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JPH06203338A - Magneto-resitance effect type head - Google Patents

Magneto-resitance effect type head

Info

Publication number
JPH06203338A
JPH06203338A JP5001691A JP169193A JPH06203338A JP H06203338 A JPH06203338 A JP H06203338A JP 5001691 A JP5001691 A JP 5001691A JP 169193 A JP169193 A JP 169193A JP H06203338 A JPH06203338 A JP H06203338A
Authority
JP
Japan
Prior art keywords
shunt
layer
head
shunt layer
electrodes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP5001691A
Other languages
Japanese (ja)
Inventor
Shinji Kobayashi
伸二 小林
Isao Yasuda
伊佐雄 安田
Kazuhiko Takeda
和彦 武田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanyo Electric Co Ltd
Original Assignee
Sanyo Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Electric Co Ltd filed Critical Sanyo Electric Co Ltd
Priority to JP5001691A priority Critical patent/JPH06203338A/en
Publication of JPH06203338A publication Critical patent/JPH06203338A/en
Withdrawn legal-status Critical Current

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  • Magnetic Heads (AREA)
  • Recording Or Reproducing By Magnetic Means (AREA)

Abstract

PURPOSE:To provide the structure of the MR head which is controllable in the shunt ratio of sense current and bias current after film formation as the MR head having an MR element, a pair of electrodes for detecting a resistance change of the MR element and a shunt layer for impressing bias magnetic fields to the MR element. CONSTITUTION:A pair of the electrode layers 5, 6 for electrically connecting the shunt layer 4 in parallel to the MR element 1 are formed in superposition on both ends of the shunt layer 4. The respective electrode layers 5 are interposed with plural pieces of electrode lines 51 parallel with each other with both junctures are interposed between the juncture to the shunt layer 4 and the juncture to the electrodes 2. The shunt ratio of the current flowing in the MR element 1 and the shunt layer 4 is finely adjusted by the breakage of a required number of the electrode lines 51.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、磁気抵抗効果素子(以
下、MR素子という)を具えた磁気抵抗効果型ヘッド(以
下、MRヘッドという)に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a magnetoresistive head (hereinafter referred to as MR head) including a magnetoresistive effect element (hereinafter referred to as MR element).

【0002】[0002]

【従来の技術】近年、ハードディスク装置やVTR(ビ
デオテープレコーダ)等の各種信号記録再生装置の高密
度化、小形化に対応するために、再生出力特性に優れた
MRヘッドの開発が進んでいる。
2. Description of the Related Art In recent years, in order to cope with higher densities and miniaturization of various signal recording / reproducing devices such as hard disk devices and VTRs (video tape recorders), development of MR heads having excellent reproduction output characteristics is progressing. .

【0003】MRヘッドは、電流の方向と磁化の方向の
為す角度によって抵抗値が変化するMR素子を用い、信
号磁界の変化を抵抗変化として検出するものであり、そ
の再生出力電圧が媒体−ヘッド間の相対速度に依存しな
いという特徴を有する。
The MR head uses an MR element whose resistance value changes depending on the angle formed by the direction of current and the direction of magnetization, and detects a change in the signal magnetic field as a resistance change. The reproduction output voltage of the MR head is the medium-head. It has the feature that it does not depend on the relative speed between.

【0004】従来のMRヘッドの基本的な構成を図5に
示す。MR素子(12)の表面を覆ってシャント層(43)が形
成され、該シャント層(43)の表面には、所定のトラック
幅Tだけ離して一対の電極(22)(22)が形成されている。
The basic structure of a conventional MR head is shown in FIG. A shunt layer (43) is formed to cover the surface of the MR element (12), and a pair of electrodes (22) and (22) are formed on the surface of the shunt layer (43) with a predetermined track width T therebetween. ing.

