び電荷発生層をこの順に積層して成る
感光層を有する電子写真感光体において、前記電荷輸送
層及び電荷発生層の各層がシリコーンオイルを含有し、
該各層のシリコーンオイルの濃度(ppm)が下記式−
(1)及び式−(2)を満足することを特徴とする感光
体、及び前記感光体の製造方法として、円筒状導電性支
持体上に設ける前記電荷発生層用及び電荷輸送層用の夫
々の塗布液が、形成された両層において夫々下記式−
(1)及び−(2)に規定する濃度(ppm)のシリコー
ンオイルを含有し、かつ少なくとも電荷発生層の塗布加
工を、前記円筒状導電性支持体に塗布液が囲繞、接触す
る円筒体塗布機を用いて行うことを特徴とする感光体の
製造方法によって達成される。That is, the object of the present invention is to provide an electrophotographic photoreceptor having a photosensitive layer formed by laminating a charge transport layer and a charge generating layer in this order on a conductive support, wherein the charge transport layer and the charge generating layer are provided. Each layer contains silicone oil,
The concentration (ppm) of silicone oil in each layer is expressed by the following formula-
(1) and the formula- (2) are satisfied, and a method for producing the photoconductor, the charge generation layer and the charge transport layer provided on a cylindrical conductive support, respectively. And the coating liquid of
Cylindrical body coating containing a silicone oil having a concentration (ppm) defined in (1) and-(2), and at least coating processing of the charge generation layer is performed by surrounding and contacting the coating liquid with the cylindrical conductive support. It is achieved by a method for producing a photoconductor, which is performed by using a machine.
【0010】式−(1):〔Q〕≧〔P〕+1000
式−(2):〔Q〕≦10000
但し〔Q〕は電荷発生層中のシリコーンオイルの濃度
(ppm)、〔P〕は輸送層中のシリコーンオイルの濃度
(ppm)を表す。Formula- (1): [Q] ≧ [P] +1000 Formula- (2): [Q] ≦ 10,000 where [Q] is the concentration (ppm) of silicone oil in the charge generation layer, and [P] is Indicates the concentration (ppm) of silicone oil in the transport layer.
【0011】なお、本発明実施態様においては、前記シ
リコーンオイルとしては、メチルフェニルシリコーンオ
イルが好ましい。In the embodiment of the present invention, methylphenyl silicone oil is preferable as the silicone oil.
【0012】即ち本発明の感光体においては、導電性支
持体上に下層としてシリコーンオイルを含有させた電荷
輸送層を設け、この上に上層として前記電荷輸送層のシ
リコーンオイルより高濃度にシリコーンオイルを含有さ
せた電荷発生層を設けて高画質、高耐久性を与えるもの
である。That is, in the photoreceptor of the present invention, a charge transport layer containing silicone oil is provided as a lower layer on a conductive support, and a silicone oil having a higher concentration than the silicone oil of the charge transport layer is provided as an upper layer thereon. Is provided to provide high image quality and high durability.
【0013】又、本発明の感光体の製造方法としては、
円筒状導電性支持体に前記に規定した、シリコーンオイ
ルの含有関係の電荷輸送層用及び電荷発生層用の塗布液
を用い少なくとも上層となる電荷発生層の塗布加工には
円形スライドホッパ塗布機、円形押出し塗布機又は円形
少量デイップ塗布機等の塗布加工精度及び加工能率に優
れた円筒体塗布機を用いる。Further, as a method for producing the photoreceptor of the present invention,
A circular slide hopper coater is used to coat at least the upper charge-generating layer using the coating liquid for the charge-transporting layer and the charge-generating layer related to the inclusion of silicone oil in the cylindrical conductive support described above. A cylindrical body coating machine such as a circular extrusion coating machine or a circular small amount dip coating machine which is excellent in coating processing accuracy and processing efficiency is used.
【0014】本発明に係る前記電荷輸送層及び電荷発生
層に含有されるシリコーンオイルとしては、例えばアル
キルシリコーンオイル、アリールシリコーンオイル、ア
ルキルアリールシリコーンオイル等から選択され、該シ
リコーンオイルを前記電荷輸送層及び電荷発生層の両層
に含有せしめる。The silicone oil contained in the charge transport layer and the charge generation layer according to the present invention is selected from, for example, alkyl silicone oil, aryl silicone oil, alkylaryl silicone oil and the like, and the silicone oil is used in the charge transport layer. And in both layers of the charge generation layer.
【0015】一方の層のみに含有せしめた場合は、電荷
輸送層若しくは電荷発生層用塗布液を塗布する際のはじ
き、ゆず肌、塗布むら、塗布筋、ぽち等の塗布欠陥を防
止することができない。When it is contained in only one layer, it is possible to prevent coating defects such as cissing, orange peel, uneven coating, streaks and spots when the coating solution for the charge transport layer or the charge generating layer is applied. Can not.
【0016】なお前記塗布欠陥を防止する上でメチルフ
ェニルシリコーンオイルがすぐれており、特にフェニル
基の含有量が10%〜25%のメチルフェニルシリコーンオ
イルがすぐれている。かかるメチルフェニルシリコーン
オイルは既に市販されていて、例えば信越化学工業(株)
社製のKF-50、KF-54、KF-56、トーレシリコーン(株)社
製のTSF431、TSF443、TSF437等が好ましく用いられる。
これらのシリコーンオイルは塗布液中への溶解性がよい
ため、下層としての電荷輸送層中に均一含有されてい
て、この上に同じく前記シリコーンオイルを含有する電
荷発生層塗布液を塗布した際、該塗布液が下層表面全域
に均一に延展して塗布され、はじき、塗布むら、塗布筋
等のない均一な電荷発生層の薄層が形成される。Methylphenyl silicone oil is excellent in preventing the coating defects, and particularly methylphenyl silicone oil having a phenyl group content of 10% to 25% is excellent. Such methylphenyl silicone oil is already commercially available, for example, Shin-Etsu Chemical Co., Ltd.
KF-50, KF-54 and KF-56 manufactured by Toray Silicone Co., Ltd. and TSF431, TSF443 and TSF437 manufactured by Toray Silicone Co., Ltd. are preferably used.
Since these silicone oils have good solubility in the coating liquid, they are uniformly contained in the charge transport layer as the lower layer, and when the charge generation layer coating liquid also containing the silicone oil is applied thereon, The coating solution is spread evenly over the entire surface of the lower layer and is applied to form a uniform thin layer of the charge generation layer without repelling, coating unevenness, coating streaks and the like.
【0017】ここで前記電荷発生層中のシリコーンオイ
ルの濃度〔Q〕は10000ppm以下、好ましくは1010〜1000
0ppmであり、電荷輸送層中の前記シリコーンオイルの濃
度〔P〕は前記電荷発生層中のシリコーンオイルの濃度
〔Q〕より少なくとも1000ppm少なく、好ましくは10〜9
000ppmの範囲に押えられる。The concentration [Q] of the silicone oil in the charge generation layer is 10,000 ppm or less, preferably 1010 to 1000.
0 ppm, and the concentration [P] of the silicone oil in the charge transport layer is at least 1000 ppm less than the concentration [Q] of the silicone oil in the charge generation layer, preferably 10-9.
It is suppressed to the range of 000ppm.
【0018】前記電荷発生層中のシリコーンオイルの濃
度〔Q〕が10000ppmを上廻ると、液垂れを生じ静電特性
を悪化し、1010ppmを下廻るとはじき、ゆず肌、塗布む
ら、塗布筋等の塗布欠陥を発生する。又電荷輸送層中の
シリコーンオイル濃度〔P〕が9000ppmを越えると液垂
れを生じ、静電特性も悪化し、10ppmを下廻るとゆず
肌、塗布むら、塗布筋等の塗布欠陥を発生する。When the concentration [Q] of the silicone oil in the charge generating layer exceeds 10,000 ppm, liquid dripping occurs and the electrostatic characteristics deteriorate, and when it falls below 1010 ppm, repelling, orange peel, uneven coating, coating streaks, etc. Causes coating defects. Further, when the silicone oil concentration [P] in the charge transport layer exceeds 9000 ppm, dripping occurs and the electrostatic characteristics deteriorate, and when it is less than 10 ppm, coating defects such as orange peel, coating unevenness and coating streaks occur.
【0019】なお、電荷発生層中のシリコーンオイル濃
度〔Q〕が電荷輸送層中のシリコーンオイル濃度〔P〕
より1000ppm以上多くないとはじきを生じて良好な塗膜
の形成が困難となる。The silicone oil concentration [Q] in the charge generation layer is equal to the silicone oil concentration [P] in the charge transport layer.
If the amount is more than 1000 ppm, cissing occurs and it becomes difficult to form a good coating film.
【0020】又前記感光体の製造に際しては、前記シリ
コーンオイル、好ましくはメチルフェニルシリコーンオ
イルを電荷発生層用塗布液及び電荷輸送層用塗布液中
に、塗布・乾燥後前記の量関係となるように溶解して含
有せしめる。次いで円筒状支持体上に必要により中間層
を形成した後、前記電荷輸送層用塗布液を浸漬塗布、ス
プレー塗布、ビーム塗布、スパイラル塗布、円形スライ
ドホッパ塗布、円形押出し塗布若しくは円形少量デイッ
プ塗布等の円筒体塗布機のいずれかにより塗布して電荷
輸送層を形成し、この上に前記円筒体塗布機を用いて前
記電荷発生層用塗布液を塗布して電荷発生層が形成され
る。In the production of the photoreceptor, the silicone oil, preferably methylphenyl silicone oil, is applied to the charge generating layer coating liquid and the charge transporting layer coating liquid so as to have the above amount relationship after coating and drying. It is dissolved in and contained. Then, after forming an intermediate layer on the cylindrical support, if necessary, the charge transport layer coating solution is applied by dip coating, spray coating, beam coating, spiral coating, circular slide hopper coating, circular extrusion coating or circular small amount dip coating. To form a charge-transporting layer, and the charge-generating layer coating solution is applied onto the charge-transporting layer by using the cylinder coating machine to form a charge-generating layer.
【0021】ここで前記円筒体塗布機は下層を溶解する
暇がない程高速で均一塗布が可能であり、中でも電荷発
生層のように分散液を薄層に塗布する場合、特に該電荷
発生層を表面層として形成する場合に適している。The cylindrical coater is capable of uniform coating at such a high speed that there is no time to dissolve the lower layer, and particularly when the dispersion is applied in a thin layer like the charge generating layer, the charge generating layer is particularly preferable. Is suitable as a surface layer.
【0022】本発明に係る前記電荷輸送層中に含有され
る電荷輸送物質としては、例えばオキサゾール誘導体、
オキサジアゾール誘導体、チアゾール誘導体、チアジア
ゾール誘導体、トリアゾール誘導体、イミダゾール誘導
体、イミダゾロン誘導体、イミダゾリジン誘導体、ビス
イミダゾリン誘導体、スチリル化合物、ヒドラゾン化合
物、ピラゾリン誘導体、オキサゾロン誘導体、ベンゾチ
アゾール誘導体、ベンゾイミダゾール誘導体、キナゾリ
ン誘導体、ベンゾフラン誘導体、アフリジン誘導体、フ
ェナジン誘導体、アミノスチルベン誘導体、ポリ-N-ビ
ニルカルバゾール、ポリ-1-ビニルピレン、ポリ9-ビニ
ルアントラセン等を挙げることができる。Examples of the charge transport material contained in the charge transport layer according to the present invention include oxazole derivatives,
Oxadiazole derivative, thiazole derivative, thiadiazole derivative, triazole derivative, imidazole derivative, imidazolone derivative, imidazolidine derivative, bisimidazoline derivative, styryl compound, hydrazone compound, pyrazoline derivative, oxazolone derivative, benzothiazole derivative, benzimidazole derivative, quinazoline derivative , Benzofuran derivative, afridine derivative, phenazine derivative, aminostilbene derivative, poly-N-vinylcarbazole, poly-1-vinylpyrene, poly-9-vinylanthracene and the like.
【0023】前記電荷輸送物質のうち特に好ましいもの
として、一般式(1)のカルバゾール誘導体、一般式
(2)〜(5)のヒドラゾン化合物、一般式(6)のピ
ラゾリン誘導体、一般式(7)のスチリル化合物及び一
般式(8)のアミン誘導体がある。Of the above-mentioned charge-transporting substances, particularly preferred are carbazole derivatives of the general formula (1), hydrazone compounds of the general formulas (2) to (5), pyrazoline derivatives of the general formula (6), and general formula (7). The styryl compound and the amine derivative of the general formula (8).
