JPH05326679A - Storage container for mirror surface wafer transportation - Google Patents
Storage container for mirror surface wafer transportationInfo
- Publication number
- JPH05326679A JPH05326679A JP13367692A JP13367692A JPH05326679A JP H05326679 A JPH05326679 A JP H05326679A JP 13367692 A JP13367692 A JP 13367692A JP 13367692 A JP13367692 A JP 13367692A JP H05326679 A JPH05326679 A JP H05326679A
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- storage container
- mirror
- inert gas
- container
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011261 inert gas Substances 0.000 claims abstract description 26
- 239000007789 gas Substances 0.000 claims abstract description 16
- 230000006866 deterioration Effects 0.000 abstract description 14
- 230000003749 cleanliness Effects 0.000 abstract description 8
- 150000001875 compounds Chemical class 0.000 abstract description 7
- 239000004065 semiconductor Substances 0.000 abstract description 7
- 230000000694 effects Effects 0.000 abstract description 4
- 235000012431 wafers Nutrition 0.000 description 46
- 239000000463 material Substances 0.000 description 6
- -1 polypropylene Polymers 0.000 description 5
- 239000004033 plastic Substances 0.000 description 4
- 229920003023 plastic Polymers 0.000 description 4
- 239000004677 Nylon Substances 0.000 description 3
- 239000004698 Polyethylene Substances 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 229920001778 nylon Polymers 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 229920000573 polyethylene Polymers 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- 239000004809 Teflon Substances 0.000 description 2
- 229920006362 Teflon® Polymers 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 206010013786 Dry skin Diseases 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000002440 industrial waste Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000005022 packaging material Substances 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Packaging Frangible Articles (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Packaging Of Annular Or Rod-Shaped Articles, Wearing Apparel, Cassettes, Or The Like (AREA)
Abstract
(57)【要約】
【目的】化合物半導体鏡面ウエハの鏡面状態の劣化低減
を可能とする。
【構成】外気との間を遮断した密閉構造よりなる鏡面ウ
エハ収納空間を有し、かつウエハ収納状態では外部から
の光を遮断する鏡面ウエハ運搬用収納容器１が、ウエハ
収納空間内の雰囲気ガスを不活性ガスに置換する機能を
持っていることを特徴とする。
【効果】鏡面ウエハ収納空間内の雰囲気ガスの清浄度が
長期間にわたって維持されるようになる。
(57) [Abstract] [Purpose] It is possible to reduce the deterioration of the mirror surface state of a compound semiconductor mirror surface wafer. A storage container 1 for transporting a mirror-like wafer, which has a mirror-finished wafer storage space having a closed structure that shuts off the outside air and shuts off light from the outside in a wafer-stored state, is an atmosphere gas in the wafer storage space. It is characterized by having a function of substituting an inert gas. [Effect] The cleanliness of the atmosphere gas in the mirror wafer storage space can be maintained for a long period of time.
Description
【０００１】[0001]
【産業上の利用分野】本発明は、鏡面ウエハ運搬用収納
容器に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a storage container for transporting a mirror surface wafer.
【０００２】[0002]
【従来の技術】化合物半導体鏡面ウエハの収納容器とし
ては、ウエハを直接収納することを目的としたものとし
て複数枚を同時に収納するボックス構造のもの（一般的
にはウエハボックスと称している）と、１枚づつ収納す
る構造のもの（一般的にはウエハトレイと称している）
とがある（以後これらを一次収納容器と称する）。一次
収納容器の機能としては（１）ウエハを清浄に保つ、
（２）ウエハを機械的損傷から保護すること等が上げら
れる。2. Description of the Related Art As a container for storing a compound semiconductor mirror-finished wafer, a container having a box structure (generally referred to as a wafer box) for simultaneously storing a plurality of wafers is provided for the purpose of directly storing the wafer. A structure for storing one wafer at a time (generally called a wafer tray)
(Hereinafter, these are referred to as primary storage containers). The functions of the primary storage container are (1) keep the wafer clean,
(2) The protection of the wafer from mechanical damage can be improved.
