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JPH0623565Y2 - Raw material storage container for CVD equipment - Google Patents

Raw material storage container for CVD equipment

Info

Publication number
JPH0623565Y2
JPH0623565Y2 JP1988039633U JP3963388U JPH0623565Y2 JP H0623565 Y2 JPH0623565 Y2 JP H0623565Y2 JP 1988039633 U JP1988039633 U JP 1988039633U JP 3963388 U JP3963388 U JP 3963388U JP H0623565 Y2 JPH0623565 Y2 JP H0623565Y2
Authority
JP
Japan
Prior art keywords
raw material
container
storage container
powder
material storage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1988039633U
Other languages
Japanese (ja)
Other versions
JPH01147254U (en
Inventor
進午 村上
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP1988039633U priority Critical patent/JPH0623565Y2/en
Publication of JPH01147254U publication Critical patent/JPH01147254U/ja
Application granted granted Critical
Publication of JPH0623565Y2 publication Critical patent/JPH0623565Y2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Chemical Vapour Deposition (AREA)

Description

【考案の詳細な説明】 〔産業上の利用分野〕 本考案はCVD(Chemical Vapor Deposition)装置に使用
する原料収納容器に関し,特に粉末原料の残存状況をモ
ニタできる原料収納容器に関する。
[Detailed Description of the Invention] [Industrial field of application] The present invention relates to a raw material storage container used in a CVD (Chemical Vapor Deposition) apparatus, and more particularly to a raw material storage container capable of monitoring the remaining state of powder raw materials.

〔従来の技術〕[Conventional technology]

従来,CVD装置用原料収納容器では,使用する原料が毒
性を有するために完全密閉構造をとらねばならないこと
と,原料を気化するために原料収納容器全体を数10℃
以上に加熱しなければならないこととの為に,容器の一
部にガラス窓を設けて内部の原料の残存量を目視で確認
するような構造はとれなかった。
Conventionally, a raw material storage container for a CVD apparatus has to have a completely closed structure because the raw material used is toxic, and the entire raw material storage container must be tens of degrees Celsius in order to vaporize the raw material.
Since it has to be heated as above, a structure in which a glass window is provided in a part of the container to visually check the remaining amount of the raw material inside cannot be taken.

また,原料収納容器内に一対の透過形光センサを置き,
受光部への光が遮られているか否かで原料の有無を判断
しようとする試み,あるいは,原料収納容器内に一種の
バネ秤を設けその上に原料粉末を置き,バネ秤の沈み具
合を磁気センサ等を用いて外部からモニタすることによ
って原料の残存量を知ろうという試みが発表されてい
る。
Also, place a pair of transmissive optical sensors in the raw material storage container,
Attempts to determine the presence or absence of raw material by whether or not the light to the light receiving part is blocked, or place a kind of spring scale in the raw material storage container and place the raw material powder on it to determine the sinking condition of the spring scale. An attempt has been made to find out the remaining amount of the raw material by externally monitoring it using a magnetic sensor or the like.

〔考案が解決しようとする課題〕 上述した2種類の試みのうち,透過形光センサを用いる
ものでは,加熱により気化した原料ガスが光センサの投
光器あるいは受光器の表面に再固体化して付着し,光セ
ンサの感度を低下させること,加熱する容器内に置いた
場合に光センサの信頼性に問題があること,また原料収
納容器内に入れるべき原料の量が多くなって光センサの
投光器と受光器の間隔を広くとらねばならないような場
合,受光器からの信号が原料の有無に急速に追随するも
のとならず,原料収納容器内の原料の有無の判断にばら
つきが生じてしまうという問題点を有している。
[Problems to be Solved by the Invention] Of the two types of attempts described above, in the case of using a transmission type optical sensor, the raw material gas vaporized by heating is resolidified and adheres to the surface of the projector or the receiver of the optical sensor. , The sensitivity of the optical sensor is reduced, the reliability of the optical sensor is problematic when it is placed in a container to be heated, and the amount of raw material to be put in the raw material storage container increases, so When the distance between the light receivers must be wide, the signal from the light receiver does not follow the presence or absence of the raw material rapidly, and the determination of the presence or absence of the raw material in the raw material storage container varies. Have a point.

