JPH05323113A - Color filter manufacturing method - Google Patents

Abstract

(57) [Summary] [Objective] Regarding the manufacturing method of the color filter, the purpose is to reduce the number of layers of the SOG film and improve the reliability of the color filter. [Structure] 1) A step in which a color layer material film 2 in which a dye is dissolved, a polyvinyl alcohol (PVA) film 3A, and a photoresist film 4 are sequentially deposited on a substrate 1, and a desired portion is provided through a mask 5. The process of exposing and developing the photoresist film 4 only, and using the developed photoresist film 4 as a mask, PV
By etching the A film 3A and the color layer material film 2, removing the photoresist film 4, and rinsing with water, PVA
It is configured to have a step of peeling off the film 3A, a step of depositing a separation film 6 on the substrate for separating the respective color layer material films, and a step of successively repeating the above steps. 2) The developing is performed using an organic developing solution.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a color filter. In recent years, the pixel size of solid-state imaging devices and liquid crystal display devices has been reduced, and along with this, it is necessary to reduce the size and thickness of color filters as well, and further improvement in quality is desired. There is.

[0002]

2. Description of the Related Art FIGS. 3 (A) to 3 (D) and FIGS. 4 (E) to 4 (I) are sectional views for explaining a conventional example of a method for manufacturing a color filter.

In FIG. 3A, a substrate (solid-state image sensor,
A color layer material film 2 in which a dye (for example, yellow) is dissolved in an EB resist is spin-coated on a glass substrate 1), baked, and spin-oglas (SOG) film 3 is spin-coated.
A baking process (200 ° C., 10 minutes to 1 hour) is performed, a photoresist film 4 is spin-coated, and a baking process is performed.

In FIG. 3B, only a desired portion is exposed and developed with ultraviolet (UV) light through the mask 5. Figure 3 (C)
In the above, using the developed photoresist film 4 as a mask, wet etching of hydrofluoric acid (HF) solution or dry etching using carbon tetrafluoride (CF ₄ ) gas was performed.
The SOG film 3 is etched.

In FIG. 3 (D), the color layer material film 2 is filled with oxygen (O).
₂ ) Dry etching with gas. FIG. 4E is a cross-sectional view after etching.

In FIG. 4 (F), the photoresist film 4 is removed (ashed or exposed over the entire surface and then stripped with a developing solution). In FIG. 4 (G), an SOG film is applied as a separation film 6 on the substrate and baked.

According to the color arrangement of the color filter,
The steps (A) to (G) are repeated several times to form a color filter. For example, in FIG. 4H, the second color layer material film 7 and the second SOG film 8 are formed. Although not shown,
The color layer material film and the third SOG film are similarly formed.

In FIG. 4 (I), an SOG film is applied as a cover film 9 on the substrate and baked. According to this process, SOG is applied to the color filter after several layers have been formed.
Six layers or more of the film will be formed.

[0009]

However, as is well known, the SOG film is prone to cracking, and there is a problem in the reliability of the color filter.

It is an object of the present invention to reduce the number of SOG film layers and improve the reliability of color filters.

[0011]

[Means for Solving the Problems] 1) The color layer material film 2 in which a dye is dissolved, the polyvinyl alcohol (PVA) film 3A, and the photoresist film 4 are sequentially deposited on the substrate 1. And the step of exposing and developing only the desired portion of the photoresist film 4 through the mask 5, and using the developed photoresist film 4 as a mask, the PVA film 3A
And a step of etching the color layer material film 2, a step of peeling the photoresist film 4, and a water rinse to remove the PVA.
Manufacture of a color filter including a step of peeling off the film 3A, a step of depositing a separation film 6 on the substrate for separating each color layer material film, and a step of repeating the above steps in order. Method, or 2) it is achieved by the method for producing a color filter described in 1) above, wherein the development is performed using an organic developer.

[0012]

The present invention uses a polyvinyl alcohol (PVA) resin film instead of the SOG film as an interlayer film (interlayer) between the color layer material film and the photoresist film.
The reliability is improved for the following reasons.