【０００３】これらの一次収納容器は、保管または運搬
のために更に二次収納容器に入れられる。保管用二次収
納容器は一般的に保管庫と称されるものである。二次収
納容器のうちこの保管庫の機能としては（１）ウエハを
保管する、（２）ウエハを清浄に保つ、（３）ウエハ鏡
面状態の劣化を防ぐ等が上げられる。These primary storage containers are further placed in secondary storage containers for storage or transportation. The secondary storage container for storage is generally called a storage. The functions of this storage in the secondary storage container are (1) storing the wafer, (2) keeping the wafer clean, (3) preventing deterioration of the mirror state of the wafer, and the like.
【０００４】運搬用二次収納容器としては袋構造のもの
や袋構造のものとプラスチック製の箱を組み合わせたも
の等があり、機能としては（１）ウエハの清浄度を保
つ、（２）ウエハ鏡面の劣化を防ぐ等が上げられる。運
搬に伴う衝撃等の吸収は一般的にはこの運搬用二次収納
容器外のクッション材等により行っている。The secondary storage container for transportation may be of a bag structure or a combination of a bag structure and a plastic box. Its functions are (1) wafer cleanliness, and (2) wafer. The prevention of deterioration of the mirror surface can be improved. Generally, the cushioning material etc. outside the secondary storage container for transportation is used to absorb the impact and the like during transportation.
【０００５】一次収納容器はポリプロピレンやテフロン
等を素材としている。二次収納容器の保管庫はステンレ
スあるいは塩化ビニル等を素材とし、ウエハ収納空間の
雰囲気ガスは不活性ガス等で連続的に置換されるように
なっている。The primary storage container is made of polypropylene, Teflon, or the like. The storage of the secondary storage container is made of stainless steel, vinyl chloride, or the like, and the atmospheric gas in the wafer storage space is continuously replaced with an inert gas or the like.
【０００６】一方、運搬用二次収納容器としては、袋構
造のものとしてはナイロン、アルミニウム、ポリエチレ
ン等を層状に重ねたラミネート構造の素材よりなるもの
や単一のプラスチック素材よりなるものが使用されてい
る。袋構造のものと併用されるプラスチック製箱も単一
素材よりなるものが一般的である。On the other hand, as the secondary storage container for transportation, a bag structure having a laminated structure of nylon, aluminum, polyethylene or the like or a single plastic material is used. ing. The plastic box used together with the bag structure is generally made of a single material.
【０００７】[0007]
【発明が解決しようとする課題】これらの収納容器に収
納される化合物半導体鏡面ウエハに対しては（１）清浄
度が保たれていること、（２）機械的損傷を受けていな
いこと、（３）ウエハ鏡面状態が劣化していないこと等
がその品質特性として上げられる。DISCLOSURE OF THE INVENTION Problems to be Solved by the Invention (1) Cleanliness is maintained for compound semiconductor mirror wafers stored in these storage containers, (2) No mechanical damage is caused, 3) The quality characteristic is that the mirror state of the wafer is not deteriorated.
【０００８】この品質特性のうちで（３）に対しては上
述の従来技術ではそれを満足するには多くの欠点があっ
た。ウエハ鏡面状態の劣化要因としてはウエハそのもの
が一次容器収納以前から何らかの劣化要因を保持してい
る場合を除いて考えて、酸素や水分の存在、収納容器か
らの微量な有機物等の発生、光の存在等が考えられ、こ
れらの単一、あるいは複合的作用によウエハ鏡面劣化が
進行すると推定される。Regarding the quality characteristic (3), the above-mentioned conventional technique has many drawbacks to satisfy it. Except for the case where the wafer itself holds some deterioration factor before the primary container is stored, the deterioration factor of the wafer mirror surface state should be considered. Existence is considered, and it is estimated that wafer mirror surface deterioration progresses due to these single or combined actions.