【0024】[0024]
【化1】 [Chemical 1]
【0025】前記一般式(1)中、R1は置換若しくは
無置換のアリール基、R2は水素原子、ハロゲン原子、
置換若しくは無置換のアルキル基、アルコキシ基、アミ
ノ基、水酸基、置換アミノ基、R3は置換若しくは無置
換のアリール基、置換若しくは無置換の複素環基を表
す。In the general formula (1), R 1 is a substituted or unsubstituted aryl group, R 2 is a hydrogen atom, a halogen atom,
A substituted or unsubstituted alkyl group, an alkoxy group, an amino group, a hydroxyl group, a substituted amino group, R 3 represents a substituted or unsubstituted aryl group or a substituted or unsubstituted heterocyclic group.
【0026】[0026]
【化2】 [Chemical 2]
【0027】前記一般式(2)中、R4、R5はそれぞ
れ、水素原子又はハロゲン原子、R6、R7はそれぞれ、
置換若しくは無置換のアリール基、Ar1は置換若しくは
無置換のアリーレン基を表す。In the general formula (2), R 4 and R 5 are each a hydrogen atom or a halogen atom, and R 6 and R 7 are each a
A substituted or unsubstituted aryl group and Ar 1 represents a substituted or unsubstituted arylene group.
【0028】前記一般式(3)中、R8は置換若しくは
無置換のアリール基又は置換若しくは無置換の複素環
基、R9は水素原子、置換若しくは無置換のアルキル基
又は、置換若しくは無置換のアリール基、Qは水素原
子、ハロゲン原子、アルキル基、置換アミノ基、アルコ
キシ基又はシアノ基、pは0又は1の整数を表す。In the general formula (3), R 8 is a substituted or unsubstituted aryl group or a substituted or unsubstituted heterocyclic group, R 9 is a hydrogen atom, a substituted or unsubstituted alkyl group, or a substituted or unsubstituted , An aryl group, Q is a hydrogen atom, a halogen atom, an alkyl group, a substituted amino group, an alkoxy group or a cyano group, and p is an integer of 0 or 1.
【0029】前記一般式(4)中、R10は置換若しくは
無置換のアリール基又は置換若しくは無置換の複素環
基、R11は水素原子、置換若しくは無置換のアルキル基
又は置換若しくは無置換のアリール基、Xは水素原子、
ハロゲン原子、アルキル基、置換アミノ基、アルコキシ
基又はシアノ基、qは0又は1の整数を表す。In the general formula (4), R 10 is a substituted or unsubstituted aryl group or a substituted or unsubstituted heterocyclic group, and R 11 is a hydrogen atom, a substituted or unsubstituted alkyl group or a substituted or unsubstituted alkyl group. An aryl group, X is a hydrogen atom,
Halogen atom, alkyl group, substituted amino group, alkoxy group or cyano group, q represents an integer of 0 or 1.
【0030】[0030]
【化3】 [Chemical 3]
【0031】前記一般式(5)中、Dは、置換若しくは
無置換のフェニル基、置換若しくは無置換のカルバゾリ
ル基を表す。In the above general formula (5), D represents a substituted or unsubstituted phenyl group or a substituted or unsubstituted carbazolyl group.
【0032】具体的には前記の基が挙げられる。Specific examples include the above groups.
【0033】R12、R13は置換若しくは無置換のアルキ
ル基、置換若しくは無置換のアラルキル基、又は置換若
しくは無置換のアリール基を表す。R 12 and R 13 represent a substituted or unsubstituted alkyl group, a substituted or unsubstituted aralkyl group, or a substituted or unsubstituted aryl group.
【0034】アルキル基としては、メチル基、エチル
基、プロピル基、ブチル基等が挙げられ、アラルキル基
としてはベンジル基、フェネチル基等が挙げられ、アリ
ール基としてはフェニル基、α-ナフチル基、β-ナフチ
ル基等が挙げられる。置換基としては、ハロゲン原子、
アルキル基、アルコキシ基、置換アミノ基(ジメチルア
ミノ基、ジエチルアミノ基、ジプロピルアミノ基、ジベ
ンジルアミノ基)等が例示される。The alkyl group includes a methyl group, an ethyl group, a propyl group, a butyl group and the like, the aralkyl group includes a benzyl group and a phenethyl group, and the aryl group includes a phenyl group and an α-naphthyl group. Examples include β-naphthyl group and the like. As the substituent, a halogen atom,
Examples thereof include alkyl groups, alkoxy groups, substituted amino groups (dimethylamino group, diethylamino group, dipropylamino group, dibenzylamino group) and the like.
【0035】R14、R15、R21はR12、R13と同様のも
のを表す。R16、R17、R18、R19、R20、R22はアル
キル基、アルコキシ基、ハロゲン原子等を表す。R 14 , R 15 and R 21 are the same as R 12 and R 13 . R 16 , R 17 , R 18 , R 19 , R 20 , and R 22 represent an alkyl group, an alkoxy group, a halogen atom, or the like.
【0036】[0036]
【化4】 [Chemical 4]
【0037】前記一般式(6)中、lは0又は1の整
数、R23、R24、R25は置換若しくは無置換のアリール
基、R26、R27は水素原子、炭素原子数1〜4のアルキ
ル基、又は置換若しくは無置換のアリール基若しくはア
ラルキル基(但、R26及びR27は共に水素原子であるこ
とはなく、lが0のときはR26は水素原子ではない。)
である。In the general formula (6), l is an integer of 0 or 1, R 23 , R 24 and R 25 are substituted or unsubstituted aryl groups, R 26 and R 27 are hydrogen atoms, and have 1 to 10 carbon atoms. 4 or a substituted or unsubstituted aryl group or aralkyl group (provided that R 26 and R 27 are not both hydrogen atoms, and when l is 0, R 26 is not a hydrogen atom).
Is.
【0038】前記一般式(7)中、R28、R29は置換若
しくは無置換のアルキル基、フェニル基を表し、置換基
としてはアルキル基、アルコキシ基、フェニル基を用い
る。R30は置換若しくは無置換のフェニル基、ナフチル
基、アントリル基、フルオレニル基又は複素環基を表
し、置換基としてはアルキル基、アルコキシ基、ハロゲ
ン原子、水酸基、フェニル基を用いる。R31は水素原
子、置換若しくは無置換のアルキル基、フェニル基を表
す。R32、R33、R34、R35は水素原子、ハロゲン原
子、アルキル基、アルコキシ基又はアルキルアミノ基を
表す。In the above general formula (7), R 28 and R 29 represent a substituted or unsubstituted alkyl group or phenyl group, and as the substituent, an alkyl group, an alkoxy group or a phenyl group is used. R 30 represents a substituted or unsubstituted phenyl group, naphthyl group, anthryl group, fluorenyl group or heterocyclic group, and as a substituent, an alkyl group, an alkoxy group, a halogen atom, a hydroxyl group or a phenyl group is used. R 31 represents a hydrogen atom, a substituted or unsubstituted alkyl group or a phenyl group. R 32 , R 33 , R 34 and R 35 represent a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group or an alkylamino group.
【0039】前記一般式(8)中、Ar2、Ar3は置換若し
くは無置換のフェニル基を表し、置換基としてはハロゲ
ン原子、アルキル基、ニトロ基、アルコキシ基を用い
る。In the general formula (8), Ar 2 and Ar 3 represent a substituted or unsubstituted phenyl group, and a halogen atom, an alkyl group, a nitro group or an alkoxy group is used as the substituent.
【0040】Ar4は置換若しくは無置換のフェニル基、
ナフチル基、アントリル基、フルオレニル基、複素環基
を表し、置換基としてはアルキル基、アルコキシ基、ハ
ロゲン原子、水酸基、アリールオキシ基、アリール基、
アミノ基、ニトロ基、ピペリジノ基、モルホリノ基、ナ
フチル基、アンスリル基及び置換アミノ基を用いる。但
し、置換アミノ基の置換基としてアシル基、アルキル
基、アリール基、アラルキル基を用いる。Ar 4 is a substituted or unsubstituted phenyl group,
Naphthyl group, anthryl group, fluorenyl group, represents a heterocyclic group, the substituent is an alkyl group, an alkoxy group, a halogen atom, a hydroxyl group, an aryloxy group, an aryl group,
An amino group, a nitro group, a piperidino group, a morpholino group, a naphthyl group, an anthryl group and a substituted amino group are used. However, an acyl group, an alkyl group, an aryl group, or an aralkyl group is used as a substituent of the substituted amino group.
【0041】前記一般式(1)〜一般式(8)に含まれ
る具体的化合物例は例えば特開昭60-172044号第6頁下
右欄2行目〜第21頁上右欄20行目に記載されている。Examples of specific compounds contained in the above general formulas (1) to (8) are, for example, JP-A-60-172044, page 6, lower right column, line 2 to page 21, upper right column, line 20. It is described in.
【0042】次に本発明の電荷発生層中に含有される電
荷発生物質としては;
(1)モノアゾ顔料、ポリアゾ顔料、金属錯塩アゾ顔
料、ピラゾロンアゾ顔料、スチルベンアゾ顔料及びチア
ゾールアゾ顔料等のアゾ系顔料
(2)ペリレン酸無水物及びペリレン酸イミド等のペリ
レン系顔料
(3)アントラキノン誘導体、アントアントロン誘導
体、ジベンズピレンキノン誘導体、ピラントロン誘導
体、ビオラントロン誘導体及びイソビオラントロン誘導
体等のアントラキノン系又は多環キノン系顔料
(4)インジゴ誘導体及びチオインジゴ誘導体等のイン
ジゴイド系顔料
(5)金属フタロシアニン及び無金属フタロシアニン等
のフタロシアニン系顔料
(6)ジフェニルメタン系顔料、トリフェニルメタン顔
料、キサンテン顔料及びアクリジン顔料等のカルボニウ
ム系顔料
(7)アジン顔料、オキサジン顔料及びチアジン顔料等
のキノンイミン系顔料
(8)シアニン顔料及びアゾメチン顔料等のメチン系顔
料
(9)キノリン系顔料
(10)ニトロ系顔料
(11)ニトロソ系顔料
(12)ベンゾキノン及びナフトキノン系顔料
(13)ナフタルイミド系顔料
(14)ビスベンズイミダゾール誘導体等のペリノン系顔
料等がある。前記各種顔料のうち特に好ましい電荷発生
物質として下記一般式(9)〜一般式(11)の多環キノ
ン顔料がある。Next, as the charge generating substance contained in the charge generating layer of the present invention: (1) azo such as monoazo pigment, polyazo pigment, metal complex salt azo pigment, pyrazolone azo pigment, stilbene azo pigment and thiazole azo pigment Pigments (2) Perylene pigments such as perylene anhydride and perylene imide (3) Anthraquinones such as anthraquinone derivatives, anthanthrone derivatives, dibenzpyrenequinone derivatives, pyranthrone derivatives, violanthrone derivatives and isoviolanthrone derivatives, or Polycyclic quinone pigment (4) Indigoid pigment such as indigo derivative and thioindigo derivative (5) Phthalocyanine pigment such as metal phthalocyanine and metal-free phthalocyanine (6) Diphenylmethane pigment, triphenylmethane pigment, xanthene pigment and acridine pigment Carbonyl pigments (7) Quinoneimine pigments such as azine pigments, oxazine pigments and thiazine pigments (8) Methine pigments such as cyanine pigments and azomethine pigments (9) Quinoline pigments (10) Nitro pigments (11) Nitroso Pigments (12) Benzoquinone and naphthoquinone pigments (13) Naphthalimide pigments (14) Perinone pigments such as bisbenzimidazole derivatives. Among the various pigments, particularly preferable charge generating substances are polycyclic quinone pigments represented by the following general formulas (9) to (11).
【0043】[0043]
【化5】 [Chemical 5]
【0044】前記各一般式中、Xはハロゲン原子、ニト
ロ基、シアノ基、アシル基又はカルボキシル基を表し、
nは0〜4の整数、mは0〜6の整数を表す。In each of the above general formulas, X represents a halogen atom, a nitro group, a cyano group, an acyl group or a carboxyl group,
n represents an integer of 0 to 4 and m represents an integer of 0 to 6.
【0045】又、使用可能な電荷発生物質として下記一
般式(12)〜一般式(14)のビスアゾ化合物を用いるこ
とができる。As usable charge generating substances, the bisazo compounds represented by the following general formulas (12) to (14) can be used.
【0046】[0046]
【化6】 [Chemical 6]
【0047】前記一般式(12)中、Ar5、Ar6はそれぞれ
置換若しくは無置換の炭素環式芳香族環基、又は置換若
しくは無置換の複素環式芳香族環基、R36、R37はそれ
ぞれ電子吸引性基又は水素原子(但、R36、R37の少な
くとも1つは−CN、−Cl等のハロゲン、−NO2等の電子
吸引性基)を表す。In the general formula (12), Ar 5 and Ar 6 are each a substituted or unsubstituted carbocyclic aromatic ring group, or a substituted or unsubstituted heterocyclic aromatic ring group, R 36 and R 37. Represents an electron-withdrawing group or a hydrogen atom (provided that at least one of R 36 and R 37 is a halogen such as —CN and —Cl, an electron withdrawing group such as —NO 2 ).
