JPH06243430A - Exposure method and device for bar substrate for thin-film magnetic head - Google Patents
Exposure method and device for bar substrate for thin-film magnetic headInfo
- Publication number
- JPH06243430A JPH06243430A JP3181993A JP3181993A JPH06243430A JP H06243430 A JPH06243430 A JP H06243430A JP 3181993 A JP3181993 A JP 3181993A JP 3181993 A JP3181993 A JP 3181993A JP H06243430 A JPH06243430 A JP H06243430A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- pattern
- image
- exposed
- magnetic head
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Closed-Circuit Television Systems (AREA)
- Magnetic Heads (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、薄膜磁気ヘッド用バー
基板の露光方法およびそのための装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of exposing a bar substrate for a thin film magnetic head and an apparatus therefor.
【0002】[0002]
【従来技術】ひとつの基板上に、多層の回路を作成する
場合、各層の回路の相対的な位置関係が正確に決定され
ることが必要である。かかる位置決めに際し、従来は、
自動的に位置決めするために、例えば十字線のような特
定の特別のマークをわざわざ露光し、かかるマークを基
準として各層の相対的な位置を決定していた。しかし、
近年の半導体の高集積化にともない、このような特別の
スペースを設けることができなくなってきた。特に、薄
膜磁気ヘッド用バー基板の場合には製造工程の制約によ
り位置決めマークを設けることができないのが実態であ
る。2. Description of the Related Art When a multi-layer circuit is formed on one substrate, it is necessary to accurately determine the relative positional relationship of the circuits of each layer. When performing such positioning, conventionally,
For automatic positioning, a specific special mark such as a cross hair is purposely exposed, and the relative position of each layer is determined with reference to the mark. But,
With the recent high integration of semiconductors, it has become impossible to provide such a special space. In particular, in the case of a bar substrate for a thin film magnetic head, it is a fact that a positioning mark cannot be provided due to restrictions in the manufacturing process.
【0003】[0003]
【課題を解決するための手段】本発明は上記の問題を解
決すべくなされたものである。すなわち、本発明は、露
光する基板上にすでに存在するパターンを画像認識し、
認識された画像に基づいて位置決めすることを特徴とす
る薄膜磁気ヘッド用バー基板の露光方法を提供するもの
である。さらに、本発明は、上記の方法を実施するのに
好ましい装置として、露光する基板上にすでに存在する
パターンの画像を電気信号に変換するための装置、該装
置から送られる電気信号に基づき画像解析するためのコ
ンピューター、およびその結果に基づきステージを移動
させるための駆動装置を含む薄膜磁気ヘッド用バー基板
の露光装置を提供する。The present invention has been made to solve the above problems. That is, the present invention image-recognizes a pattern already existing on the substrate to be exposed,
An exposure method for a bar substrate for a thin-film magnetic head, which is characterized in that positioning is performed based on a recognized image. Furthermore, the present invention provides, as a preferable apparatus for carrying out the above method, an apparatus for converting an image of a pattern already existing on the substrate to be exposed into an electric signal, and an image analysis based on the electric signal sent from the apparatus. An exposure apparatus for a bar substrate for a thin-film magnetic head, which includes a computer for performing the operation, and a drive apparatus for moving the stage based on the result.
【0004】パターンの画像を電気信号に変換するため
の装置としては、CCDカメラが好ましく使用される。A CCD camera is preferably used as a device for converting a pattern image into an electric signal.
【0005】画像認識されるパターンは、基板上に存在
するパターンの一部でよく、またどの箇所でもよいが、
当該パターンの特徴的な部分を使用することが好まし
い。The image-recognized pattern may be a part of the pattern existing on the substrate, or may be any position.
It is preferable to use the characteristic part of the pattern.
【0006】画像認識装置により電気信号に変換された
画像データはコンピューターにより処理され、得られた
データに基づいて、次に露光されるパターンの位置が決
定される。以下、同様の手順で各層を露光することによ
り、多層の基板を得ることができる。The image data converted into an electric signal by the image recognition device is processed by a computer, and the position of the pattern to be exposed next is determined based on the obtained data. Hereinafter, a multilayer substrate can be obtained by exposing each layer in the same procedure.
【0007】コンピューターには、位置決めに利用する
地点における各層のパターンをあらかじめ入力しておく
ことが必要である。このデータと画像認識装置からのデ
ータを対応し、所定の位置になるようにステージを駆動
装置により移動し、適正な位置に次の層のパターンが露
光される。It is necessary to previously input the pattern of each layer at the point used for positioning in the computer. Corresponding this data and the data from the image recognition device, the stage is moved by the drive device so as to be at a predetermined position, and the pattern of the next layer is exposed at an appropriate position.
