JPH06267485A - Scanning electron microscope - Google Patents
Scanning electron microscopeInfo
- Publication number
- JPH06267485A JPH06267485A JP5055421A JP5542193A JPH06267485A JP H06267485 A JPH06267485 A JP H06267485A JP 5055421 A JP5055421 A JP 5055421A JP 5542193 A JP5542193 A JP 5542193A JP H06267485 A JPH06267485 A JP H06267485A
- Authority
- JP
- Japan
- Prior art keywords
- ray
- analyzer
- electron microscope
- scanning electron
- dispersive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
(57)【要約】
【目的】エネルギー分散型X線分析装置と波長分散型X
線分析装置の同時分析を可能とするため、過剰のX線を
防止するX線通過防止板およびX線通過孔を装備した走
査電子顕微鏡を提供すること。
【構成】走査電子顕微鏡において、波長分散型X線分析
装置を用いて分析を行う際、過剰のX線がエネルギー分
散型X線分析装置に侵入することを防ぐため、試料とエ
ネルギー分散型X線分析装置との間に穴径の異なる複数
のX線通過孔を持つ回転もしくはスライドする二層構造
のX線通過防止板を設けた
【効果】走査電子顕微鏡を用いたX線分析において、エ
ネルギー分散型X線分析装置と波長分散型X線分析装置
の同時分析が可能となる。
(57) [Abstract] [Purpose] Energy dispersive X-ray analyzer and wavelength dispersive X
To provide a scanning electron microscope equipped with an X-ray passage prevention plate and an X-ray passage hole for preventing excessive X-rays so as to enable simultaneous analysis of a line analyzer. [Structure] When performing analysis using a wavelength dispersive X-ray analyzer in a scanning electron microscope, in order to prevent excess X-rays from entering the energy dispersive X-ray analyzer, the sample and the energy dispersive X-ray are used. A rotating or sliding X-ray passage prevention plate having a plurality of X-ray passage holes with different hole diameters was provided between the analyzer and the analyzer. [Effect] Energy dispersion in X-ray analysis using a scanning electron microscope. Type X-ray analyzer and wavelength dispersive X-ray analyzer can be simultaneously analyzed.
Description
【0001】[0001]
【産業上の利用分野】本発明は、試料室内に挿入された
試料に電子線を照射することにより、試料から発生した
特性X線を分析するエネルギー分散型X線分析装置と波
長分散型X線分析装置を装着することが可能な走査電子
顕微鏡に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an energy dispersive X-ray analyzer and a wavelength dispersive X-ray which analyze a characteristic X-ray generated from a sample by irradiating the sample inserted in the sample chamber with an electron beam. The present invention relates to a scanning electron microscope to which an analysis device can be attached.
【0002】[0002]
【従来の技術】従来の装置では、エネルギー分散型X線
分析装置への過剰なX線の侵入防止については、ほとん
ど考慮されていなかった。2. Description of the Related Art In a conventional apparatus, almost no consideration has been given to preventing excessive X-rays from entering an energy dispersive X-ray analyzer.
【0003】[0003]
【発明が解決しようとする課題】走査電子顕微鏡には、
エネルギー分散型X線分析装置と波長分散型X線分析装
置を同時に装着することが可能であるが、実際の分析に
おいて必要とされるプローブ電流は、エネルギー分散型
X線分析装置では2×10-10A ,波長分散型X線分析
装置では2×10-8A であり、両分析装置の間に大き
な差があるため、両分析装置で同時に分析が行えなかっ
た。本発明では、波長分散型X線分析装置の分析条件で
電子線を試料に照射した際、発生する特性X線において
エネルギー分散型X線分析装置にとって過剰の特性X線
の検出器への侵入を防ぐため、X線通過孔を持つ回転も
しくはスライドするX線通過防止板を装備した走査電子
顕微鏡を提供することにある。DISCLOSURE OF THE INVENTION Problems to be Solved by the Invention
It is possible to mount the energy dispersive X-ray analyzer and the wavelength dispersive X-ray analyzer at the same time, but the probe current required in the actual analysis is 2 × 10 − in the energy dispersive X-ray analyzer. It was 10 A, which was 2 × 10 -8 A in the wavelength dispersive X-ray analyzer, and there was a large difference between the two analyzers, so it was not possible to perform analysis in both analyzers at the same time. In the present invention, when the sample is irradiated with an electron beam under the analysis conditions of the wavelength dispersive X-ray analyzer, the characteristic X-rays generated do not enter the detector with excessive characteristic X-rays for the energy dispersive X-ray analyzer. In order to prevent this, it is an object to provide a scanning electron microscope equipped with a rotating or sliding X-ray passage prevention plate having an X-ray passage hole.