【0048】AにおいてXは、−OH基、−N(R39)-R40又
は−NHSO2R41(R39及びR40はそれぞれ、水素原子、置
換若しくは無置換のアルキル基、R41は置換若しくは無
置換のアルキル基又は置換若しくは無置換のアリール
基)、Yは、水素原子、ハロゲン原子、置換若しくは無
置換のアルキル基、アルコキシ基、カルボキシル基、ス
ルホ基、置換若しくは無置換のカルバモイル基又は置換
若しくは無置換のスルファモイル基(但、mが2以上の
ときは、互いに異なる基であってもよい。)、Zは、置
換若しくは無置換の炭素環式芳香族環基又は置換若しく
は無置換の複素環式芳香族環基を構成するに必要な原子
群、R38は、水素原子、置換若しくは無置換のアミノ
基、置換若しくは無置換のカルバモイル基、カルボキシ
ル基又はそのエステル基、Bは、置換若しくは無置換の
アリール基、nは、1又は2の整数、mは、0〜4の整
数である。In A, X is --OH group, --N (R 39 )-R 40 or --NHSO 2 R 41 (R 39 and R 40 are respectively a hydrogen atom, a substituted or unsubstituted alkyl group, and R 41 is A substituted or unsubstituted alkyl group or a substituted or unsubstituted aryl group), Y is a hydrogen atom, a halogen atom, a substituted or unsubstituted alkyl group, an alkoxy group, a carboxyl group, a sulfo group, a substituted or unsubstituted carbamoyl group Or a substituted or unsubstituted sulfamoyl group (however, when m is 2 or more, the groups may be different from each other), Z is a substituted or unsubstituted carbocyclic aromatic ring group, or a substituted or unsubstituted the atomic group necessary to configure the heterocyclic aromatic ring group, R 38 is a hydrogen atom, a substituted or unsubstituted amino group, a substituted or unsubstituted carbamoyl group, a carboxyl group or an ester group B is a substituted or unsubstituted aryl group, n is an integer of 1 or 2, m is an integer of 0-4.
【0049】前記一般式(12)のうち特に好ましい電荷
発生物質が下記一般式(12a)に示される。A particularly preferable charge generating substance in the general formula (12) is represented by the following general formula (12a).
【0050】[0050]
【化7】 [Chemical 7]
【0051】(但、Ar7、Ar8及びAは一般式(12)にお
いて定義されたものと同じである。)更に好ましいもの
は、特に一般式(12a)におけるAr7、Ar8が置換若しく
は無置換のフェニル基を表し、置換基としては、メチル
基、エチル基等のアルキル基、メトキシ基、エトキシ基
等のアルコキシ基、塩素原子、臭素原子などのハロゲン
原子、水酸基及びシアノ基から選択された化合物であ
る。(However, Ar 7 , Ar 8 and A are the same as those defined in the general formula (12).) More preferred are those in which Ar 7 , Ar 8 in the general formula (12a) are substituted or It represents an unsubstituted phenyl group, and the substituent is selected from an alkyl group such as a methyl group and an ethyl group, an alkoxy group such as a methoxy group and an ethoxy group, a halogen atom such as a chlorine atom and a bromine atom, a hydroxyl group and a cyano group. It is a compound.
【0052】本発明に係る電荷発生層中の好ましい電荷
発生物質が下記一般式(13)に示される。A preferable charge generating substance in the charge generating layer according to the present invention is represented by the following general formula (13).
【0053】[0053]
【化8】 [Chemical 8]
【0054】Aにおいて、Zは置換若しくは無置換の芳
香族炭素環又は置換若しくは無置換の芳香族複素環を構
成するに必要な原子群、Yは水素原子、ヒドロキシル
基、カルボキシル基若しくはそのエステル基、スルホ
基、置換若しくは無置換のカルバモイル基、又は置換若
しくは無置換のスルファモイル基、R42は水素原子、置
換若しくは無置換のアルキル基、置換若しくは無置換の
アミノ基、置換若しくは無置換のカルバモイル基、カル
ボキシル基若しくはそのエステル基、又はシアノ基、Ar
9は置換若しくは無置換のアリール基、R43は置換若し
くは無置換のアルキル基、置換若しくは無置換のアラル
キル基、又は置換若しくは無置換のアリール基を表す。In A, Z is an atomic group necessary for constituting a substituted or unsubstituted aromatic carbocycle or a substituted or unsubstituted aromatic heterocycle, and Y is a hydrogen atom, a hydroxyl group, a carboxyl group or an ester group thereof. , A sulfo group, a substituted or unsubstituted carbamoyl group, or a substituted or unsubstituted sulfamoyl group, R 42 represents a hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted amino group, a substituted or unsubstituted carbamoyl group , Carboxyl group or its ester group, or cyano group, Ar
9 represents a substituted or unsubstituted aryl group, R 43 represents a substituted or unsubstituted alkyl group, a substituted or unsubstituted aralkyl group, or a substituted or unsubstituted aryl group.
【0055】前記一般式(13)のうち下記一般式(13
a)のカルバゾール基を有するビスアゾ化合物が特に好
ましい。Of the above general formula (13), the following general formula (13
The bisazo compound having a carbazole group of a) is particularly preferable.
【0056】[0056]
【化9】 [Chemical 9]
【0057】但、この一般式(13a)中、R44、R45は
アルキル基、アルコキシ基又はアリール基、R46、
R47、R48、R49、R50、R51は水素原子、ハロゲン原
子、アルキル基、アルコキシ基、アミノ基、水酸基、ア
リール基である。However, in this general formula (13a), R 44 and R 45 are an alkyl group, an alkoxy group or an aryl group, R 46 ,
R 47 , R 48 , R 49 , R 50 and R 51 are a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, an amino group, a hydroxyl group and an aryl group.
【0058】又、本発明に係る電荷発生層中の好ましい
電荷発生物質が下記一般式(14)に示される。A preferable charge generating substance in the charge generating layer according to the present invention is represented by the following general formula (14).
【0059】[0059]
【化10】 [Chemical 10]
【0060】前記一般式(14)においてX1及びX2は、
それぞれ、ハロゲン原子、置換若しくは無置換のアルキ
ル基、置換若しくは無置換のアルコキシ基、ニトロ基、
シアノ基、ヒドロキシ基又は置換若しくは無置換のアミ
ノ基を表し、X1及びX2のうち少なくとも1つはハロゲ
ン原子である。In the general formula (14), X 1 and X 2 are
Halogen atom, substituted or unsubstituted alkyl group, substituted or unsubstituted alkoxy group, nitro group,
It represents a cyano group, a hydroxy group or a substituted or unsubstituted amino group, and at least one of X 1 and X 2 is a halogen atom.
【0061】p及びqはそれぞれ0、1又は2の整数を
表し、p及びqは同時に0となることはなく、且つ、p
が2のときはX1は互いに同一の又は異なる基であって
よく、qが2のときはX2は互いに同一の又は異なる基
であってよい。P and q each represent an integer of 0, 1 or 2, and p and q cannot be 0 at the same time, and p
When 2 is 2, X 1 may be the same or different groups from each other, and when q is 2, X 2 may be the same or different groups from each other.
【0062】またAにおいて、Ar10は少なくとも弗素化
炭化水素基を有する芳香族炭素環基又は芳香族複素環基
を表す。Zは置換若しくは無置換の芳香族炭素環又は置
換若しくは無置換の芳香族複素環を形成するのに必要な
非金属原子群を表す。Further, in A, Ar 10 represents an aromatic carbocyclic group or an aromatic heterocyclic group having at least a fluorinated hydrocarbon group. Z represents a non-metal atom group necessary for forming a substituted or unsubstituted aromatic carbocycle or a substituted or unsubstituted aromatic heterocycle.
【0063】m及びnはそれぞれ0、1又は2の整数を
表す。但し、m及びnが同時に0となることはない。M and n each represent an integer of 0, 1 or 2. However, m and n are not 0 at the same time.
【0064】一般式(14)のX1及びX2により表される
ハロゲン原子としては、塩素原子、臭素原子、弗素原
子、沃素原子を挙げることができる。X1及びX2のう
ち、少なくとも一方がハロゲン原子を有している。Examples of the halogen atom represented by X 1 and X 2 in the general formula (14) include chlorine atom, bromine atom, fluorine atom and iodine atom. At least one of X 1 and X 2 has a halogen atom.
【0065】X1及びX2で表されるアルキル基としては
炭素原子数1ないし4個の置換若しくは無置換のアルキ
ル基が好ましく、このようなアルキル基の例としては、
例えばメチル基、エチル基、β-シアノエチル基、iso-
プロピル基、トリフルオロメチル基、t-ブチル基等が挙
げられる。The alkyl group represented by X 1 and X 2 is preferably a substituted or unsubstituted alkyl group having 1 to 4 carbon atoms, and examples of such an alkyl group include
For example, methyl group, ethyl group, β-cyanoethyl group, iso-
Examples thereof include a propyl group, a trifluoromethyl group, a t-butyl group and the like.
【0066】またX1及びX2で表されるアルコキシ基
は、炭素原子数が1ないし4個の置換若しくは未置換の
アルコキシ基が好ましく、このようなアルコキシ基の例
としては、メトキシ基、エトキシ基、β-クロルエトキ
シ基、sec-ブトキシ基等が挙げられる。The alkoxy group represented by X 1 and X 2 is preferably a substituted or unsubstituted alkoxy group having 1 to 4 carbon atoms. Examples of such an alkoxy group include methoxy group and ethoxy group. Group, β-chloroethoxy group, sec-butoxy group and the like.
【0067】更にまた、X1及びX2で表される置換若し
くは無置換のアミノ基としては、例えばアルキル基、ア
リール基(好ましくはフェニル基)等で置換されたも
の、例えばN-メチルアミノ基、N-エチルアミノ基、N,N-
ジメチルアミノ基、N,N-ジエチルアミノ基、N-フェニル
アミノ基、N,N-ジフェニルアミノ基や、更にはアシル基
で置換されたアセチルアミノ基、p-クロルベンゾイルア
ミノ基等が挙げられる。前記一般式(14)においてp及
びqは、それぞれ、0、1又は2を表すが、p及びqは
同時に0となることはなく、好ましくはp=1、q=0
又はp=1、q=1の場合である。Further, the substituted or unsubstituted amino group represented by X 1 and X 2 is, for example, one substituted with an alkyl group, an aryl group (preferably a phenyl group) or the like, for example, an N-methylamino group. , N-ethylamino group, N, N-
Examples thereof include a dimethylamino group, an N, N-diethylamino group, an N-phenylamino group, an N, N-diphenylamino group, an acetylamino group substituted with an acyl group, and a p-chlorobenzoylamino group. In the general formula (14), p and q each represent 0, 1 or 2, but p and q are not 0 at the same time, preferably p = 1 and q = 0.
Alternatively, p = 1 and q = 1.
【0068】更にまたp又はqが2のときは、X1又は
X2は、それぞれ同一又は異なる基をとることができ
る。Further, when p or q is 2, X 1 or X 2 may be the same or different groups.
【0069】前記一般式(14)で表されるビスアゾ化合
物は、好ましくは下記一般式(14b)、(14c)、(14
d)、(14e)で表される。The bisazo compound represented by the general formula (14) is preferably the following general formulas (14b), (14c) and (14).
It is represented by d) and (14e).
【0070】[0070]
【化11】 [Chemical 11]
【0071】[0071]
【化12】 [Chemical 12]
【0072】式中、X1a、X1b、X2a及びX2bは、それ
ぞれ水素原子、ハロゲン原子、置換若しくは無置換のア
ルキル基、置換若しくは無置換のアルコキシ基、ニトロ
基、シアノ基、ヒドロキシ基又は置換若しくは無置換の
アミノ基を表し、X1a、X1b、X2a及びX2bのうち、少
なくとも1つはハロゲン原子である。X1a及びX1b、並
びにX2a及びX2bは、それぞれ互いに同一又は異なる基
であってもよい。In the formula, X 1a , X 1b , X 2a and X 2b are each a hydrogen atom, a halogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkoxy group, a nitro group, a cyano group or a hydroxy group. Alternatively, it represents a substituted or unsubstituted amino group, and at least one of X 1a , X 1b , X 2a and X 2b is a halogen atom. X 1a and X 1b , and X 2a and X 2b may be the same or different groups from each other.
【0073】Ar11は前記一般式(14)におけるAr10と同
義である。Ar 11 has the same meaning as Ar 10 in the general formula (14).