【0008】本発明により、基板上に位置決め用のマー
クを露光現像する必要がなくなるので、パターンを基板
全体に作成することができ、したがって基板をより有効
に利用でき、回路設計の自由度が増すとともにコストダ
ウンを図ることができる。According to the present invention, since it is not necessary to expose and develop the positioning marks on the substrate, the pattern can be formed on the entire substrate, and thus the substrate can be used more effectively and the degree of freedom in circuit design is increased. At the same time, the cost can be reduced.
【0009】特に、薄膜磁気ヘッド用バー基板の場合に
は、製造工程の制約により特定の特別のマークを設ける
ことができず、任意のパターンを用いて自動位置決めを
行うことができる本発明により、位置決め精度の向上、
スループットの向上を図ることができる。In particular, in the case of a bar substrate for a thin film magnetic head, it is not possible to provide a particular special mark due to the limitation of the manufacturing process, and automatic positioning can be performed using an arbitrary pattern. Improvement of positioning accuracy,
Throughput can be improved.
【0010】[0010]
【0011】[0011]
【図1】図1は本発明にかかる装置の構成例を示す図で
ある。FIG. 1 is a diagram showing a configuration example of an apparatus according to the present invention.
Claims (2)
ンを画像認識し、認識された画像に基づいて位置決めす
ることを特徴とする薄膜磁気ヘッド用バー基板の露光方
法。1. A method of exposing a bar substrate for a thin film magnetic head, which comprises recognizing an image of a pattern already existing on a substrate to be exposed and positioning the pattern based on the recognized image.
ンの画像を電気信号に変換する装置、該装置から送られ
る電気信号に基づき画像解析するためのコンピュータ
ー、およびその結果に基づきステージを移動させるため
の駆動装置を含む薄膜磁気ヘッド用バー基板の露光装
置。2. An apparatus for converting an image of a pattern already existing on a substrate to be exposed into an electric signal, a computer for image analysis based on the electric signal sent from the apparatus, and a stage for moving the stage based on the result. For exposing a bar substrate for a thin-film magnetic head, including a driving device for the same.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3181993A JPH06243430A (en) | 1993-02-22 | 1993-02-22 | Exposure method and device for bar substrate for thin-film magnetic head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3181993A JPH06243430A (en) | 1993-02-22 | 1993-02-22 | Exposure method and device for bar substrate for thin-film magnetic head |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH06243430A true JPH06243430A (en) | 1994-09-02 |
Family
ID=12341702
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3181993A Pending JPH06243430A (en) | 1993-02-22 | 1993-02-22 | Exposure method and device for bar substrate for thin-film magnetic head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH06243430A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1997040493A1 (en) * | 1996-04-19 | 1997-10-30 | Micrion Corporation | Thin-film magnetic recording heads and systems and methods for manufacturing the same |
-
1993
- 1993-02-22 JP JP3181993A patent/JPH06243430A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1997040493A1 (en) * | 1996-04-19 | 1997-10-30 | Micrion Corporation | Thin-film magnetic recording heads and systems and methods for manufacturing the same |
| US5916424A (en) * | 1996-04-19 | 1999-06-29 | Micrion Corporation | Thin film magnetic recording heads and systems and methods for manufacturing the same |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR100890133B1 (en) | Aligner | |
| JP3402750B2 (en) | Alignment method and device manufacturing method using the same | |
| US5582745A (en) | Method of making circuit boards with locally enhanced wiring density | |
| JPH06243430A (en) | Exposure method and device for bar substrate for thin-film magnetic head | |
| JPH04152048A (en) | Automatic drilling method for reference mark position on multilayer printed circuit board | |
| US20110262869A1 (en) | Method of aligning photomask with base material and method of manufacturing printed circuit board | |
| US6327379B2 (en) | Pattern inspection method and apparatus | |
| JP2001022099A (en) | Exposure device | |
| JP4476758B2 (en) | Mounting board inspection method and inspection apparatus | |
| JPH03201454A (en) | Aligning method for semiconductor device | |
| CN100552544C (en) | Exposure device and positioning method | |
| JPH01173174A (en) | Recognition position correction method | |
| KR970012983A (en) | Exposure apparatus and alignment discrimination method | |
| JP2002107939A (en) | Exposure method for circuit board | |
| JP2532110B2 (en) | Electron beam exposure method | |
| JPH0685016A (en) | Semiconductor chip inspection equipment | |
| JPS6135337A (en) | Pattern inspecting method | |
| JPS63113681A (en) | Inspection device for mounted substrate | |
| JPH0431572B2 (en) | ||
| JPS5833889A (en) | Position detecting film | |
| JPH08298236A (en) | Pattern exposure method and device | |
| JPS58103150A (en) | Manufacture of semiconductor substrate | |
| JP2874714B2 (en) | Semiconductor analysis / processing equipment | |
| JP3054909B2 (en) | Electron beam exposure method | |
| JPS62123338A (en) | Inspection equipment for high-density mounting boards |