【0005】MR素子(12)は、その長手方向(図5の左
右方向)に磁化容易軸を持つようにパターン化され、記
録媒体(6)との対接面に端面を露出して、信号磁界を検
出する。記録媒体(6)からの信号磁界に応じてMR素子
(12)の磁化の向きが変化すると、これに伴ってMR素子
(12)の抵抗値が変化し、該抵抗値の変化が一対の電極(2
2)(22)によって電圧変化として検出される。
The MR element (12) is patterned so as to have an easy axis of magnetization in its longitudinal direction (left and right direction in FIG. 5), and its end face is exposed at the contact surface with the recording medium (6) to give a signal. Detect magnetic field. MR element according to the signal magnetic field from the recording medium (6)
When the direction of magnetization of (12) changes, the MR element
The resistance value of (12) changes, and the change of the resistance value changes the pair of electrodes (2
2) It is detected as a voltage change by (22).

【0006】電極(22)を流れる電流は、MR素子(12)及
びシャント層(43)に夫々センス電流及びバイアス電流と
して分流される。ここでバイアス電流は、信号磁界に対
してMRヘッドの再生出力を線型化する役割を担うもの
であり、バイアス電流によってMR素子(12)に対し膜厚
方向にバイアス磁界が印加される。このバイアス方式は
シャントバイアス法として知られている。
The current flowing through the electrode (22) is shunted to the MR element (12) and the shunt layer (43) as a sense current and a bias current, respectively. Here, the bias current plays a role of linearizing the reproduction output of the MR head with respect to the signal magnetic field, and the bias magnetic field applies the bias magnetic field to the MR element (12) in the film thickness direction. This bias method is known as the shunt bias method.

【0007】[0007]

【発明が解決しようとする課題】従来のシャントバイア
ス法を採用したMRヘッドにおいては、MR素子とシャ
ント層の材料の比抵抗及び膜厚を選択することによっ
て、センス電流とバイアス電流の分流比を制御してい
る。しかしながら、一般にMR素子及びシャント層に
は、その成膜の不完全さに起因して結晶粒界、格子欠
陥、不純物介在等の不均一性が生じ、これが比抵抗の不
均一性として現れることになる。この結果、MRヘッド
毎にセンス電流とバイアス電流の分流比がばらつき、所
期のヘッド性能が得られない問題があった。
In the MR head adopting the conventional shunt bias method, the shunt ratio of the sense current and the bias current is selected by selecting the specific resistance and film thickness of the materials of the MR element and the shunt layer. Have control. However, in general, inhomogeneities such as grain boundaries, lattice defects, and inclusion of impurities occur in the MR element and the shunt layer due to incomplete film formation, and this appears as nonuniformity in resistivity. Become. As a result, there is a problem that the shunt ratio of the sense current and the bias current varies for each MR head, and the desired head performance cannot be obtained.

【0008】本発明の目的は、成膜後にセンス電流とバ
イアス電流の分流比を調節することが出来るMRヘッド
を提供するである。
An object of the present invention is to provide an MR head capable of adjusting the shunt ratio of the sense current and the bias current after film formation.

【0009】[0009]

【課題を解決する為の手段】本発明に係る第1のMRヘ
ッドにおいては、図1に示す如く、MR素子(1)に対し
てシャント層(4)を並列に電気接続するべき一対の電極
層(5)(5)がシャント層(4)の両端部に重ねて形成さ
れ、各電極層(5)には、シャント層(4)との接続部と電
極(2)との接続部の間に、両接続部に対して互いに並列
な複数本の電極条(51)が介在している。又、本発明に係
る第2のMRヘッドにおいては、図3に示す如く、シャ
ント層(41)の中央部に、一対の電極(21)(21)との接続部
に対して並列な複数本のシャント条(42)が介在してい
る。
In the first MR head according to the present invention, as shown in FIG. 1, a pair of electrodes for electrically connecting the shunt layer (4) in parallel to the MR element (1). Layers (5) and (5) are formed by overlapping on both ends of the shunt layer (4), and each electrode layer (5) includes a connection portion with the shunt layer (4) and a connection portion with the electrode (2). A plurality of electrode strips (51) that are parallel to each other are interposed between the connecting portions. In addition, in the second MR head according to the present invention, as shown in FIG. 3, a plurality of MR heads in parallel with the connecting portion with the pair of electrodes (21) and (21) are provided in the central portion of the shunt layer (41). The shunt strip (42) is intervening.