【0074】Yは前記一般式(14)におけるZの置換基
と同義である。Y has the same meaning as the substituent of Z in formula (14).
【0075】前記一般式(14)で表されるビスアゾ化合
物は、公知の方法により容易に合成することができる。The bisazo compound represented by the general formula (14) can be easily synthesized by a known method.
【0076】尚、前記一般式(9)〜一般式(14)の具
体的化合物例は、例えば特開昭60-172044号第23頁下右
欄1行目〜第46頁上右欄8行目に記載されている。Specific examples of the compounds represented by the general formulas (9) to (14) are described, for example, in JP-A-60-172044, page 23, lower right column, line 1 to page 46, upper right column, line 8. Described in the eye.
【0077】又前記フタロシアニン系顔料のうち本発明
に好ましく用いられる顔料としては、例えば銅、コバル
ト、鉛、亜鉛等を中心原子とする金属フタロシアニンと
これらを含まない無金属フタロシアニンとがあり、結晶
型としてα型、β型、γ型、X型、τ型、τ′型、η
型、η′型等が好ましく用いられる。かかるフタロシア
ニン系顔料の更に詳細な説明は特開昭62-79470号、特開
昭62-47054号に記載されている。Among the above-mentioned phthalocyanine pigments, the pigments preferably used in the present invention include, for example, metal phthalocyanine having a central atom of copper, cobalt, lead, zinc and the like and metal-free phthalocyanine not containing them, and a crystalline type Α type, β type, γ type, X type, τ type, τ ′ type, η
Type and η'type are preferably used. More detailed description of such phthalocyanine pigments is described in JP-A-62-79470 and JP-A-62-47054.
【0078】さらに特に好ましいフタロシアニン顔料と
して、CuKα特性X線回折スペクトルのブラック角2θ
が少くとも9.6±0.2°及び27.2±0.2°において夫々X
線強度のピークを示す結晶状態のチタニルフタロシアニ
ン顔料がある。As a particularly preferable phthalocyanine pigment, a black angle 2θ of CuKα characteristic X-ray diffraction spectrum is shown.
At least 9.6 ± 0.2 ° and 27.2 ± 0.2 °, respectively X
There is a crystalline titanyl phthalocyanine pigment that exhibits a peak of linear intensity.
【0079】第1図〜第3図には、本発明の感光体の層
構成が示され、1は導電性支持体、2は電荷輸送層、3
は電荷発生層、4及び5は必要にして設けられる中間層
及び保護層である。前記層構成を有するドラム状感光体
を製造するには、まずアルミニウム、ステンレス、スチ
ール、銅、真鍮、亜鉛等の金属円筒又はプラスチック円
筒に金属を蒸気若しくはラミネートして導電層を形成し
て成る円筒状支持体1上に必要により0.01〜2μm厚の
中間層4が設けられる。1 to 3 show the layer structure of the photoconductor of the present invention, 1 is a conductive support, 2 is a charge transport layer, and 3 is a charge transport layer.
Is a charge generation layer, and 4 and 5 are intermediate layers and protective layers which are provided as necessary. To manufacture the drum-shaped photoreceptor having the above-mentioned layer structure, first, a cylinder formed by vapor-depositing or laminating a metal on a metal cylinder or a plastic cylinder of aluminum, stainless steel, steel, copper, brass, zinc or the like to form a conductive layer. If necessary, an intermediate layer 4 having a thickness of 0.01 to 2 μm is provided on the substrate 1.
【0080】前記中間層4は、例えばポリアミド樹脂、
アクリル樹脂、メタクリル樹脂、塩化ビニル樹脂、酢酸
ビニル樹脂、エポキシ樹脂、ポリウレタン樹脂、フェノ
ール樹脂、ポリエステル樹脂、アルキッド樹脂、ポリカ
ーボネート樹脂、シリコーン樹脂、メラミン樹脂、塩化
ビニル-酢酸ビニル共重合体樹脂、塩化ビニル-酢酸ビニ
ル-無水マレイン酸共重合体樹脂、セルロース樹脂、ポ
リビニルアルコール樹脂、カゼイン等の樹脂を例えばブ
チルアミン、ジエチルアミン、エチレンジアミン、イソ
プロパノールアミン、モノエタノールアミン、トリエタ
ノールアミン、トリエチレンジアミン、N,N-ジメチルホ
ルムアミド、アセトン、メチルエチルケトン、シクロヘ
キサノン、ベンゼン、トルエン、キシレン、クロロホル
ム、1,2-ジクロロエタン、ジクロロメタン、テトラヒド
ロフラン、ジオキサン、メタノール、エタノール、イソ
プロパノール、酢酸エチル、酢酸ブチル、ジメチルスル
ホキシド等の有機溶媒等に溶解し、得られた樹脂溶液
を、例えばブレード塗布、ロール塗布、ディップ塗布、
スプレー塗布、円形スライドホッパ塗布、円形押出し塗
布、円形少量ディップ塗布等の塗布方法により塗布して
形成される。The intermediate layer 4 is made of, for example, polyamide resin,
Acrylic resin, methacrylic resin, vinyl chloride resin, vinyl acetate resin, epoxy resin, polyurethane resin, phenol resin, polyester resin, alkyd resin, polycarbonate resin, silicone resin, melamine resin, vinyl chloride-vinyl acetate copolymer resin, vinyl chloride -Vinyl acetate-maleic anhydride copolymer resin, cellulose resin, polyvinyl alcohol resin, casein and other resins such as butylamine, diethylamine, ethylenediamine, isopropanolamine, monoethanolamine, triethanolamine, triethylenediamine, N, N-dimethyl Formamide, acetone, methyl ethyl ketone, cyclohexanone, benzene, toluene, xylene, chloroform, 1,2-dichloroethane, dichloromethane, tetrahydrofuran, dioxane Methanol, ethanol, isopropanol, ethyl acetate, butyl acetate, dissolved in an organic solvent such as dimethyl sulfoxide, the resulting resin solution, for example blade coating, roll coating, dip coating,
It is formed by coating by a coating method such as spray coating, circular slide hopper coating, circular extrusion coating, circular small amount dip coating.
【0081】前記中間層4は支持体1の表面欠陥の遮
蔽、感光層との接着、支持体1からの電荷注入阻止、感
光層の画質調整等を目的として設けられ、前記膜厚0.01
μmを下廻ると前記目的が達成されず、2μmを上廻ると
感光層上への像露光時残留電荷が大となりかぶりを発生
し、繰返し像形成の過程で、電子写真性能が劣化してく
る。The intermediate layer 4 is provided for the purpose of shielding surface defects of the support 1, adhering to the photosensitive layer, preventing charge injection from the support 1, adjusting the image quality of the photosensitive layer, etc.
If it is less than μm, the above-mentioned object is not achieved, and if it exceeds 2 μm, the residual charge at the time of image exposure on the photosensitive layer becomes large and fog occurs, and electrophotographic performance deteriorates in the process of repeated image formation. .
【0082】又、必要にして設けられる前記保護層5は
前記中間層用樹脂、例えばポリカーボネート、スチレン
樹脂、アクリル樹脂等を用いた0.01〜3μm厚の樹脂層
であり、感光層表面の光電現象、環境雰囲気の作用等を
防護し、機械的耐摩耗性を改良する目的で設けられる。The protective layer 5, which is provided as necessary, is a resin layer having a thickness of 0.01 to 3 μm using the resin for the intermediate layer, for example, polycarbonate, styrene resin, acrylic resin, etc. It is provided for the purpose of protecting the action of the environmental atmosphere and improving the mechanical wear resistance.
【0083】次に前記中間層4上に電荷輸送層2が設け
られる。Next, the charge transport layer 2 is provided on the intermediate layer 4.
【0084】前記電荷輸送層2を形成するには、例え
ば、ポリエステル、メタクリル樹脂、アクリル樹脂、ポ
リ塩化ビニル、ポリ塩化ビニリデン、ポリスチレン、ポ
リビニルアセテート、メラミン樹脂、ポリウレタン、ス
チレン-アクリル共重合体、スチレン-ブタジエン共重合
体、塩化ビニリデン-アクリロニトリル共重合体、塩化
ビニル-酢酸ビニル共重合体、塩化ビニル-酢酸ビニル-
無水マレイン酸共重合体、シリコーン樹脂、スチレン-
アルキッド樹脂、ポリビニルカルバゾール、ポリビニル
ブチラール、その他特開昭60-172044号、同60-172045
号、同63-65444号、同63-148263号、特開平1-269942
号、同1-269942号等に記載のポリカーボネート等の樹脂
が前記中間層用溶剤から選択された溶剤1000重量部に対
し5〜300重量部混合溶解され、かつ全固形分に対して1
0〜9000ppmのシリコーンオイル、好ましくはメチルフェ
ニルシリコーンオイルが溶解される。次いで、得られた
溶液に前記電荷輸送物質をバインダ樹脂100重量部当た
り30重量部以上、好ましくは30〜300重量部混合溶解
し、得られた溶液を前記中間層4上に前記中間層塗布方
法のいずれかの方法により塗布加工して5〜50μm厚、
好ましくは10〜40μm厚の電荷輸送層2が形成される。To form the charge transport layer 2, for example, polyester, methacrylic resin, acrylic resin, polyvinyl chloride, polyvinylidene chloride, polystyrene, polyvinyl acetate, melamine resin, polyurethane, styrene-acrylic copolymer, styrene. -Butadiene copolymer, vinylidene chloride-acrylonitrile copolymer, vinyl chloride-vinyl acetate copolymer, vinyl chloride-vinyl acetate-
Maleic anhydride copolymer, silicone resin, styrene-
Alkyd resin, polyvinyl carbazole, polyvinyl butyral, etc. JP-A-60-172044 and 60-172045
No. 63-65444, No. 63-148263, JP-A 1-269942
No. 1, 1-269942 and the like resin such as polycarbonate is mixed and dissolved in 5 to 300 parts by weight to 1000 parts by weight of the solvent selected from the solvent for the intermediate layer, and 1 to the total solid content.
0-9000 ppm of silicone oil, preferably methylphenyl silicone oil, is dissolved. Then, 30 parts by weight or more, preferably 30 to 300 parts by weight, of the charge transport material is mixed and dissolved in the obtained solution per 100 parts by weight of the binder resin, and the obtained solution is applied onto the intermediate layer 4 by the intermediate layer coating method. 5 to 50 μm thick by applying coating by any one of
The charge transport layer 2 having a thickness of 10 to 40 μm is preferably formed.
【0085】次いで前記電荷輸送層形成の際用いられた
溶剤及びバインダ樹脂群から選択された溶剤及びバイン
ダ樹脂を用い、溶剤1000重量部に対してバインダ樹脂1
〜100重量部を混合溶解し、得られた溶液に前記電荷発
生物質をバインダ樹脂100重量部当たり10〜1000重量
部、好ましくは20〜500重量部混合、分散し、かつ全固
形分に対して1010〜10000ppmのシリコーンオイル、好ま
しくはメチルフェニルシリコーンオイルが溶解される。Next, using a solvent and a binder resin selected from the solvent and the binder resin group used for forming the charge transport layer, the binder resin 1 is added to 1000 parts by weight of the solvent.
To 100 parts by weight are mixed and dissolved, and the resulting solution is 10 to 1000 parts by weight, preferably 20 to 500 parts by weight, and the charge generating substance is mixed and dispersed per 100 parts by weight of the binder resin, and based on the total solid content. 1010-10000 ppm of silicone oil, preferably methylphenyl silicone oil, is dissolved.
【0086】得られた分散液が円形スライドホッパ塗布
機、円形押出し塗布機又は円形少量塗布機等の特に選択
された塗布機により高能率高精度で塗布加工され、0.05
〜20μm厚の電荷発生層3が形成され、本発明の感光体
が得られる。The obtained dispersion liquid is coated with high efficiency and high accuracy by a coating machine selected especially, such as a circular slide hopper coating machine, a circular extrusion coating machine or a circular small amount coating machine,
The charge generation layer 3 having a thickness of up to 20 μm is formed, and the photoreceptor of the present invention is obtained.
【0087】ここで前記電荷輸送層2の層厚が5μmを
下廻ると電位低下を招き、かつ電荷輸送能が不足して感
度低下を招き、50μmを越えると電荷輸送のパスが過大
となり、矢張り感度不足を生ずる。またバインダ樹脂に
対する電荷輸送物質の量が30重量部を下廻ると電荷輸送
能が不足して感度不足を生じ、300重量部を越えると、
感光層の暗抵抗が低下し、電位低下を招く。Here, if the layer thickness of the charge transport layer 2 is less than 5 μm, the potential is lowered, and the charge transport ability is insufficient, resulting in a decrease in sensitivity, and if it exceeds 50 μm, the charge transport path becomes too large, and the arrow Insufficient tension sensitivity occurs. Further, if the amount of the charge transport material with respect to the binder resin is less than 30 parts by weight, the charge transport ability is insufficient and sensitivity becomes insufficient, and if it exceeds 300 parts by weight,
The dark resistance of the photosensitive layer decreases, leading to a decrease in potential.