【０００９】これらの劣化要因を全て完全に取り除くこ
とが必要であるが、特に運搬用二次収納容器ではその実
現が困難である。酸素や水分については袋構造の二次収
納容器を乾燥した窒素ガス等の不活性気体で置換後封止
すればかなりの割合でその影響が取り除かれる。Although it is necessary to completely remove all of these deterioration factors, it is difficult to achieve this especially in a secondary storage container for transportation. Oxygen and water can be removed from the effect in a considerable amount by sealing the bag-shaped secondary container after substituting it with an inert gas such as dry nitrogen gas.
【００１０】光についても遮光性を有する一次収納容器
の使用あるいは遮光性を有する袋構造のものを使用する
ことにより、除外し得る。Light can also be excluded by using a primary storage container having a light shielding property or using a bag structure having a light shielding property.
【００１１】しかし最後に残った収納容器（これは一次
及び二次収納両容器が該当する）からの微量な有機物等
の発生は容器自体の材質に起因するもので、しかし機能
及び経済性からポリプロピレンやテフロン、ナイロン等
のプラスチック素材を使わざるを得ない。従ってそれを
完全になくすことはできず、それらに収納されたウエハ
は不活性気体で置換されているとは云え、かなり小さな
容積の袋構造の二次収納容器内にある限り、その空間内
に閉じ込められた微量有機物等の影響を全く受けないわ
けにはいかない。特にその状態での収納期間が長期化す
ると影響度は著しくなる。However, the trace amount of organic substances and the like generated from the last remaining storage container (this corresponds to both the primary and secondary storage containers) is due to the material of the container itself, but from the viewpoint of function and economy, polypropylene is used. I have no choice but to use plastic materials such as Teflon and nylon. Therefore, it cannot be completely eliminated, and it can be said that the wafers contained in them are replaced with an inert gas, and as long as they are in a secondary container having a bag structure of a considerably small volume, they are not contained in the space. It is unavoidable to be influenced by the trapped trace organic substances. Especially when the storage period in that state is extended, the degree of influence becomes remarkable.
【００１２】本発明は以上の点に鑑みなされたものであ
り、化合物半導体鏡面ウエハの鏡面状態の劣化低減を可
能とした鏡面ウエハ運搬用収納容器（運搬用二次収納容
器）を提供することを目的とするものである。The present invention has been made in view of the above points, and it is an object of the present invention to provide a storage container for transporting a mirror-finished wafer (secondary storage container for transport) capable of reducing deterioration of the mirror-finished state of a compound semiconductor mirror-finished wafer. It is intended.
【００１３】[0013]
【課題を解決するための手段】上記目的は、収納容器
が、ウエハ収納空間内の雰囲気ガスを不活性ガスに置換
する機能を持つようにすることにより、達成される。The above object can be achieved by providing the storage container with a function of replacing the atmospheric gas in the wafer storage space with an inert gas.
【００１４】[0014]
【作用】上記手段を設けたので、鏡面ウエハ収納空間内
の雰囲気ガスの清浄度が長期間にわたって維持されるよ
うになる。Since the above means is provided, the cleanliness of the atmospheric gas in the mirror wafer storage space can be maintained for a long period of time.
【００１５】[0015]
【実施例】次に本発明を実施例により具体的に説明す
る。EXAMPLES Next, the present invention will be specifically described by way of examples.
【００１６】〔実施例１〕図１には本発明の一実施例が
示されている。外気との間を遮断した密閉構造よりなる
鏡面ウエハ収納空間を有し、かつウエハ収納状態では外
部からの光を遮断する鏡面ウエハ運搬用収納容器１が、
ウエハ収納空間内の雰囲気ガスを不活性ガスに置換する
機能を持つようにした。このようにすることにより、鏡
面ウエハ収納空間内の雰囲気ガスの清浄度が長期間にわ
たって維持されるようになって、化合物半導体鏡面ウエ
ハの鏡面状態の劣化低減を可能とした鏡面ウエハ運搬用
収納容器１を得ることができる。[Embodiment 1] FIG. 1 shows an embodiment of the present invention. A storage container 1 for transporting a specular wafer, which has a specular wafer storage space having a hermetically-sealed structure that shuts off the outside air, and which shields light from the outside when the wafer is stored,
It has a function to replace the atmospheric gas in the wafer storage space with an inert gas. By doing so, the cleanliness of the atmosphere gas in the mirror wafer storage space can be maintained for a long period of time, and the container surface for transporting the mirror wafer that enables reduction of deterioration of the mirror surface state of the compound semiconductor mirror wafer. 1 can be obtained.