一方,一種のバネ秤を利用する後者の場合も,バネ秤上
に置いた原料を加熱する手段に問題がある。すなわち,
この方法では原料の置かれている場所が収納容器の壁面
から独立しているために,収納容器の壁面を外部からヒ
ータで加熱するだけでは不充分であり、原料の載ってい
るバネ秤自体に加熱手段を設けねばならないが,一般的
に収納容器内に一度に充てんする原料の量が数グラムか
ら数十グラムであることを考えると,加熱手段を設けた
バネ秤ではその自重が原料に比して重くなり過ぎ,原料
の減少に伴うバネ秤の位置の変位が極く僅ずかになって
しまい信頼性に欠けるという問題点を有している。
On the other hand, in the latter case where a kind of spring scale is used, there is a problem in the means for heating the raw material placed on the spring scale. That is,
In this method, since the place where the raw material is placed is independent of the wall surface of the storage container, it is not enough to heat the wall surface of the storage container with a heater from the outside, and the spring scale itself on which the raw material is placed is not enough. Although heating means must be provided, considering that the amount of raw material to be filled in a storage container at one time is generally several grams to several tens of grams, a spring scale equipped with heating means has its own weight relative to the raw material. It becomes too heavy, and the displacement of the position of the spring scale due to the decrease of the raw material becomes very slight, resulting in lack of reliability.

本考案は従来のもののこのような問題点を解決しようと
するもので,外部から目視で観察できない容器中の原料
の残存状況をモニタできるCVD装置用原料収納容器を提
供するものである。
The present invention is intended to solve such a problem of the conventional one, and provides a raw material container for a CVD apparatus capable of monitoring the residual state of the raw material in the container which cannot be visually observed from the outside.

〔課題を解決するための手段〕[Means for Solving the Problems]

固体粉末の原料を収納し、該収納した原料粉末を加熱気
化して原料ガスとしてCVD装置に供給する密閉型の筒
形原料収納器であって、容器中の原料粉末の表面に載せ
られて該表面のレベルの低下に追随する、多数の孔があ
けられた薄板状の可動接点と、該容器中の底部に設けら
れ、前記原料粉末の表面レベルが一定値以下に下ったと
きに前記可動接点と接触する固定接点と,これらの接点
と外部との導通をとるための信号導入端子とを有して構
成される。
A closed-type cylindrical raw material storage container for storing a raw material of a solid powder, heating and vaporizing the stored raw material powder, and supplying the raw material gas to a CVD apparatus as a raw material gas. A thin plate-shaped movable contact having a large number of holes, which follows the decrease of the surface level, and the movable contact provided at the bottom of the container when the surface level of the raw material powder falls below a certain value. It is configured to have fixed contacts that come into contact with, and signal introduction terminals for establishing electrical continuity between these contacts and the outside.

〔実施例〕〔Example〕

次に,本考案について図面を参照して説明する。 Next, the present invention will be described with reference to the drawings.

第1図は本考案の一実施例の縦断面図である。原料粉末
3は底面にテーパのついた密閉容器4の中に点線で示す
ラインまで収められており,加熱・気化された原料が消
費されるに従って原料粉末の表面レベルは水平を保った
まま実線で示すラインまで次々に下っていく。これは,
原料が微小な粉末であり,気化が表面層から均等に行わ
れるためである。また,底面にテーパがつけてあるため
に,原料の落ちつきが良く,偏りが生じにくいことも寄
与している。
FIG. 1 is a vertical sectional view of an embodiment of the present invention. The raw material powder 3 is contained in a closed container 4 having a taper on the bottom up to the line indicated by the dotted line. As the heated and vaporized raw material is consumed, the surface level of the raw material powder is shown as a solid line while keeping horizontal. It goes down to the line shown. this is,
This is because the raw material is a fine powder and vaporization is evenly carried out from the surface layer. Also, since the bottom surface is tapered, the raw material is well settled and unevenness is less likely to occur.

原料粉末の表面レベルをモニタするために,軽く作られ
た可動接点1が原料粉末の上に載っている。この可動接
点1はガイド7で支えられており,さらに信号線12を
通して信号導入端子6に接続されており,外部と導通を
とっている。一方,原料が一定値以下に下ったことを知
らせるための固定接点2は密閉容器4の底に置かれてお
り,信号導入端子5と一体化されている。
In order to monitor the surface level of the raw material powder, a lightly made movable contact 1 is placed on the raw material powder. The movable contact 1 is supported by a guide 7 and further connected to a signal introduction terminal 6 through a signal line 12 so as to be electrically connected to the outside. On the other hand, the fixed contact 2 for notifying that the raw material has fallen below a certain value is placed on the bottom of the closed container 4 and is integrated with the signal introduction terminal 5.