【0088】次に前記電荷発生層3の層厚が0.05μmを
下廻ると、均一な塗布層が得られず、かつ像露光により
十分な電荷の発生が得られず、感度不足となる。また20
μmを越えると像露光光が到達しない領域が多くなり、
表面で発生した電荷をトラップして残留電荷が大とな
り、繰返し像形成を行ったとき、疲労劣化を生ずる。ま
たバインダ樹脂に対する電荷発生物質の量が10重量部を
下廻ると感度不足、残留電荷の増大を招き、1000重量部
を越えると受容電位が低下し、帯電不良となる。ここで
前記電荷発生層3は感光体の表面層を形成するもので電
子写真性能の外に耐摩耗性、耐環境性等にすぐれてい
て、特に均一な塗布加工が要請される。Next, when the layer thickness of the charge generating layer 3 is less than 0.05 μm, a uniform coating layer cannot be obtained, and sufficient charge cannot be generated by image exposure, resulting in insufficient sensitivity. Again 20
When it exceeds μm, there are many areas where the image exposure light does not reach,
The charges generated on the surface are trapped and the residual charges become large, and fatigue deterioration occurs when images are repeatedly formed. Further, if the amount of the charge generating substance with respect to the binder resin is less than 10 parts by weight, the sensitivity is insufficient and the residual charge is increased, and if it exceeds 1000 parts by weight, the receptive potential is lowered and the charging becomes defective. Here, the charge generation layer 3 forms the surface layer of the photoconductor and is excellent in abrasion resistance, environment resistance and the like in addition to electrophotographic performance, and particularly uniform coating processing is required.
【0089】そこで前記電荷発生層3中には下層の電荷
輸送層より多く十分な量のシリコーンオイルが含有され
ているため、前記耐摩耗性、耐環境性等にすぐれていて
高耐久性が発揮される。更にまたシリコーンオイルが適
量含有された下層の電荷輸送層上に十分な量のシリコー
ンオイルを含有した電荷発生層用塗布液が塗布されるた
め濡れがよく延展塗布されて均一な塗膜が容易に得られ
る。また特に電荷発生層用塗布液を塗布する際、下層を
溶解することなく高速で均一塗布が可能な第4図〜第6
図の円筒体塗布機が用いられるため、前記シリコーンオ
イルの作用との相乗作用により良好な電荷発生層が形成
され、結果的に好ましい感光体が得られる。Therefore, since the charge generation layer 3 contains a larger amount of silicone oil than the lower charge transport layer, it is excellent in abrasion resistance, environment resistance and the like and exhibits high durability. To be done. Furthermore, since the charge generation layer coating liquid containing a sufficient amount of silicone oil is applied on the lower charge transport layer containing a proper amount of silicone oil, the wet coating is spread well and a uniform coating film is easily formed. can get. Further, in particular, when the coating liquid for the charge generating layer is applied, uniform coating can be performed at a high speed without dissolving the lower layer.
Since the cylindrical body coating machine shown in the figure is used, a favorable charge generation layer is formed by a synergistic action with the action of the silicone oil, and as a result, a preferable photoreceptor is obtained.
【0090】前記第4図の(a)は円筒状支持体10を含
む塗布機11の断面図、第4図の(b)はその一部破断斜
視図であり、図中10はA方向に搬送される円筒状支持
体、11は円形スライドホッパ塗布機で、12は該装置11の
塗布液分配室、13は塗布液分配スリット、14は塗布液供
給パイプ、15は液受け、16はホッパエッジ、17は塗布液
スライド面、18は塗布層である。FIG. 4 (a) is a sectional view of the coating machine 11 including the cylindrical support 10, and FIG. 4 (b) is a partially cutaway perspective view thereof, in which 10 is a direction A. A cylindrical support to be transported, 11 is a circular slide hopper coating machine, 12 is a coating liquid distribution chamber of the apparatus 11, 13 is a coating liquid distribution slit, 14 is a coating liquid supply pipe, 15 is a liquid receiver, and 16 is a hopper edge. Reference numeral 17 denotes a coating solution slide surface, and 18 denotes a coating layer.
【0091】塗布時塗布液Sがポンプ等により、塗布液
供給パイプ14へと必要量供給され、塗布液分配室12によ
って円周方向へと均一に分配され、分配スリット13を通
過し、スライド面17を円周方向に均一に流下する。しか
る後、塗布液Sはホッパエッジ16と支持体10外周面との
間にビードが形成される。このビードと支持体10外周面
とを接触せしめた状態で支持体10が矢印A方向へと搬送
され、表面に塗布層18が形成される。かかる塗布機によ
れば、塗布層18から速やかに溶剤が蒸発するので簡単な
乾燥装置を設けることにより容易に乾燥塗膜が得られ
る。又塗布液Sは必要量だけ送られるので塗布液の無駄
がなく、材料のコスト低減が計られる。又円周同時接触
塗布であるため継目のない均一塗布が可能であり、塗布
膜が液供給量、粘度、支持体10の移動速度で決まり、塗
布厚の制御が容易であり、又塗布中ビードの作用で塗布
厚の変動が少なく高品質、高生産性の塗布が可能とな
る。前記円形スライドホッパ塗布機11において、スライ
ド面終端部の径と被塗布体(円筒状)の外径との間隙は
0.05〜1mmが好ましく、0.1〜0.6mmがより好ましい。ス
ライド面の傾斜角は水平に対して10°〜70°が好まし
く、20°〜45°が更に好ましい。At the time of coating, the coating liquid S is supplied to the coating liquid supply pipe 14 by a pump or the like in a required amount, is evenly distributed in the circumferential direction by the coating liquid distribution chamber 12, passes through the distribution slit 13, and slides. Flow 17 evenly in the circumferential direction. Thereafter, the coating liquid S forms a bead between the hopper edge 16 and the outer peripheral surface of the support 10. The support 10 is conveyed in the direction of arrow A with the bead and the outer peripheral surface of the support 10 in contact with each other, and the coating layer 18 is formed on the surface. According to such a coating machine, the solvent evaporates quickly from the coating layer 18, so that a dry coating film can be easily obtained by providing a simple drying device. Further, since the required amount of the coating liquid S is sent, the coating liquid is not wasted and the cost of the material can be reduced. In addition, since it is the simultaneous contact coating on the circumference, it is possible to perform uniform coating without a seam, the coating film is determined by the liquid supply amount, the viscosity and the moving speed of the support 10, and the control of the coating thickness is easy. By the action, there is little fluctuation in the coating thickness, and high quality and high productivity coating is possible. In the circular slide hopper coating machine 11, the gap between the diameter of the slide surface end portion and the outer diameter of the coated object (cylindrical) is
0.05 to 1 mm is preferable, and 0.1 to 0.6 mm is more preferable. The inclination angle of the slide surface is preferably 10 ° to 70 ° with respect to the horizontal, and more preferably 20 ° to 45 °.
【0092】塗布液の粘度は0.5〜700Cpの範囲内がよ
く、1〜500Cpが更によい。The viscosity of the coating solution is preferably in the range of 0.5 to 700 Cp, and more preferably 1 to 500 Cp.
【0093】尚、塗布液が塗布液分配スリットから円周
方向に均一に流出するようにするためには、スライドホ
ッパ塗布機にあっては、分配室抵抗(Pc)と塗布液分配
スリットを流れるときのスリット抵抗(Ps)とがPs/Pc
≧80で、より好ましくは100〜100,000の範囲とするのが
好ましい。In order to make the coating liquid flow out uniformly from the coating liquid distribution slit in the circumferential direction, in the slide hopper coating machine, the resistance of the distribution chamber (Pc) and the coating liquid distribution slit flow. When slit resistance (Ps) is Ps / Pc
It is ≧ 80, and more preferably in the range of 100 to 100,000.
【0094】次に第5図は円形押出し塗布機11’の断面
図であり、第4図と同一機能部には同一符号が付され
る。円形押出し塗布装置11’においては、ポンプ等によ
り塗布に必要な量の塗布液Sが塗布液供給パイプ14へと
供給され、塗布液分配室12によって円周方向へと均一に
分配され、分配スリット13内を押し出され、ホッパエッ
ジ16より均一かつ連続的に流出して支持体外周面との間
に塗布液ビードを形成し、これにより塗布層18が塗布さ
れる。Next, FIG. 5 is a sectional view of the circular extrusion coating machine 11 ', and the same functional portions as those in FIG. 4 are designated by the same reference numerals. In the circular extrusion coating device 11 ', the coating liquid S required for coating is supplied to the coating liquid supply pipe 14 by a pump or the like, and is uniformly distributed in the circumferential direction by the coating liquid distribution chamber 12 to form a distribution slit. It is extruded through the inside of the hopper 13 and flows out uniformly and continuously from the hopper edge 16 to form a coating liquid bead between itself and the outer peripheral surface of the support, whereby the coating layer 18 is coated.
【0095】ホッパエッジ16の長さは0.1〜10mm、好ま
しくは0.5〜4mmがよい。ホッパエッジの傾斜角は鉛直
下方から30°迄の範囲内がよく、鉛直下方から20°迄の
範囲内とするのが更によい。ホッパエッジの傾斜角が30
°を超えると塗布液の架橋が短くなり、良好な塗膜を得
にくくなる。The length of the hopper edge 16 is 0.1 to 10 mm, preferably 0.5 to 4 mm. The angle of inclination of the hopper edge is preferably within the range of 30 ° from the vertical downward direction, and more preferably within the range of 20 ° from the vertical downward direction. Hopper edge tilt angle is 30
If the temperature exceeds 50 ° C., the cross-linking of the coating solution becomes short, and it becomes difficult to obtain a good coating film.
【0096】又押し出し塗布機11’にあっては、分配室
抵抗(Pc)と、塗布液分配スリットを流れる際のスリッ
ト抵抗(Ps)とがPs/Pc≧40、より好ましくは40〜1000
00の範囲内の関係に保たれることにより、塗布液を安定
且つ均一に塗布することが可能である。In the extrusion coating machine 11 ', the distribution chamber resistance (Pc) and the slit resistance (Ps) when flowing through the coating liquid distribution slit are Ps / Pc ≧ 40, more preferably 40 to 1000.
By keeping the relationship within the range of 00, it is possible to apply the coating liquid stably and uniformly.
【0097】これら分配室抵抗(Pc)、スリット抵抗
(Ps)は、塗布液供給速度、粘度、供給圧に応じて決定
すればよい。更に押し出し塗布機11’においては、ホッ
パエッジは被塗布体外径より0.05〜1mm大きく、より好
ましくは塗布膜厚をho mmとすると2ho mmから4ho mm
までの範囲であり、塗布方向長さ0.1〜10mm、より好ま
しくは0.5〜4mmを有するものであるのが望ましい。The distribution chamber resistance (Pc) and the slit resistance (Ps) may be determined according to the coating liquid supply speed, viscosity and supply pressure. Further, in the extrusion coating machine 11 ', the hopper edge is 0.05 to 1 mm larger than the outer diameter of the coated object, and more preferably 2 ho mm to 4 ho mm when the coating film thickness is ho mm.
It is desirable to have a length in the coating direction of 0.1 to 10 mm, more preferably 0.5 to 4 mm.
【0098】第6図は円形少量ディップ塗布機11”の断
面図であり、図中底板21が積載板20に固定され、液止め
用ブレード23が前記底板21の上面と押圧板22とにより狭
着保持されている。塗布液Sは液槽24に収容され、該液
槽24に塗布液Sを補給するための液補給板25が液槽24の
上面に設けられ、該液補給板25に一対の液供給口26が設
けられている。FIG. 6 is a sectional view of the circular small amount dip coating machine 11 ″, in which the bottom plate 21 is fixed to the stacking plate 20, and the liquid stopping blade 23 is narrowed by the upper surface of the bottom plate 21 and the pressing plate 22. The coating liquid S is contained in the liquid tank 24, and a liquid replenishing plate 25 for replenishing the coating liquid S to the liquid tank 24 is provided on the upper surface of the liquid tank 24. A pair of liquid supply ports 26 is provided.
【0099】塗布機11”全体は円筒状に形成されてい
る。前記液止め用ブレード23は可撓性ゴム、合成樹脂等
により形成され、支持体10を狭着保持できるように構成
されている。The entire applicator 11 "is formed in a cylindrical shape. The liquid stopping blade 23 is made of flexible rubber, synthetic resin or the like, and is constructed so that the support 10 can be held tightly. .