【００１７】すなわち一次収納容器に収納されたウエハ
（共に図示せず）は運搬用二次収納容器１に袋等に入れ
ることなくそのままの状態で収納し、シール２により内
部雰囲気と外気とを遮断する。次に電磁弁３、４を開に
して二次収納容器１内の空気を不活性ガスに置換する。That is, the wafer (both not shown) stored in the primary storage container is stored in the secondary storage container 1 for transportation as it is without being put in a bag or the like, and the seal 2 separates the inside atmosphere from the outside air. To do. Next, the solenoid valves 3 and 4 are opened to replace the air in the secondary storage container 1 with an inert gas.
【００１８】なお、この場合、不活性ガスのボンベ５の
容量の関係等からガスの消費量を節約する必要がある場
合には、電磁弁６を介して外部より不活性ガスを導入す
る。In this case, when it is necessary to save the gas consumption due to the capacity of the inert gas cylinder 5 or the like, the inert gas is introduced from the outside through the solenoid valve 6.
【００１９】また、置換効率を上げるため不活性ガス導
入前に電磁弁４を開として、これより二次収納容器１内
の空気を真空ポンプにより排気し、その後不活性ガスを
導入してもよい。但しこの場合、真空排気時二次収納容
器１は外圧に耐え、かつ気密を保つ強度を持つ必要があ
る。Further, in order to improve the substitution efficiency, the solenoid valve 4 may be opened before introducing the inert gas, the air in the secondary storage container 1 may be evacuated by the vacuum pump, and then the inert gas may be introduced. .. However, in this case, the secondary storage container 1 must be strong enough to withstand external pressure and keep airtight during vacuum evacuation.
【００２０】二次収納容器１内の雰囲気ガスが不活性ガ
スに置換された後は保護用外箱７にクッション８を介し
て収納する。運搬を容易にするため外箱７には取手やキ
ャスター等を取り付けるとよい。After the atmosphere gas in the secondary storage container 1 is replaced with the inert gas, it is stored in the protective outer box 7 via the cushion 8. A handle, a caster, or the like may be attached to the outer box 7 to facilitate transportation.
【００２１】運搬中の不活性ガスの置換については電磁
弁コントロールユニット９に所定の指示を記憶させるこ
とにより実施できる。すなわち置換のインターバルと置
換に要する時間、すなわち電磁弁３、４を開として新し
い不活性ガスを導入する時間をそれぞれ電磁弁コントロ
ールユニット９に記憶させておけばよい。このようにす
ることによりその指示に従い雰囲気ガスの置換が定期的
に行われ、ウエハ周辺の雰囲気ガスは常に新しい不活性
ガスに維持される。The replacement of the inert gas during transportation can be carried out by storing a predetermined instruction in the solenoid valve control unit 9. That is, the replacement interval and the time required for replacement, that is, the time for opening the solenoid valves 3 and 4 and introducing a new inert gas may be stored in the solenoid valve control unit 9. By doing so, the atmosphere gas is regularly replaced according to the instruction, and the atmosphere gas around the wafer is always maintained as a new inert gas.
【００２２】コントロールユニット９へは不活性ガスの
ボンベ５の圧力センサー（図示せず）からの信号が接続
されており、不活性ガスの残量が少なくなった場合には
置換作業を中止し、電磁弁４の開により外気が浸入する
等のトラブルを避けるための安全機能もコントロールユ
ニット９には付されている。A signal from a pressure sensor (not shown) of the inert gas cylinder 5 is connected to the control unit 9, and when the residual amount of the inert gas becomes small, the replacement work is stopped, The control unit 9 is also provided with a safety function for avoiding troubles such as the entry of outside air by opening the solenoid valve 4.