【0004】また、種々のプローブ電流に対応するため
複数の穴径のX線通過孔を持つX線通過防止板を装備し
た走査電子顕微鏡を提供することにある。Another object of the present invention is to provide a scanning electron microscope equipped with an X-ray passage prevention plate having X-ray passage holes having a plurality of hole diameters in order to cope with various probe currents.
【0005】さらにX線通過防止板を軽元素材と重元素
材の二層構造とすることにより、反射電子や二次励起X
線の検出器への侵入を防止することが可能となる走査電
子顕微鏡を提供することにある。Further, the X-ray passage prevention plate has a two-layer structure of a light material and a heavy material, so that the backscattered electrons and the secondary excitation X
It is an object of the present invention to provide a scanning electron microscope capable of preventing a line from entering a detector.
【0006】[0006]
【課題を解決するための手段】上記目的を達成するた
め、試料とエネルギー分散型X線分析装置の間に穴径の
異なる複数のX線通過孔をもつ回転もしくはスライドす
る二層構造のX線通過防止板を電子顕微鏡に装着した。To achieve the above object, an X-ray having a two-layer structure that rotates or slides and has a plurality of X-ray passage holes having different hole diameters between a sample and an energy dispersive X-ray analyzer. The passage prevention plate was attached to the electron microscope.
【0007】[0007]
【作用】試料とエネルギー分散型X線分析装置の間に穴
径の異なる複数のX線通過孔を持つ回転もしくはスライ
ドするX線通過防止板を設ける。この結果、過剰なX線
は、通過できずに適正な量のX線がエネルギー分散型X
線分析装置に検出される。A rotating or sliding X-ray passage prevention plate having a plurality of X-ray passage holes having different hole diameters is provided between the sample and the energy dispersive X-ray analyzer. As a result, an excessive amount of X-rays cannot pass through, and an appropriate amount of X-rays is emitted as energy dispersive X
Detected by line analyzer.
【0008】[0008]
【実施例】以下、本発明の1実施例を図1に示す。フィ
ラメント1より発生した入射電子2がコンデンサレンズ
3,対物レンズ4を通過し、試料5に照射されることに
より特性X線6a,6b,6cが発生する。このときフ
ァラデーカップ10のプローブ電流値,エネルギー分散
型X線分析装置12のデッドタイムもしくは波長分散型
X線分析装置11の取り込み開始信号などの情報からC
PU13で最適条件を選択し、デジタルアナログ変換器
14,増幅器15を通過した信号をモータ9に送りX線
通過防止板7を回転させる。これにより、X線通過防止
板7にあけられた複数のX線通過孔16a,16b,1
6c,16dのうち適正な穴径のX線通過孔が選択さ
れ、過剰な特性X線6b,6cがエネルギー分散型X線
検出器8に検出されずに特性X線6aのみが検出され
る。この結果、エネルギー分散型X線分析装置と波長分
散型X線分析装置の同時分析が可能となる。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT An embodiment of the present invention is shown in FIG. The incident electrons 2 generated from the filament 1 pass through the condenser lens 3 and the objective lens 4 and are irradiated to the sample 5, so that characteristic X-rays 6a, 6b and 6c are generated. At this time, C is determined from information such as the probe current value of the Faraday cup 10, the dead time of the energy dispersive X-ray analyzer 12 or the acquisition start signal of the wavelength dispersive X-ray analyzer 11.
The optimum condition is selected by the PU 13, and the signal passed through the digital-analog converter 14 and the amplifier 15 is sent to the motor 9 to rotate the X-ray passage prevention plate 7. Thereby, the plurality of X-ray passage holes 16a, 16b, 1 formed in the X-ray passage prevention plate 7 are formed.
An X-ray passage hole having an appropriate hole diameter is selected from 6c and 16d, and excessive characteristic X-rays 6b and 6c are not detected by the energy dispersive X-ray detector 8 and only the characteristic X-ray 6a is detected. As a result, the energy dispersive X-ray analyzer and the wavelength dispersive X-ray analyzer can be simultaneously analyzed.