【0010】[0010]

【作用】上記第1のMRヘッドの製造工程においては、
MR素子(1)の両端部に重ねて電極(2)(2)を形成した
状態で、MR素子単独の抵抗を評価する。その後、MR
素子(1)と電極(2)(2)の上部にシャント層(4)と電極
層(5)(5)を形成し、この状態で、MR素子とシャント
層の複合の抵抗を評価する。更に上記の2つの評価に基
づいてシャント層単独の抵抗を解析し、センス電流とバ
イアス電流の分流比を求める。このとき、最適な分流比
が得られていない場合は、レーザ光線等を用いた加工に
より必要本数の電極条(51)を破断し、電極層(5)の抵抗
値を変えることによって、最適な分流比に調整する。
In the manufacturing process of the first MR head,
With the electrodes (2) and (2) being formed on both ends of the MR element (1), the resistance of the MR element alone is evaluated. Then MR
A shunt layer (4) and electrode layers (5) and (5) are formed on the element (1) and the electrodes (2) and (2), and in this state, the combined resistance of the MR element and the shunt layer is evaluated. Furthermore, the resistance of the shunt layer alone is analyzed based on the above two evaluations, and the shunt ratio of the sense current and the bias current is obtained. At this time, if the optimum diversion ratio is not obtained, the required number of electrode strips (51) is broken by processing using a laser beam or the like, and the resistance value of the electrode layer (5) is changed to obtain the optimum value. Adjust to the diversion ratio.

【0011】上記第2のMRヘッドの製造工程において
は、MR素子(11)の両端部に重ねて電極(21)(21)を形成
した状態で、MR素子単独の抵抗を評価する。その後、
MR素子(11)と電極(21)(21)の上部にシャント層(41)を
形成し、この状態で、MR素子とシャント層の複合の抵
抗を評価する。更に上記の2つの評価に基づいてシャン
ト層単独の抵抗を解析し、センス電流とバイアス電流の
分流比を求める。このとき、最適な分流比が得られてい
ない場合は、レーザ光線等を用いた加工により必要本数
のシャント条(42)を破断し、シャント層(41)の抵抗値を
変えることによって、最適な分流比に調整する。
In the manufacturing process of the second MR head, the resistance of the MR element alone is evaluated in a state where the electrodes (21) and (21) are formed on both ends of the MR element (11). afterwards,
The shunt layer (41) is formed on the MR element (11) and the electrodes (21) and (21), and in this state, the combined resistance of the MR element and the shunt layer is evaluated. Furthermore, the resistance of the shunt layer alone is analyzed based on the above two evaluations, and the shunt ratio of the sense current and the bias current is obtained. At this time, if the optimum diversion ratio is not obtained, the required number of shunt strips (42) is broken by processing using a laser beam or the like, and the optimum value is obtained by changing the resistance value of the shunt layer (41). Adjust to the diversion ratio.

【0012】[0012]

【発明の効果】本発明によれば、成膜後に電極層(5)の
電極条(51)或いはシャント層(41)のシャント条(42)を破
断することによって、センス電流とバイアス電流の分流
比を調整出来るから、成膜の不完全さに拘わらず、所期
の性能を有するMRヘッドが得られる。
According to the present invention, by splitting the electrode strip (51) of the electrode layer (5) or the shunt strip (42) of the shunt layer (41) after film formation, the shunt current of the sense current and the bias current is divided. Since the ratio can be adjusted, an MR head having desired performance can be obtained regardless of incomplete film formation.

【0013】[0013]

【実施例】第1実施例 図1に示すMRヘッドは、矩形にパターン化したMR素
子(1)の両端部に重ねて一対の電極(2)(2)が形成さ
れ、両電極(2)(2)の間隔Tによって、記録媒体(6)と
の対接面におけるトラック幅が所定値に規定されてい
る。MR素子(1)及び電極(2)(2)の上部には、絶縁層
(3)を介してシャント層(4)が形成され、該シャント層
(4)の両端部及び絶縁層(3)の両端部を覆って一対の電
極層(5)(5)が形成されている。
EXAMPLES MR head shown in the first embodiment FIG. 1, a pair of electrodes stacked on both ends of the MR element (1) which is patterned in the rectangle (2) (2) is formed, the electrodes (2) By the interval T of (2), the track width on the contact surface with the recording medium (6) is regulated to a predetermined value. An insulating layer is formed on the MR element (1) and the electrodes (2) and (2).
A shunt layer (4) is formed through (3), and the shunt layer is formed.
A pair of electrode layers (5) and (5) are formed so as to cover both ends of (4) and both ends of the insulating layer (3).