【００２３】一次収納容器を二次収納容器１に収納する
操作は勿論、清浄度の管理された空間で実施する必要が
ある。従って二次収納容器１全体も清浄度を保つ必要が
ある。そのため保護用外箱７も運搬時に外気の浸入によ
る内部汚染が生じない程度の気密性を持つ必要がある。
なお、排気れた不活性ガスは外箱７に取り付けられたフ
ィルター１０を介して外部へ排気する構造としてある。
フィルター１０を用いたのは不活性ガスの排気を容易に
する一方、外気からの塵埃等の浸入を防ぐためである。
なお、同図において１１は減圧弁、１２は電磁弁コント
ロール用電線である。Needless to say, the operation of storing the primary storage container in the secondary storage container 1 must be performed in a space where the cleanliness is controlled. Therefore, it is necessary to maintain the cleanliness of the entire secondary storage container 1. Therefore, the protective outer box 7 also needs to be airtight to the extent that internal contamination does not occur due to ingress of outside air during transportation.
The exhausted inert gas is exhausted to the outside through the filter 10 attached to the outer box 7.
The filter 10 is used for facilitating the exhaust of the inert gas and preventing the intrusion of dust and the like from the outside air.
In the figure, 11 is a pressure reducing valve, and 12 is a solenoid valve control wire.
【００２４】なお、二次収納容器１は外部からの光がウ
エハの表面状態に影響しないよう光を遮断する材質で構
成してある。The secondary container 1 is made of a material that blocks light from the outside so as not to affect the surface condition of the wafer.
【００２５】本実施例と従来の袋構造の二次収納容器の
ウエハ表面品質に与える影響についての比較検討結果を
次に説明する。２種類の保管状態の化合物半導体ＧａＡ
ｓの鏡面ウエハを準備し、ある期間保管後その表面品質
をエッチング法により比較した。保管期間は１ケ月、２
ケ月、３ケ月、６ケ月、８ケ月とした。その結果を表１
に示す。The results of comparative examination of the effects of the present embodiment and the conventional bag-type secondary container on the wafer surface quality will be described below. Two types of stored compound semiconductor GaA
s mirror-finished wafers were prepared, and after being stored for a certain period of time, the surface quality was compared by the etching method. Storage period is 1 month, 2
Months, 3 months, 6 months and 8 months. The results are shown in Table 1.
Shown in.
【００２６】[0026]
【表１】 [Table 1]
【００２７】なお、この比較実験での本実施例での不活
性ガス（窒素ガス使用）置換は、２４時間に１回の割合
で二次収納容器１内の容積の約２倍に相当する分を流す
方式で実施した。一次収納容器としては標準仕様品とし
て販売されているボックス構造のものを使用した。袋構
造二次収納容器は光を遮断できるアルミラミネート構造
ものを用いた。その構造はナイロン／ポリエチレン／ア
ルミ／ポリエチレンである。The inert gas (using nitrogen gas) replacement in this embodiment in this comparative experiment corresponds to about twice the volume of the secondary storage container 1 once every 24 hours. Was carried out. As the primary storage container, a box structure sold as a standard specification product was used. The bag-structured secondary storage container had an aluminum laminate structure capable of blocking light. Its structure is nylon / polyethylene / aluminum / polyethylene.
【００２８】比較結果は同表から明らかなように、従来
例は保管期間が１ケ月後に極軽微な肌荒れが認められた
のに対し、本実施例は保管期間が３ケ月経ってから極軽
微な肌荒れ認められ、本実施例の方が表面状態の劣化は
軽微であることが判る。不活性ガスの置換頻度を多くす
れば劣化は更に抑制されると考えられる。As is clear from the table, the comparative results show that the conventional example had an extremely slight rough skin after a storage period of 1 month, whereas the present example showed an extremely slight skin roughness after a storage period of 3 months. Rough skin was observed, and it can be seen that the deterioration of the surface condition is slight in this example. It is considered that the deterioration is further suppressed by increasing the replacement frequency of the inert gas.