【0009】図2に本発明の第2の実施例を示す。入射
電子2が対物レンズ4を通過し、試料5に照射されるこ
とにより試料5より発生した特性X線6a,6b,6c
のうち過剰な特性X線6b,6cは、軽元素例えばカー
ボンから成るX線通過防止板7aと重元素例えばタンタ
ルから成るX線通過防止板7bの二層構造のX線通過防
止板に吸収され特性X線6aのみがX線検出器8に検出
される。また、X線通過防止板7aを軽減素材を使用す
ることにより反射電子の発生を防ぎ、X線通過防止板7
bに重元素材を使用することにより二次励起のX線を吸
収することが可能となる。この結果、エネルギー分散型
X線分析装置,波長分散型X線分析装置の同時分析にお
いて、良好な結果が得られる。FIG. 2 shows a second embodiment of the present invention. Characteristic X-rays 6a, 6b, 6c generated from the sample 5 by the incident electron 2 passing through the objective lens 4 and irradiating the sample 5
Excessive characteristic X-rays 6b and 6c are absorbed by the X-ray passage preventing plate having a two-layer structure of an X-ray passage preventing plate 7a made of a light element such as carbon and an X-ray passage preventing plate 7b made of a heavy element such as tantalum. Only the characteristic X-ray 6a is detected by the X-ray detector 8. In addition, the use of a lightening material for the X-ray passage prevention plate 7a prevents the generation of backscattered electrons.
It becomes possible to absorb the X-ray of the secondary excitation by using the element material for b. As a result, good results are obtained in the simultaneous analysis of the energy dispersive X-ray analyzer and the wavelength dispersive X-ray analyzer.
【0010】図3に本発明の第3の実施例を示す。X線
通過防止板7に複数の異なるX線通過孔16a,16
b,16c,16dとブランキングポイント17を設
け、回転させる構造とする。この結果、プローブ電流の
変化に対応したX線通過孔を選択することが可能とな
る。さらに、X線検出器に全く信号が入らない状態を選
択することも可能となる。FIG. 3 shows a third embodiment of the present invention. The X-ray passage prevention plate 7 has a plurality of different X-ray passage holes 16a, 16
b, 16c, 16d and a blanking point 17 are provided so that they are rotated. As a result, it becomes possible to select the X-ray passage hole corresponding to the change in the probe current. Furthermore, it is possible to select a state in which no signal enters the X-ray detector.
【0011】[0011]
【発明の効果】本発明によれば、走査電子顕微鏡を用い
たX線分析でエネルギー分散型X線分析装置,波長分散
型X線分析装置の同時分析が可能となる。According to the present invention, an energy dispersive X-ray analyzer and a wavelength dispersive X-ray analyzer can be simultaneously analyzed by X-ray analysis using a scanning electron microscope.
【図1】1実施例に基づく装置構成図である。FIG. 1 is a configuration diagram of an apparatus according to an embodiment.
【図2】第2の実施例に基づく対物レンズ近傍の装置構
成図である。FIG. 2 is a device configuration diagram in the vicinity of an objective lens according to a second embodiment.
【図3】第3の実施例に基づくX線通過防止板の構造図
である。FIG. 3 is a structural diagram of an X-ray passage prevention plate according to a third embodiment.
1…フィラメント、2…入射電子線、3…コンデンサレ
ンズ、4…対物レンズ、5…試料、6a,6b,6c…
特性X線、7…X線通過防止板、8…エネルギー分散型
X線検出器、9…モータ、10…ファラデーカップ、1
1…波長分散型X線分析装置、12…エネルギー分散型
X線分析装置、13…CPU、14…デジタルアナログ
変換器、15…増幅器、16a,16b,16c,16
d…X線通過孔、17…ブランキングポイント。1 ... Filament, 2 ... Incident electron beam, 3 ... Condenser lens, 4 ... Objective lens, 5 ... Sample, 6a, 6b, 6c ...
Characteristic X-ray, 7 ... X-ray passage prevention plate, 8 ... Energy dispersive X-ray detector, 9 ... Motor, 10 ... Faraday cup, 1
DESCRIPTION OF SYMBOLS 1 ... Wavelength dispersive X-ray analyzer, 12 ... Energy dispersive X-ray analyzer, 13 ... CPU, 14 ... Digital-analog converter, 15 ... Amplifier, 16a, 16b, 16c, 16
d ... X-ray passage hole, 17 ... Blanking point.