【0014】各電極層(5)には、電極(2)との重複部に
複数のスリットを設けることによって、トラック幅方向
に伸びる複数本の電極条(51)が形成されている。従っ
て、該電極条(51)にレーザ加工を施すことにより図2に
示す如く必要本数を破断(52)し、電極層(5)の抵抗値を
変えることによって、センス電流とバイアス電流の分流
比を調整することが出来る。尚、電極条(51)の形状寸法
及び本数は、達成すべき分流比の精度に応じて決定され
る。
A plurality of electrode strips (51) extending in the track width direction are formed in each electrode layer (5) by providing a plurality of slits in the overlapping portion with the electrodes (2). Therefore, the necessary number is broken (52) as shown in FIG. 2 by subjecting the electrode strip (51) to laser processing, and the resistance value of the electrode layer (5) is changed to thereby divide the sense current and the bias current. Can be adjusted. The shape and size of the electrode strips (51) are determined according to the accuracy of the diversion ratio to be achieved.

【0015】上記MRヘッドにおいては、MR素子(1)
及びシャント層(4)の抵抗が電極層(5)の抵抗に比べて
遥かに大きく、電極層(5)の電極条(51)の破断に伴うヘ
ッド全体の抵抗変化は僅かであるので、電極条(51)の破
断によってセンス電流とバイアス電流の分流比の微調節
が可能である。又、レーザ加工による電極条(51)の破断
は、同一ウエハ内に形成された複数のMRヘッドに対し
て別個に施すことが出来るから、単一のウエハから目的
に応じた種々の分流比のMRヘッドを作製することが可
能である。
In the MR head, the MR element (1)
The resistance of the shunt layer (4) is much larger than the resistance of the electrode layer (5), and the resistance change of the entire head due to the breakage of the electrode strip (51) of the electrode layer (5) is small. By breaking the strip (51), the shunt ratio of the sense current and the bias current can be finely adjusted. Further, the breaking of the electrode strips (51) by laser processing can be performed separately for a plurality of MR heads formed in the same wafer, so that a single wafer can be used for various diversion ratios depending on the purpose. It is possible to make an MR head.

【0016】第2実施例 図3に示すMRヘッドにおいては、MR素子(11)の上部
に所定トラック幅Tを有する絶縁層(31)が形成されると
共に、該絶縁層(31)を挟んで両側には、一対の電極(21)
(21)がMR素子(11)の両端部を覆って形成されている。
MR素子(11)の上部には、両電極(21)(21)に跨がってシ
ャント層(41)が形成され、該シャント層(41)の中央部に
複数のスリットを設けることによって、トラック幅方向
に伸びる複数本のシャント条(42)が形成されている。
Second Embodiment In the MR head shown in FIG. 3, an insulating layer (31) having a predetermined track width T is formed on the MR element (11), and the insulating layer (31) is sandwiched therebetween. A pair of electrodes (21) on each side
(21) is formed so as to cover both ends of the MR element (11).
In the upper part of the MR element (11), a shunt layer (41) is formed across both electrodes (21) (21), and by providing a plurality of slits in the central portion of the shunt layer (41), A plurality of shunt strips (42) extending in the track width direction are formed.

【0017】従って、シャント条(42)にレーザ加工を施
して必要本数を破断することによりシャント層(41)の抵
抗値を変え、これによってMR素子(11)とシャント層(4
1)に流れる電流の分流比を調整することが可能である。
Therefore, the resistance value of the shunt layer (41) is changed by subjecting the shunt strips (42) to laser processing to break the required number, whereby the MR element (11) and the shunt layer (4) are changed.
It is possible to adjust the diversion ratio of the current flowing in 1).