Originally, the role of the interlayer film of the color layer material film and the photoresist film is to prevent intermixing of both films, and it is not necessary to leave it after the patterning of the color layer material film. When the SOG film is used as the interlayer film, it is impossible to exfoliate only the SOG film in the process of FIG. 4 (F), and it is left.
There was a risk of cracks in the SOG film, which adversely affected reliability.

On the other hand, according to the present invention, since the PVA film has sufficient characteristics for preventing intermixing of the color layer material film and the photoresist film and is water-soluble, it can be rinsed with pure water.
It takes advantage of the fact that the PVA film dissolves easily and disappears.

[0015]

EXAMPLES FIGS. 1 (A) to 1 (D) and FIGS. 2 (E) to 2 (H) are sectional views for explaining an example of a method for producing a color filter.

In FIG. 1A, a substrate (solid-state image sensor,
A color layer material film 2 in which a dye (eg, yellow) is dissolved in an EB resist is spin-coated on a glass substrate 1), baked, and a PVA film 3A is spin-coated to form a negative photoresist film 4, for example. OMR 83 (manufactured by Tokyo Ohka) is spin-coated and baked.

In FIG. 1B, UV is passed through the mask 5.
Only the desired part is exposed with light. In FIG. 1C, the negative type photoresist film 4 is developed. Development is performed with an organic solvent,
For example, a mixed solution of normal heptane and butyrate acetate, normal cyclohexane, xylene, methyl isobutyre ketone, ethyl cellosolve acetate, etc. are used.

Here, in the embodiment, it is important to develop with an organic solvent as described above. If, in this process, a positive photoresist is used instead of the negative photoresist, and alkali development and pure water rinsing are carried out, the PVA film underneath the photoresist will dissolve and the PVA film will dissolve because the PVA is water-soluble. This is because the pattern disappears.

In FIG. 1D, the PVA film 3A and the color layer material film 2 are dry-etched with O ₂ gas using the developed negative photoresist film 4 as a mask. In FIG. 2 (E), the negative photoresist film 4 is stripped (ashing).
To do.

In FIG. 2F, the PVA film 3A is peeled off by water development. In FIG. 2 (G), a SOG film is applied as a separation film 6 on the substrate and baked.

The steps (A) to (G) are repeated several times to form a color filter. In FIG. 2H, the second color layer material film 7 is formed. Although not shown, the third color layer material film is also formed in the same manner.

Next, an SOG film is applied as a cover film 9 on the substrate and a baking process is performed. According to this process,
The SOG film formed on the color filter after forming several layers is only the separation film between the color layer material films.

[0023]

According to the present invention, the number of layers of the SOG film can be reduced and the reliability of the color filter can be improved.

That is, SOG that causes cracks
The total thickness of the film could be reduced by about 6000Å, so the SOG bake time was also reduced, and both reliability and throughput could be improved.

[Brief description of drawings]

FIG. 1 is a sectional view illustrating an embodiment (1)

FIG. 2 is a sectional view (2) illustrating an example.

FIG. 3 is a sectional view illustrating a conventional example (1)

FIG. 4 is a sectional view illustrating a conventional example (2)

[Explanation of symbols]

 1 substrate (solid-state image sensor, glass substrate, etc.) 2 color layer material film 3A PVA film 4 photoresist film 6 SOG film with separation layer 7 second color layer material film 9 SOG film with cover film

Claims (2)

[Claims] 1. A step of sequentially depositing a color layer material film (2) having a dye dissolved thereon, a polyvinyl alcohol (PVA) film (3A) and a photoresist film (4) on a substrate (1), Only the desired portion of the photoresist film (4) is exposed through the mask (5),
Development step, step of etching the PVA film (3A) and the color layer material film (2) using the developed photoresist film (4) as a mask, and peeling of the photoresist film (4) And a step of separating the PVA film (3A) by water rinsing, and separating the color layer material films on the substrate.
A method of manufacturing a color filter, comprising: a step of depositing (6); and a step of sequentially repeating the above steps. 2. The method of manufacturing a color filter according to claim 1, wherein the development is performed using an organic developing solution.