密閉容器4はその蓋13とOリング10を用いて密閉さ
れており,信号導入端子5,6の部分もハーメチックシ
ールやセラミック封止を用いることにより完全に気密が
保てる。
The hermetically sealed container 4 is hermetically sealed using the lid 13 and the O-ring 10, and the signal introduction terminals 5 and 6 can be completely kept airtight by using a hermetic seal or a ceramic seal.

本実施例では,キャリアガスを用いているので,その導
入口8とキャリアガスと原料ガスの混合気体を装置へ送
るための送出口9とが設けられている。また,原料の加
熱は密閉容器4の周囲に巻いたヒータ11を加熱するこ
とによって行う。
In this embodiment, since the carrier gas is used, the inlet 8 and the outlet 9 for sending the mixed gas of the carrier gas and the raw material gas to the apparatus are provided. The raw material is heated by heating the heater 11 wound around the closed container 4.

第2図は本考案の第2の実施例を示す縦断面図である。
この実施例では密閉容器24の底面にはテーパはなく平
らである。原料粉末3の上に載せられる可動接点21は
薄い円板状で原料粉末3を抑える形になる。可動接点2
1の円板には多数の孔があけられており,加熱された原
料粉末3はこの孔を通って気化していく。
FIG. 2 is a vertical sectional view showing a second embodiment of the present invention.
In this embodiment, the bottom surface of the closed container 24 is flat without taper. The movable contact 21 placed on the raw material powder 3 has a thin disc shape to hold down the raw material powder 3. Moving contact 2
A large number of holes are formed in the disk 1 and the heated raw material powder 3 is vaporized through these holes.

この実施例では,第1の実施例と異なり原料の減少に伴
って原料表面のキャリアガスに接する面積が減少するこ
とがないために,キャリアガスの流量を大きくして気化
量を多くとる場合に,常に一定の気化量を保証できると
いう利点がある。また,大量に原料を入れる場合にも適
している。例えば比重1.77のクロムカルボニルCr(C
O)を原料とする場合を考える。
In this embodiment, unlike the first embodiment, the area in contact with the carrier gas on the surface of the raw material does not decrease with the decrease of the raw material. Therefore, when the flow rate of the carrier gas is increased and the vaporization amount is increased, , There is an advantage that a constant vaporization amount can always be guaranteed. It is also suitable when a large amount of raw material is added. For example, chromium carbonyl Cr (C
O) Consider the case of using 6 as a raw material.

このクロムカルボニル50gを,底面の直径(内径)8
0mm,高さ100mmの円筒形(底面積50cm2,内容積
500cm3)の第2の実施例に示す形式の容器に入れる
と,原料の表面は容器の底面から5.5mmの高さとな
り,接点間のストロークは充分である。一方,この容器
中にキャリアガス(例えばアルゴン等の不活性ガス)を
200SCCMで流し,容器中を40℃に加熱してクロムカ
ルボニルを気化して使用することを考える。近似的に常
に平衡状態を保っていると仮定しても,その予想気化量
は1.8×10-3g/minであり上記容器中の原料のクロ
ムカルボニルの表面レベルは平均して毎分20μm程度
しか下がらないことになる。このこととクロムカルボニ
ル粉末の粒径が10μmのオーダであることから,飽和
蒸気圧近い量のクロムカルボニルを上記の条件で気化さ
せることは可能である。このように,クロムカルボニル
を原料とする場合には充分な気化量を有し,かつ接点の
ストロークも充分にとれる容器を制作することができ
る。
50 g of this chrome carbonyl is added to the bottom diameter (inner diameter) 8
When placed in a cylindrical container of 0 mm in height and 100 mm in height (bottom area 50 cm 2 , internal volume 500 cm 3 ) of the type shown in the second embodiment, the surface of the raw material becomes 5.5 mm in height from the bottom of the container, The stroke between the contacts is sufficient. On the other hand, it is considered that a carrier gas (for example, an inert gas such as argon) is caused to flow in this container at 200 SCCM and the container is heated to 40 ° C. to vaporize chromium carbonyl for use. Even if it is assumed that the equilibrium state is always maintained approximately, the expected vaporization amount is 1.8 × 10 -3 g / min, and the surface level of chromium carbonyl of the raw material in the container is averaged every minute. Only about 20 μm will be lowered. From this fact and the particle size of the chromium carbonyl powder, which is on the order of 10 μm, it is possible to vaporize chromium carbonyl in an amount close to the saturated vapor pressure under the above conditions. As described above, when chromium carbonyl is used as a raw material, it is possible to manufacture a container having a sufficient amount of vaporization and a sufficient contact stroke.