【００２９】このように本実施例によれば、ウエハ表面
品質の劣化を大幅に抑制することができ、そのためウエ
ハ使用前の有機溶剤での洗浄を省略できる効果がある。
通常劣化したウエハは塩素系有機溶剤等を用いないと、
元の状態に復することができないが、この収納容器を用
いることにより、劣化を抑制できるため塩素系有機溶剤
を使用せずにプロセス投入ができる。これは地球環境保
護のためにも有用である。また本実施例の二次収納容器
は所謂通い箱として使用できるため、従来の梱包材の使
い捨てをやめることができる。従って、産業廃棄物の低
減や資源の無駄をなくすことにも有用である。As described above, according to this embodiment, deterioration of the surface quality of the wafer can be significantly suppressed, and therefore, there is an effect that cleaning with an organic solvent before using the wafer can be omitted.
Normally, if a deteriorated wafer does not use a chlorine-based organic solvent,
Although it cannot be restored to the original state, by using this container, deterioration can be suppressed, so that the process can be input without using a chlorine-based organic solvent. This is also useful for protecting the global environment. Further, since the secondary storage container of this embodiment can be used as a so-called returnable box, it is possible to stop the conventional disposable packaging material. Therefore, it is also useful for reducing industrial waste and eliminating waste of resources.
【００３０】[0030]
【発明の効果】上述のように本発明は、収納容器が、ウ
エハ収納空間内の雰囲気ガスを不活性ガスに置換する機
能を持つようにしたので、鏡面ウエハ収納空間内の雰囲
気ガスの清浄度が長期間にわたって維持されるようにな
って、化合物半導体鏡面ウエハの鏡面状態の劣化低減を
可能とした鏡面ウエハ運搬用収納容器（運搬用二次収納
容器）を得ることができる。As described above, according to the present invention, since the storage container has a function of replacing the atmospheric gas in the wafer storage space with the inert gas, the cleanliness of the atmospheric gas in the mirror wafer storage space is improved. Is maintained for a long period of time, and a storage container for transporting a mirror-finished wafer (secondary storage container for transport) capable of reducing deterioration of the mirror-finished state of a compound semiconductor mirror-finished wafer can be obtained.
【図１】本発明の鏡面ウエハ運搬用収納容器の一実施例
の説明図である。FIG. 1 is an explanatory diagram of an embodiment of a storage container for transporting a mirror-like wafer according to the present invention.
１ 鏡面ウエハ運搬用収納容器（運搬用二次収納容器） ３、４ 電磁弁 ５ 不活性ガスのボンベ ６ 電磁弁 ９ 電磁弁コントロールユニット 1 Storage container for mirror surface wafer transportation (secondary storage container for transportation) 3, 4 Solenoid valve 5 Inert gas cylinder 6 Solenoid valve 9 Solenoid valve control unit
Claims (3)
面ウエハ収納空間を有し、かつウエハ収納状態では外部
からの光を遮断する鏡面ウエハ運搬用収納容器におい
て、前記収納容器が、前記ウエハ収納空間内の雰囲気ガ
スを不活性ガスに置換する機能を持っていることを特徴
とする鏡面ウエハ運搬用収納容器。1. A storage container for transporting a mirror-like wafer, which has a mirror-finished wafer storage space having a closed structure that shuts off air from the outside air, and shuts off light from the outside in a wafer-stored state. A container for transporting a mirror-like wafer, which has a function of replacing an atmospheric gas in a wafer housing space with an inert gas.
ガスへの置換が連続的に行われるものである請求項１記
載の鏡面ウエハ運搬用収納容器。2. The storage container for transporting a mirror-like wafer according to claim 1, wherein the storage container is one in which the atmosphere gas is continuously replaced with an inert gas.