Claims (1)
し、前記試料より発生する特性X線を検出するエネルギ
ー分散型X線分析装置,波長分散型X線分析装置と前記
電子線を発生する走査電子顕微鏡において、前記波長分
散型X線分析装置を用いて分析を行う際、過剰のX線が
前記エネルギー分散型X線分析装置に侵入することを防
ぐため、前記試料とエネルギー分散型X線分析装置との
間に穴径の異なる複数のX線通過孔を持つ回転もしくは
スライドする二層構造のX線通過防止板を設けたことを
特徴とする走査電子顕微鏡。1. An energy dispersive X-ray analyzer, a wavelength dispersive X-ray analyzer and the electron beam, which irradiate a sample inserted in a sample chamber with an electron beam and detect characteristic X-rays generated from the sample. In a scanning electron microscope to be generated, when performing analysis using the wavelength dispersive X-ray analyzer, in order to prevent excess X-rays from entering the energy dispersive X-ray analyzer, the sample and the energy dispersive A scanning electron microscope, wherein a rotating or sliding X-ray passage preventing plate having a plurality of X-ray passing holes having different hole diameters is provided between the scanning electron microscope and the X-ray analyzer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5055421A JPH06267485A (en) | 1993-03-16 | 1993-03-16 | Scanning electron microscope |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5055421A JPH06267485A (en) | 1993-03-16 | 1993-03-16 | Scanning electron microscope |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH06267485A true JPH06267485A (en) | 1994-09-22 |
Family
ID=12998116
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5055421A Pending JPH06267485A (en) | 1993-03-16 | 1993-03-16 | Scanning electron microscope |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH06267485A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2001095365A1 (en) * | 2000-06-07 | 2001-12-13 | Kla-Tencor Corporation | Film thickness measurement using electron-beam induced x-ray microanalysis |
| US6664541B2 (en) | 2001-10-01 | 2003-12-16 | Kla Tencor Technologies Corporation | Methods and apparatus for defect localization |
| US6810105B2 (en) | 2002-01-25 | 2004-10-26 | Kla-Tencor Technologies Corporation | Methods and apparatus for dishing and erosion characterization |
| KR101421093B1 (en) * | 2013-09-12 | 2014-08-13 | 한국기계연구원 | Faraday cup for alighnment of electron beam |
-
1993
- 1993-03-16 JP JP5055421A patent/JPH06267485A/en active Pending
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2001095365A1 (en) * | 2000-06-07 | 2001-12-13 | Kla-Tencor Corporation | Film thickness measurement using electron-beam induced x-ray microanalysis |
| JP2003536084A (en) * | 2000-06-07 | 2003-12-02 | ケーエルエー−テンカー・コーポレーション | Thin film thickness measurement using electron beam induced X-ray microanalysis |
| US6787773B1 (en) | 2000-06-07 | 2004-09-07 | Kla-Tencor Corporation | Film thickness measurement using electron-beam induced x-ray microanalysis |
| US6664541B2 (en) | 2001-10-01 | 2003-12-16 | Kla Tencor Technologies Corporation | Methods and apparatus for defect localization |
| US6810105B2 (en) | 2002-01-25 | 2004-10-26 | Kla-Tencor Technologies Corporation | Methods and apparatus for dishing and erosion characterization |
| KR101421093B1 (en) * | 2013-09-12 | 2014-08-13 | 한국기계연구원 | Faraday cup for alighnment of electron beam |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US6548810B2 (en) | Scanning confocal electron microscope | |
| US5008537A (en) | Composite apparatus with secondary ion mass spectrometry instrument and scanning electron microscope | |
| JP2001074437A (en) | Circuit pattern inspection apparatus and circuit pattern inspection method | |
| US4885465A (en) | Spectrum display device for x-ray microanalyzer or the like | |
| US5285066A (en) | Imaging XPS system | |
| JPH03165440A (en) | Energy dispersive X-ray analyzer | |
| KÖRTJE | Image‐EELS: Simultaneous recording of multiple electron energy‐loss spectra from series of electron spectroscopic images | |
| JPH06267485A (en) | Scanning electron microscope | |
| JP2001307672A (en) | Elemental analyzer, scanning transmission electron microscope, and elemental analysis method | |
| JP2688349B2 (en) | Spectrum display device for X-ray microanalyzer etc. | |
| JP2023517266A (en) | Method and apparatus for inspecting a sample with multiple charged particle beamlets | |
| US10319559B2 (en) | Method and device for testing samples by means of an electron or ion beam microscope | |
| JP4146103B2 (en) | Electron beam apparatus equipped with a field emission electron gun | |
| DE3851790T2 (en) | Sphere analyzer of high brightness for charged particles. | |
| JP2001093459A (en) | Scanning transmission electron microscope | |
| Berger et al. | Experimental determination of the probe profile in a dedicated scanning transmission electron microscope | |
| EP4123299B1 (en) | Analyzer apparatus and method of image processing | |
| JP2001167726A (en) | Apparatus of producing work function image | |
| SU1755144A1 (en) | Solid body x-ray spectrum analysis method | |
| JP5209930B2 (en) | X-ray photoelectron spectroscopy analysis method | |
| James et al. | A method for measuring the effective source coherence in a field emission transmission electron microscope | |
| JPH06310063A (en) | Parallel detection type energy loss analyzer | |
| JP2000292380A (en) | Positron annihilation analyzer | |
| Koening et al. | Instrumental effects in the analysis of non‐homogeneous specimens in XPS | |
| JPS599850B2 (en) | X |