【0100】底板21、押圧板22、液槽24には孔部27a、
27a’、27a”が貫設されると共に前記液補給板25には
孔部27a、27a’、27a”よりも小径の孔部27bが貫設
され、かつ前記ブレード23には孔部27bより小径の孔部
27cが貫設されている。The bottom plate 21, the pressing plate 22, and the liquid tank 24 have holes 27a,
27a ', 27a "are provided through the liquid supply plate 25, and holes 27b having a diameter smaller than the holes 27a, 27a', 27a" are provided through the liquid supply plate 25, and the blade 23 has a diameter smaller than the hole 27b. Hole
27c is pierced.
【0101】又ブレード23の孔部27c周縁が支持体10の
外周面に密着されていると共に液補給板25の孔部27b周
縁が支持体外周面に極めて僅かな間隙を形成して対面さ
れているため塗布時の溶剤の蒸発が抑制され、塗布直後
の塗膜の急激な乾燥が防止される。The periphery of the hole 27c of the blade 23 is closely attached to the outer peripheral surface of the support 10, and the periphery of the hole 27b of the liquid replenishing plate 25 is opposed to the outer peripheral surface of the support with a very small gap. As a result, evaporation of the solvent during coating is suppressed, and rapid drying of the coating film immediately after coating is prevented.
【0102】液槽24において、その下半部に液収容室28
が設けられ、上半部には液溜部29が設けられ、該液溜部
29中の塗布液Sを流すための複数の連通孔30が周方向に
配設され、かつ収容部28の外周壁にはオーバフロー用の
還流孔31が設けられていて、液面を常に一定に保つよう
に設計されている。又収容部28の内周壁には周方向に複
数の空気孔33が設けられ、孔部27bを介して外気と連通
されている。In the liquid tank 24, the liquid storage chamber 28 is provided in the lower half part.
Is provided, and a liquid reservoir 29 is provided in the upper half of the liquid reservoir 29.
A plurality of communication holes 30 for flowing the coating liquid S in 29 are arranged in the circumferential direction, and a reflux hole 31 for overflow is provided on the outer peripheral wall of the containing portion 28 so that the liquid surface is always constant. Designed to keep. Further, a plurality of air holes 33 are provided in the inner peripheral wall of the housing portion 28 in the circumferential direction, and communicate with the outside air through the hole portions 27b.
【0103】以上本発明の感光体の製造方法に用いられ
る円形スライドホッパ塗布機11、円形押出し塗布機11’
及び円形少量ディップ塗布機11”の代表例を説明した
が、これらの塗布機のいずれもが円筒状支持体に塗布液
を塗布するに適合していて、特に感光体の表面層を形成
する場合、下層の溶解、浸蝕を伴うことが少なく、高速
で均一塗布が可能であり、感光体の高品質、高生産性を
達成することができる。尚、前記円筒状支持体の塗布に
は、例えば第7図の如き支持体搬送機構を有する塗布装
置45が用いられる。図中、40a、40b、40cは円筒状支
持体10a、10b(10c)等を交互に嵌合、連結するスペ
ーサであり、前記被塗布体と一体的に垂直方向に搬送さ
れ、前記円形スライドホッパ塗布機、円形押出し塗布機
又は円形少量ディップ塗布機等の円筒体塗布機41により
連続塗布される。前記支持体の搬送は、支持体10bの上
下に嵌着されたスペーサ40b、40cを把持して支持体10
bを上方に搬送する上下1対の把持部42a、42bを有す
る把持具43A及び支持体10aの上下に嵌着されたスペー
サ40a、40bを把持して支持体10aを上方に搬送する上
下1対の把持部42c、42dを有する把持具43Bにより遂
行される。前記把持具43A及び43Bは装置本体45に支持
され、図示しない駆動源により回転駆動されるボールネ
ジ44A、44Bに螺合された昇降部材46A、46Bと緩衝部
材であるコイルスプリング47A、47Bを介して結合され
ており、前記ボールネジ44A、44Bの回転に連動する昇
降部材46A、46Bの昇降に伴って上下動される。なお前
記昇降部材46A、46Bは所定のプログラム信号に基い
て、上下動され、一方の昇降部材がスペーサを把持して
被塗布体を上方に搬送中、他方の昇降部材は互に衝突す
ることなく把持を解除した状態で下降され、次の支持体
を搬送するため下方のスペーサを把持するようになる。As described above, the circular slide hopper coating machine 11 and the circular extrusion coating machine 11 'used in the method for producing a photoreceptor of the present invention.
, And a representative example of a circular small amount dip coating machine 11 "has been described. All of these coating machines are suitable for coating the coating liquid on a cylindrical support, especially when forming a surface layer of a photoreceptor. In addition, the lower layer is less likely to be dissolved or eroded, and uniform coating can be performed at high speed, so that high quality and high productivity of the photoreceptor can be achieved. A coating device 45 having a support body transport mechanism as shown in Fig. 7 is used, in which 40a, 40b, 40c are spacers for alternately fitting and connecting the cylindrical support bodies 10a, 10b (10c) and the like. It is vertically conveyed integrally with the object to be coated, and continuously coated by a cylindrical body coating machine 41 such as the circular slide hopper coating machine, circular extrusion coating machine or circular small amount dip coating machine. , A spacer 40b fitted above and below the support 10b , 40c to grip the support 10
a pair of upper and lower grips 43A having a pair of upper and lower grips 42a and 42b for conveying b and spacers 40a and 40b fitted to the upper and lower sides of the support 10a to convey the support 10a upward. It is performed by the gripping tool 43B having the gripping portions 42c and 42d. The grippers 43A and 43B are supported by the main body 45 of the apparatus, and via lifting members 46A and 46B screwed to ball screws 44A and 44B that are rotationally driven by a drive source (not shown) and coil springs 47A and 47B that are buffer members. They are connected and are moved up and down as the elevating members 46A and 46B are moved up and down in conjunction with the rotation of the ball screws 44A and 44B. The elevating members 46A and 46B are moved up and down based on a predetermined program signal, and while one elevating member grips the spacer and conveys the coated object upward, the other elevating members do not collide with each other. It is lowered in a state where the grip is released, and the lower spacer is gripped to convey the next support.
【0104】また49は支持体供給用ハンドであり、これ
に例えばロボット等により円筒状支持体をタイミングに
合せて連続してセットしてやれば、該ハンドの所定位置
迄の上昇運動と、前記把持具43A又は43Bの上方への搬
送動作との協動により支持体は塗布機41へと連続して送
られ、塗布加工され、塗布機41のすぐ上のエアジェット
乾燥器により乾燥されてドラム状感光体が形成される。
この感光体は搬出用ハンド48により装置外に吸着搬送、
搬出される。Reference numeral 49 is a support supply hand, and if a cylindrical support is continuously set on this support by a robot or the like at a timing, the hand is raised to a predetermined position and the gripping tool is moved. The support is continuously fed to the applicator 41 in cooperation with the upward conveying operation of the 43A or 43B, coated and processed, and dried by an air jet dryer immediately above the applicator 41 to form a drum-shaped photosensitive member. The body is formed.
This photoconductor is adsorbed and carried out of the device by the carry-out hand 48,
Be shipped.
【0105】前記搬送塗布装置45の外、例えば特開昭56
-101149号に記載されるように多数の弾性グリッパを設
けた左右一対のチェンベルトにより円筒状支持体を連続
して垂直上方に搬送して塗布するようにしてもよい。In addition to the transfer coating device 45, for example, JP-A-56
No. 101149, a pair of left and right chain belts provided with a large number of elastic grippers may continuously convey the cylindrical support vertically upward and apply the support.
【0106】[0106]
【実施例】以下本発明を実施例により具体的に説明する
が、本発明の実施の態様がこれにより限定されるもので
はない。なお以降の電荷発生物質、電荷輸送物質、電荷
発生層及び電荷輸送層をCGM、CTM、CGL及びCTLと略称す
る。EXAMPLES The present invention will be specifically described below with reference to examples, but the embodiments of the present invention are not limited thereto. The charge generating substance, charge transporting substance, charge generating layer and charge transporting layer hereinafter are abbreviated as CGM, CTM, CGL and CTL.
【0107】(円筒状支持体の調製)長さ355.5mm、外
径80mmのアルミ管体を用意し、これらの管体のそれぞれ
に塩化ビニル-酢酸ビニル-無水マレイン酸共重合体(積
水化学社製、エスレックMF-10)10重量部を1000重量部
のメチルエチルケトンに溶解し、得られた溶液を通常の
浸漬塗布法により塗布、乾燥して乾燥膜厚0.1μmの中間
層を形成し、15本のテスト用支持体を調製した。(Preparation of Cylindrical Support) An aluminum tube having a length of 355.5 mm and an outer diameter of 80 mm was prepared, and a vinyl chloride-vinyl acetate-maleic anhydride copolymer (Sekisui Chemical Co., Ltd.) was provided in each of these tubes. Manufactured by S-REC MF-10) 10 parts by weight is dissolved in 1000 parts by weight of methyl ethyl ketone, and the resulting solution is applied by a normal dip coating method and dried to form an intermediate layer having a dry film thickness of 0.1 μm, and 15 Was prepared as a test support.
【0108】(本発明テスト用感光体の調製)
(1)テストNo.1〜No.3感光体の調製:前記支持体の
うちの3本の支持体に下記処方のCTL用基本処方(1)
の固形分に対するシリコーン含有量をppmで表し、該ppm
の量Xを表1−1の如く50ppm、100ppm、200ppmに変化
してCTL用の3種類の塗布液を作成し、スライドホッパ
塗布機11が組込まれた塗布装置45により塗布し乾燥膜厚
が20μm、20μm、21μmの3種類のCTLを形成した。(Preparation of Photoreceptor for Testing of the Present Invention) (1) Preparation of Test No. 1 to No. 3 Photoreceptors: Basic support for CTL (1 )
The silicone content relative to the solid content of is expressed in ppm,
The amount X of X is changed to 50 ppm, 100 ppm, and 200 ppm as shown in Table 1-1 to prepare three kinds of coating liquids for CTL, and the coating is performed by the coating device 45 with the slide hopper coating machine 11 incorporated. Three types of CTL of 20 μm, 20 μm and 21 μm were formed.
【0109】
CTL基本処方(1)
ポリカーボネート(三菱瓦斯化学社製 PCZ-200) 100重量部
下記構造のCTM(1) 90重量部
シリコーンオイル(信越化学社製 KF-54) Xppm
(処方全固形分について)
1,2-ジクロルメタン 1000重量部
次いで下記処方のCGL用基本処方(1)の固形分に対す
るシリコーンオイルの含有量をppmで表し、該ppmの量X
を1500ppmとしてCGL用塗布液を作成し、これを3分割し
てCTLの場合と同様の円形スライドホッパ塗布機11を組
込んだ塗布装置45を用いて前記の支持体のCTL上に塗布
し、それぞれ乾燥膜厚が6μm、8μm、4μmのCGLを形
成し、本発明テスト用感光体No.1〜No.3を得た。CTL basic formulation (1) Polycarbonate (PCZ-200 manufactured by Mitsubishi Gas Chemical Co., Inc.) 100 parts by weight CTM (1) 90 parts by weight of the following structure Silicone oil (KF-54 manufactured by Shin-Etsu Chemical Co., Ltd.) Xppm (total solid content of the formulation) About 1,2-dichloromethane 1000 parts by weight Next, the content of silicone oil based on the solid content of the basic formulation (1) for CGL of the following formulation is expressed in ppm, and the amount of the ppm is X
To 1500 ppm to prepare a CGL coating solution, which is divided into 3 parts and coated on the CTL of the above support using a coating device 45 incorporating a circular slide hopper coating machine 11 similar to the case of CTL, CGLs each having a dry film thickness of 6 μm, 8 μm and 4 μm were formed to obtain photoconductors No. 1 to No. 3 for testing of the present invention.
【0110】 CGL基本処方(1): ポリカーボネート(PCZ-200) 10重量部 下記構造のCGM(1) 40重量部 シリコーンオイルKF-54(処方全固形分について) 1500ppm テトラハイドロフラン 1000重量部[0110] CGL basic prescription (1): Polycarbonate (PCZ-200) 10 parts by weight 40 parts by weight of CGM (1) with the following structure Silicone oil KF-54 (about total prescription solid content) 1500ppm Tetrahydrofuran 1000 parts by weight
【0111】[0111]
【化13】 [Chemical 13]
【0112】(2)テストNo.4〜No.6感光体の調製:
下記のCTL用基本処方(2)の固形分に対するシリコー
ンオイル含有量をppmで表し、該ppmの量を表1−1の如
く10ppm、20ppm、100ppmに変化して3種類のCTL用塗布
液を作成し、これらを前記支持体のうちの3本の支持体
に通常の浸漬塗布機を用いてそれぞれ塗布し乾燥膜厚が
19μm、20μm、20μmのCTLを形成した。(2) Test No. 4 to No. 6 Preparation of photoconductors:
The silicone oil content relative to the solid content of the following basic formulation for CTL (2) is expressed in ppm, and the amount of the ppm is changed to 10 ppm, 20 ppm, and 100 ppm as shown in Table 1-1, and three types of CTL coating liquids are prepared. Prepared, and applied to each of the three supports among the above-mentioned supports by using an ordinary dip coating machine to obtain a dry film thickness.