【0018】特に該MRヘッドにおいては、MR素子(1
1)とシャント層(41)の間に絶縁層(31)が介在しているか
ら、MR素子(11)とシャント層(41)の界面での分流が安
定し、センス電流とバイアス電流の分流比の精度を高め
ることが出来る。又、シャント層(41)の下部が絶縁層(3
1)であるため、レーザ加工も容易となる。
Particularly in the MR head, the MR element (1
Since the insulating layer (31) is interposed between 1) and the shunt layer (41), the shunt current at the interface between the MR element (11) and the shunt layer (41) is stable, and the shunt current of the sense current and the bias current is shunted. The accuracy of the ratio can be improved. The lower part of the shunt layer (41) is the insulating layer (3
Since it is 1), laser processing becomes easy.

【0019】上記実施例の説明は、本発明を説明するた
めのものであって、特許請求の範囲に記載の発明を限定
し、或は範囲を減縮する様に解すべきではない。又、本
発明の各部構成は上記実施例に限らず、特許請求の範囲
に記載の技術的範囲内で種々の変形が可能であることは
勿論である。例えば、図4に示す如く、上記第2実施例
のMRヘッドにおける絶縁層(31)を省略することも可能
である。
The above description of the embodiments is for explaining the present invention, and should not be construed as limiting the invention described in the claims or reducing the scope. The configuration of each part of the present invention is not limited to the above-mentioned embodiment, and it goes without saying that various modifications can be made within the technical scope described in the claims. For example, as shown in FIG. 4, the insulating layer (31) in the MR head of the second embodiment can be omitted.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明に係るMRヘッドの要部を示す斜視図で
ある。
FIG. 1 is a perspective view showing a main part of an MR head according to the present invention.

【図2】センス電流とバイアス電流の分流比を調整した
状態を示す斜視図である。
FIG. 2 is a perspective view showing a state in which a shunt ratio of a sense current and a bias current is adjusted.

【図3】本発明の他の実施例を示す斜視図である。FIG. 3 is a perspective view showing another embodiment of the present invention.

【図4】更に他の実施例を示す斜視図である。FIG. 4 is a perspective view showing still another embodiment.

【図5】従来のMRヘッドの要部を示す斜視図である。FIG. 5 is a perspective view showing a main part of a conventional MR head.

【符号の説明】[Explanation of symbols]

(1) MR素子 (2) 電極 (3) 絶縁層 (4) シャント層 (5) 電極層 (51) 電極条 (6) 記録媒体 (1) MR element (2) Electrode (3) Insulating layer (4) Shunt layer (5) Electrode layer (51) Electrode strip (6) Recording medium

─────────────────────────────────────────────────────
─────────────────────────────────────────────────── ───

【手続補正書】[Procedure amendment]

【提出日】平成5年12月1日[Submission date] December 1, 1993

【手続補正1】[Procedure Amendment 1]

【補正対象書類名】明細書[Document name to be amended] Statement

【補正対象項目名】0006[Correction target item name] 0006

【補正方法】変更[Correction method] Change

【補正内容】[Correction content]