ガスへの置換が所定の間隔で行われるものである請求項
１記載の鏡面ウエハ運搬用収納容器。3. The storage container for transporting a mirror-like wafer according to claim 1, wherein said storage container is one in which the atmosphere gas is replaced with an inert gas at predetermined intervals.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13367692A JPH05326679A (en) | 1992-05-26 | 1992-05-26 | Storage container for mirror surface wafer transportation |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13367692A JPH05326679A (en) | 1992-05-26 | 1992-05-26 | Storage container for mirror surface wafer transportation |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH05326679A true JPH05326679A (en) | 1993-12-10 |
Family
ID=15110288
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13367692A Pending JPH05326679A (en) | 1992-05-26 | 1992-05-26 | Storage container for mirror surface wafer transportation |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH05326679A (en) |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09134952A (en) * | 1995-11-03 | 1997-05-20 | Jenoptik Ag | Transport container for wafer-like objects |
| US5799464A (en) * | 1995-09-08 | 1998-09-01 | Astra Aktiebolag | Aseptic transfer |
| WO2000057457A1 (en) * | 1999-03-23 | 2000-09-28 | Alliedsignal Inc. | Method and apparatus for transporting articles |
| US7077173B2 (en) | 2001-07-13 | 2006-07-18 | Renesas Technology Corp. | Wafer carrier, wafer conveying system, stocker, and method of replacing gas |
| JP2007311742A (en) * | 2006-05-17 | 2007-11-29 | Taiwan Semiconductor Manufacturing Co Ltd | Carrier, equipment connecting device, and transport connecting system having these |
| US7339775B2 (en) | 2004-12-20 | 2008-03-04 | Freescale Semiconductor, Inc. | Overcurrent protection circuit and DC power supply |
| JP2011512642A (en) * | 2007-05-17 | 2011-04-21 | ブルックス オートメーション インコーポレイテッド | Side opening substrate carrier and load port |
| US8174251B2 (en) | 2007-09-13 | 2012-05-08 | Freescale Semiconductor, Inc. | Series regulator with over current protection circuit |
| US9105673B2 (en) | 2007-05-09 | 2015-08-11 | Brooks Automation, Inc. | Side opening unified pod |
-
1992
- 1992-05-26 JP JP13367692A patent/JPH05326679A/en active Pending
Cited By (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5799464A (en) * | 1995-09-08 | 1998-09-01 | Astra Aktiebolag | Aseptic transfer |
| JPH09134952A (en) * | 1995-11-03 | 1997-05-20 | Jenoptik Ag | Transport container for wafer-like objects |
| WO2000057457A1 (en) * | 1999-03-23 | 2000-09-28 | Alliedsignal Inc. | Method and apparatus for transporting articles |
| US6249990B1 (en) | 1999-03-23 | 2001-06-26 | Alliedsignal, Inc. | Method and apparatus for transporting articles |
| US7077173B2 (en) | 2001-07-13 | 2006-07-18 | Renesas Technology Corp. | Wafer carrier, wafer conveying system, stocker, and method of replacing gas |
| US7339775B2 (en) | 2004-12-20 | 2008-03-04 | Freescale Semiconductor, Inc. | Overcurrent protection circuit and DC power supply |
| JP2007311742A (en) * | 2006-05-17 | 2007-11-29 | Taiwan Semiconductor Manufacturing Co Ltd | Carrier, equipment connecting device, and transport connecting system having these |
| US7918251B2 (en) | 2006-05-17 | 2011-04-05 | Taiwan Semiconductor Manufacturing Co., Ltd. | Substrate carrier and facility interface and apparatus including same |
| DE102006059152B4 (en) * | 2006-05-17 | 2020-01-09 | Taiwan Semiconductor Mfg. Co., Ltd. | Substrate carrier and device interface and device containing the same |
| US9105673B2 (en) | 2007-05-09 | 2015-08-11 | Brooks Automation, Inc. | Side opening unified pod |
| JP2011512642A (en) * | 2007-05-17 | 2011-04-21 | ブルックス オートメーション インコーポレイテッド | Side opening substrate carrier and load port |
| JP2018032880A (en) * | 2007-05-17 | 2018-03-01 | ブルックス オートメーション インコーポレイテッド | Side opening substrate carrier and load port |
| US11201070B2 (en) | 2007-05-17 | 2021-12-14 | Brooks Automation, Inc. | Side opening unified pod |
| US8174251B2 (en) | 2007-09-13 | 2012-05-08 | Freescale Semiconductor, Inc. | Series regulator with over current protection circuit |
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