19 μm, 20 μm, 20 μm CTLs were formed.
【0113】
CTL用基本処方(2)
ポリカーボネート(PCZ-200) 100重量部
下記構造のCTM(2) 90重量部
シリコーンオイル(トーレシリコン社製 SH510)
(処方全固形分について) Xppm
1,2-ジクロルメタン 1000重量部
次いで下記処方のCGL用基本処方(2)の固形分に対す
るシリコーンオイルの含有量をppmで表し、該ppmの量X
を表1−1の如く1100ppm、1100ppm、1200ppmに変化し
て3種類のCGL用塗布液を作成し、これらを前記支持体
のCTL上に円形押出し塗布機11’を組込んだ塗布装置45
を用いて塗布し、それぞれ乾燥膜厚が5μm、5μm、6
μmのCGLを形成し、本発明テスト用感光体No.4〜No.6
を得た。Basic formulation for CTL (2) Polycarbonate (PCZ-200) 100 parts by weight CTM with the following structure (2) 90 parts by weight Silicone oil (SH510 manufactured by Toray Silicon Co.) (Regarding total solid content) Xppm 1,2- Dichloromethane 1000 parts by weight Next, the content of silicone oil based on the solid content of the basic formulation (2) for CGL of the following formulation is expressed in ppm, and the amount of the ppm is X
As shown in Table 1-1, three kinds of CGL coating liquids were prepared by changing them to 1100ppm, 1100ppm and 1200ppm, and these were coated on the CTL of the support by a circular extrusion coating machine 11 '.
To obtain a dry film thickness of 5 μm, 5 μm, 6
A CGL of μm is formed, and the photoconductors No. 4 to No. 6 for testing of the present invention are formed.
Got
【0114】 CGL用基本処方(2) ポリカーボネート(PCZ-200) 10重量部 下記構造のCGM(2) 40重量部 シリコーンオイル SH510(処方全固形分について) Xppm テトラハイドロフラン 1000重量部[0114] Basic prescription for CGL (2) Polycarbonate (PCZ-200) 10 parts by weight 40 parts by weight of CGM (2) with the following structure Silicone oil SH510 (for all prescription solids) Xppm Tetrahydrofuran 1000 parts by weight
【0115】[0115]
【化14】 [Chemical 14]
【0116】(3)テストNo.7〜No.10感光体の調製:
下記処方のCTL用基本処方(3)の固形分に対するシリ
コーンオイルの含有量をppmで表し、該ppmの量Xを1000
ppm、5000ppm、8000ppmに変化して3種類のCTL用塗布液
を作成し、これらを前記支持体のうちの3本の支持体上
に通常の浸漬塗布機により塗布し、それぞれ乾燥膜厚が
21μm、21μm、20μmのCTLを形成した。
CTL用基本処方(3):
ポリカーボネート(PCZ-200) 100重量部
下記構造のCTM(3) 90重量部
シリコーンオイル(東芝シリコン社製 TSF431)
(処方全固形分について) Xppm
1,2-ジクロルメタン 1000重量部
次いで下記処方のCGL用基本処方(3)の固形分に対す
るシリコーンオイルの含有量をppmで表し、該ppmの量X
を表1−1の如く、4000ppm、6000ppm、9000ppmに変化
して3種類のCGL用塗布液を作成し、これらを円形少量
ディップ塗布機11”が組込まれた塗布装置45を用いて前
記支持体のCTL上に塗布し、それぞれ乾燥膜厚が表1−
1の如く4μm、5μm、4μmのCGLを形成し、本発明テ
スト用感光体No.7〜No.9を得た。(3) Test No. 7 to No. 10 Preparation of photoconductors:
The content of silicone oil based on the solid content of the basic formulation (3) for CTL of the following formulation is expressed in ppm, and the amount X of the ppm is 1000
ppm, 5000ppm, 8000ppm to prepare three kinds of coating liquid for CTL, and apply these to three of the above-mentioned supports by a normal dip coating machine,
21 μm, 21 μm, 20 μm CTLs were formed. Basic formulation for CTL (3): Polycarbonate (PCZ-200) 100 parts by weight CTM (3) with the following structure 90 parts by weight Silicone oil (TSF431 manufactured by Toshiba Silicon Co.) (Regarding total solid content) Xppm 1,2-dichloromethane 1000 Parts by weight Next, the content of silicone oil is expressed in ppm with respect to the solid content of the basic formulation (3) for CGL of the following formulation, and the amount of the ppm is X
As shown in Table 1-1, three kinds of CGL coating liquids were prepared by changing them to 4000 ppm, 6000 ppm and 9000 ppm, and these support materials were applied using a coating device 45 incorporating a circular small amount dip coating machine 11 ". It is applied on the CTL of and the dry film thickness is shown in Table 1-
CGLs of 4 μm, 5 μm and 4 μm were formed as in No. 1 to obtain the photoconductors No. 7 to No. 9 for testing of the present invention.
【0117】
CGL用基本処方(3)
ポリカーボネート(PCZ-200) 10重量部
下記構造のCGM(3) 40重量部
シリコーンオイル(TSF431)(処方全固形分について) Xppm
テトラハイドロフラン 1000重量部
又、別に前記支持体のうちの1本の支持体上にCTL用基
本処方(3)のシリコーンオイルTSF431に代えてジメチ
ルシリコーンオイルを用い、該シリコーンオイルを処方
固形分に対して10ppm含有せしめたCTL用塗布液を通常の
浸漬塗布機により塗布し、乾燥膜厚が20μmのCTLを形成
した。該CTL上にCGL用基本処方(3)のシリコーンオイ
ルTSF431に代えてジメチルシリコーンオイルを用い、該
シリコーンオイルを処方固形分に対して1100ppmとしたC
GL用塗布液を円形少量ディップ塗布機11”が組込まれた
前記塗布装置45により塗布し、乾燥膜厚が6μmのCGLを
形成し、本発明テスト用感光体No.10を得た。Basic formulation for CGL (3) Polycarbonate (PCZ-200) 10 parts by weight CGM (3) having the following structure 40 parts by weight Silicone oil (TSF431) (Regarding total solids content) Xppm Tetrahydrofuran 1000 parts by weight Also, Separately, for one of the above-mentioned supports, dimethyl silicone oil was used in place of the silicone oil TSF431 of the basic formulation (3) for CTL, and the silicone oil was contained at 10 ppm with respect to the formulation solid content. The coating solution was applied by an ordinary dip coating machine to form a CTL having a dry film thickness of 20 μm. Dimethyl silicone oil was used on the CTL instead of the silicone oil TSF431 of the basic formulation (3) for CGL, and the silicone oil was adjusted to 1100 ppm with respect to the solid content of the formulation.
The coating liquid for GL was applied by the above-mentioned coating device 45 equipped with a circular small amount dip coating machine 11 ″ to form CGL having a dry film thickness of 6 μm to obtain a photoconductor No. 10 for test of the present invention.
【0118】[0118]
【化15】 [Chemical 15]
【0119】(比較テスト用感光体の調製)
(4)テストNo.11及び12の感光体の調製:CTL用基本処
方(1)のシリコーンオイルの量Xppmを表1−1の如
く0及び1000ppmに変化して2種類のCTL用塗布液を作成
し、それらを前記支持体のうちの2本の支持体上に円形
スライドホッパ塗布機11が組込まれた塗布装置45を用い
て塗布し、乾燥膜厚が18μmの2種類のCTLを形成した。(Preparation of Photoreceptor for Comparative Test) (4) Preparation of Photoreceptor of Test Nos. 11 and 12: Amount Xppm of Silicone Oil of Basic Formula (1) for CTL is 0 and 1000 ppm as shown in Table 1-1. To prepare two kinds of CTL coating solutions, and apply them to two of the supports using a coating device 45 having a circular slide hopper coating machine 11 incorporated therein, and dry them. Two types of CTL with a film thickness of 18 μm were formed.
【0120】次にCTL用基本処方(1)のシリコーンオ
イルの量Xppmを表1−1の如く2000ppm及び0ppmに変
化して2種類のCGL用塗布液を作成し、前記スライドホ
ッパ塗布機11が組込まれた塗布装置45を用いて前記2種
類のCTL上にそれぞれ塗布し、乾燥膜厚が表1−1の如
く7μm及び6μmの2種類のCGLを形成し、比較テスト
用感光体No.11及び12を得た。Next, the amount Xppm of silicone oil in the basic formulation (1) for CTL was changed to 2000 ppm and 0 ppm as shown in Table 1-1 to prepare two types of CGL coating solutions, and the slide hopper coating machine 11 was used. Using the built-in coating device 45, each of the above two types of CTL was coated to form two types of CGL having a dry film thickness of 7 μm and 6 μm as shown in Table 1-1. And 12 were obtained.
【0121】(5)テストNo.13の感光体の調製:CTL用
基本処方(1)のシリコーンオイルの量Xppmを50ppmと
してCTL用塗布液を作成し、これを前記支持体のうちの
1本の支持体上に通常の浸漬塗布機を用いて塗布し、乾
燥膜厚が19μmのCTLを形成した。(5) Preparation of Photoreceptor of Test No. 13: CTL coating liquid was prepared with the amount of silicone oil Xppm of the basic formulation (1) for CTL set to 50 ppm, and this was used as one of the above supports. It was coated on the support of 1. using a normal dip coating machine to form a CTL having a dry film thickness of 19 μm.
【0122】次にCGL用基本処方(1)のシリコーンオ
イルの量Xppmを500ppmとしてCGL用塗布液を作成し、こ
れを前記CTL上に円形押出し塗布機11'が装着された塗布
装置45を用いて塗布し、乾燥膜厚が5μmのCGLを形成
し、比較テスト用感光体No.13を得た。Next, a coating solution for CGL was prepared by setting the amount Xppm of the silicone oil of the basic formulation for CGL (1) to 500 ppm, and using this, the coating device 45 equipped with the circular extrusion coating machine 11 'on the CTL was used. Was applied to form CGL having a dry film thickness of 5 μm, and a photoconductor No. 13 for comparison test was obtained.
【0123】(6)テストNo.14及びNo.15の調製:CTL
用基本処方(1)のシリコーンオイルの量Xppmを表1
−1の如く20000ppm及び50ppmに変化して2種類のCTL用
塗布液を作成し、これらを前記支持体のうちの残りの2
本の支持体上に、通常の浸漬塗布機を用いて塗布し、乾
燥膜厚が表1−1の如く20μm及び21μmの2種類のCTL
を形成した。(6) Preparation of Test Nos. 14 and 15: CTL
Table 1 shows the amount Xppm of silicone oil in the basic formulation (1)
As shown in -1, change to 20000ppm and 50ppm to prepare two kinds of CTL coating liquids, and apply these to the remaining 2 of the supports.
Two kinds of CTL with a dry film thickness of 20 μm and 21 μm as shown in Table 1-1 were applied on a support of this book using an ordinary dip coating machine.
Was formed.
【0124】次にCGL用基本処方(1)のシリコーンオ
イル量Xppmを表1−1の如く25000ppm及び12000ppmに
変化して2種類のCGL用塗布液を作成し、それらを前記
2種類のCTL上に円形スライドホッパ塗布機11が組込ま
れた塗布装置45を用いて塗布し、乾燥膜厚5μmの2種
類のCGLを形成し、比較テスト用感光体No.14及びNo.15
を得た。Next, the silicone oil amount Xppm of the basic formulation (1) for CGL was changed to 25000 ppm and 12000 ppm as shown in Table 1-1 to prepare two types of CGL coating liquids, which were applied to the above two types of CTL. Coating is performed by using a coating device 45 in which a circular slide hopper coating machine 11 is incorporated, and two types of CGL having a dry film thickness of 5 μm are formed, and photoconductors No. 14 and No. 15 for comparison test are formed.
Got
【0125】なお前記15種類の感光体を塗布加工するに
際して下層のCTLの塗布状況及び上層のCGLの塗布状況を
その都度観察し、その結果を表1−2に示した。When coating the above 15 types of photoconductors, the coating state of CTL of the lower layer and the coating state of CGL of the upper layer were observed each time, and the results are shown in Table 1-2.