【0006】電極(22)を流れる電流は、MR素子(12)及
びシャント層(43)に夫々センス電流及びバイアス電流と
して分流される。ここでバイアス電流は、信号磁界に対
してMRヘッドの再生出力を線型化する役割を担うもの
であり、バイアス電流によってMR素子(12)の面内垂直
方向(記録媒体(6)に対して垂直な方向)にバイアス磁界
が印加される。このバイアス方式はシャントバイアス法
として知られている。
The current flowing through the electrode (22) is shunted to the MR element (12) and the shunt layer (43) as a sense current and a bias current, respectively. Here bias current plays a role of linearized reproduction output of the MR head with respect to the signal magnetic field, the in-plane vertical of the MR element (12) by the bias current
A bias magnetic field is applied in the direction (direction perpendicular to the recording medium (6)) . This bias method is known as the shunt bias method.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 磁気抵抗効果素子(1)と、磁気抵抗効果
素子(1)の抵抗変化を検出するための一対の電極(2)
(2)と、磁気抵抗効果素子(1)に対してバイアス磁界を
印加するためのシャント層(4)とを具えた磁気抵抗効果
型ヘッドにおいて、磁気抵抗効果素子(1)に対してシャ
ント層(4)を並列に電気接続すべき一対の電極層(5)
(5)が、シャント層(4)の両端部と両電極(2)(2)に接
続して形成され、各電極層(5)には、シャント層(4)と
の接続部と電極(2)との接続部の間に、両接続部に対し
て互いに並列な複数本の電極条(51)が介在し、必要本数
の電極条(51)の破断によって、磁気抵抗効果素子(1)と
シャント層(4)に流れる電流の分流比の調整が可能であ
ることを特徴とする磁気抵抗効果型ヘッド。
1. A magnetoresistive effect element (1) and a pair of electrodes (2) for detecting a resistance change of the magnetoresistive effect element (1).
A magnetoresistive effect head comprising (2) and a shunt layer (4) for applying a bias magnetic field to the magnetoresistive effect element (1), comprising: A pair of electrode layers to electrically connect (4) in parallel (5)
(5) is formed by connecting both ends of the shunt layer (4) and both electrodes (2) and (2), and each electrode layer (5) has a connection portion with the shunt layer (4) and an electrode ( A plurality of electrode strips (51), which are parallel to each other, are interposed between the connecting portions with 2) and the required number of electrode strips (51) are broken, so that the magnetoresistive effect element (1) And a shunt layer (4) capable of adjusting the diversion ratio of the current flowing through the magnetoresistive head.
【請求項2】 磁気抵抗効果素子(11)と、磁気抵抗効果
素子(11)の抵抗変化を検出するための一対の電極(21)(2
1)と、磁気抵抗効果素子(11)に対してバイアス磁界を印
加するためのシャント層(41)とを具えた磁気抵抗効果型
ヘッドにおいて、シャント層(41)には、両電極(21)(21)
との接続部の間に、両接続部に対して並列な複数本のシ
ャント条(42)が介在し、必要本数のシャント条(42)の破
断によって磁気抵抗効果素子(11)とシャント層(41)に流
れる電流の分流比の調整が可能であることを特徴とする
磁気抵抗効果型ヘッド。
2. A magnetoresistive effect element (11) and a pair of electrodes (21) (2) for detecting a resistance change of the magnetoresistive effect element (11).
1) and a shunt layer (41) for applying a bias magnetic field to the magnetoresistive effect element (11), a shunt layer (41), both electrodes (21) (twenty one)
A plurality of shunt strips (42) that are parallel to both connection parts are interposed between the connection portion of the magnetoresistive element (11) and the shunt layer (11) due to breakage of the required number of shunt strips (42). A magnetoresistive head having a feature that the diversion ratio of the current flowing in 41) can be adjusted.
JP5001691A 1993-01-08 1993-01-08 Magneto-resitance effect type head Withdrawn JPH06203338A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5001691A JPH06203338A (en) 1993-01-08 1993-01-08 Magneto-resitance effect type head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5001691A JPH06203338A (en) 1993-01-08 1993-01-08 Magneto-resitance effect type head

Publications (1)

Publication Number Publication Date
JPH06203338A true JPH06203338A (en) 1994-07-22

Family

ID=11508554

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5001691A Withdrawn JPH06203338A (en) 1993-01-08 1993-01-08 Magneto-resitance effect type head

Country Status (1)

Country Link
JP (1) JPH06203338A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7296336B2 (en) * 2004-05-25 2007-11-20 Sae Magnetics (H.K.) Ltd. Method to protect a GMR head from electrostatic damage during the manufacturing process
US7466521B2 (en) 2006-04-25 2008-12-16 Hitachi Global Storage Technologies Netherlands B.V. EMR structure with bias control and enhanced linearity of signal

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7296336B2 (en) * 2004-05-25 2007-11-20 Sae Magnetics (H.K.) Ltd. Method to protect a GMR head from electrostatic damage during the manufacturing process
US7466521B2 (en) 2006-04-25 2008-12-16 Hitachi Global Storage Technologies Netherlands B.V. EMR structure with bias control and enhanced linearity of signal

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