〔考案の効果〕[Effect of device]

以上説明したように本考案は,原料収納容器内に原料の
表面レベルに追随して動く可動接点と原料表面がある一
定値以下に下がったときにこの可動接点と接触する固定
接点とを設け,電気的接点を形成することにより,外部
からは目視で観察できない容器中の原料の残存状況を確
実にモニタでき、さらに、多数の孔を有する固定接点の
場合には、気化量を多くとる場合に常に一定量の気化量
を保証するという利点がある。
As described above, the present invention provides a movable contact that moves following the surface level of the raw material in the raw material storage container and a fixed contact that comes into contact with the movable contact when the raw material surface falls below a certain value. By forming an electrical contact, it is possible to reliably monitor the residual state of the raw material in the container, which cannot be visually observed from the outside, and in the case of a fixed contact with many holes, when a large amount of vaporization is required. It has the advantage of always guaranteeing a certain amount of vaporization.

【図面の簡単な説明】[Brief description of drawings]

第1図は本考案の第1の実施例の縦断面図,第2図は本
考案の第2の実施例の縦断面図である。 記号の説明:1,21……可動接点,2……固定接点,
3……原料粉末,4……密閉容器,5,6……信号導入
端子,11……ヒータ。
FIG. 1 is a vertical sectional view of a first embodiment of the present invention, and FIG. 2 is a vertical sectional view of a second embodiment of the present invention. Explanation of symbols: 1, 21 ... movable contact, 2 ... fixed contact,
3 ... Raw material powder, 4 ... Airtight container, 5, 6 ... Signal introduction terminal, 11 ... Heater.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 【請求項1】固体粉末の原料を収納し、該収納した原料
粉末を加熱気化して原料ガスとしてCVD装置に供給す
る密閉型の筒形原料収納器であって、容器中の原料粉末
の表面に載せられて該表面のレベルの低下に追随する、
多数の孔があけられた薄板状の可動接点と、該容器中の
底部に設けられ、前記原料粉末の表面レベルが一定値以
下に下がった時に前記可動接点と接触する固定接点と、
これらの接点と外部との導通をとるための信号導入端子
とを備えたCVD装置用原料収納容器。
1. A closed type cylindrical raw material container for containing a raw material of a solid powder, heating and vaporizing the stored raw material powder as a raw material gas to a CVD apparatus, the surface of the raw material powder in a container. Mounted on the surface to follow the decrease in the level of the surface,
A thin plate-shaped movable contact having a large number of holes, a fixed contact provided at the bottom of the container and contacting the movable contact when the surface level of the raw material powder falls below a certain value,
A raw material container for a CVD apparatus, which is provided with these contact points and a signal introduction terminal for establishing electrical connection with the outside.
JP1988039633U 1988-03-28 1988-03-28 Raw material storage container for CVD equipment Expired - Lifetime JPH0623565Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1988039633U JPH0623565Y2 (en) 1988-03-28 1988-03-28 Raw material storage container for CVD equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1988039633U JPH0623565Y2 (en) 1988-03-28 1988-03-28 Raw material storage container for CVD equipment

Publications (2)

Publication Number Publication Date
JPH01147254U JPH01147254U (en) 1989-10-11
JPH0623565Y2 true JPH0623565Y2 (en) 1994-06-22

Family

ID=31266133

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1988039633U Expired - Lifetime JPH0623565Y2 (en) 1988-03-28 1988-03-28 Raw material storage container for CVD equipment

Country Status (1)

Country Link
JP (1) JPH0623565Y2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007520052A (en) * 2003-09-30 2007-07-19 東京エレクトロン株式会社 A method of depositing a metal layer from a metal-carbonyl precursor.

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1160355B1 (en) * 2000-05-31 2004-10-27 Shipley Company LLC Bubbler
US6921062B2 (en) * 2002-07-23 2005-07-26 Advanced Technology Materials, Inc. Vaporizer delivery ampoule

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5888122U (en) * 1981-12-09 1983-06-15 日立造船株式会社 Tank liquid detection device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007520052A (en) * 2003-09-30 2007-07-19 東京エレクトロン株式会社 A method of depositing a metal layer from a metal-carbonyl precursor.

Also Published As

Publication number Publication date
JPH01147254U (en) 1989-10-11

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