【0126】又、前記15種類の感光体をコニカ社製U-Bi
x3035の改造機(帯電特性を正に改造)に装着し、相対
湿度−60%、温度20℃の雰囲気下で各テスト共10000回
の実写テストを行い、画質を観察しその結果を表1−2
に示した。In addition, the above-mentioned 15 types of photoconductors are U-Bi manufactured by Konica
It was mounted on a modified x3035 machine (correctly modified charging characteristics), and 10,000 live tests were conducted for each test in an atmosphere with a relative humidity of -60% and a temperature of 20 ° C, and the image quality was observed and the results are shown in Table 1- Two
It was shown to.
【0127】又、前記10000回目の繰返し実写テストの
前後における感光体の黒紙電位(VB)及び白紙電位
(VW)を測定し、その結果を表1−2に示した。Further, the black paper potential (V B ) and the white paper potential (V W ) of the photoconductor were measured before and after the 10,000th repeated actual copying test, and the results are shown in Table 1-2.
【0128】尚表1−2の黒紙電位(VB)は反射濃度
1.3の原稿に対する感光体の表面電位、白紙電位(VW)
は反射濃度「0」の原稿に対する感光体の表面電位であ
って、いづれも実写前後に現像器の位置に電位計のブロ
ーブを配置して測定された。又露光用光源が3000°Kの
ハロゲンランプが用いられているため、カラーバランス
を考慮して、カット波長13.0nmのIRカットフィルタを光
路中に設置してテストを行った。The black paper potential (V B ) in Table 1-2 is the reflection density.
Surface potential of photoreceptor and blank sheet potential (V W ) for 1.3 original
Is the surface potential of the photoconductor with respect to an original having a reflection density of "0", and was measured by placing a probe of an electrometer at the position of the developing device before and after actual copying. Since a halogen lamp of 3000 ° K is used as an exposure light source, an IR cut filter having a cut wavelength of 13.0 nm was installed in the optical path in consideration of color balance, and a test was conducted.
【0129】[0129]
【表1】 [Table 1]
【0130】尚表中の塗布の欄において、 P1…浸漬塗布 P2…円形スライドホッパ塗布 P3…円形押出し塗布 P4…円形少量ディップ塗布In the coating column in the table, P1 ... Immersion coating P2 ... Circular slide hopper application P3 ... Circular extrusion coating P4 ... Circular small amount dip coating
【0131】[0131]
【表2】 [Table 2]
【0132】表1−1及び表1−2より本発明の製造方
法により得られた感光体は比較感光体に比して塗布加工
がすぐれていて塗布欠陥及び画像欠陥を生じていない
が、比較感光体ではゆず肌、はじき、液垂れ等の塗布欠
陥が観察され、その結果画像むら、黒ぽち、かぶり等の
画像欠陥を生ずることが理解される。From Tables 1-1 and 1-2, the photoconductors obtained by the production method of the present invention were superior in coating processing to the comparative photoconductors and were free from coating defects and image defects. It is understood that coating defects such as orange peel, repellency, and liquid drop are observed on the photoconductor, resulting in image defects such as image unevenness, black spots, and fog.
【0133】[0133]
【発明の効果】以上の説明から明らかなように本発明の
感光体の製造方法によれば、塗布加工性及び生産性にす
ぐれていて、得られる感光体は、像形成に供したとき、
画像むら、筋、ぽち等を生ぜず、かつ、電子写真性能及
び繰返し使用時の耐久性にすぐれている等の効果を示
す。As is apparent from the above description, according to the method for producing a photosensitive member of the present invention, the coating processability and the productivity are excellent, and the obtained photosensitive member is
It shows effects such as no image unevenness, streaks, and streaks, and excellent electrophotographic performance and durability during repeated use.
【図1】第1図〜第3図は本発明の感光体の層構成を示
した各断面図である。FIG. 1 to FIG. 3 are cross-sectional views showing the layer structure of a photoconductor of the present invention.
【図2】第4図(a)及び第4図(b)は本発明に用い
られる円形スライドホッパ塗布機の断面図及び1部破断
斜視図である。2 (a) and 4 (b) are a sectional view and a partially broken perspective view of a circular slide hopper applicator used in the present invention.
【図3】第5図及び第6図は本発明に用いられる円形押
出し塗布機及び円形少量ディップ塗布機の各断面図であ
る。3 and 4 are sectional views of a circular extrusion coating machine and a circular small amount dip coating machine used in the present invention.
【図4】第7図は本発明に用いられる塗布装置の断面図
である。FIG. 4 is a sectional view of a coating device used in the present invention.
1:導電性支持体 2:電荷発生層 3:電荷輸送層 10:円筒状支持体 11:円形スライドホッパ塗布機 11’:円形押出し塗布機 11”:円形少量ディップ塗布機 12:塗布液分配室 13:分配スリット 16:ホッパエッジ 23:液止め用ブレード 24:液槽 28:液収容部 40a,b及びc:スペーサ 41:塗布機 42a,b,c及びd:把持部 45:塗布装置 1: conductive support 2: Charge generation layer 3: Charge transport layer 10: Cylindrical support 11: Circular slide hopper coating machine 11 ': Circular extrusion coating machine 11 ”: circular small amount dip coating machine 12: Coating liquid distribution chamber 13: Distribution slit 16: Hopper edge 23: Liquid stop blade 24: Liquid tank 28: Liquid storage section 40a, b and c: spacer 41: Coating machine 42a, b, c and d: gripping part 45: Coating device
【手続補正書】[Procedure amendment]
【提出日】平成4年8月11日[Submission date] August 11, 1992
【手続補正1】[Procedure Amendment 1]
【補正対象書類名】明細書[Document name to be amended] Statement
【補正対象項目名】図面の簡単な説明[Name of item to be corrected] Brief description of the drawing
【補正方法】変更[Correction method] Change
【補正内容】[Correction content]
【図面の簡単な説明】[Brief description of drawings]
【図1】(1)
〜(3)は本発明の感光体の層構成を示
した各断面図である。 [1] (1) to (3) are each cross-sectional view showing the layer structure of the photoreceptor of the present invention.
【図2】(a)
及び(b)は本発明に用いられる円形ス
ライドホッパ塗布機の断面図及び1部破断斜視図であ
る。 2A and 2B are a sectional view and a partially broken perspective view of a circular slide hopper coating machine used in the present invention.
【図3】(a)
及び(b)は本発明に用いられる円形押
出し塗布機及び円形少量ディップ塗布機の各断面図であ
る。 3 (a) and (b) is a respective cross-sectional view of a circular extrusion coater and a circular small amount dip coater used in the present invention.
【図4】 本発明に用いられる塗布装置の断面図である。 FIG. 4 is a sectional view of a coating apparatus used in the present invention.
【符号の説明】 1 導電性支持体 2 電荷発生層 3 電荷輸送層 10 円筒状支持体 11 円形スライドホッパ塗布機 11’ 円形押出し塗布機 11” 円形少量ディップ塗布機 12 塗布液分配室 13 分配スリット 16 ホッパエッジ 23 液止め用ブレード 24 液槽 28 液収容部 40a,b及びc スペーサ 41 塗布機 42a,b,c及びd 把持部 45 塗布装置[Explanation of symbols] 1 Conductive support 2 Charge generation layer 3 Charge transport layer 10 Cylindrical support 11 Circular Slide Hopper Coater 11 ' Circular Extrusion Coater 11 " Circular Small Dip Coater 12 Coating liquid distribution chamber 13 Distribution slit 16 Hopper edge 23 Liquid stop blade 24 Liquid tank 28 Liquid storage parts 40a, b and c Spacer 41 Coating machines 42a, b, c and d Grip 45 Coating device
【手続補正2】[Procedure Amendment 2]
【補正対象書類名】図面[Document name to be corrected] Drawing
【補正対象項目名】全図[Correction target item name] All drawings
【補正方法】変更[Correction method] Change
【補正内容】[Correction content]
【図1】 [Figure 1]
【図2】 [Fig. 2]
【図3】 [Figure 3]
【図4】 [Figure 4]
Claims (4)
発生層をこの順に積層して成る感光層を有する電子写真
感光体において、前記電荷輸送層及び電荷発生層の各層
がシリコーンオイルを含有し、該各層のシリコーンオイ
ルの濃度(ppm)が下記式−(1)及び式−(2)を満
足することを特徴とする感光体。 式−(1):〔Q〕≧〔P〕+1000 式−(2):〔Q〕≦10000 〔但し式中、〔Q〕は電荷発生層中のシリコーンオイル
の濃度(ppm)、〔P〕は電荷輸送層中のシリコーンオイ
ルの濃度(ppm)を表す〕1. An electrophotographic photoreceptor having a photosensitive layer comprising a charge transport layer and a charge generating layer laminated in this order on a conductive support, wherein each of the charge transport layer and the charge generating layer comprises silicone oil. A photoconductor, containing the silicone oil, wherein the concentration (ppm) of the silicone oil in each layer satisfies the following formula- (1) and formula- (2). Formula- (1): [Q] ≧ [P] +1000 Formula- (2): [Q] ≦ 10000 [wherein, [Q] is the concentration (ppm) of silicone oil in the charge generation layer, [P] Represents the concentration (ppm) of silicone oil in the charge transport layer]
シリコーンオイルである請求項1に記載の感光体。2. The photoreceptor according to claim 1, wherein the silicone oil is methylphenyl silicone oil.
なくとも電荷輸送層とその上に電荷発生層をこの順に積
層塗布する感光体の製造方法において、前記電荷発生層
用及び電荷輸送層用の夫々の塗布液が、形成された両層
において夫々下記式−(1)及び−(2)に規定する濃
度(ppm)のシリコーンオイルを含有し、かつ少なくと
も電荷発生層の塗布加工を、前記円筒状導電性支持体に
塗布液が囲繞、接触する円筒体塗布機を用いて行うこと
を特徴とする感光体の製造方法。 式−(1):〔Q〕≧〔P〕+1000 式−(2):〔Q〕≦10000 〔但し〔Q〕は電荷発生層中のシリコーンオイルの濃度
(ppm)、〔P〕は輸送層中のシリコーンオイルの濃度
(ppm)を表す。〕3. A method for producing a photoconductor, comprising: coating a cylindrical conductive support with at least a charge transport layer and a charge generation layer formed thereon in this order from the surface of the support, wherein the charge generation layer and the charge transport layer are used. Each of the coating liquids described above contains silicone oil in the concentration (ppm) defined in the following formulas (1) and (2) in both formed layers, and at least the charge generation layer is coated with A method for producing a photoreceptor, which is carried out by using a cylindrical body coating machine in which a coating liquid surrounds and contacts a cylindrical conductive support. Formula- (1): [Q] ≧ [P] +1000 Formula- (2): [Q] ≦ 10,000 [where [Q] is the concentration (ppm) of silicone oil in the charge generation layer, and [P] is the transport layer) Indicates the concentration (ppm) of silicone oil in the product. ]
シリコーンオイルである請求項3に記載の感光体の製造
方法。4. The method for producing a photoconductor according to claim 3, wherein the silicone oil is methylphenyl silicone oil.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3761291A JP2909665B2 (en) | 1991-03-04 | 1991-03-04 | Photoconductor and method of manufacturing the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3761291A JP2909665B2 (en) | 1991-03-04 | 1991-03-04 | Photoconductor and method of manufacturing the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0527456A true JPH0527456A (en) | 1993-02-05 |
| JP2909665B2 JP2909665B2 (en) | 1999-06-23 |
Family
ID=12502430
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3761291A Expired - Fee Related JP2909665B2 (en) | 1991-03-04 | 1991-03-04 | Photoconductor and method of manufacturing the same |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2909665B2 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0882940A (en) * | 1994-09-12 | 1996-03-26 | Nec Corp | Production of electrophotographic photoreceptor and its photosensitive layer |
| JP2000347518A (en) * | 1999-06-04 | 2000-12-15 | Ricoh Co Ltd | Image forming device |
| US7131449B2 (en) | 2005-01-27 | 2006-11-07 | Aderans Co., Ltd. | Wig |
| KR20160045619A (en) | 2013-08-19 | 2016-04-27 | 가부시키가이샤 후지코 | Lightweight felts |
-
1991
- 1991-03-04 JP JP3761291A patent/JP2909665B2/en not_active Expired - Fee Related
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0882940A (en) * | 1994-09-12 | 1996-03-26 | Nec Corp | Production of electrophotographic photoreceptor and its photosensitive layer |
| JP2000347518A (en) * | 1999-06-04 | 2000-12-15 | Ricoh Co Ltd | Image forming device |
| US7131449B2 (en) | 2005-01-27 | 2006-11-07 | Aderans Co., Ltd. | Wig |
| KR20160045619A (en) | 2013-08-19 | 2016-04-27 | 가부시키가이샤 후지코 | Lightweight felts |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2909665B2 (en) | 1999-06-23 |
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